KR20230101645A - Apparatus for treating substrate and method for processing a substrate - Google Patents

Abstract

The present invention provides an apparatus for processing a substrate. An apparatus for processing a substrate includes a first module and a processing module for processing the substrate, wherein the first module includes a load port in which a container containing the substrate is placed, and a hand for transporting the substrate between the load port and the processing module. The branch may include a conveyance unit and an observation unit mounted on the conveyance unit and observing a state of the substrate accommodated in the container.

Description

Substrate processing apparatus and substrate processing method {APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR PROCESSING A SUBSTRATE}

The present invention relates to a substrate processing apparatus and a substrate processing method.

A semiconductor manufacturing process proceeds by performing a predetermined process on a substrate. A substrate on which a predetermined treatment has been performed or a substrate on which a predetermined treatment is to be performed is housed in a container and stored or transported. The substrate is seated inside the container, on top of slots installed inside the container.

During the process of transporting the container or seating the substrate inside the container, an event such as distorting the seated position of the substrate inside the container due to an external physical action may occur. The board housed in the container is damaged or the seating position of the board is changed. In order to transfer the substrate from the inside of the container to the outside of the container, it is necessary to accurately determine the state of the substrate stored inside the container. If the state of the substrate housed in the container cannot be accurately determined, the substrate collides with a transfer unit that transports the substrate, causing additional damage to the substrate.

When a substrate is transferred from the inside of the container to the outside of the container, such as a processing unit, while the substrate is not in a normal state inside the container, the substrate is not accurately seated on a support unit within the processing unit. If the substrate is not seated in an accurate process position inside the processing unit, a process error occurs on the substrate, making it difficult to uniformly process the substrate.

An object of the present invention is to provide a substrate processing apparatus and a substrate processing method capable of determining the state of a substrate accommodated inside a container.

Another object of the present invention is to provide a substrate processing apparatus and a substrate processing method capable of simultaneously determining the states of all substrates accommodated in a container.

Another object of the present invention is to provide a substrate processing apparatus and a substrate processing method capable of selectively determining the state of a specific substrate accommodated inside a container.

The object of the present invention is not limited thereto, and other objects not mentioned will be clearly understood by those skilled in the art from the description below.

The present invention provides an apparatus for processing a substrate. An apparatus for processing a substrate includes a first module and a processing module for processing the substrate, wherein the first module includes a load port in which a container containing the substrate is placed, and a hand for transporting the substrate between the load port and the processing module. The branch may include a conveyance unit and an observation unit mounted on the conveyance unit and observing a state of the substrate accommodated in the container.

According to an embodiment, the observation unit may be provided to simultaneously observe the states of all substrates accommodated in the container at a preset reference position.

According to an embodiment, the observation unit is installed at the end of the hand and can observe the state of the plurality of substrates accommodated in the container while the hand is fixed to the reference position.

According to an embodiment, the observation unit includes a data collection unit for collecting time data from when light is irradiated toward the substrate stored in the container until the light is reflected from the substrate and received, and the time data. and a determination unit for estimating a relative distance between the substrate stored in the container and the observation unit, and determining a state of the substrate stored in the container by differently matching a specific color for each distance data.

According to one embodiment, the first module further includes an auxiliary observation unit for selectively observing a state of the substrate by individually irradiating a laser beam toward each substrate stored in the container, the auxiliary observation unit A state of the substrate may be observed by measuring an actual distance between the substrate and the auxiliary observation unit from the laser irradiated to the substrate accommodated in the container.

According to one embodiment, the auxiliary observation unit may be installed at the end of the hand.

According to an embodiment, the transfer unit further includes a drive unit for driving the hand, and the auxiliary observation unit irradiates the laser beam toward the substrate accommodated in the container while the hand is vertically moved by the drive unit. can do.

According to one embodiment, the apparatus further comprises a controller for controlling the transfer unit, the observation unit, and the auxiliary observation unit, wherein the controller determines the state of the substrate accommodated in the container by using the observation unit. The transfer unit, the observation unit, and the auxiliary observation unit may be controlled to perform second observation and second observation of the state of the substrate using the auxiliary observation unit.

According to an embodiment, the controller performs the first observation by moving the hand to the reference position, and when it is determined from the first observation that the substrate accommodated in the container is in an abnormal state, the controller moves the hand up and down. The transfer unit, the observation unit, and the auxiliary observation unit may be controlled to perform secondary observation on the substrate in the abnormal state by moving the substrate in the abnormal state.

Further, the present invention provides a method of processing a substrate by determining the state of a substrate accommodated in a container placed on a load port. The method of processing the substrate may open the door of the container and determine the state of the substrate stored in the container with the open door using an observation unit installed in a transfer unit that transports the substrate from the load port.

According to an embodiment, the observation unit may be provided to simultaneously observe states of all substrates stored in the container in a state where the transfer unit is positioned at a preset reference position.

According to an embodiment, the observation unit collects time data from when light is irradiated toward the substrate stored in the container until the light is reflected and received from the substrate, and according to the collected time data A relative distance between the substrate accommodated in the container and the observation unit may be estimated.

According to an embodiment, the observation unit may determine the state of the substrate accommodated in the container by differently matching a specific color for each of the relative distance data.

According to one embodiment, the method individually irradiates a laser toward each substrate accommodated in the container with the door open using an auxiliary observation unit installed in the transfer unit, and irradiates the substrate and the substrate from the irradiated laser. The state of the substrate may be selectively observed by measuring the actual distance between the auxiliary observation units.

According to one embodiment, the auxiliary observation unit may irradiate the laser toward each substrate accommodated in the container while the transfer unit moves in a vertical direction.

According to an embodiment, the state of the substrate may be firstly observed using the observation unit and secondly observed using the auxiliary observation unit.

According to an embodiment, the first observation is performed by moving the transfer unit to the reference position, and when it is determined from the first observation that the substrate stored in the container is in an abnormal state, the transfer unit is moved in a vertical direction. It is possible to perform secondary observation on the substrate in the abnormal state by moving to .

According to an embodiment, the distance between the transfer unit and the substrate stored in the container, the presence or absence of the substrate stored in the container, the distortion of the substrate stored in the container, the damage of the substrate stored in the container It may be at least one of them.

In addition, the present invention provides an apparatus for processing a substrate. An apparatus for processing a substrate includes a first module and a processing module for processing the substrate, wherein the first module is disposed between a load port in which a container containing a substrate is placed and disposed between the load port and the processing module to transport the substrate. A transport frame having a transport space, a transport unit disposed inside the transport frame and having a hand for transporting a substrate between the load port and the processing module, installed in the hand, and the hand positioned at a predetermined reference position. an observation unit that simultaneously observes the states of all substrates stored in the container in the state of operation and is installed on the hand at a position that does not overlap with the observation unit, and while the hand moves in a vertical direction toward a specific substrate stored in the container It may include an auxiliary observation unit for selectively observing the state of the specific substrate by radiating the laser.

According to an embodiment, the observation unit collects time data from when light is irradiated toward the substrate stored in the container until the light is reflected and received from the substrate, and the time data according to the collected time data is collected. The relative distance between the substrate stored in the container and the observation unit is estimated, and the state of the substrate stored in the container is first determined by differentially matching a specific color for each distance data, and the auxiliary observation unit determines the state of the substrate stored in the container. The state of the specific substrate accommodated in the container may be secondarily determined by irradiating a laser beam toward a specific substrate accommodated in the container and measuring an actual distance between the specific substrate and the auxiliary observation unit from the irradiated laser beam.

According to one embodiment of the present invention, it is possible to determine the state of the substrate stored inside the container.

In addition, according to one embodiment of the present invention, the states of all substrates accommodated in the container can be simultaneously determined.

In addition, according to one embodiment of the present invention, it is possible to selectively determine the state of a specific substrate accommodated inside the container.

The effects of the present invention are not limited to the above-mentioned effects, and effects not mentioned will be clearly understood by those skilled in the art from this specification and the accompanying drawings.

1 is a diagram schematically showing a substrate processing apparatus according to an embodiment of the present invention.
FIG. 2 is a view schematically showing a first module according to an embodiment of FIG. 1 viewed from the side.
FIG. 3 is a diagram schematically showing a hand according to an embodiment of FIG. 2 viewed from above.
FIG. 4 is a block diagram showing an observation unit installed in the hand according to the embodiment of FIG. 3 viewed from the top.
FIG. 5 is a diagram schematically showing the hand according to the embodiment of FIG. 2 viewed from the bottom.
FIG. 6 is a block diagram illustrating an auxiliary observation unit installed in a hand according to an embodiment of FIG. 5 viewed from above.
7 is a flowchart of a substrate processing method according to an embodiment of the present invention.
FIG. 8 is a diagram schematically showing an embodiment of a state in which a hand moves to a reference position for the first observation of FIG. 7 .
9 is a side view of an embodiment of an observation unit performing primary observation of FIG. 7 .
FIG. 10 is a front view of an embodiment of determining the state of a substrate accommodated in a container by the first observation of FIG. 7 .
11 is a side view of an embodiment of an observation unit performing primary observation of FIG. 7 .
FIG. 12 is a front view of an embodiment of determining the state of a substrate accommodated in a container by the first observation of FIG. 7 .
13 and 14 are side views of an embodiment of an auxiliary observation unit performing secondary observation of FIG. 7 .

Hereinafter, embodiments of the present invention will be described in more detail with reference to the accompanying drawings. Embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be construed as being limited due to the examples described below. This embodiment is provided to more completely explain the present invention to those skilled in the art. Accordingly, the shapes of components in the drawings are exaggerated to emphasize a clearer description.

Terms such as first and second may be used to describe various components, but the components should not be limited by the terms. The terms may be used for the purpose of distinguishing one component from another. For example, a first element may be termed a second element, and similarly, the second element may also be termed a first element, without departing from the scope of the present invention.

Hereinafter, embodiments of the present invention will be described in detail with reference to FIGS. 1 to 14 .

1 is a diagram schematically showing a substrate processing apparatus according to an embodiment of the present invention. Referring to FIG. 1, a substrate processing apparatus 1 according to an embodiment of the present invention includes a controller 8, a first module 10, a second module 70, a load lock chamber 80, and a processing module. (90).

The controller 8 includes a process controller composed of a microprocessor (computer) for controlling the substrate processing apparatus 1, a keyboard for performing command input operations, etc. for an operator to manage the substrate processing apparatus 1, and a substrate A user interface consisting of a display or the like that visualizes and displays the operation status of the processing apparatus 1, a control program for executing processes executed in the substrate processing apparatus 1 under the control of a process controller, and various data and processing conditions. Accordingly, a program for executing processing in each component unit, that is, a storage unit in which a processing recipe is stored may be provided. Also, the user interface and storage may be connected to the process controller. The processing recipe may be stored in a storage medium of the storage unit, and the storage medium may be a hard disk, a portable disk such as a CD-ROM or a DVD, or a semiconductor memory such as a flash memory.

The controller 8 may control the substrate processing apparatus 1 to perform a substrate processing method described below. For example, the controller 8 may control elements provided to the substrate processing apparatus 1 so as to perform a substrate processing method described below.

FIG. 2 is a view schematically showing a first module according to an embodiment of FIG. 1 viewed from the side. Referring to FIGS. 1 and 2 , a first module 10 and a second module 70 to be described later may be arranged along a first direction 2 . Hereinafter, a direction perpendicular to the first direction (2) when viewed from above is defined as a second direction (4). In addition, a direction perpendicular to the plane including both the first direction (2) and the second direction (4) is defined as a third direction (6). Here, the third direction 6 may mean a direction perpendicular to the ground.

The first module 10 may selectively transfer the substrate W between the container F and the load lock chamber 80 to be described later. For example, the first module 10 takes out the substrate W from the container F and transports it to the load lock chamber 80, or takes the substrate W out of the load lock chamber 80 and transfers it to the container F. can be returned

The first module 10 may include a load port 20, a transport frame 30, a transport unit 40, an observation unit 50, and an auxiliary observation unit 60.

The load port 20 may be disposed on one side of a transport frame 30 to be described later. At least one load port 20 may be provided. A plurality of load ports 20 may be arranged in a line along the second direction 4 . The number of load ports 20 may increase or decrease depending on process efficiency and footprint conditions.

A container (F) according to an embodiment of the present invention may be placed in the load port (20). The container F is transported by a transport means (not shown) such as an Overhead Transfer Apparatus (OHT), an overhead conveyor, or an Automatic Guided Vehicle, or a load port 20 by an operator. It can be loaded into or unloaded from the load port 20.

The container (F) may include various types of containers (F) according to the type of article to be stored. For example, the container F may be an airtight container such as a front opening unified pod (FOUP).

A slot (S) is installed in the inner space of the container (F). A plurality of slots S are provided. A plurality of slots (S) may be installed on the side wall of the container (F). A plurality of slots (S) may be disposed spaced apart from the side wall of the container (F) in the vertical direction. A substrate (W) is seated on the top of the slot (S). The substrate (W) is seated on the top of the slot (S) and accommodated in the inner space of the container (F).

Hereinafter, for convenience of description, an example in which 10 slots S are installed on each of the side walls facing the inside of the container F will be described as an example. For example, in the direction from the top to the bottom of the inner space of the container (F), the installation from the first slot (S1) to the tenth slot (S10) will be described as an example. In addition, the substrate W placed on the first slot S1 is defined as a first substrate W1, and the substrate W seated on the tenth slot S10 is defined as a tenth substrate W10.

The transport frame 30 is provided between the load port 20 and the load lock chamber 80 . A load port 20 may be connected to the transport frame 30 . The transport frame 30 may have a substantially rectangular parallelepiped shape. The transport frame 30 has a transport space for transporting the substrate W therein. The inside of the transport frame 30 may be provided under normal pressure. The inside of the transport frame 30 may be maintained in an atmospheric pressure atmosphere.

A carrying inlet 311 serving as a passage for transferring the substrate W may be formed in a rear wall 310 adjacent to a load lock chamber 80 to be described later among side walls of the transport frame 30 . An opening 321 may be formed in the front wall 320 facing the rear wall 310 . The substrates W placed in the container F may be transferred from the opening 321 to the load lock chamber 80 through the carrying inlet 311 by a transfer unit 40 to be described later.

Inside the transport frame 30, a transport unit 40, a door opener 330, and a fan filter unit (not shown) may be disposed.

The door opener 330 opens and closes the door DR of the container F placed in the load port 20 . At least one door opener 330 may be provided. The door opener 330 may be provided to correspond to the number of containers F placed in the load port 20 . The door opener 330 may be moved in a sliding manner toward the third direction 6 by the driving device 340 . The door opener 330 may be coupled to the door DR of the container F and slide in a downward direction with respect to the ground. Accordingly, the container F may be opened. The driving device 340 may be provided as a known device that provides driving force in the vertical direction.

A fan filter unit (not shown) may be provided above the transport frame 30 . A fan filter unit (not shown) may supply external air current to the inner space of the transport frame 30 . A fan filter unit (not shown) may maintain the inside of the transport frame 30 at a constant level of cleanliness.

The transport unit 40 is disposed in the inner space of the transport frame 30 . The transport unit 40 may transport the substrate W between the container F seated in the load port 20 and the load lock chamber 80 to be described later. For example, the transport unit 40 may transport the substrate W, which has undergone a predetermined process in the processing module 90 to be described later, into the container F. The substrate (W) conveyed into the container (F) may be seated on top of the slot (S) installed inside the container (F). In addition, the transfer unit 40 may transfer the waiting substrate W from the container F to the load lock chamber 80 in order to perform a predetermined process in the process module 90 to be described later.

The transfer unit 40 may include a rail 420 , a driving unit 440 , and a hand 460 . The rail 420 may be provided along the second direction 4 in its longitudinal direction inside the transport frame 30 . The driving unit 440 may move along the rail 420 . The driving unit 440 may move along the second direction 4 on the rail 420 . Accordingly, the driving unit 440 may move forward and backward along the rail 420 . The driving unit 440 may rotate and move the hand 460 to be described later in the third direction 6 as an axis. Accordingly, the hand 460 may move in the first direction (2). Also, the driver 440 may vertically move the hand 460 in the third direction 6 . The driving unit 440 may include an arm and a rod. A hand 460 may be installed on top of the driving unit 440 .

FIG. 3 is a diagram schematically showing a hand according to an embodiment of FIG. 2 viewed from above. Referring to FIG. 3 , the hand 460 may transport the substrate W. A substrate W may be placed on the hand 460 . For example, the substrate W may be fixedly supported on the upper surface of the hand 460 . In addition, the hand 460 may further transport parts used in the processing module 90 . For example, the hand 460 may carry a ring-shaped member (not shown) used in the processing module 90 . According to one example, the substrate W may have a diameter smaller than that of a ring-shaped member (not shown).

Inner support parts 461 and 463 and outer support parts 465 and 467 may be formed on the upper surface of the hand 460 . The inner support parts 461 and 463 and the outer support parts 465 and 467 may be provided as pads having elasticity. Optionally, the inner support portions 461 and 463 and the outer support portions 465 and 467 may be provided in the form of vacuum holes providing negative pressure.

The inner support parts 461 and 463 may support the substrate W. A plurality of inner supporters 461 and 463 may be provided. For example, the inner supporters 461 and 463 may support the lower surface of the substrate W at four points. The inner support portions 461 and 463 may include a pair of first inner support portions 461 and a pair of second inner support portions 463 . The pair of first inner supporting parts 461 and the pair of second inner supporting parts 463 may have a substantially circular shape when viewed from the top when combined with each other. The pair of first inner supporting parts 461 and the pair of second inner supporting parts 463 are combined with each other and may overlap the edge area of the substrate W when viewed from above.

The outer support portions 465 and 467 may support a ring-shaped member (not shown). A plurality of outer supporters 465 and 467 may be provided. For example, the outer support portions 465 and 467 may support the lower surface of a ring-shaped member (not shown) at four points. The outer supports 465 and 467 may include a pair of first outer supports 465 and a pair of second outer supports 467 . The pair of first outer supporting parts 465 and the pair of second outer supporting parts 467 may have a substantially circular shape when viewed from above. The pair of first outer supporting parts 465 and the pair of second outer supporting parts 467 may be combined with each other and overlap with a ring-shaped member (not shown) when viewed from above.

FIG. 4 is a block diagram showing an observation unit installed in the hand according to the embodiment of FIG. 3 viewed from the top. Hereinafter, the observation unit 50 according to an embodiment of the present invention will be described in detail with reference to FIGS. 2 to 4 .

The observation unit 50 is mounted on the conveying unit 40 . According to one example, the observation unit 50 may be installed in the hand 460 . The observation unit 50 may be installed at the end of the hand 460 . For example, the observation unit 50 may be installed on the side of the end of the hand 460 . However, the present invention is not limited thereto, and the observation unit 50, when the substrate W and/or a ring-shaped member (not shown) is seated on the hand 460, the substrate W and/or the ring-shaped member It may be installed in a position that does not interfere with the member (not shown). In this case, the observation unit 50 may be installed on the hand 460 in a direction toward the container F placed in the load port 20 . At least one observation unit 50 may be installed in the hand 460 .

The observation unit 50 observes the state of the substrate W and determines the state of the substrate W. The observation unit 50 observes and determines the state of the substrate W housed inside the container F placed in the load port 20 . The observation unit 50 simultaneously observes and determines the state of all of the plurality of substrates W accommodated inside the container F. In addition, the observation unit 50 collectively observes and determines the state of all the substrates W housed in the container F. The observation unit 50 collectively observes the state of all the substrates W housed in the container F at a fixed position. The state of the substrate W determined by the observation unit 50 is determined by the distance between the observation unit 50 or the transfer unit 40 and the substrate W stored inside the container F, inside the container F. It may be at least one of the presence or absence of the substrate W stored therein, distortion of the substrate W stored inside the container F, and damage to the substrate W stored inside the container F. A detailed mechanism for determining the state of the substrate W using the observation unit 50 will be described later.

The observation unit 50 may include a housing 510 , an irradiation unit 520 , a light receiving unit 540 , a data collection unit 550 , and a determination unit 560 .

The housing 510 has a space therein. Components included in the observation unit 50 may be disposed in the inner space of the housing 510 . The housing 510 may modularize components included in the observation unit 50 . A configuration modularized by the housing 510 according to an embodiment may be time to flight (ToF). The housing 510 can prevent byproducts inside the transport frame 30 from damaging components included in the observation unit 50 . A lens 512 may be installed on one side of the housing 510 . Light emitted from the irradiation unit 520 to be described later by the lens 512 may be uniformly emitted to the outside of the housing 510 . In addition, the light reflected from the target object (eg, the substrate W) by the lens 512 and returned can be easily collected by the light receiving unit 540 described later.

The irradiation unit 520 radiates light toward a target object. The irradiation unit 520 radiates light toward the substrate (W). According to an embodiment, the light irradiated by the irradiation unit 520 may be infrared rays. Alternatively, the light irradiated by the irradiation unit 520 may be a laser light. The irradiation unit 520 may simultaneously irradiate light toward all the substrates W seated in the slots S of the container F with the open door DR placed in the load port 20 . For example, the irradiation unit 520 radiates light that covers all from the upper end of the container F to the lower end of the container F toward the container F. That is, the irradiation unit 520 may irradiate light having a uniform spatial spread of waves and a regular phase, which is output at a time pattern at regular intervals and emits surface light in a uniform pattern as a whole.

The light receiving unit 540 receives light reflected from a target object. The light receiving unit 540 receives the light reflected from the substrate W. According to an example, the light receiving unit 540 simultaneously receives light reflected from the substrates W seated in the slots S of the container F in which the door DR placed on the load port 20 is open. can

The data collector 550 collects time data required for light flight by using the light received from the light receiver 540 . The data collection unit 550 may collect time data from when the irradiation unit 520 emits light until the light receiver 540 receives the light. For example, in the data collection unit 550, after light is irradiated from the irradiation unit 520, the light is reflected on the substrates W seated in the slot S inside the container F placed in the load port 20 and , it is possible to collect data on the time required for the reflected light to be received by the light receiver 540 again. That is, the required time data may be a time obtained by adding light irradiation time (or projection time) and reflection time. The data collection unit 550 may transmit the collected required time data to the determination unit 560 .

The determination unit 560 analyzes the required time data transmitted from the data collection unit 550 . The determination unit 560 estimates the relative distance between the observation unit 50 and the substrate W accommodated in the container F from the required time data. For example, the determining unit 560 may measure the relative distance between the substrate W accommodated in the container F and the observation unit 50 using the required time data and the speed of light. The determination unit 560 may implement an image based on the estimated relative distance data. For example, the determination unit 560 may estimate each relative distance from each required time data estimated from each received light, and match a specific color for each of a plurality of estimated relative distances differently. According to an example, the determination unit 560 may be provided as an image sensor for measuring a phase difference according to required time data.

For example, the first substrate W1 accommodated in the first slot S1 of the container F is located at a position relatively farther from the observation unit 50 than the tenth substrate W10 accommodated in the tenth slot S10. Assume it has been received. In this case, the first light reflected from the first substrate W1 accommodated in the first slot S1 is received by the light receiving unit 540, and the light receiving unit 540 can obtain first time data. The determination unit 560 may match a first color (eg, a color darker than a second color to be described later) with the first substrate W1 by using the first time data. Unlike this, the 10th light reflected from the 10th substrate W10 accommodated in the 10th slot S10 is received by the light receiving unit 540, and the light receiving unit 540 can obtain data for the 10th time. The determination unit 560 may match the second color (eg, a color brighter than the first color) to the tenth substrate W10 using the tenth time data.

FIG. 5 is a diagram schematically showing the hand according to the embodiment of FIG. 2 viewed from the bottom. FIG. 6 is a block diagram illustrating an auxiliary observation unit installed in a hand according to an embodiment of FIG. 5 viewed from above. Hereinafter, the auxiliary observation unit 60 according to an embodiment of the present invention will be described with reference to FIGS. 2, 5, and 6.

The auxiliary observation unit 60 is mounted on the conveying unit 40 . The auxiliary observation unit 60 may be mounted on the end of the hand 460 . As shown in FIG. 5 , the auxiliary observation unit 60 may be mounted on the lower end of the hand 460 . However, the present invention is not limited thereto, and the auxiliary observation unit 60 may, when the substrate W and/or a ring-shaped member (not shown) are seated on the hand 460, the substrate W and/or the ring-shaped member 60. It may be installed in a position that does not interfere with the member (not shown). In addition, the auxiliary observation unit 60 is mounted in a position that does not overlap with the observation unit 50 installed in the hand 460 . At this time, the auxiliary observation unit 60 may be installed on the hand 460 in a direction toward the container F placed in the load port 20. At least one auxiliary observation unit 60 may be installed in the hand 460 .

The auxiliary observation unit 60 observes the state of the substrate W and determines the state of the substrate W. The auxiliary observation unit 60 observes and determines the state of the substrate W housed inside the container F placed in the load port 20 . The auxiliary observation unit 60 may radiate light toward a target object. For example, the light irradiated by the auxiliary observation unit 60 may be a laser. The auxiliary observation unit 60 may individually irradiate the laser to each of the substrates W accommodated in the container F. The auxiliary observation unit 60 can selectively observe and determine the state of the substrate W seated in each slot S by irradiating a laser on each substrate W accommodated in the container F. there is.

The state of the substrate W determined by the auxiliary observation unit 60 is the actual distance between the auxiliary observation unit 60 or the transfer unit 40 and the substrate W accommodated in the container F, the container F ) may be the presence or absence of a substrate (W) in a specific slot (S) inside, a seating position of the substrate (W) in a specific slot (S) inside the container (F), and the like.

According to one embodiment, the hand 460 is moved in a vertical direction (eg, the third direction 6) by the driving unit 440, and the auxiliary observation unit 60 mounted on the hand 460 also moves in a vertical direction. are moved Accordingly, the auxiliary observation unit 60 moves between the top and bottom of the container F, and while the auxiliary observation unit 60 is moving, the auxiliary observation unit 60 irradiates the laser toward the substrate W to It is possible to selectively observe and determine the state of each of the substrates (W) seated inside the container (F). A detailed mechanism for this will be described later.

The auxiliary observation unit 60 may include a housing 610 , a laser irradiation unit 620 , a laser light receiving unit 640 , and a reading unit 660 .

The housing 610 has a space therein. Components included in the auxiliary observation unit 60 may be disposed in the inner space of the housing 610 . The housing 610 may modularize components included in the auxiliary observation unit 60 . A component modularized by the housing 610 according to an example may be a laser module. The housing 610 may protect elements included in the auxiliary observation unit 60 from impurities outside the housing 610 . A lens 612 may be installed on one side of the housing 610 .

The laser irradiation unit 620 irradiates a laser toward a target object. The laser irradiation unit 620 irradiates the laser toward the substrate W accommodated in the container F. The laser irradiation unit 620 may irradiate a laser having linearity. Accordingly, the laser irradiation unit 620 may individually irradiate the laser to each of the substrates W seated in the slots S of the container F with the open door DR placed in the load port 20. . The laser irradiated from the laser irradiation unit 620 is reflected from the substrate W and received by a laser light receiving unit 640 to be described later. The laser light receiving unit 640 receives the laser reflected from the substrate (W). Data on the received laser is transmitted to a reader 660 to be described later.

The reading unit 660 may determine actual distance data between the target substrate W from which the laser is reflected and the auxiliary observation unit 60 by using the laser light received from the laser light receiving unit 640 . The reader 660 may determine the state of the substrate W accommodated in the container F placed in the load port 20 by using the determined actual distance data. For example, it is possible to determine whether or not the substrate (W) is present in the slot (S) inside the container (F) and/or the location where the substrate (W) is mounted in the slot (S).

Referring back to FIG. 1 , the second module 70 may be disposed between a load lock chamber 80 to be described later and a processing module 90 to be described later. The second module 70 may include a transfer chamber 720 and a transfer robot 740 .

An internal atmosphere of the transfer chamber 720 may be maintained as a vacuum pressure atmosphere. At least one processing module 90 to be described below may be connected to the transfer chamber 720 . The transfer chamber 720 may be provided in a polygonal shape. A load lock chamber 80 and a processing module 90 to be described later may be disposed around the transfer chamber 720 . For example, as shown in FIG. 1 , a transfer chamber 720 having a hexagonal shape may be disposed at the center of the second module 70 , and a load lock chamber 80 and a processing module 90 may be disposed around the transfer chamber 720 . However, the shape of the transfer chamber 720 and the number of process chambers may be variously modified and provided according to user needs.

A transfer robot 740 may be disposed in the transfer chamber 720 . For example, the transfer robot 740 may be located in the center of the transfer chamber 720 . The transport robot 740 may transport the substrate W between the load lock chamber 80 and the processing module 90 . Optionally, the transport robot 740 may transport the substrate W between processing modules 90 . The transfer robot 740 may have a transfer hand 742 that moves forward, backward or rotates on a horizontal plane. At least one transfer hand 742 may be provided. Since the structure of the transfer hand 742 is mostly similar to the structure of the hand 460 described above, the description thereof is omitted below to avoid redundant description thereof.

The load lock chamber 80 may be disposed between the transfer frame 30 and the transfer chamber 720 . The load lock chamber 80 provides a buffer space in which the substrates W are exchanged between the transport frame 30 and the transfer chamber 720 .

As described above, the transport frame 30 may maintain an atmospheric pressure atmosphere, and the transfer chamber 720 may maintain a vacuum pressure atmosphere. The load lock chamber 80 is disposed between the transport frame 30 and the transfer chamber 720 so that its internal atmosphere can be switched between an atmospheric pressure atmosphere and a vacuum pressure atmosphere.

The processing module 90 according to an embodiment of the present invention performs a predetermined process on the substrate (W). The processing module 90 may process the substrate W using plasma. For example, the processing module 90 includes an etching process of removing a thin film on the substrate W using plasma, an ashing process of removing a photoresist film, and a deposition process of forming a thin film on the substrate W. , or a dry cleaning process may be performed. As the plasma source generated by the processing module 90 according to an embodiment, known inductively coupled plasma (ICP) or microwave plasma may be used.

However, unlike the above-described example, in any part of the processing module 90 according to an embodiment of the present invention, before performing the plasma treatment on the substrate (W), an etching process or a photo process on the substrate (W) The substrate W may be processed using plasma in another part of the processing module 90 .

7 is a flowchart of a substrate processing method according to an embodiment of the present invention. Hereinafter, referring to FIG. 7 , a substrate processing method according to an embodiment of the present invention will be described in detail.

A substrate processing method according to an embodiment of the present invention may be performed in the substrate processing apparatus 1 described above. In addition, the controller 8 may control components of the substrate processing apparatus 1 so that the substrate processing apparatus 1 can perform a substrate processing method described below. For example, the controller 8 may control components included in the transfer unit 40 , the observation unit 50 , and the auxiliary observation unit 60 of the substrate processing apparatus 1 .

Referring to FIG. 7 , a substrate processing method according to an example may perform a first observation step ( S100 ) and a second observation step ( S200 ). Both the first observation step (S100) and the second observation step (S200) may be performed in a state where the container F is placed in the load port 20. For example, both the first observation step (S100) and the second observation step (S200) may be performed in a state in which the door DR of the container F placed on the load port 20 is open.

In the first observation step ( S100 ), states of all the substrates (W) accommodated in the plurality of slots (S) inside the container (F) with the door (DR) open are simultaneously observed. In the first observation step (S100), the hand 460 is fixed at a preset reference position, and the observation unit 50 mounted on the hand 460 is used to measure all the substrates W accommodated in the container F. Observe and judge the state. A detailed mechanism for observing and determining the state of the substrate W in the first observation step ( S100 ) will be described later with reference to FIGS. 8 to 12 .

In the first observation step (S100), when it is determined that a substrate W in an abnormal state exists among the substrates W accommodated in the slots S, a specific substrate W determined to be in an abnormal state exists. A second observation step (S200) is performed for

In the second observation step (S200), the state of a specific substrate (W) determined to be in an abnormal state among the substrates (W) stored in the plurality of slots (S) inside the container (F) in which the door (DR) is opened. Observe secondarily. In the second observation step (S200), the hand 460 is moved in the third direction 6 so that the auxiliary observation unit 60 is located at the same height as the specific substrate W determined to be in an abnormal state. to observe and determine the state of a specific substrate (W) using the auxiliary observation unit (60). A detailed mechanism for observing and determining the state of a specific substrate W in the secondary observation step (S200) will be described later with reference to FIGS. 13 and 14.

When it is determined that the state of the specific substrate W determined by the secondary observation step (S200) is in an abnormal state, an interlock is generated. Through the generated interlock, the operator can check the state of the specific substrate (W) housed in the container (F). In contrast, when it is determined that the specific substrate W determined in the second observation step ( S200 ) is not in an abnormal state, the observation mechanism for the substrates W accommodated in the container F may be terminated.

FIG. 8 is a diagram schematically showing an embodiment of a state in which a hand moves to a reference position for the first observation of FIG. 7 . Referring to FIG. 8 , in the first observation step ( S100 ), as described above, the observation unit 50 is used to observe and determine the states of all the substrates W accommodated in the container F. Before performing the first observation step (S100), the door DR of the container F placed in the load port 20 is opened by the door opener 330. When the door DR of the container F is moved downward by the door opener 330, the transport unit 40 drives the driving unit 440 to move the hand 460 to the reference position. According to one example, the reference position may be defined as an observation position at which the observation unit 50 can observe all the substrates W accommodated in the container F.

The reference position is when the center of the observation unit 50 coincides with a point on an imaginary straight line horizontally from the center C of the container F when the container F with the door DR opened is viewed from the front. may be a location. As shown in FIG. 8 , when the hand 460 is positioned relatively lower than the reference position, the driving unit 440 moves the hand 460 upward to move the hand 460 to the reference position. When the hand 460 is positioned at the reference position, the observation unit 50 performs a first observation step (S100).

9 is a side view of an embodiment of an observation unit performing primary observation of FIG. 7 . FIG. 10 is a front view of an embodiment of determining the state of a substrate accommodated in a container by the first observation of FIG. 7 .

Hereinafter, for convenience of explanation, when viewing the container F from the side, both ends of the substrate W seated in the slot S are imaginary straight lines L1 and L2 connected in the vertical direction of the container F. In the case of each location, the substrate (W) is defined as being seated in place on the side of the slot (S). In addition, when viewing the container F from the front, both ends of the substrate W seated in the slot S are located in L3 and L4, which are imaginary straight lines extending in the vertical direction of the container F, respectively. The substrate (W) is defined as being seated in place on the front side of the slot (S).

Referring to FIGS. 9 and 10 , when the hand 460 is moved to the reference position, the irradiation unit 520 radiates light toward the container F. The irradiation unit 520 radiates surface light that can cover all of the container F from the top to the bottom toward the container F. The light irradiated from the irradiation unit 520 is irradiated onto the substrate W seated in the internal slots S of the container F. The light receiving unit 540 receives light reflected inside the container F.

The data collector 550 collects time data required for light flight by using the light received from the light receiver 540 . The data collection unit 550 may collect time data from when light is emitted by the emitter 520 to when light is received by the light receiver 540 . For example, the data collection unit 550 transmits the collected required time data to the determination unit 560 .

The determination unit 560 analyzes the required time data transmitted from the data collection unit 550 . The determination unit 560 may estimate a relative distance between elements existing inside the container F and the observation unit 50 from the required time data. For example, the determining unit 560 may estimate relative distance data between the observation unit 50 and the substrates W existing inside the container F from the required time data at once. The determination unit 560 may implement an image based on the estimated relative distance data. For example, the determination unit 560 estimates each relative distance using each required time data estimated from each received light, and implements an image by matching a specific color for each of a plurality of estimated relative distances differently. can

In the image of the inside of the container F implemented in the first observation step (S100), it is possible to determine whether they are the same by comparing the color of the substrates W stored inside the container F with the color of the reference image. . For example, the reference image may be an image in a state in which the substrates W are all seated in the correct positions in the internal slots S of the container F.

For example, as shown in FIG. 9 , each of the substrates (W) seated in the internal slots (S) of the container (F) may be located in the right position on the side of the container (F). In addition, among the substrates W seated in the internal slots S of the container F, a third substrate W3 seated in the third slot S3 and a tenth board seated in the tenth slot S10 (W10) can be stored away from the original position on the front of the container (F).

In this case, an image of the state of the substrate W observed by the observation unit 50 may be expressed as shown in FIG. 10 . That is, as shown in FIG. 10, since the substrates (W) are all positioned on the side of the container (F), all of the substrates (W) housed in the container (F) are expressed in the same color (eg, gray). It can be. It is possible to determine whether or not the substrate (W) is located in the proper position of the slot (S) on the side of the container (F) by comparing the image color of the implemented substrates (W) and the color of the substrate (W) of the reference image with each other. there is.

However, in the image of the implemented substrates (W), the third substrate (W3) seated in the third slot (S3) and the tenth board (W10) seated in the tenth slot (S10) are respectively imaginary straight lines L3 and Since they are seated at a position out of L4, it can be determined that the third substrate W3 and the tenth substrate W10 are displaced from the original position of the slot S on the front of the container F, and distortion has occurred.

11 is a side view of an embodiment of an observation unit performing primary observation of FIG. 7 . FIG. 12 is a front view of an embodiment of determining the state of a substrate accommodated in a container by the first observation of FIG. 7 . Unlike the description with reference to FIGS. 9 and 10 hereinafter, each of the substrates W seated in the internal slots S of the container F is out of position on the side of the container F, and the container ( On the front side of F), an example in which it is positioned and accommodated will be described.

Referring to FIGS. 11 and 12, a first substrate W1 and a third slot S3 seated in a first slot S1 among substrates W seated in slots S inside a container F are shown. The third substrate (W3) seated on the side of the container (F) can be stored away from the original position. For example, as shown in FIG. 11, the first substrate (W1) is separated from its original position in a direction toward the side facing the open side of the container (F), and the third substrate (W3) is separated from its original position by the container (F). ) is deviated towards the direction towards the open side of the That is, the first substrate (W1) on the side is located at a position relatively far from the observation unit 50 located at the reference position than the other substrates (W), and the third substrate (W3) on the side of the container (F) It is located at a position relatively close to the observation unit 50 located at the reference position than the rest of the substrates (W).

In this case, an image of the state of the substrate W observed by the observation unit 50 may be expressed as shown in FIG. 12 . That is, since the first substrate W1 is located far from the observation unit 50 as described above, it is matched with a relatively dark color compared to the other substrates W. In addition, since the third substrate W3 is located close to the observation unit 50 as described above, it can be matched with a relatively bright color compared to the other substrates W. By comparing the image colors of the substrates W observed and implemented by the observation unit 50 and the color of the substrate W of the reference image with each other, the substrate W is determined by the slot S on the side of the container F. It can be determined that it is out of position.

On the other hand, according to the images of the substrates W observed and implemented by the observation unit 50, the ends of the substrates W are all positioned at L3 and L4, which are imaginary straight lines in the front of the container F Therefore, it can be determined that the substrates (W) will not depart from the original position of the slot (S) on the front of the container (F).

Whether the substrate (W) is accommodated in each of the slots (S) installed inside the container (F) using the mechanism using the observation unit 50 as described above, the substrate (W) stored inside the container (F) It is possible to determine at the same time whether or not they are out of position in the slot (S) and/or whether or not the substrates (W) accommodated in the container (F) are damaged.

13 and 14 are side views of an embodiment of an auxiliary observation unit performing secondary observation of FIG. 7 .

Hereinafter, based on the states of the substrates W accommodated in the container F described with reference to FIGS. 11 and 12, an abnormal state using the auxiliary observation unit 60 with reference to FIGS. 13 and 14 An example of selectively performing the secondary observation step (S200) on specific substrates (W) determined to be in the substrate will be described in detail.

Referring to FIG. 13 , when it is determined in the first observation step ( S100 ) that the first substrate ( W1 ) and the third substrate ( W3 ) have an abnormal state, a second observation step ( S200 ) is performed. In the second observation step (S20), the state of the specific substrate (W) determined to have an abnormal state in the first observation step (S100) is selectively observed and determined. According to an example, in the second observation step ( S200 ), the states of only the first and third substrates W1 and W3 determined to be in an abnormal state are selectively observed and determined.

The driver 440 drives the hand 460 to move the auxiliary observation unit 60 mounted on the hand 460 to a position corresponding to the position where the first substrate W1 is seated. For example, as shown in FIG. 13 , when viewing the container F from the front, the hand 460 is moved upward so that the first substrate W1 and the auxiliary observation unit 60 are positioned on the same line. The laser irradiation unit 620 irradiates the laser toward the first substrate W1, and the laser light receiving unit 640 receives the laser reflected from the first substrate W1. The reader 660 may determine actual distance data between the auxiliary observation unit 60 and the first substrate W1 from which the laser is reflected by using data on the laser light received from the laser light receiver 640 . The reader 660 may determine the state of the first substrate W1 by using actual distance data between the determined first substrate W1 and the auxiliary observation unit 60 .

That is, it is determined whether or not the first substrate W1 is present on the first slot S1 and/or whether the first substrate W1 placed on the first slot S1 is properly seated. can The reader 660 may determine that the first substrate W1 is out of the original position of the first slot S1 on the side of the container F based on the determined actual distance data.

After the determination of the state of the first substrate W1 is completed, the driving unit 440 drives the hand 460 to move the auxiliary observation unit 60 mounted on the hand 460 to the position where the third substrate W3 is seated. Move to the position corresponding to the position. The laser emitter 620 irradiates the laser toward the third substrate W3, and the laser light receiver 640 receives the laser reflected from the third substrate W3. The reading unit 660 uses data on the laser light received from the laser light receiving unit 640 to determine the actual distance between the third substrate W3 where the laser is reflected and the determined third substrate W3 and the auxiliary observation unit 60. The state of the third substrate W3 may be determined using the distance data.

That is, it is determined whether or not the third substrate W3 is present on the third slot S3 and/or whether the third substrate W3 placed on the third slot S3 is properly seated. can The reader 660 may determine that the third substrate W3 is out of the original position of the third slot S3 on the side of the container F based on the determined actual distance data. The reading unit 660 secondarily observes the first and third substrates W1 and W3 determined to be in an abnormal state in the first observation step (S100) by the second observation step (S200), and obtains the result. When it is finally determined that both the first substrate W1 and the third substrate W3 are in an abnormal state, an interlock may be generated.

According to one embodiment of the present invention described above, it is possible to collectively observe the state of the substrates W accommodated in the container F using the observation unit 50 and determine whether or not there is an abnormality. Thus, the productivity of the substrate treatment process can be improved by quickly determining the state of the substrates W accommodated in the container F. In addition, using the observation unit 50, the presence or absence of substrates (W) accommodated inside the container (F) and whether or not damage to the substrates (W) is more detailed through the implemented image in addition to the distortion of the substrates (W) can be observed and judged.

In addition, according to one embodiment of the present invention described above, by using the observation unit 50, the state of the substrates (W) stored in the container (F) is primarily determined quickly, and the first observation step (S100) ), by performing secondary observation using the auxiliary observation unit 60 for each of the specific substrates W determined to be in an abnormal state, the state of the substrate W can be more accurately observed and determined.

In the above-described embodiment, it has been described that both the observation unit 50 and the auxiliary observation unit 60 are mounted on the transfer unit 40 as an example, but it is not limited thereto. For example, only one of the observation unit 50 and the auxiliary observation unit 60 may be mounted on the transfer unit 40 .

In addition, unlike the above-described example, the second observation step (S200) is not bound by the abnormal state determination in the first observation step (S100), seated in each slot (S) installed inside the container (F) The state of all of the substrates W can be observed and determined.

The above detailed description is illustrative of the present invention. In addition, the foregoing is intended to illustrate and describe preferred embodiments of the present invention, and the present invention can be used in various other combinations, modifications, and environments. That is, changes or modifications are possible within the scope of the concept of the invention disclosed in this specification, within the scope equivalent to the written disclosure and / or within the scope of skill or knowledge in the art. The written embodiment describes the best state for implementing the technical idea of the present invention, and various changes required in the specific application field and use of the present invention are also possible. Therefore, the above detailed description of the invention is not intended to limit the invention to the disclosed embodiments. Also, the appended claims should be construed to cover other embodiments as well.

1: substrate processing device
8 : controller
10: first module
20: load port
40: transfer unit
50: observation unit
60: auxiliary observation unit
70: second module
80: load lock chamber
90: processing module
520: investigation department
540: light receiving unit
560: data collection unit
570: judging unit
620: laser irradiation unit
540: laser light receiving unit
560: reading unit
F: container
S: slot
S100: 1st observation step
S200: Second observation step

Claims (20)

In the apparatus for processing the substrate,
first module; and
Including a processing module for processing the substrate,
The first module,
a load port in which a container containing a substrate is placed;
a transfer unit having a hand for transferring a substrate between the load port and the processing module; and
and an observation unit mounted on the transfer unit and observing a state of the substrate accommodated in the container. According to claim 1,
The observation unit,
A substrate processing apparatus provided to simultaneously observe the state of all substrates accommodated in the container at a preset reference position. According to claim 2,
The observation unit,
A substrate processing apparatus installed at an end of the hand and observing a state of a plurality of substrates accommodated in the container in a state in which the hand is fixed at the reference position. According to claim 3,
The observation unit,
a data collection unit that collects data of a time required from when light is irradiated toward the substrate stored in the container until the light is reflected and received from the substrate; and
and a determination unit for estimating a relative distance between the substrate stored in the container and the observation unit according to the time data, and determining a state of the substrate stored in the container by differently matching a specific color for each distance data. A substrate processing device that does. According to claim 4,
The first module,
Further comprising an auxiliary observation unit for selectively observing the state of the substrate by irradiating a laser individually toward each substrate stored in the container,
The auxiliary observation unit,
A substrate processing apparatus for observing a state of the substrate by measuring an actual distance between the substrate and the auxiliary observation unit from the laser irradiated to the substrate accommodated in the container. According to claim 5,
The auxiliary observation unit is installed at the end of the hand substrate processing apparatus. According to claim 6,
The conveying unit further includes a driving unit for driving the hand,
The auxiliary observation unit,
A substrate processing apparatus that irradiates the laser toward the substrate accommodated in the container while the hand is vertically moved by the driving unit. According to claim 7,
The device,
Further comprising a controller for controlling the transfer unit, the observation unit, and the auxiliary observation unit;
The controller,
The transfer unit, the observation unit, and the auxiliary observation unit are configured to firstly observe the state of the substrate stored in the container using the observation unit and secondarily observe the state of the substrate using the auxiliary observation unit. A substrate processing device to control. According to claim 8,
The controller,
The first observation is performed by moving the hand to the reference position, and when it is determined from the first observation that the substrate accommodated in the container is in an abnormal state, the hand is moved in an up and down direction to perform the first observation. A substrate processing apparatus for controlling the transfer unit, the observation unit, and the auxiliary observation unit to perform secondary observation on the substrate. A method for processing a substrate by determining the state of a substrate accommodated in a container placed on a load port, comprising:
A substrate processing method comprising opening a door of the container and determining a state of a substrate housed in the container in which the door is opened using an observation unit installed in a transfer unit that transports the substrate from the load port. According to claim 10,
The observation unit,
A substrate processing method provided to simultaneously observe the state of all substrates accommodated in the container in a state where the transfer unit is located at a predetermined reference position. According to claim 11,
The observation unit,
Time data from when the light is irradiated to the substrate stored in the container until the light is reflected and received from the substrate is collected, and the substrate stored in the container and the observation unit according to the collected time data are collected. A method of processing substrates that estimates the relative distance between them. According to claim 12,
The observation unit,
A substrate processing method of determining a state of a substrate accommodated in the container by differently matching a specific color for each of the relative distance data. According to claim 13,
The method,
Using an auxiliary observation unit installed in the transport unit, laser is individually irradiated toward each substrate stored in the container with the door open, and the actual distance between the substrate and the auxiliary observation unit is measured from the irradiated laser. A substrate processing method for selectively observing the state of the substrate by doing so. According to claim 14,
The auxiliary observation unit irradiates the laser beam toward each substrate accommodated in the container while the transfer unit moves in a vertical direction. According to claim 15,
The condition of the board is
The substrate processing method of performing primary observation using the observation unit and secondary observation using the auxiliary observation unit. According to claim 16,
The first observation is performed by moving the transfer unit to the reference position, and when it is determined from the first observation that the substrate accommodated in the container is in an abnormal state, the transfer unit is moved in a vertical direction to perform the abnormal state. Substrate processing method for performing a secondary observation on the substrate in the. According to any one of claims 10 to 17,
At least one of the distance between the transfer unit and the substrate stored in the container, the presence or absence of a substrate stored in the container, the distortion of the substrate stored in the container, and the damage of the substrate stored in the container A characterized substrate processing method. In the apparatus for processing the substrate,
first module; and
Including a processing module for processing the substrate,
The first module,
a load port in which a container containing a substrate is placed;
a transport frame disposed between the load port and the processing module and having a transport space for transporting substrates;
a transport unit disposed inside the transport frame and having a hand transporting a substrate between the load port and the processing module;
an observation unit installed in the hand and simultaneously observing states of all the substrates accommodated in the container while the hand is positioned at a predetermined reference position; and
An auxiliary observation unit installed in the hand at a position that does not overlap with the observation unit and selectively observing the state of the specific substrate by radiating a laser beam toward a specific substrate accommodated in the container while the hand moves vertically. A substrate processing apparatus comprising a. According to claim 19,
The observation unit,
After irradiation of light toward the substrate stored in the container, time data required until the light is reflected and received from the substrate is collected, and between the substrate stored in the container and the observation unit according to the collected time data Estimating the relative distance of and firstly determining the state of the substrate stored in the container by differently matching a specific color for each distance data,
The auxiliary observation unit,
Substrate processing for secondarily determining the state of the specific substrate accommodated in the container by irradiating a laser toward a specific substrate accommodated in the container and measuring an actual distance between the specific substrate and the auxiliary observation unit from the irradiated laser Device.

Images