KR20230059442A - Inductively coupled plasma processing apparatus - Google Patents

Abstract

The present invention relates to an inductively coupled plasma processing apparatus, which may greatly improve the uniformity of substrate processing. The inductively coupled plasma processing apparatus comprises: a chamber body (100) which has a rectangular flat surface and is formed with an opening on a upper side of the chamber body; a window assembly (200) which includes one or more windows (210) covering the opening to form a processing space (S) with the chamber body (100), and a support frame (220) supporting the windows (210); a substrate support unit (300) which is installed in the chamber body (100) to support a rectangular substrate (10); a gas injection unit which injects gas into the processing space (S); and an antenna unit (500) which is installed in a reference rectangular area corresponding to the rectangular shape of the substrate (10) at an upper part of the window assembly (200) to form an inductive electric field in the processing space (S). The antenna unit (500) comprises: four corner antenna groups (700) which are disposed adjacent to vertices of the reference rectangular area to control the plasma density of the corner portions; and a lateral antenna group (510) which is disposed to be spaced apart from the sides of the reference rectangular area and the four corner antenna groups (700).

Description

Inductively coupled plasma processing apparatus {Inductively coupled plasma processing apparatus}

The present invention relates to an inductively coupled plasma processing device.

The inductively coupled plasma processing device is a device that performs substrate processing such as deposition and etching processes. A window is installed on the ceiling of the chamber body and the chamber body forming an airtight processing space, and a radio frequency (RF) antenna is installed on the upper side of the window. Then, power is applied to the antenna to form an induction field in the processing space, and the processing gas is converted into plasma by the induction field to perform substrate processing.

Here, the target of the substrate treatment of the inductively coupled plasma processing apparatus can be any substrate as long as it is a target for substrate treatment such as deposition and etching, such as a substrate for an LCD panel and a wafer.

Meanwhile, in response to an increase in demand for large-sized substrates and an increase in production speed by processing a larger number of substrates, an inductively coupled plasma processing apparatus for processing substrates is also becoming larger.

Accordingly, as the size of the inductively coupled plasma processing apparatus also increases, the size of planar arrangement of members and antennas installed in the inductively coupled plasma processing apparatus also needs to be increased.

Specifically, patterns such as Patent Documents 1 and 2 have been proposed as antenna planar arrangement patterns of inductively coupled plasma processing apparatuses for processing large substrates.

However, it is important to form a uniform plasma in the processing space for good substrate processing. As substrates have recently increased in size, the uniformity of plasma formed in the processing space of the inductively coupled plasma processing apparatus deteriorates and it is difficult to control the plasma uniformity.

Specifically, in the case of the prior art such as Patent Documents 1 and 2, it is difficult to control the plasma near the vertex, and there is a problem in that there is a limitation in improving the uniformity of substrate processing.

In particular, referring to Patent Documents 1 and 2, there is a problem in that it is impossible to independently perform plasma control near the vertex of the rectangular shape as the antenna located near the edge of the substrate, that is, the outermost position is disposed along the edge of the substrate.

On the other hand, when a plurality of antennas are branched and installed to improve plasma uniformity, the inductance of each antenna is low, resulting in a decrease in plasma density, making it impossible to perform good substrate processing.

(Patent Document 1) KR10-2055371 B1

(Patent Document 2) KR10-2020622 B1

In order to solve the above problems, an object of the present invention is to provide an inductively coupled plasma processing apparatus capable of greatly improving the uniformity of substrate processing by controlling the plasma without reducing the density of the plasma at the corner portion.

The present invention has been created in order to achieve the object of the present invention as described above, the present invention, the chamber body 100 has a rectangular shape, the opening is formed on the upper side; A window assembly 200 including one or more windows 210 covering the opening to form a processing space S together with the chamber body 100, and a support frame 220 supporting the window 210 and; a substrate support 300 installed on the chamber body 100 to support the rectangular substrate 10; a gas injection unit for injecting gas into the processing space (S); An antenna unit 500 installed in a reference rectangular area corresponding to the rectangular shape of the substrate 10 on the upper side of the window assembly 200 to form an induced electric field in the processing space S, wherein the antenna unit 500 includes four corner antenna groups 700 disposed adjacent to vertices of the reference rectangular region to control the plasma density of the corner portion and having a spiral corner loop structure, each of the corner antennas The group 700 is installed to be spaced apart from the upper surface of the window 210 upward by a first height H1, and is disposed at intervals in the direction of the vertex from the center of the reference rectangular area and has the same current direction. one corner antenna member (711, 712, 713); It is installed spaced apart from the window 210 at a second height H2 different from the first height H1, and is disposed at a distance from the first corner antenna members 711, 712, and 713 in the direction of the vertex. and a plurality of second corner antenna members (731, 732) through which current flows in a direction opposite to the current direction of the first corner antenna members (711, 712, 713). do.

The corner antenna group 700 is a first connection antenna member connecting the other end of each of the first corner antenna members 711, 712, and 713 and one end of each of the second corner antenna members 731 and 732. (721, 723), the second connection antenna member (connecting the other end of each of the second corner antenna members (731, 732) and one end of each of the first corner antenna members (711, 712, 713) ( 722, 724) may be included.

The first connection antenna members 721 and 723 and the second connection antenna members 722 and 724 are coupled to the first corner antenna members 711, 712 and 713 and the second corner antenna member ( A plurality of coupling parts 791 may be formed at predetermined intervals so that a coupling height of 731 and 732 may be changed.

The first corner antenna members 711, 712, and 713 have a pair of first ends connected to the first connected antenna members 721 and 723 and the second connected antenna members 722 and 724, respectively. (712a, 713a, 711b, 712b, 713b), and the second connection antenna members 722 and 724 are the first connection antenna members 721 and 723 and the second connection antenna members 722 and 724 ) may have a pair of second ends 731a, 732a, 731b, and 732b connected to each of them.

The first connection antenna members 721 and 723 and the second connection antenna members 722 and 724 may vertically extend upward from the top surface of the window 210 .

The first connection antenna members 721 and 723 and the second connection antenna members 722 and 724 may be inclined upward from the top surface of the window 210 and extend upward.

In the corner antenna group 700, RF power is applied to one end of the first corner antenna member 711 positioned at the outermost part with respect to the center of the loop structure among the first corner antenna members 711, 712, and 713. The other end of the first corner antenna member 713 located at the innermost side may be directly or indirectly grounded.

A side antenna group 510 disposed at intervals from the sides of the reference rectangular area and the four corner antenna groups 700 may be included.

The corner antenna group 700 and the lateral antenna group 510 may have the same current direction at adjacent portions.

The corner antenna group 700 may be disposed at the same height from the upper surface of the window 210 as the lateral antenna group 510 at a portion adjacent to the lateral antenna group 510 .

The lateral antenna group 510 includes one or more lateral antenna members 511 that are spaced apart from sides of the reference rectangular area, one end 511a to which the RF power source 160 is connected and the other end 511b to be grounded. can include

The lateral antenna group 510 may have one or more straight line portions on a side of the rectangle of the substrate 10 excluding vertices and one or more lateral radiation portions on a portion opposite to the corner portion.

The lateral loop structure of the lateral antenna group 510 has a multi-loop structure, and the first distance D1 between adjacent linear portions of the lateral antenna group 510 is It may be set larger than the second interval D2 between the side radiation portion and the corner antenna group 700.

At least some of the first corner antenna members 711 , 712 , and 713 may be disposed parallel to the lateral radiation portion of the lateral antenna group 510 at a portion adjacent to the lateral antenna group 510 .

The corner antenna group 700 and the lateral antenna group 510 may have the same current direction at adjacent corner oblique portions.

The first corner antenna members 711 , 712 , and 713 may include a vertex of the substrate 10 or may be installed inside the vertex of the substrate 10 .

The support frame 220 is formed with a plurality of installation openings 221, and each of the plurality of installation openings 221 has a shape corresponding to the planar shape of the corresponding installation opening 221, the window 210 ) can be installed respectively.

The plurality of installation openings ( 211) can be formed.

The corner antenna group 700 may be installed to correspond to a vertex installation opening 211 positioned to correspond to a vertex of the reference rectangular region among the plurality of installation openings 211 .

A part of the lateral antenna group 510 may be installed to correspond to the apex installation opening 211 .

The antenna unit 500 further includes one or more inner antenna groups 530 and 540 disposed concentrically with the lateral antenna group 510 inside the lateral antenna group 510, wherein the inner antenna Some of the groups 530 and 540 may be installed to correspond to the apex installation opening 211 .

The antenna unit 500 may further include one or more inner antenna groups 530 and 540 arranged concentrically with the lateral antenna group 510 inside the lateral antenna group 510 .

The corner antenna group 700 and the side antenna group 510 may be grounded by being connected to a variable capacitor for adjusting the corresponding impedance.

In the inductively coupled plasma processing apparatus according to the present invention, a corner antenna group for controlling plasma density is installed corresponding to the vertex, that is, the corner, of a rectangular substrate, thereby enabling plasma control at the corner without reducing the plasma density. This has the advantage of greatly improving the uniformity of substrate processing.

In particular, in the inductively coupled plasma processing apparatus according to the present invention, a corner antenna group for independently controlling plasma density is installed corresponding to a corner portion separately from a lateral antenna group disposed along the side excluding the vertex of a rectangular substrate, It is possible to independently control the plasma density at the corner, which has the greatest influence on the uniformity of processing, and it is possible to control plasma by region, especially at the corner, without reducing the density of plasma under various process conditions, thereby improving the uniformity of substrate processing. has the advantage of greatly improving

In addition, the inductively coupled plasma processing apparatus according to the present invention configures the corner antenna group in a spiral structure, positions the part in the same current direction low and positions the part in the opposite direction relatively high relative to the direction of current flowing in the antenna member, thereby opposing the opposite direction. It is possible to minimize the reduction of the magnetic field (H Field) for the current flow in the direction, so the efficiency of substrate processing can be greatly improved.

Furthermore, in installing the corner antenna group, the strength of the magnetic field formed by the corner antenna group and the side antenna group can be increased by placing oblique lines parallel to each other at portions adjacent to the side antenna group.

In addition, in installing the corner antenna group, the side antenna group and the side adjacent to each other have diagonal portions parallel to each other, and the current direction in the diagonal portion is the same, so that the strength of the magnetic field formed by the corner antenna group and the side antenna group can be further increased.

Meanwhile, by configuring the lengths of the antenna members constituting the corner antenna group, the lateral antenna group, and further, the inner antenna group to have preset deviations, impedance control for each antenna member can be conveniently performed.

1 is a cross-sectional view showing an inductively coupled plasma processing apparatus according to the present invention.
FIG. 2 is a plan view showing a window assembly and an antenna unit in the inductively coupled plasma processing apparatus of FIG. 1 .
3A and 3B are conceptual diagrams showing application of RF power and grounding of the antenna unit of FIG. 2, respectively.
4 is a circuit diagram showing an equivalent circuit of the antenna unit of FIG. 2 .
5A and 5B are cross-sectional views in the direction V-V′ in FIG. 2, and FIG. 5A is a cross-sectional view showing a case where the first corner antenna member and the second corner antenna member are installed at the same height with respect to the window. 5b is a cross-sectional view showing a case where the first corner antenna member is installed at a relatively lower position than the second corner antenna member.
FIG. 6 is a table showing simulation of plasma density control by the inductively coupled plasma processing apparatus according to the present invention having the antenna unit shown in FIG. 2 .
FIG. 7 is a partial perspective view showing an example of a corner antenna group among the antenna units shown in FIG. 2 .
FIG. 8 is a side view showing a structure connecting a first corner antenna member and a second corner antenna member among the corner antenna groups shown in FIG. 7 .
Fig. 9 is a plan view of the corner antenna group shown in Fig. 7;
10A and 10B are graphs showing magnetic field improvement effects in the case of FIGS. 5A and 5B , respectively.

Hereinafter, an inductively coupled plasma processing apparatus according to the present invention will be described in detail with reference to the accompanying drawings.

As shown in FIGS. 1 and 2 , an inductively coupled plasma processing apparatus according to the present invention includes a chamber body 100 having a rectangular planar shape and having an opening formed thereon; A window assembly 200 including one or more windows 210 covering an opening to form a processing space S together with the chamber body 100 and a support frame 220 supporting the window 210; a substrate support 300 installed on the chamber body 100 to support the substrate 10; a gas injection unit (not shown) for injecting gas into the processing space (S); An antenna unit 500 installed in a reference rectangular area corresponding to the rectangular shape of the substrate 10 above the window assembly 200 to form an induced electric field in the processing space S is included.

The chamber body 100 has a rectangular shape in plan view, has an opening formed thereon, and is configured to form a processing space S together with a window assembly 200 to be described later, and has a predetermined progress necessary for performing the process. Any configuration is possible as long as it can withstand pneumatic pressure.

The chamber main body 100 preferably has a planar shape corresponding to the shape of the substrate 10 to be processed, for example, a rectangular shape, and one or more gates 111 for entering and exiting the substrate 10 are formed. An exhaust pipe 180 connected to a vacuum pump (not shown) may be connected in order to control the pressure in the processing space S and remove by-products.

In addition, the chamber main body 100 has a detachable upper lead 140 installed to cover the antenna unit 500 for support of the antenna unit 500 and shielding of the induced electric field formed in the antenna unit 500. can be conjoined.

The gas dispensing unit (not shown) is configured to inject gas into the processing space S, and may have various configurations depending on the gas dispensing structure, and may be installed in a support frame 220 to be described later.

Specifically, the gas injection unit (not shown) is configured to include one or more passages formed in the support frame 220 through which gas flows, and a plurality of injection holes connected to the passages and formed to the bottom surface of the support frame 220. It can be.

In addition, the gas injection unit (not shown) can be installed separately from the support frame 220 , formed on a window, or installed on a sidewall of the process chamber 100 .

The substrate support part 300 is a configuration on which the substrate 10 is seated, and can be of any configuration as long as it can support the substrate 10, and can be applied with RF power or grounded according to the process, and can be cooled or heated. A heat transfer member may be installed.

The window assembly 200 includes one or more windows 210 covering an opening to form a processing space S together with the chamber body 100, and a support frame 220 supporting the window 210. As a configuration, various configurations are possible according to the installation structure of the window 210 and the support frame 220 .

The window 210 is interposed between the processing space S and the antenna unit 500 so that an induced electric field can be formed in the processing space S by the antenna unit 500, and may have various structures. , quartz, ceramic, metal, etc. may be used as the material.

The window 210 may be composed of a plurality of windows 210 instead of a single window 210 for the processing of a large substrate.

Here, when a plurality of windows 210 are installed, they may have various shapes such as polygons such as triangles and squares, circles, and ellipses in consideration of formation of an induced electric field for substrate processing.

In addition, the plane shape of the window 210 may have a single shape such as a square or a combination of a plurality of plane shapes having different shapes and sizes.

The support frame 220 is a configuration that supports the window 210, and any configuration is possible as long as it can stably support the window 210.

For example, the support frame 220 preferably has a metal material so as to stably support the heavy window 210, but if it can provide sufficient rigidity, a combination of a metal material and a non-metal material, a non-metal material, etc. It can have a variety of materials.

On the other hand, when the window 210 is installed in plurality, the support frame 220 has a plurality of installation openings having a shape corresponding to the plane shape of the supporting window 210 so as to support each window 210 ( 221) can be formed.

That is, the support frame 220 has a plurality of installation openings 221 formed, and each of the plurality of installation openings 221 has a window 210 having a shape corresponding to the planar shape of the corresponding installation opening 221. ) can be installed respectively.

For example, the support frame 220 has a plurality of installations of a grid structure so that the plurality of windows 210 can be arranged in an array of m×n (m and n are natural numbers greater than or equal to 2) in the horizontal and vertical directions. Openings 211 may be formed.

To this end, the support frame 220 includes a rectangular outer frame 222 installed on top of the chamber body 100, and an inner portion forming installation openings 211 having a lattice structure inside the outer frame 222. Frame 223 may be included.

The outer frame 222 has a planar shape at the top of the chamber body 100, that is, a rectangular shape, and is installed at the top of the chamber body 100, and various configurations are possible.

Here, the outer frame 222 may be hermetically coupled to the chamber body 110 by interposing an O-ring (not shown) between the upper end of the chamber body 100 .

The inner frame 223 forms installation openings 211 disposed inside the outer frame 222 in a lattice structure, for example, m×n (m and n are natural numbers of 2 or more) in the horizontal and vertical directions. As a configuration, it may be composed of (m-1) horizontal frames and (n-1) vertical frames corresponding to the grid numbers.

The inner frame 223 and the outer frame 222 are preferably made of a material having high rigidity such as metal in consideration of the load of the window 210, but are not necessarily limited thereto.

In addition, the inner frame 223 and the outer frame 222 may be formed of a plurality of frame members, but it is preferable that they are formed integrally with a minimum number in consideration of rigidity.

Meanwhile, the installation opening 211 formed in the support frame 220 may have various structures depending on the support structure of the window 210 .

For example, as shown in FIG. 1 , the support frame 220 has a step on the inner circumferential surface of the installation opening 211 to support the window 210 corresponding to the step formed on the edge side of the window 210. can be formed.

The antenna unit 500 is installed in a reference rectangular area corresponding to the flat rectangular shape of the opening at the top of the window assembly 200 to form an induced electric field in the processing space S, and the substrate 10 as a processing target Various configurations are possible depending on the size of the substrate, substrate treatment process conditions, and the like.

Meanwhile, as the size of the substrate 10 to be processed increases and the size of the plane on which the antenna unit 500 is disposed also increases, it is difficult to process the substrate uniformly.

Accordingly, conventionally, as in Patent Documents 1 and 2, antenna members, which are conductors, are disposed in various patterns to solve this problem.

However, according to the prior art, when the plurality of antenna members are divided and arranged, there is a problem in that the plasma density is lowered because the impedance is lowered compared to the application of the same RF power.

Furthermore, although the impedance is controlled by dividing into a plurality of antenna members, there is a problem in that there is a limitation in obtaining uniformity of substrate processing because it is impossible to control the impedance at the vertex, that is, the corner, of the rectangular planar shape.

Accordingly, in the induction field plasma processing apparatus according to the present invention, as shown in FIGS. 2 to 5B, the antenna unit 500 is disposed adjacent to the vertex of the reference rectangular area to control the plasma density of the corner portion, and the vortex By including four corner antenna groups 700 having a shaped corner loop structure, it is possible to control the impedance at the corner, that is, to control the plasma density, while minimizing the decrease in magnetic field, thereby improving the uniformity of substrate processing. there is.

Here, the reference rectangular area is an area corresponding to the planar rectangular shape of the substrate 10, which is a substrate processing target, and is defined as an area set larger than the edge of the substrate 10.

For example, the reference rectangular area may be defined as a rectangular area having a size larger than the plane size of the substrate 10 and smaller than the opening formed by the outer frame 222 described above.

The four corner antenna groups 700 are disposed adjacent to the vertices of the reference rectangular area to control the plasma density at the corners, and have a spiral corner loop structure, depending on the installation length and installation angle. Various configurations are possible.

In particular, the corner antenna group 700 has a spiral shape, and may be formed in a corner loop structure such as a spiral shape in which the entire planar shape is a triangle or trapezoid.

The corner loop structure is preferably composed of a single loop structure, preferably a multi-loop structure.

At this time, in the corner antenna group 700, one end to which the power applying member 613 for applying RF power is connected is located at the outermost side, and the other end to which the grounding member 623 for grounding is connected is located at the innermost side. It can be configured so that

Considering that a relatively high voltage is applied to the portion to which the RF power is applied, by applying the RF power to the outermost side of the corner antenna group 700, a relatively strong magnetic field ( field) can be formed.

Also, the power applying member 613 and the grounding member 623 may be electrically connected to the antenna member of the corner antenna group 700 by various methods such as welding or bolting.

In particular, since some of the antenna members of the corner antenna group 700 can have a variable installation height from the upper surface of the window 210, the power supply member 613 and the ground member 623 are installed as antenna members. In order to adjust the height, it is preferable to be coupled with the antenna member by bolt coupling.

In consideration of the adjustment of the installation height of the antenna member, the power applying member 613 and the grounding member 623 are plate-shaped conductive members and have a plurality of bolt coupling holes (not shown) for bolt coupling at preset intervals. can be formed

Meanwhile, in forming the corner loop structure of the corner antenna group 700, as shown in FIGS. 2 to 3B, 7 and 9, the corner antenna group 700 is disposed at intervals in the direction of the vertex from the center of the reference rectangular region. a plurality of first corner antenna members 711, 712, and 713 having the same current direction; A plurality of first corner antenna members (711, 712, and 713) are spaced apart from each other in the direction of the vertex, and current flows in a direction opposite to that of the first corner antenna members (711, 712, and 713). Two corner antenna members 731 and 732 may be included.

The plurality of first corner antenna members 711, 712, and 713 are antenna members disposed at intervals from the center of the reference rectangular region in the direction of the vertex and having the same current flow, and are materials having high conductivity, such as copper and the like. It may be made of the same plate-shaped conductor.

The plurality of second corner antenna members 731 and 732 are disposed at intervals from the first corner antenna members 711, 712 and 713 in the direction of the vertex, and the first corner antenna members 711, 712, 713) as an antenna member through which current flows in a direction opposite to the current direction, and may be made of a plate-shaped conductor such as copper as a highly conductive material.

At this time, the plurality of first corner antenna members 711, 712, and 713 and the plurality of second corner antenna members 731 and 732 are arranged so that the thickness direction is horizontal to form a strong magnetic field in the window 210. preferably installed.

Meanwhile, when the corner antenna group 700 has a corner loop structure, as shown in FIG. 5A, the second corner antenna members 731 and 732 through which current flows in opposite directions, the first corner antenna member 711 , 712, 713), there is a problem in that the magnetic field around the corner is reduced by weakening the magnetic field formed by the.

Accordingly, the second height H2 of the plurality of second corner antenna members 731 and 732 with respect to the window 210 is equal to the plurality of first corner antenna members 711 and 712 with respect to the window 210. , 713), it is preferable to have a height difference (D) different from the first height (H1).

Here, the first height H1 and the second height H2 are defined as distances from the upper surface of the window 210 to the lower surface of the antenna member spaced upward.

And, as shown in FIG. 5B, the first height H1 is preferably smaller than the second height H2.

On the other hand, the relative height difference between the first corner antenna members 711, 712, and 713 and the second corner antenna members 731 and 732 is determined by adjusting the installation height of each antenna member according to the required process conditions. possible.

As shown in FIG. 5B, when the plurality of second corner antenna members 731 and 732 are installed higher than the plurality of first corner antenna members 711, 712 and 713, the plurality of second corner antenna members Since the influence of the magnetic field by the members 731 and 732 is reduced, the reduction of the magnetic field can be minimized.

Meanwhile, in the corner antenna group 700, as shown in FIG. 7 for the above configuration, the other end of each of the first corner antenna members 711, 712, and 713 and the second corner antenna member The first connection antenna members 721 and 723 connecting one end of each of the 731 and 732, the other end of each of the second corner antenna members 731 and 732 and the first corner antenna member 711, Second connection antenna members 722 and 724 connecting one end of each of the 712 and 713 may be included.

The first connection antenna members 721 and 723 are antennas connecting the other end of each of the first corner antenna members 711, 712 and 713 and one end of each of the second corner antenna members 731 and 732. As a member, it may be made of a plate-shaped conductor such as copper as a material having high conductivity.

The second connection antenna members 722 and 724 are antennas connecting the other end of each of the second corner antenna members 731 and 732 and one end of each of the first corner antenna members 711, 712 and 713. As a member, it may be made of a plate-shaped conductor such as copper as a material having high conductivity.

The first connection antenna members 721 and 723 and the second connection antenna members 722 and 724 are connected to the first corner antenna members 711, 712 and 713 and the second corner antenna members 731 and 732, respectively. ), any structure may be used as long as it is a structure for connecting the first corner antenna members 711, 712, and 713 and the second corner antenna members 731 and 732.

For example, the first connection antenna members 721 and 723 and the second connection antenna members 722 and 724 may be installed vertically and/or inclined upward from the upper surface of the window 210. there is.

Here, when the first connection antenna members 721 and 723 and the second connection antenna members 722 and 724 are installed to be inclined upward from the upper surface of the window 210, they are vertically extended and installed. A distance between the first corner antenna members 711, 712, and 713 and the second corner antenna members 731 and 732 may be increased in the horizontal direction. Through this, the influence of the magnetic field by the plurality of second corner antenna members 731 and 732 is reduced, so that the magnetic field reduction can be minimized more effectively.

In addition, the first connection antenna members 721 and 723 and the second connection antenna members 722 and 724 are connected to the first corner antenna members 711, 712 and 713 and the second corner antenna members 722 and 724, respectively. Depending on the position of the ends of (731, 732), it can have various shapes and structures such as straight, curved, zigzag, etc.

Meanwhile, the first connection antenna members 721 and 723 and the second connection antenna members 722 and 724 are connected to the first corner antenna members 711, 712 and 713 and the second corner antenna. A plurality of coupling parts 791 formed at preset intervals may be formed so that the coupling height of the members 731 and 732 can be changed.

As shown in FIG. 8 , the plurality of coupling parts 791 have a coupling height of the first corner antenna members 711, 712, and 713 and the second corner antenna members 731 and 732 to be coupled. It is a structure formed at preset intervals on the first connected antenna members 721 and 723 and the second connected antenna members 722 and 724 so as to be changeable, and various structures are possible depending on the coupling structure between the members. do.

For example, the plurality of coupling parts 791 may be configured as bolt insertion holes for inserting bolts when members are coupled to bolts.

On the other hand, when the corner antenna group 700 forms a triangle or trapezoid, the first corner antenna members 711, 712, and 713 and the second corner antenna members 731 and 732 are inclined to the side of the reference rectangle, That is, it may be installed in an oblique line.

In particular, the first corner antenna members 711, 712, and 713 may be disposed in parallel with a first oblique portion 511d of a lateral antenna group 510 to be described later.

At this time, the second corner antenna members 731 and 732 may also be disposed in parallel with the first oblique portion 511d of the lateral antenna group 510 to be described later.

When the first corner antenna members 711, 712, and 713 are arranged in parallel with the first oblique portion 511d of the side antenna group 510 to be described later, as shown in FIGS. 2 and 5B, the side antennas As a portion adjacent to the unit 510, power is applied so that current flows in the same direction as the first oblique portion 511d of the lateral antenna group 510, so that a partially enhanced induced electric field can be formed.

The first corner antenna members 711, 712, and 713 have a pair of first ends connected to the first connected antenna members 721 and 723 and the second connected antenna members 722 and 724, respectively. (712a, 713a, 711b, 712b, 713b), and the second connection antenna members 722 and 724 are the first connection antenna members 721 and 723 and the second connection antenna members 722 and 724 ) may have a pair of second ends 731a, 732a, 731b, and 732b connected to each of them.

The first ends 712a, 713a, 711b, 712b, and 713b are members connecting the first connection antenna members 721 and 723 and the second connection antenna members 722 and 724, respectively. It may be integrally formed with the corner antenna members 711, 712, and 713.

The second ends 731a, 732a, 731b, and 732b are members connecting the first connection antenna members 721 and 723 and the second connection antenna members 722 and 724, respectively, and are connected to the second connection antenna members 721 and 723. It may be integrally formed with the antenna members 722 and 724.

At this time, when the corner antenna group 700 forms a triangle or trapezoid, for smooth connection with the first connection antenna members 721 and 723 and the second connection antenna members 722 and 724, the first connection antenna group 700 The ends 712a, 713a, 711b, 712b, and 713b are preferably parallel to the sides of the reference rectangle.

The first end portions 712a, 713a, 711b, 712b, and 713b extend from at least one end of both ends of the first corner antenna member 711, 712, and 713 to form the first connection antenna member 721, 723, and As a part connected to the second connection antenna members 722 and 724, it may extend from each side based on the vertex of the reference rectangle.

The first corner antenna members 711, 712, and 713 may be connected to the first ends 712a, 713a, 711b, 712b, and 713b by an additionally provided first vertical portion 711c.

Meanwhile, the second end portions 731a, 732a, 731b, and 732b extend from at least one end of both ends of the second corner antenna member 731 and 732 to form the first connection antenna member 721 and 723 and the second corner antenna member 731 and 732. As a part connected to the two connecting antenna members 722 and 724, it may extend from each side based on the vertex of the reference rectangle.

Further, the second corner antenna members 731 and 732 may be connected to the second ends 731a, 732a, 731b and 732b by a second vertical portion 731c.

Meanwhile, the first end portions 712a, 713a, 711b, 712b, and 713b and the first vertical portion 711c may be integrally formed from the first corner antenna members 711, 712, and 713 or may be connected as separate members. can

In addition, the second end portions 731a, 732a, 731b, and 732b and the second vertical portion 731c may be integrally formed from the second corner antenna members 731 and 732 or may be connected as separate members.

10A and 10B are graphs showing magnetic fields formed when the height of the window 210 is constant as shown in FIG. 5A and in the case of the antenna structure shown in FIGS. 5B and 7 to 9, respectively.

As shown in FIGS. 10A and 10B, in the case of the antenna structure shown in FIGS. 5B and 7 to 9, which are the structures of the present invention, it can be confirmed that the magnetic field at the corner portion of the substrate is relatively strengthened, that is, the magnetic field reduction is minimized. can

Meanwhile, the corner antenna group 700 having the above configuration can be used in combination with antenna structures of various patterns and structures in the remaining parts except for the corner part.

In particular, the antenna unit 500 including the corner antenna group 700 may include a side antenna group 510 disposed at intervals from the side of the quasi-rectangular area and the four corner antenna groups 700.

The side antenna group 510 is an antenna group disposed at intervals from the sides of the reference rectangular area and the four corner antenna groups 700, and may include a plurality of side antenna members 511.

In addition, one or more side antenna members 511 are installed and are disposed at intervals from the sides of the reference rectangular area and the four corner antenna groups 700 to form the side antenna groups 510, and include copper and It can be installed in a preset pattern by the same plate-shaped conductor.

In particular, the side antenna group 510 may have a side loop structure of one or more loops, preferably a multi-loop, by means of the side antenna member 511 .

In addition, the corner antenna group 700 and the side antenna group 510 preferably have the same current direction at adjacent portions.

As described above, when the direction of current flowing through the first corner antenna members 711, 712, and 713 of the corner antenna group 700 is the same, a stronger induced electric field can be formed.

In addition, the corner antenna group 700 may be disposed at the same height from the upper surface of the window 210 as the lateral antenna group 510 at a portion adjacent to the lateral antenna group 510 .

As described above, when the corner antenna group 700 is disposed at the same height from the upper surface of the window 210 as the lateral antenna group 510 at a portion adjacent to the lateral antenna group 510, the corner antenna group ( 700) and the lateral antenna group 510 can maximize the strengthening effect of the induced electric field.

Meanwhile, the installation number and length of the side antenna members 511 may be determined according to the length and number of other antenna members constituting the antenna unit, such as the antenna member of the corner antenna group 700.

Here, the lengths of the side antenna members 511 are preferably equal to the lengths of other antenna members or have lengths with preset allowable deviations for the convenience of impedance control of the entire antenna unit 500.

Further, each loop angle of the side antenna member 511 may have a loop angle of 90°×k (where k is a natural number equal to or greater than 1) such as 90°, 180°, 270°, and 360° from the center of the reference rectangular area. there is.

Here, the loop angle is defined as a rotation angle extending from one end to the other end with respect to the center of the reference rectangular region.

On the other hand, the side antenna members 511 of the side antenna group 510 are, for example, as shown in FIGS. 2 to 3B, arranged at intervals from the sides of the reference rectangular area, and one end 511a is RF. The power source 160 may be connected and the other end 511b may be grounded.

In addition, the lateral antenna group 510, particularly the lateral antenna member 511, has one or more straight lines on the sides of the rectangle of the board 10 excluding the vertices and one or more straight parts on the opposite corners of the rectangle of the board 10 to form a loop structure. It may have side radiation portions 511d and 511g.

Here, when the lateral loop structure of the lateral antenna group 510 has a multi-loop structure, the first interval D1 between adjacent straight portions is the lateral antenna group 510 to enhance the induced electric field at the corner portion. It is preferable that the second distance D2 between the side radiation part 511d located at the outermost side of the side radiation parts of , and the corner antenna group 700 is greater.

More specifically, the second interval D2 is applied to the outermost side radiation portion 511d and the outermost side radiation portion 511d among the side radiation portions of the side antenna group 510. It may be defined as the interval between the first corner antenna members 711, 712, and 713 of the most adjacent corner antenna group 700.

In addition, when the lateral antenna group 510 has one or more side radiation parts 511d and 511g, the corner antenna group 700, together with the side radiation parts 511d and 511g, forms an enhanced induced electric field. In the portion adjacent to the side radiation portion 511d of the antenna group 510, the first corner antenna members 711, 712, and 713 are It is desirable to achieve parallelism.

Furthermore, the lateral antenna group 510 and the corner antenna group 700 may form an enhanced induced electric field by making current directions the same at adjacent portions.

Specifically, as shown in FIGS. 5A and 5B, the side radiation portions 511d and 511g of the side antenna group 510 and the first corner antenna member 711 of the corner antenna group 700 parallel thereto, 712 and 713), an enhanced induced electric field can be formed by making the current flowing in the same direction.

On the other hand, the first corner antenna members 711, 712, and 713 of the corner antenna group 700, in particular, the diagonal portions having the same current direction as the side radiation portions 511d and 511g of the side antenna group 510, the substrate ( 10), it is preferable to include the apex of the substrate 10 or be installed inside the apex of the substrate 10 when viewed from the top in order to control the plasma density in the vicinity of the apex of the substrate 10.

Meanwhile, in order to form a loop structure, the side antenna group 510 may include four side antenna members 511 such that one end 511a is located at the center of each side among the four sides of the reference rectangular area.

And, as shown in FIGS. 2 to 3B, each side antenna member 511 is disposed in a clockwise or counterclockwise direction on each side, and includes a first straight portion 511c having one end 511a, an extended straight line It may include a second straight portion 511h having a portion 511e and the other end 511b.

The first straight portion 511c is a portion where the RF power source is parallel to the edge of the first side from the first side to the vicinity of the corner antenna group 700 located at the first vertex.

Here, one or more parallel portions may be formed in the first straight portion 511c.

In addition, the parallel part is defined as a part that is branched from one conducting wire into two or more wires and then combined into one conducting wire in order to partially widen the induced electric field formation range.

The extended straight portion 511e is a portion extending from the first straight portion 511c and parallel to the edge of the second side perpendicular to the first side.

Here, one or more parallel portions may be formed in the extended straight line portion 511e to partially widen the induced electric field formation range.

Meanwhile, between the first straight portion 511c and the extended straight portion 511e, a first oblique portion 511d extending from the first straight portion 511c and extending in parallel with the corner antenna group 700- It is preferable that a side radiation portion is provided.

The first oblique portion 511d, as a side-radiation portion, extends from the first straight portion 511c and extends in parallel with the corner antenna group 700, and is a corner portion together with the corner antenna group 700. It is used to efficiently control the plasma density in

Here, the extended straight portion 511e extends from the first oblique portion 511d.

The second straight portion 511h extends from the extended straight portion 511e so that the other end 511b is located on the third side perpendicular to the second side, and is parallel to the edge of the third side.

In the second straight line portion 511h, one or more parallel portions may be formed in order to partially widen the induced electric field formation range.

On the other hand, between the extended straight portion 511e and the second straight portion 511h, a corner antenna group 700 located at the second vertex inside the first oblique portion 511d of the other side antenna member 511 It is preferable that a second oblique portion 511g-a side radiation portion-which is parallel to .

The second oblique portion 511g, as a side oblique portion, extends from the extended straight portion 511e and is located at the second vertex inside the first oblique portion 511d of the other side antenna member 511. As a portion parallel to the antenna group 700, it is used to efficiently control the plasma density at the corner portion together with the first oblique portion 511d and the corner antenna group 700.

Here, the second straight portion 511h extends from the first oblique portion 511d.

On the other hand, as described above, the first oblique portion 511d and the second oblique portion 511g are used together with the corner antenna group 700 to efficiently control the plasma density in the corner portion, the corner It is preferable that the direction of current flow in the portion adjacent to the first oblique portion 511d and the second oblique portion 511g of the antenna group 700 is the same.

And, together with the corner antenna group 700, the extended straight portion 511e of the side antenna member 511 and the extended straight portion of the other side antenna member 511 can efficiently control the plasma density at the corner portion. The first interval (D1) between (511e) is the second interval (D2) between the first oblique portion (511c) of the side antenna member (511) and the corner oblique portion (521c) of the corner antenna unit (520) adjacent thereto. ) is preferably greater than

Since the second distance D2 is formed smaller than the first distance D1, that is, the distance in the straight portion of the side antenna member 511, a magnetic field stronger than that in other parts is formed, thereby generating local plasma density. can increase

On the other hand, the lateral antenna group 510 has been described with reference to an embodiment consisting of four, but various combinations such as consisting of two or more are possible depending on the length of the antenna member.

However, the lateral antenna group 510 preferably has an oblique portion opposite to the corner antenna group 700 in order to form a relatively concentrated magnetic field together with the corner antenna group 700 described later.

The oblique portion is installed adjacent to the corner antenna group 700 to be described later and is a portion for forming a relatively concentrated magnetic field, and power is applied so that the current flows in the same direction as the current flowing in the corner antenna group 700 This is preferable, and may be formed in various patterns to face the corner antenna group 700 such as a straight line or a curved line.

On the other hand, when the size of the substrate 10 to be processed is large, in order to form an induction electric field suitable for processing a large substrate, the antenna unit 500 has various patterns of inner antenna groups 530 inside the side antenna groups 510, 540) may be installed with or without the lateral antenna group 510.

The inner antenna group 530, 540 is an antenna group installed inside the side antenna group 510, and the antenna unit 500 is installed inside the side antenna group 510 to form an induced electric field suitable for processing a large substrate. ), or may be arranged in various patterns, such as one or more antenna groups having a small loop structure.

For example, the antenna unit 500 may further include one or more inner antenna groups 530 and 540 disposed concentrically with the lateral antenna group 510 .

In particular, the inner antenna group 530 is disposed between the first inner antenna group 530 located at the center of the reference rectangular area and between the first inner antenna group 530 and the lateral antenna group 510, One or more second inner antenna groups 540 disposed concentrically with the antenna group 530 may be included.

The first inner antenna group 530 is an antenna group arranged in a circular, polygonal, or preferably rectangular pattern at the center of a reference rectangular area by one or more antenna members, depending on the number of antenna members, loop angle, and pattern. Various configurations are possible.

For example, the first inner antenna group 530 may have a rectangular pattern in plane shape, may be composed of two antenna members, and may be disposed at a loop angle of about 810 degrees.

The first inner antenna group 530 may have a triple loop structure according to the loop angle and installation number as described above.

Meanwhile, one end of each of the antenna members may be disposed on opposite sides of each other.

Also, the first inner antenna group 530 may be located within the central installation opening 221 located at the center among the plurality of installation openings 221 described above.

On the other hand, the first inner antenna group 530 is installed relatively inner than the second inner antenna group 540 and the lateral antenna group 510, and when antenna members having substantially the same length are installed, the relatively highest. It is desirable to have a large loop angle.

One or more second inner antenna groups 540 are disposed between the first inner antenna group 530 and the lateral antenna group 510 and may be disposed concentrically with the first inner antenna group 530 .

Also, the second inner antenna group 540 may have the same or similar pattern as the lateral antenna group 510 described above.

For example, as shown in FIGS. 2 to 3B, the second inner antenna group 540 has a rectangular pattern in plane shape, may be composed of four antenna members, and has a loop angle of about 270 degrees. can be placed as

The second inner antenna group 540 may have a triple loop structure according to the loop angle and number of installations as described above.

Meanwhile, one end of each antenna member may be disposed on each of the four sides.

Also, the second inner antenna group 540 may be installed to surround the central installation opening 221 located in the center among the plurality of installation openings 221 described above.

On the other hand, the second inner antenna group 540 is installed relatively inside than the side antenna group 510 and has a smaller loop angle than the side antenna group 510 when an antenna member having substantially the same length is installed this is preferable

Similar to the lateral antenna group 510 described above, the second inner antenna group 540 preferably has an oblique portion opposite to the corner antenna group 700 in order to form a partially enhanced induced electric field. .

The oblique portion is a portion for forming a partially enhanced magnetic field in the vicinity of the corner antenna group 700 to be described later, and it is preferable that power is applied so that the current flows in the same direction as the current flowing in the corner antenna group 700. And, it can be formed in various patterns by being opposed to the corner antenna group 700, such as a straight line or a curve.

The inner antenna groups 530 and 540 may have an inner loop structure of one or more loops, preferably a multi-loop, by the inner antenna members 531 and 541.

On the other hand, in relation to the installation of the corner antenna group 700 described above, the corner antenna group 700 is a vertex installation opening 211 positioned corresponding to a vertex of a reference rectangular area among a plurality of installation openings 211. ) can be installed in correspondence with

As described above, when the corner antenna group 700 is installed corresponding to one vertex installation opening 211, distortion by the support frame 220 can be prevented when a relatively strong induced electric field is formed.

In addition, a part of the lateral antenna group 510 may be positioned at the vertex installation opening 211 to prevent distortion by the support frame 220 when a relatively strong induced electric field is formed.

Furthermore, some of the inner antenna groups 530 and 540 may be installed corresponding to the vertex installation opening 211 to prevent distortion by the support frame 220 when a relatively strong induced electric field is formed.

Meanwhile, at the other end of at least some of the antenna members 511, 521, 531, and 541 constituting the antenna unit 500, as shown in FIG. 4, a variable capacitor (VVC; Voltage- Variable Capacitor; V30, V41~V44, V21~V24, V11~V14) and can be grounded.

In addition, one end of the antenna members 511, 521, 531, and 541 constituting the antenna unit 500 is connected to an RF power source 150 having a preset frequency through a matching network.

The RF power source 150 is a power source for forming an induced electric field around the window 210 by applying RF power to the antenna unit 500, and RF power source having a frequency suitable for performing a required process may be used.

The variable capacitors V30, V41 to V44, V21 to V24, and V11 to V14 are connected to ground terminals of at least some of the antenna members 511, 521, 531, and 541 constituting the antenna unit 500 to ground. And, as a configuration for adjusting the impedance for controlling the plasma density, various configurations are possible.

For example, in the first inner antenna group 530, two antenna members 531 connected in parallel and one variable capacitor V30 may be connected to control the plasma density in the central portion.

In the second inner antenna group 540, variable capacitors V41 to 44 may be connected to each of the four antenna members 531 connected in parallel to control the plasma density of the middle portion surrounding the central portion.

In the lateral antenna group 510, variable capacitors V11 to 14 may be connected to each of the four antenna members 511 connected in parallel to control the plasma density of the edge portion surrounding the middle portion.

In addition, variable capacitors V21 to 24 may be connected to each of the four corner antenna groups 700 to control the plasma density of the rectangular corner portion formed by the edge portion.

Meanwhile, in the embodiment of the present invention, an example in which all of the variable capacitors V21 to 24 are connected has been described, but only some of the variable capacitors V21 to 24 may be installed, or a fixed capacitor having a constant capacitance may be installed in whole or in part. Of course there is.

As described above, the antenna unit 500 including the side antenna group 510 and the corner antenna group 700 enables independent control of plasma density in the central portion and the corner portion, resulting in more uniform substrate processing, for example, Etching process can be performed.

Furthermore, the antenna unit 500 is provided with a first inner antenna group 530 and a second inner antenna group 540 located inside, in addition to the side antenna group 510 and the corner antenna group 700. , As shown in FIG. 6, independent at the center portion corresponding to the center of the reference rectangular area, the middle portion surrounding the center portion, the edge portion surrounding the middle portion, and the corner portion corresponding to the four vertices of the reference rectangular area. Since plasma density can be controlled, a more uniform substrate treatment, for example, an etching process, can be performed.

For reference, FIG. 6 is a table showing a plasma measurement map based on values measured using a plasma measurement device in which probes for plasma measurement are installed at lattice points in a virtual rectangle in consideration of the size of a substrate.

Here, the antenna unit 500 has the structure shown in FIGS. 2 to 4, and by individually controlling the number of turns of each variable capacitor (VVC), plasma in the center, middle, edge, and corner portions. It was configured to control the intensity.

In addition, a vacuum pressure of 10 mTorr and Ar of 2000 sccm were used as process conditions for plasma measurement.

Meanwhile, in relation to FIG. 6, as described above, the central portion is an area corresponding to the center of the reference rectangular area, and is located inside the edge portion where the later-described lateral antenna group 510 is installed, for example, the first It is defined as an area where the inner antenna group 530 is installed.

As shown in FIG. 6, the VVC value of the first inner antenna group 530 is lowered and the VVC values of the remaining second inner antenna group 540, side antenna group 510, and corner antenna group 700 are relatively increased. As a result, it can be confirmed that the plasma density in the central portion is formed high.

And the edge portion is an area where the lateral antenna group 510 installed to include the edge of the substrate 10 is installed, and as shown in FIGS. 2, 3A and 3B, including the edge of the substrate 10 area can be defined.

For this purpose, the lateral antenna member 511 located at the outermost side of the lateral antenna group 510 is preferably disposed along the edge of the substrate 10 except for the corner portion.

As can be seen in FIG. 6, in contrast to the first example, the VVC value of the first inner antenna group 530 and the VVC value of the second inner antenna group 540 are the same, and the VVC value of the corner antenna group 700 It can be confirmed that the plasma density is formed high at the edge portion by making VVC slightly smaller than the VVC value of the second inner antenna group 540 and making the VVC value of the side antenna group 510 relatively smaller.

The corner portion is a portion located outside the lateral antenna group 510 near the vertex of the reference rectangular area, and is defined as an area where the corner antenna group 700 is installed. Here, the vicinity of the vertex, that is, the corner portion, is preferably formed in a triangle.

And, in relation to the position of the edge of the substrate 10, as shown in FIGS. 2, 3A and 3B, the first oblique portion 511d of the lateral antenna unit 511 in the corner antenna group 700 and It is preferable that the corner oblique portion 521c, where the current flows in the same direction, includes the vertex of the substrate 10 or is located inside the vertex of the substrate 10.

In the corner antenna group 700, the portion where the current flows in the same direction as the first oblique portion 511d of the side antenna unit 511 also includes the vertex of the substrate 10 or is located inside the vertex of the substrate 10. Positioned is preferred.

Meanwhile, as shown in FIG. 6 , compared to the first example, the VVC value of the first inner antenna group 530 is relatively increased, and the VVC values of the second inner antenna group 540 and the side antenna group 510 are increased. By making the VVC value of the first inner antenna group 530 higher than that of the corner antenna group 700 and the VVC value of the corner antenna group 700 being relatively the smallest or very small, it can be confirmed that the plasma density at the corner portion is formed high.

In the control of the VVC value of the corner antenna group 700, all or part of the VVC value of the corner antenna group 700 may be set differently in consideration of the location of the gate 111 and sensitivity to surrounding conditions.

Finally, the middle part is a region located between the center part where the first inner antenna group 530 described above is installed and the edge part where the side antenna group 510 is installed, and has a square ring shape surrounding the center part, For example, it may be defined as an area in which the second inner antenna group 540 is installed.

As can be seen in FIG. 6 , compared to the first example, the VVC value of the first inner antenna group 530 is relatively increased, and the VVC value of the second inner antenna group 540 is changed to that of the first inner antenna group 530. It can be confirmed that the plasma density is formed high in the middle part by making the same as the VVC value, making the VVC value of the side antenna group 510 the largest, and making the VVC value of the corner antenna group 700 relatively small. .

On the other hand, according to an embodiment of the present invention, the best result was about 10% of etching uniformity (SiON etching) in the prior art (structure without corner antenna group), but the antenna unit having the configuration shown in FIGS. 2 to 3B As a result of the experiment by the configuration of (500), it was confirmed that the substrate processing uniformity was greatly improved with a uniformity of about 7.8%.

Meanwhile, the entire antenna unit 500 has a rectangular arrangement, and the side antenna group 510 and the four corner antenna groups 700 disposed corresponding to the four vertices are combined to form an edge portion and a corner portion. Its key feature is that it can control the plasma density independently for each part.

Accordingly, the antenna unit 500, other than the embodiment shown in FIGS. 2 to 3B, has a rectangular arrangement, and the lateral antenna group 510 and the four corner antenna groups disposed corresponding to the four vertices. Any configuration can be applied as long as it is a configuration including 700 .

Meanwhile, FIG. 4 shows an equivalent circuit diagram of the antenna unit shown in FIGS. 2 to 3B.

That is, the antenna unit 500 includes a first inner antenna group 530 in which two antenna members 531 are arranged in parallel and a first inner antenna group in which four antenna members 541 are arranged in parallel ( 530), a side antenna group 510 in which four antenna members 511 are arranged in parallel, and four corner antenna groups 530 composed of one antenna member 521 and arranged in parallel. can

In the antenna unit 500, when combining each antenna group, the number of parallel connections may vary according to the plasma density control requirements for each region.

In addition, the antenna unit 500 preferably has the same length or has a predetermined allowable deviation from the average length for efficiency of power distribution in configuring the antenna members constituting each antenna group.

That is, the length of the antenna members 511, 521, 531, and 541 constituting the corner antenna group 700, the side antenna group 510, and one or more inner antenna groups 530 and 540 is It is desirable to have an allowable deviation of 10% or less of the average length of the .

In particular, the allowable deviation is preferably within 5 to 10% of the average length of all antenna members.

In addition, since all of the antenna members have substantially the same length or have a small allowable deviation, the loop angles of the lateral antenna group 510 and one or more inner antenna groups 530 and 540 are in inverse proportion to the distance from the center of the reference rectangle. it is desirable to be

That is, it is preferable that the loop angle of the antenna members constituting the antenna group is in the order of the first inner antenna group 530, the second inner antenna group 540, and the side antenna group 510.

Here, the length of the antenna member may be defined as the length of a portion disposed on the window 210 .

That is, as shown in FIG. 3A, the length of the antenna member is grounded at one end coupled to the power supply busbars 611, 612, and 613 for applying RF power, as shown in FIG. 3B. It may be defined as the length to the other end connected to the bus bars 621, 622, and 623.

On the other hand, in the antenna unit 500, the antenna members constituting each antenna group are plate-shaped plate members, and as shown in FIGS. 5A and 5B, the strength of the induced electric field is minimized by minimizing the distance to the adjacent antenna member. In order to increase the width, it is preferable that the small part is arranged vertically.

That is, the antenna members constituting each antenna group are formed integrally or by welding a plurality of plate members having a rectangular shape in vertical section, and as shown in FIGS. 5A and 5B, a portion having a small width is formed by welding. It is preferable to make a vertical arrangement.

On the other hand, in the configuration of the corner antenna group described with reference to FIGS. 5B and 7 to 9, in an inductively coupled plasma processing apparatus, plasma control is possible without reducing the density of plasma at the corner portion, thereby greatly improving the uniformity of substrate processing. Of course, if it can be improved, it can be applied regardless of the rest of the configuration.

Since the above has only been described with respect to some of the preferred embodiments that can be implemented by the present invention, as noted, the scope of the present invention should not be construed as being limited to the above embodiments, and the scope of the present invention described above It will be said that the technical idea and the technical idea together with the root are all included in the scope of the present invention.

100: chamber body 200: window assembly
300: substrate support part 500: antenna part

Claims (23)

a chamber body 100 having a rectangular planar shape and having an opening formed thereon;
A window assembly 200 including one or more windows 210 covering the opening to form a processing space S together with the chamber body 100, and a support frame 220 supporting the window 210 and;
a substrate support 300 installed on the chamber body 100 to support the rectangular substrate 10;
a gas injection unit for injecting gas into the processing space (S);
An antenna unit 500 installed in a reference rectangular area corresponding to the rectangular shape of the substrate 10 on the top of the window assembly 200 to form an induced electric field in the processing space S,
The antenna unit 500,
It is disposed adjacent to the vertex of the reference rectangular region to control the plasma density of the corner portion, and includes four corner antenna groups 700 having a spiral corner loop structure,
Each of the corner antenna groups 700,
A plurality of first corner antenna members 711 spaced apart from the upper surface of the window 210 upward by a first height H1, disposed at intervals in the direction from the center of the reference rectangular area to the vertex, and having the same current direction. , 712, 713) and;
It is installed spaced apart from the window 210 at a second height H2 different from the first height H1, and is disposed at a distance from the first corner antenna members 711, 712, and 713 in the direction of the vertex. and a plurality of second corner antenna members (731, 732) through which current flows in a direction opposite to the current direction of the first corner antenna members (711, 712, 713). The method of claim 1,
The corner antenna group 700,
first connection antenna members 721 and 723 connecting the other end of each of the first corner antenna members 711, 712 and 713 and one end of each of the second corner antenna members 731 and 732;
including second connection antenna members 722 and 724 connecting the other end of each of the second corner antenna members 731 and 732 and one end of each of the first corner antenna members 711, 712 and 713 Characterized by an induction electric field plasma processing device. The method of claim 2,
The first connection antenna members 721 and 723 and the second connection antenna members 722 and 724 are coupled to the first corner antenna members 711, 712 and 713 and the second corner antenna member ( An inductive electric field plasma processing apparatus characterized in that a plurality of coupling parts 791 are formed at predetermined intervals so that the coupling height of 731 and 732 can be changed. The method of claim 2,
The first corner antenna members 711, 712, and 713 have a pair of first ends connected to the first connected antenna members 721 and 723 and the second connected antenna members 722 and 724, respectively. (712a, 713a, 711b, 712b, 713b),
The second connection antenna members 722 and 724 are a pair of second ends 731a connected to the first connection antenna members 721 and 723 and the second connection antenna members 722 and 724, respectively. , 732a, 731b, 732b). The method of claim 2,
The first connection antenna members (721, 723) and the second connection antenna members (722, 724) extend vertically upward from the top surface of the window (210). The method of claim 2,
The first connection antenna members (721, 723) and the second connection antenna members (722, 724) are inclined upward from the top surface of the window (210) and extend upward. The method of claim 2,
The corner antenna group 700,
Among the first corner antenna members 711, 712, and 713, RF power is applied to one end of the first corner antenna member 711 located at the outermost side with respect to the center of the loop structure, and RF power is applied to the first corner antenna member 711 located at the innermost side. An induction electric field plasma processing apparatus characterized in that the other end of the one-corner antenna member (713) is directly or indirectly grounded. The method of any one of claims 1 to 7,
An inductive electric field plasma processing apparatus comprising a side antenna group 510 disposed at intervals from the side of the reference rectangular area and the four corner antenna groups 700. The method of claim 8,
The corner antenna group (700) and the side antenna group (510) have the same current direction at adjacent portions. The method of claim 8,
The corner antenna group 700 is disposed at the same height from the upper surface of the window 210 as the lateral antenna group 510 at a portion adjacent to the lateral antenna group 510. The method of claim 8,
The lateral antenna group 510,
It is characterized in that it includes one or more side antenna members 511 disposed at intervals from the sides of the reference rectangular area, one end 511a to which the RF power source 160 is connected and the other end 511b to be grounded. An induction electric field plasma processing device. The method of claim 8,
The lateral antenna group 510,
At least one straight line portion on a side of the rectangle of the substrate 10 excluding the vertex;
An inductive electric field plasma processing apparatus, characterized in that it has one or more side radiation portions in a portion opposite to the corner portion. The method of claim 12,
The lateral loop structure of the lateral antenna group 510 has a multi-loop structure,
The first interval D1 between the straight portions of the lateral antenna group 510 adjacent to each other is the second interval D2 between the lateral oblique portion of the lateral antenna group 510 and the corner antenna group 700. An induction electric field plasma processing apparatus characterized in that it is larger. The method of claim 13,
Characterized in that the first corner antenna members (711, 712, 713) are disposed parallel to the lateral oblique portion of the lateral antenna group (510) at least partially adjacent to the lateral antenna group (510). Inductive electric field plasma processing device. The method of claim 14,
The corner antenna group (700) and the lateral antenna group (510) have the same current direction at the oblique corners adjacent to each other. The method of claim 14,
The first corner antenna members (711, 712, 713) include the vertex of the substrate (10) or are installed inside the vertex of the substrate (10). The method of claim 10,
The support frame 220 is formed with a plurality of installation openings 221,
The inductive electric field plasma processing apparatus, characterized in that each of the plurality of installation openings (221) is provided with the window (210) having a shape corresponding to the planar shape of the corresponding installation opening (221). The method of claim 17
The plurality of installation openings ( 211) are formed in the induction electric field plasma processing apparatus. The method of claim 18
The corner antenna group 700,
An inductive electric field plasma processing apparatus characterized in that it is installed to correspond to a vertex installation opening 211 located to correspond to the vertex of the reference rectangular area among the plurality of installation openings 211. The method of claim 19
Part of the lateral antenna group (510) is installed to correspond to the vertex installation opening (211). The method of claim 20
The antenna unit 500,
Further comprising one or more inner antenna groups 530 and 540 disposed concentrically with the lateral antenna group 510 inside the lateral antenna group 510,
Part of the inner antenna group (530, 540) is installed to correspond to the vertex installation opening (211). The method of claim 10,
The antenna unit 500,
The inductive electric field plasma processing apparatus further comprises one or more inner antenna groups (530, 540) disposed concentrically with the side antenna group (510) inside the side antenna group (510). The method of claim 22
The corner antenna group 700 and the side antenna group 510 are grounded by being connected to a variable capacitor for adjusting the corresponding impedance.

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