KR20230035356A - Photosensitive composition, manufacturing method of optical filter, and manufacturing method of solid-state imaging device - Google Patents

Abstract

A photosensitive composition excellent in photolithography and capable of forming pixels with a fine line width, a method for manufacturing an optical filter, and a method for manufacturing a solid-state imaging device are provided. A photosensitive composition for exposure to light with a wavelength of 300 nm or less contains a colorant A, a photopolymerization initiator B, a polymerizable monomer C having an ethylenically unsaturated bond-containing group, and a polymerizable resin D having an ethylenically unsaturated bond-containing group, The content of the color material A in the total solids of the photosensitive composition exceeds 50% by mass, the content of the polymerizable monomer C in the total solids of the photosensitive composition is 4% by mass or more, and 100 parts by mass of the polymerizable resin D 5 to 200 parts by mass of the polymerizable monomer C is contained.

Description

Photosensitive composition, manufacturing method of optical filter, and manufacturing method of solid-state imaging device

The present invention relates to a photosensitive composition containing a color material. More specifically, it relates to a photosensitive composition used in the formation of an optical filter for a solid-state imaging device and the like. Moreover, the present invention relates to a manufacturing method of an optical filter and a manufacturing method of a solid-state imaging device.

BACKGROUND OF THE INVENTION [0002] In recent years, demand for solid-state imaging devices such as charge-coupled device (CCD) image sensors has greatly increased with the spread of digital cameras, camera-equipped mobile phones, and the like. Color filters are used as key devices for displays or optical elements.

A color filter is manufactured using, for example, a photosensitive composition containing a color material, a photopolymerization initiator, and a polymerizable monomer.

In Patent Document 1, a photosensitive composition containing a colorant, a photoradical polymerization initiator and a radically polymerizable compound, wherein the content of a radically polymerizable compound having a weight average molecular weight of 3000 or more in the total mass of the radically polymerizable compound is 70% by mass or more. It is described to manufacture a color filter using.

Patent Document 1: International Publication No. 2019/172006

In recent years, miniaturization and high resolution of solid-state imaging devices provided with optical filters such as color filters are progressing. For this reason, miniaturization of a pixel is examined with respect to optical filters, such as a color filter.

Moreover, in recent years, in solid-state imaging devices, there is a strong demand for miniaturization and thinning. For this reason, in recent years, it has been desired to further thin the film containing a color material such as a color filter used in a solid-state imaging device. In order to achieve thin film formation while maintaining desired spectral performance, it is necessary to increase the colorant concentration in the photosensitive composition used for film formation.

However, as the colorant concentration in the total solids of the photosensitive composition increases, the ratio of components other than the colorant relatively decreases, and thus the curability tends to be insufficient. For this reason, in the case of forming pixels by the photolithography method using the photosensitive composition, there is a tendency that the degree of curing of the film when exposed to light through a mask tends to be insufficient, and the adhesion of the obtained pixels to the support is likely to be insufficient. there was a tendency In particular, as the size of the opening of the mask narrows, the amount of exposure light irradiated to the photosensitive composition in the exposed portion decreases, so that the bottom portion of the film (support side) is not sufficiently cured, and the obtained pixel tends to lack adhesion to the support body. .

When forming pixels by the photolithography method, the film can be sufficiently cured during exposure by exposing with a high exposure amount, but curing also proceeds in the unexposed areas around the periphery of the opening of the mask, resulting in a thick line width of the formed pixels. , there was a tendency for residues to easily occur between pixels. In addition, when the size of the opening of the mask is less than 1.0 μm square, curing tends to proceed more easily even in the unexposed area around the periphery of the opening of the mask due to the influence of the standing wave, and the line width of the pixel is smaller than the size of the opening of the mask. It tended to thicken. In particular, when the size of the opening of the mask is 0.7 μm or less in all directions, such a problem is remarkably likely to occur.

Accordingly, an object of the present invention is to provide a photosensitive composition that is excellent in photolithography and can form pixels with a fine line width. Another object of the present invention is to provide a method for manufacturing an optical filter and a method for manufacturing a solid-state imaging device.

According to the study of the present inventor, it was found that the above object can be achieved by setting it as the following structure, and came to complete the present invention. Accordingly, the present invention provides the following.

<1> A photosensitive composition comprising a color material A, a photopolymerization initiator B, a polymerizable monomer C having an ethylenically unsaturated bond-containing group, and a polymerizable resin D having an ethylenically unsaturated bond-containing group,

The content of the color material A in the total solids of the photosensitive composition exceeds 50% by mass,

The content of the polymerizable monomer C in the total solids of the photosensitive composition is 4% by mass or more,

A photosensitive composition for exposure to light with a wavelength of 300 nm or less, containing 5 to 200 parts by mass of the polymerizable monomer C based on 100 parts by mass of the polymerizable resin D.

<2> The photosensitive composition according to <1>, wherein the color material A contains a chromatic color material.

<3> The photosensitive composition according to <1> or <2>, wherein the polymerizable monomer C contains a 2 to 8 functional polymerizable monomer having 2 to 8 ethylenically unsaturated bond-containing groups.

<4> The photosensitive composition according to any one of <1> to <3>, wherein the ethylenically unsaturated bond-containing value derived from the polymerizable monomer C in the total solid content of the photosensitive composition is 0.01 to 8 mmol/g.

<5> The photosensitive composition according to any one of <1> to <4>, wherein the ethylenically unsaturated bond-containing value derived from the polymerizable resin D in the total solid content of the photosensitive composition is 0.001 to 5 mmol/g.

<6> The photosensitive composition according to any one of <1> to <5>, which contains 10 to 100 parts by mass of the polymerizable monomer C with respect to 100 parts by mass of the polymerizable resin D.

<7> The photosensitive composition according to any one of <1> to <6>, in which the total amount of the polymerizable monomer C and the polymerizable resin D in the total solid content of the photosensitive composition is 5 to 45% by mass.

<8> The photosensitive composition according to any one of <1> to <7>, in which the content of the photopolymerization initiator B in the total solid content of the photosensitive composition is 1 to 10% by mass.

<9> The photosensitive composition according to any one of <1> to <8>, which is for forming a red pixel or a green pixel of a color filter.

<10> The photosensitive composition according to any one of <1> to <9>, which is for solid-state imaging devices.

<11> A step of forming a photosensitive composition layer on a support using the photosensitive composition according to any one of <1> to <10>;

A step of exposing the photosensitive composition layer by irradiating light having a wavelength of 300 nm or less in a pattern;

A method of manufacturing an optical filter comprising a step of developing and removing the photosensitive composition layer of an unexposed portion to form a pixel.

<12> The method for manufacturing an optical filter according to <11>, wherein the light having a wavelength of 300 nm or less to be irradiated onto the photosensitive composition layer is light having a wavelength of 248 nm.

<13> A method for manufacturing a solid-state imaging device including the method for manufacturing an optical filter according to <11> or <12>.

ADVANTAGE OF THE INVENTION According to this invention, the photosensitive composition which is excellent in photolithography and can form a pixel of a fine line width can be provided. In addition, a method for manufacturing an optical filter and a method for manufacturing a solid-state imaging device can be provided.

Below, the content of this invention is demonstrated in detail.

In this specification, "-" is used by the meaning which includes the numerical value described before and after that as a lower limit value and an upper limit value.

In the notation of a group (atomic group) in this specification, the notation that does not describe substitution and unsubstitution includes a group (atomic group) having a substituent as well as a group (atomic group) having no substituent. For example, the "alkyl group" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).

In the present specification, “(meth)acrylate” represents either or both of acrylate and methacrylate, and “(meth)acryl” represents both acryl and methacryl or either of them. and "(meth)acryloyl" represents either or both of acryloyl and methacryloyl.

In the present specification, Me in the structural formula represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group.

In this specification, a weight average molecular weight and a number average molecular weight are polystyrene conversion values measured by the GPC (Gel Permeation Chromatography) method.

In this specification, the total solid content refers to the total mass of the components excluding the solvent from all components of the composition.

In this specification, a pigment means a color material that is difficult to dissolve with respect to a solvent. For example, the solubility of the pigment in 100 g of water at 23°C and 100 g of propylene glycol monomethyl ether acetate at 23°C is preferably 0.1 g or less, and more preferably 0.01 g or less.

In this specification, the symbols (for example, A, B, C, and D, etc.) added before or after the name are terms used to distinguish components, and the types of components , the number of components, and the superiority or inferiority of components are not limited.

In this specification, the term "process" is included in the term not only as an independent process, but also in cases where the desired action of the process is achieved even if it cannot be clearly distinguished from other processes.

<Photosensitive composition>

The photosensitive composition of the present invention is a photosensitive composition comprising a colorant A, a photopolymerization initiator B, a polymerizable monomer C having an ethylenically unsaturated bond-containing group, and a polymerizable resin D having an ethylenically unsaturated bond-containing group,

The content of the color material A in the total solids of the photosensitive composition exceeds 50% by mass,

The content of the polymerizable monomer C in the total solids of the photosensitive composition is 4% by mass or more,

It is characterized by being a photosensitive composition for exposure to light with a wavelength of 300 nm or less, containing 5 to 200 parts by mass of polymerizable monomer C with respect to 100 parts by mass of polymerizable resin D.

According to the photosensitive composition of the present invention, despite the fact that the content of the color material in the total solid content exceeds 50% by mass, the photolithographic property is excellent, and the fine line width (for example, line width less than 1.0 μm, preferably , a line width of 0.7 μm or less, more preferably a line width of 0.6 μm or less). Although the detailed reason why such an effect is obtained is unknown, it is estimated that it is based on the following.

The photosensitive composition of the present invention is a photosensitive composition for exposure with light having a wavelength of 300 nm or less.

Since light with a wavelength of 300 nm or less is light with a high energy density, by irradiating the photosensitive composition of the present invention with light with a wavelength of 300 nm or less, a large amount of active species such as radicals can be instantaneously generated from the photopolymerization initiator in the exposed portion. there is. When a large amount of active species such as radicals are instantaneously generated in the exposed portion, a polymerizable monomer or a polymerizable resin can be efficiently cured by effects such as suppression of deactivation by oxygen. In the photosensitive composition of the present invention, the content of the polymerizable monomer C in the total solid content of the photosensitive composition is 4% by mass or more, and the content of the polymerizable monomer C is 5 to 200 parts by mass with respect to 100 parts by mass of the polymerizable resin D. By containing, although the detailed reason is unknown, it is estimated that hardening of the non-exposed part of the mask periphery at the time of exposure was suppressed, and it was possible to form a pixel with a fine line width.

The photosensitive composition of the present invention is a photosensitive composition for exposure with light having a wavelength of 300 nm or less. The light used for exposure is preferably light with a wavelength of 180 to 300 nm. Specifically, light (KrF line) with a wavelength of 248 nm, light (ArF line) with a wavelength of 193 nm, and the like are exemplified, and light (KrF line) with a wavelength of 248 nm is preferable.

It is preferable that the ethylenically unsaturated bond-containing value derived from polymerizable monomer C in the total solids of the photosensitive composition of the present invention (hereinafter also referred to as C=C value) is 0.01 to 8 mmol/g. It is preferable that it is 0.05 mmol/g or more, and, as for a minimum, it is more preferable that it is 0.1 mmol/g or more. It is preferable that it is 4 mmol/g or less, and, as for an upper limit, it is more preferable that it is 2.5 mmol/g or less. When the C=C value derived from polymerizable monomer C in the total solid content of the photosensitive composition is within the above range, high-density three-dimensional crosslinking can be formed by exposure, and it is effective for fine patterning. In addition, the C=C value derived from the polymerizable monomer C in the total solids of the photosensitive composition is the sum of the products of the content of each polymerizable monomer and the C=C value of each polymerizable monomer in the total solids of the photosensitive composition. , It is the value divided by the total solid content of the photosensitive composition. The C=C value of the polymerizable monomer is a value calculated by dividing the number of ethylenically unsaturated bond-containing groups contained in one molecule of the polymerizable monomer by the molecular weight of the polymerizable monomer.

It is preferable that the C=C value derived from polymerizable resin D in the total solid content of the photosensitive composition of this invention is 0.001-5 mmol/g. It is preferable that it is 0.005 mmol/g or more, and, as for a minimum, it is more preferable that it is 0.01 mmol/g or more. It is preferable that it is 3 mmol/g or less, and, as for an upper limit, it is more preferable that it is 1 mmol/g or less. If the C=C value derived from the polymerizable resin D in the total solid content of the photosensitive composition is within the above range, a high molecular weight polymer can be formed by exposure, and a pixel with a fine line width excellent in adhesion to the support can be formed. . In addition, the C=C value derived from the polymerizable resin D in the total solid content of the photosensitive composition is the sum of the products of the content of each polymerizable resin and the C=C value of each polymerizable resin in the total solid content of the photosensitive composition. , It is the value divided by the total solid content of the photosensitive composition. In addition, the C=C value of polymerizable resin is a numerical value showing the molar amount of C=C groups per 1 g of solid content of polymerizable resin. The C=C value of the polymerizable resin is determined by taking out the low-molecular component (a) at the C=C group site from the polymerizable resin by alkali treatment, and determining the content of the low-molecular component (a) at the C=C group site with respect to the polymerizable resin. It can be measured by high-performance liquid chromatography (HPLC) and calculated from the following formula. In addition, in the case where the C=C group site cannot be extracted from the polymerizable resin by alkali treatment, a value measured by NMR method (nuclear magnetic resonance) is used.

C=C value of polymerizable resin [mmol/g] = (content of low molecular weight component (a) [ppm]/molecular weight of low molecular weight component (a) [g/mol]) × 10 ³

It is preferable that the C=C value of the solid content of the photosensitive composition of this invention is 0.01-10 mmol/g. It is preferable that it is 0.05 mmol/g or more, and, as for a minimum, it is more preferable that it is 0.1 mmol/g or more. It is preferable that it is 5 mmol/g or less, and, as for an upper limit, it is more preferable that it is 3 mmol/g or less. When the C=C value of the solid content of the photosensitive composition is in the above range, the curability by exposure is excellent, the difference in alkali developability between the exposed and unexposed areas is effectively expanded, and it is effective for fine patterning. In addition, the C=C value of the solid content of the photosensitive composition is a numerical value showing the molar amount of C=C groups per 1 g of the solid content of the photosensitive composition. The C=C value of the solid content of the photosensitive composition is determined by taking out the low molecular component (a) of the C=C group portion from the solid content of the photosensitive composition by alkali treatment, and the low molecular component (a) of the C=C group portion with respect to the solid content of the photosensitive composition. The content of is measured by high performance liquid chromatography (HPLC) and can be calculated from the following formula. Moreover, in the case where the C=C group site cannot be extracted from the solid content of the photosensitive composition by alkali treatment, a value measured by NMR method (nuclear magnetic resonance) is used.

C=C value of the solid content of the photosensitive composition [mmol/g] = (content of low-molecular component (a) [ppm]/molecular weight of low-molecular component (a) [g/mol]) × 10 ³

The photosensitive composition of the present invention is preferably used as a photosensitive composition for optical filters. As an optical filter, a color filter, a near-infrared cutoff filter, a near-infrared transmission filter, etc. are mentioned, and a color filter is preferable.

As the color filter, a filter having colored pixels is exemplified. Examples of colored pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, and yellow pixels.

As the near-infrared cut filter, a filter that blocks at least a part of light having a wavelength in the near-infrared region is exemplified. The maximum absorption wavelength of the near-infrared cut filter is preferably in the range of 700 to 1800 nm, more preferably in the range of 700 to 1300 nm, and more preferably in the range of 700 to 1000 nm. In addition, the transmittance of the near-infrared cut filter in the entire wavelength range of 400 to 650 nm is preferably 70% or more, more preferably 80% or more, and still more preferably 90% or more. Moreover, it is preferable that the transmittance|permeability at at least 1 point in the range of wavelength 700-1800nm is 20% or less. Further, the ratio of the absorbance Amax at the maximum absorption wavelength of the near-infrared cut filter and the absorbance A550 at a wavelength of 550 nm (absorbance Amax/absorbance A550) is preferably 20 to 500, more preferably 50 to 500, , more preferably 70 to 450, and particularly preferably 100 to 400.

Examples of the near-infrared transmission filter include a filter that blocks at least a part of visible light and transmits at least a part of near-infrared light. As a specific example of the near-infrared transmission filter, the maximum value of the transmittance in the wavelength range of 400 to 640 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and in the wavelength range of 1100 to 1300 nm and a filter that satisfies the spectral characteristics with a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more). The near-infrared transmission filter is preferably a filter that satisfies any one of the following spectral characteristics (IR1) to (IR5).

(IR1): The maximum value of transmittance in the range of wavelength 400 to 640 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum value of transmittance in the range of wavelength 800 to 1500 nm 70% or more (preferably 75% or more, more preferably 80% or more).

(IR2): The maximum value of transmittance in the range of wavelength 400 to 750 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum value of transmittance in the range of wavelength 900 to 1500 nm 70% or more (preferably 75% or more, more preferably 80% or more).

(IR3): The maximum value of transmittance in the range of wavelength 400 to 830 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum value of transmittance in the range of wavelength 1000 to 1500 nm 70% or more (preferably 75% or more, more preferably 80% or more).

(IR4): The maximum value of transmittance in the range of wavelength 400 to 950 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum value of transmittance in the range of wavelength 1100 to 1500 nm 70% or more (preferably 75% or more, more preferably 80% or more).

(IR5): The maximum value of transmittance in the range of wavelength 400 to 1050 nm is 20% or less (preferably 15% or less, more preferably 10% or less), and the minimum value of transmittance in the range of wavelength 1200 to 1500 nm 70% or more (preferably 75% or more, more preferably 80% or more).

It is preferable that the photosensitive composition of this invention is a photosensitive composition for color pixel formation of a color filter. Examples of the colored pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, yellow pixels, and the like, and a red pixel or a green pixel is preferable. Moreover, the photosensitive composition of this invention is used suitably as a photosensitive composition for solid-state imaging devices. More specifically, it is preferably used as a photosensitive composition for an optical filter used in a solid-state imaging device, and more preferably used as a photosensitive composition for forming colored pixels of a color filter used in a solid-state imaging device, and used in a solid-state imaging device It is particularly preferably used as a photosensitive composition for forming a red pixel or a green pixel of a color filter to be used. The color pixel of the color filter can be formed using a photosensitive composition containing a chromatic color material.

It is preferable that the solid content concentration of the photosensitive composition of this invention is 5-30 mass %. 7.5 mass % or more is preferable and, as for a minimum, 10 mass % or more is more preferable. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and still more preferably 15% by mass or less.

Hereinafter, each component used in the photosensitive composition of the present invention is described.

<<color material>>

The photosensitive composition of the present invention contains a color material A (hereinafter referred to as a color material). The coloring material may be a pigment or a dye. You may use a pigment and dye together. Moreover, any of an inorganic pigment and an organic pigment may be sufficient as a pigment. Further, as the pigment, a material in which a part of an inorganic pigment or an organic-inorganic pigment is substituted with an organic chromophore may be used. By replacing inorganic pigments or organic-inorganic pigments with organic chromophores, color design can be easily performed.

As for the average primary particle diameter of a pigment, 1-200 nm is preferable. 5 nm or more is preferable and, as for a minimum, 10 nm or more is more preferable. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and still more preferably 100 nm or less. When the average primary particle size of the pigment is within the above range, the dispersion stability of the pigment in the photosensitive composition is good. In addition, in this invention, the primary particle diameter of a pigment can be calculated|required from the image photograph obtained by observing the primary particle of a pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is obtained, and the equivalent circle diameter corresponding to the projected area is calculated as the primary particle diameter of the pigment. The average primary particle size in the present invention is the arithmetic mean value of the primary particle size of 400 pigment primary particles. In addition, the primary particle of a pigment refers to an independent particle without aggregation.

It is preferable to use what contains a pigment as a color material. The content of the pigment in the color material is preferably 50% by mass or more, more preferably 70% by mass or more, still more preferably 80% by mass or more, and particularly preferably 90% by mass or more.

As a kind of color material, a chromatic color material, a black color material, a white color material, and a near-infrared ray absorbing color material are mentioned, and it is preferable that it is a chromatic color material. Moreover, it is preferable that a chromatic color material is a pigment (chromatic color pigment). A photosensitive composition containing a chromatic color material can be suitably used as a photosensitive composition for forming colored pixels of a color filter.

(chromatic coloring material)

As a chromatic color material, the color material which has a maximum absorption wavelength in the wavelength range of 400-700 nm is mentioned. For example, yellow color material, orange color material, red color material, green color material, purple color material, blue color material, etc. are mentioned. As a specific example of a chromatic color material, what is shown below is mentioned, for example.

Color Index (C.I.) Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35 :1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94 ,95,97,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128,129,137 , 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176 , 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232 (methane), 233 (quinoline), 234 (aminoketone ), 235 (amino ketone system), 236 (amino ketone system), and other yellow pigments.

C. I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73 Orange pigment in the back.

C. I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4 , 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3 , 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184 , 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291 , Red pigments such as 294 (xanthene, Organo Ultramarine, Bluish Red), 295 (monoazo), 296 (diazo), and 297 (amino ketone).

Green pigments such as C. I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine-based), 65 (phthalocyanine-based), 66 (phthalocyanine-based).

Violet pigments such as C. I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane-based), 61 (xanthene-based).

C. I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo ), blue pigments such as 88 (methane type).

In addition, as a green colorant, a halogenated zinc phthalocyanine pigment having an average number of halogen atoms in one molecule of 10 to 14, an average number of bromine atoms of 8 to 12, and an average number of chlorine atoms of 2 to 5 may be used. there is. As a specific example, the compound of international publication 2015/118720 is mentioned. In addition, as a green colorant, a compound described in the specification of Chinese Patent Application No. 106909027, a phthalocyanine compound having a phosphate ester as a ligand described in International Publication No. 2012/102395, and a phthalo described in Japanese Laid-Open Patent Publication No. 2019-008014 A cyanine compound, a phthalocyanine compound described in Japanese Unexamined Patent Publication No. 2018-180023, a compound described in Japanese Unexamined Patent Publication No. 2019-038958, a core shell type pigment described in Japanese Unexamined Patent Publication No. 2020-076995, etc. can also be used. .

Moreover, as a blue colorant, an aluminum phthalocyanine compound having a phosphorus atom can also be used. As a specific example, Paragraph No. 0022 of Unexamined-Japanese-Patent No. 2012-247591 - 0030, and the compound of Paragraph No. 0047 of Unexamined-Japanese-Patent No. 2011-157478 are mentioned.

Moreover, as a yellow colorant, the nickel azobarbiturate complex of the following structure can also be used.

[Formula 1]

As a red colorant, a diketopyrrolopyrrole compound in which at least one bromine atom is substituted in the structure described in Japanese Patent Laid-open Publication No. 2017-201384, and a diketopyrrolopyrrole described in paragraph Nos. 0016 to 0022 of Japanese Patent Publication No. 6248838 A compound, a diketopyrrolopyrrole compound described in International Publication No. 2012/102399, a diketopyrrolopyrrole compound described in International Publication No. 2012/117965, a naphthol azo compound described in Japanese Patent Laid-Open No. 2012-229344, Red colorant described in Japanese Patent Publication No. 6516119, red colorant described in Japanese Patent Publication No. 6525101, brominated diketopyrrolopyrrole compound described in Paragraph No. 0229 of Japanese Patent Laid-Open No. 2020-090632, Korean Patent Laid-Open No. 10 An anthraquinone compound described in -2019-0140741, an anthraquinone compound described in Korean Unexamined Patent Publication No. 10-2019-0140744, a perylene compound described in Japanese Unexamined Patent Publication No. 2020-079396, or the like can also be used. Also, as a red colorant, a compound having a structure in which an aromatic ring group in which a group in which an oxygen atom, a sulfur atom or a nitrogen atom is bonded to an aromatic ring is introduced is bonded to a diketopyrrolopyrrole skeleton can also be used.

Moreover, as a yellow colorant, the compound described in Unexamined-Japanese-Patent No. 2017-201003, the compound described in Unexamined-Japanese-Patent No. 2017-197719, the compound described in Paragraph Nos. 0011-0062, 0137-0276 of Unexamined-Japanese-Patent No. 2017-171912 , Compounds described in Paragraph Nos. 0010 to 0062, 0138 to 0295 of Japanese Laid-open Patent Publication No. 2017-171913, Paragraph Nos. 0011 to 0062, 0139 to 0190 of Japanese Unexamined Patent Publication No. 2017-171914, Compounds described in Japanese Unexamined Patent Publication No. 2017-171915 Paragraph Nos. 0010 to 0065, 0142 to 0222, the compound described in Paragraph Nos. 0011 to 0034 of Japanese Patent Application Laid-Open No. 2013-054339, the quinophthalone compound described in Paragraph Nos. 0013 to 0058 of Unexamined-Japanese-Patent No. 2014-026228 A nophthalone compound, an isoindoline compound described in Japanese Unexamined Patent Publication No. 2018-062644, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 218-203798 , a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2018-062578, Japan A quinophthalone compound described in Japanese Patent Publication No. 6432077, a quinophthalone compound described in Japanese Patent Publication No. 6432076, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2018-155881, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2018-111757 A quinophthalone compound, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2018-040835, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2017-197640, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2016-145282, A quinophthalone compound described in Japanese Unexamined Patent Publication No. 2014-085565, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2014-021139, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2013-209614, Japanese Unexamined Patent Publication 2013 A quinophthalone compound described in No. -209435, and a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2013-181015 A nophthalone compound, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2013-061622, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2013-054339, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2013-032486, Japan A quinophthalone compound described in Japanese Unexamined Patent Publication No. 2012-226110, a quinophthalone compound described in Japanese Laid-Open Patent Publication No. 2008-074987, a quinophthalone compound described in Japanese Unexamined Patent Publication No. 2008-081565, Japanese Unexamined Patent Publication 2008- A quinophthalone compound described in Japanese Patent Laid-Open No. 074986, a quinophthalone compound described in Japanese Patent Laid-Open No. 2008-074985, a quinophthalone compound described in Japanese Patent Laid-Open No. 2008-050420, and a quinophthalone compound described in Japanese Patent Laid-Open No. 2008-031281 A nophthalone compound, a quinophthalone compound described in Japanese Patent Publication No. 48-032765, a quinophthalone compound described in Japanese Patent Laid-Open No. 2019-008014, a compound described in Korean Unexamined Patent Publication No. 10-2014-0034963, The compound described in Japanese Unexamined Patent Application Publication No. 2017-095706, the compound described in Taiwanese Patent Application Publication No. 201920495, and the compound described in Japanese Patent Application Publication No. 6607427 can also be used. Moreover, what multimerized these compounds is also used preferably from a viewpoint of color value improvement. Moreover, as a yellow colorant, the compound represented by Formula (QP1) and the compound represented by Formula (QP2) can also be used.

[Formula 2]

In Formula (QP1), X ¹ to X ¹⁶ each independently represent a hydrogen atom or a halogen atom, and Z ¹ represents an alkylene group having 1 to 3 carbon atoms. As a specific example of the compound represented by Formula (QP1), the compound described in Paragraph No. 0016 of Japanese Patent Publication No. 6443711 is mentioned.

[Formula 3]

In Formula (QP2), Y ¹ to Y ³ each independently represent a halogen atom. n and m represent an integer of 0 to 6, and p represents an integer of 0 to 5. (n+m) is 1 or more. As a specific example of the compound represented by Formula (QP2), the compound described in Paragraph No. 0047 of Japanese Patent Publication 6432077 - 0048 is mentioned.

Moreover, as a coloring material, the diarylmethane compound of Unexamined-Japanese-Patent No. 2020-504758 can also be used.

Regarding the diffraction angle that various pigments preferably have, the descriptions of Japanese Patent Publication No. 6561862, Japanese Patent Publication No. 6413872, Japanese Patent Publication No. 6281345, and Japanese Unexamined Patent Publication No. 2020-026503 can be referred, and these contents is incorporated herein.

Moreover, a dye can also be used as a chromatic color material. There is no restriction|limiting in particular as a dye, A well-known dye can be used. For example, pyrazolazo compounds, anilinoazo compounds, triarylmethane compounds, anthraquinone compounds, anthrapyridone compounds, benzylidene compounds, oxonol compounds, pyrazolotriazolazo compounds, pyridonazo compounds, An anine compound, a phenothiazine compound, a pyrrolopyrazole azomethane compound, a xanthene compound, a phthalocyanine compound, a benzopyran compound, an indigo compound, and a pyromethene compound are mentioned. Moreover, a dye multimer can also be used as a dye. The dye multimer has two or more dye structures in one molecule, and preferably has three or more dye structures. The upper limit is not particularly limited, but may be 100 or less. The plurality of dye structures in one molecule may be the same dye structure or different dye structures. As for the weight average molecular weight (Mw) of a dye multimer, 2000-50000 are preferable. 3000 or more are more preferable, and, as for a minimum, 6000 or more are still more preferable. As for an upper limit, 30000 or less are more preferable, and 20000 or less are still more preferable. Dye multimers, Japanese Unexamined Patent Publication No. 2011-213925, Japanese Unexamined Patent Publication No. 2013-041097, Japanese Unexamined Patent Publication No. 2015-028144, Japanese Unexamined Patent Publication 2015-030742, Japanese Unexamined Patent Publication 2016-102191, The compound described in international publication 2016/031442 etc. can also be used.

You may use chromatic color material in combination of 2 or more types. For example, when using the photosensitive composition of this invention for formation of a green pixel of a color filter, it is preferable to use a green color material and a yellow color material together. In addition, the ratio of the green colorant and the yellow colorant is preferably 15 to 100 parts by mass, more preferably 20 to 70 parts by mass, and still more preferably 25 to 60 parts by mass, relative to 100 parts by mass of the green colorant. . The green colorant is preferably C. I. Pigment Green 7, 36, 58, 59, or 63, and more preferably C. I. Pigment Green 36 or 58. The yellow colorant is preferably C. I. Pigment Yellow 129, 138, 139, 150, 185, 215, 231, 233, and more preferably C. I. Pigment Yellow 129, 139, 185, 215.

Moreover, when using the photosensitive composition of this invention for red pixel formation of a color filter, it is preferable to use together a red color material and a yellow color material. In addition, the ratio of the red colorant and the yellow colorant is preferably 20 to 70 parts by mass, more preferably 25 to 60 parts by mass, and still more preferably 30 to 50 parts by mass, relative to 100 parts by mass of the red colorant. . The red colorant is preferably C. I. Pigment Red 177, 254, 264, 269, 272, 291, 296, 297, and more preferably C. I. Pigment Red 177, 254, 264, 269, 272. The yellow colorant is preferably C. I. Pigment Yellow 129, 138, 139, 150, 185, 215, 231, 233, more preferably C. I. Pigment Yellow 139, 185, 215, and still more preferably C. I. Pigment Yellow 139. .

Moreover, when using in combination of 2 or more types of chromatic color materials, black may be formed by the combination of 2 or more types of chromatic color materials. Examples of such a combination include the following aspects (Bk1) to (Bk7). In the case where the photosensitive composition contains two or more chromatic colorants and the combination of the two or more chromatic colorants exhibits black color, such a photosensitive composition can be suitably used as a photosensitive composition for forming a near-infrared transmission filter. .

(Bk1) An aspect containing a red colorant and a blue colorant.

(Bk2) An aspect containing a red colorant, a blue colorant, and a yellow colorant.

(Bk3) An aspect containing a red colorant, a blue colorant, a yellow colorant, and a purple colorant.

(Bk4) An aspect containing a red colorant, a blue colorant, a yellow colorant, a purple colorant, and a green colorant.

(Bk5) An aspect containing a red colorant, a blue colorant, a yellow colorant, and a green colorant.

(Bk6) The aspect containing a red color material, a blue color material, and a green color material.

(Bk7) An aspect containing a yellow colorant and a purple colorant.

(white color material)

As the white colorant, titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silica, talc, mica, aluminum hydroxide, calcium silicate, aluminum silicate, hollow resin particles, sulfide Inorganic pigments (white pigments), such as zinc, are mentioned. The white pigment is preferably a particle having a titanium atom, and more preferably a titanium oxide. Moreover, it is preferable that the white pigment is a particle having a refractive index of 2.10 or more with respect to light having a wavelength of 589 nm. It is preferable that it is 2.10-3.00, and, as for the refractive index mentioned above, it is more preferable that it is 2.50-2.75. Further, as the white pigment, titanium oxide described in “Physical properties of titanium oxide and applied technology, Manabu Kiyono, pp. 13 to 45, June 25, 1991, published by Shimpan,” can also be used.

The white pigment is not only composed of a single inorganic substance, but may also be used in combination with other materials. For example, core and shell composite particles composed of particles having pores or other materials inside, particles in which many inorganic particles are adhered to core particles, core particles composed of polymer particles and shell layers composed of inorganic nanoparticles, It is preferable to use As the core and shell composite particles composed of the core particles composed of the polymer particles and the shell layer composed of the inorganic nanoparticles, for example, the description of paragraphs No. 0012 to 0042 of Japanese Unexamined Patent Publication No. 2015-047520 can be referred to, and this content is incorporated herein.

As the white pigment, hollow inorganic particles can also be used. The hollow inorganic particle is an inorganic particle having a structure having a cavity inside, and refers to an inorganic particle having a cavity surrounded by an outer shell. As hollow inorganic particles, the hollow inorganic particles described in Unexamined-Japanese-Patent No. 2011-075786, International publication 2013/061621, Unexamined-Japanese-Patent No. 2015-164881 etc. are mentioned, These content is integrated in this specification.

(black color material)

It does not specifically limit as a black color material, A well-known thing can be used. For example, as an inorganic black colorant, carbon black, titanium black, graphite, etc. are mentioned, Carbon black and titanium black are preferable, and titanium black is more preferable. Titanium black is a black particle containing a titanium atom, and low-order titanium oxide or oxynitride titanium is preferable. The surface of titanium black can be modified as needed for the purpose of improving dispersibility, suppressing aggregation, and the like. For example, it is possible to coat the surface of titanium black with silicon oxide, titanium oxide, germanium oxide, aluminum oxide, magnesium oxide, or zirconium oxide. Moreover, treatment using a water-repellent substance as shown in Japanese Unexamined Patent Publication No. 2007-302836 is also possible. As a black colorant, color index (C.I.) Pigment Black 1, 7, etc. are mentioned. Titanium black preferably has a small primary particle diameter and an average primary particle diameter of individual particles. Specifically, it is preferable that the average primary particle size is 10 to 45 nm. Titanium black can also be used as a dispersion. For example, a dispersion etc. containing titanium black particles and silica particles and adjusting the content ratio of Si atoms and Ti atoms in the range of 0.20 to 0.50 in the dispersion are exemplified. About the said dispersion, Paragraph 0020 of Unexamined-Japanese-Patent No. 2012-169556 - description of 0105 can be considered into consideration, and this content is integrated in this specification. Examples of commercially available titanium black include titanium black 10S, 12S, 13R, 13M, 13M-C, 13R-N, 13M-T (trade name: manufactured by Mitsubishi Materials Co., Ltd.), Tilack D (trade name: Ako Kasei Note) and the like. Examples of the organic black colorant include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. As the bisbenzofuranone compound, Japanese Patent Publication No. 2010-534726, Japanese Patent Publication No. 2012-515233, Japanese Patent Publication No. 2012-515234, International Publication No. 2014/208348, Japanese Patent Publication No. 2015-525260 and the like, and can be obtained as "Irgaphor Black" from BASF, for example. As a perylene compound, C. I. Pigment Black 31, 32 etc. are mentioned. Examples of the azometaine compound include compounds described in Japanese Unexamined Patent Publication No. Hei 01-170601, Japanese Unexamined Patent Publication No. Hei 02-034664, etc. For example, as "Chromofine Black A1103" manufactured by Dainichi Seika Co., Ltd. can be obtained Moreover, as an organic black colorant, you may use Paragraph 0016 of Unexamined-Japanese-Patent No. 2017-226821 - the perylene black (Lumogen Black FK4280 grade|etc., as described in 0020).

(Near-infrared absorbing colorant)

The near-infrared absorbing colorant is preferably a pigment, and more preferably an organic pigment. Further, the near-infrared absorbing colorant is preferably a compound having a maximum absorption wavelength in a range of more than 700 nm and 1400 nm or less. Further, the maximum absorption wavelength of the near-infrared absorbing colorant is preferably 1200 nm or less, more preferably 1000 nm or less, and still more preferably 950 nm or less. In the near-infrared absorbing colorant, A ₅₅₀ /A max, which is a ratio of absorbance A ₅₅₀ at a wavelength of 550 nm and absorbance A _max at a maximum absorption wavelength, is preferably 0.1 or less, more preferably 0.05 or less, _and further preferably 0.03 or less. It is preferable, and it is especially preferable that it is 0.02 or less. The lower limit is not particularly limited, but may be, for example, 0.0001 or more, or 0.0005 or more. When the above-mentioned absorbance ratio is within the above range, a near-infrared absorbing colorant excellent in visible transparency and near-infrared shielding properties can be obtained. The values of the maximum absorption wavelength of the near-infrared absorbing colorant and the absorbance at each wavelength are values obtained from the absorption spectrum of a film formed using a photosensitive composition containing the near-infrared absorbing colorant.

The near-infrared absorbing colorant is not particularly limited, but is pyrrolopyrrole compound, cyanine compound, squarylium compound, phthalocyanine compound, naphthalocyanine compound, quaterrylene compound, merocyanine compound, croconium compound, iodine A nol compound, an iminium compound, a dithiol compound, a triarylmethane compound, a pyromethene compound, an azomethane compound, an anthraquinone compound, a dibenzofuranone compound, a dithiorene metal complex, etc. are mentioned. As a pyrrolopyrrole compound, the compound of Paragraph No. 0016 of Unexamined-Japanese-Patent No. 2009-263614 - 0058, the compound of Paragraph No. 0037 of Unexamined-Japanese-Patent No. 2011-068731 - 0052, Paragraph No. of International Publication No. 2015/166873 The compound of 0010-0033, etc. are mentioned. As a squarylium compound, the compound described in Paragraph Nos. 0044 to 0049 of Unexamined-Japanese-Patent No. 2011-208101, the compound described in Paragraph Nos. 0060 to 0061 of Japanese Patent Publication No. 6065169, and Paragraph No. 0040 of International Publication No. 2016/181987 The compound described, the compound described in Japanese Unexamined Patent Publication No. 2015-176046, the compound described in Paragraph No. 0072 of International Publication No. 2016/190162, the compound described in Paragraph Nos. A compound described in Paragraph No. 0124 of Publication No. 2017-067963, a compound described in International Publication No. 2017/135359, a compound described in Japanese Unexamined Patent Publication No. 2017-114956, a compound described in Japanese Patent Publication No. 6197940, International Publication No. 2016 /120166, etc. are mentioned. As a cyanine compound, the compound described in Paragraph No. 0044 of Unexamined-Japanese-Patent No. 2009-108267 - 0045, the compound of Paragraph No. 0026 - 0030 of Unexamined-Japanese-Patent No. 2002-194040, and the compound described in Unexamined-Japanese-Patent No. 2015-172004 , a compound described in Japanese Laid-open Patent Publication No. 2015-172102, a compound described in Japanese Unexamined Patent Publication No. 2008-088426, a compound described in International Publication No. 2016/190162, Paragraph No. 0090, and a compound described in Japanese Unexamined Patent Publication No. 2017-031394 A compound etc. are mentioned. As a croconium compound, the compound of Unexamined-Japanese-Patent No. 2017-082029 is mentioned. Examples of the iminium compound include a compound described in Japanese Laid-Open Patent Publication No. 2008-528706, a compound described in Unexamined-Japanese-Patent No. 2012-012399, a compound described in Japanese Unexamined Patent Publication No. 2007-092060, and International Publication No. 2018 /043564, Paragraph No. 0048 - the compound of 0063 is mentioned. As a phthalocyanine compound, the compound of Paragraph No. 0093 of Unexamined-Japanese-Patent No. 2012-077153, the oxytitanium phthalocyanine of Unexamined-Japanese-Patent No. 2006-343631, Paragraph No. 0013 of Unexamined-Japanese-Patent No. 2013-195480 The compound described in -0029, the vanadium phthalocyanine compound described in Japanese Patent Publication No. 6081771, and the compound described in International Publication No. 2020/071470 are exemplified. As a naphthalocyanine compound, the compound of Paragraph No. 0093 of Unexamined-Japanese-Patent No. 2012-077153 is mentioned. Examples of the dithiorene metal complex include compounds described in Japanese Patent Publication No. 5733804.

As the near-infrared absorbing colorant, a squarylium compound described in Japanese Laid-open Patent Publication No. 2017-197437, a squarylium compound described in Japanese Unexamined Patent Publication No. 2017-025311, a squarylium compound described in International Publication No. 2016/154782, A squarylium compound described in Japanese Patent Publication No. 5884953, a squarylium compound described in Japanese Patent Publication No. 6036689, a squarylium compound described in Japanese Patent Publication No. 5810604, paragraph No. 0090 of International Publication No. 2017/213047 The squarylium compound described in ~ 0107, the pyrrole ring-containing compound described in Paragraph Nos. 0019 to 0075 of Japanese Unexamined Patent Publication No. 2018-054760, the pyrrole ring-containing compound described in Paragraph No. 0078 to 0082 of Japanese Unexamined Patent Publication No. 2018-040955, Japan A pyrrole ring-containing compound described in Paragraph Nos. 0043 to 0069 of Laid-open Patent Publication No. 2018-002773, a squarylium compound having an aromatic ring on the amide α described in Paragraph Nos. 0024 to 0086 of Unexamined-Japanese-Patent No. An amide-linked squarylium compound described in Japanese Patent Laid-Open No. 2017-141215, a compound having a pyrrolebis type squarylium skeleton or a croconium skeleton, described in Japanese Patent Laid-Open No. 2017-082029. A carbazole bis-type squarylium compound, an asymmetric compound described in Paragraphs Nos. 0027 to 0114 of Japanese Unexamined Patent Publication No. 2017-068120, a pyrrole ring-containing compound described in Japanese Unexamined Patent Publication No. 2017-067963 (carbazole type), Japan A phthalocyanine compound described in Patent Publication No. 6251530 or the like can also be used.

The content of the color material in the total solids of the photosensitive composition is an amount exceeding 50% by mass, preferably 51% by mass or more, more preferably 53% by mass or more, and still more preferably 55% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, and still more preferably 70% by mass or less.

Moreover, the content of the color material is preferably 200 to 2000 parts by mass with respect to 100 parts by mass of the polymerizable monomer. The lower limit is preferably 250 parts by mass or more, more preferably 300 parts by mass or more, and still more preferably 350 parts by mass or more. The upper limit is preferably 1500 parts by mass or less, more preferably 1200 parts by mass or less, still more preferably 800 parts by mass or less, and particularly preferably 600 parts by mass or less.

Moreover, the content of the color material is preferably 100 to 1500 parts by mass with respect to 100 parts by mass of the polymerizable resin. It is preferable that it is 150 mass parts or more, and, as for a minimum, it is more preferable that it is 200 mass parts or more. The upper limit is preferably 1200 parts by mass or less, more preferably 1000 parts by mass or less, and still more preferably 500 parts by mass or less.

<<Photoinitiator>>

The photosensitive composition of the present invention contains a photopolymerization initiator B (hereinafter referred to as a photopolymerization initiator). The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, compounds having photosensitivity to light rays in the visible range from the ultraviolet range are preferred. The photopolymerization initiator is preferably a radical photopolymerization initiator.

As the photopolymerization initiator, halogenated hydrocarbon derivatives (for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazoles, oxime compounds, organic peroxides, O compounds, ketone compounds, aromatic onium salts, α-hydroxy ketone compounds, α-amino ketone compounds, and the like. From the viewpoint of exposure sensitivity, the photopolymerization initiator is a trihalomethyltriazine compound, a benzyldimethylketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, and a metallocene. compounds, oxime compounds, triarylimidazole dimers, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethyloxadiazole compounds and 3-aryl substituted coumarins It is preferable that it is a compound, It is more preferable that it is a compound chosen from an oxime compound, (alpha)-hydroxy ketone compound, (alpha)-amino ketone compound, and an acylphosphine compound, and it is still more preferable that it is an oxime compound. Moreover, as a photoinitiator, Paragraphs 0065 of Unexamined-Japanese-Patent No. 2014-130173 - 0111, the compound of Unexamined-Japanese-Patent No. 6301489, MATERIAL STAGE 37-60p, vol. 19, no. 3, a peroxide-based photopolymerization initiator described in 2019, a photopolymerization initiator described in International Publication No. 2018/221177, a photopolymerization initiator described in International Publication No. 2018/110179, a photopolymerization initiator described in Japanese Unexamined Patent Publication No. 2019-043864, Photopolymerization initiator described in Japanese Unexamined Patent Publication No. 2019-044030, peroxide-based initiator described in Japanese Unexamined Patent Publication No. 2019-167313, aminoacetophenone-based initiator having an oxazolidine group described in Japanese Unexamined Patent Publication No. 2020-055992, Japanese Unexamined Patent Publication The oxime system photoinitiator of patent publication 2013-190459, etc. are mentioned, These content is integrated in this specification.

Commercially available products of the α-hydroxyketone compound include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (above, manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (above, manufactured by BASF), and the like. can Commercially available products of α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (above, manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, and Irgacure 379EG (above, manufactured by BASF). there is. Examples of commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (above, manufactured by IGM Resins B.V.), Irgacure 819 and Irgacure TPO (above, manufactured by BASF) and the like.

As an oxime compound, the compound described in Unexamined-Japanese-Patent No. 2001-233842, the compound described in Unexamined-Japanese-Patent No. 2000-080068, the compound described in Unexamined-Japanese-Patent No. 2006-342166, J. C. S. Perkin II (1979, pp.1653 -1660), compounds described in J. C. S. Perkin II (1979, pp. 156-162), compounds described in Journal of Photopolymer Science and Technology (1995, pp. 202-232), Japanese Unexamined Patent Publication 2000- A compound described in Japanese Patent Publication No. 066385, a compound described in Japanese Patent Publication No. 2004-534797, a compound described in Japanese Unexamined Patent Publication No. 2017-019766, a compound described in Japanese Patent Publication No. 6065596, a compound described in International Publication No. 2015/152153 A compound, a compound described in International Publication No. 2017/051680, a compound described in Japanese Patent Laid-Open No. 2017-198865, a compound described in Paragraph Nos. 0025 to 0038 of International Publication No. 2017/164127, International Publication No. 2013/167515 and the compounds described in No. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, and 2-acetoxyiminopentan-3-one. , 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, and 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one etc. are mentioned. As commercially available products, Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04 (above, manufactured by BASF), TR-PBG-304 (manufactured by Changzhou Trolly New Electronic Materials Co., Ltd.), Adeka optomer N-1919 (made by ADEKA Co., Ltd., the photoinitiator 2 of Unexamined-Japanese-Patent No. 2012-014052) is mentioned. As the oxime compound, it is also preferable to use a compound having no colorability or a compound having high transparency and hardly discolored. As a commercial item, Adeka Akles NCI-730, NCI-831, NCI-930 (above, made by ADEKA Corporation), etc. are mentioned.

As the photopolymerization initiator, an oxime compound having a fluorene ring can also be used. As a specific example of the oxime compound which has a fluorene ring, the compound of Unexamined-Japanese-Patent No. 2014-137466, the compound of Unexamined-Japanese-Patent No. 6636081, and the compound of Korean Unexamined-Japanese-Patent No. 10-2016-0109444 are mentioned. .

As the photopolymerization initiator, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is a naphthalene ring can also be used. As a specific example of such an oxime compound, the compound of international publication 2013/083505 is mentioned.

As the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. As a specific example of the oxime compound which has a fluorine atom, the compound described in Unexamined-Japanese-Patent No. 2010-262028, the compound described in Unexamined-Japanese-Patent No. 2014-500852, the compound 24, 36-40, and the compound described in Unexamined-Japanese-Patent No. 2013-164471 (C-3) etc. are mentioned.

As the photopolymerization initiator, an oxime compound having a nitro group can be used. It is also preferable to use the oxime compound which has a nitro group as a dimer. As specific examples of the oxime compound having a nitro group, the compounds described in Paragraph Nos. 0031 to 0047 of Unexamined-Japanese-Patent No. 2013-114249, Paragraph Nos. 0008 to 0012, and 0070 to 0079 of Unexamined-Japanese-Patent No. 2014-137466, Japanese Patent Publication The compound described in Paragraph No. 0007 - 0025 of 4223071, Adeka Akles NCI-831 (made by Adeka Co., Ltd.) is mentioned.

As the photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. As a specific example, OE-01 described in international publication 2015/036910 - OE-75 is mentioned.

As the photopolymerization initiator, an oxime compound having a substituent having a hydroxyl group bonded to the carbazole skeleton can also be used. As such a photoinitiator, the compound of international publication 2019/088055, etc. are mentioned.

As the photopolymerization initiator, an oxime compound having an aromatic ring group Ar ^OX1 in which an electron withdrawing group is introduced into an aromatic ring (hereinafter, also referred to as oxime compound OX) can also be used. Examples of the electron withdrawing group possessed by the aromatic ring group Ar ^OX1 include an acyl group, a nitro group, a trifluoromethyl group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, and a cyano group, and an acyl group and A nitro group is preferable, and an acyl group is more preferable, and a benzoyl group is more preferable because it is easy to form a film having excellent light resistance. The benzoyl group may have a substituent. As the substituent, a halogen atom, a cyano group, a nitro group, a hydroxy group, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, a heterocyclic group, a heterocyclic oxy group, an alkenyl group, an alkylsulfanyl group, an arylsulfanyl group, It is preferably an acyl group or an amino group, more preferably an alkyl group, an alkoxy group, an aryl group, an aryloxy group, a heterocyclic oxy group, an alkylsulfanyl group, an arylsulfanyl group or an amino group, and an alkoxy group, an alkylsulfanyl group or an amino group. it is more preferable

The oxime compound OX is preferably at least one selected from compounds represented by formula (OX1) and compounds represented by formula (OX2), and more preferably is a compound represented by formula (OX2).

[Formula 4]

In the formula, R ^X1 is an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aryloxy group, a heterocyclic group, a heterocyclic oxy group, an alkylsulfanyl group, an arylsulfanyl group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, represents an arylsulfonyl group, an acyl group, an acyloxy group, an amino group, a phosphinoyl group, a carbamoyl group or a sulfamoyl group;

R ^X2 is an alkyl group, an alkenyl group, an alkoxy group, an aryl group, an aryloxy group, a heterocyclic group, a heterocyclic oxy group, an alkylsulfanyl group, an arylsulfanyl group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group , Representing an acyloxy group or an amino group,

R ^X3 and R ^X14 each independently represent a hydrogen atom or a substituent;

However, at least one of R ^X10 to R ^X14 is an electron withdrawing group.

Examples of the electron withdrawing group include an acyl group, a nitro group, a trifluoromethyl group, an alkyl sulfinyl group, an aryl sulfinyl group, an alkyl sulfonyl group, an aryl sulfonyl group, and a cyano group. An acyl group and a nitro group are preferred, and light resistance For the reason that it is easy to form this excellent film, it is more preferable that it is an acyl group, and it is more preferable that it is a benzoyl group.

In the above formula, it is preferable that R ^X12 is an electron withdrawing group, and R ^X10 , R ^X11 , R ^X13 , and R ^X14 are hydrogen atoms.

As a specific example of oxime compound OX, the compound of Paragraph No. 0083 of Japanese Patent Publication 4600600 - 0105 is mentioned.

Although the specific example of the oxime compound preferably used in this invention is shown below, this invention is not limited to these.

[Formula 5]

[Formula 6]

The oxime compound is preferably a compound having a maximum absorption wavelength in a wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in a wavelength range of 360 to 480 nm. Further, the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or a wavelength of 405 nm is preferably high, more preferably 1000 to 300000, more preferably 2000 to 300000, and more preferably 5000 to 200000, from the viewpoint of sensitivity. is particularly preferred. The molar extinction coefficient of a compound can be measured using a known method. For example, it is preferable to measure at a concentration of 0.01 g/L using a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian) using an ethyl acetate solvent.

As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used. Since two or more radicals generate|occur|produce from one molecule of radical photopolymerization initiator by using such a radical photopolymerization initiator, favorable sensitivity is obtained. Moreover, in the case of using a compound with an asymmetric structure, crystallinity is lowered, solubility in a solvent or the like is improved, and it is difficult to precipitate over time, so that the stability over time of the photosensitive composition can be improved. As a specific example of a bifunctional or trifunctional or more than trifunctional radical photopolymerization initiator, paragraphs of Japanese Patent Publication No. 2010-527339, Japanese Patent Publication No. 2011-524436, International Publication No. 2015/004565, Japanese Patent Publication No. 2016-532675 Dimers of oxime compounds described in No. 0407 to 0412, International Publication No. 2017/033680, Paragraph Nos. 0039 to 0055, compounds (E) and compounds (G) described in Japanese Patent Publication No. 2013-522445, Cmpd 1 to 7 described in International Publication No. 2016/034963, oxime ester photoinitiator described in Paragraph No. 0007 of Japanese Patent Publication No. 2017-523465, Paragraph Nos. 0020 to 0033 of Japanese Unexamined Patent Publication No. 2017-167399 The photoinitiator described in, the photoinitiator (A) described in Paragraph Nos. 0017-0026 of Unexamined-Japanese-Patent No. 2017-151342, the oxime ester photoinitiator described in Japanese Patent Publication No. 6469669, etc. are mentioned.

As for content of the photoinitiator in the total solids of the photosensitive composition, 1-10 mass % is preferable. 2 mass % or more is preferable and, as for a minimum, 3 mass % or more is more preferable. 8 mass % or less is preferable and, as for an upper limit, 6 mass % or less is more preferable. A photoinitiator may be used individually by 1 type, or may use 2 or more types together. When using 2 or more types together, it is preferable that their sum total is the said range.

<<polymerizable monomers>>

The photosensitive composition of the present invention contains a polymerizable monomer C (hereinafter referred to as a polymerizable monomer) having an ethylenically unsaturated bond-containing group. Examples of the ethylenically unsaturated bond-containing group of the polymerizable monomer include a vinyl group, a (meth)allyl group, and a (meth)acryloyl group. It is preferable that the polymerizable monomer used in this invention is a radically polymerizable monomer.

As for the molecular weight of a polymerizable monomer, 100 or more and less than 3000 are preferable. As for an upper limit, 2000 or less are more preferable, and 1500 or less are still more preferable. As for a lower limit, 150 or more are more preferable, and 250 or more are still more preferable. It is also preferable that the polymerizable monomer is a compound having no molecular weight distribution.

The polymerizable monomer preferably includes a 1 to 10 functional polymerizable monomer having 1 to 10 ethylenically unsaturated bond-containing groups, and a 2 to 8 functional polymerizable monomer having 2 to 8 ethylenically unsaturated bond-containing groups. It is more preferable to include a sexual monomer, and it is more preferable to include a 2 to 6 functional polymerizable monomer having 2 to 6 ethylenically unsaturated bond-containing groups. In addition, the polymerizable monomer preferably contains a 1-10 functional (meth)acrylate compound, more preferably contains a 2-8 functional (meth)acrylate compound, and a 2-6 functional (meth)acrylate compound. It is more preferable to include a meth)acrylate compound. As a specific example of a polymerizable monomer, Paragraph No. 0095 of Unexamined-Japanese-Patent No. 2009-288705 - 0108, Paragraph 0227 of Unexamined-Japanese-Patent No. 2013-029760, Paragraph No. 0254-0257 of Unexamined-Japanese-Patent No. 2008-292970, Unexamined-Japanese-Patent No. Paragraph Nos. 0034 to 0038 of 2013-253224, Paragraph No. 0477 of Japanese Laid-open Patent Publication No. 2012-208494, Japanese Unexamined Patent Publication No. 2017-048367, Japanese Patent Publication No. 6057891, Japanese Patent Publication No. 6031807 can be mentioned, and these contents are incorporated in this specification.

The ethylenically unsaturated bond-containing group of the polymerizable monomer (hereinafter also referred to as C = C value) is preferably 1.0 to 15.0 mmol/g. It is preferable that it is 1.5 mmol/g or more, and, as for a minimum, it is more preferable that it is 2.0 mmol/g or more. It is preferable that it is 14.0 mmol/g or less, and, as for an upper limit, it is more preferable that it is 12.0 mmol/g or less.

As the polymerizable monomer, dipentaerythritol triacrylate (as a commercial product, KAYARAD D-330; Nippon Kayaku Co., Ltd. product), dipentaerythritol tetraacrylate (as a commercial product, KAYARAD D-320; Nippon Kayaku Co., Ltd.) product), dipentaerythritol penta(meth)acrylate (as a commercial product, KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (as a commercial product, KAYARAD DPHA; Nippon Kayaku ( Co., Ltd., NK Ester A-DPH-12E; manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), and these (meth)acryloyl groups are bonded via ethylene glycol and/or propylene glycol residues. A compound having the structure (for example, SR454 and SR499 commercially available from Sartomer) is preferred. Moreover, as a polymerizable monomer, diglycerol EO (ethylene oxide) modified (meth)acrylate (as a commercial product M-460; Toagosei make), pentaerythritol tetraacrylate (Shin Nakamura Chemical Industry Co., Ltd. product, NK Ester A-TMMT), 1,6-Hexanedioldiacrylate (Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (Nippon Kayaku Co., Ltd.), Aronix TO-2349 (Toa Kosei Co., Ltd.), NK Oligo UA-7200 (Shin Nakamura Kagaku Kogyo Co., Ltd.), DPHA-40H (Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH -600, T-600, AI-600, LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (above, manufactured by Taisei Fine Chemical Co., Ltd.), light acrylate POB -A0 (manufactured by Kyoeisha Chemical Co., Ltd.) or the like can also be used.

Polymerizable monomers include trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide modified tri(meth)acrylate, trimethylolpropane ethylene oxide modified tri(meth)acrylate, isocyanate Trifunctional (meth)acrylate compounds such as ethylene oxide-modified tri(meth)acrylate and pentaerythritol tri(meth)acrylate can also be used. As commercially available products of trifunctional (meth)acrylate compounds, Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305 , M-303, M-452, M-450 (manufactured by Toagosei Co., Ltd.), NK ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A -TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin Nakamura Kagaku Kogyo Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.) ) and the like.

Moreover, the compound which has an acidic radical can also be used for a polymerizable monomer. By using a polymerizable monomer having an acid group, the polymerizable monomer in the unexposed area is easily removed during development, and generation of development residue can be suppressed. As an acid group, a carboxyl group, a sulfo group, a phosphoric acid group, etc. are mentioned, and a carboxyl group is preferable. Examples of the polymerizable monomer having an acid group include succinic acid-modified dipentaerythritol penta(meth)acrylate. As a commercial item of the polymeric monomer which has an acid group, Aronix M-510, M-520, Aronix TO-2349 (Toagosei Co., Ltd. product), etc. are mentioned. A preferable acid value of the polymerizable monomer having an acid group is 0.1 to 40 mgKOH/g, more preferably 5 to 30 mgKOH/g. When the acid value of the polymerizable monomer is 0.1 mgKOH/g or more, solubility in a developing solution is good, and when it is 40 mgKOH/g or less, it is advantageous in terms of production and handling.

Moreover, the polymerizable monomer which has an alkyleneoxy group can also be used for a polymerizable monomer. The polymerizable monomer having an alkyleneoxy group is preferably a polymerizable monomer having an ethyleneoxy group and/or a propyleneoxy group, more preferably a polymerizable monomer having an ethyleneoxy group, and 3 to 6 having 4 to 20 ethyleneoxy groups. Functional (meth)acrylate compounds are more preferred. Examples of commercially available polymerizable monomers having an alkyleneoxy group include SR-494, which is a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer , and a trifunctional (meth)acrylate having three isobutyleneoxy groups. ) KAYARAD TPA-330 etc. which are acrylates are mentioned.

As the polymerizable monomer, it is also preferable to use a polymerizable monomer having a fluorene skeleton. By using a polymerizable monomer having a fluorene skeleton, organic pigments can be adsorbed and the degree of curing by exposure can be increased, so that the effects of the present invention can be obtained more remarkably. It is preferable that the polymerizable monomer which has a fluorene backbone is a bifunctional polymerizable monomer.

Examples of the polymerizable monomer having a fluorene skeleton include compounds having a partial structure represented by the following formula (Fr).

[Formula 7]

In the formula, a broken line represents a bond, R ^f1 and R ^f2 each independently represent a substituent, and m and n each independently represent an integer of 0 to 5. When m is 2 or more, m ^Rf1 's may be the same or different, and two ^Rf1 's among the m ^Rf1's may be bonded to each other to form a ring. When n is 2 or more, n R ^{f2 '} s may be the same or different, and two of the n R ^{f2 '} s may be bonded to each other to form a ring. As the substituent represented by R ^f1 and R ^f2 , a halogen atom, a cyano group, a nitro group, an alkyl group, an aryl group, a heteroaryl group, -OR ^f11 , -COR ^f12 , -COOR ^f13 , -OCOR ^f14 , -NR ^f15 R ^f16 , -NHCOR ^f17 , -CONR ^f18 R ^f19 , -NHCONR ^f20 R ^f21 , -NHCOOR ^f22 , -SR ^f23 , -SO ₂ R ^f24 , -SO ₂ OR ^f25 , -NHSO ₂ R ^f26 or -SO ₂ NR ^f27 R ^f28 can be mentioned. R ^f11 to R ^f28 each independently represent a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group.

Specific examples of the polymerizable monomer having a fluorene skeleton include compounds having the following structures. Moreover, as a commercial item of the polymeric monomer which has a fluorene skeleton, Ogsol EA-0200, EA-0300 (Osaka Gas Chemical Co., Ltd. product, (meth)acrylate monomer which has a fluorene skeleton), etc. are mentioned.

[Formula 8]

As the polymerizable monomer, compounds represented by the following formulas (MO-1) to (MO-6) can also be used. In addition, in formula, when T is an oxyalkylene group, the terminal on the carbon atom side couple|bonds with R.

[Formula 9]

In the above formula, n is 0 to 14, m is 1 to 8. A plurality of R and T present in one molecule may be the same or different.

In each of the compounds represented by the formulas (MO-1) to (MO-6), at least one of the plurality of Rs is -OC(=O)CH=CH ₂ , -OC(=O)C(CH _{3 )} )=CH ₂ , -NHC(=O)CH=CH ₂ or -NHC(=O)C(CH ₃ )=CH ₂ .

As a specific example of the polymeric compound represented by the said formula (MO-1) - (MO-6), the compound described in Paragraph 0248 of Unexamined-Japanese-Patent No. 2007-269779 - 0251 is mentioned.

As the polymerizable monomer, it is also preferable to use a compound having a caprolactone structure. A compound having a caprolactone structure is preferably a compound represented by the following formula (Z-1).

[Formula 10]

In formula (Z-1), all 6 R's are groups represented by formula (Z-2), or 1 to 5 of 6 R's are groups represented by formula (Z-2), and the remainder is a group represented by formula (Z It is a group represented by -3), an acid group or a hydroxyl group.

[Formula 11]

In formula (Z-2), R ¹ represents a hydrogen atom or a methyl group, m represents the number of 1 or 2 , and “*” represents a bond.

[Formula 12]

In formula (Z-3), R ¹ represents a hydrogen atom or a methyl group, and “*” represents a bond.

Examples of commercially available polymerizable monomers having a caprolactone structure include KAYARAD DPCA-20, DPCA-30, DPCA-60, and DPCA-120 (manufactured by Nippon Kayaku Co., Ltd.).

As the polymerizable monomer, a compound represented by formula (Z-4) or (Z-5) can also be used.

[Formula 13]

In formulas (Z-4) and (Z-5), E is each independently -((CH ₂ ) _y CH ₂ O)-, or -((CH ₂ ) _y CH(CH ₃ )O)- , y each independently represents an integer of 0 to 10, and X each independently represents a (meth)acryloyl group, a hydrogen atom, or a carboxyl group. In formula (Z-4), the total number of (meth)acryloyl groups is 3 or 4, m each independently represents an integer of 0 to 10, and the total of each m is an integer of 0 to 40. In formula (Z-5), the total number of (meth)acryloyl groups is 5 or 6, each n independently represents an integer of 0 to 10, and the total of each n is an integer of 0 to 60.

In formula (Z-4), m has a preferable integer of 0-6, and a more preferable integer of 0-4. Moreover, the sum of each m is preferably an integer of 2 to 40, more preferably an integer of 2 to 16, and particularly preferably an integer of 4 to 8.

In Formula (Z-5), n has a preferable integer of 0-6, and the integer of 0-4 is more preferable. Moreover, the sum of each n is preferably an integer of 3 to 60, more preferably an integer of 3 to 24, and particularly preferably an integer of 6 to 12.

Further, -((CH ₂ ) _y CH ₂ O)- or -((CH ₂ ) _y CH(CH ₃ ) O)- in the formula (Z-4) or formula (Z-5) is on the oxygen atom side A form in which the terminal is bonded to X is preferable.

The content of the polymerizable monomer in the total solids of the photosensitive composition is 4% by mass or more, preferably 4 to 20% by mass. It is preferable that it is 17 mass % or less, and, as for an upper limit, it is more preferable that it is 15 mass % or less. The lower limit is preferably 5% by mass or more, more preferably 68% by mass or more, still more preferably 10% by mass or more, and still more preferably 12% by mass or more.

Further, the content of the polymerizable monomer is 5 to 200 parts by mass, preferably 10 to 100 parts by mass, more preferably 15 to 90 parts by mass, and preferably 20 to 80 parts by mass with respect to 100 parts by mass of the polymerizable resin. It is more preferable, and it is especially preferable that it is 25-75 mass parts.

Further, the content of the polymerizable monomer is preferably 100 to 1000 parts by mass, more preferably 200 to 800 parts by mass, and still more preferably 300 to 600 parts by mass with respect to 100 parts by mass of the photopolymerization initiator.

The photosensitive composition of this invention may contain 2 or more types of polymerizable monomers. When the photosensitive composition of this invention contains 2 or more types of polymerizable monomers, those total amounts are the said range.

When the photosensitive composition of the present invention contains two or more types of polymerizable monomers, it is preferable to use together polymerizable monomers having different numbers of ethylenically unsaturated bond-containing groups. In this case, a 1-3 functional polymerizable monomer C1 having 1 to 3 ethylenically unsaturated bond-containing groups and a 4-10 functional polymerizable monomer C2 having 4 to 10 ethylenically unsaturated bond-containing groups are used in combination. it is desirable According to this aspect, crosslinking can be performed at a higher density. Moreover, it is preferable that polymerizable monomer C1 is a bifunctional polymerizable monomer. Moreover, it is also preferable that polymerizable monomer C1 is a polymerizable monomer which has a fluorene backbone. Moreover, it is preferable that it is a 4-8 functional polymerizable monomer, and, as for polymerizable monomer C2, it is more preferable that it is a 6-8 functional polymerizable monomer. When using together polymerizable monomer C1 and polymerizable monomer C2, it is preferable that the ratio of both is 10-5000 mass parts of polymerizable monomer C1 with respect to 100 mass parts of polymerizable monomer C2. The lower limit is preferably 20 parts by mass or more, more preferably 30 parts by mass or more, still more preferably 40 parts by mass or more, and particularly preferably 50 parts by mass or more. The upper limit is preferably 3000 parts by mass or less, more preferably 2000 parts by mass or less, still more preferably 1000 parts by mass or less, still more preferably 500 parts by mass or less, and particularly preferably 200 parts by mass or less.

<<Polymeric Resins>>

The photosensitive composition of the present invention contains a polymerizable resin D (hereinafter referred to as a polymerizable resin) having an ethylenically unsaturated bond-containing group. Examples of the ethylenically unsaturated bond-containing group of the polymerizable resin include a vinyl group, a (meth)allyl group, and a (meth)acryloyl group.

The weight average molecular weight of the polymerizable resin is preferably 3000 or more, more preferably 3000 to 50000, still more preferably 5000 to 50000, particularly preferably 5000 to 40000.

The C=C value of the polymerizable resin is preferably 0.04 to 2.0 mmol/g. It is preferable that it is 1.5 mmol/g or less, and, as for an upper limit, it is more preferable that it is 1.0 mmol/g or less. It is preferable that it is 0.1 mmol/g or more, and, as for a minimum, it is more preferable that it is 0.2 mmol/g or more.

The polymerizable resin is preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in the side chain, and more preferably a resin containing a repeating unit represented by the following formula (A-1-1). Further, in the polymerizable resin, the content of the repeating unit having an ethylenically unsaturated bond-containing group is preferably 10 mol% or more, more preferably 10 to 80 mol%, and 20 to 80% by mol, based on all repeating units of the polymerizable resin. It is more preferable that it is 70 mol%.

[Formula 14]

In the formula (A-1-1), X ¹ represents a trivalent linking group, L ¹ represents a single bond or a divalent linking group, and Y ¹ represents an ethylenically unsaturated bond-containing group.

Examples of the trivalent linking group represented by X ¹ in formula (A-1-1) include a poly(meth)acrylic linking group, a polyalkyleneimine linking group, a polyester linking group, a polyurethane linking group, a polyurea linking group, and a polyamide. A poly(meth)acrylic coupling group, a polyalkyleneimine coupling group, and a polyester coupling group are preferred, and a poly(meth)acrylic coupling group is more preferred.

Examples of the divalent linking group represented by L ¹ in formula (A-1-1) include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an alkyleneoxy group (preferably an alkyleneoxy group having 1 to 12 carbon atoms), An oxyalkylenecarbonyl group (preferably an oxyalkylenecarbonyl group having 1 to 12 carbon atoms), an arylene group (preferably an arylene group having 6 to 20 carbon atoms), -NH-, -SO-, -SO ₂ -, - Group formed by combining CO-, -O-, -COO-, -OCO-, -S-, and two or more of these is mentioned. The alkylene group in the alkylene group and the alkyleneoxy group and the alkylene group in the oxyalkylenecarbonyl group may be linear, branched or cyclic, preferably linear or branched. Moreover, the alkylene group in an alkylene group and an alkyleneoxy group, and the alkylene group in an oxyalkylene carbonyl group may have a substituent, and may be unsubstituted. As a substituent, a hydroxyl group, an alkoxy group, etc. are mentioned, and a hydroxyl group is preferable from a manufacturing aptitude viewpoint.

Examples of the ethylenically unsaturated bond-containing group represented by Y ¹ of formula (A-1-1) include a vinyl group, a (meth)allyl group, a (meth)acryloyl group and a styrene group, and a (meth)acryloyl group , A styrene group is preferable, a (meth)acryloyl group is more preferable, and an acryloyl group is particularly preferable.

As a specific example of the repeating unit represented by formula (A-1-1), the repeating unit represented by the following formula (A-1-1a), the repeating unit represented by the following formula (A-1-1b), etc. are mentioned.

[Formula 15]

In formula (A-1-1a), R ^a1 to R ^a3 each independently represent a hydrogen atom or an alkyl group, and Q ^1a is -CO-, -COO-, -OCO-, -CONH- or phenylene. group, L ¹ represents a single bond or a divalent linking group, and Y ¹ represents an ethylenically unsaturated bond-containing group. The number of carbon atoms in the alkyl group represented by R ^a1 to R ^a3 is preferably 1 to 10, more preferably 1 to 3, still more preferably 1. Q ^1a is preferably -COO- or -CONH-, and more preferably -COO-.

In formula (A-1-1b), R ^a10 and R ^a11 each independently represent a hydrogen atom or an alkyl group, m1 represents an integer of 1 to 5, and L ¹ represents a single bond or a divalent linking group. , Y ¹ represents an ethylenically unsaturated bond-containing group. 1-10 are preferable and, as for carbon number of the alkyl group represented by R ^a10 and R ^a11 , 1-3 are more preferable.

It is also preferable that the polymerizable resin is a resin having a graft chain. Examples of the resin having a graft chain include a resin containing repeating units having a graft chain. A polymerizable resin having a graft chain can be preferably used as a dispersing agent. When a polymerizable resin having a graft chain is used, the polymerizable resin polymerizes near the colorant during exposure to reliably retain the colorant in the film, effectively suppressing thermal diffusion of these compounds by heating. In addition, the graft chain means a molecular chain branched from the main chain. In addition, a main chain means the molecular chain with the most branch points.

The weight average molecular weight of the graft chain is preferably 500 to 30000, more preferably 1000 to 20000, still more preferably 2000 to 10000.

The graft chain includes a repeating unit of at least one structure selected from a polyester structure, a polyether structure, a poly(meth)acrylic structure, a polystyrene structure, a polyurethane structure, a polyurea structure, and a polyamide structure. It is preferable, and it is more preferable to include a repeating unit of at least one structure selected from a polyester structure, a polyether structure, and a poly(meth)acrylic structure, and it is still more preferable to include a repeating unit of a polyester structure. do. As a repeating unit of a polyester structure, the repeating unit of the structure represented by the following formula (G-1), formula (G-4), or formula (G-5) is mentioned. Moreover, as a repeating unit of a polyether structure, the repeating unit of the structure represented by the following formula (G-2) is mentioned. Moreover, as a repeating unit of a poly(meth)acryl structure, the repeating unit of the structure represented by the following formula (G-3) is mentioned.

[Formula 16]

In the above formula, R ^G1 and R ^G2 each represent an alkylene group. As the alkylene group represented by R ^G1 and R ^G2 , a straight-chain or branched alkylene group having 1 to 20 carbon atoms is preferable, a straight-chain or branched alkylene group having 2 to 16 carbon atoms is more preferable, and a straight-chain or branched alkylene group having 3 to 12 carbon atoms A chain or branched alkylene group is more preferred.

In the above formula, R ^G3 represents a hydrogen atom or a methyl group.

In the above formula, Q ^G1 represents -O- or -NH-.

In the above formula, L ^G1 represents a single bond or a divalent linking group. Examples of the divalent linking group include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an alkyleneoxy group (preferably an alkyleneoxy group having 1 to 12 carbon atoms), and an oxyalkylenecarbonyl group (preferably having 1 to 12 carbon atoms). oxyalkylenecarbonyl group), an arylene group (preferably an arylene group having 6 to 20 carbon atoms), -NH-, -SO-, -SO ₂ -, -CO-, -O-, -COO-, OCO- , -S-, and a group formed by combining two or more thereof.

R ^G4 represents a hydrogen atom or a substituent. Examples of the substituent include an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthioether group, an arylthioether group, a heteroarylthioether group, an ethylenically unsaturated bond-containing group, and a cyclic ether group. and a block isocyanate group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a (meth)allyl group, and a (meth)acryloyl group. As a cyclic ether group, an epoxy group, an oxetanyl group, etc. are mentioned.

The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. Examples of the substituent include an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthioether group, an arylthioether group, and a heteroarylthioether group. Among them, from the viewpoint of improving the dispersibility of the pigment, a group having a steric repulsive effect is preferable, and an alkyl group or alkoxy group having 5 to 30 carbon atoms is preferable. The alkyl group and the alkoxy group may be linear, branched or cyclic, preferably linear or branched.

It is preferable that polymeric resin is resin containing the repeating unit represented by following formula (A-1-2).

[Formula 17]

In formula (A-1-2), X ² represents a trivalent linking group, L ² represents a single bond or a divalent linking group, and W ¹ represents a graft chain.

Examples of the trivalent linking group represented by X ² in the formula (A-1-2) include the trivalent linking group represented by X ¹ in the formula (A-1-1), and the preferred range is also the same. Examples of the divalent linking group represented by L ² in formula (A-1-2) include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an arylene group (preferably an arylene group having 6 to 20 carbon atoms), -NH -, -SO-, _-SO2- , -CO-, -O-, -COO-, -OCO-, -S-, and groups formed by combining two or more of these. Examples of the graft chain represented by W ¹ in the formula (A-1-2) include the graft chains described above.

As a specific example of the repeating unit represented by formula (A-1-2), the repeating unit represented by the following formula (A-1-2a), the repeating unit represented by the following formula (A-1-2b), etc. are mentioned.

[Formula 18]

In the formula (A-1-2a), R ^b1 to R ^b3 each independently represent a hydrogen atom or an alkyl group, and Q ^b1 is -CO-, -COO-, -OCO-, -CONH- or phenylene. group, L ² represents a single bond or a divalent linking group, and W ¹ represents a graft chain. As for carbon number of the alkyl group represented by ^Rb1 - ^Rb3 , 1-10 are preferable, 1-3 are more preferable, and 1 is still more preferable. Q ^b1 is preferably -COO- or -CONH-, and more preferably -COO-.

In the formula (A-1-2b), R ^b10 and R ^b11 each independently represent a hydrogen atom or an alkyl group, m2 represents an integer of 1 to 5, and L ² represents a single bond or a divalent linking group. , W ¹ represents a graft chain. 1-10 are preferable and, as for carbon number of the alkyl group represented by ^Rb10 and ^Rb11 , 1-3 are more preferable.

When the polymerizable resin contains a repeating unit having a graft chain, the weight average molecular weight (Mw) of the repeating unit having a graft chain is preferably 1000 or more, more preferably 1000 to 10000, and 1000 to 7500 more preferable In the present invention, the weight average molecular weight of the repeating unit having a graft chain is a value calculated from the weight average molecular weight of raw material monomers used for polymerization of the same repeating unit. For example, a repeating unit having a graft chain can be formed by polymerizing a macromonomer. Here, a macromonomer means a high molecular compound in which a polymerizable group is introduced into a polymer terminal. When a repeating unit having a graft chain is formed using a macromonomer, the weight average molecular weight of the macromonomer corresponds to the repeating unit having a graft chain.

When the polymerizable resin contains the repeating unit represented by the formula (A-1-2), the content of the repeating unit represented by the formula (A-1-2) is 1.0 to 60 mol% of all repeating units of the polymerizable resin. It is preferable that it is, and it is more preferable that it is 1.5-50 mol%.

It is also preferable that the polymerizable resin further contains a repeating unit having an acid group. When the polymerizable resin further contains a repeating unit having an acid group, dispersibility of a pigment or the like can be further improved. Furthermore, developability can also be improved. As an acidic group, a carboxyl group, a sulfo group, and a phosphoric acid group are mentioned.

When the polymerizable resin contains a repeating unit having an acid group, the content of the repeating unit having an acid group is preferably 80 mol% or less, more preferably 10 to 80 mol%, based on all repeating units of the polymerizable resin. When polymerizable resin contains the repeating unit which has an acid group, it is preferable that it is 20-150 mgKOH/g as an acid value of polymerizable resin. As for an upper limit, it is more preferable that it is 100 mgKOH/g or less. It is preferable that it is 30 mgKOH/g or more, and, as for a minimum, it is more preferable that it is 35 mgKOH/g or more. When the acid value of the polymerizable resin is within the above range, particularly excellent dispersibility is easily obtained. Furthermore, excellent developability is easy to be obtained.

It is also preferable that polymerizable resin is resin containing the repeating unit represented by Formula (Ac-1).

[Formula 19]

In formula (Ac-1), Ar ¹⁰ represents a group containing an aromatic carboxyl group, L ¹¹ represents -COO- or -CONH-, L ¹² represents a trivalent linking group, and P ¹⁰ contains an ethylenically unsaturated bond. represents a polymer chain having a group.

Examples of the group containing an aromatic carboxyl group represented by Ar ¹⁰ in the formula (Ac-1) include a structure derived from an aromatic tricarboxylic acid anhydride and a structure derived from an aromatic tetracarboxylic acid anhydride. Examples of the aromatic tricarboxylic acid anhydride and the aromatic tetracarboxylic acid anhydride include compounds having the following structures.

[Formula 20]

In the above formula, Q ¹ is represented by a single bond, -O-, -CO-, -COOCH ₂ CH ₂ OCO-, -SO ₂ -, -C(CF ₃ ) ₂ -, the following formula (Q-1) group or a group represented by the following formula (Q-2).

[Formula 21]

[Formula 22]

In formula (Ar-11), n1 represents an integer of 1 to 4, preferably 1 or 2, and more preferably 2.

In formula (Ar-12), n2 represents an integer of 1 to 8, preferably an integer of 1 to 4, more preferably 1 or 2, still more preferably 2.

In formula (Ar-13), n3 and n4 each independently represent an integer of 0 to 4, preferably an integer of 0 to 2, more preferably 1 or 2, still more preferably 1. However, at least one of n3 and n4 is an integer greater than or equal to 1.

In formula (Ar-13), Q ¹ is a single bond, -O-, -CO-, -COOCH ₂ CH ₂ OCO-, -SO ₂ -, -C(CF ₃ ) ₂ -, the above formula (Q- The group represented by 1) or the group represented by the formula (Q-2) is shown.

In formulas (Ar-11) to (Ar-13), *1 represents a bonding position with L ¹¹ .

L ¹¹ of the formula (Ac-1) represents -COO- or -CONH-, and preferably represents -COO-.

Examples of the trivalent linking group represented by L ¹² in the formula (Ac-1) include a hydrocarbon group, -O-, -CO-, -COO-, -OCO-, -NH-, and -S-, and two or more of these. Combined groups can be mentioned. The hydrocarbon group includes an aliphatic hydrocarbon group and an aromatic hydrocarbon group. 1-30 are preferable, as for carbon number of an aliphatic hydrocarbon group, 1-20 are more preferable, and 1-15 are more preferable. The aliphatic hydrocarbon group may be straight chain, branched or cyclic. 6-30 are preferable, as for carbon number of an aromatic hydrocarbon group, 6-20 are more preferable, and 6-10 are more preferable. The hydrocarbon group may have a substituent. A hydroxyl group etc. are mentioned as a substituent. The trivalent linking group represented by L ¹² is preferably a group represented by formula (L12-1), and more preferably a group represented by formula (L12-2).

[Formula 23]

In formula (L12-1), L ^12b represents a trivalent linking group, X ¹ represents S, *1 represents a bonding position with L ¹¹ in formula (Ac-1), and *2 represents the formula (Ac- 1) shows a binding position with P ¹⁰ . Examples of the trivalent linking group represented by L ^12b include a hydrocarbon group; and a group obtained by combining a hydrocarbon group with at least one selected from -O-, -CO-, -COO-, -OCO-, -NH-, and -S-; It is preferable that it is a group combining -O-.

In formula (L12-2), L ^12c represents a trivalent linking group, X ¹ represents S, *1 represents a bonding position with L ¹¹ in formula (Ac-1), and *2 represents the formula (Ac- 1) shows a binding position with P ¹⁰ . Examples of the trivalent linking group represented by L ^12c include a hydrocarbon group; and a group obtained by combining a hydrocarbon group with at least one selected from -O-, -CO-, -COO-, -OCO-, -NH-, and -S-, and a hydrocarbon group is preferable.

P ¹⁰ in the formula (Ac-1) represents a polymer chain having an ethylenically unsaturated bond-containing group. The polymer chain represented by P ¹⁰ repeats at least one structure selected from a polyester structure, a polyether structure, a poly(meth)acryl structure, a polystyrene structure, a polyurethane structure, a polyurethane structure, and a polyamide structure. It preferably contains a unit, and more preferably includes a repeating unit of at least one structure selected from a polyester structure, a polyether structure, and a poly(meth)acrylic structure, and includes a repeating unit of a polyester structure. It is more desirable to As a repeating unit of a polyester structure, the repeating unit of the structure represented by the above-mentioned formula (G-1), formula (G-4), or formula (G-5) is mentioned. Moreover, as a repeating unit of a polyether structure, the repeating unit of the structure represented by the formula (G-2) mentioned above is mentioned. Moreover, as a repeating unit of a poly(meth)acryl structure, the repeating unit of the structure represented by the formula (G-3) mentioned above is mentioned.

Further, with respect to the polymer chain represented by P ¹⁰ , the ratio of repeating units containing ethylenically unsaturated bond-containing groups in their side chains in all the repeating units constituting P ¹⁰ is preferably 5% by mass or more, and preferably 10% by mass or more. It is more preferable, and it is more preferable that it is 20 mass % or more. The upper limit can be 100% by mass, preferably 90% by mass or less, and more preferably 60% by mass or less.

Moreover, it is also preferable that the polymer chain represented by P ¹⁰ has a repeating unit containing an acid group. As an acidic group, a carboxyl group, a phosphoric acid group, a sulfo group, a phenolic hydroxyl group, etc. are mentioned. According to this aspect, the dispersibility of the pigment in the composition can be further improved. Furthermore, developability can also be improved more. It is preferable that it is 1-30 mass %, it is more preferable that it is 2-20 mass %, and, as for the ratio of the repeating unit containing an acidic radical, it is more preferable that it is 3-10 mass %.

As for the weight average molecular weight of the polymer chain which P ^<10> represents, 500-20000 are preferable. 600 or more are preferable and, as for a minimum, 1000 or more are more preferable. The upper limit is preferably 10000 or less, more preferably 5000 or less, and still more preferably 3000 or less. When the weight average molecular weight of P ¹⁰ is within the above range, the dispersibility of the pigment in the composition is good. This resin is preferably used as a dispersing agent.

It is preferable that the weight average molecular weight of resin containing the repeating unit represented by Formula (Ac-1) is 3000-35000. The upper limit is preferably 25000 or less, more preferably 20000 or less, and still more preferably 15000 or less. The lower limit is preferably 4000 or more, more preferably 5000 or more, and still more preferably 6000 or more.

As for the acid value of resin containing the repeating unit represented by Formula (Ac-1), 5-200 mgKOH/g is preferable. The upper limit is preferably 150 mgKOH/g or less, more preferably 100 mgKOH/g or less, and still more preferably 80 mgKOH/g or less. The lower limit is preferably 10 mgKOH/g or more, more preferably 15 mgKOH/g or more, and still more preferably 20 mgKOH/g or more.

It is preferable that content of the polymeric resin in the total solids of the photosensitive composition is 1-40 mass %. It is preferable that it is 35 mass % or less, and, as for an upper limit, it is more preferable that it is 30 mass % or less. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, still more preferably 15% by mass or more, and particularly preferably 18% by mass or more.

Moreover, it is preferable that the total amount of the polymerizable monomer and polymerizable resin in the total solid content of the photosensitive composition is 5 to 45% by mass. It is preferable that it is 40 mass % or less, and, as for an upper limit, it is more preferable that it is 38 mass % or less. It is preferable that it is 10 mass % or more, and, as for a minimum, it is more preferable that it is 15 mass % or more.

The photosensitive composition of this invention may contain 2 or more types of polymeric resins. When the photosensitive composition of this invention contains 2 or more types of polymeric resins, those total amounts are the said range.

<<other resins>>

The photosensitive composition of the present invention may contain resins other than the polymerizable resins described above (hereinafter, also referred to as other resins). Other resins are blended for, for example, the use of dispersing a pigment in the photosensitive composition or the use of a binder. In addition, a resin mainly used for dispersing a pigment is also referred to as a dispersing agent. However, such a use of the resin is an example, and it may be used for purposes other than such a use.

As for the weight average molecular weight (Mw) of other resin, 3000-2000000 are preferable. As for an upper limit, 1000000 or less are more preferable, and 500000 or less are still more preferable. As for a lower limit, 4000 or more are more preferable, and 5000 or more are still more preferable.

Examples of other resins include (meth)acrylic resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, and polyarylene ether foams. Spin oxide resin, polyimide resin, polyamide-imide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, etc. are mentioned. These resins may be used individually by 1 type, or 2 or more types may be mixed and used. Moreover, the resin described in Paragraph No. 0041 to 0060 of Unexamined-Japanese-Patent No. 2017-206689, the resin described in Paragraph No. 0022 to 0071 of Unexamined-Japanese-Patent No. 2018-010856, the resin described in Unexamined-Japanese-Patent No. 2017-057265, and the Japanese Unexamined Patent Publication Resin described in Patent Publication No. 2017-032685, resin described in Unexamined-Japanese-Patent No. 2017-075248, and resin described in Unexamined-Japanese-Patent No. 2017-066240 can also be used.

As another resin, it is preferable to use resin which has an acidic radical. According to this aspect, the developability of the composition for pixel formation can be improved. As an acid group, a carboxyl group, a phosphoric acid group, a sulfo group, a phenolic hydroxyl group, etc. are mentioned, and a carboxyl group is preferable. Resin having an acid group can be used as an alkali-soluble resin, for example. The resin having an acid group is preferably a resin containing a repeating unit having an acid group in a side chain, and more preferably a resin containing 5 to 70% by mol of a repeating unit having an acid group in a side chain, out of all repeating units of the resin. It is more preferable that it is 50 mol% or less, and, as for the upper limit of content of the repeating unit which has an acid group in a side chain, it is especially preferable that it is 30 mol% or less. It is more preferable that it is 10 mol% or more, and, as for the lower limit of content of the repeating unit which has an acid group in a side chain, it is especially preferable that it is 20 mol% or more. Regarding the resin having an acid group, description of Paragraph Nos. 0558 to 0571 of Japanese Laid-open Patent Publication No. 2012-208494 (paragraph No. 0685 to 0700 of corresponding US Patent Application Publication No. 2012/0235099) and Japanese Laid-Open Patent Publication No. 2012-198408 The description of Paragraph No. 0076 - 0099 can be considered into consideration, and these content is integrated in this specification. Moreover, a commercial item can also be used for resin which has an acidic radical.

Resin as a dispersing agent can also be used for another resin. As a dispersing agent, an acidic dispersing agent (acidic resin) and a basic dispersing agent (basic resin) are mentioned. Here, the acidic dispersant (acidic resin) represents a resin in which the amount of acid groups is larger than the amount of basic groups. The acidic dispersant (acidic resin) is preferably a resin in which the amount of acid groups accounts for 70 mol% or more when the total amount of the amount of acid groups and the amount of basic groups is 100 mol%, and a resin substantially consisting only of acid groups is more preferable . The acid group that the acidic dispersant (acidic resin) has is preferably a carboxyl group. 40-105 mgKOH/g is preferable, as for the acid value of an acidic dispersing agent (acidic resin), 50-105 mgKOH/g is more preferable, and its 60-105 mgKOH/g is still more preferable. Moreover, a basic dispersing agent (basic resin) shows resin with more basic group quantities than acid group quantities. The basic dispersant (basic resin) is preferably a resin in which the amount of the basic group exceeds 50 mol% when the total amount of the amount of the acid group and the amount of the basic group is 100 mol%. It is preferable that the basic group which a basic dispersing agent has is an amino group. Moreover, it is also preferable that the resin used as a dispersing agent is a graft resin. As graft resin, Paragraph No. 0025 of Unexamined-Japanese-Patent No. 2012-255128 - resin of 0094 are mentioned, This content is integrated in this specification. Moreover, it is also preferable that the resin used as a dispersing agent is a polyimine type dispersing agent containing a nitrogen atom in at least one of a main chain and a side chain. As the polyimine-based dispersant, a resin having a main chain having a partial structure having a functional group with a pKa of 14 or less and a side chain having 40 to 10,000 atoms and having a basic nitrogen atom in at least one of the main chain and the side chain is preferable. The basic nitrogen atom is not particularly limited as long as it is a nitrogen atom showing basicity. As a polyimine type dispersing agent, Paragraph No. 0102 of Unexamined-Japanese-Patent No. 2012-255128 - resin of 0166 are mentioned, This content is integrated in this specification. Moreover, it is also preferable that the resin used as a dispersing agent is a resin of a structure in which a plurality of polymer chains are bonded to a core portion. As such a resin, a dendrimer (including a star-shaped polymer) is mentioned, for example. Moreover, as a specific example of a dendrimer, Paragraph No. 0196 of Unexamined-Japanese-Patent No. 2013-043962 - the high molecular compound C-1 - C-31 of 0209 etc. are mentioned. Moreover, as a dispersing agent, the polyethyleneimine which has a polyester side chain as described in International Publication No. 2016/104803, the block copolymer described in International Publication No. 2019/125940, and the acrylamide structure described in Unexamined-Japanese-Patent No. 2020-066687 A block polymer having a unit, a block polymer having an acrylamide structural unit described in Unexamined-Japanese-Patent No. 2020-066688, or the like can also be used. In addition, the dispersing agent can be obtained as a commercial item, and specific examples thereof include the DISPERBYK series (eg, DISPERBYK-111, 161, etc.) manufactured by BYK Chemie, and the Solsperse series manufactured by Nippon Lubrizol Co., Ltd. (eg, For example, Solsperse 76500 etc.) etc. are mentioned. Moreover, Paragraph No. 0041 of Unexamined-Japanese-Patent No. 2014-130338 - the pigment dispersant of 0130 can also be used, This content is integrated in this specification. In addition, the resin described as the dispersing agent can also be used for applications other than dispersing agents. For example, it can also be used as a binder.

The content of the other resin in the total solids of the photosensitive composition is preferably 10% by mass or less, more preferably 5% by mass or less, still more preferably 1% by mass or less, and particularly preferably 0.5% by mass or less.

Moreover, it is preferable that content of the sum total of the above-mentioned polymeric resin and other resin in the total solids of the photosensitive composition is 1-40 mass %. It is preferable that it is 35 mass % or less, and, as for an upper limit, it is more preferable that it is 30 mass % or less. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, still more preferably 15% by mass or more, and particularly preferably 18% by mass or more.

1 type may be sufficient as another resin, and 2 or more types may be sufficient as it. When containing 2 or more types, it is preferable that their total amount is the said range.

<<Pigment Derivatives>>

The photosensitive composition of the present invention may contain a pigment derivative. As a pigment derivative, the compound which has a structure in which the acidic group or basic group couple|bonded with the pigment skeleton is mentioned. As the pigment skeleton constituting the pigment derivative, quinoline pigment skeleton, benzimidazolone pigment skeleton, benzisoindole pigment skeleton, benzothiazole pigment skeleton, iminium pigment skeleton , squarylium pigment skeleton, croconium pigment skeleton, oxonol pigment skeleton, pyrrolopyrrole pigment skeleton, diketopyrrolopyrrole pigment skeleton, azo pigment skeleton, azomethine pigment skeleton, phthalocyanine pigment skeleton, naphthalocyanine pigment skeleton, anthraquinone pigment skeleton, quinacridone pigment skeleton, dioxazine pigment skeleton, perinone pigment skeleton, perylene pigment skeleton, thioindigo pigment skeleton, isoindoline pigment skeleton, isoindolineone pigment skeleton, quinophthalone pigment skeleton, iminium pigment skeleton , dithiol A pigment skeleton, a triarylmethane pigment skeleton, a pyrromethene pigment skeleton, etc. are mentioned. As an acidic group, a sulfo group, a carboxyl group, a phosphoric acid group, and these salts are mentioned. As the atom or group of atoms constituting the salt, alkali metal ions (Li ⁺ , Na ⁺ , K ⁺ etc.), alkaline earth metal ions (Ca ²⁺ , Mg ²⁺ etc.), ammonium ion, imidazolium ion, pyridinium ion , phosphonium ions, and the like. Examples of the basic group include an amino group, a pyridinyl group and a salt thereof, a salt of an ammonium group, and a phthalimide methyl group. Examples of atoms or groups of atoms constituting the salt include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, phenoxide ions and the like.

As the pigment derivative, a pigment derivative having excellent visible transparency (hereinafter, also referred to as a transparent pigment derivative) may be used. The maximum value (εmax) of the molar extinction coefficient in the wavelength range of 400 to 700 nm of the transparent pigment derivative is preferably 3000 L·mol ^-1 cm ^-1 or less, more preferably 1000 L·mol ^-1 cm ^-1 or less, , more preferably 100 L·mol ^-1 · cm ^-1 or less. The lower limit of εmax is, for example, 1 L·mol ^-1 · cm ^-1 or more, and may be 10 L · mol ^-1 · cm ^-1 or more.

As specific examples of the pigment derivative, the compounds described in the examples described later, Japanese Unexamined Patent Publication Nos. 56-118462, 63-264674, 01-217077, and 03 -009961, Japanese Unexamined Patent Publication No. Hei 03-026767, Japanese Unexamined Patent Publication No. Hei 03-153780, Japanese Unexamined Patent Publication No. Hei 03-045662, Japanese Unexamined Patent Publication No. Hei 04-285669, Japanese Unexamined Patent Publication Hei 06 -145546, Japanese Unexamined Patent Publication No. Hei 06-212088, Japanese Unexamined Patent Publication No. Hei 06-240158, Japanese Unexamined Patent Publication No. Hei 10-030063, Japanese Unexamined Patent Publication No. Hei 10-195326, International Publication No. 2011/ Paragraph No. 0086 to 0098 of International Publication No. 024896, Paragraph No. 0063 to 0094 of International Publication No. 2012/102399, Paragraph No. 0082 of International Publication No. 2017/038252, Paragraph No. 0171 of Japanese Laid-Open Patent Publication No. 2015-151530, Japanese Laid-Open Patent Publication Paragraph Nos. 0162 to 0183 of 2011-252065, Japanese Laid-open Patent Publication No. 2003-081972, Japanese Patent Publication No. 5299151, Japanese Laid-Open Patent Publication 2015-172732, Japanese Laid-Open Patent Publication 2014-199308, Japanese Laid-Open Patent Publication 2014- 085562, Unexamined-Japanese-Patent No. 2014-035351, and the compound of Unexamined-Japanese-Patent No. 2008-081565 are mentioned.

The content of the pigment derivative is preferably 1 to 30 parts by mass, more preferably 3 to 20 parts by mass, based on 100 parts by mass of the color material. A pigment derivative may use only 1 type, and may use 2 or more types together. When using 2 or more types together, it is preferable that their total amount is the said range.

<<Polyalkyleneimine>>

The photosensitive composition of the present invention may contain polyalkyleneimine. The polyalkyleneimine is a polymer obtained by ring-opening polymerization of an alkyleneimine, and is a polymer having a branched structure each containing a primary amino group, a secondary amino group, and a tertiary amino group. As for carbon number of an alkyleneimine, 2-6 are preferable, 2-4 are more preferable, it is more preferable that it is 2 or 3, and it is especially preferable that it is 2.

It is preferable that it is 200 or more, and, as for the molecular weight of polyalkyleneimine, it is more preferable that it is 250 or more. The upper limit is preferably 100000 or less, more preferably 50000 or less, still more preferably 10000 or less, and particularly preferably 2000 or less. In addition, regarding the value of the molecular weight of polyalkyleneimine, when the molecular weight can be calculated from the structural formula, the molecular weight of the polyalkyleneimine is the value calculated from the structural formula. On the other hand, when the molecular weight of a specific amine compound cannot be calculated from the structural formula or is difficult to calculate, the value of the number average molecular weight measured by the boiling point rising method is used. In addition, when it cannot be measured even by the boiling point rising method or when measurement is difficult, the value of the number average molecular weight measured by the viscosity method is used. In addition, if it cannot be measured by the viscosity method or if it is difficult to measure by the viscosity method, the value of the number average molecular weight in terms of polystyrene measured by the GPC (Gel Permeation Chromatography) method is used.

The amine value of the polyalkyleneimine is preferably 5 mmol/g or more, more preferably 10 mmol/g or more, and still more preferably 15 mmol/g or more.

Specific examples of the alkylenimine include ethyleneimine, propyleneimine, 1,2-butyleneimine, and 2,3-butyleneimine, preferably ethyleneimine or propyleneimine, and more preferably ethyleneimine. do. As for polyalkyleneimine, it is especially preferable that it is polyethyleneimine. Further, the polyethyleneimine preferably contains 10 mol% or more of the total amount of the primary amino group, the secondary amino group, and the tertiary amino group, more preferably 20 mol% or more, and 30 mol% It is more preferable to include more than one. As a commercial item of polyethyleneimine, Epomin SP-003, SP-006, SP-012, SP-018, SP-200, P-1000 (above, manufactured by Nippon Shokubai Co., Ltd.), etc. are mentioned.

It is preferable that content of the alkyleneimine in the total solids of the photosensitive composition is 0.1-5 mass %. The lower limit is preferably 0.2% by mass or more, more preferably 0.5% by mass or more, and still more preferably 1% by mass or more. The upper limit is preferably 4.5% by mass or less, more preferably 4% by mass or less, and still more preferably 3% by mass or less. Moreover, it is preferable that content of an alkyleneimine is 0.5-10 mass parts with respect to 100 mass parts of pigments. The lower limit is preferably 0.6 parts by mass or more, more preferably 1 part by mass or more, and still more preferably 2 parts by mass or more. The upper limit is preferably 8 parts by mass or less, more preferably 7 parts by mass or less, and still more preferably 5 parts by mass or less. Alkyleneimine may use only 1 type, and may use 2 or more types. When using 2 or more types, it is preferable that their total amount is the said range.

<<Compound having a cyclic ether group>>

The photosensitive composition of the present invention may contain a compound having a cyclic ether group. As a cyclic ether group, an epoxy group, an oxetanyl group, etc. are mentioned. The compound having a cyclic ether group is preferably a compound having an epoxy group (hereinafter also referred to as an epoxy compound). As an epoxy compound, the compound which has 1 or more epoxy groups in 1 molecule is mentioned, The compound which has 2 or more epoxy groups is preferable. It is preferable that an epoxy compound is a compound which has 1-100 epoxy groups in 1 molecule. The upper limit of the epoxy groups contained in the epoxy compound may be, for example, 10 or less, and may be 5 or less. As for the lower limit of the epoxy group contained in an epoxy compound, two or more are preferable. As an epoxy compound, the compound of Paragraph No. 0034-0036 of Unexamined-Japanese-Patent No. 2013-011869, Paragraph No. 0147-0156 of Unexamined-Japanese-Patent No. 2014-043556, Paragraph No. 0085-0092 of Unexamined-Japanese-Patent No. 2014-089408, Japan The compound described in Unexamined-Japanese-Patent No. 2017-179172 can also be used. These contents are incorporated in this specification.

The epoxy compound may be a low molecular weight compound (for example, a molecular weight of less than 2000, and furthermore, a molecular weight of less than 1000), or a macromolecule (for example, a molecular weight of 1000 or more, in the case of a polymer, a weight average molecular weight of 1000 or more). ) may be any of them . 200-100000 are preferable and, as for the weight average molecular weight of the compound which has an epoxy group, 500-50000 are more preferable. As for the upper limit of a weight average molecular weight, 10000 or less are more preferable, 5000 or less are especially preferable, and 3000 or less are still more preferable.

As an epoxy compound, an epoxy resin can be used preferably. Examples of the epoxy resin include epoxy resins which are glycidyl ether compounds of phenolic compounds, epoxy resins which are glycidyl ether compounds of various novolac resins, alicyclic epoxy resins, aliphatic epoxy resins, and heterocyclic epoxy resins. , glycidyl ester-based epoxy resins, glycidylamine-based epoxy resins, epoxy resins obtained by glycidylating halogenated phenols, condensates of silicon compounds having an epoxy group and other silicon compounds, polymerizable unsaturated compounds having an epoxy group and copolymers of compounds and other polymerizable unsaturated compounds. The epoxy equivalent of the epoxy resin is preferably 310 to 3300 g/eq, more preferably 310 to 1700 g/eq, still more preferably 310 to 1000 g/eq.

Examples of commercially available compounds having a cyclic ether group include EHPE3150 (manufactured by Daicel Co., Ltd.), EPICLON N-695 (manufactured by DIC Corporation), Maploop G-0150M, G-0105SA, G-0130SP, and G -0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, G-01758 (above Nichiyu Co., Ltd. product, epoxy group-containing polymer), etc. are mentioned.

As for content of the compound which has a cyclic ether group in the total solids of the photosensitive composition, 0.1-20 mass % is preferable. The lower limit is more preferably 0.5% by mass or more, and more preferably 1% by mass or more, for example. As for an upper limit, 15 mass % or less is more preferable, for example, 10 mass % or less is still more preferable. 1 type may be used for the compound which has a cyclic ether group, and 2 or more types may be used. When using 2 or more types, it is preferable that those total amounts become the said range.

<<Curing Accelerator>>

The photosensitive composition of the present invention may also contain a hardening accelerator. Examples of the curing accelerator include thiol compounds, methylol compounds, amine compounds, phosphonium salt compounds, amidine salt compounds, amide compounds, base generators, isocyanate compounds, alkoxysilane compounds, onium salt compounds, and the like. . As a specific example of a hardening accelerator, the compound of Paragraph No. 0094 of International Publication No. 2018/056189 - 0097, the compound of Paragraph No. 0246 of Unexamined-Japanese-Patent No. 2015-034963 - 0253, Paragraph No. of Unexamined-Japanese-Patent No. 2013-041165 Compounds described in 0186 to 0251, ionic compounds described in Japanese Patent Laid-Open No. 2014-055114, Paragraph Nos. 0071 to 0080 of Japanese Patent Laid-Open No. 2012-150180, compounds described in Japanese Unexamined Patent Publication No. 2011-253054 Phosphorus compounds, compounds described in Paragraph Nos. 0085 to 0092 of Japanese Patent Publication No. 5765059, carboxyl group-containing epoxy curing agents described in Japanese Unexamined Patent Publication No. 2017-036379, and the like are exemplified. 0.3-8.9 mass % is preferable and, as for content of the hardening accelerator in the total solids of the photosensitive composition, 0.8-6.4 mass % is more preferable.

<<surfactants>>

The photosensitive composition of the present invention may contain a surfactant. As the surfactant, various surfactants such as fluorochemical surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone surfactants can be used. About surfactant, Paragraph No. 0238 of International Publication No. 2015/166779 - surfactant of 0245 are mentioned, This content is integrated in this specification.

It is preferable that surfactant is a fluorochemical surfactant. By containing a fluorine-based surfactant in the photosensitive composition, the liquid properties (particularly, fluidity) can be further improved, and the liquid saving property can be further improved. In addition, a film having a small thickness variation can be formed.

The fluorine content in the fluorine-based surfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass. A fluorine-based surfactant having a fluorine content within this range is effective in terms of the uniformity of the thickness of the coating film and liquid saving, and has good solubility in the photosensitive composition.

As a fluorochemical surfactant, the surfactant described in Paragraph No. 0060 - 0064 of Unexamined-Japanese-Patent No. 2014-041318 (paragraph No. 0060 - 0064 of corresponding International Publication No. 2014/017669) etc., Paragraph No. 2011-132503 The surfactant of 0117-0132 and the surfactant of Unexamined-Japanese-Patent No. 2020-008634 are mentioned, These content is integrated in this specification. As commercially available products of fluorine-based surfactants, for example, Megafac F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144, F -437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F-560, F -561, F-565, F-563, F-568, F-575, F-780, EXP, MFS-330, R-01, R-40, R-40-LM, R-41, R-41 -LM, RS-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (above, manufactured by DIC Co., Ltd.), Fluorad FC430, FC431, FC171 (above, Sumitomo 3M manufactured by Suffron Co., Ltd.), Suffron S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (above, AGC Co., Ltd.), PolyFox PF636, PF656, PF6320, PF6520, PF7002 (above, manufactured by OMNOVA), Progent 208G, 215M, 245F, 601AD, 601ADH2, 602A, 610FM, 710FL, 710FM, 710FS, FTX-218 ( The above, made by NEOS Co., Ltd.), etc. are mentioned.

In addition, as the fluorine-based surfactant, an acrylic compound having a molecular structure having a functional group containing a fluorine atom and in which a portion of the functional group containing a fluorine atom is cut off and the fluorine atom volatilizes when heated is also preferably used. As such a fluorine-based surfactant, DIC Co., Ltd.'s Megafac DS series (Gagaku Kogyo Nippo (February 22, 2016), Nikkei Sangyo Shinbun (February 23, 2016)), for example Megafac DS -21 can be heard.

Moreover, it is also preferable to use the polymer of the vinyl ether compound containing a fluorine atom which has a fluorinated alkyl group or a fluorinated alkylene ether group, and a hydrophilic vinyl ether compound as a fluorochemical surfactant. As for such a fluorochemical surfactant, the fluorochemical surfactant of Unexamined-Japanese-Patent No. 2016-216602 is mentioned, and this content is integrated in this specification.

A block polymer can also be used for a fluorochemical surfactant. The fluorine-based surfactant is a (meth)acrylate compound having 2 or more (preferably 5 or more) repeating units derived from a (meth)acrylate compound having a fluorine atom and an alkyleneoxy group (preferably an ethyleneoxy group and a propyleneoxy group). ) A fluorine-containing high molecular compound containing a repeating unit derived from an acrylate compound can also be preferably used. Moreover, the fluorine-containing surfactant of Paragraph No. 0016 of Unexamined-Japanese-Patent No. 2010-032698 - 0037 and the following compound are also illustrated as a fluorochemical surfactant used by this invention.

[Formula 24]

The weight average molecular weight of the above compound is preferably 3000 to 50000, for example 14000. Among the above compounds, % representing the ratio of repeating units is mol%.

Further, as the fluorine-based surfactant, a fluorine-containing polymer having an ethylenically unsaturated bond-containing group in the side chain may be used. As specific examples, the compounds described in Paragraph Nos. 0050 to 0090 and Paragraph Nos. 0289 to 0295 of Japanese Unexamined Patent Publication No. 2010-164965, DIC Co., Ltd. Megafac RS-101, RS-102, RS-718K, RS-72- K etc. are mentioned. Moreover, Paragraph No. 0015 of Unexamined-Japanese-Patent No. 2015-117327 - the compound of 0158 can also be used for a fluorochemical surfactant.

Moreover, it is also preferable from a viewpoint of environmental regulation to use the surfactant of international publication 2020/084854 as a substitute for the surfactant which has a C6 or more perfluoroalkyl group.

Moreover, it is also preferable to use the fluorine-containing imide salt compound represented by Formula (fi-1) as a surfactant.

[Formula 25]

In the formula (fi-1), m represents 1 or 2, n represents an integer from 1 to 4, α represents 1 or 2, X ^α+ represents an α-valent metal ion, primary ammonium ion, Secondary ammonium ion, tertiary ammonium ion, quaternary ammonium ion or NH ₄ ⁺ is shown.

Examples of nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane and their ethoxylates and propoxylates (for example, glycerol propoxylate and glycerol ethoxylate), polyoxyethylene lauryl Ether, polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate , Sorbitan fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (manufactured by BASF), Tetronic 304, 701, 704, 901, 904, 150R1 (manufactured by BASF), Solsperse 20000 (Nippon) Lubrizol Co., Ltd.), NCW-101, NCW-1001, NCW-1002 (Fujifilm Wako Junyaku Co., Ltd.), Pionein D-6112, D-6112-W, D-6315 (Takemoto Yushi Co., Ltd.), Olfin E1010, Surfynol 104, 400, 440 (Nisshin Chemical Co., Ltd. product), etc. are mentioned.

As the silicone surfactant, for example, Toray Silicone DC3PA, Toray Silicone SH7PA, Toray Silicone DC11PA, Toray Silicone SH21PA, Toray Silicone SH28PA, Toray Silicone SH29PA, Toray Silicone SH30PA, Toray Silicone SH8400 (above, Toray Dow Corning Co., Ltd.) first), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (above, manufactured by Momentive Performance Materials Co., Ltd.), KP-341, KF-6001, KF-6002 (above, new product) Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (above, made by Big Chemie Co., Ltd.), FZ-2122 (Dow Toray Co., Ltd.) ) and the like.

Moreover, the compound of the following structure can also be used for silicone type surfactant.

[Formula 26]

0.001 mass % - 5.0 mass % are preferable, and, as for content of surfactant in the total solids of the photosensitive composition, 0.005 - 3.0 mass % are more preferable. As for surfactant, only 1 type may be used and 2 or more types may be used. When using 2 or more types, it is preferable that those total amounts become the said range.

<<solvent>>

The photosensitive composition of the present invention may contain a solvent. The type of solvent is basically not particularly limited as long as the solubility of each component and the coating property of the composition are satisfied. It is preferable that a solvent is an organic solvent. Examples of the organic solvent include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, and hydrocarbon-based solvents. About these details, Paragraph No. 0223 of International Publication No. 2015/166779 can be referred, and this content is integrated in this specification. In addition, an ester-based solvent substituted with a cyclic alkyl group and a ketone-based solvent substituted with a cyclic alkyl group can also be preferably used. Specific examples of the organic solvent include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl Ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclo Hexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3- Methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfonyl Porein, Anisole, 1,4-Diacetoxybutane, Diethylene Glycol Monoethyl Ether Acetate, Butane-1,3-Diyl Diacetate, Dipropylene Glycol Methyl Ether Acetate, Di Acetone alcohol etc. are mentioned. However, there are cases where it is better to reduce aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents for reasons such as environmental concerns (for example, 50 mass ppm relative to the total amount of organic solvents). (parts per million) or less, 10 mass ppm or less, or 1 mass ppm or less).

In the present invention, it is preferable to use an organic solvent having a small metal content, and the metal content of the organic solvent is preferably 10 mass ppb (parts per billion) or less, for example. If necessary, an organic solvent at a ppt (parts per trillion) level may be used, and such an organic solvent is provided, for example, by Toyo Kosei Co., Ltd. (Cagaku Kogyo Nippo, November 13, 2015) .

Examples of methods for removing impurities such as metals from organic solvents include distillation (molecular distillation, thin film distillation, etc.) or filtration using a filter. The filter hole diameter of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and still more preferably 3 μm or less. The material of the filter is preferably polytetrafluoroethylene, polyethylene or nylon.

The organic solvent may contain isomers (compounds having the same number of atoms but different structures). Moreover, only 1 type may be contained in an isomer, and plural types may be included.

It is preferable that the content rate of the peroxide in the organic solvent is 0.8 mmol/L or less, and it is more preferable that the peroxide is not substantially contained.

It is preferable that content of the solvent in the photosensitive composition is 10-95 mass %. It is preferable that it is 92.5 mass % or less, and, as for an upper limit, it is more preferable that it is 90 mass % or less. The lower limit is preferably 20% by mass or more, more preferably 50% by mass or more, still more preferably 70% by mass or more, still more preferably 75% by mass or more, and even more preferably 80% by mass or more from the viewpoint of coatability. desirable.

Moreover, it is preferable that the photosensitive composition of this invention contains substantially no environmental regulating substance from a viewpoint of environmental regulation. In the present invention, substantially not containing an environmental regulating substance means that the content of the environmental regulating substance in the photosensitive composition is 50 ppm by mass or less, preferably 30 ppm by mass or less, and preferably 10 ppm by mass or less. It is more preferable, and it is especially preferable that it is 1 mass ppm or less. Environmentally regulated substances include, for example, benzene; Alkylbenzenes, such as toluene and xylene; Halogenated benzenes, such as chlorobenzene, etc. are mentioned. These are registered as environmentally regulated substances based on REACH (Registration Evaluation Authorization and Restriction of Chemicals) rules, PRTR (Pollutant Release and Transfer Register) laws, VOC (Volatile Organic Compounds) regulations, etc., and use and handling methods are strict. are regulated These compounds may be used as a solvent when producing each component used in the photosensitive composition, etc., and may be mixed in the photosensitive composition as a residual solvent. From the viewpoint of human safety and consideration for the environment, it is desirable to reduce these substances as much as possible. As a method of reducing the environmental regulating substance, a method of reducing the environment regulating substance by heating or reducing the pressure in the system to a boiling point or higher and distilling the environmental regulating substance out of the system is exemplified. In addition, in the case of distilling off a small amount of environmentally regulated substances, it is also useful to azeotrope with a solvent having the same boiling point as the solvent in order to increase the efficiency. In the case of containing a compound having radical polymerization, it may be distilled off under reduced pressure by adding a polymerization inhibitor or the like in order to suppress crosslinking between molecules as a result of a radical polymerization reaction during distillation under reduced pressure. These distillation methods are any step, such as the step of raw materials, the step of reacting raw materials (for example, resin solution or polyfunctional monomer solution after polymerization), or the step of photosensitive composition produced by mixing these compounds. is also possible

<<Silane coupling agent>>

The photosensitive composition of the present invention may contain a silane coupling agent. In the present specification, a silane coupling agent means a silane compound having a hydrolyzable group and a functional group other than that. In addition, a hydrolyzable group refers to a substituent that is directly connected to a silicon atom and can generate a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. As a hydrolyzable group, a halogen atom, an alkoxy group, an acyloxy group etc. are mentioned, for example, An alkoxy group is preferable. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Moreover, as a functional group other than a hydrolysable group, a vinyl group, (meth) allyl group, (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, isocyanate, for example A nate group, a phenyl group, etc. are mentioned, An amino group, a (meth)acryloyl group, and an epoxy group are preferable. Specific examples of the silane coupling agent include N-β-aminoethyl-γ-aminopropylmethyldimethoxysilane (manufactured by Shin-Etsu Chemical Industry Co., Ltd., trade name KBM-602), N-β-aminoethyl-γ -Aminopropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Industry Co., Ltd., trade name KBM-603), N-β-aminoethyl-γ-aminopropyltriethoxysilane (manufactured by Shin-Etsu Chemical Industry Co., Ltd.) No., trade name KBE-602), γ-aminopropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Industry Co., Ltd., trade name KBM-903), γ-aminopropyltriethoxysilane (Shin-Etsu Chemical Industry (manufactured by Shin-Etsu Chemical Industry Co., Ltd.) Co., Ltd., trade name KBE-903), 3-methacryloxypropylmethyldimethoxysilane (Shin-Etsu Chemical Industry Co., Ltd. trade name KBM-502), 3-methacryloxypropyltrimethoxysilane (manufactured by Shin-Etsu Chemical Co., Ltd., trade name: KBM-503). Further, specific examples of the silane coupling agent include compounds described in Paragraph Nos. 0018 to 0036 of Unexamined-Japanese-Patent No. 2009-288703 and Paragraph Nos. 0056 to 0066 of Unexamined-Japanese-Patent No. 2009-242604. These contents are incorporated in this specification. As for content of the silane coupling agent in the total solids of the photosensitive composition, 0.1-5 mass % is preferable. As for an upper limit, 3 mass % or less is more preferable, and 2 mass % or less is still more preferable. As for a lower limit, 0.5 mass % or more is more preferable, and 1 mass % or more is still more preferable. As for the silane coupling agent, only 1 type may be used and 2 or more types may be used. When using 2 or more types, it is preferable that those total amounts become the said range.

<<UV absorber>>

The photosensitive composition of the present invention may contain an ultraviolet absorber. As the ultraviolet absorber, a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound, or the like may be used. can As such a compound, Paragraph Nos. 0038 to 0052 of Unexamined-Japanese-Patent No. 2009-217221, Paragraph Nos. 0052 to 0072 of Unexamined-Japanese-Patent No. 2012-208374, Paragraph Nos. Paragraph No. 0061 of Publication No. 2016-162946 - the compound of 0080 are mentioned, These content is integrated in this specification. As a commercial item of a ultraviolet absorber, UV-503 (Daito Chemical Co., Ltd. product) etc. are mentioned, for example. Moreover, as a benzotriazole compound, the MYUA series by Miyoshi Yushi Co., Ltd. (Kagaku Kogyo Nippo, February 1, 2016) is mentioned. Moreover, the compound of Paragraph No. 0049 - 0059 of Unexamined-Japanese-Patent No. 6268967 can also be used as a ultraviolet absorber. 0.01-10 mass % is preferable and, as for content of the ultraviolet absorber in the total solid content of the photosensitive composition, 0.01-5 mass % is more preferable. Only 1 type may be used for a ultraviolet absorber, and 2 or more types may be used. When using 2 or more types, it is preferable that those total amounts become the said range.

<<Antioxidants>>

The photosensitive composition of the present invention may contain an antioxidant. As an antioxidant, a phenol compound, a phosphite compound, a thioether compound, etc. are mentioned. As the phenolic compound, any phenolic compound known as a phenolic antioxidant can be used. As a preferable phenol compound, a hindered phenol compound is mentioned. A compound having a substituent at a site adjacent to the phenolic hydroxy group (ortho position) is preferred. As the substituent described above, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferable. Further, the antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Moreover, a phosphorus antioxidant can also be used suitably as an antioxidant. Moreover, as an antioxidant, the compound described in Korean Unexamined Patent Publication No. 10-2019-0059371 can also be used. It is preferable that it is 0.01-20 mass %, and, as for content of the antioxidant in the total solid content of the photosensitive composition, it is more preferable that it is 0.3-15 mass %. Antioxidant may use only 1 type, and may use 2 or more types. When using 2 or more types, it is preferable that a total amount becomes the said range.

<<Polymerization Inhibitor>>

The photosensitive composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6 -tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salt, cerium salt, etc.). . Among them, p-methoxyphenol is preferable. As for content of the polymerization inhibitor in the total solid content of the photosensitive composition, 0.0001-5 mass % is preferable. One type of polymerization inhibitor may be sufficient as it, and two or more types may be sufficient as it. In the case of two or more types, it is preferable that the total amount be within the above range.

<<Other Ingredients>>

In the present invention, the photosensitive composition, if necessary, a sensitizer, a curing accelerator, a filler, a heat curing accelerator, a plasticizer, and other auxiliary agents (eg, conductive particles, fillers, antifoaming agents, flame retardants, leveling agents) agents, peeling accelerators, fragrances, surface tension regulators, chain transfer agents, etc.) may be contained. By appropriately containing these components, properties such as membrane properties can be adjusted. These components are, for example, described in paragraph No. 0183 of Japanese Laid-open Patent Publication No. 2012-003225 (paragraph No. 0237 of corresponding US Patent Application Publication No. 2013/0034812), paragraph No. 2008-250074 Reference can be made to descriptions of 0101 to 0104 and 0107 to 0109, the contents of which are incorporated herein by reference. Moreover, the photosensitive composition of this invention may contain a latent antioxidant as needed. The latent antioxidant is a compound in which a site functioning as an antioxidant is protected with a protecting group, and the protective group is released by heating at 100 to 250° C. or at 80 to 200° C. in the presence of an acid/base catalyst to function as an antioxidant. compounds can be mentioned. Examples of the latent antioxidant include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and Japanese Unexamined Patent Publication No. 2017-008219. As a commercial item of a latent antioxidant, Adeka Akles GPA-5001 (made by ADEKA Corporation) etc. are mentioned.

The photosensitive composition of the present invention may also contain a light fastness improver. As a light fastness improver, the compound of Paragraph No. 0036 of Unexamined-Japanese-Patent No. 2017-198787 - the compound of 0037, Paragraph No. 0029 of Unexamined-Japanese-Patent No. 2017-146350 - the compound of 0034, Paragraph No. 0036 of Unexamined-Japanese-Patent No. 2017-129774 - 0037, a compound described in 0049 to 0052, a compound described in Paragraph Nos. 0031 to 0034, 0058 to 0059 of Unexamined-Japanese-Patent No. 2017-129674, a compound described in Paragraph Nos. 0036 to 0037, 0051 to 0054 of Unexamined-Japanese-Patent No. , Paragraph Nos. 0025 to 0039 of International Publication No. 2017/164127, a compound described in Paragraph Nos. 0034 to 0047 of Japanese Unexamined Patent Publication No. 2017-186546, and paragraph Nos. 0019 to 0041 of Japanese Unexamined Patent Publication No. 2015-025116 A compound described in Paragraph Nos. 0101 to 0125 of Unexamined-Japanese-Patent No. 2012-145604, a compound described in Paragraph Nos. 0018 to 0021 of Unexamined-Japanese-Patent No. 2012-103475, Paragraph Nos. 0015 to 0018 of Unexamined-Japanese-Patent No. 2011-257591 The compound described, the compound described in Paragraph Nos. 0017 to 0021 of Unexamined-Japanese-Patent No. 2011-191483, the compound described in Paragraph No. 0108 to 0116 of Unexamined-Japanese-Patent No. 2011-145668, Paragraph No. 0103 to 0153 of Unexamined-Japanese-Patent No. 2011-253174 The compounds described in , etc. are mentioned.

In the photosensitive composition of the present invention, the content of a free metal that is not bonded or coordinated with a pigment or the like is preferably 100 ppm or less, more preferably 50 ppm or less, still more preferably 10 ppm or less, and not substantially contained. particularly preferred. According to this embodiment, stabilization of pigment dispersibility (suppression of aggregation), improvement of spectral characteristics due to quantification of dispersibility, stabilization of curable components, suppression of fluctuations in conductivity due to elution of metal atoms and metal ions, and improvement of display characteristics improvement can be expected. Moreover, Japanese Unexamined Patent Publication No. 2012-153796, Japanese Unexamined Patent Publication No. 2000-345085, Japanese Unexamined Patent Publication No. 2005-200560, Japanese Unexamined Patent Publication No. 08-043620, Japanese Unexamined Patent Publication 2004-145078, Japanese Unexamined Patent Publication Patent Publication No. 2014-119487, Japanese Unexamined Patent Publication No. 2010-083997, Japanese Unexamined Patent Publication No. 2017-090930, Japanese Unexamined Patent Publication No. 2018-025612, Japanese Unexamined Patent Publication No. 2018-025797, Japanese Unexamined Patent Publication 2017-155228 , the effect described in Unexamined-Japanese-Patent No. 2018-036521, etc. is also acquired. As the type of metal of the above glass, Na, K, Ca, Sc, Ti, Mn, Cu, Zn, Fe, Cr, Co, Mg, Al, Sn, Zr, Ga, Ge, Ag, Au, Pt, Cs , Ni, Cd, Pb, Bi and the like. Further, in the photosensitive composition of the present invention, the content of halogen in glass not bonded or coordinated with a pigment or the like is preferably 100 ppm or less, more preferably 50 ppm or less, still more preferably 10 ppm or less, and substantially not contained. particularly preferred. Examples of halogen include F, Cl, Br, I and anions thereof. Methods such as washing with ion-exchanged water, filtration, ultrafiltration, purification with ion-exchange resin, etc. are mentioned as methods for reducing metals and halogens in the glass in the photosensitive composition.

It is also preferable that the photosensitive composition of the present invention does not substantially contain terephthalic acid ester. Here, "substantially not included" means that the content of terephthalic acid ester is 1000 mass ppb or less in the total amount of the photosensitive composition, more preferably 100 mass ppb or less, and particularly preferably zero.

From the viewpoint of environmental regulations, the use of perfluoroalkylsulfonic acids and salts thereof, and perfluoroalkylcarboxylic acids and salts thereof are regulated in some cases. In the photosensitive composition of the present invention, when the content of the above compounds is reduced, perfluoroalkylsulfonic acid (especially perfluoroalkylsulfonic acid having 6 to 8 carbon atoms in the perfluoroalkyl group) and salts thereof, and purple The content of the fluoroalkylcarboxylic acid (particularly, the perfluoroalkylcarboxylic acid having 6 to 8 carbon atoms in the perfluoroalkyl group) and its salt is preferably in the range of 0.01 ppb to 1,000 ppb with respect to the total solid content of the photosensitive composition, and is 0.05 It is more preferable that it is the range of ppb - 500 ppb, and it is still more preferable that it is the range of 0.1 ppb - 300 ppb. The photosensitive composition of the present invention need not substantially contain perfluoroalkylsulfonic acids and salts thereof, and perfluoroalkylcarboxylic acids and salts thereof. For example, by using compounds that can be substituted for perfluoroalkylsulfonic acids and salts thereof, and compounds that can be substituted for perfluoroalkylcarboxylic acids and salts thereof, A photosensitive composition substantially free of perfluoroalkylcarboxylic acids and salts thereof may be selected. Examples of the compound that can be substituted for the regulated compound include compounds excluded from the regulated subject due to differences in the number of carbon atoms in the perfluoroalkyl group. However, the above does not prevent the use of perfluoroalkylsulfonic acids and salts thereof, and perfluoroalkylcarboxylic acids and salts thereof. The photosensitive composition of the present invention may also contain perfluoroalkylsulfonic acid and its salt, and perfluoroalkylcarboxylic acid and its salt within the maximum permissible range.

<<retaining container>>

There is no limitation in particular as a container for the photosensitive composition, and a known container can be used. In addition, as the storage container, a multi-layered bottle in which the inner wall of the container is composed of 6 types of 6-layer resin or a bottle in which 6 types of resin have a 7-layer structure is used for the purpose of suppressing contamination of raw materials or impurities into the photosensitive composition. is also desirable As such a container, the container of Unexamined-Japanese-Patent No. 2015-123351 is mentioned, for example. The inner wall of the container is also preferably made of glass or stainless steel for the purpose of preventing elution of metal from the inner wall of the container, enhancing the storage stability of the photosensitive composition, or suppressing component deterioration.

<Preparation method of photosensitive composition>

The photosensitive composition of the present invention can be prepared by mixing the components described above. When preparing the photosensitive composition, the photosensitive composition may be prepared by simultaneously dissolving and/or dispersing all components in a solvent, and, if necessary, each component is appropriately prepared as a solution or dispersion of two or more, and at the time of use (application) You may prepare a photosensitive composition by mixing these.

Moreover, it is preferable to include the process of dispersing a pigment at the time of preparation of a photosensitive composition. In the process of dispersing the pigment, examples of the mechanical force used for dispersing the pigment include compression, compression, impact, shear, cavitation, and the like. Specific examples of these processes include bead mill, sand mill, roll mill, ball mill, paint shaker, microfluidizer, high-speed impeller, sand grinder, float mixer, high-pressure wet atomization, ultrasonic dispersion, and the like. In addition, in pulverization of the pigment in a sand mill (bead mill), it is preferable to use beads with a small diameter or to treat under conditions in which the pulverization efficiency is increased by increasing the filling rate of the beads. In addition, it is preferable to remove coarse particles by filtration, centrifugation or the like after the crushing treatment. In addition, the process and disperser for dispersing the pigment are described in "Complete Collection of Dispersion Technology, published by Joho Kiko Co., Ltd., July 15, 2005" or "Dispersion Technology Centered on Suspension (Solid/Liquid Dispersion System) and Practice of Industrial Application" Comprehensive Data Collection, Keiei Kaihatsu Center Publishing, October 10, 1978", the process and disperser described in paragraph No. 0022 of Japanese Laid-open Patent Publication No. 2015-157893 can be suitably used. Further, in the process of dispersing the pigment, the particles may be refined by a salt milling step. For materials, equipment, processing conditions, and the like used in the salt milling process, descriptions of, for example, Japanese Unexamined Patent Publication No. 2015-194521 and Japanese Unexamined Patent Publication No. 2012-046629 can be referred.

In preparation of the photosensitive composition, it is preferable to filter the photosensitive composition with a filter for the purpose of removing foreign matter or reducing defects. As a filter, it can be used without particular limitation as long as it is a filter conventionally used for filtration purposes or the like. For example, fluororesins such as polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF), polyamide-based resins such as nylon (eg nylon-6, nylon-6,6), polyethylene, Filters using materials such as polyolefin resins (including high-density, ultra-high molecular weight polyolefin resins) such as polypropylene (PP) are exemplified. Among these materials, polypropylene (including high-density polypropylene) and nylon are preferable.

The pore diameter of the filter is preferably 0.01 to 7.0 μm, more preferably 0.01 to 3.0 μm, and still more preferably 0.05 to 0.5 μm. When the pore diameter of the filter is within the above range, fine foreign matter can be removed more reliably. For the value of the pore diameter of the filter, reference can be made to the nominal value of the filter manufacturer. As the filter, various filters provided by Nippon Pole Co., Ltd. (DFA4201NIEY, DFA4201NAEY, DFA4201J006P, etc.), Advantech Toyo Co., Ltd., Nippon Entegris Co., Ltd. (formerly Nihon Microlis Co., Ltd.), Kitz Microfilter Co., Ltd., etc. can be used.

Moreover, it is also preferable to use a fibrous filter medium as a filter. As a fibrous filter medium, polypropylene fiber, nylon fiber, glass fiber etc. are mentioned, for example. Examples of commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.), and SHPX type series (SHPX003, etc.) manufactured by Rocky Techno.

When using a filter, you may combine different filters (for example, a 1st filter and a 2nd filter, etc.). In that case, filtration using each filter may be performed only once, or may be performed twice or more. Moreover, you may combine filters of different pore diameters within the above-mentioned range. In addition, filtration using the first filter may be performed only for the dispersion liquid, and after mixing other components, filtration may be performed with the second filter.

<Method of manufacturing optical filter>

Next, the manufacturing method of the optical filter of the present invention will be described. Examples of types of optical filters include color filters, near-infrared cutoff filters, and near-infrared transmission filters. The manufacturing method of the optical filter of the present invention includes the steps of forming a photosensitive composition layer on a support using the photosensitive composition of the present invention described above, and irradiating and exposing the photosensitive composition layer with light having a wavelength of 300 nm or less in a pattern. and a step of developing and removing the photosensitive composition layer in the unexposed area to form pixels. Hereinafter, each process is demonstrated.

In the step of forming the photosensitive composition layer, a photosensitive composition layer is formed on a support using the photosensitive composition of the present invention. As a support body, there is no limitation in particular, It can select suitably according to a use. For example, a glass substrate, a silicon substrate, etc. are mentioned, and it is preferable that it is a silicon substrate. In addition, a charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, or the like may be formed on the silicon substrate. In some cases, a barrier rib is formed on the silicon substrate to isolate each pixel. In addition, a base layer may be provided on the silicon substrate to improve adhesion to the upper layer, prevent diffusion of substances, or flatten the surface of the substrate. The surface contact angle of the base layer is preferably 20 to 70° when measured with diiodomethane. Moreover, it is preferable that it is 30-80 degrees when measured with water. When the surface contact angle of the base layer is within the above range, the photosensitive composition has good wettability. Adjustment of the surface contact angle of the base layer can be performed, for example, by adding a surfactant or the like.

A well-known method can be used as a coating method of the photosensitive composition. For example, the drop method (drop cast); slit coat method; spray method; roll coat method; spin coating (spin coating); casting method; slit and spin method; Pre-wet method (for example, the method described in Unexamined-Japanese-Patent No. 2009-145395); various printing methods such as inkjet (eg, on-demand method, piezo method, thermal method), discharge-based printing such as nozzle jet, flexographic printing, screen printing, gravure printing, reverse offset printing, and metal mask printing; transfer method using a mold or the like; The nanoimprint method etc. are mentioned. The application method in inkjet is not particularly limited, and for example, the method shown in "Diffusion and Usable Inkjet -Infinite Possibilities Seen as Patents-, February 2005, Sumibe Techno Research" (particularly on page 115) to page 133), but Japanese Unexamined Patent Publication No. 2003-262716, Japanese Unexamined Patent Publication No. 2003-185831, Japanese Unexamined Patent Publication No. 2003-261827, Japanese Unexamined Patent Publication No. 2012-126830, Japanese Unexamined Patent Publication No. 2006-169325 The method described in etc. is mentioned. Moreover, about the coating method of the photosensitive composition, international publication 2017/030174 and description of international publication 2017/018419 can be considered into consideration, and these content is integrated in this specification.

The photosensitive composition layer formed on the support may be dried (prebaked). When manufacturing a film by a low-temperature process, it is not necessary to perform prebaking. In the case of prebaking, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and still more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or 80°C or higher. The prebaking time is preferably 10 to 300 seconds, more preferably 40 to 250 seconds, and still more preferably 80 to 220 seconds. Prebaking can be performed on a hot plate, oven, or the like.

Next, light having a wavelength of 300 nm or less is irradiated in a pattern to the photosensitive composition layer on the support formed as described above to expose the layer. In this way, the exposed portion of the photosensitive composition layer can be cured.

Light used in exposure may be light with a wavelength of 300 nm or less, and preferably light with a wavelength of 180 to 300 nm. Specifically, light (KrF line) with a wavelength of 248 nm, light (ArF line) with a wavelength of 193 nm, and the like are exemplified, and light (KrF line) with a wavelength of 248 nm is preferable.

Moreover, at the time of exposure, you may expose by irradiating light continuously, and you may expose by irradiating and exposing light pulsewise (pulse exposure). Further, pulse exposure is an exposure method of a system in which light irradiation and pause are repeatedly exposed in cycles of a short period of time (for example, a level of milliseconds or less).

The amount of irradiation (exposure amount) is preferably 0.03 to 2.5 J/cm ² and more preferably 0.05 to 1.0 J/cm ² . The oxygen concentration during exposure can be appropriately selected, and besides performing under atmospheric conditions, for example, in a low-oxygen atmosphere in which the oxygen concentration is 19% by volume or less (eg, 15% by volume, 5% by volume, or substantially It may be exposed in an oxygen-free atmosphere) or in a high-oxygen atmosphere in which the oxygen concentration exceeds 21% by volume (for example, 22% by volume, 30% by volume, or 50% by volume). In addition, the exposure illuminance can be set appropriately, and can be selected from the range of usually 1000 W/m ² to 100000 W/m ² (for example, 5000 W/m ² , 15000 W/m ² , or 35000 W/m ² ). . Oxygen concentration and exposure illuminance may suitably combine conditions, and, for example, an oxygen concentration of 10 vol% and an illuminance of 10000 W/m ² , an oxygen concentration of 35 vol% and an illuminance of 20000 W/m ² , and the like.

Next, the photosensitive composition layer of the unexposed part in the photosensitive composition layer after the exposure process is removed by development. Thereby, the photosensitive composition layer of the unexposed part in an exposure process is eluted with a developing solution, and only a photocured part remains, and a pixel is formed.

As for the temperature of a developing solution, 20-30 degreeC is preferable, for example. As for developing time, 20 to 180 second is preferable. Further, in order to improve residue removability, the process of shaking off the developer every 60 seconds and then supplying a new developer may be repeated several times.

Examples of the developing solution include organic solvents and alkaline developing solutions, and alkaline developing solutions are preferably used. As the alkali developing solution, an alkaline aqueous solution (alkali developing solution) obtained by diluting an alkali agent with pure water is preferable. As an alkali agent, for example, ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide oxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis(2-hydroxyethyl)ammonium hydroxide, choline, Organic alkaline compounds such as pyrrole, piperidine, 1,8-diazabicyclo-[5.4.0]-7-undecene, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium silicate, sodium metasilicate Inorganic alkaline compounds, such as these, are mentioned. The alkaline agent is preferably a compound having a large molecular weight from the viewpoint of environment and safety. 0.001-10 mass % is preferable, and, as for the density|concentration of the alkali agent of alkaline aqueous solution, 0.01-1 mass % is more preferable. Moreover, the developing solution may further contain a surfactant. The developing solution may be once prepared as a concentrated solution and diluted to a concentration necessary for use from the viewpoint of transportation or storage convenience. Although the dilution factor is not particularly limited, it can be set, for example, in the range of 1.5 to 100 times. Moreover, it is also preferable to wash (rinse) with pure water after image development. Further, the rinse is preferably performed by supplying a rinse liquid to the composition layer after development while rotating the support on which the composition layer after development is formed. It is also preferable to move the nozzle for discharging the rinse liquid from the center of the support to the periphery of the support. At this time, when the nozzle is moved from the central portion of the support body to the peripheral edge portion, the nozzle may be moved while gradually lowering the moving speed. By rinsing in this way, in-plane unevenness of the rinsing can be suppressed. Also, the same effect can be obtained by gradually lowering the rotational speed of the support while moving the nozzle from the center of the support to the periphery.

It is preferable to perform additional exposure treatment or heat treatment (post-bake) after drying after development. Additional exposure treatment and post-baking are curing treatments after development to complete curing. The heating temperature in the post-baking is, for example, preferably 100 to 240°C, and more preferably 200 to 240°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, a convection oven (hot air circulating dryer), or a high-frequency heater so that the developed film meets the above conditions. When performing additional exposure processing, it is preferable that the light used for exposure is light with a wavelength of 400 nm or less. Moreover, you may perform additional exposure processing by the method described in Korean Unexamined Patent Publication No. 10-2017-0122130.

The film thickness of the formed pixel can be appropriately adjusted according to the purpose. The film thickness of the pixel is preferably 20 μm or less, more preferably 10 μm or less, and still more preferably 5 μm or less. The lower limit of the film thickness of the pixel is preferably 0.1 μm or more, more preferably 0.2 μm or more, and still more preferably 0.3 μm or more.

The line width of the formed pixel is preferably less than 1.0 μm, more preferably 0.9 μm or less, still more preferably 0.8 μm or less, still more preferably 0.7 μm or less, and particularly preferably 0.6 μm or less. The lower limit is not particularly limited, but may be 0.1 μm or more, 0.2 μm or more, 0.3 μm or more, or 0.4 μm or more.

In the case of forming a plurality of types of pixels, an optical filter provided with a plurality of pixels can be manufactured by repeating each of the above-described steps for each pixel.

<Method of Manufacturing Solid-State Imaging Device>

The manufacturing method of the solid-state imaging device of the present invention includes the manufacturing method of the optical filter of the present invention described above. The configuration of the solid-state imaging device is not particularly limited as long as it is provided with an optical filter and functions as a solid-state imaging device, but examples include the following configurations.

On the substrate, a plurality of photodiodes constituting a light receiving area of a solid-state imaging device (CCD (charge coupled device) image sensor, CMOS (complementary metal oxide semiconductor) image sensor, etc.) and a transfer electrode formed of polysilicon, etc. , On the photodiode and the transfer electrode, there is a light blocking film in which only the light receiving portion of the photodiode is opened, and on the light blocking film, a device protective film formed of silicon nitride or the like formed to cover the entire surface of the light blocking film and the photodiode light receiving portion, and on the device protective film, a color It is a structure having an optical filter such as a filter. Further, a configuration in which a concentrating unit (for example, a microlens, etc., the same applies below) is provided above the device protective film and below the optical filter (on the side close to the substrate), or a configuration in which the condensing unit is provided above the optical filter may be used. Further, the optical filter may have a structure in which each pixel is filled in a space partitioned in a lattice shape, for example, by barrier ribs. It is preferable that the barrier rib in this case has a low refractive index for each pixel. As an example of the imaging device which has such a structure, the apparatus of Unexamined-Japanese-Patent No. 2012-227478, Unexamined-Japanese-Patent No. 2014-179577, and International Publication No. 2018/043654 is mentioned. Moreover, as shown in Unexamined-Japanese-Patent No. 2019-211559, a ultraviolet ray absorbing layer may be provided in the structure of a solid-state imaging element to improve light resistance. The imaging device provided with the solid-state imaging element of the present invention can be used not only for digital cameras and electronic devices (such as mobile phones) having an imaging function, but also for in-vehicle cameras and surveillance cameras.

<Method of manufacturing image display device>

This specification discloses a manufacturing method of an image display device. This manufacturing method includes the manufacturing method of the optical filter of the present invention described above. As an image display device, a liquid crystal display device, an organic electroluminescence display device, etc. are mentioned. For the definition of an image display device and details of each image display device, for example, "Electronic display device (authored by Akio Sasaki, Kogyo Chosakai Co., Ltd., published in 1990)", "Display device (authored by Sumiaki Ibuki, Sangyo Co., Ltd.)" Tosho Co., Ltd. Published in the first year of Heisei)", etc. Further, liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd., 1994)". The liquid crystal display device to which the present invention can be applied is not particularly limited, and for example, it can be applied to liquid crystal display devices of various types described in the above "next-generation liquid crystal display technology".

Example

The present invention will be described in more detail by way of examples below. The materials, usage amount, ratio, processing content, processing procedure, etc. shown in the following examples can be appropriately changed as long as they do not deviate from the spirit of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below.

<Measurement Conditions for Weight Average Molecular Weight and Number Average Molecular Weight in Gel Permeation Chromatography>

Column type: TOSOH TSKgel Super HZM-H, TOSOH TSKgel Super HZ4000, and TOSOH TSKgel Super HZ2000 connected columns

Developing solvent: tetrahydrofuran

Column temperature: 40°C

Flow rate (sample injection amount): 1.0 μL (sample concentration: 0.1% by mass)

Device name: Tosoh Corporation HLC-8220GPC

Detector: RI (Refractive Index) Detector

Calibration curve base resin: polystyrene resin

<Preparation of dispersion>

The raw materials listed in the table were mixed to obtain a mixed solution. The obtained liquid mixture was subjected to dispersion treatment using an Ultra Apex Mill manufactured by Kotobuki Kogyo Co., Ltd. as a circulating dispersing device (bead mill) to prepare a dispersion liquid.

[Table 1]

The detail of the abbreviation of the raw material described in the said table|surface is as follows.

[Pigment]

PG58: C. I. Pigment Green 58 (green pigment)

PG36: C. I. Pigment Green 36 (green pigment)

PY185: C. I. Pigment Yellow 185 (yellow pigment)

PY215: C. I. Pigment Yellow 215 (yellow pigment)

PY129: C. I. Pigment Yellow 129 (yellow pigment)

PY139: C. I. Pigment Yellow 139 (yellow pigment)

PR254: C. I. Pigment Red 254 (red pigment)

PR272: C. I. Pigment Red 272 (red pigment)

[Dispersion preparation]

A-1: Polyethyleneimine (Eformin SP-006, manufactured by Nippon Shokubai Co., Ltd., molecular weight 600, amine value 20 mmol/g)

[Pigment Derivative]

D-1 to D-4: Compounds with the following structures

[Formula 27]

[Dispersant 1]

B-1 to B-5: Resin having the following structure (polymerizable resin. x, y, z added to the main chain are molar ratios, and the numerical values added to the side chain are the number of repeating units. Values of x, y, z, The weight average molecular weight (Mw) and ethylenically unsaturated bond-containing value (C=C value) are as shown in the table below, respectively)

[Formula 28]

[Table 2]

[Dispersant 2]

E-1: Resin having the following structure (resin having no ethylenically unsaturated bond-containing group. The numerical value given to the main chain is the molar ratio, and the numerical value added to the side chain is the number of repeating units. Weight average molecular weight 24000)

[Formula 29]

E-2: Resin having the following structure (resin having no ethylenically unsaturated bond-containing group. The numerical value given to the main chain is the molar ratio, and the numerical value added to the side chain is the number of repeating units. Weight average molecular weight 21000)

[Formula 30]

[solvent]

S-1: propylene glycol monomethyl ether acetate (PGMEA)

S-2: cyclohexanone

S-3: cyclopentanone

S-4: diacetone alcohol

S-5: Anisole

<Preparation of photosensitive composition>

The photosensitive composition was prepared by mixing the raw materials described in the table below.

[Table 3]

[Table 4]

In the total solid content of the content of the color material in the total solid content of each photosensitive composition, the content of the polymerizable monomer in the total solid content of the photosensitive composition, the mass part of the polymerizable monomer with respect to 100 parts by mass of the polymerizable resin, the total solid content of the photosensitive composition The ethylenically unsaturated bond-containing value derived from the polymerizable monomer (C=C is 1) and the ethylenically unsaturated bond-containing value derived from the polymerizable resin in the total solids of the photosensitive composition (C=C is 2) are as follows, respectively: same.

In addition, when C=C is 1, the value calculated by dividing the sum of the product of the content of each polymerizable monomer in the total solids of the photosensitive composition and the C=C value of each polymerizable monomer by the total solids of the photosensitive composition am. In addition, when C=C is 2, the value calculated by dividing the sum of the product of the content of each polymerizable resin in the total solids of the photosensitive composition and the C=C value of each polymerizable resin by the total solids of the photosensitive composition am.

In addition, the sum of C = C = 1 and C = C = 2 corresponds to the ethylenically unsaturated bond-containing value of the solid content of the photosensitive composition.

[Table 5]

The detail of the abbreviation of the raw material used for preparation of each photosensitive composition is as follows.

[Polymerizable monomer]

M-1: Compound having the following structure (C=C value: 9.94 mmol/g)

[Formula 31]

M-2: a mixture of compounds having the following structure (the compound of the structure on the left: the compound of the structure on the right = 7: 3 (mass ratio), C = C value: 10.12 mmol / g)

[Formula 32]

M-3: Compound having the following structure (C=C value: 11.35 mmol/g)

[Formula 33]

M-4: Compound having the following structure (C=C value: 2.12 mmol/g)

[Formula 34]

M-5: Compound having the following structure (C=C value: 7.57 mmol/g)

[Formula 35]

[profit]

C-1: Resin having the following structure (polymerizable resin. The numerical value added to the main chain is a molar ratio. Weight average molecular weight 11000, C=C value: 1.44 mmol/g)

[Formula 36]

C-2: Resin having the following structure (the numerical value added to the main chain is a molar ratio. Weight average molecular weight 14000)

[Formula 37]

[Photoinitiator]

I-1: Irgacure OXE02 (manufactured by BASF, oxime compound)

[Surfactants]

W-1: A compound having the following structure (fluorine-based surfactant, weight average molecular weight: 14000, the numerical value of % representing the ratio of repeating units is mol%)

[Formula 38]

[Polymerization inhibitor]

Q-1: p-methoxyphenol

[solvent]

S-1: propylene glycol monomethyl ether acetate (PGMEA)

<Evaluation of photolithographic properties>

Each of the photosensitive compositions obtained above was coated on an 8-inch (203.2 mm) silicon wafer with an undercoat layer by spin coating using Act8 manufactured by Tokyo Electron so that the film thickness after application was 0.4 μm, and then applied on a hot plate. A composition layer was formed by heating at 100° C. for 2 minutes using a. Next, with respect to the obtained composition layer, a KrF scanner exposure machine was used, and a mask having a square pattern with four sides of 0.7 μm or a mask having a square pattern with four sides of 0.6 μm was passed through a mask with a wavelength of 248 nm (KrF line ) was irradiated at an exposure amount of 35000 W/m ² and 200 mJ/cm ² , and exposure was performed. Next, the composition layer after exposure was subjected to shower development at 23° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH) as a developing solution. Thereafter, rinsing was performed by spin shower using pure water to form pixels. The resulting pixel was observed at a magnification of 20000 using a scanning electron microscope (S-4800H, manufactured by Hitachi High-Technologies Corporation). Based on the observed images, photolithographic properties were evaluated according to the following criteria. The photolithographic test was performed three times for each sample, and the results were combined and determined. Write the evaluation result using a mask having a square pattern with four sides of 0.7 μm in the photolithographic property 1 column, and the evaluation result using a mask having a square pattern with four sides of 0.6 μm in the photolithographic property column 2.

(Evaluation standard)

5: The linearity of the four sides of the pixel is good, and there is no residue between the pixels.

4: The linearity of the four sides of the pixel is good, and there is little residue between the pixels.

3: The four sides of the pixels are slightly rounded, and there is little residue between the pixels.

2: The four sides of the pixel are rounded, and there are many residues between the pixels.

1: A pixel cannot be formed.

[Table 6]

As shown in the table above, in the examples, the evaluation of photolithography was good, and pixels could be formed even when a mask having a square pattern with four sides of 0.6 μm was used. Moreover, there were also few residues between pixels.

Similar effects were obtained even when surfactant W-1 was changed from the photosensitive compositions of Examples 25 to 43 to surfactants W-2 to W-44 shown below.

W-2: FZ-2122 (manufactured by Dow Toray Co., Ltd., silicone surfactant)

W-3: BYK-322 (manufactured by Big Chemie Co., Ltd., silicone surfactant)

W-4: BYK-323 (manufactured by Big Chemie, silicone surfactant)

W-5: BYK-330 (manufactured by Big Chemie Co., Ltd., silicone surfactant)

W-6: BYK-3760 (manufactured by Big Chemie, silicone surfactant)

W-7: BYK-UV3510 (manufactured by Big Chemie, silicone surfactant)

W-8: KF-6001 (Shin-Etsu Chemical Co., Ltd., silicone surfactant)

W-9: Megafac F-477 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-10: Megafac F-554 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-11: Megafac F-555-A (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-12: Megafac F-556 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-13: Megafac F-557 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-14: Megafac F-558 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-15: Megafac F-559 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-16: Megafac F-560 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-17: Megafac F-561 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-18: Megafac F-563 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-19: Megafac F-565 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-20: Megafac F-568 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-21: Megafac F-575 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-22: Megafac R-01 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-23: Megafac R-40 (DIC Co., Ltd., fluorine-based surfactant)

W-24: Megafac R-40-LM (DIC Co., Ltd., fluorine-based surfactant)

W-25: Megafac R-41 (DIC Co., Ltd., fluorine-based surfactant)

W-26: Megafac R-41-LM (DIC Co., Ltd., fluorine-based surfactant)

W-27: Megafac R-94 (DIC Co., Ltd., fluorine-based surfactant)

W-28: Megafac DS-21 (DIC Co., Ltd., fluorine-based surfactant)

W-29: Megafac RS-43 (DIC Co., Ltd., fluorine-based surfactant)

W-30: Megafac RS-72-K (DIC Co., Ltd., fluorine-based surfactant)

W-31: Megafac RS-90 (DIC Co., Ltd., fluorine-based surfactant)

W-32: Megafac TF-1956 (manufactured by DIC Co., Ltd., fluorine-based surfactant)

W-33: Phergent 208G (NEOS Co., Ltd., fluorine-based surfactant)

W-34: Phergent 215M (NEOS Co., Ltd., fluorine-based surfactant)

W-35: Phergent 245F (NEOS Co., Ltd., fluorine-based surfactant)

W-36: Phergent 601AD (NEOS Co., Ltd., fluorine-based surfactant)

W-37: Phergent 601ADH2 (NEOS Co., Ltd., fluorine-based surfactant)

W-38: Phergent 602A (NEOS Co., Ltd., fluorine-based surfactant)

W-39: Phergent 610FM (NEOS Co., Ltd., fluorine-based surfactant)

W-40: Progent 710FL (NEOS Co., Ltd., fluorine-based surfactant)

W-41: Progent 710FM (NEOS Co., Ltd., fluorine-based surfactant)

W-42: Progent 710FS (NEOS Co., Ltd., fluorine-based surfactant)

W-43: Ftergent FTX-218 (NEOS Co., Ltd., fluorine-based surfactant)

W-44: PF-6320 (manufactured by OMNOVA, fluorine-based surfactant)

(Example 1001)

On a silicon wafer, the green photosensitive composition was applied by spin coating to a film thickness of 0.4 μm after film formation. Next, it heated at 100 degreeC for 2 minutes using the hotplate. Then, using a KrF scanner exposure machine, light (KrF line) with a wavelength of 248 nm was irradiated at an exposure amount of 200 mJ/cm ² through a mask having a Bayer pattern formed in a square with four sides of 0.7 μm in pixel (pattern) size, exposed Next, puddle development was performed at 23°C for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). After that, it was rinsed with a spin shower and further washed with pure water. Next, a green pixel was formed by heating at 200°C for 5 minutes using a hot plate. The red photosensitive composition and the blue photosensitive composition were also patterned in the same process, and a red pixel and a blue pixel were sequentially formed to form a color filter having a green pixel, a red pixel, and a blue pixel. In this color filter, green pixels are formed in a Bayer pattern, and red pixels and blue pixels are formed in an island pattern in the adjacent region. The obtained color filter was incorporated into a solid-state imaging device according to a known method. This solid-state imaging device had a suitable image recognition ability. In addition, the photosensitive composition of Example 31 was used as the green photosensitive composition. The photosensitive composition of Example 36 was used as the red photosensitive composition. The blue photosensitive composition used the composition shown below.

-Blue photosensitive composition-

After mixing and stirring the following components, it filtered with a nylon filter (Nippon Pall Co., Ltd. product) with a pore diameter of 0.45 micrometer, and the blue photosensitive composition was prepared.

blue pigment dispersion … 44.9 parts by mass

Resin 101 … 2.1 parts by mass

polymerizable compound 101 … 1.5 parts by mass

polymerizable compound 102 … 0.7 parts by mass

photopolymerization initiator 101 … 0.8 parts by mass

surfactant 101 … 4.2 parts by mass

PGMEA: 45.8 parts by mass

The raw materials used for the blue photosensitive composition are as follows.

blue pigment dispersion

A mixture consisting of 9.7 parts by mass of CI Pigment Blue 15:6, 2.4 parts by mass of CI Pigment Violet 23, 5.5 parts by mass of a dispersant (Disperbyk-161, manufactured by BYK Chemie), and 82.4 parts by mass of PGMEA was mixed with a beads mill (0.3 parts by mass of zirconia beads). mm diameter) was used to mix and disperse for 3 hours. Thereafter, dispersion treatment was further performed at a flow rate of 500 g/min under a pressure of 2000 kg/cm ³ using a high-pressure disperser NANO-3000-10 (manufactured by Nippon Biei Co., Ltd.) equipped with a pressure reducing mechanism. This dispersion treatment was repeated 10 times to obtain a blue pigment dispersion.

Resin 101: 40% by mass PGMEA solution of a resin having the following structure (the numerical value given to the main chain is a molar ratio. Weight average molecular weight: 11000)

[Formula 39]

Polymeric compound 101: KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd.)

Polymerizable compound 102: a compound having the structure

[Formula 40]

Photopolymerization initiator 101: Irgacure OXE02 (manufactured by BASF)

Surfactant 101: 1% by mass PGMEA solution of a compound having the following structure (weight average molecular weight: 14000, in the following formula, the % representing the ratio of repeating units is mol%)

[Formula 41]

Claims (13)

A photosensitive composition comprising a color material A, a photopolymerization initiator B, a polymerizable monomer C having an ethylenically unsaturated bond-containing group, and a polymerizable resin D having an ethylenically unsaturated bond-containing group,
The content of the color material A in the total solids of the photosensitive composition exceeds 50% by mass,
The content of the polymerizable monomer C in the total solids of the photosensitive composition is 4% by mass or more,
A photosensitive composition for exposure to light with a wavelength of 300 nm or less, containing 5 to 200 parts by mass of the polymerizable monomer C based on 100 parts by mass of the polymerizable resin D. The method of claim 1,
The color material A is a photosensitive composition containing a chromatic color material. According to claim 1 or claim 2,
The photosensitive composition, wherein the polymerizable monomer C includes a 2-8 functional polymerizable monomer having 2 to 8 ethylenically unsaturated bond-containing groups. The method according to any one of claims 1 to 3,
The photosensitive composition in which the ethylenically unsaturated bond-containing value derived from the polymerizable monomer C in the total solids of the photosensitive composition is 0.01 to 8 mmol/g. The method according to any one of claims 1 to 4,
The photosensitive composition in which the ethylenically unsaturated bond-containing value derived from the polymerizable resin D in the total solid content of the photosensitive composition is 0.001 to 5 mmol/g. The method according to any one of claims 1 to 5,
A photosensitive composition containing 10 to 100 parts by mass of the polymerizable monomer C based on 100 parts by mass of the polymerizable resin D. The method according to any one of claims 1 to 6,
The photosensitive composition whose total amount of the said polymerizable monomer C and the said polymerizable resin D in the total solid content of the said photosensitive composition is 5-45 mass %. According to any one of claims 1 to 7,
The photosensitive composition whose content of the said photoinitiator B in the total solid of the said photosensitive composition is 1-10 mass %. The method according to any one of claims 1 to 8,
A photosensitive composition for forming a red pixel or a green pixel of a color filter. The method according to any one of claims 1 to 9,
A photosensitive composition for solid-state imaging devices. A step of forming a photosensitive composition layer on a support using the photosensitive composition according to any one of claims 1 to 10;
A step of exposing the photosensitive composition layer by irradiating light having a wavelength of 300 nm or less in a pattern;
A method of manufacturing an optical filter comprising a step of developing and removing the photosensitive composition layer of an unexposed portion to form a pixel. The method of claim 11,
The light having a wavelength of 300 nm or less irradiated to the photosensitive composition layer is light having a wavelength of 248 nm. A method of manufacturing a solid-state imaging device including the method of manufacturing an optical filter according to claim 11 or 12.