KR20230032928A - 임프린트 장치, 임프린트 방법, 물품 제조 방법, 및 이를 위한 프로그램 - Google Patents

임프린트 장치, 임프린트 방법, 물품 제조 방법, 및 이를 위한 프로그램 Download PDF

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Publication number
KR20230032928A
KR20230032928A KR1020220105204A KR20220105204A KR20230032928A KR 20230032928 A KR20230032928 A KR 20230032928A KR 1020220105204 A KR1020220105204 A KR 1020220105204A KR 20220105204 A KR20220105204 A KR 20220105204A KR 20230032928 A KR20230032928 A KR 20230032928A
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KR
South Korea
Prior art keywords
substrate
imprint
foreign material
mold
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020220105204A
Other languages
English (en)
Korean (ko)
Inventor
나오야 츠루미
유키 사이토
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20230032928A publication Critical patent/KR20230032928A/ko
Ceased legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/002Component parts, details or accessories; Auxiliary operations
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C2037/90Measuring, controlling or regulating
    • B29C2037/903Measuring, controlling or regulating by means of a computer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
KR1020220105204A 2021-08-31 2022-08-23 임프린트 장치, 임프린트 방법, 물품 제조 방법, 및 이를 위한 프로그램 Ceased KR20230032928A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021141294A JP7705310B2 (ja) 2021-08-31 2021-08-31 インプリント装置、インプリント方法、物品の製造方法、及び、プログラム
JPJP-P-2021-141294 2021-08-31

Publications (1)

Publication Number Publication Date
KR20230032928A true KR20230032928A (ko) 2023-03-07

Family

ID=85288342

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020220105204A Ceased KR20230032928A (ko) 2021-08-31 2022-08-23 임프린트 장치, 임프린트 방법, 물품 제조 방법, 및 이를 위한 프로그램

Country Status (3)

Country Link
US (2) US20230060799A1 (https=)
JP (1) JP7705310B2 (https=)
KR (1) KR20230032928A (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4660581B2 (ja) * 2008-09-19 2011-03-30 株式会社東芝 パターン形成方法
KR20110021291A (ko) * 2009-08-26 2011-03-04 엘아이지에이디피 주식회사 미세패턴 형성장치
JP2013008815A (ja) 2011-06-24 2013-01-10 Toshiba Corp パターン形成装置、パターン形成方法及びパターン形成用プログラム
JP2016021544A (ja) 2014-07-11 2016-02-04 株式会社東芝 インプリント装置およびインプリント方法
JP6823374B2 (ja) * 2016-03-10 2021-02-03 キヤノン株式会社 パターンの欠陥の分析を行う方法、インプリント装置、及び物品の製造方法
KR102527567B1 (ko) 2018-02-23 2023-05-03 에스케이하이닉스 주식회사 파티클에 의한 템플레이트 손상을 억제하는 임프린트 패턴 형성 방법

Also Published As

Publication number Publication date
JP2023034849A (ja) 2023-03-13
US20250353244A1 (en) 2025-11-20
JP7705310B2 (ja) 2025-07-09
US20230060799A1 (en) 2023-03-02

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