KR20230032928A - 임프린트 장치, 임프린트 방법, 물품 제조 방법, 및 이를 위한 프로그램 - Google Patents
임프린트 장치, 임프린트 방법, 물품 제조 방법, 및 이를 위한 프로그램 Download PDFInfo
- Publication number
- KR20230032928A KR20230032928A KR1020220105204A KR20220105204A KR20230032928A KR 20230032928 A KR20230032928 A KR 20230032928A KR 1020220105204 A KR1020220105204 A KR 1020220105204A KR 20220105204 A KR20220105204 A KR 20220105204A KR 20230032928 A KR20230032928 A KR 20230032928A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- imprint
- foreign material
- mold
- substrates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/002—Component parts, details or accessories; Auxiliary operations
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
- B29C2037/90—Measuring, controlling or regulating
- B29C2037/903—Measuring, controlling or regulating by means of a computer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021141294A JP7705310B2 (ja) | 2021-08-31 | 2021-08-31 | インプリント装置、インプリント方法、物品の製造方法、及び、プログラム |
| JPJP-P-2021-141294 | 2021-08-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20230032928A true KR20230032928A (ko) | 2023-03-07 |
Family
ID=85288342
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020220105204A Ceased KR20230032928A (ko) | 2021-08-31 | 2022-08-23 | 임프린트 장치, 임프린트 방법, 물품 제조 방법, 및 이를 위한 프로그램 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US20230060799A1 (https=) |
| JP (1) | JP7705310B2 (https=) |
| KR (1) | KR20230032928A (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4660581B2 (ja) * | 2008-09-19 | 2011-03-30 | 株式会社東芝 | パターン形成方法 |
| KR20110021291A (ko) * | 2009-08-26 | 2011-03-04 | 엘아이지에이디피 주식회사 | 미세패턴 형성장치 |
| JP2013008815A (ja) | 2011-06-24 | 2013-01-10 | Toshiba Corp | パターン形成装置、パターン形成方法及びパターン形成用プログラム |
| JP2016021544A (ja) | 2014-07-11 | 2016-02-04 | 株式会社東芝 | インプリント装置およびインプリント方法 |
| JP6823374B2 (ja) * | 2016-03-10 | 2021-02-03 | キヤノン株式会社 | パターンの欠陥の分析を行う方法、インプリント装置、及び物品の製造方法 |
| KR102527567B1 (ko) | 2018-02-23 | 2023-05-03 | 에스케이하이닉스 주식회사 | 파티클에 의한 템플레이트 손상을 억제하는 임프린트 패턴 형성 방법 |
-
2021
- 2021-08-31 JP JP2021141294A patent/JP7705310B2/ja active Active
-
2022
- 2022-07-27 US US17/874,785 patent/US20230060799A1/en not_active Abandoned
- 2022-08-23 KR KR1020220105204A patent/KR20230032928A/ko not_active Ceased
-
2025
- 2025-07-30 US US19/285,510 patent/US20250353244A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2023034849A (ja) | 2023-03-13 |
| US20250353244A1 (en) | 2025-11-20 |
| JP7705310B2 (ja) | 2025-07-09 |
| US20230060799A1 (en) | 2023-03-02 |
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