KR20230005055A - Substrate container system - Google Patents

Abstract

A substrate container system includes a container body, a filter assembly, and a rear-surface cover. The container body includes an upper end surface, a bottom surface facing the upper end surface, and a back plate connecting the upper end surface and the bottom surface. The container body has a front-surface opening and a rear-surface opening. The front-surface opening is located between the upper end surface and the bottom surface to allow the substrate to pass through. The rear-surface opening is located on the back plate to face the front-surface opening. The back plate has a first height, and the rear-surface opening has a second height smaller than the first height. The filter assembly is covered onto the rear-surface opening. The rear-surface cover is used to be connected to the container body in an airtight manner. A gas guidance passage extending in a first height direction is formed between the rear-surface cover and the container body. The rear-surface cover and the filter assembly define a buffer room in common. The gas guidance passage has an exit connected to the buffer room.

Description

Substrate container system {SUBSTRATE CONTAINER SYSTEM}

The present invention relates to a transportable container that prevents contamination from the environment during storage, transfer, and transportation of fragile items such as wafers, and particularly to a container system capable of distributing a purging gas therein. It is about.

BACKGROUND OF THE INVENTION [0002] In modern semi-finished processes, precision workpieces (e.g. wafers, reticles/masks) undergo multiple processes in multiple process facilities before being fabricated into integrated circuits. Wafers are generally transported or transported from a wafer manufacturing facility to another location, where further processing of the wafer is performed. These precision devices are typically transported through dedicated substrate containers (eg, front opening unified pods, FOUPs).

FOUPs are typically used to house 300mm or 450mm wafers between multiple process stations. Typically, a FOUP includes a housing, which defines an open interior space, and the housing has a plurality of racks used to hold a plurality of wafers spaced apart from each other. Further, the housing defines a front opening, and the front opening is covered by a front door member, which is coupled with a sealing member and a latching mechanism to seal the door and the housing.

Ideally, environmental contaminants (eg air/dust/moisture) entering substrate containers should be controlled while substrates are being loaded or unloaded (eg when the front door is removed and the interior is exposed). . Even if the surrounding environment is a clean room, if environmental contaminants infiltrate the container, it may adversely affect the productivity of substrates provided therein. Thus, purging equipment is coupled to the carrier box system to support the purging process during loading/unloading of the box.

Considering this point, the present invention provides a rear opening having a height smaller than the back plate on the back plate of the container body so that the filter assembly can provide a purging gas in a non-area manner, and covering the filter assembly in the rear opening. Provided is a substrate container system using a method.

According to one aspect of the invention, a substrate container system includes a container body, a filter assembly and a back cover. The container body includes a top surface, a bottom surface opposite to the top surface, and a back plate connecting the top surface and the bottom surface. The container body has a front opening and a rear opening, the front opening being positioned between the top and bottom surfaces for passage of a substrate, and the rear opening being positioned on the back plate and facing the front opening. Here, the back plate has a first height, and the rear opening has a second height smaller than the first height. A filter assembly covers the rear opening. The back cover is used to be sealedly connected to the container body, a gas guide passage extending along the first height direction is formed between the back cover and the container body, the back cover and the filter assembly jointly define a buffer chamber, and a gas guide The passage has an outlet connected to the buffer chamber.

In one embodiment, the second height is about 10% to about 90% of the first height.

In another embodiment, the second height is from about 10% to about 50% of the first height, and the rear opening is located on the adjacent top surface.

In one embodiment, the filter assembly has a gas discharge surface, the area of which is greater than the area of the rear surface opening, and the gas discharge surface has a plane parallel to the back plate.

In another embodiment, the filter assembly has a gas discharge surface, the area of which is greater than the area of the rear surface opening, and the gas discharge surface has a plane at an acute angle with the back plate.

In another embodiment, the filter assembly has a gas discharge surface, the area of which is greater than the area of the rear surface opening, and the gas discharge surface has a corrugated surface.

In another embodiment, the filter assembly has a gas discharge surface, the area of which is larger than the area of the rear opening, and the gas discharge surface extends through the rear opening toward the vessel body to form a curved contour.

In another embodiment, the filter assembly has a gas discharge surface, the area of which is greater than the area of the rear opening, and the gas discharge surface extends through the rear opening toward the rear cover to form a curved contour.

In one embodiment, the rear cover of which protrudes toward the container body and has a plurality of protruding ribs used to abut against the filter assembly, and the protruding ribs are provided at intervals so that a plurality of grooves are formed therein, and the gas guide passage is provided with a plurality of protruding ribs. The outlet includes at least a groove.

In one embodiment, the rear cover includes an intake structure that is curved and extended below the bottom surface of the container body, and the intake structure includes an intake port facing downward relative to the bottom surface, and is connected to an external purging device. The substrate container system further includes a gas valve assembly to allow passage of a purging gas. Here, the intake port has a connection structure, and the gas valve assembly is connected to the intake port through the connection structure. A gas valve assembly includes a gas valve body and a first elastic material, the first elastic material being provided on one side of the gas valve body and having a pin. When the gas valve assembly is assembled to the connection structure, the pin is deformed to form a sealing connection with the connection structure. The gas valve assembly further includes a second elastic material provided on the other side of the gas valve body, and the second elastic material has a docking surface so as to be connected to an external purging device to be sealed.

In one embodiment, the substrate container system further includes a sealing member having a first sealing portion and a second sealing portion, the first sealing portion is disposed between the rear cover and the container body, and the second sealing portion is disposed between the filter assembly and the container body. is placed on

In the substrate container system provided by an embodiment of the present invention, the back plate has a first height, the rear opening has a second height smaller than the first height, and as the filter assembly is provided in the rear opening, the filter assembly is Air outside the door with contaminants such as dust, particulates or moisture while substrates are being loaded or unloaded by providing purging gas in a non-area manner so that the inner space of the container body has different purging gas flow rates in the height direction Since does not flow into the container body, cleanliness can be maintained and humidity rise can be alleviated.

In order to more clearly understand the foregoing and other features, advantages and embodiments of the present invention, it is described as follows with accompanying drawings.
1 is a three-dimensional exploded view of a substrate container system provided by an embodiment of the present invention;
Figure 2 is a three-dimensional view of the container body provided by Figure 1;
Figure 3 is a connection diagram of the container body provided by Figure 2;
4 is a cross-sectional view of the container body along section P1 provided by FIG. 3;
Figure 5 is a rear view of the container body provided by Figure 3;
6 is a rear view of a container body provided by another embodiment of the present invention;
Figure 7 is a rear view of the container body provided by another embodiment of the present invention,
8 is a rear view of a container body provided by another embodiment of the present invention;
9 is a rear view of a container body provided by another embodiment of the present invention;
10 is a wiring diagram prior to assembly of the substrate container system provided by FIG. 1;
Figure 11 is a connection diagram after assembly of the container body, sealing member and filter assembly provided by Figure 1;
12 is a wiring diagram after assembly of the substrate container system provided by FIG. 1;
13A is an isometric view of the filter assembly provided by FIG. 1;
13B is a side view of the filter assembly provided by FIG. 1;
14A is an isometric view of a filter assembly provided by another embodiment;
14B is a side view of a filter assembly provided by another embodiment;
14c is a wiring diagram of the filter assembly and backplate provided by FIG. 14b;
14d is a wiring diagram of the filter assembly and backblade provided by FIG. 14c in another embodiment;
15A is an isometric view of a filter assembly provided by another embodiment;
15B is a side view of a filter assembly provided by another embodiment;
16A is an isometric view of a filter assembly provided by another embodiment;
16B is a side view of a filter assembly provided by another embodiment;
17 is a wiring diagram before assembly of a rear cover, a filter assembly, and a sealing member provided by FIG. 1;
18 is a wiring diagram after assembly of a rear cover, a filter assembly, and a sealing member provided by FIG. 1;
Fig. 19 is an isometric section along section P2 provided by Fig. 18;
20 is a wiring diagram of the substrate container system provided by FIG. 1;
21 is a cross-sectional view along section P3 provided by FIG. 20;
22 is a three-dimensional view of a gas valve assembly provided by an embodiment of the present invention;
23 is a cross-sectional view of the gas valve assembly along section P4 of FIG. 22;
24 is a connection diagram in which the gas valve assembly is assembled to the intake port;
25 is an isometric view from another angle of the gas valve assembly provided by FIG. 22;

This Republic of China invention patent application claims international priority over the United States patent application number 17/363,328, entitled "SUBSTRATE CONTAINER SYSTEM" filed on June 30, 2021, filed on May 12, 2020 is a continuation-in-part of the US application number 16/872,392 filed with, and the contents of the above-mentioned application are described in the specification by reference and become part of the specification.

The disclosure of the present invention is described in more detail below with reference to the accompanying drawings. The drawings are only illustrations of exemplary embodiments provided by the present invention and do not limit the present invention. Indeed, this invention may be embodied in many different forms and should not be construed as limited to the illustrative embodiments set forth herein. These exemplary embodiments are provided to make the description of the present invention more open, clear, and complete, and to fully convey the scope of the present invention to those skilled in the art.

In the detailed description of the embodiments, the same reference numerals denote the same or similar components. Terms used herein are only for the purpose of describing specific exemplary embodiments, and are not intended to limit the present invention. The singular forms of “one,” “an,” and “above,” as used herein, are intended to simultaneously include plural forms unless the context clearly dictates otherwise. Also, as used herein, ranges encompassed by "comprising", "comprising" and "having" refer to the presence or absence of one or more other features, regions, integers, steps, operations, components, assemblies and/or groups. It does not rule out what is added.

The substrate container system provided by the embodiment of the present invention has a rear opening on the back plate of the container body, and the rear opening provides a purging gas in a non-area manner so that the inner space of the container body has different purging gas flow rates in the height direction. As it has, since air outside the door containing contaminants such as dust, particulates or moisture does not flow into the container body, cleanliness can be maintained and humidity rise can be alleviated. A substrate container system provided by an embodiment of the present invention will be described in detail with reference to FIGS. 1 to 25 below. In the drawings provided by the embodiments of the present invention, some components or structures of the exemplary substrate container system are not shown in the drawings to clearly indicate the features of the present invention.

Referring simultaneously to FIGS. 1 and 2 , FIG. 1 is a three-dimensional exploded view of a substrate container system provided by an embodiment of the present invention, and FIG. 2 is a three-dimensional view of a container body provided by FIG. 1 . The substrate container system 2000 provided by this embodiment includes a container body 2100, a filter assembly 2300, and a rear cover 2500. The substrate container system 2000 is, for example, a front opening unified pod (FOUP). The container body 2100 provided by this embodiment includes an upper surface 2110, a lower surface 2130 facing the upper surface 2110, and a back plate 2150 connecting the upper surface 2110 and the lower surface 2130. The container body 2100 has a front opening 2100a and a rear opening 2100b, and the front opening 2100a is located between the top surface 2110 and the bottom surface 2130 to allow a substrate to pass therethrough. The substrate container system 2000 also includes a front door (not shown), the front door includes a latching mechanism and a sealing member, and when the front door is covered with the front opening 2100a and locked with the container body 2100, the front door and The container body 2100 forms an airtight inner space used for loading wafers, reticles, or other substrates requiring high cleanliness.

In this embodiment, the container body 2100 is a plastic integral molding, and further includes side walls 2170 connecting between the top surface 2110 and the bottom surface 2130, and the side walls 2170 are located on opposite sides of the back plate 2150, respectively. In general, the container body 2100 forms a box body for accommodating substrates by a top surface 2110, a bottom surface 2130, side walls 2170, and a back plate 2150. The front opening 2100a is formed surrounded by the top surface 2110, the bottom surface 2130, and the side walls 2170, and its width and height are both greater than that of the rear opening 2100b.

Referring simultaneously to FIGS. 3 and 4 , FIG. 3 is a connection diagram of the container body 2100 provided by FIG. 2 , and FIG. 4 is a cross-sectional view of the container body 2100 along a section P1 provided by FIG. 3 . The rear opening 2100b is located on the back plate 2150 and is relative to the front opening 2100a, wherein the back plate 2150 has a first height H1, and the rear opening 2100b has a second height H2 smaller than the first height HI. The distance between the top surface 2110 and the bottom surface 2130 is gradually reduced from the front opening 2100a to the back plate 2150 in the direction of the rear opening 2100b. The back plate 2150 is connected to the top surface 2110 and the bottom surface 2130, and the first height H1 of the back plate 2150 is approximately equal to the height of the container body 2100 here. Since the second height H2 of the rear opening 2100b is smaller than the first height H1 of the back plate 2150, the rear opening 2100b does not occupy the entire back plate 2150, indicating that the rear opening 2100b is formed in a non-area manner.

As described above, the second height H2 of the rear opening 2100b is smaller than the first height H1 of the back plate 2150, and in one embodiment, the second height H2 is about 10% to about 90% of the first height H1. in another embodiment. The second height H2 is about 10% to about 50% of the first height H1, and the rear opening 2100b is located at the adjacent top surface 2110.

Referring to FIG. 5 , it is a rear view of the vessel body provided by FIG. 3 . In the embodiment of FIG. 5 , the second height H2 is approximately 40% of the first height H1, and the rear opening 2100b is located adjacent to the top surface 2110. That is, the rear opening 2100b is close to the top position of the top surface 2110 in height.

Referring to Figure 6, it is a rear view of the container body provided by another embodiment of the present invention. In the embodiment of FIG. 6 , the second height H2(i) is about 90% of the first height H1(i), and the rear opening 2100b(i) is located at the adjacent top surface 2110(i).

Referring to Figure 7, it is a rear view of the container body provided by another embodiment of the present invention. In the embodiment of FIG. 7 , the second height H2(ii) is about 10% of the first height H1(ii), and the rear opening 2100b(ii) is located adjacent to the top surface 2110(ii).

Referring to Figure 8, it is a rear view of the container body provided by another embodiment of the present invention. In the embodiment of FIG. 8 , the second height H2(iii) is about 50% of the first height H1(iii), and the rear opening 2100b(iii) is located on the adjacent top surface 2110(iii).

Referring to Figure 9, it is a rear view of the container body provided by another embodiment of the present invention. In the embodiment of FIG. 9 , the second height H2(iv) is about 20% of the first height H1(iv), and the rear opening 2100b(iv) has a distance from the top surface 2110(iv).

The above-described embodiments of the plurality of first heights H1(i) to H1(iv) and second heights H2(i) to H2(iv) do not limit the present invention, and the second height H2 is equal to or greater than the first height H1. Any range from about 10% to about 90% is within the scope of the present invention. Further, as the rear opening 2100b is preferably located adjacent to the top surface 2110 at its top in the height direction, the purging gas has different flow rates at different heights when providing the purging gas, which will be described again later.

Referring simultaneously to FIGS. 10 to 12 , FIG. 10 is a wiring diagram before assembly of the substrate container system provided by FIG. 1 , and FIG. 11 is a wiring diagram after assembly of the container body, the sealing member and the filter assembly provided by FIG. 1 . , FIG. 12 is a wiring diagram after assembly of the substrate container system provided by FIG. 1 . In the substrate container system 2000 provided by this embodiment, the filter assembly 2300 is covered by the rear opening 2100b. The rear cover 2500 is used to be sealedly connected to the container body 2100, and a gas guide passage 2140 extending along the first height H1 is formed between the rear cover 2500 and the container body 2100. The rear cover 2500 and the filter assembly 2300 jointly define a buffer chamber 2340, and a gas guide passage 2140 has an outlet 2140a connected to the buffer chamber 2340.

When purging gas is supplied to the substrate container system 2000, the purging gas flows into the gas guide channel 2140 at the bottom, diffuses upward along the direction of the first height H1, and enters the buffer chamber 2340 through the outlet 2140a. The filter assembly 2300 is, for example, a porous material integrally molded by a porous sintering agent, and the material may include, for example, a ceramic material and a polymer-based material, but is not limited thereto. When the purging gas flows into the buffer chamber 2340 and reaches the designed pressure valve value (also referred to as saturation pressure), the purging gas is uniformly passed through the filter assembly 2300 to maintain a stable pressure during the purging process.

The filter assembly 2300 is preferably of substantially flat-plate construction and has a gas discharge surface 2310 facing the interior space of the vessel body 2100. As designed with filter assembly 2300 of flat structure. Compared to other conventional filter assemblies (e.g. columnar gas diffusion tower), under the condition of the same gas diffusion area, the inside of the filter assembly 2300 of the flat structure has a larger ventilation space (relatively the columnar gas diffusion tower). is relatively small), the gas discharge surface 2310 of the filter assembly 2300 having a flat structure diffuses the purging gas toward the inner space of the container body 2100 as a whole (the gas in the columnar gas diffusion tower is relatively small). The diffusion surface partially diffuses the purging gas toward the rear of the vessel), which helps to improve the purging efficiency.

Referring to FIGS. 1 , 13A and 13B , FIGS. 13A and 13B are respectively an isometric and side views of the filter assembly provided by FIG. 1 . The area of the gas discharge surface 2310 of the filter assembly 2300 is larger than the area of the rear opening 2100b. As the purging gas is discharged uniformly and stably by the gas discharge surface 2310, it enters the inner space of the container body 2100 and performs a purging process on the substrate. in this embodiment. The gas discharge surface 2310 has a corrugated surface, and the gas discharge surface is uneven and rough. During assembly, since the gas release surface 2310 diffuses into the container body 2100 through the rear opening 2100b (enters into the container body 2100 along the diffusion direction D as shown in FIGS. 1 and 10), the gas release surface The area of 2310 can be increased, which is helpful in improving purging efficiency.

Referring simultaneously to FIGS. 14A to 14C , FIGS. 14A and 14B are three-dimensional and side views of a filter assembly provided by another embodiment, and FIG. 14C is a connection diagram of a filter assembly and a backplate provided by FIG. 14B . . The area of the gas discharge surface 2310(i) of the filter assembly 2300(i) is larger than the area of the rear opening 2100b. As the purging gas is discharged uniformly and stably by the gas discharge surface 2310(i), it enters the inner space of the container body 2100 and performs a purging process on the substrate. In this embodiment, the gas discharge surface 2310(i) has a plane parallel to the back plate 2150, which is helpful in uniformly discharging the purging gas. During assembly, the gas discharge surface 2310(i) diffuses into the container body 2100 through the rear opening 2100b (enters into the container body 2100 along the diffusion direction D as shown in FIGS. 1 and 10), It helps to improve the purging efficiency.

Referring to FIG. 14D , a wiring diagram of a filter assembly and backplate provided by FIG. 14C in another embodiment. In a different embodiment, the gas discharge surface 2310(i)' of the filter assembly 2300(i)' has a plane at an acute angle with the backplate 2150. In this embodiment, since the plane is not parallel to the back plate 2150, it can optionally be inclined toward the top surface 2110 or the bottom surface 2130 of the container body 2100, so that the gas discharge angle of the gas discharge surface 2310(i)' can be adjusted. . Here, the angle of the plane and the back plate 2150 can be designed according to the needs or specifications of the product.

Simultaneously referring to FIGS. 15A and 15B , respectively, are three-dimensional and side views of a filter assembly provided by another embodiment. The area of the gas discharge surface 2310(ii) of the filter assembly 2300(ii) is larger than the area of the rear opening 2100b. As the purging gas is uniformly and stably discharged by the gas discharge surface 2310 (ii), it enters the inner space of the container body 2100 and performs a purging process for the substrate. In this embodiment, the gas release surface 2310(ii) diffuses toward the rear cover 2500 through the rear opening 2100b (along the direction opposite to the diffusion direction D as shown in FIGS. 1 and 10) to form a curved outline. Since a concave state is formed along the line, the area of the gas discharge surface 2310 (ii) can be increased, which is helpful in improving purging efficiency.

Referring simultaneously to FIGS. 16A and 16B , respectively, are an isometric view and a side view of a filter assembly provided by another embodiment. The area of the gas discharge surface 2310(iii) of the filter assembly 2300(iii) is larger than the area of the rear opening 2100b. As the purging gas is discharged uniformly and stably by the gas discharge surface 2310 (iii), it enters the inner space of the container body 2100 and performs a purging process on the substrate. In this embodiment, the gas release surface 2310(iii) diffuses into the container body 2100 through the rear opening 2100b (diffuses along the diffusion direction D as shown in FIGS. 1 and 10) to form a curved contour, thereby forming a convex Since the state is formed, the area of the gas discharge surface 2310 (iii) can be increased, which is helpful in improving the purging efficiency.

Referring simultaneously to FIGS. 17 to 19, FIG. 17 is a wiring diagram of the rear cover, filter assembly, and sealing member provided in FIG. 1 before assembly, and FIG. 18 is a rear cover, filter assembly, and sealing member provided in FIG. 1. is a connection diagram after assembly, and FIG. 19 is a three-dimensional cross-sectional view along section P2 provided by FIG. 18 . In this embodiment, the back cover 2500 protrudes toward the container body 2100 (projects along the diffusion direction D as shown in FIGS. 1 and 10) and has a plurality of protruding ribs 2510 used to abut the filter assembly 2300. , The plurality of protruding ribs 2510 are provided at intervals such that a plurality of grooves 2510a are formed therein, and the outlet 2140a of the gas guide passage 2140 includes at least the grooves 2150a.

1, 10 and 17 to 19, the substrate container system 2000 further includes a sealing member 2700 having a first sealing portion 2710 and a second sealing portion 2720, the first sealing portion 2710 being a rear cover 2500. and the container body 2100, and the second sealing part 2720 is disposed between the filter assembly 2300 and the container body 2100. The rear cover 2500 is sealedly connected by the first sealing part 2710 and the container body 2100, and the filter assembly 2300 is sealedly connected by the second sealing part 2720 and the container body 2100 corresponding to the peripheral portion of the rear opening 2100b. As the sealing member 2700 is provided between the container body 2100 and the rear cover 2500, the gas guide passage 2140 between the two is sealed to prevent gas leakage, so that the purging gas cannot enter the inner space of the container body 2100 only through the filter assembly 2300. can

Next, the inlet end through which the purging gas enters the substrate container system 2000 will be described. Referring simultaneously to FIGS. 17 to 21 , FIG. 20 is a connection diagram of the substrate container system and section P3 provided by FIG. 1 , and FIG. 21 is a cross-sectional view along section P3 provided by FIG. 20 . The rear cover 2500 of the substrate container system 2000 includes an intake structure 2540 that is curved and extends below the bottom surface 2130 of the container body 2100, and the intake structure 2540 includes an intake port 2541 facing downward relative to the bottom surface 2130, and external purging equipment. (its peripheral components are not shown in the figure). The intake structure 2540 is connected to the gas guide passage 2140, and the intake structure 2540 and the gas guide passage 2140 provided by the present embodiment are arranged in pairs and are located on opposite sides of the rear opening 2100b, respectively (FIG. 1 and FIG. 17). as shown in).

The substrate container system 2000 further includes a gas valve assembly 2900 through which a purging gas can pass, wherein the inlet 2541 has a connection structure 2542, and the gas valve assembly 2900 is connected to the inlet 2541 through the connection structure 2542.

Continuing to refer to FIG. 21 , after entering the intake structure 2540 through the gas valve assembly 2900, the purging gas diffuses upward along the gas guide passage 2140 (shown by the black arrow in the figure), and exits the gas guide passage 2140a. Enters the buffer chamber 2340 through (not shown in FIG. 21). When the purging gas reaches the saturation pressure in the buffer chamber 2340, it is uniformly discharged into the inner space of the container body 2100 through the gas discharge surface 2310. At the height of the container body 2100, the flow rate of the purging gas discharged corresponding to the position of the filter assembly 2300 is higher than that of other parts. That is, the purging gas has different flow rates at different heights. Taking the embodiment of FIG. 21 as an example, since the filter assembly 2300 is located in the upper half of the container body 2100, the flow rate of the purging gas in the upper half of the container body 2100 is higher than the flow rate in the lower half. Compared to uniform discharge over the entire area under the same flow rate of the purging gas, in the embodiment of the present invention, the flow rate in the upper half is higher than the flow rate in the lower half due to non-area discharge, so air outside the door blows from top to bottom when the front door is opened. As it is advantageous to prevent contaminants such as dust, particulates, or moisture from being introduced into the container body 2100 together, it is possible to maintain cleanliness and mitigate an increase in humidity.

The following is a description of gas valve assembly 2900. Referring simultaneously to FIGS. 22 to 24, FIG. 22 is a three-dimensional view of a gas valve assembly provided by an embodiment of the present invention, FIG. 23 is a cross-sectional view of the gas valve assembly taken along a section P4 of FIG. 22, and FIG. It is a wiring diagram in which the gas valve assembly is assembled to the intake port. Gas valve assembly 2900 includes a gas valve body 2930 and a first elastic material 2910. A first elastic material 2910 is provided on one side of the gas valve body 2930 and has a pin 2911. When the gas valve assembly 2900 is assembled to the connection structure 2542 of the intake port 2541, the pin 2911 is deformed and is sealedly connected to the connection structure 2542.

In one embodiment, coupling structure 2542 is a sleeve used to connect gas valve assembly 2900. The pin 2911 protrudes from the outer surface of the first elastic material 2910 and extends a certain distance outward. When the gas valve assembly 2900 is assembled to the connection structure 2542, the pin 2911 interferes with the connection structure 2542 and is bent (see FIG. 24). As shown), the pin 2911 may be sealedly connected to the connection structure 2542.

Referring to FIGS. 23-25 , FIG. 25 is an isometric view from another angle of the gas valve assembly provided by FIG. 22 . The gas valve assembly 2900 further includes a second elastic material 2920 provided on the other side of the gas valve body 2930, and has a docking surface 2921 to be connected to an external purging device to be sealed. In this embodiment, the first elastic material 2910 and the second elastic material 2920 are located on opposite sides of the gas valve body 2930, and the external purging device and the docking surface 2921 are sealedly connected using the second elastic material 2920, thereby preventing gas leakage. This can help improve the efficiency of the purging process.

The substrate container system provided by the plurality of embodiments disclosed in the foregoing description includes the following. A container body including a top surface, a bottom surface relative to the top surface, and a back plate connecting the top surface and the bottom surface, the container body having a front opening and a rear opening, the front opening being a top surface and a bottom surface through which a substrate can pass. The rear opening is located in the back plate and relative to the front opening, wherein the back plate has a first height and the rear opening has a second height less than the first height. A gas guide passage extending along the first height direction is formed between a filter assembly covered at the rear opening, a back cover used for sealing connection with the container body, and the rear cover and the container body, and the rear cover and the filter assembly are jointly formed. A buffer chamber is defined as, and the gas guide passage has an outlet connected to the buffer chamber. A rear opening is provided on the back plate of the container body, and the rear opening provides purging gas in a non-area manner so that the internal space of the container body has different purging gas flow rates in the height direction, thereby preventing contamination such as dust, particulates or moisture. Since the air outside the door with the material is prevented from entering the container body, cleanliness can be maintained and humidity rise can be mitigated.

Although a plurality of embodiments provided by the present invention have been disclosed as above, they do not limit the present invention. Since those skilled in the art to which the present invention belongs can make various changes and modifications without departing from the spirit of the present invention, the scope of protection of the present invention is defined by the scope of the appended patent application. based on

2000: Substrate Container Systems
2100: container body
2100a: front opening
2100b: rear opening
2100b(i): rear opening
2100b(ii): rear opening
2100b(iii): rear opening
2100b (iv): rear opening
2110: top side
2110(i): top view
2110(ii): top view
2110(iii): top view
2110 (iv): top view
2130: bottom
2140: gas guide passage
2140a: exit
2150: Backplate
2170: sidewall
2300: filter assembly
2300(i): filter assembly
2300(i)': filter assembly
2300(ii): Ter assembly
2300(iii): filter assembly
2310: Gas release surface
2310(i): outgassing surface
2310(i)': gas release surface
2310(ii): outgassing side
2310 (iii): gas release side
2340: buffer room
2500: rear cover
2510: protruding rib
2510a: home
2540: intake structure
2541: Intake
2542: connection structure
2700: sealing member
2710: first sealing part
2720: second sealing part
2900: gas valve assembly
2910: first elastic material
2911: pin
2920: second elastic material
2921: docking surface
2930: gas valve body
D: Expansion direction
H1: first height
H1(i): first height
H1(ii): first height
H1(iii): first height
H1(iv): first height
H2: Second height
H2(i): second height
H2(ii): second height
H2(iii): second height
H2(iv): second height
P1: Section
P2: cross section
P3: cross section
P4: Section

Claims (14)

Including the following.
It includes a container body, a top surface, a bottom surface facing the top surface, and a back plate connecting the top surface and the bottom surface, wherein the container body has a front opening and a rear opening, the front opening through which a substrate passes. the rear opening is located on the back plate and relative to the front opening, wherein the back plate has a first height, and the rear opening is less than the first height. Has a small second height,
A filter assembly, covered with its rear opening,
The rear cover is used to be sealedly connected to the container body, and a gas guide passage extending along the first height direction is formed between the rear cover and the container body, and the rear cover and the filter assembly are jointly formed in a buffer chamber. and the gas guide passage has an outlet connected to the buffer chamber. According to claim 1,
The substrate container system of claim 1, wherein the second height is about 10% to about 90% of the first height. According to claim 2,
The second height is from about 10% to about 50% of the first height, and the rear opening is located at the adjacent top surface. According to claim 1,
The substrate container system according to claim 1 , wherein the filter assembly has a gas discharge surface, the area of which is larger than that of the rear surface opening, and the gas discharge surface has a plane parallel to the back plate. According to claim 1,
The substrate container system according to claim 1 , wherein the filter assembly has a gas discharge surface, the area of which is larger than that of the rear surface opening, and the gas discharge surface has a plane making an acute angle with the back plate. According to claim 1,
The substrate container system, characterized in that the filter assembly has a gas discharge surface, the area of which is larger than the area of the rear surface opening, and the gas discharge surface has a corrugated surface. According to claim 1,
The substrate container system of claim 1 , wherein the filter assembly has a gas discharge surface, the area of which is larger than that of the rear surface opening, and the gas discharge surface extends through the rear surface opening toward the container body to form a curved contour. . According to claim 1,
The filter assembly has a gas discharge surface, the area of which is larger than that of the rear opening, the gas discharge surface extending through the rear opening toward the rear cover to form a curved contour. . According to claim 1,
The back cover has a plurality of protruding ribs projecting toward the container body and used to abut against the filter assembly, the protruding ribs being provided at intervals such that a plurality of grooves are formed therein, and the outlet of the gas guide passage. A substrate container system comprising at least the groove. According to claim 1,
It has a first sealing portion and a second sealing portion, the first sealing portion being disposed between the rear cover and the container body, and the second sealing portion further comprising a sealing member disposed between the filter assembly and the container body. A substrate container system, characterized in that. According to claim 1,
its back cover,
A substrate container system comprising an intake structure that is curved and extended below the bottom surface of the container body, and the intake structure includes an intake port facing downward relative to the bottom surface, so as to be connected to external purging equipment. According to claim 11,
A substrate container system further comprising a gas valve assembly through which a purging gas can pass, wherein the inlet has a connecting structure, and the gas valve assembly is connected to the inlet through the connecting structure. According to claim 12,
The gas valve assembly includes:
gas valve body,
A first elastic material, provided on one side of the gas valve body, has a pin, and when the gas valve assembly is assembled to the connection structure, the pin is deformed to be hermetically connected to the connection structure. system. According to claim 13,
The gas valve assembly is
The substrate container system further comprises a second elastic material provided on the other side of the gas valve body and having a docking surface so as to be connected to the external purging equipment to be sealed.

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