KR20220145179A - Substrate process device with heating jacket - Google Patents

Abstract

The present invention is a substrate processing apparatus comprising: a chamber for processing a substrate; a gas supply source storing a plurality of gases for processing the substrate and supplying the gases to the chamber; a gas supply pipe having one end connected to the gas supply source and the other end connected to the chamber; and a heating jacket surrounding the outer circumference of the gas supply pipe, wherein the temperature of gas passing through the gas supply pipe may be higher downstream of the heating jacket than upstream thereof. According to the present invention, a gas supply pipe, which may have various shapes for the designed positions, can be effectively heated.

Description

Substrate process device with heating jacket

The present invention relates to a substrate processing apparatus having a heating jacket for heating a gas supply pipe.

In the ALD or PEALD process, at least one of a source gas, a reactant gas, a purge gas, and a processing gas may be supplied to the chamber for film processing.

The gas supplied to the chamber may gradually increase in temperature as it goes downstream of the gas supply pipe close to the chamber.

The present invention is a substrate processing apparatus, and when gas for an ALD or PEALD process is supplied to a chamber, a temperature gradient may occur in the gas supply pipe, and in order to efficiently heat the gas supply pipe, which may have various shapes depending on a design location, do.

The present invention provides a substrate processing apparatus, comprising: a chamber for processing a substrate; a gas supply source for storing a plurality of gases for processing the substrate and supplying the plurality of gases to the chamber; a gas supply pipe having one end connected to the gas supply source and the other end connected to the chamber; a heating jacket surrounding the outer periphery of the gas supply pipe; may include, and the temperature of the gas passing through the gas supply pipe may be higher downstream than upstream of the heating jacket.

A discontinuous section in which the temperature of the gas passing through the gas supply pipe is lowered may occur, and the temperature of one side of the heating jacket adjacent to the discontinuous section may be higher than the temperature of the other portion of the adjacent heating jacket.

A heating jacket is continuously arranged along the gas supply pipe, and a discontinuous section occurs between the continuous heating jackets, and in the discontinuous section, a connection part for connecting the gas supply pipe and other equipment is connected, and an edge part for changing the direction of the gas supply pipe , at least one of the valve installation parts may be included.

A connection portion in which the gas supply pipe is in contact with the outside and heat loss occurs may be created, a flow rate control unit controlling the precise flow of gas in the gas supply pipe may be provided, and an inlet through which the gas is introduced into the chamber may be provided. .

At the connection portion, between the gas supply pipe and the flow rate control unit, between the gas supply pipe and the inlet, and when the gas supply pipes having different gas sources are merged with each other, at least one of the parts where the other gas supply pipes are combined may be included.

The heating jacket may be provided with a heating wire, and the heating wire may extend around the gas supply pipe in a spiral shape, and the spacing between the heating wires is the same, so that the temperature of the gas passing through the heating jacket is proportional to the number of the heating jackets can increase by

The interval between the heating wires may vary depending on the portion of the heating jacket, and the number of turns of the heating wire may increase from upstream to downstream of the heating jacket.

The gas supply pipe may include a first section and a second section, a first heating jacket may be provided in the first section, and a second heating jacket may be provided in the second section.

A discontinuous section not covered by the heating jacket may occur between the first heating jacket and the second heating jacket, and the number of turns of the heating wire in a portion adjacent to the discontinuous section of the first heating jacket or the second heating jacket increases can do.

A temperature sensing unit for sensing the temperature of the gas in the gas supply pipe may be provided, and a control unit for receiving a temperature signal measured by the temperature sensing unit and determining whether to supply electricity to the heating jacket through an electricity supply line may be provided, Electricity supply lines may be provided equal to the number of the heating jackets.

Various gases may be supplied to the chamber in which the ALD or PEALD process is performed through a gas supply pipe. The gas supply pipe may form a temperature gradient in which the temperature gradually increases as it approaches the chamber, and for this purpose, a heating jacket extending in the longitudinal direction of the gas supply pipe and surrounding the outer circumferential surface of the gas supply pipe may be provided.

The heating jacket may include a heating wire extending inside the gas supply pipe in a spiral shape.

Due to the design of the process equipment, a discontinuous section of the temperature of the gas passing through the gas supply pipe may occur.

In order to prevent heat loss of the gas in the discontinuous section, by increasing the number of turns of the heating wire of the heating jacket adjacent to the discontinuous section, it is possible to maintain a constant temperature gradient of the gas passing through the discontinuous section.

In addition, since the temperature gradient of the gas supply pipe can be adjusted by adjusting the number of turns of the heating wire, the number of heating jackets required can be reduced compared to the case of the heating jacket having a constant interval between the heating wires. Due to the decrease in the number of heating jackets provided, the number of the temperature sensing unit for sensing the temperature in the gas supply pipe and the electricity supply line for supplying electricity to the heating jacket may also be reduced.

When calculating the total power capacity for the heating jacket, the imaginary power capacity may increase as the number of heating jackets provided to calculate the total power capacity as the maximum capacity of the heating jacket increases.

Accordingly, a reduction in the number of heating jackets provided in the gas supply pipe reduces wasted power capacity, thereby avoiding excessive power capacity design.

BRIEF DESCRIPTION OF THE DRAWINGS It is explanatory drawing of the substrate processing apparatus of this invention.
Fig. 2 is an explanatory view showing a part of Fig. 1;
3 is an embodiment of the heating jacket of the present invention.

The substrate processing apparatus of the present invention may be an atomic layer deposition (ALD) apparatus. The substrate processing apparatus may include a chamber 200 in which a process for depositing a film of a substrate is performed.

The chamber 200 may include a substrate support 220 supporting the substrate W, and a shower head 210 that provides a gas supplied from the substrate processing apparatus to a space within the chamber 200 .

A plurality of gases need to be supplied to the chamber 200 in which the ALD or PEALD process is performed. A plurality of gas sources capable of supplying a plurality of gases to the chamber 200 may be provided. The gas source may be at least one of a source gas, a purge gas, a reaction gas, and a processing gas, and the gas supply pipe 140 may be a pipe through which at least one of the source gas, the purge gas, the reaction gas, and the processing gas passes.

One end of the gas supply pipe 140 may be connected to the gas source 110 , and the other end of the gas supply pipe 140 may be connected to the inlet 230 connecting the chamber 200 and the gas supply pipe 140 . A flow rate control unit 120 capable of precisely adjusting the amount of gas supplied to the chamber 200 from the gas supply source 110 may be provided, and a valve 130 that opens according to a time-division supply schedule of each gas may be provided. have.

The flow rate controller 120 may be configured by a mass flow controller (MFC).

In order for the gas to process the substrate W in the chamber 200 , it needs to be heated to a high temperature and supplied to the chamber 200 . The gas may be heated while passing through the gas supply pipe 140 .

The gas supply pipe 140 may be provided with a heating jacket 300 surrounding the gas supply pipe 140 along the outer circumferential surface. The heating jacket 300 may be arranged to extend in the gas supply direction along the gas supply pipe 140 .

The temperature of the gas passing through the gas supply pipe 140 may increase according to the number of the heating jacket 300 passing correspondingly. Among the positions of the gas supply pipe 140 , a position close to the gas supply source 110 may be referred to as an upstream position, and a position close to the inlet port 230 may be referred to as a downstream position. Accordingly, the closer the gas is to the downstream of the gas supply pipe 140 , the higher the temperature may be compared to the upstream.

When the heating jacket 300 for supplying heat to the gas supply pipe 140 has a shape surrounding the outer circumferential surface of the gas supply pipe 140, if the gas supply pipe 140 or the heating jacket 300 is not closed in a limited space, heat loss is can occur

The heating jacket 300 may be heated by hot water or electricity. If the heating jacket 300 does not maintain a predetermined temperature, it may be necessary to continuously supply electricity from the outside. The heating jacket 300 by subtracting the gas supply pipe 140 must be spatially sealed to reduce heat loss to the outside.

Accordingly, the gas box 150 may be provided. The gas box 150 may include at least one of a flow rate controller 120 , a gas supply pipe 140 , a heating jacket 300 , and a valve 130 . In addition, when the size of the gas source 110 is sufficiently small, it may be included in the gas box 150 .

The heating jacket 300 may be arranged along the gas supply pipe 140 from the flow rate control unit 120 to the inlet 230 , and a section S may be formed. For example, it may be classified into a first section ( S1 ) to a seventh section ( S7 ). One heating jacket 300 may be provided in each section. For example, seven heating jackets 300 may be provided in the seven sections (S).

The gas temperature in the gas supply pipe 140 passing from the first section S1 to the seventh section S7 may gradually increase.

The heating jacket 300 may include a heating wire 160 , and when the heating jacket 300 receives electricity from the outside, the heating wire 160 may be heated. Since the heating jacking wraps around the outside of the gas supply pipe 140 , the heating wire 160 may also extend while surrounding the gas supply pipe 140 in a spiral shape.

When the gas supply pipe 140 supplies the gas to the chamber 200 from the upstream to the downstream in a straight line, it can be expected that the gas is heated in order by the number of the heating jackets 300 .

However, when the actual equipment is provided, the gas supply pipe 140 may be formed with a bent edge portion (B), a connection portion (A) of different equipment may be formed, respectively, and when the valve 130 is installed, the valve installation portion (C) may be formed.

Referring to FIGS. 1 and 2 , it is possible to concentrate and process facilities related to gas supply or discharge to a specific location. For example, the exhaust port 240 and the inlet 230 of the chamber 200 may be provided above and below the chamber 200, and in this structure, the edge portion B may occur.

In the edge portion B of the gas supply pipe 140 , the heating jacket 300 may not be wrapped between the adjacent heating jackets 300 , and it is warmer than the portion of the other gas supply pipe 140 covered by the heating jacket 300 . losses can be high.

At the edge portion B, the gas supply pipe 140 and the outside air may directly contact, and the heat of the gas supply pipe 140 may be directly radiated to the outside air to lower the temperature. Therefore, in some sections including the edge portion B of the gas supply pipe 140 , a cold spot having a lower temperature than other sections may occur. The gas supplied to the chamber 200 by the cold spot may have a temperature change, which may cause foreign substances to be introduced into the chamber 200, thereby causing a defect in the process.

The connection part (A) may occur at a point where different gas pipes meet.

For example, a series of ALD processes may occur by supplying a source gas to the chamber 200, supplying a first purge gas, supplying a reaction gas, and then supplying a second purge gas. After supplying the source gas or the reaction gas, the purge gas supplied for the next chemical reaction may be supplied through the same gas tube as the gas tube for supplying the source gas or the reaction gas before the inlet 230 .

For example, the source gas may be supplied to the first gas supply pipes 141 and 141 , and the purge gas may be supplied to the second gas supply pipes 142 and 142 . In this case, the first gas supply pipe 141 , 141 and the second gas supply pipe 142 , 142 may be combined at any position located between the flow rate controller 120 and the first inlet 231 .

This is compared to the case where the first gas supply pipes 141 and 141 and the second gas supply pipes 142 and 142 are individually introduced into the chamber 200, when the source gas is input and then the purge gas is supplied when the second gas supply pipe ( The first purge gas of 142 and 142 may also purge residual gas of the source gas remaining in the first gas supply pipe 141 and 141 . Due to this, it is possible to prevent contamination due to residual gas remaining in each gas pipe during repeated and continuous cycles, thereby reducing the defect rate of the film treatment of the substrate W.

Accordingly, each of these gas supply pipes may have a connection part (A) due to the connection between the gas pipes as described above, if necessary, and this connection part (A) is heated by the heating jacket 300 like the edge part (B). Loss protection may be lacking.

Also, the connection part A may occur between different types of equipment connected to the gas supply pipe. For example, the connection portion A may include a portion in which the gas supply source 110 or the flow rate controller 120 is connected to the gas supply pipe, and a portion in which the gas supply pipe and the inlet 230 are connected.

Where different types of devices are connected, heat loss may be more likely to occur than where the heating jacket 300 is continuously arranged in the gas supply pipe. For example, the connection portion A may occur between the first section S1 and the flow rate control unit 120 , and between the seventh section S7 and the inlet 230 .

Accordingly, the portion between each of the first section S1 to the fourth section S4 and the portion between each of the fifth section S5 to the seventh section S7 are the fourth section S4 and the fifth section S5 ) between the edge portion (B), between the first section (S1) and the flow rate control unit 120, and between the seventh section (S7) and the inlet 230, the heat loss may be less than the connection portion (A) .

A valve 130 may be provided between the flow rate controller 120 and the inlet 230 . The opening and closing of the valve 130 may be performed according to an input schedule of the chamber 200 of each gas. When the valve 130 is installed, a discontinuous point may occur in the installation of the heating jacket 300 of the gas supply pipe by the valve 130 .

Accordingly, the valve installation portion (C) may generate a discontinuous position of the heating jacket 300 like the connection portion (A) and the edge portion (B), which may result in heat loss. In a broad sense, the valve installation part (C) may be included in the connection part (A).

The discontinuous section of the temperature of the gas supply pipe may include at least one of a connection portion (A), an edge portion (B), and a valve installation portion (C).

The heating jacket 300 may have a shape surrounding the gas supply pipe 140 . For example, when the gas supply pipe 140 has a cylindrical shape, the heating jacket 300 may have a cylindrical shape with a hollow surrounding the cylindrical gas supply pipe 140 .

The heating jacket 300 may include a heating wire 160 therein, and the heating wire 160 may extend to surround the gas supply pipe 140 in the form of a spring.

The spacing between the heating wires 160 may be the same.

If the spacing of the heating wires 160 is the same and the extension length of the heating jacket 300 is the same, only a specific temperature of the gas passing through the single heating jacket 300 may be increased. For example, if the gas passes through a single heating jacket 300 and the gas rises by 5 degrees, if four heating jackets 300 are arranged in succession without discontinuous parts, the temperature of the passing gas may rise by 20 degrees .

The temperature increase by the single heating jacket 300 may be proportional to the number of turns of the heating wire 160 wound around the heating jacket by the user.

For example, a portion P obtained by adding the second section S2 and the third section S3 of the divided gas supply pipe 140 will be described. A first heating jacket 310 and a second heating jacket 320 may be provided in the second section S2 and the third section S3, respectively. The extension length of the first heating jacket 310 and the second heating jacket 320 may be the same, and the temperature of the passing gas may also increase by 5 degrees.

The length d in the gas flow direction between the heating wires 160 may be the same between all heating jackets.

When a single heating jacket has the same spacing and the same length as the heating wires 160, a temperature discontinuity of the passing gas may occur in the discontinuous portions of the connection portion (A), the edge portion (B), and the valve installation portion (C).

A temperature sensing unit 310 may be provided in each area of the gas supply pipe 140 surrounded by a single heating jacket. For example, seven temperature sensing units 310 may be provided in the first section S1 to the seventh section S7 . A signal by each temperature sensing unit 310 may be sent to the control unit 320 .

When the temperature detected based on the signal sent from each temperature sensing unit 310 is different from the target temperature, the control unit 320 supplies or supplies electricity to the heating jacket 300 through the electricity supply line 330 . can stop

For example, when the gas supplied from the flow rate controller 120 through the gas supply source 110 is 100 degrees, the gas passing through each section may rise by 5 degrees, and the gas passing through the first section S1 may be 105 degrees. In this case, the part that senses the temperature of each section may have to be located at the most downstream of each section to measure the temperature rise of 5 degrees, so it may be between 100 and 105 degrees in the drawing, but for convenience, the gas that has undergone a normal temperature rise is 5 It can be assumed that the degree rise is measured.

Accordingly, the first temperature sensing unit 311 may sense 110 degrees, and the second temperature sensing unit 312 may sense 115 degrees. When the first temperature sensing unit 311 measures a temperature lower than 110 degrees, the control unit 320 may send electricity to the first heating jacket 310 through the first electricity supply line 331 , and the control unit 320 . ) may continue to supply electricity until the temperature sensing by the first temperature sensing unit 311 reaches 110 degrees.

When the entire gas supply pipe is heated with a standardized single heating jacket having the same spacing and length of the heating wires 160 , the temperature sensing unit 310 and the electricity supply wire 330 may be provided as many as the number of the heating jackets 300 .

Therefore, when at least one of the connection part (A), the edge part (B), and the valve installation part (C) occurs, the heating jacket 300 can be additionally installed, and the more the type of gas to be supplied is configured in various ways The number of required heating jackets 300 may increase exponentially.

Accordingly, the temperature sensing unit 310 and the electric supply line 330 may be increased by the number of the increased heating jackets, which may make it complicated to manage the entire system because there are too many parts to be controlled. In addition, an increase in cost due to a plurality of precise devices may be inevitable, and overall temperature management may be difficult due to frequent malfunctions in facility management.

Fine temperature adjustment in discontinuous sections can be difficult with a single standardized heating jacket. For example, the temperature rise of a single heating jacket may be fixed at 5 degrees or 10 degrees, and in the discontinuous section, if the required temperature rise is 3 degrees or 13 degrees, the desired temperature can be controlled by the addition of the heating jacket 300 none.

Accordingly, in the above case, the number of windings or the length of the hot wire 160 may be varied according to the section. For example, one heating jacket 300 may be provided in the entire integrated section (S') in which the second section and the third section are combined. The increase in temperature can be controlled by increasing the number of turns of the heating wire 160 in the section where the temperature is to be increased.

Since the downstream of the integration section S' is relatively closer to the chamber 200, the temperature may be higher than that of the upstream. The interval d1 of the heating wire 160 in the upstream of the integration section S', the interval d2 of the midstream heating wire 160, and the interval d3 of the downstream heating wire 160 in the sequence are gradually narrower. can get

In addition, the temperature sensing unit 310 may be provided downstream of the integrated section S', and the measured temperature information may be sent to the control unit 320 . The control unit 320 may determine whether to supply electricity to the heating jacket 300 through the electricity supply line 330 according to the measured temperature.

Referring to Figure 3, as an embodiment of the heating jacket, the first section (S1) and the second section (S2) are integrated, but the continuous section between the discontinuous sections is a single heating jacket in which the number of turns can be changed. may be sufficient. The heating jacket 300 in which the number of windings can be changed based on the temperature discontinuous section may be arranged adjacently.

For example, the first integrated heating jacket may be provided in the first integrated section (S1') integrating the first section (S1) to the fourth section (S4), the fifth section (S5) to the seventh section A second integrated heating jacket may be provided in the second integrated section (S2') integrating (S7). That is, seven heating jackets with the same number of turns can be replaced with an integrated heating jacket with two different number of turns.

In addition, when the number of windings is variable along the length of the integrated heating jacket is adjacent to the discontinuous section, by increasing the number of turns, it is possible to maintain a constant temperature of the gas passing through the discontinuous section.

For example, the downstream of the first integrated heating jacket adjacent to the edge portion (B) and the upstream of the second integrated heating jacket may increase the number of turns to prevent heat loss through the edge portion (B). The integrated heating jacket can prevent heat loss by increasing the number of turns in the vicinity of the inlet 230 between the flow control unit 120 and the gas supply pipe, which is the connection part (A), and also in the vicinity of the valve installation part (C). to prevent heat loss.

In the case of the integrated heating jacket, the number of required temperature sensing unit 310 or electricity supply line 330 can be reduced, so that the cost of installation, management, and maintenance can be reduced. When the length of the integration section S' is long, the temperature sensing unit 310 may be additionally provided at a predetermined interval between the upstream and the downstream to accurately detect a change in temperature.

Accordingly, the heating jacket having a different number of turns of the heating wire 160 according to the location may be one in which a temperature gradient that can be implemented by a plurality of heating jackets is implemented with a single heating jacket. This not only simplifies the design by reducing the number of heating jackets, but also increases the efficiency of total power capacity estimation.

When calculating the power capacity of the heating jacket 300 , the total power capacity may be calculated based on the maximum capacity of the heating jacket 300 . That is, in reality, the supply or discharge of each gas may be operated in a time-shared manner, but when preparing the entire facility, the total power capacity may be calculated including a case in which all devices are operated simultaneously.

In addition, since the power capacity is calculated to have a margin greater than the maximum required power capacity in case of an emergency, the imaginary power capacity may be proportionally increased according to the number of the heating jacket 300 .

Therefore, in the heating jacket 300 in which the number of windings is changed according to the position, the amount of wasted imaginary power is reduced compared to the heating jacket 300 having the same spacing of the heating wires 160, thereby preventing excessive power capacity design.

When a plurality of heating jackets 300 are provided, a temperature sensing unit 310 may be provided for each heating jacket 300 , and the temperature information sensed by each temperature sensing unit 310 is transmitted to the control unit 320 . can The control unit 320 is referred to as an integrated control unit in the sense that the temperature sensing unit 310 and the gas supply pipe 140 are provided for each heating jacket 300, meaning that information on all heating jackets is sent to and managed by one control unit. can do.

The integrated control unit may determine the heat loss portion of the gas supply pipe 140 from the temperature information of each temperature sensing unit 310 . The integrated control unit may supply electricity through the electricity supply line 330 to the heating jacket determined that the heat loss has occurred.

One end of the electric supply line 330 may be connected to the integrated control unit, the other end may be connected to the heating jacket 300 , and the electric supply line 330 is provided with an adjustment device capable of adjusting the voltage or current to the heating jacket 300 . can be

The entire process of a substrate processing apparatus performing an ALD or PEALD process is looked at.

A source gas may be provided for atomic film deposition, and a reactive gas that chemically reacts with the source gas may be provided. A desired atomic film layer may be formed by a chemical reaction between the source gas and the reaction gas, and a purge gas may be introduced into the chamber 200 for removing components remaining after the reaction through the exhaust port 240 in the chamber 200 . .

A source gas may be introduced into the chamber 200 from the substrate processing apparatus, and the source gas may be deposited on a substrate in one layer. In order to prevent unnecessary deposition of the source gas on the substrate W, the purge gas may be introduced into the chamber 200 after a predetermined time. Since the purge gas should have a low level of chemical reaction with the source gas or the reactant gas, the purge gas may be provided as a component having low reactivity with other chemical species.

After the concentration of the source gas in the chamber 200 is lowered by the input of the purge gas, the reaction gas may be introduced into the chamber 200 . The input reaction gas may have a chemical reaction with a deposition component of the source gas deposited on the substrate. An atomic layer of the source gas may be replaced with a component generated by a chemical reaction between the source gas and the reactant gas. The newly substituted film component may be a component targeted to be deposited on the substrate (W). When the target layer is deposited, the remaining components used in the remaining reaction may be evacuated from the chamber 200 again by the purge gas.

Accordingly, one cycle of forming the first deposition layer may include input of a source gas, input of a first purge gas, input of a reactive gas, and input of a second purge gas. In this way, one atomic deposition layer can be stacked per cycle, and the thickness of the deposition layer can be adjusted to a desired thickness by a user.

The purge gas is continuously supplied for one cycle, the supply is temporarily interrupted while the source gas is being supplied, the supply is temporarily stopped while the reactive gas is being supplied, or the purge gas is introduced immediately after the source gas is input or is introduced immediately after the reactive gas is input can be The first purge gas supplied after the source gas and the second purge gas supplied after the reaction gas may be different types of gases.

Referring to FIG. 1 , in an embodiment, the source gas may be gas A, the first purge gas may be gas B, the reaction gas may be gas C, the second purge gas may be gas D, and the processing gas may be gas E. Referring to FIG.

The process gas may remove substances remaining after a main chemical reaction between the source gas and the reactant gas from the chamber 200 . For example, the remaining material may be Cl, and the processing gas may be hydrogen gas.

The exhaust port 240 may be provided with an exhaust pressure adjusting unit that adjusts the pressure of the exhaust gas and maintains the exhaust gas at a constant pressure.

The exhaust pressure adjusting unit may be a known gas discharge regulator, and may include an external safety valve capable of adjusting the pressure.

Looking at an embodiment of the film deposition process step by step, the step of depositing one atomic layer layer may be formed in five steps.

In the first step, the first valve 131 of the first gas supply pipe 141 connected to the first gas supply source 111 is opened, and the source gas (gas A) is introduced into the chamber 200 to be deposited on the substrate. .

In the second step, the first valve 131 of the first gas supply pipe 141 may be closed, and the first purge gas (gas B) may be introduced into the chamber 200 through the first inlet 231 . The first purge gas (gas B) injected into the chamber 200 may exhaust the source gas (gas A) in the chamber 200 to the outside through the exhaust port 240 .

After the first valve 131 of the first gas supply pipe 141 is closed, the second valve 132 of the second gas supply pipe 142 connected to the second gas supply source 112 may be opened. Alternatively, the second valve 132 may be closed only while the first valve 131 is opened, and may continue to be opened during the remaining process time when the first valve 131 is closed.

In the third step, the third valve 133 of the third gas supply pipe 143 connected to the third gas supply source 113 is opened and a reaction gas (gas C) may be introduced into the chamber 200 , and the source gas ( The gas A) and the reactant gas (gas C) may undergo a chemical reaction to be substituted with a desired film component.

In the fifth gas supply source 115 step, hydrogen gas may be introduced into the chamber 200 through the fifth valve 135 in order to effectively remove the remaining components after the chemical reaction forming the deposition film.

In the fifth step, the third valve 133 of the third gas supply pipe 143 connected to the third gas supply source 113 is closed, and the purge gas (gas C) is introduced into the chamber 200 through the second inlet 232 . can be put in The purge gas introduced into the chamber 200 may discharge the reaction gas to the outside through the exhaust port 240 .

The order of the fifth gas supply source 115 step and the fifth step may be determined according to an input time of the purge gas.

When the purge gas is supplied only intermittently after supplying the source gas or after supplying the reactant gas, after the film is formed between the source gas and the reactant gas, the remaining components must be removed by the second purge gas so as not to affect the subsequent cycle. have.

Accordingly, when the purge gas is intermittently supplied, the fifth step may be performed after the fifth gas supplying step 115 .

However, in order to maintain a constant gas pressure in the chamber 200, when the purge gas is supplied to the chamber 200 for most of the time except for a specific time in the cycle, the fifth gas supply step 115 is performed after the fifth step. may come

A uniform deposition film process of one cycle may be completed through the first to fifth steps. Since the fourth step is a process for effectively removing chlorine, the fourth step may be intermittently performed if the removal by hydrogen gas is sufficient after the formation of several deposition layers in the design of the process.

110... gas source (111 to 115)
120... flow control unit (121 to 125)
130... valves (131 to 135)
140... gas supply pipe (141 to 145)
150... gas box 160... heated wire
200...chamber 210...shower head
220... substrate support 230... inlet (231 to 233)
240... exhaust vent 300... heated jacket (310, 320)
310... temperature sensing unit (311, 312) 320... control unit
330... electrical supply lines (331, 332)
W... Board A... Connection
B... Edge part C... Valve mounting part
S... section (S1 to S7) S'... integrated section

Claims (10)

a chamber for processing the substrate;
a gas supply source for storing a plurality of gases for processing the substrate and supplying the plurality of gases to the chamber;
a gas supply pipe having one end connected to the gas supply source and the other end connected to the chamber;
a heating jacket surrounding the outer periphery of the gas supply pipe; including,
A substrate processing apparatus in which a temperature of the gas passing through the gas supply pipe is higher downstream than upstream of the heating jacket.
The method of claim 1,
A discontinuous section occurs in which the temperature of the gas passing through the gas supply pipe is lowered,
A substrate processing apparatus in which a temperature of one side of the heating jacket adjacent to the discontinuous section is higher than a temperature of another portion of the adjacent heating jacket.
The method of claim 1,
The heating jacket is continuously arranged along the gas supply pipe,
A discontinuous section occurs between the successive heating jackets,
The discontinuous section includes at least any one of a connection part for connecting the gas supply pipe and other equipment, an edge part for changing a direction of the gas supply pipe, and a valve installation part.
The method of claim 1,
A connection portion in which the gas supply pipe is in contact with the outside and heat loss occurs is created,
A flow rate control unit for controlling the precise flow of gas in the gas supply pipe is provided, and an inlet through which the gas is introduced into the chamber is provided,
In the connection portion, between the gas supply pipe and the flow rate control unit, between the gas supply pipe and the inlet, and when the gas supply pipes each having the different gas supply sources are merged with each other, at least one of the parts where the other gas supply pipes are merged. A substrate processing apparatus comprising a.
The method of claim 1,
The heating jacket is provided with a heating wire,
The heating wire wraps around the gas supply pipe in a spiral shape and extends,
The spacing between the heating wires varies depending on the location of the heating jacket,
A substrate processing apparatus in which the number of windings of the heating wire increases from upstream to downstream of the heating jacket.
The method of claim 1,
The gas supply pipe is divided into a plurality of sections,
A first heating jacket is provided in the first section, and a second heating jacket is provided in the second section,
A discontinuous section not covered by the heating jacket occurs between the first heating jacket and the second heating jacket,
The number of turns of the hot wire in a portion adjacent to the discontinuous section of the first heating jacket or the second heating jacket increases.
The method of claim 1,
A temperature sensing unit for sensing the temperature of the gas in the gas supply pipe is provided,
A control unit for receiving the temperature signal measured by the temperature sensing unit and determining whether to supply electricity to the heating jacket through an electricity supply line is provided,
The substrate processing apparatus is provided with the number of the electric supply lines equal to the number of the heating jackets.
The method of claim 1,
A heating wire is provided inside the heating jacket to surround the periphery of the gas supply pipe and supply heat,
In the first heating jacket, the number of windings of the heating wire is constant in the longitudinal direction of the gas supply pipe, and in the second heating jacket, the number of windings of the heating wire is changed in the longitudinal direction of the gas supply pipe,
The total number of the first heating jackets surrounding the gas supply pipe is greater than the total number of the second heating jackets.
The method of claim 1,
A plurality of the heating jackets are provided, and a temperature sensing unit is provided for each of the plurality of heating jackets,
An integrated control unit to which temperature information sensed by the plurality of temperature sensing units is transmitted is provided;
The integrated control unit determines the heating jacket in which the heat loss of the gas supply pipe has occurred from the temperature information of each temperature sensing unit, and supplies electricity through an electricity supply line provided for each heating jacket,
One end of the electric supply line is connected to the integrated control unit, the other end of the electric supply line is connected to the heating jacket, and an adjustment device for adjusting voltage or current is provided on the electric supply line.
The method of claim 1,
The plurality of gases include at least one of a source gas, a reactive gas, a purge gas, and a processing gas,
The source gas and the reaction gas undergo a chemical reaction in which a film is deposited on the substrate,
After the source gas or the reaction gas is injected into the chamber, the purge gas is injected into the chamber,
The processing gas is a substrate processing apparatus to remove a material remaining after the reaction of the source gas and the reaction gas from the chamber.

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