KR20220099224A - Gas Treatment Device Using RF-Excited Water Molecules and RF-Discharged Plasma Radicals and Ions - Google Patents

Abstract

The present invention relates to a gas treatment device using RF-excited monomolecular water droplets and RF-excited plasma discharged radicals and ions, comprising: a reaction pipe; an RF supply unit; a plurality of discharge holes; a main pipe; a spiral gas flow path guide; and a gas component measurement unit. The present invention can increase the reaction efficiency with an object to be treated.

Description

Gas Treatment Device Using RF-Excited Water Molecules and RF-Discharged Plasma Radicals and Ions

The present invention relates to a gas treatment device for purifying exhaust gas, toxic gas, odor gas, and gas containing bacteria or various harmful substances, and more particularly, it can effectively remove harmful components in air polluted by various pollutants. By irradiating RF or RF plasma discharge on the pipe to which the vapor or water droplets in the cluster form supplied to It relates to an RF-excited monomolecular water droplet and a gas treatment apparatus using RF-excited plasma discharge radicals and ions, which are reformed into hydrogen radicals and hydroxyl radicals to effectively purify them by reacting with contaminants in the gas.

Recently, as the indoor living time increases and the indoor space is gradually sealed, interest in indoor air quality is increasing. The higher the concentration, the more severe it may appear.

For example, if you look at the pollutants flowing into the room from outside air, there are various air pollutants generated from vehicle operation and industrial sites, including fine dust. , it was found that various pollutants were emitted from the daily activities of residents and various household items.

These indoor air pollutants include fine dust and various pollutants introduced from the outside, radon and asbestos generated from building materials, and formaldehyde, dust, and volatile organic compounds (VOC) generated from various household products ( VOC), nitrogen dioxide, carbon monoxide, cigarette smoke, micro-organisms, etc., ammonia and sulfurous acid gas are added to common indoor pollutants in the rest rooms of various industrial sites, and indoor air pollutants are The higher the concentration of pollutants flowing into the room or generated from the indoor air itself, the more severe it may appear. In particular, when looking at the pollutants generated from the indoor air itself, it was found that various pollutants were emitted from building materials, kitchen heating fuels, human activities, and various household items.

Since these pollutants are known to cause various diseases including respiratory diseases, various technologies for improving indoor air quality have been proposed to efficiently remove pollutants and create a comfortable indoor environment. There are air purifiers.

The dry type air purifier sucks polluted air with a fan and then forcibly passes it through the filter to filter out dust or bacteria in this process. It is designed to be removed. Here, the filter is a high-density filter with a dust collection efficiency of 80% to 99.97% for particles of 0.3, and is efficient in collecting small particles. As the airflow increases, the airflow decreases, which reduces the purification capacity of the air purifier, and may become a source of contamination due to contamination of the filter, so it must be replaced.

Therefore, there is a disadvantage that not only causes high cost due to periodic filter replacement and disposal, but also causes environmental pollution. are used together, but it is inconvenient to have to clean and replace each filter from time to time.

The wet type air purifier is a method to remove dust particles by direct absorption and diffusion by inertial collision by contacting airborne dust particles with droplet and liquid blocking bubbles, etc., which are generated by spraying water with the inhaled air. Since a separate filter is not used, there is no need to replace it. However, if the water is not changed frequently, contamination due to bacterial propagation and only relatively large particles of contaminants can be treated. As a result, it is not widely used.

On the other hand, in recent years, the dry type air purifier is additionally configured with an anion generator to neutralize positively charged polluted dust or cations. There is this.

In addition, a device for sterilization using ultraviolet light by additionally installing an ultraviolet (UV) lamp has been proposed, but the action such as sterilization and deodorization of pollutants is achieved only after a certain contact time at a certain distance from the ultraviolet light source (for example, within about 20 cm). Therefore, the proper effect can be obtained only when sufficient air is introduced into the device, and the effect is limited depending on the degree of contamination of the lamp used as a light source and the lifespan limit. In addition, there is a disadvantage that the pollution source attached to the inside of the facility, not the pollution source floating in the air, cannot be removed.

In addition, there are air purifiers equipped with an ozone generator. However, ozone sterilization uses ozone made by ionizing air or oxygen, which is effective in removing pollutants in the air and removing attached pollutants. Although it is suitable for facilities handling products in the form of products, when using ozone, due to ozone toxicity, there is insufficient supplementary device for effective removal of pollutants frequently occurring in the living environment in addition to the problem of indoor living safety. In the case of general air sterilizers, the standard is stipulated that the ozone concentration is below 0.05ppm. According to what is generally known in the field of food science, when the ozone concentration is at least 0.5ppm, the mortality rate is over 99.9% in seconds to minutes. Therefore, the sterilizing power of ozone or active species with a concentration lower than that is inevitably limited.

As such, in the case of an air purifier using a plasma generator, an ozone generator, and an ultraviolet lamp according to the prior art, it is necessary to consider the adhesion and growth rate of microorganisms floating in the air, or to stably maintain the sterilization power in the case of a facility where frequent pollutants are introduced. However, in reality, ozone or plasma has a reaction time of less than a few seconds and is destroyed at the same time as it is created, so there is a limit to increasing the removal efficiency of microorganisms such as airborne bacteria in indoor air. If the bacteria adhere to the surface of stored products and become adherent bacteria, it is impossible to remove these contaminants.

That is, the air purifier according to the prior art simply sucks indoor air and passes it through a high-density filter medium such as a HEPA filter to filter out contaminants, thereby removing dust or foreign substances to lower the degree of indoor pollution. Continuous and effective sterilization and disinfection of pathogenic bacteria such as E. coli and Salmonella, mold adhering to indoor walls or articles, and substances that cause various odors, even in the case of air purifiers with plasma generators, ion generators, ultraviolet lamps and ozone generators. There was this difficult problem.

As another prior art, a 'nanobubble generator and a nanobubble generator' has been proposed through Korean Patent Application Laid-Open No. 10-2019-0042081, and claim 1 includes a 'housing; at least one blade; at least one first magnet; and at least one second magnet, the nano bubble generator comprising: an inlet for accommodating a liquid containing macro bubbles; a first chamber operatively disposed downstream of the inlet; a second chamber operatively disposed downstream of the first chamber; and an outlet operatively disposed downstream of the second chamber, wherein the at least one blade is positioned within the first chamber and, in use, contains microbubbles contained in a liquid for converting such macrobubbles into microbubbles. break the bubble; the at least one first magnet is located within the second chamber; the at least one second magnet is associated with the second chamber, and (i) the at least one first magnet and the at least one second magnet, wherein the polarity of the at least one first magnet is that of the at least one second magnet. A nanobubble generator arranged to be opposite to the polarity, and (ii) at least one first magnet is movable with respect to the at least one second magnet.' has been proposed.

However, the nanobubble generator according to the prior art is a technique for physically cutting microbubbles using a blade, and there is a limit to finely splitting water droplets having a large unit surface area in which a large number of water molecules are clustered, especially single molecules. There was a disadvantage that it was impossible to process into a shape.

As another prior art, an air purifying device using a streamer discharge has been proposed through Korean Patent Application Laid-Open No. 10-2006-0085647. There is a problem in that it is difficult to improve the sterilization performance by performing the sterilization treatment. Also, since it is necessary to increase the discharge intensity in order to improve the sterilization treatment performance, there is a problem that a large amount of ozone is generated in excess of a prescribed value.

In addition, in order to improve the sterilization treatment performance by radicals, a catalyst means is required, and as these catalyst means are disposed in the direction perpendicular to the air flow path on the discharge port side, the air flow is obstructed, thereby increasing the differential pressure, and in the prior art. The disclosed structure of the discharge unit has a problem in that the differential pressure is increased by obstructing the air flow.

In addition, there is a limitation in the shape of the discharge unit, and accordingly, there is a problem in that it is difficult to apply it to an air purifier having various shapes.

Therefore, in consideration of the user's current state or preference, there is an urgent need for a technology that has excellent removal efficiency of harmful substances in gas for creating a comfortable indoor/outdoor environment, and has good maintenance convenience and economic feasibility.

Registered Patent No. 10-2059380 (2019.12.19.) Laid-open Patent Publication No. 10-2019-0042081 (2019.04.23.) Registered Patent No. 10-2059380 (2019.12.19.) Registered Patent No. 10-2050278 (2019.11.25.) Publication No. 10-2020-0001918 (2020.1.07.)

The present invention was created to solve the problems of the prior art as described above, and an object of the present invention is that ultrafine water droplets in the form of single molecules have a very large unit surface area, unlike those in the form of clusters in which a large number of water molecules are clustered. It is to provide a purification device for gas containing harmful substances using an ultra-fine water droplet generator using RF, which can generate water molecules that are highly chemically reactivity and non-hazardous because dielectric dipoles in a monomolecular state are exposed. In addition, the present invention is to provide a purification apparatus for gases containing various harmful substances because the chemical reactivity of hydrogen ions, hydroxyl ions, hydrogen radicals, and hydroxyl radicals generated by RF excitation plasma discharge is very excellent and there is no harmfulness.

Another object of the present invention is to form a monomolecular water molecule by evaporating the moisture on the pipe by dielectric heating by supplying moisture to the pipe line by means of a water supply device and by supplying RF energy through the RF supply device, and forming water molecules in the form of a single molecule on the outside of the pipe line. An object of the present invention is to provide a gas treatment device that is compact and can effectively remove harmful substances in the gas by continuously generating ultra-fine droplets in the form of single molecules by being discharged to the outside of the pipe through the perforated hole.

Another object of the present invention is to form a monomolecular water molecule by evaporating water on the pipe by dielectric heating by supplying moisture to the pipe line by a moisture supply device and RF energy by the RF supply device, and furthermore, the RF energy It is to provide a gas treatment device for gases containing various harmful substances by using the excellent chemical reactivity of hydrogen ions, hydroxyl ions, hydrogen radicals, and hydroxyl radicals generated by RF excited plasma discharge by supplying

In accordance with a preferred embodiment of the present invention for realizing the above object, a gas processing apparatus using RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions for purifying a gas containing harmful substances a reaction pipe in which the temperature of water is 0~100℃; One or a plurality of units installed at intervals on one side of the reaction pipe are irradiated with an RF having a supply energy of 0.1 kw to 10 kw, and the supplied water is separated into unit water molecules through dielectric heating action, or hydrogen ions and hydroxyl ions , an RF supply module for reforming into hydrogen radicals and hydroxyl radicals; a plurality of discharge holes formed outside the reaction pipe to supply ultrafine water droplets separated into unit water molecules through the RF supply module to the outside of the reaction pipe; It is characterized in that it is composed of; a main pipe through which the gas to be treated passes therein as a pipe element surrounding the reaction pipe and has an internal pressure of 0.8 to 1.2 atm.

As a preferred feature of the present invention, the moisture supply is in any one of a steam generator for supplying high-temperature steam, a sprayer for spraying high-pressure moisture through a nozzle, or an ultrasonic oscillator using ultrasonic oscillation.

As another preferred feature of the present invention, the reaction tube is provided with a heat generating heater on the inside or outside that receives power to increase the internal temperature and performs a heating action.

As another preferred feature of the present invention, the reaction pipe path is configured to include an igniter for forming an initial plasma discharge on one side.

As another preferred feature of the present invention, a dielectric constant measurement module for measuring the concentration of water molecules in a monomolecular form in the gas supplied to the outside provided in the reaction pipe; The dielectric constant measurement module is connected to a control circuit and consists of a controller for applying a control signal to the moisture supply unit and the RF supply module.

As another preferred feature of the present invention, the reaction pipe has a spiral gas flow guide formed on the outside of the reaction pipe to discharge the gas in the form of a vortex.

As another preferred feature of the present invention, a suction fan or a blower fan for sucking air is installed on one side of the main pipe line.

As another preferred feature of the present invention, the main pipe is in that the drain hole is installed in the lower part.

As another preferred feature of the present invention, a measuring unit for measuring a gas component is installed on one side of the gas supply unit or the gas discharge unit.

As another preferred feature of the present invention, the main pipe is connected to one side of the pressure pump for adjusting the internal pressure.

The gas treatment apparatus according to the present invention can continuously generate RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions. A useful effect that can be effectively removed is expected.

The features and advantages of the present invention will become more apparent from the following detailed description taken in conjunction with the accompanying drawings. Prior to this, the terms or words used in the present specification and claims should not be construed in a conventional and dictionary meaning, and the inventor may properly define the concept of the term to describe his invention in the best way. Based on the principle that there is, it should be interpreted as meaning and concept consistent with the technical idea of the present invention.

1 is a conceptual diagram of the conversion of the present RF excitation into a monomolecular water molecule, (1) of FIG. 1 is a cluster-type water molecule constituting water vapor, and FIG. 1(2) illustrates a cluster-type water molecule A conceptual diagram showing a monomolecular form of a water molecule converted by
2 is a schematic diagram of RF steam reforming, in which (1) of FIG. 2 is a water molecule in the form of a cluster constituting water vapor, (2) in FIG. 2 is a water molecule in a monomolecular form by RF excitation (3) is a conceptual diagram showing hydrogen radicals, hydroxyl radicals, hydrogen ions, and hydroxyl ions generated by RF plasma discharge.
3 is a top view of a gas treatment apparatus using RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions;
Figure 4. Front view of a gas treatment apparatus using RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions
Figure 5. A partial enlarged detail view of a gas treatment apparatus using RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions
Figure 6. Top view of RF-excited monomolecular water droplet and RF-excited plasma discharge radical and ion generation reaction pipe
Figure 7. A half cross-sectional view of the RF-excited monomolecular water droplet and the RF-excited plasma discharge radical and ion generation reaction pipe

Hereinafter, the configuration and operation of the embodiment of the present invention will be described in detail with reference to the accompanying drawings. However, it is to be understood that the present invention is not intended to be limited to the specific disclosed form, and includes all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. In the present application, terms such as “comprise” or “have” are intended to designate that a feature, step, operation, component, part, or combination thereof described in the specification exists, but one or more other features, steps, or operations , it should be understood that it does not preclude the possibility of the presence or addition of components, parts, or combinations thereof. That is, throughout the specification, when a part "includes" a certain component, this means that other components may be further included, rather than excluding other components, unless otherwise stated.

In addition, unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which the present invention pertains. Terms such as those defined in commonly used dictionaries should be interpreted as having meanings consistent with the meanings in the context of the related art, and should not be interpreted in an ideal or excessively formal meaning unless explicitly defined in the present application. does not

Here, repeated descriptions, well-known functions that may unnecessarily obscure the subject matter of the present invention, and detailed descriptions of configurations are omitted so as not to obscure the subject matter of the present invention. The embodiments of the present invention are provided in order to more completely explain the present invention to those of ordinary skill in the art. Accordingly, the shapes and sizes of elements in the drawings may be exaggerated for clearer description.

1 is a conceptual diagram of a process of converting water (clustered water molecules) in which water molecules are clustered by hydrogen bonds according to the present invention into monomolecular water molecules by RF dielectric heating.

The figure shows a process in which the water molecules (1) in the form of clusters constituting water are converted into water molecules (2) in the form of monomolecules by RF dielectric heating. Oxygen constituting the water molecule has a certain electronegativity due to its relatively strong electron affinity, so it has a weak negative charge (δ ^- ), and the hydrogen constituting the water molecule has a relatively weak electron It has a weak electronegativity due to its affinity, so it has a weak positive charge (δ ⁺ ). As such, the bond between oxygen with a weak negative charge (δ ^- ) and hydrogen with a weak positive charge (δ ⁺ ) forms hydrogen bonds with neighboring water molecules to form a cluster. When liquid water is heated by direct heating or convection heating, it is difficult to break hydrogen bonds between water molecules, so that the water molecules evaporate in the form of clusters 10 . However, in the case of dielectric heating by RF (or electromagnetic wave), water molecule clusters through dielectric heating in which the positive charge of hydrogen (δ ⁺ ) and the negative charge of oxygen (δ ^- ) of water molecules are shaken using electromagnetic wave energy. From (1), it is possible to separate the water molecules 20 in the form of a single molecule.

2 is a schematic diagram of RF steam reforming according to the present invention, wherein (1) of FIG. 2 is a cluster-shaped water molecule (1) constituting steam, and FIG. 2 (2) is a monomolecular form of RF excitation. Water molecules (2), (3) of FIG. 2 is a conceptual diagram showing hydrogen radicals (3), hydroxyl radicals (4), hydrogen ions (5), and hydroxyl group ions (6) generated by RF plasma discharge. After the water molecule cluster (10) is converted into monomolecular water molecules (2) by RF dielectric heating, when RF energy is further irradiated, a plasma discharge phenomenon occurs. Water molecules (2) or hydrogen radicals (3), hydroxyl radicals (4), hydrogen ions (5), and hydroxyl group ions (6) have very good chemical reactivity, so chemical reaction with gases containing various harmful substances is not possible. It has an effect that is achieved quickly, and since water is formed as a by-product, it is possible to reduce the damage of environmental pollution.

3 and 4 are top and front views, respectively, of a gas treatment apparatus using RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions according to the present invention. In the drawing, water is supplied into the treatment gas injection unit 11 into which gas containing harmful substances to be removed is injected, the injection unit gas measurement unit 12 for analyzing harmful components of the gas, and the reaction pipe 21 . The water vapor injection unit 13 for heating, the RF injection unit 14 for supplying the RF to the inside of the reaction pipe 21, and the water vapor supplied by the electromagnetic wave energy of the supplied RF is converted into monomolecular water through RF dielectric heating. Reaction pipe 21 that converts molecules (2) into hydrogen radicals (3), hydroxyl radicals (4), hydrogen ions (5) and hydroxyl ions (6) through plasma discharge by electromagnetic wave energy of RF, which is generated or additionally supplied ), the ignition unit 15 that facilitates the initial ignition process in forming a plasma discharge by RF electromagnetic wave energy supplied in the reaction pipe 21, and water molecules in the form of single molecules generated from the reaction pipe 21 (2) or a discharge hole 18 for discharging hydrogen radicals 3, hydroxyl radicals 4, hydrogen ions 5 and hydroxyl ions 6 to the outside of the reaction pipe 21, the harmful substances, etc. Single molecule supplied through the exhaust hole 18 together with the gas containing harmful substances supplied through the blowing fan 19 for sucking or blowing the contained gas and the treatment electric injection unit 11 In the form of water molecules (2) or hydrogen radicals (3), hydroxyl radicals (4), hydrogen ions (5) and hydroxyl ions (6) cause a chemical reaction with each other, the main pipe 20, the treatment gas injection part ( 11), water molecules (2) or hydrogen radicals (3), hydroxyl radicals (4), hydrogen ions in the form of monomolecules supplied through the discharge hole 18 together with the gas containing harmful substances supplied through In the process in which (5) and hydroxyl ions (6) are supplied into the main pipe line 20, a spiral false flow path guide 17 for forming a vortex is formed on the outside of the reaction pipe 21, and a gas containing harmful substances After performing a chemical reaction with a monomolecular water molecule (2) or a hydrogen radical (3), a hydroxyl radical (4), a hydrogen ion (5), and a hydroxyl group ion (6) A drain hole (22) for discharging the generated liquid waste, water molecules (2) or hydrogen radicals (3), hydroxyl radicals (4), hydrogen ions (5) and hydroxyl ions (6) The treated late gas discharge unit 24 for discharging the treated gas after chemical reaction with the like, and the discharged side gas formed on one side of the treated late gas discharge unit 24 to measure the gas composition after treatment A measurement unit 23 is shown.

5 is a partially enlarged detailed view of a gas treatment apparatus using RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions.

In the drawings, the main pipe 20, the spiral gas flow guide 17, and the discharge hole 18 are shown in detail.

6 and 7 are a top view and a half cross-sectional view of the reaction pipe 21 for generating RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions, respectively.

In the drawing, a water vapor injection unit 13 for supplying moisture or water vapor into the reaction pipe 21, an RF injection unit 14 for supplying RF energy to the inside of the reaction pipe 21, and the reaction pipe 21 from the inside Ignition unit 15 for facilitating plasma initial discharge, water molecules (2) or hydrogen radicals (3) in the form of single molecules formed inside the reaction pipe (21), hydroxyl radicals (4), hydrogen ions (5) and a discharge hole 18 for discharging hydroxyl ions 6 and the like to the main pipe 20, discharged monomolecular water molecules 2 or hydrogen radicals 3, hydroxyl radicals 4, hydrogen ions ( 5) and the hydroxyl ions 6 as well as the treatment electricity supplied to the main pipe 20 through the treatment electricity injection unit 11 are mixed together to form a vortex and flow to facilitate chemical reaction application A spiral narrow gas flow guide 17 and the like are shown.

With reference to the above drawings, the configuration of a gas treatment apparatus using RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions according to the present invention will be described in detail.

First, the present invention largely consists of a water supply unit 13 for supplying moisture from the reaction pipe 21, the main pipe 20, the moisture supply unit (not shown) to the inside of the reaction pipe 21, and an RF supply unit (not shown). The RF supply unit 14 for supplying RF electromagnetic wave energy from the inside of the reaction pipe 21, the ignition unit 16 for facilitating the initial plasma ignition inside the reaction pipe 21, and the reaction pipe 21 are generated inside A plurality of discharge holes 18 for discharging the RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions to the main conduit 20, and blow to suck or blow gas into the main conduit 21 For supplying gas containing harmful substances to the inside of the fan 19, the treatment electric injection unit 11 for supplying gas into the main pipe 21 by the blowing fan 19, and the main pipe 20 Water molecules (2) or hydrogen radicals (3), hydroxyl radicals (4), hydrogen ions (5) and hydroxyl groups The ions 6 and the like form a chemical reaction and then are composed of a process gas discharge unit 31 that is discharged.

The moisture supply is an element for supplying moisture in the form of a cluster to the inside of the reaction pipe 21 to be described later.

As the moisture supply, any one of a steam generator supplying high-temperature steam or a sprayer for spraying high-pressure moisture through a nozzle or an ultrasonic oscillator using ultrasonic oscillation may be used, and in addition to known heating, ultrasonic, natural vaporization and Various known techniques may be applied as long as it has a feature that can supply small particles of moisture, such as a complex formula.

On the other hand, in the present invention, it is suggested that a nozzle atomizer is preferably used, and the temperature of the moisture at this time is in the range of 50 to 100 ℃. This is because, when high-temperature moisture clusters are supplied, the modification of moisture or water vapor through dielectric heating is facilitated by RF electromagnetic energy supplied through the RF injection unit 13 to be described later.

The reaction pipe 21 is a kind of pipe that receives moisture clusters having a temperature of 0 to 100° C. from the moisture supplier. Such a reaction pipe 21 may be provided with a heating heater (not shown) on the inside or outside that receives power to increase the temperature of the moisture supplied therein and generates heat, which will be described later during the heating process. It serves to raise the temperature to a certain temperature through heater heating rather than dielectric heating by RF electromagnetic wave energy supplied through the RF supply unit 14 .

On the other hand, the reaction pipe 21 may be provided with a temperature sensor to check whether the temperature of the moisture supplied from the moisture supply meets a set value therein, such a temperature sensor is a control element connected in a circuit By applying a sensing signal to the in-controller, the controller may be configured to control the temperature of the electrically connected heating heater.

In addition, the reaction pipe 21 may be provided with an ignition unit 15 that operates under control by a controller to form an initial plasma discharge on one side, and the ignition unit 15 at this time is formed by a known technique. Since it may be implemented, a detailed description will be omitted.

On the other hand, the reaction pipe 21 in the present invention is provided with a metallic material capable of trapping the RF, or at least a part thereof is made of a metallic outer wall.

The RF injection unit 14 is an element for irradiating RF electromagnetic wave energy by being supplied with power from the outside, provided in one or a plurality at intervals on one side of the reaction pipe 21 .

The RF injection unit 14 irradiates RF electromagnetic wave energy with a supply energy of 0.1 kw to 10 kw and separates the supplied water into unit water molecules through a dielectric heating action to form water molecules ( 2), and furthermore, when the RF electromagnetic wave energy injected exceeds the discharge threshold energy, a plasma discharge phenomenon occurs, resulting in hydrogen ions (5), hydroxyl ions (6), hydrogen radicals (3), hydroxyl radicals (4) In order to induce the generation of the light and the like, the size of the supply energy may be appropriately designed and reflected according to the size and processing capacity of the reaction pipe 21 . That is, the RF supply module (not shown) or the RF injection unit 14 in the present invention may be configured in one or a plurality.

By irradiating the RF electromagnetic wave energy supplied to the inside of the semi-silver pipe 21 through the RF injection unit 14 having such a configuration on the moisture cluster, dielectric heating is caused in the moisture cluster, and the water molecule in the form of a single molecule (2) ), and when the RF electromagnetic wave energy injected exceeds the discharge threshold energy, a plasma discharge phenomenon occurs, resulting in hydrogen ions (5), hydroxyl ions (6), hydrogen radicals (3), hydroxyl radicals (4) modified, etc. The modified monomolecular water molecules (2), hydrogen ions (5), hydroxyl ions (6), hydrogen radicals (3), hydroxyl radicals (4), etc. are widely known as harmful substances or pollutants in the gas. is removed, and in the present invention, it is introduced into the inside of the main pipe 20 through the discharge hole 18 formed in the reaction pipe 21 and reacts with harmful substances or pollutants in the gas passing through the main pipe 20 to be removed

In the reaction pipe 21 , a spiral gas flow guide 17 may be formed outside the reaction pipe 21 in order to discharge the modified ions and ultrafine water droplets in the form of single molecules in a vortex form.

On the other hand, the RF injection unit 14 according to the present invention comprises one or a plurality of RF supply units for generating an RF by receiving a control signal, an RF measuring device for measuring the RF output amount or reflection amount signal of the RF supply device, and the RF measuring device It is proposed to consist of an RF controller that receives the measurement signal of the RF and controls the output amount of the RF or the amount of water molecules supplied into the main pipe to be maintained within the set value range.

The main pipe 20 is a pipe element surrounding the reaction pipe 21 and has a shape through which a gas containing harmful substances or contaminants, which is a gas to be treated, passes therein, and has an internal pressure of 0.8 to 1.5 atmospheres.

The main conduit 20 is provided with a suction fan or a blowing fan 19 for sucking the gas to be purified on one side, and these suction fans and the blowing fan 19 are configured to receive a control signal from the controller to control the operation, , which may be carried out by a known technique, so a detailed description thereof will be omitted.

In addition, the main conduit 20 in the present invention is connected to a pressure pump for regulating the internal pressure on one side, and this pressure pump is also connected to the controller so that the operation is controlled by receiving a control signal. .

In addition, it is possible that various well-known filters, which are dry filtration elements, are provided at the inlet and outlet sides of the main conduit 20 .

On the other hand, the RF-excited monomolecular water droplet and the RF-excited plasma discharge gas treatment apparatus using radicals and ions according to the present invention are provided on the outside of the reaction pipe 21 to measure the concentration of monomolecular water molecules in the discharged gas. It may be configured to include a dielectric constant measurement module for measuring, and a controller connected to the dielectric constant measurement module to a control circuit to apply a control signal to the moisture supply unit and the RF supply module.

In addition, in the present invention, a monomolecular type water molecule concentration meter for detecting a component of the gas passing through the main pipe line 20 and a temperature meter for temperature measurement may be installed, and the water molecule concentration meter and the temperature meter A circuit may be configured to selectively control the supply amount of moisture and the RF energy supplied to the reaction pipe 20 by receiving the measured value detected from the controller.

The present invention configured as described above is a means for breaking the ring of hydrogen bonds acting between a plurality of water molecules when heating water in a liquid state or a cluster state. Stimulates the electric dipole possessed by the molecule and induces it to break the hydrogen bond with the adjacent water molecule, resulting in reforming into a single water molecule (2) or hydrogen ion (5), hydroxyl ion (6), hydrogen radical ( 3), it is modified with a hydroxyl radical (4) to induce a chemical reaction with a gas containing harmful substances or pollutants to remove harmful substances or pollutants.

On the other hand, the present invention is not limited to the described embodiments, it is possible to use it by changing the application site, and it is common in the art that various modifications and variations can be made without departing from the spirit and scope of the present invention. It is self-evident to those with knowledge. Accordingly, it is intended that such variations or modifications fall within the scope of the claims of the present invention.

1: Water molecules clustered in clusters
2: water molecule in the form of a single molecule
3: hydrogen radical
4: hydroxyl radical
5: hydrogen ion
6: hydroxyl group ion
11. Gas injection part before treatment
12. Inlet gas measurement part
13. Moisture supply
14. RF supply unit
15. Ignition
17. Spiral gas flow guide
18. Discharge hole
19. Blowing fan
20. Main pipeline
21. Reaction Pipeline
22. Drain
23. Exhaust gas measurement part
31. Gas outlet after treatment

Claims (9)

a reaction pipe in which the moisture cluster is supplied from the moisture supply unit and the temperature of the moisture is 0~100℃;
One or a plurality of spaced apart installations on one side of the reaction tube are irradiated with RF electromagnetic wave energy having a supply energy of 0.1 kw to 10 kw, and the supplied water is separated into unit water molecules through a dielectric heating action to separate single-molecular water molecules. an RF supply unit for reforming the furnace into hydrogen ions, hydroxyl ions, hydrogen radicals, and hydroxyl radicals through plasma discharge;
a plurality of discharge holes formed outside the reaction pipe to supply ultrafine water droplets or hydrogen ions, hydroxyl ions, hydrogen radicals, and hydroxyl radicals separated into unit water molecules through the RF supply unit to the outside of the reaction pipe;
An RF excited monomolecular water droplet and an RF excited plasma discharge radical and ions, characterized in that it is composed of; a main pipeline through which a gas to be treated passes and an internal pressure of 0.8 to 1.5 atm is a pipe element surrounding the reaction pipe. gas processing equipment. According to claim 1, wherein the RF supply unit,
One or a plurality of RF supply units for receiving a control signal to generate an RF;
an RF measuring device for measuring an RF output amount or a reflection amount signal from the RF supply unit;
an RF controller receiving the measurement signal of the RF measuring device and controlling the output amount of the RF or the amount of water molecules supplied into the main pipe to be maintained within a set value range;
A gas treatment apparatus using RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions, characterized in that it consists of [2] The RF-excited monomolecular water droplet and the RF-excited plasma discharge radical according to claim 1, wherein the reaction tube is provided with a heat generating heater on the inside or outside that receives power to increase the internal temperature to increase the internal temperature. A gas processing device using ions. The method of claim 1,
A gas treatment apparatus using RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions, characterized in that it comprises a igniter for forming an initial plasma discharge on one side of the reaction pipe. The method of claim 1,
a dielectric constant measurement module provided outside the reaction pipe to measure the concentration of water molecules in the form of monomolecules in the discharged gas;
a controller in which the dielectric constant measurement module is connected to a control circuit and applies a control signal to the moisture supply unit and the RF supply module;
A gas treatment apparatus using RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions, characterized in that it comprises a. The method of claim 1,
The reaction pipe is an RF-excited monomolecular water droplet and an RF-excited plasma discharge gas treatment apparatus using radicals and ions, characterized in that a spiral gas flow guide is formed outside in order to discharge the gas in the form of a vortex. The apparatus according to claim 1, wherein a suction fan or a blower fan for sucking air is installed on one side of the main pipe line. [2] The apparatus of claim 1, wherein a pressure pump for regulating the internal pressure is connected to one side of the main pipe line. The method of claim 1,
a gas component measuring unit provided on the outside of the reaction pipe to measure the concentration of hydrogen oxide compounds or harmful substances in the gas injected or discharged;
A gas treatment apparatus using RF-excited monomolecular water droplets and RF-excited plasma discharge radicals and ions, characterized in that it comprises a.

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