KR20220063470A - Nano-Micro Bubble Cleaning Apparatus and Nano-Micro Bubble Cleaning Method - Google Patents

Abstract

The present invention is to provide a nano-micro bubble cleaning apparatus for electropolishing that can maximize the cleaning effect of a product to be suitable for high vacuum and high cleanliness. Embodiments relate to a nano-micro bubble cleaning apparatus and a nano-micro bubble cleaning method. A nano-micro bubble cleaning apparatus according to an embodiment includes a cleaning solution preparing device including a cleaning tank having a cleaning solution accommodating space, a nano-micro bubble generating device for generating nano-micro bubbles using a cleaning solution, and an energy generating device for applying energy to burst the nano-micro bubbles to clean an object to be cleaned.

Description

Nano-Micro Bubble Cleaning Apparatus and Nano-Micro Bubble Cleaning Method

The embodiment relates to a cleaning apparatus and a cleaning method for electrolytic polishing, and more specifically, to a nano-micro bubble cleaning apparatus for electrolytic polishing and a cleaning method thereof.

Electrolytic Polishing Technology is mainly applied to vacuum chambers and parts used in the display industry such as sputtering, CVD, vacuum deposition, and film formation equipment.

Electropolishing technology includes an electropolishing process and a cleaning process, which are performed for the purpose of improving corrosion resistance, improving surface cleanliness, suppressing emitted gas, and improving surface surface modification.

In the electrolytic polishing process, the metal product, the object of electrolytic polishing, is used as the anode in the electrolyte, the insoluble metal is used as the cathode, and a voltage is applied between the anode and the cathode. It is a method of polishing the surface of metal products by electrolysis.

On the other hand, the display industry is gradually changing into a highly functional industry with PDP, LCD, LED, OLED, and Flexible Display. Accordingly, in the display industry, production facilities are gradually changed to high vacuum, and the quality level of the chamber is being strengthened to high cleanliness suitable for high vacuum.

Accordingly, the importance of the cleaning process in the electropolishing technology has increased from about 20% in the past to more than 40-50%, and the process time of the cleaning process in the entire process also occupies more than 40%.

In particular, according to the conventional electrolytic polishing cleaning technology, it is difficult to remove the contaminants located in the microcavity of the object to be cleaned, and it is difficult to meet the high cleanliness level of the innovatively changing display technology.

In addition, according to the conventional cleaning technology for electrolytic polishing, there is a problem in that it is difficult to remove contaminant particles and organic matter at the same time, so a separate organic material cleaning process is being performed in addition to the particle cleaning process.

In addition, since the conventional cleaning method for electropolishing proceeds with wet cleaning of high-pressure water washing by manual operation, a large amount of wastewater is generated, which is harmful to the environment.

In addition, conventionally, excessive wastewater treatment costs are a burden on the cost, and for example, the cleaning process accounts for more than about 50% of the total cost in terms of cost.

In addition, more than 30% of the total workforce for the electrolytic polishing technology is being put into the conventional cleaning technology for electrolytic polishing, and the cleaning process is treated as the most avoidable process among the 3D industry, so the difficulty in recruiting manpower is also high. many situations.

One of the technical tasks of the embodiment is to provide a nano-micro bubble cleaning device for electrolytic polishing that can maximize the cleaning effect of a product to be suitable for high vacuum and high cleaning.

In addition, one of the technical problems of the embodiment is to provide a nano-microbubble cleaning apparatus for electrolytic polishing that can effectively remove both organic matter and contaminants from the surface of the object to be cleaned in a single cleaning process.

In addition, one of the technical tasks of the embodiment is to provide a nano-micro bubble cleaning device for electrolytic polishing that can improve quality and reduce costs by developing an eco-friendly and automated cleaning device with advanced cleaning technology.

The technical problems of the embodiments are not limited to those described in this item, and include those that can be grasped throughout the description of the invention.

A nano-microbubble cleaning apparatus according to an embodiment includes a cleaning liquid manufacturing apparatus including a cleaning tank having a space for receiving a cleaning liquid, a nano-microbubble generating apparatus and energy using the cleaning liquid to generate nano-microbubbles It may include an energy generating device for cleaning the object to be cleaned by rupturing the nano-micro bubbles by adding .

The cleaning object may be immersed in the cleaning tank, and the energy generating device may include an ultrasonic wave generating device.

The ultrasonic generator may apply ultrasonic waves to rupture the nano-micro bubbles to clean the object to be cleaned.

In addition, the second cleaning object may be located outside the cleaning tank, and the energy generating device may include a high-pressure water washing device.

The high-pressure water washing apparatus may rupture the nano-microbubbles through high-pressure spraying on the second object to be cleaned, thereby cleaning the second object to be cleaned.

The nano-microbubble generator may include a gas-liquid pump, a dissolution tank, a separation tank, and a nano-microbubble nozzle unit.

According to an embodiment, the cleaning liquid mixed with a predetermined air may collide with a predetermined protrusion to generate the nano-micro bubbles.

The nano-microbubbles may be ultrafine bubbles having a diameter of 10 nm to 10 μm.

In addition, the nano-microbubble cleaning method according to the embodiment includes the steps of preparing a cleaning solution through a cleaning tank having an accommodating space in which a cleaning solution and a cleaning object can be accommodated, and generating nano-microbubbles using the cleaning solution and ultrasonic waves. It may include cleaning the object to be cleaned by rupturing the nano-micro bubbles by adding .

According to the nano-microbubble cleaning device for electrolytic polishing according to the embodiment, there is a technical effect that can maximize the cleaning effect of the product to be suitable for high vacuum and high cleaning.

For example, according to the nano-micro bubble cleaning apparatus for electrolytic polishing according to the embodiment, the product is suitable for high vacuum and high cleaning by generating nano-micro bubbles using a cleaning solution and rupturing the nano-micro bubbles by applying ultrasonic waves. There is a special technical effect that can maximize the cleaning effect of

For example, the embodiment has a special technical effect that can maximize the cleaning effect by applying energy by ultrasonic waves or the like to rupture the nano-micro bubbles to activate free radicals such as OH ^- . Accordingly, the embodiment has a special technical effect that can maximize the cleaning effect by activating free radicals such as OH ^- by forcibly rupturing the nano-micro bubbles by applying energy by ultrasonic waves, etc. in addition to the self-pressurization effect of the nano-microbubbles. .

Through this, according to the nano-microbubble cleaning apparatus for electrolytic polishing according to the embodiment, there is a technical effect that can provide an ultra-precision cleaning apparatus capable of responding to cleaning quality in units of ppb (part per billion).

In addition, according to the embodiment, it is possible to provide a nano-microbubble cleaning device for high-cleanness and high-functionality electrolytic polishing by effectively removing both contaminant particles and organic matter on the surface of the product to be cleaned in a single cleaning process. there is

For example, in the embodiment, nano-microbubbles with OH ^- groups have the effect of saponifying oil (+ groups), so there is a special technical effect of high-cleaning precision cleaning that simultaneously cleans impurities and organic substances hidden in minute gaps or holes. .

Accordingly, according to the embodiment, there is a special technical effect of high-cleaning precision cleaning that simultaneously cleans impurities and organic matter hidden in minute gaps or holes that are difficult to penetrate by general cleaning solutions by fusing the free radical of nano-micro bubbles and ultrasonic energy.

In addition, according to the embodiment, by effectively removing organic matter together with the removal of contaminant particles in one space, there are effects such as reduction of equipment cost, reduction of installation space, reduction of cleaning time, and the like.

In addition, according to the embodiment, there is a technical and economic effect that can improve quality and reduce cost by developing an eco-friendly and automated cleaning device along with advanced cleaning technology.

For example, according to the embodiment, there is a technical and economic effect of reducing waste water cost by an eco-friendly cleaning method that does not use chemicals.

In addition, according to the embodiment, nano-microbubbles are formed using pure water (ultra-pure water) and OH ^- radical cleaning solution generated by plasma, and energy is applied to the nano-microbubbles through jet water washing, etc. to nano-microbubbles. There is a special technical effect that can maximize the cleaning effect by causing it to rupture.

The technical effects of the embodiments are not limited to those described in this item, and include those that can be grasped throughout the description of the invention.

1 is a schematic view showing a nano-micro bubble cleaning apparatus for electrolytic polishing according to an embodiment;
Figure 2 is an operation example of the nano-micro bubble cleaning apparatus for electrolytic polishing according to the embodiment shown in Figure 1;
3 is an enlarged view of the ultrasonic module area in the nano-micro bubble cleaning apparatus for electrolytic polishing according to the embodiment shown in FIG.
4 is a perspective view of a vibrating unit in the ultrasonic module shown in FIG. 3 ;
5 to 8 are modified examples in which the ultrasonic module is mounted in the nano-micro bubble cleaning apparatus for electrolytic polishing according to the embodiment;
Figure 9 is an operation example of the nano-micro bubble cleaning apparatus for electrolytic polishing according to the second embodiment.

Hereinafter, embodiments of the present invention that can solve the above technical problems will be described with reference to the accompanying drawings.

In the description of the embodiment according to the present invention, in the case where it is described as being formed on "on or under" of each element, the upper (upper) or lower (lower) is two The two elements are in direct contact with each other or one or more other elements are disposed between the two elements indirectly. In addition, when expressed as "up (up) or down (down), it may include the meaning of not only an upward direction but also a downward direction based on one element.

Also, as used hereinafter, relational terms such as “first” and “second,” “top/top/top” and “bottom/bottom/bottom” refer to any physical or logical relationship between such entities or elements or It may be used only to distinguish one entity or element from another, without requiring or implying an order.

In addition, the following embodiments may be modified in other forms or various embodiments may be combined with each other, and the scope of the present invention is not limited to each of the embodiments described below.

In addition, unless there is a description that contradicts or contradicts the matter in a specific embodiment, it may be understood as a description related to another embodiment. For example, if features for configuration A are described in one embodiment and features for configuration B in another embodiment, the opposite or contradictory descriptions are made even if the embodiment in which configurations A and B are combined is not explicitly described. Unless otherwise indicated, it should be understood as belonging to the scope of the present invention.

(Example)

1 is a schematic diagram showing a nano-micro bubble cleaning apparatus 1000 for electrolytic polishing according to an embodiment, and FIG. 2 is an operation of the nano-micro bubble cleaning apparatus 1000 for electrolytic polishing according to the embodiment shown in FIG. It is an example diagram.

1 and 2 , the nano-microbubble cleaning apparatus 1000 for electrolytic polishing according to the embodiment includes a cleaning solution production apparatus 100 , a nano-microbubble generator 600 , and an ultrasonic generator 500UW ) may be included.

Hereinafter, the technical characteristics of each configuration of the nano-micro bubble cleaning apparatus 1000 for electrolytic polishing according to the embodiment will be described in detail in consideration of the mutual organic coupling relationship.

<Cleaning solution manufacturing device>

First, referring to FIG. 1 , in the embodiment, the cleaning liquid manufacturing apparatus 100 may include a cleaning tank 130 and a cleaning liquid 100E.

The cleaning tank 130 may be formed in a box shape having an accommodation space in which a predetermined cleaning liquid 100E and a cleaning object P1 can be accommodated therein, and having an open top.

The washing tank 130 may include sidewalls facing each other and a bottom portion connecting the sidewalls. The washing tank 130 may have a cylindrical shape, a polygonal box shape, or a ring shape, and the shape is not limited thereto. The cleaning tank 130 may be formed of an insulating or metallic material.

The cleaning solution 100E may be pure water (ultra-pure water) or electrolyzed water including an OH ^- radical solution generated by plasma, but is not limited thereto. OH ^- radicals in the cleaning liquid can be generated ^by decomposing water molecules with plasma energy by placing the nozzle of the plasma apparatus in the cleaning liquid. One of the technical tasks of the embodiment is to provide a nano-micro bubble cleaning device for electrolytic polishing that can maximize the cleaning effect of the product to be suitable for high vacuum and high cleaning.

According to the nano-microbubble cleaning apparatus for electrolytic polishing according to the embodiment, nano-microbubbles (ANMB) (see FIG. 2 ) are generated using the cleaning solution 100E, and ultrasonic waves are applied to generate nano-microbubbles (ANMB). There is a special technical effect that can maximize the cleaning effect of the product to be suitable for high vacuum and high cleanliness by rupturing it.

For example, in the embodiment, the nano-microbubbles (ANMB) generated by using the pure (ultra-pure water) of the cleaning solution 100E and the OH ^- radical solution generated by plasma are ultra-fine bubbles with a size of 10 nm to 10 μm. -Microbubbles (ANMB) have a negative charge of OH ^- Radical, rise at a very slow rate, do not combine with each other due to the repulsive force between the bubbles, but are widely and densely distributed in the cleaning tank 130 and stay for a long time.

In addition, the nano-microbubbles (ANMB) of the embodiment have a larger potential as the bubbles are smaller, and have a greater ability to decompose by colliding with a foreign material or organic material having a positive charge.

In addition, the nano-microbubbles (ANMB) of the embodiment generate instantaneous high heat at 4,000 to 6,000 ° C due to the self-pressurization effect generated by the force of internal surface tension compressing the gas, and compresses and ruptures in a short time of 1 millionth of a second repeats the chain reaction of At this time, the nano-microbubbles (ANMB) of the embodiment generate free radicals such as OH- when ruptured to decompose bacteria and harmful chemicals present in the water.

In an embodiment, the cleaning liquid 100E may be used in hot water (25° C. or less) or cold water. At this time, when the temperature of the cleaning solution 100E exceeds 25° C., the internal energy increases and the size of the bubble increases, so that it may be difficult to form nano-micro bubbles, so a temperature of 25° C. or less may be preferable.

The washing tank 130 may include a heating device having a capacity of about 3 to 5 KW, but is not limited thereto.

A drain (not shown) may be formed on one lower side of the cleaning tank 130 , and the drain discharges the cleaning liquid containing contaminants to keep the quality of the cleaning liquid clean. In addition, the washing tank 130 may include a recycling filter, but is not limited thereto.

In the embodiment, the cleaning object P1 may be a polygonal or cylindrical chamber or tank, or a part of various chambers. For example, the cleaning object P1 may be a chamber for manufacturing an OLED. Also, the cleaning object P1 may be a part of the OLED chamber. The object P1 to be cleaned may have a plate shape, a box shape, or a ring shape with upper and lower portions formed through it.

Since the weight of the object P1 to be cleaned is considerable in the case of a medium or large product, it may be accommodated in the receiving space of the cleaning tub 130 while being lifted by, for example, a crane. For example, in the case where the object P1 to be cleaned is a chamber for OLED or a MOCVD chamber for LED, the weight may be huge, ranging from several hundred kg to several tons. Here, the cleaning surface of the object to be cleaned P1 may include an outer, inner, and bottom surface of the object P1 to be cleaned.

<Nano-microbubble generator>

Next, referring to FIGS. 1 and 2 , in the embodiment, pure (ultra-pure water) of the cleaning solution 100E through the nano-microbubble generator 600, and an OH ^- radical solution generated by plasma are used. -Can generate microbubbles (ANMB).

For example, the nano-microbubble generator 600 includes a gas-liquid pump 623 , a dissolution tank 622 , a separation tank 621 , a control panel 610 , and a nano-microbubble nozzle unit 630 . can do.

Materials of the gas-liquid pump 623 , the dissolution tank 622 , and the separation tank 621 may be made of a metal material, for example, SUS material, but is not limited thereto.

The nano-capacity of the microbubble generator 600 of the embodiment may be a capacity of 30-50 LPM (l/min), and the power may be 1.0-2.0 KW, but is not limited thereto.

The flow rate and discharge pressure of the dissolution tank 622 and the separation tank 621 may be 3 to 5 bar, but is not limited thereto.

Referring to FIG. 2 , in the embodiment, air, highly concentrated oxygen or ozone is mixed in the cleaning liquid 100E, and nano-microbubbles (ANMB) are formed by the tornado method or the collision method with the protrusions in the nano-microbubble nozzle unit 630. can cause

Through this, according to the nano-microbubble cleaning apparatus for electrolytic polishing according to the embodiment, nano-microbubbles (ANMB) are generated using pure water (ultra-pure water) of the cleaning solution 100E and OH ^- radical solution generated by plasma, and , There is a special technical effect that can maximize the cleaning effect of the product to be suitable for high vacuum and high cleaning by rupturing nano-micro bubbles (ANMB) by applying ultrasonic waves.

Accordingly, according to the embodiment, there is a special technical effect of high-cleaning precision cleaning that can clean impurities hidden in microscopic gaps or holes that are difficult to penetrate by general cleaning solutions by fusion of the free radical of nano-microbubbles (ANMB) and ultrasonic energy. there is.

The nano-microbubbles (ANMB) in the embodiment are ultrafine bubbles having a diameter of about 10 nm to about 10 μm.

These nano-microbubbles (ANMB) are generated in the nano-microbubble generation region by a tornado method or a collision method with a projection in the cleaning solution 100E mixed with air, oxygen, or ozone sucked in the stage before the gas-liquid pump 623. can be

In an embodiment, the nano-microbubble generating region may be the nano-microbubble nozzle unit 630, but is not limited thereto.

For example, the flow rate of the mixture of the introduced air and the cleaning liquid 100E is increased while passing through the narrow tube of the nano-micro bubble nozzle unit 630 . The mixture with the increased flow rate collides with the tube wall protrusion (not shown) installed on the tube wall, forming a strong turbulence, and instantaneously generating ultra-fine bubbles with a size of 10 nm to 10 μm.

The nano-microbubbles (ANMB) of the embodiment are ultrafine bubbles of 10 nm to 10 μm in size, have a negative charge of OH Radical, rise at a very slow rate, and do not combine with each other due to the repulsive force between the bubbles. It is diffused and can stay for a long time.

In addition, the nano-microbubbles (ANMB) of the embodiment have a larger potential as the bubbles are smaller, and have a greater ability to decompose by colliding with a foreign material or organic material having a positive charge.

In addition, the nano-microbubbles (ANMB) of the embodiment generate instantaneous high heat at 4,000 to 6,000 ° C due to the self-pressurization effect generated by the force of internal surface tension compressing the gas, and compresses and ruptures in a short time of 1 millionth of a second repeats the chain reaction of At this time, the nano-microbubbles (ANMB) of the embodiment generate free radicals such as OH- when ruptured to decompose bacteria and harmful chemicals present in the water.

In addition, since the size of the nano-microbubbles (ANMB) of the embodiment is small, it has excellent adhesion to particles having a large zeta potential, and thus a cleaning effect is large. In addition, if the size of the nano-microbubbles (ANMB) of the embodiment is nano, the amount of oxygen per unit volume increases, so that the sterilization effect is large.

<Ultrasound generator>

Next, the cleaning step of the object to be cleaned will be described.

Specifically, in the embodiment, the object P1 to be cleaned may be cleaned by applying ultrasonic waves to the nano-micro bubbles ANMB through the ultrasonic generator 500UW to rupture them.

According to the nano-microbubble cleaning apparatus 1000 for electrolytic polishing according to the embodiment, nano-microbubbles (ANMB) are generated using pure water (ultra-pure water) of the cleaning solution 100E and an OH ^- radical solution generated by plasma. There is a special technical effect that can maximize the cleaning effect of the product to be suitable for high vacuum and high cleaning by applying ultrasonic waves to rupture nano-micro bubbles (ANMB).

In particular, the embodiment has a special technical effect that can maximize the cleaning effect by rupturing nano-micro bubbles (ANMB) by applying energy by ultrasonic waves or the like to activate free radicals such as OH-.

That is, in the embodiment, in addition to the self-pressurization effect of nano-microbubbles, energy is applied by ultrasonic waves, etc. to forcibly rupture nano-microbubbles (ANMB), thereby activating free radicals such as OH- and maximizing the cleaning effect. It works.

Through this, according to the embodiment, there is a special technical effect of high-cleaning precision cleaning that simultaneously cleans impurities hidden in microscopic gaps or holes that are difficult for general cleaning solutions to penetrate by fusing the free radical of nano-microbubbles (ANMB) and ultrasonic energy. .

In addition, since nano-microbubbles (ANMB), which are OH-groups in the embodiment, have the effect of saponifying oil (+ groups), there is a special technical effect of high-cleaning precision cleaning that simultaneously cleans impurities and organic substances hidden in minute gaps or holes. .

In the embodiment, the step of rupturing the nano-microbubbles (ANMB) may be performed by using ultrasonic waves in a state in which the cleaning object P1 is immersed or by jet washing method in which the second cleaning object P2 (see FIG. 9) is directly sprayed. there is.

For example, the immersion method of FIG. 2 may be performed for small and medium-sized products, and for medium and large products, it may be performed as a jet washing method.

Referring to FIG. 2 , the ultrasonic generator 500UW of the embodiment is disposed outside the ultrasonic module 500 and the cleaning tank 130 , and an oscillator 560 for supplying an electrical signal to the ultrasonic module 500 . may include

The output of the oscillator 560 may be 800 ~ 2,000W, power may be applied to 220V, but is not limited thereto.

The ultrasound module 500 may include a single plurality of ultrasound modules. For example, although FIG. 2 is illustrated as including three ultrasound modules 500, the embodiment is not limited thereto.

In the embodiment, the object P1 to be cleaned may be cleaned by applying ultrasonic waves to the nano-micro bubbles (ANMB) using the ultrasonic generator 500UW to rupture them.

For example, according to the nano-microbubble cleaning apparatus 1000 for electrolytic polishing according to the embodiment, nano-microbubbles (ANMB) are generated using the cleaning solution 100E, and ultrasonic waves are applied to the nano-microbubbles (ANMB). ), there is a special technical effect that can maximize the cleaning effect of the product to be suitable for high vacuum and high cleanliness.

The energy of the ultrasonic wave generated by the ultrasonic generator 500UW of the embodiment ruptures the nano-microbubbles (ANMB), so that a high-temperature and high-pressure field is instantaneously formed, and the cleaning effect is doubled.

Next, FIG. 3 is an enlarged view of the ultrasonic module area 500A in FIG. 2 , and FIG. 4 is a perspective view of the vibrating unit 510 of the ultrasonic module in FIG. 3 .

Referring to FIG. 3 , the ultrasonic module 500 may be disposed on the bottom surface 100B of the cleaning tank 130 . The ultrasound module 500 may include a plurality of vibrating units 510 and a cover member 520 covering the vibrating units 510 .

The cover member 520 may be disposed to surround the plurality of vibrating units 510 . The cover member 520 may be made of stainless steel. The cover member 520 may be formed in a polygonal box shape with an empty interior to accommodate the plurality of vibrating units 510 . A plurality of cover members 520 may be provided to respectively surround the vibrating unit 510 .

The plurality of vibrating units 510 may be arranged in a line on the bottom surface 100B of the washing tank. The upper surfaces of the plurality of vibrating units 510 may be formed to be parallel to the bottom surface 100B of the washing tank.

Next, FIG. 4 is a perspective view of the vibrator 510 of the ultrasound module 500 of FIG. 3 .

Referring to FIG. 4 , in the ultrasonic module of the embodiment, the vibrator 510 may include a vibrator case 510S and a plurality of vibrators 512 disposed therein. The plurality of vibrators 512 may be closely disposed. The vibrator 512 is an element that receives electrical energy from the oscillator 600 and converts it into mechanical force to generate ultrasonic waves, and the capacity can be set by controlling the number of vibrators 512 .

In an embodiment, the ultrasound module 500 including the vibrator 510 may generate short waves and long waves. A short wave may have a frequency of, for example, 40 KHz, and a long wave may have a frequency of, for example, 72 KHz, but is not limited thereto.

In an embodiment, the ultrasonic module 500 may generate ultrasonic waves by alternating short waves or long waves, and by applying these ultrasonic waves to nano-micro bubbles (ANMB) and rupturing them, the cleaning effect of the product is maximized to be suitable for high vacuum and high cleaning. There are special technical effects that can make it happen.

For example, the embodiment has a special technical effect that can maximize the cleaning effect by applying energy to ultrasonic waves to rupture nano-micro bubbles (ANMB) to activate free radicals such as OH ^- . In the embodiment, in addition to the self-pressurization effect of nano-microbubbles, energy is applied by ultrasonic waves, etc. to forcibly rupture nano-microbubbles (ANMB), thereby accelerating activation of free radicals such as OH ^- and maximizing the cleaning effect. there is.

Next, FIGS. 5 to 8 are modified examples in which the ultrasonic module 500 is mounted in the nano-micro bubble cleaning apparatus 1000 for electrolytic polishing according to the embodiment.

First, referring to FIG. 5 , the ultrasonic module 500 includes a plurality of vibrating units 510 , a protective cover 520 for protecting the vibrating units 510 , and a support for supporting the plurality of vibrating units 510 . A member 530 may be included.

In an embodiment, the cleaning tub 130 may include sidewalls 110 facing each other and a bottom portion 120 connecting the sidewalls 110 to each other.

In the ultrasound module 500 , the vibrator 510 may be formed in a polygonal box shape. The vibrator 510 may include a plurality of vibrators therein. The vibrating unit may generate a short wave or a long wave to clean the object to be cleaned. Hereinafter, a structure in which two vibrating units are installed will be described as an embodiment.

The vibrating unit 510 may include a first vibrating unit 510a and a second vibrating unit 510b. The first vibrating unit 510a and the second vibrating unit 510b may be inclined at a predetermined angle. The first vibrating unit 510a and the second vibrating unit 510b may be disposed to have an angle between 90° and 180°. The first vibrating unit 510a and the second vibrating unit 510b may generate ultrasonic waves toward the cleaning object P1 and the nano-microbubbles ANMB disposed in the cleaning tank 130 . Since the ultrasonic wave has strong linearity, when the first vibrating unit 510a and the second vibrating unit 510b are disposed toward the cleaning object P1 and the nano-microbubbles ANMB around it, the contact area of the ultrasonic wave is widened. There is an effect that can improve the cleaning power.

The support member 530 may be disposed such that the vibrating unit 510 is inclined at a predetermined interval. The support member 530 may include a first support member 530a and a second support member 530b. The first support member 530a may support the first vibrating part 510a. The first support member 530a may be formed in a shape corresponding to the shape of the first vibrating part 510a. The first support member 530a may be formed to be larger than the size of the vibrating part 510a.

The second support member 530b may support the second vibrating unit 510b. The first support member 530b may be disposed to be inclined at a predetermined angle from the first support member 530a. The second support member 530b may be integrally formed with the first support member 530a. Alternatively, the second support member 530b may be formed separately from the first support member 530a.

The first support member 530a may be operated to rotate based on the interface between the first support member 530a and the second support member 530b. The first support member 530a may change the arrangement of the first vibrating part 510a supported by the first support member 530a. The second support member 530b may be operated to rotate based on the interface between the first support member 530a and the second support member 530b. The first vibrating unit 510a and the second vibrating unit 510b may be disposed to have an inclination of 90° to 180° by the operation of the first supporting member 530a and the second supporting member 530b.

When the cleaning object P1 is a large product, the first vibrating unit 510a and the second vibrating unit 510b may be inclined at a first angle. When the cleaning object P1 is a small product, the first vibrating unit 510a and the second vibrating unit 530 may be disposed at a second angle smaller than the first angle. That is, as the cleaning object P1 has a larger size, the angle between the first vibrating unit 510a and the second vibrating unit 510b may increase.

Next, as shown in FIG. 6 , the ultrasonic module 500 includes a plurality of vibrating units 510 , a protective cover 520 protecting the vibrating units 510 , and the plurality of vibrating units 510 . It may include a support member 530 for supporting the.

The vibrator 510 may be formed in a polygonal box shape. The vibrator 510 may include a plurality of vibrators therein. The vibrating unit 510 may generate a short wave or a long wave to clean the object to be cleaned. Hereinafter, three vibrating units will be described as an embodiment.

The vibrating unit 510 may include a first vibrating unit 510a, a second vibrating unit 510b, and a third vibrating unit 510c. The first vibrating unit 510a, the second vibrating unit 510b, and the third vibrating unit 510c may be inclined at a predetermined angle. The first vibrating unit 510a, the second vibrating unit 510b, and the third vibrating unit 510c move toward the cleaning object P1 disposed in the cleaning bath 130 and the nano-microbubbles ANMB around it. Ultrasound can be generated. Since ultrasonic waves have strong straightness, when the first vibrating unit 510a, the second vibrating unit 510b, and the third vibrating unit 510c are disposed toward the cleaning object P1, the cleaning object P1 and the nano-microbubbles (ANMB) has the effect of improving the cleaning power by increasing the contact area and rupture energy of ultrasonic waves.

For example, the first vibrating unit 510a may generate ultrasonic waves in a vertical direction of the bottom surface of the cleaning tub 130 . The second vibrating unit 510b may generate ultrasonic waves in the direction of the ultrasonic waves generated by the first vibrating unit 510a. The third vibrating unit 510c may generate ultrasonic waves in the direction of the ultrasonic waves generated by the first vibrating unit 510a. One side of the second vibrating unit 510b adjacent to the first vibrating unit 510a may be disposed at a lower position than the other side of the second vibrating unit 510b. One side of the third vibrating unit 510c adjacent to the first vibrating unit 510a may be disposed at a lower position than the other side of the third vibrating unit 510c.

The support member 530 may support the first vibrating unit 510a, the second vibrating unit 510b, and the third vibrating unit 510c. The support member 530 may be formed to have a curved surface. The support member 530 may be formed to have a semicircular shape with a central portion convex toward the bottom. A first vibrating unit 510a is disposed in the center of the support member 530 to generate ultrasonic waves in a vertical direction of the bottom surface of the cleaning tub 130 , and a second vibrating unit 510b and a third vibrating unit are disposed. The 510c may effectively control the generation direction of the ultrasonic wave according to a position where it is seated on the curved surface of the support member 530 .

Accordingly, according to the embodiment, there is a special technical effect of high cleanliness and precision cleaning of impurities and/or organic substances hidden in microscopic gaps or holes that are difficult to penetrate by general cleaning solutions by fusing the free radical of nano-microbubbles and ultrasonic energy. .

7 , the ultrasound module 510 may include a plurality of vibrating units 510 and a protective cover 520 protecting the vibrating units 510 .

The vibrator 510 may be formed in a polygonal box shape. The vibrator 510 may include a plurality of vibrators therein. The vibrating unit may generate a short wave or a long wave to clean the object to be cleaned. Hereinafter, a structure in which two vibrating units are installed will be described as an embodiment.

The vibrating unit 510 may include a first vibrating unit 510a and a second vibrating unit 510b. The first vibrating unit 510a and the second vibrating unit 510b may be inclined at a predetermined angle. The first vibrating unit 510a and the second vibrating unit 510b may be disposed to have an angle between 90° and 180°. The first vibrating unit 510a and the second vibrating unit 510b may generate ultrasonic waves toward the cleaning object P1 disposed in the cleaning tank 130 and the nano-microbubbles ANMB nearby. Since ultrasonic waves have strong linearity, when the first vibrating part 510a and the second vibrating part 510b are disposed toward the cleaning object P1, the ultrasonic contact area between the cleaning object P1 and the nano-microbubbles ANMB This is widened, and since the burst energy can be strongly applied, there is an effect of improving the cleaning power.

Accordingly, according to the embodiment, there is a special technical effect of high cleanliness and precision cleaning of impurities and/or organic substances hidden in microscopic gaps or holes that are difficult to penetrate by general cleaning solutions by fusing the free radical of nano-microbubbles and ultrasonic energy. .

The bottom part 120 of the washing tank 130 may include a first bottom surface 121 and a second bottom surface 123 . The first vibrating part 510a may be supported on the first bottom surface 121 , and the second vibrating part 510b may be supported on the second bottom surface 123 . The first bottom surface 121 may have a structure extending downward from one side surface of the cleaning tank 130 . The second bottom surface 123 may have a structure extending downward from the other side surface of the cleaning tank 130 . The interface between the first bottom surface 121 and the second bottom surface 123 may be disposed at a lower position than the lower surface of the side surface of the washing tank 130 . The first bottom surface 121 and the second bottom surface 123 may be inclined at a predetermined interval. As a result, the first vibrating unit 510a and the second vibrating unit 510b may be formed inclined by less than 180°.

Next, as shown in FIG. 8 , the ultrasound module 500 may include a plurality of vibrating units 510 and a protective cover 520 protecting the vibrating units 510 .

The vibrator 510 may be formed in a polygonal box shape. The vibrator 510 may include a plurality of vibrators therein. The vibrating unit 510 may generate a short wave or a long wave to clean the object to be cleaned. Hereinafter, three vibrating units will be described as an embodiment.

The vibrating unit 510 may include a first vibrating unit 510a, a second vibrating unit 510b, and a third vibrating unit 510c. The first vibrating unit 510a, the second vibrating unit 510b, and the third vibrating unit 510c may be inclined at a predetermined angle. The first vibrating unit 510a, the second vibrating unit 510b, and the third vibrating unit 510c generate ultrasonic waves toward the cleaning object P1 and the nano-microbubbles ANMB disposed in the cleaning bath 130 . can do it Since the ultrasonic wave has strong linearity, when the first vibrating unit 510a, the second vibrating unit 510b, and the third vibrating unit 510c are disposed toward the cleaning object P1 and the nano-microbubbles ANMB, the burst energy There is an effect that can improve the cleaning power by improvement.

For example, the first vibrating unit 510a may generate ultrasonic waves in a vertical direction of the bottom surface of the cleaning tub 130 . The second vibrating unit 510b may generate ultrasonic waves in the direction of the ultrasonic waves generated by the first vibrating unit 510a. The third vibrating unit 510c may generate ultrasonic waves in the direction of the ultrasonic waves generated by the first vibrating unit 510a. One side of the second vibrating unit 510b adjacent to the first vibrating unit 510a may be disposed at a lower position than the other side of the second vibrating unit 510b. One side of the third vibrating unit 510c adjacent to the first vibrating unit 510a may be disposed at a lower position than the other side of the third vibrating unit 510c.

In an embodiment, the bottom part 120 of the washing tank 130 may include a first bottom surface 121 , a second bottom surface 123 , and a third bottom surface 125 . The first bottom surface 121 may support the first vibrating unit 510a. The second bottom surface 123 may be disposed to be inclined with the first bottom surface 121 . The second bottom surface 123 may be connected to one side of the first bottom surface 121 and a lower portion of the side wall of the washing tub 130 . The third bottom surface 125 may be disposed to be inclined with the first bottom surface 121 . The third bottom surface 125 may be connected to the other side of the first bottom surface 121 and a lower portion of the side wall of the washing tub 130 .

The width of the first bottom surface 121 may be greater than that of the second bottom surface 123 and the third bottom surface 125 . For this reason, the number of vibrating units 510 disposed on the first bottom surface 121 may be greater than the number of vibrating units 510 disposed on the second bottom surface 123 . The number of vibrating units 510 disposed on the first bottom surface 121 may be greater than that of the vibrating units 510 disposed on the third bottom surface 125 .

The first vibrating unit 510a supported on the first bottom surface 121 may evenly generate ultrasonic waves in a direction perpendicular to the bottom surface of the cleaning tub 130 . The second vibrating unit 510b and the third vibrating unit 510c may generate ultrasonic waves in a direction in which the first vibrating unit 510a generates ultrasonic waves.

The embodiment generates a large amount of ultrasonic waves that are generated in a straight line toward the top, and some of the ultrasonic waves are tilted, thereby increasing the ultrasonic energy applied to the object to be cleaned and the nano-micro bubbles (ANMB) to improve the cleaning efficiency. there is.

According to the nano-microbubble cleaning device for electrolytic polishing according to the embodiment, there is a technical effect that can maximize the cleaning effect of the product to be suitable for high vacuum and high cleaning.

For example, according to the nano-micro bubble cleaning apparatus for electrolytic polishing according to the embodiment, the product is suitable for high vacuum and high cleaning by generating nano-micro bubbles using a cleaning solution and rupturing the nano-micro bubbles by applying ultrasonic waves. There is a special technical effect that can maximize the cleaning effect of

For example, the embodiment has a special technical effect that can maximize the cleaning effect by applying energy by ultrasonic waves or the like to rupture the nano-micro bubbles to activate free radicals such as OH ^- . In addition to the self-pressurization effect of the nano-microbubbles, the embodiment has a special technical effect that can maximize the cleaning effect by activating free radicals such as OH- by forcibly rupturing the nano-microbubbles by applying energy by ultrasonic waves or the like.

Through this, according to the nano-microbubble cleaning apparatus for electrolytic polishing according to the embodiment, there is a technical effect that can provide an ultra-precision cleaning apparatus capable of responding to cleaning quality in units of ppb (part per billion).

In addition, according to the embodiment, it is possible to provide a nano-microbubble cleaning device for high-cleanness and high-functionality electrolytic polishing by effectively removing both contaminant particles and organic matter on the surface of the product to be cleaned in a single cleaning process. there is

For example, in the embodiment, nano-microbubbles, which are OH-groups, have the effect of saponifying oil (+ groups), so there is a special technical effect of high-cleaning precision cleaning that simultaneously cleans impurities and organic substances hidden in minute gaps or holes. .

Accordingly, according to the embodiment, there is a special technical effect of high-cleaning precision cleaning that simultaneously cleans impurities and organic matter hidden in minute gaps or holes that are difficult to penetrate by general cleaning solutions by fusing the free radical of nano-micro bubbles and ultrasonic energy.

In addition, according to the embodiment, by effectively removing organic matter together with the removal of contaminant particles in one space, there are effects such as reduction of equipment cost, reduction of installation space, reduction of cleaning time, and the like.

In addition, according to the embodiment, there is a technical and economic effect that can improve quality and reduce cost by developing an eco-friendly and automated cleaning device along with advanced cleaning technology.

(Second embodiment: jet washing technology)

9 is an exemplary operation view of the nano-micro bubble cleaning apparatus 1002 for electrolytic polishing according to the second embodiment.

In the nano-microbubble cleaning apparatus 1002 for electrolytic polishing according to the second embodiment, the second cleaning object P2 may be located outside the cleaning tank 130 , and the second cleaning object P2 is The second cleaning object P2 may be cleaned by high-pressure spraying to the cleaning object P2 to rupture the nano-microbubbles ANMB. The second cleaning object P2 employed in the second embodiment may be a medium-large product.

For example, the high-pressure water washing device 640 according to the second embodiment may be a jet washing device using a direct injection method, and nano-micro bubbles (ANMB) may be present in the sprayed cleaning liquid 100E.

According to the second embodiment, when the cleaning liquid 100E including the nano-microbubbles (ANMB) hits the second cleaning object P2, the nano-microbubbles (ANMB) are destroyed and OH ^- Free Radical can be activated.

Through this, according to the second embodiment, nano-micro bubbles are formed using pure water (ultra-pure water) and OH ^- radical cleaning solution generated by plasma, and energy is applied to the nano-micro bubbles through jet water washing, etc. There is a special technical effect that can maximize the cleaning effect by causing the bubble to burst.

In the second embodiment, nano-microbubbles (ANMB) may be generated in the high-pressure water washing apparatus 640 by a whirlwind method or a collision method with protrusions.

Through this, according to the nano-microbubble cleaning apparatus 10002 for electrolytic polishing according to the second embodiment, the nano-microbubbles ANMB are generated using the cleaning solution 100E, and the second cleaning object P2 is hit. When nano-microbubbles (ANMB) are destroyed, OH groups may be activated.

According to the second embodiment, high cleanliness that simultaneously cleans impurities and organic matter hidden in microscopic gaps or holes that are difficult to penetrate by general cleaning solutions by fusing the free radical of nano-microbubbles (ANMB) and the collision energy by the pressure of jet water washing. There is a special technical effect of precision cleaning.

These nano-microbubbles (ANMB) are generated in the nano-microbubble generation region by a tornado method or a collision method with a projection in the cleaning solution 100E mixed with air, oxygen, or ozone sucked in the stage before the gas-liquid pump 623. can be

In the second embodiment, the nano-microbubble generating region may be the high-pressure water washing device 640, but is not limited thereto.

For example, the flow rate of the introduced air and the cleaning liquid 100E mixture is increased while passing through the narrow tube of the high-pressure water washing device 640 . The mixture with the increased flow rate collides with the tube wall protrusion (not shown) installed on the tube wall, forming a strong turbulence, and instantaneously generating ultra-fine bubbles with a size of 10 nm to 10 μm.

According to the second embodiment, high cleanliness that simultaneously cleans impurities and organic matter hidden in microscopic gaps or holes that are difficult to penetrate by general cleaning solutions by fusing the free radical of nano-microbubbles (ANMB) and the collision energy by the pressure of jet water washing. There is a special technical effect of precision cleaning.

Features, structures, effects, etc. described in the above embodiments are included in at least one embodiment, and are not necessarily limited to only one embodiment. Furthermore, features, structures, effects, etc. illustrated in each embodiment can be combined or modified for other embodiments by those of ordinary skill in the art to which the embodiments belong. Accordingly, the contents related to such combinations and variations should be interpreted as being included in the scope of the embodiments.

In the above, the embodiment has been mainly described, but this is only an example and does not limit the embodiment, and those of ordinary skill in the art to which the embodiment belongs are provided with several examples not illustrated above within the range that does not deviate from the essential characteristics of the embodiment. It can be seen that the transformation and application of branches are possible. For example, each component specifically shown in the embodiment can be implemented by modification. And the differences related to these modifications and applications should be interpreted as being included in the scope of the embodiments set forth in the appended claims.

Claims (7)

A cleaning liquid manufacturing apparatus including a cleaning tank provided with a space for receiving the cleaning liquid;
a nano-microbubble generator for generating nano-microbubbles using the cleaning solution; and
Nano-micro bubble cleaning device comprising a; energy generating device to apply energy to rupture the nano-micro bubbles to clean the object to be cleaned. According to claim 1,
The object to be cleaned is immersed in the cleaning tank,
The energy generating device is a nano-micro bubble cleaning device including an ultrasonic wave generator. 3. The method of claim 2,
The ultrasonic generator,
A nano-micro bubble cleaning apparatus for cleaning the object to be cleaned by rupturing the nano-micro bubbles by applying ultrasonic waves. According to claim 1,
The object to be cleaned is located outside the cleaning tank,
The energy generating device includes a high-pressure water washing device,
The high-pressure water washing device is
A nano-microbubble cleaning apparatus for cleaning the object to be cleaned by rupturing the nano-microbubbles through high-pressure spraying on the object to be cleaned. According to claim 1,
The nano-microbubble generator includes a gas-liquid pump, a dissolution tank, a separation tank, and a nano-microbubble nozzle unit,
A nano-micro bubble cleaning apparatus in which the cleaning liquid mixed with a predetermined air collides with a predetermined protrusion to generate the nano-micro bubbles. According to claim 1,
The nano-micro bubble is a nano-micro bubble cleaning device that is an ultrafine bubble having a diameter of 10 nm to 10 μm. A cleaning solution manufacturing step through a cleaning tank provided with an accommodating space in which the cleaning liquid and the object to be cleaned can be accommodated;
generating nano-micro bubbles using the cleaning solution; and
Nano-micro-bubble cleaning method comprising a; cleaning the object to be cleaned by rupturing the nano-micro bubbles by applying ultrasonic waves.

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