KR20220055559A - Low-emission coating laminate with excellent visible light transmittance and durability - Google Patents

Abstract

The present application relates to a low-emission coating laminate applicable to the so called "Low-E glass" technical field and, more specifically, to a low-emission coating laminate capable of implementing a neutral color and improving visible light transmittance, while having equivalent or improved durability compared to a single Low-E glass, by controlling the configuration of a dielectric layer so as to make the refractive index of a lower dielectric layer greater than that of an upper dielectric layer.

Description

Low-emission coating laminate with excellent visible light transmittance and durability

The present application relates to a low-emissivity coating laminate applicable to a technical field called low-e glass, and by controlling the composition of the dielectric layer so that the refractive index of the lower dielectric layer is greater than the refractive index of the upper dielectric layer, the durability is equal to or While improving, it relates to a low-emissivity coating laminate capable of improving visible light transmittance and realizing a neutral color.

A lot of heat loss in a building occurs through glass and windows. Recently, as the trend of increasing the area of glass in buildings is prominent, it is expected that the energy loss of buildings will also increase accordingly. However, the domestic usage rate of low-e glass, which is superior in energy saving effect compared to general glass, is insignificant, and thus high-performance low-e glass mass production technology is not secured.

In addition, as institutional devices related to energy saving are recently prepared, explosive demand for low-e glass is expected, and it is urgent to secure high-performance low-e glass production technology in Korea to replace foreign technology.

In addition, as the aesthetic role of building exterior materials is emphasized according to recent architectural trends, glass is in the spotlight as a part that can best express the visual aspect of a building freely. The reason why glass has come into the spotlight as an exterior use for buildings is that it secures transparency, which is a fundamental characteristic of glass, and at the same time can express various colors, saturation, and brightness of glass through composition changes or coatings. Because of the advantages that can be created. For this reason, the proportion of glass in exterior members is gradually increasing in modern buildings, and in the case of commercial high-rise buildings, the front exterior is made of glass. As such, glass has the advantage of being able to freely express the exterior while securing transparency compared to other building materials.

Low-emission glass is coated with a low-emission layer that blocks solar heat in summer and preserves indoor heat in winter. Such low-emissivity glass can be broadly classified into two types according to the manufacturing method, Soft LowE glass by sputtering process and Hard lowE glass by atmospheric pressure chemical vapor deposition (Atmospheric Pressure Chemical Vapor Deposition) Hard LowE) glass.

Hardroy has the advantages of post-strengthening and free handling because the coating film is an oxide film produced at high temperature. There is a limit to large-scale distribution. On the other hand, the softroy manufactured by sputtering has relatively excellent thermal insulation and shielding performance because the coating film is composed of Ag metal, which has the best electrical conductivity. It has the advantage of being able to supply products with various characteristics that consumers want. However, post-strengthening is not possible due to the characteristics of the metal Ag film, which is easily oxidized and deformed even at high temperature, even at room temperature, and has many disadvantages in handling. Among them, the feature that post-strengthening is impossible can be a fatal disadvantage in terms of distribution of the product because it requires coating after pre-strengthening. will be This, temperable low-e glass is sometimes called Heat Treatable Low-E or Heatable Low-E in the industry. Despite being soft low-e glass, it can withstand tempered and curved conditions, so it is used for building glass and automobiles with tempered/semi-strengthened specifications. It has been applied to various fields requiring post-heat treatment such as windshield. For this purpose, low-e glass is usually heated to a temperature of 600 to 700 °C, which is bent or stressed. During this heat, a functional reflective metal layer (mainly Ag) on the glass substrate is often oxidized and crystallized due to diffusion or agglomeration. undergo structural transformation. One of the methods for preventing such deformation, that is, deterioration at high temperatures, is to laminate a silver metal layer in a sandwich structure using a metal protective film. The thickness of the metal protective film should be such that the transmittance can be maintained without deterioration of the Ag metal layer when the coated glass is heat-treated at a high temperature. However, instead of improving durability, there is a problem in that optical performance is lowered.

Korean Registered Patent No. 10-1677572 (2016.11.14)

According to an embodiment of the present application, an object of the present application is to provide a low-emissivity coating laminate having improved durability and visible light transmittance while providing a neutral color, which is a trade-off relationship.

One aspect of the present application relates to a low-emissivity coating laminate.

In one example. The low-emissivity coating laminate is a low-emission coating laminate in which a lower dielectric layer, a lower metal protective layer, a low-emission layer, an upper metal protective layer, an upper dielectric layer, and an outer protective layer are sequentially formed, wherein the lower dielectric layer includes a nitride a lower dielectric layer and a second lower dielectric layer comprising a nitride, the upper dielectric layer comprising a first upper dielectric layer comprising a nitride, a second upper dielectric layer comprising zinc aluminum oxide and a third upper dielectric layer comprising a nitride there is.

In one example, the refractive index of the lower dielectric layer may be greater than that of the upper dielectric layer.

In one example, the first lower dielectric layer may have a refractive index of 1.95 to 2.05.

In one example, the nitride may include silicon aluminum nitride.

In one example, the first lower dielectric layer may have a refractive index of 1.95 to 2.05.

In one example, the second lower dielectric layer may have a refractive index of 2.15 to 2.3.

In one example, the lower protective layer may include one selected from the group consisting of nickel, chromium, an alloy of nickel and chromium, and combinations thereof.

In one example, the first upper dielectric layer may have a refractive index of 2.15 to 2.3.

In one example, the second upper dielectric layer may include zinc aluminum oxide.

In one example, the third upper dielectric layer may have a refractive index of 1.95 to 2.05.

In one example, the upper protective layer may include one selected from the group consisting of nickel, chromium, an alloy of nickel and chromium, and combinations thereof.

In one example, the outer protective layer may have a single-layer or multi-layer structure in which one or more layers including a metal oxide and/or a metal are stacked.

Another aspect of the present application relates to low-emissivity glass.

In one example, the low-emissivity glass may be a glass substrate and the above-described low-emissivity coating laminate is coated on the glass substrate.

According to an embodiment of the present application, it is possible to provide a low-emissivity glass having excellent durability.

According to an embodiment of the present application, it is possible to provide a low-emissivity glass having excellent visible light transmittance.

According to an embodiment of the present application, it is possible to provide a low-emissivity glass capable of realizing a neutral color.

According to an embodiment of the present application, it is possible to provide a low-emissivity glass capable of implementing a color that is highly preferred by general customers.

1 is a schematic cross-sectional view of a low-emissivity glass according to an embodiment of the present application.

The terms used in the present application are only used to describe specific embodiments, and are not intended to limit the present invention. The singular expression includes the plural expression unless the context clearly dictates otherwise. In the present application, terms such as “comprise” or “have” are intended to designate that the features, components, etc. described in the specification are present, and one or more other features or components may not be present or may be added. Doesn't mean there isn't.

Unless defined otherwise, all terms used herein, including technical and scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in a commonly used dictionary should be interpreted as having a meaning consistent with the meaning in the context of the related art, and should not be interpreted in an ideal or excessively formal meaning unless explicitly defined in the present application. does not

In the case of conventional low-emissivity glass, which is referred to as low-e glass, defects occur after heat treatment at 650-700 degrees after the thin film is damaged during the process, the coating film is damaged by scratches during transportation or handling, or oxygen in the atmosphere in a high-temperature and high-humidity environment , chloride, sulfide, sulfur dioxide, etc., there was a problem that corrosion of the low-emissivity layer (silver layer) occurred and the coating film was damaged. There have been many attempts to improve the durability of metal by increasing the thickness of the material for the protective layer, but on the contrary, a problem of deterioration of optical performance occurred. The present applicant has completed a low-emissivity coating laminate capable of significantly improving optical performance while improving durability by appropriately controlling the dielectric layer in a plurality of multi-layer structures in order to improve these problems at the same time.

Hereinafter, a low-emissivity coating laminate and a low-emission glass including the same, which is an aspect of the present application, will be described in detail with reference to the accompanying drawings. However, the accompanying drawings are exemplary, and the scope of the low-emission coating laminate and the low-emission glass including the same, which is an aspect of the present application, is not limited by the accompanying drawings.

1 is a schematic cross-sectional view of a low-emissivity glass according to an embodiment of the present application.

As shown in FIG. 1 , the low-emission coating laminate 1 has a lower dielectric layer 10 , a lower metal protective layer 20 , a low-emission layer 30 , an upper metal protective layer 40 , and an upper dielectric layer 50 . ) and an outer protective layer 60 are sequentially formed as a low-emissivity coating laminate, wherein the lower dielectric layer 10 includes a first lower dielectric layer 11 including a nitride having a metal characteristic, and a second lower portion including a nitride having a ceramic characteristic. A dielectric layer 13 is included, and the upper dielectric layer 50 includes a first upper dielectric layer 51 including a nitride having ceramic characteristics, a second upper dielectric layer 53 including a metal oxide and a second upper dielectric layer 53 including a nitride having a metal characteristic. 3 may include an upper dielectric layer 55 .

Although not shown in FIG. 1, a glass substrate may be applied as a substrate as described above.

glass substrate

As the glass substrate, ordinary glass such as soda-lime glass used for construction or automobiles may be used. In addition, as the glass substrate, a glass having an appropriate thickness may be used according to the purpose of use. For example, as the glass substrate, transparent soda-lime glass having an average thickness of 2 to 12 mm, or 5 to 6 mm may be used.

A low-emissivity coating laminate is positioned on the glass substrate. The low-emissivity coating laminate is applied as a coating film of a glass substrate, for example, it can be used as a functional building material for windows, such as window glass. The functional building material for windows and doors is a functional material that reflects outdoor solar radiation in summer and preserves indoor heating radiant heat in winter, thereby minimizing heat transfer between indoors and outdoors, resulting in energy savings of buildings.

low emission layer

The low-emissivity layer is a layer formed of an electrically conductive material, for example a metal, which may have a low emissivity, ie, has a low sheet resistance and thus has a low emissivity.

'Emissivity' refers to the rate at which an object absorbs, transmits, and reflects energy having an arbitrary specific wavelength. That is, in the present application, the emissivity indicates the degree of absorption of infrared energy in the infrared wavelength region, and specifically, when far infrared rays corresponding to a wavelength region of about 5 μm to about 50 μm showing strong thermal action are applied, the applied It means the ratio of absorbed infrared energy to infrared energy.

According to Kirchhoff's law, since the infrared energy absorbed by an object is the same as the infrared energy radiated back by the object, the absorption rate and the emissivity of the object are the same.

In addition, since unabsorbed infrared energy is reflected from the surface of the object, the higher the reflectance of the object with respect to the infrared energy, the lower the emissivity. Expressing this numerically, it has a relationship of (emissivity = 1 - infrared reflectance).

Such emissivity may be measured through various methods commonly known in the art, for example, may be measured by a facility such as a Fourier transform infrared spectrometer (FT-IR) according to the KSL2514 standard.

Absorption, ie, emissivity, of any object, for example, far-infrared radiation exhibiting such a strong thermal action of low-emissivity glass, may represent a very important meaning in measuring thermal insulation performance.

As described above, the low-emissivity coating laminate is, for example, used as a coating film on a transparent substrate such as glass, while maintaining a predetermined transmittance characteristic in the visible light region to implement excellent light capture properties, and the emissivity in the infrared region It can be used as a functional building material for energy-saving windows that can lower

In the present application, the low-emissivity layer may have an emissivity of about 0.01 to about 0.3, specifically about 0.01 to about 0.2, more specifically about 0.01 to about 0.1, and even more specifically about 0.01 to about 0.1. about 0.08.

The low-emissivity layer in the emissivity range can realize excellent light-capturing and heat-insulating effects by appropriately adjusting visible light transmittance and infrared emissivity. The sheet resistance of the low-emissivity layer having the above-described emissivity may be, for example, about 0.78 Ω/sq to about 6.42 Ω/sq, but is not limited thereto.

The low-emissivity layer performs a function of selectively transmitting and reflecting solar radiation, and specifically has a high reflectance with respect to radiation in the infrared region and thus has a low-emissivity. The low-emission layer may include at least one selected from the group consisting of Ag, Au, Cu, Al, Pt, ion-doped metal oxides, and combinations thereof, but is not limited thereto, and can implement low-emission performance Any metal known to be used may be used without limitation. The ion-doped metal oxide includes, for example, indium tin oxide (ITO), fluorine-doped tin oxide (FTO), Al-doped zinc oxide (AZO), gallium zinc oxide (GZO), and the like. In one embodiment, the low-emissivity layer 110 may be a layer formed of silver (Ag), as a result, the low-emission coating can implement high electrical conductivity, low absorption in the visible light region, durability, and the like.

The thickness of the low-emissivity layer 110 may be, for example, about 5 nm to about 25 nm. The low-emissivity layer having a thickness in the above range is suitable for simultaneously implementing low infrared emissivity and high visible light transmittance.

Upper and lower metal protective layers

In addition, a lower protective layer and an upper protective layer are positioned as a metal protective layer on the upper and lower surfaces of the low emission layer.

The metal protective layer is made of a metal having excellent light absorption performance and functions to control sunlight, and by controlling the material, thickness, etc. of the metal protective layer, it is possible to control the color realized by the low-emission coating laminate.

The metal passivation layer may have an extinction coefficient of about 1.5 to about 3.5 in a visible ray region. The extinction coefficient is a value derived from an optical constant, which is an inherent property of a material, and the optical constant is expressed as n-ik by a formula. In this case, the real part, n, is the refractive index, and the imaginary part, k, is called the extinction coefficient (also called absorption coefficient, extinction coefficient, extinction coefficient, etc.). The extinction coefficient is a function of wavelength (λ), and for metals, it is common for the extinction coefficient to be greater than zero. The extinction coefficient, k, has the relationship of absorption coefficient, α and α=(4πk)/λ, and absorption coefficient, α, is the relationship of I=I0exp(-αd) when the thickness of the medium through which light passes is d. Due to the absorption of light by the medium, the intensity of the passing light (I) decreases compared to the intensity of the incident light (I0).

The metal protective layer uses a metal having an extinction coefficient in the visible ray region in the above range to absorb a certain portion of visible light, so that the low-emission coating layer has a predetermined color.

For example, the metal protective layer may include at least one selected from the group consisting of nickel, chromium, a nickel-chromium alloy, titanium, and combinations thereof, but is not limited thereto. A nickel-chromium alloy is preferred in the present application.

In addition, the thickness of each passivation layer may be 1 to 3 nm. The lower limit may be 1.2 nm, 1.4 nm, 1.6 nm, 1.8 nm or 2.0 nm, and the upper limit may be 3 nm, 2.8 nm, 2.6 nm, 2.4 nm or 2.2 nm.

dielectric layer

In the low-emission coating laminate, a lower dielectric layer is positioned on a lower surface of the lower protective layer, and an upper dielectric layer is positioned on an upper surface of the upper protective layer.

The lower and upper dielectric layers serve to protect the infrared reflective metal layer from ions or oxygen during heat treatment and to control optical properties of the manufactured glass.

Specifically, the lower and upper dielectric layers can act as an anti-oxidation film of the low-emission layer because the metal used as the low-emission layer is generally oxidized, and the dielectric layer also serves to increase visible light transmittance. In addition, the optical performance of the low-emissivity coating laminate may be adjusted by appropriately adjusting the material and properties of the dielectric layer and the number of layers. By appropriately adjusting the material and properties of the dielectric layer, the number of layers, and the thickness of each, the low-emissivity glass maintains a certain level of durability while maintaining excellent transmittance and can help to implement a commercially useful neutral color.

Here, the refractive index of the lower dielectric layer is controlled to be greater than that of the upper dielectric layer.

Since the refractive index of the lower dielectric layer is greater than the upper refractive index, light is transmitted more and reflection is reduced, so that an AR coating effect can be realized.

Hereinafter, a detailed configuration of the lower dielectric layer and the upper dielectric layer of the present application capable of implementing such an effect will be described.

The lower dielectric layer includes a first lower dielectric layer and a second lower dielectric layer. The lower dielectric layer may be, for example, from about 5 nm to about 60 nm. The thickness of the dielectric layer can be variously adjusted depending on the location and material to be configured in order to realize the optical performance (transmittance, reflectance, color index) of the entire multilayer thin film according to the target performance, and a dielectric layer having a thickness in the above range It is possible to effectively control the optical performance by the entire layer, including including, and realize an appropriate production rate.

The first lower dielectric layer includes a nitride having a metal characteristic. The nitride may include silicon aluminum nitride. Silicon aluminum nitride has excellent water resistance but poor transmittance. In particular, the refractive index of the first lower dielectric layer is preferably 1.95 to 2.05.

In silicon aluminum nitride, metal properties and ceramic properties are classified according to a histelli curve or voltage applied during thin film deposition, but they are not accurately quantified and are used as a relative concept.

The thickness of the first lower dielectric layer is preferably 5 to 15 nm. The lower limit may be 5 nm, 6 nm, 7 nm, 8 nm, or 9 nm. On the other hand, the upper limit may be 15 nm, 14 nm, 13 nm, 12 nm, or 11 nm. In this range, the above-described refractive index may be implemented.

In addition, the second lower dielectric layer includes a nitride having a ceramic characteristic. The nitride may include silicon aluminum nitride. In particular, the refractive index of the second lower dielectric layer of silicon aluminum nitride is preferably 2.15 to 2.3.

The thickness of the second lower dielectric layer is preferably 12 to 32 nm. The lower limit may be 12 nm, 14 nm, 16 nm, 18 nm, or 20 nm. On the other hand, the upper limit may be 32 nm, 30 nm, 28 nm, 26 nm, or 24 nm. In this range, the above-described refractive index may be implemented.

Through the configuration of the lower dielectric layer, durability and visible light transmittance can be improved.

The upper dielectric layer also includes a first upper dielectric layer, a second upper dielectric layer comprising a metal oxide, and a third upper dielectric layer. The top dielectric layer may be, for example, from about 5 nm to about 60 nm. The thickness of the dielectric layer can be variously adjusted depending on the location and material to be configured in order to realize the optical performance (transmittance, reflectance, color index) of the entire multilayer thin film according to the target performance, and a dielectric layer having a thickness in the above range It is possible to effectively control the optical performance by the entire layer, including including, and realize an appropriate production rate.

The first upper dielectric layer includes a nitride of ceramic characteristics. The nitride may include silicon aluminum nitride. In particular, the refractive index of the first upper dielectric layer is preferably 2.15 to 2.3.

The thickness of the first upper dielectric layer is preferably 5 to 15 nm. The lower limit may be 5 nm, 6 nm, 7 nm, 8 nm, or 9 nm. On the other hand, the upper limit may be 15 nm, 14 nm, 13 nm, 12 nm, or 11 nm. In this range, the above-described refractive index may be implemented.

In addition, the second upper dielectric layer may include a metal oxide, and the metal oxide may include zinc aluminum oxide.

The thickness of the second upper dielectric layer is preferably 2 to 8 nm. The lower limit may be 2 nm, 2.5 nm, 3 nm, 3.5 nm, or 4 nm. On the other hand, the upper limit may be 8 nm, 7.5 nm, 7 nm, 6.5 nm, or 6 nm.

In addition, the third upper dielectric layer includes a metal nitride. The nitride may include silicon aluminum nitride. In particular, the refractive index of the second upper dielectric layer is preferably 1.95 to 2.05.

The thickness of the third upper dielectric layer is preferably 22 to 42 nm. The lower limit may be 22 nm, 24 nm, 26 nm, 28 nm, or 30 nm. On the other hand, the upper limit may be 42 nm, 40 nm, 38 nm, 36 nm, or 34 nm. In this range, the above-described refractive index may be implemented.

Through the configuration of the upper dielectric layer, durability and visible light transmittance can be improved.

The refractive index of the lower dielectric layer is greater than the refractive index of the upper dielectric layer, and through this, more light is transmitted and the amount of reflection is reduced, so that the AR coating effect can be realized.

outer protective layer

In one example, the outer protective layer may have a single-layer or multi-layer structure in which one or more layers including a metal and a metal oxide are stacked.

As described above, the outer protective layer may have a single-layer structure of one layer including a metal and a metal oxide, or a multi-layer structure including two or more layers. The outer protective layer of the multilayer structure may have a structure in which a layer including two or more metals and a metal oxide is continuously stacked on the upper dielectric layer.

The metal and the metal oxide may be, for example, a metal including at least one selected from silicon, aluminum, titanium, zirconium, a silicon-based metal alloy, a titanium-based metal alloy, a zirconium-based metal alloy, and combinations thereof and a metal oxide thereof. there is.

The type of the metal may be selected to match the characteristics to be implemented according to the purpose of the low-emission coating.

For example, a Zr layer, a ZrOx layer, and a composite metal acid/nitride may be sequentially stacked. A Zr-based metal layer 1 to 3 nm and a Zr-based oxide layer 3 to 5 nm are formed as a base layer, and a SiAlOxNy or TiZrOxNx layer or a ZrSiOxNy layer 3 to 10 nm may be selectively deposited thereon.

The outer protective layer protects the low-emissivity layer by blocking oxygen, moisture, etc. from the outside with respect to the low-emissivity layer, thereby inhibiting physical and chemical diffusion to improve the chemical resistance and moisture resistance of the low-emissivity coating .

The outer protective layer may have a thickness of 2 to 15 nm. When the thickness of the outer protective layer is within the above range, it is possible to prevent a problem in that durability of the manufactured glass is deteriorated, and a problem in which fogging occurs after heat treatment of the manufactured glass.

In other words, the low-emissivity coating laminate of the present application sequentially has a first lower dielectric layer, a second lower dielectric layer, a lower metal protective layer, a low-emission layer, an upper metal protective layer, a first upper dielectric layer, a second upper dielectric layer, and a second 3 may include an upper dielectric layer and an outer protective layer.

In addition, the low-emissivity glass of the present application sequentially includes a glass substrate, a first lower dielectric layer, a second lower dielectric layer, a lower metal protective layer, a low radiation layer, an upper metal protective layer, a first upper dielectric layer, a second upper dielectric layer, a third upper part It may include a dielectric layer and an outer protective layer.

Such a low-emissivity glass can control the color index of the surface as follows. The transmitted color may have an a* value of -2 to -4, a b* value of -2 to 0, and the reflective color of the coating surface may have an a* value of 1 to 3, and a b* value of -7 to -9. .

It is possible to implement a neutral color through this range, and in the present application, it is easier to implement a neutral color than a conventional low-emissivity glass through the above-described configuration.

The color index value is based on the L, a*, and b* values measured in accordance with CIE1931 using a color difference measuring instrument (KONICA MINOLTA SENSING, InC., CM-700d) when the light source is D65 of KS standard.

In addition, in order to manufacture a functional building material for windows and doors, first, a glass substrate 10 is prepared, and then each layer of the low-emission coating laminate may be sequentially formed. Each layer of the low-emissivity coating laminate may be formed by a method suitable for realizing desired physical properties according to a known method.

For example, each layer such as the low-emissivity layer, the upper metal protective layer, the first upper dielectric layer, the second upper dielectric layer, the third upper dielectric layer, and the outer protective layer may be formed by a method such as a sputtering method.

The functional building material for windows and doors may be installed so that the surface of the glass substrate faces outward, and the surface of the low-emissivity coating laminate faces inward.

In addition, the functional building material for windows and doors is installed so that the surface of the glass substrate faces outward, the surface of the low-emissivity coating laminate faces inward, and an additional glass substrate spaced apart from the surface of the low-emissivity coating laminate at regular intervals. It can be installed with a so-called double-layer glass that forms an internal space.

Hereinafter, the present application will be described in more detail through experimental examples.

[Experimental example]

[Examples and Comparative Examples]

Using a magnetron sputtering evaporator (Selcos Cetus-S), a low-emissivity glass including a multi-layered low-emission coating laminate coated on a glass substrate as follows was prepared. The layer structure of the low-emissivity coating laminate is shown in Table 1 according to the lamination order.

Comparative Example 1 (thickness/refractive index) Example 1 (thickness/refractive index) outer protective layer Composite metal acid/nitride (optional) 8 (± 5) Composite Metal Acid/Nitride 8 (± 5) ZrOx 3 (± 5) ZrOx 3 (± 5) Zr 1 (± 1) Zr 1 (± 1) 3rd upper dielectric layer SiAlNx
(metalic) 44 (± 10)/ 1.96 SiAlNx (metalic) 32 (± 10)/1.97 2nd upper dielectric layer ZnAlOx 5 (± 3) first upper dielectric layer SiAlNx (ceramic) 10 (± 5)/2.25 upper protective layer NiCr 2 1 (± 1) NiCr 2 (± 1) low emission layer Silver 9 (± 1) Silver 9 (± 1) lower protective layer NiCr 1.8 1 (± 1) NiCr 1.8 (± 1) 2nd lower dielectric layer SiAlNx
(metalic) 38 (± 10)/ 1.95 SiAlNx (ceramic) 22 (± 10)/ 2.23 first lower dielectric layer SiAlNx (metalic) 10 (± 5)/1.96

[Evaluation 1]

For Comparative Example 1 and Example 1, the emissivity, transmittance, transmittance color and coating surface reflection color were measured, and are shown in Table 2 below.

In order to measure the emissivity, FT-IR (Frontier, Perkin Elmer, Inc.), which is a far-infrared spectrometer, is used. The far-infrared reflectance spectrum was measured on one side of the functional building material for windows and doors on which the low-emissivity coating was formed, and from the result, the average far-infrared reflectance was calculated according to the KS 2514 standard, and then 100%-(average far-infrared reflectance) with the formula The emissivity was calculated.

In order to measure the transmittance, a UV-Vis-NIR spectrum measuring device (Shimadzu, Solidspec-3700) is used. After measuring the optical spectrum with a section width of 1 nm in the range of 250 to 2500 nm, the resulting value was calculated based on the KS L 2514 standard, and the visible light transmittance was calculated.

In order to measure the transmitted color and the reflected color of the coating surface, the color index a* value according to CIE1931 was measured using a color difference measuring instrument (KONICA MINOLTA SENSING, InC., CM-700d). At this time, the light source was applied as D65 of KS standard.

Comparative Example 1 Example 1 Emissivity (%) 10.9 10.8 Transmittance (%) 72.4 77.5 Transmissive color ( a* / b*) -2.5 / -1.1 -3.5 / -0.9 Coated surface reflection color ( a* / b*) 4.2 / -11.4 2.4 / -8.8

As shown in Table 2, the transmittance of Example 1 was improved compared to Comparative Example 1, and it was confirmed that it was easier to implement a neutral color compared to Comparative Example 1.

[Evaluation 2]

For the functional building materials for windows and doors prepared according to Example 1 and Comparative Example 1, an abrasion resistance test was performed using a washing machine (MANNA, MGR-460), and observed with an optical microscope (X200) to calculate the number of scratches. Table 3 shows. However, the number shown in Table 3 below was calculated to have a width of 0.5 μm or more, which is the minimum size distinguishable when observed with an optical microscope (X200) among scratches.

In addition, the length of the corrosion point and the corrosion depth of the edge surface were measured using an optical microscope, and are shown in Table 3 below.

Comparative Example 1 Example 1 Ganghwajeon Level 1 to 1.5 (Pass)
Scratch: 10 or less Level 1 to 1.5 (Pass)
Scratch: 10 or less after strengthening 1 ~ 1.5 grade (Pass) scratches: 10 or less Level 1 to 1.5 (Pass)
Scratch: 10 or less Corrosion Point (Day 21) 10 or less 10 or less Edge surface corrosion depth 200 μm or less 200 μm or less

As shown in Table 3, it was confirmed that Example 1 had similar durability compared to Comparative Example 1. Through this, it was confirmed that it is possible to provide a low-emissivity glass that has excellent transmittance, is easy to implement a neutral color, and exhibits durability similar to that of the prior art, and simultaneously satisfies these physical properties, which are trade-off relationships. Although described with reference to examples, it will be understood by those skilled in the art that various modifications and changes can be made to the present application without departing from the spirit and scope of the present invention as set forth in the following claims. .

1: Low-emission coating laminate
10: lower dielectric layer
11: first lower dielectric layer
13: second lower dielectric layer
20: lower protective layer
30: low emission layer
40: upper protective layer
50: upper dielectric layer
51: first upper dielectric layer
53: second upper dielectric layer
55: third upper dielectric layer
60: outer protective layer

Claims (12)

A low-emission coating laminate in which a lower dielectric layer, a lower metal protective layer, a low-emission layer, an upper metal protective layer, an upper dielectric layer and an outer protective layer are sequentially formed,
the lower dielectric layer comprises a first lower dielectric layer comprising a nitride and a second lower dielectric layer comprising a nitride;
The upper dielectric layer comprises a first upper dielectric layer comprising a nitride, a second upper dielectric layer comprising a metal oxide, and a third upper dielectric layer comprising a nitride.
The method of claim 1,
A low-emissivity coating laminate in which the refractive index of the lower dielectric layer is greater than that of the upper dielectric layer.
The method of claim 1,
The nitride is a low-emissivity coating laminate comprising silicon aluminum nitride,
The method of claim 1,
wherein the first lower dielectric layer has a refractive index of 1.95 to 2.05.
The method of claim 1,
wherein the second lower dielectric layer has a refractive index of 2.15 to 2.3.
The method of claim 1,
The lower protective layer is a low-emissivity coating laminate comprising one selected from the group consisting of nickel, chromium, an alloy of nickel and chromium, and combinations thereof.
The method of claim 1,
wherein the first upper dielectric layer has a refractive index of 2.15 to 2.3.
The method of claim 1,
The second upper dielectric layer is a low-emissivity coating laminate comprising zinc aluminum oxide.
The method of claim 1,
and the third upper dielectric layer has a refractive index of 1.95 to 2.05.
The method of claim 1,
The upper protective layer is a low-emissivity coating laminate comprising one selected from the group consisting of nickel, chromium, an alloy of nickel and chromium, and combinations thereof.
The method of claim 1,
The outer protective layer is a low-emissivity coating laminate having a single-layer or multi-layer structure in which one or more layers including a metal oxide and/or a metal are stacked.
A low-emissivity glass coated with a low-emission coating laminate according to any one of claims 1 to 11 on a glass substrate and the glass substrate.

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