KR20220002719A - Resin composition for gasket, production method therefor, and gasket for secondary battery - Google Patents
Resin composition for gasket, production method therefor, and gasket for secondary battery Download PDFInfo
- Publication number
- KR20220002719A KR20220002719A KR1020217042596A KR20217042596A KR20220002719A KR 20220002719 A KR20220002719 A KR 20220002719A KR 1020217042596 A KR1020217042596 A KR 1020217042596A KR 20217042596 A KR20217042596 A KR 20217042596A KR 20220002719 A KR20220002719 A KR 20220002719A
- Authority
- KR
- South Korea
- Prior art keywords
- group
- gasket
- polyarylene sulfide
- resin composition
- sulfide resin
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 39
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 229920005989 resin Polymers 0.000 claims abstract description 83
- 239000011347 resin Substances 0.000 claims abstract description 83
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 71
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims abstract description 60
- 229920000412 polyarylene Polymers 0.000 claims abstract description 60
- 150000001875 compounds Chemical class 0.000 claims abstract description 42
- 239000000203 mixture Substances 0.000 claims abstract description 37
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 34
- 239000003112 inhibitor Substances 0.000 claims abstract description 33
- 239000011593 sulfur Substances 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 32
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims abstract description 29
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 22
- 239000003792 electrolyte Substances 0.000 claims abstract description 10
- 238000007789 sealing Methods 0.000 claims abstract description 7
- 150000001491 aromatic compounds Chemical class 0.000 claims description 23
- 125000003277 amino group Chemical group 0.000 claims description 14
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 238000002156 mixing Methods 0.000 claims description 6
- 238000005227 gel permeation chromatography Methods 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 2
- 150000003464 sulfur compounds Chemical class 0.000 claims description 2
- -1 iodo aromatic compound Chemical class 0.000 abstract description 34
- 239000000463 material Substances 0.000 abstract description 9
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 abstract description 6
- 229910001416 lithium ion Inorganic materials 0.000 abstract description 6
- 238000003860 storage Methods 0.000 abstract description 4
- 238000006243 chemical reaction Methods 0.000 description 24
- 239000002904 solvent Substances 0.000 description 24
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 21
- 239000004734 Polyphenylene sulfide Substances 0.000 description 20
- 229920000069 polyphenylene sulfide Polymers 0.000 description 20
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 229910052740 iodine Inorganic materials 0.000 description 14
- 239000007795 chemical reaction product Substances 0.000 description 13
- 238000001914 filtration Methods 0.000 description 12
- 125000000217 alkyl group Chemical group 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 11
- 125000000524 functional group Chemical group 0.000 description 10
- 239000006166 lysate Substances 0.000 description 10
- 238000000465 moulding Methods 0.000 description 10
- 125000001424 substituent group Chemical group 0.000 description 10
- 238000005406 washing Methods 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- 125000003118 aryl group Chemical group 0.000 description 9
- 239000012298 atmosphere Substances 0.000 description 9
- 229910000077 silane Inorganic materials 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 8
- 125000004432 carbon atom Chemical group C* 0.000 description 8
- 239000000835 fiber Substances 0.000 description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 8
- 238000002844 melting Methods 0.000 description 8
- 230000008018 melting Effects 0.000 description 8
- 230000001590 oxidative effect Effects 0.000 description 8
- 239000007787 solid Substances 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 238000005342 ion exchange Methods 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 239000000155 melt Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000001746 injection moulding Methods 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 5
- 238000004140 cleaning Methods 0.000 description 5
- 230000002349 favourable effect Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- LFMWZTSOMGDDJU-UHFFFAOYSA-N 1,4-diiodobenzene Chemical compound IC1=CC=C(I)C=C1 LFMWZTSOMGDDJU-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 238000004898 kneading Methods 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 239000008188 pellet Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 3
- GAMSSMZJKUMFEY-UHFFFAOYSA-N 4-[(4-carboxyphenyl)disulfanyl]benzoic acid Chemical compound C1=CC(C(=O)O)=CC=C1SSC1=CC=C(C(O)=O)C=C1 GAMSSMZJKUMFEY-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N dimethyl sulfoxide Natural products CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- 239000008151 electrolyte solution Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthene Chemical compound C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 3
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 3
- 239000011256 inorganic filler Substances 0.000 description 3
- 229910003475 inorganic filler Inorganic materials 0.000 description 3
- 239000011630 iodine Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 239000012779 reinforcing material Substances 0.000 description 3
- 125000005353 silylalkyl group Chemical group 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- JTPNRXUCIXHOKM-UHFFFAOYSA-N 1-chloronaphthalene Chemical compound C1=CC=C2C(Cl)=CC=CC2=C1 JTPNRXUCIXHOKM-UHFFFAOYSA-N 0.000 description 2
- NQMUGNMMFTYOHK-UHFFFAOYSA-N 1-methoxynaphthalene Chemical compound C1=CC=C2C(OC)=CC=CC2=C1 NQMUGNMMFTYOHK-UHFFFAOYSA-N 0.000 description 2
- AVYGCQXNNJPXSS-UHFFFAOYSA-N 2,5-dichloroaniline Chemical compound NC1=CC(Cl)=CC=C1Cl AVYGCQXNNJPXSS-UHFFFAOYSA-N 0.000 description 2
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical group 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 2
- YXVFYQXJAXKLAK-UHFFFAOYSA-N biphenyl-4-ol Chemical compound C1=CC(O)=CC=C1C1=CC=CC=C1 YXVFYQXJAXKLAK-UHFFFAOYSA-N 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- IYYZUPMFVPLQIF-UHFFFAOYSA-N dibenzothiophene Chemical compound C1=CC=C2C3=CC=CC=C3SC2=C1 IYYZUPMFVPLQIF-UHFFFAOYSA-N 0.000 description 2
- 239000004205 dimethyl polysiloxane Substances 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- PZYDAVFRVJXFHS-UHFFFAOYSA-N n-cyclohexyl-2-pyrrolidone Chemical compound O=C1CCCN1C1CCCCC1 PZYDAVFRVJXFHS-UHFFFAOYSA-N 0.000 description 2
- 150000002828 nitro derivatives Chemical class 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 150000005181 nitrobenzenes Chemical class 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- IZUPBVBPLAPZRR-UHFFFAOYSA-N pentachlorophenol Chemical compound OC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl IZUPBVBPLAPZRR-UHFFFAOYSA-N 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical group C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 2
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000012265 solid product Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- QQFIQWBUKYSUHM-UHFFFAOYSA-N (2,3-diiodophenyl)-phenylmethanone Chemical compound IC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1I QQFIQWBUKYSUHM-UHFFFAOYSA-N 0.000 description 1
- MEIFVWINIHKENC-UHFFFAOYSA-N (2-iodophenyl)-phenylmethanone Chemical compound IC1=CC=CC=C1C(=O)C1=CC=CC=C1 MEIFVWINIHKENC-UHFFFAOYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- KGANAERDZBAECK-UHFFFAOYSA-N (3-phenoxyphenyl)methanol Chemical compound OCC1=CC=CC(OC=2C=CC=CC=2)=C1 KGANAERDZBAECK-UHFFFAOYSA-N 0.000 description 1
- DBNWBEGCONIRGQ-UHFFFAOYSA-N 1,1-diphenylpropan-2-one Chemical compound C=1C=CC=CC=1C(C(=O)C)C1=CC=CC=C1 DBNWBEGCONIRGQ-UHFFFAOYSA-N 0.000 description 1
- LSESTAVEDKBXPP-UHFFFAOYSA-N 1,2-diiodo-3,4-dimethylbenzene Chemical group CC1=CC=C(I)C(I)=C1C LSESTAVEDKBXPP-UHFFFAOYSA-N 0.000 description 1
- BBOLNFYSRZVALD-UHFFFAOYSA-N 1,2-diiodobenzene Chemical compound IC1=CC=CC=C1I BBOLNFYSRZVALD-UHFFFAOYSA-N 0.000 description 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 description 1
- YFKBXYGUSOXJGS-UHFFFAOYSA-N 1,3-Diphenyl-2-propanone Chemical compound C=1C=CC=CC=1CC(=O)CC1=CC=CC=C1 YFKBXYGUSOXJGS-UHFFFAOYSA-N 0.000 description 1
- JTNRGGLCSLZOOQ-UHFFFAOYSA-N 1,3-diphenoxybenzene Chemical compound C=1C=CC(OC=2C=CC=CC=2)=CC=1OC1=CC=CC=C1 JTNRGGLCSLZOOQ-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- VRBLNWVVFVBNRK-UHFFFAOYSA-N 1,6-diphenylhexane-1,6-dione Chemical compound C=1C=CC=CC=1C(=O)CCCCC(=O)C1=CC=CC=C1 VRBLNWVVFVBNRK-UHFFFAOYSA-N 0.000 description 1
- HQJQYILBCQPYBI-UHFFFAOYSA-N 1-bromo-4-(4-bromophenyl)benzene Chemical group C1=CC(Br)=CC=C1C1=CC=C(Br)C=C1 HQJQYILBCQPYBI-UHFFFAOYSA-N 0.000 description 1
- DLKQHBOKULLWDQ-UHFFFAOYSA-N 1-bromonaphthalene Chemical compound C1=CC=C2C(Br)=CC=CC2=C1 DLKQHBOKULLWDQ-UHFFFAOYSA-N 0.000 description 1
- APWZAIZNWQFZBK-UHFFFAOYSA-N 1-ethoxynaphthalene Chemical compound C1=CC=C2C(OCC)=CC=CC2=C1 APWZAIZNWQFZBK-UHFFFAOYSA-N 0.000 description 1
- GPYDMVZCPRONLW-UHFFFAOYSA-N 1-iodo-4-(4-iodophenyl)benzene Chemical group C1=CC(I)=CC=C1C1=CC=C(I)C=C1 GPYDMVZCPRONLW-UHFFFAOYSA-N 0.000 description 1
- SCCCFNJTCDSLCY-UHFFFAOYSA-N 1-iodo-4-nitrobenzene Chemical compound [O-][N+](=O)C1=CC=C(I)C=C1 SCCCFNJTCDSLCY-UHFFFAOYSA-N 0.000 description 1
- NXYICUMSYKIABQ-UHFFFAOYSA-N 1-iodo-4-phenylbenzene Chemical group C1=CC(I)=CC=C1C1=CC=CC=C1 NXYICUMSYKIABQ-UHFFFAOYSA-N 0.000 description 1
- IYDMICQAKLQHLA-UHFFFAOYSA-N 1-phenylnaphthalene Chemical compound C1=CC=CC=C1C1=CC=CC2=CC=CC=C12 IYDMICQAKLQHLA-UHFFFAOYSA-N 0.000 description 1
- VALABLHQPAMOBO-UHFFFAOYSA-N 2,4-diiodo-1-nitrobenzene Chemical compound [O-][N+](=O)C1=CC=C(I)C=C1I VALABLHQPAMOBO-UHFFFAOYSA-N 0.000 description 1
- DCJKUXYSYJBBRD-UHFFFAOYSA-N 2,5-diphenyl-1,3,4-oxadiazole Chemical compound C1=CC=CC=C1C1=NN=C(C=2C=CC=CC=2)O1 DCJKUXYSYJBBRD-UHFFFAOYSA-N 0.000 description 1
- CNRNYORZJGVOSY-UHFFFAOYSA-N 2,5-diphenyl-1,3-oxazole Chemical compound C=1N=C(C=2C=CC=CC=2)OC=1C1=CC=CC=C1 CNRNYORZJGVOSY-UHFFFAOYSA-N 0.000 description 1
- AHKDVDYNDXGFPP-UHFFFAOYSA-N 2,6-dimethoxynaphthalene Chemical compound C1=C(OC)C=CC2=CC(OC)=CC=C21 AHKDVDYNDXGFPP-UHFFFAOYSA-N 0.000 description 1
- ATGFTMUSEPZNJD-UHFFFAOYSA-N 2,6-diphenylphenol Chemical compound OC1=C(C=2C=CC=CC=2)C=CC=C1C1=CC=CC=C1 ATGFTMUSEPZNJD-UHFFFAOYSA-N 0.000 description 1
- PPKHAIRFQKFMLE-UHFFFAOYSA-N 2,7-dimethoxynaphthalene Chemical compound C1=CC(OC)=CC2=CC(OC)=CC=C21 PPKHAIRFQKFMLE-UHFFFAOYSA-N 0.000 description 1
- UBPDKIDWEADHPP-UHFFFAOYSA-N 2-iodoaniline Chemical compound NC1=CC=CC=C1I UBPDKIDWEADHPP-UHFFFAOYSA-N 0.000 description 1
- KQDJTBPASNJQFQ-UHFFFAOYSA-N 2-iodophenol Chemical compound OC1=CC=CC=C1I KQDJTBPASNJQFQ-UHFFFAOYSA-N 0.000 description 1
- ILYSAKHOYBPSPC-UHFFFAOYSA-N 2-phenylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C1=CC=CC=C1 ILYSAKHOYBPSPC-UHFFFAOYSA-N 0.000 description 1
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- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000008247 solid mixture Substances 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- ISXOBTBCNRIIQO-UHFFFAOYSA-N tetrahydrothiophene 1-oxide Chemical compound O=S1CCCC1 ISXOBTBCNRIIQO-UHFFFAOYSA-N 0.000 description 1
- GVIJJXMXTUZIOD-UHFFFAOYSA-N thianthrene Chemical compound C1=CC=C2SC3=CC=CC=C3SC2=C1 GVIJJXMXTUZIOD-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- LZTRCELOJRDYMQ-UHFFFAOYSA-N triphenylmethanol Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(O)C1=CC=CC=C1 LZTRCELOJRDYMQ-UHFFFAOYSA-N 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
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- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
- C08G75/02—Polythioethers
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- H—ELECTRICITY
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- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M50/00—Constructional details or processes of manufacture of the non-active parts of electrochemical cells other than fuel cells, e.g. hybrid cells
- H01M50/10—Primary casings; Jackets or wrappings
- H01M50/183—Sealing members
- H01M50/19—Sealing members characterised by the material
- H01M50/193—Organic material
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/06—Sulfur
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- C—CHEMISTRY; METALLURGY
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
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- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
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- H01M50/10—Primary casings; Jackets or wrappings
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- H—ELECTRICITY
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- H01M50/183—Sealing members
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Abstract
리튬이온 이차전지 등의 밀폐형 이차전지(축전지)에 사용되는 개스킷용 재료로서, 캐비티 밸런스가 우수하며, 높은 기계적 강도를 갖는 개스킷용 수지 조성물, 그 제조 방법 및 이차전지용 개스킷을 제공한다. 구체적으로는, 양극, 음극, 봉구체, 개스킷, 세퍼레이터 및 전해액으로 구성되는 이차전지에 사용되는 개스킷용 수지 조성물로서, 폴리아릴렌설피드 수지 및 실리콘 화합물을 함유하고, 폴리아릴렌설피드 수지가, 디요오도 방향족 화합물, 단체 황 및 상기 중합금지제를 함유하는 용융 혼합물 중에서 반응시키는 것을 포함하는 방법에 의해 얻을 수 있는 것인, 개스킷용 수지 조성물, 그 제조 방법 및 이차전지용 개스킷에 관한 것이다.Provided are a gasket material used for a sealed secondary battery (storage battery) such as a lithium ion secondary battery, a resin composition for a gasket having an excellent cavity balance and high mechanical strength, a manufacturing method thereof, and a gasket for a secondary battery. Specifically, as a resin composition for a gasket used in a secondary battery composed of a positive electrode, a negative electrode, a sealing body, a gasket, a separator, and an electrolyte, it contains a polyarylene sulfide resin and a silicone compound, and the polyarylene sulfide resin is It relates to a resin composition for a gasket, a method for producing the same, and a gasket for a secondary battery, which can be obtained by a method comprising reacting in a molten mixture containing iodo aromatic compound, single sulfur and the polymerization inhibitor.
Description
본 발명은, 이차전지의 개스킷에 사용되는 개스킷용 수지 조성물, 그 제조 방법 및 이차전지용 개스킷에 관한 것이다.The present invention relates to a resin composition for a gasket used for a gasket of a secondary battery, a manufacturing method thereof, and a gasket for a secondary battery.
밀폐형 이차전지는, 일반적으로 양극판, 음극판 및 양극판과 음극판과의 사이에 배치된 세퍼레이터를 포함하는 극판군과, 이 극판군을 침지하기 위한 전해액을 함유하는 전지 소자가 일부 개구되어 있는 전지 케이스(외장체)의 내부에 수용되며, 전지 케이스의 개구를 봉구(封口)하기 위한 봉구체에 의해 밀폐되어 있다. 또한, 이 밀폐형 이차전지에 있어서, 예를 들면 양극판과 전기적으로 접속되어 있는 양극 단자와의 접점이나, 음극판과 전기적으로 접속되어 있는 음극 단자와의 접점에는 한 쌍의 단자간에서의 단락 방지나 전해액의 누출 방지를 위하여 개스킷이 마련되어 있다. 이 개스킷에는 전해액에 대한 내전해액성이나 우수한 기밀성이 요구되고 있다.A sealed secondary battery is a battery case (exterior) in which a battery element containing a positive electrode plate, a negative electrode plate, and a separator disposed between the positive electrode plate and the negative electrode plate, and a battery element containing an electrolyte for immersing the electrode plate group are partially opened. sieve), and is sealed by a sealing member for sealing the opening of the battery case. In addition, in this sealed secondary battery, for example, a contact between the positive electrode and the positive terminal electrically connected to the positive electrode plate, or the contact between the negative electrode and the negative terminal electrically connected to the negative electrode, for preventing a short circuit between a pair of terminals or electrolyte solution A gasket is provided to prevent leakage. This gasket is required to have electrolyte resistance to the electrolyte and excellent airtightness.
이들 요구를 만족시키기 위하여, 예를 들면, 개스킷 재료로서 내습열성을 향상시킨 폴리아미드 수지를 사용하는 기술이 보고되어 있다(예를 들면, 특허문헌 1 참조). 그러나, 내습열성을 향상시킨 폴리아미드 수지의 사용에 의해 내습열성을 약간 개선할 수는 있지만, 내전해액성 및 기밀성의 정도는 아직 불충분한 것이다.In order to satisfy these requirements, for example, the technique of using the polyamide resin which improved heat-and-moisture resistance as a gasket material is reported (refer patent document 1, for example). However, although heat-and-moisture resistance can be slightly improved by using the polyamide resin with improved heat-and-moisture resistance, the degree of electrolyte resistance and airtightness are still insufficient.
한편, 개스킷 재료로서, 폴리아릴렌설피드 수지 또는 테트라플루오로에틸렌-퍼-플루오로알킬비닐에테르 공중합체 수지를 사용한 개스킷이 우수한 기밀성이나 내전해액성을 갖는 것이 보고되어 있다(예를 들면, 특허문헌 2 참조).On the other hand, it has been reported that a gasket using polyarylene sulfide resin or tetrafluoroethylene-per-fluoroalkylvinyl ether copolymer resin as a gasket material has excellent airtightness and electrolyte resistance (for example, Patent Literature see 2).
최근, 높은 이론 용량의 활물질을 전극 물질로서 사용함에 의해서 리튬이온 전지의 고용량화가 진전한 반면, 충방전 시에 3∼4배라는 큰 체적 변화를 나타내도록 되어, 내부 매체의 압력이 현격히 높아져 있다. 또한, 하이브리드 자동차(HV)나 전기 자동차(EV)와 같은 차재(車載) 용도의 비중이 높아진 결과, 보다 높은 안전성이 요구되고, 고온·고습의 과혹한 조건 하에서의 개스킷의 기밀성에 대한 신뢰성이 극히 높은 레벨로 필요해져 가고 있다.In recent years, by using an active material having a high theoretical capacity as an electrode material, a high capacity lithium ion battery has progressed, while a large volume change of 3 to 4 times during charging and discharging is exhibited, and the pressure of the internal medium is remarkably high. In addition, as the specific gravity of vehicle-mounted applications such as hybrid vehicles (HV) and electric vehicles (EV) has increased, higher safety is required, and the reliability of the gasket under harsh conditions of high temperature and high humidity is extremely high. The level is becoming necessary.
그러나, 종래의 개스킷 재료는, 내부 매체의 압력에 견딜 수 없어, 최근 요구되고 있는 리튬이온 이차전지 등의 밀폐형 이차전지(축전지)에 대해서 요구되는 레벨에 이르지 못해, 재료로서는 불충분하다. 그 때문에, 개스킷 재료에는, 기계적 강도를 향상하는 것이 요구되고 있다.However, the conventional gasket material cannot withstand the pressure of the internal medium, and does not reach the level required for a sealed secondary battery (storage battery) such as a lithium ion secondary battery that has been recently demanded, and is insufficient as a material. Therefore, it is calculated|required by the gasket material to improve mechanical strength.
한편, 복수의 캐비티를 갖는 금형을 사용한 사출 성형에 의해, 동시에 복수의 개스킷을 성형했을 때에, 일부의 캐비티에 성형용 재료가 충분히 충전되지 않는다는 성형 불량이 발생하는 경우가 있다. 그 때문에, 성형용 재료에는, 균일하게 불균일 없이 충전할 수 있는 것도 요구되고 있다.On the other hand, when a plurality of gaskets are simultaneously molded by injection molding using a mold having a plurality of cavities, a molding defect in that some cavities are not sufficiently filled with a molding material may occur. Therefore, it is also calculated|required that the material for shaping|molding can be filled uniformly and nonuniformly.
그래서, 본 발명이 해결하려고 하는 주된 과제는, 리튬이온 이차전지 등의 밀폐형 이차전지(축전지)에 사용되는 개스킷용 재료로서, 캐비티 밸런스가 우수하며, 높은 기계적 강도를 갖는 개스킷용 수지 조성물, 그 제조 방법 및 이차전지용 개스킷을 제공하는 것에 있다.Therefore, the main problem to be solved by the present invention is a gasket material used in sealed secondary batteries (storage batteries) such as lithium ion secondary batteries, excellent in cavity balance and high mechanical strength, resin composition for gaskets, and its manufacture To provide a method and a gasket for a secondary battery.
본 발명자들은 각종 검토를 행한 결과, 디요오도 방향족 화합물(diiodo aromatic compound)과 단체(單體) 황과 중합금지제를 용융 중합시킴으로써 얻어지는 폴리아릴렌설피드 수지와, 실리콘 화합물을 함유하는 수지 조성물을 사용함에 의해, 상기 과제를 해결할 수 있는 것을 알아내어, 본 발명을 완성하기에 이르렀다.As a result of various studies, the present inventors have prepared a polyarylene sulfide resin obtained by melt polymerization of a diiodo aromatic compound, single sulfur, and a polymerization inhibitor, and a resin composition containing a silicone compound. By using, it discovered that the said subject could be solved, and came to complete this invention.
즉, 본 발명은, 양극, 음극, 봉구체, 개스킷, 세퍼레이터 및 전해액으로 구성되는 이차전지에 사용되는 개스킷용 수지 조성물로서, 폴리아릴렌설피드 수지 및 실리콘 화합물을 함유하고, 폴리아릴렌설피드 수지가, 디요오도 방향족 화합물과, 단체 황과, 중합금지제를, 디요오도 방향족 화합물, 단체 황 및 중합금지제를 함유하는 용융 혼합물 중에서 반응시키는 것을 포함하는 방법에 의해 얻을 수 있는 것인, 개스킷용 수지 조성물을 제공한다. 본 발명은 또한, 상기 개스킷용 수지 조성물로 이루어지는 이차전지용 개스킷을 제공한다.That is, the present invention is a resin composition for a gasket used in a secondary battery composed of a positive electrode, a negative electrode, a sealing body, a gasket, a separator, and an electrolyte, and contains a polyarylene sulfide resin and a silicone compound, and the polyarylene sulfide resin is , a gasket obtainable by a method comprising reacting a diiodo aromatic compound, single sulfur, and a polymerization inhibitor in a molten mixture containing a diiodo aromatic compound, single sulfur and a polymerization inhibitor. A resin composition for use is provided. The present invention also provides a gasket for a secondary battery comprising the resin composition for the gasket.
본 발명은 또한, 양극, 음극, 봉구체, 개스킷, 세퍼레이터 및 전해액으로 구성되는 이차전지에 사용되는 개스킷용 수지 조성물의 제조 방법으로서, 폴리아릴렌설피드 수지 및 실리콘 화합물을 혼합하는 공정을 갖고, 폴리아릴렌설피드 수지가, 디요오도 방향족 화합물과, 단체 황과, 중합금지제를, 디요오도 방향족 화합물, 단체 황 및 중합금지제를 함유하는 용융 혼합물 중에서 반응시키는 것을 포함하는 방법에 의해 얻을 수 있는 것인, 개스킷용 수지 조성물의 제조 방법을 제공한다.The present invention also provides a method for producing a resin composition for a gasket used in a secondary battery composed of a positive electrode, a negative electrode, a sealing body, a gasket, a separator, and an electrolyte, comprising a step of mixing a polyarylene sulfide resin and a silicone compound; Arylene sulfide resin can be obtained by a method comprising reacting a diiodo aromatic compound, single sulfur, and a polymerization inhibitor in a molten mixture containing a diiodo aromatic compound, single sulfur and a polymerization inhibitor. There is provided a method for producing a resin composition for a gasket.
본 발명에 따르면, 리튬이온 이차전지 등의 밀폐형 이차전지(축전지)에 사용되는 개스킷용 재료로서, 캐비티 밸런스가 우수하며, 높은 기계적 강도를 갖는 개스킷용 수지 조성물, 그 제조 방법 및 이차전지용 개스킷을 제공할 수 있다. 또한, 상기 개스킷용 수지 조성물을 사용함으로써, 가열에 의한 가스 발생을 억제한 이차전지용 개스킷을 제작할 수 있다.According to the present invention, there is provided a resin composition for a gasket used for a sealed secondary battery (storage battery) such as a lithium ion secondary battery, which has excellent cavity balance and high mechanical strength, a manufacturing method thereof, and a gasket for a secondary battery can do. Moreover, by using the said resin composition for gaskets, the gasket for secondary batteries which suppressed the gas generation by heating can be produced.
도 1은 압축 응력 완화 시험에 사용한 시험편을 나타내는 모식도.BRIEF DESCRIPTION OF THE DRAWINGS It is a schematic diagram which shows the test piece used for a compressive stress relaxation test.
이하, 본 발명의 호적(好適)한 실시형태에 대하여 상세히 설명한다. 단, 본 발명은 이하의 실시형태로 한정되는 것은 아니다.EMBODIMENT OF THE INVENTION Hereinafter, suitable embodiment of this invention is demonstrated in detail. However, this invention is not limited to the following embodiment.
본 실시형태에 따른 개스킷용 수지 조성물은, 폴리아릴렌설피드 수지 및 실리콘 화합물을 함유한다.The resin composition for gaskets according to the present embodiment contains polyarylene sulfide resin and a silicone compound.
본 실시형태에 사용되는 폴리아릴렌설피드 수지는, 디요오도 방향족 화합물과, 단체 황과, 중합금지제를, 디요오도 방향족 화합물, 단체 황 및 중합금지제를 함유하는 용융 혼합물 중에서 반응시키는 것을 포함하는 방법에 의해 얻을 수 있다. 이러한 방법에 따르면, 필립스법을 비롯한 종래법에 비해, 비교적 고분자량의 중합체로서 폴리아릴렌설피드 수지를 얻을 수 있다.The polyarylene sulfide resin used in the present embodiment is obtained by reacting a diiodo aromatic compound, single sulfur, and a polymerization inhibitor in a molten mixture containing a diiodo aromatic compound, single sulfur compound and a polymerization inhibitor. It can be obtained by a method comprising According to this method, a polyarylene sulfide resin can be obtained as a polymer having a relatively high molecular weight as compared with conventional methods including the Phillips method.
디요오도 방향족 화합물은, 방향족 환과, 방향족 환에 직접 결합한 2개의 요오드 원자를 갖는다. 디요오도 방향족 화합물로서는, 디요오도벤젠, 디요오도톨루엔, 디요오도자일렌, 디요오도나프탈렌, 디요오도비페닐, 디요오도벤조페논, 디요오도디페닐에테르 및 디요오도디페닐설폰 등을 들 수 있지만, 이들로 한정되지 않는다. 2개의 요오드 원자의 치환 위치는 특히 한정되지 않지만, 바람직하게는 2개의 치환 위치가 분자 내에서 가능한 한 먼 위치에 있는 것이 바람직하다. 바람직한 치환 위치는, 파라 위치, 및 4,4'- 위치이다.The diiodo aromatic compound has an aromatic ring and two iodine atoms directly bonded to the aromatic ring. Examples of the diiodo aromatic compound include diiodobenzene, diiodotoluene, diiodoxylene, diiodonnaphthalene, diiodobiphenyl, diiodobenzophenone, diiododiphenyl ether and diiododi Although phenylsulfone etc. are mentioned, It is not limited to these. Although the substitution position of two iodine atoms is not specifically limited, Preferably, it is preferable that the two substitution positions are as far as possible in a molecule|numerator. Preferred substitution positions are the para position, and the 4,4'-position.
디요오도 방향족 화합물의 방향족 환은, 페닐기, 요오드 원자 이외의 할로겐 원자, 히드록시기, 니트로기, 아미노기, 탄소 원자수 1∼6의 알콕시기, 카르복시기, 카복실레이트, 아릴설폰 및 아릴케톤에서 선택되는 적어도 1종의 치환기에 의해서 치환되어 있어도 된다. 단, 폴리아릴렌설피드 수지의 결정화도 및 내열성 등의 관점에서, 미치환의 디요오도 방향족 화합물에 대한 치환된 디요오도 방향족 화합물의 비율은, 바람직하게는 0.0001∼5질량%의 범위이며, 보다 바람직하게는 0.001∼1질량%의 범위이다.The aromatic ring of the diiodo aromatic compound is at least one selected from a phenyl group, a halogen atom other than an iodine atom, a hydroxyl group, a nitro group, an amino group, an alkoxy group having 1 to 6 carbon atoms, a carboxy group, a carboxylate, an arylsulfone, and an arylketone. It may be substituted by the substituent of a species. However, from the viewpoint of crystallinity and heat resistance of the polyarylene sulfide resin, the ratio of the substituted diiodo aromatic compound to the unsubstituted diiodo aromatic compound is preferably in the range of 0.0001 to 5 mass%, and more Preferably it is the range of 0.001-1 mass %.
단체 황은, 황 원자만에 의해서 구성되는 물질(S8, S6, S4, S2 등)을 의미하며, 그 형태는 한정되지 않는다. 구체적으로는, 국방(局方) 의약품으로서 시판되고 있는 단체 황을 사용해도 되고, 범용적으로 입수할 수 있는, S8 및 S6 등을 포함하는 혼합물을 사용해도 된다. 단체 황의 순도도 특히 한정되지 않는다. 단체 황은, 실온(23℃)에서 고체이면, 입형상(粒形狀) 또는 분말상이어도 된다. 단체 황의 입경은, 특히 한정되지 않지만, 바람직하게는 0.001∼10㎜의 범위이며, 보다 바람직하게는 0.01∼5㎜의 범위이고, 더 바람직하게는 0.01∼3㎜의 범위이다.Single sulfur means a substance (S 8 , S 6 , S 4 , S 2 , etc.) composed of only sulfur atoms, and the form is not limited. Specifically, the organization may use the sulfur in the market as a military (局方) drugs may be used a mixture containing a universally available, such as S 8 and S 6. The purity of the simple substance sulfur is not particularly limited, either. As long as simple sulfur is solid at room temperature (23 degreeC), granular form or powder form may be sufficient as it. Although the particle size of single sulfur is not specifically limited, Preferably it is the range of 0.001-10 mm, More preferably, it is the range of 0.01-5 mm, More preferably, it is the range of 0.01-3 mm.
중합금지제는, 폴리아릴렌설피드 수지의 중합 반응에 있어서 당해 중합 반응을 금지 또는 정지하는 화합물이면, 특히 제한 없이 사용할 수 있다. 중합금지제는, 폴리아릴렌설피드 수지의 주쇄의 말단에 히드록시기, 아미노기, 카르복시기 및 카르복시기의 염으로 이루어지는 군에서 선택되는 적어도 1종의 기를 도입할 수 있는 화합물을 함유하는 것이 바람직하다. 즉, 중합금지제로서는, 히드록시기, 아미노기, 카르복시기 및 카르복시기의 염으로 이루어지는 군에서 선택되는 적어도 1종의 기를 1 또는 2 이상 갖는 화합물이 바람직하다. 또한, 중합금지제가 상기 관능기를 갖고 있어도 되고, 중합의 정지 반응 등에 의해서, 상기 관능기를 생성해도 된다.A polymerization inhibitor can be used without a restriction|limiting in particular, as long as it is a compound which inhibits or stops the said polymerization reaction in the polymerization reaction of polyarylene sulfide resin. The polymerization inhibitor preferably contains a compound capable of introducing at least one group selected from the group consisting of a hydroxy group, an amino group, a carboxy group and a salt of a carboxyl group at the terminal of the main chain of the polyarylene sulfide resin. That is, as a polymerization inhibitor, the compound which has 1 or 2 or more of at least 1 sort(s) of group selected from the group which consists of a hydroxy group, an amino group, a carboxy group, and a salt of a carboxy group is preferable. Moreover, the polymerization inhibitor may have the said functional group, and may produce|generate the said functional group by the stop reaction of superposition|polymerization, etc.
히드록시기 또는 아미노기를 갖는 중합금지제로서는, 예를 들면, 하기 식(1) 또는 (2)으로 표시되는 화합물이 중합금지제로서 사용될 수 있다.As the polymerization inhibitor having a hydroxyl group or an amino group, for example, a compound represented by the following formula (1) or (2) can be used as the polymerization inhibitor.
일반식(1)으로 표시되는 화합물에 의하면, 하기 식(1-1)으로 표시되는 1가의 기가 주쇄의 말단기로서 도입된다. 식(1-1) 중의 Y는, 중합금지제에 유래하는 히드록시기, 아미노기 등이다.According to the compound represented by the general formula (1), a monovalent group represented by the following formula (1-1) is introduced as a terminal group of the main chain. Y in Formula (1-1) is a hydroxyl group, an amino group, etc. which originate in a polymerization inhibitor.
일반식(2)으로 표시되는 화합물에 의하면, 하기 식(2-1)으로 표시되는 1가의 기가 주쇄의 말단기로서 도입된다. 일반식(1)으로 표시되는 화합물에 유래하는 히드록시기가, 예를 들면, 식(2) 중의 카르보닐기의 탄소 원자와 황 라디칼과 결합함에 의해 폴리아릴렌설피드 수지 중에 도입될 수 있다.According to the compound represented by the general formula (2), a monovalent group represented by the following formula (2-1) is introduced as a terminal group of the main chain. A hydroxy group derived from the compound represented by the general formula (1) can be introduced into the polyarylene sulfide resin, for example, by bonding with a carbon atom of the carbonyl group in the formula (2) and a sulfur radical.
식(1-1) 또는 (2-1)으로 표시되는 기는, 폴리아릴렌설피드 수지의 주쇄 중에 원료(단체 황)에 유래해 존재하는 디설피드 결합이 용융 온도 하에서 라디칼 개열(開裂)해 발생한 황 라디칼과, 일반식(1)으로 표시되는 화합물 또는 일반식(2)으로 표시되는 화합물이 결합함에 의해서, 폴리아릴렌설피드 수지 중에 도입되는 것으로 생각된다. 이들 특정 구조의 구성 단위의 존재는, 일반식(1) 또는 (2)으로 표시되는 화합물을 사용한 용융 중합에 의해 얻어진 폴리아릴렌설피드 수지에 특징적이다.The group represented by the formula (1-1) or (2-1) is sulfur generated by radical cleavage of a disulfide bond derived from a raw material (single sulfur) in the main chain of the polyarylene sulfide resin under melting temperature. When a radical and the compound represented by General formula (1) or the compound represented by General formula (2) couple|bond together, it is thought that it introduce|transduces in polyarylene sulfide resin. Presence of the structural unit of these specific structures is characteristic of polyarylene sulfide resin obtained by melt polymerization using the compound represented by General formula (1) or (2).
일반식(1)으로 표시되는 화합물로서는, 예를 들면, 2-요오도페놀, 2-아미노아닐린 등을 들 수 있다. 일반식(2)으로 표시되는 화합물로서는, 2-요오도벤조페논을 들 수 있다.As a compound represented by General formula (1), 2-iodophenol, 2-amino aniline, etc. are mentioned, for example. As a compound represented by General formula (2), 2-iodobenzophenone is mentioned.
카르복시기를 갖는 중합금지제로서는, 예를 들면, 하기 일반식(3), (4) 또는 (5)으로 표시되는 화합물에서 선택되는 1종 이상의 화합물이 사용될 수 있다.As the polymerization inhibitor having a carboxyl group, for example, one or more compounds selected from compounds represented by the following general formulas (3), (4) or (5) can be used.
일반식(3) 중, R1 및 R2은 각각 독립적으로, 수소 원자, 또는, 하기 일반식(a), (b) 혹은 (c)으로 표시되는 1가의 기를 나타내며, R1 또는 R2 중 적어도 어느 한쪽은 일반식(a), (b) 또는 (c)으로 표시되는 1가의 기이다. 일반식(4) 중, Z는, 요오드 원자 또는 메르캅토기를 나타내고, R3은, 하기 일반식(a), (b) 또는 (c)으로 표시되는 1가를 나타낸다. 일반식(5) 중, R4은, 일반식(a), (b) 또는 (c)으로 표시되는 1가의 기를 나타낸다.In the general formula (3), R 1 and R 2 each independently represent a hydrogen atom or a monovalent group represented by the following general formulas (a), (b) or (c), and among R 1 or R 2 At least one of them is a monovalent group represented by the general formula (a), (b) or (c). In the general formula (4), Z represents an iodine atom or a mercapto group, and R 3 represents a monovalent value represented by the following general formula (a), (b) or (c). In the general formula (5), R 4 represents a monovalent group represented by the general formula (a), (b) or (c).
일반식(a)∼(c) 중의 X는, 수소 원자 또는 알칼리 금속 원자이지만, 반응성이 양호해지는 점에서 수소 원자가 바람직하다. 알칼리 금속 원자로서는, 나트륨, 리튬, 칼륨, 루비듐, 및 세슘 등을 들 수 있지만, 나트륨이 바람직하다. 일반식(b) 중, R10은 탄소 원자수 1∼6의 알킬기를 나타낸다. 일반식(c) 중, R11은 수소 원자 또는 탄소 원자수 1∼3의 알킬기를 나타내고, R12은 탄소 원자수 1∼5의 알킬기를 나타낸다.Although X in general formulas (a)-(c) is a hydrogen atom or an alkali metal atom, a hydrogen atom is preferable at the point which reactivity becomes favorable. Examples of the alkali metal atom include sodium, lithium, potassium, rubidium, and cesium, but sodium is preferable. In the general formula (b), R 10 represents an alkyl group having 1 to 6 carbon atoms. In the general formula (c), R 11 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and R 12 represents an alkyl group having 1 to 5 carbon atoms.
일반식(3), (4) 또는 (5)으로 표시되는 화합물에 의하면, 하기 식(6) 또는 (7)으로 표시되는 1가의 기가 주쇄의 말단기로서 도입된다. 이들 특정 구조의 말단의 구성 단위의 존재는, 일반식(3), (4) 또는 (5)으로 표시되는 화합물을 사용한 용융 중합에 의해 얻어진 폴리아릴렌설피드 수지에 특징적이다.According to the compound represented by the general formula (3), (4) or (5), a monovalent group represented by the following formula (6) or (7) is introduced as a terminal group of the main chain. Presence of the structural unit at the terminal of these specific structures is characteristic of polyarylene sulfide resin obtained by melt polymerization using the compound represented by General formula (3), (4) or (5).
(식 중, R5은, 일반식(a), (b) 또는 (c)으로 표시되는 1가의 기를 나타낸다)(In the formula, R 5 represents a monovalent group represented by the general formula (a), (b) or (c))
(식 중, R6은, 일반식(a), (b) 또는 (c)으로 표시되는 1가의 기를 나타낸다)(wherein R 6 represents a monovalent group represented by the general formula (a), (b) or (c))
중합금지제로서, 카르복시기 등의 관능기를 갖고 있지 않은 화합물 등을 사용해도 된다. 이러한 화합물로서는, 예를 들면, 디페닐디설피드, 모노요오도벤젠, 티오페놀, 2,2'-디벤조티아졸릴디설피드, 2-메르캅토벤조티아졸, N-시클로헥실-2-벤조티아졸릴설펜아미드, 2-(모르폴리노티오)벤조티아졸 및 N,N'-디시클로헥실-1,3-벤조티아졸-2-설펜아미드에서 선택되는 적어도 1종의 화합물을 사용할 수 있다.As a polymerization inhibitor, you may use the compound etc. which do not have functional groups, such as a carboxy group. Examples of such compounds include diphenyl disulfide, monoiodobenzene, thiophenol, 2,2'-dibenzothiazolyl disulfide, 2-mercaptobenzothiazole, N-cyclohexyl-2-benzothia. At least one compound selected from zolylsulfenamide, 2-(morpholinothio)benzothiazole and N,N'-dicyclohexyl-1,3-benzothiazole-2-sulfenamide can be used.
본 실시형태에 따른 폴리아릴렌설피드 수지는, 디요오도 방향족 화합물과, 단체 황과, 중합금지제와, 필요에 따라서 촉매를 포함하는 혼합물을 가열해서 얻어지는 용융 혼합물 중에서 용융 중합을 행함에 의해 생성한다. 용융 혼합물 중의 디요오도 방향족 화합물의 비율은, 단체 황 1몰에 대해서, 바람직하게는 0.5∼2몰의 범위이며, 보다 바람직하게는 0.8∼1.2몰의 범위이다. 또한, 혼합물 중의 중합금지제의 비율은, 고체 황 1몰에 대해서, 바람직하게는 0.0001∼0.1몰의 범위이며, 보다 바람직하게는 0.0005∼0.05몰의 범위이다.The polyarylene sulfide resin according to the present embodiment is produced by performing melt polymerization in a molten mixture obtained by heating a mixture containing a diiodo aromatic compound, single sulfur, a polymerization inhibitor, and, if necessary, a catalyst. do. The ratio of the diiodo aromatic compound in the molten mixture is preferably in the range of 0.5 to 2 moles, more preferably in the range of 0.8 to 1.2 moles, based on 1 mole of single sulfur. Moreover, to [ the ratio of the polymerization inhibitor in a mixture / 1 mol of solid sulfur ], Preferably it is the range of 0.0001-0.1 mol, More preferably, it is the range of 0.0005-0.05 mol.
중합금지제를 첨가하는 시기는, 특히 제한되지 않지만, 디요오도 방향족 화합물, 단체 황 및 필요에 따라서 첨가되는 촉매를 포함하는 혼합물을 가열해서, 혼합물의 온도가 바람직하게는 200℃∼320℃의 범위, 보다 바람직하게는 250∼320℃의 범위로 된 시점에서 중합금지제를 첨가할 수 있다.The timing of adding the polymerization inhibitor is not particularly limited, but the mixture containing the diiodo aromatic compound, single sulfur and optionally added catalyst is heated so that the temperature of the mixture is preferably 200°C to 320°C. The polymerization inhibitor may be added at a time in the range, more preferably in the range of 250 to 320°C.
용융 혼합물에 니트로 화합물을 촉매로서 첨가해서, 중합 속도를 조절할 수 있다. 이 니트로 화합물로서는, 통상적으로, 각종 니트로벤젠 유도체를 사용할 수 있다. 니트로벤젠 유도체로서는, 예를 들면 1,3-디요오도-4-니트로벤젠, 1-요오도-4-니트로벤젠, 2,6-디요오도-4-니트로페놀 및 2,6-디요오도-4-니트로아민을 들 수 있다. 촉매의 양은, 통상적으로, 촉매로서 첨가되는 양이면 되며, 예를 들면 단체 황 100질량부에 대해서 0.01∼20질량부의 범위인 것이 바람직하다.The rate of polymerization can be controlled by adding a nitro compound as a catalyst to the molten mixture. As this nitro compound, various nitrobenzene derivatives can be used normally. As the nitrobenzene derivative, for example, 1,3-diiodo-4-nitrobenzene, 1-iodo-4-nitrobenzene, 2,6-diiodo-4-nitrophenol and 2,6-diio do-4-nitroamine. The quantity of a catalyst may just be the quantity normally added as a catalyst, For example, it is preferable that it is the range of 0.01-20 mass parts with respect to 100 mass parts of single-piece sulfur.
용융 중합의 조건은, 중합 반응이 적절히 진행하도록, 적의(適宜) 조정된다. 용융 중합의 온도는, 바람직하게는, 175℃ 이상, 생성하는 폴리아릴렌설피드 수지의 융점 +100℃ 이하의 범위, 보다 바람직하게는 180∼350℃의 범위이다. 용융 중합은, 절대압이 바람직하게는 1[cPa]∼100[㎪]의 범위, 보다 바람직하게는 13[cPa]∼60[㎪]의 범위에서 행해진다. 용융 중합의 조건은, 일정할 필요는 없다. 예를 들면, 중합 초기는 온도를 바람직하게는 175∼270℃의 범위, 보다 바람직하게는 180∼250℃의 범위로 하며, 또한, 절대압을 6.7∼100[㎪]의 범위로 하고, 그 후, 연속적으로 또는 계단상으로 승온 및 감압시키면서 중합을 행하며, 중합 후기는, 온도를 바람직하게는 270℃ 이상, 생성하는 폴리아릴렌설피드 수지의 융점 +100℃ 이하의 범위, 보다 바람직하게는 300∼350℃의 범위로 하며, 또한, 절대압을 1[cPa]∼6[㎪]의 범위로 해서 중합을 행할 수 있다. 본 명세서에 있어서, 수지의 융점은, 시차 주사 열량계(퍼킨엘머제 DSC 장치 Pyris Diamond)를 사용해서 JIS K 7121에 준거해 측정되는 값을 의미한다.The conditions of melt polymerization are suitably adjusted so that a polymerization reaction may advance suitably. The temperature of melt polymerization is preferably in the range of 175°C or higher, the melting point of the polyarylene sulfide resin to be produced +100°C or less, and more preferably in the range of 180 to 350°C. The melt polymerization is preferably carried out in an absolute pressure range of 1 [cPa] to 100 [kPa], more preferably 13 [cPa] to 60 [kPa]. The conditions of melt polymerization do not need to be constant. For example, in the initial stage of polymerization, the temperature is preferably in the range of 175 to 270°C, more preferably in the range of 180 to 250°C, and the absolute pressure is in the range of 6.7 to 100 [kPa], and thereafter, Polymerization is carried out continuously or stepwise while raising and lowering the temperature, and in the latter stage of polymerization, the temperature is preferably in the range of 270° C. or higher, and the melting point of the polyarylene sulfide resin to be produced is in the range of +100° C. or less, more preferably 300 to 350 The polymerization can be carried out in the range of deg. C and the absolute pressure in the range of 1 [cPa] to 6 [kPa]. In this specification, melting|fusing point of resin means the value measured based on JISK7121 using a differential scanning calorimeter (DSC apparatus Pyris Diamond manufactured by Perkin Elmer).
용융 중합은, 산화 가교 반응을 방지하면서, 높은 중합도를 얻는 관점에서, 바람직하게는, 비산화성 분위기 하에서 행한다. 비산화성 분위기에 있어서, 기상(氣相)의 산소 농도는 바람직하게는 5체적% 미만의 범위, 보다 바람직하게는 2체적% 미만의 범위이며, 더 바람직하게는 기상이 산소를 실질적으로 함유하지 않는다. 비산화성 분위기는, 바람직하게는, 질소, 헬륨 및 아르곤 등의 불활성 가스 분위기이다.Melt polymerization is preferably performed in a non-oxidizing atmosphere from the viewpoint of obtaining a high degree of polymerization while preventing an oxidative crosslinking reaction. In a non-oxidizing atmosphere, the oxygen concentration of the gas phase is preferably in the range of less than 5% by volume, more preferably in the range of less than 2% by volume, and even more preferably the gas phase is substantially free of oxygen. . The non-oxidizing atmosphere is preferably an inert gas atmosphere such as nitrogen, helium and argon.
용융 중합은, 예를 들면, 가열 장치, 감압 장치 및 교반 장치를 구비하는 용융 혼련기를 사용해서 행할 수 있다. 용융 혼련기로서는, 예를 들면, 밴버리 믹서, 니더, 연속 혼련기, 단축(單軸) 압출기 및 2축 압출기를 들 수 있다.Melt polymerization can be performed using, for example, a melt-kneader equipped with a heating device, a pressure reducing device, and a stirring device. As a melt-kneader, a Banbury mixer, a kneader, a continuous kneader, a single screw extruder, and a twin screw extruder are mentioned, for example.
용융 중합을 위한 용융 혼합물은, 용매를 실질적으로 함유하지 않는 것이 바람직하다. 보다 구체적으로는, 용융 혼합물에 함유되는 용매의 양이, 디요오도 방향족 화합물과, 단체 황과, 중합금지제와, 필요에 따라서 촉매와의 합계 100질량부에 대해서, 바람직하게는 10질량부 이하의 범위, 보다 바람직하게는 5질량부 이하의 범위, 더 바람직하게는 1질량부 이하의 범위이다. 용매의 양은, 0질량부 이상, 0.01질량부 이상의 범위, 또는 0.1질량부 이상의 범위여도 된다.It is preferable that the molten mixture for melt polymerization contains substantially no solvent. More specifically, the amount of the solvent contained in the molten mixture is preferably 10 parts by mass relative to 100 parts by mass in total of the diiodo aromatic compound, single sulfur, a polymerization inhibitor, and, if necessary, the catalyst. The following range, More preferably, it is the range of 5 mass parts or less, More preferably, it is the range of 1 mass part or less. The amount of the solvent may be 0 parts by mass or more, 0.01 parts by mass or more, or 0.1 parts by mass or more.
용융 중합 후의 용융 혼합물(반응 생성물)을 냉각해서 고체 상태의 혼합물을 얻은 후, 감압 하, 또는 비산화성 분위기의 대기압 하에서, 혼합물을 가열해 중합 반응을 더 진행시켜도 된다. 이것에 의해 분자량을 더 증대시킬 수 있을 뿐만 아니라, 생성한 요오드 분자가 승화되어 제거되기 때문에, 폴리아릴렌설피드 수지 중의 요오드 원자 농도를 낮게 억제할 수 있다. 바람직하게는 100∼260℃의 범위, 보다 바람직하게는 130∼250℃의 범위, 더 바람직하게는 150∼230℃의 범위의 온도까지 냉각함으로써, 고체 상태의 혼합물을 얻을 수 있다. 고체 상태에의 냉각 후의 가열은, 용융 중합과 마찬가지의 온도 및 압력 조건 하에서 행할 수 있다.After the molten mixture (reaction product) after melt polymerization is cooled to obtain a mixture in a solid state, the polymerization reaction may be further advanced by heating the mixture under reduced pressure or under atmospheric pressure in a non-oxidizing atmosphere. Thereby, not only can molecular weight be increased further, but since the produced|generated iodine molecule|numerator is sublimed and removed, the iodine atom density|concentration in polyarylene sulfide resin can be suppressed low. By cooling to a temperature preferably in the range of 100 to 260° C., more preferably in the range of 130 to 250° C., and still more preferably in the range of 150 to 230° C., a mixture in a solid state can be obtained. Heating after cooling to a solid state can be performed under the temperature and pressure conditions similar to melt polymerization.
용융 중합 공정에 의해 얻어진 폴리아릴렌설피드 수지를 함유하는 반응 생성물은, 그대로 직접, 용융 혼련기에 투입하는 등의 방법에 의해 수지 조성물을 제조할 수도 있지만, 당해 반응 생성물에 당해 반응 생성물이 용해하는 용매를 가해서 용해물을 조제하고, 당해 용해물의 상태에서 반응 장치로부터 반응 생성물을 취출하는 것이, 생산성이 우수할 뿐만 아니라 반응성도 더 양호해지기 때문에 바람직하다. 당해 반응 생성물이 용해하는 용매의 첨가는, 용융 중합 후에 행하는 것이 바람직하지만, 용융 중합의 반응 후기에 행해도 되며, 또한, 상기한 바와 같이 용융 혼합물(반응 생성물)을 냉각해서 고체 상태의 혼합물을 얻은 후, 가압 하, 감압 하, 또는 비산화성 분위기의 대기압 하에서, 혼합물을 가열해 중합 반응을 더 진행시킨 후여도 된다. 당해 용해물을 조제하는 공정은, 비산화성 분위기 하에서 행해도 된다. 또한, 가열 용해의 온도로서는, 상기 반응 생성물이 용해하는 용매의 융점 이상의 범위이면 되며, 바람직하게는 200∼350℃의 범위, 보다 바람직하게는 210∼250℃의 범위이고, 가압 하에서 행하는 것이 바람직하다.Although the reaction product containing the polyarylene sulfide resin obtained by the melt polymerization process can be directly put into a melt-kneader as it is, the resin composition can be produced, but the solvent in which the reaction product dissolves in the reaction product. It is preferable to prepare a lysate by adding , and to take out the reaction product from the reaction apparatus in the state of the lysate, because not only the productivity is excellent but also the reactivity is further improved. The addition of the solvent in which the reaction product dissolves is preferably carried out after melt polymerization, but may be carried out later in the reaction of melt polymerization, and as described above, by cooling the molten mixture (reaction product) to obtain a solid mixture After that, the polymerization reaction may be further advanced by heating the mixture under pressure, under reduced pressure, or under atmospheric pressure in a non-oxidizing atmosphere. You may perform the process of preparing the said melt in a non-oxidizing atmosphere. In addition, the temperature of heat dissolution may be in the range above the melting point of the solvent in which the reaction product dissolves, preferably in the range of 200 to 350°C, more preferably in the range of 210 to 250°C, and it is preferable to carry out under pressure. .
상기 용해물을 조제하기 위하여 사용하는, 상기 반응 생성물이 용해하는 용매의 배합 비율은, 폴리아릴렌설피드 수지를 함유하는 반응 생성물 100질량부에 대해서, 바람직하게는 90∼1000질량부의 범위, 보다 바람직하게는 200∼400질량부의 범위이다.The blending ratio of the solvent in which the reaction product dissolves, which is used to prepare the melt, is preferably in the range of 90 to 1000 parts by mass, more preferably in the range of 100 parts by mass of the reaction product containing polyarylene sulfide resin. It is preferably in the range of 200 to 400 parts by mass.
반응 생성물이 용해하는 용매로서는, 예를 들면, 필립스법 등의 용액 중합에 있어서 중합 반응 용매로서 사용되는 용매를 사용할 수 있다. 바람직한 용매의 예로서는, N-메틸-2-피롤리돈(이하, NMP로 약기), N-시클로헥실-2-피롤리돈, 2-피롤리돈, 1,3-디메틸-2-이미다졸리디논산, ε-카프로락탐, N-메틸-ε-카프로락탐 등의 지방족 환상 아미드 화합물, 헥사메틸인산트리아미드(HMPA), 테트라메틸요소(TMU), 디메틸포름아미드(DMF), 및 디메틸아세트아미드(DMA) 등의 아미드 화합물, 폴리에틸렌글리콜디알킬에테르(중합도는 2000 이하이며, 탄소 원자수 1∼20의 알킬기를 갖는 것) 등의 에테르화 폴리에틸렌글리콜 화합물, 그리고, 테트라메틸렌설폭시드, 및 디메틸설폭시드(DMSO) 등의 설폭시드 화합물을 들 수 있다. 그 밖의 사용 가능한 용매의 예로서, 벤조페논, 디페닐에테르, 디페닐설피드, 4,4'-디브로모비페닐, 1-페닐나프탈렌, 2,5-디페닐-1,3,4-옥사디아졸, 2,5-디페닐옥사졸, 트리페닐메탄올, N,N-디페닐포름아미드, 벤질, 안트라센, 4-벤조일비페닐, 디벤조일메탄, 2-비페닐카르복시산, 디벤조티오펜, 펜타클로로페놀, 1-벤질-2-피롤리디온, 9-플루오레논, 2-벤조일나프탈렌, 1-브로모나프탈렌, 1,3-디페녹시벤젠, 플루오렌, 1-페닐-2-피롤리디논, 1-메톡시나프탈렌, 1-에톡시나프탈렌, 1,3-디페닐아세톤, 1,4-디벤조일부탄, 페난트렌, 4-벤조일비페닐, 1,1-디페닐아세톤, o,o'-비페놀, 2,6-디페닐페놀, 트리페닐렌, 2-페닐페놀, 티안트렌, 3-페녹시벤질알코올, 4-페닐페놀, 9,10-디클로로안트라센, 트리페닐메탄, 4,4'-디메톡시벤조페논, 9,10-디페닐안트라센, 플루오란텐, 디페닐프탈레이트, 디페닐카르보네이트, 2,6-디메톡시나프탈렌, 2,7-디메톡시나프탈렌, 4-브로모디페닐에테르, 피렌, 9,9'-비-플루오렌, 4,4'-이소프로필리덴-디페놀, ε-카프로락탐, N-시클로헥실-2-피롤리돈, 디페닐이소프탈레이트, 디페닐테레프탈레이트 및 1-클로로나프탈렌으로 이루어지는 군에서 선택되는 1종 이상의 용매를 들 수 있다.As a solvent in which the reaction product dissolves, for example, a solvent used as a polymerization reaction solvent in solution polymerization such as the Phillips method can be used. Examples of preferred solvents include N-methyl-2-pyrrolidone (hereinafter abbreviated as NMP), N-cyclohexyl-2-pyrrolidone, 2-pyrrolidone, 1,3-dimethyl-2-imidazolidone Aliphatic cyclic amide compounds such as dinoic acid, ε-caprolactam, N-methyl-ε-caprolactam, hexamethyl phosphate triamide (HMPA), tetramethylurea (TMU), dimethylformamide (DMF), and dimethylacetamide Amide compounds such as (DMA), etherified polyethylene glycol compounds such as polyethylene glycol dialkyl ether (which has a degree of polymerization of 2000 or less and an alkyl group having 1 to 20 carbon atoms), and tetramethylene sulfoxide, and dimethyl sulfoxide Sulfoxide compounds, such as seed (DMSO), are mentioned. Examples of other usable solvents include benzophenone, diphenyl ether, diphenyl sulfide, 4,4'-dibromobiphenyl, 1-phenylnaphthalene, 2,5-diphenyl-1,3,4-oxa Diazole, 2,5-diphenyloxazole, triphenylmethanol, N,N-diphenylformamide, benzyl, anthracene, 4-benzoylbiphenyl, dibenzoylmethane, 2-biphenylcarboxylic acid, dibenzothiophene, Pentachlorophenol, 1-benzyl-2-pyrrolidione, 9-fluorenone, 2-benzoylnaphthalene, 1-bromonaphthalene, 1,3-diphenoxybenzene, fluorene, 1-phenyl-2-pyrrol Dinone, 1-methoxynaphthalene, 1-ethoxynaphthalene, 1,3-diphenylacetone, 1,4-dibenzoylbutane, phenanthrene, 4-benzoylbiphenyl, 1,1-diphenylacetone, o,o '-Biphenol, 2,6-diphenylphenol, triphenylene, 2-phenylphenol, thianthrene, 3-phenoxybenzyl alcohol, 4-phenylphenol, 9,10-dichloroanthracene, triphenylmethane, 4, 4'-dimethoxybenzophenone, 9,10-diphenylanthracene, fluoranthene, diphenylphthalate, diphenylcarbonate, 2,6-dimethoxynaphthalene, 2,7-dimethoxynaphthalene, 4-bromodi Phenyl ether, pyrene, 9,9'-bi-fluorene, 4,4'-isopropylidene-diphenol, ε-caprolactam, N-cyclohexyl-2-pyrrolidone, diphenylisophthalate, diphenyl and at least one solvent selected from the group consisting of terephthalate and 1-chloronaphthalene.
반응 장치로부터 취출된 당해 용해물은, 후처리를 행한 후, 상기 다른 성분과 용융 혼련해서 수지 조성물을 조제하는 것이, 반응성이 보다 양호해지기 때문에 바람직하다. 용해물의 후처리의 방법으로서는, 특히 제한되는 것은 아니지만, 예를 들면, 이하의 방법을 들 수 있다.Since the reactivity becomes more favorable, it is preferable to melt-knead the said melt|dissolved material taken out from the reaction apparatus after performing a post-process and to prepare a resin composition with the said other component. Although it does not restrict|limit especially as a method of post-processing of a lysate, For example, the following method is mentioned.
(1) 당해 용해물을, 그대로, 또는 산 혹은 염기를 가한 후, 감압 하 또는 상압 하에서 용매를 증류 제거하고, 다음으로 용매 증류 제거 후의 고형물을 물, 당해 용해물에 사용한 용매(또는 저분자 폴리머에 대해서 동등한 용해도를 갖는 유기 용매), 아세톤, 메틸에틸케톤 및 알코올류 등에서 선택되는 용매로 1회 또는 2회 이상 세정하고, 추가로 중화, 수세, 여과 및 건조하는 방법.(1) The lysate as it is or after adding an acid or base, the solvent is distilled off under reduced pressure or under normal pressure, and then the solid after solvent distillation is mixed with water and the solvent used for the lysate (or to a low molecular weight polymer). A method of washing once or twice or more with a solvent selected from the group consisting of organic solvents having an equivalent solubility in the case of an organic solvent), acetone, methyl ethyl ketone and alcohols, and further neutralizing, washing with water, filtration and drying.
(2) 당해 용해물에 물, 아세톤, 메틸에틸케톤, 알코올, 에테르, 할로겐화탄화수소, 방향족 탄화수소 및 지방족 탄화수소 등의 용매(당해 용해물의 용매에 가용(可溶)이며, 또한 적어도 폴리아릴렌설피드 수지에 대해서는 빈용매(貧溶媒)인 용매)를 침강제로서 첨가해서, 폴리아릴렌설피드 수지 및 무기염 등을 포함하는 고체상 생성물을 침강시키고, 고체상 생성물을 여과 분별, 세정 및 건조하는 방법.(2) Solvents such as water, acetone, methyl ethyl ketone, alcohol, ether, halogenated hydrocarbons, aromatic hydrocarbons and aliphatic hydrocarbons in the lysate (soluble in the solvent of the lysate, and at least polyarylene sulfide A method of adding a poor solvent (a solvent that is a poor solvent) as a precipitating agent to the resin to precipitate a solid product containing a polyarylene sulfide resin and an inorganic salt, and filtering, separating, washing and drying the solid product.
(3) 당해 용해물에, 당해 용해물에 사용한 용매(또는 저분자 폴리머에 대해서 동등한 용해도를 갖는 유기 용매)를 가해서 교반한 후, 여과해서 저분자량 중합체를 제거한 후, 물, 아세톤, 메틸에틸케톤 및 알코올 등에서 선택되는 용매로 1회 또는 2회 이상 세정하고, 그 후 중화, 수세, 여과 및 건조를 하는 방법.(3) To the lysate, the solvent used in the lysate (or an organic solvent having an equivalent solubility to the low molecular weight polymer) is added and stirred, filtered to remove the low molecular weight polymer, and then water, acetone, methyl ethyl ketone and A method of washing once or twice or more with a solvent selected from alcohol or the like, followed by neutralization, washing with water, filtration and drying.
또, 상기 (1)∼(3)에 예시한 바와 같은 후처리 방법에 있어서, 폴리아릴렌설피드 수지의 건조는 진공 중에서 행해도 되고, 공기 중 또는 질소와 같은 불활성 가스 분위기 중에서 행해도 된다. 산소 농도가 5∼30체적%인 범위의 산화성 분위기 중 또는 감압 조건 하에서 열처리를 행해, 폴리아릴렌설피드 수지를 산화 가교시킬 수도 있다.Moreover, in the post-processing method as illustrated in said (1)-(3), drying of polyarylene sulfide resin may be performed in vacuum, and may be performed in air or in an inert gas atmosphere like nitrogen. It is also possible to oxidatively crosslink polyarylene sulfide resin by performing heat treatment in an oxidizing atmosphere in an oxygen concentration of 5 to 30% by volume or under reduced pressure conditions.
폴리아릴렌설피드 수지가 용융 중합에 의해 생성하는 반응을, 이하에 예시한다.The reaction which polyarylene sulfide resin produces|generates by melt polymerization is illustrated below.
반응식(1)∼(5)은, 예를 들면 일반식(a), (b) 또는 (c)으로 표시되는 기를 포함하는 치환기R을 갖는 디페닐디설피드를 중합금지제로서 사용했을 경우의, 폴리페닐렌설피드가 생성하는 반응의 예이다. 반응식(1)은, 중합금지제 중의 -S-S- 결합이, 용융 온도 하에서 라디칼 개열하는 반응이다. 반응식(2)은, 반응식(1)으로 발생한 황 라디칼이 성장 중인 주쇄의 말단 요오드 원자의 인접 탄소 원자를 공격해, 요오드 원자가 탈리함으로써, 중합이 정지함과 함께, 주쇄의 말단에 치환기R이 도입되는 반응이다. 반응식(3)은, 폴리아릴렌설피드 수지의 주쇄 중에 원료(단체 황)에 유래해 존재하는 디설피드 결합이 용융 온도 하에서 라디칼 개열하는 반응이다. 반응식(4)은, 반응식(3)으로 발생한 황 라디칼과, 반응식(1)으로 발생한 황 라디칼과의 재결합에 의해서, 중합이 정지함과 함께, 치환기R이 주쇄의 말단에 도입되는 반응이다. 탈리한 요오드 원자는 유리(遊離) 상태(요오드 라디칼)에 있거나, 또는, 반응식(5)과 같이 요오드 라디칼끼리가 재결합함으로써, 요오드 분자가 생성한다.Reaction formulas (1) to (5) are, for example, when diphenyldisulfide having a substituent R containing a group represented by the general formulas (a), (b) or (c) is used as a polymerization inhibitor, This is an example of a reaction produced by polyphenylene sulfide. Reaction formula (1) is a reaction in which -S-S- bond in a polymerization inhibitor radically cleaves under melting temperature. In Reaction Formula (2), the sulfur radical generated in Reaction Formula (1) attacks a carbon atom adjacent to the terminal iodine atom of the growing main chain, and the iodine atom is released, so that polymerization is stopped, and a substituent R is introduced at the end of the main chain is a reaction Reaction formula (3) is a reaction in which the disulfide bond which originates in a raw material (single sulfur) and exists in the main chain of polyarylene sulfide resin radically cleaves under a melting temperature. Reaction formula (4) is a reaction in which polymerization is stopped and a substituent R is introduced into the terminal of the main chain by recombination between the sulfur radical generated in the reaction formula (3) and the sulfur radical generated in the reaction formula (1). The detached iodine atom is in a free state (iodine radical), or when iodine radicals recombine as shown in Reaction Formula (5), iodine molecules are formed.
용융 중합에 의해 얻어지는 폴리아릴렌설피드 수지를 함유하는 반응 생성물은, 원료에 유래하는 요오드 원자를 함유한다. 그 때문에, 폴리아릴렌설피드 수지는, 통상적으로, 요오드 원자를 포함하는 혼합물의 상태로, 방사용 수지 조성물의 조제 등을 위하여 사용된다. 당해 혼합물에 있어서의 요오드 원자의 농도는, 예를 들면, 폴리아릴렌설피드 수지에 대해서 0.01∼10000ppm의 범위이며, 바람직하게는 10∼5000ppm의 범위이다. 요오드 분자의 승화성을 이용해서, 요오드 원자 농도를 낮게 억제하는 것도 가능하며, 그 경우에는, 900ppm 이하의 범위, 바람직하게는 100ppm 이하의 범위, 또한 10ppm 이하의 범위로 하는 것도 가능하다. 요오드 원자를 검출 한계 이하로 더 제거하는 것도 가능하지만, 생산성을 생각하면 실용적이지는 않다. 검출 한계는, 예를 들면 0.01ppm 정도이다. 용융 중합에 의해 얻어지는 본 실시형태의 폴리아릴렌설피드 수지 또는 이를 함유하는 반응 생성물은, 요오드 원자를 함유하고 있는 점에서, 예를 들면, 필립스법 등의 디클로로 방향족 화합물의 유기 극성 용매 중에서의 용액 중합법에 의해 얻어진 폴리아릴렌설피드와 명확히 구별될 수 있다.The reaction product containing polyarylene sulfide resin obtained by melt polymerization contains the iodine atom derived from a raw material. Therefore, polyarylene sulfide resin is the state of the mixture containing an iodine atom normally, and is used for preparation of the resin composition for spinning, etc. The density|concentration of the iodine atom in the said mixture is the range of 0.01-10000 ppm with respect to polyarylene sulfide resin, for example, Preferably it is the range of 10-5000 ppm. It is also possible to suppress the iodine atom concentration to a low level by using the sublimation property of the iodine molecules. It is also possible to further remove iodine atoms below the detection limit, but it is not practical in view of productivity. The detection limit is, for example, about 0.01 ppm. Since the polyarylene sulfide resin of the present embodiment obtained by melt polymerization or the reaction product containing the same contains an iodine atom, for example, solution polymerization of a dichloro aromatic compound such as the Phillips method in an organic polar solvent. It can be clearly distinguished from the polyarylene sulfide obtained by the method.
상기 반응식으로부터도 이해되는 바와 같이, 용융 중합에 의해 얻어지는 폴리아릴렌설피드 수지는, 디요오도 방향족 화합물에 유래하는 방향족 환 및 이것에 직접 결합한 황 원자로 이루어지는 아릴렌설피드 단위로 주로 구성되는 주쇄와, 당해 주쇄의 말단에 결합한 소정의 치환기R을 함유한다. 소정의 치환기R은, 주쇄의 말단의 방향족 환에, 직접, 또는 중합금지제에 유래하는 부분 구조를 통해서 결합해 있다.As is also understood from the above reaction formula, the polyarylene sulfide resin obtained by melt polymerization is a main chain mainly composed of an arylene sulfide unit consisting of an aromatic ring derived from a diiodo aromatic compound and a sulfur atom directly bonded thereto; It contains a predetermined substituent R bonded to the terminal of the main chain. The predetermined substituent R is bonded to the aromatic ring at the terminal of the main chain directly or through a partial structure derived from a polymerization inhibitor.
일 실시형태에 따른 폴리아릴렌설피드 수지로서의 폴리페닐렌설피드 수지는, 예를 들면, 하기 일반식(10) : The polyphenylene sulfide resin as the polyarylene sulfide resin according to one embodiment is, for example, the following general formula (10):
으로 표시되는 반복 단위(아릴렌설피드 단위)를 포함하는 주쇄를 갖는다. 식(10)으로 표시되는 반복 단위는, 파라 위치에서 결합하는 하기 식(10a) : It has a main chain including a repeating unit (arylene sulfide unit) represented by The repeating unit represented by formula (10) has the following formula (10a) bonded at the para position:
으로 표시되는 반복 단위, 및, 메타 위치에서 결합하는 하기 식(10b) : A repeating unit represented by, and the following formula (10b) coupled at a meta position:
으로 표시되는 반복 단위인 것이 보다 바람직하다. 이들 중에서도, 식(10a)으로 표시되는 파라 위치에서 결합한 반복 단위가, 수지의 내열성 및 결정성의 면에서 바람직하다.It is more preferable that it is a repeating unit represented by Among these, the repeating unit couple|bonded at the para position represented by Formula (10a) is preferable from the point of heat resistance and crystallinity of resin.
일 실시형태에 따른 폴리페닐렌설피드 수지는, 하기 일반식(11) :Polyphenylene sulfide resin according to one embodiment, the following general formula (11):
(식 중, R20 및 R21은, 각각 독립적으로 수소 원자, 탄소 원자수 1∼4의 알킬기, 니트로기, 아미노기, 페닐기, 메톡시기, 또는 에톡시기를 나타낸다)(Wherein, R 20 and R 21 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a nitro group, an amino group, a phenyl group, a methoxy group, or an ethoxy group)
으로 표시되는, 방향족 환에 결합한 측쇄로서의 치환기를 갖는 반복 단위를 포함할 수 있다. 단, 결정화도 및 내열성의 저하의 관점에서, 폴리페닐렌설피드 수지는, 일반식(11)의 반복 단위를 실질적으로 포함하지 않는 것이 바람직하다. 보다 구체적으로는, 식(11)으로 표시되는 반복 단위의 비율은, 식(10)으로 표시되는 반복 단위와 식(11)으로 표시되는 반복 단위와의 합계에 대해서, 바람직하게는 2질량% 이하, 보다 바람직하게는 0.2질량% 이하이다.It may include a repeating unit having a substituent as a side chain bonded to the aromatic ring represented by . However, it is preferable that polyphenylene sulfide resin does not contain the repeating unit of General formula (11) substantially from a viewpoint of the fall of crystallinity and heat resistance. More specifically, the proportion of the repeating unit represented by the formula (11) is preferably 2% by mass or less with respect to the total of the repeating unit represented by the formula (10) and the repeating unit represented by the formula (11). , More preferably, it is 0.2 mass % or less.
본 실시형태의 폴리아릴렌설피드 수지는, 상기 아릴렌설피드 단위로 주로 구성되지만, 통상적으로, 원료의 단체 황에 유래하는, 하기 식(20) :Although the polyarylene sulfide resin of this embodiment is mainly comprised by the said arylene sulfide unit, the following formula (20) derived from the single-piece sulfur of a raw material normally:
으로 표시되는 디설피드 결합에 따른 구성 단위도 주쇄 중에 포함한다. 내열성, 기계적 강도의 점에서, 식(20)으로 표시되는 구성 단위의 비율은, 아릴렌설피드 단위와, 식(20)으로 표시되는 구성 부위와의 합계에 대해서, 바람직하게는 2.9질량% 이하의 범위, 보다 바람직하게는 1.2질량% 이하의 범위이다.A structural unit according to a disulfide bond represented by is also included in the main chain. From the viewpoint of heat resistance and mechanical strength, the proportion of the structural unit represented by the formula (20) is preferably 2.9% by mass or less with respect to the total of the arylene sulfide unit and the structural site represented by the formula (20). range, more preferably 1.2 mass % or less.
본 실시형태에 따른 폴리아릴렌설피드 수지의 Mw/Mtop는, 바람직하게는 0.80∼1.70의 범위이며, 보다 바람직하게는 0.90∼1.30의 범위이다. Mw/Mtop를 이러한 범위로 함으로써, 폴리아릴렌설피드 수지의 가공성을 향상시킬 수 있어, 양호한 캐비티 밸런스를 부여할 수 있다. 본 명세서에 있어서, Mw는 겔침투 크로마토그래피에 의해 측정되는 중량 평균 분자량을 나타내고, Mtop는 같은 측정에 의해 얻어지는 크로마토그램의 검출 강도가 최대로 되는 점의 평균 분자량(피크 분자량)을 나타낸다. Mw/Mtop는, 측정 대상의 분자량의 분포를 나타내며, 통상적으로, 이 값이 1에 가까우면 분자량의 분포가 좁은 것을 나타내고, 이 값이 커짐에 따라서, 분자량의 분포가 넓은 것을 나타낸다. 또, 겔침투 크로마토그래피의 측정 조건은, 본 명세서의 실시예와 동일한 측정 조건으로 한다. 단, Mw, Mw/Mtop의 값에 실질적인 영향을 미치지 않는 범위에서, 측정 조건을 변경하는 것은 가능하다.Mw/Mtop of polyarylene sulfide resin which concerns on this embodiment becomes like this. Preferably it is the range of 0.80-1.70, More preferably, it is the range of 0.90-1.30. By making Mw/Mtop into such a range, the workability of polyarylene sulfide resin can be improved and favorable cavity balance can be provided. In this specification, Mw represents the weight average molecular weight measured by gel permeation chromatography, and Mtop represents the average molecular weight (peak molecular weight) of the point at which the detection intensity of the chromatogram obtained by the same measurement becomes maximum. Mw/Mtop represents the distribution of the molecular weight of the measurement target, and usually, when this value is close to 1, it indicates that the distribution of molecular weight is narrow, and as this value increases, it indicates that the distribution of molecular weight is wide. In addition, the measurement conditions of gel permeation chromatography are set as the measurement conditions similar to the Example of this specification. However, it is possible to change the measurement conditions within a range that does not substantially affect the values of Mw and Mw/Mtop.
본 실시형태에 따른 폴리아릴렌설피드 수지의 중량 평균 분자량은, 본 발명의 효과를 손상시키지 않으면 특히 한정되는 것은 아니지만, 그 하한은, 기계적 강도가 우수한 점에서 28,000 이상인 것이 바람직하며, 30,000 이상의 범위인 것이 보다 더 바람직하다. 한편, 상한은, 보다 양호한 캐비티 밸런스를 부여할 수 있는 점에서 100,000 이하의 범위인 것이 바람직하며, 60,000 이하의 범위인 것이 보다 더 바람직하고, 추가로 55,000 이하의 범위인 것이 가장 바람직하다. 추가로, 기계적 강도가 우수하면서, 또한, 양호한 캐비티 밸런스를 부여할 수 있는 관점에서, 28,000∼60,000의 범위의 폴리아릴렌설피드 수지, 보다 바람직하게는 30,000∼55,000의 범위의 폴리아릴렌설피드 수지와 함께, 중량 평균 분자량이 60,000 초과 100,000 이하의 범위에 있는 폴리아릴렌설피드 수지를 사용해도 된다.The weight average molecular weight of the polyarylene sulfide resin according to the present embodiment is not particularly limited as long as the effects of the present invention are not impaired, but the lower limit thereof is preferably 28,000 or more in terms of excellent mechanical strength, and is in the range of 30,000 or more. more preferably. On the other hand, the upper limit is preferably in the range of 100,000 or less, more preferably in the range of 60,000 or less, and most preferably in the range of 55,000 or less in terms of providing better cavity balance. Furthermore, from the viewpoint of being excellent in mechanical strength and providing good cavity balance, a polyarylene sulfide resin in the range of 28,000 to 60,000, more preferably a polyarylene sulfide resin in the range of 30,000 to 55,000; Together, the weight average molecular weight may use polyarylene sulfide resin in the range of more than 60,000 and 100,000 or less.
폴리아릴렌설피드 수지의 비뉴토니언 지수는, 바람직하게는 0.95∼1.75의 범위이며, 보다 바람직하게는 1.00∼1.70의 범위이다. 비뉴토니언 지수를 이러한 범위로 함으로써, 폴리아릴렌설피드 수지의 가공성을 향상시킬 수 있으며, 양호한 캐비티 밸런스를 부여할 수 있다. 본 명세서에 있어서, 비뉴토니언 지수는 온도 300℃의 조건 하에 있어서의 전단 속도와 전단 응력과의 하기 관계식을 만족시키는 지수를 말한다. 비뉴토니언 지수는, 측정 대상의 분자량, 또는 직쇄, 분기, 가교와 같은 분자 구조에 관한 지표로 될 수 있다. 통상적으로, 이 값이 1에 가까우면 수지의 분자 구조가 직쇄상인 것을 나타내고, 이 값이 커짐에 따라서, 분기나 가교 구조가 많이 포함되는 것을 나타낸다.The non-Newtonian index of the polyarylene sulfide resin is preferably in the range of 0.95 to 1.75, more preferably in the range of 1.00 to 1.70. By making the non-Newtonian index into such a range, the workability of polyarylene sulfide resin can be improved, and favorable cavity balance can be provided. In the present specification, the non-Newtonian index refers to an index that satisfies the following relational expression between the shear rate and the shear stress under the condition of a temperature of 300°C. The non-Newtonian index may be an index relating to the molecular weight of a measurement target or a molecular structure such as linear, branched, or crosslinked. Usually, when this value is close to 1, it shows that the molecular structure of resin is linear, and as this value becomes large, it shows that many branched and crosslinked structures are contained.
D=α×Sn D=α×S n
(상기 식 중, D는 전단 속도를 나타내고, S는 전단 응력을 나타내고, α는 상수를 나타내고, n은 비뉴토니언 지수를 나타낸다)(Wherein, D represents the shear rate, S represents the shear stress, α represents the constant, and n represents the non-Newtonian index)
상술한 특정 범위의 Mw/Mtop 및 비뉴토니언 지수를 갖는 폴리아릴렌설피드 수지는, 예를 들면, 디요오도 방향족 화합물과, 단체 황과, 중합금지제를, 디요오도 방향족 화합물, 단체 황 및 중합금지제를 함유하는 용융 혼합물 중에서 반응(용액 중합)시키는 방법에 있어서, 이러한 폴리아릴렌설피드 수지를 어느 정도 고분자량화시킴에 의해 얻는 것이 가능하다.Polyarylene sulfide resin having Mw/Mtop and non-Newtonian index in the specific range described above is, for example, a diiodo aromatic compound, a single sulfur, a polymerization inhibitor, a diiodo aromatic compound, a single sulfur And in the method of reacting (solution polymerization) in a molten mixture containing a polymerization inhibitor, it is possible to obtain by making this polyarylene sulfide resin high molecular weight to some extent.
폴리아릴렌설피드 수지의 융점은, 바람직하게는 250∼300℃의 범위, 보다 바람직하게는 265∼300℃의 범위이다. 폴리아릴렌설피드 수지의 300℃에 있어서의 용융 점도(V6)는, 바람직하게는 1∼2000[㎩·s]의 범위, 보다 바람직하게는 5∼1700[㎩·s]의 범위이다. 여기에서, 용융 점도(V6)는, 플로우 테스터를 사용해서, 온도 300℃, 하중 1.96㎫, 오리피스 길이와 오리피스 직경과의 비(오리피스 길이/오리피스 직경)가 10/1인 오리피스를 사용해서 6분간 유지한 후의 용융 점도를 의미한다.Melting|fusing point of polyarylene sulfide resin becomes like this. Preferably it is the range of 250-300 degreeC, More preferably, it is the range of 265-300 degreeC. Melt viscosity (V6) in 300 degreeC of polyarylene sulfide resin becomes like this. Preferably it is the range of 1-2000 [Pa*s], More preferably, it is the range of 5-1700 [Pa*s]. Here, the melt viscosity (V6) was measured using a flow tester at a temperature of 300°C, a load of 1.96 MPa, and an orifice whose ratio of orifice length to orifice diameter (orifice length/orifice diameter) was 10/1 for 6 minutes It means the melt viscosity after holding.
본 실시형태에 사용되는 사용하는 실리콘 화합물로서는, 주쇄에 실록산결합을 갖는 하기 일반식(I)으로 표시되는 폴리오르가노실록산이 바람직하다.As a silicone compound used for this embodiment, the polyorganosiloxane represented by the following general formula (I) which has a siloxane bond in a principal chain is preferable.
R30-〔Si(R31)2-O〕n1-R32 (I)R 30 -[Si(R 31 ) 2 -O]n 1 -R 32 (I)
(식 중, R30, R31 및 R32은, 각각 독립적으로 수소 원자 또는 유기 기를 나타내고, n1은 2 이상의 정수이다)(Wherein, R 30 , R 31 and R 32 each independently represent a hydrogen atom or an organic group, and n 1 is an integer of 2 or more)
이들 중에서도, 특히 상기 일반식(1) 중의 R30, R31 및 R32이 모두 메틸기인 폴리디메틸실록산이 바람직하며, 당해 폴리디메틸실록산의 메틸기의 일부를, 수소 원자 또는 그 밖의 치환기로 치환한 것도 바람직하다. Among these, polydimethylsiloxane in which R 30 , R 31 and R 32 in the general formula (1) are all methyl groups is particularly preferable, and those in which a part of the methyl groups of the polydimethylsiloxane are substituted with hydrogen atoms or other substituents desirable.
그 밖의 치환기로서는, 탄소 원자수 2 이상의 알킬기, 아릴기, 할로겐화알킬기, 실릴알킬기, 폴리옥시알킬렌기 및 반응성 관능기를 들 수 있고, 복수의 메틸기를 치환하는 경우는, 이들 중에서, 서로 동일 또는 다른 것을 선택 가능하다.Examples of the other substituent include an alkyl group having 2 or more carbon atoms, an aryl group, a halogenated alkyl group, a silylalkyl group, a polyoxyalkylene group, and a reactive functional group. It is selectable.
탄소 원자수 2 이상의 알킬기로서는, 예를 들면, 에틸기, 프로필기, 부틸기, 옥틸기, 도데실기 등을 들 수 있다. 아릴기로서는, 예를 들면, 페닐기, 톨릴기, 나프틸기 등을 들 수 있다.Examples of the alkyl group having 2 or more carbon atoms include an ethyl group, a propyl group, a butyl group, an octyl group, and a dodecyl group. As an aryl group, a phenyl group, a tolyl group, a naphthyl group, etc. are mentioned, for example.
할로겐화알킬기로서는, 예를 들면, 플루오로프로필기, 클로로프로필기 등을 들 수 있다.Examples of the halogenated alkyl group include a fluoropropyl group and a chloropropyl group.
실릴알킬기는, 하기 일반식(Ⅱ)으로 표시되는 것을 그 대표적인 구체예로서 들 수 있다.The silylalkyl group is represented by the following general formula (II) as a typical specific example thereof.
-(CH2)n2-Si(OCH3)3 (Ⅱ)-(CH 2 )n 2 -Si(OCH 3 ) 3 (II)
(식 중, n2은 1 이상의 정수이다)(wherein n 2 is an integer greater than or equal to 1)
폴리옥시알킬렌기는, 하기 일반식(Ⅲ)으로 표시되는 것을 그 구체예로서 들 수 있다.Specific examples of the polyoxyalkylene group include those represented by the following general formula (III).
-〔CH2〕k-O-〔C2H4O〕l-〔C3H6O〕m-R33 (Ⅲ)-[CH 2 ]kO-[C 2 H 4 O] l-[C 3 H 6 O] mR 33 (III)
(식 중, k, l 및 m은, 각각 독립적으로 0 또는 양의 정수이고, l 및 m은 동시에 0이 아닌 정수를 취한다. 또한, R33은 수소 원자, 알킬기, 아릴기, 할로겐화알킬기, 실릴알킬기 및 후술하는 반응성 관능기로 이루어지는 군에서 선택되는 1종 이상의 치환기이다)(Wherein, k, l and m are each independently 0 or a positive integer, and l and m simultaneously take non-zero integers. R 33 is a hydrogen atom, an alkyl group, an aryl group, a halogenated alkyl group, at least one substituent selected from the group consisting of a silylalkyl group and a reactive functional group to be described later)
실리콘 화합물은, 반응성 관능기를 갖는 것이 바람직하다. 반응성 관능기의 구체예로서는, 에폭시기, 아미노기, 메르캅토기, 비닐기, 카르복시기, 수산기, 이소시아네이트기, 아미드기, 아실기, 니트릴기, 산무수기 등을 들 수 있다. 이들 반응성 관능기는 주쇄에 직접 결합해 있어도 되고, 또는 주쇄에 결합한 알킬렌기, 폴리옥시알킬렌기 등의 유기 기의 말단에 결합해 있어도 된다. 그 중에서 특히 카르복시기, 수산기, 에폭시기 및 아미노기가 바람직하며, 에폭시기 및 아미노기가 더 바람직하다.It is preferable that a silicone compound has a reactive functional group. Specific examples of the reactive functional group include an epoxy group, an amino group, a mercapto group, a vinyl group, a carboxy group, a hydroxyl group, an isocyanate group, an amide group, an acyl group, a nitrile group, and an acid anhydride group. These reactive functional groups may be directly couple|bonded with the main chain, or may couple|bond with the terminal of organic groups, such as an alkylene group couple|bonded with the main chain, polyoxyalkylene group. Among them, a carboxy group, a hydroxyl group, an epoxy group and an amino group are particularly preferable, and an epoxy group and an amino group are more preferable.
실리콘 화합물은, 수지 조성물 중에서 균일하게 분산됨에 의해 전해액에 대한 내구성 향상에 효과가 발휘되는 것이며, 이 관점에서 실리콘 화합물의 점도(25℃)는, 10∼100,000mPa·s가 바람직하며, 특히 10∼80,000mPa·s의 범위에 있는 오일상의 것이 호적하다. 또, 본 실시형태의 수지 조성물 중에 실리콘 화합물을 균일하게 분산시키기 위하여, 실리콘 화합물을 실리카 등의 무기 분체에 담지(擔持)시킨 것을 사용하는 것이 바람직하다.The silicone compound exhibits an effect of improving durability with respect to the electrolyte solution by being uniformly dispersed in the resin composition. Oily ones in the range of 80,000 mPa·s are suitable. Moreover, in order to disperse|distribute a silicone compound uniformly in the resin composition of this embodiment, it is preferable to use what supported the silicone compound on inorganic powder, such as silica.
실리콘 화합물 중에 반응성 관능기를 함유하고 있으면, 수지 조성물에의 실리콘 화합물의 분산을 양호하게 해, 그 때문에 내충격성의 향상을 도모할 수 있다. 또한 실리콘 화합물이 성형품 표면에 스며나오는, 소위 블리드 아웃을 억제하는 효과가 있는 점에서도 바람직하다.When a reactive functional group is contained in a silicone compound, dispersion|distribution of the silicone compound to a resin composition will be made favorable, Therefore, the improvement of impact resistance can be aimed at. Moreover, it is preferable also from the point which has the effect of suppressing the so-called bleed-out which a silicone compound seeps on the surface of a molded article.
실리콘 화합물 중의 반응성 관능기의 함유율은, 내충격성, 강인성(强靭性)의 부여에 보다 바람직한 효과를 부여하는 점에서, 400g/당량(이하 「g/eq」로 약기한다) 이상이 바람직하고, 혼합의 용이함의 점에서 50,000g/eq 이하가 바람직하다.The content rate of the reactive functional group in the silicone compound is preferably 400 g/equivalent (hereinafter abbreviated as "g/eq") or more from the viewpoint of imparting a more preferable effect to imparting impact resistance and toughness, and mixing 50,000 g/eq or less is preferable at the point of easiness.
또한, 실리콘 화합물의 배합량은, 폴리아릴렌설피드 수지 및 실리콘 화합물의 합계 100질량부에 대해서 0.1∼10질량부인 것이 바람직하며, 0.3∼5질량부인 것이 보다 바람직하고, 0.5∼3질량부인 것이 더 바람직하다.Moreover, it is preferable that the compounding quantity of a silicone compound is 0.1-10 mass parts with respect to a total of 100 mass parts of polyarylene sulfide resin and a silicone compound, It is more preferable that it is 0.3-5 mass parts, It is more preferable that it is 0.5-3 mass parts do.
본 실시형태의 개스킷용 수지 조성물에는, 실란 화합물을 배합해도 된다. 실란 화합물로서는, 예를 들면, 아미노알콕시실란, 에폭시알콕시실란, 비닐알콕시실란 등을 들 수 있다. 이들 실란 화합물은, 단독으로 사용할 수도 있고 2종 이상 병용할 수도 있다.You may mix|blend a silane compound with the resin composition for gaskets of this embodiment. As a silane compound, aminoalkoxy silane, an epoxy alkoxy silane, vinyl alkoxy silane, etc. are mentioned, for example. These silane compounds may be used independently and may use 2 or more types together.
아미노알콕시실란으로서는, 1분자 중에 아미노기를 1개 이상 가지고, 알콕시기를 2개 이상 갖는 실란 화합물이면 사용할 수 있으며, 예를 들면, γ-아미노프로필트리에톡시실란, γ-아미노프로필트리메톡시실란, γ-아미노프로필메틸디에톡시실란, γ-아미노프로필메틸디메톡시실란, N-β(아미노에틸)-γ-아미노프로필트리에톡시실란, N-β(아미노에틸)-γ-아미노프로필트리메톡시실란, N-β(아미노에틸)-γ-아미노프로필메틸디에톡시실란, N-β(아미노에틸)-γ-아미노프로필메틸디메톡시실란, N-페닐-γ-아미노프로필트리에톡시실란, N-페닐-γ-아미노프로필트리메톡시실란 등을 들 수 있다.As the aminoalkoxysilane, any silane compound having one or more amino groups and two or more alkoxy groups in one molecule can be used, for example, γ-aminopropyltriethoxysilane, γ-aminopropyltrimethoxysilane, γ-Aminopropylmethyldiethoxysilane, γ-aminopropylmethyldimethoxysilane, N-β(aminoethyl)-γ-aminopropyltriethoxysilane, N-β(aminoethyl)-γ-aminopropyltrimethoxy Silane, N-β (aminoethyl)-γ-aminopropylmethyldiethoxysilane, N-β (aminoethyl)-γ-aminopropylmethyldimethoxysilane, N-phenyl-γ-aminopropyltriethoxysilane, N -phenyl-γ-aminopropyltrimethoxysilane, etc. are mentioned.
에폭시알콕시실란으로서는, 1분자 중에 에폭시기를 1개 이상 가지고, 알콕시기를 2개 이상 갖는 실란 화합물이면 사용할 수 있으며, 예를 들면, γ-글리시독시프로필트리메톡시실란, β-(3,4-에폭시시클로헥실)에틸트리메톡시실란, γ-글리시독시프로필트리에톡시실란, γ-글리시독시프로필메틸디에톡시실란, γ-글리시독시프로필메틸디메톡시실란 등을 들 수 있다.As the epoxyalkoxysilane, any silane compound having one or more epoxy groups and two or more alkoxy groups in one molecule can be used, for example, γ-glycidoxypropyltrimethoxysilane, β-(3,4- Epoxycyclohexyl)ethyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropylmethyldimethoxysilane, etc. are mentioned.
비닐알콕시실란으로서는, 1분자 중에 비닐기를 1개 이상 가지고, 알콕시기를 2개 이상 갖는 실란 화합물이면 사용할 수 있으며, 예를 들면, 비닐트리에톡시실란, 비닐트리메톡시실란, 비닐트리스(β-메톡시에톡시)실란 등을 들 수 있다.As the vinyl alkoxysilane, any silane compound having one or more vinyl groups and two or more alkoxy groups in one molecule can be used, for example, vinyltriethoxysilane, vinyltrimethoxysilane, vinyltris(β-methyl and ethoxyethoxy) silane.
본 실시형태에서는, 상기 각 성분에 더해, 본 발명이 나타내는 효과를 손상시키지 않는 범위에서 섬유상(纖維狀) 강화재 또는 무기질 필러를 첨가해도 된다.In this embodiment, in addition to each said component, you may add a fibrous reinforcing material or an inorganic filler in the range which does not impair the effect shown by this invention.
섬유상 강화재로서는, 예를 들면, 유리 섬유, PAN계 또는 피치계의 탄소 섬유, 실리카 섬유, 실리카·알루미나 섬유, 지르코니아 섬유, 질화붕소 섬유, 질화규소 섬유, 붕소 섬유, 붕산알루미늄 섬유, 티탄산칼륨 섬유, 스테인리스, 알루미늄, 티타늄, 구리, 진주 등의 금속의 섬유상물(纖維狀物)의 무기질 섬유상 물질, 및 아라미드 섬유 등의 유기질 섬유상 물질을 들 수 있다.Examples of the fibrous reinforcing material include glass fibers, PAN-based or pitch-based carbon fibers, silica fibers, silica-alumina fibers, zirconia fibers, boron nitride fibers, silicon nitride fibers, boron fibers, aluminum borate fibers, potassium titanate fibers, and stainless steel. , inorganic fibrous substances of metals such as aluminum, titanium, copper and pearls, and organic fibrous substances such as aramid fibers.
무기질 필러로서는, 예를 들면, 마이카, 탈크, 규회석(wollastonite), 세리사이트, 카올린, 클레이, 벤토나이트, 아스베스토, 알루미나실리케이트, 제올라이트, 파이로필라이트 등의 규산염이나 탄산칼슘, 탄산마그네슘, 돌로마이트 등의 탄산염, 황산칼슘, 황산바륨 등의 황산염, 알루미나, 산화마그네슘, 실리카, 지르코니아, 티타니아, 산화철 등의 금속 산화물, 유리 비드, 세라믹 비드, 질화붕소, 탄화규소, 인산칼슘 등을 들 수 있다. 이들 섬유상 강화재 및 무기질 필러는, 단독으로 사용할 수도 있고 2종 이상 병용할 수도 있다.Examples of the inorganic filler include silicates such as mica, talc, wollastonite, sericite, kaolin, clay, bentonite, asbesto, alumina silicate, zeolite, and pyrophyllite, calcium carbonate, magnesium carbonate, dolomite, and the like. of carbonate, calcium sulfate, sulfates such as barium sulfate, metal oxides such as alumina, magnesium oxide, silica, zirconia, titania, iron oxide, glass beads, ceramic beads, boron nitride, silicon carbide, calcium phosphate, and the like. These fibrous reinforcing materials and inorganic fillers may be used individually or in combination of 2 or more types.
또한, 본 실시형태의 개스킷용 수지 조성물에는, 본 발명이 나타내는 효과를 손상시키지 않는 범위에서, 산화방지제, 안정제, 가공열안정제, 가소제, 이형제(離型劑), 착색제, 활제(滑劑), 내후성안정제, 발포제, 방청제, 왁스를 적량 배합해도 된다.Moreover, in the resin composition for gaskets of this embodiment, in the range which does not impair the effect shown by this invention, antioxidant, a stabilizer, a processing heat stabilizer, a plasticizer, a mold release agent, a coloring agent, a lubricant, An appropriate amount of a weathering stabilizer, foaming agent, rust preventive agent and wax may be blended.
추가로, 본 실시형태의 개스킷용 수지 조성물에는, 요구되는 특성에 맞춰서 그 밖의 수지 성분을 적의 배합해도 된다. 여기에서 사용할 수 있는 수지 성분으로서는, 에틸렌, 부틸렌, 펜텐, 부타디엔, 이소프렌, 클로로프렌, 스티렌, α-메틸스티렌, 아세트산비닐, 염화비닐, 아크릴산에스테르, 메타크릴산에스테르, (메타)아크릴로니트릴 등의 단량체의 단독 중합체 또는 공중합체, 폴리우레탄, 폴리부틸렌테레프탈레이트, 폴리에틸렌테레프탈레이트 등의 폴리에스테르, 폴리아세탈, 폴리카보네이트, 폴리설폰, 폴리알릴설폰, 폴리에테르설폰, 폴리페닐렌에테르, 폴리에테르케톤, 폴리에테르에테르케톤, 폴리이미드, 폴리아미드이미드, 폴리에테르이미드, 실리콘 수지, 에폭시 수지, 페녹시 수지, 액정 폴리머, 폴리아릴에테르 등의 단독 중합체, 랜덤 공중합체 또는 블록 공중합체, 그래프트 공중합체 등을 들 수 있다.Furthermore, you may mix|blend other resin components suitably with the resin composition for gaskets of this embodiment according to the characteristic calculated|required. Examples of the resin component usable herein include ethylene, butylene, pentene, butadiene, isoprene, chloroprene, styrene, α-methylstyrene, vinyl acetate, vinyl chloride, acrylic acid ester, methacrylic acid ester, (meth)acrylonitrile, and the like. homopolymer or copolymer of monomers, polyurethane, polybutylene terephthalate, polyester such as polyethylene terephthalate, polyacetal, polycarbonate, polysulfone, polyallylsulfone, polyethersulfone, polyphenylene ether, polyether Homopolymers such as ketones, polyetheretherketones, polyimides, polyamideimides, polyetherimides, silicone resins, epoxy resins, phenoxy resins, liquid crystal polymers, polyarylethers, random copolymers or block copolymers, graft copolymers and the like.
본 실시형태의 개스킷용 수지 조성물의 제조하는 방법으로서는, 구체적으로는, 실리콘 화합물, 폴리아릴렌설피드 수지 및 필요에 따라서 배합하는 그 밖의 배합 성분을 텀블러, 헨쉘 믹서 등으로 균일하게 혼합하고, 다음으로, 그 혼합물을 2축 압출기에 투입하고, 수지 성분의 토출량(㎏/hr)과 스크루 회전수(rpm)와의 비율(토출량/스크루 회전수)이 0.02∼0.2(㎏/hr·rpm)의 범위로 되는 조건 하에서 용융 혼련하는 방법을 들 수 있다.Specifically, as a method for producing the resin composition for a gasket of the present embodiment, a silicone compound, a polyarylene sulfide resin, and other blending components to be blended as necessary are uniformly mixed with a tumbler, a Henschel mixer, or the like, and then , the mixture is put into a twin-screw extruder, and the ratio of the discharge amount (kg/hr) of the resin component and the screw rotation speed (rpm) (discharge amount/screw rotation speed) is in the range of 0.02 to 0.2 (kg/hr rpm) The method of melt-kneading under the conditions used is mentioned.
상기한 제조 방법에 대하여, 더 상세히 기술하면, 상기한 각 성분을 2축 압출기 내에 투입하고, 설정 온도 330℃, 수지 온도 350℃ 정도의 온도 조건 하에 용융 혼련하는 방법을 들 수 있다. 이때, 수지 성분의 토출량은 회전수 250rpm으로 5∼50㎏/hr의 범위로 된다. 그 중에서도 특히 분산성의 점에서 20∼35㎏/hr인 것이 바람직하다. 따라서, 수지 성분의 토출량(㎏/hr)과 스크루 회전수(rpm)와의 비율(토출량/스크루 회전수)은, 특히 0.08∼0.14(㎏/hr·rpm)인 것이 바람직하다.Regarding the above-described manufacturing method, if described in more detail, a method of introducing each of the above-mentioned components into a twin-screw extruder, and melt-kneading under the temperature conditions of a set temperature of 330°C and a resin temperature of about 350°C is mentioned. At this time, the discharge amount of the resin component is in the range of 5 to 50 kg/hr at the rotation speed of 250 rpm. Especially, it is preferable that it is 20-35 kg/hr from a dispersible point. Therefore, it is preferable that the ratio (discharge amount/screw rotation speed) of the discharge amount (kg/hr) of a resin component and screw rotation speed (rpm) is especially 0.08-0.14 (kg/hr·rpm).
이렇게 해서 용융 혼련된 개스킷용 수지 조성물은, 통상적으로 펠렛상으로 커팅된다. 또한, 얻어진 펠렛을 성형기에 공급해서 용융 성형함에 의해, 최종적으로 목적으로 하는 형상의 성형물이 얻어진다.The resin composition for gaskets melt-kneaded in this way is usually cut into pellets. Furthermore, by supplying the obtained pellets to a molding machine and melt-molding, the molded object of the target shape is finally obtained.
여기에서 용융 성형하는 방법은, 예를 들면, 사출 성형, 압출 성형, 압축 성형 등을 들 수 있지만, 그 중 이차전지용 개스킷을 성형하는 방법으로서는, 사출 성형이 특히 바람직하다.Examples of the melt-molding method include injection molding, extrusion molding, and compression molding. Among them, injection molding is particularly preferable as a method for molding the gasket for a secondary battery.
본 실시형태의 개스킷용 수지 조성물은, 예를 들면, 노트형 PC, 휴대전화, 비디오 카메라 등의 전기 기기 용도, 혹은 하이브리드 자동차(HV), 전기 자동차(EV) 등의 차재 용도로 사용되는 이차전지, 특히 고용량 리튬이온 이차전지용의 개스킷 등에 특히 유용하다.The resin composition for gaskets of the present embodiment is, for example, a secondary battery used in electric equipment applications such as notebook PCs, mobile phones, and video cameras, or in-vehicle applications such as hybrid vehicles (HV) and electric vehicles (EV). , especially for gaskets for high-capacity lithium ion secondary batteries, and the like.
[실시예][Example]
이하, 실시예를 들어 본 발명에 대하여 더 구체적으로 설명한다. 단, 본 발명은 이들 실시예로 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail by way of Examples. However, the present invention is not limited to these Examples.
1. 폴리페닐렌설피드 수지(PPS 수지)1. Polyphenylene sulfide resin (PPS resin)
1-1. PPS-1∼5의 합성1-1. Synthesis of PPS-1 to 5
(합성예 1)(Synthesis Example 1)
p-디요오도벤젠(도쿄가세이가부시키가이샤, p-디요오도벤젠 순도 98.0% 이상) 300.0g, 고체 황(간토가가쿠가부시키가이샤제, 황(분말)) 27.00g, 4,4'-디티오비스벤조산(와코준야쿠고교가부시키가이샤제, 4,4'-디티오비스벤조산, Technical Grade) 2.0g을 180℃로 질소 분위기 하에서 가열해, 이들을 용해 및 혼합했다. 다음으로 220℃로 승온하고, 절대압 26.6㎪까지 감압했다. 계 내가 320℃이며 절대압 133㎩로 되도록, 단계적으로 온도와 압력 변화시켜, 얻어진 용융 혼합물을 가열하면서, 8시간, 용융 중합을 행했다. 반응 종료 후, NMP 200g을 가해서, 220℃에서 가열 교반해, 얻어진 용해물을 여과했다. 여과 후의 용해물에 NMP 320g을 가해, 케이크 세정 여과를 행했다. 얻어진 NMP를 함유하는 케이크에 이온 교환수 1ℓ를 가해, 오토클레이브 중에서 200℃ 10분간 교반했다. 다음으로 케이크를 여과하고, 여과 후의 케이크에 70℃의 이온 교환수 1ℓ를 가해 케이크 세정을 행했다. 얻어진 함수 케이크에 이온 교환수 1ℓ를 가해서 10분간 교반했다. 다음으로 케이크를 여과하고, 여과 후의 케이크에 70℃의 이온 교환수 1ℓ를 가해 케이크 세정을 행했다. 이 조작을 다시 한번 반복한 후, 케이크를 120℃에서 4시간 건조해, PPS 수지 91g을 얻었다.p-diiodobenzene (Tokyo Chemical Co., Ltd., p-diiodobenzene purity 98.0% or more) 300.0 g, solid sulfur (manufactured by Kanto Chemical Co., Ltd., sulfur (powder)) 27.00 g, 4 2.0 g of ,4'-dithiobisbenzoic acid (manufactured by Wako Pure Chemical Industries, Ltd., 4,4'-dithiobisbenzoic acid, Technical Grade) was heated at 180° C. in a nitrogen atmosphere to dissolve and mix them. Next, it heated up at 220 degreeC and pressure-reduced to 26.6 kPa absolute. Melt polymerization was performed for 8 hours, heating the molten mixture obtained by changing the temperature and pressure step by step so that the inside of the system was 320°C and the absolute pressure was 133 Pa. After completion of the reaction, 200 g of NMP was added, and the resulting solution was filtered by heating and stirring at 220°C. NMP 320g was added to the melt|dissolution after filtration, and cake washing|cleaning filtration was performed. 1 L of ion-exchange water was added to the cake containing the obtained NMP, and it stirred for 10 minutes at 200 degreeC in an autoclave. Next, the cake was filtered, and 1 L of 70 degreeC ion-exchange water was added to the cake after filtration, and cake washing|cleaning was performed. 1 L of ion-exchanged water was added to the obtained water-containing cake, and it stirred for 10 minutes. Next, the cake was filtered, and 1 L of 70 degreeC ion-exchange water was added to the cake after filtration, and cake washing|cleaning was performed. After repeating this operation once more, the cake was dried at 120 degreeC for 4 hours, and 91 g of PPS resins were obtained.
(합성예 2)(Synthesis Example 2)
「4,4'-디티오비스벤조산」 대신에 「2-요오도아닐린(도쿄가세이가부시키가이샤제)」을 사용한 것 이외는 합성예 1과 마찬가지로 해서, PPS 수지 91g을 얻었다.91 g of PPS resin was obtained in the same manner as in Synthesis Example 1 except that "2-iodoaniline (manufactured by Tokyo Chemical Co., Ltd.)" was used instead of "4,4'-dithiobisbenzoic acid".
(합성예 3)(Synthesis Example 3)
「4,4'-디티오비스벤조산」 대신에 「디페닐디설피드(스미토모세이카가부시키가이샤, DPDS)」를 사용한 것 이외는 합성예 1과 마찬가지로 해서 PPS 수지 91g을 얻었다.91 g of PPS resin was obtained in the same manner as in Synthesis Example 1 except that "diphenyl disulfide (Sumitomo Chemical Co., Ltd., DPDS)" was used instead of "4,4'-dithiobisbenzoic acid".
(합성예 4)(Synthesis Example 4)
p-디요오도벤젠(도쿄가세이가부시키가이샤제, p-디요오도벤젠 순도 98.0% 이상) 300.0g, 고체 황(간토가가쿠가부시키가이샤제, 황(분말)) 29.15g 및 4-요오도비페닐(도쿄가세이가부시키가이샤제) 1.48g을 180℃로 질소 분위기 하에서 가열해, 이들을 용해 및 혼합했다. 다음으로 220℃로 승온하고, 절대압 46.7㎪까지 감압해, 계 내가 320℃이며 절대압 133㎩로 되도록, 단계적으로 온도와 압력 변화시켜, 얻어진 용융 혼합물을 가열하면서, 8시간, 용융 중합을 행했다. 반응 종료 후, NMP 200g을 가해서, 220℃에서 가열 교반해, 얻어진 용해물을 여과했다. 여과 후의 용해물에 NMP 320g을 가해, 케이크 세정 여과를 행했다. 얻어진 NMP를 함유하는 케이크에 이온 교환수 1ℓ를 가해, 오토클레이브 중에서 200℃ 10분간 교반했다. 다음으로 케이크를 여과하고, 여과 후의 케이크에 70℃의 이온 교환수 1ℓ를 가해 케이크 세정을 행했다. 얻어진 함수 케이크에 이온 교환수 1ℓ를 가해서 10분간 교반했다. 다음으로 케이크를 여과하고, 여과 후의 케이크에 70℃의 이온 교환수 1ℓ를 가해 케이크 세정을 행했다. 이 조작을 다시 한번 반복한 후, 케이크를 120℃에서 4시간 건조해, PPS 수지 91g을 얻었다.300.0 g of p-diiodobenzene (manufactured by Tokyo Chemical Co., Ltd., purity of 98.0% or more of p-diiodobenzene), 29.15 g of solid sulfur (manufactured by Kanto Chemical Co., Ltd., sulfur (powder)) and 1.48 g of 4-iodobiphenyl (manufactured by Tokyo Chemical Co., Ltd.) was heated at 180°C in a nitrogen atmosphere to dissolve and mix them. Next, the temperature was raised to 220 ° C, the pressure was reduced to 46.7 kPa, and the temperature and pressure were changed stepwise so that the inside of the system was 320 ° C. and the absolute pressure was 133 Pa. While heating the obtained molten mixture, melt polymerization was performed for 8 hours. After completion of the reaction, 200 g of NMP was added, and the resulting solution was filtered by heating and stirring at 220°C. NMP 320g was added to the lysate after filtration, and cake washing-filtration was performed. 1 L of ion-exchange water was added to the cake containing the obtained NMP, and it stirred for 10 minutes at 200 degreeC in the autoclave. Next, the cake was filtered, and 1 L of 70 degreeC ion-exchange water was added to the cake after filtration, and cake washing|cleaning was performed. 1 L of ion-exchange water was added to the obtained water-containing cake, and it stirred for 10 minutes. Next, the cake was filtered, and 1 L of 70 degreeC ion-exchange water was added to the cake after filtration, and cake washing|cleaning was performed. After repeating this operation once more, the cake was dried at 120 degreeC for 4 hours, and 91 g of PPS resins were obtained.
(비교 합성예)(comparative synthesis example)
NMP 600g 및 황화나트륨5수염 336.3g(2.0mol)을 투입하고, 질소 분위기 하, 200℃까지 승온함에 의해 물-NMP 혼합물을 증류 제거했다. 다음으로 이 계에 p-디클로로벤젠 292.53g과 2,5-디클로로아닐린 1.62g을 NMP 230g에 녹인 용액을 첨가하고, 220℃에서 5시간 추가로 240℃에서 2시간 질소 분위기 하에서 반응시켰다. 반응 용기를 냉각 후, 내용물을 취출하고, 일부를 샘플링해, 미반응 2,5-디클로로아닐린을 가스 크로마토그래프로 정량했다. 또한 나머지의 슬러리는 열수(熱水)로 몇 회 세정해, 폴리머 케이크를 여과 분별했다. 이 케이크를 80℃ 감압 건조해, 분말상의 PPS 수지를 얻었다. 적외 흡수 스펙트럼을 측정한 바, 3380㎝-1 부근에 아미노기에 유래하는 것으로 보이는 흡수 스펙트럼이 관측되었다.600 g of NMP and 336.3 g (2.0 mol) of sodium sulfide pentahydrate were added, and the water-NMP mixture was distilled off by raising the temperature to 200° C. under a nitrogen atmosphere. Next, a solution of 292.53 g of p-dichlorobenzene and 1.62 g of 2,5-dichloroaniline dissolved in 230 g of NMP was added to this system, and reacted at 220° C. for 5 hours and further at 240° C. for 2 hours under a nitrogen atmosphere. After cooling the reaction vessel, the contents were taken out, a portion was sampled, and unreacted 2,5-dichloroaniline was quantified with a gas chromatograph. In addition, the remaining slurry was washed several times with hot water, and the polymer cake was separated by filtration. This cake was dried under reduced pressure at 80°C to obtain a powdery PPS resin. When the infrared absorption spectrum was measured, the absorption spectrum which seems to originate in the amino group was observed in the vicinity of 3380 cm -1.
1-2. 용융 점도1-2. melt viscosity
PPS 수지를 시마즈세이사쿠쇼제 플로우 테스터, CFT-500C를 사용해, 300℃, 하중 : 1.96×106㎩, L/D=10/1에서, 6분간 유지한 후에 용융 점도를 측정했다.The PPS resin Shimadzu assay Saku syoje flow tester, using a CFT-500C, 300 ℃, load: from 1.96 × 10 6 ㎩, L / D = 10/1, to measure the melt viscosity after holding for 6 minutes.
1-3. 비뉴토니언 지수1-3. Non-Newtonian exponent
PPS 수지를 캐필러리 레오미터로, 온도 300℃의 조건 하, 직경 1㎜, 길이 40㎜의 다이스를 사용해서 100∼1000(sec-1)의 전단 속도에 대한 전단 응력을 측정하고, 이들의 대수(對數) 플롯한 기울기로부터 계산한 값이다.The PPS resin was used as a capillary rheometer and the shear stress with respect to a shear rate of 100 to 1000 (sec -1 ) was measured using a die having a diameter of 1 mm and a length of 40 mm under the condition of a temperature of 300 ° C. It is a value calculated from the logarithmic plotted slope.
1-4. Mw 및 Mw/Mtop(분자량 분포)1-4. Mw and Mw/Mtop (molecular weight distribution)
PPS 수지의 중량 평균 분자량 및 피크 분자량을, 겔침투 크로마토그래피를 사용해서, 하기의 측정 조건에 의해 측정했다. 얻어진 Mw 및 Mtop로부터 Mw/Mtop를 산출했다. 6종류의 단분산 폴리스티렌을 교정에 사용했다.The weight average molecular weight and peak molecular weight of PPS resin were measured by the following measurement conditions using gel permeation chromatography. Mw/Mtop was computed from the obtained Mw and Mtop. Six types of monodisperse polystyrene were used for calibration.
장치 : 초고온 폴리머 분자량 분포 측정 장치(가부시키가이샤센슈가가쿠제 「SSC-7000」)Apparatus: Ultra-high temperature polymer molecular weight distribution measuring device (“SSC-7000” manufactured by Sens Chemical Co., Ltd.)
칼럼 : UT-805L(쇼와덴코가부시키가이샤제)Column: UT-805L (manufactured by Showa Denko Co., Ltd.)
칼럼 온도 : 210℃Column temperature: 210℃
용매 : 1-클로로나프탈렌Solvent: 1-chloronaphthalene
측정 방법 : UV 검출기(360㎚)Measurement method: UV detector (360nm)
합성한 PPS-1∼5의 특성을 정리해서 표 1에 나타낸다.Table 1 summarizes the characteristics of the synthesized PPS-1 to 5.
[표 1] [Table 1]
2. 폴리페닐렌설피드 수지 조성물(PPS 컴파운드)2. Polyphenylene sulfide resin composition (PPS compound)
2-1. 원료2-1. Raw material
PPS 수지 조성물을 조제하기 위해, 이하의 실리콘 화합물을 준비했다.In order to prepare the PPS resin composition, the following silicone compounds were prepared.
·Si-1 : 실리콘 파우더(도레·다우코닝가부시키가이샤제, 「트레필 F-202」, 실리카에 실리콘 오일(점도(25℃) 62㎩·s)을 60질량% 담지한 파우더)Si-1: Silicone powder (Toray Dow Corning Co., Ltd., "Treefil F-202", powder in which 60 mass% of silicone oil (viscosity (25°C) 62 Pa·s) is supported on silica)
·Si-2 : 아미노기 함유 실리콘(신에츠가가쿠고교가부시키가이샤제, 「KF-868」)-Si-2: silicone containing amino group (manufactured by Shin-Etsu Chemical Co., Ltd., "KF-868")
2-2. 컴파운드의 제작2-2. production of compounds
표 2에 기재하는 배합 조성으로 각 원료를 텀블러를 사용해서 균일하게 혼합한 후, 2축 혼련 압출기(도시바기카이가부시키가이샤제, 「TEM-35B」)를 사용해 300℃에서 용융 혼련해, 펠렛상의 컴파운드를 얻었다.After uniformly mixing each raw material using a tumbler with the compounding composition shown in Table 2, melt kneading at 300 ° C. using a twin-screw kneading extruder (manufactured by Toshibagi Kai Co., Ltd., "TEM-35B"), A pelletized compound was obtained.
3. 평가3. Evaluation
3-1. 인장 강도 및 인장 신장3-1. Tensile strength and tensile elongation
얻어진 컴파운드로부터, ASTM 4호 덤벨 형상으로 사출 성형한 평가용 성형품을, ASTM D638에 따라, 가부시키가이샤시마즈세이사쿠쇼제의 「오토그래프 AG-5000C」를 사용해서, 인장 파단 신장을 측정했다.From the obtained compound, the molded article for evaluation injection molded into ASTM No. 4 dumbbell shape was measured for tensile elongation at break using "Autograph AG-5000C" manufactured by Shimadzu Corporation in accordance with ASTM D638.
3-2. 압축 응력 완화 시험3-2. compressive stress relaxation test
수지 조성물 펠렛을 사출 성형기를 사용해서 성형하고, 사출 성형기에 의해 종 8㎜×횡 8㎜×두께 3㎜의 평판을 성형해, 도 1에 나타내는 바와 같은 압축 응력 완화용 시험편을 제작했다. 이 시험편을 사용해, 항온조를 구비한 가부시키가이샤시마즈세이사쿠쇼제 「오토그래프 AG-50KNX」에 의해 10% 변형 하(온도 조건 : 23℃ 및 60℃)에서 압축 응력 완화를 측정하고, 100시간 후의 압축 응력을 구했다.The resin composition pellets were molded using an injection molding machine, and a flat plate having a length of 8 mm × width 8 mm × thickness 3 mm was molded by an injection molding machine, and a test piece for relaxation of compressive stress as shown in FIG. 1 was produced. Using this test piece, compressive stress relaxation was measured under 10% strain (temperature conditions: 23°C and 60°C) by "Autograph AG-50KNX" manufactured by Shimadzu Corporation equipped with a thermostat equipped with a thermostat, after 100 hours The compressive stress was obtained.
3-3. 기밀성의 평가3-3. Assessment of confidentiality
수지 조성물 펠렛을 사출 성형기를 사용해서 성형해, 형상이 종 8㎜×횡 8㎜×높이 10㎜이며 두께 0.8㎜인 상자형 성형품을 제작했다. 다음으로, 이 상자형 성형품에 전해액(1mol/ℓ의 LiPF6/에틸렌카보네이트(EC):디메틸카보네이트(DMC)(용량 1:1 혼합 용액) 용액, 기시다가가쿠가부시키가이샤제)를 넣고, 압축 응력 완화 시험에서 사용한 종 8㎜×횡 8㎜×두께 3㎜의 평판으로 일정 응력(10% 변형 하)으로 봉한 기밀 시험용 샘플을 작성한다. 이것을 60℃의 건열 하에서 100시간 방치해, 액의 누설 정도에 대하여 확인했다. 또, 평가 결과는 이하와 같이 표시했다.The resin composition pellets were shape|molded using the injection molding machine, and the shape produced the box-shaped molded article of length 8mm x width 8mm x height 10mm, and thickness 0.8mm. Next, an electrolyte solution (1 mol/L LiPF6/ethylene carbonate (EC):dimethyl carbonate (DMC) (volume 1:1 mixed solution) solution, manufactured by Kishida Chemical Co., Ltd.) was put into this box-shaped molded article, and compressed A sample for airtightness test sealed with a constant stress (under 10% strain) with a flat plate having a length of 8 mm × width 8 mm × thickness 3 mm used in the stress relaxation test was prepared. This was left to stand under 60 degreeC dry heat for 100 hours, and the leak degree of a liquid was confirmed. In addition, the evaluation result was displayed as follows.
○ : 100시간 후에 액의 누설이 생기지 않음○: No leakage of liquid after 100 hours
× : 100시간 후에 액의 누설이 생김×: leakage of liquid occurs after 100 hours
3-4. 캐비티 밸런스3-4. cavity balance
40개분의 캐비티를 갖는 와셔 금형을 사용해, 일차 스풀에 가장 가까운 위치의 캐비티(C1)가 완전히 충전되는 최저한의 성형 조건에서 PPS 컴파운드를 사출 성형했다. 성형 조건은 75톤 성형기, 실린더 온도 320℃, 금형 온도 140℃, 보압 없음으로 했다.Using a washer mold having 40 cavities, the PPS compound was injection molded under the minimum molding conditions in which the cavity (C1) closest to the primary spool was completely filled. The molding conditions were a 75-ton molding machine, a cylinder temperature of 320°C, a mold temperature of 140°C, and no holding pressure.
성형 후의, 캐비티(C1)와 같은 러너에 있는 일차 스풀로부터 가장 먼 캐비티(C10)의 충전도를 비교했다. 충전도(질량%)는, 캐비티(C1)의 성형품에 대한, 캐비티(C10)의 성형품의 질량비로부터 구했다. 캐비티(C10)의 충전도가 높을수록, 캐비티 밸런스가 우수하다고 할 수 있다. 충전도에 의거해서, 각 조성물의 캐비티 밸런스를 이하의 기준으로 판정했다.After molding, the degree of filling of the cavity (C10) furthest from the primary spool on the same runner as the cavity (C1) was compared. The filling degree (mass %) was calculated|required from the mass ratio of the molded article of the cavity C10 with respect to the molded article of the cavity C1. It can be said that the cavity balance is excellent, so that the filling degree of the cavity C10 is high. Based on the filling degree, the cavity balance of each composition was judged on the following reference|standard.
AA : 100∼90질량%AA: 100 to 90 mass %
A : 89∼80질량%A: 89 to 80 mass %
B : 79∼70질량%B: 79 to 70 mass %
C : 69∼60질량%C: 69-60 mass %
D : 59%질량 이하D: 59% by mass or less
3-5. 발생 가스량3-5. amount of gas generated
가스 크로마토그래프 질량 분석 장치를 사용해서, PPS 수지 단체 및 PPS 컴파운드에 대하여, 소정량의 샘플을 325℃에서 15분간 가열해, 그때의 발생 가스량을 질량%로서 정량했다.Using a gas chromatograph mass spectrometer, a predetermined amount of the sample was heated at 325° C. for 15 minutes for the PPS resin alone and the PPS compound, and the amount of gas generated at that time was quantified as mass%.
[표 2] [Table 2]
표 2에 나타나는 결과로부터 명확한 바와 같이, 실시예에서 제작한 수지 조성물은, 캐비티 밸런스가 우수하며, 기계적 강도가 높고, 기밀성도 우수한 성형품을 형성할 수 있어, 개스킷으로서 사용했을 경우, 이차전지에 필요로 되는 기밀성을 유지할 수 있다.As is clear from the results shown in Table 2, the resin composition produced in Examples has excellent cavity balance, high mechanical strength, and can form molded articles excellent in airtightness. When used as a gasket, it is necessary for a secondary battery confidentiality can be maintained.
Claims (7)
폴리아릴렌설피드 수지 및 실리콘 화합물을 함유하고,
상기 폴리아릴렌설피드 수지가, 디요오도 방향족 화합물과, 단체(單體) 황과, 중합금지제를, 상기 디요오도 방향족 화합물, 상기 단체 황 및 상기 중합금지제를 함유하는 용융 혼합물 중에서 반응시키는 것을 포함하는 방법에 의해 얻을 수 있는 것인 개스킷용 수지 조성물.A resin composition for a gasket used in a secondary battery consisting of a positive electrode, a negative electrode, a sealing body, a gasket, a separator, and an electrolyte,
It contains a polyarylene sulfide resin and a silicone compound,
The polyarylene sulfide resin reacts with a diiodo aromatic compound, single sulfur, and a polymerization inhibitor in a molten mixture containing the diiodo aromatic compound, the single sulfur compound and the polymerization inhibitor. A resin composition for gaskets obtainable by a method comprising:
상기 폴리아릴렌설피드 수지가, 상기 중합금지제에 유래하는 히드록시기, 아미노기, 카르복시기 및 카르복시기의 염으로 이루어지는 군에서 선택되는 적어도 1종의 기를 갖는 개스킷용 수지 조성물.The method of claim 1,
The resin composition for gaskets in which the said polyarylene sulfide resin has at least 1 sort(s) of group selected from the group which consists of a salt of the hydroxyl group, amino group, carboxy group, and carboxyl group derived from the said polymerization inhibitor.
상기 폴리아릴렌설피드 수지가, 300℃에 있어서의 0.95∼1.75의 비뉴토니언 지수, 및, 0.80∼1.70의 Mw/Mtop를 갖고,
상기 Mw 및 Mtop는 각각 겔침투 크로마토그래피에 의해 측정되는 중량 평균 분자량 및 피크 분자량인 개스킷용 수지 조성물.3. The method of claim 1 or 2,
The said polyarylene sulfide resin has a non-Newtonian index of 0.95-1.75 in 300 degreeC, and Mw/Mtop of 0.80-1.70,
wherein Mw and Mtop are a weight average molecular weight and a peak molecular weight measured by gel permeation chromatography, respectively.
폴리아릴렌설피드 수지 및 실리콘 화합물을 혼합하는 공정을 갖고,
상기 폴리아릴렌설피드 수지가, 디요오도 방향족 화합물과, 단체 황과, 중합금지제를, 상기 디요오도 방향족 화합물, 상기 단체 황 및 상기 중합금지제를 함유하는 용융 혼합물 중에서 반응시키는 것을 포함하는 방법에 의해 얻을 수 있는 것인 개스킷용 수지 조성물의 제조 방법.A method for producing a resin composition for a gasket used in a secondary battery comprising a positive electrode, a negative electrode, a sealing body, a gasket, a separator, and an electrolyte, the method comprising:
having a process of mixing a polyarylene sulfide resin and a silicone compound,
The polyarylene sulfide resin comprises reacting a diiodo aromatic compound, single sulfur, and a polymerization inhibitor in a molten mixture containing the diiodo aromatic compound, the single sulfur and the polymerization inhibitor The manufacturing method of the resin composition for gaskets which is obtainable by the method.
상기 폴리아릴렌설피드 수지가, 상기 중합금지제에 유래하는 히드록시기, 아미노기, 카르복시기 및 카르복시기의 염으로 이루어지는 군에서 선택되는 적어도 1종의 기를 갖는 개스킷용 수지 조성물의 제조 방법.6. The method of claim 5,
The manufacturing method of the resin composition for gaskets in which the said polyarylene sulfide resin has at least 1 sort(s) of group selected from the group which consists of a salt of the hydroxyl group, amino group, carboxy group, and carboxyl group derived from the said polymerization inhibitor.
상기 폴리아릴렌설피드 수지가, 300℃에 있어서의 0.95∼1.75의 비뉴토니언 지수, 및, 0.80∼1.70의 Mw/Mtop를 갖고,
상기 Mw 및 Mtop는 각각 겔침투 크로마토그래피에 의해 측정되는 중량 평균 분자량 및 피크 분자량인 개스킷용 수지 조성물의 제조 방법.7. The method according to claim 5 or 6,
The said polyarylene sulfide resin has a non-Newtonian index of 0.95-1.75 in 300 degreeC, and Mw/Mtop of 0.80-1.70,
Wherein Mw and Mtop are a weight average molecular weight and a peak molecular weight measured by gel permeation chromatography, respectively.
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6172489A (en) * | 1984-09-17 | 1986-04-14 | Mitsubishi Electric Corp | Picture area detecting device |
JPH08321287A (en) | 1995-03-20 | 1996-12-03 | Matsushita Electric Ind Co Ltd | Organic electrolyte battery |
JP2005078890A (en) | 2003-08-29 | 2005-03-24 | Toray Ind Inc | Polyamide resin composition for battery gasket |
JP2011029166A (en) * | 2009-06-23 | 2011-02-10 | Dic Corp | Resin composition for gasket, manufacturing method therefor, and gasket for secondary battery |
KR20110124985A (en) * | 2010-05-12 | 2011-11-18 | 에스케이케미칼주식회사 | Polyarylene sulfide having excellent formability and preparation method threrof |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4977236A (en) * | 1989-06-12 | 1990-12-11 | Eastman Kodak Company | Terminated copoly(arylene sulfide) of low molecular weight |
KR101183780B1 (en) * | 2006-08-24 | 2012-09-17 | 에스케이케미칼주식회사 | Manufacturing process for Polyarylene sulfide |
KR101780404B1 (en) * | 2010-02-01 | 2017-09-21 | 에스케이케미칼 주식회사 | Process for preparing polyarylene sulfide having lower content of iodine |
EP2634206B1 (en) * | 2010-10-29 | 2018-08-08 | Toray Industries, Inc. | Polyarylene sulfide production method and polyarylene sulfide |
EP4029900A1 (en) * | 2013-03-25 | 2022-07-20 | DIC Corporation | Method for producing polyarylene sulfide resin and polyarylene sulfide resin composition |
-
2014
- 2014-08-28 KR KR1020217042596A patent/KR102595639B1/en active IP Right Grant
- 2014-08-28 WO PCT/JP2014/072635 patent/WO2015030137A1/en active Application Filing
- 2014-08-28 KR KR1020167007667A patent/KR20160049537A/en not_active IP Right Cessation
- 2014-08-28 CN CN201480048085.9A patent/CN105493310B/en active Active
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6172489A (en) * | 1984-09-17 | 1986-04-14 | Mitsubishi Electric Corp | Picture area detecting device |
JPH08321287A (en) | 1995-03-20 | 1996-12-03 | Matsushita Electric Ind Co Ltd | Organic electrolyte battery |
JP2005078890A (en) | 2003-08-29 | 2005-03-24 | Toray Ind Inc | Polyamide resin composition for battery gasket |
JP2011029166A (en) * | 2009-06-23 | 2011-02-10 | Dic Corp | Resin composition for gasket, manufacturing method therefor, and gasket for secondary battery |
KR20110124985A (en) * | 2010-05-12 | 2011-11-18 | 에스케이케미칼주식회사 | Polyarylene sulfide having excellent formability and preparation method threrof |
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JP6233415B2 (en) | 2017-11-22 |
JPWO2015030137A1 (en) | 2017-03-02 |
CN105493310A (en) | 2016-04-13 |
KR102595639B1 (en) | 2023-10-31 |
KR20160049537A (en) | 2016-05-09 |
CN105493310B (en) | 2018-11-23 |
WO2015030137A1 (en) | 2015-03-05 |
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