KR20210144531A - Lidar device - Google Patents

Abstract

A LIDAR device of the present invention comprises: an emitter array including a first emitter and a second emitter for outputting laser beams; a detector array including a first detector for receiving a laser beam reflected from a first area and a second detector for receiving a laser beam reflected in a second region; and a processor for determining characteristics of the first area and the second area based on a histogram in which output signals of the detector array are accumulated. The processor is configured to form, to determine the characteristics of the first area and the second area, a first histogram by accumulating multiple data sets based on output signals of the first detector and a second histogram by accumulating multiple data sets based on output signals of the second detector. The first histogram includes a first data set generated based on an output signal of the first detector after a first time point when the first emitter outputs a laser beam, and a second data set generated based on an output signal of the first detector after a second time point when the first emitter outputs a laser beam. The second histogram includes a third data set generated based on an output signal of the second detector after a third time point when the second emitter outputs a laser beam, and the third time point may be between the first time point and the second time point. In accordance with an embodiment of the present invention, the LIDAR device may have an improved frame rate by controlling output timing of laser beams from emitters.

Description

LIDAR DEVICE

The present invention relates to a method for controlling an emitter array included in a lidar device, and more particularly, to a method of improving a frame rate of a lidar device by controlling a laser beam output timing of emitters included in an emitter array is about

Recently, with interest in autonomous vehicles and driverless vehicles, LiDAR (Light Detection and Ranging) has been in the spotlight. LiDAR is a device that acquires distance information around a laser using a laser, and thanks to its excellent precision and resolution, and the advantage of being able to grasp objects in three dimensions, it is being applied not only to automobiles but also to various fields such as drones and aircraft.

On the other hand, a problem for improving the frame rate of the lidar device is becoming an issue. In order to improve the accuracy of the characteristics of the object measured by the lidar device, it is important to acquire many points and frames at a predetermined time.

One object of the present invention relates to a method of controlling a laser output timing of emitters included in an emitter array.

A lidar device according to an embodiment includes an emitter array including a first emitter and a second emitter for outputting a laser beam, a first detector for receiving a laser beam reflected from the first region, and a reflection from the second region a detector array including a second detector for receiving the laser beam, and a processor for determining characteristics of the first region and the second region based on a histogram in which an output signal of the detector array is accumulated, the processor comprising: In order to determine the characteristics of the first region and the second region, a plurality of data sets based on the output signal of the first detector are accumulated, and a plurality of data based on the output signal of the first histogram and the second detector is accumulated. A second histogram is formed by accumulating the sets, and the first histogram includes a first data set generated based on an output signal of the first detector after a first time point when the first emitter outputs a laser beam and the second histogram. a second data set generated based on the output signal of the first detector after a second time point at which the first emitter outputs the laser beam, and the second histogram includes a second data set at which the second emitter outputs the laser beam A third data set generated based on the output signal of the second detector after three time points may be included, and the third time point may exist between the first time point and the second time point.

A control method of a lidar device according to another embodiment includes an emitter array for irradiating a laser beam to an object and a detector array for receiving the laser beam reflected on the object, In the control method of the lidar device for determining the characteristic of the object based on the histogram in which the data set is accumulated, the first region is moved to the first region at the first time point and the second time point through the first emitter included in the emitter array. Irradiating a laser beam, receiving the laser beam reflected from the first area through a first detector included in the detector array, and a first data set based on an output signal of the first detector after the first time point and forming a first histogram including a second data set based on the output signal of the first detector after the second time point, and a second region at a third time point through a second emitter included in the emitter array. irradiating a laser beam to the detector, receiving the laser beam reflected from the second region through a second detector included in the detector array, and a third based on the output signal of the second detector after the third time point and forming a second histogram including the data set, wherein the third time point may exist between the first time point and the second time point.

According to an embodiment of the present invention, a lidar device having an improved frame rate may be provided by controlling the laser output timing of the emitters included in the emitter array.

According to an embodiment of the present invention, there may be provided a method of controlling a lidar device in which a frame rate is improved by controlling a laser output timing of emitters included in an emitter array.

1 is a view for explaining a lidar device according to an embodiment.
2 is a diagram illustrating a lidar device according to an embodiment.
3 is a diagram illustrating a lidar device according to another exemplary embodiment.
4 is a diagram illustrating a laser output unit according to an exemplary embodiment.
5 is a diagram illustrating a VCSEL unit according to an embodiment.
6 is a diagram illustrating a VCSEL array according to an embodiment.
7 is a side view illustrating a VCSEL array and a metal contact according to an embodiment.
8 is a diagram illustrating a VCSEL array according to an embodiment.
9 is a view for explaining a lidar device according to an embodiment.
10 is a diagram for describing a collimation component according to an embodiment.
11 is a diagram for describing a collimation component according to an embodiment.
12 is a diagram for describing a collimation component according to an embodiment.
13 is a diagram for describing a collimation component according to an embodiment.
14 is a diagram for describing a steering component according to an embodiment.
15 and 16 are diagrams for explaining a steering component according to an embodiment.
17 is a diagram for describing a steering component according to an embodiment.
18 is a diagram for describing a steering component according to an embodiment.
19 is a view for explaining a metasurface according to an embodiment.
20 is a view for explaining a metasurface according to an embodiment.
21 is a view for explaining a metasurface according to an embodiment.
22 is a view for explaining a rotating multi-faceted mirror according to an embodiment.
23 is a top view for explaining a viewing angle of a rotating multi-faceted mirror in which the number of reflection surfaces is three and the upper and lower portions of the body are equilateral triangles.
24 is a top view for explaining a viewing angle of a rotating multi-faceted mirror in which the number of reflective surfaces is four and the upper and lower portions of the body have a square shape.
25 is a top view for explaining a viewing angle of a rotating multi-faceted mirror having five reflective surfaces and having upper and lower portions of a body in a regular pentagonal shape.
26 is a view for explaining an irradiating portion and a light receiving portion of the rotating multi-faceted mirror according to an embodiment.
27 is a view for explaining an optic unit according to an embodiment.
28 is a diagram for describing an optic unit according to an exemplary embodiment.
29 is a diagram for describing a meta component according to an embodiment.
30 is a diagram for describing a meta component according to another embodiment.
31 is a view for explaining a SPAD array according to an embodiment.
32 is a diagram for explaining a histogram of SPAD according to an embodiment.
33 is a diagram for explaining a SiPM according to an embodiment.
34 is a diagram for explaining a histogram of SiPM according to an embodiment.
35 is a diagram for explaining a semi-flash lidar according to an embodiment.
36 is a diagram for explaining a configuration of a semi-flesh lidar according to an exemplary embodiment.
37 is a diagram for explaining a semi-flash lidar according to another exemplary embodiment.
38 is a diagram for explaining the configuration of a semi-flesh lidar according to another exemplary embodiment.
39 is a diagram for explaining operations of an emitter array and a detector array according to an embodiment.
40 is a diagram for explaining a method of operating an emitter array and a detector array according to an embodiment.
41 is a diagram for explaining an operation sequence of an emitter array and a detector array according to an embodiment.
42 is a view for explaining a method of operating an emitter array and a detector array according to another embodiment.
43 to 46 are diagrams for explaining a method of operating an emitter array and a detector array according to another exemplary embodiment.
47 is a flowchart for explaining a method of controlling a lidar device according to an embodiment.

Since the embodiments described in the present specification are for clearly explaining the spirit of the present invention to those of ordinary skill in the art distribution to which the present invention belongs, the present invention is not limited to the embodiments described in this specification, and the present invention The scope should be construed to include modifications or variations without departing from the spirit of the present invention.

The terms used in this specification have been selected as widely used general terms as possible in consideration of the functions in the present invention, but they may vary depending on the intention, precedent, or emergence of new technology of those of ordinary skill in the art to which the present invention belongs. can However, if a specific term is defined and used with an arbitrary meaning, the meaning of the term will be separately described. Therefore, the terms used in this specification should be interpreted based on the actual meaning of the terms and the contents of the entire specification, rather than the names of simple terms.

The drawings attached to this specification are for easy explanation of the present invention, and the shapes shown in the drawings may be exaggerated as necessary to help understand the present invention, so the present invention is not limited by the drawings.

In the present specification, when it is determined that a detailed description of a known configuration or function related to the present invention may obscure the gist of the present invention, a detailed description thereof will be omitted if necessary.

According to an embodiment, an emitter array including a first emitter and a second emitter for outputting a laser beam, a first detector for receiving a laser beam reflected from the first region, and a laser beam reflected from the second region a detector array including a second detector receiving In order to determine the characteristics of the first region and the second region, a plurality of data sets based on the output signal of the first detector are accumulated to accumulate a plurality of data sets based on the output signal of the first histogram and the second detector to form a second histogram, wherein the first histogram includes a first data set generated based on an output signal of the first detector after a first time point at which the first emitter outputs a laser beam, and the first emitter includes a second data set generated based on the output signal of the first detector after a second time point at which the laser beam is output, and the second histogram is after a third time point at which the second emitter outputs the laser beam A lidar device may be provided that includes a third data set generated based on the output signal of the second detector, and the third time point is between the first time point and the second time point.

Here, the processor may determine the characteristics of the first region and the second region, respectively, based on peaks of the first histogram and the second histogram.

Here, the interval between the first time point and the third time point may be half of the interval between the first time point and the second time point.

Here, the second histogram includes a fourth data set generated based on the output signal of the second detector after a fourth time point at which the second emitter outputs the laser beam, and the second time point is the third time point It may exist between the time point and the fourth time point.

Here, the interval between the third time point and the fourth time point may be the same as the interval between the first time point and the second time point.

Here, the interval between the first time point and the third time point may be greater than half of the interval between the first time point and the second time point.

Here, the first detector may be in an off state between the third time point and the second time point, and the second detector may be in an off state between the first time point and the third time point.

Here, the emitter array may be a VCSEL (Vertical Cavity Surface Emitting Laser) array.

Here, the detector array may be a single-photon avalanche diode (SPAD) array.

Here, the lidar device irradiates the first laser beam output from the first emitter to the first region, and optics for irradiating the second laser beam output from the second emitter to the second region may include

Here, the optic may be at least one of a lens, a prism, a microprism array, and a meta surface.

Here, the first histogram includes a fourth data set generated based on the output signal of the first detector after a fourth time point when the first emitter outputs the laser beam, and the first emitter includes the first The laser beam may be output so that the interval between the viewpoint and the second viewpoint becomes the first interval, and the interval between the second viewpoint and the fourth viewpoint becomes a second interval different from the first interval.

Here, the first data set is generated based on the output signal of the first detector in a first time interval, and the second data set is generated based on the output signal of the first detector in a second time interval, The third data set may be generated based on the output signal of the second detector in a third time period, and the third time period may at least partially overlap the first time period and the second time period.

According to another embodiment, a histogram including an emitter array irradiating a laser beam to an object and a detector array receiving a laser beam reflected by the object, in which a plurality of data sets based on an output signal of the detector array are accumulated In the control method of the lidar apparatus for determining the characteristics of the object based on , receiving the laser beam reflected from the first area through a first detector included in the detector array, a first data set based on an output signal of the first detector after the first time point, and a first data set after the second time point forming a first histogram including a second data set based on an output signal of the first detector; irradiating a laser beam to a second area at a third time point through a second emitter included in the emitter array Step, receiving the laser beam reflected from the second region through a second detector included in the detector array, and a third data set based on an output signal of the second detector after the third time point A method of controlling a lidar device may be provided, including forming two histograms, wherein the third time point is between the first time point and the second time point.

According to another embodiment, there may be provided a recording medium in which a code that is read and executable by a computer in which a program is recorded to perform the above-described methods is stored.

Hereinafter, a lidar device of the present invention will be described.

)로 표현될 수 있다. 다만, 이에 한정되는 것은 아니며, 직교좌표계(X, Y, Z) 또는 원통 좌표계(r, θ, z) 등으로 표현될 수 있다.A lidar device is a device for detecting a distance from an object and a position of the object using a laser. For example, the lidar device may output a laser, and when the output laser is reflected from the object, the reflected laser may be received to measure the distance between the object and the lidar device and the position of the object. In this case, the distance and position of the object may be expressed through a coordinate system. For example, the distance and position of the object are determined in the spherical coordinate system (r, θ,

) can be expressed as However, the present invention is not limited thereto, and may be expressed in a rectangular coordinate system (X, Y, Z) or a cylindrical coordinate system (r, θ, z).

In addition, the lidar device may use a laser output from the lidar device and reflected from the object to measure the distance of the object.

The lidar device according to an embodiment may use a time of flight (TOF) of the laser from outputting the laser until it is detected in order to measure the distance of the object. For example, the LIDAR device may measure the distance to the object by using a difference between a time value based on an output time of an output laser and a time value based on a detected time of a laser reflected and sensed from the object.

In addition, the LIDAR device may measure the distance of the object by using a difference between a time value in which the output laser is detected immediately without passing through the object and a time value based on a detected time of the laser detected by being reflected from the object.

There may be a difference between the time when the lidar device sends a trigger signal for emitting the laser beam by the controller and the actual emission time, which is the time at which the laser beam is output from the actual laser output device. Since the laser beam is not actually output between the timing of the trigger signal and the actual emission timing, when included in the flight time of the laser, the precision may decrease.

In order to improve the precision in measuring the time of flight of the laser beam, the actual emission time of the laser beam may be used. However, it may be difficult to determine the actual emission timing of the laser beam. Therefore, the laser beam output from the laser output device must be delivered to the sensor unit immediately after being output, or after being output, without passing through the object.

For example, an optic is disposed above the laser output device, so that a laser beam output from the laser output device by the optic may be directly sensed by the light receiving unit without passing through the object. The optic may be a mirror, a lens, a prism, a metasurface, or the like, but is not limited thereto. The optic may be one, but may be plural.

In addition, for example, the sensor unit is disposed on the laser output device, so that the laser beam output from the laser output device can be directly sensed by the sensor unit without passing through the object. The sensor unit may be spaced apart from the laser output device at a distance of 1 mm, 1 um, 1 nm, etc., but is not limited thereto. Alternatively, the sensor unit may be disposed adjacent to the laser output device without being spaced apart from each other. An optic may exist between the sensor unit and the laser output device, but is not limited thereto.

In addition, the lidar device according to an embodiment may use a triangulation method, an interferometry method, a phase shift measurement, etc. in addition to the flight time in order to measure the distance of the object. not limited

The lidar device according to an embodiment may be installed in a vehicle. For example, the lidar device may be installed on a roof, hood, headlamp or bumper of a vehicle.

Also, a plurality of lidar devices according to an embodiment may be installed in a vehicle. For example, when two lidar devices are installed on the roof of a vehicle, one lidar device may be for observing the front and the other may be for observing the rear, but is not limited thereto. Also, for example, when two lidar devices are installed on the roof of a vehicle, one lidar device may be for observing the left side and the other lidar device may be for observing the right side, but is not limited thereto.

Also, the lidar device according to an embodiment may be installed in a vehicle. For example, when the lidar device is installed inside a vehicle, it may be for recognizing a driver's gesture while driving, but is not limited thereto. Also, for example, when the lidar device is installed inside or outside the vehicle, it may be for recognizing the driver's face, but is not limited thereto.

The lidar device according to an embodiment may be installed in an unmanned aerial vehicle. For example, the lidar device includes an unmanned aerial vehicle system (UAV system), a drone, a remote piloted vehicle (RPV), an unmanned aerial vehicle system (UAVs), an unmanned aircraft system (UAS), and a remote piloted air/aerial (RPAV). Vehicle) or RPAS (Remote Piloted Aircraft System) may be installed.

In addition, a plurality of lidar devices according to an embodiment may be installed in the unmanned aerial vehicle. For example, when two lidar devices are installed in an unmanned aerial vehicle, one lidar device may be for observing the front, and the other may be for observing the rear, but is not limited thereto. Also, for example, when two lidar devices are installed in an unmanned aerial vehicle, one lidar device may be for observing the left side and the other may be for observing the right side, but is not limited thereto.

The lidar device according to an embodiment may be installed in the robot. For example, the lidar device may be installed in personal robots, professional robots, public service robots, other industrial robots, or manufacturing robots.

In addition, a plurality of lidar devices according to an embodiment may be installed in the robot. For example, when two lidar devices are installed in the robot, one lidar device may be for observing the front, and the other may be for observing the rear, but is not limited thereto. Also, for example, when two lidar devices are installed in the robot, one lidar device may be for observing the left side, and the other may be for observing the right side, but is not limited thereto.

In addition, the lidar device according to an embodiment may be installed in the robot. For example, when the lidar device is installed in the robot, it may be for recognizing a human face, but is not limited thereto.

In addition, the lidar device according to an embodiment may be installed for industrial security. For example, lidar devices can be installed in smart factories for industrial security.

In addition, a plurality of lidar devices according to an embodiment may be installed in a smart factory for industrial security. For example, when two lidar devices are installed in a smart factory, one lidar device may be for observing the front and the other may be for observing the rear, but is not limited thereto. Also, for example, when two lidar devices are installed in a smart factory, one lidar device may be for observing the left side and the other may be for observing the right side, but is not limited thereto.

In addition, the lidar device according to an embodiment may be installed for industrial security. For example, when the lidar device is installed for industrial security, it may be for recognizing a human face, but is not limited thereto.

Hereinafter, various embodiments of the components of the lidar device will be described in detail.

1 is a view for explaining a lidar device according to an embodiment.

Referring to FIG. 1 , a lidar apparatus 1000 according to an embodiment may include a laser output unit 100 .

In this case, the laser output unit 100 according to an embodiment may emit a laser.

Also, the laser output unit 100 may include one or more laser output devices. For example, the laser output unit 100 may include a single laser output device, may include a plurality of laser output devices, and when a plurality of laser output devices are included, the plurality of laser output devices may include one laser output device. You can configure an array.

In addition, the laser output unit 100 includes a laser diode (LD), a solid-state laser, a high power laser, a light entitling diode (LED), a vertical cavity surface emitting laser (VCSEL), and an external cavity diode laser (ECDL). and the like, but is not limited thereto.

Also, the laser output unit 100 may output a laser having a predetermined wavelength. For example, the laser output unit 100 may output a laser of a 905 nm band or a laser of a 1550 nm band. Also, for example, the laser output unit 100 may output a laser having a band of 940 nm. Also, for example, the laser output unit 100 may output a laser including a plurality of wavelengths between 800 nm and 1000 nm. In addition, when the laser output unit 100 includes a plurality of laser output devices, some of the plurality of laser output devices may output a laser in a 905 nm band, and some may output a laser in a 1500 nm band.

Referring back to FIG. 1 , the lidar apparatus 1000 according to an embodiment may include an optic unit 200 .

In the description of the present invention, the optic unit may be variously expressed as a steering unit, a scan unit, and the like, but is not limited thereto.

In this case, the optic unit 200 according to an embodiment may change the flight path of the laser. For example, the optic unit 200 may change the flight path of the laser so that the laser emitted from the laser output unit 100 faces the scan area. Also, for example, the flight path of the laser may be changed so that the laser reflected from the object located in the scan area is directed toward the sensor unit.

Also, the optic unit 200 according to an embodiment may change the flight path of the laser by reflecting the laser. For example, the optic unit 200 may reflect the laser emitted from the laser output unit 100 to change the flight path of the laser so that the laser is directed toward the scan area. Also, for example, the flight path of the laser may be changed so that the laser reflected from the object located in the scan area is directed toward the sensor unit.

In addition, the optical unit 200 according to an embodiment may include various optical means to reflect the laser. For example, the optical unit 200 may include a mirror, a resonance scanner, a MEMS mirror, a voice coil motor (VCM), a polygonal mirror, a rotating mirror, or It may include, but is not limited to, a galvano mirror and the like.

Also, the optic unit 200 according to an embodiment may change the flight path of the laser by refracting the laser. For example, the optic 200 may refract the laser emitted from the laser output unit 100 to change the flight path of the laser so that the laser faces the scan area. Also, for example, the flight path of the laser may be changed so that the laser reflected from the object located in the scan area is directed toward the sensor unit.

In addition, the optic 200 according to an embodiment may include various optical means to refract the laser. For example, the optical unit 200 may include a lens, a prism, a micro lens, or a liquid lens, but is not limited thereto.

Also, the optic unit 200 according to an embodiment may change the flight path of the laser by changing the phase of the laser. For example, the optic 200 may change the phase of the laser emitted from the laser output unit 100 to change the flight path of the laser so that the laser faces the scan area. Also, for example, the flight path of the laser may be changed so that the laser reflected from the object located in the scan area is directed toward the sensor unit.

Also, the optic unit 200 according to an embodiment may include various optical means to change the phase of the laser. For example, the optical unit 200 may include an optical phased array (OPA), a meta lens, or a meta surface, but is not limited thereto.

Also, the optic 200 according to an embodiment may include one or more optical means. Also, for example, the optic 200 may include a plurality of optical means.

Referring back to FIG. 1 , the lidar device 100 according to an embodiment may include a sensor unit 300 .

The sensor unit may be variously expressed as a light receiving unit, a receiving unit, etc. in the description of the present invention, but is not limited thereto.

In this case, the sensor unit 300 according to an embodiment may detect a laser. For example, the sensor unit may detect a laser reflected from an object located within the scan area.

Also, the sensor unit 300 according to an embodiment may receive a laser and may generate an electrical signal based on the received laser. For example, the sensor unit 300 may receive a laser reflected from an object positioned within the scan area, and may generate an electrical signal based thereon. Also, for example, the sensor unit 300 may receive a laser reflected from an object located in the scan area through one or more optical means, and may generate an electric signal based on the laser beam reflected from the object located within the scan area. Also, for example, the sensor unit 300 may receive a laser reflected from an object located in the scan area through an optical filter, and may generate an electrical signal based on the received laser.

Also, the sensor unit 300 according to an embodiment may detect a laser based on the generated electrical signal. For example, the sensor unit 300 may detect a laser by comparing a predetermined threshold value with the magnitude of the generated electrical signal, but is not limited thereto. Also, for example, the sensor unit 300 may detect a laser by comparing a predetermined threshold value with a rising edge, a falling edge, or a median value of a rising edge and a falling edge of the generated electrical signal, but is not limited thereto. Also, for example, the sensor unit 300 may detect a laser by comparing a predetermined threshold value with a peak value of the generated electrical signal, but is not limited thereto.

Also, the sensor unit 300 according to an embodiment may include various sensor elements. For example, the sensor unit 300 includes a PN photodiode, a phototransistor, a PIN photodiode, an avalanche photodiode (APD), a single-photon avalanche diode (SPAD), a silicon photomultipliers (SiPM), a time to digital converter (TDC), Comparator, complementary metal-oxide-semiconductor (CMOS), or charge coupled device (CCD) may be included, but is not limited thereto.

For example, the sensor unit 300 may be a 2D SPAD array, but is not limited thereto. Also, for example, the SPAD array may include a plurality of SPAD units, and the SPAD unit may include a plurality of SPADs (pixels).

In this case, the sensor unit 300 may stack N histograms using the 2D SPAD array. For example, the sensor unit 300 may detect a light reception time of a laser beam reflected from the object and received by using the histogram.

For example, the sensor unit 300 may use the histogram to detect a peak point of the histogram as a light reception time of a laser beam reflected and received from the object, but is not limited thereto. Also, for example, the sensor unit 300 may use the histogram to detect a point at which the histogram is equal to or greater than a predetermined value as a light reception time of the laser beam reflected from the object, but is not limited thereto.

Also, the sensor unit 300 according to an embodiment may include one or more sensor elements. For example, the sensor unit 300 may include a single sensor element or a plurality of sensor elements.

Also, the sensor unit 300 according to an embodiment may include one or more optical elements. For example, the sensor unit 300 may include an aperture, a micro lens, a converging lens, or a diffuser, but is not limited thereto.

Also, the sensor unit 300 according to an embodiment may include one or more optical filters. The sensor unit 300 may receive the laser reflected from the object through an optical filter. For example, the sensor unit 300 may include a band pass filter, a dichroic filter, a guided-mode resonance filter, a polarizer, a wedge filter, and the like, but is not limited thereto.

Referring back to FIG. 1 , the lidar apparatus 1000 according to an embodiment may include a controller 400 .

The control unit may be variously expressed as a controller or the like in the description for the present invention, but is not limited thereto.

In this case, the controller 400 according to an embodiment may control the operation of the laser output unit 100 , the optic unit 200 , or the sensor unit 300 .

In addition, the control unit 400 according to an embodiment may control the operation of the laser output unit 100 .

For example, the controller 400 may control the output timing of the laser output from the laser output unit 100 . Also, the controller 400 may control the power of the laser output from the laser output unit 100 . Also, the controller 400 may control a pulse width of the laser output from the laser output unit 100 . Also, the control unit 400 may control the cycle of the laser output from the laser output unit 100 . Also, when the laser output unit 100 includes a plurality of laser output devices, the controller 400 may control the laser output unit 100 to operate some of the plurality of laser output devices.

Also, the control unit 400 according to an embodiment may control the operation of the optic unit 200 .

For example, the control unit 400 may control the operating speed of the optic unit 200 . Specifically, when the optic unit 200 includes a rotating mirror, the rotation speed of the rotating mirror can be controlled, and when the optic unit 200 includes a MEMS mirror, the repetition period of the MEMS mirror can be controlled. However, the present invention is not limited thereto.

Also, for example, the control unit 400 may control the degree of operation of the optic unit 200 . Specifically, when the optical unit 200 includes the MEMS mirror, the operating angle of the MEMS mirror may be controlled, but the present invention is not limited thereto.

In addition, the control unit 400 according to an embodiment may control the operation of the sensor unit 300 .

For example, the control unit 400 may control the sensitivity of the sensor unit 300 . Specifically, the controller 400 may control the sensitivity of the sensor unit 300 by adjusting a predetermined threshold, but is not limited thereto.

Also, for example, the control unit 400 may control the operation of the sensor unit 300 . Specifically, the control unit 400 may control On/Off of the sensor unit 300 , and when the control unit 300 includes a plurality of sensor elements, the sensor unit operates so that some of the plurality of sensor elements are operated. The operation of 300 can be controlled.

Also, the controller 400 according to an exemplary embodiment may determine a distance from the lidar device 1000 to an object located in the scan area based on the laser sensed by the sensor unit 300 .

For example, the controller 400 may determine the distance to the object located in the scan area based on the time when the laser is output from the laser output unit 100 and the time when the laser is detected by the sensor unit 300 . . In addition, for example, the control unit 400 outputs the laser from the laser output unit 100 and immediately detects the laser by the sensor unit 300 without passing through the object and the laser reflected from the object is detected by the sensor unit 300 . The distance to the object located in the scan area may be determined based on the detected time point.

There may be a difference between a time when the lidar device 1000 sends a trigger signal for emitting a laser beam by the controller 400 and an actual emission time, which is a time at which the laser beam is output from the actual laser output device. Since the laser beam is not actually output between the timing of the trigger signal and the actual emission timing, when included in the flight time of the laser, the precision may decrease.

In order to improve the precision in measuring the time of flight of the laser beam, the actual emission time of the laser beam may be used. However, it may be difficult to determine the actual emission timing of the laser beam. Therefore, the laser beam output from the laser output device must be delivered to the sensor unit 300 immediately after being output or after being output without passing through the object.

For example, an optic is disposed above the laser output device, so that a laser beam output from the laser output device by the optic can be directly sensed by the sensor unit 300 without passing through an object. The optic may be a mirror, a lens, a prism, a metasurface, or the like, but is not limited thereto. The optic may be one, but may be plural.

Also, for example, since the sensor unit 300 is disposed on the laser output device, the laser beam output from the laser output device may be directly sensed by the sensor unit 300 without passing through the object. The sensor unit 300 may be spaced apart from the laser output device at a distance of 1 mm, 1 um, 1 nm, etc., but is not limited thereto. Alternatively, the sensor unit 300 may be disposed adjacent to the laser output device without being spaced apart. An optic may exist between the sensor unit 300 and the laser output device, but is not limited thereto.

Specifically, the laser output unit 100 may output a laser, the control unit 400 may obtain a point in time at which the laser is output from the laser output unit 100 , and the laser output from the laser output unit 100 may be obtained. is reflected from the object located in the scan area, the sensor unit 300 may detect the laser reflected from the object, and the control unit 400 may obtain a time point at which the laser is detected by the sensor unit 300, The controller 400 may determine the distance to the object located in the scan area based on the laser output time and the detection time.

In addition, specifically, the laser output unit 100 may output a laser, and the laser output from the laser output unit 100 may be directly detected by the sensor unit 300 without passing through an object located in the scan area. Also, the controller 400 may acquire a point in time at which the laser that has not passed through the object is sensed. When the laser output from the laser output unit 100 is reflected from the object located within the scan area, the sensor unit 300 may detect the laser reflected from the object, and the control unit 400 may detect the laser from the sensor unit 300 . may be acquired, and the controller 400 may determine the distance to the object located in the scan area based on the detection time of the laser that has not passed through the object and the detection time of the laser reflected from the object.

2 is a diagram illustrating a lidar device according to an embodiment.

Referring to FIG. 2 , a lidar device 1050 according to an embodiment may include a laser output unit 100 , an optic unit 200 , and a sensor unit 300 .

Since the laser output unit 100 , the optic unit 200 , and the sensor unit 300 have been described with reference to FIG. 1 , a detailed description thereof will be omitted below.

The laser beam output from the laser output unit 100 may pass through the optic unit 200 . Also, the laser beam passing through the optic unit 200 may be irradiated toward the object 500 . Also, the laser beam reflected from the object 500 may be received by the sensor unit 300 .

3 is a diagram illustrating a lidar device according to another exemplary embodiment.

Referring to FIG. 3 , a lidar device 1150 according to another embodiment may include a laser output unit 100 , an optic unit 200 , and a sensor unit 300 .

Since the laser output unit 100 , the optic unit 200 , and the sensor unit 300 have been described with reference to FIG. 1 , a detailed description thereof will be omitted below.

The laser beam output from the laser output unit 100 may pass through the optic unit 200 . Also, the laser beam passing through the optic unit 200 may be irradiated toward the object 500 . Also, the laser beam reflected from the object 500 may pass through the optic unit 200 again.

In this case, the optic part through which the laser beam is rough before being irradiated to the object and the optic part through which the laser beam reflected on the object passes may be physically the same, but may be physically different optics.

The laser beam passing through the optic unit 200 may be received by the sensor unit 300 .

Hereinafter, various embodiments of the laser output unit including the VCSEL will be described in detail.

4 is a diagram illustrating a laser output unit according to an exemplary embodiment.

Referring to FIG. 4 , the laser output unit 100 according to an embodiment may include a VCSEL emitter 110 .

VCSEL emitter 110 according to an embodiment is an upper metal contact 10, an upper DBR layer (20, upper Distributed Bragg reflector), an active layer (40, quantum well), a lower DBR layer (30, lower Distributed Bragg reflector) , a substrate 50 , and a lower metal contact 60 .

In addition, the VCSEL emitter 110 according to an embodiment may emit a laser beam vertically from the top surface. For example, the VCSEL emitter 110 may emit a laser beam in a direction perpendicular to the surface of the upper metal contact 10 . Also, for example, the VCSEL emitter 110 may emit a laser beam perpendicular to the acvite layer 40 .

The VCSEL emitter 110 according to an embodiment may include an upper DBR layer 20 and a lower DBR layer 30 .

The upper DBR layer 20 and the lower DBR layer 30 according to an embodiment may include a plurality of reflective layers. For example, in the plurality of reflective layers, a reflective layer having a high reflectance and a reflective layer having a low reflectance may be alternately disposed. At this time, the thickness of the plurality of reflective layers may be a quarter of the wavelength of the laser emitted from the VCSEL emitter (110).

In addition, the upper DBR layer 20 and the lower DBR layer 30 according to an embodiment may be doped with p-type and n-type doping. For example, the upper DBR layer 20 may be doped p-type, and the lower DBR layer 30 may be doped n-type. Alternatively, for example, the upper DBR layer 20 may be n-type doped, and the lower DBR layer 30 may be doped p-type.

In addition, according to an embodiment, the substrate 50 may be disposed between the lower DBR layer 30 and the lower metal contact 60 . When the lower DBR layer 30 is doped with p-type, the substrate 50 may also become a p-type substrate, and when the lower DBR layer 30 is doped with n-type, the substrate 50 may also become an n-type substrate. have.

The VCSEL emitter 110 according to an embodiment may include an active layer 40 .

The active layer 40 according to an embodiment may be disposed between the upper DBR layer 20 and the lower DBR layer 30 .

The active layer 40 according to an embodiment may include a plurality of quantum wells for generating a laser beam. The active layer 40 may emit a laser beam.

The VCSEL emitter 110 according to an embodiment may include a metal contact for electrical connection to a power source and the like. For example, the VCSEL emitter 110 may include an upper metal contact 10 and a lower metal contact 60 .

In addition, the VCSEL emitter 110 according to an embodiment may be electrically connected to the upper DBR layer 20 and the lower DBR layer 30 through a metal contact.

For example, when the upper DBR layer 20 is doped with p-type and the lower DBR layer 30 is doped with n-type, p-type power is supplied to the upper metal contact 10 to form the upper DBR layer 20 and It is electrically connected, and n-type power is supplied to the lower metal contact 60 to be electrically connected to the lower DBR layer 30 .

Also, for example, when the upper DBR layer 20 is n-type doped and the lower DBR layer 30 is p-type doped, n-type power is supplied to the upper metal contact 10 to supply the upper DBR layer. It is electrically connected to the layer 20 , and p-type power is supplied to the lower metal contact 60 to be electrically connected to the lower DBR layer 30 .

The VCSEL emitter 110 according to an embodiment may include an oxidation area. The oxidation area may be disposed on top of the active layer.

The oxidation area according to an embodiment may have insulating properties. For example, electrical flow may be restricted in the oxidation area. For example, electrical connections may be restricted in the oxidation area.

Also, the oxidation area according to an embodiment may serve as an aperture. Specifically, since the oxidation area has insulating properties, a beam generated from the active layer 40 may be emitted only from a portion other than the oxidation area.

The laser output unit according to an embodiment may include a plurality of VCSEL emitters 110 .

In addition, the laser output unit according to an embodiment may turn on a plurality of VCSEL emitters 110 at once, or may be individually turned on.

The laser output unit according to an embodiment may emit laser beams of various wavelengths. For example, the laser output unit may emit a laser beam having a wavelength of 905 nm. Also, for example, the laser output unit may emit a laser beam having a wavelength of 1550 nm.

In addition, the output wavelength of the laser output unit according to an embodiment may be changed according to the surrounding environment. For example, as the temperature of the surrounding environment increases, the output wavelength of the laser output unit may also increase. Or, for example, the laser output unit may decrease the output wavelength as the temperature of the surrounding environment decreases. The ambient environment may include, but is not limited to, temperature, humidity, pressure, concentration of dust, ambient light, altitude, gravity, acceleration, and the like.

The laser output unit may emit a laser beam in a direction perpendicular to the support surface. Alternatively, the laser output unit may emit a laser beam in a direction perpendicular to the emission surface.

5 is a diagram illustrating a VCSEL unit according to an embodiment.

Referring to FIG. 5 , the laser output unit 100 according to an embodiment may include a VCSEL unit 130 .

The VCSEL unit 130 according to an embodiment may include a plurality of VCSEL emitters 110 . For example, the plurality of VCSEL emitters 110 may be arranged in a honeycomb structure, but is not limited thereto. In this case, 7 VCSEL emitters 110 may be included in one honeycomb structure, but the present invention is not limited thereto.

In addition, all of the VCSEL emitters 110 included in the VCSEL unit 130 according to an embodiment may be irradiated in the same direction. For example, 400 VCSEL emitters 110 included in the VCSEL unit 130 may all be irradiated in the same direction.

In addition, the VCSEL unit 130 may be distinguished by the irradiation direction of the output laser beam. For example, when all of the N VCSEL emitters 110 output a laser beam in a first direction and all of the M VCSEL emitters 110 output a laser beam in a second direction, the N VCSEL emitters 110 ) may be distinguished as a first VCSEL unit, and the M VCSEL emitters 110 may be distinguished as a second VCSEL unit.

In addition, the VCSEL unit 130 according to an embodiment may include a metal contact. For example, the VCSEL unit 130 may include a p-type metal and an n-type metal. Also, for example, a plurality of VCSEL emitters 110 included in the VCSEL unit 130 may share a metal contact.

6 is a diagram illustrating a VCSEL array according to an embodiment.

Referring to FIG. 6 , the laser output unit 100 according to an embodiment may include a VCSEL array 150 . 6 shows an 8X8 VCSEL array, but is not limited thereto.

The VCSEL array 150 according to an embodiment may include a plurality of VCSEL units 130 . For example, the plurality of VCSEL units 130 may be arranged in a matrix structure, but is not limited thereto.

For example, the plurality of VCSEL units 130 may be an N×N matrix, but is not limited thereto. Also, for example, the plurality of VCSEL units 130 may be an N×M matrix, but is not limited thereto.

Also, the VCSEL array 150 according to an embodiment may include a metal contact. For example, the VCSEL array 150 may include a p-type metal and an n-type metal. In this case, the plurality of VCSEL units 130 may share a metal contact, but may each have an independent metal contact without sharing a metal contact.

7 is a side view illustrating a VCSEL array and a metal contact according to an embodiment.

Referring to FIG. 7 , the laser output unit 100 according to an embodiment may include a VCSEL array 151 . 6 illustrates a 4X4 VCSEL array, but is not limited thereto. The VCSEL array 151 may include a first metal contact 11 , a wire 12 , a second metal contact 13 , and a VCSEL unit 130 .

The VCSEL array 151 according to an embodiment may include a plurality of VCSEL units 130 arranged in a matrix structure. In this case, each of the plurality of VCSEL units 130 may be independently connected to the metal contact. For example, the plurality of VCSEL units 130 share the first metal contact 11 and are connected together to the first metal contact, and the second metal contact 13 is not shared so that the second metal contact is independently connected to each other. can Also, for example, the plurality of VCSEL units 130 may be directly connected to the first metal contact 11 and may be connected to the second metal contact through a wire 12 . In this case, the number of required wires 12 may be the same as the number of the plurality of VCSEL units 130 . For example, when the VCSEL array 151 includes a plurality of VCSEL units 130 arranged in an N×M matrix structure, the number of wires 12 may be N×M.

Also, the first metal contact 11 and the second metal contact 13 according to an embodiment may be different from each other. For example, the first metal contact 11 may be an n-type metal, and the second metal contact 13 may be a p-type metal. Conversely, the first metal contact 11 may be a p-type metal, and the second metal contact 13 may be an n-type metal.

8 is a diagram illustrating a VCSEL array according to an embodiment.

Referring to FIG. 8 , the laser output unit 100 according to an embodiment may include a VCSEL array 153 . 7 shows a 4X4 VCSEL array, but is not limited thereto.

The VCSEL array 153 according to an embodiment may include a plurality of VCSEL units 130 arranged in a matrix structure. In this case, the plurality of VCSEL units 130 may share a metal contact, but may have an independent metal contact without sharing a metal contact. For example, the plurality of VCSEL units 130 may share the first metal contact 15 in a row unit. Also, for example, the plurality of VCSEL units 130 may share the second metal contact 17 in units of columns.

Also, the first metal contact 15 and the second metal contact 17 according to an embodiment may be different from each other. For example, the first metal contact 15 may be an n-type metal, and the second metal contact 17 may be a p-type metal. Conversely, the first metal contact 15 may be a p-type metal, and the second metal contact 17 may be an n-type metal.

In addition, the VCSEL unit 130 according to an embodiment may be electrically connected to the first metal contact 15 and the second metal contact 17 through the wire 12 .

The VCSEL array 153 according to an embodiment may operate in an addressable manner. For example, a plurality of VCSEL units 130 included in the VCSEL array 153 may operate independently of other VCSEL units.

For example, when power is supplied to the first metal contact 15 in one row and the second metal contact 17 in the first column, the VCSEL unit in one row and one column may operate. Also, for example, when power is supplied to the first metal contact 15 in row 1 and the second metal contact 17 in columns 1 and 3, the VCSEL unit in row 1, column 1 and the VCSEL unit in row 1 and column 3 operate. can

According to an embodiment, the VCSEL units 130 included in the VCSEL array 153 may operate with a predetermined pattern.

For example, after the operation of the VCSEL unit in 1 row and 1 column, the VCSEL unit in 1 row 2 column, VCSEL unit in 1 row 3 column, VCSEL unit in 1 row 4 column, VCSEL unit in 2 row 1 column, VCSEL unit in 2 row 2 column, etc. It can have a certain pattern that operates and ends with a VCSEL unit of 4 rows and 4 columns.

Also, for example, after the VCSEL unit operation in 1 row and 1 column, VCSEL unit in 2 rows and 1 column, VCSEL unit in 3 rows and 1 column, VCSEL unit in 4 rows and 1 column, VCSEL unit in 1 row and 2 columns, VCSEL unit in 2 rows and 2 columns, etc. It operates as is, and can have a certain pattern with the last VCSEL unit in 4 rows and 4 columns.

According to another embodiment, the VCSEL units 130 included in the VCSEL array 153 may operate with an irregular pattern. Alternatively, the VCSEL units 130 included in the VCSEL array 153 may operate without a pattern.

For example, the VCSEL units 130 may operate randomly. When the VCSEL units 130 operate randomly, interference between the VCSEL units 130 can be prevented.

There may be various methods for directing the laser beam emitted from the laser output unit to the object. Among them, the flash method is a method in which a laser beam is spread to an object by divergence of the laser beam. In the flash method, a high-power laser beam is required to direct the laser beam to a distant object. A high-power laser beam needs to apply a high voltage, so the power is increased. In addition, since it can damage human eyes, there is a limit to the distance that a lidar using a flash method can measure.

The scanning method is a method of directing a laser beam emitted from a laser output unit in a specific direction. By directing the scanning laser beam in a specific direction, laser power loss can be reduced. Since the laser power loss can be reduced, compared to the flash method, the scanning method has a longer range that the lidar can measure even with the same laser power. In addition, since the scanning method has lower laser power for measuring the same distance compared to the flash method, stability to the human eye may be improved.

Laser beam scanning can be done with collimation and steering. For example, the laser beam scanning may be performed by collimating the laser beam and then steering the laser beam. Also, for example, laser beam scanning may be performed in a manner of performing collimation after steering.

Hereinafter, various embodiments of an optical unit including a beam collimation and steering component (BCSC) will be described in detail.

9 is a view for explaining a lidar device according to an embodiment.

Referring to FIG. 9 , the lidar device 1200 according to an embodiment may include a laser output unit 100 and an optic unit. In this case, the optic unit may include the BCSC 250 . Also, the BCSC 250 may include a collimation component 210 and a steering component 230 .

BCSC 250 according to an embodiment may be configured as follows. The collimation component 210 may first collimate the laser beam, and the collimated laser beam may be steered via the steering component 230 . Alternatively, the steering component 230 may first steer the laser beam, and the steered laser beam may be collimated via the collimation component 210 .

In addition, the optical path of the lidar device 1200 according to an embodiment is as follows. The laser beam emitted from the laser output unit 100 may be directed to the BCSC 250 . The laser beam incident on the BCSC 250 may be collimated by the collimation component 210 and directed to the steering component 230 . A laser beam incident on the steering component 230 may be steered and directed toward an object. The laser beam incident on the object 500 may be reflected by the object 500 and may be directed toward the sensor unit.

Although the laser beam emitted from the laser output unit has directivity, there may be some degree of divergence as the laser beam goes straight. Due to such divergence, the laser beam emitted from the laser output unit may not be incident on the object, or an amount of the laser beam emitted from the laser output unit may be very small.

When the degree of divergence of the laser beam is large, the amount of the laser beam incident on the object is reduced, and the amount of the laser beam reflected from the object and directed to the sensor unit is also very reduced due to the divergence, so that a desired measurement result may not be obtained. Alternatively, when the degree of divergence of the laser beam is large, a distance that the LIDAR device can measure is reduced, and thus a distant object may not be measured.

Therefore, the efficiency of the lidar device may be improved as the degree of divergence of the laser beam emitted from the laser output unit is reduced before the laser beam is incident on the object. The collimation component of the present invention can reduce the degree of divergence of the laser beam. The laser beam passing through the collimation component may become a collimated light. Alternatively, the laser beam passing through the collimation component may have a divergence of 0.4 degrees to 1 degree.

When the degree of divergence of the laser beam is reduced, the amount of light incident to the object may be increased. When the amount of light incident on the object is increased, the amount of light reflected from the object is also increased, so that the laser beam can be efficiently received. Also, when the amount of light incident on the object is increased, it may be possible to measure an object at a greater distance with the same laser beam power as compared to before collimation of the laser beam.

10 is a diagram for describing a collimation component according to an embodiment.

Referring to FIG. 10 , the collimation component 210 according to an embodiment may be disposed in a direction in which a laser beam emitted from the laser output unit 100 is directed. The collimation component 210 may adjust the degree of divergence of the laser beam. The collimation component 210 may reduce the degree of divergence of the laser beam.

For example, the divergence angle of the laser beam emitted from the laser output unit 100 may be 16 to 30 degrees. In this case, after the laser beam emitted from the laser output unit 100 passes through the collimation component 210 , the divergence angle of the laser beam may be 0.4 degrees to 1 degree.

11 is a diagram for describing a collimation component according to an embodiment.

Referring to FIG. 11 , the collimation component 210 according to an embodiment may include a plurality of micro lenses 211 and a substrate 213 .

The microlens may have a diameter of millimeters (mm), micrometers (um), nanometers (nm), picometers (pm), and the like, but is not limited thereto.

A plurality of micro lenses 211 according to an embodiment may be disposed on the substrate 213 . The plurality of micro lenses 211 and the substrate 213 may be disposed on the plurality of VCSEL emitters 110 . At this time, one of the plurality of micro lenses 211 may be disposed to correspond to one of the plurality of VCSEL emitters 110 , but is not limited thereto.

In addition, the plurality of micro lenses 211 according to an embodiment may collimate the laser beams emitted from the plurality of VCSEL emitters 110 . In this case, the laser beam emitted from one of the plurality of VCSEL emitters 110 may be collimated by one of the plurality of micro lenses 211 . For example, the divergence angle of the laser beam emitted from one of the plurality of VCSEL emitters 110 may be reduced after passing through one of the plurality of micro lenses 211 .

In addition, the plurality of micro lenses according to an embodiment may be a refractive index distribution lens, a micro-curved lens, an array lens, a Fresnel lens, or the like.

In addition, the plurality of microlenses according to an embodiment may be manufactured by a method such as molding, ion exchange, diffusion polymerization, sputtering, and etching.

In addition, the plurality of micro lenses according to an embodiment may have a diameter of 130um to 150um. For example, a diameter of the plurality of micro lenses may be 140 μm. In addition, the plurality of micro lenses may have a thickness of 400um to 600um. For example, the thickness of the plurality of micro lenses may be 500 μm.

12 is a diagram for describing a collimation component according to an embodiment.

Referring to FIG. 12 , the collimation component 210 according to an embodiment may include a plurality of micro lenses 211 and a substrate 213 .

A plurality of micro lenses 211 according to an embodiment may be disposed on the substrate 213 . For example, the plurality of micro lenses 211 may be disposed on the front surface and the rear surface of the substrate 213 . In this case, the optical axis of the microlens 211 disposed on the surface of the substrate 213 and the microlens 211 disposed on the rear surface of the substrate 213 may coincide.

13 is a diagram for describing a collimation component according to an embodiment.

Referring to FIG. 13 , a collimation component according to an embodiment may include a metasurface 220 .

The metasurface 220 according to an embodiment may include a plurality of nanopillars 221 . For example, the plurality of nanopillars 221 may be disposed on one side of the metasurface 220 . Also, for example, a plurality of nanopillars 221 may be disposed on both sides of the metasurface 220 .

The plurality of nanopillars 221 may have a sub-wavelength dimension. For example, an interval between the plurality of nanopillars 221 may be smaller than a wavelength of a laser beam emitted from the laser output unit 100 . Alternatively, the width, diameter, and height of the nanopillars 221 may be smaller than the length of the wavelength of the laser beam.

The meta surface 220 may refract the laser beam by adjusting the phase of the laser beam emitted from the laser output unit 100 . The meta surface 220 may refract the laser beam output from the laser output unit 100 in various directions.

The meta surface 220 may collimate the laser beam emitted from the laser output unit 100 . In addition, the meta surface 220 may reduce the angle of divergence of the laser beam emitted from the laser output unit 100 . For example, the diverging angle of the laser beam emitted from the laser output unit 100 may be 15 to 30 degrees, and the diverging angle of the laser beam after passing through the meta surface 220 may be 0.4 to 1.8 degrees.

The metasurface 220 may be disposed on the laser output unit 100 . For example, the metasurface 220 may be disposed on the emitting surface side of the laser output unit 100 .

Alternatively, the metasurface 220 may be deposited on the laser output unit 100 . The plurality of nanopillars 221 may be formed on the laser output unit 100 . The plurality of nanopillars 221 may form various nanopatterns on the laser output unit 100 .

The nanopillars 221 may have various shapes. For example, the nanopillar 221 may have a shape such as a cylinder, a polygonal pillar, a cone, or a polygonal pyramid. In addition, the nanopillars 221 may have an irregular shape.

14 is a diagram for describing a steering component according to an embodiment.

Referring to FIG. 14 , the steering component 230 according to an embodiment may be disposed in a direction in which a laser beam emitted from the laser output unit 100 is directed. The steering component 230 may adjust the direction the laser beam is directed. The steering component 230 may adjust an angle between the optical axis of the laser light source and the laser beam.

For example, the steering component 230 may steer the laser beam such that an angle between the optical axis of the laser light source and the laser beam is 0° to 30°. Or, for example, the steering component 230 may steer the laser beam such that an angle between the optical axis of the laser light source and the laser beam is -30 degrees to 0 degrees.

15 and 16 are diagrams for explaining a steering component according to an embodiment.

15 and 16 , the steering component 231 according to an embodiment may include a plurality of micro lenses 231 and a substrate 233 .

A plurality of micro lenses 232 according to an embodiment may be disposed on the substrate 233 . The plurality of micro lenses 232 and the substrate 233 may be disposed on the plurality of VCSEL emitters 110 . In this case, one of the plurality of micro lenses 232 may be disposed to correspond to one of the plurality of VCSEL emitters 110 , but is not limited thereto.

In addition, the plurality of micro lenses 232 according to an embodiment may steer the laser beams emitted from the plurality of VCSEL emitters 110 . In this case, the laser beam emitted from one of the plurality of VCSEL emitters 110 may be steered by one of the plurality of micro lenses 232 .

In this case, the optical axis of the micro lens 232 and the optical axis of the VCSEL emitter 110 may not coincide. For example, referring to FIG. 14 , when the optical axis of the VCSEL emitter 110 is to the right of the optical axis of the micro lens 232 , the laser beam emitted from the VCSEL emitter 110 and passing through the micro lens 232 is left can be directed to Also, for example, referring to FIG. 15 , when the optical axis of the VCSEL emitter 110 is to the left of the optical axis of the micro lens 232 , the laser beam emitted from the VCSEL emitter 110 and passed through the micro lens 232 . can point to the right.

In addition, as the distance between the optical axis of the microlens 232 and the optical axis of the VCSEL emitter 110 increases, the degree of steering of the laser beam may increase. For example, when the distance between the optical axis of the microlens 232 and the optical axis of the VCSEL emitter 110 is 1um, the angle between the optical axis of the laser light source and the laser beam may be greater when the distance is 10um.

17 is a diagram for describing a steering component according to an embodiment.

Referring to FIG. 17 , the steering component 234 according to one embodiment may include a plurality of micro prisms 235 and a substrate 236 .

A plurality of micro-prisms 235 according to an embodiment may be disposed on the substrate 236 . The plurality of micro-prisms 235 and the substrate 236 may be disposed on the plurality of VCSEL emitters 110 . At this time, the plurality of micro-prisms 235 may be disposed to correspond to one of the plurality of VCSEL emitters 110 , but is not limited thereto.

In addition, the plurality of micro-prisms 235 according to an embodiment may steer the laser beams emitted from the plurality of VCSEL emitters 110 . For example, the plurality of micro-prisms 235 may change the angle between the optical axis of the laser light source and the laser beam.

At this time, as the angle of the micro-prism 235 decreases, the angle between the optical axis of the laser light source and the laser beam increases. For example, when the angle of the micro prism 235 is 0.05 degrees, the laser beam is steered by 35 degrees, and when the angle of the micro prism 235 is 0.25 degrees, the laser beam is steered by 15 degrees.

In addition, the plurality of micro prisms 235 according to an embodiment may be a Porro prism, an Amici roof prism, a Pentaprism, a Dove prism, a Retroreflector prism, or the like. In addition, the plurality of micro-prisms 235 may be made of glass, plastic, fluorite, or the like. In addition, the plurality of micro-prisms 235 may be manufactured by molding, etching, or the like.

In this case, the surface of the micro-prism 235 may be smoothed through a polishing process to prevent diffuse reflection due to surface roughness.

According to an embodiment, the micro prisms 235 may be disposed on both surfaces of the substrate 236 . For example, the micro prisms disposed on the first surface of the substrate 236 steer the laser beam along a first axis, and the micro prisms disposed on the second surface of the substrate 236 steer the laser beam along the second axis. can do it

18 is a diagram for describing a steering component according to an embodiment.

Referring to FIG. 18 , a steering component according to one embodiment may include a metasurface 240 .

The metasurface 240 may include a plurality of nanopillars 241 . For example, the plurality of nanopillars 241 may be disposed on one side of the metasurface 240 . Also, for example, a plurality of nanopillars 241 may be disposed on both sides of the metasurface 240 .

The meta surface 240 may refract the laser beam by adjusting the phase of the laser beam emitted from the laser output unit 100 .

The metasurface 240 may be disposed on the laser output unit 100 . For example, the meta surface 240 may be disposed on the emitting surface side of the laser output unit 100 .

Alternatively, the metasurface 240 may be deposited on the laser output unit 100 . The plurality of nanopillars 241 may be formed on the laser output unit 100 . The plurality of nanopillars 241 may form various nanopatterns on the laser output unit 100 .

The nanopillars 241 may have various shapes. For example, the nano-pillar 241 may have a shape such as a cylinder, a polygonal pillar, a cone, or a polygonal pyramid. In addition, the nanopillars 241 may have an irregular shape.

The plurality of nanopillars 241 may form various nanopatterns. The metasurface 240 may steer the laser beam emitted from the laser output unit 100 based on the nanopattern.

The nanopillars 241 may form nanopatterns based on various characteristics. The characteristics may include the width (Width, hereinafter W), the spacing (Pitch, hereinafter P), the height (Height, hereinafter H) of the nanopillar 241, and the number per unit length.

Hereinafter, nanopatterns formed based on various characteristics and steering of a laser beam according to the nanopatterns will be described.

19 is a diagram for explaining a metasurface according to an embodiment.

Referring to FIG. 19 , the metasurface 240 according to an embodiment may include a plurality of nanopillars 241 having different widths (W).

The plurality of nanopillars 241 may form a nanopattern based on the width W thereof. For example, the plurality of nanopillars 241 may be arranged such that their widths W1, W2, and W3 increase in one direction. In this case, the laser beam emitted from the laser output unit 100 may be steered in a direction in which the width W of the nanopillar 241 increases.

For example, the metasurface 240 has a first nanopillar 243 having a first width W1 , a second nanopillar 245 having a second width W2 , and a third width W3 . A third nanopillar 247 may be included. The first width W1 may be greater than the second width W2 and the third width W3 . The second width W2 may be greater than the third width W3 . That is, the width W of the nano-pillar 241 may decrease from the first nano-pillar 243 toward the third nano-pillar 247 . At this time, when the laser beam emitted from the laser output unit 100 passes through the meta surface 240 , the first nano-pillar 243 is emitted from the first direction and the third nano-pillar 247 from the laser output unit 100 . ) can be steered in a direction between the second direction.

Meanwhile, the steering angle θ of the laser beam may vary according to an increase/decrease rate of the width W of the nanopillar 241 . Here, the rate of increase/decrease in the width W of the nanopillars 241 may mean a numerical value representing the degree of increase/decrease in the width W of a plurality of adjacent nanopillars 241 on average.

Based on the difference between the first width W1 and the second width W2 and the difference between the second width W2 and the third width W3, the increase/decrease rate of the width W of the nanopillar 241 is to be calculated. can

The difference between the first width W1 and the second width W2 may be different from the difference between the second width W2 and the third width W3 .

The steering angle θ of the laser beam may vary depending on the width W of the nanopillar 241 .

Specifically, the steering angle θ may increase as the increase/decrease rate of the width W of the nanopillar 241 increases.

For example, the nanopillars 241 may form a first pattern having a first increase/decrease rate based on the width W thereof. In addition, the nano-pillars 241 may form a second pattern having a second increase/decrease rate smaller than the first increase/decrease rate based on the width W thereof.

In this case, the first steering angle by the first pattern may be greater than the second steering angle by the second pattern.

Meanwhile, the range of the steering angle θ may be -90 degrees to 90 degrees.

20 is a view for explaining a metasurface according to an embodiment.

Referring to FIG. 20 , the metasurface 240 according to an embodiment may include a plurality of nanopillars 241 having different spacing P between adjacent nanopillars 241 .

The plurality of nanopillars 241 may form a nanopattern based on a change in the spacing P between adjacent nanopillars 241 . The metasurface 240 may steer the laser beam emitted from the laser output unit 100 based on a nanopattern formed based on a change in the spacing P between the nanopillars 241 .

According to an embodiment, the distance P between the nanopillars 241 may become smaller in one direction. Here, the distance P may mean a distance between the centers of two adjacent nanopillars 241 . For example, the first interval P1 may be defined as a distance between the center of the first nanopillar 243 and the center of the second nanopillar 245 . Alternatively, the first interval P1 may be defined as the shortest distance between the first nanopillar 243 and the second nanopillar 245 .

The laser beam emitted from the laser output unit 100 may be steered in a direction in which the distance P between the nanopillars 241 is decreased.

The metasurface 240 may include a first nanopillar 243 , a second nanopillar 245 , and a third nanopillar 247 . In this case, the first distance P1 may be obtained based on the distance between the first nanopillars 243 and the second nanopillars 245 . Similarly, the second distance P2 may be obtained based on the distance between the second nanopillars 245 and the third nanopillars 247 . In this case, the first interval P1 may be smaller than the second interval P2 . That is, the gap P may increase from the first nanopillar 243 toward the third nanopillar 247 .

At this time, when the laser beam emitted from the laser output unit 100 passes through the meta surface 240 , the laser beam is emitted from the first direction and the third nano-pillar 247 from the laser output unit 100 . It may be steered in a direction between the first direction, which is a direction toward the 1 nanopillar 243 .

The steering angle θ of the laser beam may vary depending on the spacing P between the nanopillars 241 .

Specifically, the steering angle θ of the laser beam may vary according to an increase/decrease rate of the interval P between the nanopillars 241 . Here, the increase/decrease rate of the spacing P between the nanopillars 241 may mean a numerical value indicating the average degree of change in the spacing P between the adjacent nanopillars 241 .

The steering angle θ of the laser beam may increase as the increase/decrease rate of the interval P between the nanopillars 241 increases.

For example, the nanopillars 241 may form a first pattern having a first increase/decrease rate based on the interval P. Also, the nanopillars 241 may form a second pattern having a second increase/decrease rate based on the interval P.

In this case, the first steering angle by the first pattern may be greater than the second steering angle by the second pattern.

Meanwhile, the steering principle of the laser beam according to the change in the spacing P of the nanopillars 241 described above can be similarly applied even when the number of the nanopillars 241 per unit length is changed.

For example, when the number of nanopillars 241 per unit length is changed, the laser beam emitted from the laser output unit 100 is emitted from the laser output unit 100 in the first direction and the nanopillars per unit length ( 241) may be steered in a direction between the second directions in which the number increases.

21 is a view for explaining a metasurface according to an embodiment.

Referring to FIG. 21 , the metasurface 240 according to an embodiment may include a plurality of nanopillars 241 having different heights (H) of the nanopillars 241 .

The plurality of nanopillars 241 may form a nanopattern based on a change in height H of the nanopillars 241 .

According to an embodiment, the heights H1 , H2 , and H3 of the plurality of nanopillars 241 may increase in one direction. The laser beam emitted from the laser output unit 100 may be steered in a direction in which the height H of the nanopillar 241 increases.

For example, the metasurface 240 has a first nanopillar 243 having a first height H1 , a second nanopillar 245 having a second height H2 , and a third height H3 . A third nanopillar 247 may be included. The third height H3 may be greater than the first height H1 and the second height H2 . The second height H2 may be greater than the first height H1 . That is, the height H of the nano-pillar 241 may increase from the first nano-pillar 243 toward the third nano-pillar 247 . At this time, when the laser beam emitted from the laser output unit 100 passes through the meta surface 240 , the laser beam is emitted from the laser output unit 100 in a first direction and a third direction from the first nano-pillars 243 . It may be steered in a direction between the second direction, which is a direction toward the nanopillars 247 .

The steering angle θ of the laser beam may vary depending on the height H of the nanopillar 241 .

Specifically, the steering angle θ of the laser beam may vary according to an increase/decrease rate of the height H of the nanopillar 241 . Here, the increase/decrease rate of the height H of the nanopillars 241 may mean a numerical value representing the average degree of change in the height H of the adjacent nanopillars 241 .

Based on the difference between the first height H1 and the second height H2 and the difference between the second height H2 and the third height H3, the increase/decrease rate of the height H of the nanopillar 241 will be calculated. can The difference between the first height H1 and the second height H2 may be different from the difference between the second height H3 and the third height H3 .

The steering angle θ of the laser beam may increase as the increase/decrease rate of the height H of the nanopillar 241 increases.

For example, the nanopillars 241 may form a first pattern having a first increase/decrease rate based on the height H thereof. In addition, the nanopillars 241 may form a second pattern having a second increase/decrease rate based on the height H thereof.

In this case, the first steering angle by the first pattern may be greater than the second steering angle by the second pattern.

According to one embodiment, the steering component 230 may include a mirror that reflects the laser beam. For example, the steering component 230 may include a planar mirror, a multi-faceted mirror, a resonant mirror, a MEMS mirror, and a galvano mirror.

Alternatively, the steering component 230 may include a polygonal mirror that rotates 360 degrees along one axis and a nodding mirror that repeatedly drives in a preset range along one axis.

22 is a diagram for describing a multi-faceted mirror that is a steering component according to an exemplary embodiment.

Referring to FIG. 22 , the rotating multi-faceted mirror 600 according to an embodiment may include a reflective surface 620 and a body, and vertically penetrates the center through the upper part 615 and the lower part 610 of the body. It can be rotated about the rotating shaft 630 that is. However, the rotating multi-faceted mirror 600 may be composed of only some of the above-described components, and may include more components. For example, the rotating multi-faceted mirror 600 may include a reflective surface 620 and a body, and the body may include only a lower portion 610 . In this case, the reflective surface 620 may be supported on the lower portion 610 of the body.

The reflective surface 620 is a surface for reflecting the transmitted laser, and may include a reflective mirror, a reflective plastic, and the like, but is not limited thereto.

In addition, the reflective surface 620 may be installed on a side surface of the body except for the upper portion 610 and the lower portion 615, and may be installed such that the rotation shaft 630 and the normal line of each reflective surface 620 are orthogonal to each other. have. This may be to repeatedly scan the same scan area by making the scan area of the laser irradiated from each of the reflective surfaces 620 the same.

In addition, the reflective surface 620 may be installed on a side surface of the body except for the upper portion 610 and the lower portion 615 , and the normal of each of the reflection surfaces 620 has a different angle from the rotation axis 630 , respectively. can be installed. This may be to expand the scan area of the lidar device by differentiating the scan area of the laser irradiated from each of the reflective surfaces 620 .

In addition, the reflective surface 620 may have a rectangular shape, but is not limited thereto, and may have various shapes such as a triangle or a trapezoid.

In addition, the body may include an upper portion 615 , a lower portion 610 , and a column 612 connecting the upper portion 615 and the lower portion 610 to support the reflective surface 620 . At this time, the pillar 612 may be installed to connect the centers of the upper part 615 and the lower part 610 of the body, and installed to connect the vertices of the upper part 615 and the lower part 610 of the body. It may be, and may be installed to connect each corner of the upper part 615 and the lower part 610 of the body, but there is no limitation to the structure for connecting and supporting the upper part 615 and the lower part 610 of the body. .

In addition, the body may be fastened to the driving unit 640 in order to receive a driving force for rotation, may be fastened to the driving unit 640 through the lower portion 610 of the body, or through the upper portion 615 of the body. It may be fastened to the driving unit 640 .

Also, the upper portion 615 and the lower portion 610 of the body may have a polygonal shape. At this time, the shape of the upper part 615 of the body and the lower part 610 of the body may be the same, but is not limited thereto, and the shape of the upper part 615 of the body and the lower part 610 of the body are different from each other. You may.

Also, the upper portion 615 and the lower portion 610 of the body may have the same size. However, the size of the upper portion 615 of the body is not limited thereto and the size of the lower portion 610 of the body may be different from each other.

Also, the upper portion 615 and/or the lower portion 610 of the body may include an empty space through which air may pass.

In FIG. 22 , the rotating multi-faceted mirror 600 is described as a quadrangular prism-shaped hexahedron including four reflective surfaces 620 , but the reflective surfaces 620 of the rotating multi-faceted mirror 600 are necessarily four. However, it is not necessarily a hexahedron in the form of a tetragonal column.

In addition, in order to detect the rotation angle of the rotating multi-faceted mirror 600, the lidar device may further include an encoder unit. In addition, the lidar device may control the operation of the rotating multi-faceted mirror 600 using the detected rotation angle. In this case, the encoder unit may be included in the multi-faceted rotating mirror 600 or disposed to be spaced apart from the rotating multi-faceted mirror 600 .

A required field of view (FOV) may be different for a lidar device depending on its use. For example, a fixed lidar device for 3D mapping may require a wide viewing angle in vertical and horizontal directions, and a lidar device disposed in a vehicle may require a relatively wide viewing angle in the horizontal direction. A relatively narrow viewing angle in the vertical direction may be required. In addition, in the case of a lidar deployed in a drone, the widest possible viewing angle in the vertical and horizontal directions may be required.

In addition, the scan area of the lidar device may be determined based on the number of reflective surfaces of the rotating multi-faceted mirror, and accordingly, the viewing angle of the lidar device may be determined. Therefore, it is possible to determine the number of reflective surfaces of the rotating multi-faceted mirror based on the required viewing angle of the lidar device.

23 to 25 are diagrams for explaining the relationship between the number of reflective surfaces and the viewing angle.

23 to 25 describe the case of three, four, and five reflective surfaces, but the number of the reflective surfaces is not determined. In addition, although the case where the upper and lower portions of the body are regular polygons will be described in FIGS. 22 to 24 , even when the upper and lower portions of the body are not regular polygons, it can be easily calculated by analogy with the following description.

23 is a top view for explaining the viewing angle of the rotating multi-faceted mirror 650 in which the number of the reflective surfaces is three and the upper and lower portions of the body are equilateral triangles.

Referring to FIG. 23 , the laser 653 may be incident in a direction coincident with the rotational axis 651 of the rotating multi-faceted mirror 650 . Here, since the upper portion of the rotating multi-faceted mirror 650 has an equilateral triangular shape, the angle formed by the three reflective surfaces may be 60 degrees each. And referring to FIG. 23, when the rotating multi-faceted mirror 650 is rotated a little in the clockwise direction, the laser is reflected upward in the drawing, and the rotating multi-faceted mirror is rotated a little in the counterclockwise direction. The laser may be reflected downward in the drawing. Therefore, when the path of the reflected laser is calculated with reference to FIG. 23, the maximum viewing angle of the rotating multi-faceted mirror can be found.

For example, when reflected through the first reflective surface of the rotating multi-faceted mirror 650 , the reflected laser may be reflected upward at an angle of 120 degrees from the incident laser 653 . Also, when reflected through the third reflective surface of the rotating multi-faceted mirror, the reflected laser may be reflected downward at an angle of 120 degrees from the incident laser.

Therefore, when the number of the reflective surfaces of the rotating multi-faceted mirror 650 is three, and the upper and lower portions of the body are equilateral triangles, the maximum viewing angle of the rotating multi-faceted mirror may be 240 degrees.

24 is a top view for explaining a viewing angle of a rotating multi-faceted mirror in which the number of the reflective surfaces is four and the upper and lower portions of the body have a square shape.

Referring to FIG. 24 , the laser 663 may be incident in a direction coincident with the rotation axis 661 of the multi-faceted rotation mirror 660 . Here, since the upper portion of the rotating multi-faceted mirror 660 has a square shape, the angle formed by the four reflective surfaces may be 90 degrees each. And, referring to FIG. 24, when the rotating multi-faceted mirror 660 is rotated a little in the clockwise direction, the laser is reflected upward in the drawing, and the rotating multi-faceted mirror 660 is rotated a little in the counterclockwise direction to position In this case, the laser may be reflected downward in the drawing. Therefore, when the path of the reflected laser is calculated with reference to FIG. 24 , the maximum viewing angle of the rotating multi-faceted mirror 660 can be found.

For example, when reflected through the No. 1 reflective surface of the rotating multi-faceted mirror 660 , the reflected laser may be reflected upwardly at an angle of 90 degrees from the incident laser 663 . Also, when reflected through the fourth reflective surface of the rotating multi-faceted mirror 660 , the reflected laser may be reflected downward at an angle of 90 degrees to the incident laser 663 .

Accordingly, when the number of the reflective surfaces of the rotating multi-faceted mirror 660 is four and the upper and lower portions of the body have a square shape, the maximum viewing angle of the rotating multi-faceted mirror 660 may be 180 degrees.

24 is a top view for explaining a viewing angle of a rotating multi-faceted mirror in which the number of the reflective surfaces is five and the upper and lower portions of the body have a regular pentagonal shape.

Referring to FIG. 24 , the laser 673 may be incident in a direction coincident with the rotation axis 671 of the multi-faceted rotation mirror 670 . Here, since the upper portion of the rotating multi-faceted mirror 670 has a regular pentagonal shape, the angle formed by the five reflective surfaces may be 108 degrees each. And referring to FIG. 24, when the rotating multi-faceted mirror 670 is rotated a little in the clockwise direction, the laser is reflected upward in the drawing, and the rotating multi-faceted mirror 670 is rotated a little in the counterclockwise direction. When positioned, the laser may be reflected downward in the drawing. Therefore, when the path of the reflected laser is calculated with reference to FIG. 24, the maximum viewing angle of the rotating multi-faceted mirror can be found.

For example, when reflected through the No. 1 reflective surface of the rotating multi-faceted mirror 670 , the reflected laser may be reflected upwardly at an angle of 72 degrees from the incident laser 673 . Also, when reflected through the fifth reflective surface of the rotating multi-faceted mirror 670 , the reflected laser may be reflected downward at an angle of 72 degrees to the incident laser 673 .

Accordingly, when the number of the reflective surfaces of the rotating multi-faceted mirror 670 is five and the upper and lower portions of the body have a regular pentagonal shape, the maximum viewing angle of the rotating multi-faceted mirror may be 144 degrees.

As a result, referring to FIGS. 23 to 25, when the number of reflective surfaces of the rotating multi-faceted mirror is N, and the upper and lower portions of the body are N-shaped, if the inner angle of the N-shaped is theta, the rotating facet The maximum viewing angle of the mirror can be 360 degrees - 2 theta.

However, since the above-described viewing angle of the rotating multi-faceted mirror is only a calculated maximum value, the viewing angle determined by the rotating multi-faceted mirror in the lidar device may be smaller than the calculated maximum value. Also, at this time, the lidar device may use only a portion of each reflective surface of the rotating multi-faceted mirror for scanning.

When the scanning unit of the LIDAR device includes a rotating multi-faceted mirror, the rotating multi-faceted mirror may be used to irradiate the laser emitted from the laser output unit toward the scan area of the LIDAR device, and is reflected from an object existing on the scan area. It can be used to receive the laser from the sensor unit.

Here, a portion of each reflective surface of the rotating multi-faceted mirror used to irradiate the emitted laser to the scan area of the lidar device will be referred to as an irradiation part. In addition, a portion of each reflective surface of the rotating multi-faceted mirror for receiving the laser reflected from the object existing on the scan area to the sensor unit will be referred to as a light receiving portion.

26 is a view for explaining an irradiating portion and a light receiving portion of the rotating multi-faceted mirror according to an embodiment.

Referring to FIG. 26 , the laser emitted from the laser output unit 100 may have a dot-shaped irradiation area, and may be incident on the reflective surface of the rotating multi-faceted mirror 700 . However, although not shown in FIG. 26 , the laser emitted from the laser output unit 100 may have an irradiation area in the form of a line or a plane.

When the laser emitted from the laser output unit 100 has a dot-shaped irradiation area, the irradiation part 720 in the rotating multi-faceted mirror 700 rotates the point where the emitted laser meets the rotating multi-faceted mirror. It may be in the form of a line connected in the direction of rotation of the multi-faceted mirror. Accordingly, in this case, the irradiation portion 720 of the multi-faceted rotating mirror 700 may be positioned on each reflective surface in the form of a line in a direction perpendicular to the rotation axis 710 of the rotating multi-faceted mirror 700 .

In addition, the laser irradiated from the irradiated portion 720 of the rotating multi-faceted mirror 700 and irradiated to the scan area 510 of the lidar device 1000 is an object 500 present on the scan area 510 . may be reflected from, and the laser 735 reflected from the object 500 may be reflected in a larger range than the irradiated laser 725 . Accordingly, the laser 735 reflected from the object 500 is parallel to the irradiated laser and may be received by the lidar device 1000 in a wider range.

In this case, the laser 735 reflected from the object 500 may be transmitted larger than the size of the reflective surface of the rotating multi-faceted mirror 700 . However, the light-receiving portion 730 of the rotating multi-faceted mirror 700 is a portion for receiving the laser 735 reflected from the object 500 to the sensor unit 300, and the reflective surface of the rotating multi-faceted mirror 700 is It may be a portion of the reflective surface that is smaller than the size.

For example, as shown in FIG. 26 , when the laser 735 reflected from the object 500 is transmitted toward the sensor unit 300 through the rotating multi-faceted mirror 700 , the rotating multi-faceted mirror 700 . A portion of the reflective surface of the reflective surface to be reflected to be transmitted toward the sensor unit 300 may be the light receiving portion 730 . Therefore, the light-receiving portion 730 of the rotating multi-faceted mirror 700 may be a portion extending in the rotational direction of the rotating multi-faceted mirror 700 by reflecting a portion of the reflecting surface to be transmitted toward the sensor unit 300 . have.

In addition, when a condensing lens is further included between the rotating multi-faceted mirror 700 and the sensor unit 300, the light-receiving portion 730 of the rotating multi-faceted mirror 700 is transmitted toward the condensing lens among the reflective surfaces. The reflecting portion may be a portion extending in the rotational direction of the rotating multi-faceted mirror 700 .

However, in FIG. 26 , the irradiating part 720 and the light receiving part 730 of the rotating multi-faceted mirror 700 were described as being spaced apart, but the irradiating part 720 and the light receiving part 730 of the rotating multi-faceted mirror 1550 . A portion may overlap, and the irradiating portion 720 may be included in the light receiving portion 730 .

Also, according to an embodiment, the steering component 230 may include, but is not limited to, an optical phased array (OPA), etc. to change the phase of the emitted laser and thereby change the irradiation direction.

The lidar device according to an embodiment may include an optic unit for directing a laser beam emitted from a laser output unit to an object.

The optic unit may include a beam collimation and steering component (BCSC) for collimating and steering the laser beam emitted from the laser output unit. The BCSC may consist of one component or a plurality of components.

27 is a view for explaining an optic unit according to an embodiment.

Referring to FIG. 27 , an optic unit according to an embodiment may include a plurality of components. For example, it may include a collimation component 210 and a steering component 230 .

According to an embodiment, the collimation component 210 may serve to collimate the beam emitted from the laser output unit 100 , and the steering component 230 may perform a collimation function emitted from the collimation component 210 . It can serve to steer the mated beam. As a result, the laser beam emitted from the optic unit can be directed in a predetermined direction.

The collimation component 210 may be a micro lens or a metasurface.

When the collimation component 210 is a micro lens, the micro lens array may be disposed on one side of the substrate, or the micro lens array may be disposed on both sides of the substrate.

When the collimation component 210 is a metasurface, the laser beam may be collimated by a nanopattern formed by a plurality of nanopillars included in the metasurface.

The steering component 230 may be a micro lens, a micro prism, or a metasurface.

When the steering component 230 is a micro lens, the micro lens array may be disposed on one side of the substrate, and the micro lens array may be disposed on both sides of the substrate.

When the steering component 230 is a micro prism, it may be steered by the angle of the micro prism.

When the steering component 230 is a metasurface, the laser beam may be steered by a nanopattern formed by a plurality of nanopillars included in the metasurface.

According to an embodiment, when the optic unit includes a plurality of components, correct arrangement among the plurality of components may be required. In this case, the collimation component and the steering component may be correctly disposed through an alignment mark. In addition, a printed circuit board (PCB), a VCSEL array, a collimation component, and a steering component can be correctly placed through an alignment mark.

For example, by inserting an alignment mark between VCSEL units included in the VCSEL array or at the edge portion of the VCSEL array, the VCSEL array and the collimation component can be correctly positioned.

Also, for example, by inserting an alignment mark between the collimation components or at an edge portion, the collimation component and the steering component can be correctly positioned.

28 is a diagram for describing an optic unit according to an exemplary embodiment.

Referring to FIG. 28 , the optic unit according to an embodiment may include one single component. For example, it may include a meta component 270 .

According to an embodiment, the meta component 270 may collimate or steer the laser beam emitted from the laser output unit 100 .

For example, the meta-component 270 includes a plurality of metasurfaces to collimate the laser beam emitted from the laser output unit 100 on one metasurface, and collimate the collimated laser beam on the other metasurface. can be steered. It will be described in detail with reference to FIG. 29 below.

Alternatively, for example, the meta component 270 may include one meta surface to collimate and steer the laser beam emitted from the laser output unit 100 . It will be described in detail with reference to FIG. 24 below.

29 is a diagram for describing a meta component according to an embodiment.

Referring to FIG. 29 , the meta component 270 according to an embodiment may include a plurality of metasurfaces 271 and 273 . For example, it may include a first metasurface 271 and a second metasurface 273 .

The first meta surface 271 may be disposed in a direction in which the laser beam is emitted from the laser output unit 100 . The first metasurface 271 may include a plurality of nanopillars. The first metasurface may form a nanopattern by a plurality of nanopillars. The first metasurface 271 may collimate the laser beam emitted from the laser output unit 100 by the formed nanopattern.

The second metasurface 273 may be disposed in a direction in which the laser beam is output from the first metasurface 271 . The second metasurface 273 may include a plurality of nanopillars. The second metasurface 273 may form a nanopattern by a plurality of nanopillars. The second metasurface 273 may steer the laser beam emitted from the laser output unit 100 by the formed nanopattern. For example, as shown in FIG. 24 , the laser beam may be steered in a specific direction by the increase/decrease rate of the width W of the plurality of nanopillars. In addition, the laser beam may be steered in a specific direction by the spacing P, the height H, and the number per unit length of the plurality of nanopillars.

30 is a diagram for describing a meta component according to another embodiment.

Referring to FIG. 30 , the meta component 270 according to an embodiment may include one metasurface 274 .

The metasurface 275 may include a plurality of nanopillars on both sides. For example, the metasurface 275 may include a first set of nanopillars 276 on a first surface and a second set of nanopillars 278 on a second surface.

The metasurface 275 may be steered after collimating the laser beam emitted from the laser output unit 100 by a plurality of nanopillars forming respective nanopatterns on both surfaces.

For example, the first set of nanopillars 276 disposed on one side of the metasurface 275 may form a nanopattern. The laser beam emitted from the laser output unit 100 may be collimated by the nanopattern formed by the first set of nanopillars 276 . The second set of nanopillars 278 disposed on the other side of the metasurface 275 may form a nanopattern. The laser beam passing through the first nanopillar 276 may be steered in a specific direction by the nanopattern formed by the second set of nanopillars 278 .

31 is a view for explaining a SPAD array according to an embodiment.

Referring to FIG. 31 , the sensor unit 300 according to an embodiment may include a SPAD array 750 . 31 shows an 8X8 SPAD array, but is not limited thereto, and may be 10X10, 12X12, 24X24, 64X64, or the like.

The SPAD array 750 according to an embodiment may include a plurality of SPADs 751 . For example, the plurality of SPADs 751 may be arranged in a matrix structure, but is not limited thereto, and may be arranged in a circular, oval, honeycomb structure, or the like.

When a laser beam is incident on the SPAD array 750 , photons may be detected by an avalanche phenomenon. According to an embodiment, the results of the SPAD array 750 may be accumulated in the form of a histogram.

32 is a diagram for explaining a histogram of SPAD according to an embodiment.

Referring to FIG. 32 , the SPAD 751 according to an embodiment may detect a photon. When the SPAD 751 detects a photon, signals 766 and 767 may be generated.

After the SPAD 751 detects a photon, a recovery time may be required until it returns to a state capable of detecting a photon again. When the recovery time has not elapsed after the SPAD 751 detects the photon, even if the photon is incident on the SPAD 751 at this time, the SPAD 751 cannot detect the photon. Accordingly, the resolution of the SPAD 751 may be determined by the recovery time.

According to an embodiment, the SPAD 751 may detect photons for a predetermined time after the laser beam is output from the laser output unit. In this case, the SPAD 751 may detect photons during a cycle of a predetermined period. For example, the SPAD 751 may detect a photon multiple times during a cycle, depending on the time resolution of the SPAD 751 . In this case, the time resolution of the SPAD 751 may be determined by the recovery time of the SPAD 751 .

According to an embodiment, the SPAD 751 may detect a photon reflected from the object and photons other than the photon. For example, when the SPAD 751 detects a photon reflected from the object, the SPAD 751 may generate a signal 767 .

Also, for example, when the SPAD 751 detects a photon other than a photon reflected from the object, the SPAD 751 may generate a signal 766 . In this case, photons other than the photon reflected from the object may include sunlight, a laser beam reflected from a window, and the like.

According to an embodiment, the SPAD 751 may detect a photon for a cycle of a predetermined time after outputting the laser beam from the laser output unit.

For example, the SPAD 751 may detect a photon during the first cycle after outputting the first laser beam from the laser output unit. In this case, the SPAD 751 may generate the first detection signal 761 after detecting the photon.

Also, for example, the SPAD 751 may detect a photon during a second cycle after outputting a second laser beam from the laser output unit. In this case, the SPAD 751 may generate a second detection signal 762 after detecting the photon.

Also, for example, the SPAD 751 may detect a photon during a third cycle after outputting a third laser beam from the laser output unit. In this case, the SPAD 751 may generate a third detection signal 763 after detecting the photon.

Also, for example, the SPAD 751 may detect a photon during an Nth cycle after outputting an Nth laser beam from the laser output unit. In this case, the SPAD 751 may generate an N-th detection signal 764 after detecting the photon.

At this time, the first detecting signal 761 , the second detecting signal 762 , and the third detecting signal 763 ?? The Nth detection signal 764 may include a signal 767 by a photon reflected from the object or a signal 766 by a photon other than a photon reflected from the object.

In this case, the N-th detection signal 764 may be a photon detection signal for an N-th cycle after outputting the N-th laser beam. For example, N may be 5, 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 200, 300, and the like.

Signals by the SPAD 751 may be accumulated in the form of a histogram. A histogram may have a plurality of histogram bins. Signals by the SPAD 751 may be accumulated in the form of a histogram corresponding to each histogram bin.

For example, the histogram may be formed by accumulating signals by one SPAD 751 or by accumulating signals by a plurality of SPADs 751 .

For example, the first detecting signal 761 , the second detecting signal 762 , and the third detecting signal 763 ?? The histogram 765 may be created by accumulating the Nth detection signals 764 . In this case, the histogram 765 may include a signal by a photon reflected from the object or a signal by other photons.

In order to obtain distance information of the object, it is necessary to extract a signal by a photon reflected from the object from the histogram 765 . A signal caused by photons reflected from the object may be larger and more regular than signals caused by other photons.

In this case, the signal by the photon reflected from the object within the cycle may be regularly present at a specific time. On the other hand, the amount of signal caused by sunlight is small and may exist irregularly.

It is highly probable that a signal with a large accumulation amount of the histogram at a specific time is a signal due to a photon reflected from the object. Accordingly, a signal having a large accumulation amount among the accumulated histogram 765 may be extracted as a signal due to a photon reflected from the object.

For example, a signal having the highest value among the histogram 765 may be simply extracted as a signal due to a photon reflected from the object. Also, for example, a signal of a certain amount 768 or more in the histogram 765 may be extracted as a signal due to a photon reflected from the object.

In addition to the method described above, various algorithms that can be extracted as a signal by photons reflected from the object in the histogram 765 may exist.

After extracting a signal due to a photon reflected from the object from the histogram 765 , distance information of the object may be calculated based on the generation time of the corresponding signal or the reception time of the photon.

For example, the signal extracted from the histogram 765 may be a signal at one scan point. In this case, one scan point may correspond to one SPAD.

As another example, signals extracted from a plurality of histograms may be signals from one scan point. In this case, one scan point may correspond to a plurality of SPADs.

According to another embodiment, by weighting signals extracted from a plurality of histograms, it may be calculated as a signal at one scan point. In this case, the weight may be determined by the distance between the SPADs.

For example, the signal at the first scan point has a weight of 0.8 on the signal by the first SPAD, a weight of 0.6 on the signal by the second SPAD, a weight of 0.4 on the signal by the third SPAD, and a weight of 0.4 on the signal by the fourth SPAD. It can be calculated by giving the signal a weight of 0.2.

When the signals extracted from a plurality of histograms are weighted and calculated as signals at one scan point, the effect of accumulating the histograms several times can be obtained by accumulating the histograms once. Accordingly, the effect of reducing the scan time and reducing the time for obtaining the entire image can be derived.

According to another embodiment, the laser output unit may output the laser beam addressable. Alternatively, the laser output unit may output a laser beam addressably for each big cell unit.

For example, the laser output unit outputs the laser beam of the vixel unit of 1 row and 1 column once, then outputs the laser beam of the vixel unit of 1 row and 3 column once, and then outputs the laser beam of the vixel unit of 2 rows and 4 columns once can be printed out. In this way, the laser output unit may output the laser beam of the vixel unit in the A row and B column N times, and then output the laser beam of the vixel unit in the C row and D column M times.

In this case, the SPAD array may receive a laser beam that is reflected back to the object among the laser beams output from the corresponding vixel unit.

For example, in the case where the vixel unit in row 1 and column 1 outputs the Nth laser beam in the laser beam output sequence of the laser output unit, the SPAD unit in row 1 and column 1 and column 1 is reflected by the target object. can be received up to N times.

Also, for example, when the laser beam reflected on the histogram of the SPAD needs to be accumulated N times and there are M vixel units in the laser output unit, the M vixel units may be operated N times at once. Alternatively, M big cell units may be operated M*N times one by one, or M big cell units may be operated 5 times M*N/5 times.

33 is a diagram for explaining a SiPM according to an embodiment.

Referring to FIG. 33 , the sensor unit 300 according to an embodiment may include a SiPM 780 . The SiPM 780 according to an embodiment may include a plurality of microcells 781 and a plurality of microcell units 782 . For example, the microcell may be a SPAD. Also, for example, the microcell unit 782 may be a SPAD array that is a set of a plurality of SPADs.

The SiPM 780 according to an embodiment may include a plurality of microcell units 782 . 33 shows the SiPM 780 in which the microcell units 782 are arranged in a 4X6 matrix, but is not limited thereto and may be a 10X10, 12X12, 24X24, 64X64 matrix, or the like. In addition, the microcell unit 782 may be arranged in a matrix structure, but is not limited thereto, and may be arranged in a circular, oval, honeycomb structure, or the like.

When a laser beam is incident on the SiPM 780 , photons may be detected by an avalanche phenomenon. According to an embodiment, the results of the SiPM 780 may be accumulated in the form of a histogram.

There are several differences between the histogram by the SiPM 780 and the histogram by the SPAD 751 .

As described above, the histogram by the SPAD 751 may be accumulated by N detection signals formed by one SPAD 751 receiving the laser beam N times. In addition, the histogram by the SPAD 751 may be accumulated by X*Y detection signals formed by receiving the Y laser beam from the X SPADs 751 .

On the other hand, the histogram by the SiPM 780 may be formed by accumulating signals by one microcell unit 782 or by accumulating signals by a plurality of microcell units 782 .

According to an embodiment, one microcell unit 782 may output the laser beam No. 1 from the laser output unit and then detect photons reflected from the object to form a histogram.

For example, the histogram by the SiPM 780 may be formed by accumulating a signal generated by a plurality of microcells included in one microcell unit 782 detecting photons reflected from an object.

According to another embodiment, the plurality of microcell units 782 may output the laser beam No. 1 from the laser output unit and then detect photons reflected from the object to form a histogram.

For example, the histogram by the SiPM 780 may be formed by accumulating signals generated by a plurality of microcells included in the plurality of microcell units 782 detecting photons reflected from an object.

In the histogram by the SPAD 751 , one SPAD 751 or a plurality of SPADs 751 may require the N-th laser beam output of the laser output unit. However, in the histogram by the SiPM 780 , one microcell unit 782 or a plurality of microcell units 782 may require only one laser beam output.

Therefore, the histogram by the SPAD 751 may take a longer time to accumulate the histogram than the histogram by the SiPM 780 . The histogram by the SiPM 780 has an advantage in that the histogram can be formed in a short time with only one laser beam output.

34 is a diagram for explaining a histogram of SiPM according to an embodiment.

Referring to FIG. 34 , the SiPM 780 according to an embodiment may detect photons. For example, the microcell unit 782 may detect photons. When microcell unit 782 detects a photon, signals 787 and 788 may be generated.

After the microcell unit 782 detects a photon, a recovery time may be required to return to a state capable of detecting a photon again. When the recovery time has not elapsed after the microcell unit 782 detects the photon, even if the photon is incident on the microcell unit 782 at this time, the microcell unit 782 cannot detect the photon. Thus, the resolution of the microcell unit 782 may be determined by the recovery time.

According to an embodiment, the microcell unit 782 may detect photons for a predetermined time after the laser beam is output from the laser output unit. In this case, the microcell unit 782 may detect photons during a cycle of a predetermined period. For example, microcell unit 782 may detect a photon multiple times during a cycle, depending on the time resolution of microcell unit 782 . In this case, the time resolution of the microcell unit 782 may be determined by the recovery time of the microcell unit 782 .

According to an embodiment, the microcell unit 782 may detect photons reflected from the object and other photons. For example, the microcell unit 782 may generate a signal 787 when detecting a photon reflected from the object.

Also, for example, the microcell unit 782 may generate a signal 788 when detecting a photon other than a photon reflected from the object. In this case, photons other than the photon reflected from the object may include sunlight, a laser beam reflected from a window, and the like.

According to an embodiment, the microcell unit 782 may detect a photon for a cycle of a predetermined time after outputting the laser beam from the laser output unit.

For example, the first microcell 783 included in the microcell unit 782 may detect a photon during a first cycle after outputting a laser beam from the laser output unit. In this case, the first microcell 783 may generate a first detection signal 791 after detecting a photon.

Also, for example, the second microcell 784 included in the microcell unit 782 may detect a photon during a first cycle after outputting a laser beam from the laser output unit. In this case, the second microcell 784 may generate the first detection signal 792 after detecting the photon.

Also, for example, the third microcell 785 included in the microcell unit 782 may detect a photon during a first cycle after outputting a laser beam from the laser output unit. In this case, the third microcell 785 may generate a third detecting signal 793 after detecting the photon.

Also, for example, the Nth microcell 786 included in the microcell unit 782 may detect a photon during a first cycle after outputting a laser beam from the laser output unit. In this case, the Nth microcell 786 may generate an Nth detection signal 794 after detecting the photon.

At this time, the first detecting signal 791 , the second detecting signal 792 , and the third detecting signal 793 ?? The N-th detection signal 794 may include a signal 787 by a photon reflected from the object or a signal 788 by a photon other than a photon reflected from the object.

In this case, the Nth detecting signal 764 may be a photon detecting signal of the Nth microcell included in the microcell unit 782 . For example, N may be 5, 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 200, 300, and the like.

Signals by the microcells may be accumulated in the form of a histogram. A histogram may have a plurality of histogram bins. Signals by the microcells may be accumulated in the form of a histogram corresponding to each histogram bin.

For example, the histogram may be formed by accumulating signals by one microcell unit 782 , or may be formed by accumulating signals by a plurality of microcell units 782 .

For example, the first detecting signal 791 , the second detecting signal 792 , and the third detecting signal 793 ?? A histogram 795 may be formed by accumulating the N-th detection signals 794 . In this case, the histogram 795 may include a signal by a photon reflected from the object or a signal by other photons.

In order to obtain distance information of the object, it is necessary to extract a signal by a photon reflected from the object from the histogram 795 . A signal caused by photons reflected from the object may be larger and more regular than signals caused by other photons.

In this case, the signal by the photon reflected from the object within the cycle may be regularly present at a specific time. On the other hand, the amount of signal caused by sunlight is small and may exist irregularly.

It is highly probable that a signal with a large accumulation amount of the histogram at a specific time is a signal due to a photon reflected from the object. Accordingly, a signal having a large accumulation amount among the accumulated histogram 795 may be extracted as a signal due to a photon reflected from the object.

For example, a signal having the highest value among the histogram 795 may be simply extracted as a signal due to a photon reflected from the object. Also, for example, a signal of a certain amount 797 or more of the histogram 795 may be extracted as a signal due to a photon reflected from the object.

In addition to the above-described method, various algorithms that can be extracted as a signal by a photon reflected from the object in the histogram 795 may exist.

After extracting a signal due to a photon reflected from the object from the histogram 795 , distance information of the object may be calculated based on the generation time of the corresponding signal or the reception time of the photon.

According to another embodiment, the laser output unit may output the laser beam addressable. Alternatively, the laser output unit may output a laser beam addressably for each big cell unit.

For example, the laser output unit outputs the laser beam of the vixel unit of 1 row and 1 column once, then outputs the laser beam of the vixel unit of 1 row and 3 column once, and then outputs the laser beam of the vixel unit of 2 rows and 4 columns once can be printed out. In this way, the laser output unit may output the laser beam of the vixel unit in the A row and B column N times, and then output the laser beam of the vixel unit in the C row and D column M times.

In this case, the SiPM may receive a laser beam reflected back from the target object among the laser beams output from the corresponding vixel unit.

For example, when the vixel unit in row 1 and column 1 outputs the Nth laser beam in the laser beam output sequence of the laser output unit, the microcell unit in row 1 and column 1 corresponding to row 1 and column 1 is the laser reflected by the object. The beam can be received up to N times.

Also, for example, when the laser beam reflected by the histogram of the SiPM needs to be accumulated N times and there are M vixel units in the laser output unit, the M vixel units may be operated N times at once. Alternatively, M big cell units may be operated M*N times one by one, or M big cell units may be operated 5 times M*N/5 times.

Lidar can be implemented in a number of ways. For example, the lidar may have a flash method and a scanning method.

As described above, the flash method is a method using a laser beam spreading to an object by divergence of the laser beam. Since the flash method collects distance information of an object by illuminating a single laser pulse to the FOV, the resolution of the flash type lidar may be determined by a sensor unit or a receiver unit.

Also, as described above, the scanning method is a method of directing a laser beam emitted from a laser output unit in a specific direction. Since the scanning method illuminates the laser beam to the FOV using a scanner or a steering unit, the resolution of the scanning method lidar may be determined by the scanner or the steering unit.

According to an embodiment, the lidar may be implemented in a mixed manner of a flash method and a scanning method. In this case, the mixed method of the flash method and the scanning method may be a semi-flash method or a semi-scanning method. Alternatively, a mixed method of the flash method and the scanning method may be a quasi-flash method or a quasi-scanning method.

The semi-flash type lidar or the quasi-flash type lidar may mean a semi-flash type lidar rather than a complete flash type lidar. For example, one unit of the laser output unit and one unit of the receiving unit may be a flash type lidar, but a plurality of units of the laser output unit and a plurality of units of the receiving unit are gathered, so that it is not a complete flash type lidar but a quasi-flash type lidar can be is

Also, for example, since the laser beam output from the laser output unit of the semi-flash type lidar or the quasi-flash type lidar may pass through the steering unit, it may be a quasi-flash type lidar rather than a complete flash type lidar.

The semi-flash type lidar or the quasi-flash type lidar can overcome the disadvantages of the flash type lidar. For example, a flash-type lidar may be vulnerable to interference between laser beams, and a strong flash is required to detect an object, and a detection range cannot be limited.

However, the semi-flash type lidar or the quasi-flash type lidar can overcome the interference phenomenon between laser beams through the steering unit, and can control each laser output unit, so that the detection range can be controlled. and may not require a strong flash.

35 is a diagram for explaining a semi-flash lidar according to an embodiment.

Referring to FIG. 35 , the semi-flash lidar 800 according to an embodiment may include a laser output unit 810 , a beam collimation & steering component (BCSC) 820 , a scanning unit 830 , and a receiving unit 840 . can

The semi-flash lidar 800 according to an embodiment may include a laser output unit 810 . For example, the laser output unit 810 may include a big cell array. In this case, the laser output unit 810 may include a vixel array in which units including a plurality of vixel emitters are gathered.

The semi-flash lidar 800 according to an embodiment may include a BCSC 820 . For example, the BCSC 820 may include a collimation component 210 and a steering component 230 .

According to an embodiment, the laser beam output from the laser output unit 810 is collimated by the collimation component 210 of the BCSC 820 , and the collimated laser beam is the steering component 230 of the BCSC 820 . ) can be steered.

For example, the laser beam output from the first vixel unit included in the laser output unit 810 may be collimated by the first collimation component and steered in the first direction by the first steering component.

Also, for example, the laser beam output from the second vixel unit included in the laser output unit 810 may be collimated by the second collimation component and steered in the second direction by the second steering component.

In this case, the vixel units included in the laser output unit 810 may be steered in different directions. Therefore, unlike the flash method by spreading a single pulse, the laser beam of the laser output unit of the semi-flash type LIDAR can be steered in a specific direction by the BCSC. Therefore, the laser beam output from the laser output unit of the semi-flash type lidar can have directionality by BCSC.

The semi-flash lidar 800 according to an embodiment may include a scanning unit 830 . For example, the scanning unit 830 may include the optic unit 200 . For example, the scanning unit 830 may include a mirror that reflects a laser beam.

For example, the scanning unit 830 may include a plane mirror, a multi-faceted mirror, a resonant mirror, a MEMS mirror, and a galvanometer mirror. Also, for example, the scanning unit 830 may include a multi-faceted mirror that rotates 360 degrees along one axis and a node mirror that is repeatedly driven in a preset range along one axis.

The semi-flash type lidar may include a scanning unit. Therefore, unlike the flash method in which the entire image is acquired at once by spreading a single pulse, the semi-flash type lidar can scan the image of the object by the scanning unit.

In addition, the object may be randomly scanned by the laser output of the laser output unit of the semi-flash type lidar. Therefore, the semi-flash type lidar can intensively scan only a desired region of interest among the entire FOV.

The semi-flash lidar 800 according to an embodiment may include a receiver 840 . For example, the receiving unit 840 may include the sensor unit 300 . Also, for example, the receiver 840 may be the SPAD array 750 . Also, for example, the receiver 840 may be a SiPM 780 .

The receiver 850 may include various sensor elements. For example, the receiver 840 may include a PN photodiode, a phototransistor, a PIN photodiode, APD, SPAD, SiPM, TDC, CMOS, or CCD, but is not limited thereto.

In this case, the receiver 840 may stack histograms. For example, the receiver 840 may detect a light reception time of the laser beam reflected and received from the object 850 by using the histogram.

The receiver 840 according to an embodiment may include one or more optical elements. For example, the receiver 840 may include an aperture, a micro lens, a converging lens, or a diffuser, but is not limited thereto.

Also, the receiver 840 according to an embodiment may include one or more optical filters. The receiver 840 may receive the laser reflected from the object through an optical filter. For example, the receiver 840 may include a band pass filter, a dichroic filter, a guided-mode resonance filter, a polarizer, a wedge filter, and the like, but is not limited thereto.

According to an embodiment, the semi-flash type lidar 800 may have a constant optical path between components.

For example, light output from the laser output unit 810 may be incident on the scanning unit 830 through the BCSC 820 . In addition, light incident to the scanning unit 830 may be reflected and incident to the object 850 . Also, the light incident on the object 850 may be reflected and then incident on the scanning unit 830 again. Also, the light incident on the scanning unit 830 may be reflected and received by the receiving unit 840 . A lens for increasing light transmission/reception efficiency may be additionally inserted into the above optical path.

36 is a diagram for explaining a configuration of a semi-flash lidar according to an embodiment.

Referring to FIG. 36 , the semi-flash lidar 800 according to an embodiment may include a laser output unit 810 , a scanning unit 830 , and a receiving unit 840 .

According to an embodiment, the laser output unit 810 may include a big cell array 811 . Although only one column of the big cell array 811 is illustrated in FIG. 36 , the present invention is not limited thereto, and the big cell array 811 may have an N×M matrix structure.

According to an embodiment, the vixel array 811 may include a plurality of vixel units 812 . In this case, the vixel unit 812 may include a plurality of vixel emitters. For example, the big cell array 811 may include 25 big cell units 812 . In this case, the 25 big cell units 812 may be arranged in one row, but is not limited thereto.

According to an embodiment, the vixel unit 812 may have a diverging angle. For example, the vixel unit 812 may have a horizontal diffusion angle 813 and a vertical diffusion angle 814 . For example, the vixel unit 812 may have a horizontal diffusion angle 813 of 1.2 degrees and a vertical diffusion angle 814 of 1.2 degrees, but is not limited thereto.

According to an embodiment, the scanning unit 830 may receive a laser beam output from the laser output unit 810 . In this case, the scanning unit 830 may reflect the laser beam toward the object. Also, the scanning unit 830 may receive a laser beam reflected from the object. In this case, the scanning unit 830 may transmit the laser beam reflected from the object to the receiving unit 840 .

In this case, the area that reflects the laser beam toward the object and the area that receives the laser beam reflected from the object may be the same or different. For example, an area that reflects a laser beam toward the object and an area that receives a laser beam reflected from the object may be within the same reflective surface. In this case, the regions may be divided into up and down or left and right within the same reflective surface.

Also, for example, an area that reflects a laser beam toward the object and an area that receives a laser beam reflected from the object may be different reflective surfaces. For example, a region that reflects a laser beam toward the object may be a first reflective surface of the scanning unit 830 , and an area that receives a laser beam reflected from the object may be a second reflective surface of the scanning unit 830 . .

According to an embodiment, the scanning unit 830 may reflect the 2D laser beam output from the laser output unit 810 toward the object. In this case, the lidar device may scan the object in 3D due to rotation or scanning of the scanning unit 830 .

According to an embodiment, the receiver 840 may include a SPAD array 841 . Although only one column of the SPAD array 841 is illustrated in FIG. 36 , the present invention is not limited thereto, and the SPAD array 841 may have an N×M matrix structure.

According to one embodiment, the SPAD array 841 may include a plurality of SPAD units 842 . In this case, the SPAD unit 842 may include a plurality of SPAD pixels 847 . For example, the SPAD unit 842 may include a 12 X 12 SPAD pixel 847 . In this case, the SPAD pixel 847 may mean one SPAD element, but is not limited thereto.

Also for example, the SPAD array 841 may include 25 SPAD units 842 . At this time, the 25 SPAD units 842 may be arranged in one row, but is not limited thereto. Also, at this time, the arrangement of the SPAD unit 842 may correspond to the arrangement of the vixel unit 812 .

According to one embodiment, the SPAD unit 842 may have an FOV capable of receiving light. For example, the SPAD unit 842 may have a horizontal FOV 843 and a vertical FOV 844 . For example, the SPAD unit 842 may have a horizontal FOV 843 of 1.2 degrees and a vertical FOV 844 of 1.2 degrees.

In this case, the FOV of the SPAD unit 842 may be proportional to the number of SPAD pixels 847 included in the SPAD unit 842 . Alternatively, the FOV of the individual SPAD pixel 847 included in the SPAD unit 842 may be determined by the FOV of the SPAD unit 842 .

For example, when the horizontal FOV 845 and vertical FOV 846 of an individual SPAD pixel 847 are 0.1 degrees, if the SPAD unit 842 includes the SPAD pixel 847 of NXM, the The horizontal FOV 843 may be 0.1*N, and the vertical FOV 844 may be 0.1*M.

Also for example, when the horizontal FOV 843 and the vertical FOV 844 of the SPAD unit 842 are 1.2 degrees, and the SPAD unit 842 contains 12 X 12 SPAD pixels 847, individual SPAD pixels The horizontal FOV 845 and vertical FOV 846 of 847 may be 0.1 degree (1.2/12).

According to another embodiment, the receiver 840 may include a SiPM array 841 . Although only the SiPM array 841 in one column is illustrated in FIG. 36 , the present invention is not limited thereto, and the SiPM array 841 may have an N×M matrix structure.

According to one embodiment, the SiPM array 841 may include a plurality of microcell units 842 . In this case, the microcell unit 842 may include a plurality of microcells 847 . For example, the microcell unit 842 may include 12 by 12 microcells 847 .

Also for example, the SiPM array 841 may include 25 microcell units 842 . In this case, the 25 microcell units 842 may be arranged in one row, but is not limited thereto. Also, at this time, the arrangement of the microcell unit 842 may correspond to the arrangement of the big cell unit 812 .

According to one embodiment, the microcell unit 842 may have an FOV capable of receiving light. For example, the microcell unit 842 may have a horizontal FOV 843 and a vertical FOV 844 . For example, the microcell unit 842 may have a horizontal FOV 843 of 1.2 degrees and a vertical FOV 844 of 1.2 degrees.

In this case, the FOV of the microcell unit 842 may be proportional to the number of microcells included in the microcell unit 842 . Alternatively, the FOV of the individual microcells 847 included in the microcell unit 842 may be determined by the FOV of the microcell unit 842 .

For example, if the microcell unit 842 includes the microcell 847 of NXM, when the horizontal FOV 845 and the vertical FOV 846 of the individual microcell 847 are 0.1 degrees, the microcell unit 842 ), the horizontal FOV 843 may be 0.1*N, and the vertical FOV 844 may be 0.1*M.

Also for example, when the horizontal FOV 843 and the vertical FOV 844 of the microcell unit 842 are 1.2 degrees, and the microcell unit 842 contains 12 X 12 microcells 847, the individual The horizontal FOV 845 and vertical FOV 846 of the microcell 847 may be 0.1 degrees (1.2/12).

According to another embodiment, one big cell unit 812 may correspond to a plurality of SPAD units or microcell units 842 . For example, a laser beam output from the vixel unit 812 in 1 row and 1 column is reflected by the scanning unit 830 and the object 850 to be the SPAD unit or microcell unit 842 in 1 row 1 column and 1 row 2 columns. ) can be received.

According to another embodiment, a plurality of vixel units 812 may correspond to one SPAD unit or microcell unit 842 . For example, a laser beam output from the vixel unit 812 in one row and one column is reflected by the scanning unit 830 and the object 850 to be received by the SPAD unit or microcell unit 842 in one row and one column. have.

According to an embodiment, the big cell unit 812 of the laser output unit 810 and the SPAD unit or the microcell unit 842 of the receiving unit 840 may correspond.

For example, the horizontal and vertical diffusion angles of the vixel unit 812 may be the same as the horizontal FOV 845 and vertical FOV 846 of the SPAD unit or microcell unit 842 .

For example, a laser beam output from the vixel unit 812 in one row and one column is reflected by the scanning unit 830 and the object 850 to be received by the SPAD unit or microcell unit 842 in one row and one column. have.

Also, for example, the laser beam output from the vixel unit 812 in N rows and M columns is reflected by the scanning unit 830 and the object 850 to be received by the SPAD unit or microcell unit 842 in N rows and M columns. can

At this time, the laser beam output from the vixel unit 812 in N rows and M columns and reflected by the scanning unit 830 and the object 850 is received by the SPAD unit or microcell unit 842 in N rows and M columns, and LiDAR Device 800 may have resolution by SPAD unit or microcell unit 842 .

For example, if the SPAD unit or microcell unit 842 includes the SPAD pixels or microcells 847 in N rows and M columns, the FOV irradiated by the big cell unit 812 is divided into the NXM area to determine the distance information of the object. can

According to another embodiment, one big cell unit 812 may correspond to a plurality of SPAD units or microcell units 842 . For example, a laser beam output from the vixel unit 812 in 1 row and 1 column is reflected by the scanning unit 830 and the object 850 to be the SPAD unit or microcell unit 842 in 1 row 1 column and 1 row 2 columns. ) can be received.

According to another embodiment, a plurality of vixel units 812 may correspond to one SPAD unit or microcell unit 842 . For example, a laser beam output from the vixel unit 812 in one row and one column is reflected by the scanning unit 830 and the object 850 to be received by the SPAD unit or microcell unit 842 in one row and one column. have.

According to an embodiment, the plurality of vixel units 812 included in the laser output unit 810 may operate according to a predetermined sequence or may operate randomly. In this case, the SPAD unit or microcell unit 842 of the receiving unit 840 may also operate in response to the operation of the big cell unit 812 .

For example, after the first row big cell unit of the big cell array 811 operates, the third row big cell unit may operate. Then, the fifth vixel unit may operate, and then the seventh vixel unit may operate.

In this case, after the first row SPAD unit or microcell unit 842 of the receiver 840 operates, the third row SPAD unit or microcell unit 842 may operate. Then, the fifth SPAD unit or microcell unit 842 may operate, and then the seventh SPAD unit or microcell unit 842 may operate.

Also, for example, the vixel unit of the vixel array 811 may operate randomly. In this case, the SPAD unit or the microcell unit 842 of the receiving unit existing at a position corresponding to the position of the randomly operated vixel unit 812 may operate.

37 is a diagram for explaining a semi-flash lidar according to another exemplary embodiment.

Referring to FIG. 37 , the semi-flash lidar 900 according to another embodiment may include a laser output unit 910 , a BCSC 920 , and a receiving unit 940 .

The semi-flash lidar 900 according to an embodiment may include a laser output unit 910 . The description of the laser output unit 910 may overlap with the laser output unit 810 of FIG. 35 , and thus a detailed description thereof will be omitted.

The semi-flash lidar 900 according to an embodiment may include a BCSC 920 . The description of the BCSC 920 may overlap with the BCSC 820 of FIG. 35 , and thus a detailed description thereof will be omitted.

The semi-flash lidar 900 according to an embodiment may include a receiver 940 . The description of the receiver 940 may overlap with the receiver 840 of FIG. 35 , and thus a detailed description thereof will be omitted.

According to an embodiment, the semi-flash type lidar 900 may have a constant optical path between components.

For example, light output from the laser output unit 910 may be incident on the object 950 through the BCSC 920 . Also, the light incident on the object 950 may be reflected and received by the receiver 940 . A lens for increasing light transmission/reception efficiency may be additionally inserted into the above optical path.

Compared to the semi-flash lidar 800 of FIG. 35 , the semi-flash lidar 900 of FIG. 37 may not include a scanning unit. The scanning function of the scanning unit may be performed by the laser output unit 910 and the BCSC 920 .

For example, the laser output unit 910 may include an addressable Bixel array to partially output a laser beam to an ROI by an addressable operation.

Also for example, the BCSC 920 may include a collimation component and a steering component to provide a specific directionality to the laser beam to irradiate the laser beam to a desired region of interest.

Also, compared with the semi-flash lidar 800 of FIG. 35 , the light path of the semi-flash lidar 900 of FIG. 37 may be simplified. By simplifying the light path, it is possible to minimize light loss upon light reception and to reduce the possibility of occurrence of crosstalk.

38 is a diagram for explaining the configuration of a semi-flash lidar according to another exemplary embodiment.

Referring to FIG. 38 , the semi-flash lidar 900 according to an embodiment may include a laser output unit 910 and a receiving unit 940 .

According to an embodiment, the laser output unit 910 may include a big cell array 911 . For example, the big cell array 99110 may have an N×M matrix structure.

According to an embodiment, the vixel array 911 may include a plurality of vixel units 914 . In this case, the vixel unit 914 may include a plurality of vixel emitters. For example, the big cell array 811 may include 1250 big cell units 914 having a 50×25 matrix structure, but is not limited thereto.

According to an embodiment, the vixel unit 914 may have a diverging angle. For example, the vixel unit 914 may have a horizontal diffusion angle 915 and a vertical diffusion angle 916 . For example, the vixel unit 914 may have a horizontal diffusion angle 813 of 1.2 degrees and a vertical diffusion angle 814 of 1.2 degrees, but is not limited thereto.

According to an embodiment, the receiver 940 may include a SPAD array 941 . For example, the SPAD array 841 may have an N×M matrix structure.

According to one embodiment, the SPAD array 941 may include a plurality of SPAD units 944 . In this case, the SPAD unit 944 may include a plurality of SPAD pixels 947 . For example, the SPAD unit 944 may include 12 X 12 SPAD pixels 947 .

Also for example, the SPAD array 941 may include 1250 SPAD units 944 in a 50×25 matrix structure. In this case, the arrangement of the SPAD unit 944 may correspond to the arrangement of the vixel unit 914 .

According to one embodiment, the SPAD unit 944 may have an FOV capable of receiving light. For example, the SPAD unit 944 may have a horizontal FOV 945 and a vertical FOV 946 . For example, the SPAD unit 944 may have a horizontal FOV 945 of 1.2 degrees and a vertical FOV 946 of 1.2 degrees.

In this case, the FOV of the SPAD unit 944 may be proportional to the number of SPAD pixels 947 included in the SPAD unit 944 . Alternatively, the FOV of the individual SPAD pixel 947 included in the SPAD unit 944 may be determined by the FOV of the SPAD unit 944 .

For example, when the horizontal FOV 948 and vertical FOV 949 of an individual SPAD pixel 947 are 0.1 degrees, if the SPAD unit 944 includes the SPAD pixel 947 of NXM, the The horizontal FOV 945 may be 0.1*N, and the vertical FOV 946 may be 0.1*M.

Also for example, when the horizontal FOV 945 and vertical FOV 946 of the SPAD unit 944 are 1.2 degrees, and the SPAD unit 944 contains 12 X 12 SPAD pixels 947, individual SPAD pixels The horizontal FOV 948 and vertical FOV 949 of 947 may be 0.1 degree (1.2/12).

According to another embodiment, the receiver 840 may include a SiPM array 941 . For example, the SiPM array 841 may have an N×M matrix structure.

According to one embodiment, the SiPM array 941 may include a plurality of microcell units 944 . In this case, the microcell unit 944 may include a plurality of microcells 947 . For example, the microcell unit 944 may include 12 X 12 microcells 947 .

Also for example, the SiPM array 941 may include 1250 microcell units 944 in a 50×25 matrix structure. In this case, the arrangement of the microcell units 944 may correspond to the arrangement of the vixel units 914 .

According to one embodiment, the microcell unit 944 may have an FOV capable of receiving light. For example, the microcell unit 944 may have a horizontal FOV 945 and a vertical FOV 946 . For example, the microcell unit 944 may have a horizontal FOV 945 of 1.2 degrees and a vertical FOV 946 of 1.2 degrees.

In this case, the FOV of the microcell unit 944 may be proportional to the number of microcells 947 included in the microcell unit 944 . Alternatively, the FOV of the individual microcells 947 included in the microcell unit 944 may be determined by the FOV of the microcell unit 944 .

For example, if the microcell unit 944 includes the microcell 947 of NXM, when the horizontal FOV 948 and the vertical FOV 949 of the individual microcell 947 are 0.1 degrees, the microcell unit 944 ), the horizontal FOV 945 may be 0.1*N, and the vertical FOV 946 may be 0.1*M.

Also for example, when the horizontal FOV 945 and vertical FOV 946 of the microcell unit 944 are 1.2 degrees, and the microcell unit 944 contains 12 X 12 microcells 947, the individual The horizontal FOV 948 and vertical FOV 949 of the microcell 947 may be 0.1 degrees (1.2/12).

According to an embodiment, the big cell unit 914 of the laser output unit 910 and the SPAD unit or the microcell unit 944 of the receiving unit 940 may correspond.

For example, the horizontal and vertical diffusion angles of the vixel unit 914 may be the same as the horizontal FOV 945 and vertical FOV 946 of the SPAD unit or microcell unit 944 .

For example, a laser beam output from the vixel unit 914 in one row and one column may be reflected by the object 850 to be received by the SPAD unit or microcell unit 944 in one row and one column.

Also, for example, a laser beam output from the vixel unit 914 in N rows and M columns may be reflected by the object 850 to be received by the SPAD unit or microcell unit 944 in N rows and M columns.

At this time, the laser beam output from the vixel unit 914 in N rows and M columns and reflected by the object 850 is received by the SPAD unit or microcell unit 944 in N rows and M columns, and the lidar device 900 is SPAD It may have resolution by unit or microcell unit 944 .

For example, if the SPAD unit or microcell unit 944 includes SPAD pixels or microcells 947 in N rows and M columns, the FOV irradiated by the big cell unit 914 is divided into NXM regions to determine distance information of the object. can

According to another embodiment, one big cell unit 914 may correspond to a plurality of SPAD units or microcell units 944 . For example, a laser beam output from the vixel unit 914 in one row and one column may be reflected by the object 850 to be received by the SPAD unit or microcell unit 944 in the first row, first column and first row and second column. .

According to another embodiment, a plurality of vixel units 914 may correspond to one SPAD unit or microcell unit 944 . For example, a laser beam output from the vixel unit 914 in one row and one column may be reflected by the object 850 to be received by the SPAD unit or microcell unit 944 in one row and one column.

According to an embodiment, the plurality of vixel units 914 included in the laser output unit 910 may operate according to a predetermined sequence or may operate randomly. In this case, the SPAD unit or the microcell unit 944 of the receiving unit 940 may also operate in response to the operation of the big cell unit 914 .

For example, the vixel unit of one row and one column of the vixel array 911 may operate, and then the vixel unit of the first row and third column may operate. Then, the vixel unit of 1 row and 5 columns may operate, and then the vixel unit of 1 row and 7 columns may operate.

In this case, the SPAD unit or microcell unit 944 of the first row and first column of the receiver 940 may operate, and then the SPAD unit or the microcell unit 944 of the first row and third column may operate. Then, the SPAD unit or microcell unit 944 in row 1 and column 5 may operate, and then the SPAD unit or microcell unit 944 in row 1 and column 7 may operate.

Also, for example, the vixel unit of the vixel array 911 may operate randomly. In this case, the SPAD unit or the microcell unit 944 of the receiving unit present at a position corresponding to the position of the randomly operated vixel unit 914 may operate.

Hereinafter, an operation method of the emitter array and the detector array will be described.

39 is a diagram for explaining operations of an emitter array and a detector array according to an embodiment.

Referring to FIG. 39 , the lidar device of the present invention may include an emitter array 1100 and a detector array 1200 .

According to an embodiment, the emitter array 1100 may be included in the laser output unit 100 of FIGS. 1 to 3 , and the detector array 1200 may be included in the sensor unit 300 of FIGS. 1 to 3 .

The optic unit 200 may be disposed in a direction in which the emitter array 1100 outputs a laser. The optic unit 200 may collimate or steer the laser beam output from the emitter array 1100 .

The laser beam output from the emitter array 1100 and passing through the optic unit 200 may be irradiated to the object. The laser beam reflected by the object may be received by the detector array 1200 . In this case, the laser beam reflected by the object may be received by the detector array 1200 through the optic unit 200 .

When the laser beam is received by the detector array 1200 , the detector array 1200 may detect photons and generate an electrical signal. Specific details thereof may overlap with the description of FIG. 1 , and thus will be omitted herein.

According to an embodiment, the emitter array 1100 may include a plurality of emitters. In this case, the emitter may be a laser diode (LD), solid-state laser, high power laser, light entitling diode (LED), vertical cavity surface emitting laser (VCSEL), external cavity diode laser (ECDL), etc. However, the present invention is not limited thereto.

Preferably, the emitter array 1100 may be the big cell array 150 of FIG. 6 . In this case, the emitter 1115 included in the emitter array 1100 may be the bigel emitter 110 of FIG. 4 .

Although FIG. 39 shows an emitter array in the form of an 8×8 matrix, the present invention is not limited thereto, and other types of emitter arrays are also possible.

According to an embodiment, the detector array 1200 may include a plurality of detectors. In this case, the detector may be a PN photodiode, a phototransistor, a PIN photodiode, APD, SPAD, SiPM, TDC, CMOS or CCD, but is not limited thereto.

Preferably, the detector array 1200 may be the SPAD array 750 of FIG. 31 . In this case, the detector 1215 included in the detector array 1200 may be the SPAD 7510 of FIG. 31 .

Although FIG. 39 shows a detector array in the form of an 8×8 matrix, the present invention is not limited thereto, and other types of detector arrays are also possible.

According to an embodiment, the controller 400 may operate a plurality of emitters included in the emitter array 1100 line by line. For example, the controller 400 may operate the first emitter group 1110 including a plurality of emitters. Also, the controller 400 may operate the second emitter group 1120 after the first emitter group 1110 is operated.

In this case, the first emitter group 1110 and the second emitter group 1120 may be adjacent columns or non-adjacent columns.

Also, at this time, the laser beam output from the first emitter group 1110 and reflected on the object may be received by the first detector group 1210 . Also, after the operation of the first emitter group 1110 , the laser beam output from the second emitter group 1120 and reflected on the object may be received by the second detector group 1220 .

According to an embodiment, the first emitter 1115 included in the first emitter group 1110 irradiates a laser beam to the first region, and the second emitter 1116 irradiates a laser beam to the second region. can do. For example, the first laser beam output from the first emitter 1115 and the second laser beam output from the second emitter 1116 are respectively transmitted through the optics of the optic unit 200 in the first region and the second region. area can be investigated.

In this case, the first laser beam reflected from the first region may be received by the first detector 1215 , and the second laser beam reflected from the second region may be received by the second detector 1216 . The first detector 1215 and the second detector 1216 may detect photons of a laser beam to generate a signal.

As the first emitter 1115 and the second emitter 1116 irradiate the laser beam to the first region and the second region, respectively, several times, the first detector 1215 and the second detector 1216 also emit photons. Multiple detections can be performed to generate multiple signals.

In this case, the controller 400 may generate a histogram by accumulating a plurality of signals output by the first detector 1215 and the second detector 1216 , respectively.

For example, as the first emitter 1115 irradiates the N-th laser to the first region, the controller 400 generates the first histogram by accumulating N data sets that are output signals of the first detector 1215 . can create

In this case, the data set may include data included in a plurality of histogram bins. For example, a data set consists of 10000 histogram bins, and data may be included in each histogram bin.

Specifically, the first histogram bin may have no data, and the second histogram bin may have data. In this case, it may be considered that a photon is not detected during the time of the first histogram bin, and that the photon is detected during the time of the second histogram bin.

Also, at this time, when there is data in the histogram bin, since a photon is detected, the laser beam output from the emitter array may be reflected by the object and detected, or external noise (such as sunlight) may be detected.

Therefore, since it is not possible to know which data is generated by the laser beam detected by being reflected by the object with one data set, the controller 400 needs to accumulate a plurality of data sets and extract the peak of the histogram.

In this case, the controller 400 may determine that the laser beam reflected from the object is received during the time period of the histogram bin in which the peak is formed among the accumulated histograms.

Also, for example, as the second emitter 1116 irradiates the Mth laser to the second region, the control unit 400 accumulates M data sets that are output signals of the second detector 1216 to obtain a second histogram. can create

Accordingly, the controller 400 may generate X histograms through the detector array 1200 including the X detectors. In this case, the controller 400 may determine the characteristics of the first region and the second region or the object based on the generated histogram.

For example, the controller 400 may calculate the distance and position coordinates of the object 500 based on the histogram. Also, for example, the controller 400 may check the reflectance and material information of the object 500 based on the histogram. Also, for example, the controller 400 may check the speed, the moving direction, etc. of the object 500 based on the histogram generated for each of the plurality of frames.

Specifically, as described with reference to FIG. 32 , the controller 400 may extract a signal of a certain amount 768 or more from the histogram 765 as a signal due to a photon reflected from the object 500 .

An algorithm for the control unit 400 to extract a signal by a photon reflected from the object 500 from the histogram 765 may overlap with the description of FIG. 32 , and thus a detailed description thereof will be omitted.

According to another embodiment, the controller 400 may control the emitters included in the emitter array 1100 in a row rather than a column.

For example, the controller 400 may operate a first row-direction emitter group including a plurality of emitters. Also, the controller 400 may operate the second row emitter group after the first row emitter group is operated. In this case, the first row emitter group and the second row emitter group may be adjacent rows or non-adjacent rows.

Also, at this time, the laser beam output from the first row-direction emitter group and reflected from the object may be received by the first row-direction detector group. In addition, after the operation of the first row-direction emitter group, the laser beam output from the second row-direction emitter group and reflected on the object may be received by the second row-direction detector group.

Similar to the column-direction operation, the laser beams output from the first row-direction emitter group and the second row-direction emitter group may be irradiated to the third area and the fourth area, respectively. In this case, the laser beam reflected from the third region may be received by the first row-direction detector group, and the laser beam reflected from the fourth region may be received by the second row-direction detector group.

According to another embodiment, the controller 400 may control the emitters included in the emitter array 1100 according to a predetermined sequence rather than the row direction or the column direction, or may control the emitters at random. In this case, the controller 400 may control the detectors corresponding to the emitters operated by the emitter array 1100 according to a predetermined sequence or randomly.

For example, when the control unit 400 sequentially operates an emitter in row 1, column 1, emitter in row 1, column 3, emitter in row 2, column 2, and emitter in row 2, column 5 of the emitter array 1100, Accordingly, the detectors in row 1, column 1, detectors in row 1, column 3, detectors in row 2, column 2, and detectors in row 2 and column 5 may be sequentially operated.

As described above, this may overlap with the addressable operation of the big cell array 153, and thus the detailed description thereof will be omitted.

In order for the control unit 400 to form a histogram, at least N data sets are required. For example, N can be 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, or more, and as N becomes larger, it is better to distinguish the laser beam reflected from the object from external noise. can

In order for the control unit 400 to accumulate N data sets to form a histogram, the laser output unit 100 should output at least N lasers. For example, the laser output unit 100 should output a laser 50 times per emitter.

According to an embodiment, the control unit 400 may operate the emitters included in the emitter array of the 8 X 8 matrix form column by column.

In this case, the detector array includes a control logic unit capable of selecting a column therein, so that the control logic unit corresponds to a column operating in the emitter array by the control unit 400 . By selecting a column in the detector array 1200 to be used, the column in the selected detector array 1200 may be activated.

For example, the control logic unit may be included in the emitter array, so that the column selection signal applied to the control logic unit of the emitter array and the column selection signal applied to the control logic unit of the detector array may be the same.

Also, at this time, in order for the control unit 400 to form the histogram, one row of emitters included in the emitter array 1100 of the 8 X 8 matrix must irradiate the laser N times (eg, 50 times).

For example, after the emitter group in the first row of the emitter array 1100 irradiates the laser 50 times, the emitter group in the second row irradiates the laser 50 times, and thereafter, the emitter group in the third row irradiates the laser 50 times. can be investigated That is, column 1, column 2, column 3 ?? Each emitter group in 8 rows can sequentially irradiate the laser 50 times.

In this case, in order to complete one frame, all histograms for each emitter included in the emitter array 1100 must be formed. That is, after the emitter groups in columns 1 to 8 each irradiate the laser several times, a histogram in which output signals of the detector groups in columns 1 to 8 of the detector array 1200 are accumulated should be formed.

According to an embodiment, the number of columns included in the emitter array 1100 is N, the pulse repetition frequency (PRF) of the emitters is P[Hz], and the number of samplings of the detector array 1200 may be M. have. In this case, the frame rate may be P/(M*N) [fps].

For example, when the number of columns included in the emitter array 1100 is 100, the PRF of the emitters is 500 kHz, and the sampling number of the detector array 1200 is 1000, the frame rate may be 5 fps.

Also, for example, when the number of columns included in the emitter array 1100 is 100, the PRF of the emitters is 500 kHz, and the sampling number of the detector array 1200 is 500, the frame rate may be 10 fps.

When generating the histogram, the number of samplings (M, for example, 1 to 1023) of the detector array 1200 must be large in order to clearly distinguish the external noise signal from the signal for the laser beam reflected on the object. However, since the frame rate and the sampling number M of the detector array 1200 are in inverse proportion to each other, there may be a limit to increasing the sampling number M of the detector array 1200 in order to have a high frame rate.

In this case, in order to have a high frame rate and to increase the sampling number M of the detector array 1200, the PRF(P) of the emitters may be increased. However, there is a limit to increasing the PRF(P) of the emitters, and even if it operates at the maximum PRF, the above problem may not be solved.

Accordingly, the present invention describes a solution for increasing the frame rate below. According to the following method, not only can the frame rate be increased, but also various control over the number of samplings (M) of the detector array 1200 is possible regardless of the frame rate.

40 is a diagram for explaining a method of operating an emitter array and a detector array according to an embodiment.

The first emitter 1310 and the second emitter 1320 illustrated in FIG. 40 may be included in the emitter array 1100 . Also, the first detector 1410 and the second detector 1420 may be included in the detector array 1200 .

For example, the first emitter 1310 may be included in the first emitter group 1110 , and the second emitter 1320 may be included in the second emitter group 1120 . Also, for example, the first emitter 1310 and the second emitter 1320 may be included in the first emitter group 1110 , that is, one column.

Also for example, the first emitter 1310 is included in the first emitter group 1110 , and the second emitter 1320 is a third emitter that is a column that is not adjacent to the first emitter group 1110 . can be included in a group. Also, for example, the first emitter 1310 may be included in the first row, and the second emitter 1320 may be included in a row that is not adjacent to the first row.

Similar to the emitter arrangement, the first detector 1410 may be included in the first detector group 1210 , and the second detector 1420 may be included in the second detector group 1220 . Also, for example, the first detector 1410 and the second detector 1420 may be included in the first detector group 11210 , that is, in one column.

Also, for example, the first detector 1410 may be included in the first detector group 1210 , and the second detector 1420 may be included in a third detector group that is a column not adjacent to the first detector group 1210 . . Also, for example, the first detector 1410 may be included in one row, and the second detector 1420 may be included in a row that is not adjacent to the first row.

As mentioned above, the detector may vary depending on the arrangement of the emitters being actuated. That is, the emitter and the detector are in one-to-one correspondence, and when the emitters in the N rows and M columns are operated, the detectors in the N rows and M columns may also be operated.

According to an embodiment, the first emitter 1310 may output a laser beam at a first time point t1 , a second time point t2 , and a fifth time point t5 . In this case, the second time point t2 may be later than the first time point t1 by the first time ts1. Also, in this case, the fifth time point t5 may be later than the second time point t2 by the first time ts1 . That is, the first emitter 1310 may output a laser beam with a first period ts1.

In this case, the first detector 1410 may receive the laser beam reflected on the object among the laser beams output by the first emitter 1310 at the first time point t1 during the first time period p1 . Also, after the first time period p1 , the first detector 1410 transmits the laser beam reflected on the object among the laser beams output by the first emitter 1310 at the second time point t2 to the second time period p2 . ) can be received while

The first time point t1 and the second time point t2 may be laser beam output time points according to the PRF of the first emitter 1310 . That is, the first emitter 1310 may not be able to output a laser beam having a predetermined power between the first time point t1 and the second time point t2 according to the predetermined PRF.

Therefore, the control unit 400 of the present invention is a blank time during which the first emitter 1310 does not output a laser beam having a predetermined power (eg, a time between the first time point t1 and the second time point t2). ), by controlling the second emitter 1320 to output the laser beam, the blank time may be used as the laser beam output time of the second emitter 1320 .

According to an embodiment, the second emitter 1320 may output a laser beam at a third time point t3 , a fourth time point t4 , and a sixth time point t6 . In this case, the fourth time t4 may be later than the third time t3 by the second time ts2. Also, at this time, the sixth time point t6 may be later than the fourth time point t4 by the second time ts2. That is, the second emitter 1320 may output a laser beam with a second period ts2 . In this case, the second period ts2 may be the same as the first period ts1, but is not limited thereto.

In this case, the second detector 1420 may receive the laser beam reflected by the object among the laser beams output by the second emitter 1320 at the third time point t3 for the third time period p3 . In addition, after the third time period p3, the second detector 1420 transmits the laser beam reflected on the object among the laser beams output by the second emitter 1320 at the fourth time point t4 during the fourth time period ( p4) can be received.

In this case, the laser beam reception sections of the first detector 1410 and the second detector 1420 may partially overlap.

For example, in the first time period p1 in which the first detector 1410 receives the laser beam output from the first emitter 1310 , the second detector 1420 outputs the output from the second emitter 1320 . It may partially overlap with the third time period p3 in which the laser beam is received.

Also, for example, in the second time period p2 in which the second detector 1420 receives the laser beam output from the second emitter 1320 , the first detector 1410 receives the laser beam output from the first emitter 1310 . It may partially overlap with the second time period p2 for receiving the output laser beam.

The third time point t3 may be a time point between the first time point t1 and the second time point t2. Also, in this case, the third time point t3 may be a time point within the first time period p1.

Also, the fourth time point t4 may be a time point between the second time point t2 and the fifth time point t5 . Also, the fourth time point t4 may be a time point within the second time period p2 .

Also, at this time, the first time point t1 and the third time point t3 may have a difference by the delay time td. In this case, the delay time td may be half of the first period ts1 (ie, a central time point between the first time point t1 and the second time point t2), but is not limited thereto.

The third time point t3 and the fourth time point t4 may be laser beam output time points according to the PRF of the second emitter 1320 . That is, the second emitter 1320 may not be able to output a laser beam having a predetermined power between the third time point t3 and the fourth time point t4 according to the predetermined PRF.

Accordingly, the control unit 400 controls the second emitter 1320 during the blank time (eg, the time between the third time point t3 and the fourth time point t4) during which the laser beam having a predetermined power cannot be output. By controlling the first emitter 1310 to output a laser beam, the blank time may be used as a laser beam output time of the first emitter 1310 .

That is, the controller 400 of the present invention may use the blank time by allowing the second emitter 1320 to output the laser beam between the laser beam output timings of the first emitter 1310 . Accordingly, the time for forming one frame can be reduced by about half compared to the conventional method.

For example, in the conventional method, as described above, the number of columns included in the emitter array 1100 is N, the Pulse Repetition Frequency (PRF) of the emitters is P [Hz], and the detector array 1200 . When the number of samples of is M, the frame rate may be P/(M*N)[fps].

However, according to the method described in FIG. 40 , the frame rate may be about P/(M*(N/2))[fps], that is, 2P/(M*N)[fps].

41 is a diagram for explaining an operation sequence of an emitter array and a detector array according to an embodiment.

As shown in FIG. 41( a ), the emitter array 1100 and the detector array 1200 may be sequentially operated one by one.

For example, between the laser beam output time of the first column emitter group, the second column emitter group outputs a laser beam, so that the first and second column emitter groups receive a laser beam equal to the sampling number (M) of the detector array 1200 . Beam can be output.

After the laser beam output of the emitter groups in the first and second columns is completed, the laser beams in the emitter groups in the third and fourth columns may be output as described above.

In addition, after the laser beam output of the emitter groups in the 3rd and 4th columns is completed, the laser beams of the emitter groups in the 5th and 6th columns may be output as described above.

In addition, after the laser beam output of the emitter groups in rows 5 and 6 is completed, the laser beams in the emitter groups in rows 7 and 8 may be output as described above.

According to the laser beam output of the emitter array 1100 , detector groups corresponding to the emitter groups in each column may be operated.

For example, while the first and second column emitter groups output laser beams, the first and second column detector groups may receive laser beams. In addition, while the emitter groups in the third and fourth columns output laser beams, the detector groups in the third and fourth columns may receive the laser beam.

As described above, the operating sequence of the emitter array 1100 and the detector array 1200 may be sequentially operated from left to right, but is not limited thereto. The emitter array 1100 and the detector array 1200 may be operated according to a predetermined sequence or may be operated randomly.

FIG. 41(b) shows an operation sequence of the emitter array 1100 and the detector array 1200 for minimizing interference.

The controller 400 may operate the emitter group and the detector group so that a distance between two columns that alternately output laser beams is maintained at a predetermined distance or more.

For example, the emitter group in column 5 outputs a laser beam between the laser beam output time of the emitter group in column 1, so that the emitter group in column 1 and column 5 emits a laser beam equal to the sampling number (M) of the detector array 1200 . Beam can be output.

After the laser beam output of the emitter groups in rows 1 and 5 is completed, the laser beams in the emitter groups in rows 2 and 6 may be output as described above.

In addition, after the laser beam output of the emitter groups in the 2nd and 6th rows is completed, the laser beams of the emitter groups in the 3rd and 7th rows may be output as described above.

In addition, after the laser beam output of the emitter groups in the 3rd and 7th columns is completed, the laser beams of the emitter groups in the 4th and 8th columns may be output as described above.

According to the laser beam output of the emitter array 1100 , detector groups corresponding to the emitter groups in each column may be operated.

For example, while the emitter groups in rows 1 and 5 output laser beams, the detector groups in rows 1 and 5 may receive laser beams. In addition, while the emitter groups in the second and sixth columns output laser beams, the detector groups in the second and sixth columns may receive the laser beam.

As described above, since the two columns that alternately output the laser beam are spaced apart from each other by a predetermined distance, interference between the two columns can be minimized.

42 is a view for explaining a method of operating an emitter array and a detector array according to another embodiment. FIG. 42 shows a method of operation for three or more emitters, unlike FIG. 40 .

The first emitter 1310 , the second emitter 1320 , and the third emitter 1330 illustrated in FIG. 42 may be included in the emitter array 1100 . Also, the first detector 1410 , the second detector 1420 , and the third detector 1430 may be included in the detector array 1200 .

The arrangement relationship of the first emitter 1310 , the second emitter 1320 , and the third emitter 1330 , and the first detector 1410 , the second detector 1420 , and the third detector 1430 are a detector array The arrangement relationship of 1200 may overlap with the description of FIG. 40 , and thus the detailed description thereof will be omitted.

According to an embodiment, the first emitter 1310 may output a laser beam at a first time point t1 , a second time point t2 , and a fifth time point t5 . In this case, the second time point t2 may be later than the first time point t1 by the first time ts1. Also, in this case, the fifth time point t5 may be later than the second time point t2 by the first time ts1 . That is, the first emitter 1310 may output a laser beam with a first period ts1.

In this case, the first detector 1410 may receive the laser beam reflected on the object among the laser beams output by the first emitter 1310 at the first time point t1 during the first time period p1 . Also, after the first time period p1 , the first detector 1410 transmits the laser beam reflected on the object among the laser beams output by the first emitter 1310 at the second time point t2 to the second time period p2 . ) can be received while

The first time point t1 and the second time point t2 may be laser beam output time points according to the PRF of the first emitter 1310 . That is, the first emitter 1310 may not be able to output a laser beam having a predetermined power between the first time point t1 and the second time point t2 according to the predetermined PRF.

Therefore, the control unit 400 of the present invention is a blank time during which the first emitter 1310 does not output a laser beam having a predetermined power (eg, a time between the first time point t1 and the second time point t2). ), the second emitter 1320 and the third emitter 1330 are controlled to output laser beams, so that the blank time is reduced by the laser beam output of the second emitter 1320 and the third emitter 1330 . time can be used.

According to an embodiment, the second emitter 1320 may output a laser beam at a third time point t3 and a sixth time point t6 . In this case, the sixth time point t6 may be later than the third time point t3 by the second time ts2. That is, the second emitter 1320 may output a laser beam with a second period ts2 .

In this case, the second detector 1420 may receive the laser beam reflected by the object among the laser beams output by the second emitter 1320 at the third time point t3 for the third time period p3 . In addition, after the third time period p3, the second detector 1420 transmits the laser beam reflected on the object among the laser beams output by the second emitter 1320 at the sixth time point t6 during the sixth time period ( p6) can be received.

In this case, the laser beam reception sections of the first detector 1410 and the second detector 1420 may partially overlap.

For example, in the first time period p1 in which the first detector 1410 receives the laser beam output from the first emitter 1310 , the second detector 1420 outputs the output from the second emitter 1320 . It may partially overlap with the third time period p3 in which the laser beam is received.

The third time point t3 may be a time point between the first time point t1 and the second time point t2. Also, in this case, the third time point t3 may be a time point within the first time period p1.

Also, the sixth time point t6 may be a time point between the second time point t2 and the fifth time point t5 . Also, the sixth time point t6 may be a time point within the second time period p2.

Also, at this time, the first time point t1 and the third time point t3 may have a difference by the first delay time td1 . In this case, the first delay time td1 may be one third of the first period ts1, but is not limited thereto.

The third time point t3 and the sixth time point t6 may be the laser beam output time points according to the PRF of the second emitter 1320 . That is, the second emitter 1320 may not be able to output a laser beam having a predetermined power between the third time point t3 and the sixth time point t6 according to the predetermined PRF.

Accordingly, the control unit 400 controls the second emitter 1320 during an empty time (eg, a time between the third time point t3 and the sixth time point t6) during which the laser beam having a predetermined power cannot be output, The first emitter 1310 and the third emitter 1330 are controlled to output the laser beam, and the blank time is used as the laser beam output time of the first emitter 1310 and the third emitter 1330 . can

According to an embodiment, the third emitter 1330 may output a laser beam at the fourth time point t4 and the seventh time point t7 . In this case, the seventh time point t7 may be later than the fourth time point t4 by the third time ts3 . That is, the third emitter 1330 may output a laser beam with a third period ts3. In this case, the third period ts3 may be the same as the first period ts1 or the second period ts2, but is not limited thereto.

In this case, the third detector 1430 may receive the laser beam reflected on the object among the laser beams output by the third emitter 1330 at the fourth time t4 during the fourth time period p4 . In addition, after the fourth time period p4, the third detector 1430 transmits the laser beam reflected on the object among the laser beams output by the third emitter 1330 at the seventh time point t7 during the seventh time period ( p7) can be received.

In this case, the laser beam reception sections of the first detector 1410 , the second detector 1420 , and the third detector 1430 may partially overlap.

For example, in the first time period p1 in which the first detector 1410 receives the laser beam output from the first emitter 1310 , the second detector 1420 outputs the output from the second emitter 1320 . The third time period p3 for receiving the laser beam and the third detector 1430 may partially overlap with the fourth time period p4 for receiving the laser beam output from the third emitter 1330 .

The fourth time point t4 may be a time point between the first time point t1 and the second time point t2. Also, in this case, the third time point t3 may be a time point within the first time period p1.

Also, the fourth time point t4 may be a time point between the third time point t3 and the sixth time point t6 . Also, in this case, the fourth time point t4 may be a time point within the third time period p3 .

The seventh time point t7 may be a time point between the second time point t2 and the fifth time point t5. Also, at this time, the seventh time point t7 may be a time point within the second time period p2.

Also, the seventh time point t7 may be a time point after the sixth time point t6 . Also, in this case, the seventh time point t7 may be a time point within the sixth time period p6 .

Also, at this time, the first time point t1 and the fourth time point t4 may have a difference by the second delay time td2. In this case, the second delay time td2 may be two-thirds of the first period ts1, but is not limited thereto.

Also, at this time, the third time point t3 and the fourth time point t4 may have a difference by the third delay time td3. In this case, the third delay time td3 may be one third of the first period ts1 or the second period ts2, but is not limited thereto.

The fourth time point t4 and the seventh time point t7 may be laser beam output times according to the PRF of the third emitter 1330 . That is, the third emitter 1330 may not be able to output a laser beam having a predetermined power between the fourth time point t4 and the seventh time point t7 according to the predetermined PRF.

Accordingly, the control unit 400 controls the third emitter 1330 during the blank time (eg, the time between the fourth time point t4 and the seventh time point t7) during which the laser beam having a predetermined power cannot be output. By controlling the first emitter 1310 and the second emitter 1320 to output laser beams, the blank time is used as the laser beam output time of the first emitter 1310 and the second emitter 1320 . can

That is, the control unit 400 according to the present invention causes the second emitter 1320 and the third emitter 1330 to output the laser beam between the laser beam output timings of the first emitter 1310 to reduce the blank time. can be utilized Accordingly, the time for forming one frame can be reduced to about one third compared to the conventional method.

For example, in the conventional method, as described above, the number of columns included in the emitter array 1100 is N, the Pulse Repetition Frequency (PRF) of the emitters is P [Hz], and the detector array 1200 . When the number of samples of is M, the frame rate may be P/(M*N)[fps].

However, according to the method described in FIG. 42 , the frame rate may be about P/(M*(N/3))[fps], that is, 3P/(M*N)[fps].

43 is a view for explaining a method of operating an emitter array and a detector array according to another embodiment.

43 illustrates an on/off control method of a detector for minimizing interference between each emitter group and the detector group that alternately outputs and receives a laser beam.

The basic operation methods of the first emitter 1310 , the second emitter 1320 , the first detector 1410 , and the second detector 1420 of FIG. 43 may overlap with the description of FIG. 40 , so for details, refer to omit

According to an embodiment, the first time period p1 may include a period in which the first detector 1410 is in an on state and a period in which the first detector 1410 is in an off state.

The on state of the detector may include an on state by the switch when on/off control is performed by the switch. Also, the on state of the detector may include a case in which the detector is selected by a control logic unit in the detector array.

Also, the on state of the detector may include a case in which power is applied to the detector. The on state of the detector is not limited to the above case, and may include any case in which the detector can detect a photon.

The off state of the detector may include an off state by the switch when on/off control is performed by the switch. Also, the off state of the detector may include a case in which the detector is not selected by the control logic unit in the detector array.

Also, the off state of the detector may include a case in which power is not applied to the detector. The off state of the detector is not limited to the above case, and may include any case in which the detector does not detect a photon.

For example, the first detector 1410 receiving the laser beam output from the first emitter 1310 may have a second emitter from a first time point t1 at which the first emitter 1310 outputs a laser beam. It may be in the on state until the third time point t3 at which the laser beam is output at 1320 .

Also, for example, the first detector 1410 may be configured from a third time point t3 at which the second emitter 1320 outputs a laser beam to a second time point t2 at which the first emitter 1310 outputs a laser beam. ) may be in the off state.

Interference effect generated when the first detector 1410 receives the laser beam output from the second emitter 1320 after the third time point t3 , which is the point at which the second emitter 1320 outputs the laser beam To prevent this, the controller 400 may turn off the first detector 1410 between the third time point t3 and the second time point t2 .

Also, according to an embodiment, the third time period p3 may include an on state period and an off state period of the second detector 1420 .

Like the first detector 1410 , the second detector 1420 may be on or off during the third time period p3 .

For example, the second detector 1420 that receives the laser beam output from the second emitter 1320 is the first emitter from a third time point t3 at which the second emitter 1320 outputs the laser beam. It may be in the on state until the second time point t2 at which the laser beam 1310 is output.

Also, for example, the second detector 1420 may be configured from a second time point t2 at which the first emitter 1310 outputs a laser beam to a fourth time point t4 at which the second emitter 1320 outputs a laser beam. ) may be in the off state.

Interference effect generated when the second detector 1420 receives the laser beam output from the first emitter 1310 after the second time point t2, which is the time point at which the first emitter 1310 outputs the laser beam To prevent this, the controller 400 may turn off the second detector 1420 between the second time point t2 and the fourth time point t4.

43 illustrates a case in which the delay time td, which is an interval between the first time point t1 and the third time point t3, is half of the first period ts1 or the second period ts2.

When the delay time td is half of the first period ts1 or the second period ts2, when the first detector 1410 is in an on state, the second detector 1420 is in an off state, When the first detector 1410 is in an off state, the second detector 1420 may be in an on state.

In FIG. 44 below, when the delay time td, which is the interval between the first time point t1 and the third time point t3, is not half of the first period ts1 or the second period ts2 Explain.

44 is a diagram for explaining a method of operating an emitter array and a detector array according to another embodiment.

The basic operating methods of the first emitter 1310 , the second emitter 1320 , the first detector 1410 , and the second detector 1420 of FIG. 44 may overlap with the description of FIG. 40 , so for details, refer to omit

44 illustrates a case in which the delay time td, which is the interval between the first time point t1 and the third time point t3, is not half of the first period ts1 or the second period ts2, have.

According to an embodiment, the delay time td may be less than or equal to half of the first period ts1 or the second period ts2. Accordingly, the time when the first detector 1410 is in the on state may be reduced, and the time in which the second detector 1420 is in the on state may increase compared to the case of FIG. 43 .

Therefore, compared to the case of FIG. 43 , a time window of the first detector 1410 may be reduced, and thus a distance that the first detector 1410 may detect may be shortened. That is, the measurement distance that the controller 400 can measure through the first detector 1410 may be shortened.

In addition, as compared to the case of FIG. 43 , the time window of the second detector 1420 is increased, and thus a distance that the second detector 1420 can detect may be increased. That is, the measurement distance that the controller 400 can measure through the second detector 1420 may be increased.

That is, the controller 400 may measure a short-range portion of the first region through the first emitter 1310 and the first detector 1410 , and use the second emitter 1320 and the second detector 1420 . It is possible to measure the long-distance part of the second region.

Intentionally, the controller 400 may measure a short-range portion in the first region and measure a long-range portion in the second region. However, in general, the controller 400 determines the characteristics of the object existing in the first area and the second area by making the measurement distances of the first area and the second area the same.

Accordingly, a method for making the measurement distances of the first area and the second area the same will be described with reference to FIG. 45 below.

45 is a diagram for explaining a method of operating an emitter array and a detector array according to another embodiment.

The basic operating methods of the first emitter 1310 , the second emitter 1320 , the first detector 1410 , and the second detector 1420 of FIG. 45 may overlap with the description of FIG. 40 , so for details, refer to omit

45 illustrates a case in which the delay time td, which is the interval between the first time point t1 and the third time point t3, is not half of the first period ts1 or the second period ts2, have.

Also, FIG. 45 illustrates a case in which the delay times td1 and td2, which are times between the laser beam output timing of the first emitter 1310 and the laser beam output timing of the second emitter 1320, are not constant. .

According to an embodiment, the first delay time td1 that is the difference between the laser beam output timings of the first emitter 1310 and the second emitter 1320 during the first period p11 is the first period ts1 ) may be less than half of Conversely, during the second period p22, the second delay time td2, which is the difference between the laser beam output timings of the first emitter 1310 and the second emitter 1320, is less than half of the first period ts1. can be large

During the first period p11 , the time window of the first detector 1410 may be shorter than half of the first time period p1 . Accordingly, during the first period p11 , the controller 400 may measure the short-range portion of the first area through the first detector 1410 .

Also, during the first period p11 , the time window of the second detector 1420 may be longer than half of the third time period p3 . Accordingly, during the first period p11 , the controller 400 may measure the long-distance portion of the second area through the second detector 1420 .

Conversely, during the second period p22 , the time window of the first detector 1410 may be longer than half of the first time period p1 . Accordingly, during the second period p22 , the controller 400 may measure the long-distance portion of the first area through the first detector 1410 .

Also, during the second period p22 , the time window of the second detector 1420 may be shorter than half of the third time period p3 . Accordingly, during the second period p22 , the controller 400 may measure a short-range portion of the second area through the second detector 1420 .

According to an embodiment, the first cycle p11 and the second cycle p22 may be alternately repeated. At this time, before moving from the first period p11 to the second period p22 , the fourth time period p4 , which is the measurement period of the second detector 1420 , is longer than the length of the first time period p1 . A possible sag section 1421 may exist.

In the sag section 1421 , the repetition of the on/off state of the second detector 1420 may be temporarily irregular. However, after the sag section 1421, the control of the on/off state may be changed regularly.

The control unit 400 alternately repeats the first period p11 and the second period p22 or sets the time interval between the first period p11 and the second period p22 to be the same in the first region and the second period. It can enable short-range measurement and long-range measurement of an area.

For example, the controller 400 may alternately repeat the first cycle p11 and the second cycle p22 in the same number during one frame measurement. Also, for example, the controller 400 may control the emitter array 1100 and the detector array 1200 so that half of the first cycle p11 and the other half follow the second cycle p22 during one frame measurement. can

46 is a view for explaining a method of operating an emitter array and a detector array according to another embodiment.

The basic operating methods of the first emitter 1310 , the second emitter 1320 , the first detector 1410 , and the second detector 1420 of FIG. 46 may overlap with the description of FIG. 40 , so for details, refer to omit

46 illustrates a case in which the laser beam output period of the first emitter 1310 and the second emitter 1320 is different.

The control unit 400 makes the laser beam output cycle of the first emitter 1310 and the second emitter 1320 different to include a signature or an identifier in the laser beam output by the emitter array 1100 . can

By including the signature or identifier in the laser beam, the controller 400 may distinguish the lidar device outputting the laser beam including the signature or identifier from other laser output devices or other lidar devices.

According to an embodiment, the control unit 400 sets the laser beam output period to the first period (d1) and the second period (d2) for the first emitter 1310 and the second emitter 1320 to change the period. The laser beam can be output alternately.

According to another embodiment, the controller 400 may output the laser beam output period of the first emitter 1310 and the second emitter 1320 as three or more. For example, the controller 400 may control the first emitter 1310 to output a laser beam at intervals of 3 seconds, 4 seconds, 1 second, and 2 seconds.

At this time, the control unit 400 controls the second emitter 1320 after the delay time td after the first time point t1, which is the point at which the first emitter 1310 outputs the laser beam, for 3 seconds and 4 seconds. It can be controlled to output a laser beam at intervals of seconds, 1 second, and 2 seconds.

The present invention is not limited to the above embodiment, and the controller 400 may determine the output timing of the laser beam of the emitter according to a predetermined sequence.

The control unit 400 may prevent interference with other devices by including the signature in the laser beam output, and may prevent malfunction by distinguishing the signal output by the control unit 400 from other signals.

47 is a flowchart for explaining a method of controlling a lidar device according to an embodiment.

Referring to FIG. 47 , the lidar device may control an emitter array and a detector array.

According to one embodiment, the control method of the lidar device includes the step of emitting a laser beam to the first region at a first time by the first emitter ( S110 ), and the step of outputting the first signal by the first detector ( S120 ) and accumulating a first data set based on the first signal in a first histogram ( S130 ).

In addition, the second emitter emits a laser beam to the second region at a second time point (S140), the second detector outputs a second signal (S150), and a second histogram based on the second signal It may include accumulating the second data set ( S160 ).

In addition, the first emitter emits a laser beam to the first region at a third time point ( S170 ), the first detector outputs a third signal ( S180 ), and a first histogram based on the third signal It may include accumulating the third data set ( S190 ).

In this case, the second time point may be a time point between the first time point and the third time point.

The control method of the lidar device may overlap with the control method of the controller 400 described with reference to FIGS. 40 to 46 , and thus the detailed description thereof will be omitted.

The method according to the embodiment may be implemented in the form of program instructions that can be executed through various computer means and recorded in a computer-readable medium. The computer-readable medium may include program instructions, data files, data structures, etc. alone or in combination. The program instructions recorded on the medium may be specially designed and configured for the embodiment, or may be known and available to those skilled in the art of computer software. Examples of the computer-readable recording medium include magnetic media such as hard disks, floppy disks and magnetic tapes, optical media such as CD-ROMs and DVDs, and magnetic such as floppy disks. - includes magneto-optical media, and hardware devices specially configured to store and carry out program instructions, such as ROM, RAM, flash memory, and the like. Examples of program instructions include not only machine language codes such as those generated by a compiler, but also high-level language codes that can be executed by a computer using an interpreter or the like. The hardware devices described above may be configured to operate as one or more software modules to perform the operations of the embodiments, and vice versa.

As described above, although the embodiments have been described with reference to the limited embodiments and drawings, various modifications and variations are possible from the above description by those skilled in the art. For example, the described techniques are performed in a different order than the described method, and/or the described components of the system, structure, apparatus, circuit, etc. are combined or combined in a different form than the described method, or other components Or substituted or substituted by equivalents may achieve an appropriate result.

Therefore, other implementations, other embodiments, and equivalents to the claims are also within the scope of the following claims.

1310: first emitter
1320: second emitter
1410: first detector
1420: second detector

Claims (15)

an emitter array including first and second emitters for outputting a laser beam;
a detector array including a first detector for receiving the laser beam reflected from the first region and a second detector for receiving the laser beam reflected from the second region; and
a processor for determining characteristics of the first region and the second region based on a histogram in which the output signal of the detector array is accumulated;
The processor is
In order to determine the characteristics of the first region and the second region, a plurality of data sets based on the output signal of the first detector are accumulated and a plurality of data sets based on the output signal of the first histogram and the second detector are collected. accumulating to form a second histogram,
The first histogram includes a first data set generated based on an output signal of the first detector after a first time point when the first emitter outputs a laser beam, and a second data set generated by the first emitter outputting a laser beam. and a second data set generated based on the output signal of the first detector after the time point,
The second histogram includes a third data set generated based on the output signal of the second detector after the third time point when the second emitter outputs the laser beam,
The third time point is between the first time point and the second time point.
lidar device.
According to claim 1,
The processor determines the characteristics of the first region and the second region based on peaks of the first histogram and the second histogram, respectively.
lidar device.
According to claim 1,
The interval between the first time point and the third time point is half the interval between the first time point and the second time point
lidar device.
According to claim 1,
The second histogram includes a fourth data set generated based on the output signal of the second detector after the fourth time point when the second emitter outputs the laser beam,
The second time point is between the third time point and the fourth time point.
lidar device.
5. The method of claim 4,
The interval between the third time point and the fourth time point is the same as the interval between the first time point and the second time point.
lidar device.
According to claim 1,
The interval between the first time point and the third time point is greater than half the interval between the first time point and the second time point
lidar device.
According to claim 1,
The first detector is in an off state between the third time point and the second time point,
The second detector is in an off state between the first time point and the third time point.
lidar device.
According to claim 1,
The emitter array is a VCSEL (Vertical Cavity Surface Emitting Laser) array.
lidar device.
According to claim 1,
The detector array is a single-photon avalanche diode (SPAD) array.
lidar device.
According to claim 1,
The lidar device includes an optic for irradiating a first laser beam output from the first emitter to the first region and irradiating a second laser beam output from the second emitter to the second region
lidar device.
11. The method of claim 10,
The optic is at least one of a lens, a prism, a microprism array, and a meta surface.
lidar device.
According to claim 1,
The first histogram includes a fourth data set generated based on the output signal of the first detector after a fourth time point when the first emitter outputs the laser beam,
The first emitter is a laser beam such that the interval between the first time point and the second time point becomes a first interval, and the interval between the second time point and the fourth time point becomes a second interval different from the first interval. to output
lidar device.
According to claim 1,
The first data set is generated based on the output signal of the first detector in a first time interval,
The second data set is generated based on the output signal of the first detector in a second time interval,
The third data set is generated based on the output signal of the second detector in a third time interval,
The third time interval is at least partially overlapped with the first time interval and the second time interval.
lidar device.
An emitter array for irradiating a laser beam to the object and a detector array for receiving the laser beam reflected on the object, wherein a plurality of data sets based on an output signal of the detector array are accumulated based on a histogram of the object characteristics In the control method of the lidar device to determine,
irradiating a laser beam to a first area at a first time point and a second time point through a first emitter included in the emitter array;
receiving the laser beam reflected from the first area through a first detector included in the detector array;
forming a first histogram including a first data set based on an output signal of the first detector after the first time point and a second data set based on an output signal of the first detector after the second time point;
irradiating a laser beam to a second area at a third time point through a second emitter included in the emitter array;
receiving the laser beam reflected from the second area through a second detector included in the detector array; and
and forming a second histogram including a third data set based on the output signal of the second detector after the third time point,
The third time point is between the first time point and the second time point.
How to control the lidar device.
14. A recording medium storing executable code that is read by a computer in which a program is recorded to perform the method of any one of claims 1 to 13.

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