KR20210106907A - Antena segment and inductive coupling plasma processing apparatus - Google Patents

Abstract

The present invention relates to an antenna segment and an inductively coupling plasma processing device. The antenna segment formed by winding an antenna wire and forming a first plane by a part of the antenna wire comprises a first antenna line at least a part of which forms the first plane on one side in a winding axis direction and a second antenna wire forming the first plane from the other side in the winding axis direction. And the first antenna line has a planar antenna unit forming the first plane, a stacked antenna unit spaced apart from the upper side of the second antenna line, and a connection unit for connecting the planar antenna unit and the stacked antenna unit.

Description

ANTENA SEGMENT AND INDUCTIVE COUPLING PLASMA PROCESSING APPARATUS

The present disclosure relates to an antenna segment and an inductively coupled plasma processing device.

Patent Document 1 discloses a ring-shaped antenna composed of a total of eight antenna segments including four first antenna segments constituting a corner portion and four second antenna segments constituting a side center portion. In addition, the first antenna segment and the second antenna segment are configured in a vertical spiral shape by winding the antenna wire in a direction intersecting the substrate, thereby generating an induced electric field in a plane portion that is a portion that generates an induced electric field that contributes to the plasma facing the dielectric wall. It is disclosed that the direction of is unidirectional along the annular region.

Japanese Patent Laid-Open No. 2013-162035

The present disclosure provides an antenna segment and an inductively coupled plasma processing apparatus that improve the uniformity of plasma density.

An antenna segment according to an aspect of the present disclosure is an antenna segment formed by winding an antenna wire normally, and forming a first plane by a part of the antenna wire, and at least a part of the first plane is formed on one side in the winding axis direction. A first antenna line forming a first plane, and a second antenna line forming the first plane on the other side in the winding axis direction, wherein the first antenna line is on a plane forming the first plane It has an antenna unit, a laminated antenna unit arranged to be spaced apart above the second antenna line, and a connection unit for connecting the planar antenna unit and the laminated antenna unit.

According to the present disclosure, it is possible to provide an antenna segment and an inductively coupled plasma processing apparatus for improving the uniformity of plasma density.

1 is a longitudinal cross-sectional view showing an example of a substrate processing apparatus according to a first embodiment.
Fig. 2 is a plan view showing an example of arrangement of a metal window and a high-frequency antenna;
Fig. 3 is a perspective view showing an example of a second antenna segment;
Fig. 4 is a perspective view showing an example of a first antenna segment;
Fig. 5 is a front view showing an example of a first antenna segment;
Fig. 6 is a BB cross-sectional view showing an example of a first antenna segment;
Fig. 7 is a CC sectional view showing an example of a first antenna segment;
Fig. 8 is a DD cross-sectional view showing an example of a first antenna segment;
Fig. 9 is a perspective view showing another example of a first antenna segment;
Fig. 10 is an example of a graph showing a change in an induced electric field in the radial direction;
11 is a perspective view showing another example of a first antenna segment;
Fig. 12 is a perspective view showing another example of a second antenna segment;
Fig. 13 is a schematic diagram showing the flow of electric current;
Fig. 14 is a perspective view showing another example of a first antenna segment;
Fig. 15 is a perspective view showing another example of a first antenna segment;

Hereinafter, a gas supply method and a substrate processing apparatus (inductively coupled plasma processing apparatus) 10 according to an embodiment of the present disclosure will be described with reference to the accompanying drawings. In addition, in this specification and drawing, about the substantially same component, the overlapping description may be abbreviate|omitted by attaching|subjecting the same code|symbol.

[Substrate processing apparatus according to the first embodiment]

With reference to FIG. 1, the substrate processing apparatus 10 which concerns on 1st Embodiment of this indication is demonstrated. Here, FIG. 1 is a longitudinal cross-sectional view showing an example of the substrate processing apparatus 10 according to the first embodiment.

The substrate processing apparatus 10 shown in FIG. 1 is a flat panel display (hereinafter, referred to as "FPD") for a rectangular substrate G (hereinafter simply referred to as "substrate") in plan view. , an inductively coupled plasma (ICP) processing apparatus for performing various substrate processing methods. Glass is mainly used as a material of the board|substrate G, and a transparent synthetic resin etc. may be used depending on a use. Here, the substrate treatment includes an etching treatment, a film forming treatment using a CVD (Chemical Vapor Deposition) method, and the like. Examples of the FPD include a liquid crystal display (LCD), an electroluminescence (EL), a plasma display panel (PDP), and the like. The substrate G includes a supporting substrate in addition to the form in which a circuit is patterned on the surface thereof. Moreover, the planar dimension of the board|substrate for FPD is enlarged with the change of generation, and the planar dimension of the board|substrate G processed by the substrate processing apparatus 10 is about 1500 mm x 1800 mm of the 6th generation, for example. It includes at least a dimension of about 3000 mm x 3400 mm of the 10.5th generation from the dimension. In addition, the thickness of the board|substrate G is about 0.2 mm - several mm.

The substrate processing apparatus 10 shown in FIG. 1 includes a rectangular parallelepiped box-shaped processing container 20 , and a substrate mounting table 70 arranged in the processing container 20 and having a rectangular outline in plan view on which a substrate G is mounted. ) and a control unit 90 . Further, the processing container may have a shape such as a cylindrical box shape or an elliptical cylindrical box shape. In this form, the substrate mounting table is also circular or elliptical, and the substrate mounted on the substrate mounting table is also circular or the like.

The processing chamber 20 is partitioned into two upper and lower spaces by a metal window 50 , an antenna chamber A as an upper space is formed by the upper chamber 13 , and a processing area S (process chamber) as a lower space is It is formed by the lower chamber 17 . In the processing container 20, a rectangular annular support frame 14 is disposed to protrude from the inside of the processing container 20 at a position forming the boundary between the upper chamber 13 and the lower chamber 17, A metal window 50 is provided on the support frame 14 .

The upper chamber 13 forming the antenna chamber A is formed by the side wall 11 and the ceiling plate 12, and is formed as a whole by metal such as aluminum or an aluminum alloy.

The lower chamber 17 having the processing region S therein is formed by the side wall 15 and the bottom plate 16, and is formed as a whole by a metal such as aluminum or an aluminum alloy. In addition, the side wall 15 is grounded by a ground wire 21 .

In addition, the support frame 14 is formed of metals, such as electroconductive aluminum and an aluminum alloy, and can also be called a metal frame.

At the upper end of the side wall 15 of the lower chamber 17, a rectangular annular (stepless) seal groove 22 is formed, and a sealing member 23 such as an O-ring is fitted into the seal groove 22, , when the abutting surface of the support frame 14 holds the sealing member 23 , the seal structure of the lower chamber 17 and the support frame 14 is formed.

On the side wall 15 of the lower chamber 17 , a carry-in/out port 18 for carrying in/out of the substrate G is opened with respect to the lower chamber 17 , and the carrying-in/out port 18 can be opened and closed by a gate valve 24 . is well composed. A transfer chamber (not shown) containing a transfer mechanism is adjacent to the lower chamber 17 , and the gate valve 24 is opened/closed to control the opening and closing of the gate valve 24, and the substrate G is carried in and out through the transfer port 18 by the transfer mechanism. all.

In addition, a plurality of exhaust ports 19 are provided in the bottom plate 16 of the lower chamber 17 , and a gas exhaust pipe 25 is connected to each exhaust port 19 , and the gas exhaust pipe 25 has an on/off valve 26 . ) is connected to the exhaust device 27 . A gas exhaust portion 28 is formed by the gas exhaust pipe 25 , the on-off valve 26 , and the exhaust device 27 . The exhaust device 27 has a vacuum pump such as a turbo molecular pump, and is configured to be capable of evacuating the inside of the lower chamber 17 to a predetermined degree of vacuum during the process. In addition, a pressure gauge (not shown) is provided in the lower chamber 17 at the appropriate position, and monitor information by the pressure gauge is transmitted to the control unit 90 .

The substrate mounting table 70 includes a substrate 73 and an electrostatic chuck 76 formed on an upper surface 73a of the substrate 73 .

The base material 73 has a rectangular shape in a plan view, and has a planar dimension about the same as the FPD mounted on the substrate mounting table 70 . For example, the base material 73 has a planar dimension about the same as the substrate G to be loaded, the long side length is about 1800 mm to 3400 mm, and the short side length can be set to a dimension of about 1500 mm to 3000 mm. have. With respect to this planar dimension, the thickness of the substrate 73 may be, for example, on the order of 50 mm to 100 mm.

The substrate 73 is provided with a temperature control medium flow path 72a meandering so as to cover the entire area of a rectangular plane, and is formed of stainless steel, aluminum, an aluminum alloy, or the like. In addition, the base material 73 may not be a single member like the example of illustration, but may be formed in the laminated body of two members of an upper base material and a lower base material. In that case, the temperature control medium flow path 72a may be provided in the lower base material, and may be provided in the upper base material.

On the bottom plate 16 of the lower chamber 17, a box-shaped pedestal 78 formed of an insulating material and having a step portion inside is fixed, and a substrate mounting table 70 is provided on the step portion of the pedestal 78. is loaded

An electrostatic chuck 76 on which the substrate G is directly mounted is formed on the upper surface of the substrate 73 . The electrostatic chuck 76 includes a ceramic layer 74, which is a dielectric film formed by thermal spraying of ceramics such as alumina, and a conductive layer 75 (electrode) embedded in the ceramic layer 74 and having an electrostatic adsorption function. have

The conductive layer 75 is connected to a DC power supply 85 via a power supply line 84 . When a switch (not shown) interposed in the power supply line 84 is turned on by the control unit 90 , a DC voltage is applied from the DC power supply 85 to the conductive layer 75 , thereby generating a Coulombic force. By this Coulomb force, the substrate G is electrostatically attracted to the upper surface of the electrostatic chuck 76 , and is held while being mounted on the upper surface of the substrate 73 .

The substrate 73 constituting the substrate mounting table 70 is provided with a temperature control medium flow path 72a meandering so as to cover the entire area of the rectangular plane. At both ends of the temperature control medium flow path 72a, a transfer pipe 72b to which a temperature control medium is supplied with respect to the temperature control medium flow path 72a, and a temperature control medium whose temperature is increased or decreased by flowing through the temperature control medium flow path 72a A return pipe 72c from which is discharged is communicated.

As shown in Fig. 1, the conveying pipe 72b and the return pipe 72c communicate with the conveying flow path 87 and the return flow path 88, respectively, and the conveying flow path 87 and the return flow path 88 are It is in communication with a temperature control means, for example a chiller 86 . The chiller 86 has a main body for controlling the temperature and discharge flow rate of the temperature control medium, and a pump for pressurizing the temperature control medium (both not shown). As a temperature control medium, a refrigerant|coolant is applied, for example, Galden (registered trademark), fluorine nut (registered trademark), etc. are applied to this refrigerant|coolant. The temperature control device 89 is constituted by the transfer flow path 87 , the return flow path 88 , and the chiller 86 .

A temperature sensor such as a thermocouple is disposed on the substrate 73 , and monitor information by the temperature sensor is transmitted to the control unit 90 at any time. And based on the transmitted monitor information, temperature adjustment control of the base material 73 and the board|substrate G is performed by the control part 90. As shown in FIG. More specifically, the temperature and flow volume of the temperature control medium supplied from the chiller 86 to the conveyance flow path 87 are adjusted by the control part 90 . And temperature control of the board|substrate mounting table 70 is performed by circulating in the temperature control medium flow path 72a the temperature control medium to which temperature adjustment and flow volume adjustment were performed. In addition, a temperature sensor such as a thermocouple may be disposed on the electrostatic chuck 76 , for example.

A step portion is formed by the outer periphery of the electrostatic chuck 76 and the base material 73 and the upper surface of the pedestal 78 , and a rectangular frame-shaped focus ring 79 is mounted on the step portion. In a state in which the focus ring 79 is provided in the step portion, the upper surface of the focus ring 79 is set to be lower than the upper surface of the electrostatic chuck 76 . The focus ring 79 is formed of ceramics such as alumina or quartz.

A power feeding member 80 is connected to the lower surface of the base 73 . A power feed line 81 is connected to the lower end of the power feed member 80 , and the feed line 81 is connected to a high frequency power supply 83 serving as a bias power source via a matching device 82 that performs impedance matching. By applying, for example, 3.2 MHz of high-frequency power from the high-frequency power supply 83 to the substrate mounting table 70, an RF bias is generated and generated by the high-frequency power supply 59, which is a source source for plasma generation described below. ions can be attracted to the substrate G. Therefore, in a plasma etching process, it becomes possible to raise both an etching rate and an etching selectivity. In this way, the substrate mounting table 70 forms a bias electrode for mounting the substrate G and generating an RF bias. At this time, the portion serving as the ground potential inside the chamber functions as a counter electrode of the bias electrode, and constitutes a return circuit of high frequency power. Further, the metal window 50 may be configured as a part of a return circuit of high frequency power.

The metal window 50 is formed by a plurality of divided metal windows 57 . The number of divided metal windows 57 forming the metal window 50 (six are shown in the cross-sectional direction in FIG. 1 ) may be set to various numbers, such as 12, 24, and the like.

Each of the divided metal windows 57 is insulated from the supporting frame 14 and the adjacent divided metal windows 57 by the insulating member 56 . Here, the insulating member 56 is formed of a fluororesin such as PTFE (Polytetrafluoroethylene).

The divided metal window 57 has a conductor plate 30 and a shower plate 40 . The conductor plate 30 and the shower plate 40 are both formed of aluminum, an aluminum alloy, stainless steel, etc., which are nonmagnetic, conductive, corrosion-resistant metals or metals subjected to corrosion-resistant surface processing. The surface treatment having corrosion resistance is, for example, anodizing treatment, ceramic spraying, or the like. Further, the lower surface of the shower plate 40 facing the treatment region S may be subjected to anodizing treatment or plasma-resistant coating by ceramic thermal spraying. The conductor plate 30 may be grounded via a ground wire (not shown). The shower plate 40 and the conductor plate 30 are joined so as to be electrically connected to each other.

As shown in Fig. 1, a spacer (not shown) formed of an insulating member is disposed above each divided metal window 57, and is spaced apart from the conductor plate 30 by the spacer to provide a high-frequency antenna. (54) is arranged. The high-frequency antenna 54 is formed by winding and attaching an antenna wire made of a metal having good conductivity such as copper in an annular or spiral wound shape. For example, you may arrange|position multiple annular antenna wires.

Further, a power feeding member 57a extending upwardly of the upper chamber 13 is connected to the high frequency antenna 54, and a feeding line 57b is connected to the upper end of the feeding member 57a, and the feeding line 57b. is connected to the high frequency power supply 59 through a matching device 58 that performs impedance matching. When a high-frequency power of, for example, 13.56 MHz is applied from the high-frequency power source 59 to the high-frequency antenna 54 , an induced current is induced in the divided metal window 57 , and an induced current induced in the divided metal window 57 is applied to the induced current As a result, an induced electric field is formed in the lower chamber 17 . By this induced electric field, the processing gas supplied from the shower plate 40 to the processing region S is converted into a plasma to generate an inductively coupled plasma, and ions in the plasma are provided to the substrate G. In addition, each of the divided metal windows 57 may have a unique high-frequency antenna, and control may be executed in which high-frequency power is applied individually to each high-frequency antenna.

The high frequency power supply 59 is a source source for generating plasma, and the high frequency power supply 83 connected to the substrate mounting table 70 serves as a bias source that attracts generated ions and provides kinetic energy. In this way, plasma is generated by using inductive coupling to the ion source source, and a bias source, which is another power source, is connected to the substrate mounting table 70 to control ion energy, so that generation of plasma and control of ion energy are independent. , so that the degree of freedom of the process can be increased. The frequency of the high frequency power output from the high frequency power supply 59 is preferably set within the range of 0.1 to 500 MHz.

The metal window 50 is formed by a plurality of divided metal windows 57 , and each divided metal window 57 is separated from the ceiling plate 12 of the upper chamber 13 by a plurality of suspenders (not shown). is suspended Since the high-frequency antenna 54 contributing to plasma generation is disposed on the upper surface of the divided metal window 57 , the high-frequency antenna 54 is suspended from the ceiling plate 12 through the divided metal window 57 .

A gas diffusion groove 32 is formed in the lower surface of the conductor plate body 31 forming the conductor plate 30 . Further, the gas diffusion groove may be provided on the upper surface of the shower plate. In addition, the shape constituting the gas diffusion groove includes not only the shape of the concave portion formed in the shape of a long picture, but also the shape of the shape of the concave portion formed in the shape of a planar shape.

In the shower plate body 41 forming the shower plate 40 , a plurality of gas discharge holes passing through the shower plate body 41 and communicating with the gas diffusion groove 32 of the conductor plate 30 and the processing region S (42) is outlined.

As shown in Fig. 1, the gas introduction pipe 55 included in each of the divided metal windows 57 is integrated into one place in the antenna chamber A, and the gas introduction pipe 55 extending upward is the upper chamber. The supply port 12a provided in the top plate 12 of (13) is airtightly penetrated. The gas introduction pipe 55 is connected to the processing gas supply source 64 via a gas supply pipe 61 that is hermetically coupled.

An on-off valve 62 and a flow rate controller 63 such as a mass flow controller are interposed at an intermediate position of the gas supply pipe 61 . A gas supply device 60 is formed by the gas supply pipe 61 , the on/off valve 62 , the flow rate controller 63 , and the processing gas supply source 64 . In addition, in order to supply gas to a plurality of regions in the processing region S, a gas supply pipe 61 is branched on the way, and an on/off valve, a flow controller, and a processing gas supply source according to the type of processing gas are communicated to each branch pipe. Yes (not shown).

In the plasma processing, the processing gas supplied from the gas supply device 60 passes through the gas supply pipe 61 and the gas introduction pipe 55 , and the gas diffusion groove of the conductor plate 30 included in each of the divided metal windows 57 . (32) is supplied. Then, the gas is discharged from each gas diffusion groove 32 through the gas discharge hole 42 of each shower plate 40 to the processing region S.

In addition, each of the divided metal windows 57 may have a unique high frequency antenna (antenna segments 111 and 112 to be described later), and a control in which high frequency power is individually applied to each high frequency antenna may be executed.

The control unit 90 is configured based on the monitor information transmitted from each component of the substrate processing apparatus 10 , for example, the chiller 86 , the high frequency power supplies 59 and 83 , the gas supply device 60 , and the pressure gauge. The operation of the gas exhaust unit 28 and the like is controlled. The control unit 90 includes a central processing unit (CPU), a read only memory (ROM), and a random access memory (RAM). The CPU executes a predetermined process according to a recipe stored in a storage area of the RAM or ROM. Control information of the substrate processing apparatus 10 with respect to process conditions is set in a recipe. The control information includes, for example, a gas flow rate, a pressure in the processing container 20 , a temperature in the processing container 20 , a temperature of the substrate 73 , a process time, and the like.

The recipe and the program applied by the control unit 90 may be stored in, for example, a hard disk, a compact disk, a magneto-optical disk, or the like. In addition, the recipe or the like may be set in the control unit 90 and read while being accommodated in a portable computer-readable storage medium such as a CD-ROM, DVD, or memory card. In addition, the control unit 90 includes an input device such as a keyboard or mouse for performing command input operation, a display device such as a display that visualizes and displays the operation status of the substrate processing apparatus 10, and an output device such as a printer; It has the same user interface.

FIG. 2 is a plan view showing an example of the arrangement of the metal window 50 and the high-frequency antenna 54 . In addition, in FIG. 2, the direction from the center to the outer periphery of the metal window 50 is made into a radial direction, and the direction along the outer periphery of the metallic window 50 is made into a circumferential direction, and it demonstrates. In addition, in FIG. 2, the shape and arrangement|positioning of the high frequency antenna 54 are shown typically, and it is not limited to the shape and arrangement|positioning shown in FIG.

The metal window 50 is divided into a plurality of divided metal windows 57 via an insulating member 56 . Specifically, the metal window 50 is divided into three in the radial direction. In addition, the metal window 50 divided into three in the radial direction is divided into 4, 8, and 12 in order from the center side in the circumferential direction.

In addition, the metal window 50 divided by the insulating member 56 includes a first dividing line 51 extending in a direction of 45° from the four corners of the metal window 50 , and the short length of the metal window 50 . Two first dividing lines 51 intersecting the sides have a second dividing line 52 parallel to the long side connecting the two intersections. Here, the length of the short side of the metal window 50 is referred to as W. The width in the radial direction of the triangular region surrounded by the short side of the metal window 50 and the two first dividing lines 51 is W/2. In addition, the radial width of the trapezoidal region surrounded by the long side of the metal window 50 and the two first dividing lines 51 and the second dividing line 52 is W/2. With this configuration, in the triangular region and the trapezoidal region, the induced electric field formed through the divided metal window 57 by making the number of turns of the high-frequency antenna 54 the same and making the width in the radial direction the same. can be made equal to the electric field strength of Thereby, a uniform plasma can be formed.

Further, the metal window 50 divided by the insulating member 56 is divided into three sections on the outer peripheral side and two sections on the middle side in the circumferential direction of each side. With such a configuration, the size of each divided metal window 57 can be reduced by increasing the number of divisions of the metal window 50, so that the electric field intensity distribution of the induced electric field can be finely adjusted. Thereby, plasma distribution can be controlled with high precision.

The high frequency antenna 54 includes an outer antenna 110 , an intermediate antenna 120 , and an inner antenna 130 . The outer antenna 110, the intermediate antenna 120, and the inner antenna 130 are a planar region that generates an induced electric field contributing to plasma generation, specifically, planar frame-like regions 141, 142, 143) have. The frame regions 141 , 142 , 143 are formed so as to face the conductor plate 30 and face the substrate G. Further, the frame regions 141 , 142 , 143 are arranged so as to form a concentric shape, and constitute a rectangular plane corresponding to the rectangular substrate G as a whole.

In addition, the frame region 141 corresponding to the outer antenna 110 is disposed on the divided metal window 57 on the outer peripheral side among the metal windows 50 divided into three in the radial direction. The frame region 142 corresponding to the intermediate antenna 120 is disposed on the middle divided metal window 57 among the metal windows 50 divided into three with respect to the radial direction. The frame region 143 corresponding to the inner antenna 130 is disposed on the central divided metal window 57 among the metal windows 50 divided into three in the radial direction.

The outer antenna 110 includes four first antenna segments 111 constituting a corner portion of the frame region 141 and four second antenna segments 112 constituting a side center portion of the frame region 141 . is constituted by a total of eight antenna segments, and is constituted as a multi-segmented annular antenna that becomes a ring-shaped antenna as a whole. The frame region 141 is constituted by encompassing the arrangement regions of the antenna segments 111 and 112 .

In addition, the first antenna segment 111 includes two divided metal windows provided at the corners (four corners) of the metal window 50 among the divided metal windows 57 provided on the outer peripheral side of the metal window 50 . (57) is placed over. The second antenna segment 112 is disposed in the divided metal window 57 provided in the central portion of the side of the metal window 50 among the divided metal windows 57 provided on the outer peripheral side of the metal window 50 . In addition, about the 1st antenna segment 111 and the 2nd antenna segment 112, the detail is mentioned later.

The intermediate antenna 120 and the inner antenna 130 are both configured as a spiral wound planar antenna (shown concentrically for convenience in FIG. 2 ), and each antenna is formed facing the conductor plate 30 . The entire plane constitutes the frame region 142 and the frame region 143 . The intermediate antenna 120 and the inner antenna 130 are multiple (quadruped) in which a plurality of (for example, four) antenna wires made of a conductive material, for example, copper, etc. are wound so that the entirety is spiral wound. An antenna may be configured. Further, the intermediate antenna 120 and the inner antenna 130 may be configured by winding one antenna wire in a spiral wound shape. For example, when four antenna wires are wound to form a quadruple antenna, the antenna wires are wound by shifting their positions by 90°, and the number of turns of the corner portion where plasma tends to be weakened is determined by winding the central portion of the side. You may make it more than the number. An antenna line arrangement area of the intermediate antenna 120 constitutes a frame-like area 142 . An antenna line arrangement area of the inner antenna 130 constitutes a frame-like area 143 .

In addition, the high frequency antenna 54 is not limited to the configuration having three annular antennas (outer antenna 110, intermediate antenna 120, and inner antenna 130), and two or four or more annular antennas are used. It may have a structure. That is, it is good also as a structure in which one or two or more single annular antennas are provided in addition to the multi-segmented annular antenna having a structure in which antenna segments are arranged in an annular shape. In addition, the high frequency antenna 54 may be constituted by providing only one or two or more multi-segment annular antennas having the same structure as the outer antenna 110 in which antenna segments are arranged in an annular shape.

<Antenna segment>

Next, the antenna segments 111 and 112 of the outer antenna 110 are further described.

First, the second antenna segment 112 will be described with reference to FIG. 3 . 3 is a perspective view showing an example of the second antenna segment 112 .

The second antenna segment 112 is vertically wound in a direction perpendicular to the surface of the substrate G (conductor plate 30) of the antenna wire 200 made of a conductive material, for example, copper, in which the longitudinal direction is the winding direction. It is constituted by winding in a spiral shape with a winding shaft parallel to the surface of the substrate G. A plurality of antenna wires 200 are arranged on the first plane 201 facing the conductor plate 30 . The antenna wire 200 arranged on the first plane 201 constitutes a part (side center portion) of the frame region 141 that generates an induced electric field that contributes to plasma. In the first plane 201, seven antenna lines 200 are arranged in parallel.

Specifically, the second antenna segment 112 includes antenna wires 211 to 217 , 221 to 226 , 231 to 236 , 241 to 246 , and connection portions 251 and 252 . In addition, in the explanation of FIG. 3 , the direction in which the antenna wires 211 to 217 on the first plane 201 extend from one end to the other is the X direction, and the antenna wires 211 of the antenna wires 211 to 217 are set as the X direction. The direction of the arrangement from the antenna line 217 to the Y direction and the direction perpendicular to the first plane 201 (vertical direction) to the Z direction will be described.

The seven antenna lines 211 to 217 are arranged on the first plane 201 and are arranged parallel to each other. In other words, the first plane 201 is formed by the antenna wires 211 to 217 . In addition, the first plane 201 constitutes a part of the frame region 141 .

A connection part 251 is connected to one end of the antenna wire 211 . A connection part 252 is connected to the other end of the antenna wire 217 . The connection parts 251 and 252 are connected to the high frequency power supply 59 via the power supply member 57a (refer FIG. 1).

Antenna wires 221 to 226 extending in the +Z direction (direction spaced apart from the first plane 201) are connected to the other ends of the antenna wires 211 to 216, respectively. Further, antenna lines 241 to 246 extending in the +Z direction (direction spaced apart from the first plane 201) are connected to one end of the antenna lines 212 to 217, respectively. Further, the upper ends of the antenna wires 221 to 226 and the upper ends of the antenna wires 241 to 246 are connected to each other by antenna wires 231 to 236 extending horizontally (approximately in the X direction). One end of the antenna wires 231 to 236 is connected to the upper ends of the antenna wires 221 to 226 , and the other end of the antenna wires 231 to 236 is connected to the upper ends of the antenna wires 241 to 246 . That is, the antenna lines 231 to 236 are arranged on a second plane (not shown) parallel to the first plane 201 . Further, the upper ends of the antenna lines 241 to 246 are shifted in the +Y direction by the pitch at which the antenna lines 211 to 217 are arranged with respect to the upper ends of the antenna lines 221 to 226 . For this reason, in a plan view, the antenna wires 231 to 236 are formed obliquely with respect to the direction in which the antenna wires 211 to 217 extend.

Further, the second antenna segment 112 has a first end portion surrounded by a connecting portion 251 , an antenna wire 211 , an antenna wire 221 , and an antenna wire 231 on one side in the winding axis direction. . In addition, the second antenna segment 112 has a second end portion surrounded by the antenna wire 236 , the antenna wire 246 , the antenna wire 217 , and the connecting portion 252 on the other side in the winding axis direction. . Further, the winding shaft passing through the first end and the second end is arranged in the Y direction.

Here, when an electric current flows from the connecting portion 251 to the connecting portion 252, the antenna lines 211 to 217 on the first plane 201 that generate an induced electric field that contributes to the generation of plasma have a frame-like region ( 141), the current flows in the same direction (+X direction).

In addition, a current flows in the +Z direction in the antenna lines 221 to 226, and a current flows in the -Z direction in the antenna lines 241 to 246. In addition, current flows in the antenna lines 231 to 236 separated from the first plane 201 in a substantially -X direction. Since the antenna wires 231 to 236 are spaced apart from the first plane 201, the induced electric field of the antenna wires 231 to 236 inhibits the generation of plasma.

Next, the first antenna segment 111 will be described with reference to FIGS. 4 to 8 . 4 is a perspective view showing an example of the first antenna segment 111 . 5 is a front view showing an example of the first antenna segment 111 . 6 is a B-B cross-sectional view showing an example of the first antenna segment 111 . 7 is a C-C cross-sectional view showing an example of the first antenna segment 111 . 8 is a D-D cross-sectional view showing an example of the first antenna segment 111 .

The first antenna segment 111 is vertically wound in a direction perpendicular to the surface of the substrate G (conductor plate 30) of the antenna wire 300 made of a conductive material, for example, copper, in which the longitudinal direction is the winding direction. It is constituted by winding in a spiral shape with a winding shaft parallel to the surface of the substrate G. A plurality of antenna wires 300 are arranged on the first plane 301 facing the conductor plate 30 . The antenna wire 300 arranged on the first plane 301 constitutes a part (corner portion) of the frame region 141 that generates an induced electric field that contributes to plasma. In the 1st plane 301, seven antenna lines 300 are arrange|positioned so that they may parallel and form a corner part. In addition, among the seven antenna wires 300 , the inner antenna wire 300 is arranged so as to go around the outer side to the outer antenna wire 300 .

Specifically, the first antenna segment 111 includes antenna lines 311 to 317 , 321 to 326 , 331 to 336 , 341 to 346 , and connection portions 351 and 352 . In addition, in the explanation of FIG. 4 and the like, the direction in which one end of the antenna wires 311 to 317 on the first plane 301 extends from the end (one end) of the one end toward the corner is the Y direction, and the first The direction in which the other end side of the antenna wires 311 to 317 on the plane 301 extends from the corner portion toward the end (the other end) on the other end side is the X direction, and the direction perpendicular to the first plane 301 (vertical direction) ) as the Z-direction.

At least a part of the seven antenna lines 311 to 317 is arranged on the first plane 301 . In other words, the first plane 301 is formed by the antenna lines 311 to 317 . In addition, the first plane 301 constitutes a part of the frame region 141 .

The antenna wires 314 to 317 on the outer peripheral side are formed in an L-shape so as to form a corner portion. That is, the antenna lines 314 to 317 have a straight line portion at one end extending in the +Y direction, a corner portion bent by 90°, and a straight line portion at the other end extending in the +X direction. Further, the straight line portions on one end of the antenna wires 314 to 317 are arranged parallel to each other with an interval (distance between the proximal surface of one antenna line and the proximal surface of the other antenna line) G1. Further, the straight portions on the other end side of the antenna lines 314 to 317 are arranged in parallel with each other with a gap G1. Moreover, as for the space|interval G1, 10 mm or more and 30 mm or less are suitable, for example. Thereby, abnormal discharge between antenna lines can be prevented.

The antenna wire 311 includes planar antenna portions 311a and 311e, an outer circumferential portion (stacked antenna portion) 311c, and connection portions 311b and 311d.

The planar antenna units 311a and 311e are arranged on the first plane 301, similarly to the antenna lines 314 to 317. The planar antenna part 311a is arrange|positioned parallel to the linear part of the one end side of the antenna lines 312 - 317. The planar antenna part 311e is arrange|positioned parallel to the linear part of the other end side of the antenna lines 312 - 317.

The outer circumferential portion 311c is formed in an L-shape so as to form a corner portion. That is, the outer circumferential portion 311c has a linear portion at one end extending in the +Y direction, a corner portion bent by 90°, and a linear portion at the other end extending in the +X direction. Moreover, the outer circumferential part 311c is arrange|positioned so that it may overlap on the corner part of the antenna line 315 in planar view. Further, the outer circumferential portion 311c is arranged from the upper end of the antenna wire 315 to the lower end of the outer circumferential portion 311c with a gap of height H in a horizontal view. Here, it is preferable that the height H is made into the space|interval G1 or less (H≤G1). In addition, the height H is preferably set to be equal to or greater than the interval at which abnormal discharge does not occur between the outer circumferential portion 311c and the antenna wire 315 .

The connecting portion 311b connects the other end of the antenna portion 311a in plan view and one end of the outer circumferential portion 311c. The connecting portion 311b has, for example, a standing portion standing up from the other end of the antenna portion 311a on a plane, and an extending portion extending in the radial direction and connecting to one end of the outer circumferential portion 311c. In addition, in the example of FIGS. 4-8, the extending|stretching part of the connection part 311b is bent 90 degrees with respect to the antenna part 311a in planar view. The connecting portion 311d connects one end of the antenna portion 311e in plan view and the other end of the outer circumferential portion 311c. The connecting portion 311d has, for example, a standing portion standing up from one end of the antenna portion 311e on a plane, and an extending portion extending in the radial direction and connecting to the other end of the outer circumferential portion 311c. In addition, in the example of FIGS. 4-8, the extending|stretching part of the connection part 311d is bent 90 degrees with respect to the antenna part 311e in planar view.

Similarly, the antenna wire 312 includes planar antenna portions 312a and 312e, an outer circumferential portion 312c, and connection portions 312b and 312d. Further, the antenna wire 313 includes planar antenna portions 313a and 313e, an outer circumferential portion 313c, and connection portions 313b and 313d. The outer circumferential portion 312c is arranged so as to overlap on the corner portion of the antenna wire 316 in plan view. The outer circumferential portion 313c is disposed so as to overlap on the corner portion of the antenna wire 317 in plan view. Further, the outer circumferential parts 312c and 313c are arranged from the upper ends of the antenna wires 316 and 317 to the lower ends of the outer circumferential sections 312c and 313c with a gap of height H in a horizontal view. That is, the outer circumferential portions 311c to 313c are arranged on a third plane (not shown) parallel to the first plane 301 . In other words, the third plane is formed by the outer circumferential portions 311c to 313c. Further, the third plane is disposed between the first plane 301 formed by the antenna lines 311 to 317 and the second plane (not shown) formed by the antenna wires 331 to 336 .

In addition, about the positional relationship between the board|substrate G mounted on the board|substrate mounting table 70, and an antenna wire, the antenna wire 315 is arrange|positioned on the edge part of the board|substrate G in planar view, for example. In that case, the outer circumferential parts 312c and 313c are arrange|positioned outside from the edge part of the board|substrate G mounted on the board|substrate mounting table 70 in planar view.

Further, the linear portions of the antenna sections 311a to 313a and one end of the antenna lines 314 to 317 are arranged in parallel with each other at an interval G1 in a plane view. Further, in a plane, the antenna portions 311e to 313e and the straight portions on the other end side of the antenna lines 314 to 317 are arranged parallel to each other at an interval G1. In addition, the extending|stretching parts of the connection parts 311b - 313b are mutually arrange|positioned in parallel with the space|interval G1, for example. In addition, the extending|stretching parts of the connection parts 311d - 313d are arrange|positioned in parallel with each other with the space|interval G1, for example.

Moreover, the connection part 311b and the connection part 311d have the space|interval G2. It is preferable that the space|interval G2 sets it as the space|interval G1 or more. Thereby, abnormal discharge can be prevented reliably.

Further, the connecting portion 313b and the antenna lines 341 to 346 have a gap G3. It is preferable that the space|interval G3 sets it as the space|interval G1 or more. Thereby, abnormal discharge can be prevented reliably.

A connection part 351 is connected to one end of the antenna wire 311 . A connection part 352 is connected to the other end of the antenna wire 317 . The connection parts 351 and 352 are connected to the high frequency power supply 59 via the power feeding member 57a (refer FIG. 1).

Antenna lines 321 to 326 extending in the +Z direction (direction spaced apart from the first plane 301) are connected to the other ends of the antenna lines 311 to 316, respectively. In addition, antenna lines 341 to 346 extending in the +Z direction (direction spaced apart from the first plane 301) are connected to one end of the antenna lines 312 to 317, respectively. The upper ends of the antenna lines 321 to 326 and the upper ends of the antenna lines 341 to 346 are respectively connected to each other by antenna lines 331 to 336 extending horizontally (in the X and Y directions). That is, the antenna lines 331 to 336 are arranged on a second plane (not shown) parallel to the first plane 301 . The antenna lines 331 to 336 are formed in an L-shape so as to form a corner portion. That is, the antenna wires 331 to 336 each have one end connected to the upper end of the antenna wires 321 to 326, a straight portion on one end side extending in the -X direction, a corner portion bent by 90°, - It extends in the Y direction and has a straight line portion on the other end side to which the other end is connected to the upper end of the antenna wires 341 to 346 .

A straight portion on one end side of the antenna wire 331 is arranged so as to overlap the antenna portion 311e in plan view. The straight line portion on the other end side of the antenna wire 331 is arranged so as to overlap the antenna portion 312a in plan view.

A straight line portion at one end of the antenna line 332 is arranged so as to overlap the antenna portion 312e in plan view. The straight line portion on the other end side of the antenna wire 332 is arranged so as to overlap the antenna portion 313a in plan view.

A straight line portion at one end of the antenna wire 333 is arranged so as to overlap the antenna portion 313e in plan view. The straight line portion on the other end side of the antenna line 333 is arranged so as to overlap with the straight line portion on the one end side of the antenna line 314 in plan view.

The straight line portion on the one end side of the antenna line 334 is arranged so as to overlap the straight line portion on the other end side of the antenna line 314 in plan view. The straight line portion on the other end side of the antenna line 334 is arranged so as to overlap the straight line portion on the one end side of the antenna line 315 in plan view.

The straight line portion on the one end side of the antenna wire 335 is arranged so as to overlap the straight line portion on the other end side of the antenna wire 315 in plan view. The straight line portion on the other end side of the antenna wire 335 is arranged so as to overlap the straight line portion on the one end side of the antenna wire 316 in plan view.

The linear portion on one end of the antenna wire 336 is arranged so as to overlap the linear portion on the other end of the antenna wire 316 in plan view. The straight line portion on the other end side of the antenna line 336 is arranged so as to overlap the straight line portion on the one end side of the antenna line 317 in plan view.

The antenna wires 331 to 336 arranged on the second plane (not shown) may be formed in an L-shape as shown in Fig. 4 or the like, and the upper ends of the antenna wires 321 to 326 and the antenna wires It may be formed so that the upper ends of (341-346) may be connected linearly (so that it may extend diagonally), respectively.

In addition, the first antenna segment 111 has a connection part 351, an antenna wire 311 (planar antenna parts 311a, 311e), an antenna wire 321, and an antenna wire, on one side in the winding axis direction. It has a first end surrounded by (331). The first end is bent in a concave shape (bone fold). Further, the first antenna segment 111 has a second end portion surrounded by an antenna wire 336 , an antenna wire 346 , an antenna wire 317 , and a connecting portion 352 on the other side in the winding axis direction. . The second end is bent in a convex shape (mountain fold). In addition, the winding shaft passing through the 1st end and the 2nd end is arrange|positioned in the radial direction (horizontal direction).

In addition, the projection shape of the 1st antenna segment 111 projected on the 1st plane 301 is an L shape formed by bending concavely on the side of a 1st edge part and bending convexly on the side of a 2nd edge part. has a shape.

Here, when a current flows in the direction of the connection part 352 from the connection part 351, the on-plane antenna parts 311a, 311e, 312a, 312e on the first plane 301 which generate an induced electric field contributing to the generation of plasma, Currents flow in the same direction (+Y direction and +X direction) along the frame region 141 in 313a and 313e and the antenna lines 314 to 317 .

In addition, current flows in the +Z direction in the antenna lines 321 to 326, and current flows in the -Z direction in the antenna lines 341 to 346. In addition, current flows in the antenna lines 331 to 336 separated from the first plane 301 in a direction opposite to that of the antenna lines on the first plane 301 . Since the antenna wires 331 to 336 are spaced apart from the first plane 301, the induced electric field of the antenna wires 331 to 336 inhibits the generation of plasma.

Further, current flows through the outer circumferential portions 311c to 313c in the same direction as the antenna line on the first plane 301 . The outer circumferential parts 311c to 313c generate an induced electric field that contributes to the generation of plasma. Thereby, in the corner part of the frame-like region 141 (refer FIG. 2), the outside induced electric field can be strengthened.

That is, the first antenna segment 111 includes the first antenna groups 311a , 312a , 313a , 311e , 312e , 313e , 314 , 315 , 316 , and 317 arranged on the first plane 301 , and the first The second antenna groups 331 to 336 arranged on a second plane spaced apart above the antenna group, and third antenna groups 311c and 312c arranged on a third plane close to the upper side of the first antenna group; 313c). Moreover, it is comprised so that when a current flows through the 1st antenna segment 111, the direction which the 1st antenna group and the 3rd antenna group flow in the same direction. Then, an induced electric field for generating plasma is formed by the first antenna group and the third antenna group. Thereby, in the corner part of the frame-like region 141 (refer FIG. 2), the outside induced electric field can be strengthened.

In addition, the shape of the 1st antenna segment 111 is not limited to what is shown in FIG. 4 etc. FIG. 9 is a perspective view showing another example of the first antenna segment 111A. The first antenna segment 111A shown in FIG. 9 is different from the first antenna segment 111 shown in FIG. 4 in the shape of the connecting portions 311b, 311d, 312b, 312d, 313b, and 313d. Specifically, the extending portion of the connecting portion 311b is formed so as to extend obliquely with respect to the antenna portion 311a in plan view. The extension portion of the connecting portion 311d is formed so as to extend obliquely with respect to the antenna portion 311e in plan view. Similarly, the connecting portions 312b, 312d, 313b, and 313d are formed so as to extend obliquely. Other configurations are the same, and overlapping descriptions are omitted.

In the first antenna segment 111 shown in Figs. 4 and 9, the number of antennas 311c to 313c circling outside has been described as being three. . In addition, it is preferable that the number (three in the example of FIG. 4) of the antennas 311c - 313c revolving outside is less than half of the total number of turns (seven in the example of FIG. 4).

10 is an example of a graph showing the change of the induced electric field in the radial direction. Here, the change of the induced electric field on the line segment 302 of FIG. 6 is shown. The horizontal axis indicates the position in the radial direction (direction from the center side to the outside), and the vertical axis indicates the strength of the electric field. In addition, in FIG. 10, the 1st antenna segment 111 in this embodiment is an antenna segment of the structure in which the connection part shown in FIG. 9 extends diagonally, The case where the number of outer windings is two is shown as an example. Note that, as for the first antenna segment in the reference example, the case where all of the antenna lines 311 to 317 are on the first plane 301, that is, the case where the number of outer windings is 0 (there is no outer winding portion) shown as an example. In addition, the boundary of the range in which the antenna line in the 1st antenna segment of the reference example is arrange|positioned is shown with thick solid lines 401 and 402, and the position of the board|substrate end of the board|substrate G is shown with the broken line 403. As shown in FIG.

As shown by contrast with the graph, according to the antenna segment 111 of the present embodiment, the induced electric field at the corner (outer peripheral side) of the frame region 141 can be strengthened. Thereby, the plasma can be strengthened with respect to the corner portion of the frame region 141 in which the plasma tends to be weakened.

Another example of the high-frequency antenna 54 is further described with reference to FIGS. 11 and 12 . 11 is a perspective view showing another example of the first antenna segment 111B. 12 is a perspective view showing another example of the second antenna segment 112B. The first antenna segment 111B shown in FIG. 11 has different shapes of the antenna lines 321 to 326 and the antenna lines 341 to 346 from the first antenna segment 111 shown in FIG. 4 . The second antenna segment 112B shown in FIG. 12 has different shapes of the antenna wires 221 to 226 and the antenna wires 241 to 246 from the second antenna segment 112 shown in FIG. 3 . Specifically, the antenna wire 321 has a bent portion bent toward the inside (winding axis side) and an upright portion extending in the +Z direction. The same applies to the antenna lines 322 to 326, 341 to 346, 221 to 226, and 241 to 246. Other configurations are the same, and overlapping descriptions are omitted. Moreover, in the 1st antenna segment 111A shown in FIG. 9, the structure in which the antenna wires 321-326 and the antenna wires 341-346 are provided with a bending part may be sufficient.

13 is a schematic diagram showing the flow of current. The first antenna segment 111B has an antenna line 321 on the side adjacent to the second antenna segment 112B. The antenna wire 321 has a bent portion 321a that bends toward the inside of the winding shaft and an upright portion 321b. Similarly, the second antenna segment 112B has an antenna wire 241 on the side adjacent to the first antenna segment 111B. The antenna wire 241 has a bent portion 241a that bends toward the inside of the winding shaft and an upright portion 241b. Further, between the first antenna segment 111B and the second antenna segment 112B, a shield 150 made of metal for preventing interference of a magnetic field is disposed. Further, a current Ia flows through the first antenna segment 111B. The current Ia flowing through the bent portion 321a has a horizontal component Iax and a vertical component Iaz. Further, a current Ib flows through the second antenna segment 112B. The current Ib flowing through the bent portion 241a has a horizontal component Ibx and a vertical component Ibz.

By having such a structure, the space|interval of the upright part 241b and the upright part 321b is widened, and interference of a magnetic field is suppressed. Further, in the first antenna segment 111B, at the end of the antenna line 311 , a magnetic field caused by a current Ia flowing through the antenna line 311 is a magnetic field caused by a horizontal component Iax of a current flowing through the bent portion 321a . is offset by Similarly, in the second antenna segment 112B, at the end of the antenna line 212 , a magnetic field caused by a current Ib flowing through the antenna line 212 is a magnetic field caused by a horizontal component Ibx of a current flowing through the bent portion 241a . is offset by Accordingly, it is possible to prevent the magnetic field control of one antenna segment from interfering with the other antenna magnetic field control between the first antenna segment 111B and the second antenna segment 112B.

In other words, by reducing the thickness of the shield 150 , the interval G4 from the end of the first antenna segment 111B to the end of the second antenna segment 112B can be shortened. Thereby, in the induced magnetic field formed in the outer antenna 110, the non-uniformity between antenna segments can be reduced. In addition, the non-uniformity of the generated plasma can be reduced.

Another example of the high-frequency antenna 54 is further described with reference to FIG. 14 . 14 is a perspective view showing another example of the first antenna segment 111C. The first antenna segment 111C shown in Fig. 14 has capacitors 361 to 336 in the antenna lines 331 to 336 that do not contribute to the generation of plasma, respectively, compared to the first antenna segment 111B shown in Fig. 11 . 366) is inserted. Other configurations are the same, and overlapping descriptions are omitted. Further, in the first antenna segment 111 shown in Fig. 4 and the first antenna segment 111A shown in Fig. 9, the capacitors 361 to 366 are respectively inserted into the antenna lines 331 to 336. do.

Accordingly, it is possible to suppress an increase in the potential difference between the antenna lines. In particular, the potential difference between the outer winding portions 311c to 313c and the antenna wires 314 to 317 is larger than the potential difference when wound (potential difference per winding). By interposing the capacitors 361 to 366 to reduce the potential difference between the antenna lines, abnormal discharge can be prevented.

[Substrate processing apparatus according to the second embodiment]

A substrate processing apparatus 10 according to a second embodiment of the present disclosure will be described. The substrate processing apparatus 10 according to the second embodiment has the same configuration as the substrate processing apparatus 10 according to the first embodiment shown in FIG. 1 . Further, the high frequency antenna 54 of the substrate processing apparatus 10 according to the second embodiment is an external antenna, similarly to the high frequency antenna 54 (refer to FIG. 2 ) of the substrate processing apparatus 10 according to the first embodiment. 110 , an intermediate antenna 120 , and an inner antenna 130 . The outer antenna 110 includes four first antenna segments 111D constituting a corner portion of the frame region 141 and four second antenna segments 112D constituting a side center portion of the frame region 141 . is constituted by a total of eight antenna segments, and is constituted as a multi-segmented annular antenna that becomes a ring-shaped antenna as a whole. The frame region 141 is constituted by encompassing the arrangement regions of the antenna segments 111D and 112D. In the second embodiment, as in the example of the first embodiment, the antenna lines in the Z direction are bent inward in the first antenna segment and in the second segment, but the difference from the first embodiment is that the first antenna segment is in the outside It doesn't have a weekly meeting.

<Antenna segment>

Next, the antenna segments 111D and 112D of the outer antenna 110 are further described.

First, the second antenna segment 112D will be described with reference to FIG. 12 . 12 is a perspective view showing an example of the second antenna segment 112D.

The second antenna segment 112D is vertically wound in a direction perpendicular to the surface of the substrate G (conductor plate 30) of the antenna wire 200 made of a conductive material, for example, copper, in which the longitudinal direction is the winding direction. It is constituted by winding in a spiral shape with a winding shaft parallel to the surface of the substrate G. A plurality of antenna wires 200 are arranged on the first plane 201 facing the conductor plate 30 . The antenna wire 200 arranged on the first plane 201 constitutes a part (side center portion) of the frame region 141 that generates an induced electric field that contributes to plasma. In the first plane 201, seven antenna lines 200 are arranged in parallel.

Specifically, the second antenna segment 112D includes antenna lines 211 to 217 , 221 to 226 , 231 to 236 , 241 to 246 , and connecting portions 251 and 252 . 12, the direction in which the antenna wires 211 to 217 on the first plane 201 extend from one end to the other is the X direction, and the antenna wires 211 of the antenna wires 211 to 217 are The direction of the arrangement from the antenna line 217 to the Y direction and the direction perpendicular to the first plane 201 (vertical direction) to the Z direction will be described.

The seven antenna lines 211 to 217 are arranged on the first plane 201 and are arranged parallel to each other. In other words, the first plane 201 is formed by the antenna wires 211 to 217 .

A connection part 251 is connected to one end of the antenna wire 211 . A connection part 252 is connected to the other end of the antenna wire 217 . The connection parts 251 and 252 are connected to the high frequency power supply 59 via the power supply member 57a (refer FIG. 1).

Antenna wires 221 to 226 extending in the +Z direction (direction spaced apart from the first plane 201) are connected to the other ends of the antenna wires 211 to 216, respectively. Further, antenna lines 241 to 246 extending in the +Z direction (direction spaced apart from the first plane 201) are connected to one end of the antenna lines 212 to 217, respectively. Further, the upper ends of the antenna wires 221 to 226 and the upper ends of the antenna wires 241 to 246 are connected to each other by antenna wires 231 to 236 extending horizontally (approximately in the X direction). One end of the antenna wires 231 to 236 is connected to the upper ends of the antenna wires 221 to 226 , and the other end of the antenna wires 231 to 236 is connected to the upper ends of the antenna wires 241 to 246 . That is, the antenna lines 231 to 236 are arranged on a second plane (not shown) parallel to the first plane 201 . Further, the upper ends of the antenna lines 241 to 246 are shifted in the +Y direction by the pitch at which the antenna lines 211 to 217 are arranged with respect to the upper ends of the antenna lines 221 to 226 . For this reason, in a plan view, the antenna wires 231 to 236 are formed obliquely with respect to the direction in which the antenna wires 211 to 217 extend.

Further, the second antenna segment 112D has a first end portion surrounded by a connection portion 251 , an antenna wire 211 , an antenna wire 221 , and an antenna wire 231 on one side in the winding axis direction. . Further, the second antenna segment 112D has a second end portion surrounded by the antenna wire 236 , the antenna wire 246 , the antenna wire 217 , and the connecting portion 252 on the other side in the winding axis direction. . Further, the winding shaft passing through the first end and the second end is arranged in the Y direction.

Here, when an electric current flows from the connecting portion 251 to the connecting portion 252, the antenna lines 211 to 217 on the first plane 201 that generate an induced electric field that contributes to the generation of plasma have a frame-like region ( 141), the current flows in the same direction (+X direction).

In addition, a current flows in the +Z direction in the antenna lines 221 to 226, and a current flows in the -Z direction in the antenna lines 241 to 246. In addition, current flows in the antenna lines 231 to 236 separated from the first plane 201 in a substantially -X direction. Since the antenna wires 231 to 236 are spaced apart from the first plane 201, the induced electric field of the antenna wires 231 to 236 inhibits the generation of plasma.

Next, the first antenna segment 111D will be described with reference to FIG. 15 . 15 is a perspective view showing an example of the first antenna segment 111D.

The first antenna segment 111D is vertically wound in which the vertical direction, which is the direction orthogonal to the surface of the substrate G (conductor plate 30), is the winding direction of the antenna wire 300 made of a conductive material, for example, copper or the like. It is constituted by winding in a spiral shape with a winding shaft parallel to the surface of the substrate G. A plurality of antenna wires 300 are arranged on the first plane 301 facing the conductor plate 30 . The antenna wire 300 arranged on the first plane 301 constitutes a part (corner portion) of the frame region 141 that generates an induced electric field that contributes to plasma. In the 1st plane 301, seven antenna lines 300 are arrange|positioned so that they may parallel and form a corner part.

Specifically, the first antenna segment 111D includes antenna lines 311 to 317 , 321 to 326 , 331 to 336 , 341 to 346 , and connecting portions 351 and 352 . In addition, in the explanation of FIG. 15 , the direction in which one end of the antenna wires 311 to 317 on the first plane 301 extends from the end (one end) of the one end toward the corner is the Y direction, and the first plane The direction in which the other end of the antenna wires 311 to 317 on 301 extends from the corner portion toward the end (the other end) on the other end is the X direction, and the direction perpendicular to the first plane 301 (vertical direction) will be described as the Z-direction.

The seven antenna lines 311 to 317 are arranged on the first plane 301 . In other words, the first plane 301 is formed by the antenna lines 311 to 317 .

The antenna lines 311 to 317 are formed in an L-shape so as to form a corner portion. That is, the antenna lines 311 to 317 have a linear portion at one end extending in the +Y direction, a corner portion bent by 90°, and a linear portion at the other end extending in the +X direction. Further, the straight line portions on one end of the antenna lines 311 to 317 are arranged parallel to each other with an interval (the distance between the proximal surface of one antenna line and the proximal surface of the other antenna line). Further, the straight line portions on the other end side of the antenna lines 311 to 317 are arranged in parallel with each other at intervals. Moreover, as for the space|interval, 10 mm or more and 30 mm or less are suitable, for example. Thereby, abnormal discharge between antenna lines can be prevented.

A connection part 351 is connected to one end of the antenna wire 311 . A connection part 352 is connected to the other end of the antenna wire 317 . The connection parts 351 and 352 are connected to the high frequency power supply 59 via the power feeding member 57a (refer FIG. 1).

Antenna lines 321 to 326 extending in the +Z direction (direction spaced apart from the first plane 301) are connected to the other ends of the antenna lines 311 to 316, respectively. In addition, antenna lines 341 to 346 extending in the +Z direction (direction spaced apart from the first plane 301) are connected to one end of the antenna lines 312 to 317, respectively. The upper ends of the antenna lines 321 to 326 and the upper ends of the antenna lines 341 to 346 are respectively connected to each other by antenna lines 331 to 336 extending horizontally (in the X and Y directions). That is, the antenna lines 331 to 336 are arranged on a second plane (not shown) parallel to the first plane 301 . The antenna lines 331 to 336 are formed in an L-shape so as to form a corner portion. That is, the antenna wires 331 to 336 each have one end connected to the upper end of the antenna wires 321 to 326, a straight portion on one end side extending in the -X direction, a corner portion bent by 90°, - It extends in the Y direction and has a straight line portion on the other end side to which the other end is connected to the upper end of the antenna wires 341 to 346 .

The linear portion on one end of the antenna wire 331 is arranged so as to overlap with the linear portion on the other end of the antenna wire 311 in plan view. The straight line portion on the other end side of the antenna line 331 is arranged so as to overlap the straight line portion on the one end side of the antenna line 312 in plan view.

The straight line portion on the one end side of the antenna line 332 is arranged so as to overlap the straight line portion on the other end side of the antenna line 312 in plan view. The straight line portion on the other end side of the antenna line 332 is arranged so as to overlap the straight line portion on the one end side of the antenna line 313 in plan view.

The straight line portion on the one end side of the antenna wire 333 is arranged so as to overlap the straight line portion on the other end side of the antenna wire 313 in plan view. The straight line portion on the other end side of the antenna line 333 is arranged so as to overlap with the straight line portion on the one end side of the antenna line 314 in plan view.

The straight line portion on the one end side of the antenna line 334 is arranged so as to overlap the straight line portion on the other end side of the antenna line 314 in plan view. The straight line portion on the other end side of the antenna line 334 is arranged so as to overlap the straight line portion on the one end side of the antenna line 315 in plan view.

The straight line portion on the one end side of the antenna wire 335 is arranged so as to overlap the straight line portion on the other end side of the antenna wire 315 in plan view. The straight line portion on the other end side of the antenna wire 335 is arranged so as to overlap the straight line portion on the one end side of the antenna wire 316 in plan view.

The linear portion on one end of the antenna wire 336 is arranged so as to overlap the linear portion on the other end of the antenna wire 316 in plan view. The straight line portion on the other end side of the antenna line 336 is arranged so as to overlap the straight line portion on the one end side of the antenna line 317 in plan view.

The antenna wires 311 to 316 arranged on the second plane (not shown) may be formed in an L-shape as shown in Fig. 4 or the like, and the upper ends of the antenna wires 321 to 326 and the antenna wires It may be formed so that the upper ends of (341 to 346) may be connected linearly (so that they may extend obliquely), respectively.

Further, the first antenna segment 111D has a first end portion surrounded by a connecting portion 351 , an antenna wire 311 , an antenna wire 321 , and an antenna wire 331 on one side in the winding axis direction. . The first end is bent in a concave shape (bone fold). Further, the first antenna segment 111D has a second end portion surrounded by the antenna wire 336 , the antenna wire 346 , the antenna wire 317 , and the connecting portion 352 on the other side in the winding axis direction. . The second end is bent in a convex shape (mountain fold). In addition, the winding shaft passing through the 1st end and the 2nd end is arrange|positioned in the radial direction (horizontal direction).

In addition, the projection shape which projected the 1st antenna segment 111D on the 1st plane 301 is an L shape formed by bending concavely on the side of a 1st edge part and bending convexly on the side of a 2nd edge part. has a shape.

Here, when a current flows from the connecting portion 351 to the connecting portion 352, the antenna lines 311 to 317 on the first plane 301 that generate an induced electric field contributing to the generation of plasma have a frame region ( 141), the current flows in the same direction (+Y direction and +X direction).

In addition, current flows in the +Z direction in the antenna lines 321 to 326, and current flows in the -Z direction in the antenna lines 341 to 346. In addition, current flows in the antenna lines 331 to 336 separated from the first plane 301 in a direction opposite to that of the antenna lines on the first plane 301 . Since the antenna wires 331 to 336 are spaced apart from the first plane 301, the induced electric field of the antenna wires 331 to 336 inhibits the generation of plasma.

Further, the antenna wire 321 has a bent portion bent toward the inside (winding axis side) and an upright portion extending in the +Z direction. The same applies to the antenna lines 322 to 326, 341 to 346, 221 to 226, and 241 to 246.

13 is a schematic diagram showing the flow of current. The first antenna segment 111D has an antenna line 321 on a side adjacent to the second antenna segment 112D. The antenna wire 321 has a bent portion 321a that bends toward the inside of the winding shaft and an upright portion 321b. Similarly, the second antenna segment 112D has an antenna line 241 on the side adjacent to the first antenna segment 111D. The antenna wire 241 has a bent portion 241a that bends toward the inside of the winding shaft and an upright portion 241b. Further, between the first antenna segment 111D and the second antenna segment 112D, a shield 150 made of a metal for preventing interference of a magnetic field is disposed. Further, a current Ia flows through the first antenna segment 111D. The current Ia flowing through the bent portion 321a has a horizontal component Iax and a vertical component Iaz. Further, a current Ib flows through the second antenna segment 112D. The current Ib flowing through the bent portion 241a has a horizontal component Ibx and a vertical component Ibz.

By having such a structure, the space|interval of the upright part 241b and the upright part 321b is widened, and interference of a magnetic field is suppressed. In addition, in the first antenna segment 111D, at the end of the antenna line 311 , a magnetic field caused by a current Ia flowing through the antenna line 311 is a magnetic field caused by a horizontal component Iax of a current flowing through the bent portion 321a. is offset by Similarly, in the second antenna segment 112D, at the end of the antenna line 212, a magnetic field caused by the current Ib flowing through the antenna line 212 is a magnetic field caused by a horizontal component Ibx of the current flowing through the bent portion 241a. is offset by Accordingly, it is possible to prevent the magnetic field control of one antenna segment from interfering with the magnetic field control of the other antenna between the first antenna segment 111D and the second antenna segment 112D.

In other words, by reducing the thickness of the shield 150 , the interval G4 from the end of the first antenna segment 111D to the end of the second antenna segment 112D can be shortened. Thereby, in the induced magnetic field formed in the outer antenna 110, the non-uniformity between antenna segments can be reduced. In addition, the non-uniformity of the generated plasma can be reduced.

With respect to the structure etc. mentioned in the said embodiment, another embodiment may be sufficient as other components combined, and this indication is not limited at all to the structure shown here. This point can be changed within the range which does not deviate from the meaning of this indication, and it can determine suitably according to the application form.

For example, although the substrate processing apparatus 10 of FIG. 1 has been described as an inductively coupled plasma processing apparatus having a metal window 50 as an upper wall of the processing vessel 20, it is not limited thereto. It may be an inductively coupled plasma processing device provided with a dielectric window as a wall. Moreover, the plasma processing apparatus of another form may be sufficient.

In Fig. 2, it has been described that the outer antenna 110 is composed of vertically wound antenna segments 111 and 112, and the intermediate antenna 120 and the inner antenna 130 are composed of a spirally wound planar antenna. It is not limited to this. Also in the intermediate antenna 120, similarly to the outer antenna 110, it may be comprised with the antenna segments 111, 112 wound vertically.

In addition, although the case where the 2nd antenna segment 112 arrange|positioned at the edge part center of the frame-like region 141 is arrange|positioned one by one in each edge part was mentioned as an example and demonstrated, it is not limited to this. Two or more antenna segments 112 may be disposed on each edge.

In addition, although the case where the outer circumferential part 111c is provided in the 1st antenna segment 111 arrange|positioned at the corner part of the frame-like area|region 141 is mentioned as an example and demonstrated, it is not limited to this. For example, in the case where it is necessary to strengthen the plasma at the edge, the second antenna segment 112 disposed at the edge of the frame region 141 may have a configuration in which an outer circumferential portion is provided. For example, in the antenna wires 211 to 213 of FIG. 3 , an outer circumferential portion disposed above the antenna wires 215 to 217 may be provided to be spaced apart.

Claims (7)

It is an antenna segment formed by winding an antenna wire and forming a first plane by a part of the antenna wire,
a first antenna line at least a part of which forms the first plane on one side in the winding axis direction;
a second antenna wire forming the first plane on the other side in the winding axis direction;
The first antenna line is
an antenna unit on a plane forming the first plane;
a stacked antenna unit spaced apart from the upper side of the second antenna line;
An antenna segment having a connecting portion for connecting the on-plane antenna portion and the stacked antenna portion. According to claim 1,
and a current flowing through the multilayer antenna unit flows in the same direction as a current flowing through the second antenna line. 3. The method of claim 1 or 2,
The first end portion on one side in the winding axis direction is bent in a concave shape,
and a second end portion on the other side in the winding axis direction is formed by bending in a convex shape. 4. The method according to any one of claims 1 to 3,
The antenna segment, wherein the number of turns of the antenna wire constituting the multilayer antenna unit is less than or equal to half of the total number of turns of the antenna wire forming the first plane. 5. The method according to any one of claims 1 to 4,
An antenna segment, wherein a distance from an upper end of the second antenna line to a lower end of the laminated antenna unit is 10 mm or more and 30 mm or less. 6. The method according to any one of claims 1 to 5,
An antenna segment which forms a second plane by another part of the antenna line at a position opposite to the first plane. An induction system comprising an upper wall constituting a processing vessel, a loading table facing the top wall in the processing vessel, and an antenna unit disposed above the top wall, for processing a substrate loaded on the loading table a combined plasma processing device,
The antenna unit is
Usually formed by winding an antenna wire, an antenna segment forming a first plane by a part of the antenna wire is formed by arranging the first plane to form a frame-like region,
The antenna unit is
a corner part antenna segment constituting a corner part of the frame region among the plurality of antenna segments;
The corner part antenna segment,
a first antenna line at least a part of which forms the first plane on one side in the winding axis direction;
a second antenna wire forming the first plane on the other side in the winding axis direction;
The first antenna line is
an antenna unit on a plane forming the first plane;
a stacked antenna unit spaced apart from the upper side of the second antenna line;
an inductively coupled plasma processing device having a connecting portion for connecting the planar antenna portion and the stacked antenna portion.

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