KR20210105219A - Methods for Manufacturing Episulfide Compounds for Optical Materials, Compositions for Optical Materials Containing the Same, and High Refractive Optical Materials - Google Patents

Methods for Manufacturing Episulfide Compounds for Optical Materials, Compositions for Optical Materials Containing the Same, and High Refractive Optical Materials Download PDF

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KR20210105219A
KR20210105219A KR1020200019911A KR20200019911A KR20210105219A KR 20210105219 A KR20210105219 A KR 20210105219A KR 1020200019911 A KR1020200019911 A KR 1020200019911A KR 20200019911 A KR20200019911 A KR 20200019911A KR 20210105219 A KR20210105219 A KR 20210105219A
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optical material
episulfide
compound
bis
composition
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장동규
노수균
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주식회사 케이오씨솔루션
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Priority to KR1020200019911A priority Critical patent/KR20210105219A/en
Priority to PCT/KR2021/000990 priority patent/WO2021167256A1/en
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D331/00Heterocyclic compounds containing rings of less than five members, having one sulfur atom as the only ring hetero atom
    • C07D331/02Three-membered rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D409/00Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/12Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02Polythioethers
    • C08G75/06Polythioethers from cyclic thioethers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/06Sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/16Nitrogen-containing compounds
    • C08K5/29Compounds containing one or more carbon-to-nitrogen double bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/36Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37Thiols
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/041Lenses

Abstract

The present invention relates to a composition for an optical material in which a rapid curing phenomenon occurring in the polymerization of an episulfide-based highly refractive optical material is suppressed, and a method for preparing an optical material using the same. The present invention provides a composition for an episulfide-based highly refractive optical material, including an episulfide compound represented by chemical formula 1, a 2,3-epoxypropyl(2,3-epithiopropyl)sulfide compound, a catechol compound, and a quaternary phosphonium salt as a polymerization catalyst. The composition according to the present invention prevents a rapid increase in viscosity occurring upon the polymerization of an episulfide-based highly refractive optical material, and maintains the curing rate constantly, and thus can be used as a high-quality lens material free from the problem of polymerization imbalance.

Description

광학재료용 에피설파이드 화합물, 이를 포함하는 고굴절 광학재료용 조성물 및 광학재료의 제조방법 {Methods for Manufacturing Episulfide Compounds for Optical Materials, Compositions for Optical Materials Containing the Same, and High Refractive Optical Materials}Episulfide compound for optical material, composition for high refractive optical material containing same, and method for manufacturing optical material

본 발명은 광학재료용 에피설파이드 화합물의 제조방법과 이를 이용한 고굴절 광학재료용 조성물 및 광학재료의 제조방법에 관한 것으로, 특히 황화수소 가스를 직접 발생시켜 공정에 투입하고 일정한 온도와 압력에서 염산 및 에피클로로 히드린의 첨가량을 조절하는 것에 의해 투명하고 색상이 좋은 광학재료용의 에피설파이드 화합물을 효율적으로 제조할 수 있는 방법에 관한 것이다. The present invention relates to a method for producing an episulfide compound for an optical material, a composition for a high refractive optical material using the same, and a method for producing an optical material. It relates to a method for efficiently producing an episulfide compound for an optical material having good color and transparency by controlling the amount of hydrin added.

플라스틱 렌즈는 가볍고 내충격성이 좋고 착색이 용이하여, 근래 대부분의 안경렌즈에 플라스틱 렌즈가 사용되고 있다. 플라스틱 안경렌즈는 경량성, 고투명성, 낮은 황색도, 내열성, 내광성, 강도를 높이는 방향으로 발전되어 왔다. Plastic lenses are light, have good impact resistance, and are easy to color, so plastic lenses are used in most spectacle lenses in recent years. Plastic spectacle lenses have been developed in the direction of increasing lightness, high transparency, low yellowness, heat resistance, light resistance, and strength.

한국등록특허 10-0681218호에서는 에피설파이드계 플라스틱 렌즈를 제안하고 있다. 에피설파이드계 렌즈는 고굴절률이면서도 고아베수를 갖는 우수한 성질이 있으나, 인장강도, 압축강도, 착색성, 하드 접착력, 생산성 등의 면에서 문제가 많다. 이러한 문제점을 해결하기 위하여 두 종류의 서로 다른 성질의 수지를 공중합하는 방법, 즉 에피설파이드 화합물과 폴리티올 화합물 또는 여기에 폴리이소시아네이트 화합물을 함께 공중합하는 방법이 한국등록특허 10-0417985호, 일본공개특허 평11-352302호 등에서 제안되었다. Korean Patent No. 10-0681218 proposes an episulfide-based plastic lens. Episulfide-based lenses have a high refractive index and high Abbe's number, but have many problems in terms of tensile strength, compressive strength, colorability, hard adhesion, productivity, and the like. In order to solve this problem, a method of copolymerizing two types of resins having different properties, that is, a method of copolymerizing an episulfide compound and a polythiol compound or a polyisocyanate compound therewith, is disclosed in Korean Patent No. 10-0417985, Japanese Patent Laid-Open Patent Publication No. It was proposed in Hei 11-352302, etc.

최근에는 에피설파이드 화합물을 포함하는 에피설파이드계 렌즈에서 굴절율을 더욱 높여 1.71 이상의 초고굴절률과 고아베수를 달성하기 위해, 에피설파이드 화합물에 황 원자나 셀레늄 원자 등의 무기 화합물을 배합하는 광학재료용 조성물이 제안되었다(일본 공개특허 2001-2783). In recent years, in order to further increase the refractive index in an episulfide-based lens containing an episulfide compound to achieve an ultra-high refractive index of 1.71 or more and a high Abbe's number, a composition for an optical material containing an inorganic compound such as a sulfur atom or a selenium atom in the episulfide compound has been proposed (Japanese Patent Application Laid-Open No. 2001-2783).

그러나 에피설파이드 화합물의 출발물질로 사용되는 황화수소 가스는 독성물질로 이송 및 취급이 어려운 문제가 있으며, 유독가스인 황화수소를 가스 상태에서 반응시킬 때 반응 속도를 정밀하게 제어하지 않으면 고순도의 화합물을 생산하기가 어렵다. 그리고 이렇게 반응속도가 정밀하게 제어되지 않은 채 얻어진 화합물을 출발물질을 사용하여 얻어진 에피설파이드 화합물을 모노머로 사용할 경우 제조된 광학렌즈는 뿌연이가 생겨 투명성이 떨어지므로 상업용으로 사용할 수가 없는 문제가 있었다.However, hydrogen sulfide gas, which is used as a starting material for episulfide compounds, is difficult to transport and handle as a toxic substance. is difficult In addition, when an episulfide compound obtained by using a compound obtained without precisely controlling the reaction rate as a starting material is used as a monomer, the manufactured optical lens is cloudy and has poor transparency, so there is a problem that cannot be used commercially.

뿐만 아니라 독성물질인 황화수소 가스를 반응시킬 때 반응 속도를 정밀하게 제어하지 않으면 공정상 비용이 많이 소요되고, 큰 사고로까지 이어질 수 있는 문제가 있다. 이러한 문제로 인해 에피설파이드 화합물은 그동안 대량 생산에 어려움이 있었다. In addition, if the reaction rate is not precisely controlled when reacting the toxic hydrogen sulfide gas, there is a problem in that the process costs a lot and may lead to a serious accident. Due to these problems, the episulfide compound has been difficult to mass-produce.

대한민국 등록특허공보 10-0417985Republic of Korea Patent Publication No. 10-0417985 일본 공개특허공보 특개평 11-352302Japanese Unexamined Patent Publication (Kokai) Hei 11-352302 일본 공개특허공보 2001-2783Japanese Patent Laid-Open No. 2001-2783 대한민국 공개특허공보 10-2014-0122721Republic of Korea Patent Publication No. 10-2014-0122721

본 발명에서는 황화수소 가스를 직접 발생시켜 공정에 투입하고 일정한 온도와 압력에서 염산 및 에피클로로 히드린의 첨가량을 조절하는 것에 의해 반응 속도를 정밀하게 제어할 수 있는 광학재료용 에피설파이드 화합물의 제조방법을 제공하는 것을 목적으로 한다. In the present invention, a method of producing an episulfide compound for an optical material that can precisely control the reaction rate by directly generating hydrogen sulfide gas and injecting it into the process and controlling the addition amount of hydrochloric acid and epichlorohydrin at a constant temperature and pressure. intended to provide

본 발명에서는, 이러한 방법으로 황화수소 가스를 반응시키는 공정에서 순도가 높고 균일한 화합물을 제조하고 이를 이용하여 모노머로 사용될 에피설파이드 화합물을 제조함으로써 최종적으로 뿌연이가 없고 투명성이 높은 광학재료를 제공하는 것을 목적으로 한다.In the present invention, by preparing a compound with high purity and uniformity in the process of reacting hydrogen sulfide gas in this way, and using this to prepare an episulfide compound to be used as a monomer, finally providing an optical material with no haze and high transparency The purpose.

또한, 본 발명에서는 경제적이고 대량생산이 가능한 에피설파이드 화합물 및 이를 이용한 고굴절 광학재료용 조성물 및 광학재료의 제조방법을 제공하는 것을 목적으로 한다.Another object of the present invention is to provide an economical and mass-produced episulfide compound, a composition for a high refractive optical material using the same, and a method for manufacturing the optical material.

상기와 같은 목적을 달성하기 위하여, 본 발명에서는,In order to achieve the above object, in the present invention,

(a) 반응기(A)에 황화물을 넣고 상기 반응기(A)를 온도 1℃~50℃, 압력 0.001kgf/cm2~10kgf/cm2 범위로 유지하면서 산을 투입 반응시켜 황화수소 가스를 발생시키되, 상기 발생된 황화수소 가스는 전부 하기 단계의 반응기(B)로 투입되는 황화수소 가스의 발생 단계;(a) into a sulphide to the reactor (A) was added sikidoe an acid reaction, while maintaining the reactor (A) to a temperature 1 ℃ ~ 50 ℃, pressure 0.001kgf / cm 2 ~ 10kgf / cm 2 range generation of hydrogen sulfide gas, All of the generated hydrogen sulfide gas is generated in the reactor (B) of the following step of generating hydrogen sulfide gas;

(b) 에피클로로 히드린를 반응기(B)에 넣고 이 반응기(B)를 온도 1℃~30℃, 압력 0.002kgf/cm2~10kgf/cm2 범위로 유지하면서 상기 단계에서 발생된 황화수소 가스를 투입시켜 아래 반응식 2와 같은 반응으로 비스((3-클로로-2-히드록시프로필)설파이드를 제조하는 단계; 및(b) epichlorohydrin deurinreul into a reactor (B) while maintaining the reactor (B) to a temperature 1 ℃ ~ 30 ℃, pressure 0.002kgf / cm 2 ~ 10kgf / cm 2 In the range of the hydrogen sulfide gas generated in the step to prepare bis((3-chloro-2-hydroxypropyl)sulfide by the reaction shown in Scheme 2 below; and

(c) 상기 제조된 비스((3-클로로-2-히드록시프로필)설파이드를 티오우레아와 반응시켜 아래 화학식 1로 표시되는 에피설파이드 화합물을 제조하는 단계를 포함하며, (c) reacting the prepared bis((3-chloro-2-hydroxypropyl)sulfide with thiourea to prepare an episulfide compound represented by Formula 1 below,

상기 산 및 상기 에피클로로 히드린의 투입량 조절로 반응 진행을 제어하는 것을 특징으로 하는, 광학재료용 에피설파이드 화합물의 제조방법을 제공한다.It provides a method for producing an episulfide compound for an optical material, characterized in that the reaction progress is controlled by adjusting the input amount of the acid and the epichlorohydrin.

[반응식 2][Scheme 2]

Figure pat00001
Figure pat00001

[화학식 1][Formula 1]

Figure pat00002
Figure pat00002

(식 중에서 m은 0~4의 정수이며, n은 0~2의 정수이다.)(In the formula, m is an integer from 0 to 4, and n is an integer from 0 to 2.)

상기 제조방법에서, 상기 반응기(A)는 반응기(A)를 온도 5℃~30℃, 압력 0.02kgf/cm2~5kgf/cm2로 유지하고, 상기 반응기(B)는 압력 0.02kgf/cm2~5kgf/cm2로 유지하는 것이 보다 바람직하다. In the manufacturing method, the reactor (A) maintains the reactor (A) at a temperature of 5 ℃ ~ 30 ℃, a pressure of 0.02kgf / cm 2 ~ 5kgf / cm 2 , the reactor (B) is a pressure of 0.02kgf / cm 2 It is more preferable to maintain at ~5 kgf/cm 2 .

상기 반응 조절단계는, 바람직한 일 실시예에서 상기 (c) 단계의 반응 생성물을 GC 분석하여, 에피클로로히드린이 검출되면 상기 반응기(A)에 산을 추가 투입하고, 3-클로로-2-히드록시-프로판-1-티올이 검출되면 상기 반응기(B)에 에피클로로 히드린을 추가 투입하는 방법으로 반응을 진행을 제어할 수 있다. In the reaction control step, in a preferred embodiment, when epichlorohydrin is detected by GC analysis of the reaction product of step (c), an acid is additionally added to the reactor (A), and 3-chloro-2-hydrogen When hydroxy-propane-1-thiol is detected, the progress of the reaction can be controlled by additionally adding epichlorohydrin to the reactor (B).

또한, 본 발명에서는,In addition, in the present invention,

상기 방법으로 상기 화학식 1로 표시되는 광학재료용 에피설파이드 화합물을 제조하는 단계와;preparing an episulfide compound for an optical material represented by Formula 1 by the above method;

상기 에피설파이드 화합물과 중합촉매를 포함하는 조성물을 제조하는 단계를 포함하는, 에피설파이드계 고굴절 광학재료용 조성물의 제조방법을 제공한다.It provides a method for preparing a composition for an episulfide-based high refractive optical material, comprising the step of preparing a composition comprising the episulfide compound and a polymerization catalyst.

상기 조성물을 제조하는 단계는 상기 조성물에 황, 폴리티올 화합물, 폴리이소시아네이트 화합물 중 어느 하나 이상을 더 포함시킬 수 있다. Preparing the composition may further include any one or more of sulfur, a polythiol compound, and a polyisocyanate compound in the composition.

또한, 본 발명에서는,In addition, in the present invention,

상기 방법으로 상기 화학식 1로 표시되는 광학재료용 에피설파이드 화합물을 제조하는 단계;preparing an episulfide compound for an optical material represented by Formula 1 by the above method;

상기 에피설파이드 화합물과 중합촉매를 포함하는 광학재료용 조성물을 제조하는 단계; 및preparing a composition for an optical material comprising the episulfide compound and a polymerization catalyst; and

상기 광학재료용 조성물을 중합시키는 단계를 포함하는, 에피설파이드계 고굴절 광학재료의 제조방법을 제공한다. It provides a method for producing an episulfide-based high refractive optical material, comprising the step of polymerizing the composition for an optical material.

상기 조성물을 제조하는 단계는 상기 조성물에 황, 폴리티올 화합물, 폴리이소시아네이트 화합물 중 어느 하나 이상을 더 포함시킬 수 있다. Preparing the composition may further include any one or more of sulfur, a polythiol compound, and a polyisocyanate compound in the composition.

본 발명의 광학재료용 에피설파이드 화합물의 제조방법은, 황화수소 가스를 직접 발생시켜 공정에 투입하고 일정한 온도와 압력에서 염산 및 에피클로로 히드린의 첨가량을 조절하는 것에 의해 반응 속도를 정밀하게 제어할 수 있다.In the method for producing an episulfide compound for an optical material of the present invention, the reaction rate can be precisely controlled by directly generating hydrogen sulfide gas and injecting it into the process and adjusting the addition amounts of hydrochloric acid and epichlorohydrin at a constant temperature and pressure. have.

이에 따라 본 발명에서는, 황화수소 가스를 반응시키는 공정에서 순도가 높고 균일한 화합물을 제조할 수 있으며, 중합시 뿌연이가 없고 투명성이 높은 광학재료를 형성할 수 있는 모노머인 에피설파이드 화합물을 제조할 수 있다.Accordingly, in the present invention, a compound with high purity and uniformity can be prepared in the process of reacting hydrogen sulfide gas, and an episulfide compound, which is a monomer capable of forming an optical material with high transparency and no fog during polymerization, can be prepared. have.

본 발명의 에피설파이드 화합물의 제조방법에 따르면 중합시 뿌연이가 없어 투명성이 높은 에피설파이드 화합물을 경제적 방법으로 얻을 수 있고, 대량생산도 가능하다. According to the method for producing an episulfide compound of the present invention, an episulfide compound having high transparency can be obtained in an economical manner because there is no haze during polymerization, and mass production is possible.

본 발명에서 '고굴절'은 특별히 한정하지 않으면 1.67 이상부터 통상 초고굴절로 지칭되는 1.71 이상까지 모두 포함하는 의미이다. 한정되는 것은 아니나 보통 굴절률 1.67에서 1.77 범위가 여기에 해당된다. In the present invention, unless specifically limited, 'high refractive index' includes all of 1.67 or more to 1.71 or more, commonly referred to as ultra-high refractive index. Although not limited, the refractive index is usually in the range of 1.67 to 1.77.

에피설파이드episulfide 화합물의 제조 Preparation of compounds

본 발명의 광학재료용 에피설파이드 화합물의 제조방법은, 황화수소 가스의 발생 단계; 에피클로로 히드린과 황화수소를 반응시켜 비스((3-클로로-2-히드록시프로필)설파이드를 제조하는 단계; 및 비스((3-클로로-2-히드록시프로필)설파이드와 티오우레아를 반응시켜 에피설파이드 화합물을 제조하는 단계를 포함하며, 이때 상기 염산 및 상기 에피클로로 히드린의 투입량 조절에 의해 전체적인 반응 진행을 조절 제어한다. 이하, 각 단계별로 상세하게 설명한다. The method for producing an episulfide compound for an optical material of the present invention comprises the steps of generating hydrogen sulfide gas; reacting epichlorohydrin with hydrogen sulfide to prepare bis((3-chloro-2-hydroxypropyl)sulfide; and reacting bis((3-chloro-2-hydroxypropyl)sulfide with thiourea to produce epi It includes the step of preparing a sulfide compound, wherein the overall reaction progress is controlled and controlled by adjusting the input amounts of the hydrochloric acid and the epichlorohydrin. Hereinafter, each step will be described in detail.

1. 황화수소 가스의 발생 단계1. Generation of hydrogen sulfide gas

반응기(A)에 황화물을 넣고 산을 투입 반응시켜 황화수소 가스를 발생시킨다. 산으로는 바람직하게는 농염산을 사용할 수 있다. 농염산 대신 묽은 염산을 사용하는 것도 가능하나, 반응기에 상대적으로 많은 양의 황화수소 가스 잔량이 남게 되므로 생산량이 줄어드는 단점이 있다. Sulfide is put into the reactor (A) and acid is added to react to generate hydrogen sulfide gas. As the acid, preferably concentrated hydrochloric acid can be used. It is also possible to use dilute hydrochloric acid instead of concentrated hydrochloric acid, but since a relatively large amount of residual hydrogen sulfide gas remains in the reactor, there is a disadvantage in that the production is reduced.

상기 반응기(A)는 온도 1℃~50℃, 압력 0.001kgf/cm2~10kgf/cm2 범위로 유지하면서 황화물과 산을 반응시키며, 보다 바람직하게는 온도 5℃~30℃, 압력 0.02kgf/cm2~5kgf/cm2로 유지하면서 반응시킨다. 특히 바람직하게는 온도 5℃~20℃, 압력 0.02kgf/cm2~3kgf/cm2로 유지하면서 반응시킨다. The reactor (A) reacts with the sulfide and acid while maintaining the temperature 1 ℃ ~ 50 ℃, pressure 0.001kgf / cm 2 ~ 10kgf / cm 2 range, more preferably temperature 5 ℃ ~ 30 ℃, pressure 0.02kgf / cm 2 ~ 5kgf / cm 2 The reaction is maintained while maintaining. And particularly preferably a temperature 5 ℃ ~ 20 ℃, is allowed to react while maintaining the pressure 0.02kgf / cm 2 ~ 3kgf / cm 2.

본 단계에서는 바람직하게는 농염산을 사용해서 아래 반응식 1과 같이 반응시킨다. 발생된 황화수소 가스는 비스((3-클로로-2-히드록시프로필)설파이드를 제조하는 다음 단계의 반응기(B)에 전량 투입되도록 한다. In this step, it is preferably reacted as shown in Scheme 1 below using concentrated hydrochloric acid. The generated hydrogen sulfide gas is fed to the reactor (B) in the next step for producing bis((3-chloro-2-hydroxypropyl)sulfide.

[반응식 1][Scheme 1]

Figure pat00003
Figure pat00003

2. 비스((3-클로로-2-히드록시프로필)설파이드의 제조 단계2. Preparation of bis((3-chloro-2-hydroxypropyl)sulfide

에피클로로 히드린를 반응기(B)에 넣고 이 반응기(B)를 온도 1℃~30℃, 압력 0.002kgf/cm2~10kgf/cm2 범위로 유지하면서 상기 단계에서 발생된 황화수소 가스를 투입시켜 아래 반응식 2와 같은 반응으로 1-클로로-3-메르캅토포로판-2-올을 생성시킨다. 이때 보다 바람직하게는 반응기(B)를 온도 5℃~20℃, 압력 0.02kgf/cm2~5kgf/cm2로 유지하며, 특히 바람직하게는 온도 5℃~15℃,0.02kgf/cm2~3kgf/cm2로 유지한다. Epichlorohydrin deurinreul into a reactor (B) while maintaining the reaction schemes below, the reactor (B) to a temperature 1 ℃ ~ 30 ℃, pressure 0.002kgf / cm 2 ~ 10kgf / cm 2 range was added to the hydrogen sulfide gas generated in the step In the same reaction as in 2, 1-chloro-3-mercaptoporopan-2-ol is produced. At this point, and more preferably from maintaining the reactor (B) to a temperature 5 ℃ ~ 20 ℃, pressure 0.02kgf / cm 2 ~ 5kgf / cm 2, particularly preferably at a temperature 5 ℃ ~ 15 ℃, 0.02kgf / cm 2 ~ 3kgf Keep it at /cm 2 .

상기 반응은 황화수소가 포화되어야 하고, 온도와 압력을 제어함으로써 일정한 속도로 반응이 진행될 수 있다. 위와 같은 조건이 유지되지 않으면, 즉 반응기의 온도가 30℃ 이상으로 상승하거나 압력이 위 범위를 벗어나게 되면 반응이 불규칙하게 진행되어 불순물이 생성되어 다음 단계의 생성물인 에피설파이드 화합물에 영향을 주고 최종적으로 중합시 광학렌즈에서 뿌연이 현상이 나타나게 된다. The reaction must be saturated with hydrogen sulfide, and the reaction can proceed at a constant rate by controlling the temperature and pressure. If the above conditions are not maintained, that is, if the temperature of the reactor rises to 30° C. or higher or the pressure exceeds the above range, the reaction proceeds irregularly and impurities are generated, affecting the episulfide compound, the product of the next step, and finally During polymerization, a haze phenomenon appears in the optical lens.

본 단계에서는 에피클로로히드린과 황화수소가 반응하여 1-클로로-3-메르캅토포로판-2-올이 생성되고, 1-클로로-3-메르캅토포로판-2-올이 다시 에피클로로히드린과 반응하여 비스((3-클로로-2-히드록시프로필)설파이드가 생성된다.In this step, epichlorohydrin and hydrogen sulfide react to produce 1-chloro-3-mercaptoporopan-2-ol, and 1-chloro-3-mercaptoporopan-2-ol is again epichloroused. Reaction with hydrin gives bis((3-chloro-2-hydroxypropyl)sulfide.

상기 황화수소 가스의 발생 단계와 비스((3-클로로-2-히드록시프로필)설파이드의 제조 단계에서는 일정한 반응온도 및 압력 하에 황화수소 가스 발생량 및 에피클로로히드린의 첨가량을 조절함으로써 1-클로로-3-메르캅토포로판-2-올을 제조한다. 이때 반응기에 포화상태로 남아있는 황화수소는 에피클로로히드린과 반응시켜 1-클로로-3-메르캅토포로판-2-올을 더 생성하도록 하며 황화수소가 소모됨에 따라 압력이 내려가고 압력이 걸리지 않은 대기압에 도달하게 된다. In the hydrogen sulfide gas generation step and the bis((3-chloro-2-hydroxypropyl) sulfide production step, 1-chloro-3- To prepare mercaptophoropan-2-ol, at this time, hydrogen sulfide remaining in a saturated state in the reactor is reacted with epichlorohydrin to further produce 1-chloro-3-mercaptophoropan-2-ol As the hydrogen sulfide is consumed, the pressure drops and reaches the unpressurized atmospheric pressure.

[반응식 2][Scheme 2]

Figure pat00004
Figure pat00004

3. 에피설파이드 화합물의 제조 단계3. Preparation of Episulfide Compounds

상기 단계에서 제조된 비스((3-클로로-2-히드록시프로필)설파이드를 티오우레아와 반응시켜 아래 반응식 3과 같이 에피설파이드 화합물을 제조한다. The bis((3-chloro-2-hydroxypropyl)sulfide prepared in the above step is reacted with thiourea to prepare an episulfide compound as shown in Scheme 3 below.

[반응식 3][Scheme 3]

Figure pat00005
Figure pat00005

4. 반응 조절4. Reaction Control

상기 단계에서 산 및 에피클로로 히드린의 투입량을 조절함으로써 전체적인 반응 진행을 제어할 수 있다. 즉, 상기 황화수소 가스의 발생 단계에서 반응기(A)에 투입되는 산의 양과 상기 비스((3-클로로-2-히드록시프로필)설파이드의 제조 단계에서 반응기(B)에 투입되는 에피클로로 히드린의 양을 조절함으로써 전체적인 반응 진행을 조절할 수 있다. In the above step, the overall reaction progress can be controlled by adjusting the amounts of acid and epichlorohydrin. That is, the amount of acid input to the reactor (A) in the hydrogen sulfide gas generation step and epichlorohydrin input to the reactor (B) in the production step of bis((3-chloro-2-hydroxypropyl)sulfide By adjusting the amount, the overall reaction progress can be controlled.

바람직한 일 실시예에서는 상기 에피설파이드 화합물의 제조 단계에서 생성된 반응 생성물을 GC 분석하여, 에피클로로히드린이 검출되면 상기 반응기(A)에 염산을 추가 투입하고, 3-클로로-2-히드록시-프로판-1-티올이 검출되면 상기 반응기(B)에 에피클로로 히드린을 추가 투입하여 반응진행을 조절한다. In a preferred embodiment, when epichlorohydrin is detected by GC analysis of the reaction product generated in the preparation step of the episulfide compound, hydrochloric acid is further added to the reactor (A), and 3-chloro-2-hydroxy- When propane-1-thiol is detected, epichlorohydrin is additionally added to the reactor (B) to control the reaction progress.

반응에 참여하지 않고 잔류하는 출발물질은 이후 반응계에서 다양한 반응으로 의도하지 않는 불순물이 되어 최종 목적하는 산물 중에 혼입될 수 있다. 본 발명에서는 산과 에피클로로 히드린의 투입량 조절만으로 반응 진행을 정밀하게 제어하여 잔류하는 출발물질을 최소화하고 거의 완전하게 반응시킬 수 있으므로 간단하고 용이한 방법으로 고순도의 에피설파이드 화합물을 생산할 수 있다. The starting material remaining without participating in the reaction may become an unintended impurity due to various reactions in the subsequent reaction system and may be incorporated into the final desired product. In the present invention, only by adjusting the amount of acid and epichlorohydrin input, the reaction progress can be precisely controlled to minimize the remaining starting materials and react almost completely, so that it is possible to produce a high-purity episulfide compound in a simple and easy way.

에피설파이드계episulfide 고굴절high refractive index 광학재료용 조성물의 제조 Preparation of compositions for optical materials

본 발명의 에피설파이드계 고굴절 광학재료용 조성물의 제조방법은, The method for producing a composition for an episulfide-based high refractive optical material of the present invention,

상기와 같은 방법으로 상기 화학식 1로 표시되는 광학재료용 에피설파이드 화합물을 제조하는 단계와, Preparing an episulfide compound for an optical material represented by Chemical Formula 1 in the same manner as described above;

상기 에피설파이드 화합물과 중합촉매를 포함하는 조성물을 제조하는 단계를 포함한다. and preparing a composition comprising the episulfide compound and a polymerization catalyst.

상기 조성물을 제조하는 단계는, 상기 조성물에 황, 폴리티올 화합물, 폴리이소시아네이트 화합물 중 어느 하나 이상을 더 포함시킬 수 있다. In the preparing of the composition, any one or more of sulfur, a polythiol compound, and a polyisocyanate compound may be further included in the composition.

에피설파이드 화합물은 상기 화학식 1로 표시되며, 예를 들어, 비스(2,3-에피티오프로필)설파이드, 비스(2,3-에피티오프로필)디설파이드, 1,3 및 1,4-비스(β-에피티오프로필티오)시클로헥산, 1,3 및 1,4-비스(β-에피티오프로필티오메틸)시클로헥산, 비스[4-(β-에피티오프로필티오)시클로헥실]메탄, 2,2-비스[4-(β-에피티오프로필티오)시클로헥실]프로판, 비스[4-(β-에피티오프로필티오)시클로헥실]설파이드 등의 지환족골격을 갖는 에피설파이드화합물; 1,3 및 1,4-비스(β-에피티오프로필티오메틸)벤젠, 비스[4-(β-에피티오프로필티오)페닐]메탄, 2,2-비스[4-(β-에피티오프로필티오)페닐]프로판, 비스[4-(β-에피티오프로필티오)페닐]설파이드, 비스[4-(β-에피티오프로필티오)페닐]설핀, 4,4-비스(β-에피티오프로필티오)비페닐 등의 방향족골격을 갖는 에피설파이드화합물; 2,5-비스(β-에피티오프로필티오메틸)-1,4-디티안, 2,5-비스(β-에피티오프로필티오에틸티오메틸)-1,4-디티안, 2,5-비스(β-에피티오프로필티오에틸)-1,4-디티안, 2,3,5-트리(β-에피티오프로필티오에틸)-1,4-디티안 등의 디티안사슬 골격을 갖는 에피설파이드화합물; 2-(2-β-에피티오프로필티오에틸티오)-1,3-비스(β-에피티오프로필티오)프로판, 1,2-비스[(2-β-에피티오프로필티오에틸)티오]-3-(β-에피티오프로필티오)프로판, 테트라키스(β-에피티오프로필티오메틸)메탄, 1,1,1-트리스(β-에피티오프로필티오메틸)프로판, 비스-(β-에피티오프로필)설파이드 등의 지방족 골격을 갖는 에피설파이드화합물 등이 될 수 있다. 이외에도 에피설파이드화합물로 에피설파이드기를 가진 화합물의 염소 치환체, 브롬 치환체 등의 할로겐 치환체, 알킬 치환체, 알콕시 치환체, 니트로 치환체나 폴리티올과의 프리폴리머형 변성체 등도 될 수 있다. The episulfide compound is represented by Formula 1 above, for example, bis(2,3-epithiopropyl)sulfide, bis(2,3-epithiopropyl)disulfide, 1,3 and 1,4-bis(β). -epithiopropylthio)cyclohexane, 1,3 and 1,4-bis(β-epithiopropylthiomethyl)cyclohexane, bis[4-(β-epithiopropylthio)cyclohexyl]methane, 2,2 Episulfide compounds having an alicyclic skeleton such as -bis[4-(β-epithiopropylthio)cyclohexyl]propane and bis[4-(β-epithiopropylthio)cyclohexyl]sulfide; 1,3 and 1,4-bis(β-epithiopropylthiomethyl)benzene, bis[4-(β-epithiopropylthio)phenyl]methane, 2,2-bis[4-(β-epithiopropyl) Thio)phenyl]propane, bis[4-(β-epithiopropylthio)phenyl]sulfide, bis[4-(β-epithiopropylthio)phenyl]sulfine, 4,4-bis(β-epithiopropylthio) ) episulfide compounds having an aromatic skeleton such as biphenyl; 2,5-bis(β-epithiopropylthiomethyl)-1,4-dithiane, 2,5-bis(β-epithiopropylthioethylthiomethyl)-1,4-dithiane, 2,5- Epi having a dithiane chain skeleton such as bis(β-epithiopropylthioethyl)-1,4-dithiane and 2,3,5-tri(β-epithiopropylthioethyl)-1,4-dithiane sulfide compounds; 2-(2-β-epithiopropylthioethylthio)-1,3-bis(β-epithiopropylthio)propane, 1,2-bis[(2-β-epithiopropylthioethyl)thio]- 3-(β-epithiopropylthio)propane, tetrakis(β-epithiopropylthiomethyl)methane, 1,1,1-tris(β-epithiopropylthiomethyl)propane, bis-(β-epithio and an episulfide compound having an aliphatic skeleton such as propyl) sulfide. In addition, the episulfide compound may be a chlorine substituent of a compound having an episulfide group, a halogen substituent such as a bromine substituent, an alkyl substituent, an alkoxy substituent, a nitro substituent, or a prepolymer-type modified product with polythiol.

화학식 1로 표시되는 에피설파이드 화합물은, 바람직하게는 비스(2,3-에피티오프로필)설파이드, 비스(2,3-에피티오프로필)디설파이드, 1,3 및 1,4-비스(β-에피티오프로필티오)시클로헥산, 1,3 및 1,4-비스(β-에피티오프로필티오메틸)시클로헥산, 2,5-비스(β-에피티오프로필티오메틸)-1,4-디티안, 2,5-비스(β-에피티오프로필티오에틸티오메틸)-1,4-디티안, 2-(2-β-에피티오프로필티오에틸티오)-1,3-비스(β-에피티오프로필티오)프로판 중 1종 이상이다.The episulfide compound represented by Formula 1 is preferably bis(2,3-epithiopropyl)sulfide, bis(2,3-epithiopropyl)disulfide, 1,3 and 1,4-bis(β-epi). thiopropylthio)cyclohexane, 1,3 and 1,4-bis(β-epithiopropylthiomethyl)cyclohexane, 2,5-bis(β-epithiopropylthiomethyl)-1,4-dithiane; 2,5-bis(β-epithiopropylthioethylthiomethyl)-1,4-dithiane, 2-(2-β-epithiopropylthioethylthio)-1,3-bis(β-epithiopropyl thio) propane.

화학식 1로 표시되는 에피설파이드 화합물 외에 상기 반응식 3의 생성물과 같이 2,3-에폭시프로필(2,3-에피티오프로필)설파이드 화합물이 최종 생성물인 에피설파이드 화합물에 더 포함될 수 있다. 2,3-에폭시프로필(2,3-에피티오프로필)설파이드 화합물은 조성물의 중합성을 높여 중합이 잘 일어날 수 있도록 한다. 바람직하게는 최종 생성물인 에피설파이드 화합물 중에 2,3-에폭시프로필(2,3-에피티오프로필)설파이드 화합물이 0.3~15중량%로 포함되며, 더욱 바람직하게는 0.5~13중량%로 포함된다. 본 발명의 에피설파이드계 광학재료용 조성물이 황을 포함할 경우, 2,3-에폭시프로필(2,3-에피티오프로필)설파이드 화합물은 특히 바람직하게는 상기 에피설파이드 화합물 중에 0.5~5중량%로 포함된다. In addition to the episulfide compound represented by Formula 1, a 2,3-epoxypropyl (2,3-epithiopropyl) sulfide compound as in the product of Scheme 3 may be further included in the episulfide compound as a final product. The 2,3-epoxypropyl (2,3-epithiopropyl) sulfide compound increases the polymerizability of the composition to facilitate polymerization. Preferably, in the episulfide compound as the final product, the 2,3-epoxypropyl (2,3-epithiopropyl) sulfide compound is contained in an amount of 0.3 to 15 wt%, more preferably 0.5 to 13 wt%. When the composition for an episulfide-based optical material of the present invention contains sulfur, the 2,3-epoxypropyl (2,3-epithiopropyl) sulfide compound is particularly preferably used in an amount of 0.5 to 5% by weight in the episulfide compound. Included.

상기 폴리티올화합물은, 특별히 한정되지 않고 최소한 1개 이상의 티올기를 가진 화합물이면 1종 또는 2종 이상을 혼합하여 사용할 수 있다. 바람직하게는, 비스(2-메르캅토에틸)설파이드, 4-메르캅토메틸-1,8-디메르캅토-3,6-디티아옥탄, 2,3-비스(2-메르캅토에틸티오)프로판-1-티올, 2,2-비스(메르캅토메틸)-1,3-프로판디티올, 테트라키스(메르캅토메틸)메탄; 2-(2-메르캅토에틸티오)프로판-1,3-디티올, 2-(2,3-비스(2-메르캅토에틸티오)프로필티오)에탄티올, 비스(2,3-디메르캅토프로판닐)설파이드, 비스(2,3-디메르캅토프로판닐)디설파이드, 1,2-비스(2-메르캅토에틸티오)-3-메르캅토프로판, 1,2-비스(2-(2-메르캅토에틸티오)-3-메르캅토프로필티오)에탄, 비스(2-(2-메르캅토에틸티오)-3-메르캅토프로필)설파이드, 비스(2-(2-메르캅토에틸티오)-3-메르캅토프로필)디설파이드, 2-(2-메르캅토에틸티오)-3-2-메르캅토-3-[3-메르캅토-2-(2-메르캅토에틸티오)-프로필티오]프로필티오-프로판-1-티올, 2,2 -비스-(3-메르캅토-프로피오닐옥시메틸)-부틸 에스테르, 2-(2-메르캅토에틸티오)-3-(2-(2-[3-메르캅토-2-(2-메르캅토에틸티오)-프로필티오]에틸티오)에틸티오)프로판-1-티올, (4R,11S)-4,11-비스(메르캅토메틸)-3,6,9,12-테트라티아테트라데칸-1,14-디티올, (S)-3-((R-2,3-디메르캅토프로필)티오)프로판-1,2-디티올, (4R,14R)-4,14-비스(메르캅토메틸)-3,6,9,12,15-펜타티아헵탄-1,17-디티올, (S)-3-((R-3-메르캅토-2-((2-메르캅토에틸)티오)프로필)티오)프로필)티오)-2-((2-메르캅토에틸)티오)프로판-1-티올, 3,3'-디티오비스(프로판-1,2-디티올), (7R,11S)-7,11-비스(메르캅토메틸)-3,6,9,12,15-펜타티아헵타데칸-1,17-디티올, (7R,12S)-7,12-비스(메르캅토메틸)-3,6,9,10,13,16-헥사티아옥타데칸-1,18-디티올, 5,7-디메르캅토메틸-1,11-디메르캅토-3,6,9-트리티아운데칸, 4,7-디메르캅토메틸-1,11-디메르캅토-3,6,9-트리티아운데칸, 4,8-디메르캅토메틸-1,11-디메르캅토-3,6,9-트리티아운데칸, 펜타에리트리톨 테트라키스(3-메르캅토프로피오네이트), 트라이메틸올프로판 트리스(3-메르캅토프로피오네이트), 펜타에트리톨테트라키스(2-메르캅토아세테이트), 비스펜타에리트리톨-에테르-헥사키스(3-메르캅토프로피오네이트), 1,1,3,3-테트라키스(메르캅토메틸티오)프로판, 1,1,2,2-테트라키스(메르캅토메틸티오)에탄, 4,6-비스(메르캅토메틸티오)-1,3-디티안 및 2-(2,2-비스(메르캅토디메틸티오)에틸)-1,3-디티안 중에서 선택된 1종 이상을 사용할 수 있다. 이외에도 1개 이상의 티올기를 가진 화합물이면 1종 또는 2종 이상을 혼합하여 사용할 수 있다. 또한, 폴리티올화합물에 이소시아네이트나 에피설파이드 화합물, 티에탄 화합물 또는 수지개질제로 불포화 결합을 가진 화합물과의 예비중합에서 얻어진 중합 변성체도 사용이 가능하다. The polythiol compound is not particularly limited, and as long as it is a compound having at least one thiol group, one type or a mixture of two or more types may be used. Preferably, bis(2-mercaptoethyl)sulfide, 4-mercaptomethyl-1,8-dimercapto-3,6-dithiaoctane, 2,3-bis(2-mercaptoethylthio)propane -1-thiol, 2,2-bis(mercaptomethyl)-1,3-propanedithiol, tetrakis(mercaptomethyl)methane; 2-(2-mercaptoethylthio)propane-1,3-dithiol, 2-(2,3-bis(2-mercaptoethylthio)propylthio)ethanethiol, bis(2,3-dimercapto Propanyl)sulfide, bis(2,3-dimercaptopropanyl)disulfide, 1,2-bis(2-mercaptoethylthio)-3-mercaptopropane, 1,2-bis(2-(2-) Mercaptoethylthio)-3-mercaptopropylthio)ethane, bis(2-(2-mercaptoethylthio)-3-mercaptopropyl)sulfide, bis(2-(2-mercaptoethylthio)-3 -Mercaptopropyl) disulfide, 2-(2-mercaptoethylthio)-3-2-mercapto-3-[3-mercapto-2-(2-mercaptoethylthio)-propylthio]propylthio- Propane-1-thiol, 2,2-bis-(3-mercapto-propionyloxymethyl)-butyl ester, 2-(2-mercaptoethylthio)-3-(2-(2-[3-mer) Capto-2-(2-mercaptoethylthio)-propylthio]ethylthio)ethylthio)propane-1-thiol, (4R,11S)-4,11-bis(mercaptomethyl)-3,6,9 ,12-tetrathiatetradecane-1,14-dithiol, (S)-3-((R-2,3-dimercaptopropyl)thio)propane-1,2-dithiol, (4R,14R) -4,14-bis(mercaptomethyl)-3,6,9,12,15-pentathiaheptane-1,17-dithiol, (S)-3-((R-3-mercapto-2- ((2-mercaptoethyl)thio)propyl)thio)propyl)thio)-2-((2-mercaptoethyl)thio)propane-1-thiol, 3,3'-dithiobis(propane-1,2 -dithiol), (7R,11S)-7,11-bis(mercaptomethyl)-3,6,9,12,15-pentathiaheptadecane-1,17-dithiol, (7R,12S)- 7,12-bis(mercaptomethyl)-3,6,9,10,13,16-hexathiaoctadecane-1,18-dithiol, 5,7-dimercaptomethyl-1,11-dimer Capto-3,6,9-trithiaundecane, 4,7-dimercaptomethyl-1,11-dimercapto-3,6,9-trithiaundecane, 4,8-dimercaptomethyl- 1,11-dimercapto-3,6,9-trithiaundecane, pentaerythritol tetrakis (3-mercaptopropionate), trimethylolpropane tris (3-mercaptopropionate), pentaerythritol Ethritol tetrakis (2-mercaptoacetate), bispentaerythritol-ether-hex Sakis (3-mercaptopropionate), 1,1,3,3-tetrakis (mercaptomethylthio) propane, 1,1,2,2-tetrakis (mercaptomethylthio) ethane, 4, At least one selected from 6-bis(mercaptomethylthio)-1,3-dithiane and 2-(2,2-bis(mercaptodimethylthio)ethyl)-1,3-dithiane may be used. In addition, as long as it is a compound having one or more thiol groups, one type or a mixture of two or more types may be used. In addition, a polymerization modified product obtained by prepolymerization with an isocyanate, an episulfide compound, a thietane compound, or a compound having an unsaturated bond as a resin modifier to the polythiol compound can also be used.

폴리티올화합물로, 특히 바람직하게는, 비스(2-메르캅토에틸)설파이드 또는 4-메르캅토메틸-1,8-디메르캅토-3,6-디티아옥탄 또는 여기에 다른 폴리티올화합물을 1종 이상 혼합하여 사용할 수 있다. As the polythiol compound, particularly preferably, bis(2-mercaptoethyl)sulfide or 4-mercaptomethyl-1,8-dimercapto-3,6-dithiaoctane or another polythiol compound is added thereto to 1 It can be used by mixing more than one species.

폴리티올은 바람직하게는 상기 광학재료용 조성물 중에 1~15중량% 포함될 수 있으며, 보다 바람직하게는 4~13중량%, 더욱 바람직하게는 5~11중량% 포함될 수 있다. The polythiol may preferably be included in the composition for an optical material in an amount of 1 to 15% by weight, more preferably 4 to 13% by weight, and still more preferably 5 to 11% by weight.

상기 폴리이소시아네이트 화합물은, 특별히 한정되지 않고 최소한 1개 이상의 이소시아네이트 기 및/또는 이소티오시아네이트 기를 가진 화합물이 사용될 수 있다. 예를 들어, 2,2-디메틸펜탄디이소시아네이트, 2,2,4-트리메틸헥산디이소시아네이트, 부텐디이소시아네이트, 1,3-부타디엔-1,4-디이소시아네이트, 헥사메틸렌디이소시아네이트, 2,4,4-트리메틸헥사메틸렌디이소시아네이트, 1,6,11-운데칸트리이소시아네이트, 1,3,6-헥사메틸렌트리이소시아네이트, 1,8-디이소시아네이트-4-이소시아네이토메틸옥탄, 비스(이소시아네이토에틸)카보네이트, 비스(이소시아네이토에틸)에테르 등의 지방족 이소시아네이트 화합물; 이소포론디이소시아네이트, 1,2-비스(이소시아네이토메틸)시클로헥산, 1,3-비스(이소시아네이토메틸)시클로헥산, 1,4-비스(이소시아네이토메틸)시클로헥산, 디시클로헥실메탄디이소시아네이트, 시클로헥산디이소시아네이트, 메틸시클로헥산디이소시아네이트, 디시클로헥실디메틸메탄이소시아네이트, 2,2-디메틸디시클로헥실메탄이소시아네이트 등의 지환족 이소시아네이트 화합물; 자일릴렌디이소시아네이트(XDI), 비스(이소시아네이토에틸)벤젠, 비스(이소시아네이토프로필)벤젠, 비스(이소시아네이토부틸)벤젠, 비스(이소시아네이토메틸)나프탈렌, 비스(이소시아네이토메틸)디페닐에테르, 페닐렌디이소시아네이트, 에틸페닐렌디이소시아네이트, 이소프로필페닐렌디이소시아네이트, 디메틸페닐렌디이소시아네이트, 디에틸페닐렌디이소시아네이트, 디이소프로필페닐렌디이소시아네이트, 트리메틸벤젠트리이소시아네이트, 벤젠트리이소시아네이트, 디페닐디이소시아네이트, 톨루이딘디이소시아네이트, 4,4'-디페닐메탄디이소시아네이트, 3,3'-디메틸디페닐메탄-4,4'-디이소시아네이트, 비벤질-4,4'-디이소시아네이트, 비스(이소시아네이토페닐)에틸렌, 3,3'-디메톡시비페닐-4,4'-디이소시아네이트, 헥사히드로벤젠디이소시아네이트, 헥사히드로디페닐메탄-4,4'-디이소시아네이트 등의 방향족 이소시아네이트 화합물; 비스(이소시아네이토에틸)설파이드, 비스(이소시아네이토프로필)설파이드, 비스(이소시아네이토헥실)설파이드, 비스(이소시아네이토메틸)설폰, 비스(이소시아네이토메틸)디설파이드, 비스(이소시아네이토프로필)디설파이드, 비스(이소시아네이토메틸티오)메탄, 비스(이소시아네이토에틸티오)메탄, 비스(이소시아네이토에틸티오)에탄, 비스(이소시아네이토메틸티오)에탄, 1,5-디이소시아네이토-2-이소시아네이토메틸-3-티아펜탄 등의 함황 지방족 이소시아네이트 화합물; 디페닐설파이드-2,4-디이소시아네이트, 디페닐설파이드-4,4'-디이소시아네이트, 3,3'-디메톡시-4,4'-디이소시아네이토디벤질티오에테르, 비스(4-이소시아네이토메틸벤젠)설파이드, 4,4-메톡시벤젠티오에틸렌글리콜-3,3-디이소시아네이트, 디페닐디설파이드-4,4'-디이소시아네이트, 2,2'-디메틸디페닐디설파이드-5,5'-디이소시아네이트, 3,3'-디메틸디페닐디설파이드-5,5'-디이소시아네이트, 3,3'-디메틸디페닐디설파이드-6,6'-디이소시아네이트, 4,4'-디메틸디페닐디설파이드-5,5'-디이소시아네이트, 3,3'-디메톡시디페닐디설파이드-4,4'-디이소시아네이트, 4,4'-디메톡시디페닐디설파이드-3,3'-디이소시아네이트 등의 함황 방향족 이소시아네이트 화합물; 2,5-디이소시아네이토티오펜, 2,5-비스(이소시아네이토메틸)티오펜, 2,5-디이소시아네이토테트라히드로티오펜, 2,5-비스(이소시아네이토메틸)테트라히드로티오펜, 3,4-비스(이소시아네이토메틸)테트라히드로티오펜, 2,5-디이소시아네이토-1,4-디티안, 2,5-비스(이소시아네이토메틸)-1,4-디티안, 4,5-디이소시아네이토-1,3-디티오란, 4,5-비스(이소시아네이토메틸)-1,3-디티오란, 4,5-비스(이소시아네이토메틸)-2-메틸-1,3-디티오란 등의 함황 복소환 이소시아네이트 화합물 중에서 선택된 1종 또는 2종 이상의 화합물이 사용될 수 있다. 이외에도 최소한 1개 이상의 이소시아네이트 기 및/또는 이소티오시아네이트 기를 가진 화합물이면 1종 또는 2종 이상을 혼합 사용할 수 있다. 또한, 이들 이소시아네이트 화합물의 염소 치환체, 브롬 치환체 등의 할로겐 치환체, 알킬 치환체, 알콕시 치환체, 니트로 치환체나, 다가 알코올 혹은 티올과의 프리폴리머형 변성체, 카르보디이미드 변성체, 우레아 변성체, 뷰렛 변성체 혹은 다이머화, 트라이머화 반응 생성물 등도 사용 가능하다. The polyisocyanate compound is not particularly limited, and a compound having at least one isocyanate group and/or an isothiocyanate group may be used. For example, 2,2-dimethylpentane diisocyanate, 2,2,4-trimethylhexane diisocyanate, butene diisocyanate, 1,3-butadiene-1,4-diisocyanate, hexamethylene diisocyanate, 2,4, 4-trimethylhexamethylene diisocyanate, 1,6,11-undecanetriisocyanate, 1,3,6-hexamethylenetriisocyanate, 1,8-diisocyanate-4-isocyanatomethyloctane, bis(isocy aliphatic isocyanate compounds such as anatoethyl) carbonate and bis(isocyanatoethyl) ether; isophorone diisocyanate, 1,2-bis(isocyanatomethyl)cyclohexane, 1,3-bis(isocyanatomethyl)cyclohexane, 1,4-bis(isocyanatomethyl)cyclohexane; alicyclic isocyanate compounds such as dicyclohexylmethane diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, dicyclohexyldimethylmethane isocyanate, and 2,2-dimethyldicyclohexylmethane isocyanate; Xylylene diisocyanate (XDI), bis(isocyanatoethyl)benzene, bis(isocyanatopropyl)benzene, bis(isocyanatobutyl)benzene, bis(isocyanatomethyl)naphthalene, bis( Isocyanatomethyl) diphenyl ether, phenylene diisocyanate, ethylphenylene diisocyanate, isopropylphenylene diisocyanate, dimethylphenylene diisocyanate, diethylphenylene diisocyanate, diisopropylphenylene diisocyanate, trimethylbenzene triisocyanate, benzene tri Isocyanate, diphenyl diisocyanate, toluidine diisocyanate, 4,4'-diphenylmethane diisocyanate, 3,3'-dimethyldiphenylmethane-4,4'-diisocyanate, bibenzyl-4,4'-diisocyanate , bis(isocyanatophenyl)ethylene, 3,3'-dimethoxybiphenyl-4,4'-diisocyanate, hexahydrobenzene diisocyanate, hexahydrodiphenylmethane-4,4'-diisocyanate, etc. aromatic isocyanate compounds; bis(isocyanatoethyl)sulfide, bis(isocyanatopropyl)sulfide, bis(isocyanatohexyl)sulfide, bis(isocyanatomethyl)sulfone, bis(isocyanatomethyl)disulfide, Bis(isocyanatopropyl)disulfide, bis(isocyanatomethylthio)methane, bis(isocyanatoethylthio)methane, bis(isocyanatoethylthio)ethane, bis(isocyanatomethyl) sulfur-containing aliphatic isocyanate compounds such as thio)ethane and 1,5-diisocyanato-2-isocyanatomethyl-3-thiapentane; Diphenylsulfide-2,4-diisocyanate, diphenylsulfide-4,4'-diisocyanate, 3,3'-dimethoxy-4,4'-diisocyanatodibenzylthioether, bis(4-isocy Anatomethylbenzene) sulfide, 4,4-methoxybenzenethioethylene glycol-3,3-diisocyanate, diphenyldisulfide-4,4'-diisocyanate, 2,2'-dimethyldiphenyldisulfide-5,5 '-diisocyanate, 3,3'-dimethyldiphenyldisulfide-5,5'-diisocyanate, 3,3'-dimethyldiphenyldisulfide-6,6'-diisocyanate, 4,4'-dimethyldiphenyldisulfide Sulfur-containing aromatics such as -5,5'-diisocyanate, 3,3'-dimethoxydiphenyldisulfide-4,4'-diisocyanate, and 4,4'-dimethoxydiphenyldisulfide-3,3'-diisocyanate isocyanate compounds; 2,5-diisocyanatothiophene, 2,5-bis(isocyanatomethyl)thiophene, 2,5-diisocyanatotetrahydrothiophene, 2,5-bis(isocyanatomethyl) Tetrahydrothiophene, 3,4-bis(isocyanatomethyl)tetrahydrothiophene, 2,5-diisocyanato-1,4-dithiane, 2,5-bis(isocyanatomethyl) -1,4-dithiane, 4,5-diisocyanato-1,3-dithiolane, 4,5-bis(isocyanatomethyl)-1,3-dithiolane, 4,5-bis( One or two or more compounds selected from sulfur-containing heterocyclic isocyanate compounds such as isocyanatomethyl)-2-methyl-1,3-dithiorane may be used. In addition, as long as it is a compound having at least one isocyanate group and/or isothiocyanate group, one type or a mixture of two or more types may be used. In addition, halogen substituents such as chlorine substituents and bromine substituents, alkyl substituents, alkoxy substituents, nitro substituents, polyhydric alcohols or thiols of these isocyanate compounds, carbodiimide modified products, urea modified products, and biuret modified products Alternatively, dimerization or trimerization reaction products may also be used.

이소시아네이트 화합물로, 바람직하게는, 이소포론디이소시아네이트(IPDI), 헥사메틸렌디이소시아네이트(HDI), 디사이클로헥실메탄디이소시아네이트(H12MDI), 자일릴렌디이소시아네이트(XDI), 노보란디이소시아네이트(NBDI), 3,8-비스(이소시아나토메틸)트리시클로[5,2,1,02,6]데칸, 3,9-비스(이소시아나토메틸)트리시클로[5,2,1,02,6]데칸, 4,8-비스(이소시아나토메틸)트리시클로[5,2,1,02,6]데칸, 2,5-비스(이소시아나토메틸)비시클로[2,2,1]헵탄, 2,6-비스(이소시아나토메틸)비시클로[2,2,1]헵탄 중에서 선택된 1종 이상을 사용할 수 있다. As an isocyanate compound, Preferably, isophorone diisocyanate (IPDI), hexamethylene diisocyanate (HDI), dicyclohexylmethane diisocyanate (H12MDI), xylylene diisocyanate (XDI), norborane diisocyanate (NBDI), 3 ,8-bis(isocyanatomethyl)tricyclo[5,2,1,02,6]decane, 3,9-bis(isocyanatomethyl)tricyclo[5,2,1,02,6]decane , 4,8-bis(isocyanatomethyl)tricyclo[5,2,1,02,6]decane, 2,5-bis(isocyanatomethyl)bicyclo[2,2,1]heptane, 2 At least one selected from among ,6-bis(isocyanatomethyl)bicyclo[2,2,1]heptane may be used.

이소시아네이트 화합물은 상기 광학재료용 조성물 중 0.01~20중량%로 포함되며, 보다 바람직하게는 0.05~10중량%로 포함될 수 있다. The isocyanate compound is included in an amount of 0.01 to 20% by weight of the composition for an optical material, and more preferably, may be included in an amount of 0.05 to 10% by weight.

상기 에피설파이드계 광학재료용 조성물은 황을 더 포함할 수 있는데, 황을 포함할 경우 굴절률을 1.71 이상의 초고굴절로 높일 수 있다. 조성물에 포함되는 황은 바람직하게는 순도 98% 이상이다. 98% 미만의 경우, 불순물의 영향으로 광학재료의 투명도가 떨어질 수 있다. 황의 순도는 보다 바람직하게는 99.0% 이상이며, 특히 바람직하게는 99.5% 이상이다. 통상 상업적으로 입수 가능한 황은 형상이나 정제법의 차이에 의해 구분되는데, 미분황, 콜로이드황, 침강황, 결정황, 승화황 등이 있다. 본 발명에서는, 순도 98% 이상이면 어떤 황이나 사용 가능하다. 바람직하게는, 광학재료용 조성물 제조시 용해가 용이한 미세입자의 미분황을 사용할 수 있다. 상기 광학재료용 조성물 중에 황은 바람직하게는 1~40중량%로 포함되며, 보다 바람직하게는 2~30중량%, 가장 바람직하게는 3~22중량%로 포함된다. The composition for an episulfide-based optical material may further include sulfur. When sulfur is included, the refractive index may be increased to an ultra-high refractive index of 1.71 or more. The sulfur included in the composition is preferably 98% or more pure. In the case of less than 98%, the transparency of the optical material may be deteriorated due to the influence of impurities. The purity of the sulfur is more preferably 99.0% or more, and particularly preferably 99.5% or more. Generally, commercially available sulfur is classified by differences in shape or refining method, and there are fine powder, colloidal sulfur, precipitated sulfur, crystalline sulfur, sublimated sulfur, and the like. In the present invention, any sulfur can be used as long as the purity is 98% or more. Preferably, fine powder of fine particles that are easily dissolved may be used in the preparation of the composition for an optical material. In the composition for an optical material, sulfur is preferably contained in an amount of 1 to 40 wt%, more preferably 2 to 30 wt%, and most preferably 3 to 22 wt%.

상기 중합촉매는, 바람직하게는 아민, 제4급 암모늄염, 제4급 포스포늄염, 제3급 술포늄염, 제2급 요오드늄염, 포스핀 화합물 중에서 선택된 1종 이상을 사용한다. 보다 바람직하게는 제4급 암모늄염, 제4급 포스포늄염, 포스핀 화합물 중에서 선택된 1종 이상을 사용할 수 있다. 제4급 암모늄염으로는, 예를 들어, 테트라-n-부틸암모늄브로마이드, 테트라페닐암모늄브로마이드, 트리에틸벤질암모늄클로라이드, 세틸디메틸벤질암모늄클로라이드, 1-n-도데실피리디늄클로라이드 등을 사용할 수 있다. 제4급 포스포늄염으로는, 예를 들어, 테트라-n-부틸포스포늄브로마이드, 테트라페닐포스포늄브로마이드 등을 사용할 수 있다. 포스핀 화합물로는 트리페닐포스핀 등을 사용할 수 있다. 특히 바람직하게는 상기 중합촉매는 제4급 포스포늄염이며, 테트라-n-부틸포스포늄브로마이드, 테트라페닐포스포늄브로마이드 중 어느 하나를 포함한다. 이들 중합 촉매는 단독으로 사용하거나 2종 이상을 혼합하여 사용할 수 있다.The polymerization catalyst is preferably at least one selected from among amines, quaternary ammonium salts, quaternary phosphonium salts, tertiary sulfonium salts, secondary iodonium salts, and phosphine compounds. More preferably, at least one selected from a quaternary ammonium salt, a quaternary phosphonium salt, and a phosphine compound may be used. As the quaternary ammonium salt, for example, tetra-n-butylammonium bromide, tetraphenylammonium bromide, triethylbenzylammonium chloride, cetyldimethylbenzylammonium chloride, 1-n-dodecylpyridinium chloride, etc. can be used. . As a quaternary phosphonium salt, tetra-n-butylphosphonium bromide, tetraphenylphosphonium bromide, etc. can be used, for example. As the phosphine compound, triphenylphosphine or the like can be used. Particularly preferably, the polymerization catalyst is a quaternary phosphonium salt, and includes any one of tetra-n-butylphosphonium bromide and tetraphenylphosphonium bromide. These polymerization catalysts can be used individually or in mixture of 2 or more types.

상기 에피설파이드계 광학재료용 조성물은 중합조절제로 주석할로겐 화합물을 더 포함할 수 있다. 상기 주석할로겐 화합물은 바람직하게는 디부틸주석디클로라이드, 디메틸주석디클로라이드 중 어느 하나 또는 여기에 모노메틸주석트리클로라이드가 소량 포함된 것을 사용할 수 있다. 더욱 바람직하게는 모노메틸주석트리클로라이드는 0.1~3.5중량%로 포함될 수 있다. 에피설파이드계 광학재료용 조성물은 중합 경화시킬 때 반응이 빠르게 진행되어 조성물의 점도가 급격하게 상승될 수 있다. 상기 중합 조절제는 반응속도를 조절함으로써 점도의 급격한 상승을 억제할 수 있다. 상기 중합 조절제는 광학재료용 조성물 전체 중량 중 0.01~5 중량%로 사용하는 것이 바람직하다. 이 중합 조절제의 사용으로 중합 속도를 조절하여 점도의 급격한 상승을 억제할 수 있을 뿐만 아니라 그 결과 중합 수율이 높아지고, 기포의 발생 또한 없어진다. The composition for an episulfide-based optical material may further include a tin halogen compound as a polymerization regulator. The tin halogen compound is preferably any one of dibutyl tin dichloride and dimethyl tin dichloride, or one in which monomethyl tin trichloride is included in a small amount may be used. More preferably, monomethyl tin trichloride may be included in an amount of 0.1 to 3.5 wt%. When the composition for an episulfide-based optical material is polymerized and cured, the reaction proceeds rapidly, so that the viscosity of the composition may be rapidly increased. The polymerization regulator can suppress a sudden increase in viscosity by controlling the reaction rate. The polymerization regulator is preferably used in an amount of 0.01 to 5% by weight based on the total weight of the composition for an optical material. By using this polymerization regulator, the polymerization rate can be controlled to suppress a sudden increase in viscosity, and as a result, the polymerization yield is increased, and the generation of bubbles is also eliminated.

상기 에피설파이드계 광학재료용 조성물 중에 황을 포함할 경우, 프리폴리머를 형성한 후 중합하는 것이 바람직한데, 이때 프리폴리머의 형성을 원활하게 하기 위해 바람직하게는 중합조절제로 알킬이미다졸을 더 포함할 수 있다. 상기 알킬이미다졸은 특히 바람직하게는 2-메르캅토-1-메틸이미다졸을 포함한다. 2-메르캅토-1-메틸이미다졸은 바람직하게는 순도 98% 이상의 것을 사용한다. 광학재료용 조성물 중에 바람직하게는 0.01~5중량% 포함될 수 있으며, 보다 바람직하게는 0.1~3중량%, 더욱 바람직하게는 0.15~1중량%가 포함될 수 있다.When sulfur is included in the composition for an episulfide-based optical material, it is preferable to polymerize after forming the prepolymer. have. Said alkylimidazole particularly preferably comprises 2-mercapto-1-methylimidazole. 2-Mercapto-1-methylimidazole is preferably used with a purity of 98% or more. The composition for an optical material may preferably contain 0.01 to 5% by weight, more preferably 0.1 to 3% by weight, and still more preferably 0.15 to 1% by weight.

본 발명의 광학재료용 조성물은 내부이형제를 더 포함할 수 있다. 바람직하게는 내부이형제로 인산에스테르 화합물을 포함할 수 있다. 인산에스테르 화합물은 포스포러스펜톡사이드(P2O5)에 2~3몰의 알코올 화합물을 부가하여 제조하는데 이때 사용하는 알코올 종류에 따라 여러 가지 형태의 인산에스테르 화합물을 얻을 수 있다. 대표적인 것으로는 지방족 알코올에 에틸렌옥사이드 혹은 프로필렌 옥사이드가 부가되거나 노닐페놀기 등에 에틸렌 옥사이드 혹은 프로필렌 옥사이드가 부가된 종류들이다. 본 발명의 중합성 조성물에, 에틸렌 옥사이드 혹은 프로필렌 옥사이드가 부가된 인산에스테르화합물이 내부이형제로 포함될 경우, 이형성이 좋고 품질이 우수한 광학재료를 얻을 수 있어 바람직하다. 본 발명의 조성물은, 내부이형제로, 바람직하게는, 4-PENPP[폴리옥시에틸렌노닐페놀에테르포스페이트(에틸렌옥사이드가 5몰 부가된 것 5중량%, 4몰 부가된 것 80중량%, 3몰 부가된 것 10중량%, 1몰 부가된 것 5중량%)], 8-PENPP[폴리옥시에틸렌노닐페놀에테르포스페이트(에틸렌옥사이드 9몰 부가된 것 3중량%, 8몰 부가된 것 80중량%, 9몰 부가된 것 5중량%, 7몰 부가된 것 6중량%, 6몰 부가된 것 6중량%)], 12-PENPP[폴리옥시에틸렌노닐페놀에테르포스페이트(에틸렌옥사이드 13몰 부가된 것 3중량%, 12몰 부가된 것 80중량%, 11몰 부가된 것 8중량%, 9몰 부가된 것 3중량%, 4몰 부가된 것 6중량%)], 16-PENPP[폴리옥시에틸렌 노닐페놀에테르포스페이트(에틸렌옥사이드가 17몰 부가된 것 3중량%, 16몰 부가된 것 79중량%, 15몰 부가된 것 10중량%, 14몰 부가된 것 4중량%, 13몰 부가된 것 4중량%)], 20-PENPP[폴리옥시에틸렌노닐페놀에테르 포스페이트(에틸렌옥사이드가 21몰 부가된 것 6중량%, 20몰 부가된 것 76중량%, 19몰 부가된 것 7중량%, 18몰 부가된 것 6중량%, 17몰 부가된 것 5중량%)], 4-PPNPP[폴리옥시프로필렌노닐페놀에테르포스페이트(프로필렌옥사이드가 5몰 부가된 것 5중량%, 4몰 부가된 것 80중량%, 3몰 부가된 것 10중량%, 1몰 부가된 것 5중량%)], 8-PPNPP[폴리옥시프로필렌노닐페놀에테르포스페이트(프로필렌옥사이드 9몰 부가된 것 3중량%, 8몰 부가된 것 80중량%, 9몰 부가된 것 5중량%, 7몰 부가 된 것 6중량%, 6몰 부가된 것 6중량%)], 12-PPNPP[폴리옥시프로필렌노닐페놀에테르포스페이트(프로필렌옥사이드 13몰 부가된 것 3중량%, 12몰 부가된 것 80중량%, 11몰 부가된 것 8중량%, 9몰 부가된 것 3중량%, 4몰 부가된 것 6중량%)], 16-PPNPP[폴리옥시프로필렌 노닐페놀에테르포스페이트(프로필렌옥사이드 17몰 부가된 것 3중량%, 16몰 부가된 것 79중량%, 15몰 부가된 것 10중량%, 14몰 부가된 것 4중량%, 13몰 부가된 것 4중량%)], 20-PPNPP[폴리옥시프로필렌노닐페놀에테르포스페이트(프로필렌옥사이드가 21몰 부가된 것 6중량%, 20몰 부가된 것 76중량%, 19몰 부가된 것 7중량%, 18몰 부가된 것 6중량%, 17몰 부가된 것 5중량%)] 및 Zelec UNTM 중에서 선택된 1종 이상을 사용한다. 이러한 인산에스테르화합물의 할로겐화합물 치환체를 비롯한 각종 치환체들도 같은 목적으로 사용이 가능하다.The composition for an optical material of the present invention may further include an internal release agent. Preferably, it may include a phosphate ester compound as an internal mold release agent. Phosphoric acid ester compound is prepared by adding 2 to 3 moles of an alcohol compound to phosphorus pentoxide (P 2 O 5 ). At this time, various types of phosphoric acid ester compounds can be obtained depending on the type of alcohol used. Representative examples are types in which ethylene oxide or propylene oxide is added to an aliphatic alcohol or ethylene oxide or propylene oxide is added to a nonylphenol group or the like. When the phosphoric acid ester compound to which ethylene oxide or propylene oxide is added is included in the polymerizable composition of the present invention as an internal mold release agent, it is preferable to obtain an optical material having good mold release properties and excellent quality. The composition of the present invention is an internal mold release agent, preferably 4-PENPP [polyoxyethylene nonylphenol ether phosphate (5 wt% of ethylene oxide added by 5 moles, 80 wt% of 4 moles added, 3 moles added) 10 wt% of ethylene oxide, 5 wt% of added 1 mole)], 8-PENPP [polyoxyethylene nonylphenol ether phosphate (3 wt% of ethylene oxide added by 9 moles, 80 wt% of 8 moles added), 9 5 wt% of molar addition, 6 wt% of 7 molar addition, 6 wt% of 6 molar addition)], 12-PENPP [polyoxyethylene nonylphenol ether phosphate (3 wt% of ethylene oxide added by 13 moles) , 80 wt% of 12 moles added, 8 wt% of 11 moles added, 3 wt% of 9 moles added, 6 wt% of 4 moles added)], 16-PENPP [polyoxyethylene nonylphenol ether phosphate (3 wt% of ethylene oxide added by 17 moles, 79 wt% of added 16 moles, 10 wt% of 15 moles added, 4 wt% of 14 moles added, 4 wt% of 13 moles added)] , 20-PENPP [polyoxyethylene nonylphenol ether phosphate (6 wt% of ethylene oxide added by 21 moles, 76 wt% of 20 moles added, 7 wt% of 19 moles added, 6 wt% of 18 moles added) %, 17 mol added 5 wt %)], 4-PPNPP [polyoxypropylene nonylphenol ether phosphate (5 mol propylene oxide added 5 wt %, 4 mol added 80 wt %, 3 mol added 10% by weight, 5% by weight added by 1 mole)], 8-PPNPP [Polyoxypropylene nonylphenol ether phosphate (3% by weight of propylene oxide added by 9 moles, 80% by weight added by 8 moles) 5% by weight added, 6% by weight added by 7 moles, 6% by weight added by 6 moles)], 12-PPNPP [polyoxypropylene nonylphenol ether phosphate (3 weight% by adding 13 moles of propylene oxide) 80 wt% of 12 moles added, 8 wt% of 11 moles added, 3 wt% of 9 moles added, 6 wt% of 4 moles added)], 16-PPNPP [polyoxypropylene nonylphenol ether phosphate ( 3 wt% of propylene oxide added by 17 moles , 16 mol added 79 wt %, 15 mol added 10 wt %, 14 mol added 4 wt %, 13 mol added 4 wt %)], 20-PPNPP [polyoxypropylene nonylphenol ether phosphate (6 wt% of propylene oxide added by 21 moles, 76% by weight of 20 moles added, 7 wt% of 19 moles added, 6 wt% of 18 moles added, 5 wt% of 17 moles added)] and Zelec UN TM Use at least one selected from among. Various substituents including halogen compound substituents of these phosphoric acid ester compounds can also be used for the same purpose.

본 발명의 광학재료용 조성물은, 광학재료의 광학적인 물성을 향상시키기 위해, 내충격성, 비중 및 모노머 점도 등을 조절하는 목적으로 올레핀 화합물을 반응성 수지개질제로 더 포함할 수 있다. 수지개질제로서 첨가할 수 있는 올레핀 화합물로는, 예를 들어, 벤질아크릴레이트, 벤질메타크릴레이트, 부톡시에틸아크릴레이트, 부톡시메틸메타크릴레이트, 시클로헥실아크릴레이트, 시클로헥실메타크릴레이트, 2-히드록시에틸아크릴레이트, 2-히드록시메틸메타크릴레이트, 글리시딜아크릴레이트, 글리시딜메타크릴레이트, 페녹시 에틸아크릴레이트, 페녹시에틸메타크릴레이트, 페닐메타크릴레이트, 에틸렌글리콜디아크릴레이트, 에틸렌글리콜디메타크릴레이트, 디에틸렌글리콜디아크릴레이트, 디에틸렌글리콜디메타크릴레이트, 트리에틸렌글리콜디아크릴레이트, 트리에틸렌글리콜디메타크릴레이트, 테트라에틸렌글리콜디아크릴레이트, 테트라에틸렌글리콜디메타크릴레이트, 폴리에틸렌글리콜디아크릴레이트, 폴리에틸렌글리콜디메타크릴레이트, 네오펜틸글리콜디아크릴레이트, 네오펜틸글리콜디메타크릴레이트, 에틸렌글리콜비스글리시딜아크릴레이트, 에틸렌글리콜비스글리시딜메타크릴레이트, 비스페놀 A 디아크릴레이트, 비스페놀 A 디메타크릴레이트, 2,2-비스(4-아크록시에톡시페닐)프로판, 2,2-비스(4-메타크록시에톡시페닐)프로판, 2,2-비스(4-아크록시디에톡시페닐)프로판, 2,2-비스(4-메타크록시디에톡시페닐)프로판, 비스페놀 F 디아크릴레이트, 비스페놀 F 디메타크릴레이트, 1,1-비스(4-아크록시에톡시페닐)메탄, 1,1-비스(4-메타크록시에톡시페닐)메탄, 1,1-비스(4-아크록시디에톡시페닐)메탄, 1,1-비스(4-메타크록시디에톡시페닐)메탄, 디메티롤트리시클로데칸디아크릴레이트, 트리메티롤프로판트리아크릴레이트, 트리메티롤프로판트리메타크릴레이트, 글리세롤디아크릴레이트, 글리세롤디메타크릴레이트, 펜타에리트리톨트리아크릴레이트, 펜타에리트리톨테트라크릴레이트, 펜타에리트리톨테트라메타크릴레이트, 메틸티오아크릴레이트, 메틸티오메타크릴레이트, 페닐티오아크릴레이트, 벤질티오메타크릴레이트, 크실리렌디티올디아크릴레이트, 크실리렌디티올디메타크릴레이트, 메르캅토에틸설파이드디아크릴레이트, 메르캅토에틸설파이드디메타크릴레이트 등의 (메타)아크릴레이트 화합물 및, 알릴글리시딜에테르, 디알릴프탈레이트, 디알릴테레프탈레이트, 디알릴이소프탈레이트, 디알릴카보네이트, 디에틸렌글리콜비스알릴카보네이트 등의 알릴 화합물 및 스티렌, 클로로스티렌, 메틸스티렌, 브로모스티렌, 디브로모스티렌, 디비닐벤젠, 3,9-디비닐스피로비(m-디옥산) 등의 비닐 화합물 등이 있으며, 사용 가능한 화합물이 이들 예시 화합물로 제한되는 것은 아니다. 이들 올레핀 화합물은 단독, 또는 2종류 이상을 혼합하여 사용해도 좋다.The composition for an optical material of the present invention may further include an olefin compound as a reactive resin modifier for the purpose of controlling impact resistance, specific gravity, monomer viscosity, etc. in order to improve optical properties of the optical material. Examples of the olefin compound that can be added as the resin modifier include benzyl acrylate, benzyl methacrylate, butoxyethyl acrylate, butoxymethyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, 2 -Hydroxyethyl acrylate, 2-hydroxymethyl methacrylate, glycidyl acrylate, glycidyl methacrylate, phenoxy ethyl acrylate, phenoxy ethyl methacrylate, phenyl methacrylate, ethylene glycol di Acrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, diethylene glycol dimethacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, tetraethylene glycol diacrylate, tetraethylene glycol Dimethacrylate, polyethylene glycol diacrylate, polyethylene glycol dimethacrylate, neopentyl glycol diacrylate, neopentyl glycol dimethacrylate, ethylene glycol bisglycidyl acrylate, ethylene glycol bisglycidyl methacrylic Late, bisphenol A diacrylate, bisphenol A dimethacrylate, 2,2-bis(4-hydroxyethoxyphenyl)propane, 2,2-bis(4-methoxyethoxyphenyl)propane, 2, 2-bis(4-acroxydiethoxyphenyl)propane, 2,2-bis(4-methoxydiethoxyphenyl)propane, bisphenol F diacrylate, bisphenol F dimethacrylate, 1,1-bis( 4-Acrythoxyphenyl)methane, 1,1-bis(4-methacrythoxyphenyl)methane, 1,1-bis(4-hydroxydiethoxyphenyl)methane, 1,1-bis(4 -Methoxydiethoxyphenyl) methane, dimethylol tricyclodecane diacrylate, trimethylol propane triacrylate, trimethylol propane trimethacrylate, glycerol diacrylate, glycerol dimethacrylate, pentaerythritol Triacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, methylthioacrylate, methylthiomethacrylate, phenylthioacrylate, benzylthiomethacrylate, xylylenedithioldiacrylate, (meth)acrylate compounds such as silylene dithiol dimethacrylate, mercaptoethyl sulfide diacrylate, and mercaptoethyl sulfide dimethacrylate, and allyl glycidyl Allyl compounds such as tere, diallyl phthalate, diallyl terephthalate, diallyl isophthalate, diallyl carbonate and diethylene glycol bisallyl carbonate and styrene, chlorostyrene, methylstyrene, bromostyrene, dibromostyrene, divinyl and vinyl compounds such as benzene and 3,9-divinyl spirobi (m-dioxane), and the usable compounds are not limited to these exemplary compounds. You may use these olefin compounds individually or in mixture of 2 or more types.

본 발명의 광학재료용 조성물은 필요에 따라 자외선 흡수제를 더 포함할 수 있다. 자외선 흡수제는 광학재료의 내광성 향상 및 자외선 차단을 위하여 사용되는데, 광학재료에 사용되는 공지의 자외선 흡수제가 제한 없이 사용될 수 있다. 예를 들면, 에틸-2-시아노-3,3-디페닐아크릴레이트, 2-(2'-히드록시-5-메틸페닐)-2H-벤조트리아졸; 2-(2'-히드록시-3',5'-디-t-부틸페닐)-5-클로로-2H-벤조트리아졸; 2-(2'-히드록시-3'-t-부틸-5'-메틸페닐)-5-클로로-2H-벤조트리아졸; 2-(2'-히드록시-3',5'-디-t-아밀페닐)-2H-벤조트리아졸; 2-(2'-히드록시-3',5'-디-t-부틸페닐)-2H-벤조트리아졸; 2-(2'-히드록시-5'-t-부틸페닐)-2H-벤조트리아졸; 2-(2'-히드록시-5'-t-옥틸페닐)-2H-벤조트리아졸; 2,4-디히드록시벤조페논; 2-히드록시-4-메톡시벤조페논; 2-히드록시-4-옥틸옥시벤조페논; 4-도데실옥시-2-히드록시벤조페논; 4-벤조록시-2-히드록시벤조페논; 2,2',4,4'-테트라히드록시벤조페논; 2,2'-디히드록시-4,4'-디메톡시벤조페논 등이 단독으로 또는 2종 이상 혼합 사용될 수 있다. The composition for an optical material of the present invention may further include an ultraviolet absorber, if necessary. The ultraviolet absorber is used for improving the light resistance of the optical material and blocking ultraviolet rays, and a known ultraviolet absorber used for the optical material may be used without limitation. For example, ethyl-2-cyano-3,3-diphenylacrylate, 2-(2'-hydroxy-5-methylphenyl)-2H-benzotriazole; 2-(2'-hydroxy-3',5'-di-t-butylphenyl)-5-chloro-2H-benzotriazole; 2-(2′-hydroxy-3′-t-butyl-5′-methylphenyl)-5-chloro-2H-benzotriazole; 2-(2'-hydroxy-3',5'-di-t-amylphenyl)-2H-benzotriazole; 2-(2'-hydroxy-3',5'-di-t-butylphenyl)-2H-benzotriazole; 2-(2'-hydroxy-5'-t-butylphenyl)-2H-benzotriazole; 2-(2'-hydroxy-5'-t-octylphenyl)-2H-benzotriazole; 2,4-dihydroxybenzophenone; 2-hydroxy-4-methoxybenzophenone; 2-hydroxy-4-octyloxybenzophenone; 4-dodecyloxy-2-hydroxybenzophenone; 4-benzooxy-2-hydroxybenzophenone; 2,2',4,4'-tetrahydroxybenzophenone; 2,2'-dihydroxy-4,4'-dimethoxybenzophenone and the like may be used alone or in combination of two or more.

바람직하게는, 400㎚ 이하의 파장역에서 양호한 자외선 흡수능을 가지고, 본 발명의 조성물에 양호한 용해성을 갖는, 2-(2'-히드록시-3'-t-부틸-5'-메틸페닐)-5-클로로-2H-벤조트리아졸과 2-(2'-히드록시-5'-t-옥틸페닐)-2H-벤조트리아졸 등을 사용할 수 있다. 이와 같은 자외선 흡수제는 광학재료용 조성물 100g에 대해 0.6g 이상으로 사용될 때 400nm 이상의 차단이 가능하다. Preferably, 2-(2'-hydroxy-3'-t-butyl-5'-methylphenyl)-5 which has good ultraviolet absorption ability in the wavelength range of 400 nm or less and has good solubility in the composition of this invention -Chloro-2H-benzotriazole, 2-(2'-hydroxy-5'-t-octylphenyl)-2H-benzotriazole, etc. can be used. Such a UV absorber can block 400 nm or more when used in an amount of 0.6 g or more with respect to 100 g of the composition for optical materials.

본 발명의 광학재료용 조성물은 이밖에도 필요에 따라 쇄연장제, 가교제, 광안정제, 산화방지제, 착색 방지제, 유기염료, 충전제, 밀착성 향상제 등의 여러 가지의 첨가제를 더 포함할 수 있다. In addition, the composition for an optical material of the present invention may further include various additives such as a chain extender, a crosslinking agent, a light stabilizer, an antioxidant, a color inhibitor, an organic dye, a filler, and an adhesion improver, if necessary.

위와 같이 조성된 본 발명의 광학재료용 조성물은, 중합 후 고상굴절율(Ne)이 황을 포함하지 않을 경우 1.67~1.70, 황을 포함할 경우 1.71~1.77 이다. The composition for an optical material of the present invention composed as described above, after polymerization, has a solid-state refractive index (Ne) of 1.67 to 1.70 when sulfur is not included, and 1.71 to 1.77 when sulfur is included.

에피설파이드계episulfide 고굴절high refractive index 광학재료의 제조 Manufacturing of optical materials

본 발명의 에피설파이드계 고굴절 광학재료의 제조방법은, The method for producing an episulfide-based high refractive optical material of the present invention,

상기와 같은 방법으로 상기 화학식 1로 표시되는 광학재료용 에피설파이드 화합물을 제조하는 단계;preparing an episulfide compound for an optical material represented by Formula 1 in the same manner as described above;

상기 에피설파이드 화합물과 중합촉매를 포함하는 광학재료용 조성물을 제조하는 단계; 및preparing a composition for an optical material comprising the episulfide compound and a polymerization catalyst; and

상기 광학재료용 조성물을 중합시키는 단계를 포함한다. and polymerizing the composition for an optical material.

즉, 상기와 같이 준비된 광학재료용 조성물을 중합시킴으로써 에피설파이드계 고굴절 광학재료를 얻을 수 있다. 좀 더 자세히 설명하면 다음과 같다. 먼저, 개스켓 또는 테이프 등으로 유지된 성형 몰드 사이에, 본 발명의 중합성 조성물을 주입한다. 이때, 얻어지는 광학재료에 요구되는 물성에 따라, 또 필요에 따라, 감압 하에서의 탈포처리나 가압, 감압 등의 여과처리 등을 실시하는 것이 바람직한 경우가 많다. 중합조건은, 중합성 조성물, 촉매의 종류와 사용량, 몰드의 형상 등에 의해서 크게 조건이 달라지기 때문에 한정되는 것은 아니지만, 약 -50~130℃의 온도에서 1~50시간에 걸쳐 실시된다. 경우에 따라서는, 10~130℃의 온도범위에서 유지 또는 서서히 승온하여, 1~48 시간에서 경화시키는 것이 바람직하다.That is, by polymerizing the composition for an optical material prepared as described above, an episulfide-based high refractive optical material can be obtained. A more detailed description is as follows. First, the polymerizable composition of the present invention is injected between the molding molds held by gaskets or tapes. At this time, in many cases, it is preferable to perform a degassing treatment under reduced pressure or a filtration treatment such as pressurization or reduced pressure depending on the physical properties required for the obtained optical material and if necessary. The polymerization conditions are not limited because conditions vary greatly depending on the polymerizable composition, the type and amount of catalyst used, the shape of the mold, and the like, but it is carried out at a temperature of about -50 to 130° C. for 1 to 50 hours. In some cases, it is preferable to maintain or gradually increase the temperature in a temperature range of 10 to 130° C. and harden in 1 to 48 hours.

경화로 얻어진 에피설파이드화합물계 광학재료는, 필요에 따라, 어닐링 등의 처리를 실시해도 좋다. 처리 온도는 통상 50~130℃의 사이에서 행해지며, 90~120℃에서 실시하는 것이 바람직하다.The episulfide compound-based optical material obtained by curing may be subjected to treatment such as annealing, if necessary. The treatment temperature is usually 50 to 130°C, and preferably 90 to 120°C.

본 발명의 광학재료는, 주형 중합 시의 몰드를 바꾸는 것으로 여러 가지의 형상의 성형체로 얻을 수 있으므로, 안경 렌즈, 카메라 렌즈, 발광다이오드(LED) 등의 각종 광학재료로 사용하는 것이 가능하다. 특히, 안경 렌즈, 카메라 렌즈, 발광다이오드 등의 광학재료, 광학소자로서 적합하다.Since the optical material of the present invention can be obtained as a molded article having various shapes by changing the mold during casting polymerization, it can be used as various optical materials such as spectacle lenses, camera lenses, and light emitting diodes (LEDs). In particular, it is suitable as an optical material and an optical element, such as a spectacle lens, a camera lens, and a light emitting diode.

본 발명에 따라 얻어진 에피설파이드계 고굴절 광학재료는 하드 접착성이 뛰어나 프라이머 없이도 하드 코팅이 가능하고, 코팅이 매우 용이하며, 코팅의 안정성 또한 매우 우수하다. 본 발명에 따라 얻어진 플라스틱 광학렌즈는 이밖에도 필요에 따라, 단면 또는 양면에 다양한 코팅층을 형성하여 사용할 수 있다. 코팅층으로서는, 프라이머층, 하드코팅층, 반사방지막층, 방담코트막층, 방오염층, 발수층 등이 모두 가능하며, 이들 코팅층은 각각 단독으로 사용하는 것도 복수의 코팅층을 다층화하여 사용해도 좋다. 또한, 양면에 코팅층을 형성하는 경우, 각각의 면에 동일한 코팅층을 형성하는 것이나, 상이한 코팅층을 형성하는 것 모두 가능하다.The episulfide-based high-refractive optical material obtained according to the present invention has excellent hard adhesion and can be hard coated without a primer, can be easily coated, and has excellent coating stability. In addition, the plastic optical lens obtained according to the present invention can be used by forming various coating layers on one side or both sides, if necessary. As the coating layer, a primer layer, a hard coating layer, an anti-reflection film layer, an anti-fogging coating film layer, an anti-fouling layer, a water-repellent layer, etc. are all possible, and these coating layers may be used alone or in multiple coating layers. In addition, when the coating layer is formed on both surfaces, it is possible to form the same coating layer on each surface or to form different coating layers.

이하 구체적인 실시예를 통해 본 발명을 보다 상세히 설명한다. 그러나 이들 실시예는 오로지 본 발명을 보다 구체적으로 설명하기 위한 것으로서, 본 발명의 범위가 이들 실시예에 의해 한정되는 것은 아니다. Hereinafter, the present invention will be described in more detail through specific examples. However, these examples are only for explaining the present invention in more detail, and the scope of the present invention is not limited by these examples.

[[ 합성예Synthesis example 1] One]

비스(3-클로로-2-히드록시프로필)설파이드Bis(3-chloro-2-hydroxypropyl)sulfide (( BCPSBCPS -- 1)의1) of 합성 synthesis

12kgf/cm2 까지 사용가능한 GL 반응기에 에피클로로히드린 (11126g, 120.25 mol) 및 메탄올 (5000g)을 첨가하고 반응온도를 6℃에 맞추고 반응온도가 6℃에 도달했을 때 가성소다 (50% (aq), 10g, 0.125 mol)를 첨가하였다. 또 다른 10kgf/cm2 까지 사용가능한 반응기에 NaSH.xH2O (70% NaSH, 7320g, 91.50 mol), 메탄올(4000g) 및 물(2000g)을 첨가하고 교반하여 완전히 녹이고, 35.5% 진한염산 (9447g, 92.00 mol)을 천천히 적가하여 발생한 황화수소 가스를 그대로 에피클로로히드린 용액에 첨가하여 비스((3-클로로-2-히드록시프로필)설파이드를 얻었다. 황화수소 가스반응기는 내부온도 8.2℃와 내부압력 0.03kgf/cm2 을 유지하면서 반응시켰고, 에피클로로히드린과 황화수소가 반응하는 반응기는 내부온도 8.0℃와 내부압력 0.02kgf/cm2를 유지하면서 반응시켰다. 반응종결은 최종생성물을 GC 분석하여 에피클로로히드린과 3-클로로-2-히드록시-프로판-1-티올 화합물이 완전히 없어지고 비스(3-클로로-2-히드로시프로필)설파이드가 생성되는 시점을 반응종결로 하였다. 3-클로로-2-히드록시-프로판-티올이 존재하면 GC 분석의 상대적인 적분비를 함량으로 계산하여 에피클로로히드린을 더 첨가하여 비스(3-클로로-2-히드록시프로필)설파이드(BCPS-1)를 합성하였다.Epichlorohydrin (11126 g, 120.25 mol) and methanol (5000 g) were added to a GL reactor that can be used up to 12 kgf/cm 2 , and the reaction temperature was adjusted to 6 ° C. When the reaction temperature reached 6 ° C, caustic soda (50% ( aq), 10 g, 0.125 mol) was added. In another reactor usable up to 10 kgf/cm 2 NaSH.xH 2 O (70% NaSH, 7320 g, 91.50 mol), methanol (4000 g) and water (2000 g) were added and stirred to dissolve completely, and 35.5% concentrated hydrochloric acid (9447 g) , 92.00 mol) was slowly added dropwise, and the generated hydrogen sulfide gas was directly added to the epichlorohydrin solution to obtain bis((3-chloro-2-hydroxypropyl)sulfide. The hydrogen sulfide gas reactor had an internal temperature of 8.2 ° C and an internal pressure of 0.03. kgf/cm 2 was reacted while maintaining, and the reactor in which epichlorohydrin and hydrogen sulfide reacted was reacted while maintaining an internal temperature of 8.0 °C and an internal pressure of 0.02 kgf/cm 2 . The completion of the reaction is the point at which epichlorohydrin and 3-chloro-2-hydroxy-propane-1-thiol compounds are completely eliminated by GC analysis of the final product, and bis(3-chloro-2-hydrocypropyl)sulfide is produced. was set to end the reaction. If 3-chloro-2-hydroxy-propane-thiol is present, bis(3-chloro-2-hydroxypropyl)sulfide ( BCPS- 1 ) was synthesized.

[[ 합성예Synthesis example 2] ~ [ 2] to [ 합성예Synthesis example 10] 10]

비스(3-클로로-2-히드록시프로필)설파이드Bis(3-chloro-2-hydroxypropyl)sulfide ( ( BCPSBCPS -2 ~ -2 ~ BCPSBCPS -- 10)의10) of 합성 synthesis

합성예 1과 같은 방법으로 표 1에 기재된 압력 및 조건에 따라 BCPS -2 ~ BCPS -10의 화합물을 제조하였다. In the same manner as in Synthesis Example 1 , compounds of BCPS -2 to BCPS -10 were prepared according to the pressures and conditions described in Table 1.

[[ 비교합성예Comparative Synthesis Example 1] One]

비스(3-클로로-2-히드록시프로필)설파이드Bis(3-chloro-2-hydroxypropyl)sulfide (( BCPSBCPS -- 11)의11) of 합성 synthesis

12kgf/cm2 까지 사용가능한 GL 반응기에 에피클로로히드린 (11126g, 120.25 mol) 및 메탄올 (5000g)을 첨가하고 반응온도를 6℃에 맞추고 반응온도가 6℃에 도달했을 때 가성소다 (50% (aq), 10g, 0.125 mol)를 첨가하였다. 또 다른 10kgf/cm2 까지 사용가능한 반응기에 NaSH.xH2O (70% NaSH, 7320g, 91.50 mol), 메탄올(4000g) 및 물(2000g)을 첨가하고 교반하여 완전히 녹이고, 35.5% 진한염산 (9447g, 92.00 mol)을 천천히 적가하여 발생한 황화수소 가스를 에피클로로히드린 용액에 첨가하여 비스((3-클로로-2-히드록시프로필)설파이드를 얻었다. 황화수소 가스반응기는 내부온도 10.0℃와 내부압력 0.00kgf/cm2을 유지하면서 반응시켰고, 에피클로로히드린과 황화수소가 반응하는 반응기는 내부온도 10.0℃와 내부압력 0.00kgf/cm2를 유지하면서 반응시켰다. 반응종결은 최종생성물을 GC 분석하여 에피클로로히드린과 3-클로로-2-히드록시-프로판-1-티올 화합물이 완전히 없어지고 비스(3-클로로-2-히드로시프로필)설파이드가 생성되는 시점을 반응종결로 하였다. 3-클로로-2-히드록시-프로판-티올이 존재하면 GC 분석의 상대적인 적분비를 함량으로 계산하여 에피클로로히드린을 더 첨가하여 비스(3-클로로-2-히드록시프로필)설파이드(BCPS - 11)를 합성하였다.Epichlorohydrin (11126 g, 120.25 mol) and methanol (5000 g) were added to a GL reactor that can be used up to 12 kgf/cm 2 , and the reaction temperature was adjusted to 6 ° C. When the reaction temperature reached 6 ° C, caustic soda (50% ( aq), 10 g, 0.125 mol) was added. In another reactor usable up to 10 kgf/cm 2 NaSH.xH 2 O (70% NaSH, 7320 g, 91.50 mol), methanol (4000 g) and water (2000 g) were added and stirred to dissolve completely, and 35.5% concentrated hydrochloric acid (9447 g) , 92.00 mol) was slowly added dropwise, and hydrogen sulfide gas generated was added to the epichlorohydrin solution to obtain bis((3-chloro-2-hydroxypropyl)sulfide. The hydrogen sulfide gas reactor had an internal temperature of 10.0°C and an internal pressure of 0.00kgf. The reaction was carried out while maintaining /cm 2 , and the reactor in which epichlorohydrin and hydrogen sulfide reacted was reacted while maintaining an internal temperature of 10.0° C. and an internal pressure of 0.00 kgf/cm 2. The completion of the reaction was completed by GC analysis of the final product to be epichlorohydrin. The reaction was terminated at the point when the dry and 3-chloro-2-hydroxy-propane-1-thiol compounds were completely eliminated and bis(3-chloro-2-hydrocypropyl)sulfide was produced. In the presence of hydroxy-propane-thiol, bis(3-chloro-2-hydroxypropyl)sulfide ( BCPS - 11 ) was synthesized by adding more epichlorohydrin by calculating the relative integration ratio of GC analysis as the content.

[ 비교합성예 2] ~ [ 비교합성예 5] [ Comparative Synthesis Example 2] ~ [ Comparative Synthesis Example 5]

비스(3-클로로-2-히드록시프로필)설파이드Bis(3-chloro-2-hydroxypropyl)sulfide ( ( BCPSBCPS -12 ~ -12 ~ BCPSBCPS -- 15)의15) of 합성 synthesis

합성예 1비교합성예 1 같은 방법으로 표 1에 기재된 압력 및 조건에 따라 BCPS -12 ~ BCPS -15의 화합물을 제조하였다. In the same manner as in Synthesis Example 1 and Comparative Synthesis Example 1 , compounds of BCPS- 12 to BCPS- 15 were prepared according to the pressures and conditions described in Table 1.

[[ 합성예Synthesis example 11] 11]

비스(2,3-에피티오프로필)설파이드(BEPS-1)의of bis (2,3-epithiopropyl) sulfide (BEPS-1) 합성 synthesis

10리터의 반응용기에 BCPS -1 (1070.48g, 4.88 mol), 톨루엔 1300g, 메탄올 800g을 넣고 교반하면서 외부반응온도를 30℃에 맞추었다. 25℃에 도달했을 때 NaOH(50% (aq), 783.08g, 9.78 mol)를 천천히 적가하고 적가 시 반응온도는 25~30℃를 유지하면서 반응시켰다. 적가는 1시간 이내로 하였으며, 숙성은 37℃에서 30분 동안 하였고, 숙성이 끝나면 톨루엔 2000g을 첨가하여 약 10분 동안 교반하고 층분리하여 물층은 제거하고, 상층액인 유기용액은 물로 2회 세척하고 물을 최대한 제거하고 얻은 용액에 메탄올 400g을 더 첨가하여 교반하였다. 반응온도 8℃에서 티오우레아(1117.65g, 14.68 mol) 및 무수초산(70g)을 첨가하고, 반응온도 18℃에서 18시간 동안 반응시켰다. 반응의 종결은 HPLC로 확인하여 출발물질이 거의 사라지고, 2,3-에폭시프로필(2,3-에피티오프로필)설파이드 화합물이 GC 분석에서 적분의 함량이 8.6% 존재할 때 반응을 종결하고 교반을 정지하였다. 층분리에서 얻은 유기층은 물로 5회 세척하고, 감압 하에서 유기용매를 제거하여 비스(2,3-에피티오프로필)설파이드 화합물 BEPS -1을 얻었다. BCPS- 1 (1070.48 g, 4.88 mol), 1300 g toluene, and 800 g of methanol were put in a 10 liter reaction vessel, and the external reaction temperature was adjusted to 30 °C while stirring. When it reached 25°C, NaOH (50% (aq), 783.08 g, 9.78 mol) was slowly added dropwise, and the reaction temperature was maintained at 25-30°C during the reaction. The dropwise addition was carried out within 1 hour, and the aging was carried out at 37° C. for 30 minutes. When the aging was completed, 2000 g of toluene was added, stirred for about 10 minutes, the layers were separated, the water layer was removed, and the organic solution as the supernatant was washed twice with water. Water was removed as much as possible, and 400 g of methanol was further added to the obtained solution and stirred. Thiourea (1117.65 g, 14.68 mol) and acetic anhydride (70 g) were added at a reaction temperature of 8° C., and the reaction was conducted at a reaction temperature of 18° C. for 18 hours. The completion of the reaction was confirmed by HPLC, and the starting material almost disappeared, and the reaction was terminated and stirring was stopped when the 2,3-epoxypropyl (2,3-epithiopropyl) sulfide compound had an integral content of 8.6% in GC analysis. did. The organic layer obtained in the layer separation was washed with water 5 times, and the organic solvent was removed under reduced pressure to obtain a bis(2,3-epithiopropyl)sulfide compound BEPS- 1.

[[ 합성예Synthesis example 12] ~ [ 12] to [ 합성예Synthesis example 20] 20]

비스(2,3-에피티오프로필)설파이드Bis(2,3-epithiopropyl)sulfide ( ( BEPSBEPS -2 ~ -2 ~ BEPSBEPS -- 10)의10) of 합성 synthesis

합성예 1과 같은 방법으로 표 2에 기재된 출발물질 BCPS -2 ~ BCPS -10을 이용하여 에피설파이드 화합물 BEPS -2 ~ BEPS -10을 제조하였다.Episulfide compounds BEPS- 2 to BEPS- 10 were prepared using the starting materials BCPS- 2 to BCPS- 10 shown in Table 2 in the same manner as in Synthesis Example 1.

[[ 비교합성예Comparative Synthesis Example 6] 6]

비스(2,3-에피티오프로필)설파이드(BEPS-11)의of bis(2,3-epithiopropyl)sulfide (BEPS-11) 합성 synthesis

10리터의 반응용기에 BCPS -11 (1070.48g, 4.88 mol), 톨루엔 1300g, 메탄올 800g을 넣고 교반하면서 반응온도를 30℃에 맞추었다. 25℃에 도달했을 때 NaOH(50% (aq), 783.08g, 9.78 mol)를 천천히 적가하고 적가 시 반응온도는 35~37℃를 유지하면서 반응시켰다. 적가는 1시간 이내로 하였으며, 숙성은 37℃에서 30분 동안 하였고, 숙성이 끝나면 톨루엔 2000g을 첨가하여 약 10분 동안 교반하고 층분리하여 물층은 제거하고, 상층액인 유기용액은 물로 2회 세척하고 물을 최대한 제거하고 얻은 용액에 메탄올 400g을 더 첨가하여 교반하였다. 반응온도 8℃에서 티오우레아(1117.65g, 14.68 mol) 및 무수초산(70g)을 첨가하고, 반응온도 18℃에서 18시간 동안 반응시켰다. 반응의 종결은 HPLC로 확인하여 출발물질이 거의 사라지고, 2,3-에폭시프로필(2,3-에피티오프로필)설파이드 화합물이 GC 분석에서 적분의 함량이 9% 존재할 때 반응을 종결하고 교반을 정지하였다. 층분리에서 얻은 유기층은 물로 5회 세척하고, 감압 하에서 유기용매를 제거하여 비스(2,3-에피티오프로필)설파이드 화합물 BEPS -11을 얻었다. BCPS- 11 (1070.48g, 4.88 mol), 1300g toluene, and 800g methanol were put in a 10 liter reaction vessel, and the reaction temperature was adjusted to 30°C while stirring. When it reached 25°C, NaOH (50% (aq), 783.08 g, 9.78 mol) was slowly added dropwise, and the reaction temperature was maintained at 35-37°C during the reaction. The dropwise addition was carried out within 1 hour, and the aging was carried out at 37° C. for 30 minutes. When the aging was completed, 2000 g of toluene was added, stirred for about 10 minutes, the layers were separated, the water layer was removed, and the organic solution as the supernatant was washed twice with water. Water was removed as much as possible, and 400 g of methanol was further added to the obtained solution and stirred. Thiourea (1117.65 g, 14.68 mol) and acetic anhydride (70 g) were added at a reaction temperature of 8° C., and the reaction was conducted at a reaction temperature of 18° C. for 18 hours. The completion of the reaction was confirmed by HPLC, and when the starting material almost disappeared, the 2,3-epoxypropyl (2,3-epithiopropyl) sulfide compound had an integral content of 9% in the GC analysis, the reaction was terminated and the stirring was stopped. did. The organic layer obtained in the layer separation was washed with water 5 times, and the organic solvent was removed under reduced pressure to obtain a bis(2,3-epithiopropyl)sulfide compound BEPS- 11.

[[ 비교합성예Comparative Synthesis Example 7] ~ [ 7] to [ 비교합성예Comparative Synthesis Example 10] 10]

비스(2,3-에피티오프로필)설파이드Bis(2,3-epithiopropyl)sulfide ( ( BEPSBEPS -12 ~ -12 ~ BEPSBEPS -- 15)의15) of 합성 synthesis

합성예 11비교합성예 6과 같은 방법으로 표 2에 기재된 출발물질 BCPS -12 ~ BCPS - 15을 이용하여 각각의 에피설파이드 화합물인 BEPS -12 ~ BEPS - 15을 제조하였다. In the same manner as in Synthesis Example 11 and Comparative Synthesis Example 6 , starting materials BCPS- 12 to BCPS - 15 described in Table 2 were used. Each of the episulfide compounds BEPS- 12 to BEPS - 15 were prepared.

실시예Example 1 One

티오에폭시 화합물로 비스(2,3-에피티오프로필)설파이드 (BEPS -1) 89g, 이소시아네이트화합물로서 이소포론디이소시아네이트 5g, 티올화합물로서 비스(2-메르캅토에틸)설파이드 6g, 내부이형제로 인산에스테르인 8-PENPP [폴리옥시에티렌노닐페놀에테르포스페이트(에틸렌옥사이드 9몰 부가된 것 3중량%, 8몰 부가된 것 80중량%, 9몰 부가된 것 5중량%, 7몰 부가된 것 6중량%, 6몰 부가된 것 6중량%)] 0.15g, 테트라부틸포스포늄브로마이드 0.2g, 트리페닐포스핀 0.1g, 유기염료 HTAQ(20ppm) 및 PRD(10ppm), 자외선 흡수제 2-(2'-히드록시-5'-t-옥틸페닐)-2H-벤조트리아졸 1.5g을 20℃에서 혼합하여, 균일용액으로 했다. 이 혼합용액을 400Pa에서 1시간 탈포를 실시했다. 그 후, 1μm PTFE 필터로 여과를 실시하고, 유리 몰드와 테이프로 이뤄진 몰드형에 주입하였다. 이 몰드형을 중합 오븐에 투입하고, 25℃~130℃까지 21시간에 걸쳐 서서히 승온하여 중합하였다. 중합 종료 후, 오븐으로부터 몰드형을 꺼내고, 탈형시켜 광학렌즈를 얻었다. 몰드형으로부터의 이형성은 양호하였다. 얻어진 광학렌즈를 100℃에서 4시간 더 어닐링처리 실시했다. 얻어진 광학렌즈의 물성은 굴절률(nE) 1.699, 아베수 35이었다. 몰드형에 주입 전 용해된 상태를 육안으로 관찰하였고, 탈형 후 물성 및 불량 여부를 확인한 결과 이상이 없었고, 뿌연이는 보이지 않았으며, 안정한 품질의 렌즈가 얻어졌다.Bis(2,3-epithiopropyl)sulfide ( BEPS- 1 ) 89g as thioepoxy compound, isophorone diisocyanate 5g as isocyanate compound, bis(2-mercaptoethyl)sulfide 6g as thiol compound, phosphate ester as internal mold release agent Phosphorus 8-PENPP [polyoxyethylene nonylphenol ether phosphate (3 wt% of ethylene oxide added by 9 moles, 80 wt% of 8 moles added, 5 wt% of 9 moles added, 6 wt% of 7 moles added) %, 6% by weight of 6 mol added)] 0.15 g, tetrabutylphosphonium bromide 0.2g, triphenylphosphine 0.1g, organic dye HTAQ (20ppm) and PRD (10ppm), UV absorber 2-(2'- 1.5 g of hydroxy-5'-t-octylphenyl)-2H-benzotriazole was mixed at 20 degreeC, and it was set as the homogeneous solution. This mixed solution was defoamed at 400 Pa for 1 hour. After that, it was filtered with a 1 μm PTFE filter, and injected into a mold made of a glass mold and a tape. This mold was put into a polymerization oven, and the temperature was gradually increased from 25°C to 130°C over 21 hours for polymerization. After completion of polymerization, the mold was taken out of the oven and demolded to obtain an optical lens. The releasability from the mold was good. The obtained optical lens was further annealed at 100°C for 4 hours. The obtained optical lens had a refractive index (nE) of 1.699 and an Abbe's number of 35. The melted state before injection into the mold was visually observed, and after demolding, physical properties and defects were checked.

물성 실험방법Physical property test method

실시예에서 제조된 광학렌즈의 물성을 아래의 실험방법으로 측정하여 그 결과를 표 2에 기재하였다.The physical properties of the optical lenses prepared in Examples were measured by the following experimental method, and the results are shown in Table 2 .

1) 굴절률 및 아베수: Atago 사의 DR-M4 모델인 아베 굴절계를 사용하여 측정하였다.1) Refractive index and Abbe's number: It was measured using an Abbe refractometer, a DR-M4 model of Atago Corporation.

2) 투명성: 100매의 렌즈를 USHIO USH-10D인 수은 아크램프(Mercury Arc Lamp) 아래 육안으로 관찰하여, 렌즈의 탁함이 발견되지 않으면 "◎"로 표시하고, 1~2개 발견되면 "○"로 표시하고, 3개 이상 발견되면 "×"로 표시하였다. 2) Transparency: Visually observe 100 lenses under a USHIO USH-10D Mercury Arc Lamp. If no lens turbidity is found, “◎” is indicated, and if 1 or 2 lenses are found, “○” ", and if three or more were found, it was marked with "x".

실시예Example 2-10 2-10

실시예 1과 같은 방법으로 표 2에 기재된 조성으로 광학렌즈를 제조하였다. An optical lens was manufactured with the composition shown in Table 2 in the same manner as in Example 1.

비교예comparative example 1 One

티오에폭시 화합물로 비스(2,3-에피티오프로필)설파이드 (BEPS -11) 89g, 이소시아네이트화합물로서 이소포론디이소시아네이트 5g, 티올화합물로서 비스(2-메르캅토에틸)설파이드 6g, 내부이형제로 인산에스테르인 8-PENPP [폴리옥시에티렌노닐페놀에테르포스페이트(에틸렌옥사이드 9몰 부가된 것 3중량%, 8몰 부가된 것 80중량%, 9몰 부가된 것 5중량%, 7몰 부가된 것 6중량%, 6몰 부가된 것 6중량%)] 0.15g, 테트라부틸포스포늄브로마이드 0.2g, 트리페닐포스핀 0.1g, 유기염료 HTAQ(20ppm) 및 PRD(10ppm), 자외선 흡수제 2-(2'-히드록시-5'-t-옥틸페닐)-2H-벤조트리아졸 1.5g을 20℃에서 혼합하여, 균일용액으로 했다. 이 혼합용액을 400Pa에서 1시간 탈포를 실시했다. 그 후, 1μm PTFE 필터로 여과를 실시하고, 유리 몰드와 테이프로 이뤄진 몰드형에 주입하였다. 이 몰드형을 중합 오븐에 투입하고, 25℃~130℃까지 21시간에 걸쳐 서서히 승온하여 중합하였다. 중합 종료 후, 오븐으로부터 몰드형을 꺼내고, 몰드형으로부터의 이형성은 양호하였다. 얻어진 렌즈를 100℃에서 4시간 더 어닐링처리 실시했다. 얻어진 렌즈의 물성은 굴절률(nE) 1.699, 아베수 35이었다. 그 물성의 결과는 표 2에 나타내었다.Bis(2,3-epithiopropyl)sulfide ( BEPS- 11 ) 89g as thioepoxy compound, isophorone diisocyanate 5g as isocyanate compound, bis(2-mercaptoethyl)sulfide 6g as thiol compound, phosphoric acid ester as internal mold release agent Phosphorus 8-PENPP [polyoxyethylene nonylphenol ether phosphate (3 wt% of ethylene oxide added by 9 moles, 80 wt% of 8 moles added, 5 wt% of 9 moles added, 6 wt% of 7 moles added) %, 6% by weight of 6 mol added)] 0.15 g, tetrabutylphosphonium bromide 0.2g, triphenylphosphine 0.1g, organic dye HTAQ (20ppm) and PRD (10ppm), UV absorber 2-(2'- 1.5 g of hydroxy-5'-t-octylphenyl)-2H-benzotriazole was mixed at 20 degreeC, and it was set as the homogeneous solution. This mixed solution was defoamed at 400 Pa for 1 hour. After that, it was filtered with a 1 μm PTFE filter, and injected into a mold made of a glass mold and a tape. This mold was put into a polymerization oven, and the temperature was gradually increased from 25°C to 130°C over 21 hours for polymerization. After the polymerization was completed, the mold was taken out of the oven, and the releasability from the mold was good. The obtained lens was further annealed at 100 degreeC for 4 hours. The physical properties of the obtained lens were a refractive index (nE) of 1.699 and an Abbe's number of 35. The results of the physical properties are shown in Table 2 .

비교예comparative example 2-5 2-5

비교예 1 같은 방법으로 표 2에 기재된 각각의 에피설파이드 화합물인 BEPS -12 ~ BEPS - 15을 달리하여 광학렌즈를 제조하고 그 결과를 표 2에 나타내었다. Comparative Example 1 In the same manner, each of the episulfide compounds BEPS- 12 to BEPS - 15 described in Table 2 was used to prepare an optical lens, and the results are shown in Table 2.

황화수소 발생 반응기 Hydrogen Sulfide Generation Reactor
(반응식 1)(Scheme 1)
황화수소와 에피클로로 히드린 반응기 (반응식 2)Hydrogen sulfide and epichlorohydrin reactor (Scheme 2) 생성물product
내부온도(℃)Internal temperature (℃) 압력 (kgf/cmpressure (kgf/cm 22 )) 내부온도(℃)Internal temperature (℃) 압력 (kgf/cmpressure (kgf/cm 22 )) 합성예 1Synthesis Example 1 8.28.2 0.030.03 8.08.0 0.020.02 BCPS-1BCPS-1 합성예 2Synthesis Example 2 9.29.2 0.200.20 10.010.0 0.150.15 BCPS-2BCPS-2 합성예 3Synthesis Example 3 10.010.0 0.400.40 6.56.5 0.350.35 BCPS-3BCPS-3 합성예 4Synthesis Example 4 12.012.0 2.902.90 10.210.2 2.702.70 BCPS-4BCPS-4 합성예 5Synthesis Example 5 12.012.0 0.850.85 7.67.6 0.770.77 BCPS-5BCPS-5 합성예 6Synthesis Example 6 15.015.0 0.480.48 10.010.0 0.430.43 BCPS-6BCPS-6 합성예 7Synthesis Example 7 19.019.0 0.920.92 13.013.0 0.840.84 BCPS-7BCPS-7 합성예 8Synthesis Example 8 22.122.1 0.730.73 15.015.0 0.620.62 BCPS-8BCPS-8 합성예 9Synthesis Example 9 15.015.0 1.341.34 8.58.5 1.221.22 BCPS-9BCPS-9 합성예 10Synthesis Example 10 18.118.1 2.332.33 18.018.0 2.252.25 BCPS-10BCPS-10 비교합성예 1Comparative Synthesis Example 1 10.010.0 0.000.00 10.010.0 0.000.00 BCPS-11BCPS-11 비교합성예 2Comparative Synthesis Example 2 25.025.0 0.000.00 13.013.0 0.000.00 BCPS-12BCPS-12 비교합성예 3Comparative Synthesis Example 3 10.010.0 11.011.0 10.010.0 10.510.5 BCPS-13BCPS-13 비교합성예 4Comparative Synthesis Example 4 51.051.0 0.800.80 32.032.0 0.600.60 BCPS-14BCPS-14 비교합성예 5Comparative Synthesis Example 5 0.70.7 3.403.40 0.50.5 3.203.20 BCPSBCPS -15-15

출발물질, Astarting material, A 에피설파이드episulfide 화합물, B compound, B 투명성Transparency 실시예Example 1 One BCPS-1BCPS-1 합성예1Synthesis Example 1 BEPS-1BEPS-1 실시예Example 2 2 BCPS-2BCPS-2 합성예2Synthesis Example 2 BEPS-2BEPS-2 실시예Example 3 3 BCPS-3BCPS-3 합성예3Synthesis Example 3 BEPS-3BEPS-3 실시예Example 4 4 BCPS-4BCPS-4 합성예4Synthesis Example 4 BEPS-4BEPS-4 실시예Example 5 5 BCPS-5BCPS-5 합성예5Synthesis Example 5 BEPS-5BEPS-5 실시예Example 6 6 BCPS-6BCPS-6 합성예6Synthesis Example 6 BEPS-6BEPS-6 실시예Example 7 7 BCPS-7BCPS-7 합성예7Synthesis Example 7 BEPS-7BEPS-7 실시예Example 8 8 BCPS-8BCPS-8 합성예8Synthesis Example 8 BEPS-8BEPS-8 실시예Example 9 9 BCPS-9BCPS-9 합성예9Synthesis Example 9 BEPS-9BEPS-9 실시예Example 10 10 BCPS-10BCPS-10 합성예10Synthesis Example 10 BEPS-10BEPS-10 비교예comparative example 1 One BCPS-11BCPS-11 비교합성예1Comparative Synthesis Example 1 BEPS-11BEPS-11 ×× 비교예comparative example 2 2 BCPS-12BCPS-12 비교합성예2Comparative Synthesis Example 2 BEPS-12BEPS-12 ×× 비교예comparative example 3 3 BCPS-13BCPS-13 비교합성예3Comparative Synthesis Example 3 BEPS-13BEPS-13 ×× 비교예comparative example 4 4 BCPS-14BCPS-14 비교합성예4Comparative Synthesis Example 4 BEPS-14BEPS-14 ×× 비교예comparative example 5 5 BCPS-15BCPS-15 비교합성예5Comparative Synthesis Example 5 BEPS-15BEPS-15 ××

<약어><abbreviation>

A: 비스(3-클로로-히드록시포로필)설파이드A: bis(3-chloro-hydroxyphorophyl)sulfide

B: 2,3-에폭시프로필(2,3-에피티오프로필)설파이드 화합물이 8.5%가 포함한 비스(2,3-에피티오프로필)설파이드 화합물B: Bis (2,3-epithiopropyl) sulfide compound containing 8.5% of 2,3-epoxypropyl (2,3-epithiopropyl) sulfide compound

본 발명의 광학재료용 에피설파이드 화합물의 제조방법은, 간단한 방법으로 반응 진행을 정밀하게 제어하여 고순도의 에피설파이드 화합물을 생산할 수 있으므로, 기존의 제조방법을 대체하여 에피설파이드 화합물이 필요한 다양한 분야에서 이용될 수 있으며, 특히 고순도 에피설파이드 화합물이 필요한 고굴절 광학재료 분야에서 이용될 수 있다. The method for producing an episulfide compound for an optical material of the present invention can produce a high-purity episulfide compound by precisely controlling the reaction progress in a simple way, so it can be used in various fields requiring an episulfide compound by replacing the existing production method In particular, it can be used in the field of high refractive optical materials requiring a high purity episulfide compound.

본 발명에 따라 얻어진 에피설파이드계 고굴절 광학재료는 색상이 좋고 맑고 투명하므로, 교정용 선글라스용 렌즈, 패션렌즈, 변색렌즈, 카메라렌즈, 광학 장치용 렌즈 등에 유용하게 이용될 수 있다. Since the episulfide-based high refractive optical material obtained according to the present invention has a good color and is clear and transparent, it can be usefully used for corrective sunglasses, fashion lenses, color-changing lenses, camera lenses, lenses for optical devices, and the like.

Claims (7)

(a) 반응기(A)에 황화물을 넣고 상기 반응기(A)를 온도 1℃~50℃, 압력 0.001kgf/cm2~10kgf/cm2 범위로 유지하면서 산을 투입 반응시켜 황화수소 가스를 발생시키되, 상기 발생된 황화수소 가스는 전부 하기 단계의 반응기(B)로 투입되는 황화수소 가스의 발생 단계;
(b) 에피클로로 히드린를 반응기(B)에 넣고 이 반응기(B)를 온도 1℃~30℃, 압력 0.002kgf/cm2~10kgf/cm2 범위로 유지하면서 상기 단계에서 발생된 황화수소 가스를 투입시켜 아래 반응식 2와 같은 반응으로 비스((3-클로로-2-히드록시프로필)설파이드를 제조하는 단계; 및
(c) 상기 제조된 비스((3-클로로-2-히드록시프로필)설파이드를 티오우레아와 반응시켜 아래 화학식 1로 표시되는 에피설파이드 화합물을 제조하는 단계를 포함하며,
상기 산 및 상기 에피클로로 히드린의 투입량 조절로 반응 진행을 제어하는 것을 특징으로 하는, 광학재료용 에피설파이드 화합물의 제조방법.
[반응식 2]
Figure pat00006

[화학식 1]
Figure pat00007

(식 중에서 m은 0~4의 정수이며, n은 0~2의 정수이다.)
(a) into a sulphide to the reactor (A) was added sikidoe an acid reaction, while maintaining the reactor (A) to a temperature 1 ℃ ~ 50 ℃, pressure 0.001kgf / cm 2 ~ 10kgf / cm 2 range generation of hydrogen sulfide gas, All of the generated hydrogen sulfide gas is generated in the reactor (B) of the following step of generating hydrogen sulfide gas;
(b) epichlorohydrin deurinreul into a reactor (B) while maintaining the reactor (B) to a temperature 1 ℃ ~ 30 ℃, pressure 0.002kgf / cm 2 ~ 10kgf / cm 2 In the range of the hydrogen sulfide gas generated in the step to prepare bis((3-chloro-2-hydroxypropyl)sulfide by the reaction shown in Scheme 2 below; and
(c) reacting the prepared bis((3-chloro-2-hydroxypropyl)sulfide with thiourea to prepare an episulfide compound represented by Formula 1 below,
A method for producing an episulfide compound for an optical material, characterized in that the reaction progress is controlled by controlling the input amount of the acid and the epichlorohydrin.
[Scheme 2]
Figure pat00006

[Formula 1]
Figure pat00007

(In the formula, m is an integer from 0 to 4, and n is an integer from 0 to 2.)
제1항에 있어서,
상기 반응기(A)를 온도 5℃~30℃, 압력 0.02kgf/cm2~5kgf/cm2로 유지하고,
상기 반응기(B)를 압력 0.02kgf/cm2~5kgf/cm2로 유지하는 것을 특징으로 하는, 광학재료용 에피설파이드 화합물의 제조방법.
According to claim 1,
Maintaining the reactor (A) at a temperature of 5 ℃ ~ 30 ℃, a pressure of 0.02kgf / cm 2 ~ 5kgf / cm 2,
The method for producing an episulfide compound for an optical material, characterized in that the reactor (B) is maintained at a pressure of 0.02 kgf/cm 2 to 5 kgf/cm 2 .
제1항에 있어서,
상기 반응 진행 제어는,
상기 반응 조절단계는, 상기 (c) 단계의 반응 생성물을 GC 분석하여, 에피클로로히드린이 검출되면 상기 반응기(A)에 산을 추가 투입하고, 3-클로로-2-히드록시-프로판-1-티올이 검출되면 상기 반응기(B)에 에피클로로 히드린을 추가 투입하는 것을 특징으로 하는, 광학재료용 에피설파이드 화합물의 제조방법.
According to claim 1,
The reaction progress control is,
In the reaction control step, when epichlorohydrin is detected by GC analysis of the reaction product of step (c), an acid is additionally added to the reactor (A), and 3-chloro-2-hydroxy-propane-1 - A method for producing an episulfide compound for an optical material, characterized in that when thiol is detected, epichlorohydrin is additionally added to the reactor (B).
제1항 내지 제3항 중 어느 한 항의 방법으로 아래 화학식 1로 표시되는 광학재료용 에피설파이드 화합물을 제조하는 단계와;
상기 에피설파이드 화합물과 중합촉매를 포함하는 조성물을 제조하는 단계를 포함하는, 에피설파이드계 고굴절 광학재료용 조성물의 제조방법.
[화학식 1]
Figure pat00008

(식 중에서 m은 0~4의 정수이며, n은 0~2의 정수이다.)
The method of any one of claims 1 to 3, comprising the steps of: preparing an episulfide compound for an optical material represented by Formula 1 below;
A method for producing a composition for an episulfide-based high refractive optical material, comprising the step of preparing a composition comprising the episulfide compound and a polymerization catalyst.
[Formula 1]
Figure pat00008

(In the formula, m is an integer from 0 to 4, and n is an integer from 0 to 2.)
제4항에 있어서,
상기 조성물을 제조하는 단계는 상기 조성물에 황, 폴리티올 화합물, 폴리이소시아네이트 화합물 중 어느 하나 이상을 더 포함시키는 것을 특징으로 하는, 에피설파이드계 고굴절 광학재료용 조성물의 제조방법.
5. The method of claim 4,
Preparing the composition comprises sulfur, a polythiol compound, and a polyisocyanate compound in the composition, characterized in that further comprising any one or more of an episulfide-based composition for a high refractive optical material.
제1항 내지 제3항 중 어느 한 항의 방법으로 아래 화학식 1로 표시되는 광학재료용 에피설파이드 화합물을 제조하는 단계;
상기 에피설파이드 화합물과 중합촉매를 포함하는 광학재료용 조성물을 제조하는 단계; 및
상기 광학재료용 조성물을 중합시키는 단계를 포함하는, 에피설파이드계 고굴절 광학재료의 제조방법.
[화학식 1]
Figure pat00009

(식 중에서 m은 0~4의 정수이며, n은 0~2의 정수이다.)
The method of any one of claims 1 to 3, comprising: preparing an episulfide compound for an optical material represented by the following Chemical Formula 1;
preparing a composition for an optical material comprising the episulfide compound and a polymerization catalyst; and
A method of producing an episulfide-based high refractive optical material, comprising the step of polymerizing the composition for an optical material.
[Formula 1]
Figure pat00009

(In the formula, m is an integer from 0 to 4, and n is an integer from 0 to 2.)
제6항에 있어서,
상기 광학재료용 조성물을 제조하는 단계는 상기 조성물에 황, 폴리티올 화합물, 폴리이소시아네이트 화합물 중 어느 하나 이상을 더 포함시키는 것을 특징으로 하는, 에피설파이드계 고굴절 광학재료의 제조방법.
7. The method of claim 6,
Preparing the composition for an optical material is characterized in that the composition further comprises any one or more of sulfur, a polythiol compound, and a polyisocyanate compound.
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