KR20210085303A - Reaction Behavior Simulation System In Natural Gas High Pressure Pipeline - Google Patents

Abstract

According to the present invention, provided is a reaction behavior simulation system in natural gas high-pressure piping, wherein the system comprises: a reaction device in which a specimen is mounted inside and the high-pressure gas and the specimen react under a set flow rate and pressure condition; a gas injection line connected to the lower side of the reaction device to inject gas into the reaction device; a methane gas tank connected to one side of the gas injection line and connected through a methane gas supply line; a nitrogen gas tank connected to the other side of the gas injection line and connected through a nitrogen gas supply line; a process line connected to one side of the reaction device to change reaction conditions of the reaction device; an exhaust line connected to the other side of the reaction device to discharge gas in the reaction device; and a discharge line connected to the process line and equipped with a safety valve that automatically operates and discharges the gas to the outside when the pressure of the gas flowing into the process line exceeds the set pressure. In the methane gas supply line, a first pressure regulator for regulating the pressure, a first metering valve for measuring and controlling an amount of gas, and a first check valve for preventing a reverse flow are disposed. A main ball valve for controlling whether or not gas introduced into the reaction device is injected is disposed in the gas injection line. The process line includes a process line ball valve, a heater capable of adjusting the temperature of the process line, a third pressure regulator, a third metering valve, a mass flow meter, a third check valve, and a fourth pressure adjuster capable of adjusting the discharged gas pressure to which the regulator is placed.

Description

Reaction Behavior Simulation System In Natural Gas High Pressure Pipeline

The present invention relates to a system for simulating the reaction behavior in a natural gas high-pressure pipe, and more specifically, to effectively simulate the internal reaction behavior characteristics of a pipeline that may occur due to impurities in the process of transporting natural gas through a pipeline in a high-pressure state. And it's about a system that can figure it out.

Liquefied Natural Gas (LNG) imported through an LNG carrier is stored in a storage tank at an onshore base through an offloading facility, then vaporized at the vaporization facility and supplied to the governor station. In the gasification facility, in order to increase the heat exchange efficiency of natural gas and the transport density from the gasification facility to the supply management center, the gas is sent at a high pressure, for example, about 70 bar.

From the supply management office, vaporized gas is supplied to natural gas demanders such as power plants and city gas companies in each branch nationwide.

At this time, the supply management office uses a static pressure facility to depressurize the gasified gas supplied from the gasification facility to a constant pressure and supplies it to the natural gas demander.

Therefore, there is a case in which a gas pipe for transporting natural gas is coated with epoxy or the like inside the pipe to protect the gas pipe.

In order to improve the safety of the natural gas transport process, it is important to clearly understand the effect of natural gas on the coating material inside the pipeline through experiments. However, since the length of the gas pipe reaches hundreds to thousands of km, it is filled with natural gas at high pressure, and the gas flow rate and service period are long, it was difficult to reproduce it through a simulation test in a short period of time.

In addition, when simulating by simply reducing the size of the pipe, it is possible to reduce the diameter, but it is not easy to simulate by reducing the length.

Therefore, there is a need for a system capable of controlling the type and thickness of the coating material inside the pipe and securing data according to the pressure condition.

The present invention was invented to improve the above problems, and it is possible to test the reaction relationship between the coating material inside the pipe and natural gas that may occur inside the gas pipe under the actual natural gas supply operating conditions. Let's provide a reaction behavior simulation system.

In addition, it is an object of the present invention to provide a system for simulating the reaction behavior in a natural gas high-pressure pipe that can control the type and thickness of the coating material inside the pipe, and can secure data according to the pressure condition.

The technical problems of the present invention are not limited to the technical problems mentioned above, and other technical problems not mentioned will be clearly understood by those skilled in the art from the following description.

The reaction behavior simulation system in a natural gas high-pressure pipe according to the present invention for achieving the above technical problem is a reaction device in which a specimen is mounted and the high-pressure gas and the specimen react under a set flow rate and pressure condition; a gas injection line connected to the lower side of the reaction apparatus to inject gas into the reaction apparatus; a methane gas tank connected to one side of the gas injection line and connected through a methane gas supply line; a nitrogen gas tank connected to the other side of the gas injection line and connected through a nitrogen gas supply line; a process line connected to one side of the reaction apparatus to change reaction conditions of the reaction apparatus; an exhaust line connected to the other side of the reaction apparatus to discharge gas in the reaction apparatus; and a discharge line connected to the process line and provided with a safety valve that automatically operates and discharges the gas to the outside when the pressure of the gas flowing into the process line exceeds a set pressure; A first pressure regulator for regulating pressure, a first metering valve for measuring and controlling an amount of gas, and a first check valve for preventing backflow are disposed in the methane gas supply line; A main ball valve for controlling whether or not gas introduced into the reaction device is injected is disposed in the gas injection line; The process line includes a process line ball valve, a heater capable of controlling the temperature of the process line, a third pressure regulator, a third metering valve, a mass flow meter, a third check valve, and a fourth pressure capable of adjusting the discharged gas pressure It is characterized in that the regulator is disposed.

Preferably, in the nitrogen gas supply line, a second pressure regulator for regulating pressure, a second metering valve for measuring and controlling an amount of gas, and a second check valve for preventing backflow are disposed; An exhaust line ball valve for controlling whether or not the gas discharged from the reaction device is discharged is disposed in the exhaust line.

More preferably, the reaction device further comprises a pressure gauge for measuring the pressure, a pressure transmitter for monitoring the value measured by the pressure gauge, and a thermometer for measuring the temperature.

Also preferably, the process line, it characterized in that it further comprises a thermometer for measuring the temperature of the process line and a pressure transmitter capable of monitoring the pressure controlled through the third pressure regulator.

Also preferably, the reaction apparatus is provided with a specimen mounting container therein; A plurality of specimens are mounted in the specimen mounting container; the specimen is formed to be smaller than the inner diameter of the specimen mounting container; It is characterized in that a spacer is provided between the specimen and the specimen to form a space in which the gas can flow by being spaced apart by a predetermined distance.

Also preferably, one ventilation hole is formed through the specimen; mounting so that the ventilation holes can be alternately arranged on one side and the other side when a plurality of specimens are mounted in the specimen mounting container; A plurality of specimens are spaced apart from each other in the specimen mounting container, and the gas is sequentially transferred from the lower side to the upper side of the specimen along the flow path formed through the ventilation hole.

Also preferably, it is connected to the reaction device, it is possible to mount and recover the specimen, it characterized in that it further comprises a reaction device control unit capable of coating a desired material on the specimen.

Also preferably, a control system comprising a storage unit capable of accumulating and storing the test data of the reaction device, a control unit controlling each valve and each device, and a detection unit concentrating, analyzing, and detecting the reactant. characterized by including.

According to some embodiments of the technical idea of the present invention, there are at least the following effects.

First, the reaction relationship between the coating material and natural gas that can occur inside the gas pipe can be tested under actual natural gas supply operating conditions. Second, the type and thickness of the coating material inside the pipe can be controlled. It has the effect of being able to secure data according to pressure conditions.

The effect according to the present invention is not limited by the contents exemplified above, and more various effects are included in the present specification.

1 is a schematic conceptual diagram of a reaction behavior simulation system in a natural gas high-pressure pipe according to an embodiment of the present invention.
2 is a view showing the flow of the configuration and function of the reaction behavior simulation device in the natural gas high-pressure pipe according to an embodiment of the present invention.
3 is a diagram showing the configuration of a reactor according to an embodiment of the present invention.
4 is a conceptual diagram illustrating an operation configuration of a reaction device according to an embodiment of the present invention.
5 is a flowchart illustrating an operation sequence of a system for simulating the reaction behavior in a natural gas high-pressure pipe according to an embodiment of the present invention.

Advantages and features of the present invention, and a method of achieving the same, will become apparent with reference to the embodiments described below in detail in conjunction with the accompanying drawings.

However, the present invention is not limited by the embodiments disclosed below, but will be implemented in a variety of different forms, and only these embodiments allow the disclosure of the present invention to be complete, and common knowledge in the art to which the present invention pertains. It is provided to fully inform those who have the scope of the invention, and the present invention is only defined by the scope of the claims.

Accordingly, in some embodiments, well-known components, well-known operations, and well-known techniques have not been specifically described in order to avoid obscuring the present invention.

In addition, like reference numerals refer to like elements throughout the specification, and terms used (referred to) herein are for the purpose of describing the embodiments and are not intended to limit the present invention.

In addition, in the description of the present invention, if it is determined that related known technologies may obscure the gist of the present invention, detailed description thereof will be omitted.

Hereinafter, preferred embodiments according to the present invention will be described in detail with reference to the accompanying drawings.

Hereinafter, a reaction behavior simulation system in a natural gas high-pressure pipe according to an embodiment of the present invention will be described with reference to FIGS. 1 to 4 .

1 is a conceptual diagram of a system for simulating reaction behavior in a natural gas high-pressure pipe according to an embodiment of the present invention, and FIG. 2 is a flow of the configuration and function of an apparatus for simulating reaction behavior in a natural gas high-pressure pipe according to an embodiment of the present invention FIG. 3 is a diagram showing the configuration of a reactor according to an embodiment of the present invention, and FIG. 4 is a conceptual diagram showing an operating configuration of the reactor according to an embodiment of the present invention.

As shown in FIG. 1, the apparatus 200 for simulating reaction behavior in a natural gas high-pressure pipe includes a reaction apparatus 100 including a specimen mounting container in which a specimen for a high-pressure experiment is mounted, and a reaction apparatus 100, as shown in FIG. ) and a methane gas tank 110 for supplying methane gas and a nitrogen gas tank 120 connected with the reactor 100 for supplying nitrogen gas, and connected to the reactor 100 to mount a specimen And it is recoverable and includes a reaction device control unit 150 capable of coating a desired material on the specimen.

In addition, the type and thickness of the coating material to be coated on the specimen may be controlled through the reaction device controller 150 .

In addition, the reaction behavior simulation device 200 in the natural gas high-pressure pipe concentrates and analyzes the storage unit 310 that can accumulate and store data, the control unit 320 that controls each valve and each device, and the reactants, and It is connected to the control system 300 including the detection unit 330 to detect, so that the entire device can be controlled.

Referring to FIG. 2 , the reaction device 100 is connected to the methane gas tank 110 and the methane gas supply line L1 and the gas injection line L3 through the nitrogen gas tank 120 and the nitrogen gas supply line. (L2) and the gas injection line (L3) is connected through.

In the methane gas supply line (L1), a first pressure regulator 11 for regulating the pressure, a first metering valve 21 for measuring and controlling the amount of gas, and a first check valve 31 for preventing backflow are installed. can

A second pressure regulator 12 for regulating the pressure, a second metering valve 22 for measuring and controlling the amount of gas, and a second check valve 32 for preventing backflow are installed in the nitrogen gas supply line L2. can

In addition, the methane gas supply line L1 and the nitrogen gas supply line L2 are joined to the gas injection line L3, and the gas injection line L3 is a reactor inlet (not shown) at the lower end of the reactor 100 . It can be connected to and inject gas into the reactor.

The gas injection line L3 may be provided with an auxiliary ball valve 41 and a main ball valve 42 , and it is possible to control whether or not to inject the gas flowing into the reactor 100 through the ball valves 41 and 42 . can

In addition, the auxiliary ball valve 41 may be omitted, and it is possible to control whether or not the gas flowing into the reactor 100 is injected through the opening/closing operation of the main ball valve 42 .

The reactor 100 includes a pressure transmitter (PT) and a temperature that can monitor the pressure of the reactor 100 by converting the value measured by the pressure gauge (PG) and the pressure gauge (PG) into an electrical signal. It is made including a thermometer (TT) to measure.

Therefore, it is possible to check the real-time pressure and temperature of the reaction apparatus 100, and to control the reaction behavior simulating apparatus 200 in the natural gas high-pressure pipe through the control unit in real time according to the pressure and temperature of the reaction apparatus 100 indicates that

A process line L4 may be connected to one side of the reactor 100 , and an exhaust line L6 may be connected to the other side of the reactor 100 .

In the process line L4 connected to the first outlet (not shown) formed on one side of the reactor 100, a process line ball valve 44 for controlling whether or not gas flows from the reactor 100 to the process line L4 side And a heater 50 that can control the temperature of the process line (L4), a third pressure regulator 13 that can adjust the pressure of the process line (L4), and a third metering valve 23 that measures and controls the amount of gas ) and a thermometer (TT) that measures the temperature of the process line (L4), a pressure transmitter (PT) that can monitor the pressure controlled through the third pressure control (13), and is not affected by temperature or pressure A mass flow meter 60 capable of detecting the mass of a fluid passing per unit time in the process line L4 and a third check valve 33 preventing backflow may be included.

In addition, a discharge line L5 may be connected between the reaction device 100 and the process line ball valve 44 of the process line L4, and a safety valve 70 is connected to the discharge line L5, the process line It automatically operates when the pressure of the gas flowing into it exceeds a certain pressure, indicating that it can be discharged to the outside.

In addition, a gas leak alarm (not shown) and a warning light (not shown) may be included to detect a gas leak in the flow path through which the reaction device 100 and gas are transported.

In addition, an exhaust line L6 is connected to a second outlet (not shown) formed on the other side of the reactor 100 , and an exhaust line ball valve 43 may be provided in the exhaust line L6 , and the exhaust line ball Gas may be discharged from the reactor 100 to the exhaust line L6 side through the valve 43 .

In addition, the exhaust line (L6) may be combined with the process line (L4) to release gas to the outside,

The discharge line L5 is joined to the exhaust line L6 to indicate that the gas can be discharged to the outside.

In addition, the process line L4 may include a filter (not shown) that filters foreign substances in the gas generated from the reactor 100 , and the filter is disposed between the reactor 100 and the process line ball valve 44 . It is preferred, but not limited thereto.

3 and 4 , the configuration and operation of the reactor 100 are shown.

The reactor 100 may be configured in a cylindrical shape, and a specimen mounting container 101 is provided therein, and a specimen 102 formed in a disk shape may be mounted to the specimen mounting container 101, and the specimen 102 is It may be formed to be 1 mm to 3 mm smaller than the inner diameter of the specimen mounting container 101 .

In addition, the diameter of the specimen 102 may be composed of 200 mm, the thickness may be composed of 2 mm.

In addition, there is one ventilation hole 104 having a diameter of 20 mm at a position 30 mm from the outer diameter of the specimen 102 and may be formed through the specimen.

Therefore, a plurality of specimens 102 can be stacked and mounted inside the specimen mounting container 101, and a spacer (D2) is spaced apart between the specimen and the specimen to form a space through which the gas can flow. 103) is provided.

The spacer 103 may have the same outer diameter as the specimen 102, form a hollow portion, and be formed in a ring shape, and the width of the rim may be 5 mm. In addition, the thickness of the spacer 103 is preferably comprised of 3 mm to 5 mm, but is not limited thereto.

Accordingly, a predetermined distance is formed between the specimen and the specimen through the spacer 103 to form a flow path through which the gas can flow.

In addition, the ventilation holes 104 are arranged to be alternately disposed on one side and the other side, so that a plurality of specimens 102 are spaced apart, and from the lower side to the upper side of the specimen 102 along the flow path formed through the ventilation holes 104 . The gas may be sequentially transferred.

In addition, the reaction apparatus 100 may be provided with a temperature control unit 105 , and the temperature in the reaction apparatus may be adjusted through the temperature control unit 105 .

On the other hand, the specimen 102 may be mounted at a predetermined distance D1 from the lower portion of the specimen mounting container 101, and is directly sprayed on the surface of the specimen 102 to prevent the specimen 102 from being damaged. (not shown) may be installed.

In addition, the stacking of the specimen 102 is made in an effective space, and the effective space is a location space spaced apart from the lower part of the specimen mounting container 101 by a predetermined distance in order to prevent direct spraying on the surface of the specimen when high-pressure gas is injected. It refers to a space in which specimens can be stacked except for the free space at the top of the specimen mounting container 101 and the specimen mounting container 101 .

The interval spaced apart from the lower portion of the specimen mounting container 101 is preferably formed of 5 mm, but is not limited thereto.

In addition, a flange cover (not shown) is coupled to the upper portion of the reaction device 100 so as to be opened and closed, and the specimen can be stacked in the specimen mounting container 101 , and after the specimen 102 is stacked, the flange cover is closed. sealed, and the experiment can be carried out according to the experimental conditions.

In addition, it is possible to control the opening and closing operation of the flange cover through the reaction apparatus control unit 150 connected to the reaction apparatus 100, and to mount and retrieve the specimen 102 in the specimen mounting container 101 of the reaction apparatus 100, A desired material may be coated on the specimen 102 .

In addition, assembling and disassembling are possible so that substances generated in each pressure section can be checked from the reaction apparatus 100 through the reaction apparatus control unit 150 .

The reaction device 100 can be filled with high-pressure methane gas at a pressure of 70 bar, flow rate control and temperature control are possible, and the methane (CH4) gas filled with 70 bar is the third and fourth pressure regulators 13 and 14 ), it is possible to reduce the pressure in two steps to 20bar and 5bar, etc., and the temperature of the reactor can be set to be the same as the actual piping conditions at room temperature, 50℃, 100℃, etc., and can be adjusted by setting according to the desired experimental conditions.

5 is a flowchart illustrating an operation sequence of a reaction behavior simulation system in a natural gas high-pressure pipe according to an embodiment of the present invention.

The operation step of the reaction behavior simulation system in the natural gas high-pressure pipe is first, in the specimen mounting step (S100), the flange cover of the specimen mounting vessel 101 is opened through the reaction device control unit 150 to mount the specimen 102 and the flange Close the cover.

In the methane gas pressurization step ( S200 ), the temperature controller is turned on through the control system 300 to raise the temperature of the reaction device 100 , the valve of the methane gas tank is opened, and the auxiliary ball valve 41 is opened.

Then, the pressure is adjusted to the set pressure through the first pressure regulator (11). The pressure set here is preferably adjusted to 120barg → 70barg, but is not limited thereto. After the pressure (70 barg) set in the first pressure regulator 11 is adjusted, the main ball valve 42 is opened, and the first metering valve 21 is opened to gradually pressurize. When the set pressure and temperature (70barg and 20℃) are confirmed, the process line ball valve 44 is opened.

Then, the pressure is adjusted to the set pressure through the third pressure regulator (13). The pressure set here is preferably adjusted to 70barg → 20barg, but is not limited thereto.

Then, the third metering valve 23 is gradually opened.

Then, the pressure is adjusted to the set pressure through the fourth pressure regulator (14). The pressure set here is preferably adjusted to 20barg → 5barg, but is not limited thereto.

Thereafter, the first metering valve 21 is closed after a predetermined time has elapsed.

In the methane gas depressurization step ( S300 ), it is checked whether the first metering valve 21 is in the Close position, and the process line ball valve 44 is closed. Then, the exhaust line ball valve 43 is opened. Thereafter, the second metering valve 22 is opened to purify the reactor 100 with nitrogen.

In the specimen collection and re-mounting step ( S400 ), the first metering valve 21 is closed and the second metering valve 22 is closed.

At this time, the exhaust line ball valve 43 continuously maintains an open state.

It is confirmed that the pressure gauge PG and the pressure transmission gauge PT of the reactor 100 are 0 (Zero).

The specimen is retrieved by opening the flange cover of the demonstration mounting vessel 101 through the reaction device control unit 150, a new specimen is mounted, and the flange cover is closed.

Then, through the step (S500) of confirming whether the additional experiment is proceeding, the methane gas pressurization step (S200) according to the newly set value is performed when the additional experiment is performed, and when the additional experiment is not performed, it is terminated.

Although the embodiments of the present invention have been described above with reference to the accompanying drawings, the present invention is not limited to the above embodiments, but may be implemented in various different forms, and those of ordinary skill in the art to which the present invention pertains. It will be understood by those skilled in the art that the present invention may be embodied in other specific forms without changing the technical spirit or essential features of the present invention. Therefore, it should be understood that the embodiments described above are illustrative in all respects and not restrictive.

11: first pressure regulator 12: second pressure regulator
13: third pressure regulator 14: fourth pressure regulator
21: first metering valve 22: second metering valve
23: third metering valve 31: first check valve
32: second check valve 33: third check valve
41: auxiliary ball valve 42: main ball valve
43: exhaust line ball valve 44: process line ball valve
50: heater (heater) 60: mass flow meter
70: safety valve 100: reaction device
101: specimen mounting container 102: specimen
103: spacer 104: ventilation hole
105: temperature control unit 110: methane gas tank
120: nitrogen gas tank 150: reactor control unit
200: high-pressure piping simulation device 300: control system
310: storage unit 320: control unit
330: detection unit D1: first interval
D2: second gap L1: methane gas supply line
L2: nitrogen gas supply line L3: gas injection line
L4: process line L5: discharge line
L6: exhaust line PG: pressure gauge
PT: pressure transmitter TT: thermometer

Claims (8)

a reaction device in which a specimen is mounted inside and the high-pressure gas and the specimen react under the set flow rate and pressure conditions;
a gas injection line connected to the lower side of the reaction apparatus to inject gas into the reaction apparatus;
a methane gas tank connected to one side of the gas injection line and connected through a methane gas supply line;
a nitrogen gas tank connected to the other side of the gas injection line and connected through a nitrogen gas supply line;
a process line connected to one side of the reaction apparatus to change reaction conditions of the reaction apparatus;
an exhaust line connected to the other side of the reaction apparatus to discharge gas in the reaction apparatus; and
a discharge line connected to the process line and provided with a safety valve that automatically operates and discharges the gas to the outside when the pressure of the gas flowing into the process line exceeds a set pressure;
A first pressure regulator for regulating pressure, a first metering valve for measuring and controlling an amount of gas, and a first check valve for preventing backflow are disposed in the methane gas supply line;
A main ball valve for controlling whether or not gas introduced into the reaction device is injected is disposed in the gas injection line;
The process line includes a process line ball valve, a heater capable of controlling the temperature of the process line, a third pressure regulator, a third metering valve, a mass flow meter, a third check valve, and a fourth pressure capable of adjusting the discharged gas pressure A system for simulating reaction behavior in natural gas high-pressure piping, characterized in that a regulator is disposed. The method according to claim 1,
A second pressure regulator for regulating pressure, a second metering valve for measuring and controlling an amount of gas, and a second check valve for preventing backflow are disposed in the nitrogen gas supply line;
In the exhaust line, an exhaust line ball valve for controlling whether or not the gas discharged from the reaction device is discharged is disposed. The method according to claim 1,
The reaction device is
Reaction behavior simulation system in natural gas high-pressure pipe, characterized in that it further comprises a pressure transmitter capable of monitoring the value measured by the pressure gauge and the pressure gauge, and a thermometer for measuring the temperature. The method according to claim 1,
In the process line,
Reaction behavior simulation system in natural gas high-pressure pipe, characterized in that it further comprises a thermometer for measuring the temperature of the process line and a pressure transmitter capable of monitoring the pressure controlled through the third pressure regulator. The method according to claim 1,
The reaction apparatus is provided with a specimen mounting container therein;
A plurality of specimens are mounted in the specimen mounting container;
the specimen is formed to be smaller than the inner diameter of the specimen mounting container;
A system for simulating the reaction behavior in a natural gas high-pressure pipe, characterized in that a spacer is provided between the specimen and the specimen to form a space through which the gas can flow by being spaced apart by a predetermined interval. 6. The method of claim 5,
One ventilation hole is formed through the specimen;
mounting so that the ventilation holes can be alternately arranged on one side and the other side when a plurality of specimens are mounted in the specimen mounting container;
A plurality of specimens are spaced apart from each other in the specimen mounting container, and gas is sequentially transferred from the lower side to the upper side of the specimen along the flow path formed through the ventilation hole. 6. The method of claim 5,
Reaction behavior simulation system in a natural gas high-pressure pipe, characterized in that it is connected to the reaction device to mount and recover a specimen, and further comprises a reaction device control unit capable of coating a desired material on the specimen. 8. The method of claim 7,
A control system comprising a storage unit capable of accumulating and storing test data of the reaction device, a control unit for controlling each valve and each device, and a detection unit for concentrating, analyzing, and detecting the reaction material A system for simulating reaction behavior in natural gas high-pressure piping.

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