KR20210084381A - An Integrated EVU Pellicle including Pellicle Frame and Pellicle Membrane And An Exposure Apparatus including the Integrated EUV pellicle - Google Patents

Abstract

The embodiment relates to a pellicle, a method for manufacturing the same, an exposure device including a pellicle, and a device for manufacturing a pellicle. An EUV pellicle with an integrated pellicle frame and pellicle membrane according to the embodiment is used in an exposure process using extreme ultraviolet (EUV) and includes: the pellicle membrane through which a predetermined light source is transmitted; and the pellicle frame supporting the pellicle membrane. The pellicle membrane and the pellicle frame are made of the same material and integrally formed on a mask substrate through 3D printing. The pellicle frame comes in direct contact with the mask substrate without an adhesive, and is integrated with the pellicle membrane to support the pellicle membrane.

Description

An Integrated EVU Pellicle including Pellicle Frame and Pellicle Membrane And An Exposure Apparatus including the Integrated EUV pellicle

The embodiment relates to a pellicle, a method for manufacturing the same, an exposure apparatus including the pellicle, and an apparatus for manufacturing the pellicle. Specifically, the embodiment relates to a pellicle including an integrated frame and a membrane, a method for manufacturing the same, an exposure apparatus including the pellicle, and an apparatus for manufacturing the pellicle. The pellicle and the exposure apparatus of the embodiment may be applied to an Extreme Ultra Violet (EUV) exposure process, but are not limited thereto.

In the manufacture of semiconductor devices or liquid crystal displays, etc., a photolithography process is used when patterning a semiconductor wafer or a substrate for liquid crystal.

In photolithography, a reticle or a photomask is used as a patterning original, and the pattern on the reticle is transferred to a semiconductor wafer or a substrate for liquid crystal. However, when particles are attached to the reticle, the transferred pattern is damaged because light is absorbed or reflected due to the particles, resulting in a decrease in quality or yield of semiconductor devices or liquid crystal displays.

Although the photolithography process is usually performed in a clean room, a method of attaching a pellicle is performed in order to prevent particles from adhering to the surface of the reticle since particles are present in the clean room as well.

In this case, the particles are not directly attached to the surface of the reticle, but are attached to the pellicle. Therefore, during lithography, the focus is on the mask pattern, so the particles on the pellicle are out of focus, so there is an advantage in that they are not transferred to the semiconductor wafer or liquid crystal substrate.

On the other hand, the resolution of the semiconductor exposure apparatus is increasing, and the wavelength of the source light source is also getting shorter in order to realize the resolution.

For example, as the UV (Ultra Violet) light source, G-line (436 nm), I-line (365 nm), KrF excimer laser (248 nm), ArF excimer laser (193 nm), etc. were used. Accordingly, the use of extreme ultraviolet (EUV, 13.5 nm) is required.

That is, in recent years, semiconductor devices and liquid crystal displays are increasingly highly integrated and miniaturized. For example, in the conventional technique of forming a fine pattern of about 32 nm on a photoresist film, an improved technique using an excimer laser such as an immersion exposure technique that exposes the photoresist film using an ArF excimer laser (193 nm) or multiple exposure can be used. It is possible.

However, further fine pattern formation is required for next-generation semiconductor devices and liquid crystal displays, and it is becoming difficult to form such fine patterns with conventional pellicle and exposure techniques. Accordingly, recently, as a method for forming a finer pattern, an EUV exposure technique using EUV light having a dominant wavelength of 13.5 nm is attracting attention.

In order to implement such an exposure technology using EUV, it is essential to develop a new light source, photoresist, reticle, pellicle, and the like.

On the other hand, the pellicle includes a pellicle membrane through which the light source is transmitted, and a pellicle frame supporting the pellicle membrane. In the conventional pellicle technology development, there are studies on the pellicle membrane in terms of light source transmittance, etc., but studies on the pellicle frame considering the exposure technology using EUV are insufficient.

First, according to the prior art, the PID (Pellicle Induced Distortion) problem caused by the difference in thermal properties due to the difference in the material of the pellicle frame and the mask substrate on which the pellicle frame is mounted or the material of the pellicle membrane and the pellicle frame is different. generate

Specifically, as the miniaturization of semiconductor devices or liquid crystal displays progresses, with respect to the pellicle, which influences the yield, when the pellicle is attached to the photomask, stress is generated due to the difference in the coefficient of thermal expansion, and the PID deforms the photomask due to the stress. There is an issue, and as a result, since the positional accuracy of the pattern formed is shifted, it is a big problem that it becomes difficult to form a fine pattern.

In particular, EUV has a very high energy because of its short wavelength, and because of its low transmittance, a significant amount of energy is absorbed by the pellicle and the mask substrate, thereby heating the pellicle and the mask substrate. Therefore, when the material of the pellicle and the mask substrate are different from each other, the PID issue due to the difference in thermal expansion due to heat generated in the lithography process becomes more important, but an appropriate solution is not presented.

In addition, in the case of lithography to which EUV is applied, pattern defects due to PID issues due to differences in thermal expansion become more important because the patterns are fine.

Next, in the prior art, the pellicle membrane is adhered to the pellicle frame by an adhesive. However, in such an adhesive, an out gasing phenomenon of generating a predetermined gas occurs during the process, and the gas may act as an impurity.

For example, the conventional pellicle frame is made of aluminum, stainless steel, polyethylene, etc., and the pellicle membrane is made of nitrocellulose, cellulose acetate, or fluororesin having excellent light transmittance.

At this time, the pellicle membrane is adhered to the pellicle frame by a membrane adhesive such as a fluorine-based adhesive, an acrylic adhesive, a silicone-based adhesive, or an epoxy resin. However, in such an adhesive, an out gasing phenomenon occurs during the process, and the generated gas acts as an impurity.

In particular, in an EVU with very high energy, a significant amount of energy is absorbed by the pellicle and the mask substrate, and as the pellicle and the mask substrate are heated, an out gasing phenomenon may occur.

Next, the pellicle membrane of the pellicle should be free-standing on a centimeter scale for more efficient patterning. The pellicle membrane in the prior art is very difficult to free-standing due to its weak tensile strength.

On the other hand, in the prior art, there is a technique using single crystal silicon (Si), silicon nitride (SiN), etc. as a constituent material in order to realize high transmittance of a film constituting a pellicle for EUV lithography (Korea Patent Publication No. 2009-0122114). However, the pellicle film using such single crystal silicon must be formed as an ultra-thin film of 100 nm or less in order to realize high transmittance. Accordingly, the pellicle film of the single crystal silicon thin film has a weak tensile strength, so it is difficult to implement a pellicle film on a scale of several centimeters.

In addition, since the pellicle film of the silicon single crystal thin film disclosed in Korean Patent Application Laid-Open No. 2009-0122114 can be easily damaged even by a small impact, a separate base substrate is used to support it. The reinforcing frame of the base substrate forms a certain pattern, and there is a problem in that the pattern is transferred to the substrate in a lithography process. In addition, there is a problem that the transmittance is as low as about 60%.

On the other hand, in order to supplement the strength of the pellicle film, there is a technology that integrates a mesh-shaped structure into a film support structure, but the transmittance of exposure light passing through the pellicle film and the transmittance and The uniformity is lowered, so it is difficult to apply it as a pellicle film.

The technical problem of the embodiment is to provide a pellicle suitable for exposure technology using extreme ultraviolet (EUV), a method for manufacturing the same, an exposure apparatus including the pellicle, and an apparatus for manufacturing the pellicle.

Specifically, the technical problem of the embodiment is to provide a pellicle capable of solving the PID (Pellicle Induced Distortion) problem, a method for manufacturing the same, an exposure apparatus including the pellicle, and an apparatus for manufacturing the pellicle.

In addition, the technical problem of the embodiment is to provide a pellicle capable of preventing an out gasing phenomenon, a method for manufacturing the same, an exposure apparatus including the pellicle, and an apparatus for manufacturing the pellicle.

In addition, the technical problem of the embodiment is to provide a pellicle capable of realizing free-standing, a method for manufacturing the same, an exposure apparatus including the pellicle, and an apparatus for manufacturing the pellicle.

The technical problems of the embodiments are not limited to those described in this item, and include those identified through the description of the invention.

A pellicle according to an embodiment includes a pellicle used in an exposure process, a pellicle membrane through which a predetermined light source is transmitted, and a pellicle frame supporting the pellicle membrane, wherein the pellicle membrane and the pellicle frame are integrally made of the same material characterized in that it is formed with

The pellicle membrane and the pellicle frame may be integrally formed by 3D printing.

In addition, the pellicle according to the embodiment, in the pellicle used in the exposure process using extreme ultraviolet (EUV), a pellicle membrane through which a predetermined light source is transmitted; and a pellicle frame supporting the pellicle membrane, wherein the pellicle membrane and the pellicle frame are integrally formed on the mask substrate through 3D printing with the same material, and the pellicle frame is the mask without an adhesive It is in direct contact with the substrate and may be integrally formed with the pellicle membrane to support the pellicle membrane.

In the method of manufacturing a pellicle used in an exposure process according to an embodiment, the pellicle is disposed on a reticle including a mask substrate and used in an exposure process using extreme ultraviolet (EUV), directly on the mask substrate. forming a pellicle frame by 3D printing to be in contact; and integrally forming a pellicle membrane on the pellicle frame using the same material as the pellicle frame through 3D printing.

The pellicle membrane and the pellicle frame may have an extinction coefficient of 0.00183 to 0.01709 under a light source of 13.5 nm.

An extinction coefficient of the pellicle membrane and the pellicle frame may be 10 times or less of an extinction coefficient of Si in a light source of 13.5 nm.

The pellicle membrane and the pellicle frame are Zr, Mo, Nb, Si, Si ₃ N ₄ , SiC, graphene, boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Al ₂ O ₃ , Y ₂ O ₃ , SiO ₂ (quartz), including any one of AlN, BN, Si-SiC, or a mixture thereof may be formed by 3D printing.

Horizontal widths at an upper portion and a lower portion of the pellicle frame may be different from each other.

In the pellicle frame, a lower first horizontal width in contact with the pellicle membrane may be smaller than a second horizontal width at an upper portion in contact with a predetermined mask substrate.

The inner wall of the pellicle frame may be vertical, and the outer wall may be inclined.

A first horizontal width of a lower portion of the pellicle frame in contact with the pellicle membrane may be greater than a second horizontal width of an upper portion in contact with a predetermined mask substrate.

The inside of the pellicle frame may be empty.

The manufacturing method of the pellicle used in the exposure process according to the embodiment is characterized in that the pellicle membrane and the pellicle frame are integrally formed through 3D printing with the same material.

The pellicle membrane and the pellicle frame are Zr, Mo, Nb, Si, Si ₃ N ₄ , SiC, graphene, boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Al ₂ O ₃ , Y ₂ O ₃ , SiO ₂ (quartz), including any one of AlN, BN, Si-SiC, or a mixture thereof may be manufactured through 3D printing.

It can be determined whether the pellicle membrane and the pellicle frame are printed according to the CAD design drawing by simulation through feedback of the three-dimensional surface in a closed loop layer by layer.

The thickness of the pellicle membrane may be 20-50 nm, and light transmittance may be 80% or more.

The embodiment may further include forming a protective layer on the pellicle.

The protective layer may be formed of any one or more _{of Si 3} N ₄ , SC, and Al ₂ O _{3 .}

Embodiments may further include forming a heat-conducting layer under the pellicle membrane.

The heat conductive layer may be any one or more of Ru, Ag, Pt, Mo, and graphene.

In addition, the exposure apparatus according to the embodiment may include an exposure light source, a reticle to which the exposure light source is irradiated, and any one of the pellicles disposed on the reticle.

The exposure light source is injected and reflected from the lower side of the reticle, and the mask substrate of the reticle may include a predetermined multi-layer mirror to reflect the exposure light source.

The pellicle frame may be directly formed on the mask substrate of the reticle without an adhesive.

In addition, the apparatus for manufacturing a pellicle according to an embodiment includes a stage and a nano-nozzle capable of nano-dropping on a substrate on the stage, wherein the nano-nozzle includes a plurality of nano-nozzles having a plurality of sizes, and the nano-nozzles include: The nozzle is Zr, Mo, Nb, Si, Si ₃ N ₄ , SiC, Graphene, boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Al ₂ O ₃ , Y ₂ O ₃ , SiO ₂ ( quartz), AlN, BN, Si-SiC, including any one of a mixture thereof may be manufactured through 3D printing pellicle.

The nano-nozzle may be capable of artificial intelligence mixing control for the nano-nozzles of the plurality of sizes.

In the embodiment, the nano-dropped pellicle material on the substrate may be heat-treated with an IR heater and UV.

The pellicle may be formed by simulating through feedback of a three-dimensional surface with a closed loop layer by layer and determining whether it is printed according to a CAD design drawing.

According to the embodiment, there is a technical effect that can provide a pellicle including an integrated frame and a membrane suitable for exposure technology using EUV, a method for manufacturing the same, an exposure apparatus including the pellicle, and an apparatus for manufacturing the pellicle. .

Specifically, according to the embodiment, there is a technical effect that can solve the PID (Pellicle Induced Distortion) problem caused by the difference in thermal properties as the materials of the pellicle membrane and the pellicle frame are different.

For example, according to the embodiment, by making the material of the pellicle membrane the same as the pellicle frame, there is a special technical effect that can fundamentally solve the PID problem due to the difference in the material of the pellicle membrane and the pellicle frame. Also, according to the embodiment, the material of the pellicle frame may use a material having a thermal expansion coefficient similar to or the same as that of quartz, which is a material of the mask substrate. In this way, it is possible to minimize the PID and minimize the mask and the overlay caused by the use of the mask.

In addition, according to the embodiment, there is a technical effect that can prevent the out gasing (out gasing) phenomenon by the adhesive for bonding the pellicle membrane and the pellicle frame.

For example, according to the embodiment, as the pellicle membrane is integrally formed with the pellicle frame, a separate membrane adhesive is not required, so there is a special technical effect that can fundamentally solve the outgassing problem.

In addition, according to the embodiment, there is a technical effect of providing a pellicle capable of realizing free-standing.

For example, in the embodiment, as the pellicle membrane is integrally formed with the pellicle frame, there is a special effect that it can be free-standing. In addition, the pellicle membrane of the embodiment has excellent tensile strength Zr, Mo, Nb, Si, Si ₃ N ₄ , SiC, Graphene, boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Al ₂ O ₃ , Y ₂ O ₃ , SiO ₂ (quartz), AlN, BN, Si-SiC, or a mixture thereof may be formed to implement a free-standing structure on a centimeter scale.

Accordingly, according to the embodiment, it has high transmittance for EUV exposure light so that it can be used in EUV lithography process, there is no PID issue even with high thermal energy generated by repeated exposure, and has high tensile strength, so that freestanding (Freestanding) light is obtained. ), there is a technical effect that can implement the structure.

The technical effects of the embodiments are not limited to those described in this item, and include those identified through the description of the invention.

1 is an exemplary view in which a pellicle according to an embodiment is disposed on a reticle;
2A is a perspective view of a pellicle according to an embodiment;
Fig. 2B is a cross-sectional view of a pellicle according to the embodiment shown in Fig. 2A;
3A to 3B are a second embodiment of a pellicle according to the embodiment;
4A to 4B are a third embodiment of a pellicle according to the embodiment;
5A to 5H are explanatory views of an apparatus or method for manufacturing a pellicle according to an embodiment.
6A to 6G are explanatory views of an apparatus for manufacturing a pellicle according to an embodiment.

Hereinafter, embodiments that can be specifically realized for solving the above problems will be described with reference to the accompanying drawings.

In the description of the embodiment, in the case where it is described as being formed on "on or under" of each element, the upper (upper) or lower (on or under) It includes both elements in which two elements are in direct contact with each other or one or more other elements are disposed between the two elements indirectly. In addition, when expressed as "up (up) or down (on or under)", it may include the meaning of not only an upward direction but also a downward direction based on one element.

(Example)

1 is an exemplary view in which a pellicle 200 according to an embodiment is disposed on a reticle 20 . The reticle 20 may include a mask substrate 21 and a mask pattern 22 , and the pellicle 200 may include a pellicle frame 210 and a pellicle membrane 220 .

The ultra-extreme ultraviolet (EUV) exposure apparatus having a wavelength of 13.5 nm to which the embodiment is applied may be a reflective type in which the light source does not transmit the reticle 20 . For example, in the EUV exposure apparatus to which the embodiment is applied, an exposure light source (not shown) may be injected and reflected from the lower side of the reticle 20 based on FIG. 1 , and a predetermined multilayer thin film mirror ( multi-layer mirror) may be provided, but is not limited thereto.

In the EUV exposure apparatus according to the embodiment, EUV as a light source may be generated by a laser-produced plasma (LPP) source. _{For example, when a CO 2} laser is fired on tin that falls tens of thousands of times per second, plasma is generated and EUV can be generated.

Referring to FIG. 1 , in the reticle 20 , a mask pattern 22 may be patterned on a predetermined mask substrate 21 . The reticle 20 may be a light-transmitting substrate on which a predetermined mask pattern 22 is drawn, but is not limited thereto.

In the embodiment, the reticle 20 may be a photo mask that can be repeatedly repositioned several times, and may be a quartz glass substrate on which a pattern is drawn 4 to 10 times larger than the design drawing. For example, the mask pattern 22 on the reticle 20 may be reduced in a ratio of 4:1, 5:1, or 10:1 and transferred to a predetermined semiconductor wafer.

The mask pattern 22 may correspond to a predetermined circuit pattern in each layer of a circuit structure such as a semiconductor device. The mask pattern 22 may be generated by forming a circuit image generated by an electronic circuit design automation (EDA) S/W tool on a blank mask.

In an embodiment, the mask substrate 21 may be a quartz glass substrate with high light transmittance, or a fused-silica glass plate.

Next, FIG. 2A is a perspective view of the pellicle 200 according to the embodiment, and FIG. 2B is a cross-sectional view taken along line A1-A1' of the pellicle 200 according to the embodiment shown in FIG. 2A.

In an embodiment, the pellicle 200 may include a pellicle frame 210 and a pellicle membrane 220 . The pellicle membrane 220 of the embodiment may prevent the particle P from coming into contact with the mask pattern 22 .

Since EUV having a wavelength of 13.5 nm to which the embodiment is applied is absorbed in a large amount by most materials, the material placed in the path of EUV in the optical system used for the patterning process is extremely limited, and a material having a very thin thickness is required.

On the other hand, as the miniaturization of semiconductor devices or liquid crystal displays is progressing in recent years, PID (Pellicle Induced Distortion) problem in which the positional accuracy of the mask pattern is shifted as a result of deformation of the reticle due to the stress of the pellicle when the pellicle is attached to the reticle is emerging In particular, in the ultra-miniaturized pattern technology of 10 nm or less to which the embodiment is applied, the PID issue is a very important technical problem.

The pellicle 200 according to the embodiment may be applied to EUV exposure equipment using EUV as a light source. EUV exposure equipment can implement finer integrated circuits than DUV (Deep Ultra Violet) exposure equipment. EUV wavelength is 13.5nm, which is shorter than DUV, and if the wavelength is short, light diffraction is reduced. Therefore, EUV exposure equipment can pattern finer integrated circuits on semiconductor wafers. For example, EUV exposure equipment may be applied to a front end process (7 nm or less) of a non-memory semiconductor or a DRAM process.

Meanwhile, the resolution of the exposure equipment may be expressed as k1*λ. The density of the DRAM integrated circuit is proportional to the process constant (k1) and the wavelength (λ: wave length), and is inversely proportional to the lens aberration (NA, Numerical Aperture). Lens aberration (NA) refers to the maximum diffraction angle that a lens can capture.

On the other hand, to make the cell-to-cell spacing tighter, you can reduce the value of wavelength or increase the value of NA (Numerical Aperture) in the above resolving power formula.

In DUV exposure equipment, which is the stage before the introduction of EUV exposure equipment, it is possible to realize a line width of 36 to 38 nm through the immersion technique in which the lens is immersed in water to increase the aperture of the denominator.

On the other hand, in EUV exposure equipment, the wavelength of light corresponding to a molecule is rapidly reduced from 193 nm to 13.5 nm, and the resolution is finer, so that more dense electronic circuits can be designed.

However, in the EUV exposure equipment to which the embodiment is applied, the wavelength of light is abruptly reduced from 193 nm to 3.5 nm, and accordingly, as ultra-miniaturized pattern technology of 10 nm or less can be implemented, the PID problem is emerging as a more important technical problem.

Specifically, in the prior art, there is a difference in the coefficient of thermal expansion between the pellicle frame 210 and the mask substrate 21 of the reticle 20 . Also, there is a difference in thermal expansion coefficient between the pellicle frame 210 and the pellicle membrane 220 .

For example, in the prior art, the pellicle frame is made of aluminum (Al) to make a frame shape and anodized alumina (Al ₂ O ₃ ) as a main component, and manganese, chromium, Black alumina is mainly used because it is colored black with a colorant such as carbon.

In the ultra-miniaturized pattern technology of 10 nm or less to which the embodiment is applied, the PID issue due to the difference in the thermal expansion coefficient between the black alumina pellicle frame and the quartz glass substrate is a very important technical problem.

In addition, in the prior art, the pellicle frame is made of aluminum, stainless steel, polyethylene, etc., and the pellicle membrane is made of nitrocellulose, cellulose acetate, or fluororesin having excellent light transmittance.

In the conventional pellicle technology development, there are studies on the pellicle membrane in terms of light source transmittance, etc., but studies on the pellicle frame considering the exposure technology using EUV are insufficient.

Accordingly, according to the prior art, the PID (Pellicle Induced Distortion) problem caused by the difference in thermal characteristics due to the difference in the material of the pellicle frame and the mask substrate on which the pellicle frame is mounted, or the difference in the material of the pellicle membrane and the pellicle frame. generate

In particular, a significant amount of energy from EUV, which has very high energy but low transmittance, is absorbed by the pellicle membrane and the pellicle frame, and the PID issue due to the difference in thermal expansion due to heat generated in the lithography process is becoming more important. situation. In addition, in the case of lithography to which EUV is applied, pattern defects due to PID issues due to differences in thermal expansion become more important because the patterns are fine.

On the other hand, in the prior art, attempts have been made to reduce PID by improving the material of the pellicle membrane, etc., but as the material of the pellicle membrane and the material of the pellicle frame are different, there is a PID (Pellicle Induced Defect) problem in the exposure apparatus to which EUV is applied. It is not properly resolved.

In addition, in the prior art, as the size of the reticle becomes larger as the diameter of the semiconductor substrate becomes larger, the pellicle is also required to have a larger diameter. However, as the pellicle becomes larger in diameter, the lifespan of the pellicle is rapidly shortening, and the tensile strength is not high, making it difficult to implement a freestanding structure.

In particular, in the case of a pellicle frame made of alumina material, due to brittleness, the pellicle is distorted in about 3 days, which is about 10,000 wafer process, and the pellicle must be discarded. There is a problem that is difficult to become.

In addition, in the case of a pellicle frame made of alumina in the prior art, as it is manufactured by mechanical processing, it is difficult to secure flatness, low corrosion prevention performance, discoloration may occur, and extrusion in the polishing step. There is also a problem with this.

In the prior art, it is not possible to present an appropriate alternative to the technical problem of the pellicle frame made of such alumina material.

In addition, in the prior art, the pellicle membrane is adhered to the pellicle frame by an adhesive such as a fluorine-based adhesive, an acrylic adhesive, a silicone-based adhesive, or an epoxy resin. generated and the gas may act as an impurity.

In particular, in an EVU with very high energy, a significant amount of energy is absorbed by the pellicle and the mask substrate, and as the pellicle and the mask substrate are heated, an out gasing phenomenon may occur.

Accordingly, the technical problem of the embodiment is to provide a pellicle suitable for exposure technology using extreme ultraviolet (EUV), a method for manufacturing the same, an exposure apparatus including the pellicle, and an apparatus for manufacturing the pellicle.

As described above, the ultra-violet (EUV) exposure apparatus having a wavelength of 13.5 nm to which the embodiment is applied may be of a reflective type in which the light source does not transmit the reticle 20 , but is not limited thereto.

For example, in the EUV exposure apparatus of the embodiment, a predetermined light source may be injected and reflected from the lower side of the reticle 20 , and in this case, a predetermined multi-layer mirror may be provided on the mask substrate 21 . have.

On the other hand, when the EUV exposure apparatus having a wavelength of 13.5 nm to which the embodiment is applied is a reflective type, the source power becomes higher, so that the PID issue due to the pellicle becomes more important. In particular, the EUV exposure apparatus having a wavelength of 13.5 nm to which the embodiment is applied proceeds in a vacuum, and accordingly, the heat generated in the exposure process cannot be radiated to the outside, so the PID issue becomes more pronounced.

In addition, according to the increased light source output, the pellicle made of alumina material of the prior art is more fragile and the lifespan is shortened, and the PID (Pellicle Induced Defect) problem can be fatal in the exposure process.

Specifically, EUV with a wavelength of 13.5 nm has a unique property of being absorbed by most materials including gas, and the nature of EUV absorbed by most materials in nature requires a design change of exposure equipment.

First, a vacuum can be maintained inside the exposure equipment, and EUV is also absorbed by air. Also, it is difficult to use conventional transmissive lenses due to absorption problems.

On the other hand, EUV equipment may adopt a method of reflecting the EUV light source with a multi-layer mirror in which Mo and Si are stacked in several layers to reduce the projection of the mask image.

On the other hand, the maximum reflection efficiency of the Mo-Si multilayer thin film mirror is about 70%, so when the EUV light source reaches the photosensitizer applied on the actual wafer, a large amount of light source loss occurs. is causing

Furthermore, since the conventional pellicle frame made of black alumina absorbs the light source, there is a problem of further causing the loss of the light source.

According to the embodiment, the material of the pellicle frame 210 may use a material having a thermal expansion coefficient similar to or the same as that of quartz, which is the material of the mask substrate 21 . In this way, it is possible to minimize the PID and minimize the mask and the overlay caused by the use of the mask.

In addition, the embodiment has a special technical effect that can fundamentally solve the PID problem due to the material of the pellicle membrane and the pellicle frame being different by manufacturing the material of the pellicle membrane 220 as an integral part as the pellicle frame 210 .

In the embodiment, the material of the pellicle frame 210 and the pellicle membrane 220 is Zr, Mo, Nb, Si, Si ₃ N ₄ , SiC, Graphene, boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Al ₂ O ₃ , Y ₂ O ₃ , SiO ₂ (quartz), AlN, BN, Si-SiC, or a mixture thereof may be used.

FIG. 2B is a cross-sectional view taken along line A1-A1' of the pellicle according to the embodiment shown in FIG. 2A. Although a dotted line is shown between the pellicle frame 210 and the pellicle membrane 220, this is to separate the regions between the two. This is an arbitrary line, and since both materials are the same, the dividing line between the two may not appear in the actual product.

Table 1 below shows the refractive index and extinction coefficient of the material of the pellicle frame 210 and the pellicle membrane 220 of the embodiment and the comparative material (Al ₂ O _{3 ) in the exposure process to which EUV (13.5 nm) is applied.} .

Material Refractive Index
(@13.5nm) Extinction coefficient
(@13.5nm) Zr 0.95764 0.00371 Mo 0.92388 0.00643 Nb 0.93375 0.00519 Si 0.99900 0.00183 Si ₃ N ₄ 0.97501 0.00867 SiC 0.98222 0.00478 Graphene 0.96157 0.00691 B4C 0.96379 0.00514 Ru 0.88635 0.01709 Al ₂ O ₃ 0.96788 0.3899

The extinction coefficient is a coefficient indicating the degree of absorption of light by a material that does not cause light scattering by allowing light to be incident at a right angle to a material having a predetermined thickness. Absorption of light is a phenomenon in which a part of energy is converted into heat energy when a wave such as light passes through a medium. It is an irreversible thermodynamic process, and the light energy decreases and the temperature rises. Accordingly, as the extinction coefficient increases, the generation of thermal energy increases and the degree of thermal expansion increases.

Referring to Table 1, in the embodiment, the material of the pellicle frame 210 and the pellicle membrane 220 is Zr, Mo, Nb, Si, Si ₃ N ₄ , SiC, Graphene, boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Al ₂ O ₃ , Y ₂ O ₃ , SiO ₂ (quartz), AlN, BN, Si-SiC, or a mixture thereof may be used.

According to the embodiment, by making the material of the pellicle membrane 220 the same as the pellicle frame 210, there is a special technical effect that can fundamentally solve the PID problem due to the difference in the material of the pellicle membrane and the pellicle frame.

Also, according to the embodiment, the material of the pellicle frame 210 may use a material having a thermal expansion coefficient similar to or the same as that of quartz, which is the material of the mask substrate 21 . In this way, it is possible to minimize the PID and minimize the mask and the overlay caused by the use of the mask.

For example, the material of the pellicle frame 210 and the pellicle membrane 220 may have an extinction coefficient of less than 0.02000 at 13.5 nm. For example, the material of the pellicle frame 210 may have an extinction coefficient of 0.00183 to 0.01709 at 13.5 nm.

For example, the material of the pellicle frame 210 and the pellicle membrane 220 may have an extinction coefficient of 10 times or less that of Si at 13.5 nm. For example, the material of the pellicle frame 210 and the pellicle membrane 220 may have an extinction coefficient of 0.00183 to 0.01830 at 13.5 nm. For example, the material of the pellicle frame 210 may have an extinction coefficient of 0.00183 to 0.01709 at 13.5 nm.

According to the embodiment, the material of the pellicle frame 210 and the pellicle membrane 220 is similar to or the same thermal expansion coefficient as quartz, which is the material of the mask substrate 21 , to minimize PID to mask (mask). ) and Overlay due to the use of a mask can be minimized.

Through this, according to the embodiment, there is a technical effect of providing a pellicle including an integrated frame and a membrane suitable for an exposure technology using EUV, a manufacturing method thereof, and an exposure apparatus including the pellicle.

The technical problem of the embodiment is to provide a pellicle capable of preventing an out gasing phenomenon by an adhesive bonding the pellicle membrane and the pellicle frame, a manufacturing method thereof, an exposure apparatus including the pellicle, and an apparatus for manufacturing the pellicle. .

Conventionally, the pellicle membrane is adhered to the pellicle frame by a predetermined membrane adhesive. The membrane adhesive may be a fluorine-based adhesive, an acrylic adhesive, or a silicone-based adhesive.

According to the embodiment, as the pellicle membrane 220 is integrally formed with the pellicle frame 210 , a separate membrane adhesive is not required, so there is a special technical effect that can fundamentally solve the outgassing problem.

Also, in the embodiment, the pellicle frame 210 may be formed on the mask substrate 21 without a separate adhesive. For example, the pellicle frame 210 may be directly formed on the mask substrate 21 by 3D printing as will be described later.

Accordingly, according to the embodiment, since a separate adhesive is not required as the pellicle frame 210 is formed on the mask substrate 21, there is a special technical effect that can fundamentally solve the outgassing problem.

In addition, the technical problem of the embodiment is to provide a pellicle capable of realizing free-standing, a method for manufacturing the same, an exposure apparatus including the pellicle, and an apparatus for manufacturing the pellicle.

In the embodiment, as the pellicle membrane 220 is integrally formed with the pellicle frame 210 , there is a special effect that it can be free-standing.

In addition, the pellicle membrane 220 of the embodiment has excellent tensile strength Zr, Mo, Nb, Si, Si ₃ N ₄ , SiC, Graphene, boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Al ₂ O ₃ , Y ₂ O ₃ , SiO ₂ (quartz), AlN, BN, Si-SiC, or a mixture thereof may be formed to implement a free-standing structure on a centimeter scale. For example, the pellicle membrane 220 may be supported by a rectangular or circular pellicle frame 210 having one side or a diameter of 5 mm or more to be free-standing.

In addition, the thickness of the pellicle membrane 220 of the embodiment may be 100 nm or less, and transmittance of 13.5 nm to ultra-violet (EUV) may be 70% or more. The thickness of the pellicle membrane 220 may be 50 nm or less, and the transmittance for EUV may be 80% or more. In addition, the pellicle membrane 220 may have a transmittance of 90% or more for EUV.

Accordingly, according to the embodiment, it has high transmittance for EUV exposure light so that it can be used in EUV lithography process, there is no PID issue even with high thermal energy generated by repeated exposure, and has high tensile strength, so that freestanding (Freestanding) light is obtained. ) There is a technical effect that can provide a pellicle including an integrated frame and membrane having a technical effect that can implement the structure, a manufacturing method thereof, and an exposure apparatus including the pellicle.

Next, Figures 3a to 3b is a second embodiment of the pellicle according to the embodiment.

Referring to FIG. 3A , in the pellicle 200B1 according to the 2-1 embodiment, horizontal widths at the top and the bottom of the 2-1 pellicle frame 210 may be different from each other.

For example, in the 2-1 pellicle frame 210b1 of the second embodiment, a lower first horizontal width in contact with the pellicle membrane 220 may be smaller than a second horizontal width at an upper portion in contact with the mask substrate 21 . .

According to the embodiment, the material of the pellicle frame 210b1 may be a material having a thermal expansion coefficient similar to or the same as that of quartz, which is the material of the mask substrate 21 . In this way, it is possible to minimize the PID and minimize the mask and the overlay caused by the use of the mask.

Furthermore, in the embodiment, by forming the second horizontal width of the 2-1 th pellicle frame 210b1 in contact with the mask substrate 21 to be larger than the first horizontal width in contact with the pellicle membrane 220, stress caused by thermal expansion of the pellicle There is a technical effect of minimizing the PID issue by dispersing the PID on the mask substrate 21 .

In addition, the inner wall of the 2-1 pellicle frame 210b1 of the second embodiment may be vertical, and the outer wall may be inclined based on the vertical cross-sectional view. Through this, it is possible to secure a wide contact area between the mask substrate 21 and the pellicle frame 210b1 while securing the light transmitting area inside.

Referring to FIG. 3B , in the pellicle 200B2 according to the second embodiment, the horizontal widths at the top and the bottom of the second-second pellicle frame 210b2 may be different from each other.

For example, in the pellicle 200B2 according to the second embodiment, the first horizontal width of the lower portion in contact with the pellicle membrane 220 of the second pellicle frame 210b2 in the pellicle 200B2 according to the second embodiment is the upper portion in contact with the mask substrate 21 . It may be larger than the second horizontal width.

According to the embodiment, by making the material of the pellicle membrane the same as the pellicle frame, there is a special technical effect that can fundamentally solve the PID problem due to the difference in the material of the pellicle membrane and the pellicle frame. Furthermore, in the embodiment, the first horizontal width of the lower portion of the 2-2nd pellicle frame 210b2 in contact with the pellicle membrane 220 is the second horizontal width of the upper portion of the 2-2nd pellicle frame 210b2 contacting the mask substrate 21 By designing it to be larger than that, there is a technical effect to minimize the PID issue by allowing the stress due to thermal expansion of the relatively thin pellicle membrane to be dispersed in the pellicle frame.

Next, Figures 4a to 4b are a third embodiment of the pellicle according to the embodiment.

Referring to FIG. 4A , in the pellicle 200C1 according to the third embodiment, horizontal widths at the top and the bottom of the 3-1 pellicle frame 210c1 may be different from each other. For example, in the 3-1 th pellicle frame 210c1 , a lower first horizontal width in contact with the pellicle membrane 220 may be smaller than a second horizontal width at an upper portion in contact with the mask substrate 21 .

Also, the inside of the 3-1 th pellicle frame 210c1 may be empty. In addition, the inner and outer walls of the 3-1 pellicle frame 210c1 may be provided with pores (not shown).

According to the embodiment, the material of the pellicle frame may be a material having a thermal expansion coefficient similar to or the same as that of quartz, which is the material of the mask substrate 21 . In this way, it is possible to minimize the PID and minimize the mask and the overlay caused by the use of the mask.

Furthermore, in the embodiment, the inside of the 3-1 pellicle frame 210c1 is made to be empty, so that the thermal energy of the 3-1 pellicle frame 210c1 is absorbed into the empty space of the 3-1 pellicle frame 210c1, and the pores There is a special technical effect that can minimize the PID issue by distributing the stress or energy caused by the thermal expansion of the pellicle frame by discharging it to the outside through the

Next, referring to FIG. 4B , in the pellicle 200C2 according to the third embodiment, the horizontal widths at the top and the bottom of the 3-2 pellicle frame 210c2 may be different from each other.

Also, the inside of the 3-2 pellicle frame 210c2 may be empty. In addition, the inner and outer walls of the 3-2 pellicle frame 210c2 may be provided with pores.

According to the embodiment, by making the material of the pellicle membrane the same as the pellicle frame, there is a special technical effect that can fundamentally solve the PID problem due to the difference in the material of the pellicle membrane and the pellicle frame.

Further, in the embodiment, the interior of the 3-2 pellicle frame 210c2 is made to be empty, so that the thermal energy of the 3-2 pellicle frame 210c2 is absorbed into the empty space of the 3-2 pellicle frame 210c2, and the pore There is a special technical effect that can minimize the PID issue by distributing the stress or energy caused by the thermal expansion of the pellicle frame by discharging it to the outside through the

Next, FIGS. 5A to 5H are explanatory views of an apparatus or method for manufacturing a pellicle according to an embodiment, and FIGS. 6A to 6G are explanatory views of an apparatus for manufacturing a pellicle according to an embodiment.

In an embodiment, the pellicle may be manufactured by 3D printing by Hyper vision process control.

Specifically, in 3D printing, using Optical Heterodyning 3D inspection, it is possible to check whether the CAD design drawings are printed by simulation through feedback of the 3D surface with a closed loop layer by layer.

First, Figure 5a is a conceptual diagram of a 3D manufacturing apparatus of a pellicle according to an embodiment.

In the 3D manufacturing apparatus of the pellicle according to the embodiment, the structured light may be irradiated by a light source apparatus 310 that generates a rotatable structure light to the sample area SA. At this time, the control unit 330 such as a computer may determine and control the manufacturing process by detecting the sample area SA irradiated with the structured light by a predetermined sensor 320 .

In the embodiment, the pellicle frame 210 and the pellicle membrane 220 for EUV are Zr, Mo, Nb, Si, Si ₃ N ₄ , SiC, Graphene, boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Al ₂ O ₃ , Y ₂ O ₃ , SiO ₂ (quartz), AlN, BN, Si-SiC, or a mixture thereof may be manufactured using 3D printing.

The 3D manufacturing apparatus of the pellicle according to the embodiment may be a solid-based 3D printing manufacturing apparatus, a liquid-based 3D printing manufacturing apparatus, or a powder-based 3D printing manufacturing apparatus depending on the 3D printing material. For example, the 3D manufacturing apparatus of the pellicle according to the embodiment may be a solid-based 3D printing manufacturing apparatus such as Fused Deposition Modeling (FMD) or Fused Filament Fabrication (FFF). In addition, the 3D manufacturing apparatus of the pellicle according to the embodiment may be a liquid-based 3D printing manufacturing apparatus that hardens by irradiating a predetermined light source such as a metal lamp, a mercury lamp, or a laser to the liquid photocurable resin. Alternatively, the 3D manufacturing apparatus for the pellicle according to the embodiment may be a powder-based 3D printing manufacturing apparatus for sintering or melting a powder-type material using a laser or an electron beam to form a shape.

Specifically, referring to FIGS. 6A to 6G , the 3D manufacturing apparatus of the pellicle according to the embodiment may include a nano ink jet device, and the nano ink jet includes a nano nozzle 350 . It may be provided, the nano ink jet may be provided with a nano nozzle (nano nozzle) (350).

Hereinafter, the description of FIGS. 6A to 6E shows that a predetermined wet etching is performed after the membrane preliminary layer 220a is formed, but the embodiment is not limited thereto.

For example, in the embodiment, when the material of the pellicle integral structure is silicon, wet etching may be performed as shown in FIGS. 6A to 6E, but in other cases, a high-quality pellicle membrane without separate etching by nano 3D printing. can be produced directly. For example, the material of the pellicle is Zr, Mo, Nb, Si ₃ N ₄ , SiC, Graphene, boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Al ₂ O ₃ , Y ₂ O ₃ , SiO ₂ (quartz), AlN, BN, Si-SiC, or a mixture thereof has a special technical effect that can directly manufacture a high quality pellicle membrane 220 with a thickness of 40-50 nm.

Referring to Figure 6a, in the embodiment the nano-nozzle 350 is a pellicle material Zr, Mo, Nb, Si, Si ₃ N ₄ , SiC, Graphene, boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Al ₂ O ₃ , Y ₂ O ₃ , SiO ₂ (quartz), AlN, BN, Si-SiC, or a mixture thereof may be dropped as nano drops on the substrate 2360 on a predetermined stage 355 .

In the embodiment, when a predetermined wet etching is performed after forming the membrane preliminary layer 220a, the material of the membrane preliminary layer 220a is not limited to silicon, and Zr, Mo, Nb, Si ₃ N ₄ , SiC, Graphene , boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Al ₂ O ₃ , Y ₂ O ₃ , SiO ₂ (quartz), AlN, BN, Si-SiC or mixtures thereof may also be possible.

In an embodiment, the 3D printer stage 355 may use a precision floating stage, and has ultra-high accuracy, low particles and defect free film. can be printed.

In the embodiment, the process control through feedback (feedback) with 3D measurement of the material sprayed by the nano ink jet to observe the printer-head in real time, and at the same time real-time calibration (calibration), the yield of the process can guarantee

In an embodiment, the substrate 360 on which the pellicle material is 3D printed may be a thin support substrate that is soluble in a strong acid such as sulfuric acid or nitric acid. For example, the substrate 360 may be made of cellulose, polyimides, or perfluoro polymer, but is not limited thereto.

In an embodiment, the nano-nozzles 350 may include nano-nozzles of a plurality of sizes capable of nano-drops of a plurality of sizes. For example, the nano-nozzle 350 may include first to sixth nano-nozzles 350a, 350b, 350c, 350d, 350e, 350f, etc., and artificial intelligence mixing control for these nozzles is possible. It may be possible.

In an embodiment, the artificial intelligence mixing control can secure the uniformity of the pellicle through a program and change the nano-nozzle size and position to obtain a mura-free film to ensure maximum homogeneity and uniformity.

For example, the size of the nanodrops in the pellicle frame 210 forming process and the pellicle membrane 220 forming process may be controlled differently.

For example, since the pellicle membrane 220 has to have high light transmittance, the nano-drop may be performed with a size smaller than the nozzle size when the pellicle frame 210 is formed.

For example, after 3D printing the membrane preliminary layer 220a to a thickness of about 80 nm to 300 μm as shown in FIG. 6A, 3D printing by controlling the size of the nanodrops in the pellicle frame 210 forming process differently as shown in FIG. 6B By doing so, the pellicle preliminary structure 200a can be formed.

The membrane preliminary layer 220a may be formed to a thickness of about 100 nm to 300 μm. A stand-off of the pellicle frame 210 may be about 2.5 to 3.5 mm, but is not limited thereto. According to an embodiment, there is an effect of producing uniformity of film quality, higher quality, and higher film uniformity by artificial intelligence mixing control.

Next, in a state in which the membrane preliminary layer 220a and the pellicle frame 210 are printed on the substrate 360 , the preliminary pellicle structure 200a may be heat-treated by a predetermined UV device.

For example, the nano-dropped pellicle preliminary structure 200a on the substrate 360 is heat-treated with an IR heater (not shown) or a UV device (not shown) to flatten and smooth the surface state, while simultaneously increasing the surface tension (surface tension) can be adjusted. In addition, the nano-dropped pellicle preliminary structure 200a on the substrate 360 may secure light transmittance during curing with a UV device.

Next, referring to FIG. 6C , the substrate 360 may be removed by immersing the heat-treated pellicle preliminary structure 200a in a strong acid such as sulfuric acid or nitric acid using a predetermined jig (not shown). Thereafter, the pellicle preliminary structure 200a may be sintered after cleaning, thereby stabilizing the pellicle preliminary structure 200a and aligning the crystal structure.

At this time, the conditions for sintering vary depending on the material, and a specific ambient gas is added to stabilize the material during sintering. In an embodiment, the sintering of the pellicle may be performed by laser sintering or thermal sintering at a high temperature, for example, around 1400°C.

In addition, after the substrate 360 is removed by strong acid, it is cured to remove liquids included in the film, such as a solvent.

Next, referring to FIG. 6D , the pellicle membrane 220 may be formed by coating a predetermined mask 390 on the preliminary pellicle structure 200a and etching the membrane preliminary layer 220a as shown in FIG. 6E .

For example, the mask 390 may be a photoresist film PR or a resin.

Referring to FIG. 6D , the membrane preliminary layer 220a may be wet-etched to a second thickness T2 as shown in FIG. 6E while being formed to a first thickness T1. For example, the membrane preliminary layer 220a may be etched to a second thickness T2 of 20 nm to 50 nm as shown in FIG. 6E in a state formed to a first thickness T1 of about 80 nm to 300 μm, but is limited thereto. it is not Also, the second thickness of the pellicle membrane 220 may be 20 nm to 40 nm. The width of the pellicle frame 210 may also be reduced by partially etched, but is not limited thereto. Thereafter, the remaining mask 390 may be removed.

In the embodiment, as the pellicle membrane 220 is integrally formed with the pellicle frame 210 by 3D printing, there is a special effect that can be free-standing.

In addition, the pellicle membrane 220 of the embodiment has excellent tensile strength Zr, Mo, Nb, Si, Si ₃ N ₄ , SiC, Graphene, boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Al ₂ O ₃ , Y ₂ O ₃ , SiO ₂ (quartz), AlN, BN, Si-SiC or a mixture thereof is formed by 3D printing, it is possible to implement a free-standing structure on a centimeter scale. For example, the pellicle membrane 220 may be supported by a rectangular or circular pellicle frame 210 having one side or a diameter of 5 mm or more to be free-standing.

In addition, as the pellicle membrane 220 of the embodiment is formed by 3D printing, the thickness may be 100 nm or less, and the transmittance for ultra-ultraviolet (EUV) of 13.5 nm may be 70% or more. The thickness of the pellicle membrane 220 may be 50 nm or less, and the transmittance for EUV may be 80% or more. In addition, the thickness of the pellicle membrane 220 may be 40 nm or less, and the pellicle membrane 220 may have a transmittance of 90% or more for EUV.

Next, the pellicle 200 is annealed with an IR heater (not shown), a UV device (not shown), a furnace, etc. to make the surface state flat and smooth while simultaneously increasing the surface tension. can be adjusted

Next, referring to FIG. 6F , a protective layer 230 may be formed on the pellicle 200 of the embodiment. _{For example, the protective layer 230 such as Si 3} N ₄ , SC, Al ₂ O ₃ on the pellicle 200 is preferably about 3 to 10 nm thick, more preferably 5 by using an ALD or CVD deposition process. It can be formed by depositing to a thickness of ~10 nm.

Next, referring to FIG. 6G , a heat-conducting layer 240 may be formed on the pellicle 200 . For example, Ru, Ag, Pt, Mo, graphene, etc. having high heat transfer efficiency under the pellicle 200 on which the protective layer 230 is formed is preferably about 1 to 5 nm thick, more preferably about 2 to 4 nm thick. By depositing to form the heat conductive layer 240, it is possible to effectively dissipate heat and increase EUV transmittance.

In the process process described above, the process sequence may be changed for efficiency of heat treatment and deposition.

On the other hand, as described in the background art, in the prior art, there is a technique using single crystal silicon (Si), silicon nitride (SiN), etc. as a constituent material to realize high transmittance of a film constituting a pellicle for EUV lithography (Korea). Publication No. 2009-0122114). However, the pellicle film using such single crystal silicon must be formed as an ultra-thin film of 100 nm or less in order to realize high transmittance. Accordingly, the pellicle film of the single crystal silicon thin film has a weak tensile strength, so it is difficult to implement a pellicle film on a scale of several centimeters.

In addition, since the pellicle film of the silicon single crystal thin film disclosed in Korean Patent Application Laid-Open No. 2009-0122114 can be easily damaged even by a small impact, a separate base substrate is used to support it. The reinforcing frame of the base substrate forms a certain pattern, and there is a problem in that the pattern is transferred to the substrate in a lithography process. In addition, there is a problem that the transmittance is as low as about 60%.

In the previous embodiment, the embodiment through wet etching has been described with reference to FIGS. 6A to 6E, but in another embodiment, a high-quality pellicle membrane can be directly manufactured without separate etching by nano 3D printing.

For example, if the material of the pellicle is Zr, Mo, Nb, Si3N4, SiC, Graphene, boron carbide (B4C), Ru, Ti, Ba, ZrO2, Al2O3, Y2O3, SiO2 (quartz), AlN, BN, Si-SiC Alternatively, in the case of a mixture thereof, there is a special technical effect that can directly manufacture the high quality pellicle membrane 220 with a thickness of 40-50 nm.

In this case, there is a special technical effect in that transmittance of 80% or more, for example 90% or more, can be secured because separate silicon nitride (SiN) is not disposed above and below silicon (Si) as in No. 2009-0122114 No. 2009-0122114.

Referring again to FIG. 5B , FIG. 5B is a reference image among the composite images of light sources projected from arbitrary angles, and FIG. 5C is an image including the rectangular sample area SA.

Next, FIG. 5D is the phase difference amplitude data of the Sample and Reference according to time for a single pixel trace in many rotations.

Next, FIGS. 5E and 5F are Green Object in field of view as spectroscopy of Optical Heterodyning 3D inspection in Examples, respectively, and are Stacked Images.

Next, referring to FIG. 5G , the Single Pixel trace at various wavelengths shows a response only in Green. Next, FIG. 5G is a synthetic image of a relative phase and wavelength information, and a mixed signal.

Through this, in the embodiment, the pellicle frame is simulated through feedback of the three-dimensional surface with a closed loop layer by layer using Optical Heterodyning 3D inspection during 3D printing to check whether it is printed according to the CAD design drawing. have.

Through this, in the embodiment, the pellicle frame may be manufactured by 3D printing by Hyper vision process control.

In addition, according to the embodiment, the material to be nano-dropped can be controlled by an error compensation algorithm so that the film quality can be applied as uniformly as possible.

In addition, the embodiment observes the printer-head in an ultra-fast manner by controlling the process through feedback by 3D measurement of the material sprayed by the nano ink jet, and at the same time, real-time calibration (calibration) can ensure the yield of the process.

According to the embodiment, there is a technical effect that can provide a pellicle including an integrated frame and a membrane suitable for exposure technology using EUV, a method for manufacturing the same, an exposure apparatus including the pellicle, and an apparatus for manufacturing the pellicle. .

Specifically, according to the embodiment, there is a technical effect that can solve the PID (Pellicle Induced Distortion) problem caused by the difference in thermal properties as the materials of the pellicle membrane and the pellicle frame are different.

In addition, according to the embodiment, there is a technical effect that can prevent the out gasing (out gasing) phenomenon by the adhesive for bonding the pellicle membrane and the pellicle frame.

In addition, according to the embodiment, there is a technical effect of providing a pellicle capable of realizing free-standing.

Accordingly, according to the embodiment, it has high transmittance for EUV exposure light so that it can be used in EUV lithography process, there is no PID issue even with high thermal energy generated by repeated exposure, and has high tensile strength, so that freestanding (Freestanding) light is obtained. ), there is a technical effect that can implement the structure.

Features, structures, effects, etc. described in the above embodiments are included in at least one embodiment, and are not necessarily limited to only one embodiment. Furthermore, features, structures, effects, etc. illustrated in each embodiment can be combined or modified for other embodiments by those of ordinary skill in the art to which the embodiments belong. Accordingly, the contents related to such combinations and modifications should be interpreted as being included in the scope of the embodiments.

In the above, the embodiment has been mainly described, but this is only an example and not limiting the embodiment, and those of ordinary skill in the art to which the embodiment pertains are provided with several examples not illustrated above in the range that does not depart from the essential characteristics of the embodiment. It can be seen that variations and applications of branches are possible. For example, each component specifically shown in the embodiment can be implemented by modification. And differences related to such modifications and applications should be construed as being included in the scope of the embodiments set forth in the appended claims.

Claims (7)

In the pellicle used in the exposure process using extreme ultraviolet (EUV),
a pellicle membrane through which a predetermined light source is transmitted; and;
Including; a pellicle frame supporting the pellicle membrane;
The pellicle membrane and the pellicle frame are integrally formed on the mask substrate through 3D printing with the same material,
The pellicle frame is in direct contact with the mask substrate without an adhesive, and is integrally formed with the pellicle membrane to support the pellicle membrane. According to claim 1,
The pellicle membrane and the pellicle frame are
An extinction coefficient (extinction coefficient) of 0.00183 to 0.01709 under a light source of 13.5 nm, a pellicle frame and a pellicle membrane integrated EUV pellicle. 3. The method of claim 2,
The pellicle membrane and the pellicle frame are
An EUV pellicle having a pellicle frame and a pellicle membrane integrated with an extinction coefficient that is 10 times or less of the extinction coefficient of Si at a light source of 13.5 nm. According to claim 1,
The pellicle membrane and the pellicle frame are
Zr, Mo, Nb, Si, Si ₃ N ₄ , SiC, boron carbide (B4C), Ru, Ti, Ba, ZrO ₂ , Y ₂ O ₃ , SiO ₂ (quartz), AlN, BN, Si-SiC or these A pellicle frame and an EUV pellicle integral with a pellicle membrane, formed by 3D printing, including any one of a mixture of According to claim 1,
The pellicle frame is
An EUV pellicle having an integrated pellicle frame and a pellicle membrane, wherein a first horizontal width of a lower portion in contact with the pellicle membrane is smaller than a second horizontal width of an upper portion in contact with a predetermined mask substrate. exposure light source;
a reticle to which the exposure light source is irradiated; and
An exposure apparatus comprising a; the pellicle frame of any one of claims 1 to 5 disposed on the reticle and the EUV pellicle integrated with the pellicle membrane. 7. The method of claim 6,
The exposure light source is injected and reflected from the lower side of the reticle,
The mask substrate of the reticle includes a predetermined multi-layer mirror to reflect the exposure light source.

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