KR20210076610A - Oxidation resistance apparatus - Google Patents

Abstract

The present invention provides an oxidation resistance apparatus comprising: a wiping unit that controls the thickness of a plating layer by injecting gas to a steel plate; sealing box units that move in conjunction with the wiping unit and are installed to surround the wiping unit to create a non-oxidizing atmosphere; and a buffer chamber unit which is installed to surround a sealing line of the sealing box units in which a clearance part is formed, and is filled with an inert gas. The oxidation resistance apparatus can create a stable non-oxidizing atmosphere to minimize quality defects.

Description

Anti-oxidation device {OXIDATION RESISTANCE APPARATUS}

The present invention relates to an anti-oxidation device with reduced quality defects.

It should be noted that the content described in this section merely provides background information on the present invention and does not constitute the prior art.

The plating products produced in the continuous hot-dip galvanizing process are typically classified into GI materials, GA materials, and high corrosion-resistant plated steel sheets according to the plating bath composition system.

Conventionally, plating products have been produced mainly for GI materials and GA materials for the Zn-Al composition system in which the plating bath composition consists of zinc (Zn) and aluminum (Al). However, recently, by adding a magnesium (Mg) component to the existing Zn-Al composition system, the development of highly corrosion-resistant plated steel sheets in which the corrosion resistance of the plated surface is significantly improved is being actively conducted.

Although magnesium component has the advantage of improving corrosion resistance, magnesium in a molten state has a disadvantage in that it is easily oxidized when in contact with the surrounding atmosphere.

1, in the continuous hot-dip galvanizing process, the steel sheet (S) is immersed in the plating bath of the plating bath (P) having a Zn-Al-Mg composition system, and then the air knife (Q) is moved while moving in the vertical direction. When passing, the molten metal plating layer attached to the steel plate S comes into contact with the surrounding atmosphere.

At this time, as shown in FIG. 2, due to the oxidizing property of magnesium contained in the molten metal, oxidative surface defects such as beard patterns, flow patterns and rain marks occur on the surface of the plated steel sheet (S).

On the other hand, when the adhesion amount of the highly corrosion-resistant plated steel sheet is post-plating, not only oxidative surface defects but also surface defects in the form of edge comb patterns are additionally generated.

In order to secure the high quality of the Zn-Al-Mg composition system of highly corrosion-resistant plated steel sheet, it is important to prevent oxidative surface defects as well as edge comb pattern defects that occur in post-plating.

After the steel sheet is immersed in the plating bath of the Zn-Al-Mg composition system, it comes out of the plating bath and moves in the vertical direction, and the amount of adhesion of the plating bath is controlled by the wiping part installed on the plating bath.

After the steel sheet exits the plating bath, when the plating layer on the surface of the steel sheet comes into contact with the atmosphere, oxidative defects are generated on the surface of the plating layer due to the oxidizing property of magnesium.

In order to prevent such oxidative surface defects, it is necessary to create a non-oxidizing atmosphere around the plating bath.

KR 10-0641756 B1

An aspect of the present invention is to provide an anti-oxidation device capable of minimizing quality defects by more stably creating a non-oxidizing atmosphere.

As an aspect for achieving the above object, the present invention provides a wiping unit installed in a pair to control the thickness of the plating layer by spraying gas to the steel sheet; a sealing box unit installed integrally with the wiping unit to move together, and provided with a pair to surround the wiping unit to create a non-oxidizing atmosphere; And, at least a portion of the pair of sealing box portions is installed to surround the sealing line overlapping each other, the buffer chamber portion filled with an inert gas; provides an oxidation prevention device comprising a.

Preferably, the buffer chamber part is integrally installed in the sealing box and moves together, and a buffer line in which at least some of them overlap each other while a pair is installed to surround the sealing line may be formed. Preferably, the buffer The chamber part may be installed so as to surround the sealing line of the sealing box part so as to be in close contact with the sealing box part.

Preferably, it is fixed to the fixing structure, the close contact driving portion for contacting the buffer chamber portion in the sealing line direction of the sealing box portion; may further include.

Preferably, the close contact driving unit, the contact frame fixed to the fixed structure; an adjustment rod member having one end fixed to the buffer chamber portion and movably installed on the close contact frame by adjusting an adjustment nut installed on the other end portion; and an elastic member provided between the buffer chamber part and the close contact frame to provide an elastic force.

Preferably, the close contact driving unit, a close contact mode for adhering the buffer chamber in the direction of the sealing box portion; and an adhesion release mode for releasing the adhesion between the buffer chamber part and the sealing box part when the sealing box part and the wiping part move together. Preferably, the second internal pressure of the buffer chamber part may be equal to or greater than the first internal pressure of the sealing box part.

Preferably, the second internal pressure of the buffer chamber portion may be maintained relatively larger than the external atmospheric pressure.

Preferably, the second volumetric space in which the inert gas is filled in the buffer chamber part may be configured in a ratio of 5 to 20% of the first volume space in which the inert gas is filled in the sealing box part.

Preferably, a gas supply unit for supplying an inert gas to the inside of the buffer chamber; may further include.

According to an embodiment of the present invention, there is an effect of minimizing quality defects by more stably creating a non-oxidizing atmosphere.

1 is a view showing a conventional plating apparatus.
2 is a view showing oxidative surface defects that occur during production of a plated steel sheet with a conventional plating apparatus.
3 is a view illustrating a case in which the sealing box unit is installed in the wiping unit and the buffer chamber unit is not installed in the sealing box unit.
4 is a perspective view illustrating an antioxidant device according to an embodiment of the present invention.
FIG. 5A is a view illustrating a direction I-I' of FIG. 4 .
FIG. 5B is a view illustrating a direction II-II' of FIG. 4 .
FIG. 5C is a view illustrating a direction III-III′ of FIG. 4 .
6 is a perspective view illustrating an antioxidant device according to an embodiment of the present invention.
7 is a plan view showing an antioxidant device according to another embodiment of the present invention.
8A is a view showing a case in which the buffer chamber part is not installed in the sealing box part (case 1).
8B is a view showing a case (case 2) in which the buffer chamber part is installed in the sealing box part.
FIG. 9 is a view showing movement of oxygen entering the inside of the sealing box when the sealing box unit moves together with the wiping unit in the case of FIG. 8A (Case 1).
FIG. 10 is a view showing the movement of oxygen entering the sealing box when the wiping unit moves together with the sealing box with the buffer chamber mounted on the side in the case of FIG.
FIG. 11 is a view showing the results of measuring the oxygen concentration change in the sealing box with time with respect to FIGS. 8A (Case1) and FIG. 8B (Case2).

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings. However, the embodiment of the present invention may be modified in various other forms, and the scope of the present invention is not limited to the embodiments described below. Further, the embodiments of the present invention are provided in order to more completely explain the present invention to those of ordinary skill in the art. The shapes and sizes of elements in the drawings may be exaggerated for clearer description.

As shown in FIG. 3 , unlike the present invention, when only the sealing box unit 200 is installed in the wiping unit 100 , and the buffer chamber unit 300 is not installed in the sealing box unit 200 , the sealing box Since it is not possible to stably create a non-oxidizing atmosphere in the inner space of the part 200, there may be a problem that quality defects occur in the steel plate S.

Therefore, the anti-oxidation device of the present invention includes the buffer chamber part 300 together with the sealing box part 200 to more stably create a non-oxidizing atmosphere in the inner space of the sealing box part 200 to form a steel plate (S). We aim to minimize defects in product quality.

Hereinafter, an antioxidant according to an embodiment of the present invention will be described in detail with reference to FIGS. 4 to 11 .

The antioxidant device according to an embodiment of the present invention includes a wiping unit 100, a sealing box unit 200, and a buffer chamber unit 300, and additionally a close contact driving unit 400 and a gas supply unit (not shown). may include

4 to 5c, the oxidation prevention device is installed integrally with the wiping unit 100, a pair of which is installed to control the thickness of the plating layer by spraying gas to the steel plate (S), and the wiping unit moves together , A pair of sealing box units 200 are installed to surround the wiping unit 100 to create a non-oxidizing atmosphere, and at least a portion of the pair of sealing box units are installed to surround a sealing line overlapping each other, and are inert It may include a buffer chamber part 300 filled with gas.

Referring to FIG. 5A , the wiping unit 100 controls the thickness of the plating layer plated on the steel sheet S by injecting gas to the steel sheet S.

The thickness of the plating layer can be adjusted by spraying an inert gas to the steel sheet S drawn upward from the plating bath P.

The wiping unit 100 may be disposed to face a pair with the steel plate S interposed therebetween.

A pair of wiping units 100 are disposed to face each other with the steel sheet S interposed therebetween, and by spraying an inert gas to the front and rear surfaces of the steel sheet S, respectively, the amount of adhesion of the plating bath on the front and rear surfaces of the steel sheet S Adjust.

As an example, the wiping unit 100 may be periodically moved with a distance of ± 5 mm from the steel plate S.

The inert gas injected from the wiping unit 100 may be composed _{of nitrogen gas (N 2 ).}

The distance between the wiping part 100 and the steel plate S may be adjusted while the wiping part 100 moves in the steel plate S direction in order to control the amount of the plating bath attached to the steel plate S.

The steel sheet (S) may be a galvanized steel sheet (S) or a zinc alloy plated steel sheet (S) containing 1% or more of magnesium and 1% or more of aluminum.

4 to 5C , the sealing box unit 200 may be installed to surround the wiping unit 100 to create a non-oxidizing atmosphere around the wiping unit 100 .

An inert gas such as nitrogen (inert gas) may be maintained in the inner space of the sealing box unit 200 .

For example, the internal pressure of the inner space of the sealing box unit 200 may be maintained relatively larger than the external atmospheric pressure.

The inner space surrounded by the sealing box 200 is blocked from outside air, and a non-oxidizing atmosphere may be formed around the steel plate S by the inert gas sprayed from the wiping unit 100 or the like.

The sealing box unit 200 may be installed such that a lower end thereof is immersed in the plating bath surface of the plating bath P, and surrounds the wiping unit 100 .

A sealing line 210 may be formed in the sealing box unit 200 at a gap portion where adjacent sealing wall materials are overlapped.

In the sealing line 210 , a gap portion that is finely separated in a state in which adjacent sealing wall materials are overlapped may be formed. Since the gap portion is a fine gap, normally, the amount of gas flowing through the gap portion may be quite small.

However, when the sealing box unit 200 moves together with the wiping unit 100, a pressure change occurs due to a volume change inside the sealing box unit 200, and the amount of gas flowing through the sealing line 210 in which the clearance is formed is can increase significantly.

In particular, when the sealing box unit 200 moves in a direction away from the steel plate S together with the wiping unit 100, the volume inside the sealing box unit 200 increases and the internal pressure decreases due to the increased volume, while the clearance Gas, such as oxygen, from the outside of the sealing box 200 may be introduced into the inside of the sealing box 200 through the sealing line 210 in which the portion is formed.

Conversely, when the sealing box unit 200 moves in a direction closer to the steel plate S along with the wiping unit 100, the volume inside the sealing box unit 200 is reduced and the internal pressure increases due to the reduced volume. Gas such as nitrogen (inert gas) inside the sealing box 200 may flow out of the sealing box 200 through the sealing line 210 in which the clearance is formed.

The sealing box unit 200 may move together with the wiping unit 100 .

For example, in the sealing box unit 200 , the wiping unit 100 is integrally fixed to the wiping arm, and when the wiping arm is moved, the wiping unit 100 and the sealing box unit 200 may be integrally moved together.

The sealing box unit 200 may be integrally fixed with the wiping unit 100, and when the wiping unit 100 moves in the direction of the steel plate S, the sealing box unit 200 may also move integrally with the wiping unit 100. have.

In order to control the adhesion amount of the plating bath, the wiping unit 100 is moved to adjust the distance between the wiping unit 100 and the steel plate S. The inside of the sealing box unit 200 that moves integrally with the wiping unit 100 The volume of space can be changed.

Accordingly, when the volume of the inner space of the sealing box unit 200 is increased, the pressure of the inner space of the sealing box unit 200 is momentarily lowered while the external gas is passed through the sealing line 210 of the sealing box unit 200 . can be introduced.

When the buffer chamber part 300 is not installed on the outside of the sealing line 210 of the sealing box part 200, the sealing line 210 in which the clearance part is formed when the volume of the inner space of the sealing box part 200 increases. ), as external oxygen flows in, quality defects may occur in the plated steel sheet (S).

The anti-oxidation device of the present invention includes a buffer chamber part 300 together with the sealing box part 200, and external oxygen flows into the sealing box part 200 to cause quality defects in the steel plate (S). can be minimized

As shown in FIGS. 5A and 5B , when the sealing box part 200 is integrally configured with the wiping part 100 , the steel plate S for adjusting the distance between the wiping part 100 and the steel plate S ) can be assembled by being provided with one set each in the front direction and the rear direction.

One set of the sealing box unit 200 is disposed in the front direction and the rear direction of the steel plate S, respectively, and may be disposed to overlap each other with the sealing line 210 as a boundary.

A transfer passage through which the steel plate S is drawn may be formed at the upper end of the sealing box unit 200 .

The sealing box unit 200 may be configured to be larger than the maximum width of the steel plate S by 50 mm or more.

For example, the width of the steel plate (S) is 700 ~ 1800 mm, the sealing box portion 200 may be greater than 50 mm larger than the maximum width of the steel plate (S). That is, the sealing box unit 200 may have a width of 1850 mm or more.

The anti-oxidation device of the present invention uses the sealing box unit 200 to isolate the plating bath including the wiping unit 100 from the surrounding atmosphere, and an inert gas (N2 gas, etc.) Oxygen concentration can be controlled by injecting

4 to 5C , the buffer chamber part 300 is installed to surround the sealing line 210 of the sealing box part 200 , so that it is possible to prevent the sealing line 210 from being exposed to the outside air.

The inner space of the buffer chamber part 300 may be filled with an inert gas such as nitrogen.

The buffer chamber part 300 may be installed to cover the entire sealing line 210 when the sealing box part 200 moves together with the wiping part 100 , and the sealing line 210 is formed by the buffer chamber part 300 . It can be surrounded and blocked from outside air.

Therefore, the buffer chamber part 300 is installed to surround the sealing line 210 of the sealing box part 200, so that the gas through the sealing line 210 due to a change in the volume of the inner space of the sealing box part 200 At the time of inflow, an inert gas filled in the buffer chamber part 300 rather than external oxygen flows in, thereby maintaining a non-oxidizing atmosphere in the inner space of the sealing box part 200 .

Referring to FIG. 4 , the buffer chamber part 300 may be configured in a shape corresponding to the shape of the sealing box part 200 .

For example, the shape of the side surface of the buffer chamber part 300 may have the same shape as the shape of the side surface of the sealing box part 200 .

As another example, the buffer chamber part 300 may be configured to have a minimized size so as to cover the sealing line 210 of the sealing box part 200 .

4 and 6 , the sealing box unit 200 includes a plurality of sealing wall materials installed to surround the wiping unit 100 to create a non-oxidizing atmosphere, and a pair of sealing box units 200 ) may form the sealing line 210 while at least some of the adjacent sealing wall materials are disposed to overlap each other.

Referring to FIG. 5B , at least a portion of the adjacent sealing wall materials of the pair of sealing box units 200 may be disposed to overlap each other.

The pair of sealing box units 200 may form a sealing line 210 in which adjacent sealing wall materials are slidably overlapped.

Adjacent sealing wall materials are arranged in a slidably overlapping state, and it is possible to minimize the inflow of outside air into the inner space of the sealing box unit 200 through the sealing line 210 .

While the overlapping state is maintained even when the wiping unit 100 is moved between the overlapping sealing wall materials, the inflow of outside air into the inner space of the sealing box unit 200 is minimized, and the sealing box unit 200 creates a non-oxidizing atmosphere. can be maintained.

4 and 6 , the sealing box unit 200 includes a first sealing wall material 201 provided in the front-rear direction of the wiping unit 100 and a second sealing wall material 201 provided in the left-right direction of the wiping unit 100 . A sealing wall material 202 may be provided.

Among the plurality of sealing wall materials, the second sealing wall materials 202 provided in the left and right directions of the wiping part 100 may be disposed to overlap each other to form a sealing line 210 .

The first sealing wall material 201 may be formed to extend in the width direction along the wiping part 100 and be disposed to face each other in the front-rear direction with the wiping part 100 interposed therebetween.

The second sealing wall material 202 may be disposed to face each other in the left and right directions with the wiping unit 100 interposed therebetween.

A third sealing wall material 203 is formed on the upper side of the sealing box unit 200 , and a withdrawal passage through which the steel plate S is drawn out may be formed in the third sealing wall material 203 .

A passage control unit 500 for adjusting the width of the withdrawal passage according to the width of the steel plate S may be installed in both end regions of the withdrawal passage.

The lower side of the sealing box unit 200 may be opened, and the lower end of the sealing box unit 200 may be immersed in the plating bath surface of the plating bath (P).

Referring to FIG. 4 , the buffer chamber part 300 is integrally installed in the sealing box part 200 and moves together, and a pair is installed to surround the sealing line 210 , and at least a part of the buffer is overlapped with each other. A line 310 may be formed.

The buffer chamber part 300 includes a plurality of buffer wall materials installed to surround the sealing line 210 of the sealing box part 200, and the adjacent buffer wall materials of the pair of buffer chamber parts 300 are at least partially The buffer line 310 may be formed while being overlapped with each other.

A plurality of cushioning wall materials may be installed to surround the sealing line 210 .

A sealing line 210 is formed at the portion where the adjacent sealing wall materials of the pair of sealing box units 200 overlap, and the buffer line 310 at the portion where the adjacent cushioning wall materials of the pair of buffer chamber portions 300 overlap. can be formed.

A pair of buffer chamber parts 300 may form a buffer line 310 in a state in which adjacent buffer wall materials are slidably overlapped.

The pair of buffer chamber parts 300 are arranged in a state in which adjacent buffer wall materials are slidably overlapped, and it is possible to minimize the inflow of outside air into the internal space of the buffer chamber part 300 through the buffer line 310 .

The pair of buffer chamber parts 300 maintain the overlapping state even when the wiping part 100 is moved between the buffer wall materials disposed to overlap, while the inflow of external air into the internal space of the buffer chamber part 300 is minimized. The inner space of the buffer chamber part 300 may be maintained in a state filled with an inert gas.

Specifically, the buffer chamber part 300 includes a first buffer wall material 301 provided in the front-rear direction of the wiping part 100 and a second buffer wall material 302 provided in the left-right direction of the wiping part 100 . can do. A third buffer wall material 303 may be formed on the upper side of the buffer box part.

The pair of buffer chamber parts 300 may form a buffer line 310 while overlapping the second buffer wall materials 302 provided in the left and right directions of the wiping part 100 among the plurality of buffer wall materials.

The buffer chamber part 300 and the sealing box part 200 may move together with the wiping part 100 .

As an example, the buffer chamber part 300 and the sealing box part 200, the wiping part 100 is integrally fixed to the wiping arm, and when the wiping arm moves, the wiping part 100, the sealing box part 200 and, The buffer chamber part 300 may move together integrally.

That is, the sealing wall of the sealing box part 200 and the buffer wall of the buffer chamber part 300 may be moved at the same time in an integrally coupled state.

4 and 7 , the buffer chamber part 300 may be installed so as to surround the sealing line 210 of the sealing box part 200 in the direction of the sealing box part 200 so as to be able to be installed in close contact. . The buffer chamber part 300 may be installed to be in close contact with the sealing box part 200 in the direction to surround the sealing line 210 of the sealing box part 200 or to be able to release the adhesion.

The buffer chamber part 300 is not installed integrally with the wiping part 100 and the sealing box part 200, and may be installed separately from the wiping part 100 and the sealing box part 200 to be individually movable. have.

That is, in the buffer chamber part 300 , the wiping part 100 and the sealing box part 200 may not move together, and may be fixed to the fixed structure through the close contact driving part 400 .

In addition, when the wiping unit 100 and the sealing box unit 200 move together to adjust the distance between the wiping unit 100 and the steel plate S, the buffer chamber unit 300 does not move together with the wiping unit 100. If not, there is an effect that can prevent quality defects of the steel sheet (S) in advance by more stably creating a non-oxidizing atmosphere in the inner space of the sealing box unit 200 .

Referring to FIG. 7 , the anti-oxidation device is fixed to a fixed structure and further includes a close contact driving unit 400 for adhering the buffer chamber unit 300 to the sealing line 210 direction of the sealing box unit 200 . can

The close contact driving unit 400 may closely contact the buffer chamber unit 300 in the direction of the sealing line 210 of the sealing box unit 200 through an elastic force in a state in which it is fixed to the fixed structure.

The buffer chamber part 300 may be connected to the fixed structure through the close contact driving part 400 .

For example, the fixing structure may be a wiping arm on which the wiping unit 100 is installed.

7 , when the overlapping portion of the sealing wall material of the sealing box unit 200 together with the wiping unit 100 moves, the close contact driving unit 400 closes the buffer chamber unit 300 to the sealing box unit 200 , as shown in the right part of FIG. 7 . The overlapping part of the sealing wall material can be moved smoothly because it does not adhere to it.

As shown in the left part of Figure 7, the movement of the overlapping portion of the sealing wall material of the sealing box unit 200 is finished, and before plating the steel plate (S), the adhesion driving unit 400 closes the buffer chamber unit 300 to the sealing box. It can be closely attached to the part 200 .

Referring to FIG. 7 , the close contact driving unit 400 includes a close contact frame 410 fixed to a fixed structure, and one end is fixed to the buffer chamber unit 300 , and an adjustment nut 440 installed at the other end is adjusted. and an adjustment rod member 430 that is movably installed on the close contact frame 410, and an elastic member 450 that is provided between the buffer chamber 300 and the close contact frame 410 to provide an elastic force. can be provided

The close contact frame 410 may be installed in a fixed structure, and the adjusting rod member 430 may be movably installed in the close contact frame 410 .

One end of the adjustment rod member 430 is fixed to the buffer chamber portion 300 and adjusts the tightening force of the adjustment nut 440 installed at the other end of the adjustment rod member 430 in a state that penetrates the close contact frame 410 . Thus, the adjustment rod member 430 can be moved on the close contact frame 410 .

For example, one end of the control rod member 430 is fixed to the buffer chamber part 300 by welding, or a nut fixed to one end of the control rod member 430 is welded to the buffer chamber part 300 . can be fixed by

When the adjustment nut 440 installed on the other end of the adjustment rod member 430 is rotated in the forward direction, the adjustment rod member 430 is moved on the close contact frame 410 toward the sealing box 200 in the direction of the adjustment rod member ( The buffer chamber part 300 fixed to the 430 may be in close contact with the sealing box part 200 .

When the adjusting nut 440 installed on the other end of the adjusting rod member 430 is rotated in the reverse direction, the adjusting rod member 430 moves in the opposite direction of the sealing box unit 200 on the contact frame 410 in the opposite direction. The buffer chamber part 300 fixed to the member 430 may be released from adhesion in the sealing box part 200 .

The elastic member 450 serves to provide an elastic force to closely contact the buffer chamber part 300 in the direction of the sealing box part 200 .

The elastic member 450 is provided between the buffer chamber part 300 and the close contact frame 410, and the adjustment rod member 430 may be installed therethrough.

The elastic member 450 relaxes the elastic member 450 when the adjustment rod member 430 moves in the direction of the sealing box 200 while the adjustment nut 440 is adjusted, and is a buffer chamber fixed to the adjustment rod member 430 . The part 300 may be in close contact with the sealing box part 200 while being pressed by the elastic member 450 .

The elastic member 450 is compressed when the adjustment rod member 430 moves in the opposite direction to the sealing box 200 while the adjustment nut 440 is adjusted, and the cushioning member fixed to the adjustment rod member 430 is compressed. The chamber unit 300 may be released from adhesion in the sealing box unit 200 .

Referring to FIG. 7 , the close contact driving unit 400 includes a close contact mode in which the buffer chamber unit 300 is in close contact with the sealing box unit 200 in the direction, and the sealing box unit 200 is the wiping unit 100 . When moving together, it may be provided with an adhesion release mode for releasing the adhesion between the buffer chamber part 300 and the sealing box part 200 .

In the close contact mode, as shown in the left part of FIG. 7 , the buffer chamber part 300 is in close contact with the sealing box part 200 in the direction.

The reason why the close mode is necessary is, the buffer chamber part 300 is not installed integrally with the wiping part 100 and the sealing box part 200, and the buffer chamber part 300 moves in the sealing box part 200 direction. This is because, when possible, the buffer chamber part 300 needs to be in close contact in the direction of the sealing box part 200 in order to maintain a state in which the inert gas is filled in the buffer chamber part 300 . The mode is a state in which the close contact between the buffer chamber part 300 and the sealing box part 200 is released, as shown in the right part of FIG. 7 .

The reason why the adhesion release mode is required is that, when the buffer chamber part 300 is in close contact with the sealing box part 200 , the sealing box part 200 moving together with the wiping part 100 cannot move smoothly.

Specifically, in the close mode, the movement of the overlapping portion of the sealing wall material of the sealing box unit 200 is finished, and before plating the steel plate (S), the close contact driving unit 400 closes the buffer chamber unit 300 to the sealing box unit ( 200) to keep the inside of the buffer chamber 300 filled with an inert gas.

It goes without saying that a gas supply unit (not shown) is installed in the buffer chamber part 300 , and an inert gas may be supplied to the interior of the buffer chamber part 300 .

The second internal pressure of the buffer chamber part 300 may be equal to or greater than the first internal pressure of the sealing box part 200 .

The second internal pressure of the buffer chamber part 300 is maintained equal to or higher than the first internal pressure of the sealing box part 200, so that the internal pressure is momentarily reduced due to an increase in the volume of the sealing box part 200. In this case, as the inert gas filled in the buffer chamber part 300 flows through the gap portion of the sealing line 210 , it is possible to more smoothly prevent external oxygen from flowing into the inner space of the sealing box part 200 .

In addition, the first internal pressure of the sealing box unit 200 may be maintained relatively larger than the external atmospheric pressure.

The first internal pressure of the sealing box unit 200 is maintained relatively higher than the external atmospheric pressure, so that it is possible to more smoothly prevent external oxygen from flowing into the inner space of the sealing box unit 200 .

The second internal pressure of the buffer chamber part 300 may be maintained relatively larger than the external atmospheric pressure.

The buffer chamber part 300 is configured to maintain an internal pressure greater than the external atmospheric pressure, thereby preventing external oxygen from flowing into the internal space of the buffer chamber part 300 in advance.

Therefore, the internal space of the buffer chamber 300 is maintained in a state in which an inert gas such as nitrogen is filled, and the inflow of oxygen is minimized to allow external oxygen to pass through the clearance portion of the sealing line 210 into the sealing box unit 200 . ) can be prevented more smoothly from entering the internal space.

In addition, the first internal pressure of the sealing box unit 200 may be maintained relatively larger than the external atmospheric pressure.

The second volume space in which the inert gas is filled in the buffer chamber part 300 may be configured in a ratio of 5 to 20% of the first volume space in which the inert gas is filled in the sealing box part 200 .

The first volume space is a volume of the inner space filled with the inert gas in the sealing box unit 200 , and the second volume space is the volume of the inner space filled with the inert gas in the buffer chamber unit 300 .

At this time, the reason why the second volume space is composed of 5 to 20% of the first volume space is as follows.

First, when the second volume space is composed of a ratio of less than 5% of the first volume space, oxygen introduced through the buffer line 310 of the buffer chamber part 300 is transferred to the sealing box part through the sealing line 210 . This is because a quality defect may occur as it flows into the interior of (200).

Next, when the second volume space is composed of a ratio exceeding 20% of the first volume space, it is possible to prevent oxygen from flowing into the inside of the sealing box unit 200 through the sealing line 210, This is because, as the buffer chamber 300 becomes excessively large, economic feasibility due to excessive design may become a problem.

For example, when the first volumetric space is 1 m 3 , the second volumetric space may be configured to be 0.05 to 0.2 m 3 .

The buffer chamber part 300 is installed to form a pair with the sealing box part 200 interposed therebetween. In this case, the second volume space in which the pair of buffer chamber parts 300 is filled with an inert gas is the sealing box part. (200) may be composed of a ratio of 5 to 20% of the first volume space filled with an inert gas.

For example, the first volume space may be a volume of the inner space of the portion filled with the inert gas in the inner space of the sealing box unit 200 except for the inner space in which the wiping unit 100 is installed.

The oxidation prevention device may further include a gas supply unit (not shown) for supplying an inert gas to the inside of the buffer chamber unit 300 .

The gas supply unit (not shown) may include a supply pipe connected to the buffer chamber unit 300 , a supply tank connected to the supply pipe and storing an inert gas, and the like.

The gas supply unit (not shown) continuously supplies an inert gas such as nitrogen to the inside of the buffer chamber 300 to more stably create a non-oxidizing atmosphere in the inner space of the sealing box 200 to improve the quality of the steel plate (S). It has the effect of preventing defects in advance.

Hereinafter, with reference to FIGS. 8A to 11 , a case in which the buffer chamber part 300 is not installed in the sealing box part 200 (case 1), and the buffer chamber part 300 in the sealing box part 200 is The experimental process for evaluating the degree of inflow of outside air in the installed case (case 2) will be described.

8a is a view showing a case where the buffer chamber part 300 is not installed in the sealing box part 200 (case 1), and FIG. 8b is a case where the buffer chamber part 300 is installed in the sealing box part 200 It is a diagram showing (case 2).

8A and 8B show the sealing box unit 200 when the distance between the wiping unit 100 and the steel plate S is changed with respect to the sealing box unit 200 moving integrally with the wiping unit 100 in case 1 and case 2 ( 200) shows the dynamic simulation conditions for the intrusion of external oxygen into the internal space.

In actual operation, the distance between the wiping part 100 and the steel plate S is changed at the time when the coating amount condition of the steel plate S is changed, but in this experiment, the change timing is reduced so that it changes periodically in consideration of the calculation load during dynamic analysis.

The distance between the wiping part 100 and the steel plate S is periodically moved to a size of ±5 mm, and the sealing box part 200 and the buffer chamber part 300 are initially filled with nitrogen (N2), and the wiping part ( 100) was calculated under the condition that all of the nitrogen injected from the sealing box 200 exits with the steel plate S to the upper portion.

Referring to FIGS. 8A and 9 , in case 1, the sealing line 210 in which the outer clearance portion of the sealing box unit 200 is formed is exposed to atmospheric pressure.

9 shows the movement of oxygen entering the sealing box 200 when the sealing box unit 200 moves together with the wiping unit 100 in Case 1 .

When the sealing box unit 200 moves together with the wiping unit 100, the volume of the inner space of the sealing box unit 200 fluctuates according to the movement cycle of the wiping unit 100. When the volume increases, oxygen is released to the outside. It can be seen that the concentration of oxygen in the interior space increases with time.

Referring to FIGS. 8b and 10 , in case 2, the sealing line 210 in which the outer clearance portion of the sealing box 200 is formed is exposed to the inner space of the buffer chamber 300, and in case 2, the buffer chamber part The buffer line 310 in which the outer gap portion of the 300 is formed is exposed to atmospheric pressure.

10 shows the movement of oxygen entering the sealing box unit 200 when the sealing box unit 200 with the buffer chamber unit 300 mounted on the side moves together with the wiping unit 100 in Case 2 are giving

As shown in FIG. 10 , it can be seen that the amount of oxygen introduced into the sealing box 200 is significantly reduced in case 2 compared to case 1 .

It can be seen that the nitrogen atmosphere inside the sealing box unit 200 due to the outside air is not greatly affected even considering that nitrogen is filled in the initial buffer chamber part 300 and nitrogen is no longer supplied. .

11 shows the results of measuring the oxygen concentration change in the sealing box unit 200 over time for Case 1 and Case 2 .

As shown in the graph, when the volume of the sealing box unit 200 increases, the oxygen concentration increases, and when the volume decreases again, it shows a slightly decreasing trend.

However, since the amount of oxygen introduced is significantly greater than the amount discharged, the oxygen concentration inside the sealing box 200 increases with the passage of time.

This is conspicuously shown in the case where the buffer chamber part 300 is not installed (Case 1), and it can be seen that the increase width of the oxygen concentration is small when the buffer chamber part 300 is installed (Case 2).

Although the embodiments of the present invention have been described in detail above, the scope of the present invention is not limited thereto, and various modifications and variations are possible within the scope without departing from the technical spirit of the present invention described in the claims. It will be apparent to those of ordinary skill in the art.

100: wiping unit 200: sealing box unit
201: first sealing wall material 202: second sealing wall material
203: third sealing wall material 210: sealing line
300: buffer chamber portion 301: first buffer wall material
302: second buffer wall material 303: third buffer wall material
310: buffer line 400: close driving unit
410: close contact frame 430: control rod member
440: adjustment nut 450: elastic member
500: passage control unit P: plating tank
Q: Air knife S: Steel plate

Claims (9)

A pair of wiping units are installed to control the thickness of the plating layer by spraying gas to the steel sheet;
a sealing box unit installed integrally with the wiping unit to move together, and provided with a pair to surround the wiping unit to create a non-oxidizing atmosphere; and;
and a buffer chamber part in which at least a portion of the pair of sealing box parts is installed to surround a sealing line overlapping each other, and is filled with an inert gas.
According to claim 1, wherein the buffer chamber portion,
Antioxidation device, characterized in that the buffer line is installed integrally installed in the sealing box to move together, and at least a part of the buffer line overlaps each other while a pair is installed to surround the sealing line.
According to claim 1, wherein the buffer chamber portion,
Antioxidation device, characterized in that it is installed in close contact with the sealing box portion so as to surround the sealing line of the sealing box portion.
4. The method of claim 3,
The oxidation prevention device further comprising a; is fixed to the fixed structure, the close contact driving portion for contacting the buffer chamber portion in the sealing line direction of the sealing box portion.
The method of claim 4, wherein the close driving unit,
Adherence frame fixed to the fixed structure;
an adjustment rod member having one end fixed to the buffer chamber portion and movably installed on the close contact frame by adjusting an adjustment nut installed on the other end portion; and;
An oxidation prevention device comprising a; an elastic member provided between the buffer chamber portion and the close contact frame to provide an elastic force.
The method of claim 4, wherein the close driving unit,
a close contact mode for adhering the buffer chamber in a direction toward the sealing box; and;
and an adhesion release mode for releasing the adhesion between the buffer chamber and the sealing box when the sealing box and the wiping portion move together.
According to claim 1,
The second internal pressure of the buffer chamber is equal to or higher than the first internal pressure of the sealing box.
According to claim 1,
Antioxidation device, characterized in that the second internal pressure of the buffer chamber portion is maintained relatively larger than the atmospheric pressure outside.
According to claim 1,
Oxidation prevention device further comprising a; gas supply for supplying an inert gas to the inside of the buffer chamber.

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