KR20210048832A - Heater using Surface Treatment OMO Transparent Conductive Electrodes - Google Patents

Abstract

The present invention relates to a heating device using a surface treatment OMO transparent electrode to optimize performance by controlling the thickness of each layer constituting the transparent electrode using metal oxide surface treatment. The heating device using a surface treatment OMO transparent electrode comprises: a substrate; a lower metal oxide layer stacked sequentially on the substrate; a metal layer; and an upper metal oxide layer, wherein the metal layer is formed to a minimum thickness forming a continuous thin film, and when the sheet resistance is equal to or less than 10 Ω/Sq., the thickness of the lower metal oxide layer and the upper metal oxide layer is determined as the thickness in which maximum transmittance and average visible light transmittance are maximized. The heating device using a surface treatment OMO transparent electrode further comprises a power supply unit supplying heating power to the metal layer.

Description

Surface treatment ＯＭＯ heating device using transparent electrode {Heater using Surface Treatment ＯＭＯ Transparent Conductive Electrodes}

The present invention relates to a heating device, and more particularly, to a heating device using a surface-treated OMO transparent electrode capable of optimizing performance by controlling the thickness of each layer constituting a transparent electrode by using a metal oxide surface treatment.

In general, the glass surface of the exterior window of the building, the glass surface of the refrigerator case, the surface of the automobile glass, or the mirror of the bathroom are formed of transparent materials to allow light to pass through. Phenomena such as condensation occur due to condensation.

In this case, a method of preventing fogging by blowing warm air or using a surfactant was generally used to prevent phenomena such as fogging, but these methods not only take a long time to remove fogging, but also have a limited rate of fogging. It was merely a temporary means.

Recently, a method of directly heating the glass surface by attaching a separate heating wire to the glass surface has been used, but since such a heating wire is recognized by the user's eyes, the glass surface cannot be maintained in a transparent and clean state. It is not widely used due to deterioration of transparency and inconvenience.

As a device capable of removing fogging and frost through direct heating to the glass surface, such as such a heating wire, a transparent heater has been developed and used. Such a transparent heater directly heats the glass surface by receiving heat by receiving external power. Works in a way.

Currently, most of the transparent electrodes used for commercial use are Indium Tin Oxide (ITO), which has a transmittance of 80% in the visible light region and a low sheet resistance approaching 10Ω/Sq.

However, in order to improve properties along with expensive indium, it has a disadvantage in terms of productivity because crystallization through heat treatment of 250°C or higher is required, and there is a limitation that it is difficult to use a temperature-sensitive substrate such as a polymer.

Therefore, in order to develop a transparent electrode that has the permeability and sheet resistance characteristics of the ITO electrode even at room temperature, various forms such as graphene, carbon nanotubes, Ag nanowires, PEDOT:PSS (poly(3,4-ethylenedioxythiophene) polystyrene sulfonate), etc. Research on transparent electrodes using materials is actively underway.

Among the transparent electrodes that have been developed so far, metal microgrids made by vacuum deposition are the only ones that can satisfy the transparency and electrical conductivity required by a transparent heater for a vehicle windshield.

However, since microelectrodes are made using the exposure process, it is practically difficult to make the width of the electrode smaller than 2㎛, and line widths exceeding 2㎛ may interfere with the visibility of passengers and drivers through light scattering or reflection. .

In addition, since microelectrodes are usually formed on a flat surface, serious mechanical damage may occur when the vehicle glass is bent into a desired shape.

As is known, since the windshield of a vehicle is in the form of two cages bonded together, a method of forming microelectrodes on the adhesive film that goes between the two glass plates can be considered, but the roughness of the adhesive film surface is over several tens of μm to form microelectrodes on the adhesive film. It is also very difficult to do.

Accordingly, there is a need to develop a new technology to optimize the heating performance by controlling the thickness of each layer constituting the transparent electrode.

Korean Patent Registration No. 10-1579869 Korean Patent Registration No. 10-1523325 Republic of Korea Patent Publication No. 10-2008-0054317

The present invention is to solve the problem of a heating device using a transparent electrode of the prior art, and a surface treatment OMO transparent to optimize performance by controlling the thickness of each layer constituting the transparent electrode by using a metal oxide surface treatment. An object thereof is to provide a heating device using an electrode.

The present invention is to provide a heating apparatus using a surface-treated OMO transparent electrode in which an OMO transparent electrode is composed of a ZnO/Ag/ZnO transparent electrode, and an Ar plasma surface treatment is applied to the lower ZnO layer to control changes in the characteristics of the transparent electrode. There is this.

An object of the present invention is to provide a heating apparatus using a surface-treated OMO transparent electrode having a structure in which upper and lower ZnO layers prevent light reflection and oxidation, and lower ZnO layers have a structure to improve the wettability of Ag.

An object of the present invention is to provide a heating apparatus using a surface-treated OMO transparent electrode that can increase the size of crystal grains and increase the usability by reducing the sheet resistance and improving the transmittance by reducing the thickness of the continuous thin film.

The present invention optimizes the thickness of the metal layer and the upper and lower ZnO layers in order to maximize the performance of the ZnO/Ag/ZnO transparent electrode, and thus 10 Ω/Sq. An object thereof is to provide a heating device using a surface-treated OMO transparent electrode capable of increasing the transmittance of the visible light region while achieving the following.

Other objects of the present invention are not limited to the above-mentioned objects, and other objects not mentioned will be clearly understood by those skilled in the art from the following description.

A heating apparatus using a surface-treated OMO transparent electrode according to the present invention for achieving the above object includes: a substrate; a lower metal oxide layer sequentially stacked on the substrate; Metal layer; And an upper metal oxide layer, wherein the metal layer is formed to have a minimum thickness forming a continuous thin film, and the thicknesses of the lower metal oxide layer and the upper metal oxide layer are set to have a sheet resistance of 10 Ω/Sq. In the following state, the maximum transmittance and the average transmittance of visible light are determined to be the maximum thickness, and a power supply unit for supplying heating power to the metal layer.

A heating apparatus using a surface-treated OMO transparent electrode according to the present invention for achieving another object comprises: a substrate; a lower metal oxide layer sequentially stacked on the substrate; Metal layer; And an upper metal oxide layer, wherein the metal layer is formed to have a minimum thickness forming a continuous thin film, and the thicknesses of the lower metal oxide layer and the upper metal oxide layer are set to have a sheet resistance of 10 Ω/Sq. In the following conditions, the maximum transmittance and the average transmittance of visible light are determined as the maximum thickness, and the surface roughness of the lower metal oxide layer is controlled by the surface treatment of the lower metal oxide layer to improve the wettability of the metal layer to be laminated later. And a configuration in which the thickness of the metal layer is controlled by suppressing the formation of nuclei due to type 3D growth, and a power supply unit for supplying heating power to the metal layer.

Here, the metal layer is Ag and is characterized in that it is fixed to a minimum thickness of 8 nm that forms a continuous thin film.

In addition, the lower metal oxide layer and the upper metal oxide layer are ZnO, the thickness of the lower metal oxide layer is 20-30 nm, and the thickness of the upper metal oxide layer is 40 nm.

The heating apparatus using the surface-treated OMO transparent electrode according to the present invention as described above has the following effects.

First, it is possible to optimize the performance by controlling the thickness of each layer constituting the transparent electrode of the heating device by using a metal oxide surface treatment.

Second, the OMO transparent electrode is composed of a ZnO/Ag/ZnO transparent electrode, and an Ar plasma surface treatment is performed on the lower ZnO layer to control the change in characteristics of the transparent electrode, thereby improving heating performance.

Third, the upper and lower ZnO layers prevent light reflection and oxidation, and the lower ZnO layer is made of an OMO transparent electrode so as to have a structure that improves the wettability of Ag, thereby increasing the utility as a transparent electrode of a heating device.

Fourth, the thickness of the continuous thin film can be reduced while increasing the size of the crystal grains, thereby reducing the sheet resistance and improving the transmittance, thereby increasing the utility of the heating device as a transparent electrode.

1 is a block diagram of a heating device using a surface-treated OMO transparent electrode according to the present invention
Figure 2 is a graph of the results of sheet resistance when the Ag thickness is changed in the range of 6-12 nm for the (Glass/Ag) and (Glass/ZnO/Ag/ZnO) structures
3 is an FE-SEM micrograph showing the shape of the Ag layer for Glass/Ag (8 nm) and Glass/ZnO (30 nm)/Ag (8 nm)

Hereinafter, a preferred embodiment of a heating device using a surface-treated OMO transparent electrode according to the present invention will be described in detail.

Features and advantages of the heating apparatus using the surface-treated OMO transparent electrode according to the present invention will become apparent through detailed description of each embodiment below.

1 is a block diagram of a heating apparatus using a surface-treated OMO transparent electrode according to the present invention.

Recently, researches on OMO transparent electrodes having an oxide/metal/oxide structure are also actively underway, paying attention to the high electrical conductivity of metals and high visible light transmittance at a thickness less than the skin depth.

The performance of the Ag thin film-based OMO transparent electrode mainly depends on the thickness and surface shape of the Ag layer. As the thickness of the Ag thin film decreases, the 3D island growth phenomenon becomes remarkable.

Therefore, it is quite difficult to obtain an ultra-thin Ag film while maintaining the shape of a continuous thin film. As the film thickness increases, the problem of film continuity can be alleviated.

However, this is a'trade-off' phenomenon in which the light transmittance decreases proportionally.

In order to minimize this problem, it is necessary to increase the electrical conductivity by forming a continuous thin film with a thinner thickness and reduce the decrease in light transmittance due to the increase in thickness.

However, research and development on structural, optical, and electrical characteristics by controlling the thickness of each layer constituting the ZnO/Ag/ZnO transparent electrode structure has not been conducted in earnest.

In particular, the development of a heating device using such a ZnO/Ag/ZnO transparent electrode has not been made in earnest.

In the present invention, in order to control the thickness of each layer constituting the transparent electrode of the heating device, ZnO is deposited on the substrate, and Ar plasma surface treatment is performed, so that Ar collides with the ZnO layer and sputtering occurs, resulting in the surface roughness of the ZnO layer. Is to reduce.

(Example 1)

The heating device using the surface-treated OMO transparent electrode according to the first embodiment of the present invention includes a lower metal oxide layer 20 and a metal layer 30 in which a heating device using a surface-treated OMO transparent electrode is sequentially stacked on the substrate 10. , Including the upper metal oxide layer 40, forming the metal layer 30 to a minimum thickness forming a continuous thin film, the thickness of the lower metal oxide layer 20 and the upper metal oxide layer 40, sheet resistance Is 10 Ω/Sq. In the following state, it includes a configuration in which the maximum transmittance and the average transmittance of visible light are determined to be the maximum thickness, and includes a power supply for supplying heating power to the metal layer 30.

(Second Example)

The heating device using the surface-treated OMO transparent electrode according to the second embodiment of the present invention includes a lower metal oxide layer 20, a metal layer 30, and an upper metal oxide layer 40 that are sequentially stacked on the substrate 10. In addition, the metal layer 30 is formed to have a minimum thickness forming a continuous thin film, and the thickness of the lower metal oxide layer 20 and the upper metal oxide layer 40 is set, and the sheet resistance is 10 Ω/Sq. In the following state, the thickness at which the maximum transmittance and average transmittance of visible light is the maximum is determined, and the surface roughness of the lower metal oxide layer 20 is controlled by the surface treatment of the lower metal oxide layer 20, and the metal layer 30 to be laminated thereafter. ) By improving the wettability of Volmer-Weber type 3D growth to suppress the formation of nuclei, thereby controlling the thickness of the metal layer 30, and including a power supply for supplying heating power to the metal layer 30. will be.

In the heating apparatus using the surface-treated OMO transparent electrode according to the present invention, it is preferable that the metal layer 30 is Ag and is fixed to a minimum thickness of 8 nm forming a continuous thin film.

In addition, the lower metal oxide layer 20 and the upper metal oxide layer 40 are ZnO, the thickness of the lower metal oxide layer 20 is 20-30 nm, and the thickness of the upper metal oxide layer 40 is 40 nm. It is desirable.

The heating apparatus using the surface-treated OMO transparent electrode according to the present invention having such a structure is made to have the following characteristics by plasma surface treatment.

Figure 2 is a graph of the sheet resistance results when the Ag thickness is changed in the range of 6-12 nm for the (Glass/Ag) and (Glass/ZnO/Ag/ZnO) structures, and FIG. This is an FE-SEM micrograph showing the shape of the Ag layer for Glass/ZnO(30 nm)/Ag(8 nm).

2 is a sheet resistance result when the Ag thickness is changed in the range of 6-12 nm for the (Glass/Ag) and (Glass/ZnO/Ag/ZnO) structures.

At a thickness of less than 8 nm, the sheet resistance of the Glass/ZnO/Ag/ZnO electrode was significantly lower than that of the Glass/Ag electrode, and at a thickness above that, the Glass/Ag electrode had a lower sheet resistance.

As shown in FIG. 3, the difference in sheet resistance at a thickness of 8 nm or less suppresses the formation of nuclei by 3D growth in the form of Volmer-Weber by improving the wettability of the Ag layer on which the deposited lower ZnO layer is subsequently deposited, as shown in FIG. This is because the nuclei of

When the growth of the Ag continuous thin film was completed at a thickness of 10 nm or more, an increase in sheet resistance was observed due to activation of electron scattering due to such small grain size.

In the present invention, the thickness of the Ag layer in the ZnO/Ag/ZnO electrode structure is fixed to 8 nm, which is close to the continuous thin film, so that 10 Ω/Sq. In the state of securing the following sheet resistance, the transmittance was optimized according to the thickness change of the upper and lower ZnO layers.

The heating device using the surface-treated OMO transparent electrode according to the present invention described above optimizes the thickness of the metal layer and the upper and lower ZnO layers to maximize the performance of the ZnO/Ag/ZnO transparent electrode. Sq. It is to provide a heating device using a surface-treated OMO transparent electrode capable of increasing the transmittance of the visible light region while achieving the following.

As described above, it will be understood that the present invention is implemented in a modified form without departing from the essential characteristics of the present invention.

Therefore, the specified embodiments should be considered from a descriptive point of view rather than a limiting point of view, and the scope of the present invention is shown in the claims rather than the above description, and all differences within the scope equivalent thereto are included in the present invention. It will have to be interpreted.

10. Substrate
20. Lower ZnO layer
30. Ag layer
40. Upper ZnO layer

Claims (4)

Board;
A lower metal oxide layer sequentially stacked on the substrate; Metal layer; Including; an upper metal oxide layer,
The metal layer is formed to have a minimum thickness forming a continuous thin film, and the thicknesses of the lower metal oxide layer and the upper metal oxide layer are set to have a sheet resistance of 10 Ω/Sq. In the following state, the maximum transmittance and the average transmittance of visible light are determined to be the maximum thickness,
Heating device using a surface-treated OMO transparent electrode, characterized in that it comprises a power supply for supplying heating power to the metal layer. Board;
A lower metal oxide layer sequentially stacked on the substrate; Metal layer; Including; an upper metal oxide layer,
The metal layer is formed to have a minimum thickness forming a continuous thin film, and the thicknesses of the lower metal oxide layer and the upper metal oxide layer are set to have a sheet resistance of 10 Ω/Sq. In the state below, the maximum transmittance and the average transmittance of visible light are determined as the maximum thickness,
Structure to control the thickness of the metal layer by controlling the surface roughness of the lower metal oxide layer by surface treatment of the lower metal oxide layer to improve the wettability of the metal layer to be laminated later to suppress the formation of nuclei by Volmer-Weber type 3D growth. Including,
Heating device using a surface-treated OMO transparent electrode, characterized in that it comprises a power supply for supplying heating power to the metal layer. The heating apparatus using a surface-treated OMO transparent electrode according to claim 1 or 2, wherein the metal layer is Ag and is fixed to a minimum thickness of 8 nm that forms a continuous thin film. The method of claim 1 or 2, wherein the lower metal oxide layer and the upper metal oxide layer are ZnO,
A heating apparatus using a surface-treated OMO transparent electrode, characterized in that the thickness of the lower metal oxide layer is 20-30 nm, and the thickness of the upper metal oxide layer is 40 nm.

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