KR20210014002A - Fabrication equipment of visible parylene film - Google Patents

Abstract

The present invention relates to equipment for forming a visible parylene film and, more specifically, to equipment for forming a visible parylene film which can simultaneously form parylene films with two or more types of materials or conditions by a single piece of equipment to secure visibility, have excellent insulation, maximize material use efficiency through a bypass unit (60), and improve film forming speed. According to the present invention, the equipment for forming a visible parylene film comprises: an evaporation unit (10) to evaporate dimer parylene; a decomposition unit (20) to heat dimer parylene supplied from the evaporation unit (10) to convert the dimer parylene into monomer parylene; a deposition chamber (30) to form a polymer film layer through dimer parylene and monomer parylene received from the decomposition unit (20); a cold trap (40) to condense a parylene byproduct; and a vacuum pump (50) which performs control to maintain a vacuum.

Description

Visibility Perline Film Formation Equipment {FABRICATION EQUIPMENT OF VISIBLE PARYLENE FILM}

The present invention relates to an equipment for forming a visible ferralin film, and more particularly, since one equipment can simultaneously form a feralin film with two or more materials or conditions, it can be coated to have excellent insulation while securing visibility. , It relates to a visible ferrule film deposition equipment capable of maximizing material use efficiency and improving the deposition rate through a bypass unit.

In general, medical devices, identification cards (e.g., resident registration cards, driver's licenses, passports, corporate identification cards/passports, etc.), semiconductors, electronic devices, bi-chips, needles, needles, etc. are coated with insulation through polymer materials with high chemical corrosion resistance and thermal stability. Insulation coating generally includes a Teflon coating and a parylene coating.

Teflon coating was performed by pretreating the object at high temperature and coating the object with a solution process, but defects such as pinholes occur in the film, and it is difficult to coat because it adheres to the surface of the object, and it is coated with a thickness of 10㎛ or more. Since it is difficult to coat the object and it has to be coated in one direction by a spray method, there is a problem in that it takes a long process time since solution spraying and drying must be repeated several times to coat a three-dimensional object.

On the contrary, unlike Teflon coating, in the case of Parylene coating, organic single molecules in the form of powder are vaporized in a vacuum to form a transparent thin film on the surface of the object. Since it can have a high specific resistance value obtained from Teflon coating, the film processing time is shortened while securing the same insulation.

In addition, the feralin coating has the advantage of forming a coating film of uniform thickness and quality even in fine gaps, structures, and structures with irregularities due to its excellent coating properties.It is excellent in insulation, water resistance, corrosion resistance, and is chemically very stable. In addition, since it is not easily soluble in any existing chemical solvents, it has been widely used for electronic packaging.

However, the conventional ferrule coating performs a high-temperature process for excellent insulation, but since the high-temperature process lowers visibility, it is coated very transparently and the coated portion is not visible with the naked eye.

Accordingly, there is a problem in that it is difficult to inspect and check the defect rate when ferrule is coated for partial insulation on semiconductor chip sockets and pins.

In addition, in order to improve the visibility of the ferrule coating, when the process is performed at a low temperature, there is a limitation in that the visibility and insulation properties cannot be satisfied at the same time because insulation is deteriorated.

Korean Patent Registration No. 10-1649620 (2016.08.12)

The present invention is to solve the above problems, and an object of the present invention is a visibility ferrule capable of simultaneously forming a ferrule film under two or more conditions so as to have visibility and excellent insulation so that coating can be checked with the naked eye. It is to provide lean film forming equipment.

According to a feature of the present invention for achieving the above object, the present invention vaporizes the dimer feralin in powder form, the vaporization unit provided with a first discharge pipe and a second discharge pipe through which the vaporized dimer feralline is discharged; The dimer feralin gas introduced from the vaporization unit is heated to convert it into monomeric ferralin, one side of which is connected to the first discharge pipe and the other side of the first decomposition chamber connected to the first transfer pipe, and one side of the second discharge pipe A disassembly unit including a second dissolution chamber connected and the other side connected to the second transfer pipe; A deposition chamber for forming a polymer film film through dimer feralin and monomer feralin supplied from the decomposition unit; A cold trap condensing the feralline by-product transferred from the decomposition unit or the deposition chamber; And a vacuum pump connected to the cold trap and controlling the vaporization unit, the decomposition unit, the deposition chamber, and the cold trap to maintain a vacuum.

In addition, one side is connected to the first transfer pipe and the second transfer tube, respectively, and the other side is connected to the cold trap, so that the dimer feralin and monomer feralin of the first and second decomposition chambers are selectively selected as the cold trap. It further includes; a bypass unit including a pair of first bypass units to be transferred to.

In addition, the vaporization unit includes a first vaporization chamber in which the first discharge pipe is installed, and a second vaporization chamber in which the second discharge pipe is installed, and the bypass part is connected to the second discharge pipe and the other side is a first transfer. Further comprising a second bypass unit connected to the first bypass unit installed in the pipe, wherein the second bypass unit transfers the dimer feralin and the monomer feralin of the first decomposition chamber to the second decomposition chamber through the second discharge pipe. Optionally supplied with

In addition, the bypass unit is a pair of third bypasses installed in the first discharge pipe and the second discharge pipe to selectively supply the dimer feralin vaporized in the vaporization unit to the first and second decomposition chambers. Includes more wealth.

In addition, the vaporization unit controls the partial pressure of the dimer feralin gas by controlling the temperature within the range of 100 to 300°C, and the first and second cracking chambers control the temperature within the range of 300 to 800°C, respectively, Controls the gas ratio of feralin and monomeric feralin.

In addition, the deposition chamber is provided with a divider for diffusing the dimer feralin and the monomer feralin throughout the inner space.

According to the visibility feralin film forming equipment according to the present invention, since a feralin film can be simultaneously formed with two or more types of materials or conditions with one equipment, it is possible to identify the coated part with the naked eye, so that it has excellent insulation while securing visibility. There is an effect that can be coated.

In addition, according to the present invention, since the gas partial pressure can be independently controlled through temperature control of the vaporization unit and the decomposition unit, a uniform gas distribution can be achieved by controlling the ratio of dimer feralin and monomoferalin gas to improve surface uniformity. There are strengths that can be done.

In addition, according to the present invention, through a second bypass portion connected to the first bypass portion installed on one side of the second discharge pipe and the other side installed in the first transfer pipe, it is possible to reuse the feralline material, thereby minimizing material waste. There is an advantage in that the film formation speed can be improved.

In addition, according to the present invention, since one vaporization unit can be configured to be connected to a pair of decomposition units, there is an effect of reducing the manufacturing cost and simplifying the process.

1 is a conceptual diagram of a visible ferralin film deposition equipment according to a first embodiment of the present invention,
Figure 2 is an operation diagram showing a distributor according to the first embodiment of the present invention,
3 and 4 are operation diagrams showing a first bypass unit according to a first embodiment of the present invention;
5 is an operation diagram showing a second bypass unit according to the first embodiment of the present invention;
6 is a conceptual diagram of a visible feralin film deposition equipment according to a second embodiment of the present invention,
7 to 9 are operation diagrams showing a third bypass unit according to a second embodiment of the present invention.

Hereinafter, the apparatus for forming a visible ferrule film according to the present invention will be described with reference to the accompanying drawings.

First, a description will be given of a first embodiment of the apparatus for forming a visible ferrule film according to the present invention.

1 is a conceptual diagram of a visible ferrule film forming equipment according to a first embodiment of the present invention, FIG. 2 is an operation diagram showing a dispenser according to a first embodiment of the present invention, and FIGS. 3 and 4 are a first embodiment of the present invention. An operation diagram showing a first bypass unit according to the first embodiment, and FIG. 5 is an operation diagram showing a second bypass unit according to the first embodiment of the present invention.

As shown in Figs. 1 to 5, the visibility feralin film deposition equipment according to the present invention can simultaneously form a feralline film with two or more materials or conditions with one equipment, so coating to have excellent insulation while securing visibility It is a visible ferrule film deposition equipment capable of minimizing material waste and improving deposition speed through the bypass unit.

To this end, the visibility feralin film deposition equipment according to the present invention basically includes a vaporization unit 10, a decomposition unit 20, a deposition chamber 30, a cold trap 40, a vacuum pump 50, and a bypass unit 60. ).

The vaporization unit 10 heats and vaporizes the dimer feralin in powder form, and a first discharge pipe P1 and a second discharge pipe P2 are installed to discharge the vaporized dimer ferrule.

The vaporization unit 10 includes a first vaporization chamber 11 in which the first discharge pipe P1 is installed, and a second vaporization chamber 12 in which the second discharge pipe P2 is installed.

At this time, the first vaporization chamber 11 and the second vaporization chamber 12 may be arranged in parallel, so that the same type of ferrule may be injected, or different types of ferrule may be injected.

Through this, since the first vaporization chamber 11 and the second vaporization chamber 12 can vaporize various types of feralin at the same time, when two types of materials are added to the vaporization unit 10, two or more types of materials are mixed. As a result, deposition can be implemented.

Here, since the vaporization unit 10 can control the partial pressure of the dimer feralin gas by controlling the temperature within the range of 100 to 300°C, the speed of the polymer polymerization reaction can be controlled by controlling the film formation rate on the surface coated with the visible ferrule. You will be able to.

In addition, the vaporization unit 10 may be formed to enable separate venting, vacuum, or the like to enable continuous deposition.

The decomposition unit 20 functions to heat the dimer feralin gas introduced from the vaporization unit 10 to convert it into monomeric feralin.

The decomposition part 20 includes a first decomposition chamber 21 having one side connected to the first discharge pipe P1 and the other side connected to the first transfer pipe P3, and one side of the second discharge pipe P2. It is connected and the other side is configured to include a second decomposition chamber 22 connected to the second transfer pipe (P4).

The first decomposition chamber 21 and the second decomposition chamber 22 interlock with the temperature condition of the vaporization unit 10 and control the temperature within the range of 300 to 800°C, respectively, so that the first transfer pipe P3 And controlling the ratio of the gas between the dimer feralin and the monomer feralin transferred to the second transfer pipe P4.

The first decomposition chamber 21 and the second decomposition chamber 22 may control the same temperature within the range of 300 to 800°C, but the first decomposition chamber 21 and the second decomposition chamber 22 Since independent control is possible, each temperature can be controlled differently.

Through this, the temperature of the first decomposition chamber 21 and the second decomposition chamber 22 are controlled differently to control the transport fraction of the dimer feralin and the monomer feralin, and the feralin film is multilayered under two conditions. The tabernacle can be made.

As a specific example, the first decomposition chamber 21 is set to 300 to 600°C to be used as a visible ferrule forming unit, and the second decomposition chamber 22 is set to 600 to 800°C to be used as a transparent ferrule forming unit It can be used as a multi-layer process, and through this, it is possible to form a film having both visibility and insulation.

The deposition chamber 30 contains a dimer feralin and a monomer feralin supplied from the decomposition unit 20 through the first transfer pipe P3 and the second transfer pipe P4 in a temperature range of -283 to 200°C. A polymer film film is formed by diffusion on the surface of the object and polymerization reaction occurs on the surface of the object.

Here, it is preferable that the deposition chamber 30 maintains a pressure in the range of 0.1 mTorr to 1 Torr, and specifically, the most preferable pressure is 70 mTorr, but the pressure of the deposition chamber 30 is not limited to the above range, depending on conditions. It can be changed to a suitable pressure.

At this time, in the deposition chamber 30 under room temperature conditions, the monomer ferralin diffuses well, but the dimer feralin is difficult to diffuse due to the heavy particles, making it difficult to uniformly diffuse the monomeric ferralin and dimer feralin.

In order to prevent such non-uniform diffusion of dimer feralin and monomer feralin, it is preferable that the deposition chamber 30 is provided with a distributor 31 for uniformly diffusing dimer feralin and monomer feralin throughout the internal space. .

As shown in FIG. 2, a distributor 31 is provided in the inner space of the deposition chamber 30, and the distributor 31 functions to uniformly diffuse dimer feralin and monomer feralin throughout the inner space.

In addition, the cold trap 40 functions to cool and condense the feralline by-product transferred from the decomposition unit 20 or the deposition chamber 30.

Here, the cold trap 40 is preferably set to maintain a temperature range of -283 to 0°C to cool the feralline by-product, but the temperature range may be changed according to materials and conditions, so it is not limited to the temperature range. Does not.

In addition, the vacuum pump 50 is connected to the cold trap 40 and serves to control the vaporization unit 10, the decomposition unit 20, the deposition chamber 30, and the cold trap 40 to maintain the vacuum. do.

Since the by-product of ferrule is condensed in the cold trap 40, the by-product of ferrule does not flow into the vacuum pump 50.

In addition, the bypass unit 60 has one side connected to the first transfer pipe P3 and the second transfer pipe P4, respectively, and the other side connected to the cold trap 40, so that the first decomposition chamber 21 ) And a pair of first bypass units 61 for selectively transferring dimer feralin and monomer feralin in the second decomposition chamber 22 to the cold trap 40.

That is, one first bypass part 61 has one side connected to the first transfer pipe P3, the other side connected to the cold trap 40, and the other first bypass part 61 has one side connected to the second The transfer pipe (P4), the other side is configured to be connected to the cold trap.

Through this, it is possible to simultaneously drive the first vaporization chamber 11, the first decomposition chamber 21, the second vaporization chamber 12, and the second decomposition chamber 22, while allowing selective use during driving. do.

That is, depending on the required characteristics, only visibility may be realized by depositing under the conditions of the first decomposition chamber 21, which is a visibility film forming unit, and the first decomposition chamber 21 set at different temperatures because independent temperature control is possible. ) And the second decomposition chamber 22 are simultaneously driven to deposit under two conditions to form a film having both visibility and insulation.

In addition, the bypass unit 60 has a second bypass unit (one side connected to the second discharge pipe P2) and the other side connected to the first bypass unit 61 installed in the first transfer pipe (P3). 62).

The second bypass part 62 functions to selectively supply the dimer feralin and the monomer feralin of the first decomposition chamber 21 to the second discharge pipe P2, through which the first decomposition chamber The dimer feralin and monomer feralin of (21) are supplied to the second decomposition chamber 22 to perform additional heating.

Here, the first decomposition chamber 21 is preferably heated to a lower temperature than the second decomposition chamber 22.

Even when the first vaporization chamber 11 and the first decomposition chamber 21 are not in use, they must be operated to maintain a high temperature environment for energy efficiency.

If the power of the first vaporization chamber 11 and the first decomposition chamber 21 is turned off, the first vaporization chamber 11 and the first decomposition chamber 21 need to be heated again to a high temperature when they are restarted, which takes a long time and reduces energy efficiency. The vaporization chamber 11 and the first decomposition chamber 21 must be operated to maintain a constant temperature even when not in use.

Therefore, the first vaporization chamber 11 and the first decomposition chamber 21 are operated, but the deposition of the dimer feralin and the monomer feralin in the first vaporization chamber 11 and the first decomposition chamber 21 is not required. If not, the ferrule material is discarded.

In order to minimize waste of such ferrule material, the second bypass part 62 functions to deliver the dimer feralin and the monomer feralin of the first decomposition chamber 21 to the second decomposition chamber 22, Make lean materials reusable.

In this way, the second bypass unit 62 transfers the ferrule material, which can be discarded when not in use, to another decomposition chamber in operation, thereby improving the efficiency of use of the ferrule material.

In this case, the second bypass part 62 is not limited so that one side is installed in the second discharge pipe P2 and the other side is installed in the first transfer pipe P3, and one side of the second bypass part 62 is It is connected to the first discharge pipe (P1) and the other side is installed in the second transfer pipe (P4), so that the dimer feralin and the monomer feralin of the second decomposition chamber 22 are first decomposed through the first discharge pipe (P1). It may be configured to be selectively supplied to the chamber 21.

When the operation of either of the first decomposition chamber 21 or the second decomposition chamber 22 is not required, the second bypass unit 62 is a first decomposition chamber 21 that requires operation. Alternatively, since the material is supplied to the second decomposition chamber 22 to perform additional heating, waste of ferrule material may be reduced and the film formation speed may be improved.

Next, the operation of the apparatus for forming a visible ferrule film according to the first embodiment will be described in detail together with the drawings.

The first bypass part 61 selectively includes the cold trap 40 so as not to transfer the monomer feralin converted in the first decomposition chamber 21 or the second decomposition chamber 22 to the deposition chamber 30. ) To bypass.

As shown in FIG. 3, when the first bypass part 61 connected to the first transfer pipe P3 operates, the monomer feralin and dimer feralin of the first decomposition chamber 21 are transferred to the deposition chamber 30. It is bypassed to the cold trap 40 without being transferred to the second decomposition chamber 22 to deposit a monomer feralin and a dimer feralin generated under the materials and conditions of the second decomposition chamber 22.

Conversely, as shown in FIG. 4, when the first bypass part 61 connected to the second transfer pipe P4 is operated, the monomer feralin and the dimer feralin of the second decomposition chamber 22 are deposited. By bypassing the cold trap 40 without going through the process of the chamber 30, the monomer ferruline and the dimer ferruline are condensed, and the monomer ferruline and the dimer produced by the materials and conditions of the first decomposition chamber 21 Ferruline is deposited.

In addition, as shown in Fig. 5, the second bypass unit 62 is a monomer feralin and a dimer feralin of the first decomposition chamber 21 to reuse the material that is not used in the second discharge pipe (P2). It functions to be supplied to the second decomposition chamber 22 through.

The first vaporization chamber 11 and the first decomposition chamber 21 are operated, but the dimer feralin and the monomer feralin generated in the first vaporization chamber 11 and the first decomposition chamber 21 are not used for deposition. If not, it is transferred to the cold trap 40 through the first bypass part 61 to waste the ferrule material.

When the second bypass part 62 is operated in order to maximize the use efficiency of the ferrule material, the dimer ferrule and the monomer ferrule transferred from the first decomposition chamber 21 to the first transfer pipe P3. Lin is delivered to the second discharge pipe (P2) installed between the second vaporization chamber 12 and the second decomposition chamber 22 by the second bypass part 62 to be supplied to the second decomposition chamber 22. do.

Through this, the second decomposition chamber 22 additionally heats the dimer feralin and the monomer feralin transferred from the first decomposition chamber 21 and transfers it to the deposition chamber 30 to proceed with the deposition process.

Therefore, the use of the second bypass part 62 minimizes waste of material by reusing the ferrule material, and additionally heats dimer feralin and monomer feralin in a heated state and transfers it to the deposition chamber 30 Therefore, there is an advantage in that the film formation speed can be improved.

Next, a second embodiment of the apparatus for forming a visible perelin film according to the present invention will be described. In the present embodiment, the same reference numerals are used for components corresponding to the first embodiment.

The second embodiment includes the first embodiment, and in the first embodiment, the vaporization unit 10 has a configuration of a first vaporization chamber 11 and a second vaporization chamber 12, and consists of a pair of chambers. , In the second embodiment, a partially modified visible ferralin film deposition equipment is provided to be composed of the vaporization unit 10 consisting of one chamber.

6 is a conceptual diagram of an equipment for forming a visible ferrule film according to a second embodiment of the present invention, and FIGS. 7 to 9 are operation diagrams showing a third bypass unit according to a second embodiment of the present invention.

In the second embodiment, both the first discharge pipe P1 and the second discharge pipe P2 are installed in the vaporization unit 10 configured as one, and are connected to the first decomposition chamber 21 and the second decomposition chamber 22.

The bypass unit 60 is the first discharge pipe (P1) to selectively supply the dimer feralin vaporized in the vaporization unit 10 to the first decomposition chamber 21 and the second decomposition chamber 22 And a pair of third bypass units 63 installed in the second discharge pipe P2.

Through the third bypass part 63, the dimer feralin vaporized in the vaporization part 10 may be transported by selecting from the first decomposition chamber 21 or the second decomposition chamber 22, It may be transferred to the first decomposition chamber 21 and the second decomposition chamber 22 at the same time.

In addition, since it is possible to control the amount and flow of the dimer feralin transferred to the first decomposition chamber 21 and the second decomposition chamber 22 through the third bypass part 63, the first It is possible to control the mixing ratio of the monomeric feralin converted under the conditions of the decomposition chamber 21 and the monomeric feralline converted under the conditions of the second decomposition chamber 22.

That is, the vaporization unit 10 consisting of one chamber is connected to the decomposition unit 20 consisting of the first decomposition chamber 21 and the second decomposition chamber 22, and the dimer ferrule vaporized in the vaporization unit 10 Since it is possible to control the flow of, the expensive vaporization unit 10 can be configured as one chamber to reduce the equipment manufacturing cost, and the film can be formed using one material under two conditions, and the process can be simplified.

As shown in FIG. 7, when all of the pair of third bypass units 63 are operated, the dimer feralin vaporized in the vaporization unit 10 is converted into the first decomposition chamber 21 and the second decomposition chamber 22. ), and simultaneous film formation is possible under two conditions.

As shown in FIG. 8, when the third bypass part 63 installed in the first discharge pipe P1 operates, the dimer feralin vaporized in the vaporization part 10 is supplied to the first decomposition chamber 21. As shown in FIG. 9, when the third bypass part 63 installed in the second discharge pipe P2 is operated, the vaporized dimer ferrule is supplied to the second decomposition chamber 22.

That is, since the third bypass part 63 can control the flow of the dimer feralin vaporized in the vaporization part 10, the dimer transferred to the first and second cracking chambers 21 and 22 It functions to form a film at the same time under two conditions by adjusting the feralin ratio.

As described above, the visibility ferralin film deposition equipment according to the first and second embodiments of the present invention can simultaneously deposit a feralline film with two or more types of materials or conditions with a single device, thus securing visibility and insulation at the same time. So that the coated part can be visually identified.

The rights of the present invention are not limited to the embodiments described above, but are defined by what is described in the claims, and that a person having ordinary knowledge in the field of the present invention can make various modifications and adaptations within the scope of the rights described in the claims. It is self-evident.

1: Visibility Perlin film forming equipment
10: vaporization unit 11: first vaporization chamber
12: second vaporization chamber 20: disassembly part
21: first decomposition chamber 22: second decomposition chamber
30: deposition chamber 31: distributor
40: cold trap 50: vacuum pump
60: bypass unit 61: first bypass unit
62: second bypass unit 63: third bypass unit
P1: 1st discharge pipe P2: 2nd discharge pipe
P3: first transfer pipe P4: second transfer pipe

Claims (6)

A vaporization unit 10 in which the first and second discharge pipes P1 and P2 through which the dimer feralin is vaporized in the form of powder are vaporized;
A first decomposition chamber connected to the first discharge pipe (P1) and the other side connected to the first delivery pipe (P3) by heating the dimer feralline gas introduced from the vaporization unit (10) (21) and a decomposition unit 20 including a second decomposition chamber 22 having one side connected to the second discharge pipe P2 and the other side connected to the second transfer pipe P4;
A deposition chamber 30 for forming a polymer film film through dimer feralin and monomer feralin supplied from the decomposition unit 20;
A cold trap 40 for condensing the by-product of ferrule transferred from the decomposition unit 20 or the deposition chamber 30; And
Visibility including a vacuum pump 50 connected to the cold trap 40 and controlling to maintain the vacuum of the vaporization unit 10, the decomposition unit 20, the deposition chamber 30, and the cold trap 40 Feralin film forming equipment.
The method of claim 1,
The vaporization unit 10 controls the temperature within the range of 100 to 300°C to control the partial pressure of the dimer feralin gas, and the first and second cracking chambers 21 and 22 are in the range of 300 to 800°C. Visible ferralin film forming equipment, characterized in that the gas ratio of dimer feralin and monomer feralin is controlled by adjusting the temperature within each.
The method of claim 1,
One side is connected to the first transfer pipe (P3) and the second transfer pipe (P4), and the other side is connected to the cold trap (40), so that the first and second disintegration chambers 21 and 22 Visibility ferrule further comprising: a bypass unit 60 including a pair of first bypass units 61 for selectively transporting dimer feralin and monomer feralin to the cold trap 40 Lean film forming equipment.
The method of claim 3,
The vaporization unit 10 includes a first vaporization chamber 11 in which the first discharge pipe P1 is installed, and a second vaporization chamber 12 in which the second discharge pipe P2 is installed,
The bypass unit 60 has a second bypass unit 62 connected to one side to the second discharge pipe (P2) and the other side to the first bypass unit (61) installed in the first transfer pipe (P3) Including more,
The second bypass part 62 selectively supplies dimer feralin and monomer feralin of the first decomposition chamber 21 to the second decomposition chamber 22 through the second discharge pipe P2. Visibility Feralin film deposition equipment characterized by.
The method of claim 3,
The bypass unit 60 is the first discharge pipe (P1) to selectively supply the dimer feralin vaporized in the vaporization unit 10 to the first decomposition chamber 21 and the second decomposition chamber 22 And a pair of third bypass units (63) installed in the second discharge pipe (P2).
The method of claim 1,
The deposition chamber (30) is a visible ferralin film deposition equipment, characterized in that provided with a divider (31) for diffusing the dimer feralin and the monomer feralin throughout the inner space.

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