KR20200092068A - Tungsten-zirconium metal oxide catalysts for removal of large capacity perfluorinated compounds and its manufacturing method - Google Patents

Abstract

The present invention relates to a catalyst for decomposing perfluorinated compounds, comprising: an alumina support prepared by mixing, drying and calcinating a carrier configured to have at least one selected from alpha alumina, alumina, pseudo-boehmite, and silica, as well as tungsten (W) and zirconium (Zr) in a water-containing solvent, preferably by supporting tungsten (W) and zirconium (Zr) as active ingredients on a mixed catalyst of alumina, tungsten and zirconium through a neutralization precipitation method. According to the present invention, the metal oxide catalyst for removing large-capacity perfluorinated compounds is an acid-resistant catalyst, has durability against fluorine generated by decomposition of halogenated acid gases or perfluorinated compounds contained in perfluorinated compounds, and can also improve a reaction activity. Thus, the catalyst can be used for the purpose of decomposing cleaning agents and etching agents of perfluorinated compounds used in semiconductor manufacturing processes and display manufacturing processes, and useful as a catalyst for decomposing perfluorinated compounds discharged from processes using halogen acid gas.

Description

Tungsten-zirconium metal oxide catalysts for removal of large capacity perfluorinated compounds and its manufacturing method

The present invention relates to an aluminum oxide catalyst for decomposing a perfluorinated compound and a method for manufacturing the same, and more particularly, a method for preparing an aluminum oxide catalyst for decomposing a perfluorinated compound is a zirconium (Zr) and tungsten (W) component Dissolving in distilled water to produce a solution, and mixing the aluminum oxide with the solution to produce a carrier (catalyst supporting material), performing the drying of the carrier and firing for the carrier And performing Zr-W-Al catalyst. Therefore, the rate at which the decomposition efficiency for the perfluorinated compound is reduced over time is lowered, and characteristics of heat resistance and chemical resistance are provided to maintain high decomposition efficiency for the perfluorinated compound.

Hazardous waste gas emitted from the semiconductor manufacturing process is discharged in various types according to each process, and most of them are highly volatile and harmful to the human body or have high global warming index, so they must be completely decomposed and removed.

Among them, perfluorocompound (PFC), a perfluorinated compound mainly discharged from etching and deposition (CVD) processes of semiconductor processes, is very stable and is not easily removed.

PFC is more stable than chlorofluorocompound (CFC) used as a refrigerant, and has a problem of accumulation when released into the atmosphere because it has a large global warming index and a very long decomposition time.

PFC emissions from semiconductor processes are increasing at a high rate each year. Therefore, because of the large impact of PFC outbreaks on global warming, countries are gradually tightening regulations on PFC.

Attempts have been made to develop new alternative gases to reduce PFC emissions, but no alternative gas has been proposed that is more efficient and more productive than CF ₄ as a gas used for etching silicon substrates during semiconductor manufacturing. Accordingly, CF ₄ is used in most semiconductor manufacturing processes.

Several technologies for removing PFCs, especially carbon-based PFCs, are under development, and can be divided into separation recovery using PSA and membrane and decomposition removal using plasma, combustion or catalyst.

The catalytic decomposition method is a technique of decomposing PFC, which is poorly decomposable, at a low temperature of 800° C. or less using a catalyst and water vapor, and using the catalytic decomposition method can significantly lower the decomposition temperature, thus bringing many advantages.

For example, if the perfluorinated compound is decomposed at a low temperature of 800° C. or lower, the advantages of reducing the operating cost and securing the durability of the system due to continuous operation, and thermal NOx resulting from N ₂ present in the exhaust gas There is an increased advantage that can suppress the occurrence of and significantly reduce device corrosion. On the other hand, by increasing the reaction activity of the catalyst, the size of the scrubber is greatly reduced, and there is an advantage that it can be downsized.

However, the catalytic decomposition method has a problem in that the catalysts must be periodically replaced because halogen compounds such as HF and F ₂ generated after the reaction rapidly decrease the performance of the catalyst. Various studies have been conducted, such as returning the catalyst to its original state by contacting the catalyst with water vapor, or forming a film on the surface of the catalyst.

In Japanese Patent Laid-Open Nos. Hei 11-70332 and Hei 10-46824, catalysts are produced in the form of a complex oxide of aluminum and a metal component containing at least one of various transition metals such as Zn, Ni, Ti, and Fe inside aluminum oxide. In order to decompose perfluorinated compounds, US Patent Nos. 6,023,007 and 6,162,957 disclose that various types of metal phosphate catalysts can be used as catalysts for decomposing perfluorinated compounds.

However, as described above, aluminum phosphate in the form of a multi-component composite oxide in which metal components are separately added is not only complicated in manufacturing process, but also disadvantageous in terms of economic efficiency and long-term useability is unclear.

Therefore, there is a need to develop a simple and economical method for manufacturing a catalyst having durability capable of maintaining catalytic activity for a long time. This is the technical idea of the present invention and one of the core technical problems.

The problem to be solved by the present invention is to be able to completely decompose a perfluorinated compound containing an acidic gaseous halogen compound as a by-product after being used in a semiconductor manufacturing process or a display manufacturing process such as LCD, and has excellent durability for long-term catalytic activity. It is to provide a catalyst for decomposing a perfluorinated compound that can be maintained.

Another problem to be solved by the present invention is the core technical idea of the present invention, which can decompose a perfluorinated compound at a lower temperature than a catalyst for decomposing a conventional fluorinated compound, so that it is easy to reduce operating costs and secure durability of the system according to continuous operation. In addition, it is possible to suppress the generation of thermal NOx caused by N ₂ present in the flue gas and significantly reduce the corrosion of the device. On the other hand, by increasing the reaction activity of the catalyst, the size of the scrubber can be greatly reduced and miniaturized. It is to provide a catalyst for decomposing a perfluorinated compound.

The solution for solving the problem of the present invention is to select one or more of tungsten (W) and zirconium (Zr) as a main component, and react at a lower temperature than a catalyst for decomposing a conventional perfluorinated compound composed of one or more of Al and Si as a carrier. It is to provide a catalyst for decomposing an active perfluorinated compound.

As a solution of another problem of the present invention, the precursor of tungsten (W) is sodium tungstate (Na ₂ WO ₄ ㆍ2H ₂ O), ammonium paratungstate (5(NH ₄ ) ₂ O·12WO ₃ ㆍ5H ₂ O ), tungsten oxide (WO ₃ ), tungsten chloride (WC _l6 ) or mixtures thereof, the precursors of zirconium (Zr) are zirconium nitrate (Zr(NO ₃ ) ₄ ), zirconium sulfate (Zr(SO ₄ ) ₂ ), zirconium Hydro oxide (Zr(OH) ₂ ), zirconium oxide (ZrO) or a mixture thereof, the precursor of aluminum (Al) is at least one of alpha alumina, alumina and pseudo-boehmite, and silicon It is to provide a catalyst for decomposing a perfluorinated compound selected from at least one group among silica (SiO2) and water glass as a precursor of (Si).

Another solution of the present invention is to prepare a mixture of alumina and tungsten, zirconium mixed catalyst support having a weight ratio of Al: W: Zr = 100: 0.1 to 10: 0.1 to 5, prepared by mixing, drying and firing the raw material in a solvent. It is to provide a catalyst for decomposing a perfluorinated compound.

Another solution of the present invention is to provide a catalyst for decomposing a perfluorinated compound prepared using a sol-gel, neutralization precipitation method, impregnation method, or coprecipitation method as a catalyst manufacturing method.

Another solution of the present invention is to provide a catalyst for decomposing a perfluorinated compound prepared by selecting one of a basic solution group consisting of ammonia water, caustic soda water, and quick lime water as a neutralizing agent.

Another solution of the present invention is to provide a catalyst for decomposing a perfluorinated compound prepared by selecting one of a group of acidic solutions consisting of sulfuric acid, hydrochloric acid, nitric acid, and acetic acid as a dispersant for a metal raw material.

Another method of solving the problem of the present invention is a step of mixing tungsten (W), zirconium (Zr) as a main component, and mixing aluminum (Al) or silicon (Si) as a carrier, and decomposing the mixed compound into a perfluorinated compound. Provided is a method for producing a catalyst for decomposing a perfluorinated compound, which comprises molding in a form of at least one of particles, spheres, pellets, and rings prepared for removal, and drying and firing the catalyst for decomposing the formed perfluorinated compound. Is doing.

The catalyst for decomposing a perfluorinated compound according to the present invention is an acid-resistant catalyst, has durability against fluorine generated by decomposition of a halogenated acid gas or a perfluorinated compound contained in the perfluorinated compound, and has an increased effect of enhancing reaction activity. .

In addition, the catalyst for decomposing a perfluorinated compound according to the present invention can be used for the purpose of decomposing a perfluorinated compound among cleaning agents and etching agents used in semiconductor manufacturing processes and display manufacturing processes. In particular, F ₂ , Cl ₂ , Br ₂ There is an advantageous effect that can be usefully used as a catalyst for decomposing a perfluorinated compound discharged from a process using a halogen acid gas.

Another effect of the present invention is to decompose the perfluorinated compound at a lower temperature than the catalyst for decomposing the conventional fluorinated compound, reducing the operating cost and securing the durability of the system due to continuous operation, and originating from N ₂ present in the exhaust gas. It can suppress the generation of thermal NOx and greatly reduce device corrosion, and has a raised effect that can greatly reduce the size of the scrubber and downsize due to the high reaction activity of the catalyst.

Figure 1 shows the crystalline phase change of the catalyst before and after the CF ₄ decomposition reaction using each catalyst of Example 2 according to the present invention.

It looks at the specific technical idea, technical problem, configuration for carrying out the present invention and its operational effects.

One of the core technical ideas of the present invention is that it can be completely decomposed of a perfluorinated compound containing an acidic gaseous halogen compound as a by-product after being used in a semiconductor manufacturing process or a display manufacturing process such as LCD, and has excellent durability for long-term catalytic activity It is to provide a catalyst for decomposing a perfluorinated compound that can be maintained.

Another core technical idea of the present invention can decompose the perfluorinated compound at a lower temperature than the catalyst for decomposing the conventional fluoride compound, thereby reducing the operating cost and securing the durability of the system due to continuous operation, and N ₂ present in the exhaust gas It can suppress the generation of thermal NOx caused by and significantly reduce device corrosion, while providing a catalyst for decomposing a perfluorinated compound that can greatly reduce the size of a scrubber and miniaturize it by increasing the reaction activity of the catalyst. Is doing.

Various embodiments for achieving the technical spirit of the present invention will be described.

The first embodiment of the present invention was prepared by neutralization, drying and firing in a water-containing solvent to which water-boehmite (pseudo-boehmite) raw materials, tungsten (W), zirconium (Zr), and nitric acid were added, weight ratio It is possible to provide a catalyst for decomposing a perfluorinated compound comprising an alumina having a Al:W:Zr=100:0.1 to 10:0.1 to 5 and a mixed tungsten and zirconium support.

The second embodiment of the present invention comprises the steps of mixing an aqueous solution of at least one of tungsten and zirconium with an alumina precursor selected from at least one selected from the group consisting of alpha alumina, gamma alumina, and pseudo-boehmite. It includes, and comprises a step of manufacturing and drying and firing in a predetermined form, the weight ratio of Al:W: Zr = 100: 0.1 to 10: 0.1 to 5 includes the step of producing an Al-W-Zr oxide.

The third embodiment of the present invention provides a method for treating a perfluorinated compound comprising the step of decomposing the perfluorinated compound in a gas containing a perfluorinated compound using the catalyst for decomposing the perfluorinated compound of the first embodiment.

The fourth embodiment of the present invention can provide a semiconductor manufacturing process or a display manufacturing process including the step of decomposing a perfluorinated compound in a gas containing a perfluorinated compound using the catalyst for decomposing the perfluorinated compound of the first embodiment. .

“Perfluoro compound (PFC)” includes carbon-containing perfluoro compound (PFC) containing two or more fluorine (F), nitrogen-containing perfluoro compound (PFC), and sulfur-containing perfluoro compound (PFC). compound).

Carbon-containing PFCs include saturated and unsaturated aliphatics such as CF ₄ , CHF ₃ , CH ₂ F ₂ , C ₂ F ₄ , C ₂ F ₆ , C ₃ F ₆ , C ₃ F ₈ , C ₄ F ₈ , C ₄ F _10, etc. (aliphatic) components as well as cyclic aliphatic and aromatic (aromatic) perfluorocarbons may be included.

Nitrogen-containing PFC may typically include NF ₃ , and sulfur-containing PFC may include SF ₄ , SF _6, and the like.

However, in the present specification, the perfluorinated compound (PFC) can be extended to a compound that can be decomposed by a catalyst to form a gaseous product such as HF, which also falls within the protection scope of the present invention.

The precursor of tungsten (W) is sodium tungstate (Na ₂ WO ₄ ㆍ2H ₂ O), ammonium paratungstate (5(NH ₄ ) ₂ Oㆍ12WO ₃ ㆍ5H ₂ O), tungsten oxide (WO ₃ ), chloride Tungsten (WC ₁₆ ) or a mixture thereof, the precursors of zirconium (Zr) are zirconium nitrate (Zr(NO ₃ ) ₄ ), zirconium sulfate (Zr(SO ₄ ) ₂ ), zirconium hydrooxide (Zr(OH) ₂ ), Zirconium oxide (ZrO) or a mixture thereof, and the precursor of aluminum (Al) is at least one selected from alpha alumina, alumina, and pseudo-boehmite, and silica (SiO2) is a precursor of silicon (Si). And it is to provide a catalyst for decomposing a perfluorinated compound selected from at least one group of water glass.

Acid gas is an acidic gas when it comes into contact with water, and non-limiting examples include halogen, hydrogen halide, nitrogen oxide (NOx), sulfur oxide (SOx), acetic acid, mercury sublimation, hydrogen sulfide, carbon dioxide, and the like. Acid gas not only causes corrosion, but can also degrade the activity of the catalyst.

The hydrolysis reaction that proceeds between PFC and moisture is an endothermic reaction, and the higher the temperature, the more easily it can induce a spontaneous reaction. However, high temperatures degrade the thermal stability of the catalyst.

That is, the operating condition of 500 to 800°C is a high temperature condition for the catalyst to maintain its activity for a long time without physical or chemical changes, and securing the durability of the catalyst is the biggest problem.

In particular, the development of a catalyst having a durable durability under a reaction atmosphere of 500 to 800° C. in which HF and water vapor generated as by-products are present at the same time has become an important technical problem for commercialization.

It is preferable to highly disperse the active ingredient in order to increase the resistance to the halogen acid gas, but there is a problem in that the decomposition activity is lowered as a result of the high dispersion technology of the active ingredient is not easy.

Therefore, in order to solve this problem, one embodiment of the catalyst for decomposing a perfluorinated compound according to the present invention is co-precipitated with tungsten and zirconium active metals in alumina, so that the weight ratio is Al:W:Zr = 100: 0.1 to 10 : To prepare a porous catalyst support in which alumina, tungsten, and zirconium are uniformly mixed to be 0.1 to 5.

Accordingly, another embodiment of the catalyst for decomposing a perfluorinated compound according to the present invention is mixed with a raw material of water-boehmite and tungsten (W) and zirconium (Zr), and dried and calcined. Prepared, but includes alumina and tungsten, zirconium mixed catalyst support having a weight ratio of Al:W:Zr=100:0.1-10:0.1-5.

Most catalysts applicable in the catalytic decomposition reaction of perfluorinated compounds are solid acid catalysts, and among them, Al ₂ O ₃ catalysts are most frequently used.

Accordingly, in the catalyst for decomposing a perfluorinated compound according to the present invention, alumina serves as a support for which an active metal is supported, as well as a main catalyst having a decomposed perfluorinated compound. In terms of catalytic activity, γ-alumina is preferred among α, γ, and δ-alumina. In addition, if the transition of γ-alumina to the α phase can be suppressed, there is an increased effect of maintaining high resolution for PFC for a long time.

When tungsten (W) is supported as an active metal, it is possible to impart desirable results in terms of improving catalyst efficiency for HF generated during PFC catalytic decomposition reaction.

The active metal may be supported on the catalyst support by an incipient-wetness method.

Drying and firing of the catalyst for decomposing the perfluorinated compound prepared according to the present invention is primary drying in a constant temperature and humidity tank at 110° C., secondary drying at 200° C. or higher, and calcination under an air atmosphere of 400 to 1000° C. to perform tertiary drying. Can be performed with.

The final shape of the catalyst for decomposing the perfluorinated compound according to the present invention may be a granular shape such as a sphere, pellet, or ring, or may be molded into a honeycomb shape.

As the catalyst forming method, any method such as an extrusion molding method, a tableting molding method, or an electric granulation method can be used. Further, the catalyst of the present invention may be coated on a honeycomb or plate made of ceramic or metal.

The catalyst for decomposing a perfluorinated compound according to the present invention exhibits an excellent decomposition effect and durability in decomposing and removing a perfluorinated compound containing a halogenated acidic gas, so that a process containing a halogenated acidic gas, in particular, an LCD from the semiconductor manufacturing industry It can be used for the purpose of decomposing perfluorinated compounds present in cleaning agents, etchants, and solvents used up to the process site, and also discharged from processes using halogenated acid gases such as F ₂ , Cl ₂ , Br _2, etc. It has an advantageous effect in decomposing and removing perfluorinated compounds.

The catalyst that decomposes CF ₄ can decompose most of the PFC contained in the waste gas, and converts carbon constituting a perfluorinated compound into CO ₂ , so it can be mainly used for treating waste gas generated in a semiconductor process, but the semiconductor process If not, PFC can be used for the purpose of cleaning agents, etching agents, solvents, reaction raw materials, etc., or can be usefully used in manufacturing processes or workplaces.

Acid gases including hydrofluoric acid (HF) are removed through an acid gas scrubber before being discharged. However, hydrofluoric acid generated in hydrolysis not only causes serious corrosion problems in the downstream process including RCS, but also affects the activity of the PFC decomposition catalyst.

Therefore, the catalyst for decomposing a perfluorinated compound according to the present invention is durable to a halogen acid gas, and thus is particularly suitable for treating a gas containing a perfluorinated compound containing a halogen acid gas, and thus has an increased effect compared to the prior art.

In the present invention, the temperature during the catalytic decomposition of PFC is 500 to 800°C, preferably 600 to 750°C, and more preferably 500 to 600°C.

The catalyst according to the present invention is used to form a bed in the catalytic reactor after shaping to the required size in the form of particles or spheres, pellets, or rings prepared to decompose and remove perfluorinated compounds in the waste gas. Can. The catalyst layer formed inside the catalytic reactor may be operated in the form of a packed bed (or fixed bed) or a fluidized bed.

In order to perform a hydrolysis reaction in a catalytic reactor, water may be introduced into the reactor from the outside. Water may be supplied through a separate source provided outside the reactor, and heated through a heat exchanger before being introduced into the reactor to be supplied in the form of water vapor. Preferably, the water supplied to the reactor uses pure water, and the supply amount can be adjusted in consideration of the hydrolysis reaction rate.

The water vapor includes a molar ratio of water vapor/PFC in the range of 1 to 100, and it is possible to decompose PFC without deactivation of the catalyst by using oxygen in a concentration range of 0 to 50% with water vapor. When the content of water vapor falls outside the above range, the reaction activity decreases.

The catalyst for decomposing a perfluorinated compound according to the present invention is prepared by selecting one of a sol-gel method, a neutralization precipitation method, an impregnation method, and a coprecipitation method.

The neutralizing agent used in the preparation of the catalyst for decomposing a perfluorinated compound according to the present invention is selected from one or more of ammonia water, caustic soda water, and quicklime water.

The dispersant of the metal raw material used in preparing the catalyst for decomposing the perfluorinated compound according to the present invention is selected from sulfuric acid, hydrochloric acid, nitric acid and acetic acid.

In addition, the protection scope of the present invention includes a method for preparing a catalyst for decomposing a perfluorinated compound according to the present invention.

The method for preparing a catalyst for decomposing a perfluorinated compound includes the step of mixing at least one of tungsten (W) and zirconium (Zr) as a main component, and one or more of Al and Si as a carrier, and mixing the compound with a perfluorinated compound It comprises the step of molding in the form of one or more of the state, spheres, pellets and rings prepared to decompose and remove.

The method for preparing a catalyst for decomposing a perfluorinated compound according to the present invention may include a configuration related to the manufacturing method among the technical components applied in the catalyst for decomposing a perfluorinated compound.

The catalyst is prepared by specifically applying a predetermined value within a given numerical range including the composition of the always-on embodiment of the present invention, and the effect of the prepared catalyst is examined.

[One specific example 1] Preparation of Zr-Al oxide catalyst

After adding 100 g of water-boehmite to 500 g of distilled water, 10 g of nitric acid was added and completely dissolved. After adding zirconium oxide to the dissolved mixture, the mixture is stirred for 6 hours.

The mixed solution is neutralized to pH8 with ammonia water. After filtration, the mixture was dried at 110°C for 6 hours, and fired at 750°C for 4 hours to prepare a Zr-Al oxide. At this time, the amount of zirconium was applied to a ratio of 1% to the weight of Al of water-boehmite.

[Another specific example 2] Preparation of Zr-Al oxide catalyst

Zr-Al oxide was prepared in the same manner as in Example 1, except that the amount of zirconium was 5 wt% instead of 1 wt%.

[Another specific example 3] Preparation of W-Al oxide catalyst

5 wt% of tungsten oxide was added to 20 g of hydrogen peroxide, and completely dissolved by heating. 100 g of water-boehmite was placed in a solution to which 500 g of distilled water and 10 g of nitric acid were added, completely dissolved, and mixed with the tungsten solution. The mixed solution is neutralized to pH 8 with ammonia water. After filtration, the mixture was dried at 110°C for 6 hours, and fired at 750°C for 4 hours to prepare a W-Al oxide.

[Another specific example 4] Preparation of W-Al oxide catalyst

W-Al oxide was prepared in the same manner as in Example 3, except that the amount of tungsten was 10 wt% instead of 5 wt% (weight ratio or wt%).

[Another specific example 5] Preparation of Zr-W-Al oxide catalyst

5 wt% (weight ratio) of tungsten oxide was added to 20 g of hydrogen peroxide, and completely dissolved by heating. 5% by weight of zirconium oxide is added to distilled water, completely dissolved, and mixed with the tungsten solution. 100 g of water-boehmite is completely dissolved with 500 g of distilled water and nitric acid, mixed with the tungsten-zirconium solution and stirred for 6 hours. Neutralize to pH8 with ammonia water. After filtration, the mixture was dried at 110°C for 6 hours, and calcined at 750°C for 4 hours to prepare a Zr-W-Al oxide.

[Comparative Example 1] Preparation of Al oxide catalyst

After adding 100 g of water-boehmite to 500 g of distilled water, 10 g of nitric acid was added and completely dissolved. The mixed solution was neutralized to pH8 with ammonia water. After filtration, the mixture was dried at 110° C. for 6 hours, and calcined at 750° C. for 4 hours to prepare Al oxide.

Compare the Zr-Al oxide catalysts prepared according to the present invention by measuring the removal rate of the perfluorinated compound (CF ₄ ) of the Al oxide catalyst prepared as a comparative example.

The following experiment was performed to compare the removal rate of the perfluorinated compound (CF4) of the Al oxide catalyst prepared by the method of Comparative Example 1 as a control with the Zr-Al oxide catalysts of Examples 1 to 5.

Examples 1 to 5 and Comparative Example 1, taken respectively by 7ml of a catalyst produced in filling the 1/2 inch Inconel (Inconel) reaction tube, to control the reaction temperature using an external heater to 750 ~ 800 ℃, SV 1700h ^- Tetrafluormethane was decomposed while supplying 5000 ppm of tetrafluoromethane (CF ₄ ) and 200 ml/min of air under the conditions of ¹ . Tetrafluoromethane conversion was calculated by the following equation (1), and the reaction was analyzed using FT-IR. The results are shown in Table 1 below.

Removal rate (%) Reaction temperature (℃) 750℃ 800℃ Example 1 98 100 Example 2 100 100 Example 3 95 100 Example 4 96 100 Example 5 100 100 Comparative Example 1 65 100

As shown in Table 1, the removal rate of tetrafluoromethane of the catalyst prepared by the method according to the present invention was 95 to 100% under the temperature condition of 750° C., while the removal rate of tetrafluoromethane of the control Al oxide catalyst was The removal rate of tetrafluoromethane was 65% under 750°C temperature.

Figure 1 shows the crystal phase change of the catalyst before and after the CF ₄ decomposition reaction using the Zr-Al oxide catalyst of Example 2 according to the present invention.

The present invention is a carrier consisting of at least one selected from alpha alumina, alumina, pseudo-boehmite and silica, and tungsten (W) and zirconium (Zr) mixed, dried and calcined in a water-containing solvent. It includes a prepared alumina support, but is preferably an alumina, tungsten and zirconium mixed catalyst to provide a catalyst for decomposing a perfluorinated compound carrying tungsten (W) and zirconium (Zr) as neutralizing precipitates by a neutralization precipitation method. Since it can be efficiently removed, it is highly available for industrial use.

Claims (7)

A catalyst for decomposing a perfluorinated compound, characterized in that it is prepared by selecting one or more of tungsten (W) and zirconium (Zr) as a main component and mixing one or more of Al and Si as a carrier with a main component. According to claim 1,
The precursor of tungsten (W) is sodium tungstate (Na ₂ WO ₄ ㆍ2H ₂ O), ammonium paratungstate (5(NH ₄ ) ₂ Oㆍ12WO ₃ ㆍ5H ₂ O), tungsten oxide (WO ₃ ), chloride Tungsten (WC ₁₆ ) or a mixture thereof, the precursors of zirconium (Zr) are zirconium nitrate (Zr(NO ₃ ) ₄ ), zirconium sulfate (Zr(SO ₄ ) ₂ ), zirconium hydrooxide (Zr(OH) ₂ ), Zirconium oxide (ZrO) or a mixture thereof, and the precursor of aluminum (Al) is at least one selected from alpha alumina, alumina, and pseudo-boehmite, and silica (SiO2) is a precursor of silicon (Si). And a catalyst for decomposing a perfluorinated compound, characterized in that it is selected from at least one of water glass. According to claim 1,
Prepared by mixing tungsten (W), zirconium (Zr), and aluminum (Al) in a solvent, drying and firing, but alumina and tungsten having a weight ratio of Al:W:Zr=100:0.1-10:0.1-5 A catalyst for decomposing a perfluorinated compound comprising a zirconium mixed catalyst support. The method according to any one of claims 1 to 3,
The catalyst for decomposing a perfluorinated compound is prepared by selecting one of a sol-gel (Sol-Gel) method, a neutralization precipitation method, an impregnation method, and a coprecipitation method. The method according to any one of claims 1 to 3,
A catalyst for decomposing a perfluorinated compound is prepared by selecting at least one of ammonia water, caustic soda water, and quicklime water. The method according to any one of claims 1 to 3,
A catalyst for decomposing a perfluorinated compound, characterized in that it is prepared by selecting one of sulfuric acid, hydrochloric acid, nitric acid, and acetic acid as a dispersant for a metal raw material used in manufacturing a catalyst for decomposing a perfluorinated compound. Selecting one or more of tungsten (W) and zirconium (Zr) as a main component, and selecting one or more of Al and Si as a carrier to mix with the main component,
Molding the mixed compound into one or more of the form of particles, spheres, pellets and rings prepared to decompose and remove the perfluorinated compound,
A method for producing a catalyst for decomposing a perfluorinated compound, comprising drying and firing the catalyst for decomposing the formed perfluorinated compound.

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