KR20200074224A - Composition - Google Patents

Abstract

상기 식 (a1) 중, Rf^a1은, 양단이 산소 원자인 2가의 퍼플루오로폴리에테르 구조이다.A film formed of a composition containing a compound having a perfluoropolyether structure may be exposed to chemicals such as alcohol, depending on the application, and in such a case, good performance can be maintained even after exposure to the chemical. There was a demand. The present invention provides a composition comprising a compound having a perfluoropolyether structure, and capable of realizing a film having chemical resistance.
This invention is a composition containing the organosilicon compound (A) represented by Formula (a1) and the organosilicon compound (C) represented by Formula (c1).

In the formula (a1), Rf ^a1 is a divalent perfluoropolyether structure whose both ends are oxygen atoms.

Description

Composition

The present invention relates to a composition.

The film formed of a composition containing a compound having a perfluoropolyether structure has a very small surface free energy, and thus displays devices such as touch panel displays, optical devices, semiconductor devices, building materials, windows of automobiles or buildings. In various fields, such as glass, it is used as an antifouling coating or water-repellent oil-repellent coating.

For example, Patent Document 1 discloses a coating composition comprising a predetermined amount of a fluorosiloxane, a polyacrylic acid resin, a silane coupler, an acid, and an organic solvent, and perfluoropolyether as the fluorosiloxane. It is described that siloxanes are preferred. In addition, specifically, as the silane coupler, γ-(2,3-epoxypropoxy)propyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-(methacryloyloxy)propyltrimethoxysilane It is disclosed.

Japanese Patent Publication No. 2015-534601

A film formed of a composition containing a compound having a perfluoropolyether structure may be exposed to chemicals such as alcohol depending on the use, and in such a case, good performance (water repellency, etc.) even after exposure to the chemical ) Is required (hereinafter referred to as chemical resistance).

Accordingly, an object of the present invention is to provide a composition comprising a compound having a perfluoropolyether structure, and capable of realizing a film having chemical resistance.

The present invention achieving the above object is as follows.

[1] A composition comprising an organosilicon compound (A) represented by formula (a1) and an organosilicon compound (C) represented by formula (c1).

In the formula (a1),

Rf ^a1 is a divalent perfluoropolyether structure whose both ends are oxygen atoms,

R ^11, R ^12, and R ¹³ is each independently an alkyl group having 1 to 20 carbon atoms, when R ¹¹ is plural exist, and even if each of the plurality of R ¹¹ different from each other, a plurality of cases to R ¹² are a plurality presence the R ¹² and each may be different, and if R ¹³ is present in plurality and a plurality of R ¹³ may be each different from each other,

E ^1, E ^2, E ^3, E ^4, and E ⁵ are each independently a hydrogen atom or a fluorine atom, E ¹ If a plurality exist, and even if each of the plurality of E ¹ phase, E ² is the plurality presence when there is even a respective plurality of different E ^2, E ³ is the case that a plurality exist and a plurality of E ³ may be respectively different, and if the E ⁴ is present in the plurality, and each may be a plurality of different E ^4,

G ¹ and G ² are each independently a 2-10 organosiloxane group having a siloxane bond,

J ¹ , J ² , and J ³ are each independently a hydrolyzable group or -(CH ₂ ) _e6 -Si(OR ¹⁴ ) ₃ , e6 is 1 to 5, R ¹⁴ is a methyl group or an ethyl group, and J when the ^first plurality present, and even if each of the plurality of J ¹ different from each other, if J ² is a plurality exist, and even if each of the plurality of J ² different, J ³ is the case that a plurality present in each of the plurality of J ³ different You can do it,

L ¹ and L ² are, each independently, an oxygen atom, a divalent linking group of 1 to 12 carbon atoms which may contain a nitrogen atom, a fluorine atom, if L ¹ is plural exist even if a plurality of L ¹ are each different and, if L ² is present in the plurality, and each may be a plurality of L ² different from each other,

d11 is 1 to 9,

d12 is 0-9,

a10 and a14 are 0-10 each independently,

a11 and a15 are each independently 0 or 1,

a12 and a16 are each independently 0 to 9,

a13 is 0 or 1,

a21, a22, and a23 are each independently 0 to 2,

e1, e2, and e3 are respectively 1-3 respectively.

In the formula (c1),

R ^x1, R ^x2, R ^x3, R ^x4 each independently is a hydrogen atom or a carbon number of alkyl group of from 1 to 4, in the case of R ^x1 plurality exist, and a plurality of R ^x1 is even, respectively different, R ^x2 is When there are multiple, multiple R ^x2 may differ, respectively, and when multiple R ^x3 exists, multiple R ^x3 may differ, and when multiple R ^x4 exist, multiple R ^x4 may differ. ,

Rf ^x1 , Rf ^x2 , Rf ^x3 , and Rf ^x4 are each independently an alkyl group or a fluorine atom having 1 to 20 carbon atoms in which one or more hydrogen atoms are replaced with fluorine atoms, and when multiple Rf ^x1 exists, a plurality of Rf ^x1 will be respectively different, when the Rf ^x2 sometimes plurality exist, and even if each of a plurality of Rf ^x2 different, if Rf ^x3 plurality exist, and even if each of the plurality of Rf ^x3 different, Rf ^x4 the plurality present in the plurality Rf ^x4 of each may be different,

R ^x5 is, the number of carbon atoms is an alkyl group of 1 to 20, if R ^x5 is present in plurality may be each a plurality of different R ^x5,

X is a hydrolyzable group, and when a plurality of Xs are present, a plurality of Xs may be different from each other,

Y is -NH- or -S-, and when a plurality of Y are present, a plurality of Y may be different from each other,

Z is a vinyl group, α-methylvinyl group, styryl group, methacryloyl group, acryloyl group, amino group, isocyanate group, isocyanurate group, epoxy group, ureido group, or mercapto group,

p1 is an integer from 1 to 20, p2, p3, and p4 are each independently an integer from 0 to 10, p5 is an integer from 1 to 10,

p6 is an integer from 1 to 3,

Z-, -Si(X) _p6 (R ^x5 ) _3-p6 , p1 -{C(R ^x1 )(R ^x2 )}-, p2 -{C(Rf ^x1 )(Rf ^x2 )}-, p3 -{Si(R ^x3 )(R ^x4 )}-, p4 -{Si(Rf ^x3 )(Rf ^x4 )}-, p5 -Y-, Z- and -Si(X) _p6 (R ^x5 ) As long as _3-p6 is terminal and -O- is not connected to -O-, they are bonded side by side in any order.

[2] The composition according to [1], wherein the organosilicon compound (C) is 0.1% by mass or more and 1% by mass or less of the total mass of the composition.

[3] The composition according to [1] or [2], wherein the organosilicon compound (C) is represented by the following formula (c2).

In the formula (c2),

X ¹ is a methoxy group or an ethoxy group, if X ¹ is present in plurality and a plurality of X ¹ may be each different from each other,

Y ¹ is -NH-,

Z ¹ is an amino group or a mercapto group,

R is ^x51, and the carbon number of alkyl group of 1 ~ 20, R ^x51 In this case, a plurality may be present, and the plurality of R ^x51 are each different from each other,

p61 is an integer of 1-3, q is an integer of 2-5, and r is an integer of 0-5.

[4] A surface-treated resin substrate having a coating made of the composition according to any one of [1] to [3] above, on the surface of the resin substrate.

[5] The surface-treated resin substrate according to [4], wherein the resin substrate is an acrylic resin substrate.

[6] A method for producing a surface-treated resin substrate that is coated on the surface of a resin substrate and cured at room temperature by applying the composition according to any one of [1] to [3] above.

According to the composition of the present invention, since the predetermined organosilicon compound (C) is included together with the predetermined organosilicon compound (A) having a perfluoropolyether structure, the chemical resistance of the resulting film is improved.

The organosilicon compounds (A) and (C) will be described in order below.

1. Organosilicon Compound (A)

The organosilicon compound (A) is represented by the following formula (a1).

In the formula (a1),

Rf ^a1 is a divalent perfluoropolyether structure whose both ends are oxygen atoms,

R ¹¹ , R ¹² , and R ¹³ are each independently (ie, R ¹¹ and R ¹² and R ¹³ may be the same or different from each other) are alkyl groups having 1 to 20 carbon atoms, and when there are a plurality of R ¹¹ There may be a plurality of each of R ¹¹ different from each other, if R ¹² is present in plurality, and each may be a plurality of different R ^12, R ^13, and even if the plurality present in each of a plurality of different R ^13,

E ^1, E ^2, E ^3, E ^4, and E ⁵ are each independently a hydrogen atom or a fluorine atom, when E ¹ a plurality exist, and even if each of the plurality of E ¹ phase, E ² is the plurality presence There will be a respective plurality of different E ^2, E ^3, which in this case is present in plurality may be each a plurality of different E ^3, respectively, there will be a plurality of different E ⁴ E ⁴ if a plurality, if any,

G ¹ and G ² are each independently a 2-10 organosiloxane group having a siloxane bond,

J ¹ , J ² , and J ³ are each independently a hydrolyzable group or -(CH ₂ ) _e6 -Si(OR ¹⁴ ) ₃ , e6 is 1-5, R ¹⁴ is a methyl group or an ethyl group, J when the ^first plurality present in the plurality of J ^1, and may be respectively different, J ² If a plurality exist, and even if each of the plurality of J ² different, J ³ is the case that a plurality present in each of the plurality of J ³ different You can

L ¹ and L ² are, each independently, an oxygen atom, a divalent linking group of 1 to 12 carbon atoms which may contain a nitrogen atom, a fluorine atom, if L ¹ is plural exist even if a plurality of L ¹ are each different and, if there is a respective plurality of L ² different from L ² if a plurality is present,

d11 is 1 to 9,

d12 is 0-9,

a10 and a14 are each independently 0 to 10,

a11 and a15 are each independently 0 or 1,

a12 and a16 are each independently 0 to 9,

a13 is 0 or 1,

a21, a22, and a23 are each independently 0 to 2,

e1, e2, and e3 are respectively 1-3 respectively.

The organosilicon compound (A) has a perfluoropolyether structure represented by Rf ^a1 as represented by the formula (a1), and a hydrolyzable group represented by J ² or -(CH ₂ ) _e6 -Si( OR ¹⁴ ) ₃ (where R ¹⁴ is at least one methyl group or ethyl group). The perfluoropolyether structure is a structure in which hydrogen atoms of all of the polyoxyalkylene groups are replaced with fluorine atoms, and can also be referred to as perfluorooxyalkylene groups, and water repellency can be imparted to the resulting film. Moreover, it is a compound which can become a matrix of the film|membrane obtained by bonding together with an organosilicon compound (A) with J ² or other monomers through a polymerization reaction (especially polycondensation reaction).

Rf ^a1 is preferably -O-(CF ₂ CF ₂ O) _e4 -, or -O-(CF ₂ CF ₂ CF ₂ O) _e5 -. e4 and e5 are both 15-80.

R ¹¹ , R ¹² , and R ¹³ are each independently preferably an alkyl group having 1 to 10 carbon atoms.

L ¹ and L ² are each independently preferably a C 1 to C 5 divalent linking group containing a fluorine atom.

G ¹ and G ² are each independently preferably a 2-5 valent organosiloxane group having a siloxane bond.

J ¹ , J ² , and J ³ are each independently preferably a methoxy group, an ethoxy group, or -(CH ₂ ) _e6 -Si(OR ¹⁴ ) ₃ .

a10 is preferably 0 to 5 (more preferably 0 to 3), a11 is preferably 0, a12 is preferably 0 to 7 (more preferably 0 to 5), and a14 is preferably 1 to 6 (More preferably 1 to 3), a15 is preferably 0, a16 is preferably 0 to 6, a21 to a23 are all 0 or 1 is preferred (more preferably all are 0), and d11 is 1 ~5 is preferable (more preferably 1 to 3), d12 is preferably 0 to 3 (more preferably 0 or 1), and e1 to e3 are all preferably 3. Moreover, 1 is preferable for a13.

As the compound (A), Rf ^{a1 in} the formula (a1) is -O-(CF ₂ CF ₂ CF ₂ O) _e5 -, e5 is 35 to 50, and L ¹ and L ² are both 1 to 3 carbon atoms. Perfluoroalkylene group, E ¹ , E ² , and E ³ are all hydrogen atoms, E ⁴ , and E ⁵ are hydrogen atoms or fluorine atoms, and J ¹ , J ² , and J ³ are all methoxy groups or Ethoxy group (especially methoxy group), a10 is 1-3, a11 is 0, a12 is 0-5, a13 is 1, a14 is 2-5, a15 is 0, a16 is 0-6 And a21 to a23 are each independently 0 or 1 (more preferably a21 to a23 are all 0), d11 is 1, d12 is 0 or 1, and e1 to e3 are all 3 compounds. It is preferred.

In addition, when the compound a to be used as the compound (A) in the following example is represented by the formula (a1), Rf ^a1 is -O-(CF ₂ CF ₂ CF ₂ O) ₄₃ -, and L ¹ and L ² are All -(CF ₂ )-, E ¹ , E ² , and E ³ are all hydrogen atoms, E ⁵ is a fluorine atom, J ¹ , J ² are all methoxy groups, a10 is 2, a11 is 0, a12 is 0-5, a13 is 1, a14 is 3, a15 is 0, a16 is 0, a21, a22 are all 0, d11 is 1, d12 is 0, e1, e2 are all 3.

As the compound (A), Rf ^{a1 in} the formula (a1) is -O-(CF ₂ CF ₂ CF ₂ O) _e5 -, e5 is 25 to 40, and L ¹ is a carbon number containing a fluorine atom and an oxygen atom 3 to 6 divalent linking group, L ² is a C 1 to C 3 perfluoroalkylene group, E ² and E ³ are both hydrogen atoms, E ⁵ is a fluorine atom, and J ² is -(CH ₂ ) _e6 -Si(OCH ₃ ) ₃ , e6 is 2-4, a10 is 1-3, a11 is 0, a12 is 0, a13 is 0, a14 is 2-5, a15 is 0 , a16 is 0, a21 to a23 are each independently 0 or 1 (more preferably, a21 to a23 are all 0), d11 is 1, d12 is 0, and e2 is a 3 compound. desirable.

Moreover, it is also preferable that the organosilicon compound (A) is a compound represented by the following formula (a2-1).

In the formula (a2-1),

Rf ^a21 is a C1-C20 alkyl group or a fluorine atom in which one or more hydrogen atoms are replaced by fluorine atoms,

Rf ^a22 , Rf ^a23 , Rf ^a24 , and Rf ^a25 are each independently an alkyl group or a fluorine atom having 1 to 20 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and a plurality of Rf ^a22s when multiple Rf ^a22s are present that is if each phase, Rf ^a23 if this plurality exist, and even if a plurality of Rf ^a23 are respectively different, when the Rf ^a24 plurality exist, and even if each of a plurality of Rf ^a24 different and Rf if ^a25 the plurality present in the A plurality of Rf ^a25 may be different from each other,

R ^20, R ^21, R ^22, and R ²³ are, are, each independently, a hydrogen atom or an alkyl group having a carbon number of 1 ~ 4, R ²⁰ is even if the plurality present in the plurality of R ²⁰ are each different, R ²¹ is When there are multiple, multiple R ²¹ may differ, respectively, when multiple R ²² exists, multiple R ²² may differ, and when multiple R ²³ exists, multiple R ²³ may differ. ,

R ²⁴ is an alkyl group having 1 to 20 carbon atoms, when R ²⁴ is present in plurality and a plurality of R ²⁴ may be respectively different, and

M ¹ is a hydrogen atom or an alkyl group having from 1 to 4 carbon atoms, when M ¹ is present in plurality and a plurality of M may be respectively different from ^1,

M ² is a hydrogen atom or a halogen atom,

M ³ is -O-, -C(=O)-O-, -OC(=O)-, -NR-, -NRC(=O)-, or -C(=O)NR-(R is a hydrogen atom, a fluorinated alkyl group) having from 1 to 4 carbon atoms or an alkyl group having 1 to 4, if M ³ is present in plurality, and the plurality of M ³ may be respectively different, and

M ⁴ is a hydrolyzable group, there may be a respective plurality of M ⁴ to M ⁴ is different if a plurality is present,

f11, f12, f13, f14, and f15 are each independently an integer from 0 to 600, and the sum of f11, f12, f13, f14, and f15 is 13 or more,

f16 is an integer from 1 to 20,

f17 is an integer of 0-2,

g1 is an integer from 1 to 3,

Rf ^a21 -, M ² -, f11 -{C(R ²⁰ )(R ²¹ )}-, f12 -{C(Rf ^a22 )(Rf ^a23 )}-, f13 -{Si(R ²² )( R ²³ )}-, f14 -{Si(Rf ^a24 )(Rf ^a25 )}-, f15 -M ³ -, and f16 -[CH ₂ C(M ¹ ){(CH ₂ ) _f17 -Si( M ⁴ ) _g1 (R ²⁴ ) _3-g1 }]-, Rf ^a21 -, M ² -are terminated, listed in order to form a perfluoropolyether structure at least in part, and -O- is Unless connected to -O- to -F, they are joined side by side in any order. That is, in formula (a2-1), f11 -{C(R ²⁰ )(R ²¹ )}- are necessarily continuous, and f12 -{C(Rf ^a22 )(Rf ^a23 )}- are continuous, f13 -{Si(R ²² )(R ²³ )}- are contiguous, f14 -{Si(Rf ^a24 )(Rf ^a25 )}- are contiguous, f15 -M ³ -are contiguous, f16- [CH ₂ C(M ¹ ){(CH ₂ ) _f17 -Si(M ⁴ ) _g1 (R ²⁴ ) _3-g1 }]- does not mean that they are sequentially listed in this order, but -C(R ²⁰ )(R ²¹ )-Si(Rf ^a24 )(Rf ^a25 )-CH ₂ C(M ₁ ){(CH ₂ ) _f17 -Si(M ⁴ ) _g1 (R ²⁴ ) _3-g1 }-C(Rf ^a22 ) (Rf ^a23 )-M ³ -Si(R ²² )(R ²³ )-C(Rf ^a22 )(Rf ^a23 )-, etc., it is possible that each is listed in any order.

Rf ^a21 is preferably an alkyl group having 1 to 10 carbon atoms substituted with one or more fluorine atoms, more preferably a perfluoroalkyl group having 1 to 10 carbon atoms, and more preferably a perfluoroalkyl group having 1 to 5 carbon atoms. to be.

Rf ^a22 , Rf ^a23 , Rf ^a24 , and Rf ^a25 are preferably each independently a fluorine atom or an alkyl group having 1 to 2 carbon atoms in which one or more hydrogen atoms are replaced with fluorine atoms, and more preferably all are fluorine atoms. .

R ²⁰ , R ²¹ , R ²² , and R ²³ are preferably each independently a hydrogen atom or an alkyl group having 1 to 2 carbon atoms, and more preferably all are hydrogen atoms.

R ²⁴ is preferably an alkyl group having 1 to 5 carbon atoms.

M ¹ is preferably each independently a hydrogen atom or an alkyl group having 1 to 2 carbon atoms, and more preferably all are hydrogen atoms.

M ² is preferably a hydrogen atom.

M ³ is preferably -C(=O)-O-, -O-, -OC(=O)-, more preferably all -O-.

M ⁴ is preferably an alkoxy group or a halogen atom, and more preferably a methoxy group, an ethoxy group, or a chlorine atom.

Preferably, f11, f13, and f14 are each 1/2 or less of f12, more preferably 1/4 or less, more preferably f13 or f14 is 0, particularly preferably f13 and f14 are Is zero.

f15 is preferably 1/5 or more of the sum of f11, f12, f13, and f14, and is less than the sum of f11, f12, f13, and f14.

f12 is preferably 20 to 600, more preferably 20 to 200, further preferably 50 to 200 (more preferably 30 to 150, particularly preferably 50 to 150, most preferably 80 to 200). 140). The f15 is preferably 4 to 600, more preferably 4 to 200, and even more preferably 10 to 200 (more preferably 30 to 60). The total value of f11, f12, f13, f14, and f15 is preferably 20 to 600, more preferably 20 to 200, and even more preferably 50 to 200.

f16 is preferably 1 to 18. More preferably, it is 1-15. More preferably, it is 1-10.

f17 is preferably 0 to 1.

As for g1, 2-3 are preferable and 3 is more preferable.

f11 -{C(R ²⁰ )(R ²¹ )}-, f12 -{C(Rf ^a22 )(Rf ^a23 )}-, f13 -{Si(R ²² )(R ²³ )}-, f14 The order of -{Si(Rf ^a24 )(Rf ^a25 )}-, and f15 -M ³ -is arbitrary in the formula, as long as they are listed in order to form a perfluoropolyether structure at least in part, but is preferred. The repeating units (ie -{C(Rf ^a22 )(Rf ^a23 )}-) enclosed in parentheses by giving f12 of the most fixed end (side binding to silicon atom) is the most free end By assigning f11 on the (自由端) side, it is located on the free end side than the repeating units (ie, -{C(R ²⁰ )(R ²¹ )}-) enclosed in parentheses, more preferably the most fixed end side f12 and f14 The repeating units enclosed in parentheses (i.e., -{C(Rf ^a22 )(Rf ^a23 )}-, and -{Si(Rf ^a24 )(Rf ^a25 )}-) give f11 and f13 at the most free ends) It is located on the free end of the repeating units enclosed in parentheses (ie, -{C(R ²⁰ )(R ²¹ )}-, and -{Si(R ²² )(R ²³ )}-)).

In the formula (a2-1), Rf ^a21 is a perfluoroalkyl group having 1 to 5 carbon atoms, Rf ^a22 , Rf ^a23 , Rf ^a24 and Rf ^a25 are all fluorine atoms, and M ³ is all -O-, M ⁴ is all a methoxy group, an ethoxy group or a chlorine atom (especially a methoxy group or an ethoxy group), M ¹ and M ² are all hydrogen atoms, f11 is 0, f12 is 30 to 150 (more preferably 80 to 140) ), it is preferable that f15 is 30-60, f13 and f14 are 0, f17 is 0-1 (especially 0), g1 is 3, and f16 is 1-10.

In addition, in the following example, when the compound a used as the compound (A) is represented by the formula (a2-1), Rf ^a21 is C ₃ F ₇ -, Rf ^a22 and Rf ^a23 are both fluorine atoms, and f11= f13=f14=0, f12 is 131, f15 is 44, f16 is 1-6, f17 is 0, M ¹ and M ² are hydrogen atoms, M ³ is -O-, M ⁴ is methoxy group, g1 is It is 3.

Moreover, it is also preferable that the organosilicon compound (A) is a compound represented by the following formula (a2-2).

In the formula (a2-2),

Rf ^a26 , Rf ^a27 , Rf ^a28 , and Rf ^a29 are each independently an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms have been replaced with fluorine atoms, and a plurality of Rf ^a26s when multiple Rf ^a26s are present Each of these may be different, and when multiple Rf ^a27 exists, multiple Rf ^a27 may be different respectively, and when multiple Rf ^a28 exists, multiple Rf ^a28 may be different respectively, and when multiple Rf ^a29 exists A plurality of Rf ^a29 may be different from each other,

R ^25, R ^26, R ^27, and R ²⁸ are, each independently, in the case of a hydrogen atom or an alkyl group having a carbon number of 1 ~ 4, R ²⁵ is a plurality exist, and even if a plurality of R ²⁵ each different, R ²⁶ is When there are multiple, multiple R ²⁶ may differ, respectively, when multiple R ²⁷ exists, multiple R ²⁷ may differ, and when multiple R ²⁸ exists, multiple R ²⁸ may differ. ,

R ^29, and R ³⁰ are, each independently, an alkyl group of carbon number 1 ~ 20, R ²⁹ are the case that a plurality exist, and even if each of the plurality of R ²⁹ different from, R ^30, if there is more than one, there is a plurality of R ³⁰ Each of these may be different,

M ⁷ is -O-, -C(=O)-O-, -OC(=O)-, -NR-, -NRC(=O)-, or -C(=O)NR-, wherein R is an alkyl group or a fluorinated alkyl group having a carbon number of 1-4 of the hydrogen atoms, having from 1 to 4 carbon atoms, if present, and if M ⁷ with a plurality each of the plurality of M ⁷ different,

M ^5, M ⁹ are, each independently, a hydrogen atom or an alkyl group having a carbon number of 1 ~ 4, M if ⁵ the plurality there is provided with a plurality of M ⁵ may be respectively different, and the plurality of cases to M ⁹ a plurality presence M ⁹ may be different from each other,

M ⁶ and M ¹⁰ are each independently a hydrogen atom or a halogen atom,

M ^8, and M ¹¹ are, each independently, a hydrolysable group, M ⁸ if this plurality exist, and even if each of the plurality of M ⁸ different, M ¹¹ is the case that a plurality present in each of the plurality of M ¹¹ different You can do it,

f21, f22, f23, f24, and f25 are each independently an integer from 0 to 600, and the sum of f21, f22, f23, f24, and f25 is 13 or more,

f26 and f28 are each independently an integer of 1 to 20,

f27 and f29 are each independently an integer of 0 to 2,

g2 and g3 are each independently an integer of 1 to 3,

M ¹⁰ -, M ⁶ -, f21 -{C(R ²⁵ )(R ²⁶ )}-, f22 -{C(Rf ^a26 )(Rf ^a27 )}-, f23 -{Si(R ²⁷ )( R ²⁸ )}-, ^f24 -{Si(Rf ^a28 )(Rf ^a29 )}-, f25 -M ⁷ -, f26 -[CH ₂ C(M ⁵ ) {(CH ₂ ) _f27 -Si(M ⁸ ) _g2 (R ²⁹ ) _3-g2 }], and f28 -[CH ₂ C(M ⁹ ){(CH ₂ ) _f29 -Si(M ¹¹ ) _g3 (R ³⁰ ) _3-g3 }], M ¹⁰ -, M ⁶ -are terminal, are listed in order to form a perfluoropolyether structure at least in part, and are bonded side by side in any order, unless -O- is continuous with -O-. About the combination in arbitrary order, it is the same as what was described in Formula (a2-1) above, and each repeating unit is not limited to the meaning which is listed in the same order as described in Formula (a2-2).

In the formula (a2-2), Rf ^a26 , Rf ^a27 , Rf ^a28 , and Rf ^a29 are all fluorine atoms, M ⁷ is both -O-, and M ⁸ and M ¹¹ are both methoxy groups, ethoxy groups, or Chlorine atom (especially methoxy group or ethoxy group), M ⁵ , M ⁶ , M ⁹ , and M ¹⁰ are all hydrogen atoms, f21 is 0, f22 is 30 to 150 (more preferably 80 to 140), f25 It is preferable that 30-60, f23 and f24 are 0, f27 and f29 are 0-1 (especially 0), g2 and g3 are 3, f26 and f28 are 1-10.

As a compound (A), the compound of following formula (a3) is mentioned more specifically.

In the formula (a3), R ³⁰ is a perfluoroalkyl group having 2 to 6 carbon atoms, R ³¹ and R ³² are each independently a perfluoroalkylene group having 2 to 6 carbon atoms, and R ³³ is a carbon number. It is a 2-6 trivalent saturated hydrocarbon group, and R ³⁴ is a C 1-3 alkyl group. ^{R 30, R 31, R 32} , the number of carbon atoms of R ³³ are, each independently, 2 to 4 is preferred, more preferred are 2-3. h1 is 5 to 70, h2 is 1 to 5, and h3 is 1 to 10. h1 is preferably 10 to 60, more preferably 20 to 50, h2 is preferably 1 to 4, more preferably 1 to 3, h3 is preferably 1 to 8, and 1 to 6 is more preferable. .

As a compound (A), the compound represented by following formula (a4) is also mentioned.

In the formula (a4), R ⁴⁰ is a perfluoroalkyl group having 2 to 5 carbon atoms, R ⁴¹ is a perfluoroalkylene group having 2 to 5 carbon atoms, and R ⁴² is hydrogen of an alkylene group having 2 to 5 carbon atoms. A part of the atom is a fluoroalkylene group substituted with fluorine, R ⁴³ and R ⁴⁴ are each independently an alkylene group having 2 to 5 carbon atoms, and R ⁴⁵ is a methyl group or an ethyl group. k1, k2, and k3 are each independently an integer of 1-5.

The number average molecular weight of the organosilicon compound (A) is preferably 2,000 or more, more preferably 4,000 or more, further preferably 6,000 or more, particularly preferably 7,000 or more, and also preferably 40,000 or less, more preferably It is 20,000 or less, more preferably 15,000 or less.

2. Organosilicon compound (C)

The organosilicon compound (C) is represented by the following formula (c1).

In the formula (c1),

R ^x1, R ^x2, R ^x3, and R ^x4 each independently is a hydrogen atom or a carbon number of alkyl group of from 1 to 4, in the case of R ^x1 plurality exist a plurality of R ^x1 is even, respectively different, R ^x2 When multiple exists, a plurality of R ^x2 may be different, and when multiple R ^x3 exists, a plurality of R ^x3 may be different, and when multiple R ^x4 are present, multiple R ^x4 may be different. And

Rf ^x1, Rf ^x2, Rf ^x3, and Rf ^x4 each independently is 1 or more hydrogen atoms are substituted with a fluorine atom alkyl group or a fluorine atom having 1 to 20 carbon atoms, a plurality of Rf ^x1 if Rf ^x1 plurality presence this will be respectively different, and Rf if ^x2 plurality exist and may be each a plurality of Rf ^x2 different, Rf ^x3 in this case, a plurality exist, and even if each of the plurality of Rf ^x3 different, in the case where Rf ^x4 multiple presence A plurality of Rf ^x4 may be different from each other,

R ^x5 is, the number of carbon atoms is an alkyl group of 1 to 20, if R ^x5 is present in plurality may be each a plurality of different R ^x5,

X is a hydrolyzable group, and when a plurality of Xs are present, a plurality of Xs may be different from each other,

Y is -NH- or -S-, and when a plurality of Y are present, a plurality of Y may be different from each other,

Z is a vinyl group, α-methylvinyl group, styryl group, methacryloyl group, acryloyl group, amino group, isocyanate group, isocyanurate group, epoxy group, ureido group, or mercapto group,

p1 is an integer of 1-20, p2, p3, and p4 are each independently an integer of 0-10, p5 is an integer of 1-10,

p6 is an integer from 1 to 3,

Z-, -Si(X) _p6 (R ^x5 ) _3-p6 , p1 -{C(R ^x1 )(R ^x2 )}-, p2 -{C(Rf ^x1 )(Rf ^x2 )}-, p3 -{Si(R ^x3 )(R ^x4 )}-, p4 -{Si(Rf ^x3 )(Rf ^x4 )}-, and p5 -Y-, Z- and -Si(X) _p6 (R ^x5 ) _3-p6 is terminal, and as long as -O- is not connected to -O-, they are bonded side by side in any order.

R ^x1 , R ^x2 , R ^x3 , and R ^x4 are preferably hydrogen atoms.

It is preferable that Rf ^x1 , Rf ^x2 , Rf ^x3 , and Rf ^x4 are each independently an alkyl group having 1 to 10 carbon atoms or a fluorine atom in which one or more hydrogen atoms are replaced with fluorine atoms.

It is preferable that ^Rx5 is a C1-C5 alkyl group.

X is preferably an alkoxy group, a halogeno group, a cyano group, or an isocyanate group, more preferably an alkoxy group, and more preferably a methoxy group or an ethoxy group.

It is preferable that Y is -NH-.

Z is preferably a methacryloyl group, an acryloyl group, a mercapto group or an amino group, more preferably a mercapto group or an amino group, and more preferably an amino group.

As for p1, 1-15 are preferable, More preferably, they are 2-10.

p2, p3 and p4 are each independently 0-5 are preferable, and more preferably all are 0-2.

As for p5, 1-5 are preferable, More preferably, they are 1-3.

As for p6, 2-3 are preferable, More preferably, it is 3.

As the organosilicon compound (C), in the formula (c1), R ^x1 and R ^x2 are both hydrogen atoms, Y is -NH-, X is an alkoxy group (especially a methoxy group or an ethoxy group), and Z is It is preferable to use a compound having an amino group or a mercapto group, p1 is 1 to 10, p2, p3 and p4 are all 0, p5 is 1 to 5 (particularly preferably 1 to 3), and p6 is 3 .

In addition, when the N-2-(aminoethyl)-3-aminopropyl trimethoxysilane used as the compound (C) in the later example is represented by the formula (c1), Z is an amino group, R ^x1 and R ^x2 are all The hydrogen atom, p1 is 5, p2, p3 and p4 are all 0, Y is -NH-, p5 is 1, p6 is 3, and X is a methoxy group.

It is preferable that the organosilicon compound (C) is represented by the following formula (c2).

In the formula (c2),

X ¹ is a hydrolyzable group, when X ¹ is present in plurality and a plurality of X ¹ may be each different from each other,

Y ¹ is -NH-,

Z ¹ is an amino group or a mercapto group,

R is ^x51, and the carbon number of alkyl group of 1 ~ 20, R ^x51 In this case, a plurality may be present, and the plurality of R ^x51 are each different from each other,

p61 is an integer of 1-3, q is an integer of 2-5, and r is an integer of 0-5.

X ¹ is preferably an alkoxy group, a halogeno group, a cyano group, or an isocyanate group, and more preferably an alkoxy group.

It is preferable that Z ¹ is an amino group.

R ^x51 is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 1 to 5 carbon atoms.

p61 is preferably an integer of 2 or 3, and more preferably 3.

q is preferably an integer of 2 or 3, and r is preferably an integer of 2 to 4.

The content of the organosilicon compound (A) is, for example, 0.01% by mass or more, preferably 0.05% by mass or more, and more preferably 0.5% by mass or less, more preferably in 100% by mass of the composition of the present invention. It is 0.3 mass% or less.

The content of the organosilicon compound (C) is, for example, 0.1% by mass or more, preferably 0.2% by mass or more, and more preferably 1% by mass or less, more preferably in 100% by mass of the composition of the present invention. It is 0.6 mass% or less, More preferably, it is 0.4 mass% or less.

The mass ratio of the organosilicon compound (A) to the organosilicon compound (C) is preferably 0.1 or more, more preferably 0.2 or more, and further preferably 1 or less, more preferably 0.75 or less, and more preferably 0.5 or less.

The composition of the present invention, in addition to the above-mentioned organosilicon compounds (A) and (C), usually contains a solvent (D). It is preferable to use a fluorine-based solvent as the solvent (D), and examples thereof include a fluorinated ether-based solvent, a fluorinated amine-based solvent, and a fluorinated hydrocarbon-based solvent, and particularly preferably a boiling point of 100°C or higher. As the fluorinated ether-based solvent, hydrofluoroethers such as fluoroalkyl (especially a perfluoroalkyl group having 2 to 6 carbon atoms)-alkyl (especially methyl group or ethyl group) ether are preferable, for example, ethyl nonafluorobutyl ether or And ethyl nonafluoroisobutyl ether. Examples of ethyl nonafluorobutyl ether or ethyl nonafluoroisobutyl ether include Novec (registered trademark) 7200 (manufactured by 3M, a molecular weight of about 264). As the fluorinated amine-based solvent, an amine in which at least one of the hydrogen atoms of ammonia is substituted with a fluoroalkyl group is preferable, and a tertiary amine in which all hydrogen atoms of ammonia is substituted with a fluoroalkyl group (particularly a perfluoroalkyl group) is preferable. , Specifically, tris(heptafluoropropyl)amine, and fluorinate (registered trademark) FC-3283 (manufactured by 3M, molecular weight of about 521). Examples of the fluorinated hydrocarbon-based solvent include fluorinated aliphatic hydrocarbon-based solvents such as 1,1,1,3,3-pentafluorobutane, and fluorinated aromatic hydrocarbon-based solvents such as 1,3-bis(trifluoromethylbenzene). have. Examples of 1,1,1,3,3-pentafluorobutane include Solve 55 (manufactured by Solvex) and the like.

As the fluorine-based solvent, in addition to the above, hydrochlorofluorocarbons such as AsahiClean (registered trademark) AK225 (manufactured by Asahi Glass) and hydrofluorocarbons such as AsahiClean (registered trademark) AC2000 (manufactured by Asahi Glass) can be used. .

As the solvent (D), it is preferable to use at least a fluorinated amine-based solvent. Moreover, as a solvent (D), it is also preferable to contain 2 or more types of fluorine-based solvents, and it is also preferable to contain a fluorinated amine-based solvent and a fluorinated hydrocarbon-based solvent (especially a fluorinated aliphatic hydrocarbon-based solvent).

The composition of the present invention, in a range that does not impair the effects of the present invention, a silanol condensation catalyst, antioxidant, antirust agent, ultraviolet absorber, light stabilizer, antiseptic agent, antibacterial agent, bio adhesion prevention agent, deodorant, pigment , Flame retardants, antistatic agents, and other additives.

A film can be formed on a substrate by applying the composition of the present invention to the substrate and drying it. Examples of the method for applying the composition of the present invention include a dip coating method, a roll coating method, a bar coating method, a spin coating method, a spray coating method, a die coating method, and a gravure coating method.

The conditions after applying the composition of the present invention to the substrate are not particularly limited, and may be left at room temperature or in the air, for example, for 1 hour or more. In the present invention, the normal temperature is 5 to 60°C, and preferably, the film can be formed by standing in a temperature range of 15 to 40°C. Thereafter, it may be further heated (fired) at a temperature of 50 to 300°C, preferably 100 to 200°C, for about 10 to 60 minutes.

The thickness of the film formed from the composition of the present invention is, for example, 0.1 to 100 nm. The film has water repellency, and the water contact angle (initial contact angle) measured at a liquid amount: 3 μL by a droplet method (analysis method: θ/2 method) is, for example, 105° or more, more preferably 110 ° or more, and for example, 120 ° or less. In addition, after performing the chemical resistance test performed in the later examples, the water contact angle (contact angle after chemical test) measured at 3 μL of the liquid amount by the droplet method (analysis method: θ/2 method) is, for example, 86.0° or more. Is, preferably 90° or more, more preferably 100° or more (especially 105° or more), the upper limit being, for example, 115° or less, and may be 110° or less.

The material of the base material to which the composition of the present invention is applied is not particularly limited, and may be either an organic material or an inorganic material, and the shape of the base material may be either a flat surface or a curved surface, or a combination of these. Examples of the organic material include acrylic resin, polycarbonate resin, polyester resin, styrene resin, acrylic-styrene copolymer resin, cellulose resin, polyolefin resin, and vinyl resin (polyethylene, polyvinyl chloride, polystyrene, vinylbenzyl chloride resin, polyvinyl Thermoplastic resins such as alcohol); And thermosetting resins such as phenol resins, urea resins, melamine resins, epoxy resins, unsaturated polyesters, silicone resins, and urethane resins. Examples of the inorganic material include metals such as iron, silicon, copper, zinc, and aluminum, or alloys containing these metals, ceramics, and glass. Among these, an organic material is particularly preferable, and the surface-treated resin substrate having a coating made of the composition of the present invention on the surface of the resin substrate is also included in the present invention. Among the resin substrates, at least one of acrylic resin, benzyl chloride-based resin, epoxy resin, silicone resin, and urethane resin is preferred, and acrylic resin is particularly preferred.

The base material to which the composition of the present invention is applied may be subjected to an easy adhesion treatment. Examples of the adhesion treatment include hydrophilization treatments such as corona treatment, plasma treatment, and ultraviolet treatment. By performing an easy adhesion treatment such as plasma treatment, functional groups such as OH groups (especially when the substrate is an epoxy resin) or COOH groups (especially when the substrate is an acrylic resin) can be formed on the surface of the substrate, and on the substrate surface In the case where such a functional group is formed, adhesion between the film formed of the composition of the present invention and the substrate may be more improved.

In a preferred embodiment, a coating is applied by coating the composition of the present invention on a protective layer (hereinafter, sometimes referred to as a hard coating layer) provided for abrasion resistance of an electronic device, such as a display, to protect an article from wounds. It can be formed, and a laminate of the hard coat layer and the coating layer formed of the composition of the present invention can be formed.

The hard coating layer described above is a layer having a surface hardness, and the hardness is, for example, 2H or more in pencil hardness. The hard coat layer may have a single layer structure or a multilayer structure. The hard coating layer is made of a hard coating layer resin, and as the hard coating layer resin, for example, an acrylic resin, an epoxy resin, a urethane resin, a vinyl benzyl chloride resin, a vinyl resin or a silicone resin, or ultraviolet rays such as mixed resins Curable, electron beam curable, or thermosetting resins. In particular, it is also preferable that the hard coating layer contains an acrylic resin in order to express high hardness. It is preferable to contain an epoxy-based resin from the viewpoint of showing a tendency of good adhesion with the coating layer formed of the composition of the present invention.

The hard coating layer may further contain an ultraviolet absorber, and may contain a metal oxide such as silica or alumina, or an inorganic filler such as polyorganosiloxane. By including such an inorganic filler, adhesiveness with the coating layer formed from the composition of this invention can be improved. The thickness of the hard coating layer is, for example, 1 to 100 μm.

The laminate of the hard coating layer and the coating layer formed of the composition of the present invention preferably further includes a resin layer, and in turn from the surface of the laminate, the coating layer, the hard coating layer, the number of layers formed of the composition of the present invention. You can do this in order of strata. The resin component of the resin layer is not particularly limited, but polyacrylate resin, polyamide resin, polyimide resin, polyamide imide resin, polyurethane resin, polyester resin, polycarbonate resin, polyether sulfide Phone-based resins, acetyl cellulose-based resins, cycloolefin-based resins, polyvinyl alcohol-based resins, and the like are preferred from the viewpoint of easy adhesion to the hard coating layer, and among them, polyimide-based resins and polyamide-imide-based resins are preferred. The thickness of the resin layer is, for example, 10 to 500 μm. Further, a laminate of a hard coating layer and an antireflection layer may be used, and the hard coating layer may have a function of an antireflection layer.

A primer layer may be formed between the resin layer and the hard coat layer. As the primer agent, for example, a primer agent such as an ultraviolet curing type, a thermosetting type, or a two-liquid curing type epoxy compound is used. It is preferable that the compound contained in the primer layer is chemically bonded to the resin component contained in the resin layer or the silicon material included as necessary. Moreover, as a primer agent, you may use polyamic acid, and adhesiveness of a resin layer and a hard coating layer can be improved. Moreover, a silane coupling agent is mentioned as a primer agent, You may chemically bond with the silicon material contained in a resin base material as needed by a condensation reaction. The thickness of the primer layer is, for example, 0.1 to 20 μm.

Example

Hereinafter, the present invention will be described in more detail with reference to Examples. The present invention is not limited by the following examples, and, of course, it is possible to carry out with appropriate changes in a range that can be suitable for the above and later purposes, and they are all included in the technical scope of the present invention.

Example 1

As an organosilicon compound (A), a compound represented by the following formula (1) (hereinafter compound a) and FC-3283 (C ₉ F ₂₁ N, fluorine nut, manufactured by 3M) as a solvent (D) were mixed to room temperature. After stirring for a predetermined period of time, KBM-603 (N-2-(aminoethyl)-3-aminopropyltrimethoxysilane, manufactured by Shin-Etsu Chemical Industry Co., Ltd.) was used as the organosilicon compound (C), the compound (A) and It added dropwise so that it might become 0.25 mass% with respect to the total amount of the solvent (D). Thereafter, the mixture was stirred at room temperature for a predetermined time to obtain a film forming solution. In this solution, the proportion of compound (A) is 0.085% by mass. The obtained solution was applied onto a substrate having an acrylic hard coating layer on which the surface to be coated was activated using an atmospheric pressure plasma device (manufactured by Fuji Machine Manufacturing Co., Ltd.) using a spray coater manufactured by Apiros Co., Ltd. Thereafter, firing was performed at 120°C for 20 minutes to obtain a transparent film on the acrylic hard coating layer. In addition, the conditions of the spray coat are scan speed: 600 mm/sec, pitch: 5 mm, liquid amount: 6 cc/min, atomizing air: 350 kPa, gap: 70 mm.

The compound a represented by the formula (1) is synthesized by the method described in Synthesis Examples 1 and 2 of JP 2014-15609 A, r is 43 and s is an integer from 1 to 6, and the number average. The molecular weight is about 8000.

Comparative Example 1

A transparent film was obtained on the acrylic hard coating substrate in the same manner as in Example 1, except that 1% by mass of γ-(2,3-epoxypropoxy)propyltrimethoxysilane was used instead of KBM-603.

The following measurements were performed on the films obtained in the above Examples and Comparative Examples.

(1) Measurement of water contact angle (initial contact angle)

3 μL of water was added dropwise to the obtained film, and the contact angle of water was measured by a droplet method (analysis method: θ/2 method) using a contact angle measuring device (manufactured by Kyowa Interface Science, DM700).

(2) Measurement of water contact angle after chemical resistance test

To the obtained film, a load of 1000 g was applied to the obtained film in a state where the eraser was in contact with the film using a scratch device provided with a minoan eraser. About 2.5 ml of ethanol was added dropwise thereto, and an eraser was reciprocated on the film at a rate of 40 r/min (40 reciprocations per minute) to perform a chemical resistance test. The contact angle of water after the eraser reciprocated the film 3000 times was measured.

Table 1 shows the results.

In Example 1 using the organosilicon compounds (A) and (C) of the present invention, compared to the organosilicon compound (C) of the present invention, the water contact angle after the chemical resistance test was better than 86.0°, compared to the organosilicon compound (C) In Comparative Example 1 using an organosilicon compound different from (C), the water contact angle after the chemical resistance test decreased. In addition, Example 1 using the organosilicon compounds (A) and (C) of the present invention had good transparency and appearance of the coating, but the coating of Comparative Example 1 showed white haze, and transparency and appearance were also poor.

The composition of the present invention includes a display device such as a touch panel display, an optical element, a semiconductor element, a building material, a nanoimprint technology, a solar cell, a metal product such as a window glass of an automobile or a building, a cooking appliance, a ceramic product such as tableware, It can be formed into a film suitable for plastic automobile parts, and is useful in industry. In addition, it is preferably used for articles, goggles, glasses, etc. of each member around the kitchen, bathroom, sink, mirror, and toilet.

Claims (6)

A composition comprising the organosilicon compound (A) represented by formula (a1) and the organosilicon compound (C) represented by formula (c1).
[Formula 1]

In the formula (a1),
Rf ^a1 is a divalent perfluoropolyether structure whose both ends are oxygen atoms,
R ^11, R ^12, and R ¹³ is each independently an alkyl group having 1 to 20 carbon atoms, when R ¹¹ is plural exist, and even if each of the plurality of R ¹¹ different from each other, a plurality of cases to R ¹² are a plurality presence the R ¹² and each may be different, and if R ¹³ is present in plurality and a plurality of R ¹³ may be each different from each other,
E ^1, E ^2, E ^3, E ^4, and E ⁵ are each independently a hydrogen atom or a fluorine atom, E ¹ If a plurality exist, and even if each of the plurality of E ¹ phase, E ² is the plurality presence when there is even a respective plurality of different E ^2, E ³ is the case that a plurality exist and a plurality of E ³ may be respectively different, and if the E ⁴ is present in the plurality, and each may be a plurality of different E ^4,
G ¹ and G ² are each independently a 2-10 organosiloxane group having a siloxane bond,
J ¹ , J ² , and J ³ are each independently a hydrolyzable group or -(CH ₂ ) _e6 -Si(OR ¹⁴ ) ₃ , e6 is 1 to 5, R ¹⁴ is a methyl group or an ethyl group, and J when the ^first plurality present, and even if each of the plurality of J ¹ different from each other, if J ² is a plurality exist, and even if each of the plurality of J ² different, J ³ is the case that a plurality present in each of the plurality of J ³ different You can do it,
L ¹ and L ² are, each independently, an oxygen atom, a divalent linking group of 1 to 12 carbon atoms which may contain a nitrogen atom, a fluorine atom, if L ¹ is plural exist even if a plurality of L ¹ are each different and, if L ² is present in the plurality, and each may be a plurality of L ² different from each other,
d11 is 1 to 9,
d12 is 0-9,
a10 and a14 are 0-10 each independently,
a11 and a15 are each independently 0 or 1,
a12 and a16 are each independently 0 to 9,
a13 is 0 or 1,
a21, a22, and a23 are each independently 0 to 2,
e1, e2, and e3 are respectively 1-3 respectively.
[Formula 2]

In the formula (c1),
R ^x1, R ^x2, R ^x3, R ^x4 each independently is a hydrogen atom or a carbon number of alkyl group of from 1 to 4, in the case of R ^x1 plurality exist, and a plurality of R ^x1 is even, respectively different, R ^x2 is When there are multiple, multiple R ^x2 may differ, respectively, and when multiple R ^x3 exists, multiple R ^x3 may differ, and when multiple R ^x4 exist, multiple R ^x4 may differ. ,
Rf ^x1 , Rf ^x2 , Rf ^x3 , and Rf ^x4 are each independently an alkyl group or a fluorine atom having 1 to 20 carbon atoms in which one or more hydrogen atoms are replaced with fluorine atoms, and when multiple Rf ^x1 exists, a plurality of Rf ^x1 will be respectively different, when the Rf ^x2 sometimes plurality exist, and even if each of a plurality of Rf ^x2 different, if Rf ^x3 plurality exist, and even if each of the plurality of Rf ^x3 different, Rf ^x4 the plurality present in the plurality Rf ^x4 of each may be different,
R ^x5 is, the number of carbon atoms is an alkyl group of 1 to 20, if R ^x5 is present in plurality may be each a plurality of different R ^x5,
X is a hydrolyzable group, and when a plurality of Xs are present, a plurality of Xs may be different from each other,
Y is -NH- or -S-, and when a plurality of Y are present, a plurality of Y may be different from each other,
Z is a vinyl group, α-methylvinyl group, styryl group, methacryloyl group, acryloyl group, amino group, isocyanate group, isocyanurate group, epoxy group, ureido group, or mercapto group,
p1 is an integer from 1 to 20, p2, p3, and p4 are each independently an integer from 0 to 10, p5 is an integer from 1 to 10,
p6 is an integer from 1 to 3,
Z-, -Si(X) _p6 (R ^x5 ) _3-p6 , p1 -{C(R ^x1 )(R ^x2 )}-, p2 -{C(Rf ^x1 )(Rf ^x2 )}-, p3 -{Si(R ^x3 )(R ^x4 )}-, p4 -{Si(Rf ^x3 )(Rf ^x4 )}-, p5 -Y-, Z- and -Si(X) _p6 (R ^x5 ) As long as _3-p6 is terminal and -O- is not connected to -O-, they are bonded side by side in any order. According to claim 1,
The said organosilicon compound (C) is 0.1 mass% or more, and 1 mass% or less of the total mass of a composition. The method of claim 1 or 2,
A composition in which the organosilicon compound (C) is represented by the following formula (c2).
[Formula 3]

In the formula (c2),
X ¹ is a methoxy group or an ethoxy group, if X ¹ is present in plurality and a plurality of X ¹ may be each different from each other,
Y ¹ is -NH-,
Z ¹ is an amino group or a mercapto group,
R is ^x51, and the carbon number of alkyl group of 1 ~ 20, R ^x51 In this case, a plurality may be present, and the plurality of R ^x51 are each different from each other,
p61 is an integer of 1-3, q is an integer of 2-5, and r is an integer of 0-5. A surface-treated resin substrate having a coating made of the composition according to any one of claims 1 to 3 on the surface of the resin substrate. The method of claim 4,
The said resin base material is a surface-treated resin base material which is an acrylic resin base material. The manufacturing method of the surface-treated resin base material which apply|coats the composition in any one of Claims 1-3 on the surface of a resin base material, and hardens at normal temperature.