WO2021166736A1 - Multilayer body and flexible display device - Google Patents

Multilayer body and flexible display device Download PDF

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Publication number
WO2021166736A1
WO2021166736A1 PCT/JP2021/004722 JP2021004722W WO2021166736A1 WO 2021166736 A1 WO2021166736 A1 WO 2021166736A1 JP 2021004722 W JP2021004722 W JP 2021004722W WO 2021166736 A1 WO2021166736 A1 WO 2021166736A1
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Prior art keywords
different
group
independently
carbon atoms
layer
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PCT/JP2021/004722
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French (fr)
Japanese (ja)
Inventor
真芳 ▲徳▼田
友宏 伊藤
知典 宮本
みちる 上原
Original Assignee
住友化学株式会社
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Priority to CN202180007445.0A priority Critical patent/CN114868045A/en
Priority to KR1020227032014A priority patent/KR20220140827A/en
Publication of WO2021166736A1 publication Critical patent/WO2021166736A1/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/023Optical properties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • C08L101/02Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C08L101/10Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing hydrolysable silane groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/18Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements

Definitions

  • the present invention relates to a laminate and a flexible display device.
  • a fluorine-based water-repellent film represented by a film formed from a composition containing a compound having a perfluoropolyether structure has a very small surface free energy, so that it is a display device such as a touch panel display, an optical element, or a semiconductor element.
  • a display device such as a touch panel display, an optical element, or a semiconductor element.
  • Building materials, windowpanes of automobiles and buildings, etc., are used as antifouling coatings, water-repellent and oil-repellent coatings, and the like.
  • the water-repellent film is usually formed on a base material and used, and when the composition for forming a water-repellent film is applied to the base material, after another layer such as a primer layer is formed on the base material in advance. ,
  • the composition may be applied to form an antifouling coating or a water- and oil-repellent coating.
  • Patent Document 1 describes a hard coat film in which a hard coat layer (X), a primer layer (Y), and a surface layer (Z) are laminated in this order on at least one surface of a base material, and the surface layer (X).
  • a hard coat film having a water contact angle of 110 ° or more in Z) is disclosed.
  • a silane compound such as methoxysilane is preferable.
  • an object of the present invention is to provide a laminated body in which a base material, an intermediate layer, and a water-repellent layer are laminated in this order, and even if it is a thin film, it has excellent wear resistance.
  • the reflectance after deducting the loss and the back surface reflection loss is 4.5% or less.
  • the thickness of the laminated body is 500 ⁇ m or less.
  • the laminate according to [1] which satisfies the following requirement (3).
  • the surface fluorine element ratio on the water-repellent layer (r) side is 30 atomic% or more.
  • the laminate according to [1] or [2] which satisfies at least one of the following requirements (4) and (5).
  • the arithmetic mean height Sa on the water-repellent layer (r) side is 0.03 to 1.00 ⁇ m.
  • the sliding angle of water on the water-repellent layer (r) side is 25 ° or less.
  • the water-repellent layer (r) is a mixed composition (ca) of an organosilicon compound (A) represented by the following formula (a1) and an organosilicon compound (B) represented by the following formula (b1).
  • Rf a1 has a divalent perfluoropolyether structure in which both ends are oxygen atoms.
  • R 11, R 12, and R 13 are each independently an alkyl group having 1 to 20 carbon atoms, if R 11 there are a plurality may be different plural R 11 are each, R 12 is more if present may be different plurality of R 12 each may be the case where R 13 there are a plurality of different plural R 13 are each, E 1 , E 2 , E 3 , E 4 , and E 5 are independently hydrogen or fluorine atoms, respectively.
  • E 1 there are a plurality may be the different plurality of E 1, respectively, when the E 2 there are a plurality may be different plurality of E 2 are each of a plurality if E 3 there are multiple E 3 may have been different, or different plural E 4 each if E 4 there are a plurality, if E 5 there are a plurality may be different plurality of E 5, respectively,
  • G 1 and G 2 are 2- to 10-valent organosiloxane groups each independently having a siloxane bond.
  • J 1 , J 2 , and J 3 are independently hydrolyzable groups or-(CH 2 ) e6- Si (OR 14 ) 3 , e 6 is 1-5, and R 14 is a methyl group.
  • J 1 there are a plurality may be different plurality of J 1, respectively, when J 2 there are a plurality may be different plurality of J 2, respectively, J 3 is more Multiple J 3s may be different if they exist L 1 and L 2 are divalent linking groups having 1 to 12 carbon atoms which may independently contain an oxygen atom, a nitrogen atom, or a fluorine atom, and when a plurality of L 1s are present, a plurality of L 1 and L 2 are divalent linking groups.
  • L 1 It may be different for L 1, respectively, if L 2 there are a plurality may be different plurality of L 2, respectively, d11 is 1-9, d12 is 0-9, a10 and a14 are 0 to 10 independently of each other. a11 and a15 are independently 0 or 1, respectively. a12 and a16 are 0 to 9 independently of each other. a13 is 0 or 1, a21, a22, and a23 are 0 to 2 independently of each other. e1, e2, and e3 are 1 to 3 independently of each other.
  • Rf b10 is an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are replaced with fluorine atoms.
  • R b11, R b12, R b13 and R b14 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R b11 there are a plurality differ plurality of R b11 each may, if R b12 there are a plurality may be different plural R b12 each may be the case where R b13 there are a plurality of different plural R b13 are each if R b14 there are multiple May have different R b14s, Rf b11, Rf b12, Rf b13 and Rf b14 are each independently one or more hydrogen atoms is an alkyl group or a fluorine atom carbon number of 1 to 20 substituted by a fluorine atom, Rf b11 multiple presence
  • R is a hydrogen atom, a fluorine-containing alkyl group of the alkyl group having 1 to 4 carbon atoms having 1 to 4 carbon atoms, if a 1 there are a plurality may be different plurality of a 1, respectively,
  • a 2 is a hydrolyzable group, if A 2 there are a plurality may be different plurality of A 2, respectively, b11, b12, b13, b14 and b15 are independently integers from 0 to 100, respectively.
  • c is an integer of 1 to 3 and Rf b10 -, - Si (A 2) c (R b15) 3-c, b11 amino - ⁇ C (R b11) ( R b12) ⁇ -, b12 amino - ⁇ C (Rf b11) ( Rf b12) ⁇ -, B13- ⁇ Si (R b13 ) (R b14 ) ⁇ -, b14- ⁇ Si (Rf b13 ) (Rf b14 ) ⁇ -, b15 -A 1- are Rf b10- , Arranged in any order as long as -Si (A 2 ) c (R b15 ) 3-c is the terminal, does not form a perfluoropolyether structure, and -O- is not linked to -O- to -F.
  • the intermediate layer (c) is the cured layer of the mixed composition (cc) of the organosilicon compound (C) represented by any of the following formulas (c1) to (c3) or the organosilicon compound (C). ), which is the laminated body according to any one of [1] to [5].
  • R x11, R x12, R x13 , R x14 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R x11 there are a plurality differ plurality of R x11 are each may, if R x12 there are a plurality may be different plural R x12 are each may be the case where R x13 there are a plurality of different plural R x13 are each if R x14 there are multiple May have different R x14s, Rf x11 , Rf x12 , Rf x13 , and Rf x14 are each independently an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf x11.
  • Rf x11 differs if the Rf x12 there are a plurality may be different plurality of Rf x12, respectively, a plurality of Rf x13 If Rf x13 is present in plural even if well, if Rf x14 there are a plurality may be different plurality of Rf x14, respectively, R x15 is an alkyl group having 1 to 20 carbon atoms, it may be the case where R x15 there are a plurality of different plural R x15 are each, X 11 is a hydrolysable group, if X 11 there are a plurality may be different plurality of X 11 are each, Y 11 is, -NH-, or -S-.
  • Z 11 is a vinyl group, an ⁇ -methylvinyl group, a styryl group, a methacryloyl group, an acryloyl group, an amino group, an isocyanate group, an isocyanurate group, an epoxy group, a ureido group, or a mercapto group.
  • p1 is an integer of 1 to 20
  • p2, p3, and p4 are independently integers of 0 to 10
  • p5 is an integer of 1 to 10.
  • p6 is an integer of 1 to 3 and If Z 11 is not an amino group, then at least one of Y 11 is -NH-, and if Y 11 is all -S-, then Z 11 is an amino group.
  • R x20 and R x21 are each independently a hydrogen atom or an alkyl group of 1 to 4 carbon atoms, if R x20 there are a plurality may be different plural R x20 are each, R x21 is When there are a plurality of R x21s, the plurality of R x21s may be different from each other, and Rf x20 and Rf x21 are each independently an alkyl group having 1 to 20 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms.
  • Rf x20 there are a plurality may be different from each plurality of Rf x20, when Rf x21 there are a plurality may be different plurality of Rf x21, respectively,
  • each R x22 and R x23 is independently an alkyl group having 1 to 20 carbon atoms, may be the case where R x22 and R x23 there are a plurality of different plural R x22 and R x23 are each, X 20 and X 21 are each independently a hydrolysable group, if X 20 and X 21 there are a plurality may be different plurality of X 20 and X 21 are each,
  • p20 is an integer of 1 to 30 independently
  • p21 is an integer of 0 to 30 independently
  • at least one of the repeating units in parentheses with p20 or p21 is It has been replaced by an amine skeleton-NR 100 -where R 100 in the amine skeleton is a hydrogen atom or an al
  • p22 and p23 are independently integers of 1 to 3, respectively.
  • the p20- ⁇ C (R x20 ) (R x21 ) ⁇ -and the p21- ⁇ C (Rf x20 ) (Rf x21 ) ⁇ -do not have to be continuous p20 or p21, and are arbitrary. They are joined side by side in order, and both ends are -Si (X 20 ) p22 (R x22) 3-p22 and -Si (X 21 ) p23 (R x23 ) 3-p23 .
  • Z 31 and Z 32 are reactive functional groups other than the hydrolyzable group and the hydroxy group, respectively.
  • R x31, R x32, R x33 , R x34 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R x31 there are a plurality differ plurality of R x31 are each may, if R x32 there are a plurality may be different plural R x32 are each may be the case where R x33 there are a plurality of different plural R x33 are each if R x34 there are multiple May have different R x 34s, Rf x31 , Rf x32 , Rf x33 , and Rf x34 are independently alkyl groups or fluorine atoms having 1 to 20 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf x31.
  • Rf x31 may be different plurality of Rf x31 respectively, differ if the Rf x32 there are a plurality may be different plurality of Rf x32, respectively, a plurality of Rf x33 If Rf x33 is present in plural even if well, if Rf x34 there are a plurality may be different plurality of Rf x34, respectively, Y 31 is, -NH -, - N (CH 3) - or -O-.
  • X 31 , X 32 , X 33 , and X 34 are independently -OR c (R c is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an amino C 1-3 alkyl di C 1-3 alkoxysilyl.
  • a is a group), if X 31 there are a plurality may be different plurality of X 31 are each, if X 32 there are a plurality may be different plurality of X 32 are each, X 33 is If there are two or more may be different plurality of X 33 are each, if X 34 there are a plurality may be different plurality of X 34 are each, p31 is an integer of 0 to 20, p32, p33, and p34 are independently integers of 0 to 10, p35 is an integer of 0 to 5, and p36 is an integer of 1 to 10.
  • p37 is 0 or 1
  • the laminate of the present invention including the base material (s), the intermediate layer (c), and the water-repellent layer (r) in this order has wavelengths at an incident angle of 12 ° and a reflection angle of 12 ° measured on the surface of the water-repellent layer side. It has the requirement that the reflectance of 530 nm, which is obtained by subtracting the front surface reflectance loss and the back surface reflectance loss from the reflectance calculated by the JIS Z8701 2 degree field (C light source), is 4.5% or less. It has excellent wear resistance and also has a requirement of a thickness of 500 ⁇ m or less, so that both wear resistance and a thin film can be achieved at the same time.
  • the laminate of the present invention is a laminate having a base material (s), an intermediate layer (c), and a water-repellent layer (r) in this order, and satisfies the following requirements (1) and (2). ..
  • the reflectance after deducting the reflection loss is 4.5% or less.
  • the thickness of the laminated body is 500 ⁇ m or less.
  • the reflectance is preferably 4.3% or less, more preferably 3.5% or less, further preferably 2.5% or less, and even if it is 0.5% or more. good.
  • the thickness of the laminate of the present invention is preferably 400 ⁇ m or less, more preferably 300 ⁇ m or less, further preferably 200 ⁇ m or less, most preferably 100 ⁇ m or less, and 10 ⁇ m or more. May be good.
  • the laminate of the present invention satisfies the above requirements (1) and (2) and further satisfies at least one of the following requirements (3) to (5).
  • the surface fluorine element ratio on the water-repellent layer (r) side is 30 atomic% or more. By satisfying the requirement (3) above, better water repellency can be realized.
  • the surface fluorine element ratio is more preferably 40 atomic% or more, still more preferably 50 atomic% or more.
  • the upper limit of the surface fluorine element ratio is not particularly limited, but is, for example, 80 atomic%.
  • the surface fluorine element ratio can be measured by the method described in Examples described later.
  • the arithmetic mean height Sa on the water-repellent layer (r) side is 0.03 to 1.00 ⁇ m. By providing the requirement (4) above, the wear resistance can be further improved. The requirement (4) is also effective in achieving better water repellency and / or slipperiness.
  • the surface height Sa on the water-repellent layer (r) side is more preferably 0.70 ⁇ m or less, further preferably 0.50 ⁇ m or less, and even more preferably 0.30 ⁇ m or less. Further, the surface height Sa may be 0.04 ⁇ m or more, or may be 0.05 ⁇ m or more.
  • the arithmetic mean height Sa is calculated in accordance with ISO 25178.
  • the sliding angle of water on the water-repellent layer (r) side is 25 ° or less.
  • the sliding angle of water is more preferably 20 ° or less, further preferably 15 ° or less, and even more preferably 10 ° or less.
  • the lower limit of the sliding angle of water is not particularly limited, but is, for example, 1 °.
  • the water-repellent layer (r) is preferably a cured layer of a mixed composition (ca) of the organosilicon compound (A) and the organosilicon compound (B).
  • Organosilicon compound (A) In the organosilicon compound (A), a monovalent group having a perfluoropolyether structure is bonded to a silicon atom, and a hydrolyzable group is bonded to the silicon atom via a linking group or not via a linking group. It is a compound that is used.
  • the water-repellent layer (r) is preferably obtained by applying the composition (ca) and curing it, and has a structure derived from the organosilicon compound (A). As described above, the organosilicon compound (A) has a hydrolyzable group bonded to a silicon atom (may be bonded via a linking group), and the organosilicon compound (A) produced by hydrolysis is produced.
  • -SiOH groups Si and OH may be bonded via a linking group
  • the water-repellent layer (r) usually has a condensed structure derived from the organosilicon compound (A).
  • the hydrolyzable group include an alkoxy group, a halogen atom, a cyano group, an acetoxy group, an isocyanate group and the like.
  • the perfluoropolyether structure can also be referred to as a perfluorooxyalkylene group.
  • the perfluoropolyether structure has liquid repellency such as water repellency or oil repellency.
  • the number of carbon atoms contained in the longest linear portion of the perfluoropolyether structure is, for example, preferably 5 or more, more preferably 10 or more, and even more preferably 20 or more.
  • the upper limit of the number of carbon atoms is not particularly limited, and may be, for example, about 200.
  • the monovalent group having a perfluoropolyether structure of the organosilicon compound (A) preferably further has a perfluoroalkyl group at the free end.
  • the water-repellent layer (r) can also be shown as a layer having a perfluoropolyether structure and a polysiloxane skeleton, and preferably further has a perfluoroalkyl group.
  • the water-repellent layer (r) has a structure in which a monovalent group having a perfluoroalkyl structure and a perfluoroalkyl group at the free end is bonded to a part of the silicon atom of the polysiloxane skeleton. Is preferable.
  • the presence of the perfluoroalkyl group on the free end side improves water repellency.
  • the carbon number of the perfluoroalkyl group (particularly the carbon number of the longest straight chain portion) is preferably, for example, 3 or more, more preferably 5 or more, and even more preferably 7 or more.
  • the upper limit of the number of carbon atoms is not particularly limited, and even if it is, for example, about 20, it exhibits excellent water repellency.
  • the perfluoroalkyl group may form a fluorine-containing group such as a fluoroalkyl group by bonding with a group in which at least a part of the hydrogen atom of the hydrocarbon group and / or the hydrocarbon group is substituted with a fluorine atom.
  • CF 3 (CF 2) m - (CH 2) n -, CF 3 (CF 2) m -C 6 H 4 - (m is 1 to 10 both are preferably the 3 ⁇ 7, n Is 1 to 5, preferably 2 to 4), and CF 3 (CF 2 ) m- (CH 2 ) n- (m is 1 to 10, preferably 3 to 4). 7 and n are all 1 to 5, preferably 2 to 4). It is more preferable that the perfluoroalkyl group is directly bonded to the perfluoropolyether structure.
  • a monovalent group having a perfluoropolyether structure and a silicon atom may be bonded via an appropriate linking group, and the perfluoropolyether may be bonded without the linking group.
  • the monovalent group having may be directly bonded to the silicon atom.
  • the linking group include a hydrocarbon group such as an alkylene group and an aromatic hydrocarbon group, a (poly) alkylene glycol group, a group in which a part of these hydrogen atoms is substituted with a fluorine atom or a substituent, and these. Examples thereof include groups in which are appropriately linked.
  • the carbon number of the linking group is, for example, 1 or more and 20 or less, preferably 2 or more and 15 or less.
  • the hydrolyzable group has an action of binding the organosilicon compounds (A) to each other or the organosilicon compound (A) and active hydrogen (hydroxyl group or the like) on the surface of the base material through a hydrolysis / dehydration condensation reaction.
  • a hydrolyzable group include an alkoxy group (particularly an alkoxy group having 1 to 4 carbon atoms), a hydroxy group, an acetoxy group, and a halogen atom (particularly a chlorine atom).
  • Preferred hydrolyzable groups are an alkoxy group and a halogen atom, and a methoxy group, an ethoxy group and a chlorine atom are particularly preferable.
  • the hydrolyzable group may be bonded to a silicon atom via a linking group, or may be directly bonded to a silicon atom without a linking group.
  • the number of hydrolyzable groups bonded to the silicon atom may be one or more and may be 2 or 3, but is preferably 2 or 3, and particularly preferably 3.
  • different hydrolyzable groups may be bonded to the silicon atom, but the same hydrolyzable group is bonded to the silicon atom.
  • the total number of fluorine-containing groups and hydrolyzable groups bonded to the silicon atom is usually 4, but may be 2 or 3 (particularly 3).
  • a monovalent group other than the hydrolyzable group may be bonded to the remaining bond, for example, an alkyl group (particularly an alkyl group having 1 to 4 carbon atoms), H, NCO. Etc. can be combined.
  • the monovalent group having a perfluoropolyether structure of the organosilicon compound (A) may be linear or may have a side chain, and is preferably linear.
  • the organosilicon compound (A) can be represented by, for example, the following formula (a).
  • D 1 represents a monovalent group having a perfluoropolyether structure
  • the ends of the side that bind to D 2 in D 1 is -CF 2 -O - *, - CFD 9 - * at Yes (* is the bond on the D 2 side)
  • D 2 is a single bond or a divalent hydrocarbon group not substituted with a fluorine atom
  • D 3 is a trivalent hydrocarbon group not substituted with a fluorine atom.
  • a part of the methylene group of the hydrocarbon group may be replaced with an oxygen atom
  • D 4 is a hydrogen atom or a fluorine atom
  • D 5 is a single bond or a divalent hydrocarbon group
  • D 6 is a monovalent group other than a hydrolyzable group
  • D 7 is a divalent group or a single bond
  • D 8 is a hydrolyzable group
  • D 9 is a hydrogen atom, a fluorine atom, or a hydrocarbon. It is a group, n1 is 1 to 30, and n2 is 1 to 3. Examples of the hydrolyzable group of D 8 include those mentioned above.
  • the organosilicon compound (A) is preferably represented by the following formula (a1).
  • Rf a1 has a divalent perfluoropolyether structure in which both ends are oxygen atoms.
  • R 11 , R 12 , and R 13 are independent alkyl groups having 1 to 20 carbon atoms (that is, R 11 and R 12 and R 13 may be the same or different from each other).
  • R 11 there are a plurality may be different plurality of R 11 each may be the case where R 12 there are a plurality of different plural R 12 are each, if R 13 there are a plurality of May have different R 13s, E 1, E 2, E 3 , E 4, and E 5 is, independently represents a hydrogen atom or a fluorine atom, if E 1 there are a plurality may be different plurality of E 1, respectively, E 2 may be the case where there are plural different multiple E 2 respectively, when the E 3 there are a plurality may be different plurality of E 3 respectively, the plurality of E if E 4 there are a plurality of 4 may be different from each, if E 5 there are a plurality may be different plurality of E 5, respectively, G 1 and G 2 are 2- to 10-valent organosiloxane groups each independently having a siloxane bond.
  • J 1 , J 2 , and J 3 are independently hydrolyzable groups or-(CH 2 ) e6- Si (OR 14 ) 3 , e 6 is 1-5, and R 14 is a methyl group. or an ethyl group, if J 1 there are a plurality may be different plurality of J 1, respectively, when J 2 there are a plurality may be different plurality of J 2, respectively, J 3 is more Multiple J 3s may be different if they exist L 1 and L 2 are divalent linking groups having 1 to 12 carbon atoms which may independently contain an oxygen atom, a nitrogen atom, or a fluorine atom, and when a plurality of L 1s are present, a plurality of L 1 and L 2 are divalent linking groups.
  • L 1 It may be different for L 1, respectively, if L 2 there are a plurality may be different plurality of L 2, respectively, d11 is 1-9, d12 is 0-9, a10 and a14 are 0 to 10 independently of each other. a11 and a15 are independently 0 or 1, respectively. a12 and a16 are 0 to 9 independently of each other. a13 is 0 or 1, a21, a22, and a23 are 0 to 2 independently of each other. e1, e2, and e3 are 1 to 3 independently of each other.
  • the organosilicon compound (A) has a perfluoropolyether structure represented by Rf a1 and a hydrolyzable group represented by J 2 or-(CH 2). ) E6- Si (OR 14 ) 3 (where R 14 has a methyl group or an ethyl group).
  • the perfluoropolyether structure is a structure in which all hydrogen atoms of the polyoxyalkylene group are replaced with fluorine atoms, and can be said to be a perfluorooxyalkylene group, which can impart water repellency to the obtained film. Further, it is a compound that can be a matrix of a film obtained by bonding the organosilicon compounds (A) with each other or with other monomers through a polymerization reaction (particularly a polycondensation reaction) by J 2.
  • Rf a1 is preferably -O- (CF 2 CF 2 O) e4- or -O- (CF 2 CF 2 CF 2 O) e5- . Both e4 and e5 are 15 to 80.
  • R 11 , R 12 , and R 13 are each independently preferably an alkyl group having 1 to 10 carbon atoms.
  • L 1 and L 2 are each independently preferably a divalent linking group having 1 to 5 carbon atoms containing a fluorine atom.
  • G 1 and G 2 are preferably divalent to pentavalent organosiloxane groups having a siloxane bond, respectively.
  • J 1 , J 2 , and J 3 are each independently preferably a methoxy group, an ethoxy group, or-(CH 2 ) e6- Si (OR 14 ) 3 .
  • a10 is preferably 0 to 5 (more preferably 0 to 3), a11 is preferably 0, a12 is preferably 0 to 7 (more preferably 0 to 5), and a14 is preferably 1 to 6 (more preferably 1).
  • a15 is preferably 0, a16 is preferably 0 to 6, a21 to a23 are all preferably 0 or 1 (more preferably all 0), and d11 is preferably 1 to 5 (more preferably 1).
  • d12 is preferably 0 to 3 (more preferably 0 or 1), and e1 to e3 are all preferably 3.
  • a13 is preferably 1.
  • Rf a1 of the above formula (a1) is -O- (CF 2 CF 2 CF 2 O) e5- , e5 is 35 to 50, and L 1 and L 2 are. All are perfluoroalkylene groups having 1 to 3 carbon atoms, E 1 , E 2 , and E 3 are all hydrogen atoms, E 4 and E 5 are hydrogen atoms or fluorine atoms, and J 1 , J 2 and J 3 are both methoxy groups or ethoxy groups (particularly methoxy groups), a10 is 1 to 3, a11 is 0, a12 is 0 to 5, and a13 is 1.
  • a14 is 2 to 5, a15 is 0, a16 is 0 to 6, a21 to a23 are independently 0 or 1 (more preferably, a21 to a23 are all 0), and d11. It is preferable to use a compound in which 1 is 1, d12 is 0 or 1, and e1 to e3 are all 3.
  • Rf a1 of the above formula (a1) is ⁇ O ⁇ (CF 2 CF 2 CF 2 O) e5- , e5 is 25 to 40, L 1 is a fluorine atom and It is a divalent linking group having 3 to 6 carbon atoms containing an oxygen atom, L 2 is a perfluoroalkylene group having 1 to 3 carbon atoms, E 2 and E 3 are both hydrogen atoms, and E 5 is a hydrogen atom. It is a fluorine atom, J 2 is-(CH 2 ) e6- Si (OCH 3 ) 3 , e6 is 2 to 4, a10 is 1 to 3, a11 is 0, and a12 is 0.
  • a13 is 0, a14 is 2-5, a15 is 0, a16 is 0, and a21-a23 are independently 0 or 1 (more preferably a21-a23). Is all 0), d11 is 1, d12 is 0, and e2 is 3. It is also preferable to use a compound.
  • organosilicon compound (A) is a compound represented by the following formula (a2-1).
  • Rf a21 is an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are replaced with fluorine atoms.
  • Rf a22 , Rf a23 , Rf a24 , and Rf a25 are independently alkyl groups or fluorine atoms having 1 to 20 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf a22.
  • Rf a22 if present may be different plurality of Rf a22 respectively, if Rf a23 there are a plurality may be different plurality of Rf a23, respectively, a plurality of Rf a24 If Rf a24 are present in plural It may be different, if Rf a25 there are a plurality may be different plurality of Rf a25 respectively, R 20, R 21, R 22, and R 23 are each independently hydrogen atom or an alkyl group having 1 to 4 carbon atoms, if R 20 there are a plurality differ plurality of R 20 each may, if R 21 there are a plurality may be different plurality of R 21 each may be the case where R 22 there are a plurality of different plural R 22 are each, if R 23 there are a plurality of It may be a different multiple of R 23, respectively, R 24 is an alkyl group having 1 to 20 carbon atoms, it may be the case where R 24 there are a plurality of different plural R 24 are each, M 1 is
  • f16 is an integer from 1 to 20 and f17 is an integer of 0 to 2 and g1 is an integer of 1 to 3 and Rf a21- , M 2- , f11- ⁇ C (R 20 ) (R 21 ) ⁇ -, f12- ⁇ C (Rf a22 ) (Rf a23 ) ⁇ -, f13- ⁇ Si (R) 22 ) (R 23 ) ⁇ -, f14- ⁇ Si (Rf a24 ) (Rf a25 ) ⁇ -, f15 -M 3- , and f16- [CH 2 C (M 1 ) ⁇ (CH 2 ) f17-Si (M 4 ) g1 (R 24 ) 3-g1 ⁇ ]- ends at Rf a21- and M 2- , in the order of forming a perfluoropolyether structure at least in part.
  • Rf a21 is preferably an alkyl group having 1 to 10 carbon atoms substituted with one or more fluorine atoms, more preferably a perfluoroalkyl group having 1 to 10 carbon atoms, and further preferably 1 to 10 carbon atoms. It is a perfluoroalkyl group of 5.
  • Rf a22 , Rf a23 , Rf a24 , and Rf a25 are preferably independently each of a fluorine atom or an alkyl group having 1 to 2 carbon atoms in which one or more hydrogen atoms are substituted with a fluorine atom. Preferably all are fluorine atoms.
  • R 20 , R 21 , R 22 and R 23 are preferably independent hydrogen atoms or alkyl groups having 1 to 2 carbon atoms, and more preferably all hydrogen atoms.
  • R 24 is preferably an alkyl group having 1 to 5 carbon atoms.
  • M 1 is preferably a hydrogen atom or an alkyl group having 1 to 2 carbon atoms independently of each other, and more preferably all hydrogen atoms.
  • M 2 is preferably a hydrogen atom.
  • M 4 is preferably an alkoxy group or a halogen atom, and more preferably a methoxy group, an ethoxy group or a chlorine atom.
  • f11, f13, and f14 are each 1/2 or less of f12, more preferably 1/4 or less, still more preferably f13 or f14 being 0, and particularly preferably f13 and f14 being 0. Is.
  • F15 is preferably 1/5 or more of the total value of f11, f12, f13, and f14, and is less than or equal to the total value of f11, f12, f13, and f14.
  • the f12 is preferably 20 to 600, more preferably 20 to 200, still more preferably 50 to 200 (more preferably 30 to 150, particularly preferably 50 to 150, most preferably 80 to 140).
  • the f15 is preferably 4 to 600, more preferably 4 to 200, still more preferably 10 to 200 (more preferably 30 to 60).
  • the total value of f11, f12, f13, f14, and f15 is preferably 20 to 600, more preferably 20 to 200, and even more preferably 50 to 200.
  • F16 is preferably 1 to 18. More preferably, it is 1 to 15. More preferably, it is 1 to 10.
  • F17 is preferably 0 to 1.
  • G1 is preferably 2 to 3, more preferably 3.
  • the repeating unit (ie- ⁇ C (Rf a22) (Rf a23 ) ⁇ -) enclosed in parentheses with f12 on the most fixed end side (the side that bonds to the silicon atom) is optional, but preferably.
  • the repeating units ie- ⁇ C (Rf a22) (Rf a23 ) ⁇ -and- ⁇ Si (Rf a24 ) (Rf a25 ) ⁇ -) with the sides f12 and f14 in parentheses are Repeat units with f11 and f13 on the most free end side and enclosed in parentheses (ie- ⁇ C (R 20 ) (R 21 ) ⁇ -and- ⁇ Si (R 22 ) (R 23 ) ⁇ - ) Is located on the free end side.
  • Rf a21 is a perfluoroalkyl group having 1 to 5 carbon atoms
  • Rf a22 , Rf a23 , Rf a24 , and Rf a25 are all fluorine atoms
  • M 3 is all -O-.
  • M 4 is all a methoxy group, an ethoxy group or a chlorine atom (particularly a methoxy group or an ethoxy group)
  • M 1 and M 2 are both hydrogen atoms
  • f11 is 0, and f12 is 30 to 150 (from). It is preferable that 80 to 140), f15 is 30 to 60, f13 and f14 are 0, f17 is 0 to 1 (particularly 0), g1 is 3, and f16 is 1 to 10.
  • organosilicon compound (A) is a compound represented by the following formula (a2-2).
  • Rf a26 , Rf a27 , Rf a28 , and Rf a29 are independently alkyl groups or fluorine atoms having 1 to 20 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf a26.
  • Rf a26 if present may be different plurality of Rf a26 respectively, if Rf a27 there are a plurality may be different plurality of Rf a27, respectively, a plurality of Rf a28 If Rf a28 are present in plural It may be different, if Rf a29 there are a plurality may be different plurality of Rf a29 respectively, R 25, R 26, R 27, and R 28 are each independently hydrogen atom or an alkyl group having 1 to 4 carbon atoms, if R 25 there are a plurality differ plurality of R 25 each may, if R 26 there are a plurality may be different plurality of R 26 each may be the case where R 27 there are a plurality of different plural R 27 are each, if R 28 there are a plurality of It may be a different multiple of R 28, respectively, R 29, and R 30 are each independently an alkyl group having 1 to 20 carbon atoms, if R 29 there are a plurality may be different plural R 29 are each, R 30
  • R is a hydrogen atom, a fluorine-containing alkyl group of the alkyl group having 1 to 4 carbon atoms having 1 to 4 carbon atoms, if M 7 there are a plurality may be different plurality of M 7, respectively, M 5, M 9 are each independently hydrogen atom or an alkyl group having 1 to 4 carbon atoms, if M 5 there are a plurality may be different plurality of M 5, respectively, M 9 are multiple if present may be different plurality of M 9, respectively, M 6 and M 10 are independently hydrogen or halogen atoms, respectively.
  • M 8, and M 11 are each independently a hydrolysable group, if M 8 there are a plurality may be different plurality of M 8, respectively, of a plurality if M 11 there are a plurality of M 11 may be different, f21, f22, f23, f24, and f25 are independently integers from 0 to 600, and the total value of f21, f22, f23, f24, and f25 is 13 or more.
  • f26 and f28 are each independently an integer of 1 to 20.
  • f27 and f29 are independently integers of 0 to 2, respectively.
  • g2 and g3 are independently integers of 1 to 3, respectively.
  • M 10- , M 6- , f21- ⁇ C (R 25 ) (R 26 ) ⁇ -, f22- ⁇ C (Rf a26 ) (Rf a27 ) ⁇ -, f23- ⁇ Si (R) 27) (R 28) ⁇ - , f24 amino - ⁇ Si (Rf a28) ( Rf a29) ⁇ -, f25 amino -M 7 -, f26 amino - [CH 2 C (M 5 ) ⁇ (CH 2 ) F27-Si (M 8 ) g2 (R 29 ) 3-g2 ⁇ ], and f28- [CH 2 C (M 9 ) ⁇ (CH 2 ) f29-Si (M 11 ) g3 (R 30 ) 3 -g3 ⁇ ] are arranged in the order of forming a perfluoropolyether structure at least in part, with M 10- and M 6- at the ends, and in any order unless -O- is
  • Rf a26 , Rf a27 , Rf a28 , and Rf a29 are all fluorine atoms
  • M 7 is all -O-
  • M 8 and M 11 are all methoxy and ethoxy groups.
  • it is a chlorine atom (particularly a methoxy group or an ethoxy group)
  • M 5 , M 6 , M 9 , and M 10 are all hydrogen atoms
  • f21 is 0, and f22 is 30 to 150 (more preferably 80 to 140).
  • F25 is 30 to 60
  • f23 and f24 are 0, f27 and f29 are 0 to 1 (particularly preferably 0)
  • g2 and g3 are 3, and f26 and f28 are 1 to 10.
  • the organosilicon compound (A) includes a compound of the following formula (a3).
  • R 30 is a perfluoroalkyl group having 2 to 6 carbon atoms
  • R 31 and R 32 are independently perfluoroalkylene groups having 2 to 6 carbon atoms
  • R 33 is a trivalent saturated hydrocarbon group having 2 to 6 carbon atoms
  • R 34 is an alkyl group having 1 to 3 carbon atoms.
  • the carbon numbers of R 30 , R 31 , R 32 , and R 33 are preferably 2 to 4 independently, and more preferably 2 to 3.
  • h1 is 5 to 70
  • h2 is 1 to 5
  • h3 is 1 to 10.
  • h1 is preferably 10 to 60, 20 to 50 is more preferable
  • h2 is 1 to 4
  • 1 to 3 is more preferable
  • h3 is 1 to 8 is preferable
  • 1 to 6 is more preferable.
  • organosilicon compound (A) a compound represented by the following formula (a4) can also be mentioned.
  • R 40 is a perfluoroalkyl group having 2 to 5 carbon atoms
  • R 41 is a perfluoroalkylene group having 2 to 5 carbon atoms
  • R 42 is a perfluoroalkylene group having 2 to 5 carbon atoms.
  • a part of the hydrogen atom of the alkylene group is a fluoroalkylene group substituted with fluorine
  • R 43 and R 44 are independently alkylene groups having 2 to 5 carbon atoms
  • R 45 is a methyl group or an ethyl group.
  • k1, k2, and k3 are independently integers of 1 to 5.
  • the number average molecular weight of the organosilicon compound (A) is preferably 2,000 or more, more preferably 4,000 or more, still more preferably 6,000 or more, particularly preferably 7,000 or more, and 40. It is preferably 000 or less, more preferably 20,000 or less, and even more preferably 15,000 or less.
  • organosilicon compound (A) examples include a compound represented by the following formula (1) or a compound having a structure similar to the compound, and examples thereof include Optool (registered trademark) UF503 manufactured by Daikin Industries, Ltd. ..
  • Examples of the compound represented by the above formula (1) include those synthesized by the methods described in Synthesis Examples 1 and 2 of JP-A-2014-15609, where r is 43 and s is an integer of 1 to 6. , The number average molecular weight is about 8000.
  • Examples of the similar structure include a structure in which the number of carbon atoms of the hydrocarbon group of the above formula (1) or the number of carbon atoms of the hydrocarbon group substituted with a fluorine atom is different, a perfluoropolyether structure and a silicon atom without a linking group.
  • Other hydrocarbon groups (including hydrocarbon groups in which at least some hydrogen atoms are replaced with fluorine atoms) are located at any position of the linking group between the bonded structure, the perfluoropolyether structure and the silicon atom. Examples thereof include a structure in which a silicon atom and a hydrolyzable group are bonded via a linking group, a structure in which the values of r and s are different, and the like, but the structure is not limited to these structures.
  • Organosilicon compound (B) As will be described later, the organosilicon compound (B) represented by the following formula (b1) has a hydrolyzable group represented by A 2 , and is usually produced by hydrolysis of the organosilicon compound (B). -SiOH group is dehydrated and condensed with the -SiOH group of the organosilicon compound (A) generated by hydrolysis and / or the -SiOH group of the organosilicon compound (B) generated by hydrolysis.
  • the water-repellent layer (r) which is a cured layer of the mixed composition (ca), has a condensed structure derived from the organosilicon compound (A) and a condensed structure derived from the organosilicon compound (B).
  • the hydrolyzable group include an alkoxy group, a halogen atom, a cyano group, an acetoxy group, an isocyanate group and the like.
  • Rf b10 is an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are replaced with fluorine atoms.
  • R b11, R b12, R b13 , R b14 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R b11 there are a plurality differ plurality of R b11 each may, if R b12 there are a plurality may be different plural R b12 each may be the case where R b13 there are a plurality of different plural R b13 are each if R b14 there are multiple May have different R b14s, Rf b11, Rf b12, Rf b13 , Rf b14 are each independently one or more hydrogen atoms is an alkyl group or a fluorine atom carbon number of 1 to 20 substituted by a fluorine atom, Rf b11
  • R is a hydrogen atom, a fluorine-containing alkyl group of the alkyl group having 1 to 4 carbon atoms having 1 to 4 carbon atoms, if a 1 there are a plurality may be different plurality of a 1, respectively,
  • a 2 is a hydrolyzable group, if A 2 there are a plurality may be different plurality of A 2, respectively, b11, b12, b13, b14, and b15 are independently integers from 0 to 100, respectively.
  • c is an integer of 1 to 3 and Rf b10 -, - Si (A 2) c (R b15) 3-c, b11 amino - ⁇ C (R b11) ( R b12) ⁇ -, b12 amino - ⁇ C (Rf b11) ( Rf b12) ⁇ -, B13- ⁇ Si (R b13 ) (R b14 ) ⁇ -, b14- ⁇ Si (Rf b13 ) (Rf b14 ) ⁇ -, b15 -A 1- are Rf b10- , Arranged in any order as long as -Si (A 2 ) c (R b15 ) 3-c is the terminal, does not form a perfluoropolyether structure, and -O- is not linked to -O- to -F. Join.
  • Rf b10 is preferably a fluorine atom or a perfluoroalkyl group having 1 to 10 carbon atoms (more preferably 1 to 5 carbon atoms) independently of each other.
  • R b11, R b12, R b13 , and R b14 is preferably a hydrogen atom.
  • R b15 is preferably an alkyl group having 1 to 5 carbon atoms.
  • a 2 is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom, and more preferably a methoxy group, an ethoxy group or a chlorine atom.
  • B11 is preferably 1 to 30, more preferably 1 to 25, further preferably 1 to 10, particularly preferably 1 to 5, and most preferably 1 to 2.
  • B12 is preferably 0 to 15, more preferably 0 to 10.
  • B13 is preferably 0 to 5, more preferably 0 to 2.
  • B14 is preferably 0 to 4, more preferably 0 to 2.
  • B15 is preferably 0 to 4, more preferably 0 to 2.
  • C is preferably 2 to 3, more preferably 3.
  • the total value of b11, b12, b13, b14, and b15 is preferably 3 or more, preferably 5 or more, preferably 80 or less, more preferably 50 or less, and further preferably 20 or less.
  • Rf b10 is a fluorine atom or a perfluoroalkyl group having 1 to 5 carbon atoms
  • R b11 and R b12 are both hydrogen atoms
  • a 2 is a methoxy group or an ethoxy group
  • b11 is 1 to 1 to 1. It is preferable that 5, b12 is 0 to 5, b13, b14, and b15 are all 0, and c is 3.
  • Specific examples of the compound represented by the above formula (b1) include CF 3- Si- (OCH 3 ) 3 , C j F 2j + 1- Si- (OC 2 H 5 ) 3 (j is 1 to 12). Of these, C 4 F 9- Si- (OC 2 H 5 ) 3 , C 6 F 13- Si- (OC 2 H 5 ) 3 , C 7 F 15- Si- (OC) 2 H 5 ) 3 and C 8 F 17- Si- (OC 2 H 5 ) 3 are preferable.
  • CF 3 (CF 2 ) m- (CH 2 ) n SiCl 3 CF 3 (CF 2 ) m- (CH 2 ) n Si (OCH 3 ) 3
  • CF 3 (CF 2 ) m- (CH 2 ) n Si (OC 2 H 5 ) 3 can also be mentioned (m is 1 to 10, preferably 3 to 7, and n is 1 to 5, preferably 2 to 4).
  • the compound represented by the following formula (b2) is preferable.
  • R 60 is a perfluoroalkyl group having 3 to 8 carbon atoms
  • R 61 is an alkylene group having 1 to 5 carbon atoms
  • R 62 is an alkyl group having 1 to 3 carbon atoms. ..
  • the mixed composition (ca) is a composition in which the organosilicon compound (A) and the organosilicon compound (B) are mixed, and the organosilicon compound (A) and the organosilicon compound (B) are mixed. Is obtained by mixing, and when a component other than the organosilicon compound (A) and the organosilicon compound (B) is mixed, the organosilicon compound (A) and the organosilicon compound (B) are mixed. It is obtained by mixing and other components.
  • the mixed composition (ca) also includes those whose reaction has proceeded after mixing, for example, during storage.
  • the mixed composition (ca) is usually mixed with a solvent (D).
  • a solvent (D) it is preferable to use a fluorine-based solvent, for example, a fluorinated ether solvent, a fluorinated amine solvent, a fluorinated hydrocarbon solvent and the like can be used, and the boiling point is particularly 100 ° C. or higher. Is preferable.
  • hydrofluoro ethers such as fluoroalkyl (particularly perfluoroalkyl group having 2 to 6 carbon atoms) -alkyl (particularly methyl group or ethyl group) ether are preferable, and for example, ethyl nona fluorobutyl ether or ethyl nona. Fluoroisobutyl ether can be mentioned. Examples of the ethyl nonafluorobutyl ether or ethyl nonafluoroisobutyl ether include Novec® 7200 (manufactured by 3M, molecular weight of about 264).
  • the fluorinated amine-based solvent is preferably an amine in which at least one hydrogen atom of ammonia is substituted with a fluoroalkyl group, and a third in which all hydrogen atoms of ammonia are substituted with a fluoroalkyl group (particularly a perfluoroalkyl group).
  • Primary amines are preferred, and specific examples thereof include tris (heptafluoropropyl) amines, such as Florinate (registered trademark) FC-3283 (manufactured by 3M, molecular weight: about 521).
  • fluorinated hydrocarbon solvent examples include a fluorinated aliphatic hydrocarbon solvent such as 1,1,1,3,3-pentafluorobutane, and a fluorinated aromatic solvent such as 1,3-bis (trifluoromethylbenzene). Hydrocarbon-based solvents can be mentioned.
  • 1,1,1,3,3-pentafluorobutane examples include Solve 55 (manufactured by Solvex).
  • hydrochlorofluorocarbons such as Asahiclean (registered trademark) AK225 (manufactured by AGC) and hydrofluorocarbons such as Asahiclean (registered trademark) AC2000 (manufactured by Asahi Glass Co., Ltd.) may be used. Can be done.
  • the solvent (D) it is preferable to use at least a fluorinated amine solvent as the solvent (D). Further, as the solvent (D), it is preferable to use two or more kinds of fluorine-based solvents, and it is preferable to use a fluorinated amine-based solvent and a fluorinated hydrocarbon-based solvent (particularly, a fluorinated aliphatic hydrocarbon-based solvent).
  • the amount of the organosilicon compound (A) in the mixed composition (ca) is, for example, 0.01% by mass or more, preferably 0.03% by mass or more, based on 100% by mass of the entire composition. It is more preferably 0.05% by mass or more, preferably 1.0% by mass or less, more preferably 0.5% by mass or less, still more preferably 0.3% by mass or less. Yes, and it is particularly preferable that it is 0.1% by mass or less.
  • the amount of the organosilicon compound (B) in the mixed composition (ca) is, for example, 0.01% by mass or more, preferably 0.03% by mass or more, based on 100% by mass of the entire composition. It is preferably 0.3% by mass or less, and more preferably 0.2% by mass or less.
  • the mass ratio of the organosilicon compound (B) to the organosilicon compound (A) is preferably 0.01 or more, more preferably 0.1 or more, still more preferably 0.3 or more, and 2. It is preferably 0 or less, more preferably 1.5 or less, and even more preferably 1.0 or less.
  • the amounts of the above-mentioned organosilicon compounds (A) and (B) can be adjusted at the time of preparing the composition.
  • the amounts of the organosilicon compounds (A) and (B) may be calculated from the analysis result of the composition.
  • the mixed composition (ca) for forming the water-repellent layer (r) is a silanol condensation catalyst, an antioxidant, a rust preventive, an ultraviolet absorber, a light stabilizer, and a fungicide, as long as the effect of the present invention is not impaired.
  • Various additives such as fungicides, antibacterial agents, bioadhesion inhibitors, deodorants, pigments, flame retardants, and antistatic agents may be mixed.
  • the thickness of the water-repellent layer (r) is, for example, about 1 to 1000 nm.
  • the intermediate layer (c) is a mixed composition (cc) of an organosilicon compound (C) having a silicon atom and an amino group or an amine skeleton (-NR 100- , and R 100 is a hydrogen atom or an alkyl group).
  • the cured layer of the above or a vapor-deposited layer of the organosilicon compound (C), and the intermediate layer (c) has an amino group or an amine skeleton.
  • the silicon atom of the organic silicon compound (C) has a hydrolyzable group or a hydroxy group bonded thereto, and the organic silicon compound (C) has a hydrolyzable group bonded to a Si—OH group or a silicon atom.
  • the intermediate layer (c) preferably has a condensed structure derived from the organic silicon compound (C).
  • the intermediate layer (c) can function as a primer layer for the water-repellent layer (r).
  • the hydrolyzable group bonded to the silicon atom of the organic silicon compound (C) include an alkoxy group, a halogen atom, a cyano group, an acetoxy group and an isocyanate group. It is preferable that an alkoxy group or a hydroxy group having 1 to 4 carbon atoms is bonded to the silicon atom of the organosilicon compound (C).
  • the organosilicon compound (C) is preferably a compound represented by any of the following formulas (c1) to (c3).
  • Organosilicon compound (C) represented by the following formula (c1) (hereinafter, organosilicon compound (C1))
  • R x11, R x12, R x13 , R x14 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R x11 there are a plurality differ plurality of R x11 are each may, if R x12 there are a plurality may be different plural R x12 are each may be the case where R x13 there are a plurality of different plural R x13 are each if R x14 there are multiple May have different R x14s, Rf x11 , Rf x12 , Rf x13 , and Rf x14 are each independently an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf x11.
  • Rf x11 differs if the Rf x12 there are a plurality may be different plurality of Rf x12, respectively, a plurality of Rf x13 If Rf x13 is present in plural even if well, if Rf x14 there are a plurality may be different plurality of Rf x14, respectively, R x15 is an alkyl group having 1 to 20 carbon atoms, it may be the case where R x15 there are a plurality of different plural R x15 are each, X 11 is a hydrolysable group, if X 11 there are a plurality may be different plurality of X 11 are each, Y 11 is, -NH-, or -S-.
  • Z 11 is a vinyl group, an ⁇ -methylvinyl group, a styryl group, a methacryloyl group, an acryloyl group, an amino group, an isocyanate group, an isocyanurate group, an epoxy group, a ureido group, or a mercapto group.
  • p1 is an integer of 1 to 20
  • p2, p3, and p4 are independently integers of 0 to 10
  • p5 is an integer of 1 to 10.
  • p6 is an integer of 1 to 3 and If Z 11 is not an amino group, then at least one of Y 11 is -NH-, and if Y 11 is all -S-, then Z 11 is an amino group.
  • R x11 , R x12 , R x13 , and R x14 are preferably hydrogen atoms.
  • Rf x11 , Rf x12 , Rf x13 , and Rf x14 are each independently an alkyl group having 1 to 10 carbon atoms or a fluorine atom in which one or more hydrogen atoms are substituted with fluorine atoms.
  • R x15 is preferably an alkyl group having 1 to 5 carbon atoms.
  • X 11 is preferably an alkoxy group, a halogen atom, a cyano group, or an isocyanate group, more preferably an alkoxy group, and even more preferably a methoxy group or an ethoxy group.
  • Y 11 is preferably ⁇ NH ⁇ .
  • Z 11 is preferably a methacryloyl group, an acryloyl group, a mercapto group or an amino group, more preferably a mercapto group or an amino group, and even more preferably an amino group.
  • P1 is preferably 1 to 15, more preferably 2 to 10.
  • p2, p3 and p4 are preferably 0 to 5, more preferably all 0 to 2.
  • p5 is preferably 1 to 5, more preferably 1 to 3.
  • the p6 is preferably 2 to 3, more preferably 3.
  • both R x11 and R x12 are hydrogen atoms
  • Y 11 is -NH-
  • X 11 is an alkoxy group (particularly a methoxy group or an ethoxy group).
  • Z 11 is an amino group or a mercapto group
  • p1 is 1 to 10
  • p2, p3 and p4 are all
  • p5 is 1 to 5 (particularly 1 to 3)
  • p6 It is preferable to use a compound having a value of 3.
  • the organosilicon compound (C1) is preferably represented by the following formula (c1-2).
  • X 12 is a hydrolysable group, if X 12 there are a plurality may be different plurality of X 12 are each, Y 12 is -NH- Z 12 is an amino group or a mercapto group, R x16 is an alkyl group having 1 to 20 carbon atoms, it may be the case where R x16 there are a plurality of different plural R x16 are each, p is an integer of 1 to 3, q is an integer of 2 to 5, and r is an integer of 0 to 5.
  • X 12 is preferably an alkoxy group, a halogen atom, a cyano group, or an isocyanate group, more preferably an alkoxy group, and even more preferably an alkoxy group having 1 to 4 carbon atoms.
  • Z 12 is preferably an amino group.
  • R x16 is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 1 to 5 carbon atoms.
  • P is preferably an integer of 2 to 3, and more preferably 3.
  • Q is preferably an integer of 2 to 3
  • r is preferably an integer of 2 to 4.
  • Organosilicon compound (C) represented by the following formula (c2) (hereinafter, organosilicon compound (C2))
  • R x20 and R x21 are each independently a hydrogen atom or an alkyl group of 1 to 4 carbon atoms, if R x20 there are a plurality may be different plural R x20 are each, R x21 is If there are multiple R x21s, multiple R x21s may be different.
  • Rf x20 and Rf x21 are each independently an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are substituted with fluorine atoms, and when a plurality of Rf x20 are present, a plurality of Rfs are present.
  • each R x22 and R x23 is independently an alkyl group having 1 to 20 carbon atoms, may be the case where R x22 and R x23 there are a plurality of different plural R x22 and R x23 are each, X 20 and X 21 are each independently a hydrolysable group, if X 20 and X 21 there are a plurality may be different plurality of X 20 and X 21 are each, p20 is an integer from 1 to 30, p21 is an integer from 0 to 30, and at least one of the repeating units in parentheses with p20 or p21 is replaced by the amine backbone-NR 100-.
  • R 100 in the amine skeleton is a hydrogen atom or an alkyl group.
  • p22 and p23 are independently integers of 1 to 3, respectively.
  • the p20- ⁇ C (R x20 ) (R x21 ) ⁇ -and the p21- ⁇ C (Rf x20 ) (Rf x21 ) ⁇ -do not have to be consecutive p20 or p21, and are in any order. Both ends are -Si (X 20 ) p22 (R x22 ) 3-p22 and -Si (X 21 ) p23 (R x23 ) 3-p23 .
  • R x20 and Rx21 are preferably hydrogen atoms.
  • Rf x20 and Rf x21 are preferably alkyl groups or fluorine atoms having 1 to 10 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, respectively.
  • R x22 and R x23 are preferably a carbon number of alkyl group of 1 to 5.
  • X 20 and X 21 are preferably an alkoxy group, a halogen atom, a cyano group, or an isocyanate group, more preferably an alkoxy group, and even more preferably a methoxy group or an ethoxy group.
  • At least one amine skeleton-NR 100 - may be present in the molecule as described above, and any of the repeating units in parentheses with p20 or p21 may be replaced by the amine skeleton.
  • a plurality of the amine skeletons may be present, and in that case, the number of amine skeletons is preferably 1 to 10, more preferably 1 to 5, and even more preferably 2 to 5. Further, in this case, it is preferable to have an alkylene group between adjacent amine skeletons, and the carbon number of the alkylene group is preferably 1 to 10, and more preferably 1 to 5. The carbon number of the alkylene group between adjacent amine backbones is included in the total number of p20 or p21.
  • the number of carbon atoms is preferably 5 or less, and more preferably 3 or less.
  • the amine skeleton -NR 100- is preferably -NH- (R 100 is a hydrogen atom).
  • P20 is preferably 1 to 15, more preferably 1 to 10, excluding the number of repeating units replaced by the amine skeleton.
  • P21 is preferably 0 to 5, more preferably all 0 to 2, except for the number of repeating units replaced by the amine skeleton.
  • P22 and p23 are preferably 2 to 3, more preferably 3.
  • the organosilicon compound (C2) in the formula (c2), an R x20 and R x21 are both hydrogen atom, X 20 and X 21 is an alkoxy group (particularly methoxy group or ethoxy group), a p20
  • the repeating units in parentheses are replaced with at least one amine skeleton-NR 100- , where R 100 is a hydrogen atom and p20 is 1-10 (but replaced by an amine skeleton). (Excluding the number of repeating units), it is preferable to use a compound in which p21 is 0 and p22 and p23 are 3.
  • Product name; X-12-5263HP, manufactured by Shin-Etsu Chemical Industry Co., Ltd.) is represented by the above formula (c2).
  • R x20 and R x21 are both hydrogen atoms, p20 is 8, p21 is 0, and amine skeleton is 2.
  • the organosilicon compound (C2) is preferably a compound represented by the following formula (c2-2).
  • X 22 and X 23 are each independently a hydrolyzable group, when X 22 and X 23 there are a plurality may be different plurality of X 22 and X 23 are each, R x24 and R x25 are each independently alkyl groups having 1 to 20 carbons, may be the case where R x24 and R x25 there are a plurality of different plural R x24 and R x25 are each, -C w H 2w -has at least one of its methylene groups replaced by an amine skeleton -NR 100- , where R 100 is a hydrogen atom or an alkyl group.
  • w is an integer from 1 to 30 (excluding the number of methylene groups replaced by the amine backbone).
  • p24 and p25 are each independently an integer of 1 to 3.
  • X 22 and X 23 are preferably an alkoxy group, a halogen atom, a cyano group, or an isocyanate group, more preferably an alkoxy group, and an alkoxy group having 1 to 4 carbon atoms (particularly a methoxy group or an ethoxy group). Is more preferable.
  • a plurality of amine skeletons ⁇ NR 100 ⁇ may be present, and in that case, the number of amine skeletons is preferably 1 to 10, more preferably 1 to 5, and preferably 2 to 5. More preferred. Further, in this case, it is preferable to have an alkylene group between adjacent amine skeletons.
  • the alkylene group preferably has 1 to 10 carbon atoms, and more preferably 1 to 5 carbon atoms. The number of carbon atoms of the alkylene group between adjacent amine skeletons is included in the total number of w.
  • the number of carbon atoms is preferably 5 or less, and more preferably 3 or less.
  • the amine skeleton -NR 100- is preferably -NH- (R 100 is a hydrogen atom).
  • R x24 and R x25 are preferably alkyl groups having 1 to 10 carbon atoms, and more preferably alkyl groups having 1 to 5 carbon atoms.
  • P24 and p25 are preferably integers of 2 to 3, and more preferably 3.
  • W is preferably 1 or more, more preferably 2 or more, preferably 20 or less, and more preferably 10 or less.
  • Organosilicon compound (C) represented by the following formula (c3) (hereinafter, organosilicon compound (C3))
  • Z 31 and Z 32 are reactive functional groups other than the hydrolyzable group and the hydroxy group, respectively.
  • the reactive functional group include a vinyl group, an ⁇ -methylvinyl group, a styryl group, a methacryloyl group, an acryloyl group, an amino group, an epoxy group, a ureido group, or a mercapto group.
  • Z 31 and Z 32 an amino group, a mercapto group, or a methacryloyl group is preferable, and an amino group is particularly preferable.
  • R x31, R x32, R x33 , R x34 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R x31 there are a plurality differ plurality of R x31 are each may, if R x32 there are a plurality may be different plural R x32 are each may be the case where R x33 there are a plurality of different plural R x33 are each if R x34 there are multiple May have different R x 34s.
  • R x31 , R x32 , R x33 , and R x34 are preferably hydrogen atoms or alkyl groups having 1 to 2 carbon atoms, and more preferably hydrogen atoms.
  • Rf x31 , Rf x32 , Rf x33 , and Rf x34 are independently alkyl groups or fluorine atoms having 1 to 20 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf x31. If you may be different plurality of Rf x31 respectively, differ if the Rf x32 there are a plurality may be different plurality of Rf x32, respectively, a plurality of Rf x33 If Rf x33 is present in plural even if well, a plurality of Rf x34 If Rf x34 there are a plurality may be different from each other.
  • Rf x31 , Rf x32 , Rf x33 , and Rf x34 are preferably alkyl groups or fluorine atoms having 1 to 10 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms.
  • Y 31 is, -NH -, - N (CH 3) - or -O-. And, in the case where the Y 31 there are a plurality may be different plurality of Y 31, respectively.
  • Y 31 is preferably ⁇ NH ⁇ .
  • X 31 , X 32 , X 33 , and X 34 are independently -OR c (R c is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an amino C 1-3 alkyl di C 1-3 alkoxysilyl. a is a group), if X 31 there are a plurality may be different plurality of X 31 are each, if X 32 there are a plurality may be different plurality of X 32 are each, X 33 is If there are two or more may be multiple X 33 are different each, a plurality of X 34 may be different from each if X 34 there are a plurality.
  • R c is preferably a hydrogen atom or ⁇ OR c , which is an alkyl group having 1 to 2 carbon atoms, and R c is more preferably a hydrogen atom.
  • p31 is an integer of 0 to 20
  • p32, p33, and p34 are independently integers of 0 to 10
  • p35 is an integer of 0 to 5
  • p36 is an integer of 1 to 10.
  • p37 is 0 or 1.
  • p31 is preferably 1 to 15, more preferably 3 to 13, and even more preferably 5 to 10.
  • P32, p33 and p34 are each independently preferably 0 to 5, more preferably all 0 to 2.
  • the p35 is preferably 1 to 5, more preferably 1 to 3.
  • p36 is preferably 1 to 5, more preferably 1 to 3.
  • P37 is preferably 1.
  • the organosilicon compound (C3) satisfies the condition that at least one of Z 31 and Z 32 is an amino group, or at least one of Y 31 is -NH- or -N (CH 3)-and is terminal.
  • p31 amino - ⁇ C (R x31) ( R x32) ⁇ - is, - ⁇ C (R x31) ( R x32) ⁇ - It is not necessary for bonded continuously, through the other units in the middle It may be combined with each other, and a total of p31 may be used. The same applies to the units enclosed by p32 to p37.
  • the organosilicon compound (C3), Z 31 and Z 32 is amino group, R x31 and R x32 are each a hydrogen atom, p31 is 3 to 13 (preferably 5 ⁇ 10), R x33 and R x34 is a hydrogen atom, Rf x31 to Rf x34 are all alkyl groups or fluorine atoms having 1 to 10 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and p32 to p34 are all. 0 to 5, Y 31 is -NH-, p35 is 0 to 5 (preferably 0 to 3), X 31 to X 34 are all -OH, and p36 is 1 to 5 (preferably). 1 to 3), and a compound having p37 of 1 is preferable.
  • the organosilicon compound (C3) is preferably represented by the following formula (c3-2).
  • Z 31 , Z 32 , X 31 , X 32 , X 33 , X 34 , and Y 31 are synonymous with these in the formula (c3), and p41 to p44 are independent of each other. Is an integer of 1 to 6, and p45 and 46 are independently 0 or 1, respectively.
  • Z 31 and Z 32 are preferably an amino group, a mercapto group, or a methacryloyl group, and particularly preferably an amino group.
  • X 31, X 32, X 33 , X 34, is more it is preferred that R c is -OR c is an alkyl group of a hydrogen atom, or C 1 ⁇ 2, R c is a hydrogen atom preferable.
  • Y 31 is preferably ⁇ NH ⁇ .
  • P41 to p44 are preferably 2 or more, preferably 5 or less, and more preferably 4 or less. It is preferable that both p45 and p46 are 0.
  • the mixed composition (cc) is a composition in which the organosilicon compound (C) is mixed, and the organosilicon compound (C) may be one kind or two or more kinds.
  • the mixed composition (cc) is obtained by mixing the organosilicon compound (C), and when a component other than the organosilicon compound (C) is mixed, the organosilicon compound (C) and other components are mixed. Is obtained by mixing.
  • the mixed composition (cc) also includes those whose reaction has proceeded after mixing, for example, during storage.
  • the mixed composition (cc) contains a condensate of the organosilicon compound (C), and more specifically, the above. It can be mentioned that the mixed composition (cc) contains an organosilicon compound (C3') in which the organosilicon compound (C3) is condensed and bonded at at least one of the above X 31 to X 34.
  • the organosilicon compound (C3') has two or more structures (c31-1) represented by the following formula (c31-1), and the structures (c31-1) have the following * 3 or * 4. It is a chain-like or cyclically bonded compound, and the bond at the following * 3 or * 4 is due to the condensation of the X 31 or X 32 of two or more of the organosilicon compounds (C3).
  • * 1 and * 2 of the following formula (c31-1) have at least the units enclosed by p31, p32, p33, p34, p35, (p36) -1, and p37 of the following formula (c31-2), respectively.
  • One type is bonded in any order and groups having a Z-terminal are bonded, and the groups that are bonded to * 1 and * 2 may be different for each of the plurality of structures (c31-1).
  • * 3 at the end is a hydrogen atom
  • * 4 is a hydroxy group.
  • Z is a reactive functional group other than the hydrolyzable group and the hydroxy group.
  • R x31 , R x32 , R x33 , R x34 , Rf x31 , Rf x32 , Rf x33 , Rf 34 , Y 31 , X 31 , X 32 , X 33 , X 34 , p31 to p37 are included in the above equation (c3). It is synonymous with these codes of.
  • organosilicon compound (C3) is a compound represented by the above formula (c3-2), as the organosilicon compound (C3'), for example, the structure represented by the following formula (c31-3) is described below * 3.
  • the structure represented by the following formula (c31-3) is bonded in a chain, the terminal * 3 is a hydrogen atom and the terminal * 4 is a hydroxy group.
  • the organosilicon compound (C3') is preferably a compound in which the structure represented by the above formula (c31-3) is bonded by 2 to 10 (preferably 3 to 8).
  • the mixed composition (cc) is preferably mixed with the solvent (E).
  • the solvent (E) is not particularly limited, and for example, water, an alcohol solvent, a ketone solvent, an ether solvent, a hydrocarbon solvent, an ester solvent, or the like can be used, and in particular, water, an alcohol solvent, or a ketone solvent can be used. , A hydrocarbon solvent is preferable.
  • Examples of the alcohol solvent include methanol, ethanol, 1-propanol, 2-propanol, 1-butanol and the like.
  • Examples of the ketone solvent include acetone, methyl ethyl ketone, and methyl isobutyl ketone.
  • Examples of the ether solvent include diethyl ether, dipropyl ether, tetrahydrofuran, 1,4-dioxane and the like.
  • Examples of the hydrocarbon solvent include an aliphatic hydrocarbon solvent such as pentane and hexane, an alicyclic hydrocarbon solvent such as cyclohexane, and an aromatic hydrocarbon solvent such as benzene, toluene and xylene.
  • Examples of the ester solvent include ethyl acetate, propyl acetate, butyl acetate and the like.
  • the total amount of the composition (cc) is 100% by mass
  • the total amount of the organosilicon compound (C) is preferably 0.005% by mass or more, more preferably 0.01% by mass or more. It is more preferably 0.02% by mass or more, further preferably 0.1% by mass or more, still preferably 5% by mass or less, more preferably 3% by mass or less, still more preferably 2% by mass or less. be.
  • the amount of the above-mentioned organosilicon compound (C) can be adjusted at the time of preparation of the composition.
  • the amount of the organosilicon compound (C) may be calculated from the analysis result of the composition.
  • the base material (s) is preferably a layer having a function of preventing reflection of incident light on the surface on the intermediate layer (c) side, specifically, in a visible light region of 380 to 780 nm.
  • the surface on the intermediate layer (c) side is preferably a layer exhibiting a reflection characteristic in which the reflectance is reduced to about 5.0% or less, more preferably 4.80% or less, still more preferably 4. It is less than 5.5%.
  • the reflectance may be evaluated by the spectral reflectance at a wavelength of 530 nm.
  • the base material (s) preferably has a surface Si ratio of 1 atomic% or more in at least the outermost layer on the intermediate layer (c) side, and the base material (s) is preferably an organic material or an inorganic material.
  • the surface Si ratio is at least a predetermined value, the surface of the base material (s) and the components constituting the intermediate layer (c) or the water-repellent layer (r) are likely to be bonded to each other, and the laminate of the present invention is water-repellent.
  • the wear resistance of the surface on the layer (r) side is further improved.
  • the surface Si ratio is more preferably 5 atomic% or more, further preferably 10 atomic% or more, still more preferably 20 atomic% or more, and may be 40 atomic% or less.
  • the base material (s) may be composed of one kind of material or two or more kinds of materials.
  • the material constituting the base material (s) include acrylic resin, polycarbonate resin, polyester resin (polyethylene terephthalate, etc.), styrene resin, acrylic-styrene copolymer resin, cellulose resin, polyolefin resin, and vinyl resin (polyethylene, Thermoplastic resins such as polyvinyl chloride, polystyrene, vinylbenzyl chloride resin, polyvinyl alcohol, etc .; or thermosetting resins such as phenol resin, urea resin, melamine resin, epoxy resin, unsaturated polyester, silicone resin, urethane resin, etc.
  • resin materials such as engineering plastics such as polyamide resins, polyimide resins and polyamideimide resins, or metal oxides such as titanium, zirconium, aluminum, niobium, tantalum, lanthanum or silicon can be mentioned.
  • the base material (s) when the base material (s) is composed of one kind of material, it may be a resin layer having a surface Si ratio of 1 atomic% or more, or even a metal oxide layer such as silica. good.
  • a protective layer provided on the resin layer to protect the article from scratches in applications requiring abrasion resistance such as displays of electronic devices.
  • a hard coat layer it may be referred to as a hard coat layer.
  • the layer is provided.
  • the above-mentioned thermosetting resin, thermoplastic resin, or engineering plastic can be used, and polyester resin is particularly preferable.
  • the above-mentioned hard coat layer is a layer having a surface hardness, and the hardness is, for example, a pencil hardness of 2H or more.
  • the hard coat layer may have a single layer structure or a multi-layer structure.
  • the hard coat layer contains a hard coat layer resin
  • the hard coat layer resin include acrylic resin, epoxy resin, urethane resin, vinylbenzyl chloride resin, vinyl resin, silicone resin, and these.
  • examples thereof include ultraviolet curable type, electron beam curable type, and heat curable type resins such as mixed resins, and as described above, it is preferable that the surface Si ratio of the resin forming the hard coat layer is 1 atomic% or more. ..
  • the hard coat layer preferably contains an acrylic resin and has a surface Si ratio of 1 atomic% or more in order to exhibit high hardness. It is also preferable to include an epoxy resin because the adhesion to the water-repellent layer (r) via the intermediate layer (c) tends to be good.
  • the hard coat layer may further contain an ultraviolet absorber, a metal oxide such as silica or alumina, or an inorganic filler such as polyorganosiloxane.
  • an ultraviolet absorber such as silica or alumina
  • an inorganic filler such as polyorganosiloxane.
  • an antireflection layer may be provided on the resin layer, or a hard coat layer provided on the resin layer. It is also preferable that an antireflection layer is further provided on the top, and in this case, the resin layer, the hard coat layer, the antireflection layer, the intermediate layer (c), and the water repellent layer (r) are laminated in this order. ..
  • the material constituting the resin layer the above-mentioned thermosetting resin, thermoplastic resin, or engineering plastic can be used.
  • the antireflection layer is a layer having a function of preventing the reflection of incident light, and is a layer exhibiting a reflection characteristic in which the reflectance is reduced to about 5% or less in the visible light region of 380 to 780 nm.
  • the structure of the antireflection layer is not particularly limited, and may be a single-layer structure or a multi-layer structure. In the case of a multi-layer structure, a structure in which low refractive index layers and high refractive index layers are alternately laminated is preferable, and the total number of layers is preferably 2 to 20.
  • the material constituting the high refractive index layer examples include oxides of titanium, zirconium, aluminum, niobium, tantalum and lanthanum, and examples of the material constituting the low refractive index layer include oxides of silicon (that is, silica).
  • the antireflection layer having a multi-layer structure a structure in which SiO 2 and ZrO 2 or SiO 2 and Nb 2 O 5 are alternately laminated and the outermost layer on the opposite side to the base material (s) is SiO 2 is preferable. ..
  • the antireflection layer can be formed, for example, by a vapor deposition method.
  • the reflection characteristics and / or the material may be satisfied in at least the outermost layer on the intermediate layer (c) side of the base material (s), and preferably the base material (s).
  • s) may be filled with a thickness of 10% or more (thickness of the base material (s)) from the outermost surface layer on the intermediate layer (c) side, and more preferably 40% or more. It is more preferable that the entire base material (s) is filled.
  • the thickness of the base material (s) is, for example, 1 to 498 ⁇ m, preferably 1 to 300 ⁇ m, more preferably 1 to 100 ⁇ m, still more preferably 10 to 95 ⁇ m, and particularly preferably 30 to 90 ⁇ m.
  • the water contact angle (initial contact angle) when the laminate of the present invention is evaluated according to the method described in Examples described later is, for example, 105 ° or more, more preferably 110 ° or more, and for example 125 °. It is as follows.
  • the first method for producing the laminate of the present invention includes (i) a step of applying the mixed composition (cc) on the base material (s) and (ii) a coated surface of the mixed composition (cc). Including a step of applying the mixed composition (ca) to, and (iii) a step of curing the mixed composition (cc) and the mixed composition (ca), and applying the mixed composition (cc).
  • the intermediate layer (c) is formed from the layer, and the water-repellent layer (r) is formed from the coating layer of the mixed composition (ca).
  • a known method can be used, but a spin coating method or a dip coating method is preferable.
  • the mixed composition (ca) for forming the water-repellent layer (r) is applied to the coated surface of the mixed composition (cc) and dried to obtain the mixed composition (cc) from the coated layer.
  • the intermediate layer (c) can be formed, and the water-repellent layer (r) can be formed from the coating layer of the mixed composition (ca).
  • the intermediate layer (c) may be formed during or after the application of the mixed composition (cc), and the intermediate layer (c) and the water-repellent layer (r) may be formed. May proceed at the same time.
  • Examples of the method for applying the composition for forming the water-repellent layer (r) include a dip coating method, a roll coating method, a bar coating method, a spin coating method, a spray coating method, a die coating method, and a gravure coating method. ..
  • the laminate of the present invention can be produced by allowing it to stand at room temperature in the air for, for example, 1 hour or more (usually 24 hours or less).
  • room temperature is 5 to 60 ° C, preferably 15 to 40 ° C.
  • the humidity condition when the product is allowed to stand at room temperature may be 50 to 90% RH.
  • the organosilicon compound (C) is vapor-deposited on the base material (s) to form the intermediate layer (c), and the intermediate layer (c) is formed.
  • the mixed composition (ca) is applied onto the coating layer and cured to form the water-repellent layer (r) from the coating layer of the mixed composition (ca).
  • the organosilicon compound (C) alone may be vapor-deposited on the base material (s), or the organosilicon compound (c) may be vapor-deposited.
  • a solid substance that is, the organosilicon compound (C) obtained by removing the solvent from the mixed composition of C) and the solvent may be vapor-deposited on the base material (s). After applying the composition for forming the water-repellent layer (r), the same procedure as in the first method may be applied.
  • the base material (s) is hydrophilized before the composition (cc) is applied or before the organosilicon compound (C) is vapor-deposited.
  • the hydrophilic treatment include hydrophilization treatments such as corona treatment, plasma treatment, ultraviolet treatment, and ion cleaning treatment, and plasma treatment and ion cleaning treatment are more preferable.
  • hydrophilization treatment such as plasma treatment
  • functional groups such as OH groups and COOH groups can be formed on the surface of the base material, especially when such functional groups are formed on the surface of the base material.
  • the adhesion between the intermediate layer (c) and the base material (s) can be further improved.
  • the present invention also provides a flexible display device comprising the optical laminate of the present invention.
  • the laminate of the present invention can preferably be used as a front plate in a flexible display device, and the front plate may be referred to as a window film.
  • the flexible display device is preferably composed of a laminated body for a flexible display device and an organic EL display panel, and the laminated body for the flexible display device is arranged on the visual side with respect to the organic EL display panel and is configured to be bendable. ing.
  • the laminated body for a flexible display device may further contain a polarizing plate (preferably a circular polarizing plate), a touch sensor, and the like, and the stacking order thereof is arbitrary, but the window film (that is, the present invention) is viewed from the visual side. It is preferable that the laminated body), the polarizing plate, and the touch sensor are laminated in this order, or the window film, the touch sensor, and the polarizing plate are laminated in this order. If a polarizing plate is present on the visual side of the touch sensor, the pattern of the touch sensor is less likely to be visually recognized and the visibility of the displayed image is improved, which is preferable. Each member can be laminated using an adhesive, an adhesive, or the like. Further, the flexible display device can be provided with a light-shielding pattern formed on at least one surface of any of the layers of the window film, the polarizing plate, and the touch sensor.
  • the flexible display device of the present invention preferably includes a polarizing plate, particularly a circular polarizing plate.
  • the circular polarizing plate is a functional layer having a function of transmitting only a right or left circularly polarized light component by laminating a ⁇ / 4 retardation plate on a linear polarizing plate.
  • the external light is converted to right-handed circularly polarized light and reflected by the organic EL panel to block the left-handed circularly polarized light, and only the light emitting component of the organic EL is transmitted to suppress the influence of the reflected light. It is used to make it easier to see.
  • the absorption axis of the linear polarizing plate and the slow axis of the ⁇ / 4 retardation plate need to be theoretically 45 degrees, but practically, they are 45 ⁇ 10 degrees.
  • the linear polarizing plate and the ⁇ / 4 retardation plate do not necessarily have to be laminated adjacent to each other, and the relationship between the absorption axis and the slow phase axis may satisfy the above range. It is preferable to achieve perfect circularly polarized light at all wavelengths, but it is not always necessary in practical use. Therefore, the circularly polarizing plate in the present invention also includes an elliptical polarizing plate. It is also preferable to further laminate a ⁇ / 4 retardation film on the visible side of the linear polarizing plate to convert the emitted light into circularly polarized light to improve the visibility when wearing polarized sunglasses.
  • the linear polarizing plate is a functional layer that allows light vibrating in the transmission axis direction to pass through, but has the function of blocking the polarization of vibration components perpendicular to it.
  • the linear polarizing plate may be configured to include a linear polarizing element alone or a linear polarizing element and a protective film attached to at least one surface thereof.
  • the thickness of the linear polarizing plate may be 200 ⁇ m or less, preferably 0.5 to 100 ⁇ m. When the thickness of the linear polarizing plate is within the above range, the flexibility of the linear polarizing plate tends to be difficult to decrease.
  • the linear polarizer may be a film-type polarizer produced by dyeing and stretching a polyvinyl alcohol (hereinafter, may be abbreviated as PVA) -based film.
  • a dichroic dye such as iodine is adsorbed on the PVA-based film oriented by stretching, or the dichroic dye is oriented in a state of being adsorbed on the PVA to exhibit polarization performance.
  • other steps such as swelling, cross-linking with boric acid, washing with an aqueous solution, and drying may be included.
  • the stretching and dyeing steps may be performed on the PVA-based film alone, or may be performed in a state of being laminated with another film such as polyethylene terephthalate.
  • the thickness of the PVA-based film used is preferably 10 to 100 ⁇ m, and the draw ratio is preferably 2 to 10 times.
  • a liquid crystal coating type polarizer formed by coating a liquid crystal polarizing composition can be mentioned.
  • the liquid crystal polarizing composition may contain a liquid crystal compound and a dichroic dye compound.
  • the liquid crystal compound may have a property of exhibiting a liquid crystal state, and is particularly preferable when it has a higher-order orientation state such as a smectic phase because it can exhibit high polarization performance.
  • the liquid crystal compound preferably has a polymerizable functional group.
  • the dichroic dye compound is a dye that is oriented together with the liquid crystal compound and exhibits dichroism, and may have a polymerizable functional group, and the dichroic dye itself has liquid crystallinity. You may be doing it. Any of the compounds contained in the liquid crystal polarizing composition has a polymerizable functional group.
  • the liquid crystal polarizing composition can further contain an initiator, a solvent, a dispersant, a leveling agent, a stabilizer, a surfactant, a cross-linking agent, a silane coupling agent and the like.
  • the liquid crystal polarizing layer is manufactured by applying a liquid crystal polarizing composition on an alignment film to form a liquid crystal polarizing layer.
  • the liquid crystal polarizing layer can be formed to be thinner than the film-type polarizing element, and the thickness is preferably 0.5 to 10 ⁇ m, more preferably 1 to 5 ⁇ m.
  • the alignment film is produced, for example, by applying an alignment film forming composition on a substrate and imparting orientation by rubbing, polarized light irradiation, or the like.
  • the alignment film forming composition contains an alignment agent, and may further contain a solvent, a cross-linking agent, an initiator, a dispersant, a leveling agent, a silane coupling agent, and the like.
  • the alignment agent include polyvinyl alcohols, polyacrylates, polyamic acids, and polyimides.
  • an orientation agent that imparts orientation by polarization irradiation it is preferable to use an orientation agent containing a synnamate group.
  • the weight average molecular weight of the polymer used as the alignment agent is, for example, about 10,000 to 1,000,000.
  • the thickness of the alignment film is preferably 5 to 10,000 nm, and more preferably 10 to 500 nm in that the alignment regulating force is sufficiently exhibited.
  • the liquid crystal polarizing layer can be peeled off from the base material, transferred and laminated, or the base material can be laminated as it is. It is also preferable that the base material serves as a transparent base material for a protective film, a retardation plate, and a window film.
  • any transparent polymer film may be used, and the same materials and additives used for the transparent base material of the window film can be used. Further, it may be a coating type protective film obtained by applying a cationic curing composition such as an epoxy resin or a radical curing composition such as acrylate and curing the film.
  • the protective film may be a plasticizer, an ultraviolet absorber, an infrared absorber, a colorant such as a pigment or a dye, a fluorescent whitening agent, a dispersant, a heat stabilizer, a light stabilizer, an antioxidant, an antioxidant, if necessary. , Lubricants, solvents and the like may be contained.
  • the thickness of the protective film is preferably 200 ⁇ m or less, more preferably 1 to 100 ⁇ m. When the thickness of the protective film is within the above range, the flexibility of the film tends to be difficult to decrease.
  • the ⁇ / 4 retardation plate is a film that gives a retardation of ⁇ / 4 in a direction orthogonal to the traveling direction of incident light (in-plane direction of the film).
  • the ⁇ / 4 retardation plate may be a stretch-type retardation plate manufactured by stretching a polymer film such as a cellulose-based film, an olefin-based film, or a polycarbonate-based film.
  • the ⁇ / 4 retardation plate may be used as a retardation adjuster, a plastic agent, an ultraviolet absorber, an infrared absorber, a colorant such as a pigment or a dye, a fluorescent whitening agent, a dispersant, a heat stabilizer, and a light stabilizer.
  • the thickness of the stretched retardation plate is preferably 200 ⁇ m or less, more preferably 1 to 100 ⁇ m.
  • the thickness of the stretchable retardation plate is within the above range, the flexibility of the stretchable retardation plate tends to be difficult to decrease.
  • the ⁇ / 4 retardation plate there is a liquid crystal coating type retardation plate formed by coating a liquid crystal composition.
  • the liquid crystal composition contains a liquid crystal compound exhibiting a liquid crystal state such as nematic, cholesteric, and smectic.
  • the liquid crystal compound has a polymerizable functional group.
  • the liquid crystal composition can further contain an initiator, a solvent, a dispersant, a leveling agent, a stabilizer, a surfactant, a cross-linking agent, a silane coupling agent, and the like.
  • the liquid crystal coating type retardation plate can be manufactured by applying a liquid crystal composition on a substrate and curing the liquid crystal composition to form a liquid crystal retardation layer, similarly to the liquid crystal polarizing layer.
  • the liquid crystal coating type retardation plate can be formed to be thinner than the stretch type retardation plate.
  • the thickness of the liquid crystal polarizing layer is preferably 0.5 to 10 ⁇ m, more preferably 1 to 5 ⁇ m.
  • the liquid crystal coating type retardation plate can be peeled off from the base material, transferred and laminated, or the base material can be laminated as it is. It is also preferable that the base material serves as a transparent base material for a protective film, a retardation plate, and a window film.
  • the in-plane phase difference is preferably 100 to 4 so that it becomes ⁇ / 4 with respect to the vicinity of 560 nm, which has high luminosity factor. It is designed to be 180 nm, more preferably 130-150 nm.
  • a reverse dispersion ⁇ / 4 retardation plate using a material having a birefringence wavelength dispersion characteristic opposite to the usual one is preferable in that visibility is good.
  • a stretchable retardation plate can be used as described in JP-A-2007-232873, and a liquid crystal coating type retardation plate can be used as described in JP-A-2010-30979. ..
  • a technique for obtaining a wideband ⁇ / 4 retardation plate by combining with a ⁇ / 2 retardation plate is also known (for example, Japanese Patent Application Laid-Open No. 10-90521).
  • the ⁇ / 2 retardation plate is also manufactured by the same material method as the ⁇ / 4 retardation plate.
  • the combination of the stretchable retardation plate and the liquid crystal coating type retardation plate is arbitrary, but the thickness can be reduced by using the liquid crystal coating type retardation plate in both cases.
  • a method of laminating a positive C plate on the circularly polarizing plate in order to improve visibility in an oblique direction is known (for example, Japanese Patent Application Laid-Open No. 2014-224738).
  • the positive C plate may be a liquid crystal coating type retardation plate or a stretched retardation plate.
  • the phase difference in the thickness direction of the retardation plate is preferably ⁇ 200 to ⁇ 20 nm, more preferably ⁇ 140 to ⁇ 40 nm.
  • the flexible display device of the present invention preferably includes a touch sensor.
  • the touch sensor is used as an input means.
  • Examples of the touch sensor include various types such as a resistive film method, a surface acoustic wave method, an infrared method, an electromagnetic induction method, and a capacitance method, and a capacitance method is preferable.
  • the capacitive touch sensor is divided into an active region and an inactive region located outside the active region.
  • the active area is an area corresponding to the area where the screen is displayed on the display panel (display unit), the area where the user's touch is sensed, and the inactive area is the area where the screen is not displayed on the display device (non-active area). This is the area corresponding to the display unit).
  • the touch sensor is formed in a substrate having flexible characteristics, a sensing pattern formed in an active region of the substrate, and an inactive region of the substrate, and is connected to an external drive circuit via the sensing pattern and a pad portion.
  • Each sensing line for can be included.
  • the substrate having flexible characteristics the same material as the transparent substrate of the window film can be used.
  • the sensing pattern can include a first pattern formed in the first direction and a second pattern formed in the second direction.
  • the first pattern and the second pattern are arranged in different directions from each other.
  • the first pattern and the second pattern are formed in the same layer, and each pattern must be electrically connected in order to sense the touched point.
  • the first pattern is a form in which a plurality of unit patterns are connected to each other via a joint, but the second pattern has a structure in which a plurality of unit patterns are separated from each other in an island form, so that the second pattern is electrically operated.
  • a separate bridge electrode is required for the connection.
  • a well-known transparent electrode can be applied to the electrode for connecting the second pattern.
  • Examples of the material of the transparent electrode include indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc oxide oxide (IZTO), and indium gallium zinc oxide (IGZO). , Cadmium tin oxide (CTO), PEDOT (poly (3,4-ethylenedioxythiophene)), carbon nanotubes (CNT), graphene, metal wire and the like, and ITO is preferable. These can be used alone or in combination of two or more.
  • the metal used for the metal wire is not particularly limited, and examples thereof include silver, gold, aluminum, copper, iron, nickel, titanium, telenium, chromium, etc., and these may be used alone or in combination of two or more. Can be done.
  • the bridge electrode can be formed on the upper part of the insulating layer via the insulating layer on the upper part of the sensing pattern, the bridge electrode is formed on the substrate, and the insulating layer and the sensing pattern can be formed on the bridge electrode.
  • the bridge electrode can be made of the same material as the sensing pattern, or it can be made of molybdenum, silver, aluminum, copper, palladium, gold, platinum, zinc, tin, titanium or two or more alloys of these. can. Since the first pattern and the second pattern must be electrically insulated, an insulating layer is formed between the sensing pattern and the bridge electrode.
  • the insulating layer may be formed only between the joint of the first pattern and the bridge electrode, or may be formed as a layer covering the entire sensing pattern. In the case of a layer covering the entire sensing pattern, the bridge electrode can connect the second pattern through a contact hole formed in the insulating layer.
  • the touch sensor is induced by a difference in transmittance between a pattern region in which a sensing pattern is formed and a non-pattern region in which a sensing pattern is not formed, specifically, a difference in refractive index in these regions.
  • An optical adjustment layer may be further included between the substrate and the electrode as a means for appropriately compensating for the difference in light transmittance.
  • the optical control layer may contain an inorganic insulating material or an organic insulating material.
  • the optical control layer can be formed by coating a photocurable composition containing a photocurable organic binder and a solvent on a substrate.
  • the photocurable composition may further contain inorganic particles.
  • the refractive index of the optical control layer can be increased by the inorganic particles.
  • the photocurable organic binder contains a copolymer of each monomer such as an acrylate-based monomer, a styrene-based monomer, and a carboxylic acid-based monomer, as long as the effects of the present invention are not impaired. be able to.
  • the photocurable organic binder may be, for example, a copolymer containing different repeating units such as an epoxy group-containing repeating unit, an acrylate repeating unit, and a carboxylic acid repeating unit. Examples of the inorganic particles include zirconia particles, titania particles, alumina particles and the like.
  • the photocuring composition may further contain additives such as a photopolymerization initiator, a polymerizable monomer, and a curing aid.
  • ⁇ Adhesive layer> Each layer (window film, circularly polarizing plate, touch sensor) forming the laminate for the flexible image display device and the film member (straight polarizing plate, ⁇ / 4 retardation plate, etc.) constituting each layer are joined by an adhesive.
  • the adhesive include water-based adhesives, organic solvent-based adhesives, solvent-free adhesives, solid adhesives, solvent volatilization adhesives, moisture-curable adhesives, heat-curable adhesives, anaerobic curable adhesives, and active energy ray-curable adhesives.
  • adhesives such as mold adhesives, hardener mixed adhesives, heat-melt adhesives, pressure-sensitive adhesives (adhesives), and re-wet adhesives can be used, preferably aqueous solvent volatilization. Mold adhesives, active energy ray-curable adhesives, and adhesives can be used.
  • the thickness of the adhesive layer can be appropriately adjusted according to the required adhesive force and the like, and is preferably 0.01 to 500 ⁇ m, more preferably 0.1 to 300 ⁇ m.
  • the laminated body for a flexible image display device has a plurality of adhesive layers, and the thickness and type of each may be the same or different.
  • a polyvinyl alcohol-based polymer a water-soluble polymer such as starch, an ethylene-vinyl acetate emulsion, a styrene-butadiene emulsion, or the like in an aqueous-dispersed state can be used as the main polymer.
  • a cross-linking agent a silane compound, an ionic compound, a cross-linking catalyst, an antioxidant, a dye, a pigment, an inorganic filler, an organic solvent and the like may be blended.
  • the water-based solvent volatilization type adhesive When adhering with the water-based solvent volatilization type adhesive, the water-based solvent volatilization type adhesive can be injected between the layers to be adhered, the adherend layers are bonded, and then dried to impart adhesiveness.
  • the thickness of the adhesive layer is preferably 0.01 to 10 ⁇ m, more preferably 0.1 to 1 ⁇ m.
  • the thickness and type of each layer may be the same or different.
  • the active energy ray-curable adhesive can be formed by curing an active energy ray-curable composition containing a reactive material that is irradiated with active energy rays to form an adhesive layer.
  • the active energy ray-curable composition can contain at least one polymer of a radical-polymerizable compound and a cationically polymerizable compound similar to those contained in the hard coat composition.
  • the radically polymerizable compound the same compound as the radically polymerizable compound in the hard coat composition can be used.
  • the cationically polymerizable compound the same compound as the cationically polymerizable compound in the hard coat composition can be used.
  • an epoxy compound is particularly preferable. It is also preferable to include a monofunctional compound as a reactive diluent in order to reduce the viscosity of the adhesive composition.
  • the active energy ray composition can contain a monofunctional compound in order to reduce the viscosity.
  • the monofunctional compound include an acrylate-based monomer having one (meth) acryloyl group in one molecule and a compound having one epoxy group or oxetanyl group in one molecule, for example, glycidyl (meth). ) Examples include acrylate.
  • the active energy ray composition can further contain a polymerization initiator. Examples of the polymerization initiator include radical polymerization initiators, cationic polymerization initiators, radicals and cationic polymerization initiators, and these are appropriately selected and used.
  • These polymerization initiators are decomposed by at least one of activation energy ray irradiation and heating to generate radicals or cations to promote radical polymerization and cation polymerization.
  • an initiator that can initiate at least one of radical polymerization or cationic polymerization by irradiation with active energy rays can be used.
  • the active energy ray-curable composition further comprises an ion trapping agent, an antioxidant, a chain transfer agent, an adhesion imparting agent, a thermoplastic resin, a filler, a fluid viscosity modifier, a plasticizer, a defoaming agent solvent, an additive, and a solvent. Can be included.
  • the active energy ray-curable composition is applied to either or both of the layers to be adhered, and then bonded to each layer. Alternatively, both layers to be adhered can be adhered by irradiating them with active energy rays and curing them.
  • the thickness of the adhesive layer is preferably 0.01 to 20 ⁇ m, more preferably 0.1 to 10 ⁇ m.
  • the thickness and type of the respective layers may be the same or different.
  • the pressure-sensitive adhesive is classified into an acrylic pressure-sensitive adhesive, a urethane-based pressure-sensitive adhesive, a rubber-based pressure-sensitive adhesive, a silicone-based pressure-sensitive adhesive, and the like according to the main polymer, and any of them can be used.
  • the pressure-sensitive adhesive may contain a cross-linking agent, a silane compound, an ionic compound, a cross-linking catalyst, an antioxidant, a tackifier, a plasticizer, a dye, a pigment, an inorganic filler and the like.
  • a pressure-sensitive adhesive layer is formed by dissolving and dispersing each component constituting the pressure-sensitive adhesive in a solvent to obtain a pressure-sensitive adhesive composition, applying the pressure-sensitive adhesive composition onto a substrate, and then drying the mixture.
  • the adhesive layer may be directly formed, or a separately formed base material may be transferred. It is also preferable to use a release film to cover the adhesive surface before bonding.
  • the thickness of the adhesive layer is preferably 0.1 to 500 ⁇ m, more preferably 1 to 300 ⁇ m.
  • the thickness and type of the respective layers may be the same or different.
  • the shading pattern can be applied as at least a part of the bezel or housing of the flexible image display device.
  • the light-shielding pattern hides the wiring arranged at the edge of the flexible image display device to make it difficult to see, thereby improving the visibility of the image.
  • the shading pattern may be in the form of a single layer or multiple layers.
  • the color of the light-shielding pattern is not particularly limited, and may be various colors such as black, white, and metallic.
  • the light-shielding pattern can be formed of a pigment for embodying color and a polymer such as an acrylic resin, an ester resin, an epoxy resin, polyurethane, or silicone. They can also be used alone or in mixtures of two or more.
  • the shading pattern can be formed by various methods such as printing, lithography, and inkjet.
  • the thickness of the shading pattern is preferably 1 to 100 ⁇ m, more preferably 2 to 50 ⁇ m. It is also preferable to give a shape such as an inclination in the thickness direction of the light-shielding pattern.
  • Abrasion resistance test Using a steel wool testing machine (manufactured by Daiei Seiki Co., Ltd.) equipped with steel wool # 0000 (manufactured by Bonster), the load is applied with the steel wool in contact with the surface of the laminate (water repellent layer (r)).
  • a wear test was carried out by applying 1000 g, and the test was repeated until peeling / scratches were confirmed visually, and the wear resistance was evaluated by the number of tests when peeling / scratches were confirmed. The presence or absence of peeling and scratches was confirmed at an illuminance of 1000 lux.
  • Thickness measurement The thickness of the base material (s) was measured using DIGIMICRO (model number: MFC-101A) manufactured by Nikon Corporation. In each of the examples and comparative examples, the thickness of the water-repellent layer (r) was several nm, and the thickness of the intermediate layer (c) was about 5 to 30 nm.
  • Example 1 A reaction product of N-2- (aminoethyl) -3-aminopropyltrimethoxysilane and chloropropyltrimethoxysilane (trade name) described in JP2012-197330A, which is represented by the following formula as an organic silicon compound (C).
  • a solution prepared by mixing 0.25% by mass of X-12-5263HP (manufactured by Shin-Etsu Chemical Industry Co., Ltd.) and 99.75% by mass of hexane as the solvent (E) is stirred at room temperature for forming the intermediate layer (c). A solution was obtained.
  • an AR film having a thickness of 84 ⁇ m was prepared as the base material (s).
  • the AR film is a film in which SiO 2 and a metal oxide (however, other than SiO 2 ) are alternately laminated on a resin layer by a vacuum vapor deposition method to make the outermost surface SiO 2 .
  • Substrate (s) measured by the above method The surface Si ratio of was 31.5 atomic%.
  • the surface of the AR film is activated by atmospheric pressure plasma treatment, and the intermediate layer (c) forming solution is applied to the activated surface using OPTICOAT MS-A100 (spin coater) manufactured by MIKASA Co., Ltd.
  • An intermediate layer (c) was obtained by coating under the conditions of a coating liquid volume of 200 ⁇ l, a rotation speed of 2000 rpm, and a rotation speed of 20 seconds.
  • organosilicon compound (A) Optool (registered trademark) UF503 manufactured by Daikin Industries, Ltd. (containing 20% by mass of the organosilicon compound (A) and 80% by mass of Novec7200 as the solvent), and the organosilicon compound ( FAS13E (C 6 F 13- C 2 H 4- Si (OC 2 H 5 ) 3 , manufactured by Tokyo Kasei Kogyo Co., Ltd.) as B), FC-3283 (C 9 F 21 N, Florinate, 3M) as solvent (D)
  • the water-repellent layer (r) is mixed and stirred at room temperature for a predetermined time. A forming solution was obtained.
  • Optool (registered trademark) UF503 is an organosilicon compound in which a monovalent group having a perfluoropolyether structure and a hydrolyzable group are each bonded to a silicon atom.
  • the proportion (solid content) of the organosilicon compound (A) in 100% by mass of the water-repellent layer (r) forming solution is 0.085% by mass, and the proportion of the organosilicon compound (B) is 0.05% by mass. Met.
  • the water-repellent layer (r) forming solution was applied onto the intermediate layer (c) using a spray coater manufactured by Apiros Co., Ltd.
  • the conditions for spray coating are scan speed: 600 mm / sec, pitch: 5 mm, liquid volume: 6 cc / min, atomizing air: 350 kPa, and gap: 70 mm. Then, it was fired at 80 ° C. for 30 minutes to obtain a laminate containing the base material (s), the intermediate layer (c), and the water-repellent layer (r) in this order.
  • Example 2 The base material (s), the intermediate layer (c), and the water-repellent layer (s) are the same as in Example 1 except that the base material (s) is changed to an AR film having a surface Si ratio of 31.3 atomic%. A laminate containing r) in this order was obtained.
  • Example 3 A laminate containing the base material (s), the intermediate layer (c), and the water-repellent layer (r) in this order was obtained in the same manner as in Example 2 except that butyl acetate was used as the solvent (E). ..
  • Example 4 The base material (s), the intermediate layer (c), and the water-repellent layer (r) are arranged in this order in the same manner as in Example 1 except that the base material (s) is changed to a hard coat film having a thickness of 45 ⁇ m. A laminate containing the mixture was obtained.
  • the hard coat film is a film in which an acrylic hard coat layer having a surface Si ratio of 1.8 atomic% is laminated on a resin layer composed of polyethylene terephthalate, and is subjected to atmospheric pressure plasma treatment similar to that in Example 1. The surface of the acrylic hard coat layer was subjected to the activation treatment according to the above.
  • Example 5 The substrate (s) was the same as in Example 1 except that the organosilicon compound (C) was changed to KBM-903 (manufactured by Shin-Etsu Chemical Co., Ltd.) and butyl acetate was used as the solvent (E). ), The intermediate layer (c), and the water-repellent layer (r) were obtained in this order.
  • Comparative Example 1 The base material (s) and the intermediate layer (c) are the same as in Example 1 except that the base material (s) is changed to an acrylic hard coat layer having a thickness of 60 ⁇ m and a surface Si ratio of 0 atomic%. ), A laminate containing the water-repellent layer (r) in this order was obtained.
  • Comparative Example 2 A laminate containing the base material (s), the intermediate layer (c), and the water-repellent layer (r) in this order was obtained in the same manner as in Comparative Example 1 except that the solvent (E) was changed to methyl ethyl ketone.
  • Table 1 shows the results of evaluating the laminates obtained in Examples and Comparative Examples by the above method.
  • the laminate of the present invention includes display devices such as touch panel displays, optical elements, semiconductor elements, building materials, nanoimprint technology, solar cells, windowpanes of automobiles and buildings, metal products such as cooking utensils, ceramic products such as tableware, and plastics. It can be suitably formed on automobile parts and the like, and is industrially useful. It is also preferably used for kitchens, bathrooms, wash basins, mirrors, articles of various members around toilets, and the like.

Abstract

A multilayer body which is sequentially provided with a base material (s), an intermediate layer (c) and a water repellent layer (r) in this order, and which is characterized by satisfying the requirements (1) and (2) described below. (1) The reflectance, which is obtained by subtracting the front surface reflection loss and the back surface reflection loss from the reflectance that is calculated, with a 2-degree field of view (C light source) of JIS Z8701, from the spectral reflectance at the wavelength of 530 nm as measured on the water repellent layer (r)-side surface at the incident angle of 12° and at the reflection angle of 12°, is 4.5% or less. (2) The thickness of the multilayer body is 500 μm or less.

Description

積層体及びフレキシブル表示装置Laminated body and flexible display device
 本発明は、積層体及びフレキシブル表示装置に関する。 The present invention relates to a laminate and a flexible display device.
 パーフルオロポリエーテル構造を有する化合物を含む組成物から形成される皮膜に代表されるフッ素系撥水性皮膜は、その表面自由エネルギーが非常に小さいため、タッチパネルディスプレイ等の表示装置、光学素子、半導体素子、建築材料、自動車や建物の窓ガラス等の種々の分野において防汚コーティング、又は撥水撥油コーティングなどとして用いられている。 A fluorine-based water-repellent film represented by a film formed from a composition containing a compound having a perfluoropolyether structure has a very small surface free energy, so that it is a display device such as a touch panel display, an optical element, or a semiconductor element. , Building materials, windowpanes of automobiles and buildings, etc., are used as antifouling coatings, water-repellent and oil-repellent coatings, and the like.
 撥水性の皮膜は、通常、基材の上に形成して用いられ、撥水性皮膜形成用組成物を基材に塗布するに際しては、基材に予めプライマー層などの他の層を形成した後に、前記組成物を塗布して防汚コーティング又は撥水撥油コーティングを形成する場合がある。 The water-repellent film is usually formed on a base material and used, and when the composition for forming a water-repellent film is applied to the base material, after another layer such as a primer layer is formed on the base material in advance. , The composition may be applied to form an antifouling coating or a water- and oil-repellent coating.
 例えば、特許文献1には、基材の少なくとも一方の面にハードコート層(X)、プライマー層(Y)及び表面層(Z)が順に積層されたハードコートフィルムであって、前記表面層(Z)が110°以上の水接触角を有するハードコートフィルムが開示されている。前記表面層(Z)を形成するためには、ポリパーフルオロポリエーテル鎖を有するフッ素系化合物を用いるのが好ましいこと、またプライマー層(Y)を形成するためには、3-アクリロキシプロピルトリメトキシシラン等のシラン化合物が好ましいことが記載されている。 For example, Patent Document 1 describes a hard coat film in which a hard coat layer (X), a primer layer (Y), and a surface layer (Z) are laminated in this order on at least one surface of a base material, and the surface layer (X). A hard coat film having a water contact angle of 110 ° or more in Z) is disclosed. In order to form the surface layer (Z), it is preferable to use a fluorine-based compound having a polyperfluoropolyether chain, and in order to form the primer layer (Y), 3-acryloxypropyltri It is described that a silane compound such as methoxysilane is preferable.
特開2015-120253号公報JP-A-2015-120253
 基材の上に撥水層を備えた積層体では、良好な撥水性を維持するために、おもて面側に曝される撥水層側から評価した際の耐摩耗性が要求される。そこで、本発明は、基材、中間層、撥水層がこの順で積層された積層体であって、薄膜であっても耐摩耗性に優れた積層体を提供することを目的とする。 A laminate having a water-repellent layer on a base material is required to have abrasion resistance when evaluated from the water-repellent layer side exposed to the front surface side in order to maintain good water repellency. .. Therefore, an object of the present invention is to provide a laminated body in which a base material, an intermediate layer, and a water-repellent layer are laminated in this order, and even if it is a thin film, it has excellent wear resistance.
 本発明者らは、積層体表面における反射特性を調整することで、薄膜でありながら良好な耐摩耗性を実現できることを見出した。具体的には、上記課題を達成した本発明は以下の通りである。
 [1]基材(s)、中間層(c)、及び撥水層(r)をこの順に備える積層体であって、以下の(1)及び(2)の要件を満足することを特徴とする積層体。
(1)前記撥水層(r)側表面で測定した入射角12°及び反射角12°における波長530nmの分光反射率をJIS Z8701の2度視野(C光源)により算出した反射率から表面反射損失及び裏面反射損失を差し引いた反射率が4.5%以下である。
(2)前記積層体の厚みが500μm以下である。
 [2]更に、下記(3)の要件を満足する[1]に記載の積層体。
(3)前記撥水層(r)側の表面フッ素元素比が30原子%以上である。
 [3]更に、下記(4)及び(5)の要件の少なくとも1つを満足する[1]又は[2]に記載の積層体。
(4)前記撥水層(r)側の算術平均高さSaが0.03~1.00μmである。
(5)前記撥水層(r)側の水の滑落角が25°以下である。
 [4]前記基材(s)の、前記中間層(c)側の最表層の表面Si比が1原子%以上である[1]~[3]のいずれかに記載の積層体。
 [5]前記撥水層(r)は、下記式(a1)で表される有機ケイ素化合物(A)と下記式(b1)で表される有機ケイ素化合物(B)の混合組成物(ca)の硬化層である[1]~[4]のいずれかに記載の積層体。
Figure JPOXMLDOC01-appb-C000006
 上記式(a1)中、
 Rfa1は、両端が酸素原子である2価のパーフルオロポリエーテル構造であり、
 R11、R12、及びR13は、それぞれ独立して炭素数1~20のアルキル基であり、R11が複数存在する場合は複数のR11がそれぞれ異なっていてもよく、R12が複数存在する場合は複数のR12がそれぞれ異なっていてもよく、R13が複数存在する場合は複数のR13がそれぞれ異なっていてもよく、
 E1、E2、E3、E4、及びE5は、それぞれ独立して水素原子又はフッ素原子であり、
1が複数存在する場合は複数のE1がそれぞれ異なっていてもよく、E2が複数存在する場合は複数のE2がそれぞれ異なっていてもよく、E3が複数存在する場合は複数のE3がそれぞれ異なっていてもよく、E4が複数存在する場合は複数のE4がそれぞれ異なっていてもよく、E5が複数存在する場合は複数のE5がそれぞれ異なっていてもよく、
 G1及びG2は、それぞれ独立して、シロキサン結合を有する2~10価のオルガノシロキサン基であり、
 J1、J2、及びJ3は、それぞれ独立して、加水分解性基又は-(CH2e6-Si(OR143であり、e6は1~5であり、R14はメチル基又はエチル基であり、J1が複数存在する場合は複数のJ1がそれぞれ異なっていてもよく、J2が複数存在する場合は複数のJ2がそれぞれ異なっていてもよく、J3が複数存在する場合は複数のJ3がそれぞれ異なっていてもよく、
 L1及びL2は、それぞれ独立して、酸素原子、窒素原子、又はフッ素原子を含んでいてもよい炭素数1~12の2価の連結基であり、L1が複数存在する場合は複数のL1がそれぞれ異なっていてもよく、L2が複数存在する場合は複数のL2がそれぞれ異なっていてもよく、
 d11は、1~9であり、
 d12は、0~9であり、
 a10及びa14は、それぞれ独立して0~10であり、
 a11及びa15は、それぞれ独立して0又は1であり、
 a12及びa16は、それぞれ独立して0~9であり、
 a13は、0又は1であり、
 a21、a22、及びa23は、それぞれ独立して0~2であり、
 e1、e2、及びe3は、それぞれ独立して1~3である。
Figure JPOXMLDOC01-appb-C000007
上記式(b1)中、
 Rfb10は、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、
 Rb11、Rb12、Rb13及びRb14は、それぞれ独立して、水素原子又は炭素数が1~4のアルキル基であり、Rb11が複数存在する場合は複数のRb11がそれぞれ異なっていてもよく、Rb12が複数存在する場合は複数のRb12がそれぞれ異なっていてもよく、Rb13が複数存在する場合は複数のRb13がそれぞれ異なっていてもよく、Rb14が複数存在する場合は複数のRb14がそれぞれ異なっていてもよく、
 Rfb11、Rfb12、Rfb13及びRfb14は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfb11が複数存在する場合は複数のRfb11がそれぞれ異なっていてもよく、Rfb12が複数存在する場合は複数のRfb12がそれぞれ異なっていてもよく、Rfb13が複数存在する場合は複数のRfb13がそれぞれ異なっていてもよく、Rfb14が複数存在する場合は複数のRfb14がそれぞれ異なっていてもよく、
 Rb15は、炭素数が1~20のアルキル基であり、Rb15が複数存在する場合は複数のRb15がそれぞれ異なっていてもよく、
 A1は、-O-、-C(=O)-O-、-O-C(=O)-、-NR-、-NRC(=O)-、又は-C(=O)NR-であり、前記Rは水素原子、炭素数1~4のアルキル基又は炭素数1~4の含フッ素アルキル基であり、A1が複数存在する場合は複数のA1がそれぞれ異なっていてもよく、
 A2は、加水分解性基であり、A2が複数存在する場合は複数のA2がそれぞれ異なっていてもよく、
 b11、b12、b13、b14及びb15は、それぞれ独立して0~100の整数であり、
 cは、1~3の整数であり、
 Rfb10-、-Si(A2c(Rb153-c、b11個の-{C(Rb11)(Rb12)}-、b12個の-{C(Rfb11)(Rfb12)}-、b13個の-{Si(Rb13)(Rb14)}-、b14個の-{Si(Rfb13)(Rfb14)}-、b15個の-A1-は、Rfb10-、-Si(A2c(Rb153-cが末端となり、パーフルオロポリエーテル構造を形成せず、かつ-O-が-O-乃至-Fと連結しない限り、任意の順で並んで結合する。
 [6]前記中間層(c)は、下記式(c1)~(c3)のいずれかで表される有機ケイ素化合物(C)の混合組成物(cc)の硬化層又は前記有機ケイ素化合物(C)の蒸着層である[1]~[5]のいずれかに記載の積層体。
Figure JPOXMLDOC01-appb-C000008
 上記式(c1)中、
 Rx11、Rx12、Rx13、Rx14は、それぞれ独立して、水素原子又は炭素数が1~4のアルキル基であり、Rx11が複数存在する場合は複数のRx11がそれぞれ異なっていてもよく、Rx12が複数存在する場合は複数のRx12がそれぞれ異なっていてもよく、Rx13が複数存在する場合は複数のRx13がそれぞれ異なっていてもよく、Rx14が複数存在する場合は複数のRx14がそれぞれ異なっていてもよく、
 Rfx11、Rfx12、Rfx13、Rfx14は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfx11が複数存在する場合は複数のRfx11がそれぞれ異なっていてもよく、Rfx12が複数存在する場合は複数のRfx12がそれぞれ異なっていてもよく、Rfx13が複数存在する場合は複数のRfx13がそれぞれ異なっていてもよく、Rfx14が複数存在する場合は複数のRfx14がそれぞれ異なっていてもよく、
 Rx15は、炭素数が1~20のアルキル基であり、Rx15が複数存在する場合は複数のRx15がそれぞれ異なっていてもよく、
 X11は、加水分解性基であり、X11が複数存在する場合は複数のX11がそれぞれ異なっていてもよく、
 Y11は、-NH-、又は-S-であり、Y11が複数存在する場合は複数のY11がそれぞれ異なっていてもよく、
 Z11は、ビニル基、α-メチルビニル基、スチリル基、メタクリロイル基、アクリロイル基、アミノ基、イソシアネート基、イソシアヌレート基、エポキシ基、ウレイド基、又はメルカプト基であり、
 p1は、1~20の整数であり、p2、p3、p4は、それぞれ独立して、0~10の整数であり、p5は、1~10の整数であり、
 p6は、1~3の整数であり、
 Z11がアミノ基でない場合はY11の少なくとも1つが-NH-であり、Y11が全て-S-である場合はZ11がアミノ基であり、
 Z11-、-Si(X11p6(Rx153-p6、p1個の-{C(Rx11)(Rx12)}-、p2個の-{C(Rfx11)(Rfx12)}-、p3個の-{Si(Rx13)(Rx14)}-、p4個の-{Si(Rfx13)(Rfx14)}-、p5個の-Y11-は、Z11-及び-Si(X11p6(Rx153-p6が末端となり、-O-が-O-と連結しない限り、任意の順で並んで結合する。
Figure JPOXMLDOC01-appb-C000009
 上記式(c2)中、
 Rx20及びRx21は、それぞれ独立して、水素原子又は炭素数が1~4のアルキル基であり、Rx20が複数存在する場合は複数のRx20がそれぞれ異なっていてもよく、Rx21が複数存在する場合は複数のRx21がそれぞれ異なっていてもよく、 Rfx20及びRfx21は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfx20が複数存在する場合は複数のRfx20がそれぞれ異なっていてもよく、Rfx21が複数存在する場合は複数のRfx21がそれぞれ異なっていてもよく、
 Rx22及びRx23はそれぞれ独立して、炭素数が1~20のアルキル基であり、Rx22及びRx23が複数存在する場合は複数のRx22及びRx23がそれぞれ異なっていてもよく、
 X20及びX21はそれぞれ独立して、加水分解性基であり、X20及びX21が複数存在する場合は複数のX20及びX21がそれぞれ異なっていてもよく、
 p20は、それぞれ独立して1~30の整数であり、p21は、それぞれ独立して0~30の整数であり、p20又はp21を付して括弧でくくられた繰り返し単位の少なくとも1つは、アミン骨格-NR100-に置き換わっており、前記アミン骨格におけるR100は水素原子又はアルキル基であり、
 p22及びp23はそれぞれ独立して、1~3の整数であり、
 p20個の-{C(Rx20)(Rx21)}-、p21個の-{C(Rfx20)(Rfx21)}-は、p20個又はp21個が連続である必要はなく、任意の順で並んで結合し、両末端が-Si(X20p22(Rx223-p22及び-Si(X21p23(Rx233-p23となる。
Figure JPOXMLDOC01-appb-C000010
上記式(c3)中、
 Z31、Z32は、それぞれ独立に、加水分解性基及びヒドロキシ基以外の、反応性官能基であり、
 Rx31、Rx32、Rx33、Rx34は、それぞれ独立して、水素原子又は炭素数が1~4のアルキル基であり、Rx31が複数存在する場合は複数のRx31がそれぞれ異なっていてもよく、Rx32が複数存在する場合は複数のRx32がそれぞれ異なっていてもよく、Rx33が複数存在する場合は複数のRx33がそれぞれ異なっていてもよく、Rx34が複数存在する場合は複数のRx34がそれぞれ異なっていてもよく、
 Rfx31、Rfx32、Rfx33、Rfx34は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfx31が複数存在する場合は複数のRfx31がそれぞれ異なっていてもよく、Rfx32が複数存在する場合は複数のRfx32がそれぞれ異なっていてもよく、Rfx33が複数存在する場合は複数のRfx33がそれぞれ異なっていてもよく、Rfx34が複数存在する場合は複数のRfx34がそれぞれ異なっていてもよく、
 Y31は、-NH-、-N(CH3)-又は-O-であり、Y31が複数存在する場合は複数のY31がそれぞれ異なっていてもよく、
 X31、X32、X33、X34は、それぞれ独立に、-ORc(Rcは、水素原子、炭素数1~4のアルキル基、又はアミノC1-3アルキルジC1-3アルコキシシリル基である)であり、X31が複数存在する場合は複数のX31がそれぞれ異なっていてもよく、X32が複数存在する場合は複数のX32がそれぞれ異なっていてもよく、X33が複数存在する場合は複数のX33がそれぞれ異なっていてもよく、X34が複数存在する場合は複数のX34がそれぞれ異なっていてもよく、
 p31は、0~20の整数であり、p32、p33、p34は、それぞれ独立して、0~10の整数であり、p35は、0~5の整数であり、p36は、1~10の整数であり、p37は0又は1であり、
 Z31及びZ32の少なくとも一方がアミノ基であるか、又はY31の少なくとも一つが-NH-又は-N(CH3)-であるという条件を満たし、かつ末端がZ31-及びZ32-であり、-O-が-O-と連結しない限り、p31個の-{C(Rx31)(Rx32)}-、p32個の-{C(Rfx31)(Rfx32)}-、p33個の-{Si(Rx33)(Rx34)}-、p34個の-{Si(Rfx33)(Rfx34)}-、p35個の-Y31-、p36個の-{Si(X31)(X32)-O}-、p37個の-{Si(X33)(X34)}-が任意の順で並んで結合して構成される。
 [7][1]~[6]のいずれかに記載の積層体、偏光板、タッチセンサ、及び表示パネルを含むフレキシブル表示装置。
The present inventors have found that good wear resistance can be realized even though it is a thin film by adjusting the reflection characteristics on the surface of the laminate. Specifically, the present invention that has achieved the above problems is as follows.
[1] A laminate having a base material (s), an intermediate layer (c), and a water-repellent layer (r) in this order, characterized in that it satisfies the following requirements (1) and (2). Laminated body.
(1) Surface reflection of the spectral reflectance at a wavelength of 530 nm at an incident angle of 12 ° and a reflection angle of 12 ° measured on the surface of the water-repellent layer (r) side from the reflectance calculated by the two-degree field of view (C light source) of JIS Z8701. The reflectance after deducting the loss and the back surface reflection loss is 4.5% or less.
(2) The thickness of the laminated body is 500 μm or less.
[2] Further, the laminate according to [1], which satisfies the following requirement (3).
(3) The surface fluorine element ratio on the water-repellent layer (r) side is 30 atomic% or more.
[3] Further, the laminate according to [1] or [2], which satisfies at least one of the following requirements (4) and (5).
(4) The arithmetic mean height Sa on the water-repellent layer (r) side is 0.03 to 1.00 μm.
(5) The sliding angle of water on the water-repellent layer (r) side is 25 ° or less.
[4] The laminate according to any one of [1] to [3], wherein the surface Si ratio of the outermost layer on the intermediate layer (c) side of the base material (s) is 1 atomic% or more.
[5] The water-repellent layer (r) is a mixed composition (ca) of an organosilicon compound (A) represented by the following formula (a1) and an organosilicon compound (B) represented by the following formula (b1). The laminate according to any one of [1] to [4], which is the cured layer of the above.
Figure JPOXMLDOC01-appb-C000006
In the above formula (a1),
Rf a1 has a divalent perfluoropolyether structure in which both ends are oxygen atoms.
R 11, R 12, and R 13 are each independently an alkyl group having 1 to 20 carbon atoms, if R 11 there are a plurality may be different plural R 11 are each, R 12 is more if present may be different plurality of R 12 each may be the case where R 13 there are a plurality of different plural R 13 are each,
E 1 , E 2 , E 3 , E 4 , and E 5 are independently hydrogen or fluorine atoms, respectively.
If E 1 there are a plurality may be the different plurality of E 1, respectively, when the E 2 there are a plurality may be different plurality of E 2 are each of a plurality if E 3 there are multiple E 3 may have been different, or different plural E 4 each if E 4 there are a plurality, if E 5 there are a plurality may be different plurality of E 5, respectively,
G 1 and G 2 are 2- to 10-valent organosiloxane groups each independently having a siloxane bond.
J 1 , J 2 , and J 3 are independently hydrolyzable groups or-(CH 2 ) e6- Si (OR 14 ) 3 , e 6 is 1-5, and R 14 is a methyl group. or an ethyl group, if J 1 there are a plurality may be different plurality of J 1, respectively, when J 2 there are a plurality may be different plurality of J 2, respectively, J 3 is more Multiple J 3s may be different if they exist
L 1 and L 2 are divalent linking groups having 1 to 12 carbon atoms which may independently contain an oxygen atom, a nitrogen atom, or a fluorine atom, and when a plurality of L 1s are present, a plurality of L 1 and L 2 are divalent linking groups. It may be different for L 1, respectively, if L 2 there are a plurality may be different plurality of L 2, respectively,
d11 is 1-9,
d12 is 0-9,
a10 and a14 are 0 to 10 independently of each other.
a11 and a15 are independently 0 or 1, respectively.
a12 and a16 are 0 to 9 independently of each other.
a13 is 0 or 1,
a21, a22, and a23 are 0 to 2 independently of each other.
e1, e2, and e3 are 1 to 3 independently of each other.
Figure JPOXMLDOC01-appb-C000007
In the above formula (b1),
Rf b10 is an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are replaced with fluorine atoms.
R b11, R b12, R b13 and R b14 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R b11 there are a plurality differ plurality of R b11 each may, if R b12 there are a plurality may be different plural R b12 each may be the case where R b13 there are a plurality of different plural R b13 are each if R b14 there are multiple May have different R b14s,
Rf b11, Rf b12, Rf b13 and Rf b14 are each independently one or more hydrogen atoms is an alkyl group or a fluorine atom carbon number of 1 to 20 substituted by a fluorine atom, Rf b11 multiple presence If you may be different plurality of Rf b11, respectively, differ if the Rf b12 there are a plurality may be different plurality of Rf b12, respectively, a plurality of Rf b13 If Rf b13 is present in plural even if well, if Rf b14 there are a plurality may be different plurality of Rf b14, respectively,
R b15 is an alkyl group having 1 to 20 carbon atoms, it may be the case where R b15 there are a plurality of different plural R b15 are each,
A 1 is -O-, -C (= O) -O-, -OC (= O)-, -NR-, -NRC (= O)-, or -C (= O) NR-. There, wherein R is a hydrogen atom, a fluorine-containing alkyl group of the alkyl group having 1 to 4 carbon atoms having 1 to 4 carbon atoms, if a 1 there are a plurality may be different plurality of a 1, respectively,
A 2 is a hydrolyzable group, if A 2 there are a plurality may be different plurality of A 2, respectively,
b11, b12, b13, b14 and b15 are independently integers from 0 to 100, respectively.
c is an integer of 1 to 3 and
Rf b10 -, - Si (A 2) c (R b15) 3-c, b11 amino - {C (R b11) ( R b12)} -, b12 amino - {C (Rf b11) ( Rf b12) }-, B13-{Si (R b13 ) (R b14 )}-, b14-{Si (Rf b13 ) (Rf b14 )}-, b15 -A 1- are Rf b10- , Arranged in any order as long as -Si (A 2 ) c (R b15 ) 3-c is the terminal, does not form a perfluoropolyether structure, and -O- is not linked to -O- to -F. Join.
[6] The intermediate layer (c) is the cured layer of the mixed composition (cc) of the organosilicon compound (C) represented by any of the following formulas (c1) to (c3) or the organosilicon compound (C). ), Which is the laminated body according to any one of [1] to [5].
Figure JPOXMLDOC01-appb-C000008
In the above formula (c1),
R x11, R x12, R x13 , R x14 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R x11 there are a plurality differ plurality of R x11 are each may, if R x12 there are a plurality may be different plural R x12 are each may be the case where R x13 there are a plurality of different plural R x13 are each if R x14 there are multiple May have different R x14s,
Rf x11 , Rf x12 , Rf x13 , and Rf x14 are each independently an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf x11. If you may be different plurality of Rf x11 respectively, differ if the Rf x12 there are a plurality may be different plurality of Rf x12, respectively, a plurality of Rf x13 If Rf x13 is present in plural even if well, if Rf x14 there are a plurality may be different plurality of Rf x14, respectively,
R x15 is an alkyl group having 1 to 20 carbon atoms, it may be the case where R x15 there are a plurality of different plural R x15 are each,
X 11 is a hydrolysable group, if X 11 there are a plurality may be different plurality of X 11 are each,
Y 11 is, -NH-, or -S-. And, in the case where Y 11 there are a plurality may be different plurality of Y 11, respectively,
Z 11 is a vinyl group, an α-methylvinyl group, a styryl group, a methacryloyl group, an acryloyl group, an amino group, an isocyanate group, an isocyanurate group, an epoxy group, a ureido group, or a mercapto group.
p1 is an integer of 1 to 20, p2, p3, and p4 are independently integers of 0 to 10, and p5 is an integer of 1 to 10.
p6 is an integer of 1 to 3 and
If Z 11 is not an amino group, then at least one of Y 11 is -NH-, and if Y 11 is all -S-, then Z 11 is an amino group.
Z 11 -, - Si (X 11) p6 (R x15) 3-p6, p1 amino - {C (R x11) ( R x12)} -, p2 amino - {C (Rf x11) ( Rf x12) } -, p3 amino - {Si (R x13) ( R x14)} -, p4 amino - {Si (Rf x13) ( Rf x14)} -, p5 amino -Y 11 - is, Z 11 - and -Si (X 11 ) p6 (R x15 ) 3-p6 is the end, and unless -O- is connected to -O-, they are connected side by side in any order.
Figure JPOXMLDOC01-appb-C000009
In the above formula (c2),
R x20 and R x21 are each independently a hydrogen atom or an alkyl group of 1 to 4 carbon atoms, if R x20 there are a plurality may be different plural R x20 are each, R x21 is When there are a plurality of R x21s, the plurality of R x21s may be different from each other, and Rf x20 and Rf x21 are each independently an alkyl group having 1 to 20 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms. or a fluorine atom, if Rf x20 there are a plurality may be different from each plurality of Rf x20, when Rf x21 there are a plurality may be different plurality of Rf x21, respectively,
And each R x22 and R x23 is independently an alkyl group having 1 to 20 carbon atoms, may be the case where R x22 and R x23 there are a plurality of different plural R x22 and R x23 are each,
X 20 and X 21 are each independently a hydrolysable group, if X 20 and X 21 there are a plurality may be different plurality of X 20 and X 21 are each,
p20 is an integer of 1 to 30 independently, p21 is an integer of 0 to 30 independently, and at least one of the repeating units in parentheses with p20 or p21 is It has been replaced by an amine skeleton-NR 100 -where R 100 in the amine skeleton is a hydrogen atom or an alkyl group.
p22 and p23 are independently integers of 1 to 3, respectively.
The p20-{C (R x20 ) (R x21 )}-and the p21-{C (Rf x20 ) (Rf x21 )}-do not have to be continuous p20 or p21, and are arbitrary. They are joined side by side in order, and both ends are -Si (X 20 ) p22 (R x22) 3-p22 and -Si (X 21 ) p23 (R x23 ) 3-p23 .
Figure JPOXMLDOC01-appb-C000010
In the above formula (c3),
Z 31 and Z 32 are reactive functional groups other than the hydrolyzable group and the hydroxy group, respectively.
R x31, R x32, R x33 , R x34 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R x31 there are a plurality differ plurality of R x31 are each may, if R x32 there are a plurality may be different plural R x32 are each may be the case where R x33 there are a plurality of different plural R x33 are each if R x34 there are multiple May have different R x 34s,
Rf x31 , Rf x32 , Rf x33 , and Rf x34 are independently alkyl groups or fluorine atoms having 1 to 20 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf x31. If you may be different plurality of Rf x31 respectively, differ if the Rf x32 there are a plurality may be different plurality of Rf x32, respectively, a plurality of Rf x33 If Rf x33 is present in plural even if well, if Rf x34 there are a plurality may be different plurality of Rf x34, respectively,
Y 31 is, -NH -, - N (CH 3) - or -O-. And, in the case where the Y 31 there are a plurality may be different plurality of Y 31, respectively,
X 31 , X 32 , X 33 , and X 34 are independently -OR c (R c is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an amino C 1-3 alkyl di C 1-3 alkoxysilyl. a is a group), if X 31 there are a plurality may be different plurality of X 31 are each, if X 32 there are a plurality may be different plurality of X 32 are each, X 33 is If there are two or more may be different plurality of X 33 are each, if X 34 there are a plurality may be different plurality of X 34 are each,
p31 is an integer of 0 to 20, p32, p33, and p34 are independently integers of 0 to 10, p35 is an integer of 0 to 5, and p36 is an integer of 1 to 10. And p37 is 0 or 1
The condition that at least one of Z 31 and Z 32 is an amino group, or at least one of Y 31 is -NH- or -N (CH 3 )-is satisfied, and the ends are Z 31- and Z 32- And unless -O- is connected to -O-, p31- {C (R x31) (R x32 )}-, p32- {C (Rf x31) (Rf x32 )}-, p33 number of - {Si (R x33) ( R x34)} -, p34 amino - {Si (Rf x33) ( Rf x34)} -, p35 amino -Y 31 -, p36 amino - {Si (X 31 ) (X 32 ) -O}-, p37- {Si (X 33 ) (X 34 )}-are combined side by side in any order.
[7] A flexible display device including the laminate, polarizing plate, touch sensor, and display panel according to any one of [1] to [6].
 基材(s)、中間層(c)、及び撥水層(r)をこの順に備える本発明の積層体は、前記撥水層側表面で測定した入射角12°及び反射角12°における波長530nmの分光反射率をJIS Z8701の2度視野(C光源)により算出した反射率から表面反射損失及び裏面反射損失を差し引いた反射率が4.5%以下であるという要件を備えているため耐摩耗性に優れており、更に厚み500μm以下という要件も備えており、耐摩耗性と薄膜を両立できる。 The laminate of the present invention including the base material (s), the intermediate layer (c), and the water-repellent layer (r) in this order has wavelengths at an incident angle of 12 ° and a reflection angle of 12 ° measured on the surface of the water-repellent layer side. It has the requirement that the reflectance of 530 nm, which is obtained by subtracting the front surface reflectance loss and the back surface reflectance loss from the reflectance calculated by the JIS Z8701 2 degree field (C light source), is 4.5% or less. It has excellent wear resistance and also has a requirement of a thickness of 500 μm or less, so that both wear resistance and a thin film can be achieved at the same time.
 本発明の積層体は、基材(s)、中間層(c)、及び撥水層(r)をこの順に備える積層体であって、以下の(1)及び(2)の要件を満足する。
 (1)前記撥水層側表面で測定した入射角12°及び反射角12°における波長530nmの分光反射率をJIS Z8701の2度視野(C光源)により算出した反射率から表面反射損失及び裏面反射損失を差し引いた反射率が4.5%以下である。
 (2)前記積層体の厚みが500μm以下である。
The laminate of the present invention is a laminate having a base material (s), an intermediate layer (c), and a water-repellent layer (r) in this order, and satisfies the following requirements (1) and (2). ..
(1) Surface reflectance loss and back surface reflection loss and back surface from the reflectance calculated from the 2 degree field (C light source) of JIS Z8701 for the spectral reflectance at a wavelength of 530 nm at an incident angle of 12 ° and a reflection angle of 12 ° measured on the surface on the water-repellent layer side. The reflectance after deducting the reflection loss is 4.5% or less.
(2) The thickness of the laminated body is 500 μm or less.
 前記要件(1)を満足することで、良好な耐摩耗性を実現できる。要件(1)において、前記反射率は4.3%以下が好ましく、より好ましくは3.5%以下であり、更に好ましくは2.5%以下であり、また0.5%以上であってもよい。 By satisfying the above requirement (1), good wear resistance can be realized. In the requirement (1), the reflectance is preferably 4.3% or less, more preferably 3.5% or less, further preferably 2.5% or less, and even if it is 0.5% or more. good.
 要件(2)において、本発明の積層体の厚みは、好ましくは400μm以下であり、より好ましくは300μm以下であり、更に好ましくは200μm以下であり、100μm以下が最も好ましく、また10μm以上であってもよい。前記積層体の厚みを所定以下とすることで、本発明の積層体をタッチパネル用途に用いる際に感度が向上し、また視認性が向上する。 In the requirement (2), the thickness of the laminate of the present invention is preferably 400 μm or less, more preferably 300 μm or less, further preferably 200 μm or less, most preferably 100 μm or less, and 10 μm or more. May be good. By setting the thickness of the laminated body to a predetermined value or less, the sensitivity is improved and the visibility is improved when the laminated body of the present invention is used for a touch panel application.
 また、本発明の積層体は、前記要件(1)及び(2)を満足すると共に、更に下記(3)~(5)の要件を少なくとも1つ満足することが好ましい。特に、前記要件(1)及び(2)を満足すると共に下記(3)の要件を満足することがより好ましく、要件(1)~(5)を全て満足することが更に好ましい。 Further, it is preferable that the laminate of the present invention satisfies the above requirements (1) and (2) and further satisfies at least one of the following requirements (3) to (5). In particular, it is more preferable to satisfy the requirements (1) and (2) and the following requirements (3), and it is further preferable to satisfy all the requirements (1) to (5).
 (3)前記撥水層(r)側の表面フッ素元素比が30原子%以上である。
 前記(3)の要件を備えることで、より良好な撥水性を実現できる。前記表面フッ素元素比は、40原子%以上がより好ましく、更に好ましくは50原子%以上である。前記表面フッ素元素比の上限は特に限定されないが、例えば80原子%である。前記表面フッ素元素比は後述の実施例に記載の方法により測定することができる。
(3) The surface fluorine element ratio on the water-repellent layer (r) side is 30 atomic% or more.
By satisfying the requirement (3) above, better water repellency can be realized. The surface fluorine element ratio is more preferably 40 atomic% or more, still more preferably 50 atomic% or more. The upper limit of the surface fluorine element ratio is not particularly limited, but is, for example, 80 atomic%. The surface fluorine element ratio can be measured by the method described in Examples described later.
 (4)前記撥水層(r)側の算術平均高さSaが0.03~1.00μmである。
 前記(4)の要件を備えることで、耐摩耗性をより向上できる。また前記(4)の要件は、より良好な撥水性及び/又は滑落性の実現にも有効である。前記撥水層(r)側の表面高さSaは、より好ましくは0.70μm以下であり、更に好ましくは0.50μm以下であり、一層好ましくは0.30μm以下である。また、前記表面高さSaは、0.04μm以上であってもよいし、0.05μm以上であってもよい。なお、算術平均高さSaは、ISO 25178に準拠して算出される。
(4) The arithmetic mean height Sa on the water-repellent layer (r) side is 0.03 to 1.00 μm.
By providing the requirement (4) above, the wear resistance can be further improved. The requirement (4) is also effective in achieving better water repellency and / or slipperiness. The surface height Sa on the water-repellent layer (r) side is more preferably 0.70 μm or less, further preferably 0.50 μm or less, and even more preferably 0.30 μm or less. Further, the surface height Sa may be 0.04 μm or more, or may be 0.05 μm or more. The arithmetic mean height Sa is calculated in accordance with ISO 25178.
 (5)前記撥水層(r)側の水の滑落角が25°以下である。
 前記(5)の要件において、水の滑落角は、20°以下がより好ましく、更に好ましくは15°以下であり、一層好ましくは10°以下である。水の前記滑落角の下限は特に限定されないが、例えば1°である。
(5) The sliding angle of water on the water-repellent layer (r) side is 25 ° or less.
In the requirement (5), the sliding angle of water is more preferably 20 ° or less, further preferably 15 ° or less, and even more preferably 10 ° or less. The lower limit of the sliding angle of water is not particularly limited, but is, for example, 1 °.
 前記撥水層(r)は、有機ケイ素化合物(A)と有機ケイ素化合物(B)の混合組成物(ca)の硬化層であることが好ましい。 The water-repellent layer (r) is preferably a cured layer of a mixed composition (ca) of the organosilicon compound (A) and the organosilicon compound (B).
 I.有機ケイ素化合物(A)
 前記有機ケイ素化合物(A)は、パーフルオロポリエーテル構造を有する1価の基がケイ素原子に結合すると共に、該ケイ素原子に連結基を介して又は連結基を介さずに加水分解性基が結合している化合物である。前記撥水層(r)は前記組成物(ca)を塗布して硬化させることにより得られることが好ましく、前記有機ケイ素化合物(A)由来の構造を有している。上述の通り、上記有機ケイ素化合物(A)はケイ素原子に結合した(連結基を介して結合していてもよい)加水分解性基を有しており、加水分解で生じた有機ケイ素化合物(A)の-SiOH基(SiとOHが連結基を介して結合していてもよい)同士が脱水縮合するため、撥水層(r)は、通常有機ケイ素化合物(A)由来の縮合構造を有する。前記加水分解性基としては、アルコキシ基、ハロゲン原子、シアノ基、アセトキシ基、イソシアネート基等が挙げられる。
I. Organosilicon compound (A)
In the organosilicon compound (A), a monovalent group having a perfluoropolyether structure is bonded to a silicon atom, and a hydrolyzable group is bonded to the silicon atom via a linking group or not via a linking group. It is a compound that is used. The water-repellent layer (r) is preferably obtained by applying the composition (ca) and curing it, and has a structure derived from the organosilicon compound (A). As described above, the organosilicon compound (A) has a hydrolyzable group bonded to a silicon atom (may be bonded via a linking group), and the organosilicon compound (A) produced by hydrolysis is produced. ) -SiOH groups (Si and OH may be bonded via a linking group) are dehydrated and condensed, so that the water-repellent layer (r) usually has a condensed structure derived from the organosilicon compound (A). .. Examples of the hydrolyzable group include an alkoxy group, a halogen atom, a cyano group, an acetoxy group, an isocyanate group and the like.
 前記パーフルオロポリエーテル構造は、パーフルオロオキシアルキレン基ともいうことができる。パーフルオロポリエーテル構造は、撥水性又は撥油性などの撥液性を有する。パーフルオロポリエーテル構造の最も長い直鎖部分に含まれる炭素数は、例えば5以上であることが好ましく、10以上がより好ましく、更により好ましくは20以上である。前記炭素数の上限は特に限定されず、例えば200程度であってもよい。前記有機ケイ素化合物(A)のパーフルオロポリエーテル構造を有する1価の基は、更に自由末端にパーフルオロアルキル基を有することが好ましい。 The perfluoropolyether structure can also be referred to as a perfluorooxyalkylene group. The perfluoropolyether structure has liquid repellency such as water repellency or oil repellency. The number of carbon atoms contained in the longest linear portion of the perfluoropolyether structure is, for example, preferably 5 or more, more preferably 10 or more, and even more preferably 20 or more. The upper limit of the number of carbon atoms is not particularly limited, and may be, for example, about 200. The monovalent group having a perfluoropolyether structure of the organosilicon compound (A) preferably further has a perfluoroalkyl group at the free end.
 前記撥水層(r)は、パーフルオロポリエーテル構造とポリシロキサン骨格を有する層として示すこともでき、好ましくは、パーフルオロアルキル基を更に有する。前記撥水層(r)は、ポリシロキサン骨格の一部のケイ素原子に、自由末端がパーフルオロアルキル基であり、パーフルオロポリエーテル構造を有する1価の基が結合した構造を有していることが好ましい。パーフルオロアルキル基は自由末端側に存在することで、撥水性が向上する。 The water-repellent layer (r) can also be shown as a layer having a perfluoropolyether structure and a polysiloxane skeleton, and preferably further has a perfluoroalkyl group. The water-repellent layer (r) has a structure in which a monovalent group having a perfluoroalkyl structure and a perfluoroalkyl group at the free end is bonded to a part of the silicon atom of the polysiloxane skeleton. Is preferable. The presence of the perfluoroalkyl group on the free end side improves water repellency.
 パーフルオロアルキル基の炭素数(特に最も長い直鎖部分の炭素数)は、例えば3以上であることが好ましく、5以上がより好ましく、より好ましくは7以上である。なお前記炭素数の上限は特に限定されず、例えば20程度であっても優れた撥水特性を示す。 The carbon number of the perfluoroalkyl group (particularly the carbon number of the longest straight chain portion) is preferably, for example, 3 or more, more preferably 5 or more, and even more preferably 7 or more. The upper limit of the number of carbon atoms is not particularly limited, and even if it is, for example, about 20, it exhibits excellent water repellency.
 前記パーフルオロアルキル基は、炭化水素基及び/又は炭化水素基の少なくとも一部の水素原子がフッ素原子に置換した基と結合してフルオロアルキル基などの含フッ素基を形成していてもよく、例えば、CF3(CF2m-(CH2n-、CF3(CF2m-C64-(mはいずれも1~10であり、好ましくは3~7であり、nはいずれも1~5であり、好ましくは2~4である)が挙げられ、CF3(CF2m-(CH2n-(mはいずれも1~10であり、好ましくは3~7であり、nはいずれも1~5であり、好ましくは2~4である)が好ましい。前記パーフルオロアルキル基は、直接パーフルオロポリエーテル構造に結合していることがより好ましい。 The perfluoroalkyl group may form a fluorine-containing group such as a fluoroalkyl group by bonding with a group in which at least a part of the hydrogen atom of the hydrocarbon group and / or the hydrocarbon group is substituted with a fluorine atom. For example, CF 3 (CF 2) m - (CH 2) n -, CF 3 (CF 2) m -C 6 H 4 - (m is 1 to 10 both, are preferably the 3 ~ 7, n Is 1 to 5, preferably 2 to 4), and CF 3 (CF 2 ) m- (CH 2 ) n- (m is 1 to 10, preferably 3 to 4). 7 and n are all 1 to 5, preferably 2 to 4). It is more preferable that the perfluoroalkyl group is directly bonded to the perfluoropolyether structure.
 前記有機ケイ素化合物(A)では、パーフルオロポリエーテル構造を有する1価の基とケイ素原子は、適当な連結基を介して結合していてもよく、当該連結基なしで上記パーフルオロポリエーテルを有する1価の基が直接ケイ素原子に結合してもよい。連結基としては、例えば、アルキレン基、芳香族炭化水素基などの炭化水素基、(ポリ)アルキレングリコール基、又はこれらの水素原子の一部がフッ素原子又は置換基に置換された基、及びこれらが適当に連結した基などが挙げられる。連結基の炭素数は、例えば1以上、20以下であり、好ましくは2以上、15以下である。 In the organosilicon compound (A), a monovalent group having a perfluoropolyether structure and a silicon atom may be bonded via an appropriate linking group, and the perfluoropolyether may be bonded without the linking group. The monovalent group having may be directly bonded to the silicon atom. Examples of the linking group include a hydrocarbon group such as an alkylene group and an aromatic hydrocarbon group, a (poly) alkylene glycol group, a group in which a part of these hydrogen atoms is substituted with a fluorine atom or a substituent, and these. Examples thereof include groups in which are appropriately linked. The carbon number of the linking group is, for example, 1 or more and 20 or less, preferably 2 or more and 15 or less.
 前記加水分解性基は、加水分解・脱水縮合反応を通じて、有機ケイ素化合物(A)同士を、又は有機ケイ素化合物(A)と基材表面の活性水素(水酸基など)とを結合する作用を有する。こうした加水分解性基としては、例えばアルコキシ基(特に炭素数1~4のアルコキシ基)、ヒドロキシ基、アセトキシ基、ハロゲン原子(特に塩素原子)などが挙げられる。好ましい加水分解性基は、アルコキシ基及びハロゲン原子であり、特にメトキシ基、エトキシ基、塩素原子が好ましい。 The hydrolyzable group has an action of binding the organosilicon compounds (A) to each other or the organosilicon compound (A) and active hydrogen (hydroxyl group or the like) on the surface of the base material through a hydrolysis / dehydration condensation reaction. Examples of such a hydrolyzable group include an alkoxy group (particularly an alkoxy group having 1 to 4 carbon atoms), a hydroxy group, an acetoxy group, and a halogen atom (particularly a chlorine atom). Preferred hydrolyzable groups are an alkoxy group and a halogen atom, and a methoxy group, an ethoxy group and a chlorine atom are particularly preferable.
 前記加水分解性基は連結基を介してケイ素原子に結合していてもよいし、連結基を介さずに直接ケイ素原子に結合していてもよい。ケイ素原子に結合する加水分解性基の数は、1つ以上であればよく、2又は3であってもよいが、2又は3であるのが好ましく、3であるのが特に好ましい。2つ以上の加水分解性基がケイ素原子に結合している場合、異なる加水分解性基がケイ素原子に結合していてもよいが、同じ加水分解性基がケイ素原子に結合しているのが好ましい。ケイ素原子に結合する含フッ素基と加水分解性基との合計数は、通常4であるが、2又は3(特に3)であってもよい。3以下の場合、残りの結合手には、加水分解性基以外の1価の基が結合していてもよく、例えば、アルキル基(特に炭素数が1~4のアルキル基)、H、NCOなどが結合できる。 The hydrolyzable group may be bonded to a silicon atom via a linking group, or may be directly bonded to a silicon atom without a linking group. The number of hydrolyzable groups bonded to the silicon atom may be one or more and may be 2 or 3, but is preferably 2 or 3, and particularly preferably 3. When two or more hydrolyzable groups are bonded to a silicon atom, different hydrolyzable groups may be bonded to the silicon atom, but the same hydrolyzable group is bonded to the silicon atom. preferable. The total number of fluorine-containing groups and hydrolyzable groups bonded to the silicon atom is usually 4, but may be 2 or 3 (particularly 3). In the case of 3 or less, a monovalent group other than the hydrolyzable group may be bonded to the remaining bond, for example, an alkyl group (particularly an alkyl group having 1 to 4 carbon atoms), H, NCO. Etc. can be combined.
 前記有機ケイ素化合物(A)のパーフルオロポリエーテル構造を有する1価の基は、直鎖状であっても良いし、側鎖を有していてもよく、直鎖状であることが好ましい。 The monovalent group having a perfluoropolyether structure of the organosilicon compound (A) may be linear or may have a side chain, and is preferably linear.
 前記有機ケイ素化合物(A)は、例えば下記式(a)で表すことができる。 The organosilicon compound (A) can be represented by, for example, the following formula (a).
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 上記式(a)中、D1はパーフルオロポリエーテル構造を有する1価の基であり、D1におけるD2と結合する側の末端は-CF2-O-*、-CFD9-*であり(*はD2側の結合手)、D2は単結合又はフッ素原子に置換されていない2価の炭化水素基であり、D3はフッ素原子に置換されていない3価の炭化水素基であり、該炭化水素基のメチレン基の一部が酸素原子に置き換わっていてもよく、D4は水素原子又はフッ素原子であり、D5は単結合又は2価の炭化水素基であり、D6は加水分解性基以外の1価の基であり、D7は2価の基又は単結合であり、D8は加水分解性基であり、D9は水素原子、フッ素原子、又は炭化水素基であり、n1は1~30であり、n2は1~3である。D8の加水分解性基としては上述のものが挙げられる。 In the above formula (a), D 1 represents a monovalent group having a perfluoropolyether structure, the ends of the side that bind to D 2 in D 1 is -CF 2 -O - *, - CFD 9 - * at Yes (* is the bond on the D 2 side), D 2 is a single bond or a divalent hydrocarbon group not substituted with a fluorine atom, and D 3 is a trivalent hydrocarbon group not substituted with a fluorine atom. A part of the methylene group of the hydrocarbon group may be replaced with an oxygen atom, D 4 is a hydrogen atom or a fluorine atom, D 5 is a single bond or a divalent hydrocarbon group, and D 6 is a monovalent group other than a hydrolyzable group, D 7 is a divalent group or a single bond, D 8 is a hydrolyzable group, and D 9 is a hydrogen atom, a fluorine atom, or a hydrocarbon. It is a group, n1 is 1 to 30, and n2 is 1 to 3. Examples of the hydrolyzable group of D 8 include those mentioned above.
 前記有機ケイ素化合物(A)は、下記式(a1)で表されることが好ましい。 The organosilicon compound (A) is preferably represented by the following formula (a1).
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 上記式(a1)中、
 Rfa1は、両端が酸素原子である2価のパーフルオロポリエーテル構造であり、
 R11、R12、及びR13は、それぞれ独立して(すなわち、R11とR12とR13は同一であってもよいし、互いに異なっていてもよく)炭素数1~20のアルキル基であり、R11が複数存在する場合は複数のR11がそれぞれ異なっていてもよく、R12が複数存在する場合は複数のR12がそれぞれ異なっていてもよく、R13が複数存在する場合は複数のR13がそれぞれ異なっていてもよく、
 E1、E2、E3、E4、及びE5は、それぞれ独立して水素原子又はフッ素原子であり、E1が複数存在する場合は複数のE1がそれぞれ異なっていてもよく、E2が複数存在する場合は複数のE2がそれぞれ異なっていてもよく、E3が複数存在する場合は複数のE3がそれぞれ異なっていてもよく、E4が複数存在する場合は複数のE4がそれぞれ異なっていてもよく、E5が複数存在する場合は複数のE5がそれぞれ異なっていてもよく、
 G1及びG2は、それぞれ独立して、シロキサン結合を有する2~10価のオルガノシロキサン基であり、
 J1、J2、及びJ3は、それぞれ独立して、加水分解性基又は-(CH2e6-Si(OR143であり、e6は1~5であり、R14はメチル基又はエチル基であり、J1が複数存在する場合は複数のJ1がそれぞれ異なっていてもよく、J2が複数存在する場合は複数のJ2がそれぞれ異なっていてもよく、J3が複数存在する場合は複数のJ3がそれぞれ異なっていてもよく、
 L1及びL2は、それぞれ独立して、酸素原子、窒素原子、又はフッ素原子を含んでいてもよい炭素数1~12の2価の連結基であり、L1が複数存在する場合は複数のL1がそれぞれ異なっていてもよく、L2が複数存在する場合は複数のL2がそれぞれ異なっていてもよく、
 d11は、1~9であり、
 d12は、0~9であり、
 a10及びa14は、それぞれ独立して0~10であり、
 a11及びa15は、それぞれ独立して0又は1であり、
 a12及びa16は、それぞれ独立して0~9であり、
 a13は、0又は1であり、
 a21、a22、及びa23は、それぞれ独立して0~2であり、
 e1、e2、及びe3は、それぞれ独立して1~3である。
In the above formula (a1),
Rf a1 has a divalent perfluoropolyether structure in which both ends are oxygen atoms.
R 11 , R 12 , and R 13 are independent alkyl groups having 1 to 20 carbon atoms (that is, R 11 and R 12 and R 13 may be the same or different from each other). , and the case where R 11 there are a plurality may be different plurality of R 11 each may be the case where R 12 there are a plurality of different plural R 12 are each, if R 13 there are a plurality of May have different R 13s,
E 1, E 2, E 3 , E 4, and E 5 is, independently represents a hydrogen atom or a fluorine atom, if E 1 there are a plurality may be different plurality of E 1, respectively, E 2 may be the case where there are plural different multiple E 2 respectively, when the E 3 there are a plurality may be different plurality of E 3 respectively, the plurality of E if E 4 there are a plurality of 4 may be different from each, if E 5 there are a plurality may be different plurality of E 5, respectively,
G 1 and G 2 are 2- to 10-valent organosiloxane groups each independently having a siloxane bond.
J 1 , J 2 , and J 3 are independently hydrolyzable groups or-(CH 2 ) e6- Si (OR 14 ) 3 , e 6 is 1-5, and R 14 is a methyl group. or an ethyl group, if J 1 there are a plurality may be different plurality of J 1, respectively, when J 2 there are a plurality may be different plurality of J 2, respectively, J 3 is more Multiple J 3s may be different if they exist
L 1 and L 2 are divalent linking groups having 1 to 12 carbon atoms which may independently contain an oxygen atom, a nitrogen atom, or a fluorine atom, and when a plurality of L 1s are present, a plurality of L 1 and L 2 are divalent linking groups. It may be different for L 1, respectively, if L 2 there are a plurality may be different plurality of L 2, respectively,
d11 is 1-9,
d12 is 0-9,
a10 and a14 are 0 to 10 independently of each other.
a11 and a15 are independently 0 or 1, respectively.
a12 and a16 are 0 to 9 independently of each other.
a13 is 0 or 1,
a21, a22, and a23 are 0 to 2 independently of each other.
e1, e2, and e3 are 1 to 3 independently of each other.
 前記有機ケイ素化合物(A)は、上記式(a1)で表される通り、Rfa1で表されるパーフルオロポリエーテル構造を有するとともに、J2で表される加水分解性基又は-(CH2e6-Si(OR143(但し、R14はメチル基又はエチル基)を少なくとも1つ有している。パーフルオロポリエーテル構造は、ポリオキシアルキレン基の全部の水素原子がフッ素原子に置き換わった構造であり、パーフルオロオキシアルキレン基ともいえ、得られる皮膜に撥水性を付与できる。また、J2によって、前記有機ケイ素化合物(A)同士、又は他の単量体と共に重合反応(特に重縮合反応)を通じて結合することによって、得られる皮膜のマトリックスとなり得る化合物である。 As represented by the above formula (a1), the organosilicon compound (A) has a perfluoropolyether structure represented by Rf a1 and a hydrolyzable group represented by J 2 or-(CH 2). ) E6- Si (OR 14 ) 3 (where R 14 has a methyl group or an ethyl group). The perfluoropolyether structure is a structure in which all hydrogen atoms of the polyoxyalkylene group are replaced with fluorine atoms, and can be said to be a perfluorooxyalkylene group, which can impart water repellency to the obtained film. Further, it is a compound that can be a matrix of a film obtained by bonding the organosilicon compounds (A) with each other or with other monomers through a polymerization reaction (particularly a polycondensation reaction) by J 2.
 Rfa1は、-O-(CF2CF2O)e4-、又は-O-(CF2CF2CF2O)e5-が好ましい。e4、e5は、いずれも15~80である。 Rf a1 is preferably -O- (CF 2 CF 2 O) e4- or -O- (CF 2 CF 2 CF 2 O) e5- . Both e4 and e5 are 15 to 80.
 R11、R12、及びR13は、それぞれ独立して、炭素数1~10のアルキル基が好ましい。 R 11 , R 12 , and R 13 are each independently preferably an alkyl group having 1 to 10 carbon atoms.
 L1及びL2は、それぞれ独立して、フッ素原子を含んだ炭素数1~5の2価の連結基が好ましい。 L 1 and L 2 are each independently preferably a divalent linking group having 1 to 5 carbon atoms containing a fluorine atom.
 G1及びG2は、それぞれ独立して、シロキサン結合を有する2~5価のオルガノシロキサン基が好ましい。 G 1 and G 2 are preferably divalent to pentavalent organosiloxane groups having a siloxane bond, respectively.
 J1、J2、及びJ3は、それぞれ独立して、メトキシ基、エトキシ基又は-(CH2e6-Si(OR143が好ましい。 J 1 , J 2 , and J 3 are each independently preferably a methoxy group, an ethoxy group, or-(CH 2 ) e6- Si (OR 14 ) 3 .
 a10は0~5が好ましく(より好ましくは0~3)、a11は0が好ましく、a12は0~7が好ましく(より好ましくは0~5)、a14は1~6が好ましく(より好ましくは1~3)、a15は0が好ましく、a16は0~6が好ましく、a21~a23はいずれも0又は1が好ましく(より好ましくはいずれも0)、d11は1~5が好ましく(より好ましくは1~3)、d12は0~3が好ましく(より好ましくは0又は1)、e1~e3はいずれも3が好ましい。また、a13は1が好ましい。 a10 is preferably 0 to 5 (more preferably 0 to 3), a11 is preferably 0, a12 is preferably 0 to 7 (more preferably 0 to 5), and a14 is preferably 1 to 6 (more preferably 1). ~ 3), a15 is preferably 0, a16 is preferably 0 to 6, a21 to a23 are all preferably 0 or 1 (more preferably all 0), and d11 is preferably 1 to 5 (more preferably 1). ~ 3), d12 is preferably 0 to 3 (more preferably 0 or 1), and e1 to e3 are all preferably 3. Further, a13 is preferably 1.
 前記有機ケイ素化合物(A)としては、上記式(a1)のRfa1が-O-(CF2CF2CF2O)e5-であり、e5が35~50であり、L1及びL2がいずれも炭素数1~3のパーフルオロアルキレン基であり、E1、E2、及びE3がいずれも水素原子であり、E4、及びE5が水素原子又はフッ素原子であり、J1、J2、及びJ3がいずれもメトキシ基又はエトキシ基(特にメトキシ基)であり、a10が1~3であり、a11が0であり、a12が0~5であり、a13が1であり、a14が2~5であり、a15が0であり、a16が0~6であり、a21~a23が、それぞれ独立して、0又は1であり(より好ましくはa21~a23が全て0)、d11が1であり、d12が0又は1であり、e1~e3がいずれも3である化合物を用いることが好ましい。 As the organic silicon compound (A), Rf a1 of the above formula (a1) is -O- (CF 2 CF 2 CF 2 O) e5- , e5 is 35 to 50, and L 1 and L 2 are. All are perfluoroalkylene groups having 1 to 3 carbon atoms, E 1 , E 2 , and E 3 are all hydrogen atoms, E 4 and E 5 are hydrogen atoms or fluorine atoms, and J 1 , J 2 and J 3 are both methoxy groups or ethoxy groups (particularly methoxy groups), a10 is 1 to 3, a11 is 0, a12 is 0 to 5, and a13 is 1. a14 is 2 to 5, a15 is 0, a16 is 0 to 6, a21 to a23 are independently 0 or 1 (more preferably, a21 to a23 are all 0), and d11. It is preferable to use a compound in which 1 is 1, d12 is 0 or 1, and e1 to e3 are all 3.
 前記有機ケイ素化合物(A)としては、上記式(a1)のRfa1が-O-(CF2CF2CF2O)e5-であり、e5が25~40であり、L1がフッ素原子及び酸素原子を含む炭素数3~6の2価の連結基であり、L2が炭素数1~3のパーフルオロアルキレン基であり、E2、E3がいずれも水素原子であり、E5がフッ素原子であり、J2が-(CH2e6-Si(OCH33であり、e6が2~4であり、a10が1~3であり、a11が0であり、a12が0であり、a13が0であり、a14が2~5であり、a15が0であり、a16が0であり、a21~a23が、それぞれ独立して、0又は1であり(より好ましくはa21~a23が全て0)、d11が1であり、d12が0であり、e2が3である化合物を用いることも好ましい。 As the organic silicon compound (A), Rf a1 of the above formula (a1) is −O− (CF 2 CF 2 CF 2 O) e5- , e5 is 25 to 40, L 1 is a fluorine atom and It is a divalent linking group having 3 to 6 carbon atoms containing an oxygen atom, L 2 is a perfluoroalkylene group having 1 to 3 carbon atoms, E 2 and E 3 are both hydrogen atoms, and E 5 is a hydrogen atom. It is a fluorine atom, J 2 is-(CH 2 ) e6- Si (OCH 3 ) 3 , e6 is 2 to 4, a10 is 1 to 3, a11 is 0, and a12 is 0. Yes, a13 is 0, a14 is 2-5, a15 is 0, a16 is 0, and a21-a23 are independently 0 or 1 (more preferably a21-a23). Is all 0), d11 is 1, d12 is 0, and e2 is 3. It is also preferable to use a compound.
 また、前記有機ケイ素化合物(A)は、下記式(a2-1)で表される化合物であることも好ましい。 Further, it is also preferable that the organosilicon compound (A) is a compound represented by the following formula (a2-1).
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 上記式(a2-1)中、
 Rfa21は、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、
 Rfa22、Rfa23、Rfa24、及びRfa25は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfa22が複数存在する場合は複数のRfa22がそれぞれ異なっていてもよく、Rfa23が複数存在する場合は複数のRfa23がそれぞれ異なっていてもよく、Rfa24が複数存在する場合は複数のRfa24がそれぞれ異なっていてもよく、Rfa25が複数存在する場合は複数のRfa25がそれぞれ異なっていてもよく、
 R20、R21、R22、及びR23は、それぞれ独立して、水素原子又は炭素数1~4のアルキル基であり、R20が複数存在する場合は複数のR20がそれぞれ異なっていてもよく、R21が複数存在する場合は複数のR21がそれぞれ異なっていてもよく、R22が複数存在する場合は複数のR22がそれぞれ異なっていてもよく、R23が複数存在する場合は複数のR23がそれぞれ異なっていてもよく、
 R24は、炭素数1~20のアルキル基であり、R24が複数存在する場合は複数のR24がそれぞれ異なっていてもよく、
 M1は、水素原子又は炭素数1~4のアルキル基であり、M1が複数存在する場合は複数のM1がそれぞれ異なっていてもよく、
 M2は、水素原子又はハロゲン原子であり、
 M3は、-O-、-C(=O)-O-、-O-C(=O)-、-NR-、-NRC(=O)-、又は-C(=O)NR-(Rは水素原子、炭素数1~4のアルキル基又は炭素数1~4の含フッ素アルキル基)であり、M3が複数存在する場合は複数のM3がそれぞれ異なっていてもよく、
 M4は、加水分解性基であり、M4が複数存在する場合は複数のM4がそれぞれ異なっていてもよく、
 f11、f12、f13、f14、及びf15はそれぞれ独立して0~600の整数であり、f11、f12、f13、f14、及びf15の合計値は13以上であり、
 f16は、1~20の整数であり、
 f17は、0~2の整数であり、
 g1は、1~3の整数であり、
 Rfa21-、M2-、f11個の-{C(R20)(R21)}-、f12個の-{C(Rfa22)(Rfa23)}-、f13個の-{Si(R22)(R23)}-、f14個の-{Si(Rfa24)(Rfa25)}-、f15個の-M3-、及びf16個の-[CH2C(M1
{(CH2f17-Si(M4g1(R243-g1}]-は、Rfa21-、M2-が末端となり、少なくとも一部でパーフルオロポリエーテル構造を形成する順で並び、かつ-O-が-O-乃至-Fと連結しない限り、任意の順で並んで結合する。すなわち、式(a2-1)は、必ずしもf11個の-{C(R20)(R21)}-が連続し、f12個の-{C(Rfa22)(Rfa23)}-が連続し、f13個の-{Si(R22)(R23)}-が連続し、f14個の-{Si(Rfa24)(Rfa25)}-が連続し、f15個の-M3-が連続し、f16個の-[CH2C(M1){(CH2f17-Si(M4g1(R243-g1}]-が連続して、この順で並ぶという意味ではなく、-C(R20)(R21)-Si(Rfa24)(Rfa25)-CH2C(M1){(CH2f17-Si(M4g1(R243-g1}-C(Rfa22)(Rfa23)-M3-Si(R22)(R23)-C(Rfa22)(Rfa23)-などのように、それぞれが任意の順番で並ぶことが可能である。
In the above formula (a2-1),
Rf a21 is an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are replaced with fluorine atoms.
Rf a22 , Rf a23 , Rf a24 , and Rf a25 are independently alkyl groups or fluorine atoms having 1 to 20 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf a22. if present may be different plurality of Rf a22 respectively, if Rf a23 there are a plurality may be different plurality of Rf a23, respectively, a plurality of Rf a24 If Rf a24 are present in plural It may be different, if Rf a25 there are a plurality may be different plurality of Rf a25 respectively,
R 20, R 21, R 22, and R 23 are each independently hydrogen atom or an alkyl group having 1 to 4 carbon atoms, if R 20 there are a plurality differ plurality of R 20 each may, if R 21 there are a plurality may be different plurality of R 21 each may be the case where R 22 there are a plurality of different plural R 22 are each, if R 23 there are a plurality of It may be a different multiple of R 23, respectively,
R 24 is an alkyl group having 1 to 20 carbon atoms, it may be the case where R 24 there are a plurality of different plural R 24 are each,
M 1 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, if M 1 there are a plurality may be different plurality of M 1, respectively,
M 2 is a hydrogen atom or a halogen atom,
M 3 is -O-, -C (= O) -O-, -OC (= O)-, -NR-, -NRC (= O)-, or -C (= O) NR-( R is a hydrogen atom, a fluorine-containing alkyl group) an alkyl group having 1 to 4 carbon atoms having 1 to 4 carbon atoms, if M 3 there are a plurality may be different plurality of M 3, respectively,
M 4 is a hydrolysable group, if M 4 there are a plurality may be different plurality of M 4, respectively,
f11, f12, f13, f14, and f15 are independently integers from 0 to 600, and the total value of f11, f12, f13, f14, and f15 is 13 or more.
f16 is an integer from 1 to 20 and
f17 is an integer of 0 to 2 and
g1 is an integer of 1 to 3 and
Rf a21- , M 2- , f11-{C (R 20 ) (R 21 )}-, f12- {C (Rf a22 ) (Rf a23 )}-, f13-{Si (R) 22 ) (R 23 )}-, f14-{Si (Rf a24 ) (Rf a25 )}-, f15 -M 3- , and f16- [CH 2 C (M 1 )
{(CH 2 ) f17-Si (M 4 ) g1 (R 24 ) 3-g1 }]- ends at Rf a21- and M 2- , in the order of forming a perfluoropolyether structure at least in part. As long as they are lined up and -O- is not connected to -O- to -F, they are joined side by side in any order. That is, in the equation (a2-1), f11-{C (R 20 ) (R 21 )}-are necessarily continuous, and f12-{C (Rf a22 ) (Rf a23 )}-are continuous. , F13-{Si (R 22 ) (R 23 )}-are continuous, f14-{Si (Rf a24 ) (Rf a25 )}-are continuous, and f15 -M 3- are continuous. However, it does not mean that f16- [CH 2 C (M 1 ) {(CH 2 ) f17-Si (M 4 ) g1 (R 24 ) 3-g1 }]-are arranged in this order in succession. , -C (R 20 ) (R 21 ) -Si (Rf a24 ) (Rf a25 ) -CH 2 C (M 1 ) {(CH 2 ) f17-Si (M 4 ) g1 (R 24 ) 3-g1 } -C (Rf a22 ) (Rf a23 ) -M 3- Si (R 22 ) (R 23 ) -C (Rf a22 ) (Rf a23 ) -and so on, each can be arranged in any order. be.
 Rfa21は、好ましくは1個以上のフッ素原子で置換された炭素数1~10のアルキル基であり、より好ましくは炭素数1~10のパーフルオロアルキル基であり、さらに好ましくは炭素数1~5のパーフルオロアルキル基である。 Rf a21 is preferably an alkyl group having 1 to 10 carbon atoms substituted with one or more fluorine atoms, more preferably a perfluoroalkyl group having 1 to 10 carbon atoms, and further preferably 1 to 10 carbon atoms. It is a perfluoroalkyl group of 5.
 Rfa22、Rfa23、Rfa24、及びRfa25は、好ましくはそれぞれ独立して、フッ素原子、又は1個以上の水素原子がフッ素原子に置換された炭素数1~2のアルキル基であり、より好ましくはすべてフッ素原子である。 Rf a22 , Rf a23 , Rf a24 , and Rf a25 are preferably independently each of a fluorine atom or an alkyl group having 1 to 2 carbon atoms in which one or more hydrogen atoms are substituted with a fluorine atom. Preferably all are fluorine atoms.
 R20、R21、R22、及びR23は、好ましくはそれぞれ独立して、水素原子、又は炭素数1~2のアルキル基であり、より好ましくはすべて水素原子である。 R 20 , R 21 , R 22 and R 23 are preferably independent hydrogen atoms or alkyl groups having 1 to 2 carbon atoms, and more preferably all hydrogen atoms.
 R24は、炭素数1~5のアルキル基が好ましい。 R 24 is preferably an alkyl group having 1 to 5 carbon atoms.
 M1は、好ましくはそれぞれ独立して、水素原子又は炭素数1~2のアルキル基であり、より好ましくはすべて水素原子である。 M 1 is preferably a hydrogen atom or an alkyl group having 1 to 2 carbon atoms independently of each other, and more preferably all hydrogen atoms.
 M2は、好ましくは水素原子である。 M 2 is preferably a hydrogen atom.
 M3は、好ましくは、-C(=O)-O-、-O-、-O-C(=O)-であり、より好ましくはすべて-O-である。 M 3 is preferably -C (= O) -O-, -O-, -OC (= O)-, and more preferably all -O-.
 M4は、アルコキシ基、ハロゲン原子が好ましく、メトキシ基、エトキシ基、塩素原子がより好ましい。 M 4 is preferably an alkoxy group or a halogen atom, and more preferably a methoxy group, an ethoxy group or a chlorine atom.
 好ましくは、f11、f13、及びf14は、それぞれf12の1/2以下であり、より好ましくは1/4以下であり、さらに好ましくはf13又はf14は0であり、特に好ましくはf13及びf14は0である。 Preferably, f11, f13, and f14 are each 1/2 or less of f12, more preferably 1/4 or less, still more preferably f13 or f14 being 0, and particularly preferably f13 and f14 being 0. Is.
 f15は、好ましくはf11、f12、f13、f14の合計値の1/5以上であり、f11、f12、f13、f14の合計値以下である。 F15 is preferably 1/5 or more of the total value of f11, f12, f13, and f14, and is less than or equal to the total value of f11, f12, f13, and f14.
 f12は、20~600が好ましく、より好ましくは20~200であり、更に好ましくは50~200である(一層好ましくは30~150、特に好ましくは50~150、最も好ましくは80~140)。f15は4~600が好ましく、より好ましくは4~200であり、更に好ましくは10~200である(一層好ましくは30~60)。f11、f12、f13、f14、f15の合計値は、20~600が好ましく、20~200がより好ましく、50~200が更に好ましい。 The f12 is preferably 20 to 600, more preferably 20 to 200, still more preferably 50 to 200 (more preferably 30 to 150, particularly preferably 50 to 150, most preferably 80 to 140). The f15 is preferably 4 to 600, more preferably 4 to 200, still more preferably 10 to 200 (more preferably 30 to 60). The total value of f11, f12, f13, f14, and f15 is preferably 20 to 600, more preferably 20 to 200, and even more preferably 50 to 200.
 f16は、好ましくは1~18である。より好ましくは1~15である。更に好ましくは1~10である。 F16 is preferably 1 to 18. More preferably, it is 1 to 15. More preferably, it is 1 to 10.
 f17は、好ましくは0~1である。 F17 is preferably 0 to 1.
 g1は、2~3が好ましく、3がより好ましい。 G1 is preferably 2 to 3, more preferably 3.
 f11個の-{C(R20)(R21)}-、f12個の-{C(Rfa22)(Rfa23)}-、f13個の-{Si(R22)(R23)}-、f14個の-{Si(Rfa24)(Rfa25)}-、及びf15個の-M3-の順序は、少なくとも一部でパーフルオロポリエーテル構造を形成する順で並ぶ限り、式中において任意であるが、好ましくは最も固定端側(ケイ素原子と結合する側)のf12を付して括弧でくくられた繰り返し単位(すなわち、-{C(Rfa22)(Rfa23)}-)は、最も自由端側のf11を付して括弧でくくられた繰り返し単位(すなわち、-{C(R20)(R21)}-)よりも自由端側に位置し、より好ましくは最も固定端側のf12及びf14を付して括弧でくくられた繰り返し単位(すなわち、-{C(Rfa22)(Rfa23)}-、及び-{Si(Rfa24)(Rfa25)}-)は、最も自由端側のf11及びf13を付して括弧でくくられた繰り返し単位(すなわち、-{C(R20)(R21)}-、及び-{Si(R22)(R23)}-)よりも自由端側に位置する。 f11-{C (R 20 ) (R 21 )}-, f12-{C (Rf a22 ) (Rf a23 )}-, f13-{Si (R 22 ) (R 23 )}- , F14-{Si (Rf a24 ) (Rf a25 )}-, and f15 -M 3 --in the formula, as long as they are arranged in the order of forming a perfluoropolyether structure at least in part. The repeating unit (ie- {C (Rf a22) (Rf a23 )}-) enclosed in parentheses with f12 on the most fixed end side (the side that bonds to the silicon atom) is optional, but preferably. , Located on the free end side of the repeating unit (ie-{C (R 20 ) (R 21 )}-) enclosed in parentheses with f11 on the most free end side, more preferably the most fixed end. The repeating units (ie- {C (Rf a22) (Rf a23 )}-and-{Si (Rf a24 ) (Rf a25 )}-) with the sides f12 and f14 in parentheses are Repeat units with f11 and f13 on the most free end side and enclosed in parentheses (ie-{C (R 20 ) (R 21 )}-and-{Si (R 22 ) (R 23 )}- ) Is located on the free end side.
 上記式(a2-1)において、Rfa21が炭素数1~5のパーフルオロアルキル基であり、Rfa22、Rfa23、Rfa24、Rfa25が全てフッ素原子であり、M3が全て-O-であり、M4が全てメトキシ基、エトキシ基又は塩素原子(特にメトキシ基又はエトキシ基)であり、M1、M2がいずれも水素原子であり、f11が0、f12が30~150(より好ましくは80~140)、f15が30~60、f13及びf14が0、f17が0~1(特に0)、g1が3、f16が1~10であることが好ましい。 In the above formula (a2-1), Rf a21 is a perfluoroalkyl group having 1 to 5 carbon atoms, Rf a22 , Rf a23 , Rf a24 , and Rf a25 are all fluorine atoms, and M 3 is all -O-. M 4 is all a methoxy group, an ethoxy group or a chlorine atom (particularly a methoxy group or an ethoxy group), M 1 and M 2 are both hydrogen atoms, f11 is 0, and f12 is 30 to 150 (from). It is preferable that 80 to 140), f15 is 30 to 60, f13 and f14 are 0, f17 is 0 to 1 (particularly 0), g1 is 3, and f16 is 1 to 10.
 また、有機ケイ素化合物(A)は、下記式(a2-2)で表される化合物であることも好ましい。 It is also preferable that the organosilicon compound (A) is a compound represented by the following formula (a2-2).
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
 上記式(a2-2)中、
 Rfa26、Rfa27、Rfa28、及びRfa29は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfa26が複数存在する場合は複数のRfa26がそれぞれ異なっていてもよく、Rfa27が複数存在する場合は複数のRfa27がそれぞれ異なっていてもよく、Rfa28が複数存在する場合は複数のRfa28がそれぞれ異なっていてもよく、Rfa29が複数存在する場合は複数のRfa29がそれぞれ異なっていてもよく、
 R25、R26、R27、及びR28は、それぞれ独立して、水素原子又は炭素数1~4のアルキル基であり、R25が複数存在する場合は複数のR25がそれぞれ異なっていてもよく、R26が複数存在する場合は複数のR26がそれぞれ異なっていてもよく、R27が複数存在する場合は複数のR27がそれぞれ異なっていてもよく、R28が複数存在する場合は複数のR28がそれぞれ異なっていてもよく、
 R29、及びR30は、それぞれ独立して、炭素数1~20のアルキル基であり、R29が複数存在する場合は複数のR29がそれぞれ異なっていてもよく、R30が複数存在する場合は複数のR30がそれぞれ異なっていてもよく、
 M7は、-O-、-C(=O)-O-、-O-C(=O)-、-NR-、-NRC(=O)-、又は-C(=O)NR-であり、前記Rは水素原子、炭素数1~4のアルキル基又は炭素数1~4の含フッ素アルキル基であり、M7が複数存在する場合は複数のM7がそれぞれ異なっていてもよく、
 M5、M9は、それぞれ独立して、水素原子又は炭素数1~4のアルキル基であり、M5が複数存在する場合は複数のM5がそれぞれ異なっていてもよく、M9が複数存在する場合は複数のM9がそれぞれ異なっていてもよく、
 M6、及びM10は、それぞれ独立して水素原子又はハロゲン原子であり、
 M8、及びM11は、それぞれ独立して、加水分解性基であり、M8が複数存在する場合は複数のM8がそれぞれ異なっていてもよく、M11が複数存在する場合は複数のM11がそれぞれ異なっていてもよく、
 f21、f22、f23、f24、及びf25はそれぞれ独立して0~600の整数であり、f21、f22、f23、f24、及びf25の合計値は13以上であり、
 f26、及びf28は、それぞれ独立して、1~20の整数であり、
 f27、及びf29は、それぞれ独立して、0~2の整数であり、
 g2、g3は、それぞれ独立して、1~3の整数であり、
 M10-、M6-、f21個の-{C(R25)(R26)}-、f22個の-{C(Rfa26)(Rfa27)}-、f23個の-{Si(R27)(R28)}-、f24個の-{Si(Rfa28)(Rfa29)}-、f25個の-M7-、f26個の-[CH2C(M5){(CH2f27-Si(M8g2(R293-g2}]、及びf28個の-[CH2C(M9){(CH2f29-Si(M11g3(R303-g3}]は、M10-、M6-が末端となり、少なくとも一部でパーフルオロポリエーテル構造を形成する順で並び、-O-が-O-と連続しない限り、任意の順で並んで結合する。任意の順で並んで結合することについては、上記式(a2-1)にて説明したのと同様であり、各繰り返し単位が連続して上記式(a2-2)に記載の通りの順に並ぶ意味に限定されない。
In the above formula (a2-2),
Rf a26 , Rf a27 , Rf a28 , and Rf a29 are independently alkyl groups or fluorine atoms having 1 to 20 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf a26. if present may be different plurality of Rf a26 respectively, if Rf a27 there are a plurality may be different plurality of Rf a27, respectively, a plurality of Rf a28 If Rf a28 are present in plural It may be different, if Rf a29 there are a plurality may be different plurality of Rf a29 respectively,
R 25, R 26, R 27, and R 28 are each independently hydrogen atom or an alkyl group having 1 to 4 carbon atoms, if R 25 there are a plurality differ plurality of R 25 each may, if R 26 there are a plurality may be different plurality of R 26 each may be the case where R 27 there are a plurality of different plural R 27 are each, if R 28 there are a plurality of It may be a different multiple of R 28, respectively,
R 29, and R 30 are each independently an alkyl group having 1 to 20 carbon atoms, if R 29 there are a plurality may be different plural R 29 are each, R 30 there are a plurality of In some cases, multiple R 30s may be different,
M 7 is -O-, -C (= O) -O-, -OC (= O)-, -NR-, -NRC (= O)-, or -C (= O) NR-. There, wherein R is a hydrogen atom, a fluorine-containing alkyl group of the alkyl group having 1 to 4 carbon atoms having 1 to 4 carbon atoms, if M 7 there are a plurality may be different plurality of M 7, respectively,
M 5, M 9 are each independently hydrogen atom or an alkyl group having 1 to 4 carbon atoms, if M 5 there are a plurality may be different plurality of M 5, respectively, M 9 are multiple if present may be different plurality of M 9, respectively,
M 6 and M 10 are independently hydrogen or halogen atoms, respectively.
M 8, and M 11 are each independently a hydrolysable group, if M 8 there are a plurality may be different plurality of M 8, respectively, of a plurality if M 11 there are a plurality of M 11 may be different,
f21, f22, f23, f24, and f25 are independently integers from 0 to 600, and the total value of f21, f22, f23, f24, and f25 is 13 or more.
f26 and f28 are each independently an integer of 1 to 20.
f27 and f29 are independently integers of 0 to 2, respectively.
g2 and g3 are independently integers of 1 to 3, respectively.
M 10- , M 6- , f21- {C (R 25 ) (R 26 )}-, f22- {C (Rf a26 ) (Rf a27 )}-, f23- {Si (R) 27) (R 28)} - , f24 amino - {Si (Rf a28) ( Rf a29)} -, f25 amino -M 7 -, f26 amino - [CH 2 C (M 5 ) {(CH 2 ) F27-Si (M 8 ) g2 (R 29 ) 3-g2 }], and f28- [CH 2 C (M 9 ) {(CH 2 ) f29-Si (M 11 ) g3 (R 30 ) 3 -g3 }] are arranged in the order of forming a perfluoropolyether structure at least in part, with M 10- and M 6- at the ends, and in any order unless -O- is continuous with -O-. Combine with. The joining in any order is the same as described in the above formula (a2-1), and the repeating units are continuously arranged in the order described in the above formula (a2-2). Not limited to meaning.
 上記式(a2-2)において、Rfa26、Rfa27、Rfa28、及びRfa29が全てフッ素原子であり、M7が全て-O-であり、M8及びM11が全てメトキシ基、エトキシ基又は塩素原子(特にメトキシ基又はエトキシ基)であり、M5、M6、M9、及びM10がいずれも水素原子であり、f21が0、f22が30~150(より好ましくは80~140)、f25が30~60、f23及びf24が0、f27及びf29が0~1(特に好ましくは0)、g2及びg3が3、f26及びf28が1~10であることが好ましい。 In the above formula (a2-2), Rf a26 , Rf a27 , Rf a28 , and Rf a29 are all fluorine atoms, M 7 is all -O-, and M 8 and M 11 are all methoxy and ethoxy groups. Alternatively, it is a chlorine atom (particularly a methoxy group or an ethoxy group), M 5 , M 6 , M 9 , and M 10 are all hydrogen atoms, f21 is 0, and f22 is 30 to 150 (more preferably 80 to 140). ), F25 is 30 to 60, f23 and f24 are 0, f27 and f29 are 0 to 1 (particularly preferably 0), g2 and g3 are 3, and f26 and f28 are 1 to 10.
 前記有機ケイ素化合物(A)として、より具体的には下記式(a3)の化合物が挙げられる。 More specifically, the organosilicon compound (A) includes a compound of the following formula (a3).
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 上記式(a3)中、R30は炭素数が2~6のパーフルオロアルキル基であり、R31及びR32はそれぞれ独立していずれも炭素数が2~6のパーフルオロアルキレン基であり、R33は炭素数が2~6の3価の飽和炭化水素基であり、R34は炭素数が1~3のアルキル基である。R30、R31、R32、R33の炭素数は、それぞれ独立に2~4が好ましく、2~3がより好ましい。h1は5~70であり、h2は1~5であり、h3は1~10である。h1は10~60が好ましく、20~50がより好ましく、h2は1~4が好ましく、1~3がより好ましく、h3は1~8が好ましく、1~6がより好ましい。 In the above formula (a3), R 30 is a perfluoroalkyl group having 2 to 6 carbon atoms, and R 31 and R 32 are independently perfluoroalkylene groups having 2 to 6 carbon atoms. R 33 is a trivalent saturated hydrocarbon group having 2 to 6 carbon atoms, and R 34 is an alkyl group having 1 to 3 carbon atoms. The carbon numbers of R 30 , R 31 , R 32 , and R 33 are preferably 2 to 4 independently, and more preferably 2 to 3. h1 is 5 to 70, h2 is 1 to 5, and h3 is 1 to 10. h1 is preferably 10 to 60, 20 to 50 is more preferable, h2 is 1 to 4, 1 to 3 is more preferable, h3 is 1 to 8 is preferable, and 1 to 6 is more preferable.
 前記有機ケイ素化合物(A)としては、下記式(a4)で表される化合物も挙げることができる。 As the organosilicon compound (A), a compound represented by the following formula (a4) can also be mentioned.
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 上記式(a4)中、R40は炭素数が2~5のパーフルオロアルキル基であり、R41は炭素数が2~5のパーフルオロアルキレン基であり、R42は炭素数2~5のアルキレン基の水素原子の一部がフッ素に置換されたフルオロアルキレン基であり、R43、R44はそれぞれ独立に炭素数が2~5のアルキレン基であり、R45はメチル基又はエチル基である。k1、k2、k3はそれぞれ独立に1~5の整数である。 In the above formula (a4), R 40 is a perfluoroalkyl group having 2 to 5 carbon atoms , R 41 is a perfluoroalkylene group having 2 to 5 carbon atoms, and R 42 is a perfluoroalkylene group having 2 to 5 carbon atoms. A part of the hydrogen atom of the alkylene group is a fluoroalkylene group substituted with fluorine, R 43 and R 44 are independently alkylene groups having 2 to 5 carbon atoms, and R 45 is a methyl group or an ethyl group. be. k1, k2, and k3 are independently integers of 1 to 5.
 前記有機ケイ素化合物(A)の数平均分子量は、2,000以上が好ましく、より好ましくは4,000以上であり、更に好ましくは6,000以上、特に好ましくは7,000以上であり、また40,000以下が好ましく、より好ましくは20,000以下であり、更に好ましくは15,000以下である。 The number average molecular weight of the organosilicon compound (A) is preferably 2,000 or more, more preferably 4,000 or more, still more preferably 6,000 or more, particularly preferably 7,000 or more, and 40. It is preferably 000 or less, more preferably 20,000 or less, and even more preferably 15,000 or less.
 前記有機ケイ素化合物(A)としては、例えば下記式(1)で示される化合物、又は該化合物の類似構造を有する化合物が挙げられ、ダイキン工業株式会社製のオプツール(登録商標)UF503などが挙げられる。
Figure JPOXMLDOC01-appb-C000017
Examples of the organosilicon compound (A) include a compound represented by the following formula (1) or a compound having a structure similar to the compound, and examples thereof include Optool (registered trademark) UF503 manufactured by Daikin Industries, Ltd. ..
Figure JPOXMLDOC01-appb-C000017
 上記式(1)で示される化合物としては、特開2014-15609号公報の合成例1、2に記載の方法により合成したものが挙げられ、rは43、sは1~6の整数であり、数平均分子量は約8000である。 Examples of the compound represented by the above formula (1) include those synthesized by the methods described in Synthesis Examples 1 and 2 of JP-A-2014-15609, where r is 43 and s is an integer of 1 to 6. , The number average molecular weight is about 8000.
 前記類似構造としては、上記式(1)の炭化水素基の炭素数又はフッ素原子で置換された炭化水素基の炭素数が異なる構造、パーフルオロポリエーテル構造とケイ素原子が連結基を介さずに結合している構造、パーフルオロポリエーテル構造とケイ素原子の間の連結基の任意の位置に他の炭化水素基(少なくとも一部の水素原子がフッ素原子で置換された炭化水素基も含む)が介在する構造、ケイ素原子と加水分解性基が連結基を介して結合する構造、r及びsの値が異なる構造、などが挙げられるが、これらの構造に限定されない。 Examples of the similar structure include a structure in which the number of carbon atoms of the hydrocarbon group of the above formula (1) or the number of carbon atoms of the hydrocarbon group substituted with a fluorine atom is different, a perfluoropolyether structure and a silicon atom without a linking group. Other hydrocarbon groups (including hydrocarbon groups in which at least some hydrogen atoms are replaced with fluorine atoms) are located at any position of the linking group between the bonded structure, the perfluoropolyether structure and the silicon atom. Examples thereof include a structure in which a silicon atom and a hydrolyzable group are bonded via a linking group, a structure in which the values of r and s are different, and the like, but the structure is not limited to these structures.
 II.有機ケイ素化合物(B)
 下記式(b1)で表される有機ケイ素化合物(B)は、後述する通り、A2で表される加水分解性基を有しており、通常、加水分解で生じた有機ケイ素化合物(B)の-SiOH基が、加水分解で生じた有機ケイ素化合物(A)の-SiOH基及び/又は加水分解で生じた有機ケイ素化合物(B)の-SiOH基と脱水縮合するため、好ましい態様において、前記混合組成物(ca)の硬化層である撥水層(r)は有機ケイ素化合物(A)由来の縮合構造と共に、有機ケイ素化合物(B)由来の縮合構造を有する。前記加水分解性基としては、アルコキシ基、ハロゲン原子、シアノ基、アセトキシ基、イソシアネート基等が挙げられる。
II. Organosilicon compound (B)
As will be described later, the organosilicon compound (B) represented by the following formula (b1) has a hydrolyzable group represented by A 2 , and is usually produced by hydrolysis of the organosilicon compound (B). -SiOH group is dehydrated and condensed with the -SiOH group of the organosilicon compound (A) generated by hydrolysis and / or the -SiOH group of the organosilicon compound (B) generated by hydrolysis. The water-repellent layer (r), which is a cured layer of the mixed composition (ca), has a condensed structure derived from the organosilicon compound (A) and a condensed structure derived from the organosilicon compound (B). Examples of the hydrolyzable group include an alkoxy group, a halogen atom, a cyano group, an acetoxy group, an isocyanate group and the like.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 上記式(b1)中、
 Rfb10は、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、
 Rb11、Rb12、Rb13、Rb14は、それぞれ独立して、水素原子又は炭素数が1~4のアルキル基であり、Rb11が複数存在する場合は複数のRb11がそれぞれ異なっていてもよく、Rb12が複数存在する場合は複数のRb12がそれぞれ異なっていてもよく、Rb13が複数存在する場合は複数のRb13がそれぞれ異なっていてもよく、Rb14が複数存在する場合は複数のRb14がそれぞれ異なっていてもよく、
 Rfb11、Rfb12、Rfb13、Rfb14は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfb11が複数存在する場合は複数のRfb11がそれぞれ異なっていてもよく、Rfb12が複数存在する場合は複数のRfb12がそれぞれ異なっていてもよく、Rfb13が複数存在する場合は複数のRfb13がそれぞれ異なっていてもよく、Rfb14が複数存在する場合は複数のRfb14がそれぞれ異なっていてもよく、
 Rb15は、炭素数が1~20のアルキル基であり、Rb15が複数存在する場合は複数のRb15がそれぞれ異なっていてもよく、
 A1は、-O-、-C(=O)-O-、-O-C(=O)-、-NR-、-NRC(=O)-、又は-C(=O)NR-であり、前記Rは水素原子、炭素数1~4のアルキル基又は炭素数1~4の含フッ素アルキル基であり、A1が複数存在する場合は複数のA1がそれぞれ異なっていてもよく、
 A2は、加水分解性基であり、A2が複数存在する場合は複数のA2がそれぞれ異なっていてもよく、
 b11、b12、b13、b14、b15は、それぞれ独立して0~100の整数であり、
 cは、1~3の整数であり、
 Rfb10-、-Si(A2c(Rb153-c、b11個の-{C(Rb11)(Rb12)}-、b12個の-{C(Rfb11)(Rfb12)}-、b13個の-{Si(Rb13)(Rb14)}-、b14個の-{Si(Rfb13)(Rfb14)}-、b15個の-A1-は、Rfb10-、-Si(A2c(Rb153-cが末端となり、パーフルオロポリエーテル構造を形成せず、かつ-O-が-O-乃至-Fと連結しない限り、任意の順で並んで結合する。
In the above formula (b1),
Rf b10 is an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are replaced with fluorine atoms.
R b11, R b12, R b13 , R b14 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R b11 there are a plurality differ plurality of R b11 each may, if R b12 there are a plurality may be different plural R b12 each may be the case where R b13 there are a plurality of different plural R b13 are each if R b14 there are multiple May have different R b14s,
Rf b11, Rf b12, Rf b13 , Rf b14 are each independently one or more hydrogen atoms is an alkyl group or a fluorine atom carbon number of 1 to 20 substituted by a fluorine atom, Rf b11 multiple presence If you may be different plurality of Rf b11, respectively, differ if the Rf b12 there are a plurality may be different plurality of Rf b12, respectively, a plurality of Rf b13 If Rf b13 is present in plural even if well, if Rf b14 there are a plurality may be different plurality of Rf b14, respectively,
R b15 is an alkyl group having 1 to 20 carbon atoms, it may be the case where R b15 there are a plurality of different plural R b15 are each,
A 1 is -O-, -C (= O) -O-, -OC (= O)-, -NR-, -NRC (= O)-, or -C (= O) NR-. There, wherein R is a hydrogen atom, a fluorine-containing alkyl group of the alkyl group having 1 to 4 carbon atoms having 1 to 4 carbon atoms, if a 1 there are a plurality may be different plurality of a 1, respectively,
A 2 is a hydrolyzable group, if A 2 there are a plurality may be different plurality of A 2, respectively,
b11, b12, b13, b14, and b15 are independently integers from 0 to 100, respectively.
c is an integer of 1 to 3 and
Rf b10 -, - Si (A 2) c (R b15) 3-c, b11 amino - {C (R b11) ( R b12)} -, b12 amino - {C (Rf b11) ( Rf b12) }-, B13-{Si (R b13 ) (R b14 )}-, b14-{Si (Rf b13 ) (Rf b14 )}-, b15 -A 1- are Rf b10- , Arranged in any order as long as -Si (A 2 ) c (R b15 ) 3-c is the terminal, does not form a perfluoropolyether structure, and -O- is not linked to -O- to -F. Join.
 Rfb10は、それぞれ独立して、フッ素原子又は炭素数1~10(より好ましくは炭素数1~5)のパーフルオロアルキル基が好ましい。 Rf b10 is preferably a fluorine atom or a perfluoroalkyl group having 1 to 10 carbon atoms (more preferably 1 to 5 carbon atoms) independently of each other.
 Rb11、Rb12、Rb13、及びRb14は、水素原子が好ましい。 R b11, R b12, R b13 , and R b14 is preferably a hydrogen atom.
 Rb15は、炭素数1~5のアルキル基が好ましい。 R b15 is preferably an alkyl group having 1 to 5 carbon atoms.
 A1は、-O-、-C(=O)-O-、又は-O-C(=O)-が好ましい。 A 1 is preferably —O—, —C (= O) —O—, or —OC (= O) −.
 A2は、炭素数1~4のアルコキシ基、又はハロゲン原子が好ましく、より好ましくはメトキシ基、エトキシ基、塩素原子である。 A 2 is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom, and more preferably a methoxy group, an ethoxy group or a chlorine atom.
 b11は1~30が好ましく、1~25がより好ましく、1~10が更に好ましく、1~5が特に好ましく、最も好ましくは1~2である。 B11 is preferably 1 to 30, more preferably 1 to 25, further preferably 1 to 10, particularly preferably 1 to 5, and most preferably 1 to 2.
 b12は、0~15が好ましく、より好ましくは0~10である。 B12 is preferably 0 to 15, more preferably 0 to 10.
 b13は、0~5が好ましく、より好ましくは0~2である。 B13 is preferably 0 to 5, more preferably 0 to 2.
 b14は、0~4が好ましく、より好ましくは0~2である。 B14 is preferably 0 to 4, more preferably 0 to 2.
 b15は、0~4が好ましく、より好ましくは0~2である。 B15 is preferably 0 to 4, more preferably 0 to 2.
 cは、2~3が好ましく、より好ましくは3である。 C is preferably 2 to 3, more preferably 3.
 b11、b12、b13、b14、及びb15の合計値は、3以上が好ましく、5以上が好ましく、また80以下が好ましく、より好ましくは50以下であり、更に好ましくは20以下である。 The total value of b11, b12, b13, b14, and b15 is preferably 3 or more, preferably 5 or more, preferably 80 or less, more preferably 50 or less, and further preferably 20 or less.
 特に、Rfb10がフッ素原子又は炭素数1~5のパーフルオロアルキル基であり、Rb11、Rb12がいずれも水素原子であり、A2がメトキシ基又はエトキシ基であると共に、b11が1~5、b12が0~5であり、b13、b14、及びb15が全て0であり、cが3であることが好ましい。 In particular, Rf b10 is a fluorine atom or a perfluoroalkyl group having 1 to 5 carbon atoms, R b11 and R b12 are both hydrogen atoms, A 2 is a methoxy group or an ethoxy group, and b11 is 1 to 1 to 1. It is preferable that 5, b12 is 0 to 5, b13, b14, and b15 are all 0, and c is 3.
 なお、後記する実施例にて、化合物(B)として用いるFAS13Eを上記式(b1)で表すと、Rb11、Rb12がいずれも水素原子、b11が2、b13、b14、及びb15が全て0、cが3、A2がエトキシ基であり、Rfb10-{C(Rfb11)(Rfb12)}b12-が末端となり、C613-となるように定められる。 In the examples described later, when FAS13E used as compound (B) is represented by the above formula (b1), R b11 and R b12 are all hydrogen atoms, b11 is 2, b13, b14, and b15 are all 0. , C is 3, A 2 is an ethoxy group, Rf b10 − {C (Rf b11 ) (Rf b12 )} b12 − is the terminal, and C 6 F 13 − is determined.
 上記式(b1)で表される化合物としては、具体的に、CF3-Si-(OCH33、Cj2j+1-Si-(OC253(jは1~12の整数)が挙げられ、この中で特にC49-Si-(OC253、C613-Si-(OC253、C715-Si-(OC253、C817-Si-(OC253が好ましい。また、CF3CH2O(CH2kSiCl3、CF3CH2O(CH2kSi(OCH33、CF3CH2O(CH2kSi(OC253、CF3(CH22Si(CH32(CH2kSiCl3、CF3(CH22Si(CH32(CH2kSi(OCH33、CF3(CH22Si(CH32(CH2kSi(OC253、CF3(CH26Si(CH32(CH2kSiCl3、CF3(CH26Si(CH32(CH2kSi(OCH33、CF3(CH26Si(CH32(CH2kSi(OC253、CF3COO(CH2kSiCl3、CF3COO(CH2kSi(OCH33、CF3COO(CH2kSi(OC253が挙げられる(kはいずれも5~20であり、好ましくは8~15である)。また、CF3(CF2m-(CH2nSiCl3、CF3(CF2m-(CH2nSi(OCH33、CF3(CF2m-(CH2nSi(OC253を挙げることもできる(mはいずれも1~10であり、好ましくは3~7であり、nはいずれも1~5であり、好ましくは2~4である)。CF3(CF2p-(CH2q-Si-(CH2CH=CH23を挙げることもできる(pはいずれも2~10であり、好ましくは2~8であり、qはいずれも1~5であり、好ましくは2~4である)。更に、CF3(CF2p-(CH2SiCH3Cl2、CF3(CF2p-(CH2qSiCH3(OCH32、CF3(CF2p-(CH2qSiCH3(OC252が挙げられる(pはいずれも2~10であり、好ましくは3~7であり、qはいずれも1~5であり、好ましくは2~4である)。 Specific examples of the compound represented by the above formula (b1) include CF 3- Si- (OCH 3 ) 3 , C j F 2j + 1- Si- (OC 2 H 5 ) 3 (j is 1 to 12). Of these, C 4 F 9- Si- (OC 2 H 5 ) 3 , C 6 F 13- Si- (OC 2 H 5 ) 3 , C 7 F 15- Si- (OC) 2 H 5 ) 3 and C 8 F 17- Si- (OC 2 H 5 ) 3 are preferable. In addition, CF 3 CH 2 O (CH 2 ) k SiCl 3 , CF 3 CH 2 O (CH 2 ) k Si (OCH 3 ) 3 , CF 3 CH 2 O (CH 2 ) k Si (OC 2 H 5 ) 3 , CF 3 (CH 2 ) 2 Si (CH 3 ) 2 (CH 2 ) k SiCl 3 , CF 3 (CH 2 ) 2 Si (CH 3 ) 2 (CH 2 ) k Si (OCH 3 ) 3 , CF 3 ( CH 2 ) 2 Si (CH 3 ) 2 (CH 2 ) k Si (OC 2 H 5 ) 3 , CF 3 (CH 2 ) 6 Si (CH 3 ) 2 (CH 2 ) k SiCl 3 , CF 3 (CH 2) ) 6 Si (CH 3 ) 2 (CH 2 ) k Si (OCH 3 ) 3 , CF 3 (CH 2 ) 6 Si (CH 3 ) 2 (CH 2 ) k Si (OC 2 H 5 ) 3 , CF 3 COO (CH 2 ) k SiCl 3 , CF 3 COO (CH 2 ) k Si (OCH 3 ) 3 , CF 3 COO (CH 2 ) k Si (OC 2 H 5 ) 3 (k is 5 to 20 in each case). It is preferably 8 to 15). In addition, CF 3 (CF 2 ) m- (CH 2 ) n SiCl 3 , CF 3 (CF 2 ) m- (CH 2 ) n Si (OCH 3 ) 3 , CF 3 (CF 2 ) m- (CH 2 ) n Si (OC 2 H 5 ) 3 can also be mentioned (m is 1 to 10, preferably 3 to 7, and n is 1 to 5, preferably 2 to 4). ). CF 3 (CF 2 ) p − (CH 2 ) q −Si− (CH 2 CH = CH 2 ) 3 can also be mentioned (p is 2 to 10, preferably 2 to 8, q). Is 1 to 5, preferably 2 to 4). Furthermore, CF 3 (CF 2 ) p- (CH 2 ) q SiCH 3 Cl 2 , CF 3 (CF 2 ) p- (CH 2 ) q SiCH 3 (OCH 3 ) 2 , CF 3 (CF 2 ) p- ( CH 2 ) q SiCH 3 (OC 2 H 5 ) 2 (p is 2 to 10, preferably 3 to 7, q is 1 to 5, preferably 2 to 4). Is).
 上記式(b1)で表される化合物の中で、下記式(b2)で表される化合物が好ましい。 Among the compounds represented by the above formula (b1), the compound represented by the following formula (b2) is preferable.
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 上記式(b2)中、R60は炭素数3~8のパーフルオロアルキル基であり、R61は炭素数1~5のアルキレン基であり、R62は炭素数1~3のアルキル基である。 In the above formula (b2), R 60 is a perfluoroalkyl group having 3 to 8 carbon atoms, R 61 is an alkylene group having 1 to 5 carbon atoms, and R 62 is an alkyl group having 1 to 3 carbon atoms. ..
 なお、前記混合組成物(ca)は、前記有機ケイ素化合物(A)と前記有機ケイ素化合物(B)が混合された組成物であり、前記有機ケイ素化合物(A)と前記有機ケイ素化合物(B)を混合することにより得られ、また前記有機ケイ素化合物(A)と前記有機ケイ素化合物(B)以外の成分が混合されている場合は、前記有機ケイ素化合物(A)と前記有機ケイ素化合物(B)と他の成分を混合することにより得られる。前記混合組成物(ca)は、混合後、例えば保管中に反応が進んだものも含む。 The mixed composition (ca) is a composition in which the organosilicon compound (A) and the organosilicon compound (B) are mixed, and the organosilicon compound (A) and the organosilicon compound (B) are mixed. Is obtained by mixing, and when a component other than the organosilicon compound (A) and the organosilicon compound (B) is mixed, the organosilicon compound (A) and the organosilicon compound (B) are mixed. It is obtained by mixing and other components. The mixed composition (ca) also includes those whose reaction has proceeded after mixing, for example, during storage.
 III.溶剤(D)
 前記混合組成物(ca)は、通常、溶剤(D)が混合されている。前記溶剤(D)としてはフッ素系溶剤を用いることが好ましく、例えばフッ素化エーテル系溶剤、フッ素化アミン系溶剤、フッ素化炭化水素系溶剤等を用いることができ、特に沸点が100℃以上であることが好ましい。フッ素化エーテル系溶剤としては、フルオロアルキル(特に炭素数2~6のパーフルオロアルキル基)-アルキル(特にメチル基又はエチル基)エーテルなどのハイドロフルオロエーテルが好ましく、例えばエチルノナフルオロブチルエーテル又はエチルノナフルオロイソブチルエーテルが挙げられる。エチルノナフルオロブチルエーテル又はエチルノナフルオロイソブチルエーテルとしては、例えばNovec(登録商標)7200(3M社製、分子量約264)が挙げられる。フッ素化アミン系溶剤としては、アンモニアの水素原子の少なくとも1つがフルオロアルキル基で置換されたアミンが好ましく、アンモニアの全ての水素原子がフルオロアルキル基(特にパーフルオロアルキル基)で置換された第三級アミンが好ましく、具体的にはトリス(ヘプタフルオロプロピル)アミンが挙げられ、フロリナート(登録商標)FC-3283(3M社製、分子量約521)がこれに該当する。フッ素化炭化水素系溶剤としては、1,1,1,3,3-ペンタフルオロブタンなどのフッ素化脂肪族炭化水素系溶剤、1,3-ビス(トリフルオロメチルベンゼン)などのフッ素化芳香族炭化水素系溶剤が挙げられる。1,1,1,3,3-ペンタフルオロブタンとしては、例えばソルブ55(ソルベックス社製)等が挙げられる。
III. Solvent (D)
The mixed composition (ca) is usually mixed with a solvent (D). As the solvent (D), it is preferable to use a fluorine-based solvent, for example, a fluorinated ether solvent, a fluorinated amine solvent, a fluorinated hydrocarbon solvent and the like can be used, and the boiling point is particularly 100 ° C. or higher. Is preferable. As the fluorinated ether solvent, hydrofluoro ethers such as fluoroalkyl (particularly perfluoroalkyl group having 2 to 6 carbon atoms) -alkyl (particularly methyl group or ethyl group) ether are preferable, and for example, ethyl nona fluorobutyl ether or ethyl nona. Fluoroisobutyl ether can be mentioned. Examples of the ethyl nonafluorobutyl ether or ethyl nonafluoroisobutyl ether include Novec® 7200 (manufactured by 3M, molecular weight of about 264). The fluorinated amine-based solvent is preferably an amine in which at least one hydrogen atom of ammonia is substituted with a fluoroalkyl group, and a third in which all hydrogen atoms of ammonia are substituted with a fluoroalkyl group (particularly a perfluoroalkyl group). Primary amines are preferred, and specific examples thereof include tris (heptafluoropropyl) amines, such as Florinate (registered trademark) FC-3283 (manufactured by 3M, molecular weight: about 521). Examples of the fluorinated hydrocarbon solvent include a fluorinated aliphatic hydrocarbon solvent such as 1,1,1,3,3-pentafluorobutane, and a fluorinated aromatic solvent such as 1,3-bis (trifluoromethylbenzene). Hydrocarbon-based solvents can be mentioned. Examples of 1,1,1,3,3-pentafluorobutane include Solve 55 (manufactured by Solvex).
 前記フッ素系溶剤としては、上記の他、アサヒクリン(登録商標)AK225(AGC社製)などのハイドロクロロフルオロカーボン、アサヒクリン(登録商標)AC2000(旭ガラス社製)などのハイドロフルオロカーボンなどを用いることができる。 In addition to the above, as the fluorocarbon solvent, hydrochlorofluorocarbons such as Asahiclean (registered trademark) AK225 (manufactured by AGC) and hydrofluorocarbons such as Asahiclean (registered trademark) AC2000 (manufactured by Asahi Glass Co., Ltd.) may be used. Can be done.
 前記溶剤(D)として、少なくともフッ素化アミン系溶剤を用いることが好ましい。また溶剤(D)としては、2種以上のフッ素系溶剤を用いることが好ましく、フッ素化アミン系溶剤とフッ素化炭化水素系溶剤(特にフッ素化脂肪族炭化水素系溶剤)を用いることが好ましい。 It is preferable to use at least a fluorinated amine solvent as the solvent (D). Further, as the solvent (D), it is preferable to use two or more kinds of fluorine-based solvents, and it is preferable to use a fluorinated amine-based solvent and a fluorinated hydrocarbon-based solvent (particularly, a fluorinated aliphatic hydrocarbon-based solvent).
 前記混合組成物(ca)における前記有機ケイ素化合物(A)の量は、該組成物の全体を100質量%に対して、例えば0.01質量%以上であり、好ましくは0.03質量%以上であり、より好ましくは0.05質量%以上であり、また1.0質量%以下であることが好ましく、より好ましくは0.5質量%以下であり、更に好ましくは0.3質量%以下であり、特に0.1質量%以下であることが好ましい。 The amount of the organosilicon compound (A) in the mixed composition (ca) is, for example, 0.01% by mass or more, preferably 0.03% by mass or more, based on 100% by mass of the entire composition. It is more preferably 0.05% by mass or more, preferably 1.0% by mass or less, more preferably 0.5% by mass or less, still more preferably 0.3% by mass or less. Yes, and it is particularly preferable that it is 0.1% by mass or less.
 前記混合組成物(ca)における前記有機ケイ素化合物(B)の量は、該組成物の全体を100質量%に対して、例えば0.01質量%以上であり、好ましくは0.03質量%以上であり、また0.3質量%以下であることが好ましく、より好ましくは0.2質量%以下である。 The amount of the organosilicon compound (B) in the mixed composition (ca) is, for example, 0.01% by mass or more, preferably 0.03% by mass or more, based on 100% by mass of the entire composition. It is preferably 0.3% by mass or less, and more preferably 0.2% by mass or less.
 前記有機ケイ素化合物(A)に対する前記有機ケイ素化合物(B)の質量比は、0.01以上が好ましく、より好ましくは0.1以上であり、更に好ましくは0.3以上であり、また2.0以下が好ましく、より好ましくは1.5以下であり、更に好ましくは1.0以下である。 The mass ratio of the organosilicon compound (B) to the organosilicon compound (A) is preferably 0.01 or more, more preferably 0.1 or more, still more preferably 0.3 or more, and 2. It is preferably 0 or less, more preferably 1.5 or less, and even more preferably 1.0 or less.
 上記の有機ケイ素化合物(A)及び(B)の量は、組成物の調製時に調整できる。前記有機ケイ素化合物(A)及び(B)の量は、組成物の分析結果から算出してもよい。 The amounts of the above-mentioned organosilicon compounds (A) and (B) can be adjusted at the time of preparing the composition. The amounts of the organosilicon compounds (A) and (B) may be calculated from the analysis result of the composition.
 また撥水層(r)形成用の前記混合組成物(ca)は、本発明の効果を阻害しない範囲で、シラノール縮合触媒、酸化防止剤、防錆剤、紫外線吸収剤、光安定剤、防カビ剤、抗菌剤、生物付着防止剤、消臭剤、顔料、難燃剤、帯電防止剤等、各種の添加剤が混合されていてもよい。 Further, the mixed composition (ca) for forming the water-repellent layer (r) is a silanol condensation catalyst, an antioxidant, a rust preventive, an ultraviolet absorber, a light stabilizer, and a fungicide, as long as the effect of the present invention is not impaired. Various additives such as fungicides, antibacterial agents, bioadhesion inhibitors, deodorants, pigments, flame retardants, and antistatic agents may be mixed.
 前記撥水層(r)の厚みは、例えば1~1000nm程度である。 The thickness of the water-repellent layer (r) is, for example, about 1 to 1000 nm.
 前記中間層(c)は、ケイ素原子を有すると共にアミノ基又はアミン骨格(-NR100-であり、R100は水素原子又はアルキル基)を有する有機ケイ素化合物(C)の混合組成物(cc)の硬化層又は前記有機ケイ素化合物(C)の蒸着層であり、中間層(c)はアミノ基又はアミン骨格を有する。好ましい態様においては、有機ケイ素化合物(C)のケイ素原子には加水分解性基又はヒドロキシ基が結合しており、有機ケイ素化合物(C)が有するSi-OH基又はケイ素原子に結合した加水分解性基の加水分解で生じた有機ケイ素化合物(C)の-SiOH基同士が脱水縮合するため、中間層(c)は、有機ケイ素化合物(C)由来の縮合構造を有することが好ましい。中間層(c)は撥水層(r)のプライマー層として機能することができる。有機ケイ素化合物(C)のケイ素原子に結合する加水分解性基としては、アルコキシ基、ハロゲン原子、シアノ基、アセトキシ基、イソシアネート基等が挙げられる。有機ケイ素化合物(C)のケイ素原子には、炭素数1~4のアルコキシ基又はヒドロキシ基が結合していることが好ましい。 The intermediate layer (c) is a mixed composition (cc) of an organosilicon compound (C) having a silicon atom and an amino group or an amine skeleton (-NR 100- , and R 100 is a hydrogen atom or an alkyl group). The cured layer of the above or a vapor-deposited layer of the organosilicon compound (C), and the intermediate layer (c) has an amino group or an amine skeleton. In a preferred embodiment, the silicon atom of the organic silicon compound (C) has a hydrolyzable group or a hydroxy group bonded thereto, and the organic silicon compound (C) has a hydrolyzable group bonded to a Si—OH group or a silicon atom. Since the −SiOH groups of the organic silicon compound (C) generated by hydrolysis of the groups are dehydrated and condensed, the intermediate layer (c) preferably has a condensed structure derived from the organic silicon compound (C). The intermediate layer (c) can function as a primer layer for the water-repellent layer (r). Examples of the hydrolyzable group bonded to the silicon atom of the organic silicon compound (C) include an alkoxy group, a halogen atom, a cyano group, an acetoxy group and an isocyanate group. It is preferable that an alkoxy group or a hydroxy group having 1 to 4 carbon atoms is bonded to the silicon atom of the organosilicon compound (C).
 有機ケイ素化合物(C)は、下記式(c1)~(c3)のいずれかで表される化合物であることが好ましい。 The organosilicon compound (C) is preferably a compound represented by any of the following formulas (c1) to (c3).
 IV-1.下記式(c1)で表される有機ケイ素化合物(C)(以下、有機ケイ素化合物(C1)
Figure JPOXMLDOC01-appb-C000020
IV-1. Organosilicon compound (C) represented by the following formula (c1) (hereinafter, organosilicon compound (C1))
Figure JPOXMLDOC01-appb-C000020
 上記式(c1)中、
 Rx11、Rx12、Rx13、Rx14は、それぞれ独立して、水素原子又は炭素数が1~4のアルキル基であり、Rx11が複数存在する場合は複数のRx11がそれぞれ異なっていてもよく、Rx12が複数存在する場合は複数のRx12がそれぞれ異なっていてもよく、Rx13が複数存在する場合は複数のRx13がそれぞれ異なっていてもよく、Rx14が複数存在する場合は複数のRx14がそれぞれ異なっていてもよく、
 Rfx11、Rfx12、Rfx13、Rfx14は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfx11が複数存在する場合は複数のRfx11がそれぞれ異なっていてもよく、Rfx12が複数存在する場合は複数のRfx12がそれぞれ異なっていてもよく、Rfx13が複数存在する場合は複数のRfx13がそれぞれ異なっていてもよく、Rfx14が複数存在する場合は複数のRfx14がそれぞれ異なっていてもよく、
 Rx15は、炭素数が1~20のアルキル基であり、Rx15が複数存在する場合は複数のRx15がそれぞれ異なっていてもよく、
 X11は、加水分解性基であり、X11が複数存在する場合は複数のX11がそれぞれ異なっていてもよく、
 Y11は、-NH-、又は-S-であり、Y11が複数存在する場合は複数のY11がそれぞれ異なっていてもよく、
 Z11は、ビニル基、α-メチルビニル基、スチリル基、メタクリロイル基、アクリロイル基、アミノ基、イソシアネート基、イソシアヌレート基、エポキシ基、ウレイド基、又はメルカプト基であり、
 p1は、1~20の整数であり、p2、p3、p4は、それぞれ独立して、0~10の整数であり、p5は、1~10の整数であり、
 p6は、1~3の整数であり、
 Z11がアミノ基でない場合はY11の少なくとも1つが-NH-であり、Y11が全て-S-である場合はZ11がアミノ基であり、
 Z11-、-Si(X11p6(Rx153-p6、p1個の-{C(Rx11)(Rx12)}-、p2個の-{C(Rfx11)(Rfx12)}-、p3個の-{Si(Rx13)(Rx14)}-、p4個の-{Si(Rfx13)(Rfx14)}-、p5個の-Y11-は、Z11-及び-Si(X11p6(Rx153-p6が末端となり、-O-が-O-と連結しない限り、任意の順で並んで結合する。
In the above formula (c1),
R x11, R x12, R x13 , R x14 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R x11 there are a plurality differ plurality of R x11 are each may, if R x12 there are a plurality may be different plural R x12 are each may be the case where R x13 there are a plurality of different plural R x13 are each if R x14 there are multiple May have different R x14s,
Rf x11 , Rf x12 , Rf x13 , and Rf x14 are each independently an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf x11. If you may be different plurality of Rf x11 respectively, differ if the Rf x12 there are a plurality may be different plurality of Rf x12, respectively, a plurality of Rf x13 If Rf x13 is present in plural even if well, if Rf x14 there are a plurality may be different plurality of Rf x14, respectively,
R x15 is an alkyl group having 1 to 20 carbon atoms, it may be the case where R x15 there are a plurality of different plural R x15 are each,
X 11 is a hydrolysable group, if X 11 there are a plurality may be different plurality of X 11 are each,
Y 11 is, -NH-, or -S-. And, in the case where Y 11 there are a plurality may be different plurality of Y 11, respectively,
Z 11 is a vinyl group, an α-methylvinyl group, a styryl group, a methacryloyl group, an acryloyl group, an amino group, an isocyanate group, an isocyanurate group, an epoxy group, a ureido group, or a mercapto group.
p1 is an integer of 1 to 20, p2, p3, and p4 are independently integers of 0 to 10, and p5 is an integer of 1 to 10.
p6 is an integer of 1 to 3 and
If Z 11 is not an amino group, then at least one of Y 11 is -NH-, and if Y 11 is all -S-, then Z 11 is an amino group.
Z 11 -, - Si (X 11) p6 (R x15) 3-p6, p1 amino - {C (R x11) ( R x12)} -, p2 amino - {C (Rf x11) ( Rf x12) } -, p3 amino - {Si (R x13) ( R x14)} -, p4 amino - {Si (Rf x13) ( Rf x14)} -, p5 amino -Y 11 - is, Z 11 - and -Si (X 11 ) p6 (R x15 ) 3-p6 is the end, and unless -O- is connected to -O-, they are connected side by side in any order.
 Rx11、Rx12、Rx13、及びRx14は、水素原子であることが好ましい。 R x11 , R x12 , R x13 , and R x14 are preferably hydrogen atoms.
 Rfx11、Rfx12、Rfx13、及びRfx14は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~10のアルキル基又はフッ素原子であることが好ましい。 It is preferable that Rf x11 , Rf x12 , Rf x13 , and Rf x14 are each independently an alkyl group having 1 to 10 carbon atoms or a fluorine atom in which one or more hydrogen atoms are substituted with fluorine atoms.
 Rx15は、炭素数が1~5のアルキル基であることが好ましい。 R x15 is preferably an alkyl group having 1 to 5 carbon atoms.
 X11は、アルコキシ基、ハロゲン原子、シアノ基、又はイソシアネート基であることが好ましく、アルコキシ基であることがより好ましく、メトキシ基又はエトキシ基であることが更に好ましい。 X 11 is preferably an alkoxy group, a halogen atom, a cyano group, or an isocyanate group, more preferably an alkoxy group, and even more preferably a methoxy group or an ethoxy group.
 Y11は、-NH-であることが好ましい。 Y 11 is preferably −NH−.
 Z11は、メタクリロイル基、アクリロイル基、メルカプト基又はアミノ基であることが好ましく、メルカプト基又はアミノ基がより好ましく、アミノ基が更に好ましい。 Z 11 is preferably a methacryloyl group, an acryloyl group, a mercapto group or an amino group, more preferably a mercapto group or an amino group, and even more preferably an amino group.
 p1は1~15が好ましく、より好ましくは2~10である。p2、p3及びp4は、それぞれ独立して、0~5が好ましく、より好ましくは全て0~2である。p5は、1~5が好ましく、より好ましくは1~3である。p6は、2~3が好ましく、より好ましくは3である。 P1 is preferably 1 to 15, more preferably 2 to 10. Independently, p2, p3 and p4 are preferably 0 to 5, more preferably all 0 to 2. p5 is preferably 1 to 5, more preferably 1 to 3. The p6 is preferably 2 to 3, more preferably 3.
 有機ケイ素化合物(C)としては、上記式(c1)において、Rx11及びRx12がいずれも水素原子であり、Y11が-NH-であり、X11がアルコキシ基(特にメトキシ基又はエトキシ基)であり、Z11がアミノ基又はメルカプト基であり、p1が1~10であり、p2、p3及びp4がいずれも0であり、p5が1~5(特に1~3)であり、p6が3である化合物を用いることが好ましい。 As the organic silicon compound (C), in the above formula (c1), both R x11 and R x12 are hydrogen atoms, Y 11 is -NH-, and X 11 is an alkoxy group (particularly a methoxy group or an ethoxy group). ), Z 11 is an amino group or a mercapto group, p1 is 1 to 10, p2, p3 and p4 are all 0, p5 is 1 to 5 (particularly 1 to 3), and p6. It is preferable to use a compound having a value of 3.
 有機ケイ素化合物(C1)は、下記式(c1-2)で表されることが好ましい。 The organosilicon compound (C1) is preferably represented by the following formula (c1-2).
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
 上記式(c1-2)中、
 X12は、加水分解性基であり、X12が複数存在する場合は複数のX12がそれぞれ異なっていてもよく、
 Y12は、-NH-であり、
 Z12は、アミノ基、又はメルカプト基であり、
 Rx16は、炭素数が1~20のアルキル基であり、Rx16が複数存在する場合は複数のRx16がそれぞれ異なっていてもよく、
 pは、1~3の整数であり、qは2~5の整数であり、rは0~5の整数である。
In the above formula (c1-2),
X 12 is a hydrolysable group, if X 12 there are a plurality may be different plurality of X 12 are each,
Y 12 is -NH-
Z 12 is an amino group or a mercapto group,
R x16 is an alkyl group having 1 to 20 carbon atoms, it may be the case where R x16 there are a plurality of different plural R x16 are each,
p is an integer of 1 to 3, q is an integer of 2 to 5, and r is an integer of 0 to 5.
 X12は、アルコキシ基、ハロゲン原子、シアノ基、又はイソシアネート基であることが好ましく、アルコキシ基であることがより好ましく、炭素数が1~4のアルコキシ基であることが更に好ましい。 X 12 is preferably an alkoxy group, a halogen atom, a cyano group, or an isocyanate group, more preferably an alkoxy group, and even more preferably an alkoxy group having 1 to 4 carbon atoms.
 Z12は、アミノ基であることが好ましい。 Z 12 is preferably an amino group.
 Rx16は、炭素数が1~10のアルキル基であることが好ましく、炭素数が1~5のアルキル基であることがより好ましい。 R x16 is preferably an alkyl group having 1 to 10 carbon atoms, and more preferably an alkyl group having 1 to 5 carbon atoms.
 pは、2~3の整数であることが好ましく、3であることがより好ましい。 P is preferably an integer of 2 to 3, and more preferably 3.
 qは2~3の整数であることが好ましく、rは2~4の整数であることが好ましい。 Q is preferably an integer of 2 to 3, and r is preferably an integer of 2 to 4.
 IV-2.下記式(c2)で表される有機ケイ素化合物(C)(以下、有機ケイ素化合物(C2)) IV-2. Organosilicon compound (C) represented by the following formula (c2) (hereinafter, organosilicon compound (C2))
Figure JPOXMLDOC01-appb-C000022
 上記式(c2)中、
 Rx20及びRx21は、それぞれ独立して、水素原子又は炭素数が1~4のアルキル基であり、Rx20が複数存在する場合は複数のRx20がそれぞれ異なっていてもよく、Rx21が複数存在する場合は複数のRx21がそれぞれ異なっていてもよく、
 Rfx20及びRfx21は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfx20が複数存在する場合は複数のRfx20がそれぞれ異なっていてもよく、Rfx21が複数存在する場合は複数のRfx21がそれぞれ異なっていてもよく、
 Rx22及びRx23はそれぞれ独立して、炭素数が1~20のアルキル基であり、Rx22及びRx23が複数存在する場合は複数のRx22及びRx23がそれぞれ異なっていてもよく、
 X20及びX21はそれぞれ独立して、加水分解性基であり、X20及びX21が複数存在する場合は複数のX20及びX21がそれぞれ異なっていてもよく、
 p20は、1~30の整数であり、p21は、0~30の整数であり、p20又はp21を付して括弧でくくられた繰り返し単位の少なくとも1つは、アミン骨格-NR100-に置き換わっており、前記アミン骨格におけるR100は水素原子又はアルキル基であり、
 p22及びp23はそれぞれ独立して、1~3の整数であり、
 p20個の-{C(Rx20)(Rx21)}-、p21個の-{C(Rfx20)(Rfx21)}-は、p20又はp21個が連続である必要はなく、任意の順で並んで結合し、両末端が-Si(X20p22(Rx223-p22及び-Si(X21p23(Rx233-p23となる。
Figure JPOXMLDOC01-appb-C000022
In the above formula (c2),
R x20 and R x21 are each independently a hydrogen atom or an alkyl group of 1 to 4 carbon atoms, if R x20 there are a plurality may be different plural R x20 are each, R x21 is If there are multiple R x21s, multiple R x21s may be different.
Rf x20 and Rf x21 are each independently an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are substituted with fluorine atoms, and when a plurality of Rf x20 are present, a plurality of Rfs are present. x20 well be different from each other, when the Rf x21 there is more than one may be different multiple of Rf x21, respectively,
And each R x22 and R x23 is independently an alkyl group having 1 to 20 carbon atoms, may be the case where R x22 and R x23 there are a plurality of different plural R x22 and R x23 are each,
X 20 and X 21 are each independently a hydrolysable group, if X 20 and X 21 there are a plurality may be different plurality of X 20 and X 21 are each,
p20 is an integer from 1 to 30, p21 is an integer from 0 to 30, and at least one of the repeating units in parentheses with p20 or p21 is replaced by the amine backbone-NR 100-. R 100 in the amine skeleton is a hydrogen atom or an alkyl group.
p22 and p23 are independently integers of 1 to 3, respectively.
The p20-{C (R x20 ) (R x21 )}-and the p21-{C (Rf x20 ) (Rf x21 )}-do not have to be consecutive p20 or p21, and are in any order. Both ends are -Si (X 20 ) p22 (R x22 ) 3-p22 and -Si (X 21 ) p23 (R x23 ) 3-p23 .
 Rx20及びRx21は、水素原子であることが好ましい。 R x20 and Rx21 are preferably hydrogen atoms.
 Rfx20及びRfx21は、は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~10のアルキル基又はフッ素原子であることが好ましい。 Rf x20 and Rf x21 are preferably alkyl groups or fluorine atoms having 1 to 10 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, respectively.
 Rx22及びRx23は、炭素数が1~5のアルキル基であることが好ましい。 R x22 and R x23 are preferably a carbon number of alkyl group of 1 to 5.
 X20及びX21は、アルコキシ基、ハロゲン原子、シアノ基、又はイソシアネート基であることが好ましく、アルコキシ基であることがより好ましく、メトキシ基又はエトキシ基であることが更に好ましい。 X 20 and X 21 are preferably an alkoxy group, a halogen atom, a cyano group, or an isocyanate group, more preferably an alkoxy group, and even more preferably a methoxy group or an ethoxy group.
 アミン骨格-NR100-は、上記の通り分子内に少なくとも1つ存在すればよく、p20又はp21を付して括弧でくくられた繰り返し単位のいずれかが前記アミン骨格に置き換わっていればよいが、p20を付して括弧でくくられた繰り返し単位の一部であることが好ましい。前記アミン骨格は、複数存在してもよく、その場合のアミン骨格の数は、1~10であることが好ましく、1~5であることがより好ましく、2~5であることがさらに好ましい。また、この場合、隣り合うアミン骨格の間にアルキレン基を有することが好ましく、該アルキレン基の炭素数は、1~10であることが好ましく、1~5であることがより好ましい。隣り合うアミン骨格の間のアルキレン基の炭素数は、p20又はp21の総数に含まれる。 At least one amine skeleton-NR 100 -may be present in the molecule as described above, and any of the repeating units in parentheses with p20 or p21 may be replaced by the amine skeleton. , P20 and are preferably part of the repeating unit enclosed in parentheses. A plurality of the amine skeletons may be present, and in that case, the number of amine skeletons is preferably 1 to 10, more preferably 1 to 5, and even more preferably 2 to 5. Further, in this case, it is preferable to have an alkylene group between adjacent amine skeletons, and the carbon number of the alkylene group is preferably 1 to 10, and more preferably 1 to 5. The carbon number of the alkylene group between adjacent amine backbones is included in the total number of p20 or p21.
 アミン骨格-NR100-において、R100がアルキル基である場合、炭素数は5以下であることが好ましく、3以下であることがより好ましい。アミン骨格-NR100-は、-NH-(R100が水素原子)であることが好ましい。 In the amine skeleton-NR 100- , when R 100 is an alkyl group, the number of carbon atoms is preferably 5 or less, and more preferably 3 or less. The amine skeleton -NR 100- is preferably -NH- (R 100 is a hydrogen atom).
 p20は、アミン骨格に置き変わった繰り返し単位の数を除いて、1~15が好ましく、より好ましくは1~10である。 P20 is preferably 1 to 15, more preferably 1 to 10, excluding the number of repeating units replaced by the amine skeleton.
 p21は、アミン骨格に置き変わった繰り返し単位の数を除いて、0~5が好ましく、より好ましくは全て0~2である。 P21 is preferably 0 to 5, more preferably all 0 to 2, except for the number of repeating units replaced by the amine skeleton.
 p22及びp23は、2~3が好ましく、より好ましくは3である。 P22 and p23 are preferably 2 to 3, more preferably 3.
 有機ケイ素化合物(C2)としては、上記式(c2)において、Rx20及びRx21がいずれも水素原子であり、X20及びX21がアルコキシ基(特にメトキシ基又はエトキシ基)であり、p20を付して括弧でくくられた繰り返し単位が、少なくとも1つアミン骨格-NR100-に置き換わっており、R100が水素原子であり、p20が1~10であり(ただし、アミン骨格に置き変わった繰り返し単位の数を除く)、p21が0であり、p22及びp23が3である化合物を用いることが好ましい。 The organosilicon compound (C2), in the formula (c2), an R x20 and R x21 are both hydrogen atom, X 20 and X 21 is an alkoxy group (particularly methoxy group or ethoxy group), a p20 The repeating units in parentheses are replaced with at least one amine skeleton-NR 100- , where R 100 is a hydrogen atom and p20 is 1-10 (but replaced by an amine skeleton). (Excluding the number of repeating units), it is preferable to use a compound in which p21 is 0 and p22 and p23 are 3.
 なお、後記する実施例で化合物(C)として用いる、特開2012-197330号公報に記載のN-2-(アミノエチル)-3-アミノプロピルトリメトキシシランとクロロプロピルトリメトキシシランの反応物(商品名;X-12-5263HP、信越化学工業(株)製)を上記式(c2)で表すと、Rx20及びRx21がいずれも水素原子、p20が8、p21が0、アミン骨格が2つ(いずれもR100が水素原子)、両末端が同一で、p22及びp23が3でX20及びX21がメトキシ基である。 A reaction product of N-2- (aminoethyl) -3-aminopropyltrimethoxysilane and chloropropyltrimethoxysilane described in JP2012-197330A, which is used as compound (C) in Examples described later. Product name; X-12-5263HP, manufactured by Shin-Etsu Chemical Industry Co., Ltd.) is represented by the above formula (c2). R x20 and R x21 are both hydrogen atoms, p20 is 8, p21 is 0, and amine skeleton is 2. One (R 100 is a hydrogen atom), both ends are the same, p22 and p23 are 3, and X 20 and X 21 are methoxy groups.
 有機ケイ素化合物(C2)は、下記式(c2-2)で表される化合物であることが好ましい。 The organosilicon compound (C2) is preferably a compound represented by the following formula (c2-2).
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
 上記式(c2-2)中、
 X22及びX23は、それぞれ独立して、加水分解性基であり、X22及びX23が複数存在する場合は複数のX22及びX23がそれぞれ異なっていてもよく、
 Rx24及びRx25は、それぞれ独立して、炭素数が1~20のアルキル基であり、Rx24及びRx25が複数存在する場合は複数のRx24及びRx25がそれぞれ異なっていてもよく、
 -Cw2w-は、その一部のメチレン基の少なくとも1つがアミン骨格-NR100-に置き換わっており、R100は水素原子又はアルキル基であり、
 wは1~30の整数であり(ただし、アミン骨格に置き換わったメチレン基の数を除く)、
 p24及びp25は、それぞれ独立して、1~3の整数である。
In the above formula (c2-2),
X 22 and X 23 are each independently a hydrolyzable group, when X 22 and X 23 there are a plurality may be different plurality of X 22 and X 23 are each,
R x24 and R x25 are each independently alkyl groups having 1 to 20 carbons, may be the case where R x24 and R x25 there are a plurality of different plural R x24 and R x25 are each,
-C w H 2w -has at least one of its methylene groups replaced by an amine skeleton -NR 100- , where R 100 is a hydrogen atom or an alkyl group.
w is an integer from 1 to 30 (excluding the number of methylene groups replaced by the amine backbone).
p24 and p25 are each independently an integer of 1 to 3.
 X22及びX23は、アルコキシ基、ハロゲン原子、シアノ基、又はイソシアネート基であることが好ましく、アルコキシ基であることがより好ましく、炭素数1~4のアルコキシ基(特にメトキシ基又はエトキシ基)であることが更に好ましい。 X 22 and X 23 are preferably an alkoxy group, a halogen atom, a cyano group, or an isocyanate group, more preferably an alkoxy group, and an alkoxy group having 1 to 4 carbon atoms (particularly a methoxy group or an ethoxy group). Is more preferable.
 アミン骨格-NR100-は、複数存在してもよく、その場合のアミン骨格の数は、1~10であることが好ましく、1~5であることがより好ましく、2~5であることがさらに好ましい。また、この場合、隣り合うアミン骨格の間にアルキレン基を有することが好ましい。前記アルキレン基の炭素数は、1~10であることが好ましく、1~5であることがより好ましい。隣り合うアミン骨格の間のアルキレン基の炭素数は、wの総数に含まれる。 A plurality of amine skeletons −NR 100 − may be present, and in that case, the number of amine skeletons is preferably 1 to 10, more preferably 1 to 5, and preferably 2 to 5. More preferred. Further, in this case, it is preferable to have an alkylene group between adjacent amine skeletons. The alkylene group preferably has 1 to 10 carbon atoms, and more preferably 1 to 5 carbon atoms. The number of carbon atoms of the alkylene group between adjacent amine skeletons is included in the total number of w.
 アミン骨格-NR100-において、R100がアルキル基である場合、炭素数は5以下であることが好ましく、3以下であることがより好ましい。アミン骨格-NR100-は、-NH-(R100が水素原子)であることが好ましい。 In the amine skeleton-NR 100- , when R 100 is an alkyl group, the number of carbon atoms is preferably 5 or less, and more preferably 3 or less. The amine skeleton -NR 100- is preferably -NH- (R 100 is a hydrogen atom).
 Rx24及びRx25は、炭素数が1~10のアルキル基であることが好ましく、炭素数が1~5のアルキル基であることがより好ましい。 R x24 and R x25 are preferably alkyl groups having 1 to 10 carbon atoms, and more preferably alkyl groups having 1 to 5 carbon atoms.
 p24及びp25は、2~3の整数であることが好ましく、3であることがより好ましい。 P24 and p25 are preferably integers of 2 to 3, and more preferably 3.
 wは、1以上であることが好ましく、2以上であることがより好ましく、また20以下であることが好ましく、10以下であることがより好ましい。 W is preferably 1 or more, more preferably 2 or more, preferably 20 or less, and more preferably 10 or less.
 IV-3.下記式(c3)で表される有機ケイ素化合物(C)(以下、有機ケイ素化合物(C3)) IV-3. Organosilicon compound (C) represented by the following formula (c3) (hereinafter, organosilicon compound (C3))
Figure JPOXMLDOC01-appb-C000024
 上記式(c3)中、
 Z31、Z32は、それぞれ独立に、加水分解性基及びヒドロキシ基以外の、反応性官能基である。反応性官能基としては、ビニル基、α-メチルビニル基、スチリル基、メタクリロイル基、アクリロイル基、アミノ基、エポキシ基、ウレイド基、又はメルカプト基が挙げられる。Z31、Z32としては、アミノ基、メルカプト基、又はメタクリロイル基が好ましく、特にアミノ基が好ましい。
Figure JPOXMLDOC01-appb-C000024
In the above formula (c3),
Z 31 and Z 32 are reactive functional groups other than the hydrolyzable group and the hydroxy group, respectively. Examples of the reactive functional group include a vinyl group, an α-methylvinyl group, a styryl group, a methacryloyl group, an acryloyl group, an amino group, an epoxy group, a ureido group, or a mercapto group. As Z 31 and Z 32 , an amino group, a mercapto group, or a methacryloyl group is preferable, and an amino group is particularly preferable.
 Rx31、Rx32、Rx33、Rx34は、それぞれ独立して、水素原子又は炭素数が1~4のアルキル基であり、Rx31が複数存在する場合は複数のRx31がそれぞれ異なっていてもよく、Rx32が複数存在する場合は複数のRx32がそれぞれ異なっていてもよく、Rx33が複数存在する場合は複数のRx33がそれぞれ異なっていてもよく、Rx34が複数存在する場合は複数のRx34がそれぞれ異なっていてもよい。Rx31、Rx32、Rx33、Rx34は、水素原子又は炭素数が1~2のアルキル基であることが好ましく、水素原子であることがより好ましい。 R x31, R x32, R x33 , R x34 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R x31 there are a plurality differ plurality of R x31 are each may, if R x32 there are a plurality may be different plural R x32 are each may be the case where R x33 there are a plurality of different plural R x33 are each if R x34 there are multiple May have different R x 34s. R x31 , R x32 , R x33 , and R x34 are preferably hydrogen atoms or alkyl groups having 1 to 2 carbon atoms, and more preferably hydrogen atoms.
 Rfx31、Rfx32、Rfx33、Rfx34は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfx31が複数存在する場合は複数のRfx31がそれぞれ異なっていてもよく、Rfx32が複数存在する場合は複数のRfx32がそれぞれ異なっていてもよく、Rfx33が複数存在する場合は複数のRfx33がそれぞれ異なっていてもよく、Rfx34が複数存在する場合は複数のRfx34がそれぞれ異なっていてもよい。Rfx31、Rfx32、Rfx33、Rfx34は、1個以上の水素原子がフッ素原子に置換された炭素数1~10のアルキル基又はフッ素原子であることが好ましい。 Rf x31 , Rf x32 , Rf x33 , and Rf x34 are independently alkyl groups or fluorine atoms having 1 to 20 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf x31. If you may be different plurality of Rf x31 respectively, differ if the Rf x32 there are a plurality may be different plurality of Rf x32, respectively, a plurality of Rf x33 If Rf x33 is present in plural even if well, a plurality of Rf x34 If Rf x34 there are a plurality may be different from each other. Rf x31 , Rf x32 , Rf x33 , and Rf x34 are preferably alkyl groups or fluorine atoms having 1 to 10 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms.
 Y31は、-NH-、-N(CH3)-又は-O-であり、Y31が複数存在する場合は複数のY31がそれぞれ異なっていてもよい。Y31は-NH-であることが好ましい。 Y 31 is, -NH -, - N (CH 3) - or -O-. And, in the case where the Y 31 there are a plurality may be different plurality of Y 31, respectively. Y 31 is preferably −NH−.
 X31、X32、X33、X34は、それぞれ独立に、-ORc(Rcは、水素原子、炭素数1~4のアルキル基、又はアミノC1-3アルキルジC1-3アルコキシシリル基である)であり、X31が複数存在する場合は複数のX31がそれぞれ異なっていてもよく、X32が複数存在する場合は複数のX32がそれぞれ異なっていてもよく、X33が複数存在する場合は複数のX33がそれぞれ異なっていてもよく、X34が複数存在する場合は複数のX34がそれぞれ異なっていてもよい。X31、X32、X33、X34は、Rcが水素原子、又は炭素数1~2のアルキル基である-ORcであることが好ましく、Rcは水素原子がより好ましい。 X 31 , X 32 , X 33 , and X 34 are independently -OR c (R c is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an amino C 1-3 alkyl di C 1-3 alkoxysilyl. a is a group), if X 31 there are a plurality may be different plurality of X 31 are each, if X 32 there are a plurality may be different plurality of X 32 are each, X 33 is If there are two or more may be multiple X 33 are different each, a plurality of X 34 may be different from each if X 34 there are a plurality. In X 31 , X 32 , X 33 , and X 34 , R c is preferably a hydrogen atom or −OR c , which is an alkyl group having 1 to 2 carbon atoms, and R c is more preferably a hydrogen atom.
 p31は、0~20の整数であり、p32、p33、p34は、それぞれ独立して、0~10の整数であり、p35は、0~5の整数であり、p36は、1~10の整数であり、p37は0又は1である。p31は1~15が好ましく、より好ましくは3~13であり、さらに好ましくは5~10である。p32、p33及びp34は、それぞれ独立して、0~5が好ましく、より好ましくは全て0~2である。p35は、1~5が好ましく、より好ましくは1~3である。p36は、1~5が好ましく、より好ましくは1~3である。p37は1が好ましい。 p31 is an integer of 0 to 20, p32, p33, and p34 are independently integers of 0 to 10, p35 is an integer of 0 to 5, and p36 is an integer of 1 to 10. And p37 is 0 or 1. p31 is preferably 1 to 15, more preferably 3 to 13, and even more preferably 5 to 10. P32, p33 and p34 are each independently preferably 0 to 5, more preferably all 0 to 2. The p35 is preferably 1 to 5, more preferably 1 to 3. p36 is preferably 1 to 5, more preferably 1 to 3. P37 is preferably 1.
 有機ケイ素化合物(C3)は、Z31及びZ32の少なくとも一方がアミノ基であるか、又はY31の少なくとも一つが-NH-又は-N(CH3)-であるという条件を満たし、かつ末端がZ31-及びZ32-であり、-O-が-O-と連結しない限り、p31個の-{C(Rx31)(Rx32)}-、p32個の-{C(Rfx31)(Rfx32)}-、p33個の-{Si(Rx33)(Rx34)}-、p34個の-{Si(Rfx33)(Rfx34)}-、p35個の-Y31-、p36個の-{Si(X31)(X32)-O}-、p37個の-{Si(X33)(X34)}-が任意の順で並んで結合して構成される。p31個の-{C(Rx31)(Rx32)}-は、-{C(Rx31)(Rx32)}-が連続して結合している必要はなく、途中に他の単位を介して結合していてもよく、合計でp31個であればよい。p32~p37で括られる単位についても同様である。 The organosilicon compound (C3) satisfies the condition that at least one of Z 31 and Z 32 is an amino group, or at least one of Y 31 is -NH- or -N (CH 3)-and is terminal. There Z 31 - and Z 32 - a and, unless linking -O- is an -O-, p31 amino - {C (R x31) ( R x32)} -, p32 amino - {C (Rf x31) (Rf x32)} -, p33 amino - {Si (R x33) ( R x34)} -, p34 amino - {Si (Rf x33) ( Rf x34)} -, p35 amino -Y 31 -, p36 It is composed of-{Si (X 31 ) (X 32 ) -O}-and p37- {Si (X 33 ) (X 34 )}-combined side by side in any order. p31 amino - {C (R x31) ( R x32)} - is, - {C (R x31) ( R x32)} - It is not necessary for bonded continuously, through the other units in the middle It may be combined with each other, and a total of p31 may be used. The same applies to the units enclosed by p32 to p37.
 有機ケイ素化合物(C3)としては、Z31及びZ32がアミノ基であり、Rx31及びRx32が水素原子であり、p31が3~13(好ましくは5~10)であり、Rx33及びRx34がいずれも水素原子であり、Rfx31~Rfx34がいずれも1個以上の水素原子がフッ素原子に置換された炭素数1~10のアルキル基又はフッ素原子であり、p32~p34がいずれも0~5であり、Y31が-NH-であり、p35が0~5(好ましくは0~3)であり、X31~X34がいずれも-OHであり、p36が1~5(好ましくは1~3)であり、p37が1である化合物が好ましい。 The organosilicon compound (C3), Z 31 and Z 32 is amino group, R x31 and R x32 are each a hydrogen atom, p31 is 3 to 13 (preferably 5 ~ 10), R x33 and R x34 is a hydrogen atom, Rf x31 to Rf x34 are all alkyl groups or fluorine atoms having 1 to 10 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and p32 to p34 are all. 0 to 5, Y 31 is -NH-, p35 is 0 to 5 (preferably 0 to 3), X 31 to X 34 are all -OH, and p36 is 1 to 5 (preferably). 1 to 3), and a compound having p37 of 1 is preferable.
 有機ケイ素化合物(C3)は、下記式(c3-2)で表されることが好ましい。 The organosilicon compound (C3) is preferably represented by the following formula (c3-2).
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
 前記式(c3-2)中、Z31、Z32、X31、X32、X33、X34、Y31は、式(c3)中のこれらと同義であり、p41~p44は、それぞれ独立に1~6の整数であり、p45、46はそれぞれ独立に0又は1である。 In the formula (c3-2), Z 31 , Z 32 , X 31 , X 32 , X 33 , X 34 , and Y 31 are synonymous with these in the formula (c3), and p41 to p44 are independent of each other. Is an integer of 1 to 6, and p45 and 46 are independently 0 or 1, respectively.
 式(c3-2)において、Z31及びZ32は、アミノ基、メルカプト基、又はメタクリロイル基が好ましく、特にアミノ基が好ましい。X31、X32、X33、X34、は、Rcが水素原子、又は炭素数1~2のアルキル基である-ORcであることが好ましく、Rcが水素原子であることがより好ましい。Y31は-NH-であることが好ましい。p41~p44は、2以上が好ましく、また5以下が好ましく、4以下がより好ましい。p45、p46はいずれも0であることが好ましい。 In the formula (c3-2), Z 31 and Z 32 are preferably an amino group, a mercapto group, or a methacryloyl group, and particularly preferably an amino group. X 31, X 32, X 33 , X 34, is more it is preferred that R c is -OR c is an alkyl group of a hydrogen atom, or C 1 ~ 2, R c is a hydrogen atom preferable. Y 31 is preferably −NH−. P41 to p44 are preferably 2 or more, preferably 5 or less, and more preferably 4 or less. It is preferable that both p45 and p46 are 0.
 前記混合組成物(cc)は、前記有機ケイ素化合物(C)が混合された組成物であり、前記有機ケイ素化合物(C)としては1種でもよいし、2種以上でもよい。混合組成物(cc)は、有機ケイ素化合物(C)を混合することにより得られ、有機ケイ素化合物(C)以外の成分が混合されている場合は、有機ケイ素化合物(C)と、他の成分を混合することにより得られる。前記混合組成物(cc)は、混合後、例えば保管中に反応が進んだものも含む。 The mixed composition (cc) is a composition in which the organosilicon compound (C) is mixed, and the organosilicon compound (C) may be one kind or two or more kinds. The mixed composition (cc) is obtained by mixing the organosilicon compound (C), and when a component other than the organosilicon compound (C) is mixed, the organosilicon compound (C) and other components are mixed. Is obtained by mixing. The mixed composition (cc) also includes those whose reaction has proceeded after mixing, for example, during storage.
 前記混合組成物(cc)の保管中に反応が進んだ例として、前記混合組成物(cc)が、前記有機ケイ素化合物(C)の縮合物を含むことが挙げられ、より具体的には前記混合組成物(cc)が、前記有機ケイ素化合物(C3)が上記X31~X34の少なくともいずれかで縮合して結合した有機ケイ素化合物(C3’)を含むことが挙げられる。 An example in which the reaction proceeds during storage of the mixed composition (cc) is that the mixed composition (cc) contains a condensate of the organosilicon compound (C), and more specifically, the above. It can be mentioned that the mixed composition (cc) contains an organosilicon compound (C3') in which the organosilicon compound (C3) is condensed and bonded at at least one of the above X 31 to X 34.
 前記有機ケイ素化合物(C3’)は、下記式(c31-1)で表される構造(c31-1)を2以上有し、前記構造(c31-1)同士が、下記*3又は*4で鎖状又は環状に結合した化合物であって、下記*3又は*4での結合は、2以上の前記有機ケイ素化合物(C3)の前記X31又はX32の縮合によるものであり、
 下記式(c31-1)の*1及び*2には、それぞれ、下記式(c31-2)のp31、p32、p33、p34、p35、(p36)-1、p37で括られた単位の少なくとも1種が任意の順で結合し末端がZ-である基が結合しており、複数の前記構造(c31-1)ごとに、*1及び*2に結合する基は異なっていてもよく、
 複数の前記構造(c31-1)が鎖状に結合しているときの末端となる*3は水素原子であり、*4はヒドロキシ基である。
The organosilicon compound (C3') has two or more structures (c31-1) represented by the following formula (c31-1), and the structures (c31-1) have the following * 3 or * 4. It is a chain-like or cyclically bonded compound, and the bond at the following * 3 or * 4 is due to the condensation of the X 31 or X 32 of two or more of the organosilicon compounds (C3).
* 1 and * 2 of the following formula (c31-1) have at least the units enclosed by p31, p32, p33, p34, p35, (p36) -1, and p37 of the following formula (c31-2), respectively. One type is bonded in any order and groups having a Z-terminal are bonded, and the groups that are bonded to * 1 and * 2 may be different for each of the plurality of structures (c31-1).
When the plurality of structures (c31-1) are bonded in a chain, * 3 at the end is a hydrogen atom, and * 4 is a hydroxy group.
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
 前記式(c31-2)中、
 Zは、加水分解性基及びヒドロキシ基以外の、反応性官能基であり、
 Rx31、Rx32、Rx33、Rx34、Rfx31、Rfx32、Rfx33、Rf34、Y31、X31、X32、X33、X34、p31~p37は、前記式(c3)中のこれら符号と同義である。
In the above formula (c31-2),
Z is a reactive functional group other than the hydrolyzable group and the hydroxy group.
R x31 , R x32 , R x33 , R x34 , Rf x31 , Rf x32 , Rf x33 , Rf 34 , Y 31 , X 31 , X 32 , X 33 , X 34 , p31 to p37 are included in the above equation (c3). It is synonymous with these codes of.
 有機ケイ素化合物(C3)が前記式(c3-2)で表される化合物である場合、有機ケイ素化合物(C3’)としては、例えば下記式(c31-3)で表される構造が下記*3又は*4で鎖状又は環状に結合した化合物が挙げられる。下記式(c31-3)で表される構造が鎖状に結合する場合には、末端となる*3は水素原子であり、末端となる*4はヒドロキシ基である。 When the organosilicon compound (C3) is a compound represented by the above formula (c3-2), as the organosilicon compound (C3'), for example, the structure represented by the following formula (c31-3) is described below * 3. Alternatively, a compound bonded in a chain or cyclic manner at * 4 can be mentioned. When the structure represented by the following formula (c31-3) is bonded in a chain, the terminal * 3 is a hydrogen atom and the terminal * 4 is a hydroxy group.
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
 前記式(c31-3)中の符号は、全て前記式(c3-2)の符号と同義である。 The codes in the formula (c31-3) are all synonymous with the codes in the formula (c3-2).
 有機ケイ素化合物(C3’)は、前記式(c31-3)で表される構造が2~10(好ましくは3~8)結合した化合物であることが好ましい。 The organosilicon compound (C3') is preferably a compound in which the structure represented by the above formula (c31-3) is bonded by 2 to 10 (preferably 3 to 8).
 V.溶剤(E)
 前記混合組成物(cc)は、溶剤(E)が混合されていることが好ましい。溶剤(E)は特に限定されず、例えば水、アルコール系溶剤、ケトン系溶剤、エーテル系溶剤、炭化水素系溶剤、エステル系溶剤などを用いることができ、特に水、アルコール系溶剤、ケトン系溶剤、炭化水素系溶剤が好ましい。
V. Solvent (E)
The mixed composition (cc) is preferably mixed with the solvent (E). The solvent (E) is not particularly limited, and for example, water, an alcohol solvent, a ketone solvent, an ether solvent, a hydrocarbon solvent, an ester solvent, or the like can be used, and in particular, water, an alcohol solvent, or a ketone solvent can be used. , A hydrocarbon solvent is preferable.
 アルコール系溶剤としては、メタノール、エタノール、1-プロパノール、2-プロパノール、1-ブタノールなどが挙げられる。
 ケトン系溶剤としては、アセトン、メチルエチルケトン、メチルイソブチルケトンなどが挙げられる。
 エーテル系溶剤としては、ジエチルエーテル、ジプロピルエーテル、テトラヒドロフラン、1,4-ジオキサンなどが挙げられる。
 炭化水素系溶剤としては、ペンタン、ヘキサンなどの脂肪族炭化水素系溶剤、シクロヘキサンなどの脂環式炭化水素系溶剤、ベンゼン、トルエン、キシレンなどの芳香族炭化水素系溶剤などが挙げられる。
 エステル系溶剤としては、酢酸エチル、酢酸プロピル、酢酸ブチルなどが挙げられる。
Examples of the alcohol solvent include methanol, ethanol, 1-propanol, 2-propanol, 1-butanol and the like.
Examples of the ketone solvent include acetone, methyl ethyl ketone, and methyl isobutyl ketone.
Examples of the ether solvent include diethyl ether, dipropyl ether, tetrahydrofuran, 1,4-dioxane and the like.
Examples of the hydrocarbon solvent include an aliphatic hydrocarbon solvent such as pentane and hexane, an alicyclic hydrocarbon solvent such as cyclohexane, and an aromatic hydrocarbon solvent such as benzene, toluene and xylene.
Examples of the ester solvent include ethyl acetate, propyl acetate, butyl acetate and the like.
 前記組成物(cc)の全体を100質量%としたときの、前記有機ケイ素化合物(C)の合計量は、0.005質量%以上が好ましく、より好ましくは0.01質量%以上であり、更に好ましくは0.02質量%以上であり、一層好ましくは0.1質量%以上であり、また5質量%以下が好ましく、より好ましくは3質量%以下であり、更に好ましくは2質量%以下である。上記の有機ケイ素化合物(C)の量は、組成物の調製時に調整できる。前記有機ケイ素化合物(C)の量は、組成物の分析結果から算出してもよい。なお、本明細書において、各成分の量、質量比又はモル比の範囲を記載している場合、上記と同様に、該範囲は、組成物の調製時に調整できる。 When the total amount of the composition (cc) is 100% by mass, the total amount of the organosilicon compound (C) is preferably 0.005% by mass or more, more preferably 0.01% by mass or more. It is more preferably 0.02% by mass or more, further preferably 0.1% by mass or more, still preferably 5% by mass or less, more preferably 3% by mass or less, still more preferably 2% by mass or less. be. The amount of the above-mentioned organosilicon compound (C) can be adjusted at the time of preparation of the composition. The amount of the organosilicon compound (C) may be calculated from the analysis result of the composition. When the range of the amount, mass ratio or molar ratio of each component is described in the present specification, the range can be adjusted at the time of preparation of the composition in the same manner as described above.
 前記基材(s)は、前記中間層(c)側の面で、入射した光の反射を防止する機能を有する層であることが好ましく、具体的には380~780nmの可視光領域において、前記中間層(c)側の面で、反射率が5.0%以下程度に低減された反射特性を示す層であることが好ましく、より好ましくは4.80%以下であり、更に好ましくは4.5%以下である。該反射率は、波長530nmの分光反射率で評価してもよい。 The base material (s) is preferably a layer having a function of preventing reflection of incident light on the surface on the intermediate layer (c) side, specifically, in a visible light region of 380 to 780 nm. The surface on the intermediate layer (c) side is preferably a layer exhibiting a reflection characteristic in which the reflectance is reduced to about 5.0% or less, more preferably 4.80% or less, still more preferably 4. It is less than 5.5%. The reflectance may be evaluated by the spectral reflectance at a wavelength of 530 nm.
 前記基材(s)は、少なくとも中間層(c)側の最表層において、表面Si比が1原子%以上であることが好ましく、基材(s)は有機系材料または無機系材料が好ましい。前記表面Si比が所定以上であると、基材(s)表面と、中間層(c)又は撥水層(r)を構成する成分とが結合しやすくなり、本発明の積層体の撥水層(r)側表面の耐摩耗性がより向上する。前記表面Si比は、5原子%以上がより好ましく、更に好ましくは10原子%以上であり、一層好ましくは20原子%以上であり、また40原子%以下であってもよい。 The base material (s) preferably has a surface Si ratio of 1 atomic% or more in at least the outermost layer on the intermediate layer (c) side, and the base material (s) is preferably an organic material or an inorganic material. When the surface Si ratio is at least a predetermined value, the surface of the base material (s) and the components constituting the intermediate layer (c) or the water-repellent layer (r) are likely to be bonded to each other, and the laminate of the present invention is water-repellent. The wear resistance of the surface on the layer (r) side is further improved. The surface Si ratio is more preferably 5 atomic% or more, further preferably 10 atomic% or more, still more preferably 20 atomic% or more, and may be 40 atomic% or less.
 前記基材(s)は、1種の材料で構成されていてもよいし、2種以上の材料で構成されていてもよい。前記基材(s)を構成する材料としては例えば、アクリル樹脂、ポリカーボネート樹脂、ポリエステル樹脂(ポリエチレンテレフタレートなど)、スチレン樹脂、アクリル-スチレン共重合樹脂、セルロース樹脂、ポリオレフィン樹脂、ビニル系樹脂(ポリエチレン、ポリ塩化ビニル、ポリスチレン、ビニルベンジルクロライド系樹脂、ポリビニルアルコール等)などの熱可塑性樹脂;若しくはフェノール樹脂、ユリア樹脂、メラミン樹脂、エポキシ樹脂、不飽和ポリエステル、シリコーン樹脂、ウレタン樹脂等の熱硬化性樹脂;若しくはポリアミド系樹脂、ポリイミド系樹脂、ポリアミドイミド系樹脂等のエンジニアリングプラスチック等の樹脂材、又はチタン、ジルコニウム、アルミニウム、ニオブ、タンタル、ランタン若しくはケイ素等の金属の酸化物が挙げられる。 The base material (s) may be composed of one kind of material or two or more kinds of materials. Examples of the material constituting the base material (s) include acrylic resin, polycarbonate resin, polyester resin (polyethylene terephthalate, etc.), styrene resin, acrylic-styrene copolymer resin, cellulose resin, polyolefin resin, and vinyl resin (polyethylene, Thermoplastic resins such as polyvinyl chloride, polystyrene, vinylbenzyl chloride resin, polyvinyl alcohol, etc .; or thermosetting resins such as phenol resin, urea resin, melamine resin, epoxy resin, unsaturated polyester, silicone resin, urethane resin, etc. Alternatively, resin materials such as engineering plastics such as polyamide resins, polyimide resins and polyamideimide resins, or metal oxides such as titanium, zirconium, aluminum, niobium, tantalum, lanthanum or silicon can be mentioned.
 前記基材(s)が1種の材料で構成される場合、樹脂層であって、表面Si比が1原子%以上である層であってよく、シリカ等の金属酸化物層であってもよい。 When the base material (s) is composed of one kind of material, it may be a resin layer having a surface Si ratio of 1 atomic% or more, or even a metal oxide layer such as silica. good.
 前記基材(s)が2種以上の材料で構成される場合、樹脂層の上に、電子機器のディスプレイ等の耐摩耗性が要求される用途で物品を傷から守るために設けられる保護層(以下、ハードコート層という場合がある。)が設けられたものであることが好ましい。前記樹脂層を構成する材料としては、上述の熱硬化性樹脂、熱可塑性樹脂、又はエンジニアリングプラスチックを用いることができ、特にポリエステル樹脂が好ましい。上記したハードコート層は、表面硬度を有する層であり、その硬度は例えば鉛筆硬度で2H以上である。ハードコート層は、単層構造であってもよく、多層構造であってもよい。ハードコート層はハードコート層樹脂を含んでなり、ハードコート層樹脂としては、例えば、アクリル系樹脂、エポキシ系樹脂、ウレタン系樹脂、ビニルベンジルクロライド系樹脂、ビニル系樹脂もしくはシリコーン系樹脂又はこれらの混合樹脂等の紫外線硬化型、電子線硬化型、又は熱硬化型の樹脂が挙げられ、更に上記した通り、これらハードコート層を形成する樹脂において表面Si比が1原子%以上であることが好ましい。特に、ハードコート層は、高硬度を発現するためには、アクリル系樹脂を含み、表面Si比が1原子%以上であることが好ましい。上記中間層(c)を介した上記撥水層(r)との密着性が良好となる傾向が見られることから、エポキシ系樹脂を含むことも好ましい。 When the base material (s) is composed of two or more kinds of materials, a protective layer provided on the resin layer to protect the article from scratches in applications requiring abrasion resistance such as displays of electronic devices. (Hereinafter, it may be referred to as a hard coat layer.) It is preferable that the layer is provided. As the material constituting the resin layer, the above-mentioned thermosetting resin, thermoplastic resin, or engineering plastic can be used, and polyester resin is particularly preferable. The above-mentioned hard coat layer is a layer having a surface hardness, and the hardness is, for example, a pencil hardness of 2H or more. The hard coat layer may have a single layer structure or a multi-layer structure. The hard coat layer contains a hard coat layer resin, and examples of the hard coat layer resin include acrylic resin, epoxy resin, urethane resin, vinylbenzyl chloride resin, vinyl resin, silicone resin, and these. Examples thereof include ultraviolet curable type, electron beam curable type, and heat curable type resins such as mixed resins, and as described above, it is preferable that the surface Si ratio of the resin forming the hard coat layer is 1 atomic% or more. .. In particular, the hard coat layer preferably contains an acrylic resin and has a surface Si ratio of 1 atomic% or more in order to exhibit high hardness. It is also preferable to include an epoxy resin because the adhesion to the water-repellent layer (r) via the intermediate layer (c) tends to be good.
 ハードコート層は、更に紫外線吸収剤を含んでいてもよいし、シリカ、アルミナ等の金属酸化物や、ポリオルガノシロキサン等の無機フィラーを含んでいてもよい。このような無機フィラーを含むことによって、上記中間層(c)を介した上記撥水層(r)との密着性を向上できる。 The hard coat layer may further contain an ultraviolet absorber, a metal oxide such as silica or alumina, or an inorganic filler such as polyorganosiloxane. By including such an inorganic filler, the adhesion to the water-repellent layer (r) via the intermediate layer (c) can be improved.
 基材(s)が2種以上の材料で構成される場合、樹脂層の上に反射防止層が設けられたものであってもよいし、また、樹脂層の上に設けられたハードコート層の上に更に反射防止層を有しているものであることも好ましく、この場合、樹脂層、ハードコート層、反射防止層、中間層(c)、撥水層(r)の順に積層される。前記樹脂層を構成する材料としては、上述の熱硬化性樹脂、熱可塑性樹脂、又はエンジニアリングプラスチックを用いることができる。前記反射防止層は、入射した光の反射を防止する機能を有する層であり、380~780nmの可視光領域において、反射率が5%以下程度に低減された反射特性を示す層である。反射防止層の構造は特に限定されず、単層構造であってもよいし、多層構造であってもよい。多層構造の場合、低屈折率層と高屈折率層とを交互に積層した構造が好ましく、積層数は合計で2~20であることが好ましい。高屈折率層を構成する材料としては、チタン、ジルコニウム、アルミニウム、ニオブ、タンタル又はランタンの酸化物などが挙げられ、低屈折率層を構成する材料としてはケイ素の酸化物(すなわちシリカ)などが挙げられる。多層構造の反射防止層としては、SiO2とZrO2が、または、SiOとNbが交互に積層され、基材(s)と反対側の最外層がSiO2である構造が好ましい。反射防止層は、例えば蒸着法によって形成することができる。 When the base material (s) is composed of two or more kinds of materials, an antireflection layer may be provided on the resin layer, or a hard coat layer provided on the resin layer. It is also preferable that an antireflection layer is further provided on the top, and in this case, the resin layer, the hard coat layer, the antireflection layer, the intermediate layer (c), and the water repellent layer (r) are laminated in this order. .. As the material constituting the resin layer, the above-mentioned thermosetting resin, thermoplastic resin, or engineering plastic can be used. The antireflection layer is a layer having a function of preventing the reflection of incident light, and is a layer exhibiting a reflection characteristic in which the reflectance is reduced to about 5% or less in the visible light region of 380 to 780 nm. The structure of the antireflection layer is not particularly limited, and may be a single-layer structure or a multi-layer structure. In the case of a multi-layer structure, a structure in which low refractive index layers and high refractive index layers are alternately laminated is preferable, and the total number of layers is preferably 2 to 20. Examples of the material constituting the high refractive index layer include oxides of titanium, zirconium, aluminum, niobium, tantalum and lanthanum, and examples of the material constituting the low refractive index layer include oxides of silicon (that is, silica). Can be mentioned. As the antireflection layer having a multi-layer structure, a structure in which SiO 2 and ZrO 2 or SiO 2 and Nb 2 O 5 are alternately laminated and the outermost layer on the opposite side to the base material (s) is SiO 2 is preferable. .. The antireflection layer can be formed, for example, by a vapor deposition method.
 前記基材(s)において、前記した反射特性及び/又は前記材料は、前記基材(s)の少なくとも中間層(c)側の最表層において満たしていればよく、好ましくは、前記基材(s)の中間層(c)側の最表層から10%以上の厚み(前記基材(s)の厚み)で満たしていればよく、より好ましくは40%以上の厚みで満たしていればよく、基材(s)の全体において満たしていることが更に好ましい。 In the base material (s), the reflection characteristics and / or the material may be satisfied in at least the outermost layer on the intermediate layer (c) side of the base material (s), and preferably the base material (s). s) may be filled with a thickness of 10% or more (thickness of the base material (s)) from the outermost surface layer on the intermediate layer (c) side, and more preferably 40% or more. It is more preferable that the entire base material (s) is filled.
 前記基材(s)の厚みは、例えば1~498μmであり、好ましくは1~300μm、より好ましくは1~100μmであり、一層好ましくは10~95μmであり、特に好ましくは30~90μmである。 The thickness of the base material (s) is, for example, 1 to 498 μm, preferably 1 to 300 μm, more preferably 1 to 100 μm, still more preferably 10 to 95 μm, and particularly preferably 30 to 90 μm.
 本発明の積層体を、後述の実施例に記載した方法に従って評価した際の水接触角(初期接触角)は、例えば105°以上であり、より好ましくは110°以上であり、また例えば125°以下である。 The water contact angle (initial contact angle) when the laminate of the present invention is evaluated according to the method described in Examples described later is, for example, 105 ° or more, more preferably 110 ° or more, and for example 125 °. It is as follows.
 次に、本発明の積層体の製造方法について説明する。 Next, the method for producing the laminate of the present invention will be described.
 本発明の積層体を製造する第1の方法は、(i)基材(s)上に前記混合組成物(cc)を塗布する工程と、(ii)前記混合組成物(cc)の塗布面に、に前記混合組成物(ca)を塗布する工程と、(iii)前記混合組成物(cc)と前記混合組成物(ca)を硬化させる工程を含み、前記混合組成物(cc)の塗布層から前記中間層(c)を形成し、前記混合組成物(ca)の塗布層から前記撥水層(r)を形成する。 The first method for producing the laminate of the present invention includes (i) a step of applying the mixed composition (cc) on the base material (s) and (ii) a coated surface of the mixed composition (cc). Including a step of applying the mixed composition (ca) to, and (iii) a step of curing the mixed composition (cc) and the mixed composition (ca), and applying the mixed composition (cc). The intermediate layer (c) is formed from the layer, and the water-repellent layer (r) is formed from the coating layer of the mixed composition (ca).
 前記混合組成物(cc)を塗布する方法としては、公知の方法で行うことができるが、スピンコート法またはディップコート法が好ましい。 As a method of applying the mixed composition (cc), a known method can be used, but a spin coating method or a dip coating method is preferable.
 次に、撥水層(r)形成用の前記混合組成物(ca)を前記混合組成物(cc)の塗布面に塗布し、乾燥することで前記混合組成物(cc)の塗布層から前記中間層(c)を形成し、前記混合組成物(ca)の塗布層から前記撥水層(r)を形成できる。前記中間層(c)は、前記混合組成物(cc)の塗布中に形成してもよいし、塗布後に形成してもよく、前記中間層(c)と前記撥水層(r)の形成が同時に進行してもよい。前記撥水層(r)形成用の組成物を塗布する方法としては、例えばディップコート法、ロールコート法、バーコート法、スピンコート法、スプレーコート法、ダイコート法、グラビアコート法などが挙げられる。 Next, the mixed composition (ca) for forming the water-repellent layer (r) is applied to the coated surface of the mixed composition (cc) and dried to obtain the mixed composition (cc) from the coated layer. The intermediate layer (c) can be formed, and the water-repellent layer (r) can be formed from the coating layer of the mixed composition (ca). The intermediate layer (c) may be formed during or after the application of the mixed composition (cc), and the intermediate layer (c) and the water-repellent layer (r) may be formed. May proceed at the same time. Examples of the method for applying the composition for forming the water-repellent layer (r) include a dip coating method, a roll coating method, a bar coating method, a spin coating method, a spray coating method, a die coating method, and a gravure coating method. ..
 撥水層(r)形成用の組成物を塗布した後、常温、大気中で、例えば1時間以上(通常24時間以下)静置することで本発明の積層体を製造できる。本発明において常温とは、5~60℃であり、好ましくは15~40℃の温度範囲である。常温で静置する際の湿度条件は50~90%RHとしてもよい。また、撥水層(r)形成用の組成物を塗布した後は、60℃を超える温度(通常100℃以下。80℃以下であってもよい)に加熱して5分~60分(好ましくは20分~40分)程度保持してもよい。 After applying the composition for forming the water-repellent layer (r), the laminate of the present invention can be produced by allowing it to stand at room temperature in the air for, for example, 1 hour or more (usually 24 hours or less). In the present invention, room temperature is 5 to 60 ° C, preferably 15 to 40 ° C. The humidity condition when the product is allowed to stand at room temperature may be 50 to 90% RH. After applying the composition for forming the water-repellent layer (r), it is heated to a temperature exceeding 60 ° C. (usually 100 ° C. or lower, and may be 80 ° C. or lower) for 5 to 60 minutes (preferably). May be held for about 20 to 40 minutes).
 また、本発明の積層体を製造する第2の方法は、前記基材(s)に、前記有機ケイ素化合物(C)を蒸着して中間層(c)を形成し、前記中間層(c)上に、前記混合組成物(ca)を塗布して硬化させ、前記混合組成物(ca)の塗布層から前記撥水層(r)を形成する。前記有機ケイ素化合物(C)を蒸着して前記中間層(c)を形成するに際しては、前記有機ケイ素化合物(C)単体を基材(s)に蒸着してもよいし、前記有機ケイ素化合物(C)と溶剤の混合組成物から溶剤を除去して得られる固形物(すなわち前記有機ケイ素化合物(C))を基材(s)に蒸着してもよい。撥水層(r)形成用組成物を塗布した後は、前記第1の方法と同様にすればよい。 Further, in the second method for producing the laminate of the present invention, the organosilicon compound (C) is vapor-deposited on the base material (s) to form the intermediate layer (c), and the intermediate layer (c) is formed. The mixed composition (ca) is applied onto the coating layer and cured to form the water-repellent layer (r) from the coating layer of the mixed composition (ca). When the organosilicon compound (C) is vapor-deposited to form the intermediate layer (c), the organosilicon compound (C) alone may be vapor-deposited on the base material (s), or the organosilicon compound (c) may be vapor-deposited. A solid substance (that is, the organosilicon compound (C)) obtained by removing the solvent from the mixed composition of C) and the solvent may be vapor-deposited on the base material (s). After applying the composition for forming the water-repellent layer (r), the same procedure as in the first method may be applied.
 前記組成物(cc)を塗布する前又は前記有機ケイ素化合物(C)を蒸着する前に、前記基材(s)に親水化処理を施しておくことが好ましい。前記親水化処理としては、コロナ処理、プラズマ処理、紫外線処理、イオンクリーニング処理等の親水化処理が挙げられ、プラズマ処理、イオンクリーニング処理がより好ましい。プラズマ処理等の親水化処理を行うことで、基材の表面にOH基やCOOH基などの官能基を形成させることができ、基材表面にこのような官能基が形成されている場合に特に前記中間層(c)と前記基材(s)との密着性がより向上できる。 It is preferable that the base material (s) is hydrophilized before the composition (cc) is applied or before the organosilicon compound (C) is vapor-deposited. Examples of the hydrophilic treatment include hydrophilization treatments such as corona treatment, plasma treatment, ultraviolet treatment, and ion cleaning treatment, and plasma treatment and ion cleaning treatment are more preferable. By performing hydrophilization treatment such as plasma treatment, functional groups such as OH groups and COOH groups can be formed on the surface of the base material, especially when such functional groups are formed on the surface of the base material. The adhesion between the intermediate layer (c) and the base material (s) can be further improved.
<フレキシブル表示装置>
 本発明は、本発明の光学積層体を備える、フレキシブル表示装置も提供する。本発明の積層体は、好ましくはフレキシブル表示装置において前面板として用いることができ、該前面板はウインドウフィルムと称されることがある。該フレキシブル表示装置は、フレキシブル表示装置用積層体と、有機EL表示パネルとからなることが好ましく、有機EL表示パネルに対して視認側にフレキシブル表示装置用積層体が配置され、折り曲げ可能に構成されている。フレキシブル表示装置用積層体は、さらに偏光板(好ましくは円偏光板)、タッチセンサ等を含有していてもよく、それらの積層順は任意であるが、視認側からウインドウフィルム(すなわち、本発明の積層体)、偏光板、タッチセンサの順、又は、ウインドウフィルム、タッチセンサ、偏光板の順に積層されていることが好ましい。タッチセンサよりも視認側に偏光板が存在すると、タッチセンサのパターンが視認されにくくなり表示画像の視認性が良くなるので好ましい。それぞれの部材は接着剤、粘着剤等を用いて積層することができる。また、フレキシブル表示装置は、前記ウインドウフィルム、偏光板、タッチセンサのいずれかの層の少なくとも一方の面に形成された遮光パターンを具備することができる。
<Flexible display device>
The present invention also provides a flexible display device comprising the optical laminate of the present invention. The laminate of the present invention can preferably be used as a front plate in a flexible display device, and the front plate may be referred to as a window film. The flexible display device is preferably composed of a laminated body for a flexible display device and an organic EL display panel, and the laminated body for the flexible display device is arranged on the visual side with respect to the organic EL display panel and is configured to be bendable. ing. The laminated body for a flexible display device may further contain a polarizing plate (preferably a circular polarizing plate), a touch sensor, and the like, and the stacking order thereof is arbitrary, but the window film (that is, the present invention) is viewed from the visual side. It is preferable that the laminated body), the polarizing plate, and the touch sensor are laminated in this order, or the window film, the touch sensor, and the polarizing plate are laminated in this order. If a polarizing plate is present on the visual side of the touch sensor, the pattern of the touch sensor is less likely to be visually recognized and the visibility of the displayed image is improved, which is preferable. Each member can be laminated using an adhesive, an adhesive, or the like. Further, the flexible display device can be provided with a light-shielding pattern formed on at least one surface of any of the layers of the window film, the polarizing plate, and the touch sensor.
<円偏光板>
 本発明のフレキシブル表示装置は、上記の通り、偏光板、中でも円偏光板を備えることが好ましい。円偏光板は、直線偏光板にλ/4位相差板を積層することにより、右又は左円偏光成分のみを透過させる機能を有する機能層である。たとえば外光を右円偏光に変換して有機ELパネルで反射されて左円偏光となった外光を遮断し、有機ELの発光成分のみを透過させることで反射光の影響を抑制して画像を見やすくするために用いられる。円偏光機能を達成するためには、直線偏光板の吸収軸とλ/4位相差板の遅相軸は理論上45度である必要があるが、実用的には45±10度である。直線偏光板とλ/4位相差板は必ずしも隣接して積層される必要はなく、吸収軸と遅相軸の関係が前述の範囲を満足していればよい。全波長において完全な円偏光を達成することが好ましいが実用上は必ずしもその必要はないので本発明における円偏光板は楕円偏光板をも包含する。直線偏光板の視認側にさらにλ/4位相差フィルムを積層して、出射光を円偏光とすることで偏光サングラスをかけた状態での視認性を向上させることも好ましい。
<Circular polarizing plate>
As described above, the flexible display device of the present invention preferably includes a polarizing plate, particularly a circular polarizing plate. The circular polarizing plate is a functional layer having a function of transmitting only a right or left circularly polarized light component by laminating a λ / 4 retardation plate on a linear polarizing plate. For example, the external light is converted to right-handed circularly polarized light and reflected by the organic EL panel to block the left-handed circularly polarized light, and only the light emitting component of the organic EL is transmitted to suppress the influence of the reflected light. It is used to make it easier to see. In order to achieve the circularly polarized light function, the absorption axis of the linear polarizing plate and the slow axis of the λ / 4 retardation plate need to be theoretically 45 degrees, but practically, they are 45 ± 10 degrees. The linear polarizing plate and the λ / 4 retardation plate do not necessarily have to be laminated adjacent to each other, and the relationship between the absorption axis and the slow phase axis may satisfy the above range. It is preferable to achieve perfect circularly polarized light at all wavelengths, but it is not always necessary in practical use. Therefore, the circularly polarizing plate in the present invention also includes an elliptical polarizing plate. It is also preferable to further laminate a λ / 4 retardation film on the visible side of the linear polarizing plate to convert the emitted light into circularly polarized light to improve the visibility when wearing polarized sunglasses.
 直線偏光板は、透過軸方向に振動している光は通すが、それとは垂直な振動成分の偏光を遮断する機能を有する機能層である。前記直線偏光板は、直線偏光子単独又は直線偏光子及びその少なくとも一方の面に貼り付けられた保護フィルムを備えた構成であってもよい。前記直線偏光板の厚さは、200μm以下であってもよく、好ましくは0.5~100μmである。直線偏光板の厚さが前記の範囲にあると直線偏光板の柔軟性が低下し難い傾向にある。 The linear polarizing plate is a functional layer that allows light vibrating in the transmission axis direction to pass through, but has the function of blocking the polarization of vibration components perpendicular to it. The linear polarizing plate may be configured to include a linear polarizing element alone or a linear polarizing element and a protective film attached to at least one surface thereof. The thickness of the linear polarizing plate may be 200 μm or less, preferably 0.5 to 100 μm. When the thickness of the linear polarizing plate is within the above range, the flexibility of the linear polarizing plate tends to be difficult to decrease.
 前記直線偏光子は、ポリビニルアルコール(以下、PVAと略すことがある)系フィルムを染色、延伸することで製造されるフィルム型偏光子であってもよい。延伸によって配向したPVA系フィルムに、ヨウ素等の二色性色素が吸着、又はPVAに吸着した状態で延伸されることで二色性色素が配向し、偏光性能を発揮する。前記フィルム型偏光子の製造においては、他に膨潤、ホウ酸による架橋、水溶液による洗浄、乾燥等の工程を有していてもよい。延伸や染色工程はPVA系フィルム単独で行ってもよいし、ポリエチレンテレフタレートのような他のフィルムと積層された状態で行うこともできる。用いられるPVA系フィルムの厚さは好ましくは10~100μmであり、前記延伸倍率は好ましくは2~10倍である。
 さらに前記偏光子の他の一例としては、液晶偏光組成物を塗布して形成する液晶塗布型偏光子が挙げられる。前記液晶偏光組成物は、液晶性化合物及び二色性色素化合物を含むことができる。前記液晶性化合物は、液晶状態を示す性質を有していればよく、特にスメクチック相等の高次の配向状態を有していると高い偏光性能を発揮することができるため好ましい。また、液晶性化合物は、重合性官能基を有することが好ましい。
 前記二色性色素化合物は、前記液晶性化合物とともに配向して二色性を示す色素であって、重合性官能基を有していてもよく、また、二色性色素自身が液晶性を有していてもよい。
 液晶偏光組成物に含まれる化合物のいずれかは重合性官能基を有する。前記液晶偏光組成物はさらに開始剤、溶剤、分散剤、レベリング剤、安定剤、界面活性剤、架橋剤、シランカップリング剤などを含むことができる。
 前記液晶偏光層は、配向膜上に液晶偏光組成物を塗布して液晶偏光層を形成することにより製造される。液晶偏光層は、フィルム型偏光子に比べて厚さを薄く形成することができ、その厚さは好ましくは0.5~10μm、より好ましくは1~5μmである。
The linear polarizer may be a film-type polarizer produced by dyeing and stretching a polyvinyl alcohol (hereinafter, may be abbreviated as PVA) -based film. A dichroic dye such as iodine is adsorbed on the PVA-based film oriented by stretching, or the dichroic dye is oriented in a state of being adsorbed on the PVA to exhibit polarization performance. In the production of the film-type polarizer, other steps such as swelling, cross-linking with boric acid, washing with an aqueous solution, and drying may be included. The stretching and dyeing steps may be performed on the PVA-based film alone, or may be performed in a state of being laminated with another film such as polyethylene terephthalate. The thickness of the PVA-based film used is preferably 10 to 100 μm, and the draw ratio is preferably 2 to 10 times.
Further, as another example of the above-mentioned polarizer, a liquid crystal coating type polarizer formed by coating a liquid crystal polarizing composition can be mentioned. The liquid crystal polarizing composition may contain a liquid crystal compound and a dichroic dye compound. The liquid crystal compound may have a property of exhibiting a liquid crystal state, and is particularly preferable when it has a higher-order orientation state such as a smectic phase because it can exhibit high polarization performance. Further, the liquid crystal compound preferably has a polymerizable functional group.
The dichroic dye compound is a dye that is oriented together with the liquid crystal compound and exhibits dichroism, and may have a polymerizable functional group, and the dichroic dye itself has liquid crystallinity. You may be doing it.
Any of the compounds contained in the liquid crystal polarizing composition has a polymerizable functional group. The liquid crystal polarizing composition can further contain an initiator, a solvent, a dispersant, a leveling agent, a stabilizer, a surfactant, a cross-linking agent, a silane coupling agent and the like.
The liquid crystal polarizing layer is manufactured by applying a liquid crystal polarizing composition on an alignment film to form a liquid crystal polarizing layer. The liquid crystal polarizing layer can be formed to be thinner than the film-type polarizing element, and the thickness is preferably 0.5 to 10 μm, more preferably 1 to 5 μm.
 前記配向膜は、例えば基材上に配向膜形成組成物を塗布し、ラビング、偏光照射等により配向性を付与することにより製造される。前記配向膜形成組成物は、配向剤を含み、さらに溶剤、架橋剤、開始剤、分散剤、レベリング剤、シランカップリング剤等を含んでいてもよい。前記配向剤としては、例えば、ポリビニルアルコール類、ポリアクリレート類、ポリアミック酸類、ポリイミド類が挙げられる。偏光照射により配向性を付与する配向剤を用いる場合、シンナメート基を含む配向剤を使用することが好ましい。前記配向剤として使用される高分子の重量平均分子量は、例えば、10,000~1,000,000程度である。前記配向膜の厚さは、好ましくは5~10,000nmであり、配向規制力が十分に発現される点で、より好ましくは10~500nmである。
 前記液晶偏光層は基材から剥離して転写して積層することもできるし、前記基材をそのまま積層することもできる。前記基材が、保護フィルムや位相差板、ウインドウフィルムの透明基材としての役割を担うことも好ましい。
The alignment film is produced, for example, by applying an alignment film forming composition on a substrate and imparting orientation by rubbing, polarized light irradiation, or the like. The alignment film forming composition contains an alignment agent, and may further contain a solvent, a cross-linking agent, an initiator, a dispersant, a leveling agent, a silane coupling agent, and the like. Examples of the alignment agent include polyvinyl alcohols, polyacrylates, polyamic acids, and polyimides. When an orientation agent that imparts orientation by polarization irradiation is used, it is preferable to use an orientation agent containing a synnamate group. The weight average molecular weight of the polymer used as the alignment agent is, for example, about 10,000 to 1,000,000. The thickness of the alignment film is preferably 5 to 10,000 nm, and more preferably 10 to 500 nm in that the alignment regulating force is sufficiently exhibited.
The liquid crystal polarizing layer can be peeled off from the base material, transferred and laminated, or the base material can be laminated as it is. It is also preferable that the base material serves as a transparent base material for a protective film, a retardation plate, and a window film.
 前記保護フィルムとしては、透明な高分子フィルムであればよく前記ウインドウフィルムの透明基材に使用される材料や添加剤と同じものが使用できる。また、エポキシ樹脂等のカチオン硬化組成物やアクリレート等のラジカル硬化組成物を塗布して硬化して得られるコーティング型の保護フィルムであってもよい。該保護フィルムは、必要により可塑剤、紫外線吸収剤、赤外線吸収剤、顔料や染料のような着色剤、蛍光増白剤、分散剤、熱安定剤、光安定剤、帯電防止剤、酸化防止剤、滑剤、溶剤等を含んでいてもよい。該保護フィルムの厚さは、好ましくは200μm以下、より好ましくは1~100μmである。保護フィルムの厚さが前記の範囲にあると、該フィルムの柔軟性が低下し難い傾向にある。 As the protective film, any transparent polymer film may be used, and the same materials and additives used for the transparent base material of the window film can be used. Further, it may be a coating type protective film obtained by applying a cationic curing composition such as an epoxy resin or a radical curing composition such as acrylate and curing the film. The protective film may be a plasticizer, an ultraviolet absorber, an infrared absorber, a colorant such as a pigment or a dye, a fluorescent whitening agent, a dispersant, a heat stabilizer, a light stabilizer, an antioxidant, an antioxidant, if necessary. , Lubricants, solvents and the like may be contained. The thickness of the protective film is preferably 200 μm or less, more preferably 1 to 100 μm. When the thickness of the protective film is within the above range, the flexibility of the film tends to be difficult to decrease.
 前記λ/4位相差板は、入射光の進行方向に直行する方向(フィルムの面内方向)にλ/4の位相差を与えるフィルムである。前記λ/4位相差板は、セルロース系フィルム、オレフィン系フィルム、ポリカーボネート系フィルム等の高分子フィルムを延伸することで製造される延伸型位相差板であってもよい。前記λ/4位相差板は、必要により位相差調整剤、可塑剤、紫外線吸収剤、赤外線吸収剤、顔料や染料のような着色剤、蛍光増白剤、分散剤、熱安定剤、光安定剤、帯電防止剤、酸化防止剤、滑剤、溶剤等を含んでいてもよい。
 前記延伸型位相差板の厚さは、好ましくは200μm以下、より好ましくは1~100μmである。延伸型位相差板の厚さが前記の範囲にあると、該延伸型位相差板の柔軟性が低下し難い傾向にある。
 さらに前記λ/4位相差板の他の一例としては、液晶組成物を塗布して形成する液晶塗布型位相差板が挙げられる。
 前記液晶組成物は、ネマチック、コレステリック、スメクチック等の液晶状態を示す液晶性化合物を含む。前記液晶性化合物は、重合性官能基を有する。
 前記液晶組成物は、さらに開始剤、溶剤、分散剤、レベリング剤、安定剤、界面活性剤、架橋剤、シランカップリング剤などを含むことができる。
 前記液晶塗布型位相差板は、前記液晶偏光層と同様に、液晶組成物を下地上に塗布、硬化して液晶位相差層を形成することで製造することができる。液晶塗布型位相差板は、延伸型位相差板に比べて厚さを薄く形成することができる。前記液晶偏光層の厚さは、好ましくは0.5~10μm、より好ましくは1~5μmである。
 前記液晶塗布型位相差板は基材から剥離して転写して積層することもできるし、前記基材をそのまま積層することもできる。前記基材が、保護フィルムや位相差板、ウインドウフィルムの透明基材としての役割を担うことも好ましい。
The λ / 4 retardation plate is a film that gives a retardation of λ / 4 in a direction orthogonal to the traveling direction of incident light (in-plane direction of the film). The λ / 4 retardation plate may be a stretch-type retardation plate manufactured by stretching a polymer film such as a cellulose-based film, an olefin-based film, or a polycarbonate-based film. The λ / 4 retardation plate may be used as a retardation adjuster, a plastic agent, an ultraviolet absorber, an infrared absorber, a colorant such as a pigment or a dye, a fluorescent whitening agent, a dispersant, a heat stabilizer, and a light stabilizer. It may contain an agent, an antioxidant, an antioxidant, a lubricant, a solvent and the like.
The thickness of the stretched retardation plate is preferably 200 μm or less, more preferably 1 to 100 μm. When the thickness of the stretchable retardation plate is within the above range, the flexibility of the stretchable retardation plate tends to be difficult to decrease.
Further, as another example of the λ / 4 retardation plate, there is a liquid crystal coating type retardation plate formed by coating a liquid crystal composition.
The liquid crystal composition contains a liquid crystal compound exhibiting a liquid crystal state such as nematic, cholesteric, and smectic. The liquid crystal compound has a polymerizable functional group.
The liquid crystal composition can further contain an initiator, a solvent, a dispersant, a leveling agent, a stabilizer, a surfactant, a cross-linking agent, a silane coupling agent, and the like.
The liquid crystal coating type retardation plate can be manufactured by applying a liquid crystal composition on a substrate and curing the liquid crystal composition to form a liquid crystal retardation layer, similarly to the liquid crystal polarizing layer. The liquid crystal coating type retardation plate can be formed to be thinner than the stretch type retardation plate. The thickness of the liquid crystal polarizing layer is preferably 0.5 to 10 μm, more preferably 1 to 5 μm.
The liquid crystal coating type retardation plate can be peeled off from the base material, transferred and laminated, or the base material can be laminated as it is. It is also preferable that the base material serves as a transparent base material for a protective film, a retardation plate, and a window film.
 一般的には、短波長ほど複屈折が大きく長波長になるほど小さな複屈折を示す材料が多い。この場合には全可視光領域でλ/4の位相差を達成することはできないので、視感度の高い560nm付近に対してλ/4となるように、面内位相差は、好ましくは100~180nm、より好ましくは130~150nmとなるように設計される。通常とは逆の複屈折率波長分散特性を有する材料を用いた逆分散λ/4位相差板は、視認性が良好となる点で好ましい。このような材料としては、例えば延伸型位相差板は特開2007-232873号公報等に、液晶塗布型位相差板は特開2010-30979号公報等に記載されているものを用いることができる。
 また、他の方法としてはλ/2位相差板と組合せることで広帯域λ/4位相差板を得る技術も知られている(例えば、特開平10-90521号公報など)。λ/2位相差板もλ/4位相差板と同様の材料方法で製造される。延伸型位相差板と液晶塗布型位相差板の組合せは任意であるが、どちらも液晶塗布型位相差板を用いることにより厚さを薄くすることができる。
 前記円偏光板には斜め方向の視認性を高めるために、正のCプレートを積層する方法が知られている(例えば、特開2014-224837号公報など)。正のCプレートは、液晶塗布型位相差板であっても延伸型位相差板であってもよい。該位相差板の厚さ方向の位相差は、好ましくは-200~-20nm、より好ましくは-140~-40nmである。
In general, there are many materials that exhibit a larger birefringence as the wavelength becomes shorter and a smaller birefringence as the wavelength becomes longer. In this case, since it is not possible to achieve a phase difference of λ / 4 in the entire visible light region, the in-plane phase difference is preferably 100 to 4 so that it becomes λ / 4 with respect to the vicinity of 560 nm, which has high luminosity factor. It is designed to be 180 nm, more preferably 130-150 nm. A reverse dispersion λ / 4 retardation plate using a material having a birefringence wavelength dispersion characteristic opposite to the usual one is preferable in that visibility is good. As such a material, for example, a stretchable retardation plate can be used as described in JP-A-2007-232873, and a liquid crystal coating type retardation plate can be used as described in JP-A-2010-30979. ..
Further, as another method, a technique for obtaining a wideband λ / 4 retardation plate by combining with a λ / 2 retardation plate is also known (for example, Japanese Patent Application Laid-Open No. 10-90521). The λ / 2 retardation plate is also manufactured by the same material method as the λ / 4 retardation plate. The combination of the stretchable retardation plate and the liquid crystal coating type retardation plate is arbitrary, but the thickness can be reduced by using the liquid crystal coating type retardation plate in both cases.
A method of laminating a positive C plate on the circularly polarizing plate in order to improve visibility in an oblique direction is known (for example, Japanese Patent Application Laid-Open No. 2014-224738). The positive C plate may be a liquid crystal coating type retardation plate or a stretched retardation plate. The phase difference in the thickness direction of the retardation plate is preferably −200 to −20 nm, more preferably −140 to −40 nm.
<タッチセンサ>
 本発明のフレキシブル表示装置は、上記の通り、タッチセンサを備えることが好ましい。タッチセンサは入力手段として用いられる。タッチセンサとしては、抵抗膜方式、表面弾性波方式、赤外線方式、電磁誘導方式、静電容量方式等様々な様式が挙げられ、好ましくは静電容量方式が挙げられる。
 静電容量方式タッチセンサは活性領域及び前記活性領域の外郭部に位置する非活性領域に区分される。活性領域は表示パネルで画面が表示される領域(表示部)に対応する領域であって、使用者のタッチが感知される領域であり、非活性領域は表示装置で画面が表示されない領域(非表示部)に対応する領域である。タッチセンサはフレキシブルな特性を有する基板と、前記基板の活性領域に形成された感知パターンと、前記基板の非活性領域に形成され、前記感知パターンとパッド部を介して外部の駆動回路と接続するための各センシングラインを含むことができる。フレキシブルな特性を有する基板としては、前記ウインドウフィルムの透明基板と同様の材料が使用できる。
<Touch sensor>
As described above, the flexible display device of the present invention preferably includes a touch sensor. The touch sensor is used as an input means. Examples of the touch sensor include various types such as a resistive film method, a surface acoustic wave method, an infrared method, an electromagnetic induction method, and a capacitance method, and a capacitance method is preferable.
The capacitive touch sensor is divided into an active region and an inactive region located outside the active region. The active area is an area corresponding to the area where the screen is displayed on the display panel (display unit), the area where the user's touch is sensed, and the inactive area is the area where the screen is not displayed on the display device (non-active area). This is the area corresponding to the display unit). The touch sensor is formed in a substrate having flexible characteristics, a sensing pattern formed in an active region of the substrate, and an inactive region of the substrate, and is connected to an external drive circuit via the sensing pattern and a pad portion. Each sensing line for can be included. As the substrate having flexible characteristics, the same material as the transparent substrate of the window film can be used.
 前記感知パターンは、第1方向に形成された第1パターン及び第2方向に形成された第2パターンを備えることができる。第1パターンと第2パターンとは互いに異なる方向に配置される。第1パターン及び第2パターンは、同一層に形成され、タッチされる地点を感知するためには、それぞれのパターンが電気的に接続されなければならない。第1パターンは複数の単位パターンが継ぎ手を介して互いに接続された形態であるが、第2パターンは複数の単位パターンがアイランド形態に互いに分離された構造になっているので、第2パターンを電気的に接続するためには別途のブリッジ電極が必要である。第2パターンの接続のための電極には、周知の透明電極を適用することができる。該透明電極の素材としては、例えば、インジウムスズ酸化物(ITO)、インジウム亜鉛酸化物(IZO)、亜鉛酸化物(ZnO)、インジウム亜鉛スズ酸化物(IZTO)、インジウムガリウム亜鉛酸化物(IGZO)、カドミウムスズ酸化物(CTO)、PEDOT(poly(3,4-ethylenedioxythiophene))、炭素ナノチューブ(CNT)、グラフェン、金属ワイヤなどが挙げられ、好ましくはITOが挙げられる。これらは単独又は2種以上混合して使用できる。金属ワイヤに使用される金属は特に限定されず、例えば、銀、金、アルミニウム、銅、鉄、ニッケル、チタン、テレニウム、クロムなどが挙げられ、これらは単独又は2種以上混合して使用することができる。
 ブリッジ電極は感知パターン上部に絶縁層を介して前記絶縁層上部に形成されることができ、基板上にブリッジ電極が形成されており、その上に絶縁層及び感知パターンを形成することができる。前記ブリッジ電極は感知パターンと同じ素材で形成することもでき、モリブデン、銀、アルミニウム、銅、パラジウム、金、白金、亜鉛、スズ、チタン又はこれらのうちの2種以上の合金で形成することもできる。
 第1パターンと第2パターンは電気的に絶縁されなければならないので、感知パターンとブリッジ電極の間には絶縁層が形成される。該絶縁層は、第1パターンの継ぎ手とブリッジ電極との間にのみ形成することや、感知パターン全体を覆う層として形成することもできる。感知パターン全体を覆う層の場合、ブリッジ電極は絶縁層に形成されたコンタクトホールを介して第2パターンを接続することができる。
The sensing pattern can include a first pattern formed in the first direction and a second pattern formed in the second direction. The first pattern and the second pattern are arranged in different directions from each other. The first pattern and the second pattern are formed in the same layer, and each pattern must be electrically connected in order to sense the touched point. The first pattern is a form in which a plurality of unit patterns are connected to each other via a joint, but the second pattern has a structure in which a plurality of unit patterns are separated from each other in an island form, so that the second pattern is electrically operated. A separate bridge electrode is required for the connection. A well-known transparent electrode can be applied to the electrode for connecting the second pattern. Examples of the material of the transparent electrode include indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc oxide oxide (IZTO), and indium gallium zinc oxide (IGZO). , Cadmium tin oxide (CTO), PEDOT (poly (3,4-ethylenedioxythiophene)), carbon nanotubes (CNT), graphene, metal wire and the like, and ITO is preferable. These can be used alone or in combination of two or more. The metal used for the metal wire is not particularly limited, and examples thereof include silver, gold, aluminum, copper, iron, nickel, titanium, telenium, chromium, etc., and these may be used alone or in combination of two or more. Can be done.
The bridge electrode can be formed on the upper part of the insulating layer via the insulating layer on the upper part of the sensing pattern, the bridge electrode is formed on the substrate, and the insulating layer and the sensing pattern can be formed on the bridge electrode. The bridge electrode can be made of the same material as the sensing pattern, or it can be made of molybdenum, silver, aluminum, copper, palladium, gold, platinum, zinc, tin, titanium or two or more alloys of these. can.
Since the first pattern and the second pattern must be electrically insulated, an insulating layer is formed between the sensing pattern and the bridge electrode. The insulating layer may be formed only between the joint of the first pattern and the bridge electrode, or may be formed as a layer covering the entire sensing pattern. In the case of a layer covering the entire sensing pattern, the bridge electrode can connect the second pattern through a contact hole formed in the insulating layer.
 前記タッチセンサは、感知パターンが形成されたパターン領域と、感知パターンが形成されていない非パターン領域との間の透過率の差、具体的には、これらの領域における屈折率の差によって誘発される光透過率の差を適切に補償するための手段として基板と電極の間に光学調節層をさらに含むことができる。該光学調節層は、無機絶縁物質又は有機絶縁物質を含むことができる。光学調節層は光硬化性有機バインダー及び溶剤を含む光硬化組成物を基板上にコーティングして形成することができる。前記光硬化組成物は無機粒子をさらに含むことができる。前記無機粒子によって光学調節層の屈折率を高くすることができる。
 前記光硬化性有機バインダーは、本発明の効果を損ねない範囲で、例えば、アクリレート系単量体、スチレン系単量体、カルボン酸系単量体などの各単量体の共重合体を含むことができる。前記光硬化性有機バインダーは、例えば、エポキシ基含有繰り返し単位、アクリレート繰り返し単位、カルボン酸繰り返し単位などの互いに異なる各繰り返し単位を含む共重合体であってもよい。
 前記無機粒子としては、例えば、ジルコニア粒子、チタニア粒子、アルミナ粒子などが挙げられる。
 前記光硬化組成物は、光重合開始剤、重合性モノマー、硬化補助剤などの各添加剤をさらに含むこともできる。
The touch sensor is induced by a difference in transmittance between a pattern region in which a sensing pattern is formed and a non-pattern region in which a sensing pattern is not formed, specifically, a difference in refractive index in these regions. An optical adjustment layer may be further included between the substrate and the electrode as a means for appropriately compensating for the difference in light transmittance. The optical control layer may contain an inorganic insulating material or an organic insulating material. The optical control layer can be formed by coating a photocurable composition containing a photocurable organic binder and a solvent on a substrate. The photocurable composition may further contain inorganic particles. The refractive index of the optical control layer can be increased by the inorganic particles.
The photocurable organic binder contains a copolymer of each monomer such as an acrylate-based monomer, a styrene-based monomer, and a carboxylic acid-based monomer, as long as the effects of the present invention are not impaired. be able to. The photocurable organic binder may be, for example, a copolymer containing different repeating units such as an epoxy group-containing repeating unit, an acrylate repeating unit, and a carboxylic acid repeating unit.
Examples of the inorganic particles include zirconia particles, titania particles, alumina particles and the like.
The photocuring composition may further contain additives such as a photopolymerization initiator, a polymerizable monomer, and a curing aid.
<接着層>
 前記フレキシブル画像表示装置用積層体を形成する各層(ウインドウフィルム、円偏光板、タッチセンサ)並びに各層を構成するフィルム部材(直線偏光板、λ/4位相差板等)は接着剤によって接合することができる。該接着剤としては、水系接着剤、有機溶剤系、無溶剤系接着剤、固体接着剤、溶剤揮散型接着剤、湿気硬化型接着剤、加熱硬化型接着剤、嫌気硬化型、活性エネルギー線硬化型接着剤、硬化剤混合型接着剤、熱溶融型接着剤、感圧型接着剤(粘着剤)、再湿型接着剤等、通常使用されている接着剤等が使用でき、好ましくは水系溶剤揮散型接着剤、活性エネルギー線硬化型接着剤、粘着剤を使用できる。接着剤層の厚さは、求められる接着力等に応じて適宜調節することができ、好ましくは0.01~500μm、より好ましくは0.1~300μmである。前記フレキシブル画像表示装置用積層体には、複数の接着層が存在するが、それぞれの厚さや種類は、同じであっても異なっていてもよい。
<Adhesive layer>
Each layer (window film, circularly polarizing plate, touch sensor) forming the laminate for the flexible image display device and the film member (straight polarizing plate, λ / 4 retardation plate, etc.) constituting each layer are joined by an adhesive. Can be done. Examples of the adhesive include water-based adhesives, organic solvent-based adhesives, solvent-free adhesives, solid adhesives, solvent volatilization adhesives, moisture-curable adhesives, heat-curable adhesives, anaerobic curable adhesives, and active energy ray-curable adhesives. Commonly used adhesives such as mold adhesives, hardener mixed adhesives, heat-melt adhesives, pressure-sensitive adhesives (adhesives), and re-wet adhesives can be used, preferably aqueous solvent volatilization. Mold adhesives, active energy ray-curable adhesives, and adhesives can be used. The thickness of the adhesive layer can be appropriately adjusted according to the required adhesive force and the like, and is preferably 0.01 to 500 μm, more preferably 0.1 to 300 μm. The laminated body for a flexible image display device has a plurality of adhesive layers, and the thickness and type of each may be the same or different.
 前記水系溶剤揮散型接着剤としては、ポリビニルアルコール系ポリマー、でんぷん等の水溶性ポリマー、エチレン-酢酸ビニル系エマルジョン、スチレン-ブタジエン系エマルジョン等水分散状態のポリマーを主剤ポリマーとして使用することができる。前記主剤ポリマーと水とに加えて、架橋剤、シラン系化合物、イオン性化合物、架橋触媒、酸化防止剤、染料、顔料、無機フィラー、有機溶剤等を配合してもよい。前記水系溶剤揮散型接着剤によって接着する場合、前記水系溶剤揮散型接着剤を被接着層間に注入して被着層を貼合した後、乾燥させることで接着性を付与することができる。前記水系溶剤揮散型接着剤を用いる場合、その接着層の厚さは、好ましくは0.01~10μm、より好ましくは0.1~1μmである。前記水系溶剤揮散型接着剤を複数層に用いる場合、それぞれの層の厚さや種類は同じであっても異なっていてもよい。 As the water-based solvent volatilization type adhesive, a polyvinyl alcohol-based polymer, a water-soluble polymer such as starch, an ethylene-vinyl acetate emulsion, a styrene-butadiene emulsion, or the like in an aqueous-dispersed state can be used as the main polymer. In addition to the main polymer and water, a cross-linking agent, a silane compound, an ionic compound, a cross-linking catalyst, an antioxidant, a dye, a pigment, an inorganic filler, an organic solvent and the like may be blended. When adhering with the water-based solvent volatilization type adhesive, the water-based solvent volatilization type adhesive can be injected between the layers to be adhered, the adherend layers are bonded, and then dried to impart adhesiveness. When the water-based solvent volatilization type adhesive is used, the thickness of the adhesive layer is preferably 0.01 to 10 μm, more preferably 0.1 to 1 μm. When the water-based solvent volatilization type adhesive is used in a plurality of layers, the thickness and type of each layer may be the same or different.
 前記活性エネルギー線硬化型接着剤は、活性エネルギー線を照射して接着剤層を形成する反応性材料を含む活性エネルギー線硬化組成物の硬化により形成することができる。前記活性エネルギー線硬化組成物は、ハードコート組成物に含まれるものと同様のラジカル重合性化合物及びカチオン重合性化合物の少なくとも1種の重合物を含有することができる。前記ラジカル重合性化合物は、ハードコート組成物におけるラジカル重合性化合物と同じ化合物を用いることができる。
 前記カチオン重合性化合物は、ハードコート組成物におけるカチオン重合性化合物と同じ化合物を用いることができる。
 活性エネルギー線硬化組成物に用いられるカチオン重合性化合物としては、エポキシ化合物が特に好ましい。接着剤組成物としての粘度を下げるために単官能の化合物を反応性希釈剤として含むことも好ましい。
The active energy ray-curable adhesive can be formed by curing an active energy ray-curable composition containing a reactive material that is irradiated with active energy rays to form an adhesive layer. The active energy ray-curable composition can contain at least one polymer of a radical-polymerizable compound and a cationically polymerizable compound similar to those contained in the hard coat composition. As the radically polymerizable compound, the same compound as the radically polymerizable compound in the hard coat composition can be used.
As the cationically polymerizable compound, the same compound as the cationically polymerizable compound in the hard coat composition can be used.
As the cationically polymerizable compound used in the active energy ray-curable composition, an epoxy compound is particularly preferable. It is also preferable to include a monofunctional compound as a reactive diluent in order to reduce the viscosity of the adhesive composition.
 活性エネルギー線組成物は、粘度を低下させるために、単官能の化合物を含むことができる。該単官能の化合物としては、1分子中に1個の(メタ)アクリロイル基を有するアクリレート系単量体や、1分子中に1個のエポキシ基又はオキセタニル基を有する化合物、例えば、グリシジル(メタ)アクリレートなどが挙げられる。
 活性エネルギー線組成物は、さらに重合開始剤を含むことができる。該重合開始剤としては、ラジカル重合開始剤、カチオン重合開始剤、ラジカル及びカチオン重合開始剤等が挙げられ、これらは適宜選択して用いられる。これらの重合開始剤は、活性エネルギー線照射及び加熱の少なくとも一種により分解されて、ラジカルもしくはカチオンを発生してラジカル重合とカチオン重合を進行させるものである。ハードコート組成物の記載の中で活性エネルギー線照射によりラジカル重合又はカチオン重合の内の少なくともいずれか開始することができる開始剤を使用することができる。
 前記活性エネルギー線硬化組成物はさらに、イオン捕捉剤、酸化防止剤、連鎖移動剤、密着付与剤、熱可塑性樹脂、充填剤、流動粘度調整剤、可塑剤、消泡剤溶剤、添加剤、溶剤を含むことができる。前記活性エネルギー線硬化型接着剤によって2つの被接着層を接着する場合、前記活性エネルギー線硬化組成物を被接着層のいずれか一方又は両方に塗布後、貼合し、いずれかの被着層又は両方の被接着層に活性エネルギー線を照射して硬化させることにより、接着することができる。前記活性エネルギー線硬化型接着剤を用いる場合、その接着層の厚さは、好ましくは0.01~20μm、より好ましくは0.1~10μmである。前記活性エネルギー線硬化型接着剤を複数の接着層形成に用いる場合、それぞれの層の厚さや種類は同じであっても異なっていてもよい。
The active energy ray composition can contain a monofunctional compound in order to reduce the viscosity. Examples of the monofunctional compound include an acrylate-based monomer having one (meth) acryloyl group in one molecule and a compound having one epoxy group or oxetanyl group in one molecule, for example, glycidyl (meth). ) Examples include acrylate.
The active energy ray composition can further contain a polymerization initiator. Examples of the polymerization initiator include radical polymerization initiators, cationic polymerization initiators, radicals and cationic polymerization initiators, and these are appropriately selected and used. These polymerization initiators are decomposed by at least one of activation energy ray irradiation and heating to generate radicals or cations to promote radical polymerization and cation polymerization. In the description of the hard coat composition, an initiator that can initiate at least one of radical polymerization or cationic polymerization by irradiation with active energy rays can be used.
The active energy ray-curable composition further comprises an ion trapping agent, an antioxidant, a chain transfer agent, an adhesion imparting agent, a thermoplastic resin, a filler, a fluid viscosity modifier, a plasticizer, a defoaming agent solvent, an additive, and a solvent. Can be included. When two layers to be adhered are bonded by the active energy ray-curable adhesive, the active energy ray-curable composition is applied to either or both of the layers to be adhered, and then bonded to each layer. Alternatively, both layers to be adhered can be adhered by irradiating them with active energy rays and curing them. When the active energy ray-curable adhesive is used, the thickness of the adhesive layer is preferably 0.01 to 20 μm, more preferably 0.1 to 10 μm. When the active energy ray-curable adhesive is used for forming a plurality of adhesive layers, the thickness and type of the respective layers may be the same or different.
 前記粘着剤としては、主剤ポリマーに応じて、アクリル系粘着剤、ウレタン系粘着剤、ゴム系粘着剤、シリコーン系粘着剤等に分類され何れを使用することもできる。粘着剤には主剤ポリマーに加えて、架橋剤、シラン系化合物、イオン性化合物、架橋触媒、酸化防止剤、粘着付与剤、可塑剤、染料、顔料、無機フィラー等を配合してもよい。前記粘着剤を構成する各成分を溶剤に溶解・分散させて粘着剤組成物を得て、該粘着剤組成物を基材上に塗布した後に乾燥させることで、粘着剤層接着層が形成される。粘着層は直接形成されてもよいし、別途基材に形成したものを転写することもできる。接着前の粘着面をカバーするためには離型フィルムを使用することも好ましい。前記活性エネルギー線硬化型接着剤を用いる場合、その接着層の厚さは、好ましくは0.1~500μm、より好ましくは1~300μmである。前記粘着剤を複数層用いる場合には、それぞれの層の厚さや種類は同じであっても異なっていてもよい。 The pressure-sensitive adhesive is classified into an acrylic pressure-sensitive adhesive, a urethane-based pressure-sensitive adhesive, a rubber-based pressure-sensitive adhesive, a silicone-based pressure-sensitive adhesive, and the like according to the main polymer, and any of them can be used. In addition to the main polymer, the pressure-sensitive adhesive may contain a cross-linking agent, a silane compound, an ionic compound, a cross-linking catalyst, an antioxidant, a tackifier, a plasticizer, a dye, a pigment, an inorganic filler and the like. A pressure-sensitive adhesive layer is formed by dissolving and dispersing each component constituting the pressure-sensitive adhesive in a solvent to obtain a pressure-sensitive adhesive composition, applying the pressure-sensitive adhesive composition onto a substrate, and then drying the mixture. NS. The adhesive layer may be directly formed, or a separately formed base material may be transferred. It is also preferable to use a release film to cover the adhesive surface before bonding. When the active energy ray-curable adhesive is used, the thickness of the adhesive layer is preferably 0.1 to 500 μm, more preferably 1 to 300 μm. When a plurality of layers of the pressure-sensitive adhesive are used, the thickness and type of the respective layers may be the same or different.
<遮光パターン>
 前記遮光パターンは、前記フレキシブル画像表示装置のベゼル又はハウジングの少なくとも一部として適用することができる。遮光パターンによって前記フレキシブル画像表示装置の辺縁部に配置される配線が隠されて視認されにくくすることで、画像の視認性が向上する。前記遮光パターンは単層又は複層の形態であってもよい。遮光パターンのカラーは特に制限されることはなく、黒色、白色、金属色などの多様なカラーであってもよい。遮光パターンはカラーを具現するための顔料と、アクリル系樹脂、エステル系樹脂、エポキシ系樹脂、ポリウレタン、シリコーンなどの高分子で形成することができる。これらの単独又は2種類以上の混合物で使用することもできる。前記遮光パターンは、印刷、リソグラフィ、インクジェットなど各種の方法にて形成することができる。遮光パターンの厚さは、好ましくは1~100μm、より好ましくは2~50μmである。また、遮光パターンの厚さ方向に傾斜等の形状を付与することも好ましい。
<Shading pattern>
The shading pattern can be applied as at least a part of the bezel or housing of the flexible image display device. The light-shielding pattern hides the wiring arranged at the edge of the flexible image display device to make it difficult to see, thereby improving the visibility of the image. The shading pattern may be in the form of a single layer or multiple layers. The color of the light-shielding pattern is not particularly limited, and may be various colors such as black, white, and metallic. The light-shielding pattern can be formed of a pigment for embodying color and a polymer such as an acrylic resin, an ester resin, an epoxy resin, polyurethane, or silicone. They can also be used alone or in mixtures of two or more. The shading pattern can be formed by various methods such as printing, lithography, and inkjet. The thickness of the shading pattern is preferably 1 to 100 μm, more preferably 2 to 50 μm. It is also preferable to give a shape such as an inclination in the thickness direction of the light-shielding pattern.
 以下、実施例を挙げて本発明をより具体的に説明する。本発明は以下の実施例によって制限を受けるものではなく、前記、後記の趣旨に適合し得る範囲で適当に変更を加えて実施することも勿論可能であり、それらはいずれも本発明の技術的範囲に包含される。 Hereinafter, the present invention will be described in more detail with reference to examples. The present invention is not limited by the following examples, and it is of course possible to carry out the present invention with appropriate modifications within a range that can be adapted to the above-mentioned purpose, and all of them are technical of the present invention. Included in the range.
 下記実施例及び比較例で得られる各層又は積層体を下記の方法で評価した。 Each layer or laminate obtained in the following Examples and Comparative Examples was evaluated by the following method.
 基材(s)の表面Si比及び撥水層(r)の表面フッ素比の測定
 日本電子社製 JFS-9010型を用い、励起X線:MgKα、X線出力は110Wとし、光電子脱出角度は45°、パスエネルギー50eVにて、撥水層(r)のフッ素(F1s)、基材(s)のケイ素の各種元素について、測定を行った。
Measurement of the surface Si ratio of the base material (s) and the surface fluorine ratio of the water-repellent layer (r) Using JFS-9010 manufactured by JEOL Ltd., the excitation X-ray: MgKα, the X-ray output is 110 W, and the photoelectron escape angle is Various elements of fluorine (F1s) in the water-repellent layer (r) and silicon in the base material (s) were measured at 45 ° and a pass energy of 50 eV.
 算術平均高さSaの測定
 レーザー顕微鏡(OLS4000、オリンパス製)を用いて、積層体の撥水層(r)の表面を拡大倍率20倍で観察した。算術平均高さSaはISO25178に準拠して評価した。算術平均高さSaはN=2の平均値とした。
Measurement of Arithmetic Mean Height Sa Using a laser microscope (OLS4000, manufactured by Olympus), the surface of the water-repellent layer (r) of the laminate was observed at a magnification of 20 times. The arithmetic mean height Sa was evaluated according to ISO25178. The arithmetic mean height Sa was set to the average value of N = 2.
 接触角及び滑落角
 得られた積層体の撥水層(r)上に、3.0μLの水滴を滴下し、接触角測定装置(協和界面科学社製、DM700)を用い、θ/2法にて、液量:3.0μLの水の接触角を測定した。
 また、得られた積層体の撥水層(r)上に、6.0μLの水滴を滴下し、前記接触角測定装置(協和界面科学社製、DM700)を用い、滑落法(水滴量:6.0μL、傾斜方法:連続傾斜、滑落検出:滑落後、滑落判定距離:0.25mm)にて、積層体の撥水層(r)面の動的撥水特性(滑落角)を測定した。
Contact angle and sliding angle 3.0 μL of water droplets are dropped onto the water-repellent layer (r) of the obtained laminate, and a contact angle measuring device (DM700, manufactured by Kyowa Interface Science Co., Ltd.) is used to perform the θ / 2 method. The contact angle of water with a liquid volume of 3.0 μL was measured.
Further, 6.0 μL of water droplets were dropped onto the water-repellent layer (r) of the obtained laminate, and a sliding method (water droplet amount: 6) was used using the contact angle measuring device (DM700 manufactured by Kyowa Interface Science Co., Ltd.). The dynamic water repellency (sliding angle) of the water-repellent layer (r) surface of the laminated body was measured at 0.0 μL, inclination method: continuous inclination, slip detection: after sliding, sliding determination distance: 0.25 mm).
 表面反射率
 コニカミノルタ製測色計(CM-3700A、光源:D65)を使用し、積層体の撥水層(r)側表面で測定した入射角12°及び反射角12°における波長530nmの分光反射率をJIS Z8701の2度視野(C光源)により求めた。この値から、表面反射損失4.2%、裏面反射損失4.2%を差し引き、反射率を算出した。また、基材(s)の中間層(c)側表面での表面反射率も同様にして測定した。
Surface reflectance Spectrometry at a wavelength of 530 nm at an incident angle of 12 ° and a reflection angle of 12 ° measured on the water-repellent layer (r) side surface of the laminate using a Konica Minolta colorimeter (CM-3700A, light source: D65). The reflectance was determined by the 2 degree field (C light source) of JIS Z8701. The reflectance was calculated by subtracting the front surface reflection loss of 4.2% and the back surface reflection loss of 4.2% from this value. Further, the surface reflectance on the surface of the base material (s) on the intermediate layer (c) side was also measured in the same manner.
 耐摩耗試験
 スチールウール♯0000(ボンスター社製)を具備したスチールウール試験機(大栄精機社製)を用い、スチールウールが積層体の表面(撥水層(r))に接した状態で、荷重1000gをかけて摩耗試験を行い、目視にて、剥がれ・傷が確認されるまで試験を繰り返し、剥がれ・傷が確認された際の試験回数で耐摩耗性を評価した。なお、剥がれ・傷の有無の確認は、照度1000ルクスにて行った。
Abrasion resistance test Using a steel wool testing machine (manufactured by Daiei Seiki Co., Ltd.) equipped with steel wool # 0000 (manufactured by Bonster), the load is applied with the steel wool in contact with the surface of the laminate (water repellent layer (r)). A wear test was carried out by applying 1000 g, and the test was repeated until peeling / scratches were confirmed visually, and the wear resistance was evaluated by the number of tests when peeling / scratches were confirmed. The presence or absence of peeling and scratches was confirmed at an illuminance of 1000 lux.
 厚み測定
 Nikon社製、DIGIMICRO(型番:MFC-101A)を用いて基材(s)の厚みを測定した。なお、いずれの実施例及び比較例においても、撥水層(r)の厚みは数nm、中間層(c)の厚みは約5~30nmであった。
Thickness measurement The thickness of the base material (s) was measured using DIGIMICRO (model number: MFC-101A) manufactured by Nikon Corporation. In each of the examples and comparative examples, the thickness of the water-repellent layer (r) was several nm, and the thickness of the intermediate layer (c) was about 5 to 30 nm.
 実施例1
 有機ケイ素化合物(C)として下記式で示す、特開2012-197330号公報に記載のN-2-(アミノエチル)-3-アミノプロピルトリメトキシシランとクロロプロピルトリメトキシシランの反応物(商品名;X-12-5263HP、信越化学工業株式会社製)を0.25質量%、溶剤(E)としてヘキサンを99.75質量%混合した溶液を、室温で撹拌し、中間層(c)形成用溶液を得た。
Example 1
A reaction product of N-2- (aminoethyl) -3-aminopropyltrimethoxysilane and chloropropyltrimethoxysilane (trade name) described in JP2012-197330A, which is represented by the following formula as an organic silicon compound (C). A solution prepared by mixing 0.25% by mass of X-12-5263HP (manufactured by Shin-Etsu Chemical Industry Co., Ltd.) and 99.75% by mass of hexane as the solvent (E) is stirred at room temperature for forming the intermediate layer (c). A solution was obtained.
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
 次に、基材(s)として、厚み84μmのARフィルムを用意した。前記ARフィルムは、樹脂層の上に、真空蒸着法によりSiO2及び金属酸化物(但し、SiO2以外)を交互に積層して最表面をSiO2としたフィルムである。上述の方法で測定した基材(s)
の表面Si比は31.5原子%であった。前記ARフィルムの表面を大気圧プラズマ処理によって活性化処理し、該活性化処理面に、前記中間層(c)形成用溶液を、株式会社MIKASA製OPTICOAT MS-A100(スピンコーター)を用いて、塗布液量200μl、回転スピード2000rpm、回転秒数20秒の条件で塗布して中間層(c)を得た。
Next, an AR film having a thickness of 84 μm was prepared as the base material (s). The AR film is a film in which SiO 2 and a metal oxide (however, other than SiO 2 ) are alternately laminated on a resin layer by a vacuum vapor deposition method to make the outermost surface SiO 2 . Substrate (s) measured by the above method
The surface Si ratio of was 31.5 atomic%. The surface of the AR film is activated by atmospheric pressure plasma treatment, and the intermediate layer (c) forming solution is applied to the activated surface using OPTICOAT MS-A100 (spin coater) manufactured by MIKASA Co., Ltd. An intermediate layer (c) was obtained by coating under the conditions of a coating liquid volume of 200 μl, a rotation speed of 2000 rpm, and a rotation speed of 20 seconds.
 次に、有機ケイ素化合物(A)として、ダイキン工業株式会社製のオプツール(登録商標)UF503(有機ケイ素化合物(A)を20質量%と、溶媒としてNovec7200を80質量%含む)、有機ケイ素化合物(B)としてFAS13E(C613-C24-Si(OC253、東京化成工業株式会社製)、溶剤(D)としてFC-3283(C921N、フロリナート、3M社製)を混合し、室温で所定の時間撹拌し、撥水層(r)
形成用溶液を得た。ここで、オプツール(登録商標)UF503は、パーフルオロポリエーテル構造を有する1価の基と加水分解性基とが、それぞれケイ素原子に結合している有機ケイ素化合物である。撥水層(r)形成用溶液100質量%中の有機ケイ素化合物(A)の割合(固形分)は、0.085質量%であり、有機ケイ素化合物(B)の割合は0.05質量%であった。撥水層(r)形成用溶液を、中間層(c)の上に株式会社アピロス製スプレーコーターを用いて塗布した。スプレーコートの条件は、スキャン速度:600mm/sec、ピッチ:5mm、液量:6cc/min、アトマイジングエアー:350kPa、ギャップ:70mmである。その後、80℃で30分焼成し、基材(s)、中間層(c)、撥水層(r)をこの順で含む積層体を得た。
Next, as the organosilicon compound (A), Optool (registered trademark) UF503 manufactured by Daikin Industries, Ltd. (containing 20% by mass of the organosilicon compound (A) and 80% by mass of Novec7200 as the solvent), and the organosilicon compound ( FAS13E (C 6 F 13- C 2 H 4- Si (OC 2 H 5 ) 3 , manufactured by Tokyo Kasei Kogyo Co., Ltd.) as B), FC-3283 (C 9 F 21 N, Florinate, 3M) as solvent (D) The water-repellent layer (r) is mixed and stirred at room temperature for a predetermined time.
A forming solution was obtained. Here, Optool (registered trademark) UF503 is an organosilicon compound in which a monovalent group having a perfluoropolyether structure and a hydrolyzable group are each bonded to a silicon atom. The proportion (solid content) of the organosilicon compound (A) in 100% by mass of the water-repellent layer (r) forming solution is 0.085% by mass, and the proportion of the organosilicon compound (B) is 0.05% by mass. Met. The water-repellent layer (r) forming solution was applied onto the intermediate layer (c) using a spray coater manufactured by Apiros Co., Ltd. The conditions for spray coating are scan speed: 600 mm / sec, pitch: 5 mm, liquid volume: 6 cc / min, atomizing air: 350 kPa, and gap: 70 mm. Then, it was fired at 80 ° C. for 30 minutes to obtain a laminate containing the base material (s), the intermediate layer (c), and the water-repellent layer (r) in this order.
 実施例2
 基材(s)を、表面Si比が31.3原子%であるARフィルムに変更したこと以外は実施例1と同様にして、基材(s)、中間層(c)、撥水層(r)をこの順で含む積層体を得た。
Example 2
The base material (s), the intermediate layer (c), and the water-repellent layer (s) are the same as in Example 1 except that the base material (s) is changed to an AR film having a surface Si ratio of 31.3 atomic%. A laminate containing r) in this order was obtained.
 実施例3
 溶剤(E)として、酢酸ブチルを用いたこと以外は実施例2と同様にして、基材(s)、中間層(c)、撥水層(r)をこの順で含む積層体を得た。
Example 3
A laminate containing the base material (s), the intermediate layer (c), and the water-repellent layer (r) in this order was obtained in the same manner as in Example 2 except that butyl acetate was used as the solvent (E). ..
 実施例4
 基材(s)を、厚みが45μmのハードコートフィルムに変更したこと以外は実施例1と同様にして、基材(s)、中間層(c)、撥水層(r)をこの順で含む積層体を得た。前記ハードコートフィルムは、ポリエチレンテレフタレートから構成される樹脂層に、表面Si比が1.8原子%であるアクリル系ハードコート層が積層されたフィルムであり、実施例1と同様の大気圧プラズマ処理による活性化処理を、アクリル系ハードコート層の表面に施したものを用いた。
Example 4
The base material (s), the intermediate layer (c), and the water-repellent layer (r) are arranged in this order in the same manner as in Example 1 except that the base material (s) is changed to a hard coat film having a thickness of 45 μm. A laminate containing the mixture was obtained. The hard coat film is a film in which an acrylic hard coat layer having a surface Si ratio of 1.8 atomic% is laminated on a resin layer composed of polyethylene terephthalate, and is subjected to atmospheric pressure plasma treatment similar to that in Example 1. The surface of the acrylic hard coat layer was subjected to the activation treatment according to the above.
 実施例5
 有機ケイ素化合物(C)をKBM-903(信越化学工業株式会社製)に変更したこと、及び溶剤(E)として、酢酸ブチルを用いたこと以外は実施例1と同様にして、基材(s)、中間層(c)、撥水層(r)をこの順で含む積層体を得た。
Example 5
The substrate (s) was the same as in Example 1 except that the organosilicon compound (C) was changed to KBM-903 (manufactured by Shin-Etsu Chemical Co., Ltd.) and butyl acetate was used as the solvent (E). ), The intermediate layer (c), and the water-repellent layer (r) were obtained in this order.
 比較例1
 基材(s)を、厚みが60μmで、表面Si比が0原子%であるアクリル系ハードコート層に変更したこと以外は実施例1と同様にして、基材(s)、中間層(c)、撥水層(r)をこの順で含む積層体を得た。
Comparative Example 1
The base material (s) and the intermediate layer (c) are the same as in Example 1 except that the base material (s) is changed to an acrylic hard coat layer having a thickness of 60 μm and a surface Si ratio of 0 atomic%. ), A laminate containing the water-repellent layer (r) in this order was obtained.
 比較例2
 溶剤(E)をメチルエチルケトンに変更したこと以外は、比較例1と同様にして、基材(s)、中間層(c)、撥水層(r)をこの順で含む積層体を得た。
Comparative Example 2
A laminate containing the base material (s), the intermediate layer (c), and the water-repellent layer (r) in this order was obtained in the same manner as in Comparative Example 1 except that the solvent (E) was changed to methyl ethyl ketone.
 実施例及び比較例で得られた積層体を、上記の方法で評価した結果を表1に示す。 Table 1 shows the results of evaluating the laminates obtained in Examples and Comparative Examples by the above method.
Figure JPOXMLDOC01-appb-T000030
Figure JPOXMLDOC01-appb-T000030
 本発明の積層体は、タッチパネルディスプレイ等の表示装置、光学素子、半導体素子、建築材料、ナノインプリント技術、太陽電池、自動車や建物の窓ガラス、調理器具などの金属製品、食器などのセラミック製品、プラスチック製の自動車部品等に好適に成膜することができ、産業上有用である。また、台所、風呂場、洗面台、鏡、トイレ周りの各部材の物品などにも好ましく用いられる。 The laminate of the present invention includes display devices such as touch panel displays, optical elements, semiconductor elements, building materials, nanoimprint technology, solar cells, windowpanes of automobiles and buildings, metal products such as cooking utensils, ceramic products such as tableware, and plastics. It can be suitably formed on automobile parts and the like, and is industrially useful. It is also preferably used for kitchens, bathrooms, wash basins, mirrors, articles of various members around toilets, and the like.

Claims (7)

  1.  基材(s)、中間層(c)、及び撥水層(r)をこの順に備える積層体であって、以下の(1)及び(2)の要件を満足することを特徴とする積層体。
    (1)前記撥水層(r)側表面で測定した入射角12°及び反射角12°における波長530nmの分光反射率をJIS Z8701の2度視野(C光源)により算出した反射率から表面反射損失及び裏面反射損失を差し引いた反射率が4.5%以下である。
    (2)前記積層体の厚みが500μm以下である。
    A laminate including a base material (s), an intermediate layer (c), and a water-repellent layer (r) in this order, which satisfies the following requirements (1) and (2). ..
    (1) Surface reflection of the spectral reflectance at a wavelength of 530 nm at an incident angle of 12 ° and a reflection angle of 12 ° measured on the surface of the water-repellent layer (r) side from the reflectance calculated by the two-degree field of view (C light source) of JIS Z8701. The reflectance after deducting the loss and the back surface reflection loss is 4.5% or less.
    (2) The thickness of the laminated body is 500 μm or less.
  2.  更に、下記(3)の要件を満足する請求項1に記載の積層体。
    (3)前記撥水層(r)側の表面フッ素元素比が30原子%以上である。
    Further, the laminate according to claim 1, which satisfies the requirement (3) below.
    (3) The surface fluorine element ratio on the water-repellent layer (r) side is 30 atomic% or more.
  3.  更に、下記(4)及び(5)の要件の少なくとも1つを満足する請求項1又は2に記載の積層体。
    (4)前記撥水層(r)側の算術平均高さSaが0.03~1.00μmである。
    (5)前記撥水層(r)側の水の滑落角が25°以下である。
    Further, the laminate according to claim 1 or 2, which satisfies at least one of the following requirements (4) and (5).
    (4) The arithmetic mean height Sa on the water-repellent layer (r) side is 0.03 to 1.00 μm.
    (5) The sliding angle of water on the water-repellent layer (r) side is 25 ° or less.
  4.  前記基材(s)の、前記中間層(c)側の最表層の表面Si比が1原子%以上である請求項1~3のいずれかに記載の積層体。 The laminate according to any one of claims 1 to 3, wherein the surface Si ratio of the outermost layer on the intermediate layer (c) side of the base material (s) is 1 atomic% or more.
  5.  前記撥水層(r)は、下記式(a1)で表される有機ケイ素化合物(A)と下記式(b1)で表される有機ケイ素化合物(B)の混合組成物(ca)の硬化層である請求項1~4のいずれかに記載の積層体。
    Figure JPOXMLDOC01-appb-C000001
     上記式(a1)中、
     Rfa1は、両端が酸素原子である2価のパーフルオロポリエーテル構造であり、
     R11、R12、及びR13は、それぞれ独立して炭素数1~20のアルキル基であり、R11が複数存在する場合は複数のR11がそれぞれ異なっていてもよく、R12が複数存在する場合は複数のR12がそれぞれ異なっていてもよく、R13が複数存在する場合は複数のR13がそれぞれ異なっていてもよく、
     E1、E2、E3、E4、及びE5は、それぞれ独立して水素原子又はフッ素原子であり、E1が複数存在する場合は複数のE1がそれぞれ異なっていてもよく、E2が複数存在する場合は複数のE2がそれぞれ異なっていてもよく、E3が複数存在する場合は複数のE3がそれぞれ異なっていてもよく、E4が複数存在する場合は複数のE4がそれぞれ異なっていてもよく、E5が複数存在する場合は複数のE5がそれぞれ異なっていてもよく、
     G1及びG2は、それぞれ独立して、シロキサン結合を有する2~10価のオルガノシロキサン基であり、
     J1、J2、及びJ3は、それぞれ独立して、加水分解性基又は-(CH2e6-Si(OR143であり、e6は1~5であり、R14はメチル基又はエチル基であり、J1が複数存在する場合は複数のJ1がそれぞれ異なっていてもよく、J2が複数存在する場合は複数のJ2がそれぞれ異なっていてもよく、J3が複数存在する場合は複数のJ3がそれぞれ異なっていてもよく、
     L1及びL2は、それぞれ独立して、酸素原子、窒素原子、又はフッ素原子を含んでいてもよい炭素数1~12の2価の連結基であり、L1が複数存在する場合は複数のL1がそれぞれ異なっていてもよく、L2が複数存在する場合は複数のL2がそれぞれ異なっていてもよく、
     d11は、1~9であり、
     d12は、0~9であり、
     a10及びa14は、それぞれ独立して0~10であり、
     a11及びa15は、それぞれ独立して0又は1であり、
     a12及びa16は、それぞれ独立して0~9であり、
     a13は、0又は1であり、
     a21、a22、及びa23は、それぞれ独立して0~2であり、
     e1、e2、及びe3は、それぞれ独立して1~3である。
    Figure JPOXMLDOC01-appb-C000002
    上記式(b1)中、
     Rfb10は、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、
     Rb11、Rb12、Rb13及びRb14は、それぞれ独立して、水素原子又は炭素数が1~4のアルキル基であり、Rb11が複数存在する場合は複数のRb11がそれぞれ異なっていてもよく、Rb12が複数存在する場合は複数のRb12がそれぞれ異なっていてもよく、Rb13が複数存在する場合は複数のRb13がそれぞれ異なっていてもよく、Rb14が複数存在する場合は複数のRb14がそれぞれ異なっていてもよく、
     Rfb11、Rfb12、Rfb13及びRfb14は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfb11が複数存在する場合は複数のRfb11がそれぞれ異なっていてもよく、Rfb12が複数存在する場合は複数のRfb12がそれぞれ異なっていてもよく、Rfb13が複数存在する場合は複数のRfb13がそれぞれ異なっていてもよく、Rfb14が複数存在する場合は複数のRfb14がそれぞれ異なっていてもよく、
     Rb15は、炭素数が1~20のアルキル基であり、Rb15が複数存在する場合は複数のRb15がそれぞれ異なっていてもよく、
     A1は、-O-、-C(=O)-O-、-O-C(=O)-、-NR-、-NRC(=O)-、又は-C(=O)NR-であり、前記Rは水素原子、炭素数1~4のアルキル基又は炭素数1~4の含フッ素アルキル基であり、A1が複数存在する場合は複数のA1がそれぞれ異なっていてもよく、
     A2は、加水分解性基であり、A2が複数存在する場合は複数のA2がそれぞれ異なっていてもよく、
     b11、b12、b13、b14及びb15は、それぞれ独立して0~100の整数であり、
     cは、1~3の整数であり、
     Rfb10-、-Si(A2c(Rb153-c、b11個の-{C(Rb11)(Rb12)}-、b12個の-{C(Rfb11)(Rfb12)}-、b13個の-{Si(Rb13)(Rb14)}-、b14個の-{Si(Rfb13)(Rfb14)}-、b15個の-A1-は、Rfb10-、-Si(A2c(Rb153-cが末端となり、パーフルオロポリエーテル構造を形成せず、かつ-O-が-O-乃至-Fと連結しない限り、任意の順で並んで結合する。
    The water-repellent layer (r) is a cured layer of a mixed composition (ca) of an organosilicon compound (A) represented by the following formula (a1) and an organosilicon compound (B) represented by the following formula (b1). The laminate according to any one of claims 1 to 4.
    Figure JPOXMLDOC01-appb-C000001
    In the above formula (a1),
    Rf a1 has a divalent perfluoropolyether structure in which both ends are oxygen atoms.
    R 11, R 12, and R 13 are each independently an alkyl group having 1 to 20 carbon atoms, if R 11 there are a plurality may be different plural R 11 are each, R 12 is more if present may be different plurality of R 12 each may be the case where R 13 there are a plurality of different plural R 13 are each,
    E 1, E 2, E 3 , E 4, and E 5 is, independently represents a hydrogen atom or a fluorine atom, if E 1 there are a plurality may be different plurality of E 1, respectively, E 2 may be the case where there are plural different multiple E 2 respectively, when the E 3 there are a plurality may be different plurality of E 3 respectively, the plurality of E if E 4 there are a plurality of 4 may be different from each, if E 5 there are a plurality may be different plurality of E 5, respectively,
    G 1 and G 2 are 2- to 10-valent organosiloxane groups each independently having a siloxane bond.
    J 1 , J 2 , and J 3 are independently hydrolyzable groups or-(CH 2 ) e6- Si (OR 14 ) 3 , e 6 is 1-5, and R 14 is a methyl group. or an ethyl group, if J 1 there are a plurality may be different plurality of J 1, respectively, when J 2 there are a plurality may be different plurality of J 2, respectively, J 3 is more Multiple J 3s may be different if they exist
    L 1 and L 2 are divalent linking groups having 1 to 12 carbon atoms which may independently contain an oxygen atom, a nitrogen atom, or a fluorine atom, and when a plurality of L 1s are present, a plurality of L 1 and L 2 are divalent linking groups. It may be different for L 1, respectively, if L 2 there are a plurality may be different plurality of L 2, respectively,
    d11 is 1-9,
    d12 is 0-9,
    a10 and a14 are 0 to 10 independently of each other.
    a11 and a15 are independently 0 or 1, respectively.
    a12 and a16 are 0 to 9 independently of each other.
    a13 is 0 or 1,
    a21, a22, and a23 are 0 to 2 independently of each other.
    e1, e2, and e3 are 1 to 3 independently of each other.
    Figure JPOXMLDOC01-appb-C000002
    In the above formula (b1),
    Rf b10 is an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are replaced with fluorine atoms.
    R b11, R b12, R b13 and R b14 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R b11 there are a plurality differ plurality of R b11 each may, if R b12 there are a plurality may be different plural R b12 each may be the case where R b13 there are a plurality of different plural R b13 are each if R b14 there are multiple May have different R b14s,
    Rf b11, Rf b12, Rf b13 and Rf b14 are each independently one or more hydrogen atoms is an alkyl group or a fluorine atom carbon number of 1 to 20 substituted by a fluorine atom, Rf b11 multiple presence If you may be different plurality of Rf b11, respectively, differ if the Rf b12 there are a plurality may be different plurality of Rf b12, respectively, a plurality of Rf b13 If Rf b13 is present in plural even if well, if Rf b14 there are a plurality may be different plurality of Rf b14, respectively,
    R b15 is an alkyl group having 1 to 20 carbon atoms, it may be the case where R b15 there are a plurality of different plural R b15 are each,
    A 1 is -O-, -C (= O) -O-, -OC (= O)-, -NR-, -NRC (= O)-, or -C (= O) NR-. There, wherein R is a hydrogen atom, a fluorine-containing alkyl group of the alkyl group having 1 to 4 carbon atoms having 1 to 4 carbon atoms, if a 1 there are a plurality may be different plurality of a 1, respectively,
    A 2 is a hydrolyzable group, if A 2 there are a plurality may be different plurality of A 2, respectively,
    b11, b12, b13, b14 and b15 are independently integers from 0 to 100, respectively.
    c is an integer of 1 to 3 and
    Rf b10 -, - Si (A 2) c (R b15) 3-c, b11 amino - {C (R b11) ( R b12)} -, b12 amino - {C (Rf b11) ( Rf b12) }-, B13-{Si (R b13 ) (R b14 )}-, b14-{Si (Rf b13 ) (Rf b14 )}-, b15 -A 1- are Rf b10- , Arranged in any order as long as -Si (A 2 ) c (R b15 ) 3-c is the terminal, does not form a perfluoropolyether structure, and -O- is not linked to -O- to -F. Join.
  6.  前記中間層(c)は、下記式(c1)~(c3)のいずれかで表される有機ケイ素化合物(C)の混合組成物(cc)の硬化層又は前記有機ケイ素化合物(C)の蒸着層である請求項1~5のいずれかに記載の積層体。
    Figure JPOXMLDOC01-appb-C000003
     上記式(c1)中、
     Rx11、Rx12、Rx13、Rx14は、それぞれ独立して、水素原子又は炭素数が1~4のアルキル基であり、Rx11が複数存在する場合は複数のRx11がそれぞれ異なっていてもよく、Rx12が複数存在する場合は複数のRx12がそれぞれ異なっていてもよく、Rx13が複数存在する場合は複数のRx13がそれぞれ異なっていてもよく、Rx14が複数存在する場合は複数のRx14がそれぞれ異なっていてもよく、
     Rfx11、Rfx12、Rfx13、Rfx14は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfx11が複数存在する場合は複数のRfx11がそれぞれ異なっていてもよく、Rfx12が複数存在する場合は複数のRfx12がそれぞれ異なっていてもよく、Rfx13が複数存在する場合は複数のRfx13がそれぞれ異なっていてもよく、Rfx14が複数存在する場合は複数のRfx14がそれぞれ異なっていてもよく、
     Rx15は、炭素数が1~20のアルキル基であり、Rx15が複数存在する場合は複数のRx15がそれぞれ異なっていてもよく、
     X11は、加水分解性基であり、X11が複数存在する場合は複数のX11がそれぞれ異なっていてもよく、
     Y11は、-NH-、又は-S-であり、Y11が複数存在する場合は複数のY11がそれぞれ異なっていてもよく、
     Z11は、ビニル基、α-メチルビニル基、スチリル基、メタクリロイル基、アクリロイル基、アミノ基、イソシアネート基、イソシアヌレート基、エポキシ基、ウレイド基、又はメルカプト基であり、
     p1は、1~20の整数であり、p2、p3、p4は、それぞれ独立して、0~10の整数であり、p5は、1~10の整数であり、
     p6は、1~3の整数であり、
     Z11がアミノ基でない場合はY11の少なくとも1つが-NH-であり、Y11が全て-S-である場合はZ11がアミノ基であり、
     Z11-、-Si(X11p6(Rx153-p6、p1個の-{C(Rx11)(Rx12)}-、p2個の-{C(Rfx11)(Rfx12)}-、p3個の-{Si(Rx13)(Rx14)}-、p4個の-{Si(Rfx13)(Rfx14)}-、p5個の-Y11-は、Z11-及び-Si(X11p6(Rx153-p6が末端となり、-O-が-O-と連結しない限り、任意の順で並んで結合する。
    Figure JPOXMLDOC01-appb-C000004
     上記式(c2)中、
     Rx20及びRx21は、それぞれ独立して、水素原子又は炭素数が1~4のアルキル基であり、Rx20が複数存在する場合は複数のRx20がそれぞれ異なっていてもよく、Rx21が複数存在する場合は複数のRx21がそれぞれ異なっていてもよく、
     Rfx20及びRfx21は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfx20が複数存在する場合は複数のRfx20がそれぞれ異なっていてもよく、Rfx21が複数存在する場合は複数のRfx21がそれぞれ異なっていてもよく、
     Rx22及びRx23はそれぞれ独立して、炭素数が1~20のアルキル基であり、Rx22及びRx23が複数存在する場合は複数のRx22及びRx23がそれぞれ異なっていてもよく、
     X20及びX21はそれぞれ独立して、加水分解性基であり、X20及びX21が複数存在する場合は複数のX20及びX21がそれぞれ異なっていてもよく、
     p20は、それぞれ独立して1~30の整数であり、p21は、それぞれ独立して0~30の整数であり、p20又はp21を付して括弧でくくられた繰り返し単位の少なくとも1つは、アミン骨格-NR100-に置き換わっており、前記アミン骨格におけるR100は水素原子又はアルキル基であり、
     p22及びp23はそれぞれ独立して、1~3の整数であり、
     p20個の-{C(Rx20)(Rx21)}-、p21個の-{C(Rfx20)(Rfx21)}-は、p20個又はp21個が連続である必要はなく、任意の順で並んで結合し、両末端が-Si(X20p22(Rx223-p22及び-Si(X21p23(Rx233-p23となる。
    Figure JPOXMLDOC01-appb-C000005
    上記式(c3)中、
     Z31、Z32は、それぞれ独立に、加水分解性基及びヒドロキシ基以外の、反応性官能基であり、
     Rx31、Rx32、Rx33、Rx34は、それぞれ独立して、水素原子又は炭素数が1~4のアルキル基であり、Rx31が複数存在する場合は複数のRx31がそれぞれ異なっていてもよく、Rx32が複数存在する場合は複数のRx32がそれぞれ異なっていてもよく、Rx33が複数存在する場合は複数のRx33がそれぞれ異なっていてもよく、Rx34が複数存在する場合は複数のRx34がそれぞれ異なっていてもよく、
     Rfx31、Rfx32、Rfx33、Rfx34は、それぞれ独立して、1個以上の水素原子がフッ素原子に置換された炭素数1~20のアルキル基又はフッ素原子であり、Rfx31が複数存在する場合は複数のRfx31がそれぞれ異なっていてもよく、Rfx32が複数存在する場合は複数のRfx32がそれぞれ異なっていてもよく、Rfx33が複数存在する場合は複数のRfx33がそれぞれ異なっていてもよく、Rfx34が複数存在する場合は複数のRfx34がそれぞれ異なっていてもよく、
     Y31は、-NH-、-N(CH3)-又は-O-であり、Y31が複数存在する場合は複数のY31がそれぞれ異なっていてもよく、
     X31、X32、X33、X34は、それぞれ独立に、-ORc(Rcは、水素原子、炭素数1~4のアルキル基、又はアミノC1-3アルキルジC1-3アルコキシシリル基である)であり、X31が複数存在する場合は複数のX31がそれぞれ異なっていてもよく、X32が複数存在する場合は複数のX32がそれぞれ異なっていてもよく、X33が複数存在する場合は複数のX33がそれぞれ異なっていてもよく、X34が複数存在する場合は複数のX34がそれぞれ異なっていてもよく、
     p31は、0~20の整数であり、p32、p33、p34は、それぞれ独立して、0~10の整数であり、p35は、0~5の整数であり、p36は、1~10の整数であり、p37は0又は1であり、
     Z31及びZ32の少なくとも一方がアミノ基であるか、又はY31の少なくとも一つが-NH-又は-N(CH3)-であるという条件を満たし、かつ末端がZ31-及びZ32-であり、-O-が-O-と連結しない限り、p31個の-{C(Rx31)(Rx32)}-、p32個の-{C(Rfx31)(Rfx32)}-、p33個の-{Si(Rx33)(Rx34)}-、p34個の-{Si(Rfx33)(Rfx34)}-、p35個の-Y31-、p36個の-{Si(X31)(X32)-O}-、p37個の-{Si(X33)(X34)}-が任意の順で並んで結合して構成される。
    The intermediate layer (c) is a cured layer of a mixed composition (cc) of an organosilicon compound (C) represented by any of the following formulas (c1) to (c3) or a vapor deposition of the organosilicon compound (C). The laminate according to any one of claims 1 to 5, which is a layer.
    Figure JPOXMLDOC01-appb-C000003
    In the above formula (c1),
    R x11, R x12, R x13 , R x14 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R x11 there are a plurality differ plurality of R x11 are each may, if R x12 there are a plurality may be different plural R x12 are each may be the case where R x13 there are a plurality of different plural R x13 are each if R x14 there are multiple May have different R x14s,
    Rf x11 , Rf x12 , Rf x13 , and Rf x14 are each independently an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf x11. If you may be different plurality of Rf x11 respectively, differ if the Rf x12 there are a plurality may be different plurality of Rf x12, respectively, a plurality of Rf x13 If Rf x13 is present in plural even if well, if Rf x14 there are a plurality may be different plurality of Rf x14, respectively,
    R x15 is an alkyl group having 1 to 20 carbon atoms, it may be the case where R x15 there are a plurality of different plural R x15 are each,
    X 11 is a hydrolysable group, if X 11 there are a plurality may be different plurality of X 11 are each,
    Y 11 is, -NH-, or -S-. And, in the case where Y 11 there are a plurality may be different plurality of Y 11, respectively,
    Z 11 is a vinyl group, an α-methylvinyl group, a styryl group, a methacryloyl group, an acryloyl group, an amino group, an isocyanate group, an isocyanurate group, an epoxy group, a ureido group, or a mercapto group.
    p1 is an integer of 1 to 20, p2, p3, and p4 are independently integers of 0 to 10, and p5 is an integer of 1 to 10.
    p6 is an integer of 1 to 3 and
    If Z 11 is not an amino group, then at least one of Y 11 is -NH-, and if Y 11 is all -S-, then Z 11 is an amino group.
    Z 11 -, - Si (X 11) p6 (R x15) 3-p6, p1 amino - {C (R x11) ( R x12)} -, p2 amino - {C (Rf x11) ( Rf x12) } -, p3 amino - {Si (R x13) ( R x14)} -, p4 amino - {Si (Rf x13) ( Rf x14)} -, p5 amino -Y 11 - is, Z 11 - and -Si (X 11 ) p6 (R x15 ) 3-p6 is the end, and unless -O- is connected to -O-, they are connected side by side in any order.
    Figure JPOXMLDOC01-appb-C000004
    In the above formula (c2),
    R x20 and R x21 are each independently a hydrogen atom or an alkyl group of 1 to 4 carbon atoms, if R x20 there are a plurality may be different plural R x20 are each, R x21 is If there are multiple R x21s, multiple R x21s may be different.
    Rf x20 and Rf x21 are each independently an alkyl group having 1 to 20 carbon atoms or a fluorine atom in which one or more hydrogen atoms are substituted with fluorine atoms, and when a plurality of Rf x20 are present, a plurality of Rfs are present. x20 well be different from each other, when the Rf x21 there is more than one may be different multiple of Rf x21, respectively,
    And each R x22 and R x23 is independently an alkyl group having 1 to 20 carbon atoms, may be the case where R x22 and R x23 there are a plurality of different plural R x22 and R x23 are each,
    X 20 and X 21 are each independently a hydrolysable group, if X 20 and X 21 there are a plurality may be different plurality of X 20 and X 21 are each,
    p20 is an integer of 1 to 30 independently, p21 is an integer of 0 to 30 independently, and at least one of the repeating units in parentheses with p20 or p21 is It has been replaced by an amine skeleton-NR 100 -where R 100 in the amine skeleton is a hydrogen atom or an alkyl group.
    p22 and p23 are independently integers of 1 to 3, respectively.
    The p20-{C (R x20 ) (R x21 )}-and the p21-{C (Rf x20 ) (Rf x21 )}-do not have to be continuous p20 or p21, and are arbitrary. They are joined side by side in order, and both ends are -Si (X 20 ) p22 (R x22) 3-p22 and -Si (X 21 ) p23 (R x23 ) 3-p23 .
    Figure JPOXMLDOC01-appb-C000005
    In the above formula (c3),
    Z 31 and Z 32 are reactive functional groups other than the hydrolyzable group and the hydroxy group, respectively.
    R x31, R x32, R x33 , R x34 are each independently a hydrogen atom or a carbon atoms is an alkyl group of 1 to 4, if R x31 there are a plurality differ plurality of R x31 are each may, if R x32 there are a plurality may be different plural R x32 are each may be the case where R x33 there are a plurality of different plural R x33 are each if R x34 there are multiple May have different R x 34s,
    Rf x31 , Rf x32 , Rf x33 , and Rf x34 are independently alkyl groups or fluorine atoms having 1 to 20 carbon atoms in which one or more hydrogen atoms are substituted with fluorine atoms, and there are a plurality of Rf x31. If you may be different plurality of Rf x31 respectively, differ if the Rf x32 there are a plurality may be different plurality of Rf x32, respectively, a plurality of Rf x33 If Rf x33 is present in plural even if well, if Rf x34 there are a plurality may be different plurality of Rf x34, respectively,
    Y 31 is, -NH -, - N (CH 3) - or -O-. And, in the case where the Y 31 there are a plurality may be different plurality of Y 31, respectively,
    X 31 , X 32 , X 33 , and X 34 are independently -OR c (R c is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or an amino C 1-3 alkyl di C 1-3 alkoxysilyl. a is a group), if X 31 there are a plurality may be different plurality of X 31 are each, if X 32 there are a plurality may be different plurality of X 32 are each, X 33 is If there are two or more may be different plurality of X 33 are each, if X 34 there are a plurality may be different plurality of X 34 are each,
    p31 is an integer of 0 to 20, p32, p33, and p34 are independently integers of 0 to 10, p35 is an integer of 0 to 5, and p36 is an integer of 1 to 10. And p37 is 0 or 1
    The condition that at least one of Z 31 and Z 32 is an amino group, or at least one of Y 31 is -NH- or -N (CH 3 )-is satisfied, and the ends are Z 31- and Z 32- And unless -O- is connected to -O-, p31- {C (R x31) (R x32 )}-, p32- {C (Rf x31) (Rf x32 )}-, p33 number of - {Si (R x33) ( R x34)} -, p34 amino - {Si (Rf x33) ( Rf x34)} -, p35 amino -Y 31 -, p36 amino - {Si (X 31 ) (X 32 ) -O}-, p37- {Si (X 33 ) (X 34 )}-are combined side by side in any order.
  7.  請求項1~6のいずれかに記載の積層体、偏光板、タッチセンサ、及び表示パネルを含むフレキシブル表示装置。 A flexible display device including the laminate, polarizing plate, touch sensor, and display panel according to any one of claims 1 to 6.
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