KR20200040723A - Colored curable resin composition - Google Patents

Colored curable resin composition Download PDF

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KR20200040723A
KR20200040723A KR1020200042590A KR20200042590A KR20200040723A KR 20200040723 A KR20200040723 A KR 20200040723A KR 1020200042590 A KR1020200042590 A KR 1020200042590A KR 20200042590 A KR20200042590 A KR 20200042590A KR 20200040723 A KR20200040723 A KR 20200040723A
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resin composition
curable resin
colored curable
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KR102199589B1 (en
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도루 아시다
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동우 화인켐 주식회사
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

The present invention relates to a colored curable resin composition comprising: a coloring agent (A) including a compound represented by chemical formula (l); a resin (B); a photopolymerization compound (C); and a photopolymerization initiator (D). The resin (B) is an alkali-soluble resin. In the chemical formula (l), X^- represents an anion derived from a dye and Y^+ represents a cation derived from a compound represented by chemical formula (Y). In the chemical formula (Y), n represents an integer of 1-8 and R^40 represents an alkyl group of 1-4 carbon atoms. The present invention can obtain a color filter having excellent heat resistance.

Description

착색 경화성 수지 조성물{COLORED CURABLE RESIN COMPOSITION}Colored curable resin composition {COLORED CURABLE RESIN COMPOSITION}

본 발명은, 착색 경화성 수지 조성물에 관한 것이다.The present invention relates to a colored curable resin composition.

착색 경화성 수지 조성물은, 액정 표시 장치, 일렉트로루미네센스 표시 장치, 플라즈마 디스플레이 등의 표시 장치에 사용되는 컬러 필터의 제조에 이용되고 있다. 착색 경화성 수지 조성물로는, 하기의 화합물을 포함하는 착색 경화성 수지 조성물이 기재되어 있다(일본 특허 공개 제2013-7032호).The colored curable resin composition is used for the production of color filters used in display devices such as liquid crystal display devices, electroluminescence display devices, and plasma displays. As a coloring curable resin composition, the coloring curable resin composition containing the following compound is described (Japanese Patent Publication No. 2013-7032).

Figure pat00001
Figure pat00001

본 발명은, 이하의 [1]∼[7]을 제공하는 것이다.The present invention provides the following [1] to [7].

[1] 화학식 (I)로 표시되는 화합물을 포함하는 착색제(A),[1] A colorant (A) comprising a compound represented by formula (I),

수지(B),Resin (B),

광중합성 화합물(C) 및Photopolymerizable compound (C) and

광중합 개시제(D)Photopolymerization initiator (D)

를 포함하는 착색 경화성 수지 조성물.Colored curable resin composition comprising a.

Figure pat00002
Figure pat00002

[상기 화학식 (I)에서, X-는, 염료에서 유래되는 음이온을 나타내고, Y+는 화학식 (Y)로 표시되는 화합물에서 유래되는 양이온을 나타낸다.[In the formula (I), X - represents an anion derived from a dye, and Y + represents a cation derived from a compound represented by the formula (Y).

Figure pat00003
Figure pat00003

(상기 화학식 (Y)에서, n은 1∼8의 정수를 나타내고, R40은 탄소수 1∼4의 알킬기를 나타낸다.)](In the formula (Y), n represents an integer of 1 to 8, and R 40 represents an alkyl group having 1 to 4 carbon atoms.)]

[2] 염료에서 유래되는 음이온은, 함금 아조 염료 또는 트리아릴메탄 염료에서 유래되는 음이온인 [1]에 기재된 착색 경화성 수지 조성물.[2] The colored curable resin composition according to [1], wherein the anion derived from the dye is an anion derived from an alloy azo dye or a triarylmethane dye.

[3] 염료에서 유래되는 음이온은, 함금 아조 염료에서 유래되는 음이온인 [1] 또는 [2]에 기재된 착색 경화성 수지 조성물.[3] The colored curable resin composition according to [1] or [2], wherein the anion derived from the dye is an anion derived from the alloy azo dye.

[4] 함금 아조 염료에서 유래되는 음이온은, 화학식 (A0)으로 표시되는 [2] 또는 [3]에 기재된 착색 경화성 수지 조성물.[4] The colored curable resin composition according to [2] or [3], wherein the anion derived from the alloy azo dye is represented by the formula (A0).

Figure pat00004
Figure pat00004

[상기 화학식 (A0)에서, R1∼R18은 각각 독립적으로 수소 원자, 할로겐 원자, 탄소수 1∼10의 1가의 알킬기, 니트로기 또는 -SO2R29를 나타낸다.[In the formula (A0), R 1 to R 18 each independently represent a hydrogen atom, a halogen atom, a monovalent alkyl group having 1 to 10 carbon atoms, a nitro group, or -SO 2 R 29 .

R29는 -OH, -NHR30 또는 -R32를 나타낸다.R 29 represents -OH, -NHR 30 or -R 32 .

R30은 수소 원자, 탄소수 1∼10의 1가의 알킬기, 탄소수 1∼4의 알킬기로 치환되어 있어도 좋은 시클로헥실기, -R31-O-R33, -R34-CO-O-R35, -R36-O-CO-R37, 또는 탄소수 7∼10의 아랄킬기를 나타낸다.R 30 is a hydrogen atom, a monovalent alkyl group having 1 to 10 carbon atoms, a cyclohexyl group which may be substituted with an alkyl group having 1 to 4 carbon atoms, -R 31 -OR 33 , -R 34 -CO-OR 35 , -R 36- O-CO-R 37 or an aralkyl group having 7 to 10 carbon atoms.

R31, R34 및 R36은 각각 독립적으로 탄소수 1∼8의 2가의 알칸디일기를 나타낸다.R 31 , R 34 and R 36 each independently represent a divalent alkanediyl group having 1 to 8 carbon atoms.

R32, R33, R35 및 R37은 각각 독립적으로 탄소수 1∼8의 1가의 알킬기를 나타낸다.R 32 , R 33 , R 35 and R 37 each independently represent a monovalent alkyl group having 1 to 8 carbon atoms.

R19 및 R20은 각각 독립적으로 수소 원자, 메틸기, 에틸기 또는 아미노기를 나타낸다.R 19 and R 20 each independently represent a hydrogen atom, a methyl group, an ethyl group, or an amino group.

M1은 Cr 또는 Co를 나타낸다.]M 1 represents Cr or Co.]

[5] 착색제(A)는 안료를 더 포함하는 [1]∼[4] 중 어느 하나에 기재된 착색 경화성 수지 조성물.[5] The coloring curable resin composition according to any one of [1] to [4], wherein the coloring agent (A) further contains a pigment.

[6] [1]∼[5] 중 어느 하나에 기재된 착색 경화성 수지 조성물에 의해 형성되는 컬러 필터.[6] A color filter formed of the colored curable resin composition according to any one of [1] to [5].

[7] [6]에 기재된 컬러 필터를 포함하는 표시 장치.[7] A display device comprising the color filter according to [6].

본 발명의 착색 경화성 수지 조성물에 따르면, 내열성이 우수한 컬러 필터를 얻을 수 있다.According to the colored curable resin composition of the present invention, a color filter excellent in heat resistance can be obtained.

본 발명의 착색 경화성 수지 조성물은,The colored curable resin composition of the present invention,

화학식 (I)로 표시되는 화합물[이하, 「화합물 (I)」이라고 기재하는 경우도 있음]을 포함하는 착색제(A),A colorant (A) containing a compound represented by the formula (I) (hereinafter sometimes referred to as "compound (I)"),

수지(B),Resin (B),

광중합성 화합물(C) 및Photopolymerizable compound (C) and

광중합 개시제(D)를 함유한다.It contains a photoinitiator (D).

Figure pat00005
Figure pat00005

상기 화학식 (I)에서, X-는 염료에서 유래되는 음이온을 나타내고,In the formula (I), X - represents an anion derived from a dye,

Y+는 화학식 (Y)로 표시되는 화합물에서 유래되는 양이온을 나타낸다.Y + represents a cation derived from the compound represented by the formula (Y).

Figure pat00006
Figure pat00006

상기 화학식 (Y)에서, n은 1∼8의 정수를 나타내고, R40은 탄소수 1∼4의 알킬기를 나타낸다.In the formula (Y), n represents an integer of 1 to 8, and R 40 represents an alkyl group having 1 to 4 carbon atoms.

염료로는, 함금 아조 염료, 트리아릴메탄 염료, 크산텐 염료 및 시아닌 염료를 들 수 있고, 그 중에서도, 함금 아조 염료 및 트리아릴메탄 염료가 바람직하며, 함금 아조 염료가 보다 바람직하다.Examples of the dyes include alloy azo dyes, triarylmethane dyes, xanthene dyes, and cyanine dyes. Among these, alloy azo dyes and triarylmethane dyes are preferred, and alloy azo dyes are more preferred.

함금 아조 염료에서 유래되는 음이온으로는, 하기 다이렉트 옐로우 112나 애시드 블루 158에서 유래되는 음이온, 하기 화학식 (A0)으로 표시되는 음이온 등을 들 수 있다.Examples of the anion derived from the alloy azo dye include an anion derived from the following direct yellow 112 or acid blue 158, an anion represented by the following formula (A0), and the like.

Figure pat00007
Figure pat00007

Figure pat00008
Figure pat00008

함금 아조 염료에서 유래되는 음이온 중에서도, 화학식 (A0)으로 표시되는 음이온이 바람직하다.Among the anions derived from the alloy azo dye, anions represented by the formula (A0) are preferred.

Figure pat00009
Figure pat00009

상기 화학식 (A0)에서, R1∼R18은 각각 독립적으로 수소 원자, 할로겐 원자, 탄소수 1∼10의 1가의 알킬기, 니트로기 또는 -SO2R29를 나타낸다.In the formula (A0), R 1 to R 18 each independently represent a hydrogen atom, a halogen atom, a monovalent alkyl group having 1 to 10 carbon atoms, a nitro group, or -SO 2 R 29 .

R29는 -OH, -NHR30 또는 -R32를 나타낸다.R 29 represents -OH, -NHR 30 or -R 32 .

R30은 수소 원자, 탄소수 1∼10의 1가의 알킬기, 탄소수 1∼4의 알킬기로 치환되어 있어도 좋은 시클로헥실기, -R31-O-R33, -R34-CO-O-R35, -R36-O-CO-R37, 또는 탄소수 7∼10의 아랄킬기를 나타낸다.R 30 is a hydrogen atom, a monovalent alkyl group having 1 to 10 carbon atoms, a cyclohexyl group which may be substituted with an alkyl group having 1 to 4 carbon atoms, -R 31 -OR 33 , -R 34 -CO-OR 35 , -R 36- O-CO-R 37 or an aralkyl group having 7 to 10 carbon atoms.

R31, R34 및 R36은 각각 독립적으로 탄소수 1∼8의 2가의 알칸디일기를 나타낸다.R 31 , R 34 and R 36 each independently represent a divalent alkanediyl group having 1 to 8 carbon atoms.

R32, R33, R35 및 R37은 각각 독립적으로 탄소수 1∼8의 1가의 알킬기를 나타낸다.R 32 , R 33 , R 35 and R 37 each independently represent a monovalent alkyl group having 1 to 8 carbon atoms.

R19 R20은 각각 독립적으로 수소 원자, 메틸기, 에틸기 또는 아미노기를 나타낸다.R 19 and R 20 each independently represents a hydrogen atom, a methyl group, an ethyl group, or an amino group.

M1은 Cr 또는 Co를 나타낸다.M 1 represents Cr or Co.

화학식 (A0)에 있어서, 탄소수 1∼10의 1가의 알킬기로는, 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, sec-부틸기, tert-부틸기, n-펜틸기, n-헥실기, n-헵틸기, n-옥틸기, 데실기, 1-메틸부틸기, 1,1,3,3-테트라메틸부틸기, 1,5-디메틸헥실기, 1,6-디메틸헵틸기, 2-에틸헥실기 및 1,1,5,5-테트라메틸헥실기 등을 들 수 있다.In the formula (A0), as the monovalent alkyl group having 1 to 10 carbon atoms, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, n-pentyl group , n-hexyl group, n-heptyl group, n-octyl group, decyl group, 1-methylbutyl group, 1,1,3,3-tetramethylbutyl group, 1,5-dimethylhexyl group, 1,6- And dimethylheptyl group, 2-ethylhexyl group, and 1,1,5,5-tetramethylhexyl group.

탄소수 1∼4의 알킬기로는, 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, sec-부틸기, tert-부틸기 등을 들 수 있다.Examples of the alkyl group having 1 to 4 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, and tert-butyl group.

탄소수 7∼10의 아랄킬기로는, 페닐메틸기, 페닐에틸기, 페닐프로필기 등을 들 수 있다.Examples of the aralkyl group having 7 to 10 carbon atoms include a phenylmethyl group, a phenylethyl group, and a phenylpropyl group.

탄소수 1∼8의 2가의 알칸디일기로는, 메틸렌기, 에틸렌기, 프로판-1,3-디일기, 프로판-1,2-디일기, 부탄-1,4-디일기, 부탄-1,3-디일기, 펜탄-1,5-디일기, 헥산-1,6-디일기, 헵탄-1,7-디일기, 옥탄-1,8-디일기 등을 들 수 있다.Examples of the divalent alkanediyl group having 1 to 8 carbon atoms include methylene group, ethylene group, propane-1,3-diyl group, propane-1,2-diyl group, butane-1,4-diyl group, butane-1, 3-diyl group, pentane-1,5-diyl group, hexane-1,6-diyl group, heptane-1,7-diyl group, octane-1,8-diyl group, etc. are mentioned.

탄소수 1∼8의 1가의 알킬기로는, 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, sec-부틸기, tert-부틸기, n-펜틸기, n-헥실기, n-헵틸기, n-옥틸기 등을 들 수 있다.As the monovalent alkyl group having 1 to 8 carbon atoms, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, tert-butyl group, n-pentyl group, n-hexyl group, n -Heptyl group, n-octyl group, and the like.

할로겐 원자로는, 불소 원자, 염소 원자, 브롬 원자, 요오드 원자를 들 수 있고, 그 중에서도 불소 원자 및 염소 원자가 바람직하다.Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and among them, a fluorine atom and a chlorine atom are preferable.

탄소수 1∼10의 1가의 알킬기로는 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, sec-부틸기, tert-부틸기가 바람직하다.As a monovalent alkyl group having 1 to 10 carbon atoms, a methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, and tert-butyl group are preferable.

-SO2R29로는, -SO3H로 표시되는 술포기, -SO2NHR30으로 표시되는 기, -SO2R32로 표시되는 기를 들 수 있다.Examples of -SO 2 R 29 include a sulfo group represented by -SO 3 H, a group represented by -SO 2 NHR 30, and a group represented by -SO 2 R 32 .

R30으로 표시되는 탄소수 1∼10의 1가의 알킬기로는, 메틸기, 에틸기, n-프로필기, 이소프로필기, n-부틸기, sec-부틸기, tert-부틸기 등의 탄소수 1∼4의 1가의 알킬기가 바람직하다.Examples of the monovalent alkyl group having 1 to 10 carbon atoms represented by R 30 include 1 to 4 carbon atoms such as methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group and tert-butyl group. A monovalent alkyl group is preferred.

탄소수 1∼4의 알킬기로 치환되어 있어도 좋은 시클로헥실기로는, 시클로헥실기, 2-메틸시클로헥실기, 2-에틸시클로헥실기, 2-프로필시클로헥실기, 2-이소프로필시클로헥실기, 2-부틸시클로헥실기, 4-메틸시클로헥실기, 4-에틸시클로헥실기, 4-프로필시클로헥실기, 4-이소프로필시클로헥실기, 4-부틸시클로헥실기 등을 들 수 있고, 2 위치에 탄소수 1∼4의 알킬기를 갖는 시클로헥실기가 바람직하며, 2-메틸시클로헥실기가 바람직하다.As the cyclohexyl group which may be substituted with an alkyl group having 1 to 4 carbon atoms, cyclohexyl group, 2-methylcyclohexyl group, 2-ethylcyclohexyl group, 2-propylcyclohexyl group, 2-isopropylcyclohexyl group, 2-butylcyclohexyl group, 4-methylcyclohexyl group, 4-ethylcyclohexyl group, 4-propylcyclohexyl group, 4-isopropylcyclohexyl group, 4-butylcyclohexyl group, etc. may be mentioned, and 2 positions A cyclohexyl group having an alkyl group having 1 to 4 carbon atoms is preferable, and a 2-methylcyclohexyl group is preferable.

-R31-O-R33으로는, 메톡시메틸기, 에톡시메틸기, 프로폭시메틸기, 메톡시에틸기, 에톡시에틸기, 프로폭시에틸기, 메톡시프로필기, 에톡시프로필기, 프로폭시프로필기, 2-옥소-4-메톡시부틸기, 옥틸옥시프로필기, 3-에톡시프로필기, 3-(2-에틸헥실옥시)프로필기 등을 들 수 있고, (C1-C4 알콕시)메틸기가 바람직하며, 메톡시메틸기 및 에톡시메틸기가 바람직하다.As -R 31 -OR 33 , methoxymethyl group, ethoxymethyl group, propoxymethyl group, methoxyethyl group, ethoxyethyl group, propoxyethyl group, methoxypropyl group, ethoxypropyl group, propoxypropyl group, 2- And an oxo-4-methoxybutyl group, octyloxypropyl group, 3-ethoxypropyl group, 3- (2-ethylhexyloxy) propyl group, and the like, (C1-C4 alkoxy) methyl group is preferred, Methoxymethyl group and ethoxymethyl group are preferred.

-R34-CO-O-R35로는, 메톡시카르보닐메틸기, 메톡시카르보닐에틸기, 에톡시카르보닐메틸기, 에톡시카르보닐에틸기, 프로폭시카르보닐메틸기, 프로폭시카르보닐에틸기, 부톡시카르보닐메틸기, 부톡시카르보닐에틸기 등을 들 수 있고, 메톡시카르보닐메틸기 또는 메톡시카르보닐에틸기가 바람직하다.As -R 34 -CO-OR 35 , methoxycarbonylmethyl group, methoxycarbonylethyl group, ethoxycarbonylmethyl group, ethoxycarbonylethyl group, propoxycarbonylmethyl group, propoxycarbonylethyl group, butoxycarbonyl A methyl group, butoxycarbonyl ethyl group, etc. are mentioned, A methoxycarbonyl methyl group or a methoxycarbonyl ethyl group is preferable.

-R36-O-CO-R37로는, 아세틸옥시메틸기, 아세틸옥시에틸기, 에틸카르보닐옥시메틸기, 에틸카르보닐옥시에틸기, 프로필카르보닐옥시메틸기, 프로필카르보닐옥시에틸기, 부틸카르보닐옥시메틸기, 부틸카르보닐옥시에틸기 등을 들 수 있고, 아세틸옥시메틸기 및 아세틸옥시에틸기가 바람직하다.Examples of -R 36 -O-CO-R 37 include acetyloxymethyl group, acetyloxyethyl group, ethylcarbonyloxymethyl group, ethylcarbonyloxyethyl group, propylcarbonyloxymethyl group, propylcarbonyloxyethyl group, butylcarbonyloxymethyl group, And butylcarbonyloxyethyl groups, and acetyloxymethyl groups and acetyloxyethyl groups are preferred.

R30으로는, 수소 원자가 바람직하다.As R 30 , a hydrogen atom is preferable.

-SO2NHR30으로 표시되는 기로는, N-메틸술파모일기, N-에틸술파모일기, N-프로필술파모일기, N-이소프로필술파모일기, N-부틸술파모일기, N-이소부틸술파모일기, N-sec-부틸술파모일기, N-tert-부틸술파모일기, N-펜틸술파모일기, N-(1-에틸프로필)술파모일기, N-(1,1-디메틸프로필)술파모일기, N-(1,2-디메틸프로필)술파모일기, N-(2,2-디메틸프로필)술파모일기, N-(1-메틸부틸)술파모일기, N-(2-메틸부틸)술파모일기, N-(3-메틸부틸)술파모일기, N-시클로펜틸술파모일기, N-헥실술파모일기, N-(1,3-디메틸부틸)술파모일기, N-(3,3-디메틸부틸)술파모일기, N-헵틸술파모일기, N-(1-메틸헥실)술파모일기, N-(1,4-디메틸펜틸)술파모일기, N-옥틸술파모일기, N-(2-에틸헥실)술파모일기, N-(1,5-디메틸)헥실술파모일기, N-(1,1,2,2-테트라메틸부틸)술파모일기, N-알릴술파모일기 등의 지방족 탄화수소기로 치환된 술파모일기;The group represented by -SO 2 NHR 30 is N-methylsulfamoyl group, N-ethylsulfamoyl group, N-propylsulfamoyl group, N-isopropylsulfamoyl group, N-butylsulfamoyl group, N-iso Butyl sulfamoyl group, N-sec-butyl sulfamoyl group, N-tert-butyl sulfamoyl group, N-pentyl sulfamoyl group, N- (1-ethylpropyl) sulfamoyl group, N- (1,1-dimethyl Profile) sulfamoyl group, N- (1,2-dimethylpropyl) sulfamoyl group, N- (2,2-dimethylpropyl) sulfamoyl group, N- (1-methylbutyl) sulfamoyl group, N- (2 -Methylbutyl) sulfamoyl group, N- (3-methylbutyl) sulfamoyl group, N-cyclopentylsulfamoyl group, N-hexylsulfamoyl group, N- (1,3-dimethylbutyl) sulfamoyl group, N -(3,3-dimethylbutyl) sulfamoyl group, N-heptylsulfamoyl group, N- (1-methylhexyl) sulfamoyl group, N- (1,4-dimethylpentyl) sulfamoyl group, N-octylsul Pamoyl group, N- (2-ethylhexyl) sulfamoyl group, N- (1,5-dimethyl) hexylsulfamoyl group, N- (1,1,2,2-tetramethylbutyl) sulfamoyl group, N- Aliphatic such as allyl sulfamoyl group A sulfamoyl group substituted with a hydrocarbon;

N-(2-메톡시에틸)술파모일기, N-(2-에톡시에틸)술파모일기, N-(1-메톡시프로필)술파모일기, N-(3-메톡시프로필)술파모일기, N-(3-에톡시프로필)술파모일기, N-(3-프로폭시프로필)술파모일기, N-(3-이소프로폭시프로필)술파모일기, N-(3-헥시록시프로필)술파모일기, N-(2-에틸헥실옥시프로필)술파모일기, N-(3-tert-부톡시프로필)술파모일기, N-(4-옥틸옥시부틸)술파모일기 등의 -R31-O-R33으로 치환된 술파모일기;N- (2-methoxyethyl) sulfamoyl group, N- (2-ethoxyethyl) sulfamoyl group, N- (1-methoxypropyl) sulfamoyl group, N- (3-methoxypropyl) sulfamoyl Diary, N- (3-ethoxypropyl) sulfamoyl group, N- (3-propoxypropyl) sulfamoyl group, N- (3-isopropoxypropyl) sulfamoyl group, N- (3-hexyoxypropyl -R such as sulfamoyl group, N- (2-ethylhexyloxypropyl) sulfamoyl group, N- (3-tert-butoxypropyl) sulfamoyl group, N- (4-octyloxybutyl) sulfamoyl group, etc. A sulfamoyl group substituted with 31 -OR 33 ;

N-(메톡시카르보닐메틸)술파모일기, N-(메톡시카르보닐에틸)술파모일기, N-(에톡시카르보닐메틸)술파모일기, N-(에톡시카르보닐에틸)술파모일기, N-(프로폭시카르보닐메틸)술파모일기, N-(프로폭시카르보닐에틸)술파모일기, N-(부톡시카르보닐메틸)술파모일기, N-(부톡시카르보닐에틸)술파모일기 등의 -R34-CO-O-R35로 치환된 술파모일기;N- (methoxycarbonylmethyl) sulfamoyl group, N- (methoxycarbonylethyl) sulfamoyl group, N- (ethoxycarbonylmethyl) sulfamoyl group, N- (ethoxycarbonylethyl) sulfamoyl Diary, N- (propoxycarbonylmethyl) sulfamoyl group, N- (propoxycarbonylethyl) sulfamoyl group, N- (butoxycarbonylmethyl) sulfamoyl group, N- (butoxycarbonylethyl) Sulfamoyl groups substituted with -R 34 -CO-OR 35 such as sulfamoyl groups;

N-(아세틸옥시메틸)술파모일기, N-(아세틸옥시에틸)술파모일기, N-(에틸카르보닐옥시메틸)술파모일기, N-(에틸카르보닐옥시에틸)술파모일기, N-(프로필카르보닐옥시메틸)술파모일기, N-(프로필카르보닐옥시에틸)술파모일기, N-(부틸카르보닐옥시메틸)술파모일기, N-(부틸카르보닐옥시에틸)술파모일기 등의 -R36-O-CO-R37로 치환된 술파모일기;N- (acetyloxymethyl) sulfamoyl group, N- (acetyloxyethyl) sulfamoyl group, N- (ethylcarbonyloxymethyl) sulfamoyl group, N- (ethylcarbonyloxyethyl) sulfamoyl group, N- (Propylcarbonyloxymethyl) sulfamoyl group, N- (propylcarbonyloxyethyl) sulfamoyl group, N- (butylcarbonyloxymethyl) sulfamoyl group, N- (butylcarbonyloxyethyl) sulfamoyl group, etc. A sulfamoyl group substituted with -R 36 -O-CO-R 37 of;

N-시클로헥실술파모일기, N-(2-메틸시클로헥실)술파모일기, N-(3-메틸시클로헥실)술파모일기, N-(4-메틸시클로헥실)술파모일기, N-(4-부틸시클로헥실)술파모일기 등의 치환기를 갖는 시클로헥실기로 치환된 술파모일기;N-cyclohexyl sulfamoyl group, N- (2-methylcyclohexyl) sulfamoyl group, N- (3-methylcyclohexyl) sulfamoyl group, N- (4-methylcyclohexyl) sulfamoyl group, N- ( A sulfamoyl group substituted with a cyclohexyl group having a substituent such as 4-butylcyclohexyl) sulfamoyl group;

N-벤질술파모일기, N-(1-페닐에틸)술파모일기, N-(2-페닐에틸)술파모일기, N-(3-페닐프로필)술파모일기, N-(4-페닐부틸)술파모일기, N-[2-(2-나프틸)에틸]술파모일기, N-[2-(4-메틸페닐)에틸]술파모일기, N-(3-페닐-1-프로필)술파모일기, N-(3-페닐-1-메틸프로필)술파모일기 등의 아랄킬기로 치환된 술파모일기 등을 들 수 있다.N-benzyl sulfamoyl group, N- (1-phenylethyl) sulfamoyl group, N- (2-phenylethyl) sulfamoyl group, N- (3-phenylpropyl) sulfamoyl group, N- (4-phenylbutyl ) Sulfamoyl group, N- [2- (2-naphthyl) ethyl] sulfamoyl group, N- [2- (4-methylphenyl) ethyl] sulfamoyl group, N- (3-phenyl-1-propyl) sulfide And sulfamoyl groups substituted with aralkyl groups such as pamoyl group and N- (3-phenyl-1-methylpropyl) sulfamoyl group.

-SO2NHR30으로는, -SO2NH2가 바람직하다.As -SO 2 NHR 30 , -SO 2 NH 2 is preferable.

-SO2R32로는, 메틸술포닐기, 에틸술포닐기, 프로필술포닐기, 이소프로필술포닐기, n-부틸술포닐기, sec-부틸술포닐기, tert-부틸술포닐기, 펜틸술포닐기, 헥실술포닐기, 헵틸술포닐기, 옥틸술포닐기, 1-메틸부틸술포닐기, 1,1,3,3-테트라메틸부틸술포닐기, 1,5-디메틸헥실술포닐기, 1,6-디메틸헵틸술포닐기, 2-에틸헥실술포닐기 및 1,1,5,5-테트라메틸헥실술포닐기 등을 들 수 있다. 그 중에서도, 메틸술포닐기 및 에틸술포닐기가 바람직하고, 메틸술포닐기가 보다 바람직하다.As -SO 2 R 32 , methylsulfonyl group, ethylsulfonyl group, propylsulfonyl group, isopropylsulfonyl group, n-butylsulfonyl group, sec-butylsulfonyl group, tert-butylsulfonyl group, pentylsulfonyl group, hexylsulfonyl group, Heptylsulfonyl group, octylsulfonyl group, 1-methylbutylsulfonyl group, 1,1,3,3-tetramethylbutylsulfonyl group, 1,5-dimethylhexylsulfonyl group, 1,6-dimethylheptylsulfonyl group, 2-ethyl And hexylsulfonyl groups and 1,1,5,5-tetramethylhexylsulfonyl groups. Especially, a methylsulfonyl group and an ethylsulfonyl group are preferable, and a methylsulfonyl group is more preferable.

내열성이 한층 더 우수한 패턴 등을 형성할 수 있는 경향이 있기 때문에, R1∼R18 중, 적어도 하나는 니트로기인 것이 바람직하다.It is preferable that at least one of R 1 to R 18 is a nitro group, because the heat resistance tends to be able to form more excellent patterns and the like.

또한, R1∼R5 중 적어도 하나 및 R6∼R10 중 적어도 하나는 -SO2R29인 것이 바람직하다. -SO2R29를 복수개 갖는 경우, 복수의 R29는 서로 동일하여도 좋고 상이하여도 좋다.Further, it is preferable that at least one of R 1 to R 5 and at least one of R 6 to R 10 be -SO 2 R 29 . When having a plurality of -SO 2 R 29 , a plurality of R 29 may be the same or different from each other.

-SO2R29로는, -SO2R32가 바람직하고, 메틸술포닐기가 보다 바람직하다.As -SO 2 R 29 , -SO 2 R 32 is preferable, and a methylsulfonyl group is more preferable.

화학식 (A0)으로 표시되는 음이온이 -SO2R32를 갖는 경우, R11∼R14 중 적어도 하나 및 R15∼R18 중 적어도 하나는 -SO2R32인 것이 보다 바람직하다. -SO2R32를 복수개 갖는 경우, 복수의 R32는 서로 동일하여도 좋고 상이하여도 좋다.If the anion represented by the formula (A0) having a -SO 2 R 32, R 11 ~R at least one of R and at least one of 14 15 ~R 18 it is more preferably -SO 2 R 32. In the case of having a plurality of -SO 2 R 32 , a plurality of R 32 may be the same as or different from each other.

R19 R20으로는, 메틸기, 에틸기 및 아미노기가 바람직하고, 메틸기가 보다 바람직하다.R 19 and As R 20 , a methyl group, an ethyl group and an amino group are preferable, and a methyl group is more preferable.

화학식 (A0)으로 표시되는 음이온의 바람직한 예로는, 화학식 (1-b1)∼화학식 (1-b60)으로 표시되는 음이온을 들 수 있다.Preferable examples of the anion represented by the formula (A0) include anions represented by the formulas (1-b1) to (1-b60).

Figure pat00010
Figure pat00010

Figure pat00011
Figure pat00011

Figure pat00012
Figure pat00012

Figure pat00013
Figure pat00013

Figure pat00014
Figure pat00014

Figure pat00015
Figure pat00015

화학식 (A0)으로 표시되는 음이온의 합성 방법을, 화학식 (A01)로 표시되는 음이온을 들어 설명한다.A method for synthesizing an anion represented by the formula (A0) will be described taking an anion represented by the formula (A01).

Figure pat00016
Figure pat00016

(상기 식에서, R1∼R5, R11∼R14, R19, M1은 상기에 있어서의 것과 동일한 의미를 나타낸다.)(In the above formula, R 1 to R 5 , R 11 to R 14 , R 19 and M 1 represent the same meaning as in the above.)

상기 음이온은, 화학식 (d)로 표시되는 화합물과 크롬 화합물을, 수성 용매(N,N-디메틸포름아미드, N-메틸피롤리돈 등) 중, 70℃∼150℃에서 3∼10시간 동안 반응시킴으로써 제조할 수 있다.The anion reacts the compound represented by the formula (d) with the chromium compound in an aqueous solvent (N, N-dimethylformamide, N-methylpyrrolidone, etc.) at 70 ° C to 150 ° C for 3 to 10 hours. Can be produced.

Figure pat00017
Figure pat00017

(상기 식에서, R1∼R5, R11∼R14 및 R19는 상기와 동일한 의미를 나타낸다.)(In the above formula, R 1 to R 5 , R 11 to R 14 and R 19 represent the same meanings as above.)

상기 크롬 화합물로는, 포름산크롬, 아세트산크롬, 염화크롬, 불화크롬, 황산암모늄크롬 등을 들 수 있고, 바람직하게는 포름산크롬, 황산암모늄크롬 등을 들 수 있다.Examples of the chromium compound include chromium formate, chromium acetate, chromium chloride, chromium fluoride, ammonium chromium sulfate, and preferably chromic formate, ammonium chromium sulfate, and the like.

크롬 화합물의 사용량은, 화학식 (d)로 표시되는 화합물 1몰에 대하여, 0.5∼1몰인 것이 바람직하다.It is preferable that the usage-amount of a chromium compound is 0.5-1 mol with respect to 1 mol of compounds represented by general formula (d).

화학식 (d)로 표시되는 화합물은, 화학식 (a2)로 표시되는 디아조늄염과, 화학식 (b1)로 표시되는 화합물을, 수성 용매 중에서 디아조 커플링함으로써 제조할 수 있다.The compound represented by the formula (d) can be produced by diazo coupling the diazonium salt represented by the formula (a2) and the compound represented by the formula (b1) in an aqueous solvent.

화학식 (a2)로 표시되는 디아조늄염은, 예컨대, 화학식 (a1)로 표시되는 아민을, 아질산, 아질산염 또는 아질산에스테르로 디아조화함으로써 얻을 수 있다.The diazonium salt represented by the formula (a2) can be obtained, for example, by diazotizing the amine represented by the formula (a1) with nitrous acid, nitrite or nitrite ester.

Figure pat00018
Figure pat00018

[화학식 (a1) 및 화학식 (a2)에서, R11∼R14는 상기와 동일한 의미를 나타낸다. A1은 무기 또는 유기 음이온을 나타낸다.[In the formula (a1) and the formula (a2), R 11 to R 14 have the same meaning as described above. A 1 represents an inorganic or organic anion.

화학식 (b1)에서, R1∼R4 및 R19는 상기와 동일한 의미를 나타낸다.]In the formula (b1), R 1 to R 4 and R 19 have the same meaning as above.]

상기 무기 음이온으로는, 불화물 이온, 염화물 이온, 브롬화물 이온, 요오드화물 이온, 과염소산 이온, 차아염소산 이온 등을 들 수 있다.Examples of the inorganic anions include fluoride ions, chloride ions, bromide ions, iodide ions, perchlorate ions, hypochlorite ions, and the like.

상기 유기 음이온으로는, CH3COO-, PhCOO- 등을 들 수 있다.Examples of the organic anion include CH 3 COO-, PhCOO-, and the like.

A1로는, 바람직하게는, 염화물 이온, 브롬화물 이온, CH3COO- 등을 들 수 있다.As A 1 , preferably, chloride ions, bromide ions, CH 3 COO-, and the like are listed.

상기 디아조 커플링 반응에 있어서, 반응 온도는, -5℃∼60℃가 바람직하고, 0℃∼30℃가 보다 바람직하다. 반응 시간은, 1시간∼12시간이 바람직하고, 1시간∼4시간이 보다 바람직하다. 상기 수성 용매로는, N-메틸피롤리돈 등을 들 수 있다.In the diazo coupling reaction, the reaction temperature is preferably -5 ° C to 60 ° C, and more preferably 0 ° C to 30 ° C. The reaction time is preferably 1 hour to 12 hours, and more preferably 1 hour to 4 hours. N-methylpyrrolidone etc. are mentioned as said aqueous solvent.

상기 반응을 촉진시키기 위해서 무기 염기를 공존시킬 수 있다.In order to promote the reaction, an inorganic base can be coexisted.

상기 무기 염기로는, 수산화나트륨, 수산화칼슘, 탄산나트륨, 탄산칼슘, 아세트산나트륨, 아세트산칼슘 등을 들 수 있고, 바람직하게는 탄산나트륨, 아세트산나트륨 등을 들 수 있다.Examples of the inorganic base include sodium hydroxide, calcium hydroxide, sodium carbonate, calcium carbonate, sodium acetate, and calcium acetate, preferably sodium carbonate, sodium acetate, and the like.

트리아릴메탄 염료에서 유래되는 음이온이란, 트리아릴메탄 골격을 가지며, 또한, 술포기 등의 음이온기를 갖는 음이온이다.An anion derived from a triarylmethane dye is an anion having a triarylmethane skeleton and anionic groups such as sulfo groups.

트리아릴메탄 염료에서 유래되는 음이온의 구체예로는, 화학식 (2-b1)∼화학식 (2-b3)으로 표시되는 음이온을 들 수 있다.Specific examples of the anion derived from the triarylmethane dye include anions represented by the formulas (2-b1) to (2-b3).

Figure pat00019
Figure pat00019

크산텐 염료는, 분자 내에 크산텐 골격을 갖는 염료이다.The xanthene dye is a dye having a xanthene skeleton in a molecule.

시아닌 염료는, 분자 내에 시아닌 골격을 갖는 염료이다.The cyanine dye is a dye having a cyanine skeleton in the molecule.

화학식 (I)에 있어서의 Y+는 화학식 (Y)로 표시되는 화합물에서 유래되는 양이온을 나타낸다.Y + in formula (I) represents a cation derived from the compound represented by formula (Y).

Figure pat00020
Figure pat00020

n은 1∼8의 정수를 나타내고, R40은 탄소수 1∼4의 알킬기를 나타낸다.n represents an integer of 1 to 8, and R 40 represents an alkyl group having 1 to 4 carbon atoms.

화학식 (Y)에 있어서, n은 1∼3의 정수가 바람직하다. R40으로는, 메틸기 및 에틸기가 바람직하다.In the formula (Y), n is preferably an integer of 1 to 3. As R 40 , a methyl group and an ethyl group are preferable.

화학식 (Y)로 표시되는 화합물에서 유래되는 양이온의 구체예로는, 화학식 (3-b1)∼화학식 (3-b9)로 표시되는 것을 들 수 있다.Specific examples of the cation derived from the compound represented by the formula (Y) include those represented by the formulas (3-b1) to (3-b9).

Figure pat00021
Figure pat00021

화학식 (I)로 표시되는 화합물로는, 이하에 나타내는 화합물이 바람직하다.As a compound represented by general formula (I), the compound shown below is preferable.

Figure pat00022
Figure pat00022

다음에, 화학식 (I)로 표시되는 화합물[이하, 본 화합물을 화합물 (I)이라 칭함]의 제조 방법에 대해서 설명한다.Next, a method for producing the compound represented by the formula (I) (hereinafter, the compound is referred to as compound (I)) will be described.

화합물 (I)의 제조 방법으로는, 염료에서 유래되는 음이온과 금속 양이온과의 염과, 화학식 (Y)로 표시되는 화합물을 용매 중에서 혼합함으로써 제조할 수 있다.As a method for producing compound (I), it can be produced by mixing a salt of an anion derived from a dye with a metal cation and a compound represented by formula (Y) in a solvent.

염료에서 유래되는 음이온과 금속 양이온과의 염은, 금속 양이온의 할로겐화물을 포함하는 수용액에 염료를 용해시키는 것 등에 의해 얻을 수 있다.The salt of the anion derived from the dye and the metal cation can be obtained by dissolving the dye in an aqueous solution containing a halide of the metal cation or the like.

염을 형성하는 금속 양이온으로는, 리튬 양이온, 나트륨 양이온 및 칼륨 양이온 등의 알칼리 금속 양이온을 들 수 있다.Examples of the salt-forming metal cation include alkali metal cations such as lithium cations, sodium cations, and potassium cations.

화학식 (Y)로 표시되는 화합물로서, 시판되고 있는 화합물을 이용할 수 있다.As the compound represented by the formula (Y), commercially available compounds can be used.

용매로는, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈, 디메틸술폭시드, 아세토니트릴, 아세트산에틸, 톨루엔, 메탄올, 에탄올, 이소프로판올, 아세톤, 테트라히드로푸란, 디옥산, 물 및 클로로포름을 들 수 있다.As a solvent, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, acetonitrile, ethyl acetate, toluene, methanol, ethanol, isopropanol, acetone, tetrahydrofuran , Dioxane, water and chloroform.

그 중에서도, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈, 디메틸술폭시드, 메탄올, 에탄올, 이소프로판올 및 물이 바람직하다.Among them, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, methanol, ethanol, isopropanol and water are preferable.

용매가 물인 경우, 아세트산이나 염산 등의 산을 첨가하여도 좋다.When the solvent is water, an acid such as acetic acid or hydrochloric acid may be added.

염료에서 유래되는 음이온과 금속 양이온과의 염과, 화학식 (Y)로 표시되는 화합물과의 혼합 온도는, 바람직하게는 0℃∼150℃, 보다 바람직하게는 10℃∼120℃, 더욱 바람직하게는 20℃∼100℃이다. 혼합 시간은, 바람직하게는 1시간∼72시간, 보다 바람직하게는 2시간∼48시간, 더욱 바람직하게는 3시간∼24시간이다.The mixing temperature of the salt of the anion derived from the dye and the metal cation and the compound represented by the formula (Y) is preferably 0 ° C to 150 ° C, more preferably 10 ° C to 120 ° C, and even more preferably 20 ° C to 100 ° C. The mixing time is preferably 1 hour to 72 hours, more preferably 2 hours to 48 hours, and even more preferably 3 hours to 24 hours.

물과 상용하는 용매를 이용한 경우는, 염료에서 유래되는 음이온과 금속 양이온과의 염과, 화학식 (Y)로 표시되는 화합물과의 혼합 용액을, 필요에 따라 1∼3시간 더 교반하고, 그 후, 여과에 의해 취득함으로써, 화학식 (I)로 표시되는 화합물을 고체로서 추출할 수 있다.When a solvent compatible with water is used, a mixed solution of a salt of an anion derived from a dye with a metal cation and a compound represented by the formula (Y) is further stirred for 1 to 3 hours as necessary, after which , The compound represented by the formula (I) can be extracted as a solid by obtaining by filtration.

물과 상용하지 않는 용매를 이용한 경우는, 염료에서 유래되는 음이온과 금속 양이온과의 염과, 화학식 (Y)로 표시되는 화합물과의 반응 용액에 물을 첨가하여 결정을 석출시키고, 그 후, 여과함으로써, 화학식 (I)로 표시되는 화합물을 고체로서 추출할 수 있다.When a solvent that is not compatible with water is used, water is added to a reaction solution of a salt of an anion derived from a dye and a metal cation and a compound represented by the formula (Y) to precipitate crystals, and then filtered. By doing so, the compound represented by the formula (I) can be extracted as a solid.

<착색제(A)><Colorant (A)>

착색제(A)는, 화합물 (I)과는 상이한 염료를 함께 포함하여도 좋다. 상기 염료로는, 유용성(油溶性) 염료, 산성 염료, 산성 염료의 아민염이나 산성 염료의 술폰아미드 유도체 등의 염료를 들 수 있고, 예컨대, 컬러 인덱스(The Society of Dyers and Colourists 출판)에서 염료로 분류되어 있는 화합물이나, 염색 노트(시키센샤)에 기재되어 있는 공지된 염료를 들 수 있다.The coloring agent (A) may contain dyes different from the compound (I) together. Examples of the dye include dyes such as oil-soluble dyes, acid dyes, amine salts of acid dyes, sulfonamide derivatives of acid dyes, and the like, for example, color index (published by The Society of Dyers and Colourists). Compounds classified as, and known dyes described in dyeing notes (Shikisensha) are exemplified.

구체적으로는, C.I. 솔벤트 옐로우 4(이하, C.I. 솔벤트 옐로우의 기재를 생략하고, 번호만 기재함), 14, 15, 23, 24, 38, 62, 63, 68, 82, 94, 98, 99, 162;Specifically, C.I. Solvent yellow 4 (hereinafter, C.I. solvent yellow is omitted, only numbers are described), 14, 15, 23, 24, 38, 62, 63, 68, 82, 94, 98, 99, 162;

C.I. 솔벤트 레드 45, 49, 125, 130;C.I. Solvent red 45, 49, 125, 130;

C.I. 솔벤트 오렌지 2, 7, 11, 15, 26, 56; 등의 C.I. 솔벤트 염료,C.I. Solvent orange 2, 7, 11, 15, 26, 56; C.I. Solvent dyes,

C.I. 애시드 옐로우 1, 3, 7, 9, 11, 17, 23, 25, 29, 34, 36, 38, 40, 42, 54, 65, 72, 73, 76, 79, 98, 99, 111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139, 140, 144, 150, 155, 157, 160, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, 197, 199, 202, 203, 204, 205, 207, 212, 214, 220, 221, 228, 230, 232, 235, 238, 240, 242, 243, 251;C.I. Acid Yellow 1, 3, 7, 9, 11, 17, 23, 25, 29, 34, 36, 38, 40, 42, 54, 65, 72, 73, 76, 79, 98, 99, 111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139, 140, 144, 150, 155, 157, 160, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, 197, 199, 202, 203, 204, 205, 207, 212, 214, 220, 221, 228, 230, 232, 235, 238, 240, 242, 243, 251;

C.I. 애시드 레드 1, 4, 8, 14, 17, 18, 26, 27, 29, 31, 34, 35, 37, 42, 44, 50, 51, 52, 57, 66, 73, 80, 87, 88, 91, 92, 94, 97, 103, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 158, 176, 182, 183, 198, 206, 211, 215, 216, 217, 227, 228, 249, 252, 257, 258, 260, 261, 266, 268, 270, 274, 277, 280, 281, 195, 308, 312, 315, 316, 339, 341, 345, 346, 349, 382, 383, 394, 401, 412, 417, 418, 422, 426;C.I. Acid Red 1, 4, 8, 14, 17, 18, 26, 27, 29, 31, 34, 35, 37, 42, 44, 50, 51, 52, 57, 66, 73, 80, 87, 88, 91, 92, 94, 97, 103, 111, 114, 129, 133, 134, 138, 143, 145, 150, 151, 158, 176, 182, 183, 198, 206, 211, 215, 216, 217, 227, 228, 249, 252, 257, 258, 260, 261, 266, 268, 270, 274, 277, 280, 281, 195, 308, 312, 315, 316, 339, 341, 345, 346, 349, 382, 383, 394, 401, 412, 417, 418, 422, 426;

C.I. 애시드 오렌지 6, 7, 8, 10, 12, 26, 50, 51, 52, 56, 62, 63, 64, 74, 75, 94, 95, 107, 108, 169, 173;C.I. Acid Orange 6, 7, 8, 10, 12, 26, 50, 51, 52, 56, 62, 63, 64, 74, 75, 94, 95, 107, 108, 169, 173;

C.I. 애시드 바이올렛 6B, 7, 9, 17, 19; 등의 C.I. 애시드 염료,C.I. Acid violet 6B, 7, 9, 17, 19; C.I. Acid Dye,

C.I. 다이렉트 옐로우 2, 33, 34, 35, 38, 39, 43, 47, 50, 54, 58, 68, 69, 70, 71, 86, 93, 94, 95, 98, 102, 108, 109, 129, 136, 138, 141;C.I. Direct Yellow 2, 33, 34, 35, 38, 39, 43, 47, 50, 54, 58, 68, 69, 70, 71, 86, 93, 94, 95, 98, 102, 108, 109, 129, 136, 138, 141;

C.I. 다이렉트 레드 79, 82, 83, 84, 91, 92, 96, 97, 98, 99, 105, 106, 107, 172, 173, 176, 177, 179, 181, 182, 184, 204, 207, 211, 213, 218, 220, 221, 222, 232, 233, 234, 241, 243, 246, 250;C.I. Direct Red 79, 82, 83, 84, 91, 92, 96, 97, 98, 99, 105, 106, 107, 172, 173, 176, 177, 179, 181, 182, 184, 204, 207, 211, 213, 218, 220, 221, 222, 232, 233, 234, 241, 243, 246, 250;

C.I. 다이렉트 오렌지 34, 39, 41, 46, 50, 52, 56, 57, 61, 64, 65, 68, 70, 96, 97, 106, 107;C.I. Direct orange 34, 39, 41, 46, 50, 52, 56, 57, 61, 64, 65, 68, 70, 96, 97, 106, 107;

C.I. 다이렉트 바이올렛 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103, 104; 등의 C.I. 다이렉트 염료,C.I. Direct violet 47, 52, 54, 59, 60, 65, 66, 79, 80, 81, 82, 84, 89, 90, 93, 95, 96, 103, 104; C.I. Direct dyes,

C.I. 모던트 옐로우 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 61, 62, 65;C.I. Modern Yellow 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 61, 62, 65;

C.I. 모던트 레드 1, 2, 3, 4, 9, 11, 12, 14, 17, 18, 19, 22, 23, 24, 25, 26, 30, 32, 33, 36, 37, 38, 39, 41, 43, 45, 46, 48, 53, 56, 63, 71, 74, 85, 86, 88, 90, 94, 95;C.I. Modern red 1, 2, 3, 4, 9, 11, 12, 14, 17, 18, 19, 22, 23, 24, 25, 26, 30, 32, 33, 36, 37, 38, 39, 41 , 43, 45, 46, 48, 53, 56, 63, 71, 74, 85, 86, 88, 90, 94, 95;

C.I. 모던트 오렌지 3, 4, 5, 8, 12, 13, 14, 20, 21, 23, 24, 28, 29, 32, 34, 35, 36, 37, 42, 43, 47, 48;C.I. Modern Orange 3, 4, 5, 8, 12, 13, 14, 20, 21, 23, 24, 28, 29, 32, 34, 35, 36, 37, 42, 43, 47, 48;

C.I. 모던트 바이올렛 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53, 58; 등의 C.I. 모던트 염료 등을 들 수 있다.C.I. Modern violet 1, 2, 4, 5, 7, 14, 22, 24, 30, 31, 32, 37, 40, 41, 44, 45, 47, 48, 53, 58; C.I. And modern dyes.

착색제(A)는, 또한, 안료를 함께 포함하여도 좋다.The coloring agent (A) may also contain a pigment together.

안료로는, 유기 안료, C.I. 피그먼트 바이올렛 1, 19, 23, 29, 32, 36, 38 등의 바이올렛색 안료;As a pigment, an organic pigment, C.I. Violet pigments such as pigment violet 1, 19, 23, 29, 32, 36, 38;

C.I. 피그먼트 옐로우 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 137, 138, 139, 147, 148, 150, 153, 154, 166, 173, 194, 214 등의 황색 안료;C.I. Pigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 137, 138, 139 , Yellow pigments such as 147, 148, 150, 153, 154, 166, 173, 194, 214;

C.I. 피그먼트 오렌지 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73 등의 오렌지색 안료;C.I. Orange pigments such as Pigment Orange 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, and 73;

C.I. 피그먼트 레드 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 177, 180, 192, 209, 215, 216, 224, 242, 254, 255, 264, 265 등의 적색 안료 등을 들 수 있다.C.I. Red pigments such as Pigment Red 9, 97, 105, 122, 123, 144, 149, 166, 168, 176, 177, 180, 192, 209, 215, 216, 224, 242, 254, 255, 264, 265 And the like.

그 중에서도, C.I. 피그먼트 옐로우 138, 139, 150, C.I. 피그먼트 레드 177, 242, 254에서 선택되는 적어도 1종을 함유하고 있는 것이 바람직하다. 상기한 안료를 포함함으로써, 투과 스펙트럼의 최적화가 용이하고, 내약품성이 양호해진다.Among them, C.I. Pigment Yellow 138, 139, 150, C.I. It is preferable to contain at least 1 sort (s) selected from pigment red 177, 242, 254. By including the above-mentioned pigment, optimization of the transmission spectrum is easy, and chemical resistance becomes good.

이들 안료는, 단독으로 이용하여도 좋고, 2종 이상을 혼합하여 이용하여도 좋다.These pigments may be used alone or in combination of two or more.

유기 안료는, 필요에 따라, 로진 처리, 산성기 또는 염기성기가 도입된 안료 유도체 등을 이용한 표면 처리, 고분자 화합물 등에 의한 안료 표면에 대한 그라프트 처리, 황산 미립화법 등에 의한 미립화 처리, 또는 불순물을 제거하기 위한 유기 용제나 물 등에 의한 세정 처리, 이온성 불순물의 이온 교환법 등에 의한 제거 처리 등이 행해져 있어도 좋다.If necessary, the organic pigments are subjected to rosin treatment, surface treatment using an acidic or basic group-derived pigment derivative, graft treatment on a pigment surface with a polymer compound, atomization treatment using a sulfuric acid atomization method, or removal of impurities. Washing treatment with an organic solvent, water, or the like, and removal treatment with an ion exchange method of ionic impurities may be performed.

유기 안료는, 입경이 균일한 것이 바람직하다. 안료 분산제를 함유시켜 분산 처리를 행함으로써, 안료가 용액 중에서 균일하게 분산된 상태의 안료 분산액을 얻을 수 있다.It is preferable that the organic pigment has a uniform particle size. A pigment dispersion liquid in which a pigment is uniformly dispersed in a solution can be obtained by subjecting the pigment dispersant to dispersion treatment.

상기한 안료 분산제로는, 양이온계, 음이온계, 비이온계, 양성(兩性), 폴리에스테르계, 폴리아민계, 아크릴계 등의 계면활성제 등을 들 수 있다. 이들 안료 분산제는, 단독으로 이용하여도 좋고, 2종 이상을 조합하여 이용하여도 좋다. 안료 분산제로는, 상품명으로 KP[신에츠카가쿠고교(주) 제조], 플로렌[교에이샤카가쿠(주) 제조], 솔스퍼스[제네카(주) 제조], EFKA(BASF사 제조), 아지스파[아지노모토파인테크노(주) 제조], Disperbyk(빅케미사 제조) 등을 들 수 있다.Examples of the pigment dispersant include cationic, anionic, nonionic, amphoteric, polyester, polyamine, and acrylic surfactants. These pigment dispersants may be used alone or in combination of two or more. As the pigment dispersant, KP (manufactured by Shin-Etsu Chemical Co., Ltd.), Floren (manufactured by Kyoeisha Chemical Co., Ltd.), Solspers [manufactured by Geneca Co., Ltd.], EFKA (manufactured by BASF), Aji Spas (manufactured by Ajinomoto Fine Techno Co., Ltd.), Disperbyk (manufactured by BIC Chemie), and the like.

안료 분산제를 이용하는 경우, 그 사용량은, 안료에 대하여, 바람직하게는 100 질량%이고, 보다 바람직하게는 5 질량% 이상 50 질량% 이하이다. 안료 분산제의 사용량이 상기한 범위에 있으면, 균일한 분산 상태의 안료 분산액이 얻어지는 경향이 있다.When a pigment dispersant is used, the amount used is preferably 100% by mass, more preferably 5% by mass or more and 50% by mass or less with respect to the pigment. When the amount of the pigment dispersant used is in the above-mentioned range, a pigment dispersion liquid in a uniform dispersion state tends to be obtained.

화합물 (I)의 함유량은, 착색제(A)에 대하여, 바람직하게는 3∼100 질량%이고, 보다 바람직하게는 5∼90 질량%이며, 더욱 바람직하게는 10∼80 질량%이다.The content of the compound (I) is preferably 3 to 100% by mass, more preferably 5 to 90% by mass, and even more preferably 10 to 80% by mass with respect to the colorant (A).

착색제(A)의 함유량은, 착색 경화성 수지 조성물 중의 고형분에 대하여, 바람직하게는 5∼60 질량%이고, 보다 바람직하게는 8∼55 질량%이며, 더욱 바람직하게는 10∼50 질량%이다. 여기서, 고형분이란, 착색 경화성 수지 조성물 중의, 용제를 제외한 성분의 합계를 말한다. 착색제(A)의 함유량이 상기한 범위에 있으면, 컬러 필터로 했을 때의 색 농도가 충분하고, 또한 조성물 중에 바인더 폴리머를 필요량 함유시킬 수 있기 때문에, 기계적 강도가 충분한 패턴을 형성할 수 있다.The content of the colorant (A) is preferably 5 to 60% by mass, more preferably 8 to 55% by mass, and even more preferably 10 to 50% by mass, based on the solid content in the colored curable resin composition. Here, solid content means the sum of the components except a solvent in a colored curable resin composition. When the content of the colorant (A) is within the above-mentioned range, the color concentration when the color filter is used is sufficient, and since a desired amount of the binder polymer can be contained in the composition, a pattern with sufficient mechanical strength can be formed.

<수지(B)><Resin (B)>

본 발명의 착색 경화성 수지 조성물은, 수지(B)를 포함한다. 수지(B)로는, 특별히 한정되는 것은 아니지만, 알칼리 가용성 수지인 것이 바람직하다.The coloring curable resin composition of this invention contains resin (B). Although it does not specifically limit as resin (B), It is preferable that it is alkali-soluble resin.

수지(B)로는, 예컨대, 이하의 수지 [K1]∼[K4] 등을 들 수 있다.Examples of the resin (B) include resins [K1] to [K4] below.

[K1] 탄소수 2∼4의 환상 에테르 구조와 에틸렌성 불포화 결합을 갖는 단량체(a)[이하 「(a)」라고 하는 경우가 있음]와, 불포화 카르복실산 및 불포화 카르복실산무수물로 이루어진 군에서 선택되는 적어도 1종(b)[이하 「(b)」라고 하는 경우가 있음]과의 공중합체.[K1] A group consisting of a monomer having a cyclic ether structure having 2 to 4 carbon atoms and an ethylenically unsaturated bond (a) (hereinafter sometimes referred to as "(a)"), and an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride. A copolymer with at least one selected from (b) (hereinafter sometimes referred to as "(b)").

[K2] (a)와 (b)와, (a)와 공중합 가능한 단량체(c)[단, (a) 및 (b)와는 상이함][이하 「(c)」라고 하는 경우가 있음]와의 공중합체[K2] With (a) and (b), and (a) a copolymerizable monomer (c) (but different from (a) and (b)) [hereinafter sometimes referred to as "(c)"] Copolymer

[K3] (b)와 (c)와의 공중합체[K3] Copolymer of (b) and (c)

[K4] (b)와 (c)와의 공중합체에 (a)를 반응시켜 얻어지는 수지.[K4] A resin obtained by reacting (a) with a copolymer of (b) and (c).

수지(B)가 (a)에서 유래되는 구조 단위를 포함함으로써, 얻어지는 착색 패턴의 내열성, 내약품성 등의 신뢰성을 보다 높일 수 있다.By including the structural unit derived from (a), the resin (B) can further increase the reliability of the obtained colored pattern, such as heat resistance and chemical resistance.

(a)는, 예컨대, 탄소수 2∼4의 환상 에테르 구조[예컨대, 옥시란 고리, 옥세탄 고리 및 테트라히드로푸란 고리(옥솔란 고리)로 이루어진 군에서 선택되는 적어도 1종]와 에틸렌성 불포화 결합을 갖는 중합성 화합물을 말한다. (a)는, 탄소수 2∼4의 환상 에테르와 (메트)아크릴로일옥시기를 갖는 단량체가 바람직하다.(a) is, for example, a cyclic ether structure having 2 to 4 carbon atoms (eg, at least one selected from the group consisting of an oxirane ring, an oxetane ring, and a tetrahydrofuran ring (oxolane ring)) and an ethylenically unsaturated bond. It refers to a polymerizable compound having a. (a) is preferably a monomer having a cyclic ether having 2 to 4 carbon atoms and a (meth) acryloyloxy group.

본 명세서에 있어서, 「(메트)아크릴산」이란, 아크릴산 및 메타크릴산으로 이루어진 군에서 선택되는 적어도 1종을 나타낸다. 「(메트)아크릴로일」 및 「(메트)아크릴레이트」 등의 표기도 동일한 의미를 갖는다.In the present specification, "(meth) acrylic acid" refers to at least one selected from the group consisting of acrylic acid and methacrylic acid. Notations such as "(meth) acryloyl" and "(meth) acrylate" have the same meaning.

(a)로는, 옥시라닐기와 에틸렌성 불포화 결합을 갖는 단량체, 옥세타닐기와 에틸렌성 불포화 결합을 갖는 단량체, 테트라히드로푸릴기와 에틸렌성 불포화 결합을 갖는 단량체 등을 들 수 있다.Examples of the monomer (a) include a monomer having an oxiranyl group and an ethylenically unsaturated bond, a monomer having an oxetanyl group and an ethylenically unsaturated bond, a monomer having a tetrahydrofuryl group and an ethylenically unsaturated bond, and the like.

(a)로는, 얻어지는 착색 패턴의 내열성, 내약품성 등의 신뢰성을 보다 높일 수 있다는 점에서, 옥시라닐기와 에틸렌성 불포화 결합을 갖는 단량체인 것이 바람직하다.As (a), it is preferable that it is a monomer which has an oxiranyl group and an ethylenically unsaturated bond from the viewpoint that reliability, such as heat resistance and chemical resistance, of the obtained coloring pattern can be raised more.

(b)로는, 구체적으로는, 아크릴산, 메타크릴산, 크로톤산, o-, m-, p-비닐안식향산 등의 불포화 모노카르복실산;As (b), specifically, unsaturated monocarboxylic acids, such as acrylic acid, methacrylic acid, crotonic acid, o-, m-, and p-vinyl benzoic acid;

말레산, 푸마르산, 시트라콘산, 메사콘산, 이타콘산, 3-비닐프탈산, 4-비닐프탈산, 3,4,5,6-테트라히드로프탈산, 1,2,3,6-테트라히드로프탈산, 디메틸테트라히드로프탈산, 1,4-시클로헥센디카르복실산 등의 불포화 디카르복실산;Maleic acid, fumaric acid, citraconic acid, mesaconic acid, itaconic acid, 3-vinylphthalic acid, 4-vinylphthalic acid, 3,4,5,6-tetrahydrophthalic acid, 1,2,3,6-tetrahydrophthalic acid, dimethyl Unsaturated dicarboxylic acids such as tetrahydrophthalic acid and 1,4-cyclohexene dicarboxylic acid;

메틸-5-노르보넨-2,3-디카르복실산, 5-카르복시비시클로[2.2.1]헵트-2-엔, 5,6-디카르복시비시클로[2.2.1]헵트-2-엔, 5-카르복시-5-메틸비시클로[2.2.1]헵트-2-엔, 5-카르복시-5-에틸비시클로[2.2.1]헵트-2-엔, 5-카르복시-6-메틸비시클로[2.2.1]헵트-2-엔, 5-카르복시-6-에틸비시클로[2.2.1]헵트-2-엔 등의 카르복시기를 함유하는 비시클로 불포화 화합물;Methyl-5-norbornene-2,3-dicarboxylic acid, 5-carboxybicyclo [2.2.1] hept-2-ene, 5,6-dicarboxybicyclo [2.2.1] hept-2-ene , 5-carboxy-5-methylbicyclo [2.2.1] hept-2-ene, 5-carboxy-5-ethylbicyclo [2.2.1] hept-2-ene, 5-carboxy-6-methylbicyclo A bicyclo unsaturated compound containing a carboxyl group such as [2.2.1] hept-2-ene, 5-carboxy-6-ethylbicyclo [2.2.1] hept-2-ene;

무수말레산, 시트라콘산무수물, 이타콘산무수물, 3-비닐프탈산무수물, 4-비닐프탈산무수물, 3,4,5,6-테트라히드로프탈산무수물, 1,2,3,6-테트라히드로프탈산무수물, 디메틸테트라히드로프탈산무수물, 5,6-디카르복시비시클로[2.2.1]헵트-2-엔 무수물(하이믹산무수물) 등의 불포화 디카르복실산류 무수물;Maleic anhydride, citraconic anhydride, itaconic anhydride, 3-vinyl phthalic anhydride, 4-vinyl phthalic anhydride, 3,4,5,6-tetrahydrophthalic anhydride, 1,2,3,6-tetrahydrophthalic anhydride , Unsaturated dicarboxylic acid anhydrides such as dimethyltetrahydrophthalic anhydride and 5,6-dicarboxybicyclo [2.2.1] hept-2-ene anhydride (hymic acid anhydride);

호박산모노[2-(메트)아크릴로일옥시에틸], 프탈산모노[2-(메트)아크릴로일옥시에틸] 등의 2가 이상의 다가 카르복실산의 불포화 모노[(메트)아크릴로일옥시알킬]에스테르;Unsaturated mono [(meth) acryloyloxyalkyl of divalent or higher polyvalent carboxylic acids such as mono succinate [2- (meth) acryloyloxyethyl], phthalate mono [2- (meth) acryloyloxyethyl] ]ester;

α-(히드록시메틸)아크릴산 등, 동일 분자 중에 히드록시기 및 카르복시기를 함유하는 불포화 아크릴레이트 등을 들 수 있다.and unsaturated acrylates containing hydroxy groups and carboxy groups in the same molecule, such as α- (hydroxymethyl) acrylic acid.

(b)로는, 공중합 반응성의 점이나 알칼리 수용액에 대한 용해성의 점에서, 아크릴산, 메타크릴산, 무수말레산 등이 바람직하다.As (b), acrylic acid, methacrylic acid, maleic anhydride and the like are preferable from the viewpoint of copolymerization reactivity and solubility in an aqueous alkali solution.

(c)로는, 메틸(메트)아크릴레이트, 에틸(메트)아크릴레이트, n-부틸(메트)아크릴레이트, sec-부틸(메트)아크릴레이트, tert-부틸(메트)아크릴레이트, 2-에틸헥실(메트)아크릴레이트, 도데실(메트)아크릴레이트, 라우릴(메트)아크릴레이트, 스테아릴(메트)아크릴레이트, 시클로펜틸(메트)아크릴레이트, 시클로헥실(메트)아크릴레이트, 2-메틸시클로헥실(메트)아크릴레이트, 트리시클로[5.2.1.02,6]데칸-8-일(메트)아크릴레이트[해당 기술 분야에서는, 관용명으로서 디시클로펜타닐(메트)아크릴레이트라고 불리고 있음], 디시클로펜타닐옥시에틸(메트)아크릴레이트, 이소보르닐(메트)아크릴레이트, 아다만틸(메트)아크릴레이트, 알릴(메트)아크릴레이트, 프로파르길(메트)아크릴레이트, 페닐(메트)아크릴레이트, 나프틸(메트)아크릴레이트, 벤질(메트)아크릴레이트 등의 (메트)아크릴산 에스테르;As (c), methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, sec-butyl (meth) acrylate, tert-butyl (meth) acrylate, 2-ethylhexyl (Meth) acrylate, dodecyl (meth) acrylate, lauryl (meth) acrylate, stearyl (meth) acrylate, cyclopentyl (meth) acrylate, cyclohexyl (meth) acrylate, 2-methylcyclo Hexyl (meth) acrylate, tricyclo [5.2.1.0 2,6 ] decane-8-yl (meth) acrylate (in the art, it is commonly called dicyclopentanyl (meth) acrylate), dicyclo Fentanyloxyethyl (meth) acrylate, isobornyl (meth) acrylate, adamantyl (meth) acrylate, allyl (meth) acrylate, propargyl (meth) acrylate, phenyl (meth) acrylate, Naphthyl (meth) acrylate, benzyl (meth) acrylate (Meth) acrylic acid esters such as;

2-히드록시에틸(메트)아크릴레이트, 2-히드록시프로필(메트)아크릴레이트 등의 히드록시기 함유 (메트)아크릴산 에스테르;Hydroxy group-containing (meth) acrylic acid esters such as 2-hydroxyethyl (meth) acrylate and 2-hydroxypropyl (meth) acrylate;

말레산디에틸, 푸마르산디에틸, 이타콘산디에틸 등의 디카르복실산디에스테르;Dicarboxylic acid diesters such as diethyl maleate, diethyl fumarate and diethyl itaconic acid;

비시클로[2.2.1]헵트-2-엔, 5-메틸비시클로[2.2.1]헵트-2-엔, 5-에틸비시클로[2.2.1]헵트-2-엔, 5-히드록시비시클로[2.2.1]헵트-2-엔, 5-히드록시메틸비시클로[2.2.1]헵트-2-엔, 5-(2'-히드록시에틸)비시클로[2.2.1]헵트-2-엔, 5-메톡시비시클로[2.2.1]헵트-2-엔, 5-에톡시비시클로[2.2.1]헵트-2-엔, 5, 6-디히드록시비시클로[2.2.1]헵트-2-엔, 5,6-디(히드록시메틸)비시클로[2.2.1]헵트-2-엔, 5,6-디(2'-히드록시에틸)비시클로[2.2.1]헵트-2-엔, 5,6-디메톡시비시클로[2.2.1]헵트-2-엔, 5,6-디에톡시비시클로[2.2.1]헵트-2-엔, 5-히드록시-5-메틸비시클로[2.2.1]헵트-2-엔, 5-히드록시-5-에틸비시클로[2.2.1]헵트-2-엔, 5-히드록시메틸-5-메틸비시클로[2.2.1]헵트-2-엔, 5-tert-부톡시카르보닐비시클로[2.2.1]헵트-2-엔, 5-시클로헥실옥시카르보닐비시클로[2.2.1]헵트-2-엔, 5-페녹시카르보닐비시클로[2.2.1]헵트-2-엔, 5,6-비스(tert-부톡시카르보닐)비시클로[2.2.1]헵트-2-엔, 5,6-비스(시클로헥실옥시카르보닐)비시클로[2.2.1]헵트-2-엔 등의 비시클로 불포화 화합물;Bicyclo [2.2.1] hept-2-ene, 5-methylbicyclo [2.2.1] hept-2-ene, 5-ethylbicyclo [2.2.1] hept-2-ene, 5-hydroxy ratio Cyclo [2.2.1] hept-2-ene, 5-hydroxymethylbicyclo [2.2.1] hept-2-ene, 5- (2'-hydroxyethyl) bicyclo [2.2.1] hept-2 -Ene, 5-methoxybicyclo [2.2.1] hept-2-ene, 5-ethoxybicyclo [2.2.1] hept-2-ene, 5,6-dihydroxybicyclo [2.2.1] hept 2-ene, 5,6-di (hydroxymethyl) bicyclo [2.2.1] hept-2-ene, 5,6-di (2'-hydroxyethyl) bicyclo [2.2.1] hept- 2-ene, 5,6-dimethoxybicyclo [2.2.1] hept-2-ene, 5,6-diethoxybicyclo [2.2.1] hept-2-ene, 5-hydroxy-5-methyl Bicyclo [2.2.1] hept-2-ene, 5-hydroxy-5-ethylbicyclo [2.2.1] hept-2-ene, 5-hydroxymethyl-5-methylbicyclo [2.2.1] Hept-2-ene, 5-tert-butoxycarbonylbicyclo [2.2.1] hept-2-ene, 5-cyclohexyloxycarbonylbicyclo [2.2.1] hept-2-ene, 5-phenoxy Cycarbonylbicyclo [2.2.1] hept-2-ene, 5,6- Ratios such as su (tert-butoxycarbonyl) bicyclo [2.2.1] hept-2-ene, 5,6-bis (cyclohexyloxycarbonyl) bicyclo [2.2.1] hept-2-ene, etc. Cyclo unsaturated compounds;

N-페닐말레이미드, N-시클로헥실말레이미드, N-벤질말레이미드, N-숙신이미딜-3-말레이미드벤조에이트, N-숙신이미딜-4-말레이미드부틸레이트, N-숙신이미딜-6-말레이미드카프로에이트, N-숙신이미딜-3-말레이미드프로피오네이트, N-(9-아크리디닐)말레이미드 등의 디카르보닐이미드 유도체;N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, N-succinimidyl-3-maleimide benzoate, N-succinimidyl-4-maleimidebutylate, N-succinimidyl Dicarbonylimide derivatives such as -6-maleimide caproate, N-succinimidyl-3-maleimide propionate, and N- (9-acridinyl) maleimide;

스티렌, α-메틸스티렌, m-메틸스티렌, p-메틸스티렌, 비닐톨루엔, p-메톡시스티렌, 아크릴로니트릴, 메타크릴로니트릴, 염화비닐, 염화비닐리덴, 아크릴아미드, 메타크릴아미드, 아세트산비닐, 1,3-부타디엔, 이소프렌, 2,3-디메틸-1,3-부타디엔 등을 들 수 있다.Styrene, α-methylstyrene, m-methylstyrene, p-methylstyrene, vinyltoluene, p-methoxystyrene, acrylonitrile, methacrylonitrile, vinyl chloride, vinylidene chloride, acrylamide, methacrylamide, acetic acid Vinyl, 1,3-butadiene, isoprene, 2,3-dimethyl-1,3-butadiene and the like.

(c)로는, 공중합 반응성 및 내열성의 점에서, 스티렌, N-페닐말레이미드, N-시클로헥실말레이미드, N-벤질말레이미드, 비시클로[2.2.1]헵트-2-엔 등이 바람직하다.As (c), from the viewpoint of copolymerization reactivity and heat resistance, styrene, N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, bicyclo [2.2.1] hept-2-ene, and the like are preferable. .

수지(B)는, 문헌 「고분자합성의 실험법」[오오츠 타카유키 지음 핫코죠(주) 화학동인 제1판 제1쇄 1972년 3월 1일 발행]에 기재된 방법 및 해당 문헌에 기재된 인용 문헌을 참고로 하여 제조할 수 있다.Resin (B) is a method described in the literature "Experiment of Polymer Synthesis" (Otaka Takayuki Hakjo Co., Ltd. First Edition, First Printing, Issued March 1, 1972) and cited literatures described in the document. It can be prepared for reference.

또한, 얻어진 공중합체는, 반응 후의 용액을 그대로 사용하여도 좋고, 농축 혹은 희석한 용액을 사용하여도 좋으며, 재침전 등의 방법으로 고체(분체)로서 추출한 것을 사용하여도 좋다. 특히, 이 중합시에 용제로서, 후술하는 용제(E)를 사용함으로써, 반응 후의 용액을 그대로 사용할 수 있어, 제조 공정을 간략화할 수 있다.Moreover, the obtained copolymer may use the solution after reaction as it is, the concentrated or diluted solution may be used, and the thing extracted as solid (powder) by methods, such as reprecipitation, may be used. In particular, by using the solvent (E) described later as a solvent at the time of polymerization, the solution after the reaction can be used as it is, and the manufacturing process can be simplified.

수지(B)로는, 3,4-에폭시시클로헥실메틸(메트)아크릴레이트/(메트)아크릴산 공중합체, 3,4-에폭시트리시클로[5.2.1.02.6]데실아크릴레이트/(메트)아크릴산 공중합체 등의 수지 [K1]; 글리시딜(메트)아크릴레이트/벤질(메트)아크릴레이트/(메트)아크릴산 공중합체, 글리시딜(메트)아크릴레이트/스티렌/(메트)아크릴산 공중합체, 3,4-에폭시트리시클로[5.2.1.02.6]데실아크릴레이트/(메트)아크릴산/N-시클로헥실말레이미드 공중합체, 3-메틸-3-(메트)아크릴로일옥시메틸옥세탄/(메트)아크릴산/스티렌 공중합체 등의 수지 [K2]; 벤질(메트)아크릴레이트/(메트)아크릴산 공중합체, 스티렌/(메트)아크릴산 공중합체 등의 수지 [K3]; 벤질(메트)아크릴레이트/(메트)아크릴산 공중합체에 글리시딜(메트)아크릴레이트를 부가시킨 수지, 트리시클로데실(메트)아크릴레이트/스티렌/(메트)아크릴산 공중합체에 글리시딜(메트)아크릴레이트를 부가시킨 수지, 트리시클로데실(메트)아크릴레이트/벤질(메트)아크릴레이트/(메트)아크릴산 공중합체에 글리시딜(메트)아크릴레이트를 부가시킨 수지 등의 수지 [K4] 등을 들 수 있다.As the resin (B), 3,4-epoxycyclohexylmethyl (meth) acrylate / (meth) acrylic acid copolymer, 3,4-epoxycitricyclo [5.2.1.0 2.6 ] decylacrylate / (meth) acrylic acid copolymer Resins such as [K1]; Glycidyl (meth) acrylate / benzyl (meth) acrylate / (meth) acrylic acid copolymer, glycidyl (meth) acrylate / styrene / (meth) acrylic acid copolymer, 3,4-epoxytricyclo [5.2 .1.0 2.6 ] resins such as decylacrylate / (meth) acrylic acid / N-cyclohexylmaleimide copolymer, 3-methyl-3- (meth) acryloyloxymethyloxetane / (meth) acrylic acid / styrene copolymer [K2]; Resins such as benzyl (meth) acrylate / (meth) acrylic acid copolymer and styrene / (meth) acrylic acid copolymer [K3]; A glycidyl (meth) acrylate resin is added to a benzyl (meth) acrylate / (meth) acrylic acid copolymer, and a tricyclodecyl (meth) acrylate / styrene / (meth) acrylic acid copolymer is glycidyl (meth) Resin [K4] etc., such as resin which added acrylate, resin which added glycidyl (meth) acrylate to tricyclodecyl (meth) acrylate / benzyl (meth) acrylate / (meth) acrylic acid copolymer, etc. Can be mentioned.

그 중에서도, 수지 [K1] 및 수지 [K2]가 바람직하고, 수지 [K1]이 보다 바람직하며, 3,4-에폭시트리시클로[5.2.1.02.6]데실아크릴레이트/(메트)아크릴산 공중합체가 더욱 바람직하다.Especially, resin [K1] and resin [K2] are preferable, resin [K1] is more preferable, and 3,4-epoxycitricyclo [5.2.1.0 2.6 ] decylacrylate / (meth) acrylic acid copolymer is further desirable.

수지(B)의 폴리스티렌 환산의 중량 평균 분자량은, 바람직하게는 3,000∼100,000이고, 보다 바람직하게는 5,000∼50,000이며, 더욱 바람직하게는 5,000∼35,000이고, 특히 바람직하게는 6,000∼30,000이며, 특히 바람직하게는 7,000∼28,000이다. 분자량이 상기한 범위에 있으면, 도포막 경도가 향상되고, 잔막률도 높아, 미노광부의 현상액에 대한 용해성이 양호하며, 해상도가 향상되는 경향이 있다.The weight average molecular weight in terms of polystyrene in the resin (B) is preferably 3,000 to 100,000, more preferably 5,000 to 50,000, further preferably 5,000 to 35,000, particularly preferably 6,000 to 30,000, and particularly preferably It is 7,000-28,000. When the molecular weight is in the above-mentioned range, the coating film hardness is improved, the residual film rate is also high, the solubility in the developing solution of the unexposed portion is good, and the resolution tends to be improved.

수지(B)의 분자량 분포[중량 평균 분자량(Mw)/수 평균 분자량(Mn)]는, 바람직하게는 1.1∼6이고, 보다 바람직하게는 1.2∼4이다.The molecular weight distribution (weight average molecular weight (Mw) / number average molecular weight (Mn)) of the resin (B) is preferably 1.1 to 6, and more preferably 1.2 to 4.

수지(B)의 산가는, 바람직하게는 50∼150 mg-KOH/g이고, 보다 바람직하게는 60∼135 mg-KOH/g, 더욱 바람직하게는 70∼135 mg-KOH/g이다. 여기서 산가는 수지(B) 1 g을 중화시키는 데에 필요한 수산화칼륨의 양(mg)으로서 측정되는 값이며, 예컨대 수산화칼륨 수용액을 이용하여 적정(滴定)함으로써 구할 수 있다.The acid value of the resin (B) is preferably 50 to 150 mg-KOH / g, more preferably 60 to 135 mg-KOH / g, more preferably 70 to 135 mg-KOH / g. Here, the acid value is a value measured as the amount of potassium hydroxide (mg) required to neutralize 1 g of the resin (B), and can be obtained by titration using, for example, an aqueous potassium hydroxide solution.

수지(B)의 함유량은, 착색 경화성 수지 조성물의 고형분에 대하여, 바람직하게는 7∼65 질량%이고, 보다 바람직하게는 13∼60 질량%이며, 더욱 바람직하게는 17∼55 질량%이다. 수지(B)의 함유량이 상기한 범위에 있으면, 패턴을 형성할 수 있고, 또한, 해상도 및 잔막률이 향상되는 경향이 있다.The content of the resin (B) is preferably 7 to 65% by mass, more preferably 13 to 60% by mass, and even more preferably 17 to 55% by mass with respect to the solid content of the colored curable resin composition. When the content of the resin (B) is within the above range, a pattern can be formed, and the resolution and the residual film rate tend to be improved.

<광중합성 화합물(C)><Photopolymerizable compound (C)>

본 발명의 착색 경화성 수지 조성물은, 광중합성 화합물(C)을 포함한다. 광중합성 화합물(C)은, 광을 조사함으로써 광중합 개시제(D)로부터 발생한 활성 라디칼 및 산 등에 의해 중합할 수 있는 화합물로서, 예컨대, 중합성의 에틸렌성 불포화 결합을 갖는 화합물 등을 들 수 있고, 바람직하게는 (메트)아크릴산에스테르 화합물을 들 수 있다.The colored curable resin composition of the present invention contains a photopolymerizable compound (C). The photopolymerizable compound (C) is a compound capable of polymerizing with active radicals and acids generated from the photopolymerization initiator (D) by irradiating light, and examples thereof include compounds having a polymerizable ethylenically unsaturated bond, and the like. (Meth) acrylic acid ester compound is mentioned.

광중합성 화합물(C)로는, 에틸렌성 불포화 결합을 3개 이상 갖는 광중합성 화합물인 것이 바람직하다. 이러한 광중합성 화합물로는, 예컨대, 펜타에리스리톨테트라아크릴레이트, 펜타에리스리톨테트라메타크릴레이트, 디펜타에리스리톨펜타아크릴레이트, 디펜타에리스리톨펜타메타크릴레이트, 디펜타에리스리톨헥사아크릴레이트, 디펜타에리스리톨헥사메타크릴레이트 등을 들 수 있다. 광중합성 화합물(C)은, 단독으로 이용하여도 좋고, 2종 이상을 조합하여 이용하여도 좋다.The photopolymerizable compound (C) is preferably a photopolymerizable compound having three or more ethylenically unsaturated bonds. As such a photopolymerizable compound, for example, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipentaerythritol pentaacrylate, dipentaerythritol pentamethacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacryl Rate etc. are mentioned. The photopolymerizable compound (C) may be used alone or in combination of two or more.

광중합성 화합물(C)의 함유량은, 착색 경화성 수지 조성물의 고형분에 대하여, 7∼65 질량%인 것이 바람직하고, 보다 바람직하게는 13∼60 질량%이며, 더욱 바람직하게는 17∼55 질량%이다. 상기한 광중합성 화합물(C)의 함유량이 상기한 범위에 있으면, 경화가 충분히 일어나고, 현상 전후에서의 막 두께 비율이 향상되며, 패턴에 언더컷이 생기기 어렵게 되어 밀착성이 양호해지는 경향이 있기 때문에 바람직하다.The content of the photopolymerizable compound (C) is preferably 7 to 65 mass%, more preferably 13 to 60 mass%, still more preferably 17 to 55 mass%, based on the solid content of the colored curable resin composition. . When the content of the photopolymerizable compound (C) is in the above-mentioned range, curing is sufficiently performed, the film thickness ratio before and after development is improved, and undercuts are unlikely to occur in the pattern, and adhesion is likely to be improved, which is preferable. .

<광중합 개시제(D)><Photopolymerization initiator (D)>

본 발명의 착색 경화성 수지 조성물은, 광중합 개시제(D)를 포함한다.The colored curable resin composition of the present invention contains a photopolymerization initiator (D).

광중합 개시제(D)로는, 광의 작용에 의해 활성 라디칼, 산 등을 발생시키고, 중합을 개시하는 화합물이라면 특별히 한정되지 않고, 공지된 중합 개시제를 이용할 수 있다.The photopolymerization initiator (D) is not particularly limited as long as it is a compound that generates active radicals, acids, and the like by the action of light and initiates polymerization, and a known polymerization initiator can be used.

광중합 개시제(D)로는, 광의 작용에 의해 활성 라디칼을 발생시키는 화합물이 바람직하고, 알킬페논 화합물, 트리아진 화합물, 아실포스핀옥사이드 화합물, 옥심 화합물 및 비이미다졸 화합물로 이루어진 군에서 선택되는 적어도 1종을 포함하는 광중합 개시제가 보다 바람직하며, 옥심 화합물을 포함하는 광중합 개시제가 더욱 바람직하다.As the photopolymerization initiator (D), a compound that generates an active radical by the action of light is preferred, and at least 1 selected from the group consisting of alkylphenone compounds, triazine compounds, acylphosphine oxide compounds, oxime compounds, and biimidazole compounds The photopolymerization initiator containing a species is more preferable, and the photopolymerization initiator containing an oxime compound is more preferable.

알킬페논 화합물로는, 디에톡시아세토페논, 2-메틸-2-모르폴리노-1-(4-메틸술파닐페닐)프로판-1-온, 2-디메틸아미노-1-(4-모르폴리노페닐)-2-벤질부탄-1-온, 2-디메틸아미노-1-(4-모르폴리노페닐)-2-(4-메틸페닐메틸)부탄-1-온, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-2-메틸-1-[4-(2-히드록시에톡시)페닐]프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-히드록시-2-메틸-1-[4-(1-메틸비닐)페닐]프로판-1-온의 올리고머 등을 들 수 있고, 바람직하게는 2-메틸-2-모르폴리노-1-(4-메틸술파닐페닐)프로판-1-온, 2-디메틸아미노-1-(4-모르폴리노페닐)-2-벤질부탄-1-온 등을 들 수 있다. 이르가큐어(등록상표) 369, 907(이상, BASF사 제조) 등의 시판품을 이용하여도 좋다.Examples of the alkylphenone compound include diethoxy acetophenone, 2-methyl-2-morpholino-1- (4-methylsulfanylphenyl) propan-1-one, and 2-dimethylamino-1- (4-morpholino Phenyl) -2-benzylbutan-1-one, 2-dimethylamino-1- (4-morpholinophenyl) -2- (4-methylphenylmethyl) butan-1-one, 2-hydroxy-2-methyl -1-phenylpropan-1-one, benzyldimethylketal, 2-hydroxy-2-methyl-1- [4- (2-hydroxyethoxy) phenyl] propan-1-one, 1-hydroxycyclohexyl And oligomers of phenyl ketone and 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propan-1-one. Preferably, 2-methyl-2-morpholino -1- (4-methylsulfanylphenyl) propan-1-one, 2-dimethylamino-1- (4-morpholinophenyl) -2-benzylbutan-1-one, and the like. You may use commercial items, such as Irgacure (registered trademark) 369, 907 (above, manufactured by BASF).

트리아진 화합물로는, 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-피페로닐-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸푸란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(푸란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(3,4-디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다.As the triazine compound, 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- ( 4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (triclo Romethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2-yl) Ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine, 2 , 4-bis (trichloromethyl) -6- [2- (4-diethylamino-2-methylphenyl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl)- And 6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine.

아실포스핀옥사이드 화합물로는, 2,4,6-트리메틸벤조일디페닐포스핀옥사이드 등을 들 수 있다. 이르가큐어(등록상표) 819(BASF사 제조) 등의 시판품을 이용하여도 좋다.2,4,6-trimethylbenzoyldiphenylphosphine oxide etc. are mentioned as an acylphosphine oxide compound. You may use commercial items, such as Irgacure (trademark) 819 (made by BASF Corporation).

옥심 화합물로는, N-벤조일옥시-1-(4-페닐술파닐페닐)부탄-1-온-2-이민, N-벤조일옥시-1-(4-페닐술파닐페닐)옥탄-1-온-2-이민, N-아세톡시-1-[9-에틸-6-(2-메틸벤조일)-9H-카르바졸-3-일]에탄-1-이민, N-아세톡시-1-[9-에틸-6-{2-메틸-4-(3,3-디메틸-2,4-디옥사시클로펜타닐메틸옥시)벤조일}-9H-카르바졸-3-일]에탄-1-이민 등을 들 수 있다. 이르가큐어(등록상표) OXE-01, OXE-02(이상, BASF사 제조), N-1919(ADEKA사 제조) 등의 시판품을 이용하여도 좋다.As an oxime compound, N-benzoyloxy-1- (4-phenylsulfanylphenyl) butan-1-one-2-imine, N-benzoyloxy-1- (4-phenylsulfanylphenyl) octan-1-one -2-imine, N-acetoxy-1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethan-1-imine, N-acetoxy-1- [9 -Ethyl-6- {2-methyl-4- (3,3-dimethyl-2,4-dioxacyclopentanylmethyloxy) benzoyl} -9H-carbazol-3-yl] ethane-1-imine. You can. You may use commercial items, such as Irgacure (trademark) OXE-01, OXE-02 (above, BASF company make), and N-1919 (made by ADEKA company).

비이미다졸 화합물로는, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸(일본 특허 공개 평성 제6-75372호 공보, 일본 특허 공개 평성 제6-75373호 공보 등 참조), 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(디알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(트리알콕시페닐)비이미다졸(일본 특허 공고 소화 제48-38403호 공보, 일본 특허 공개 소화 제62-174204호 공보 등 참조), 4,4',5,5'-위치의 페닐기가 카르보알콕시기에 의해 치환되어 있는 이미다졸 화합물(일본 특허 공개 평성 제7-10913호 공보 등 참조) 등을 들 수 있다. 바람직하게는 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,4-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸을 들 수 있다.As the biimidazole compound, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3-dichlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole (see Japanese Patent Laid-Open Publication No. 6-75372, Japanese Patent Publication Laid-Open Publication No. 6-75373, etc.), 2,2'-bis (2 -Chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) ratio Imidazole, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetra (dialkoxyphenyl) biimidazole, 2,2'-bis (2-chlorophenyl) -4 , 4 ', 5,5'-tetra (trialkoxyphenyl) biimidazole (see Japanese Patent Publication No. 48-38403, Japanese Patent Publication No. 62-174204, etc.), 4,4', 5 And an imidazole compound in which the phenyl group at the 5'-position is substituted by a carboalkoxy group (see Japanese Unexamined Patent Publication No. Hei 7-10913, etc.). Preferably 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3-dichlorophenyl) -4,4 And ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,4-dichlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole.

광에 의해 산을 발생시키는 산 발생제로는, 4-히드록시페닐디메틸술포늄 p-톨루엔술포네이트, 4-히드록시페닐디메틸술포늄헥사플루오로안티모네이트, 4-아세톡시페닐디메틸술포늄 p-톨루엔술포네이트, 4-아세톡시페닐·메틸·벤질술포늄헥사플루오로안티모네이트, 트리페닐술포늄 p-톨루엔술포네이트, 트리페닐술포늄헥사플루오로안티모네이트, 디페닐요오드늄 p-톨루엔술포네이트, 디페닐요오드늄헥사플루오로안티모네이트 등의 오늄염이나, 니트로벤질토실레이트, 벤조인토실레이트 등을 들 수 있다.Examples of the acid generator that generates acid by light include 4-hydroxyphenyldimethylsulfonium p-toluenesulfonate, 4-hydroxyphenyldimethylsulfonium hexafluoroantimonate, and 4-acetoxyphenyldimethylsulfonium p -Toluenesulfonate, 4-acetoxyphenyl · methyl · benzylsulfonium hexafluoroantimonate, triphenylsulfonium p-toluenesulfonate, triphenylsulfonium hexafluoroantimonate, diphenyl iodonium p- And onium salts such as toluene sulfonate and diphenyl iodonium hexafluoroantimonate; and nitrobenzyl tosylate and benzointosylate.

광중합 개시제(D)는, 트리아진 화합물 등, 광에 의해 활성 라디칼과 산을 동시에 발생시키는 화합물이어도 좋다.The photopolymerization initiator (D) may be a compound that simultaneously generates an active radical and an acid by light, such as a triazine compound.

광중합 개시제(D)로는, 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르, 벤조인이소부틸에테르 등의 벤조인 화합물; 벤조페논, o-벤조일안식향산메틸, 4-페닐벤조페논, 4-벤조일-4'-메틸디페닐술파이드, 3,3',4,4'-테트라(tert-부틸퍼옥시카르보닐)벤조페논, 2,4,6-트리메틸벤조페논 등의 벤조페논 화합물; 9,10-페난트렌퀴논, 2-에틸안트라퀴논, 캄파퀴논 등의 퀴논 화합물; 10-부틸-2-클로로아크리돈, 벤질, 페닐글리옥실산메틸, 티타노센 화합물 등을 더 들 수 있다. 이들은, 후술하는 광중합 개시 보조제(D1)(아민 등)와 조합하여 이용하는 것이 바람직하다.Examples of the photopolymerization initiator (D) include benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzoin isobutyl ether; Benzophenone, o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenylsulfide, 3,3 ', 4,4'-tetra (tert-butylperoxycarbonyl) benzophenone , 2,4,6-trimethylbenzophenone and other benzophenone compounds; Quinone compounds such as 9,10-phenanthrenequinone, 2-ethylanthraquinone, and campaquinone; And 10-butyl-2-chloroacridone, benzyl, methyl phenylglyoxylate, and titanocene compounds. It is preferable to use these in combination with the photoinitiator (D1) (amine etc.) mentioned later.

광중합 개시제(D)의 함유량은, 수지(B) 및 광중합성 화합물(C)의 합계량 100 질량부에 대하여, 바람직하게는 0.1∼30 질량부이고, 보다 바람직하게는 1∼20 질량부이다. 광중합 개시제의 함유량이 상기한 범위에 있으면, 고감도화하여 노광 시간이 단축되고 생산성이 향상된다.The content of the photopolymerization initiator (D) is preferably 0.1 to 30 parts by mass, more preferably 1 to 20 parts by mass, based on 100 parts by mass of the total amount of the resin (B) and the photopolymerizable compound (C). When the content of the photopolymerization initiator is in the above-described range, the sensitivity is increased, the exposure time is shortened, and productivity is improved.

<광중합 개시 보조제(D1)><Photopolymerization start adjuvant (D1)>

본 발명의 착색 경화성 수지 조성물에는, 광중합 개시 보조제(D1)가 더 포함되어 있어도 좋다. 광중합 개시 보조제(D1)는, 통상, 광중합 개시제(D)와 조합하여 이용되고, 광중합 개시제에 의해 중합이 개시된 광중합성 화합물의 중합을 촉진시키기 위해서 이용되는 화합물, 혹은 증감제이다.The photocuring initiation aid (D1) may further be included in the colored curable resin composition of the present invention. The photopolymerization initiation aid (D1) is usually used in combination with the photopolymerization initiator (D), and is a compound or sensitizer used to accelerate polymerization of the photopolymerizable compound in which polymerization is initiated by the photopolymerization initiator.

광중합 개시 보조제(D1)로는, 아민 화합물, 알콕시안트라센 화합물, 티오크산톤 화합물, 카르복실산 화합물 등을 들 수 있다.Examples of the photopolymerization initiation aid (D1) include an amine compound, an alkoxyanthracene compound, a thioxanthone compound, and a carboxylic acid compound.

아민 화합물로는, 트리에탄올아민, 메틸디에탄올아민, 트리이소프로판올아민, 4-디메틸아미노벤조산메틸, 4-디메틸아미노벤조산에틸, 4-디메틸아미노벤조산이소아밀, 안식향산2-디메틸아미노에틸, 4-디메틸아미노벤조산2-에틸헥실, N,N-디메틸파라톨루이딘, 4,4'-비스(디메틸아미노)벤조페논(통칭 미힐러케톤), 4,4'-비스(디에틸아미노)벤조페논, 4,4'-비스(에틸메틸아미노)벤조페논 등을 들 수 있고, 그 중에서도 4,4'-비스(디에틸아미노)벤조페논이 바람직하다. EAB-F[호도가야카가쿠고교(주) 제조] 등의 시판품을 이용하여도 좋다.As the amine compound, triethanolamine, methyldiethanolamine, triisopropanolamine, 4-dimethylaminobenzoate methyl, 4-dimethylaminobenzoate ethyl, 4-dimethylaminobenzoic acid isoamyl, benzoic acid 2-dimethylaminoethyl, 4-dimethyl Aminobenzoic acid 2-ethylhexyl, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzophenone (commonly known as healer ketone), 4,4'-bis (diethylamino) benzophenone, 4, And 4'-bis (ethylmethylamino) benzophenone. Among them, 4,4'-bis (diethylamino) benzophenone is preferable. You may use commercial items, such as EAB-F (made by Hodogaya Chemical Industry Co., Ltd.).

알콕시안트라센 화합물로는, 9,10-디메톡시안트라센, 2-에틸-9,10-디메톡시안트라센, 9,10-디에톡시안트라센, 2-에틸-9,10-디에톡시안트라센, 9,10-디부톡시안트라센, 2-에틸-9,10-디부톡시안트라센 등을 들 수 있다.As the alkoxy anthracene compound, 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, 9,10- And dibutoxyanthracene, 2-ethyl-9,10-dibutoxyanthracene, and the like.

티오크산톤 화합물로는, 2-이소프로필티오크산톤, 4-이소프로필티오크산톤, 2,4-디에틸티오크산톤, 2,4-디클로로티오크산톤, 1-클로로-4-프로폭시티오크산톤 등을 들 수 있다.As the thioxanthone compound, 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, 1-chloro-4-propoxy And city oak xanthone.

카르복실산 화합물로는, 페닐술파닐아세트산, 메틸페닐술파닐아세트산, 에틸페닐술파닐아세트산, 메틸에틸페닐술파닐아세트산, 디메틸페닐술파닐아세트산, 메톡시페닐술파닐아세트산, 디메톡시페닐술파닐아세트산, 클로로페닐술파닐아세트산, 디클로로페닐술파닐아세트산, N-페닐글리신, 페녹시아세트산, 나프틸티오아세트산, N-나프틸글리신, 나프톡시아세트산 등을 들 수 있다.Examples of the carboxylic acid compound include phenylsulfanyl acetic acid, methylphenylsulfanyl acetic acid, ethylphenylsulfanyl acetic acid, methylethylphenylsulfanyl acetic acid, dimethylphenylsulfanyl acetic acid, methoxyphenylsulfanyl acetic acid and dimethoxyphenylsulfanyl acetic acid, And chlorophenylsulfanyl acetic acid, dichlorophenylsulfanyl acetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, and naphthoxyacetic acid.

광중합 개시 보조제(D1)는, 단독으로 이용하여도 좋고, 2종 이상을 조합하여 이용하여도 좋다.The photopolymerization initiation aid (D1) may be used alone or in combination of two or more.

이들 광중합 개시 보조제(D1)를 이용하는 경우, 그 사용량은, 수지(B) 및 중합성 화합물(C)의 합계량 100 질량부에 대하여, 바람직하게는 0.01∼50 질량부, 보다 바람직하게는 0.1∼40 질량부이다. 또한, 광중합 개시제(D) 1몰에 대하여, 바람직하게는 0.01∼10몰, 보다 바람직하게는 0.01∼5몰이다. 중합 개시 보조제(D1)의 양이 이 범위에 있으면, 더욱 고감도로 패턴을 형성할 수 있어, 패턴의 생산성이 향상되는 경향이 있다.When using these photopolymerization start adjuvants (D1), the use amount thereof is preferably 0.01 to 50 parts by mass, more preferably 0.1 to 40 parts by mass relative to 100 parts by mass of the total amount of the resin (B) and the polymerizable compound (C). It is the mass part. Moreover, with respect to 1 mol of a photoinitiator (D), it is preferably 0.01 to 10 mol, more preferably 0.01 to 5 mol. When the amount of the polymerization initiation aid (D1) is in this range, the pattern can be formed with higher sensitivity, and the productivity of the pattern tends to be improved.

<용제(E)><Solvent (E)>

본 발명의 착색 경화성 수지 조성물은, 용제(E)를 포함하여도 좋다.The colored curable resin composition of the present invention may contain a solvent (E).

용제(E)는, 특별히 한정되지 않고, 해당 분야에서 통상 사용되는 용제를 이용할 수 있다. 용제(E)로는, 에스테르 용제(-COO-를 포함하는 용제), 에스테르 용제 이외의 에테르 용제(-O-를 포함하는 용제), 에테르에스테르 용제(-COO-와 -O-를 포함하는 용제), 에스테르 용제 이외의 케톤 용제(-CO-를 포함하는 용제), 알코올 용제, 방향족 탄화수소 용제, 아미드 용제, 디메틸술폭시드 등 중에서 선택하여 이용할 수 있다.The solvent (E) is not particularly limited, and a solvent commonly used in the field can be used. As the solvent (E), an ester solvent (a solvent containing -COO-), an ether solvent other than an ester solvent (a solvent containing -O-), and an ether ester solvent (a solvent containing -COO- and -O-) , Ketone solvents other than ester solvents (solvents containing -CO-), alcohol solvents, aromatic hydrocarbon solvents, amide solvents, and dimethyl sulfoxide.

에스테르 용제로는, 젖산메틸, 젖산에틸, 젖산부틸, 2-히드록시이소부탄산메틸, 아세트산에틸, 아세트산n-부틸, 아세트산이소부틸, 포름산펜틸, 아세트산이소펜틸, 프로피온산부틸, 부티르산이소프로필, 부티르산에틸, 부티르산부틸, 피루브산메틸, 피루브산에틸, 피루브산프로필, 아세토아세트산메틸, 아세토아세트산에틸, 시클로헥산올아세테이트, γ-부티로락톤 등을 들 수 있다.As an ester solvent, methyl lactate, ethyl lactate, butyl lactate, methyl 2-hydroxyisobutanoate, ethyl acetate, n-butyl acetate, isobutyl acetate, pentyl formate, isopentyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate , Butyl butyrate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, cyclohexanol acetate, γ-butyrolactone, and the like.

에테르 용제로는, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸에테르, 에틸렌글리콜모노프로필에테르, 에틸렌글리콜모노부틸에테르, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 디에틸렌글리콜모노부틸에테르, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노에틸에테르, 프로필렌글리콜모노프로필에테르, 프로필렌글리콜모노부틸에테르, 3-메톡시-1-부탄올, 3-메톡시-3-메틸부탄올, 테트라히드로푸란, 테트라히드로피란, 1,4-디옥산, 디에틸렌글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 디에틸렌글리콜메틸에틸에테르, 디에틸렌글리콜디프로필에테르, 디에틸렌글리콜디부틸에테르, 아니솔, 페네톨, 메틸아니솔 등을 들 수 있다.Examples of the ether solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, Propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, 3-methoxy-1-butanol, 3-methoxy-3-methylbutanol, tetrahydrofuran, tetrahydropyran , 1,4-dioxane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, anisole, phenitol, methylani And brushes.

에테르에스테르 용제로는, 메톡시아세트산메틸, 메톡시아세트산에틸, 메톡시아세트산부틸, 에톡시아세트산메틸, 에톡시아세트산에틸, 3-메톡시프로피온산메틸, 3-메톡시프로피온산에틸, 3-에톡시프로피온산메틸, 3-에톡시프로피온산에틸, 2-메톡시프로피온산메틸, 2-메톡시프로피온산에틸, 2-메톡시프로피온산프로필, 2-에톡시프로피온산메틸, 2-에톡시프로피온산에틸, 2-메톡시-2-메틸프로피온산메틸, 2-에톡시-2-메틸프로피온산에틸, 3-메톡시부틸아세테이트, 3-메틸-3-메톡시부틸아세테이트, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노프로필에테르아세테이트, 에틸렌글리콜모노메틸에테르아세테이트, 에틸렌글리콜모노에틸에테르아세테이트, 디에틸렌글리콜모노에틸에테르아세테이트, 디에틸렌글리콜모노부틸에테르아세테이트 등을 들 수 있다.As the ether ester solvent, methyl methoxy acetate, ethyl methoxy acetate, butyl butyl acetate, methyl ethoxy acetate, ethyl ethoxy acetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionic acid Methyl, 3-ethoxypropionate, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, 2-methoxy-2 -Methyl methyl propionate, 2-ethoxy-2-methyl propionate, 3-methoxybutyl acetate, 3-methyl-3-methoxybutyl acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol Monopropyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate , Di, and the like ethylene glycol monobutyl ether acetate.

케톤 용제로는, 4-히드록시-4-메틸-2-펜타논, 아세톤, 2-부타논, 2-헵타논, 3-헵타논, 4-헵타논, 4-메틸-2-펜타논, 시클로펜타논, 시클로헥사논, 이소포론 등을 들 수 있다.As a ketone solvent, 4-hydroxy-4-methyl-2-pentanone, acetone, 2-butanone, 2-heptanone, 3-heptanone, 4-heptanone, 4-methyl-2-pentanone, And cyclopentanone, cyclohexanone, and isophorone.

알코올 용제로는, 메탄올, 에탄올, 프로판올, 부탄올, 헥산올, 시클로헥산올, 에틸렌글리콜, 프로필렌글리콜, 글리세린 등을 들 수 있다.Examples of the alcohol solvent include methanol, ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, and glycerin.

방향족 탄화수소 용제로는, 벤젠, 톨루엔, 크실렌, 메시틸렌 등을 들 수 있다.Benzene, toluene, xylene, mesitylene, etc. are mentioned as an aromatic hydrocarbon solvent.

아미드 용제로는, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, N-메틸피롤리돈 등을 들 수 있다.Examples of the amide solvent include N, N-dimethylformamide, N, N-dimethylacetamide, and N-methylpyrrolidone.

이들 용제는, 단독으로 이용하여도 좋고, 2종류 이상을 조합하여 이용하여도 좋다.These solvents may be used alone or in combination of two or more.

상기한 용제 중, 도포성, 건조성의 점에서, 1 atm에 있어서의 비점이 120℃ 이상 180℃ 이하인 유기 용제가 바람직하다. 그 중에서도, 프로필렌글리콜모노메틸에테르아세테이트, 젖산에틸, 프로필렌글리콜모노메틸에테르, 3-에톡시프로피온산에틸, 에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노메틸에테르, 디에틸렌글리콜모노에틸에테르, 4-히드록시-4-메틸-2-펜타논, N,N-디메틸포름아미드, N-메틸피롤리돈 등이 바람직하고, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜모노메틸에테르아세테이트, 젖산에틸, 3-에톡시프로피온산에틸 등이 보다 바람직하다. 이들 용제를 포함하면, 도포시의 평탄성이 우수하다.Among the above-mentioned solvents, from the viewpoints of coatability and dryness, organic solvents having a boiling point of 1 atm of 120 ° C or more and 180 ° C or less are preferable. Among them, propylene glycol monomethyl ether acetate, ethyl lactate, propylene glycol monomethyl ether, 3-ethoxypropionate ethyl, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, 4-hydroxy Preference is given to -4-methyl-2-pentanone, N, N-dimethylformamide, N-methylpyrrolidone, etc., propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, ethyl lactate, 3-ethoxypropionic acid Ethyl and the like are more preferable. When these solvents are included, the flatness at the time of coating is excellent.

착색 경화성 수지 조성물에 있어서의 용제(E)의 함유량은, 착색 경화성 수지 조성물에 대하여, 바람직하게는 70∼95 질량%이고, 보다 바람직하게는 75∼92 질량%이다. 다시 말하면, 착색 경화성 수지 조성물의 고형분은, 바람직하게는 5∼30 질량%, 보다 바람직하게는 8∼25 질량%이다. 용제(E)의 함유량이 상기한 범위에 있으면, 도포시의 평탄성이 양호해지고, 또한, 컬러 필터를 형성했을 때에 색 농도가 부족하지 않기 때문에 표시 특성이 양호해지는 경향이 있다.The content of the solvent (E) in the colored curable resin composition is preferably 70 to 95% by mass, and more preferably 75 to 92% by mass, with respect to the colored curable resin composition. In other words, the solid content of the colored curable resin composition is preferably 5 to 30% by mass, more preferably 8 to 25% by mass. When the content of the solvent (E) is within the above-mentioned range, the flatness at the time of application becomes good, and when the color filter is formed, the color density is not insufficient, so the display characteristics tend to be improved.

본 발명의 착색 경화성 수지 조성물은, 필요에 따라, 계면활성제, 충전제, 다른 고분자 화합물, 밀착 촉진제, 산화 방지제, 레벨링제, 자외선 흡수제, 광안정제, 연쇄 이동제 등의 여러 가지 첨가제를 포함하여도 좋다.The colored curable resin composition of the present invention may contain various additives such as surfactants, fillers, other polymer compounds, adhesion promoters, antioxidants, leveling agents, ultraviolet absorbers, light stabilizers, and chain transfer agents, if necessary.

전술한 착색 경화성 조성물에 의해 형성되는 컬러 필터도 또한, 본 발명의 범주에 들어간다. 상기 컬러 필터는, 착색 경화성 조성물을 기판에 도포하고, 또한, 건조시킴으로써 착색층(이 층을 「조성물층」이라고 부르는 경우가 있음)을 작성하며, 또한, 얻어진 착색층을 경화하는 공정을 포함하는 방법에 의해 얻을 수 있다.The color filter formed by the above-mentioned colored curable composition also falls within the scope of the present invention. The color filter comprises a step of applying a colored curable composition to a substrate and drying it to form a colored layer (sometimes referred to as a "composition layer"), and further curing the obtained colored layer. Can be obtained by method.

본 발명의 착색 경화성 조성물로부터 컬러 필터의 착색 패턴을 제조하는 방법으로는, 포토리소그래프법, 잉크젯법, 인쇄법 등을 들 수 있다. 그 중에서도, 포토리소그래프법이 바람직하다. 포토리소그래프법은, 착색 경화성 수지 조성물을, 기판 또는 다른 수지층(예컨대, 기판 위에 먼저 형성된 다른 착색 경화성 수지 조성물층 등) 위에 도포하고, 용제 등의 휘발 성분을 건조 등에 의해 제거하여 착색층을 형성하며, 또한, 포토마스크를 통해 상기 착색층을 노광하여, 현상하는 방법이다. 포토리소그래프법에 있어서, 노광시에 포토마스크를 이용하지 않음으로써, 및/또는 현상하지 않음으로써, 상기 착색층의 경화물인 도포막을 형성할 수 있다.A photolithography method, an inkjet method, a printing method, etc. are mentioned as a method of manufacturing the colored pattern of a color filter from the colored curable composition of this invention. Especially, the photolithography method is preferable. In the photolithography method, a colored curable resin composition is applied onto a substrate or another resin layer (for example, another colored curable resin composition layer first formed on a substrate, etc.), and volatile components such as a solvent are removed by drying or the like to remove the colored layer. It is a method of forming and exposing the colored layer through a photomask to develop. In the photolithography method, a coating film that is a cured product of the colored layer can be formed by not using and / or not developing a photomask during exposure.

이 경우의 도포막의 막 두께는, 특별히 한정되지 않고, 이용하는 재료, 용도 등에 따라 적절하게 조정할 수 있으며, 통상 0.1∼30 ㎛, 바람직하게는 1∼20 ㎛, 더욱 바람직하게는 1∼6 ㎛이다.The film thickness of the coating film in this case is not particularly limited, and can be appropriately adjusted depending on the material, application, and the like, and is usually 0.1 to 30 μm, preferably 1 to 20 μm, and more preferably 1 to 6 μm.

착색 경화성 수지 조성물의 도포 방법으로는, 압출 코팅법, 다이렉트 그라비아 코팅법, 리버스 그라비아 코팅법, CAP 코팅법, 다이코팅법 등을 들 수 있다. 딥 코터, 바 코터, 스핀 코터, 슬릿 & 스핀 코터, 슬릿 코터(다이 코터, 커튼 플로 코터, 스핀리스 코터라고도 불리는 경우가 있음) 등의 코터를 이용하여 도포하여도 좋다.Extrusion coating method, direct gravure coating method, reverse gravure coating method, CAP coating method, die coating method etc. are mentioned as a coating method of a coloring curable resin composition. You may apply using a coater such as a dip coater, bar coater, spin coater, slit & spin coater, and slit coater (sometimes referred to as a die coater, curtain flow coater, or spinless coater).

용매의 제거/건조는, 자연 건조, 통풍 건조, 감압 건조, 가열 건조 등에 의해 행할 수 있다. 구체적인 건조 온도는, 10℃∼120℃가 바람직하고, 25℃∼100℃가 보다 바람직하다.The removal / drying of the solvent can be performed by natural drying, air drying, vacuum drying, heat drying, or the like. The specific drying temperature is preferably 10 ° C to 120 ° C, and more preferably 25 ° C to 100 ° C.

건조 시간은, 10초간∼60분간이 바람직하고, 30초간∼30분간이 보다 바람직하다.The drying time is preferably 10 seconds to 60 minutes, more preferably 30 seconds to 30 minutes.

감압 건조는, 50∼150 Pa의 압력 하, 20℃∼25℃의 범위에서 행하는 것이 바람직하다.The drying under reduced pressure is preferably performed in a range of 20 ° C to 25 ° C under a pressure of 50 to 150 Pa.

건조 후의 도포막은, 원하는 패턴을 형성하기 위한 포토마스크를 통해 노광한다. 이 때의 포토마스크 상의 패턴 형상은 특별히 한정되지 않고, 목적으로 하는 용도에 따른 패턴 형상이 이용된다.The coated film after drying is exposed through a photomask for forming a desired pattern. The pattern shape on the photomask at this time is not particularly limited, and a pattern shape according to the intended use is used.

노광에 이용되는 광원으로는, 250∼450 ㎚ 파장의 광을 발생시키는 광원이 바람직하다. 구체적으로는, 수은등, 발광 다이오드, 메탈 할라이드 램프, 할로겐 램프 등을 들 수 있고, 특정 파장 영역을 커트하는 필터를 이용하여 커트하거나, 특정 파장 영역을 추출하는 밴드 패스 필터를 이용하여 선택적으로 추출하거나 하여 노광하여도 좋다.The light source used for exposure is preferably a light source that generates light having a wavelength of 250 to 450 nm. Specifically, a mercury lamp, a light emitting diode, a metal halide lamp, a halogen lamp, and the like may be used, and the filter may be cut using a filter that cuts a specific wavelength region, or selectively extracted using a band pass filter that extracts a specific wavelength region. May be exposed.

노광면 전체에 균일하게 평행 광선을 조사하거나, 마스크와 기재와의 정확한 위치 맞춤을 행할 수 있기 때문에, 마스크 얼라이너, 스테퍼 등의 장치를 사용하는 것이 바람직하다.It is preferable to use a device such as a mask aligner, a stepper, etc., because it is possible to uniformly irradiate parallel light beams over the entire exposed surface or to accurately align the mask with the substrate.

노광 후, 현상액에 접촉시켜 소정 부분(미노광부 등)을 용해시켜, 현상함으로써, 패턴을 얻을 수 있다. 현상액으로는, 알칼리성 화합물(수산화칼륨, 탄산나트륨, 테트라메틸암모늄히드록시드 등)의 수용액 등을 들 수 있다. 이 현상액은, 계면활성제를 포함하고 있어도 좋다.After exposure, a pattern can be obtained by contacting a developer and dissolving and developing a predetermined portion (such as an unexposed portion). Examples of the developing solution include an aqueous solution of an alkaline compound (potassium hydroxide, sodium carbonate, tetramethylammonium hydroxide, etc.). This developer may contain a surfactant.

현상 방법은, 퍼들법, 디핑법, 스프레이법 등 중 어느 것이어도 좋다. 또한 현상시에 기판을 임의의 각도로 기울여도 좋다. 현상 후에는, 수세하는 것이 바람직하다.The developing method may be any of a puddle method, a dipping method, and a spray method. Further, the substrate may be tilted at an arbitrary angle during development. After development, it is preferable to wash with water.

또한, 필요에 따라, 포스트 베이크를 행하여도 좋다. 포스트 베이크는, 예컨대, 150℃∼230℃, 10∼240분간의 범위가 바람직하다.Further, if necessary, post-baking may be performed. The post-baking, for example, is preferably in the range of 150 ° C to 230 ° C and 10 to 240 minutes.

본 발명의 착색 경화성 수지 조성물에 따르면, 명도와 콘트라스트가 양호한 도포막, 패턴 및 고품질의 컬러 필터를 얻을 수 있다. 이들 컬러 필터 또는 패턴을 그 구성 부품의 일부로서 구비하는 표시 장치, 예컨대, 공지된 액정 표시 장치, 유기 EL 장치, 고체 촬상 소자 등의 여러 가지 착색 화상에 관련된 기기 모두에 공지된 양태로 이용할 수 있다.According to the colored curable resin composition of the present invention, it is possible to obtain a coating film having good brightness and contrast, a pattern, and a high-quality color filter. These color filters or patterns can be used in a manner known to all of the devices associated with various colored images, such as display devices provided as part of their constituent parts, such as known liquid crystal display devices, organic EL devices, and solid-state imaging devices. .

다음에 실시예를 들어 본 발명을 더욱 구체적으로 설명한다. 예 중, 함유량 내지 사용량을 나타내는 % 및 부는 특별히 기재하지 않는 한, 질량 기준이다.Next, the present invention will be described in more detail with reference to Examples. In the examples,% and parts indicating the content to the amount used are based on mass unless otherwise specified.

이하에 있어서, 화합물의 구조는 질량 분석(LC; Agilent제 1200형, MASS; Agilent제 LC/MSD형)으로 확인하였다.In the following, the structure of the compound was confirmed by mass spectrometry (LC; Agilent 1200 type, MASS; Agilent LC / MSD type).

[합성예 1][Synthesis Example 1]

2-아미노-4-메틸술포닐-6-니트로페놀(CAS No. 101861-04-5) 7.5부에 물 65부를 첨가한 후, 수산화나트륨 1.3부를 첨가하여 용해시켰다. 빙냉 하, 35% 아질산나트륨[와코쥰야쿠고교(주) 제조] 수용액 6.1부를 첨가하고, 계속해서 35% 염산 19.4부를 조금씩 첨가하여 용해시켜 2시간 동안 교반하고, 디아조늄염을 포함하는 현탁액을 얻었다. 계속해서 아미드황산[와코쥰야쿠고교(주) 제조] 5.6부를 물 26부에 용해시킨 수용액을 천천히 첨가하여, 과잉의 아질산나트륨을 불활성화시켰다.After adding 65 parts of water to 7.5 parts of 2-amino-4-methylsulfonyl-6-nitrophenol (CAS No. 101861-04-5), 1.3 parts of sodium hydroxide was added to dissolve it. Under ice-cooling, 6.1 parts of an aqueous 35% sodium nitrite solution (manufactured by Wako Pure Chemical Industries, Ltd.) was added, and then 19.4 parts of 35% hydrochloric acid was gradually added to dissolve and stirred for 2 hours to obtain a suspension containing a diazonium salt. . Subsequently, an aqueous solution in which 5.6 parts of amide sulfuric acid (manufactured by Wako Pure Chemical Industries, Ltd.) was dissolved in 26 parts of water was slowly added to inactivate excess sodium nitrite.

계속해서, 3-메틸-1-페닐-5-피라졸론[와코쥰야쿠고교(주) 제조] 5.6부를 물 70부에 현탁시키고, 수산화나트륨을 이용하여 pH를 8.0으로 조정하였다. 여기에, 상기 디아조늄염을 포함하는 현탁액을 15분에 걸쳐 pH가 7∼7.5의 범위에 들어가도록 10% 수산화나트륨 용액을 적절하게 추가하면서, 적하하였다. 적하 종료 후, 30분간 더 교반함으로써 황색의 현탁액을 얻었다. 1시간 동안 교반하였다. 여과하여 얻은 황색 고체를 감압 하 60℃에서 건조시켜, 화학식 (p-2)로 표시되는 화합물 11.7부(수율 87%)를 얻었다.Subsequently, 5.6 parts of 3-methyl-1-phenyl-5-pyrazolone (manufactured by Wako Pure Chemical Industries, Ltd.) was suspended in 70 parts of water, and the pH was adjusted to 8.0 using sodium hydroxide. To this, the suspension containing the diazonium salt was added dropwise over 15 minutes while adding a 10% sodium hydroxide solution appropriately so that the pH was in the range of 7 to 7.5. After completion of the dropwise addition, yellow suspension was obtained by further stirring for 30 minutes. Stir for 1 hour. The yellow solid obtained by filtration was dried under reduced pressure at 60 ° C. to obtain 11.7 parts of a compound represented by the formula (p-2) (yield 87%).

Figure pat00023
Figure pat00023

화학식 (p-2)의 화합물 10부를 디메틸포름아미드[도쿄카세이고교(주) 제조] 100부에 넣어 용해시키고, 황산암모늄크롬(III) 12 수화물[와코쥰야쿠고교(주) 제조] 3.1부, 아세트산나트륨[와코쥰야쿠고교(주) 제조] 1.1부를 첨가한 후, 4시간 30분간 가열 환류시켰다. 실온까지 냉각시킨 후, 반응 용액을 20% 식염수 1500부에 주입하고, 여과 후에 얻어진 붉은 주황색 고체를 60℃에서 건조시켜, 화학식 (z-2A)로 표시되는 화합물 13.6부(수율 63%)를 얻었다.10 parts of the compound of formula (p-2) is dissolved in 100 parts of dimethylformamide (manufactured by Tokyo Chemical Industry Co., Ltd.) and dissolved, and ammonium chromium (III) sulfate hydrate (manufactured by Wako Pure Chemical Industries, Ltd.) 3.1 parts, After adding 1.1 parts of sodium acetate (manufactured by Wako Pure Chemical Industries, Ltd.), the mixture was refluxed for 4 hours and 30 minutes. After cooling to room temperature, the reaction solution was poured into 1500 parts of 20% saline, and the red-orange solid obtained after filtration was dried at 60 ° C. to obtain 13.6 parts of a compound represented by the formula (z-2A) (yield 63%). .

Figure pat00024
Figure pat00024

[합성예 2][Synthesis Example 2]

화학식 (z-2A)로 표시되는 화합물 9.1부를 물 100부에 용해시킨 액(d-1)을 작성하였다. 액(d-1)에 3-아미노프로필트리에톡시실란[도쿄카세이고교(주) 제조] 2.2부를 1시간에 걸쳐 첨가하고, 그 후 24시간 동안 교반하였다. 생성된 침전물을 여과하여, 물 1000부로 세정한 후, 24시간 동안, 60℃에서 감압 건조시켜, 화학식 (z-3)으로 표시되는 화합물을 1.0부 얻었다.A solution (d-1) was prepared by dissolving 9.1 parts of the compound represented by the formula (z-2A) in 100 parts of water. To the liquid (d-1), 2.2 parts of 3-aminopropyltriethoxysilane (manufactured by Tokyo Chemical Industry Co., Ltd.) was added over 1 hour, and then stirred for 24 hours. The resulting precipitate was filtered, washed with 1000 parts of water, and dried under reduced pressure at 60 ° C. for 24 hours to obtain 1.0 part of the compound represented by formula (z-3).

Figure pat00025
Figure pat00025

[합성예 3][Synthesis Example 3]

교반기, 온도계, 환류 냉각기 및 적하 깔때기를 구비한 플라스크 내에 질소를 0.02 ℓ/분으로 흐르게 하여 질소 분위기로 하고, 프로필렌글리콜모노메틸에테르아세테이트 305부를 넣어, 교반하면서 70℃까지 가열하였다.In a flask equipped with a stirrer, a thermometer, a reflux cooler, and a dropping funnel, nitrogen was flowed at 0.02 L / min to a nitrogen atmosphere, and 305 parts of propylene glycol monomethyl ether acetate was added and heated to 70 ° C while stirring.

계속해서, 아크릴산 60부, 3,4-에폭시트리시클로[5.2.1.02.6]데실아크릴레이트[화학식 (I-1)로 표시되는 화합물 및 화학식 (II-1)로 표시되는 화합물을, 몰비로, 50:50으로 혼합] 440부를, 프로필렌글리콜모노메틸에테르아세테이트 140부에 용해시켜 용액을 조제하고, 이 용액을, 적하 깔때기를 이용하여 4시간에 걸쳐 70℃로 보온한 플라스크 내에 적하하였다.Subsequently, 60 parts of acrylic acid, 3,4-epoxytricyclo [5.2.1.0 2.6 ] decyl acrylate [a compound represented by the formula (I-1) and a compound represented by the formula (II-1), in molar ratio, 50:50 mixture] 440 parts were dissolved in 140 parts of propylene glycol monomethyl ether acetate to prepare a solution, and this solution was added dropwise into a flask kept at 70 ° C over 4 hours using a dropping funnel.

Figure pat00026
Figure pat00026

한편, 중합 개시제 2,2'-아조비스(2,4-디메틸발레로니트릴) 30부를 프로필렌글리콜모노메틸에테르아세테이트 225부에 용해한 용액을, 다른 적하 깔때기를 이용하여 4시간에 걸쳐 플라스크 내에 적하하였다. 중합 개시제 용액의 적하가 종료된 후, 4시간 동안 70℃로 유지하고, 그 후 실온까지 냉각시켜 중량 평균 분자량(Mw)은 9.1×103, 분자량 분포가 2.16, 고형분 34.8%, 고형분 환산의 산가는 81 mg-KOH/g인 수지 B1 용액을 얻었다. 수지 B1은 하기에 나타내는 구조 단위를 갖는다.Meanwhile, a solution in which 30 parts of the polymerization initiator 2,2'-azobis (2,4-dimethylvaleronitrile) was dissolved in 225 parts of propylene glycol monomethyl ether acetate was added dropwise into the flask over 4 hours using another dropping funnel. . After the dropping of the polymerization initiator solution is completed, the temperature is maintained at 70 ° C. for 4 hours, and then cooled to room temperature, so that the weight average molecular weight (Mw) is 9.1 × 10 3 , molecular weight distribution is 2.16, solid content is 34.8%, acid in terms of solid content. A thin B1 solution of 81 mg-KOH / g was obtained. Resin B1 has a structural unit shown below.

Figure pat00027
Figure pat00027

합성예에서 얻어진 수지의 중량 평균 분자량(Mw) 및 수 평균 분자량(Mn)의 측정은, GPC법을 이용하여 이하의 조건으로 행하였다.The weight average molecular weight (Mw) and the number average molecular weight (Mn) of the resin obtained in the synthesis example were measured under the following conditions using the GPC method.

장치; K2479[(주)시마즈세이사쿠쇼 제조]Device; K2479 [manufactured by Shimadzu Seisakusho Co., Ltd.]

칼럼; SHIMADZU Shim-pack GPC-80Mcolumn; SHIMADZU Shim-pack GPC-80M

칼럼 온도; 40℃Column temperature; 40 ℃

용매; THF(테트라히드로푸란)menstruum; THF (tetrahydrofuran)

유속; 1.0 ㎖/minFlow rate; 1.0 ml / min

검출기; RIDetector; RI

교정용 표준 물질; TSK STANDARD POLYSTYRENE F-40, F-4, F-288, A-2500, A-500[도소(주) 제조]Standard materials for calibration; TSK STANDARD POLYSTYRENE F-40, F-4, F-288, A-2500, A-500 [manufactured by Tosoh Corporation]

상기에서 얻어진 폴리스티렌 환산의 중량 평균 분자량 및 수 평균 분자량의 비(Mw/Mn)를 분자량 분포로 하였다.The ratio (Mw / Mn) of the weight average molecular weight and number average molecular weight in terms of polystyrene obtained above was used as the molecular weight distribution.

<실시예 1><Example 1>

이하의 각 성분을 혼합함으로써 착색 감광성 수지 조성물을 조제하였다.A colored photosensitive resin composition was prepared by mixing each of the following components.

화합물(A): 화학식 (z-3)으로 표시되는 화합물 5.1부Compound (A): 5.1 parts of compound represented by formula (z-3)

안료: C.I. 피그먼트 레드 254 40.1부Pigment: C.I. Pigment Red 254 part 40.1

수지(B): 수지 B1 15.0부Resin (B): Resin B1 15.0 parts

광중합성 화합물(C): 디펜타에리스리톨헥사아크릴레이트[KAYARAD(등록상표) DPHA; 니혼카야쿠(주) 제조] 52.1부Photopolymerizable compound (C): dipentaerythritol hexaacrylate [KAYARAD (registered trademark) DPHA; Nihon Kayaku Co., Ltd.] 52.1 copies

광중합 개시제(D): 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온[이르가큐어(등록상표) 369; BASF사 제조] 2.0부Photopolymerization initiator (D): 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one [Irgacure® 369; BASF Corporation] 2.0 copies

광중합 개시제(D): 이르가큐어(등록상표) OXE01(BASF사 제조)Photopolymerization initiator (D): Irgacure (registered trademark) OXE01 (manufactured by BASF)

8.5부                                                        Section 8.5

광중합 개시 보조제(D1): 2,4-디에틸티오크산톤[KAYACURE(등록상표) DETX-S; 니혼카야쿠(주) 제조] 2.1부Photopolymerization initiation adjuvant (D1): 2,4-diethylthioxanthone [KAYACURE® DETX-S; Nihon Kayaku Co., Ltd.] 2.1 copies

용제(E): 프로필렌글리콜모노메틸에테르아세테이트 690.1부Solvent (E): 690.1 parts of propylene glycol monomethyl ether acetate

용제(E): 프로필렌글리콜모노메틸에테르 62.1부Solvent (E): 62.1 parts of propylene glycol monomethyl ether

<실시예 2><Example 2>

이하의 각 성분을 혼합함으로써 착색 감광성 수지 조성물을 조제하였다.A colored photosensitive resin composition was prepared by mixing each of the following components.

화합물(A): 화학식 (z-3)으로 표시되는 화합물 7.3부Compound (A): Compound 7.3 represented by formula (z-3)

수지(B): 수지 B1 12.0부Resin (B): Resin B1 12.0 parts

광중합성 화합물(C): 디펜타에리스리톨헥사아크릴레이트[KAYARAD(등록상표) DPHA; 니혼카야쿠(주) 제조] 52.1부Photopolymerizable compound (C): dipentaerythritol hexaacrylate [KAYARAD (registered trademark) DPHA; Nihon Kayaku Co., Ltd.] 52.1 copies

광중합 개시제(D): 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온[이르가큐어(등록상표) 369; BASF사 제조] 2.0부Photopolymerization initiator (D): 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one [Irgacure® 369; BASF Corporation] 2.0 copies

광중합 개시제(D): 이르가큐어(등록상표) OXE01(BASF사 제조)Photopolymerization initiator (D): Irgacure (registered trademark) OXE01 (manufactured by BASF)

8.5부                                                        Section 8.5

광중합 개시 보조제(D1): 2,4-디에틸티오크산톤[KAYACURE(등록상표) DETX-S; 니혼카야쿠(주) 제조] 2.1부Photopolymerization initiation adjuvant (D1): 2,4-diethylthioxanthone [KAYACURE® DETX-S; Nihon Kayaku Co., Ltd.] 2.1 copies

용제(E): 프로필렌글리콜모노메틸에테르아세테이트 895.1부Solvent (E): 895.1 parts of propylene glycol monomethyl ether acetate

용제(E): 프로필렌글리콜모노메틸에테르 73.2부Solvent (E): 73.2 parts of propylene glycol monomethyl ether

<비교예 1><Comparative Example 1>

이하의 각 성분을 혼합함으로써 착색 수지 조성물을 조제하였다.A colored resin composition was prepared by mixing the following components.

화합물(A): 화화식 (z-2)로 표시되는 화합물 10.3부Compound (A): Compound 10.3 parts represented by chemical formula (z-2)

안료: C.I. 피그먼트 레드 254 80.1부Pigment: C.I. Pigment Red 254 Part 80.1

수지(B): 수지 B1 31.1부Resin (B): Resin B1 31.1 parts

중합성 화합물(C): 디펜타에리스리톨헥사아크릴레이트[KAYARAD(등록상표) DPHA; 니혼카야쿠(주) 제조] 50.0부Polymerizable compound (C): dipentaerythritol hexaacrylate [KAYARAD (registered trademark) DPHA; Nihon Kayaku Co., Ltd.] 50.0 copies

광중합 개시제(D): 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온[이르가큐어(등록상표) 369; BASF사 제조] 11.4부Photopolymerization initiator (D): 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one [Irgacure® 369; BASF Corporation] 11.4 copies

중합 개시제(D): 이르가큐어(등록상표) OXE01(BASF사 제조)Polymerization initiator (D): Irgacure (registered trademark) OXE01 (manufactured by BASF)

8.5부                                                        Section 8.5

중합 개시 보조제(D1): 2,4-디에틸티오크산톤[KAYACURE(등록상표) DETX-S; 니혼카야쿠(주) 제조] 2.1부Polymerization initiation aid (D1): 2,4-diethylthioxanthone [KAYACURE® DETX-S; Nihon Kayaku Co., Ltd.] 2.1 copies

용제(E): 프로필렌글리콜모노메틸에테르아세테이트 1120.8부Solvent (E): 1120.8 parts of propylene glycol monomethyl ether acetate

용제(E): 프로필렌글리콜모노메틸에테르 12.5부Solvent (E): 12.5 parts of propylene glycol monomethyl ether

용제(E): 다이아세톤알코올 180.2부Solvent (E): 180.2 parts of diacetone alcohol

<시험예><Test Example>

[착색 패턴의 제작][Production of colored patterns]

1변이 2인치인 정사각형 유리 기판(이글 XG; 코닝사 제조) 상에, 실시예 1, 실시예 2 또는 비교예 1에서 얻어진 조성물을 스핀 코트법으로 도포한 후, 100℃에서 3분간 프리베이크하여 두께 2.5 ㎛의 조성물층을 형성하였다.After coating the composition obtained in Example 1, Example 2 or Comparative Example 1 on a square glass substrate (Egle XG; manufactured by Corning) having a side of 2 inches by spin coating, pre-baking at 100 ° C. for 3 minutes to obtain a thickness. A 2.5 µm composition layer was formed.

방냉 후, 패턴을 갖는 석영 유리제 포토마스크와 상기 조성물층과의 간격을 100 ㎛로 하여 노광기[TME-150RSK; 톱콘(주) 제조]를 이용하여, 대기 분위기 하, 150 mJ/㎠의 노광량(365 ㎚ 기준)으로 광조사하였다.After cooling, the distance between the photomask made of quartz glass having a pattern and the composition layer was set to 100 µm [TME-150RSK; Topcon Co., Ltd.], and irradiated with light at an exposure amount of 150 mJ / cm 2 (based on 365 nm) in an atmospheric atmosphere.

포토마스크로는, 100 ㎛ 라인 앤드 스페이스 패턴이 형성된 마스크를 사용하였다. 광조사 후, 얻어진 도포막을, 비이온계 계면활성제 0.12%와 탄산나트륨 2%를 포함하는 수계 현상액(알칼리 수계 현상액)에, 23℃에서 80초간, 침지시킴으로써 현상하고, 수세 후, 오븐 안에서 230℃로 20분간 포스트베이크를 행하여 착색 패턴을 얻었다.As a photomask, a mask having a 100 µm line and space pattern was used. After light irradiation, the obtained coating film was developed by immersing it in an aqueous developing solution (alkali aqueous developing solution) containing 0.12% of nonionic surfactant and 2% of sodium carbonate at 23 ° C for 80 seconds, and after washing with water to 230 ° C in an oven. Post-baking was performed for 20 minutes to obtain a colored pattern.

[내열성 평가][Heat resistance evaluation]

1변이 2인치인 정사각형 유리 기판(이글 XG; 코닝사 제조) 상에, 실시예 1, 실시예 2 또는 비교예 1에서 얻어진 조성물을 스핀 코트법으로 도포함으로써, 두께 2.5 ㎛의 도포층을 형성하였다. 또한, 상기 도포막을 230℃에서 20분간 가열하고, 도포막의 가열 전후의 색차(ΔEab*)를 측색기(OSP-SP-200; OLYMPUS사 제조)를 이용하여 측정하였다.A coating layer having a thickness of 2.5 µm was formed by applying a composition obtained in Example 1, Example 2 or Comparative Example 1 on a square glass substrate (Egle XG; manufactured by Corning) having a side of 2 inches by spin coating. Further, the coating film was heated at 230 ° C for 20 minutes, and the color difference (ΔEab *) before and after heating of the coating film was measured using a colorimeter (OSP-SP-200; manufactured by OLYMPUS).

실시예 1 및 실시예 2의 조성물에 의해 얻어진 도포막에 대해서, 내열성 평가를 실시한 결과, 색차(ΔEab*)는 각각 4.2 및 4.8이었다.When the coating films obtained by the compositions of Examples 1 and 2 were evaluated for heat resistance, the color difference (ΔEab *) was 4.2 and 4.8, respectively.

비교예 1의 조성물로부터 얻어진 도포막에 대해서 동일하게 내열성 평가를 실시한 결과, 색차(ΔEab*)는 5.1이며, 본원 착색 감광성 수지 조성물이 내열성이 우수하다는 것을 알 수 있었다.When the heat resistance evaluation was similarly performed on the coating film obtained from the composition of Comparative Example 1, it was found that the color difference (ΔEab *) was 5.1, and the colored photosensitive resin composition of the present application was excellent in heat resistance.

본 발명의 착색 경화성 수지 조성물을 이용하면, 내열성이 우수한 컬러 필터를 제공할 수 있다. 상기 컬러 필터는, 표시 장치(액정 표시 장치, 유기 EL 장치, 전자 페이퍼 등) 및 고체 촬상 소자에 이용되는 컬러 필터로서 유용하다.When the colored curable resin composition of the present invention is used, a color filter excellent in heat resistance can be provided. The color filter is useful as a color filter used in display devices (liquid crystal display devices, organic EL devices, electronic paper, etc.) and solid-state imaging devices.

Claims (9)

화학식 (I)로 표시되는 화합물을 포함하는 착색제(A),
수지(B),
광중합성 화합물(C) 및
광중합 개시제(D)를 포함하고,
상기 수지(B)는 알칼리 가용성 수지인 착색 경화성 수지 조성물:
Figure pat00028

[상기 화학식 (I)에서, X-는, 염료에서 유래되는 음이온을 나타내고, Y+는 화학식 (Y)로 표시되는 화합물에서 유래되는 양이온을 나타낸다:
Figure pat00029

(상기 화학식 (Y)에서, n은 1∼8의 정수를 나타내고, R40은 탄소수 1∼4의 알킬기를 나타낸다.)]
Coloring agent (A) comprising a compound represented by formula (I),
Resin (B),
Photopolymerizable compound (C) and
It includes a photopolymerization initiator (D),
The resin (B) is an alkali-soluble resin colored curable resin composition:
Figure pat00028

[In the formula (I), X represents an anion derived from a dye, and Y + represents a cation derived from a compound represented by the formula (Y):
Figure pat00029

(In the formula (Y), n represents an integer of 1 to 8, and R 40 represents an alkyl group having 1 to 4 carbon atoms.)]
제1항에 있어서, 염료에서 유래되는 음이온은, 함금 아조 염료 또는 트리아릴메탄 염료에서 유래되는 음이온인 착색 경화성 수지 조성물.The colored curable resin composition according to claim 1, wherein the anion derived from the dye is an anion derived from an alloy azo dye or a triarylmethane dye. 제1항 또는 제2항에 있어서, 염료에서 유래되는 음이온은, 함금 아조 염료에서 유래되는 음이온인 착색 경화성 수지 조성물.The colored curable resin composition according to claim 1 or 2, wherein the anion derived from the dye is an anion derived from the alloy azo dye. 제2항에 있어서, 함금 아조 염료에서 유래되는 음이온은, 화학식 (A0)으로 표시되는 착색 경화성 수지 조성물.
Figure pat00030

[상기 화학식 (A0)에서, R1∼R18은 각각 독립적으로 수소 원자, 할로겐 원자, 탄소수 1∼10의 1가의 알킬기, 니트로기 또는 -SO2R29를 나타낸다.
R29는 -OH, -NHR30 또는 -R32를 나타낸다.
R30은 수소 원자, 탄소수 1∼10의 1가의 알킬기, 탄소수 1∼4의 알킬기로 치환되어 있어도 좋은 시클로헥실기, -R31-O-R33, -R34-CO-O-R35, -R36-O-CO-R37, 또는 탄소수 7∼10의 아랄킬기를 나타낸다.
R31, R34 및 R36은 각각 독립적으로 탄소수 1∼8의 2가의 알칸디일기를 나타낸다.
R32, R33, R35 및 R37은 각각 독립적으로 탄소수 1∼8의 1가의 알킬기를 나타낸다.
R19 및 R20은 각각 독립적으로 수소 원자, 메틸기, 에틸기 또는 아미노기를 나타낸다.
M1은 Cr 또는 Co를 나타낸다.]
The colored curable resin composition according to claim 2, wherein the anion derived from the alloy azo dye is represented by the formula (A0).
Figure pat00030

[In the formula (A0), R 1 to R 18 each independently represent a hydrogen atom, a halogen atom, a monovalent alkyl group having 1 to 10 carbon atoms, a nitro group, or -SO 2 R 29 .
R 29 represents -OH, -NHR 30 or -R 32 .
R 30 is a hydrogen atom, a monovalent alkyl group having 1 to 10 carbon atoms, a cyclohexyl group which may be substituted with an alkyl group having 1 to 4 carbon atoms, -R 31 -OR 33 , -R 34 -CO-OR 35 , -R 36- O-CO-R 37 or an aralkyl group having 7 to 10 carbon atoms.
R 31 , R 34 and R 36 each independently represent a divalent alkanediyl group having 1 to 8 carbon atoms.
R 32 , R 33 , R 35 and R 37 each independently represent a monovalent alkyl group having 1 to 8 carbon atoms.
R 19 and R 20 each independently represent a hydrogen atom, a methyl group, an ethyl group, or an amino group.
M 1 represents Cr or Co.]
제1항 또는 제2항에 있어서, 착색제(A)는 안료를 더 포함하는 착색 경화성 수지 조성물.The colored curable resin composition according to claim 1 or 2, wherein the colorant (A) further comprises a pigment. 제1항 또는 제2항에 있어서, 상기 수지(B)의 산가는 50~150 mg-KOH/g인 착색 경화성 수지 조성물.The colored curable resin composition according to claim 1 or 2, wherein the resin (B) has an acid value of 50 to 150 mg-KOH / g. 제1항 또는 제2항에 있어서, 상기 착색 경화성 수지 조성물은 포토리소그라프법을 이용한 패턴 제조용인 착색 경화성 수지 조성물.The colored curable resin composition according to claim 1 or 2, wherein the colored curable resin composition is for pattern production using a photolithography method. 제1항 또는 제2항에 기재된 착색 경화성 수지 조성물에 의해 형성되는 컬러 필터.A color filter formed by the colored curable resin composition according to claim 1 or 2. 제8항에 기재된 컬러 필터를 포함하는 표시 장치.A display device comprising the color filter according to claim 8.
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