KR20200007531A - Processing method of polarizing plate - Google Patents

Abstract

The present invention relates to a processing method of a polarizing plate which can efficiently suppress the separation of a functional layer and a polarizer protective film at the time of removing a surface protection film by adjusting a laser irradiation direction and the laser spot size. The processing method of a polarizing plate comprises the steps of: preparing a polarizing plate; providing a surface protection film; and cutting the polarizing plate.

Description

Processing method of polarizing plate {PROCESSING METHOD OF POLARIZING PLATE}

The present invention relates to a processing method of a polarizing plate using a laser.

Polarizer is an optical module widely used in display units such as LCD, Liquid Crystal Display (OLED), Organic Light Emitting Diodes (OLED), Plasma Display Panel (PDP), Electrophoretic Display (EPD), etc. to be. As the application of such a display unit becomes common, the demand for polarizers having improved performance is increasing.

Such a polarizing plate generally includes a polarizer and a polarizer protective film for protecting the polarizer. In addition, the polarizer protective film is provided with a functional layer, thereby producing a polarizing plate with improved performance. In the process of distributing such a polarizing plate, in order to prevent the polarizing plate from being contaminated or the polarizing plate is damaged, the surface protective film may be attached to the functional layer in the manufacturing process of the polarizing plate. In order to cut such a polarizing plate to a product size, a knife cutting or a laser cutting is used.

However, when cutting the polarizing plate using a laser cutting, in the process of removing the surface protection film in order to use the polarizing plate, there was a problem that the functional layer and the polarizer protective film is peeled off.

Thus, even when the surface protective film is removed, a situation in which a technology capable of cutting the polarizing plate is required so that the functional layer and the polarizer protective film do not peel from each other.

The present invention is to provide a method of processing a polarizing plate that can suppress the peeling of the functional layer of the polarizing plate and the polarizer protective film to each other even when removing the surface protective film.

However, the problem to be solved by the present invention is not limited to the above-mentioned problem, another task that is not mentioned will be clearly understood by those skilled in the art from the following description.

One embodiment of the present invention, the polarizer; A polarizer protective film provided on one surface of the polarizer; Preparing a polarizing plate including a functional layer provided on one surface of the polarizer protective film; Providing a surface protection film on one surface of the functional layer; And cutting the polarizing plate by irradiating a laser having a spot size of 40 μm or less from the polarizer toward the surface protective film, and including the outermost point of the cutting surface of the polarizer protective film and the cutting surface of the functional layer. Provided is a method of processing a polarizing plate having a minimum distance between outer points of less than 3 μm.

The processing method of the polarizing plate according to the exemplary embodiment of the present invention can effectively suppress the peeling of the polarizer protective film and the functional layer when the surface protective film is removed.

The effects of the present invention are not limited to the above-described effects, and effects that are not mentioned will be clearly understood by those skilled in the art from the present specification and the accompanying drawings.

1A and 1B schematically illustrate a polarizing plate according to an exemplary embodiment of the present invention.
2 is a diagram schematically illustrating processing a polarizer by using a laser according to an exemplary embodiment of the present invention.
Figure 3 schematically shows a cross section of the processed polarizing plate according to an embodiment of the present invention.
4A is a photograph of the polarizing plates cut in Examples 1 and 2, and FIG. 4B is a photograph of the polarizing plates cut in Comparative Examples 1 to 4. FIG.

Throughout this specification, when a part is said to "include" a certain component, it means that it may further include other components, except to exclude other components unless specifically stated otherwise.

Throughout this specification, when a member is located "on" another member, this includes not only when one member is in contact with another member but also when another member exists between the two members.

As used throughout this specification, the term "step of" or "step of" as used does not mean "step for".

Throughout this specification, the scanning speed of the laser means the speed at which the light source of the laser moves from one point of the member surface to which the laser is irradiated to another point.

Throughout this specification, the spot size of the laser means the distance from one end to the other end of the region to which the laser is irradiated.

Throughout this specification, the pulse repetition rate of a laser means the oscillation per second of the laser.

In the present specification, the MD direction refers to a moving direction of the polarizing plate, that is, a machine direction (MD) in the process of processing the polarizing plate.

Hereinafter, this specification is demonstrated in detail.

One embodiment of the present invention, the polarizer; A polarizer protective film provided on one surface of the polarizer; Preparing a polarizing plate including a functional layer provided on one surface of the polarizer protective film; Providing a surface protection film on one surface of the functional layer; And cutting the polarizing plate by irradiating a laser having a spot size of 40 μm or less from the polarizer toward the surface protective film, and including the outermost point of the cutting surface of the polarizer protective film and the cutting surface of the functional layer. Provided is a method of processing a polarizing plate having a minimum distance between outer points of less than 3 μm.

The processing method of the polarizing plate according to the exemplary embodiment of the present invention can effectively suppress the peeling of the polarizer protective film and the functional layer when the surface protective film is removed.

1A and 1B schematically illustrate a polarizing plate according to an exemplary embodiment of the present invention. 1A and 1B, the adhesive member is omitted. Referring to FIG. 1A, the polarizer protective film 120 and the functional layer 130 may be sequentially provided on one surface of the polarizer 110, and the surface protective film 200 may be provided on the functional layer 130. Can be. In addition, referring to FIG. 1B, the polarizer protective film 120, the functional layer 130, and the surface protective film 200 may be sequentially provided on one surface of the polarizer 110, and on the other surface of the polarizer 110. Additional polarizer protective film 120 ', the pressure-sensitive adhesive layer 140 and the release film 300 may be provided in sequence.

According to one embodiment of the present invention, the polarizer may be used without limitation the polarizer used in the art. For example, the polarizer may be formed by doping and absorbing dye molecules in a polyvinyl alcohol (PVA) thin film or a liquid crystal material of a dichroic dye adsorbed and oriented. Polyvinyl alcohol may also be formed by saponification poly vinyl acetate. For example, the polyvinyl acetate can be a homopolymer of vinyl acetate or a copolymer of vinyl acetate and other monomers. The other monomer may be unsaturated carboxylic acid, olefin, unsaturated sulfonic acid or vinyl ether.

In addition, the polarizer may be prepared by a method of manufacturing a polarizer generally in the art. For example, a polyvinyl alcohol film can be dyed, crosslinked, stretched, washed, complementary, and dried to produce a polarizer.

According to one embodiment of the present invention, the polarizer protective film is a film for protecting the polarizer, it may be used a polarizer protective film generally used in the art. For example, as the polarizer protective film, a polyethylene terephthalate film, a polyethylene m-phthalate film, a polycarbonate film, a polyimide film, an acrylic film, or a triacetyl cellulose (TAC) system A film etc. can be used. In addition, as the polarizer protective film, a relatively high absorption rate for laser light can be used. For example, as the polarizer protective film, a light absorption rate of more than 2% may be used for a laser having a wavelength of 9.4 μm.

According to one embodiment of the present invention, the polarizer protective film may be provided on one surface of the polarizer through an adhesive member such as an adhesive or an adhesive film. As the adhesive or the adhesive film, those used when manufacturing the polarizer in the art can be used without limitation. For example, as an adhesive or an adhesive film, what contains polymers, such as an acrylic acid type, a rubber type, an amine ester type, a polysiloxane type, a polyvinyl ether type, etc. can be used.

According to an exemplary embodiment of the present invention, the functional layer may be provided on one surface of the polarizer protective film. The functional layer may be provided to improve the performance of the polarizer. In addition, the functional layer may include at least one of an anti-glare layer, a low reflection layer, and a high hardness layer. Specifically, the anti-glare layer may include an anti-glare (AG) layer or a semi-glare (SG) layer used in the art. In addition, the low reflection layer may include an anti reflection (AR) layer or a low reflection (LR) layer used in the art. In addition, the functional layer may be coated on one surface of the polarizer protective film, or the functional layer may be attached using an adhesive or an adhesive film. The above-mentioned thing can be used as an adhesive agent or an adhesive film.

According to one embodiment of the present invention, a surface protection film may be provided on one surface of the functional layer of the polarizing plate. The surface protection film may be to protect the polarizing plate during the production, distribution, storage of the polarizing plate, may be removed when using the polarizing plate.

In addition, the surface protection film is a polyester resin such as polyethylene terephthalate, polyethylene naphthalate, olefin resin, cellulose acetate resin, polycarbonate It may include at least one of the resin, acrylic resin, cycloolefin (cycloolefin) resin. However, the type of the surface protection film is not limited. The surface protective film may be provided on one surface of the functional layer through an adhesive member such as an adhesive or an adhesive film.

Adhesive film for providing the surface protection film on one surface of the functional layer is polyethylene, ethylene vinyl acetate copolymer, polypropylene, polystyrene, methacryl resin, polyvinyl chloride, polyethylene terephthalate, polybutylene terephthalate, cellulose Acetate, diallyl phthalate resin, urea resin, melamine resin, unsaturated polyester, polyvinyl butyral, polyvinyl formal, polyvinyl alcohol, vinyl acetate resin, ionomer, polymethylpentene, vinylidene chloride, polysulfone, polyfluorinated And at least one of vinylidene, methacryl-styrene copolymer resin, polyarylate, polyallyl sulfone, polybutadiene, polyethersulfone, and polyetheretherketone. In addition, the adhesive may include PSA (Presure Sensitive Adhesive), OCA (Optically Clear Adhesive), Liquid Optically Clear Adhesive (LOCA), or OCR (Optically Clear Resin). However, it does not limit the kind of adhesive film and adhesive.

According to an exemplary embodiment of the present invention, the polarizing plate may further include an additional polarizer protective film provided on the other surface of the polarizer, and an adhesive layer provided on one surface of the additional polarizer protective film. The additional polarizer protective film provided on the other surface of the polarizer may be the same kind or different type as the polarizer protective film provided on one surface of the polarizer.

In addition, an adhesive layer may be provided on one surface of the additional polarizer protective film, and the polarizing plate may be attached to the final product through the adhesive layer. The pressure-sensitive adhesive layer may include an adhesive or an adhesive film used in the art. For example, as the pressure-sensitive adhesive or pressure-sensitive adhesive film, the pressure-sensitive adhesive or pressure-sensitive adhesive film used to provide the surface protection film on the functional layer may be used.

In addition, the polarizing plate may further include a release film provided on one surface of the pressure-sensitive adhesive layer. The release film may be to protect the pressure-sensitive adhesive layer until the polarizing plate is attached to the final product, it may be removed to attach the polarizing plate to the final product.

Hereinafter, as shown in FIG. 1B, the polarizer protective film 120, the functional layer 130, and the surface protective film 200 are sequentially provided on one surface of the polarizer 110, and are further added on the other surface of the polarizer 110. The polarizer protective film 120 ', the pressure-sensitive adhesive layer 140 and the release film 300 will be described with respect to the polarizer sequentially provided.

2 is a diagram schematically illustrating processing a polarizer by using a laser according to an exemplary embodiment of the present invention. Specifically, FIG. 2 is a view illustrating cutting a polarizing plate by irradiating a laser toward the surface protection film 200 from the polarizer 110.

According to the exemplary embodiment of the present invention, the polarizer may be cut by irradiating a laser having a spot size of 40 μm or less from the polarizer toward the surface protective film. By setting the irradiation direction of the laser for cutting the polarizing plate from the polarizer to the surface protective film direction, the polarizing plate can be cut effectively.

Further, the spot size of the laser can be adjusted to 20 µm or more and 40 µm or less, 20 µm or more and 35 µm or less, 30 µm or more and 40 µm or less, or 30 µm or more and 35 µm or less. By adjusting the spot size of the laser in the above-described range, it is possible to effectively suppress the peeling of the functional layer and the polarizer protective film when the surface protective film is removed from the polarizing plate.

Specifically, when the spot size of the laser is within the above range, the minimum distance between the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface may be adjusted to less than 3 ㎛. By adjusting the minimum distance between the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface to less than 3 ㎛, the functional layer and the polarizer protective film is peeled off when the surface protective film is removed from the polarizing plate Can be suppressed effectively. More specifically, when the minimum distance between the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface is less than 3 μm, a force applied when the surface protective film is removed is transferred to the functional layer. Can be suppressed.

In the present specification, the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface may be set based on a direction parallel to one surface of the polarizer. That is, based on a direction parallel to one surface of the polarizer, the minimum distance between the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface may be adjusted to less than 3 ㎛.

Also, in the present specification, the minimum distance between the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface passes through the outermost point of the polarizer protective film cutting surface and is perpendicular to one surface of the polarizer. It may mean a minimum distance between the virtual line extending to the virtual line extending in the direction perpendicular to one surface of the polarizer passing through the outermost point of the functional layer cutting surface.

Figure 3 schematically shows a cross section of the processed polarizing plate according to an embodiment of the present invention. In FIG. 3, the surface protection film is omitted for convenience of description. Specifically, FIG. 3 illustrates the outermost point P1 of the cutting surface of the polarizer protective film 120 and the outermost point of the functional layer 200 based on the direction L parallel to one surface of the polarizer 110. (P2) is shown. 3 is a imaginary line L1 passing through the outermost point P1 of the cutting surface of the polarizer protective film 120 and extending in a direction perpendicular to one surface direction L of the polarizer 110 and a functional layer. The minimum distance d between the imaginary lines L2 passing through the outermost point P2 of the cutting surface and extending in a direction perpendicular to the one surface direction L of the polarizer 110 is shown.

According to an exemplary embodiment of the present invention, the interfacial adhesion between the polarizer protective film and the functional layer may be 4B or higher in ASTM D3359 standard. Specifically, the interfacial adhesion between the polarizer protective film and the functional layer may be 5B according to ASTM D3359 standard. The interfacial adhesion between the polarizer protective film and the functional layer may be measured according to the ASTM D3359 standard. Specifically, a sample having a functional layer adhered to one surface of the polarizer protective film is prepared, and the functional layer of the sample is 1 mm. 10 squares and 10 squares are cut at intervals of 3 to 3 mm to form a total of 100 regions. Thereafter, the functional layer is peeled off with a Nichiban tape, and the number of peeled regions is measured from a total of 100 regions of the functional layer. Of the total 100 areas, when the peeled area is 1 or less, it is evaluated as 5B. When the peeled areas are 2 or more and 5 or less, it is evaluated as 4B. When the peeled areas are 6 or more and 15 or less, 3B. If the peeled areas are 16 or more and 35 or less, it is evaluated as 2B, and when the peeled areas are 36 or more and 50 or less, it is evaluated as 1B, and when the peeled areas are more than 50, 0B Evaluate as

According to an exemplary embodiment of the present invention, even when the interfacial adhesion between the polarizer protective film and the functional layer is within the above range, by cutting the polarizing plate according to the processing method of the polarizing plate, when removing the surface protective film from the polarizing plate The peeling off of the functional layer and the polarizer protective film can be effectively suppressed.

According to an exemplary embodiment of the present invention, the polarizing plate may be cut by adjusting the focus of the laser to the functional layer. Specifically, the focus of the laser may be aligned with one surface of the functional layer provided with the surface protection film. The cutting quality of the polarizing plate may be improved by cutting the polarizing plate by adjusting the focus of the laser to one surface of the functional layer.

According to an exemplary embodiment of the present invention, the power density of the laser is 1 MW / cm ² More than 5 MW / cm ² May be less than. Specifically, the power density of the laser may mean the maximum power density, the power density of the laser is 1.5 MW / cm ² More than 4.5 MW / cm ² 2 MW / cm ² or less More than 3.5 MW / cm ² 1 MW / cm ² or less More than 4 MW / cm ² 2.5 MW / cm ² or less 4 MW / cm ² or more, or 2.9 MW / cm ² or more More than 4.1 MW / cm ² It may be By adjusting the output density of the laser in the above-described range, energy can be stably transmitted to the polarizing plate, thereby improving the cutting quality of the polarizing plate.

According to an exemplary embodiment of the present invention, the pulse repetition rate of the laser may be 10 kHz or more and 100 kHz or less. Specifically, the pulse repetition rate of the laser is 20 kHz or more and 85 kHz or less, 35 kHz or more and 65 kHz or less, 40 kHz or more and 55 kHz or less, 45 kHz or more and 70 kHz or less, 15 kHz or more and 80 kHz or less, or 20 kHz or more and 40 kHz or less. The following can be adjusted. By adjusting the pulse repetition rate of the laser in the above-described range, it is possible to suppress that the overlapping degree of the focused laser beam is lowered and the laser cutting process efficiency is lowered. In addition, when the pulse repetition rate of the laser is in the above-described range, it is possible to prevent the polarizer from deteriorating due to excessive energy irradiation.

According to an exemplary embodiment of the present invention, the laser may be irradiated at a scan speed of 100 mm / sec or more and 1000 mm / sec or less. Specifically, the scan speed of the laser is 200 mm / sec or more and 900 mm / sec or less, 400 mm / sec or more and 600 mm / sec or less, 300 mm / sec or more and 800 mm / sec or less, or 500 mm / sec or more and 700 mm You can adjust it to less than / sec. By adjusting the scan speed of the laser in the above-described range, it is possible to effectively improve the cutting efficiency of the polarizing plate.

According to an exemplary embodiment of the present invention, the processing method of the polarizing plate may irradiate the laser along the MD direction of the polarizing plate. By irradiating the said laser along the MD direction of the said polarizing plate, the cutting quality of the said polarizing plate can be improved, and the efficiency of a laser cutting process can be improved. The MD direction of the polarizer may be a stretching direction of the polarizer.

Hereinafter, the present invention will be described in detail with reference to Examples. However, embodiments according to the present invention can be modified in many different forms, the scope of the invention is not to be construed as limited to the embodiments described below. The embodiments of the present specification are provided to more completely explain the present invention to those skilled in the art.

Preparation of AG Coating Liquid-Composition for Forming Functional Layer

16 g pentaerythritol triacrylate (PETA, SK Entis), 6 g photocurable urethane acrylate polymer (8BR-500, Taisei Fine Chemical) with a weight average molecular weight of about 200,000 g / mol, toluene diisocyanate and pentaerythritol triacryl 3g urethane acrylate (UA-306T, Kyoeisha), photoinitiator Irgacure 184 (Ciba) 0.75g, Irgacure 1173 (Ciba) 0.75g, leveling agent T270 (Tego 270) 0.1g, ethyl alcohol 25g , 25 g of isopropyl alcohol, 25 g of 2-butyl alcohol, XX-113BQ (refractive index 1.555, average particle diameter 2um, Sekisui Plastic Co., Ltd.) 1.25g, copolymer of polystyrene-polymethylmethacrylate, nanoparticle having an average particle diameter of 10 nm to 15 nm As a solution in which silica particles were dispersed in methyl alcohol, 0.2 g of MA-ST (Nissan Chemical Co., Ltd.) having a solid content of about 30% was mixed to prepare an AG coating solution.

Preparation of Polarizer

A polyvinyl alcohol (PVA) film having a thickness of 25 μm was prepared as a polarizer, and a PET film (TA044, Totyobo) having a thickness of 80 μm was prepared as a polarizer protective film and an additional polarizer protective film. A UV curable adhesive was applied to one surface of the polarizer to a thickness of about 1.5 μm, the polarizer protective film was squeezed onto the adhesive through a lamination process, and UV was irradiated to attach the polarizer protective film. In addition, the AG coating solution prepared on the polarizer protective film was applied, dried at 60 ° C. for 2 minutes to remove the solvent, and then irradiated with UV of about 200 mJ / cm ² using a high pressure mercury lamp at an oxygen concentration of 500 ppm or less. , An AG functional layer having a thickness of about 4 μm.

The interfacial adhesion between the polarizer protective film and the AG functional layer was measured according to the ASTM D3359 standard. Specifically, the surface of the AG functional layer formed on the polarizer protective film was cut in 10 squares and 10 squares at intervals of about 2 mm to form a total of 100 regions. Thereafter, the functional layer was peeled off with a Nichiban tape, and the number of peeled regions was measured among the total 100 regions of the functional layer, and as a result, one region was peeled off. That is, the interfacial adhesion between the polarizer protective film and the AG functional layer was 5B according to ASTM D3359.

Thereafter, a polyethylene terephthalate film was attached to the AG functional layer by a lamination process with a surface protective film using an adhesive film.

Thereafter, the UV curable adhesive was applied to the other surface of the polarizer not provided with the polarizer protective film at a thickness of about 2 μm, an additional polarizer protective film was laminated on the adhesive, and UV was irradiated to attach the polarizer protective film. In addition, in order to form an adhesive layer on the surface of the additional polarizer protective film, an adhesive film having a PSA adhesive layer having a thickness of about 20 μm was formed on a release film by a lamination process to prepare a polarizing plate.

Example  One

As shown in FIG. 2, the polarizer was cut by irradiating a laser toward the surface protective film from the polarizer. At this time, E400i (Coherent Co., Ltd.) was used as a laser irradiation device, the wavelength was 9.4 μm, the laser power density was 4 MW / cm ² , the laser pulse repetition rate was 20 kHZ, the laser scanning speed was 500 mm / sec, and the laser spot. The size was set to 34 μm. Then, the cross section of the polarizing plate was observed with a scanning electron microscope (SU8020, HITACHI Co., Ltd.), and the minimum distance between the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface was measured. The minimum distance measured was 2.5 μm.

Example  2

The polarizing plate was cut in the same manner as in Example 1, except that the output density of the laser and the spot size of the laser were set as shown in Table 1 below. Then, in the same manner as in Example 1, the minimum distance between the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface was measured. The minimum distances measured are shown in Table 1 below.

Comparative example  1 to Comparative example  4

The polarizing plate was cut in the same manner as in Example 1, except that the output density of the laser and the spot size of the laser were set as shown in Table 1 below. Then, in the same manner as in Example 1, the minimum distance between the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface was measured. The minimum distances measured are shown in Table 1 below.

Peel test

The polarizing plates cut out in Example 1, Example 2, and Comparative Examples 1-4 were prepared, and the surface protection film was removed from the polarizing plate. Then, when the surface protection film was removed and the tape (Nichibang Co., Ltd.) was attached to the exposed AG functional layer, and the tape was removed by applying a force in the direction of 180 degrees to the surface of the AG functional layer, the AG functional layer protected the polarizer. It was checked whether it peeled from the film. The results are shown in Table 1 below.

laser
Spot size
(Μm) laser
Power density
(MW / cm ² ) Distance d
(Μm) Peel off Example 1 34 4 2.5 x Example 2 34 3 1.6 x Comparative Example 1 34 5 4.6 o Comparative Example 2 34 7.4 7.6 o Comparative Example 3 200 8 12.3 o Comparative Example 4 400 8 28.1 o

4A is a photograph of the polarizing plates cut in Examples 1 and 2, and FIG. 4B is a photograph of the polarizing plates cut in Comparative Examples 1 to 4. FIG. Specifically, FIG. 4A illustrates the polarizing plate taken from the upper side of the AG functional layer after removing the surface protection film from the polarizing plates cut in Examples 1 and 2, and FIG. 4B is cut out in Comparative Examples 1 to 4. After removing the surface protection film from the polarizing plate, the polarizing plate was taken on the AG functional layer. 4A and 4B, d is a minimum distance between the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface.

Referring to Tables 1, 4A, and 4B, Examples 1 and 2 in which the spot size of the laser is adjusted to 40 μm or less are the outermost points of the polarizer protective film cutting surface and the outermost points of the functional layer cutting surface. The minimum distance d between the points was less than 3 μm, and the peel test results confirmed that the AG functional layer did not peel off from the polarizer protective film. That is, in Example 1 and Example 2, when peeling the surface protection film from the functional layer of the polarizing plate, it can be seen that the peeling does not occur between the polarizer protective film and the functional layer.

On the other hand, even when the spot size of the laser is less than 40 ㎛, Comparative Example 1 and Comparative Example 2, the output density of the laser is adjusted to 5 MW / cm ² or more are the outermost point of the cutting surface of the polarizer protective film and the functional layer cutting surface The minimum distance (d) between the outermost points of 3 m or more, according to the peel test results confirmed that the AG functional layer is peeled from the polarizer protective film. That is, in the case of Comparative Example 1 and Comparative Example 2, it can be seen that when peeling the surface protective film from the functional layer of the polarizing plate, peeling occurs between the polarizer protective film and the functional layer.

In addition, Comparative Examples 3 and 4 in which the spot size of the laser is adjusted to more than 40 μm, the minimum distance d between the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface is 3 μm or more. As a result of the peel test, it was confirmed that the AG functional layer was peeled from the polarizer protective film. That is, in the case of Comparative Example 3 and Comparative Example 4, it can be seen that when peeling the surface protective film from the functional layer of the polarizing plate, peeling occurs between the polarizer protective film and the functional layer.

In addition, referring to Examples 1 and 2, by adjusting the output density of the laser even in the same laser spot size, the minimum distance between the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface It was confirmed that (d) can be controlled.

Therefore, in the method of processing the polarizing plate according to the exemplary embodiment of the present invention, even when the surface protection film provided on the functional layer is removed, the functional layer of the polarizing plate and the polarizer protective film can be effectively suppressed from peeling from each other.

100: polarizer
110: polarizer
120: polarizer protective film
120 ': additional polarizer protective film
130: functional layer
140: adhesive layer
200: surface protective film
300: release film

Claims (7)

Polarizer; A polarizer protective film provided on one surface of the polarizer; Preparing a polarizing plate including a functional layer provided on one surface of the polarizer protective film;
Providing a surface protection film on one surface of the functional layer; And
And irradiating a laser having a spot size of 40 μm or less from the polarizer toward the surface protective film to cut the polarizing plate.
And a minimum distance between the outermost point of the polarizer protective film cutting surface and the outermost point of the functional layer cutting surface is less than 3 μm.
The method according to claim 1,
The power density of the laser is 1 MW / cm ² More than 5 MW / cm ² Processing method of less than polarizing plate.
The method according to claim 1,
The pulse repetition rate of the laser is 10 kHz or more and 100 kHz or less.
The method according to claim 1,
The interfacial adhesion between the polarizer protective film and the functional layer is 4B or higher in ASTM D3359 standard.
The method according to claim 1,
The processing method of the polarizing plate which irradiates the said laser along MD direction of the said polarizing plate.
The method according to claim 1,
And the functional layer comprises at least one of an antiglare layer, a low reflection layer, and a high hardness layer.
The method according to claim 1,
The polarizing plate further comprises a polarizer protective film provided on the other surface of the polarizer, and the pressure-sensitive adhesive layer provided on one surface of the additional polarizer protective film.

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