KR20190117642A - Lighting apparatus and method, exposure apparatus and method, and device manufacturing method - Google Patents

Abstract

An illumination device for illuminating a mask, comprising: a light source for generating illumination light, a shift optical system for adjusting the maximum tilt angle of the illumination light, a light guide fiber for branching the illumination light through the shift optical system at a tilt angle, and an exit end of the light guide fiber An input lens having the illumination light emitted from the light beam as a parallel light flux, an aperture stop for adjusting the numerical aperture of the illumination light, and a condenser lens for guiding the illumination light with the numerical aperture adjusted to the mask. The utilization efficiency of illumination light can be made high according to illumination conditions.

Description

Lighting apparatus and method, exposure apparatus and method, and device manufacturing method

The present invention relates to an illumination technique for illuminating an object with illumination light, an exposure technique using an illumination technique, and a device manufacturing technique using an exposure technique.

Background Art Conventionally, a photolithography process for manufacturing electronic devices such as liquid crystal display elements, semiconductor elements, and thin film magnetic heads, in which a pattern of a mask illuminated by an illumination device is applied to a plate coated with a photoresist such as photoresist through a projection optical system. The exposure apparatus is used to transfer to the board | substrate.

Conventional lighting apparatus comprising an optical system composed of a plurality of conical or pyramidal optical members for controlling the cross-sectional shape of the luminous flux from a mercury lamp, and ring-shaped illumination In order to increase the utilization efficiency of the illumination light in the case of performing the above, an illumination device for controlling the cross-sectional shape of the illumination light beam using the optical system is used in accordance with the shape of the annular illumination light source (see Patent Document 1, for example).

In an exposure apparatus, illumination methods other than ring zone illumination are also used. Even in such a case, it is required to consider increasing the utilization efficiency of the illumination light.

Patent Document 1: US Patent No. 5,719,704

According to a first aspect, there is provided an illumination device for illuminating a mask, comprising: a light source for generating illumination light, an optical system for adjusting the inclination angle of the illumination light, a first condensing optical system for condensing the illumination light through the optical system, and an optical system An optical member which maintains the inclination angle of the illumination light and emits it to the first condensing optical system, an aperture stop for adjusting the numerical aperture of the illumination light emitted from the first condensing optical system, and the numerical aperture is adjusted There is provided an illuminating device including a second condensing optical system for guiding the illuminated illumination light to the mask.

According to a 2nd aspect, it is an exposure apparatus which exposes the pattern of a mask to a board | substrate, Comprising: The illuminating device of a 1st aspect, and the projection optical system which forms the image of the pattern of the mask illuminated by the said lighting device on a board | substrate. An exposure apparatus is provided.

According to a third aspect, there is provided an illumination method of illuminating a mask, comprising: adjusting an inclination angle of illumination light generated from a light source, emitting the illumination light whose adjusted inclination angle is adjusted through an optical member that maintains the inclination angle of the illumination light; And condensing the emitted illumination light, adjusting the numerical aperture of the illumination light, and guiding the illumination light whose numerical aperture is adjusted to the mask.

According to a fourth aspect, an exposure method for exposing a pattern of a mask to a substrate, comprising: illuminating the mask using the illumination method of the third aspect, and forming an image of the illuminated pattern of the mask on the substrate. An exposure method is provided.

1 is a perspective view showing a schematic configuration of an exposure apparatus according to an embodiment.
2 is a diagram illustrating a configuration of a lighting apparatus according to an embodiment.
3 is a diagram illustrating a configuration of a partial projection optical system and a stage system according to an embodiment.
4 is a flowchart showing an example of an illumination method and an exposure method.
FIG. 5: (A) is a figure which shows the principal part of the lighting apparatus when the sigma value of illumination light is large, (B) is the figure which shows the principal part of the illumination apparatus when the sigma value of illumination light is small.
FIG. 6A is a diagram showing a main part of the lighting apparatus of the comparative example, FIG. 6B is a diagram showing the light intensity distribution at the incidence end of the light guide fiber, and FIG. 6C is a fly-eye lens. It is a figure which shows the light intensity distribution in the incidence end of a lens.
FIG. 7A is a diagram illustrating a partial illumination optical system, and FIG. 7B is an enlarged view illustrating an exit end of the light guide fiber of FIG. 7A.
(A) is a figure which shows an example of the opening of an aperture stop at the time of circular illumination, (B) is a figure which shows an example of the opening of the aperture stop at the time of large (sigma) illumination, (C) is a small (Small) It is a figure which shows an example of the opening of an aperture stop at the time of (sigma) illumination.
9A and 9B are conceptual views showing an exit surface of a fly's eye lens.
Fig. 10A is a diagram showing an example of the configuration of a variable-optical system, (B) is a diagram illustrating an example of the configuration of a switchable optical system, and (C) is an optical member for controlling the inclination angle of the laser beam. It is a figure which shows an example.
11 is a flowchart showing an example of an electronic device manufacturing method.

An embodiment will be described with reference to FIGS. 1 to 9B. 1 is a perspective view illustrating an exposure apparatus EX according to the present embodiment. In this embodiment, the exposure apparatus EX synchronously moves the flat plate-like plate P as a substrate on which the mask M and the photosensitive agent are applied to the projection optical system PL having a plurality of reflection-reflection type partial projection optical systems. It demonstrates as an exposure apparatus of the step-and-scan system which transfers the image of the pattern formed in the mask M to plate P, on the other hand.

Hereinafter, in FIG. 1, the X-axis and the Y-axis are taken to be orthogonal in a plane parallel to the plate P, and the Z-axis is taken perpendicular to the plane (XY plane). As an example, the XY plane is set to a plane parallel to the horizontal plane, and the Z axis is set to be parallel to the vertical line. Moreover, in this embodiment, the scanning direction which is a direction which moves the mask M and the plate P synchronously is set to the direction parallel to an X axis (X direction). At this time, the non-scanning direction orthogonal to the scanning direction is a direction parallel to the Y axis (Y direction).

The exposure apparatus EX is an illumination apparatus ILA for illuminating a pattern surface (hereinafter also referred to as a mask surface) of the mask M supported by the mask stage MST (see FIG. 3) with illumination light having a uniform illuminance distribution. And a control unit 30 including a projection optical system PL and a computer for controlling the operation of the entire apparatus. The illuminating device ILA is a plurality of first regions (here, four) illumination regions 21a, 21c, 21e, 21g arranged along the Y direction (non-scanning direction) on the mask surface, and the illumination regions of the first row ( A plurality of illumination regions (not shown) in the second row located between the illumination regions 21a to 21g are illuminated in a state shifted from the scanning direction (X direction) with respect to 21a to 21g. . In this way, the illuminating device ILA illuminates seven illumination regions of the mask surface, but the arrangement and number of the illumination regions are arbitrary.

In this embodiment, since the visual field stop is arrange | positioned in the projection optical system PL as mentioned later, the illumination area | region 21a-21g should just be a shape slightly larger than the image in the mask surface of the visual field stop. The illuminating device ILA is equipped with three light sources 2a, 2b, and 2c which consist of an ultrahigh pressure mercury lamp, as shown in FIG. Illumination lights 3a, 3b, 3c emitted from the light sources 2a, 2b, 2c are condensed by ellipsoids 4a, 4b, 4c, respectively. The light sources 2a to 2c are arranged at the first focal positions of the ellipsoids 4a to 4c, and the light sources of the light sources 2a, 2b and 2c are located at the second focal positions of the ellipsoids 4a, 4b and 4c. (5a, 5b, 5c) are formed. In the period where the mask M is not illuminated, the illumination light 3a, 3b, 3c is shielded by a shutter (not shown) disposed near the second focal point of the ellipsoids 4a, 4b, 4c. In addition, the number of light sources 2a, 2b, and 2c may be arbitrary, and one light source (for example, only the light source 2a) may be sufficient.

Illumination lights 3a, 3b, 3c emitted as divergent light from light source images 5a, 5b, 5c are respectively incident ends 12a, 12b of light guide fiber 10 by variable optical systems 8a, 8b, 8c. , 12c). The shift optical systems 8a, 8b, and 8c respectively receive images 9a, 9b, and 9c having a variable magnification of the light source images 5a, 5b, and 5c (hereinafter, referred to as light source images). , 12b, 12c). The shift optical systems 8a to 8c are, for example, a front lens system 6 that is movable along the optical axis by the drive unit 6a, and a rear lens system that is movable along the optical axis by the drive unit 7a. It is a zoom lens (zoom optical system) which has (7). By controlling the positions of the front lens group 6 and the rear lens group 7 through the driving units 6a and 7a, the control unit 30 can control the magnification of the shifting optical systems 8a to 8c.

Here, the height (image height) of the light source image 9a when the shift optical system 8a is at the minimum magnification is y1, and the maximum with respect to the optical axis of the illumination light 3a forming the light source image 9a at this time. The inclination angle of is called α1. The height of the light source image 9a when the magnification of the variable magnification optical system 8a is the maximum magnification higher than the magnification is y2, and the maximum inclination angle with respect to the optical axis of the illumination light 3a at this time is referred to as α2. The maximum angle of inclination is also half of the so-called inclination. In addition, when the light intensity distribution of the light source image 9a is a normal distribution (Gauss distribution) shape, the height of the light source image 9a is 10%-50% of the light intensity in the light intensity distribution, for example. It can also be regarded as an interval between a position which becomes a degree or a position which becomes, for example, about 30%. If the variable displacement optical system 8a satisfies the sine condition, the following relationship is established.

y1 sin α1 = y2 sin α2. (One)

Here, since the height y2 is higher than the height y1, the inclination angle α2 becomes smaller than the inclination angle α1 from equation (1). The shift optical systems 8a to 8c are also optical systems capable of controlling or adjusting the maximum inclination angle of the illumination light incident on the incident ends 12a to 12c by forming the light source images 9a to 9c having a variable magnification. In the present embodiment, the shift optical systems 8a to 8c are controlled to have the same magnification.

The light guide fiber 10 as the light transmission member is a fiber bundle formed by randomly tying a plurality of optical fiber element wires 11 (see FIG. 5A), and includes three incidence ends 12a, 12b, and 12c. And a plurality of (in this case, seven) ejection stages (in this case, only the ejection stages 14a and 14B are shown in FIG. 2) corresponding to a plurality of (here seven) illumination regions, and the incidence stages 12a to 12c. ) And distributes the illumination light 3a to 3c received from the plurality of emission stages. As a result, at least a part of each of the illumination lights 3a to 3c is emitted from the plurality of exit stages, respectively, and the illumination device ILA mixes and emits the illumination light emitted from the plurality of light sources 2a to 2c, respectively. Can be. It is assumed here that the light guide fiber 10 is configured to distribute each of the illumination light received from the incidence ends 12a to 12c to the plurality of emission stages at approximately the same light quantity ratio and to emit the light.

The optical fiber element wires 11 emit and maintain the inclination angle of the incident light beam such that the maximum inclination angle of the incident light beam and the maximum inclination angle of the emitted light beam are substantially the same. For this reason, the largest inclination angle of the illumination light 3a-3c which injects into the incidence end 12a-12c of the light guide fiber 10, and the largest inclination angle of the illumination light emitted from the some exit end are substantially the same. As an example, the illumination light emitted from the shifting optical systems 8a to 8c is incident on the corresponding incidence ends 12a to 12c in a state in which the main rays are parallel to the optical axis, that is, in a so-called telecentric state. . Thereby, illumination light can be made to enter uniformly in the range of the incidence angle which the optical fiber element wire 11 of the light guide fiber 10 can transmit. In addition, the maximum inclination angle of the illumination light emitted from the shift optical systems 8a to 8c is controlled in a range smaller than the maximum incidence angle (inclined angle) that can be transmitted to the optical fiber element wire 11.

Each of the illumination light 20a, 20c, etc. emitted from the plurality of exit stages 14a, 14B, etc. of the light guide fiber 10 is a plurality of illuminating partial illumination areas 21a, 21c, etc. of the mask M, etc. (7 pieces here) are incident on the partial illumination optical systems IL1 to IL7 having the same configuration (however, the partial illumination optical systems IL2 and IL4 to IL7 are not shown). The partial illumination optical systems IL1-IL7 correspond to the partial projection optical systems PL1-PL7 mentioned later, respectively, and are arrange | positioned at the zigzag grid | lattice-shaped form along the non-scanning direction (Y direction) orthogonal to a scanning direction.

In the partial illumination optical systems IL1 and IL3, the illumination lights 20a and 20c emitted from the exit ends 14a and 14B of the light guide fiber 10 are condensed by the input lens 15 which is a collimating lens, respectively, and are parallel. After being converted to the light beam, it is incident on the fly's eye lens 16, which is an optical integrator. The illumination light 20a, 20c incident on the fly's eye lens 16 is divided into wavefronts by a plurality of lens elements constituting the fly's eye lens 16, and the rear focal plane near the exit surface (emission pupil plane of the illumination optical system). A secondary light source (surface light source) consisting of a plurality of light source images is formed in the image. The aperture stop 17 is disposed on the rear focal plane. The controller 30 controls the size and shape of the opening of the aperture stop 17 through the drive unit 17a. Thereby, the numerical aperture NA of the illumination light which illuminates the mask M with partial illumination optical systems IL1 and IL3 can be controlled. In the following description, the numerical aperture NA of the illumination light is represented by using a? Value (a value obtained by dividing the numerical aperture of the illumination light for illuminating the mask by the numerical aperture on the mask side of the projection optical system) which is a coherence factor. For this reason, the aperture stop 17 can also be called sigma stop. In addition, in the case of performing the annular illumination, the aperture stop 17 may be replaced with an aperture stop (not shown) for the annular illumination having an annular aperture variable size opening.

The illumination light 20a, 20c emitted from the opening of the aperture stop 17 illuminates the corresponding illumination area 21a, 21c on the mask M with a substantially uniform illuminance distribution via the condenser lens 18. In addition, the structure of partial illumination optical systems IL2 and IL4-IL7 which is not shown in figure is the same as partial illumination optical system IL1, and partial illumination optical systems IL2 and IL4-IL7 are also masked like the partial illumination optical system IL1. Each corresponding illumination region on M) is illuminated with an almost uniform illuminance distribution.

Illumination light from illumination areas 21a-21g on mask M corresponding to each of partial illumination optical systems IL1-IL7 is incident on partial projection optical systems PL1-PL7, respectively. 3 is a diagram illustrating a configuration of the partial projection optical system PL1. As shown in FIG. 3, the partial projection optical system PL1 includes a first reflection refractive optical system PL11 which forms an intermediate image of the pattern provided in the corresponding illumination region 21a of the mask surface in the opening of the field stop 22. And the image of the pattern of the mask M are equally magnified in the exposure area 23a of the plate P supported by the plate stage PST in cooperation with the first reflection refractive optical system PL11. As a second reflection refractive optical system PL12. Moreover, partial projection optical systems PL2-PL7 have the same structure as partial projection optical system PL1, and image the pattern of the pattern formed in the illumination area corresponding to each of the mask surface on the plate P. As shown in FIG. In addition, the partial projection optical systems PL1 to PL7 are arranged in a zigzag lattice pattern along the non-scanning direction.

In FIG. 2, the control unit 30 is connected to a power supply device 32 that supplies electric power to the light sources 2a to 2c. The control unit 30 turns on the light sources 2a to 2c through the power supply device 32, for example, when exposing the plate P or calibrating the illumination device ILA. In addition, when the required exposure amount is small, it is also possible to light only at least one light source among the light sources 2a to 2c.

As a basic operation at the time of exposure, the control unit 30 sets the illumination conditions including the sigma value of the illumination light and the magnification of the variable optical systems 8a to 8c (detailed later), and turns on the light sources 2a to 2c. Then, the mask M is illuminated by the illumination device ILA, the mask stage MST supporting the mask M and the plate stage PST supporting the plate P are driven, and the mask M and By repeating synchronously moving the plate P in the scanning direction with respect to the partial projection optical systems PL1-PL7 (scanning exposure) and moving the plate P in the non-scanning direction or scanning direction (step movement) The image of the pattern formed in the mask M is exposed to the plurality of exposed areas of the plate P by the step-and-scan method.

In addition, when calibrating illumination device ILA, an illumination intensity sensor (not shown) is arrange | positioned at each some position of illumination area 21a-21g as an example. When the light sources 2a to 2c are turned on and the sigma value is changed, and when the magnification of the shifting optical systems 8a to 8c is changed, the distribution of illuminance measured by such an illuminance sensor is targeted. The illuminance distribution becomes uniform by adjusting the shift optical systems 8a to 8c and the partial illumination optical systems IL1 to IL7 so as to fall within a predetermined allowable range.

Hereinafter, an example of the operation of the illumination method including the setting of the illumination conditions of the illumination device ILA of this embodiment and the exposure method using the exposure apparatus EX is demonstrated with reference to the flowchart of FIG. The operation is controlled by the controller 30.

First, in the state in which the light sources 2a to 2c are not turned on, in step 102 of FIG. 4, the partial illumination optical system of the illumination device ILA according to the type and fineness of the pattern of the mask M to be exposed. Using the aperture stop 17 of IL1-IL7, the sigma value of illumination light is controlled. In addition, when performing annular illumination, you may replace the aperture stop 17 with the aperture stop (not shown) for annular illumination. Here, as shown in FIG. 5A, the diameter of the circular aperture of the aperture stop 17 is set to the maximum value, and the sigma value is set to the maximum value NA1 (for example, about 0.8 to 0.9), Large sigma illumination is assumed. In the case of large sigma illumination, the illumination light emitted from the exit end 14a of the light guide fiber 10 becomes a parallel light beam through the input lens 15, so that the widest range of the incident surface of the fly's eye lens 16 ( It is necessary to illuminate a wider range than the area facing the largest opening of the aperture stop 17). For this reason, it is necessary to set the maximum inclination angle of the illumination light emitted from the emitting end 14a to the maximum value within the adjustable range.

And in step 104, the light source formed in the magnification of the displacement optical system 8a-8c, and also the incidence end 12a-12c of the light guide fiber 10 according to the value of sigma set by the aperture stop 17. The maximum inclination angle of the illumination light 3a-3c which forms the image 9a-9c is adjusted. In the case of using the aperture stop for annular illumination as the aperture stop 17, the? Value determined by the outer diameter of the annular aperture may be used as the? Value. Here, since the sigma value is set to the maximum value NA1, the magnification of the shift optical systems 8a to 8c is set to the minimum value in the range that can be changed, and the maximum inclination angle of the illumination light 3a to 3c is the maximum value within the adjustable range. is set to α1. In FIG. 5A, the focal length of the variable displacement optical system 8a is set to f1, and the height of the light source image 9a is set to the minimum value y1 within an adjustable range.

In each optical fiber element wire 11 constituting the light guide fiber 10, the maximum inclination angle of the incident light beam and the maximum inclination angle of the emitted light beam are almost the same. For this reason, when the aperture diameter of the aperture stop 17 is maximized, the illumination light 20a emitted from the exit end 14a of the light guide fiber 10 passes the maximum aperture through the input lens 15. The incident light is incident on an area of the incident surface of the illuminating fly's eye lens 16. Moreover, the light intensity distribution (illuminance distribution) D1 of the light source image 9a formed in the incidence end 12a is an almost axisymmetric normal distribution shape, the center part is strong, and it weakens rapidly toward the peripheral part. In the case where the height of the light source image 9a is the minimum value y1, the portion of the light intensity distribution D1 that is about 10% or less of the maximum value widens outside the incident surface of the incident end 12a, but most of the incident illumination light 3a (To be more precise, the light beam which randomly synthesized the incident illumination light 3a-3c) is emitted from the exit end 14a etc.

The light intensity distribution C31 at the incidence surface of the fly's eye lens 16 of the illumination light 20a emitted from the exit end 14a becomes slightly stronger as it moves away from the optical axis, and is almost axially symmetrical weakening rapidly outside. Distribution. The light intensity distribution C31 can be regarded as a substantially uniform value in a region facing the opening of the aperture stop 17, and the opening of the aperture stop 17 emits a maximum inclination angle from the exit end 14a at almost α1. Most of the illumination light 20a to be incident. For this reason, the ratio of the illumination light 20a that passes through the aperture of the aperture stop 17 and enters the mask M through the condenser lens 18 is the ratio of the illumination light 3a that enters the light guide fiber 10. The utilization efficiency of illumination light (henceforth illumination efficiency) is high.

In step 106, the light sources 2a to 2c are turned on, and the illumination light systems 3a to 3c are provided from the light sources 2a to 2c by the illumination device ILA, and the optical system 8a to 8c and the light guide fiber are provided. (10), the mask M is illuminated through the input lens 15, the fly's eye lens 16, the aperture stop 17, and the condenser lens 18 of the partial illumination optical systems IL1 to IL8. In step 108, the mask M and the plate P are moved synchronously with respect to the projection optical system PL while exposing the plate P onto the pattern of the mask M by the projection optical system PL. , Plate P is exposed. At this time, since the mask M can be illuminated with high illumination efficiency by using the illumination light having the maximum value of sigma value, the pattern formed on the mask M can be accurately applied to the plate P with high throughput and productivity. It can be exposed.

Next, for example, in the case where the pattern of the mask M to be exposed includes a fine isolation pattern like the pattern of the contact hole, so-called small sigma illumination is performed in step 102 in FIG. As shown in (B), for example, the diameter of the circular aperture of the aperture stop 17 is set to the minimum value, and the sigma value is set to the minimum value NA2 (for example, about 0.05 to 0.1). In this case, the illumination light emitted from the exit end 14a becomes a parallel light beam through the input lens 15, and faces the smallest area of the entrance face of the fly's eye lens 16 (the minimum opening of the aperture stop 17). What is necessary is just to illuminate the area | region a little wider than the area | region to make, so that the maximum inclination-angle of the illumination light emitted from the exit end 14a may be set to the minimum value (alpha) 2 within an adjustable range. Therefore, in step 104, the magnification of the shift optical systems 8a to 8c is set to the maximum value in the range that can be changed, and the maximum inclination angle of the illumination lights 3a to 3c is set to the minimum value α2. In FIG. 5B, the focal length of the variable displacement optical system 8a is set to f2, and the height of the light source image 9a is set to the maximum value y2.

At this time, the light intensity distribution D2 of the light source image 9a formed at the incidence end 12a is an almost axisymmetric normal distribution form in which the light intensity distribution D1 in FIG. 5A is enlarged at a magnification ratio y2 / y1. . In the light intensity distribution D2, a portion of about 35% or less of the maximum value is widened to the outside of the incident surface of the incident end 12a, and, for example, about 60% of the incident illumination light 3a to 3c exits the exit end. It is injected from 14a and the like. When the height y2 of the light source image 9a is set at an interval of a portion where the light intensity is approximately 30% of the maximum value, the light source image 9a having a height y2 becomes slightly larger than the width of the incident end 12a.

However, in this case, the maximum inclination angle of the illumination light 20a emitted from the exit end 14a is almost the minimum value α2, and most of the illumination light 20a is passed through the input lens 15 to the fly's eye lens 16. In the incident surface of, the light enters a region opposed to the minimum opening of the aperture stop 17. In this case, the light intensity distribution C11 on the incident surface of the fly's eye lens 16 of the illumination light 20a emitted from the exit end 14a is obtained by compressing the light intensity distribution C31 in Fig. 5A in the radial direction. It is almost a distribution of axisymmetry. The light intensity distribution C11 can be regarded as a substantially uniform value in a region facing the minimum opening of the aperture stop 17, and the opening of the aperture stop 17 has a maximum inclination angle of approximately 2 at the exit end 14a. Most of the illumination light 20a emitted by the light is incident. For this reason, the illumination light which enters the mask M through the condenser lens 18 through the condenser lens 18 through the minimum opening of the aperture stop 17 even if the amount of light loss of the illumination light 3a which injects into the incidence end 12a arises to some extent. The utilization efficiency with respect to the illumination light 3a of 20a is high. After that, by performing steps 106 and 108, for example, a pattern including an isolated pattern can be exposed to the plate P with high throughput with high accuracy.

Here, as a comparative example, as shown in FIG. 6A, the magnification of the variable optical system 8a is set to the minimum as in the case of FIG. 5A (the maximum inclination angle of the illumination light 3a is the maximum value α1). Assumes that the sigma value is set to the minimum value NA2 in the aperture stop 17. In this comparative example, the light intensity distribution C31 at the incidence surface of the fly's eye lens 16 of the illumination light 20a emitted from the exit end 14a is in the region opposite to the minimum opening of the aperture stop 17. It is also considerably stronger in the outer region 16Aa. For this reason, about 45% of the illumination light 20a emitted from the exit end 14a can pass through the opening of the aperture stop 17, for example.

For this reason, as shown in FIG. 5 (B) of the present embodiment, the illumination efficiency of the illumination light 20a incident on the mask M when the magnification of the variable magnification optical system 8a is increased is shown in FIG. About 30% (= (60 / 45-1) * 100) is improved about a comparative example. In the present embodiment, three light sources 2a to 2c are used. However, when the lighting efficiency is improved by 30%, for example, only two light sources 2a and 2b can be turned on to perform exposure. It is also possible to extend the life of the light sources 2a to 2c.

6B shows light intensity distributions D1 and D2 of the illumination light 3a at the incidence end 12a of FIGS. 5A and 5B with relative light intensities. The horizontal axis of (B) shows the distance from the center as a relative value with the center position of the incident end 12a as 0. FIG. The position where the value of a horizontal axis is 50 is the position of the edge part of the incident edge 12a as an example. In addition, the light intensity distribution D3 of FIG. 6B is the illumination light which passed the opening of the aperture stop 17, and the illumination light which injects into the fly-eye lens 16, when it is the comparative example of FIG. 6A. It is the distribution which compressed the light intensity distribution D1 by the light-quantity ratio of. The amount of light obtained by integrating the light intensity distribution D2 inside the position ± 50 is the amount of light obtained in the present embodiment, and the amount of light obtained by integrating the light intensity distribution D3 is the amount of light obtained in the comparative example. It can be seen that the lighting efficiency is improved.

6C shows light intensity distributions C31 and C11 of the illumination light 20a at the incident surface of the fly's eye lens 16 of FIGS. 5A and 5B in terms of relative light intensity, The horizontal axis of FIG. 6C shows the distance from the center as (sigma) value, making the center position of the incident surface zero. In the light intensity distributions C31 and C11, the relative intensity is adjusted so that the sigma values are the same at 0.88 and 0.65. In this case, if the values of the light intensity distributions C31 and C11 at the sigma value of 0.5 are the average light intensity or the average illuminance, the average illuminance of the light intensity distributions C31 and C11 is almost the same.

Next, in step 102, when the sigma value is set to an arbitrary value NA3 between the maximum value NA1 and the minimum value NA2 using the aperture stop 17, in step 104, the magnification of the variable displacement optical systems 8a to 8c. May be set to a value β3 between the minimum value (called β1) in the case of FIG. 5A and the maximum value (called β2) in FIG. 5B. As an example, as shown by the following equation, β3 is gradually set larger as the sigma value NA3 gradually decreases, and the maximum inclination angle of the illumination light incident on the light guide fiber 10 is gradually set smaller.

β3 = β1 + (NA1-NA3) (β2-β1) / (NA1-NA2)... (2)

As a result, even when illumination is performed at any sigma value, the mask M can be illuminated with high illumination efficiency according to the sigma value (lighting condition), and the pattern of the mask M is accurately plated with high throughput. It can expose to P).

7A is an enlarged view showing the partial illumination optical system IL1 of FIG. 5A, and FIG. 7B is an ejection of the light guide fiber 10 of FIG. 7A. It is an enlarged view which looked at the stage 14a from the front, and in FIG. 7A, the lens element 16a of the same shape of each part which comprises the fly-eye lens 16 is expanded and shown. As shown in FIG. 7B, the exit end 14a is formed by regularly tying a plurality of optical fiber element wires 11. In Fig. 7A, the exit end 14a is formed by the input lens 15 and the lens element 16a, and the exit surface of the lens element 16a (so-called copper surface, which is an arrangement surface of the aperture stop 17). Is imaged on. In addition, since the incidence surface of the lens element 16a is formed in the illumination region 21a of the mask M by the lens element 16a and the condenser lens 18, the illumination region 21a is exposed to an exposure field (Fig. The shape of each lens element 16a of the fly's eye lens 16 is determined so as to be slightly larger than the aperture of the three field of view aperture 22).

The light intensity distribution of the incident end 12a of the light guide fiber 10 is changed by the shift optical system 8a. Here, as an example, the input lens 15 and the fly's eye lens () are emitted by the light emitted from the optical fiber element wire 11 into which the light intensity up to about 10% of the maximum light intensity at the time of sigma illumination is incident. The light source image formed on the arrangement surface of the aperture stop 17 through 16 is regarded as an effective light source image contributing to the illumination. In addition, when the light emitted from the optical fiber element wires 11 of all the light emitting ends 14a respectively forms an effective light source image, the lens element 16a of the fly's eye lens 16 is in the range in which the light is incident. The number n1 of the effective light source images formed on the exit surface of is equal to the number n2 of the optical fiber element wires 11 constituting the exit end 14a.

Hereinafter, the ratio (= n1 / n2) of the number n1 of the effective light source image formed in the exit surface of the lens element 16a with respect to the number n2 of the optical fiber element wires 11 which comprise the exit end 14a is taken as a lens. The filling rate gamma of the illumination light from the optical fiber element wire 11 in the element 16a is called. In this embodiment, as an example, the magnification (maximum inclination angle of illumination light incident on the incidence end 12a) of the shift optical system 8a is adjusted so that the filling factor γ is maintained at 1 (100%).

At this time, in the case of performing annular illumination, large sigma illumination, or small sigma illumination, the exit surface of the lens element 16a of the fly's eye lens 16 in the opening of the aperture stop 17 is respectively shown in FIG. As shown in A), FIG. 8B, or FIG. 8C, the same maximum density distribution (distribution corresponding to the density distribution of the optical fiber element wire 11 in FIG. 7B) is obtained. An effective light source image 24 is formed. In addition, in FIG. 8 (A), the opening of the aperture stop 17 is set to the annular opening 17c. In the case of performing circular band illumination or large sigma illumination, the maximum inclination angle of the illumination light incident on the incidence ends 12a-12c of the light guide fiber 10 from the shifting optical systems 8a-8c is smaller than in the case of small sigma illumination. It is set large.

In addition, for convenience of description, in FIGS. 8A to 8C, and FIGS. 9A and 9B to be described later, each lens element 16a of the fly's eye lens 16 has an opening ( 17b and 17c) are larger than they are.

As described above, in the present embodiment, the filling factor gamma of the illumination light from the optical fiber element wire 11 in the case of performing annular illumination, large? Illumination, or small? The magnification is adjusted. In this case, since the number of effective light source images 14 in the opening of the aperture stop 17 is the maximum, the uniformity of the illuminance distribution in the mask M is good. In addition, the filling factor gamma may be almost 1 (for example, 0.9-1).

However, the light intensity of the illumination light incident on the incidence ends 12a to 12c of the light guide fiber 10 is the maximum at the center portion and decreases toward the periphery. Therefore, among the many optical fiber element wires 11 constituting the incidence end 12a, for example, about 70% or more, 70 to 40%, and 40 to 10% of the light with respect to the maximum value at the time of large sigma illumination. The light source images formed by the illumination light from the optical fiber element wire 11 into which the illumination light 3a of intensity | strength enters are made into the light source image 24A, 24B, 24C, respectively. At this time, as shown in FIG. 5A, when the sigma value is set to a large value, the lens element 16a in the opening 17b of the aperture stop 17 in the exit surface of the fly's eye lens 16. 9, light source images 24A, 24B, and 24C are formed in a random arrangement as shown in FIG.

Moreover, the illumination light emitted from the exit end 14a of the light guide fiber 10 is a part in the entrance port (large opening 17b) of the plurality of lens elements 16a (optical elements) of the fly's eye lens 16. In an area larger than the size of the incident surface of the plurality of lens elements 16a.

On the other hand, as shown in FIG. 5 (B), when setting the sigma value to be small, the lens element 16a in the opening 17b of the aperture stop 17 in the exit surface of the fly's eye lens 16. As shown in Fig. 9B, a light source image 24B of almost medium light intensity is formed in a regular arrangement on the exit surface of Fig. 9). In addition, the illumination light emitted from the exit end 14a of the light guide fiber 10 is a region wider than the size of the entrance hole of the plurality of lens elements 16a of the fly's eye lens 16 at the portion within the small opening 17b. Distributed in For this reason, in small sigma illumination, since the light intensity of the light source image 24B formed in the exit surface of each lens element 16a of the fly-eye lens 16 is more uniform than in the case of FIG. 9A, illuminance distribution Becomes more uniform.

When the small sigma illumination of the numerical aperture NA2 is performed as in the comparative example, as shown by a dotted line in Fig. 9A, when the opening 17b of the aperture stop 17 is made small, the light guide fiber Since most of the illumination light incident from 10 to the outside of the opening 17b is shielded, the utilization efficiency of illumination light falls.

As described above, the illuminating device ILA for illuminating the mask M of the present embodiment includes a light source 2a for generating illumination light and a variable optical system 8a for adjusting the maximum inclination angle of the illumination light in step 104. And an input lens 15 (hereinafter also referred to as a first condensing optical system) for condensing the illumination light through the shift optical system 8a in step 106 to form a parallel light beam, and in step 106, through the shift optical system 8a. The light guide fiber 10 (hereinafter also referred to as an optical member) which emits the illumination light to the input lens 15 while maintaining the maximum inclination angle of the illumination light, and the numerical aperture (σ value) of the illumination light in step 102. The aperture diaphragm 17 which adjusts the and the condenser lens 18 (henceforth a 2nd condensing optical system) which guides the illumination light of which numerical aperture was controlled by the mask M is provided in step 106. FIG.

According to the illuminating device ILA of this embodiment, when small sigma illumination which made the numerical aperture of illumination light small is performed, the variable angle optical system 8a makes small the inclination angle of the illumination light small, The ratio of the illumination light incident on the opening can be increased, and the utilization efficiency of the illumination light can be improved. For this reason, the mask M can be illuminated with greater illuminance. In addition, when illuminating the mask M with the same illuminance, the life of the light source 2a can be lengthened, and when the plurality of light sources 2a to 2c are used, the number of light sources to be used is reduced. The downsizing and cost reduction of the illuminating device ILA can be attained. Moreover, since the light guide fiber 10 is used, the light source 2a and the mask M can be isolate | separated, and thermal expansion of the mask M can be suppressed.

Moreover, the exposure apparatus EX which exposes the pattern of the mask M of this embodiment to the plate P is the illumination apparatus ILA which illuminates the mask M in step 102-106, and step 108 WHEREIN: The projection optical system PL which forms in the plate P the image of the pattern of the mask M illuminated with the illuminating device ILA is provided. According to the exposure apparatus EX, since the utilization efficiency of the illumination light in the illumination device ILA is high, the pattern of the mask M can be exposed to the plate P with high throughput with high throughput by increasing illumination intensity of illumination light. Can be. Moreover, when illumination intensity of illumination light is the same as before, since illumination device ILA can be made small and low cost, exposure apparatus EX can be made more compact and low cost.

In addition, since the light guide fiber 10 includes a plurality of incidence ends 12a to 12c, a plurality of exit ends 14a and 14B, and the like, the illumination light from the plurality of light sources 2a to 2c is randomly mixed. In addition, it can branch easily to the luminous flux for several partial illumination optical systems IL1-IL7.

Moreover, since the fly-eye lens 16 containing the some lens element 16a is provided, the illumination intensity distribution of the illumination light in the illumination area | region of the mask M can be made more uniform.

In addition, in embodiment mentioned above, the following modifications are possible.

As the shift optical system 8a of the above-described embodiment, as shown in Fig. 10A, the front lens system 6A is composed of three lenses, and the rear lens group 7A is composed of three lensrons. At the time of adjustment, for example, the shift optical system 8Aa for adjusting the position of the rear lens group system 7A can be used.

In addition, the optical system of the type which forms the intermediate image of a light source on the optical path between the light source image 5a and the light source image 9a can also be used as the displacement optical system 8a.

In addition, in the above-described embodiment, the shift optical system 8a is used to control the maximum inclination angle of the illumination light, but instead of the shift optical system 8a, as shown in FIG. You may use the relay optical system 8Ba of the system which switches a magnification. The relay optical system 8Ba includes a first rear lens group 7B made of a front lens group 6A, a lens group 7Bb having a lens 7Ba and two lenses, and a second lens group 7Ca and 7Cb. It has a rear lens system 7C. When the magnification is low, the light source image 9a is formed by using the front lens group 6A and the first rear lens group 7B. When the magnification is high, the second rear lens group 7B is used instead of the first rear lens group 7B. Using 7C, the light source image 9a is formed. Thus, when using the interchangeable relay optical system 8Ba, the optical system for controlling the inclination angle can be manufactured at low cost.

In addition, as disclosed in US Patent No. 5,719, 704, for example, between the front lens group 6 and the rear lens group 7 of the variable displacement optical system 8a of the above-described embodiment, FIG. ), An optical system (axicon system) consisting of two conical prismatic optical members 7B1 and 7B2 may be provided. At this time, when the normal illumination is performed, the two optical members 7B1 and 7B2 are brought into close contact with each other, and when the circular illumination is performed, the distance between the two optical members 7B1 and 7B2 is adjusted to adjust the overall lens system ( 6), the cross-sectional shape of the illumination light 3a passing between the rear lens group system 7 may be a ring-shaped shape having a variable size. In this case, the illumination light 20a emitted from the exit end 14a of the light guide fiber 10 is incident on the annular region of the incident surface of the fly's eye lens 16 through the input lens 15. In the case of performing the annular illumination, by adjusting the interval between the two optical members 7B1 and 7B2 according to the size of the annular aperture of the aperture stop, the utilization efficiency of the illumination light in the case of performing the annular illumination can be further improved. Can be.

Moreover, in the above-mentioned embodiment, although the fly-eye lens 16 is used as an optical integrator, you may use a micro lens array, a rod integrator, etc. instead of the fly-eye lens 16. As shown in FIG.

In the above-described embodiment, an ultra-high pressure mercury lamp is used as the light sources 2a to 2c. However, as the light sources 2a to 2c, lamps such as other arbitrary discharge lamps can be used. It is also possible to use a light emitting diode (LED) or the like as the light sources 2a to 2c. Moreover, you may use laser light sources, such as a solid state laser, a gas laser, or a semiconductor laser, as light sources 2a-2c. Moreover, it is also possible to use harmonics etc. of a laser beam as illumination light.

And when using a laser light source as a light source and setting the largest inclination angle of illumination light large, as an example, the laser beam which consists of parallel beams which generate | occur | produce from a laser light source (not shown), as shown to FIG. 10 (C). On the optical path of the LB, a diffraction grating 8C in which a fine concentric circular (zone plate shape) phase type irregularities are gradually formed is formed. The minimum pitch of the diffraction grating 8C is defined according to the maximum inclination angle.

In the case where the maximum inclination angle of the illumination light is set small by using the laser light source, concentric concave-shaped irregularities such as the diffraction grating 8C are formed on the optical path of the laser beam LB, and the minimum pitch is A diffraction grating 8D larger than the diffraction grating 8C is disposed. In this modified example, when the diffraction grating 8C is used, the illumination light having the largest inclination angle can be generated, and when the diffraction grating 8D is used, the illumination light with the smallest inclination angle can be generated. Therefore, the same effects as in the above-described embodiment can be obtained.

In addition, in the above-mentioned embodiment, although the multi-lens type scanning exposure apparatus was demonstrated as an example, in addition to the scanning exposure apparatus, the pattern of the mask M was stopped in the state which stopped the mask M and the plate P. The above-mentioned embodiment can also be applied to the exposure apparatus of the step and repeat type which exposes and steps the plate P in order. Moreover, although three light sources are used as a light source of an illuminating device, the illuminating device may be equipped with one, two, or four or more light sources. In addition, in the above-mentioned embodiment, although the light guide fiber has seven injection ends, as long as there are one or more injection ends of the light guide fiber, the number may be sufficient.

Moreover, in embodiment mentioned above, although the illumination light from several light source 2a-2c diverges to the light beam for several partial illumination optical systems IL1-IL7, it is one by the illumination light from one light source 2a. Even if the mask M is illuminated through the partial illumination optical system IL1, the pattern of the mask M is transferred to the plate P through one imaging optical system (for example, an optical system such as the partial projection optical system PL1). do. In this case, the illumination light 3a from the shift optical system 8a may be incident on the fly's eye lens 16 directly through the input lens 15 without providing the light guide fiber 10.

Next, the device manufacturing method using the exposure apparatus or exposure method which concerns on embodiment mentioned above is demonstrated. It is a flowchart which shows the manufacturing process of liquid crystal devices, such as a liquid crystal display element. As shown in FIG. 11, in the manufacturing process of a liquid crystal device, a pattern formation process (step 200), a color filter formation process (step 202), a cell assembly process (step 204), and a module assembly process (step 206) are performed in order.

In the pattern formation process of step 200, predetermined patterns, such as a circuit pattern and an electrode pattern, are formed on the glass substrate to which the photoresist was apply | coated as a plate using the above-mentioned exposure apparatus or exposure method. In this pattern formation process, the exposure process which transfers a pattern to a photoresist layer using the exposure apparatus or exposure method of above-mentioned embodiment, the image development of the plate in which the pattern was transferred, and the photoresist layer of the shape corresponding to a pattern are performed. The developing process which produces | generates as a mask layer, and the processing process of processing the surface of a glass substrate through this developed photoresist layer are included.

In the color filter forming step of step 202, a plurality of sets of three dots corresponding to R (red), G (green), and B (blue) are arranged in a matrix, or three stripes of R, G, and B A color filter in which a plurality of sets of filters are arranged in the horizontal scanning direction is formed.

In the cell assembly process of step 204, a liquid crystal panel (liquid crystal cell) is assembled using the glass substrate in which the predetermined pattern was formed in step 200, and the color filter formed in step 202. Specifically, a liquid crystal panel is formed by inject | pouring a liquid crystal between a glass substrate and a color filter, for example.

In the module assembly process of step 206, various components, such as an electric circuit and a backlight, which perform the display operation | movement of this liquid crystal panel with respect to the liquid crystal panel assembled by step 204, are attached. As described above, in the device manufacturing method of the present embodiment, the glass substrate is formed through the predetermined pattern by forming a predetermined pattern on the glass substrate using the exposure apparatus EX or the exposure method of the above-described embodiment. It includes processing. According to the exposure apparatus EX or the exposure method of this embodiment, since exposure can be performed with high illumination efficiency, an electronic device can be manufactured with high throughput with high precision.

Moreover, the exposure apparatus EX or the exposure method of embodiment mentioned above can be applied also when manufacturing a semiconductor device. Moreover, embodiment mentioned above is not limited to application to the exposure apparatus for semiconductor device manufacture or liquid crystal device manufacture, For example, exposure apparatus for display apparatuses, such as a plasma display, an imaging element (CCD etc.), The present invention can also be widely applied to an exposure apparatus for manufacturing various devices such as a micro machine, a thin film magnetic head, and a DNA chip. Moreover, embodiment mentioned above is applicable also to the exposure apparatus at the time of manufacturing the mask (photomask, reticle, etc.) used for manufacture of various devices using a photolithography process.

2a, 2b, 2c... Light sources 4a, 4b, 4c... Ellipsoid,
8a-8c... Variable optical system 10. Light guide fiber
12a, 12b, 12c... Incidence ends 14a, 14b. Injection stage
15... Input lens 16... Flyeye lens
17. Aperture aperture 18. Condenser lens
30. Control unit 32. Power unit
EX… Exposure apparatus ILA... Lighting device
IL1, IL3... Partial illumination optical system PL... Projection optics
PL1 to PL7. Partial projection optical system M... Mask
P… plate

Claims (29)

Lighting device for illuminating the mask,
A light source for generating illumination light,
An optical system for adjusting an inclination angle of the illumination light;
A first condensing optical system for condensing the illumination light through the optical system;
An optical member which emits the illumination light through the optical system to the first condensing optical system while maintaining the inclination angle of the illumination light;
An aperture stop for adjusting the numerical aperture of the illumination light emitted from the first condensing optical system;
And a second condensing optical system for guiding the illumination light whose numerical aperture is adjusted to the mask. The method according to claim 1,
The first condensing optical system has an optical element group including a plurality of optical elements for uniformizing the illuminance distribution of the illumination light,
The illumination device having passed through the optical member is distributed in a region wider than the size of the entrance hole of the plurality of optical elements of the first condensing optical system. The method according to claim 1 or 2,
And the optical system adjusts the inclination angle of the illumination light based on the numerical aperture of the aperture stop. The method according to claim 3,
And the optical system reduces the inclination angle of the illumination light when the numerical aperture is decreased by the aperture stop. The method according to claim 3,
And the optical system increases the inclination angle of the illumination light when the numerical aperture is increased by the aperture stop or when the aperture of the aperture stop is formed in a ring shape. The method according to any one of claims 1 to 5,
And the optical system is a variable magnification optical system for forming an image of variable magnification of the light source. The method according to claim 6,
And the variable magnification optical system increases the magnification of the image of the light source when the numerical aperture is reduced by the aperture stop. The method according to claim 6,
And the variable magnification optical system reduces the magnification of the image of the light source when the numerical aperture is increased by the aperture stop or when the aperture of the aperture stop is formed in a ring shape. The method according to any one of claims 1 to 8,
The optical member branches the illumination light through the optical system into a plurality of luminous fluxes while maintaining the inclination angle of the illumination light,
A plurality of sets of the first condensing optical system, the aperture stop, and the second condensing optical system corresponding to the plurality of luminous fluxes branched from the optical member;
Illuminating the plurality of illumination regions of the mask. The method according to claim 9,
The optical member has a plurality of incident ends,
And a plurality of sets of the light source and the optical system corresponding to the plurality of incident ends of the optical member. The method according to any one of claims 1 to 10,
Illumination distribution of the image of the light source is a normal distribution shape. The method according to claim 2,
The optical member is configured by tying a plurality of optical fiber element wires,
The opening of the illumination light with the aperture stop within a range where the number of the optical fiber element wires constituting the exit end of the optical member and the number of light source images formed at each exit end of each of the plurality of optical elements of the optical element group are approximately equal. Lighting device to adjust the number. An exposure apparatus for exposing a pattern of a mask to a substrate,
The lighting device according to any one of claims 1 to 12,
And a projection optical system for forming on the substrate an image of the pattern of the mask illuminated by the illuminating device. The method according to claim 13,
The illumination device illuminates a plurality of illumination regions of the mask,
A plurality of projection optical systems are provided corresponding to the plurality of illumination regions,
And a stage device for relatively scanning the mask and the substrate in a direction crossing the array direction of the plurality of illumination regions. As a lighting method for illuminating a mask,
Adjusting the inclination angle of the illumination light generated from the light source,
Emitting the illumination light having the tilt angle adjusted through the optical member that maintains the tilt angle of the illumination light;
Condensing the emitted illumination light;
Adjusting the numerical aperture of the illumination light;
Guiding the illumination light whose numerical aperture is adjusted to the mask. The method according to claim 15,
Condensing the illumination light includes equalizing the illuminance distribution of the illumination light using an optical element group including a plurality of optical elements,
The illumination method which passed the said optical member distributes in the area | region larger than the magnitude | size of the entrance hole of several optical element. The method according to claim 15 or 16,
Adjusting the inclination angle of the illumination light includes adjusting the inclination angle of the illumination light based on the numerical aperture of the illumination light. The method according to claim 17,
And the inclination angle of the illumination light is reduced when the numerical aperture of the illumination light is reduced. The method according to claim 17,
Adjusting the numerical aperture of the illumination light includes performing circular band illumination using the illumination light,
The illumination method which enlarges the said inclination-angle of the said illumination light, when the numerical aperture of the said illumination light is enlarged or when circular illumination is performed using the said illumination light. The method according to any one of claims 15 to 19,
Adjusting the inclination angle of the illumination light includes forming an image of variable magnification of the light source. The method of claim 20,
The illumination method which enlarges the magnification of the image of the said light source, when reducing the numerical aperture of the said illumination light. The method of claim 20,
Adjusting the numerical aperture of the illumination light includes performing circular band illumination using the illumination light,
The illumination method of which the magnification of the image of the said light source is made small when the numerical aperture of the said illumination light is made large, or when circular illumination is performed using the said illumination light. The method according to any one of claims 15 to 22,
Branching the illumination light having the tilt angle adjusted to a plurality of beams by using the optical member,
And illuminating the plurality of illumination regions of the mask using the plurality of luminous fluxes. The method according to claim 23,
The optical member has a plurality of incident ends,
And injecting the illumination light from the plurality of light sources into the plurality of incidence ends by respectively adjusting the inclination angles. The method according to claim 16,
The optical member is configured by tying a plurality of optical fiber element wires,
The numerical aperture of the illumination light is adjusted within a range where the number of the optical fiber element wires constituting the exit end of the optical member and the number of light source images formed at each exit end of each of the plurality of optical elements of the optical element group are approximately equal. Lighting method. As an exposure method which exposes the pattern of a mask to a board | substrate,
Illuminating said mask using the illumination method as described in any one of Claims 15-25,
Forming an image of the pattern of the illuminated mask on a substrate. The method of claim 26,
The illumination method comprises illuminating a plurality of illumination regions of the mask,
Forming images of the pattern of the mask of the plurality of illumination regions on the substrate, respectively;
And relatively scanning the mask and the substrate in a direction crossing the array direction of the plurality of illumination regions. Using the exposure apparatus of Claim 13 or 14, forming a predetermined pattern on a board | substrate,
A device manufacturing method comprising processing the substrate through the predetermined pattern. Forming a predetermined pattern on a substrate using the exposure method according to claim 26 or 27;
A device manufacturing method comprising processing the substrate through the predetermined pattern.

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