KR20190072083A - Super-resolution microscopic apparatus using hyper-lens - Google Patents

Abstract

The present invention relates to a super-resolution scanning microscope using a hyperlens. According to an aspect of the present invention, the super-resolution scanning microscope using a hyperlens comprises: a light source unit to emit a light; an object lens unit to concentrate the light provided by the light source unit; a hyperlens unit having a focal point formed on the same line as a focal point of an object lens of the object lens unit, and including a hyperlens to focus the light concentrated by the object lens to a diffraction limit or lower; a stage to allow the light focused by the hyperlens unit to be emitted, allow a sample to be placed thereon, and move the sample in a planar direction for scanning; a detection unit to detect a signal generated by emitting the focused light to the sample; and a control unit to control the stage to control a position of the sample, and realize an image of the sample based on the signal detected from the detection unit.

Description

{SUPER-RESOLUTION MICROSCOPIC APPARATUS USING HYPER-LENS}

The present invention relates to an ultra-high resolution scanning microscope using a hyper lens.

A general scanning microscope uses an objective lens to which a general optical lens is applied to focus the light and irradiate the object to be observed with the focused light. At this time, the scanning microscope can scan the object by a point-by-point method, obtain a fluorescence signal emitted from the observation object, and complete the image of the observation object.

At this time, an objective lens using a general optical lens has a limitation in focusing the light below the diffraction limit. Specifically, since the resolution of the optical lens is limited by the diffraction phenomenon of the wave according to the Heigenberg uncertainty principle, the limit of the minimum line width that can be realized in lithography in theory is obtained by the following optical system and process Can be expressed as.

Here, RES is the resolution, k1 is the process coefficient of the exposure facility,? Is the wavelength of the light source used, and NA is the numerical aperture of the exposure optical system. Excepting the process coefficients, transferring a slightly more elaborate pattern is possible by using a short wavelength and using a high NA optical system, i.e., a large lens.

However, in the case of a lens using ordinary light, there is a practical limitation in making the wavelength of the light source short or increasing the size of the lens, so that the resolution of the scanning microscope for obtaining the image by scanning the object by point- There is a problem that it is very difficult to do.

Patent Document 1: Japanese Patent Application Laid-Open No. 10-2011-0060404 (published on June 8, 2011)

Embodiments of the present invention have been proposed in order to solve the above problems and provide an ultra-high resolution scanning microscope using a hyper lens having a resolution higher than the diffraction limit of light used as a light source.

Also, there is provided an ultra-high resolution scanning microscope using a hyper lens which can obtain an ultra-high resolution image.

According to an aspect of the present invention, there is provided a light source device comprising: a light source unit for irradiating light; An objective lens unit for condensing light provided from the light source unit; A hyper lens unit having a focal point formed in the same line as the focal point of the objective lens of the objective lens unit and focusing the light condensed by the objective lens at a diffraction limit or less; A stage in which the focused light from the hyper lens section is irradiated, a sample is placed, and a sample can be moved in a plane direction for scanning; A detector for detecting a signal generated by irradiating the sample with the focused light; And a control unit controlling the stage to control the position of the sample and implementing an image of the sample based on the signal detected from the detection unit.

Further, the hyper lens section may include: a substrate fixed to the objective lens section; And a hyper lens formed on the substrate, wherein the hyper lens comprises: a plurality of dielectric layers; And an ultra-high resolution scanning microscope using a hyper lens including a plurality of metal layers alternately stacked with the dielectric layer.

Also, the dielectric layer may be silicon, the metal layer may be silver, and the light source may be provided with an ultra-high resolution scanning microscope using a hyper lens that emits light having a wavelength of 500 to 600 nm.

Also, the dielectric layer may be titanium oxide, the metal layer may be silver, and the light source may be provided with an ultra-high resolution scanning microscope using a hyper lens that emits light having a wavelength of 400 to 600 nm.

Also, the dielectric layer may be aluminum oxide or titanium dioxide, the metal layer may be silver, and the light source may be provided with an ultra-high resolution scanning microscope using a hyper lens that emits light in an ultraviolet wavelength band.

Also, the dielectric layer may be germanium, the metal layer may be gold or silver, and the light source may be provided with an ultrahigh-resolution scanning microscope using a hyper lens that emits light in a near-infrared wavelength band.

Also, the light source unit may be provided with an ultra-high resolution scanning microscope using a hyper lens for irradiating unpolarized light.

Also, the hyper lens unit may be provided with an ultra-high resolution scanning microscope using a hyper lens fixed to the objective lens unit.

And a fixing jig having at least a part of the fixing jig formed such that the rear end of the objective lens unit is fixed to one side, the hyper lens unit is fixed to the other side, and light emitted from the objective lens is provided to the hyper lens, An ultra-high resolution scanning microscope can be provided.

Also, the hyper lens may be provided with an ultra-high resolution scanning microscope using a hyper lens which is curved convexly toward the front where light is incident.

Also, the stage may be provided with an ultra-high resolution scanning microscope using a hyper lens in which light is irradiated to the sample and at least a part of the stage is formed to be transparent so that the signal generated in the sample is passed.

Also, the hyper lens section and the objective lens section may be provided with an ultra-high resolution scanning microscope using a hyper lens that sequentially passes signals generated in the sample and provides the same to the detection section.

A dichroic mirror for selectively passing or reflecting light is provided between the light source unit and the objective lens unit. The dichroic mirror reflects light emitted from the light source unit and provides the light to the objective lens unit And an ultra-high resolution scanning microscope using a hyper lens through which the signal of the sample provided from the objective lens unit passes and is provided to the detection unit.

Further, an ultra-high resolution scanning microscope using a hyper lens for receiving and detecting a signal passing through the additional objective lens unit is further provided, further comprising an additional objective lens unit for receiving and condensing the signal generated in the sample .

Also, an ultra-high resolution scanning microscope using a hyper lens in which a dichroic mirror for selectively passing the signal is provided between the additional objective lens part and the detection part can be provided.

Further, the additional objective lens unit and the detection unit may be provided with an ultra-high resolution scanning microscope using the hyper lens, the objective lens unit, and a hyper lens arranged in the opposite direction with respect to the stage.

In addition, the wavelength of the light irradiated to the sample through the hyper lens unit and the wavelength of the signal generated from the sample may have different ranges, and the hyper lens unit may include a hyper lens which can not pass the wavelength of the signal generated in the sample An ultra-high resolution scanning microscope can be provided.

According to another aspect of the present invention, there is provided a light source device comprising: a light source unit for emitting light; A light processing unit for selectively reflecting or projecting incident light; An objective lens unit for condensing the fluorescence signal generated from the light or sample provided by the optical processing unit; A hyper lens unit condensing or transmitting the light condensed by the objective lens unit or a fluorescence signal generated from the sample to a diffraction limit or less; A stage on which the sample is placed and capable of adjusting the position of the sample in a planar direction for scanning; A detector for detecting a transmitted fluorescence signal; And a control unit controlling the stage to control the position of the sample and implementing an image of the sample based on the signal detected from the detection unit.

According to another aspect of the present invention, there is provided a light source device comprising: a light source unit for emitting light; An objective lens unit for condensing light provided from the light source unit; A hyper lens unit for condensing the light condensed by the objective lens unit to a diffraction limit or less and irradiating the condensed sample with a sample; A stage on which the sample is placed and capable of adjusting the position of the sample in a planar direction for scanning; An additional objective lens unit for receiving and condensing a signal generated from the sample; A light processing unit selectively passing a signal transmitted through the additional objective lens unit; A detection unit for detecting a fluorescence signal transmitted from the optical processing unit; And a controller for controlling the stage to control the position of the sample and implementing an image of the sample based on the signal detected from the detector.

According to the embodiments of the present invention, an ultra-high resolution scanning microscope using a hyper lens having a resolution higher than the diffraction limit of light used as a light source can be provided.

In addition, an ultra-high resolution scanning microscope using a hyper lens capable of obtaining an ultra-high resolution image can be provided.

FIG. 1 is a schematic view showing a configuration of an ultra-high resolution scanning microscope using a hyper lens according to an embodiment of the present invention.
FIG. 2 is a schematic view showing the configuration of the hyper lens section of FIG. 1. FIG.
3 is a view showing the simulation result of the hyper lens portion of FIG.
FIG. 4 is a view showing an example in which the hyper lens portion of FIG. 1 is fixed to the objective lens.
FIG. 5 is a schematic view illustrating the configuration of an ultra-high resolution scanning microscope using a hyper lens according to another embodiment of the present invention.

Hereinafter, specific embodiments of the present invention will be described in detail with reference to the drawings.

In the following description of the present invention, detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.

In the following description, the front (front) and rear (rear) can be referred to according to the direction of movement of light irradiated from the light source. For example, when light moves from the first configuration toward the second configuration, the first configuration may be located in front of the second configuration, and the second configuration may be located behind the first configuration. Further, in one configuration, the side on which light is incident may be referred to as a front side, and the side on which light is emitted may be referred to as a rear side.

FIG. 1 is a schematic view showing a configuration of an ultra-high resolution scanning microscope using a hyper lens according to an embodiment of the present invention. FIG. 2 is a schematic view showing a configuration of a hyper lens part of FIG. 1, FIG. 4 is a view showing an example of a state where the hyper lens portion of FIG. 1 is fixed to the objective lens. FIG.

1 to 4, an ultra-high resolution scanning microscope 10 using a hyper lens according to an embodiment of the present invention includes a light source unit 11 for irradiating light, a light source unit 11 for condensing light provided from the light source unit 11, And an objective lens unit 13 and a hyper lens unit having a focus formed on the same line as the focus of the objective lens of the objective lens unit 13 and focusing the light condensed by the objective lens to a diffraction limit or less A stage 15 in which the focused light is irradiated and the sample S is placed and the sample can be moved in the plane direction for scanning, A detection unit 16 for detecting a signal generated by irradiating the sample S with a laser beam and a control unit for controlling the stage 15 to control the position of the sample S, (Not shown) that implements an image of the sample S .

More specifically, in this embodiment, a light processing unit 12 may be provided between the light source unit 11 and the objective lens unit 13 to selectively reflect or project the light incident thereon, It is possible to condense the light provided from the processing unit 12 or the emission signal generated from the sample S. The hyper lens section 14 can condense or transmit the light condensed in the objective lens section 13 or the fluorescence signal generated from the sample S to the diffraction limit or less. That is, the light irradiated from the light source unit 11 is reflected by the light processing unit 12, sequentially passes through the objective lens 13 and the hyper lens unit 14 and is irradiated onto the sample S, The generated or generated emission signal, for example, a fluorescence signal can be transmitted to the detection unit 16 sequentially through the hyper lens unit 14, the objective lens 13, and the optical processing unit 12. For this purpose, the emission signal generated in the sample (S) may have a wavelength within the operating wavelength range of the hyper lens section (14). That is, this embodiment can be used when the fluorescence signal generated in the sample S is within the operating wavelength range of the hyper lens section 14. The light source unit 11 can irradiate light having a wavelength corresponding to the characteristic of the hyper lens provided in the hyper lens unit 14, and a specific example related thereto will be described later.

On the other hand, the light emitted from the light source unit 11 may be general unpolarized light. That is, the light source unit 11 may not be provided with a color filter for selective selection of the optical spectrum, a polarization filter for polarization, or the like, thereby further simplifying the configuration of the microscope 10.

The optical processing unit 12 may be a dichroic mirror, and may reflect the light emitted from the light source unit 11 and pass the emission signal. By using such a light processing unit 12, the configuration of the microscope 10 can be further simplified.

The objective lens unit 13 includes an objective lens (not shown) for focusing light and can collect light reflected from the optical processing unit 12 and provide the light to the hyper lens unit 14. The objective lens unit 13 collects the emission signal emitted from the sample S through the hyper lens unit 14 and provides the emission signal to the optical processing unit 12. [

The hyper lens section 14 is composed of a plurality of dielectric layers 142 and a plurality of metal layers 143 alternately stacked with the dielectric layer 142 and functions as an anisotropic meta material. Specifically, the hyper lens section 14 can converge the light incident through the objective lens section 13 below the diffraction limit, advance the fluorescence signal emitted from the sample S, and transmit it to the objective lens section 13 .

)과 접선 방향의 유효 유전율(

)이 서로 다르게 형성되는 물질을 의미할 수 있다. 본 실시예에서, 서로 적층되는 유전체층(142)의 유전율과 금속층(143)의 유전율을 반지름 방향의 유효 유전율(

)과 접선 방향의 유효 유전율()을 서로 반대 부호가 되도록 설정함으로써, 하이퍼렌즈는 비등방성 메타물질이 될 수 있다. Here, the anisotropic meta material has an effective permittivity in the radial direction based on the center of curvature of the hyper lens (

) And the effective permittivity in the tangential direction (

) May be formed differently from one another. In this embodiment, the dielectric constant of the dielectric layer 142 and the dielectric constant of the metal layer 143, which are laminated to each other,

) And the effective permittivity in the tangential direction ( ) To be opposite to each other, the hyper lens may be an anisotropic meta material.

If the thicknesses of the dielectric layers 142 and the metal layers 143 are smaller than the wavelength of the incident light, the light is uniformly distributed in the dielectric layers 142 and the metal layers 143 It is recognized as one material with properties and exhibits one effective permittivity characteristic.

Here, the hyper lens provided as an anisotropic meta material increases the wave vector (k) value of the incident light so as not to be lost even if the light travels across the hyper lens. Specifically, when a propagating wave is incident on the hyper lens, the light propagates through the dielectric layer 142 and the metal layer 143. At this time, the momentum of light is preserved. The value of the wave wavenumber vector (k) of light increases as the light travels through the hyper lens, and eventually the light reaches an evanescent wave or a shorter wavelength It can be condensed.

The light condensing performance of the hyper lens is proportional to the ratio of the outer diameter to the inner diameter of the hyper lens and the number of dielectric layers 142 and metal layers 143 (amount of light travel). Therefore, the inner diameter and outer diameter of the hyper lens, and the number of the dielectric layer 142 and the metal layer 143 can be selected according to the desired light condensing performance. Here, the light condensing performance of the hyper lens can be understood as a ratio between an effective wavelength of incident light and an effective wavelength of condensed light.

In addition, the light reflected from the sample S passes through the hyper lens as opposed to the above, and the extinction wave can proceed without disappearing and can be provided to the objective lens unit 13. [

For example, the material of the dielectric layer 142 and the metal layer 143 constituting the hyper lens may be different from each other. For example, the materials of the dielectric layer 142 and the metal layer 143 may be different from each other. have.

For example, when the hyper lens is composed of silicon (Si) and silver (Ag), the light source unit 11 can provide light of a wavelength of 500 to 600 nm. Alternatively, when the hyper lens is composed of titanium oxide (Ti ₃ O ₅ ) and silver (Ag), the light source section 11 can provide light of a wavelength of 400 to 500 nm. Alternatively, when the hyper lens is made of aluminum oxide (Al ₂ O ₃ ) or titanium dioxide (TiO ₂ ) and silver (Ag), the light source unit 11 can provide light with a wavelength in the ultraviolet band. Or if the hyper lens is composed of germanium (Ge), gold (Au), or silver (Ag), the light source unit 11 can provide light with a wavelength in the near infrared band.

The hyper lens section 14 may be curved so as to be convex toward the front (downward in the drawing) in which light is incident so that the light provided from the objective lens section 13 is focused and irradiated onto the sample S .

Light passing through the hyper lens section 14 and focused below the diffraction limit is irradiated onto the sample S, and thus the sample S can emit a predetermined signal, for example a fluorescence signal, accordingly. At this time, the signal emitted from the sample S has a wavelength within the operating range of the applied hyper lens. For example, when a hyper lens is composed of a combination of titanium dioxide and silver, and the light emitted from the sample S when the light source unit 11 emits light with a wavelength in the ultraviolet band can have a wavelength in the ultraviolet band, The same hyper lens is applicable to this embodiment.

Here, the hyper lens section 14 may be fixed to the objective lens section 13. [ The fixing jig 132 can be provided on one side of which the rear end of the objective lens unit 13 is fixed and on the other side of which the hyper lens unit 14 can be fixed, A groove into which a part of the lens part 13 can be inserted can be formed. When the objective lens unit 13 is inserted into the groove of the fixing jig 132, the bolt 134 is inserted from the outside of the fixing jig 132 to press the outer tube of the objective lens unit 13, The jig 132 can be fixed to the objective lens portion 13. [

At this time, the hyper lens part 14 may be fixedly attached to one side of the fixing jig 132, and the focus of the hyper lens may be aligned with the focus of the objective lens.

Here, the fixing jig 132 may be formed of a material at least partially transparent so that light passing through the objective lens unit 13 or light passing through the hyper lens unit 14 can be transmitted.

Meanwhile, the stage 15 may have a displacement corresponding to the wavelength of the light that can be provided by the hyper lens section 14, and may transfer the sample S in the plane direction, for example, the X axis direction and the Y axis direction Device. As an example, the stage 15 may be a Piezo Nano Stage in nanometer units.

The stage 15 is controlled by the control unit so that the microscope apparatus 10 can perform scanning in a point-by-point manner. That is, after light is irradiated to a specific point of the sample S and a signal is detected, the control unit controls the stage 15 to transfer the position of the sample S so as to irradiate an adjacent point of the sample S And the traveling distance at this time may correspond to the resolution of the hyper lens section 14. [

The stage 15 is arranged so that at least a part of the light emitted from the sample S is transmitted to the hyper lens section 14 so that the light focused by the hyper lens section 14 is irradiated onto the sample S, .

The signal emitted from the sample S passes through the hyper lens section 14 and the objective lens section 13 and then passes through the optical processing section 12 and enters the detection section 16. For example, the detection unit 16 may be a photomultiplier tube (PMT).

The control unit can control the stage 15 to move the position of the sample S and implement the entire image of the sample S based on the image detected by the detection unit 16 as described above.

The operation and effects of the ultra-high resolution scanning microscope 10 using the hyper lens according to an embodiment of the present invention having the above-described structure are as follows.

The light having a specific wavelength emitted from the light source unit 11 is transmitted to the optical processing unit 12 and the optical processing unit 12 reflects the light emitted from the light source unit 11 and provides the reflected light to the objective lens unit 13. The objective lens unit 13 condenses the light provided from the light processing unit 12 and supplies the condensed light to the hyper lens unit 14. The hyper lens unit 14 focuses the light below the diffraction limit, do.

Thereby, a predetermined emission signal is generated in the sample S, and this signal is supplied to the objective lens unit 13 again without passing through the hyper lens unit 14 and disappearing. The objective lens unit 13 transmits a signal provided from the hyper lens unit 14 to the optical processing unit 12 and the optical processing unit 12 transmits the signal to the detection unit 16.

By this process, a signal for any one point of the sample S can be detected by the detecting unit 16, and the control unit controls the stage 15 to move the sample S, Repeat the same procedure.

Since the magnitude of each point detected by the detecting unit 16 is smaller than the diffraction limit of the light, the control unit can obtain the image of the sample S by performing the above- Although the microscope 10 according to the embodiment uses a general optical system, an ultra-high resolution image much higher than a conventional scanning microscope can be obtained.

Hereinafter, an ultra-high resolution scanning microscope using a hyper lens according to another embodiment of the present invention will be described with reference to FIG. 5 differs from the above embodiment in that the emission signal of the sample does not pass through the hyper lens section. Therefore, the difference will be mainly described, and the same part will be described with reference to the description of the embodiment and the reference numerals .

FIG. 5 is a schematic view illustrating the configuration of an ultra-high resolution scanning microscope using a hyper lens according to another embodiment of the present invention.

5, an ultra-high resolution scanning microscope 10 'using a hyper lens according to another embodiment of the present invention includes a light source unit 11', an objective lens unit 13 ', a hyper- The sample S placed on the stage 15 'is irradiated with light having a wavelength lower than the diffraction limit of light provided by the light source section 11', including the lens section 14 'and the stage 15' (S).

At this time, due to the characteristic of the sample S dyed with the fluorescent dye, the wavelength of the emission signal may have a wavelength different from that of the incident light. In this case, the emission signal may not pass through the hyper lens section 14 ' . Specifically, the hyper lens proposed so far can function as a meta material for a light having a wavelength outside the wavelength band because it can function in a specific wavelength band, that is, it can proceed without destroying the extinction wave. Therefore, in such a case, a separate configuration is required to detect the emission signal of the sample S.

In this embodiment, an additional objective lens portion 17 'is added for this purpose. The additional objective lens section 17 'collects the signal generated in the sample S and provides it to the detection section 16'. To this end, the additional objective lens portion 17 'and the detection portion 16' may be disposed in the opposite direction with respect to the hyper lens portion 14 'and the objective lens portion 13' and the stage 15 '.

Further, between the additional objective lens section 17 'and the detection section 16', a light processing section 12 'for selectively passing the light provided from the additional objective lens section 17', for example, An emission filter may be provided. At this time, the emission filter passes only the wavelength of the fluorescence signal, and noise can be eliminated.

According to the microscope 10 'according to the present embodiment, the wavelength of the light irradiated to the sample S through the hyper lens section 14' and the wavelength of the signal generated in the sample S are different from each other There is an advantage that an ultra-high-resolution image for the sample S can be obtained.

Although the ultra-high resolution scanning microscope using the hyper lens according to the embodiment of the present invention has been described as a specific embodiment, the present invention is not limited thereto, and the scope of the present invention is not limited to this, Should be interpreted as having. Skilled artisans may implement the pattern of features that have not been explicitly described in combination, substitution of the disclosed embodiments, but which, too, do not depart from the scope of the present invention. It will be apparent to those skilled in the art that various changes and modifications may be readily made without departing from the spirit and scope of the invention as defined by the appended claims.

10: ultra-high resolution scanning microscope 11:
12: optical processing unit 13: objective lens unit
14: hyper lens section 15: stage
16: detection part 17: additional objective lens part

Claims (19)

A light source unit for irradiating light;
An objective lens unit for condensing light provided from the light source unit;
A hyper lens unit having a focal point formed in the same line as the focal point of the objective lens of the objective lens unit and focusing the light condensed by the objective lens at a diffraction limit or less;
A stage in which the focused light from the hyper lens section is irradiated, a sample is placed, and a sample can be moved in a plane direction for scanning;
A detector for detecting a signal generated by irradiating the sample with the focused light; And
And a controller for controlling the stage to control the position of the sample and implementing an image of the sample based on the signal detected from the detector.
The method according to claim 1,
The hyper-
A substrate fixed to the objective lens unit; And
And a hyper lens formed on the substrate,
The hyper lens includes:
A plurality of dielectric layers; And
And a plurality of metal layers alternately stacked with the dielectric layer
Ultra High Resolution Scanning Microscope Using Hyper Lens.
3. The method of claim 2,
Wherein the dielectric layer is silicon, the metal layer is silver,
The light source unit is an ultra-high resolution scanning microscope using a hyper lens for irradiating light having a wavelength of 500 to 600 nm.
3. The method of claim 2,
Wherein the dielectric layer is titanium oxide, the metal layer is silver,
Wherein the light source unit is an ultra-high resolution scanning microscope using a hyper lens for irradiating light having a wavelength of 400 to 600 nm.
3. The method of claim 2,
Wherein the dielectric layer is aluminum oxide or titanium dioxide, the metal layer is silver,
Wherein the light source unit is a hyper-high resolution scanning microscope using a hyper lens for irradiating light in an ultraviolet wavelength band.
3. The method of claim 2,
Wherein the dielectric layer is germanium, the metal layer is gold or silver,
Wherein the light source unit is an ultra-high resolution scanning microscope using a hyper lens for irradiating light in a near-infrared wavelength band.
The method according to claim 1,
Wherein the light source unit is an ultra-high resolution scanning microscope using a hyper lens for irradiating unpolarized light.
The method according to claim 1,
Wherein the hyper lens unit is a hyper lens fixed to the objective lens unit.
9. The method of claim 8,
And a fixing jig having at least a part of which is transparent so that the light emitted from the objective lens is provided to the hyper lens, wherein the fixing lens is fixed to the rear end of the objective lens part at one side thereof, Ultra high resolution scanning microscope.
The method according to claim 1,
Wherein the hyper lens is curved convexly toward the front where light is incident.
The method according to claim 1,
Wherein the stage is at least partially transparent so that light is irradiated onto the sample and a signal generated from the sample is passed through the microscope.
The method according to claim 1,
Wherein the hyper lens section and the objective lens section sequentially pass signals generated in the sample and provide the signal to the detection section.
13. The method of claim 12,
A dichroic mirror is provided between the light source unit and the objective lens unit to selectively pass or reflect light,
The dichroic mirror includes:
The light emitted from the light source unit is reflected and provided to the objective lens unit,
Resolution microscope using a hyper lens that passes the signal of the sample provided from the objective lens unit and provides the signal to the detection unit.
The method according to claim 1,
Further comprising an additional objective lens unit for receiving and condensing the signal generated in the sample,
Wherein the detection unit receives a signal transmitted through the additional objective lens unit and detects the signal.
15. The method of claim 14,
And a dichroic mirror for selectively passing the signal is provided between the additional objective lens part and the detection part.
15. The method of claim 14,
Wherein the additional objective lens unit and the detection unit use a hyper lens arranged in the opposite direction with respect to the hyper lens unit, the objective lens unit, and the stage.
15. The method of claim 14,
Wherein a wavelength of the light irradiated to the sample through the hyper lens unit and a wavelength of a signal generated from the sample have different ranges,
Wherein the hyper lens unit is a hyper lens which can not pass the wavelength of a signal generated in the sample.
A light source unit for irradiating light;
A light processing unit for selectively reflecting or projecting incident light;
An objective lens unit for condensing the fluorescence signal generated from the light or sample provided by the optical processing unit;
A hyper lens unit condensing or transmitting the light condensed by the objective lens unit or a fluorescence signal generated from the sample to a diffraction limit or less;
A stage on which the sample is placed and capable of adjusting the position of the sample in a planar direction for scanning;
A detector for detecting a transmitted fluorescence signal; And
And a controller for controlling the stage to control the position of the sample and implementing an image of the sample based on the signal detected from the detector.
A light source unit for irradiating light;
An objective lens unit for condensing light provided from the light source unit;
A hyper lens unit for condensing the light condensed by the objective lens unit to a diffraction limit or less and irradiating the condensed sample with a sample;
A stage on which the sample is placed and capable of adjusting the position of the sample in a planar direction for scanning;
An additional objective lens unit for receiving and condensing a signal generated from the sample;
A light processing unit selectively passing a signal transmitted through the additional objective lens unit;
A detection unit for detecting a fluorescence signal transmitted from the optical processing unit; And
And a controller for controlling the stage to control the position of the sample and implementing an image of the sample based on the signal detected from the detector.

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