KR20180100220A - Method of spreading to Mars treatment bath - Google Patents

Method of spreading to Mars treatment bath Download PDF

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KR20180100220A
KR20180100220A KR1020187022919A KR20187022919A KR20180100220A KR 20180100220 A KR20180100220 A KR 20180100220A KR 1020187022919 A KR1020187022919 A KR 1020187022919A KR 20187022919 A KR20187022919 A KR 20187022919A KR 20180100220 A KR20180100220 A KR 20180100220A
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treatment bath
aluminum
chemical conversion
conversion treatment
chemical
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KR1020187022919A
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마사유키 카미무라
마사히코 마츠카와
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니뽄 페인트 서프 케미컬즈 컴퍼니 리미티드
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/86Regeneration of coating baths
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
    • C23C22/06Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
    • C23C22/34Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
    • C23C22/06Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
    • C23C22/34Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides
    • C23C22/36Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides containing also phosphates
    • C23C22/361Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides containing also phosphates containing titanium, zirconium or hafnium compounds

Abstract

알루미늄계 금속 화성처리욕을 계속 사용해도, 형성되는 화성 피막의 내식성 및 도막 밀착성을 유지할 수 있는, 알루미늄계 금속 화성처리욕에의 보급방법을 제공한다.
알루미늄계 금속 화성처리욕에 대한 보급제의 보급방법으로서, 보급제는, 지르코늄염 및 티탄염 중 적어도 일방과 유효 불화물을 포함하고, 알루미늄계 금속 화성처리욕 중의 알루미늄이온 농도(mg/L)에 대한 불소이온 농도(mg/L)의 비, F/Al이 1.8~4.5가 되도록 보급제를 보급하는, 알루미늄계 금속 화성처리욕에 대한 보급방법이다.
Provided is a method for supplying a chemical conversion film to an aluminum-based metallization treatment bath capable of maintaining corrosion resistance and coating film adhesion of a chemical conversion film formed even when an aluminum-based metallization treatment bath is continuously used.
A method of replenishing a supply agent to an aluminum-based metalization treatment bath, the supply agent comprising at least one of a zirconium salt and a titanium salt and an effective fluoride, wherein the aluminum ion concentration (mg / L) in the aluminum- (F / A) of 1.8 to 4.5 in terms of the fluorine ion concentration (mg / L) and the F / Al concentration (mg / L).

Description

화성처리욕에의 보급방법Method of spreading to Mars treatment bath

본 발명은, 화성처리욕(化性處理浴)에의 보급방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a method of supplying a chemical treatment bath (chemical treatment bath).

종래, 알루미늄 및 알루미늄 합금의 표면처리를 실시하기 위한 다양한 논크로메이트 처리방법이 제안되고 있다.A variety of non-chromate treatment methods for surface treatment of aluminum and aluminum alloys have been proposed.

예를 들면, 인산 또는 축합 인산 또는 이들 염의 적어도 1종과, 지르코늄염 또는 티탄염의 적어도 1종과, 유효 불화물과, 아인산, 차아인산 또는 이들 염의 적어도 1종, 을 각각 소정량 포함하는 알루미늄계 금속 표면 처리욕 및 상기 처리욕을 이용한 표면처리방법이 제안되고 있다(예를 들면, 후술하는 특허문헌 1 참조). 이러한 처리욕 및 처리방법에 따르면, 알루미늄 및 알루미늄 합금의 표면에 내식성과 도막 밀착성을 양립시킨 화성(化成) 피막을 형성할 수 있다.For example, an aluminum-based metal containing a predetermined amount of phosphoric acid or condensed phosphoric acid or at least one of these salts, at least one of a zirconium salt or a titanium salt, an effective fluoride and at least one of phosphorous acid, A surface treatment bath and a surface treatment method using the treatment bath have been proposed (for example, see Patent Document 1 described later). According to such a treatment bath and treatment method, it is possible to form a chemical conversion coating that combines corrosion resistance and film adhesion on the surfaces of aluminum and aluminum alloys.

특허문헌 1에 기재된 처리욕 및 처리방법에 의한 알루미늄 및 이들 합금의 화성처리는, 통상 피처리물을 처리욕에 연속적으로 반송하여, 처리욕에 침지 또는 스프레이 처리 등을 실시하는 공정을 포함한다. 이러한 화성처리를 실시해 가는 과정에서 처리욕 중의 유효 성분이 소비되는 동시에 처리욕 중의 성분의 조성이 변화된다. 예를 들면, 화성처리 반응 과정에서, 불소에 의해 알루미늄이 기재(基材) 표면에서 에칭되기 때문에, 처리욕 중의 알루미늄의 상대적인 농도는 점차 높아져 알루미늄 슬러지의 원인이 된다.The chemical treatment of aluminum and these alloys by the treatment bath and treatment method described in Patent Document 1 usually includes a step of continuously conveying the object to be treated to a treatment bath and then dipping or spraying the treatment bath. During the chemical conversion treatment, the active ingredient in the treatment bath is consumed and the composition of the component in the treatment bath is changed. For example, in the conversion treatment process, since aluminum is etched at the surface of the base material by fluorine, the relative concentration of aluminum in the treatment bath gradually increases and becomes the cause of aluminum sludge.

따라서, 아무런 대책을 세우지 않고 처리욕을 계속 사용하면, 형성된 화성 피막의 내식성 등의 효과를 얻을 수 없는 경우가 있다. 이 때문에, 처리욕에 대하여 유효 성분을 포함하는 보급제를 일정 간격으로 보급하는 것을 생각할 수 있다. 그러나, 이러한 방법으로는 반드시 처리욕 중의 유효 성분의 농도를 일정하게 유지할 수 있는 것은 아니다. 예를 들면, 화성처리를 실시한 알루미늄 및 이들 합금을 가공한 후, 다시 화성처리를 실시하는 경우도 있다. 이러한 경우, 한 번 화성처리가 이루어진 개소는 반응이 진행되지 않으므로, 소비되는 유효 성분량은 상대적으로 낮아진다. 즉, 처리 시간과 유효 성분의 소비량은 반드시 비례하는 것은 아니다. 또한, 상술한 바와 같이 처리욕 중의 성분의 조성 변화의 문제도 있다. 따라서, 종래의 방법에서는, 처리욕을 이용하여 계속해서 화성처리를 실시한 경우, 내식성 등을 갖는 화성 피막을 안정적으로 형성할 수 없었다.Therefore, if the treatment bath is continuously used without any countermeasures, effects such as corrosion resistance of the formed chemical conversion film may not be obtained. For this reason, it is conceivable to supply a supply agent containing an effective ingredient to the treatment bath at regular intervals. However, with this method, the concentration of the active ingredient in the treatment bath can not always be kept constant. For example, after the chemical conversion treatment of aluminum and alloys thereof, the chemical conversion treatment may be carried out again. In this case, since the reaction does not proceed at the site where the chemical treatment has been performed once, the amount of the effective ingredient consumed is relatively low. That is, the processing time and the consumed amount of the effective ingredient are not always proportional. In addition, as described above, there is also a problem of compositional change of components in the treatment bath. Therefore, in the conventional method, when a chemical conversion treatment is continuously performed using a treatment bath, a chemical conversion film having corrosion resistance and the like can not be stably formed.

[특허문헌 1] 일본공개특허 특개평09-143752호 공보[Patent Document 1] Japanese Unexamined Patent Publication No. 09-143752

본 발명자들은, 화성처리욕 중의 각 성분 비율과 형성되는 화성 피막과의 관계에 대하여 예의 검토한 결과, 화성처리욕 중의 알루미늄이온 농도와 불소이온 농도의 비율이 일정 범위내에 있는 경우, 내식성과 도막 밀착성을 양립시킨 화성 피막을 형성할 수 있다는 것을 이번에 알아냈다.The inventors of the present invention have made intensive investigations on the relationship between the proportions of respective components in the chemical conversion treatment bath and the formed chemical conversion coating film and found that when the ratio of the aluminum ion concentration to the fluorine ion concentration in the chemical conversion treatment bath is within a certain range, Can be formed at the same time.

따라서 본 발명은 화성처리욕 중의 알루미늄이온 농도와 불소이온 농도의 비율을 일정 범위 내로 유지함으로써, 알루미늄계 금속 화성처리욕을 계속 사용해도, 형성되는 화성 피막의 내식성 및 도막 밀착성을 유지할 수 있는, 알루미늄계 금속 화성처리욕에의 보급방법을 제공하는 것을 목적으로 한다.Therefore, the present invention is to provide a process for producing an aluminum-based metalization treatment bath which can maintain the corrosion resistance of a chemical conversion film formed and the coating film adhesion property while maintaining the ratio of the aluminum ion concentration and the fluorine ion concentration in the chemical conversion treatment bath within a certain range, And to provide a method for spreading the metal on the metallization treatment bath.

상기 목적을 달성하기 위하여 본 발명은, 알루미늄계 금속 화성처리욕에 대한 보급제의 보급방법으로서, 상기 보급제는, 지르코늄염 및 티탄염 중 적어도 일방과, 유효 불화물, 을 포함하고, 상기 알루미늄계 금속 화성처리욕 중의 알루미늄이온 농도(mg/L)에 대한 불소이온 농도(mg/L)의 비, F/Al이 1.8~4.5가 되도록 상기 보급제를 보급하는, 알루미늄계 금속 화성처리욕에 대한 보급방법을 제공한다.In order to achieve the above object, the present invention is a method for supplying a supply agent to an aluminum-based metallization treatment bath, wherein the supply agent comprises at least one of a zirconium salt and a titanium salt and an effective fluoride, Wherein the supplying agent is replenished so that the ratio F / Al of the fluorine ion concentration (mg / L) to the aluminum ion concentration (mg / L) in the metalization treatment bath is 1.8 to 4.5. Provide a supply method.

또한, 상기 보급제가, 인산, 아인산, 과산화수소로 이루어지는 군에서 선택되는 적어도 1종을 더 포함하는 것이 바람직하다.It is also preferable that the replenishment agent further comprises at least one selected from the group consisting of phosphoric acid, phosphorous acid and hydrogen peroxide.

또한, 상기 알루미늄계 금속 화성처리욕은, 지르코늄염 및 티탄염 중 적어도 일방과, 유효 불화물과, 인산, 축합 인산, 및 이들 염으로 이루어지는 군에서 선택되는 적어도 1종과, 아인산, 차아인산, 및 이들 염으로 이루어지는 군에서 선택되는 적어도 1종, 을 포함하는 것이 바람직하다.The aluminum-based metallization treatment bath may further comprise at least one of a zirconium salt and a titanium salt, an effective fluoride, at least one selected from the group consisting of phosphoric acid, condensed phosphoric acid, and salts thereof and at least one selected from the group consisting of phosphorous acid, And at least one member selected from the group consisting of these salts.

또한, 상기 화성처리욕의 pH가 소정 범위내가 되도록 상기 보급제를 보급함으로써, 상기 F/Al이 1.8~4.5가 되도록 상기 보급제를 보급하는 것이 바람직하다.Further, it is preferable to replenish the replenishers so that the F / Al ratio is 1.8 to 4.5 by replenishing the replenishers so that the pH of the conversion treatment bath is within a predetermined range.

또한, 상기 화성처리욕의 전기 전도도가 소정 범위내가 되도록 상기 보급제를 보급함으로써, 상기 F/Al이 1.8~4.5가 되도록 상기 보급제를 보급하는 것이 바람직하다.It is also preferable to replenish the supply agent so that the F / Al ratio is 1.8 to 4.5 by supplying the supply agent so that the chemical conversion efficiency of the chemical conversion treatment solution is within a predetermined range.

또한, 상기 알루미늄계 금속 화성처리욕은, 알루미늄 음료캔을 처리 대상으로 하는 것이 바람직하다.Further, it is preferable that the aluminum-based metallization treatment bath is to be treated with an aluminum beverage can.

본 발명에 의하면, 알루미늄계 금속 화성처리욕을 계속 사용해도, 형성되는 화성 피막의 내식성 및 도막 밀착성을 유지할 수 있는, 알루미늄계 금속 화성처리욕에의 보급방법을 제공할 수 있다.According to the present invention, it is possible to provide a method of supplying the chemical conversion film to an aluminum-based metallization treatment bath capable of maintaining the corrosion resistance and coating film adhesion of the chemical conversion film formed even when the aluminum-based metallization treatment bath is continuously used.

이하, 본 발명의 실시형태에 대하여 설명한다. 그러나, 본 발명은 이하의 실시형태로 한정되지 않는다.Hereinafter, an embodiment of the present invention will be described. However, the present invention is not limited to the following embodiments.

본 실시형태에 따른 보급방법이 적용되는 알루미늄계 금속 화성처리욕은, 알루미늄계 금속으로 이루어진 알루미늄 기재에, 외관, 내식성, 도막 밀착성 등이 양호한 보호 피막을 형성하기 위해 이용된다.The aluminum-based metallization treatment bath to which the supply method according to the present embodiment is applied is used for forming a protective film having good appearance, corrosion resistance, coating film adhesion, etc. on an aluminum base made of an aluminum-base metal.

<화성처리욕>&Lt; Chemical treatment bath &

본 실시형태에 따른 보급방법이 적용되는 알루미늄계 금속 화성처리욕(이하, 「화성처리욕」이라고도 한다)은, 지르코늄염 및 티탄염 중 적어도 일방과, 유효 불화물과, 인산, 축합 인산, 및 이들 염으로 이루어지는 군에서 선택되는 적어도 1종(이하, 「인산 등」이라고도 한다)와, 아인산, 차아인산, 및 이들 염으로 이루어지는 군에서 선택되는 적어도 1종(이하, 「아인산 등」이라고도 한다), 을 함유하는 화성처리제 조성물을 적당량의 물로 희석함으로써 얻을 수 있다.The aluminum-based metallization treatment bath (hereinafter, also referred to as a &quot; chemical treatment bath &quot;) to which the supply method according to the present embodiment is applied comprises at least one of a zirconium salt and a titanium salt, an effective fluoride, (Hereinafter also referred to as &quot; phosphoric acid and the like &quot;) selected from the group consisting of phosphoric acid and salts thereof (hereinafter also referred to as &quot; phosphoric acid and the like &quot;) and at least one member selected from the group consisting of phosphorous acid, hypophosphoric acid, By diluting with an appropriate amount of water.

본 실시형태의 화성처리욕에 의하면, 알루미늄 기재 표면에 방식성 등이 우수한 화성 피막을 형성할 수 있다.According to the chemical conversion treatment bath of the present embodiment, a chemical conversion coating excellent in corrosion resistance and the like can be formed on the surface of the aluminum base.

구체적으로는, 먼저, 화성처리욕 중에 포함되는 유효 불화물이, 알루미늄 기재 표면에 형성된 산화 피막을 에칭하여 이탈시킨다. 또한, 아인산 등은, 에칭된 알루미늄 기재 표면의 산화를 방지하는 환원제로서 기능한다. 그리고, 지르코늄염 및 티탄염 중 적어도 일방과, 유효 불화물과, 인산 등과, 아인산 등, 에 의해 복염이 형성되어, 알루미늄 기재 표면에 강고한 화성 피막이 형성된다.Specifically, first, the effective fluoride contained in the chemical conversion treatment bath etches away the oxide film formed on the surface of the aluminum base material. Further, the phosphorous acid or the like functions as a reducing agent for preventing the oxidation of the surface of the etched aluminum substrate. Then, a double salt is formed by at least one of a zirconium salt and a titanium salt, an effective fluoride, phosphoric acid and the like, phosphorous acid, etc., and a strong chemical film is formed on the surface of the aluminum base.

[지르코늄염][Zirconium salt]

본 실시형태에 따른 화성처리욕 중에 포함되는 지르코늄염으로는 특별히 한정되지 않으나, 예를 들면 지르코늄불화수소산(H2ZrF6) 및 플루오르지르코늄산의 리튬, 나트륨, 칼륨, 암모늄염(Li2ZrF6, Na2ZrF6, K2ZrF6, (NH4)2ZrF6), 황산지르코늄(Zr(SO4)2), 황산지르코닐(ZrO(SO4)), 질산지르코늄(Zr(NO3)4), 질산지르코닐(ZrO(NO3)2), 아세트산지르코늄, 불화지르코늄(ZrF4) 등을 들 수 있다. 이들은 단독으로 사용할 수도 있고, 2 종류 이상을 병용할 수도 있다.The zirconium salt contained in the chemical conversion treatment bath according to the present embodiment is not particularly limited and examples thereof include zirconium hydrofluoric acid (H 2 ZrF 6 ) and lithium, sodium, potassium, ammonium salts of fluorozirconic acid (Li 2 ZrF 6 , Na 2 ZrF 6, K 2 ZrF 6, (NH 4) 2 ZrF 6), sulfuric acid, zirconium (Zr (SO 4) 2) , sulfate, zirconyl (ZrO (SO 4)), zirconium nitrate (Zr (NO 3) 4 ), Zirconyl nitrate (ZrO (NO 3 ) 2 ), zirconium acetate, and zirconium fluoride (ZrF 4 ). These may be used alone, or two or more of them may be used in combination.

[티탄염][Titanium salt]

본 실시형태에 따른 화성처리욕 중에 포함되는 티탄염으로는 특별히 한정되지 않으나, 예를 들면, 티탄불화수소산 및 플루오르티탄산의 리튬, 나트륨, 칼륨, 암모늄염(Li2TiF6, Na2TiF6, K2TiF6, (NH4)2TiF6), 황산티탄(Ti(SO4)2), 황산티타닐(TiO(SO4)), 질산티탄(Ti(NO3)4), 질산티타닌(TiO(NO3)2), 불화티탄(TiF3·TiF4) 등을 들 수 있다. 이들은 단독으로 사용할 수 있고, 2 종류 이상을 병용할 수도 있다.Examples of the titanium salt contained in the chemical conversion treatment bath according to the present embodiment include, but are not limited to, lithium, sodium, potassium, ammonium salts of titanium hydrofluoric acid and fluorotitanic acid (Li 2 TiF 6 , Na 2 TiF 6 , K 2 TiF 6 , (NH 4 ) 2 TiF 6 ), titanium sulfate (Ti (SO 4 ) 2 ), titanyl sulfate (TiO (SO 4 )), titanium nitrate (Ti (NO 3 ) 4 ) TiO (NO 3 ) 2 ), titanium fluoride (TiF 3 .TiF 4 ), and the like. These may be used alone, or two or more of them may be used in combination.

지르코늄염 및 티탄염 중 적어도 일방은, 본 실시형태에 따른 화성처리욕 중에, 금속 환산으로 10ppm 이상 포함되는 것이 바람직하고, 보다 바람직하게는 10~500ppm, 더욱 바람직하게는 10~100ppm 포함된다. 화성처리욕 중에서의 지르코늄염 및 티탄염 중 적어도 일방의 농도가 금속 환산으로 10ppm 미만인 경우에는, 거의 화성 피막이 형성되지 않는다. 한편, 처리욕 중에 지르코늄염 및 티탄염 중 적어도 일방을 금속 환산으로 500ppm 이상 첨가해도 효과가 상승되지 않으므로, 지르코늄염 및 티탄염 중 적어도 일방의 농도는, 금속 환산으로 500ppm 이내인 것이 바람직하다.It is preferable that at least one of the zirconium salt and the titanium salt is contained in an amount of 10 ppm or more, more preferably 10 to 500 ppm, and still more preferably 10 to 100 ppm in terms of metals in the chemical conversion treatment bath according to the present embodiment. When the concentration of at least one of the zirconium salt and the titanium salt in the chemical conversion treatment bath is less than 10 ppm in terms of the metal, the chemical conversion film is hardly formed. On the other hand, even when 500 ppm or more of at least one of the zirconium salt and the titanium salt is added in the treatment bath, the effect is not increased, so that the concentration of at least one of the zirconium salt and the titanium salt is preferably 500 ppm or less in terms of the metal.

[유효 불화물][Effective Fluoride]

유효 불화물이란, 화성처리욕 중에서 불소이온을 유리하는 불화물을 말한다.The term &quot; effective fluoride &quot; refers to a fluoride which liberates fluorine ions in a chemical treatment bath.

본 실시형태에 따른 화성처리욕 중에 포함되는 유효 불화물로서는 특별히 한정되지 않으나, 예를 들면, 불화수소산(HF), 불화암모늄(NH4F), 불화수소암모늄(NH4HF2), 불화나트륨(NaF), 불화수소나트륨(NaHF2) 등을 들 수 있다. 이들은 단독으로 사용할 수 있고, 2 종류 이상을 병용할 수도 있다.The effective fluoride contained in the chemical treatment bath according to the present embodiment is not particularly limited and examples thereof include hydrofluoric acid (HF), ammonium fluoride (NH 4 F), ammonium hydrogen fluoride (NH 4 HF 2 ), sodium fluoride NaF), sodium hydrogen fluoride (NaHF 2 ), and the like. These may be used alone, or two or more of them may be used in combination.

본 실시형태에 따른 화성처리욕 중에서, 유효 불화물로부터 불소이온(F-)이 유리된다. 불소이온은, 알루미늄 기재 표면의 산화 피막을 에칭하는 외에, 화성처리욕 중에서 생성되는 지르코늄포스페이트의 침전을 억제하는 기능을 갖는다. 또한, 알루미늄 기재의 화성처리중에 화성처리욕에 용출(溶出)된 알루미늄을 플루오르알루미늄으로서 화성처리욕 중에 용해시켜, 알루미늄 슬러지의 발생을 억제하는 기능을 갖는다.In the chemical treatment bath according to the present embodiment, fluorine ions (F &lt; - &gt;) are released from the effective fluoride. The fluorine ion has a function of suppressing precipitation of zirconium phosphate generated in the chemical conversion treatment bath, in addition to etching the oxide film on the surface of the aluminum base. Further, it has a function of dissolving aluminum eluted in the chemical conversion treatment bath during chemical conversion treatment of the aluminum base as fluoroaluminum in the chemical conversion treatment bath to suppress generation of aluminum sludge.

본 실시형태에 따른 화성처리욕 중에서의 불소이온의 농도(mg/L)는, 화성처리 반응에 의해 화성처리욕 중에 용출되어 나오는 알루미늄이온의 농도(mg/L)와의 비, F/Al이 1.8~4.5 범위내인 것이 바람직하다. F/Al이 1.8 이상이 됨으로써, 화성처리욕 중에서 알루미늄이온이 충분히 가용화 되어 알루미늄 기재 표면에 형성되는 화성 피막의 균일성이 향상된다. 또한, 4.5 이하이면, 불소이온에 의한 에칭이 과잉이 되는 것을 억제할 수 있어, 충분한 내식성을 구비한 화성 피막을 알루미늄 기재 표면에 형성할 수 있다. F/Al은 1.8~2.2인 것이 바람직하다. 알루미늄이온의 농도는 ICP(유도결합 플라즈마 발광분석장치)에 의해, 불소이온의 농도는 이온 크로마토그래프에 의해 측정할 수 있다.The concentration (mg / L) of fluorine ions in the chemical treatment bath according to the present embodiment is a ratio of the concentration (mg / L) of aluminum ions eluted into the chemical treatment bath by the chemical treatment reaction, To 4.5. When F / Al is 1.8 or more, aluminum ions are sufficiently solubilized in the chemical conversion treatment bath to improve the uniformity of the chemical conversion film formed on the surface of the aluminum base. On the other hand, if it is 4.5 or less, excessive etching due to fluorine ions can be suppressed, and a chemical conversion film having sufficient corrosion resistance can be formed on the surface of the aluminum substrate. F / Al is preferably 1.8 to 2.2. The concentration of aluminum ions can be measured by ICP (inductively coupled plasma emission spectrometry) and the concentration of fluorine ions can be measured by ion chromatography.

[인산 등][Phosphoric acid]

본 실시형태에 따른 화성처리욕 중에 포함되는 인산 및 그 염으로서는 특별히 한정되지 않으나, 예를 들면, H3PO4, (NH4)H2PO4, NaH2PO4, KH2PO4 등의 인산알칼리 금속염, 인산칼슘, 인산마그네슘 등의 인산알칼리 토류금속염 등을 들 수 있다.Phosphoric acid and salts thereof contained in the chemical conversion treatment bath according to the present embodiment are not particularly limited, and examples thereof include H 3 PO 4 , (NH 4 ) H 2 PO 4 , NaH 2 PO 4 and KH 2 PO 4 Alkaline earth metal phosphate salts such as alkali metal phosphate, calcium phosphate and magnesium phosphate, and the like.

또한, 본 실시형태에 따른 화성처리욕 중에 포함되는 축합 인산 및 그 염으로서는 특별히 한정되지 않으나, 축합 인산으로는, 예를 들면, 피로인산, 트리폴리인산, 메타인산, 울트라인산 등을 들 수 있고, 축합 인산의 염으로는, 예를 들면, 나트륨, 칼륨 등의 알칼리 금속염, 칼슘, 마그네슘 등의 알칼리 토류 금속염, 암모늄염 등을 들 수 있다. 이들은 단독으로 사용할 수 있고, 2 종류 이상을 병용할 수도 있다.The condensed phosphoric acid and salts thereof contained in the chemical conversion treatment bath according to the present embodiment are not particularly limited, and examples of the condensed phosphoric acid include pyrophosphoric acid, tripolyphosphoric acid, metaphosphoric acid, and ultraphosphoric acid, Examples of salts of condensed phosphoric acid include alkali metal salts such as sodium and potassium, alkaline earth metal salts such as calcium and magnesium, and ammonium salts. These may be used alone, or two or more of them may be used in combination.

인산 등은, 본 실시형태에 따른 화성처리욕 중에, 인산 환산으로 10ppm 이상 포함되는 것이 바람직하고, 10~500ppm 포함되는 것이 보다 바람직하고, 10~100ppm 포함되는 것이 더욱 바람직하다. 본 실시형태에 따른 인산등의 화성처리욕 중의 농도가, 인산 환산으로 10ppm 미만인 경우에는, 내비수흑변(耐沸水黑變)을 일으킨다. 한편, 화성처리욕 중의 인산 등의 농도가, 인산 환산으로 500ppm을 넘는 경우, 내비수흑변을 일으키는 동시에 도막 밀착성도 악화된다.Phosphoric acid, and the like is preferably contained in an amount of 10 ppm or more in terms of phosphoric acid in the chemical conversion treatment bath according to the present embodiment, more preferably 10 to 500 ppm, and further preferably 10 to 100 ppm. When the concentration in the chemical conversion treatment bath such as phosphoric acid according to the present embodiment is less than 10 ppm in terms of phosphoric acid, it causes an evaporation black color change. On the other hand, when the concentration of phosphoric acid or the like in the chemical conversion treatment bath exceeds 500 ppm in terms of phosphoric acid, it causes dark water blackness and deteriorates the film adhesion.

[아인산 등][Such as phosphorous acid]

본 실시형태에 따른 화성처리욕 중에 포함되는 아인산, 차아인산 및 이들 염으로서는 특별히 한정되지 않으나, 예를 들면, 아인산, 차아인산에 더하여 이들 염으로서 나트륨, 칼륨 등의 알칼리 금속염, 칼슘, 마그네슘 등의 알칼리 토류 금속염, 암모늄 염 등을 들 수 있다. 이들은 단독으로 사용할 수 있고, 2 종류 이상을 병용할 수도 있다.The phosphorous acid, hypophosphoric acid and salts thereof contained in the chemical conversion treatment bath according to the present embodiment are not particularly limited, and examples thereof include alkali metal salts such as sodium and potassium, calcium and magnesium Alkaline earth metal salts, and ammonium salts. These may be used alone, or two or more of them may be used in combination.

아인산 등은, 본 실시형태에 따른 화성처리욕 중에, 아인산 환산으로 10ppm 이상 포함되는 것이 바람직하고, 10~5000ppm 포함되는 것이 보다 바람직하고, 50~500ppm 포함되는 것이 더욱 바람직하다. 본 실시형태에 따른 아인산 등의 화성처리욕 중의 농도가, 아인산 환산으로 10ppm 미만인 경우에는, 화성 피막의 균일성이 불충분해진다. 한편, 화성처리욕 중의 아인산 등의 농도가, 아인산 환산으로 5000ppm 이상인 경우, 도막 밀착성이 저하된다.The phosphorous acid and the like are preferably contained in the chemical conversion treatment bath according to the present embodiment in terms of phosphorous acid in an amount of 10 ppm or more, more preferably in the range of 10 to 5000 ppm, and still more preferably in the range of 50 to 500 ppm. When the concentration in the chemical conversion treatment bath such as phosphorous acid according to the present embodiment is less than 10 ppm in terms of phosphorous acid, the uniformity of the chemical conversion film becomes insufficient. On the other hand, when the concentration of phosphorous acid or the like in the chemical conversion treatment bath is 5000 ppm or more in terms of phosphorous acid, the film adhesion is deteriorated.

또한 본 실시형태의 화성처리욕에는, 필요에 따라 항균제, 계면활성제, 방청제 등을 첨가할 수 있다. 항균제로서는, 예를 들면, 에탄올이나 이소프로판올 등의 알코올, 폴리헥사메틸렌비구아니딘염산염 등의 구아니딘기 함유 화합물, 2-(4-티아졸일)-벤즈이미다졸, 메틸-2-벤즈이미다졸카바메이트 등의 벤즈이미다졸계 항균제, p-클로로-m-크실레놀, p-클로로-m-크레졸 등의 페놀계 항균제, 2,4,5,6-테트라클로로이소프탈로니트릴, 1,2-디브로모-2,4-디시아노부탄 등의 니트릴계 항균제, (2-피리딜티오-1-옥시드)나트륨, 비스(2-피리딜티오-1-옥시드)아연 등의 피리딘계 항균제, 2-메틸-4-이소티아졸린-3-온, 5-클로로-2-메틸-4-이소티아졸린-3-온 등 이소티아졸론계 항균제, 염화벤잘코늄, 염화벤제토늄 등의 4급 암모늄염, 안식향산, p-옥시안식향산에틸, 소르브산, 소르브산칼륨, 디히드로아세트산나트륨, 프로피온산나트륨 등을 들 수 있다.In addition, an antimicrobial agent, a surfactant, an antirust agent, and the like may be added to the chemical conversion treatment bath of the present embodiment, if necessary. Examples of the antibacterial agent include alcohols such as ethanol and isopropanol, guanidine group-containing compounds such as polyhexamethylenebiguanidine hydrochloride, 2- (4-thiazolyl) -benzimidazole, methyl-2-benzimidazole carbamate Phenol antimicrobial agents such as p-chloro-m-xylenol and p-chloro-m-cresol, 2,4,5,6-tetrachloroisophthalonitrile, 1,2- 2,4-dicyanobutane, pyridine antimicrobial agents such as sodium (2-pyridylthio-1-oxide) sodium and bis (2-pyridylthio-1-oxide) Methyl-4-isothiazolin-3-one and 5-chloro-2-methyl-4-isothiazolin-3-one, quaternary ammonium salts such as benzalkonium chloride and benzethonium chloride, Benzoic acid, ethyl p-oxybenzoate, sorbic acid, potassium sorbate, sodium dihydroacetate, and sodium propionate.

또한, 계면활성제로는, 예를 들면, 비이온 계면활성제, 양이온 계면활성제, 음이온 계면활성제를 들 수 있고, 방청제로는, 예를 들면, 타닌산, 이미다졸류, 트리아진류, 구아닌류, 히드라진류, 비구아니드 등을 들 수 있다.Examples of the surfactant include nonionic surfactants, cationic surfactants and anionic surfactants. Examples of the rust inhibitor include tannic acid, imidazoles, triazines, guanines, hydrazines , Buguanide, and the like.

이외에도, 밀착성 향상을 목적으로 실란커플링제, 콜로이달실리카, 아민류, 페놀 수지를 포함하는 페놀계 수용성 유기화합물 등을 화성처리욕에 첨가할 수 있다.In addition, a phenol-based water-soluble organic compound including a silane coupling agent, colloidal silica, amines, and a phenol resin may be added to the chemical conversion treatment bath for the purpose of improving the adhesion.

본 실시형태에 따른 화성처리욕의 25℃에서의 pH는, 2~4인 것이 바람직하고, 2.5~3.5인 것이 보다 바람직하다. 화성처리욕의 pH가 2 미만인 경우, 에칭 과잉되어 화성 피막의 형성이 곤란해질 뿐만 아니라, 내비수흑변성, 도막 밀착성이 저하된다. 한편, 화성처리욕의 pH가 4를 넘는 경우, 화성처리욕이 백탁되어 슬러지가 발생하고, 화성 피막의 형성도 곤란해져, 내비수흑변성이 저하된다.The pH of the chemical treatment bath according to the present embodiment at 25 캜 is preferably 2 to 4, more preferably 2.5 to 3.5. When the pH of the chemical conversion treatment bath is less than 2, the excess of the etching is not only difficult to form a chemical conversion film, but also the resistance to ink darkening and the adhesion to the coating film deteriorate. On the other hand, when the pH of the chemical conversion treatment bath is more than 4, the chemical conversion treatment bath becomes opaque, sludge is formed, formation of the chemical conversion coating becomes difficult, and the dark black denaturation is lowered.

본 실시형태에 따른 화성처리욕의 처리 대상은 알루미늄 기재이며, 알루미늄 기재의 재질인 알루미늄계 금속으로는 특별히 제한되지 않으나, 알루미늄, 알루미늄-구리 합금, 알루미늄-망간 합금, 알루미늄-규소 합금, 알루미늄-마그네슘 합금, 알루미늄-마그네슘-규소 합금, 알루미늄-아연 합금, 알루미늄-아연-마그네슘 합금 등을 들 수 있다. 또한, 처리 대상인 알루미늄 기재의 형상에 대해서는 특별히 제한되지 않으며, 판, 봉, 캔 등의 임의 형상의 처리 대상을 화성처리 할 수 있다. 보다 구체적으로는, 본 실시형태에 따른 알루미늄계 금속 화성처리욕은, 특히 3000계 합금제의 알루미늄 음료캔을 바람직하게 화성처리 할 수 있다.An object to be treated with the chemical conversion treatment bath according to the present embodiment is an aluminum-based material. The aluminum-based metal is not particularly limited but may be aluminum, an aluminum- A magnesium alloy, an aluminum-magnesium-silicon alloy, an aluminum-zinc alloy, an aluminum-zinc-magnesium alloy and the like. In addition, the shape of the aluminum substrate to be treated is not particularly limited, and an arbitrary shape such as a plate, rod, or can can be subjected to chemical conversion treatment. More specifically, the aluminum-based metallization treatment bath according to the present embodiment can preferably treat an aluminum beverage can made of a 3000-series alloy, preferably.

본 실시형태에 따른 화성처리욕에 의하면, 알루미늄 기재 표면에 균일한 화성 피막을 형성할 수 있다. 따라서, 화성 피막을 박막화해도 내식성을 유지할 수 있기 때문에, 화성 피막의 밀착성을 향상시킬 수 있다. 예를 들면, 알루미늄 음료캔은 화성 피막 형성 후에 엄격한 드로잉가공을 실시하기 때문에, 내식성에 더해 화성 피막의 밀착성이 요구되는데, 본 실시형태에 따른 화성처리욕은 이러한 알루미늄 음료캔 등에 대해서도 바람직하게 이용된다.According to the chemical conversion treatment bath of this embodiment, a uniform chemical conversion coating can be formed on the surface of the aluminum base. Therefore, corrosion resistance can be maintained even if the chemical conversion film is made thin, so that the adhesion of the chemical conversion film can be improved. For example, since aluminum beverage cans are subjected to strict drawing processing after formation of a chemical conversion film, adhesion of the chemical conversion film is required in addition to corrosion resistance, and the chemical conversion treatment bath according to this embodiment is also preferably used for such aluminum beverage cans and the like .

<보급제><Supply>

본 실시형태에 따른 알루미늄계 금속 화성처리욕에 대한 보급방법에 이용되는 보급제는, 지르코늄염 및 티탄염 중 적어도 일방과, 유효 불화물, 을 포함하고, 인산, 아인산, 과산화수소로 이루어지는 군에서 선택되는 적어도 1종을 더 포함하는 것이 바람직하다.The replenishment agent used in the replenishment method for the aluminum-based metallization treatment bath according to the present embodiment is characterized in that it contains at least one of a zirconium salt and a titanium salt and an effective fluoride, and is selected from the group consisting of phosphoric acid, phosphorous acid and hydrogen peroxide It is preferable to further include at least one species.

지르코늄염 및 티탄염 중 적어도 일방과, 유효 불화물과, 인산과, 아인산, 은 복염을 형성함으로써 화성 피막을 형성하는 성분이기 때문에, 화성 피막의 형성에 수반되어 소비된다. 또한, 유효 불화물로부터는 불소이온이 유리 되는데, 불소이온은 화성처리욕 중에 용출된 알루미늄이온과 플루오로알루미늄 등을 형성함으로써 소비된다. 또한, 아인산은 불소에 의해 에칭된 알루미늄 기재 표면의 산화를 방지하는 환원제로서 기능하기 때문에, 자신이 산화됨으로써 환원제로서의 기능을 잃는다.A zirconium salt, and a titanium salt, an effective fluoride, phosphoric acid, phosphorous acid, and a silver complex salt to form a chemical conversion coating film, so that it is consumed accompanying formation of a chemical conversion coating film. Further, fluorine ions are liberated from the effective fluoride, which is consumed by forming aluminum ions and fluoroaluminum eluted in the chemical treatment bath. Furthermore, since phosphorous acid functions as a reducing agent for preventing the oxidation of the surface of the aluminum substrate etched by fluorine, it is lost its function as a reducing agent by itself.

따라서, 이들 성분을 보급제에 함유시켜 화성처리욕에 보급하는 것이 화성처리욕의 계속 사용을 위해 필요하다.Therefore, it is necessary to incorporate these components in the replenishment agent and supply it to the chemical conversion treatment bath for continuous use of the chemical conversion treatment bath.

본 실시형태에 따른 보급제에 포함되는 지르코늄염으로서는, 특별히 한정되지 않으나, 상기 본 실시형태에 따른 화성처리욕 중에 포함되는 지르코늄염을 들 수 있다. 마찬가지로 티탄염, 유효 불화물, 인산, 아인산으로서도 상기 본 실시형태에 따른 화성처리욕 중에 포함되는 유효 불화물, 인산 등, 아인산 등을 들 수 있다.The zirconium salt contained in the replenishment agent according to the present embodiment is not particularly limited, but includes a zirconium salt contained in the chemical conversion treatment bath according to the present embodiment. Likewise, examples of the titanium salt, the effective fluoride, the phosphoric acid, and the phosphorous acid include the effective fluoride, phosphoric acid, and phosphorous acid contained in the chemical treatment bath according to the present embodiment.

또한, 본 실시형태에 따른 보급제에는, 화성처리욕 중의 pH를 조정하기 위해, pH조정제가 함유될 수 있다. pH조정제로서는, 특별히 한정되지 않으며, 질산, 암모니아 등의 일반적인 산이나 알칼리를 들 수 있다.In addition, the pH adjusting agent may be contained in the replenishing agent according to the present embodiment in order to adjust the pH in the chemical conversion treatment bath. The pH adjuster is not particularly limited and includes common acids and alkalis such as nitric acid and ammonia.

또한, 본 실시형태에 따른 보급제에는, 화성처리욕과 마찬가지로, 필요에 따라 항균제, 계면활성제, 방청제 등이 포함될 수 있다.In addition, the replenisher according to the present embodiment may include an antimicrobial agent, a surfactant, an antirust agent, and the like as necessary, as in the case of the chemical conversion treatment bath.

<보급방법><Supply method>

다음으로, 본 실시형태에 따른 보급제를 이용하여 실시하는, 알루미늄계 금속 화성처리욕에 대한 보급방법에 대하여 설명한다.Next, the supply method for the aluminum-based metallization treatment bath, which is performed using the supply agent according to the present embodiment, will be described.

본 실시형태에 따른 보급방법은, 알루미늄계 금속이 불소에 의해 에칭됨으로써 화성처리욕 중에 용출되는 알루미늄이온 농도(mg/L)와, 화성처리욕 중의 불소이온 농도(mg/L)의 비, F/Al이 1.8~4.5가 되도록 상기 보급제를 보급함으로써 이루어진다.The supply method according to the present embodiment is characterized in that the ratio of the aluminum ion concentration (mg / L) eluted into the chemical treatment bath by the aluminum-based metal being etched by fluorine and the fluorine ion concentration (mg / L) in the chemical treatment bath, F / Al &lt; / RTI &gt; of 1.8 to 4.5.

화성처리욕 중의 알루미늄이온 농도는, 화성처리욕 중에서 알루미늄계 금속이 불소에 의해 에칭됨으로써 증대된다. 알루미늄이온 농도가 증대되면 알루미늄 슬러지의 원인이 되나, 알루미늄이온은 불소이온과 결합하여 플루오로알루미늄이 되어 가용화되기 때문에, 알루미늄이온에 대하여 불소이온이 충분한 양 존재함으로써 알루미늄 슬러지를 방지할 수 있다.The aluminum ion concentration in the chemical treatment bath is increased by etching the aluminum-based metal in the chemical treatment bath with fluorine. When the aluminum ion concentration is increased, aluminum sludge is caused. However, because aluminum ions are combined with fluorine ions to become fluoroaluminum and solubilized, aluminum sludge can be prevented by the presence of a sufficient amount of fluoride ions in the aluminum ion.

또한, 화성처리욕 중의 불소이온 농도가 증대되면, 불소이온에 의한 에칭이 과잉이 되어, 화성 피막의 형성이 저해된다. 그러나 알루미늄이온과 불소이온이 결합하여 플루오로알루미늄이 됨으로써 불소이온에 의한 에칭이 억제된다. 따라서 불소이온에 대하여 알루미늄이온이 충분한 양 존재함으로써 불소이온에 의한 과잉 에칭이 억제된다.Further, if the concentration of fluorine ions in the chemical conversion treatment bath is increased, etching by fluorine ions is excessive, and formation of a chemical conversion film is hindered. However, since aluminum ion and fluorine ion are combined to form fluoroaluminum, etching by fluorine ions is suppressed. Therefore, the presence of a sufficient amount of aluminum ion with respect to the fluorine ion suppresses excessive etching due to the fluorine ion.

따라서 화성처리욕 중의 알루미늄이온 농도와 불소이온 농도의 비를 상기 범위 내로 유지하는 것이 중요하다. F/Al이 1.8 이상인 경우, 화성처리욕 중에서 알루미늄이온이 충분히 가용화되어 알루미늄 기재 표면에 형성되는 화성 피막의 균일성이 향상되므로 바람직하고, 4.5 이하이면 불소이온에 의한 에칭이 과잉이 되는 것을 억제할 수 있어, 충분한 내식성을 구비한 화성 피막을 알루미늄 기재 표면에 형성할 수 있다. F/Al은 1.9~2.1인 것이 바람직하다.Therefore, it is important to keep the ratio of the aluminum ion concentration and the fluorine ion concentration in the chemical conversion treatment bath within the above range. When F / Al is 1.8 or more, the aluminum ion is sufficiently solubilized in the chemical treatment bath to improve the uniformity of the chemical conversion film formed on the surface of the aluminum substrate. When F / Al is 4.5 or less, excessive etching by fluorine ions is suppressed So that a chemical conversion film having sufficient corrosion resistance can be formed on the surface of the aluminum substrate. F / Al is preferably 1.9 to 2.1.

본 실시형태에 따른 보급방법은, 화성처리욕 중의 25℃에서의 pH가 2~4가 되도록 보급제를 보급한다. 화성처리욕의 25℃에서의 pH가 2 미만인 경우, 상술한 바와 같이 알루미늄 기재에 대한 에칭량이 증대되어, 알루미늄이온 농도가 증대된다. 또한, 마찬가지로 pH가 4를 넘는 경우, 알루미늄이온의 허용 용존 농도가 저하되기 때문에, 알루미늄이온 농도가 저하된다. 따라서, pH를 상기 범위 내로 유지함으로써, 화성처리욕 중의 알루미늄이온 농도를 일정치 내로 유지할 수 있고, F/Al을 바람직한 범위 내로 유지하기 쉽다. pH의 측정방법은 특별히 한정되지 않으며, 시판되는 pH전극 등이 이용된다.The supply method according to the present embodiment replenishes the supply agent so that the pH at 25 DEG C in the chemical treatment bath becomes 2 to 4. When the pH of the chemical conversion treatment bath at 25 캜 is less than 2, the etching amount to the aluminum base material is increased as described above, and the aluminum ion concentration is increased. Similarly, when the pH is more than 4, the allowable dissolved concentration of aluminum ions is lowered, so that the aluminum ion concentration is lowered. Therefore, by keeping the pH within the above range, the aluminum ion concentration in the chemical conversion treatment bath can be maintained within a predetermined range, and F / Al can be easily maintained within a preferable range. A method of measuring the pH is not particularly limited, and a commercially available pH electrode or the like is used.

또한, pH가 상기 범위 내로 유지되도록 본 실시형태에 따른 보급제를 첨가하면, 결과적으로 F/Al이 1.8~4.5의 범위 내로 유지되도록, 보급제에 함유되는 유효 불화물 등의 성분의 함유량이나 pH를 조정하는 것이 바람직하다.Further, the addition of the auxiliary agent according to the present embodiment so that the pH is maintained within the above range results in a reduction in the content or pH of the component such as the effective fluoride contained in the flux so that F / Al is maintained within the range of 1.8 to 4.5. It is preferable to adjust it.

또한, 본 실시형태에 따른 보급방법은, 화성처리욕의 25℃에서의 전기 전도도가 0.5~5mS/cm가 되도록 보급제를 보급한다. Further, the supply method according to the present embodiment replenishes the supply agent so that the electrical conductivity of the chemical conversion treatment bath at 25 캜 is 0.5 to 5 mS / cm.

상술한 바와 같이, 화성처리욕의 계속 사용으로 인해, 화성처리제 중의 피막 형성 성분인 지르코늄염, 티탄염, 유효 불화물, 인산등, 아인산 등이 소비되고, 화성처리욕 중의 이온 농도가 저하된다. 이에 수반되어 화성처리욕의 전기 전도도는 저하된다. 따라서, 전기 전도도를 상기 범위 내로 유지함으로써, 화성처리욕 중의 피막 형성 성분의 농도를 일정치 내로 유지할 수 있다. 전기 전도도의 측정 방법은 특별히 한정되지 않으며, 시판되는 EC전극 등이 이용된다.As described above, zirconium salt, titanium salt, effective fluoride, phosphoric acid, phosphorous acid, etc., which are film forming components in the chemical conversion treatment agent, are consumed due to continuous use of the chemical treatment bath, and the ion concentration in the chemical treatment bath is lowered. The electrical conductivity of the chemical conversion treatment bath is lowered. Therefore, by keeping the electric conductivity within the above range, the concentration of the film-forming component in the chemical treatment bath can be maintained within a predetermined range. A method of measuring the electrical conductivity is not particularly limited, and a commercially available EC electrode or the like is used.

또한, 전기 전도도가 상기 범위 내로 유지되도록 본 실시형태에 따른 보급제를 첨가할 경우, 결과적으로 F/Al이 1.8~4.5의 범위 내로 유지되도록, 보급제에 함유되는 유효 불화물 등의 성분의 함유량 등을 조정하는 것이 바람직하다.In the case where the additive agent according to the present embodiment is added so that the electric conductivity is maintained within the above range, the content of the component such as the effective fluoride contained in the flux agent is adjusted so that the F / Al ratio is maintained within the range of 1.8 to 4.5 .

본 실시형태에 따른 보급제를 보급하는 방법으로는 특별히 한정되지 않으나, 화성처리욕 중의 각 성분의 조성이 크게 변화되지 않도록, 수시 미량 보급되는 것이 바람직하다. 예를 들면, 상기 pH전극이나 EC전극의 검출치에 따라서, pH나 전기 전도도가 일정치 내로 유지되도록 자동 관리되는 것이 바람직하다.The method for supplying the supply agent according to the present embodiment is not particularly limited, but it is preferable that the supply of the supply agent according to the present embodiment is carried out at an infinitesimal amount so that the composition of each component in the chemical treatment bath is not greatly changed. For example, it is preferable that the pH and the electric conductivity are automatically controlled so as to be maintained within a predetermined value according to the detection values of the pH electrode and the EC electrode.

이상 설명한 본 실시형태의 보급방법에 의하면, 화성처리욕을 계속 사용하여 화성처리욕 중의 성분에 변화가 생긴 경우에도, 화성처리욕의 F/Al를 1.8~4.5로 유지함으로써 알루미늄 기재 표면에 균일한 화성 피막을 형성할 수 있다. 따라서 본 실시형태의 보급방법이 적용되는 화성처리욕은, 화성 피막의 방식성과 함께 밀착성이 요구되는 알루미늄 음료캔 등을 바람직하게 화성처리 할 수 있다.According to the supply method of the present embodiment described above, even when the chemical conversion treatment bath is continuously used to change the components in the chemical conversion treatment bath, the F / Al ratio of the chemical conversion treatment bath is maintained at 1.8 to 4.5, A chemical conversion film can be formed. Therefore, the chemical treatment bath to which the supply method of the present embodiment is applied can preferably treat the aluminum beverage cans and the like, which are required to have adhesion to the chemical conversion film and adhesion.

<화성처리방법><Chemical conversion treatment method>

다음으로, 본 실시형태에 따른 화성처리욕을 이용하여 실시하는 알루미늄계 금속의 화성처리방법에 대하여 설명한다.Next, a chemical conversion treatment method of an aluminum-based metal using the chemical conversion treatment bath according to the present embodiment will be described.

화성처리에 앞서, 알루미늄 기재의 전(前)처리를 실시한다. 예를 들면, 음료캔 등의 알루미늄캔은, 드로잉·앤드·아이어닝 가공(이하 「DI가공」이라 한다)이라 불리는 드로잉가공 등에 의해서 제조되고 있으며, 이 과정에서 발생된 스멋이라 불리는 알루미늄 분말이나 윤활유가 표면에 부착되어 있다. 또한, 알루미늄 기재 표면에는 통상 산화 피막이 형성되어 부동태화 되어 있다. 따라서 알칼리 처리나 산처리 등에 의해 이들 스멋이나 윤활유를 제거하는 동시에, 알루미늄 기재 표면을 적당히 에칭하는 것이 바람직하다. 이러한 알칼리 처리나 산처리를 전처리로서 실시함으로써, 알루미늄 기재 표면에 강고한 화성 피막을 형성할 수 있다.Prior to the conversion treatment, the aluminum substrate is pre-treated. For example, aluminum cans such as beverage cans are manufactured by a drawing process called drawing-and-ironing process (hereinafter referred to as "DI process"), and aluminum powder or lubricant Is attached to the surface. In addition, an oxide film is usually formed on the surface of the aluminum substrate and is immobilized. Therefore, it is preferable to remove these smuts and lubricating oil by an alkali treatment or an acid treatment, and at the same time to appropriately etch the surface of the aluminum base material. By performing such alkali treatment or acid treatment as a pretreatment, a strong chemical conversion film can be formed on the surface of the aluminum base material.

알루미늄계 금속의 화성처리방법은 특별히 제한되지 않으나, 피처리물인 알루미늄 제품 등을 화성처리욕 중에 침지, 혹은 화성처리욕 내의 화성처리제 조성물을 분무 또는 도포 등 함으로써 이루어진다. 화성처리에 요하는 시간은, 화성처리욕에 따른 화성처리제 조성물, 처리온도, 처리방법에 의해 다르나, 통상 5~60초이다.A method of treating the aluminum-based metal with a chemical treatment is not particularly limited, but the aluminum product or the like to be treated is immersed in a chemical treatment bath or the chemical treatment composition in a chemical treatment bath is sprayed or coated. The time required for the conversion treatment varies depending on the chemical conversion treatment composition, the treatment temperature and the treatment method depending on the chemical conversion treatment bath, but is usually 5 to 60 seconds.

또한, 본 실시형태에 따른 화성처리방법에 있어서, 화성처리욕의 온도는, 실온~60℃인 것이 바람직하고, 30~50℃인 것이 보다 바람직하다. 화성처리욕의 온도가 실온(예를 들면 25℃) 미만인 경우, 화성 피막의 형성 속도가 느리고, 형성 속도를 상승시키기 위해서는 처리욕 중의 각 성분의 농도를 상승시켜야 하므로, 어쨌든 경제적으로 불리하다. 한편, 화성처리욕의 온도가 60℃를 넘는 경우, 처리욕이 백탁되고 슬러지가 발생하기 쉬워진다. 또한, 화성처리욕의 온도 유지에 다대한 에너지를 요하기 때문에, 경제적으로 불리하다.In the chemical conversion treatment method according to the present embodiment, the temperature of the chemical conversion treatment bath is preferably room temperature to 60 ° C, more preferably 30 to 50 ° C. When the temperature of the chemical conversion treatment bath is less than room temperature (for example, 25 占 폚), the formation rate of the chemical conversion film is slow and the concentration of each component in the treatment bath must be raised in order to increase the formation rate. On the other hand, when the temperature of the chemical conversion treatment bath exceeds 60 캜, the treatment bath becomes cloudy and sludge tends to be generated. Further, since it requires a great deal of energy for maintaining the temperature of the chemical conversion treatment bath, it is economically disadvantageous.

[[ 실시예Example ]]

이하에, 실시예에 근거하여 본 발명을 보다 상세하게 설명하나, 본 발명은 이들 실시예에 의해 한정되는 것은 아니다. 실시예 및 비교예 중, 「%」는 특별히 언급이 없는 한 「질량%」를 의미한다.Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited to these examples. In the examples and comparative examples, &quot;% &quot; means &quot;% by mass &quot; unless otherwise specified.

<실시예 1>&Lt; Example 1 >

지르코늄이온, 알루미늄이온, 불소이온의 농도가 각각 표 1에 나타낸 농도의 수용액이 되도록 각 성분을 조제하여, 실시예1의 화성처리욕으로 하였다. 지르코늄 이온원으로는 (NH4)2ZrF6를 이용하고, 불소 이온원으로는 HF를 이용하였다. 피처리물로서는, 알루미늄 합금(A3004)판을 DI가공하여 얻은 뚜껑 없는 알루미늄캔체를 이용하고, 화성처리욕의 pH, 처리온도, 처리시간을 각각 표 1에 나타낸 조건으로 하여 화성처리를 실시하였다. 표 1 중의 pH는, 25℃에서의 pH를 의미한다.Each component was prepared so that the concentrations of zirconium ion, aluminum ion and fluorine ion were each an aqueous solution of the concentration shown in Table 1, and the chemical conversion treatment bath of Example 1 was used. (NH 4 ) 2 ZrF 6 was used as the zirconium ion source and HF was used as the fluorine ion source. As the material to be treated, a lidless aluminum can body obtained by DI processing of an aluminum alloy (A3004) plate was subjected to a chemical conversion treatment under the conditions shown in Table 1 for the pH of the chemical conversion treatment bath, the treatment temperature and the treatment time. The pH in Table 1 means the pH at 25 ° C.

<실시예 3, 5, 7, 9>&Lt; Examples 3, 5, 7 and 9 >

지르코늄이온, 알루미늄이온, 불소이온에 더하여 인산, 아인산, 과산화수소(H2O2)의 각 성분 농도가 표 1에 나타낸 농도가 되도록 각 성분을 조제하여, 실시예3, 5, 7, 9의 화성처리욕으로 하였다. 각각 처리조건을 표 1에 나타낸 것으로 한 것 이외에는 실시예 1과 동일한 조건으로 화성처리를 실시하였다.The respective components were prepared so that the concentration of each component of phosphoric acid, phosphorous acid and hydrogen peroxide (H 2 O 2 ) in addition to zirconium ion, aluminum ion and fluorine ion had the concentrations shown in Table 1, and the compositions of Examples 3, 5, Treatment bath. The chemical treatment was carried out under the same conditions as in Example 1, except that the treatment conditions were as shown in Table 1.

<실시예 2>&Lt; Example 2 >

실시예 1의 화성처리욕에 대하여, 지르코늄이온 20g/L, 불소이온 20g/L, 질산 20g/L를 포함하는 보급제A를 0.1% 보급하여, 실시예 2의 화성처리욕으로 하였다. 각 성분원으로는 실시예 1과 동일한 것을 이용하였다. 상기 보급에 의한 화성처리욕 중의 각 성분량은 표 1에 나타낸 대로 되었다. 처리조건을 표 1에 나타낸 것으로 한 것 이외에는 실시예 1과 동일한 조건으로 화성처리를 실시하였다.The chemical treatment bath of Example 2 was supplied with 0.1% of a replenisher A containing 20 g / L of zirconium ions, 20 g / L of fluorine ions and 20 g / L of nitric acid to the chemical treatment bath of Example 1. The same components as in Example 1 were used as the respective component sources. The amount of each component in the chemical conversion treatment bath by the above diffusion was as shown in Table 1. A chemical conversion treatment was carried out under the same conditions as in Example 1, except that the treatment conditions were as shown in Table 1.

<실시예 4><Example 4>

실시예 3의 화성처리욕에 대하여, 지르코늄이온 10g/L, 불소이온 10g/L, 인산 10g/L, 질산 20g/L를 포함하는 보급제B를 0.1% 보급하여, 실시예 4의 화성처리욕으로 하였다. 각 성분원으로는 실시예 1과 동일한 것을 이용하였다. 상기 보급에 의한 화성처리욕 중의 각 성분량은 표 1에 나타낸 대로 되었다. 처리조건을 표 1에 나타낸 것으로 한 것 이외에는 실시예 1과 동일한 조건으로 화성처리를 실시하였다.The replenishment agent B containing 10 g / L of zirconium ions, 10 g / L of fluorine ions, 10 g / L of phosphoric acid and 20 g / L of nitric acid was replenished to the chemical treatment bath of Example 3, Respectively. The same components as in Example 1 were used as the respective component sources. The amount of each component in the chemical conversion treatment bath by the above diffusion was as shown in Table 1. A chemical conversion treatment was carried out under the same conditions as in Example 1, except that the treatment conditions were as shown in Table 1.

<실시예 6>&Lt; Example 6 >

실시예 5의 화성처리욕에 대하여, 지르코늄이온 10g/L, 불소이온 10g/L, 인산 10g/L, 아인산 10g/L, 질산 20g/L를 포함하는 보급제C를 0.1% 보급하여, 실시예6의 화성처리욕으로 하였다. 각 성분원으로는 실시예1과 동일한 것을 이용하였다. 상기 보급에 의한 화성처리욕 중의 각 성분량은 표 1에 나타낸 대로 되었다. 처리조건을 표 1에 나타낸 것으로 한 것 이외에는 실시예 1과 동일한 조건으로 화성처리를 실시하였다.A replenisher C containing 10 g / L of zirconium ions, 10 g / L of fluorine ions, 10 g / L of phosphoric acid, 10 g / L of phosphorous acid and 20 g / L of nitric acid was replenished to the chemical conversion treatment bath of Example 5, 6 &lt; / RTI &gt; The same components as in Example 1 were used as the respective component sources. The amount of each component in the chemical conversion treatment bath by the above diffusion was as shown in Table 1. A chemical conversion treatment was carried out under the same conditions as in Example 1, except that the treatment conditions were as shown in Table 1.

<실시예 8>&Lt; Example 8 >

실시예 7의 화성처리욕에 대하여, 지르코늄이온 10g/L, 불소이온 10g/L, 인산 10g/L, 과산화수소 10g/L, 질산 20g/L를 포함하는 보급제D를 0.1% 보급하여, 실시예8의 화성처리욕으로 하였다. 각 성분원으로는 실시예 1과 동일한 것을 이용하였다. 상기 보급에 의한 화성처리욕 중의 각 성분량은 표 1에 나타낸 대로 되었다. 처리조건을 표 1에 나타낸 것으로 한 것 이외에는 실시예 1과 동일한 조건으로 화성처리를 실시하였다.A replenishment agent D containing 10 g / L of zirconium ions, 10 g / L of fluorine ions, 10 g / L of phosphoric acid, 10 g / L of hydrogen peroxide and 20 g / L of nitric acid was supplied to the chemical treatment bath of Example 7, 8 &lt; / RTI &gt; The same components as in Example 1 were used as the respective component sources. The amount of each component in the chemical conversion treatment bath by the above diffusion was as shown in Table 1. A chemical conversion treatment was carried out under the same conditions as in Example 1, except that the treatment conditions were as shown in Table 1.

<실시예 10>&Lt; Example 10 >

실시예 9의 화성처리욕에 대하여, 지르코늄이온 10g/L, 불소이온 10g/L, 인산 10g/L, 아인산 10g/L, 과산화수소 10g/L, 질산 20g/L를 포함하는 보급제E를 0.1% 보급하여, 실시예 10의 화성처리욕으로 하였다. 각 성분원으로는 실시예 1과 동일한 것을 이용하였다. 상기 보급에 의한 화성처리욕 중의 각 성분량은 표 1에 나타낸 대로 되었다. 처리조건을 표 1에 나타낸 것으로 한 것 이외에는 실시예 1과 동일한 조건으로 화성처리를 실시하였다.The replenishment agent E containing 10 g / L of zirconium ions, 10 g / L of fluorine ions, 10 g / L of phosphoric acid, 10 g / L of phosphorous acid, 10 g / L of hydrogen peroxide and 20 g / L of nitric acid was added to the chemical conversion treatment bath of Example 9 in an amount of 0.1% And a conversion treatment tank of Example 10 was used. The same components as in Example 1 were used as the respective component sources. The amount of each component in the chemical conversion treatment bath by the above diffusion was as shown in Table 1. A chemical conversion treatment was carried out under the same conditions as in Example 1, except that the treatment conditions were as shown in Table 1.

Figure pct00001
Figure pct00001

실시예 및 비교예의 화성처리욕의 피처리물인 알루미늄캔체에 대하여, 이하의 방법으로 전처리를 실시하였다. 먼저, 시판되는 산성 세정제(일본페인트·서프 케미컬즈주식회사제, 서프 클리너 NHC260)를 이용하여, 75℃에서 60초간 스프레이 처리함으로써 윤활유와 스멋을 제거하였다. 다음으로 수도물로 15초간 스프레이 물 세정하였다.The aluminum can bodies to be treated in the chemical treatment baths of Examples and Comparative Examples were pre-treated in the following manner. First, a lubricant and a lubricant were removed by spraying at 75 DEG C for 60 seconds using a commercially available acidic detergent (Nippon Paint & Surf Chemicals Co., Ltd., Surf Cleaner NHC260). Next, the water was spray-rinsed with tap water for 15 seconds.

그 다음에, 피처리물인 알루미늄캔체에 실시예 및 비교예의 화성처리욕에 따른 화성처리제 조성물을 각각 표 1에 나타낸 조건으로 스프레이하였다. 그 다음에 수도물로 15초간, 탈이온수로 5초간 스프레이 물세정한 후, 200℃에서 3분간 건조시켜, 이하의 평가 시험에 이용되는 실시예 및 비교예의 처리 용기로 하였다.Then, the chemical treatment composition according to the chemical treatment baths of Examples and Comparative Examples was sprayed on the aluminum can body to be treated under the conditions shown in Table 1, respectively. Then, it was spray-rinsed with tap water for 15 seconds and deionized water for 5 seconds, and then dried at 200 ° C for 3 minutes to obtain treatment containers of Examples and Comparative Examples used in the following evaluation tests.

[비등수(沸騰水) 내식성 시험][Boiling water corrosion resistance test]

실시예 1~10 및 비교예 1, 2의 처리 용기에서 잘라낸 캔바닥을 100℃의 비등시킨 수도물에 30분간 침지하고, 캔바닥 외면부의 흑변 정도를 이하의 평가 기준에 따라서 육안으로 평가하였다. 평가 결과를 표 1에 나타낸다. 평가 A를 합격으로 하고, 평가 B, C를 불합격으로 판정하였다.The bottoms of the cans cut out from the treatment vessels of Examples 1 to 10 and Comparative Examples 1 and 2 were immersed in boiled tap water at 100 DEG C for 30 minutes and the degree of blackening of the outer surface of the can bottom was evaluated by naked eyes according to the following evaluation criteria. The evaluation results are shown in Table 1. Evaluation A was judged to be acceptable, and evaluations B and C were judged to be rejected.

A: 흑변 없음A: No blackness

B: 조금 흑변B: A little shade

C: 강하게 흑변C: strongly blackened

실시예 1~10 및 비교예 1, 2의 처리 용기를 건조시킨 후에 잘라내어 시험편으로 하고, 에폭시아크릴계 도료를 바코터에 의해, 건조 막두께가 5㎛가 되도록 도포한 후, 250℃의 분위기에서 3분간, 열을 가해 경화시켜 형성된 도막에 대하여 이하의 도막 밀착성 시험을 실시하였다.The treatment vessels of Examples 1 to 10 and Comparative Examples 1 and 2 were dried and cut to obtain test specimens. The epoxy-acrylic paint was applied by a bar coater to a dry film thickness of 5 m, The coating film formed by heating and curing for minutes was subjected to the following coating film adhesion test.

[1차 밀착성 시험][Primary adhesion test]

상기에서 얻은 도막에 대하여, 1차 밀착성 시험으로서 0T 굽힘 시험을 실시하였다. 그리고, 굽힘부에 뜬 도막을 점착 테이프로 제거한 후, 굽힘부 양측의 박리폭을 측정하였다. 박리폭 0.1mm 이내를 합격으로 하고, 박리폭 0.1mm를 넘으면 불합격으로 평가하였다. 결과를 표 1에 나타낸다.The coating film obtained above was subjected to a 0T bending test as a primary adhesion test. Then, the coating film floating on the bent portion was removed with an adhesive tape, and the peeling widths on both sides of the bent portion were measured. The peeling width was determined to be within 0.1 mm, and when the peeling width exceeded 0.1 mm, it was evaluated as rejection. The results are shown in Table 1.

또한, 동일하게 1차 밀착성 시험으로서 구JIS K5400을 참고하여 1mm의 크로스 컷 테스트(碁盤目試驗)를 실시하였다. 크로스 컷 테스트법에서는, 컷터 나이프를 이용하여, 도막상에 1mm 폭으로 100개의 칸을 형성하고, 점착 테이프를 붙인 후, 당겨 떼어내고, 도막이 남은 칸의 수를 세었다. 도막이 남은 칸의 수가 100인 것을 합격으로 하고, 그 이외를 불합격으로 평가하였다. 결과를 표 1에 나타낸다.As a primary adhesion test, a cross-cut test of 1 mm was carried out by referring to the former JIS K5400. In the cross-cut test method, 100 chambers were formed on a coating film with a cutter knife in a width of 1 mm, and an adhesive tape was stuck thereon, then pulled off, and the number of chambers remaining was counted. The number of the remaining chambers of the coating was 100, and the others were evaluated as being unacceptable. The results are shown in Table 1.

[2차 밀착성 시험][Secondary adhesion test]

상기에서 얻은 도막을 비등수 중에 30분간 침지한 후의 도막에 대하여, 2차 밀착성 시험으로서 상기와 동일하게 1mm의 크로스 컷 테스트를 실시하였다. 도막이 남은 칸의 수가 100인 것을 합격으로 하고, 그 이외를 불합격으로 평가하였다. 결과를 표 1에 나타낸다.The coating film obtained by immersing the coating film obtained above in boiling water for 30 minutes was subjected to a crosscut test of 1 mm in the same manner as described above for the secondary adhesion test. The number of the remaining chambers of the coating was 100, and the others were evaluated as being unacceptable. The results are shown in Table 1.

실시예 1~10과, 비교예 1의 비교로부터, 실시예 1~10의 화성처리욕에 의해 처리한 알루미늄 기재가, 비교예 1의 화성처리욕에 의해 처리한 알루미늄 기재보다 비등수 내식성 및 밀착성 시험의 결과가 우수하다는 것을 알았다. 이러한 결과로부터, 화성처리욕 중의 F/Al을 4.5 이하로 함으로써 알루미늄 기재에 내식성 및 밀착성이 높은 화성 피막을 형성할 수 있다는 것이 확인되었다.From the comparison of Examples 1 to 10 and Comparative Example 1, it can be understood that the aluminum substrate treated by the chemical treatment baths of Examples 1 to 10 is superior to the aluminum substrate treated by the chemical treatment bath of Comparative Example 1 in boiling water corrosion resistance and adhesion The results of the test were found to be excellent. From these results, it was confirmed that the chemical conversion coating having high corrosion resistance and high adhesion to the aluminum base can be formed by setting the F / Al in the chemical conversion treatment bath to 4.5 or less.

실시예 1~10과, 비교예 2의 비교로부터, 실시예 1~10의 화성처리욕에 의해 처리한 알루미늄 기재가, 비교예 2의 화성처리욕에 의해 처리한 알루미늄 기재보다 비등수 내식성 및 밀착성 시험의 결과가 우수하다는 것을 알았다. 이러한 결과로부터, 화성처리욕 중의 F/Al을 1.8 이상으로 함으로써 알루미늄 기재에 내식성 및 밀착성이 높은 화성 피막을 형성할 수 있다는 것이 확인되었다.From the comparison of Examples 1 to 10 and Comparative Example 2, it can be understood that the aluminum substrate treated by the chemical treatment baths of Examples 1 to 10 is superior to the aluminum substrate treated by the chemical treatment bath of Comparative Example 2 in boiling water corrosion resistance and adhesion The results of the test were found to be excellent. From these results, it was confirmed that a chemical conversion coating having high corrosion resistance and high adhesion to an aluminum base can be formed by setting F / Al in the chemical conversion treatment bath to 1.8 or more.

따라서, 상기에 의해, 화성처리욕 중의 F/Al을 1.8~4.5로 유지함으로써, 내식성이 높은 화성 피막을 형성할 수 있는 화성처리욕을 유지할 수 있다는 것이 확인되었다.Thus, it has been confirmed that the above-described method can maintain the chemical conversion treatment bath capable of forming a chemical corrosion film having a high corrosion resistance by maintaining the F / Al ratio in the chemical conversion treatment bath at 1.8 to 4.5.

Claims (6)

알루미늄계 금속 화성처리욕에 대한 보급제의 보급방법으로서,
상기 보급제는, 지르코늄염 및 티탄염 중 적어도 일방과, 유효 불화물, 을 포함하고,
상기 알루미늄계 금속 화성처리욕 중의 알루미늄이온 농도(mg/L)에 대한 불소이온 농도(mg/L)의 비, F/Al이 1.8~4.5가 되도록 상기 보급제를 보급하는, 알루미늄계 금속 화성처리욕에 대한 보급방법.
As a method for supplying a supply agent to an aluminum-based metalization treatment bath,
Wherein the replenishment agent comprises at least one of a zirconium salt and a titanium salt and an effective fluoride,
Wherein the supplying agent is replenished so that the ratio of the fluorine ion concentration (mg / L) to the aluminum ion concentration (mg / L) in the aluminum-based metalization treatment bath and the F / Al ratio is 1.8 to 4.5, The supply method for bath.
제1항에 있어서,
상기 보급제가, 인산, 아인산, 과산화수소로 이루어지는 군에서 선택되는 적어도 1종을 더 포함하는, 알루미늄계 금속 화성처리욕에 대한 보급방법.
The method according to claim 1,
Wherein the replenishment agent further comprises at least one member selected from the group consisting of phosphoric acid, phosphorous acid, and hydrogen peroxide.
제1항 또는 제2항에 있어서,
상기 알루미늄계 금속 화성처리욕은, 지르코늄염 및 티탄염 중 적어도 일방과, 유효 불화물과, 인산, 축합 인산, 및 이들 염으로 이루어지는 군에서 선택되는 적어도 1종과, 아인산, 차아인산, 및 이들 염으로 이루어지는 군에서 선택되는 적어도 1종, 을 함유하는, 알루미늄계 금속 화성처리욕에 대한 보급방법.
3. The method according to claim 1 or 2,
Wherein the aluminum-based metallization treatment bath comprises at least one of a zirconium salt and a titanium salt, an effective fluoride, at least one member selected from the group consisting of phosphoric acid, condensed phosphoric acid, and salts thereof and at least one member selected from the group consisting of a phosphorous acid, At least one member selected from the group consisting of copper, aluminum, and combinations thereof.
제1항 내지 제3항 중 어느 한 항에 있어서,
상기 화성처리욕의 pH가 소정 범위 내가 되도록 상기 보급제를 보급함으로써, 상기 F/Al이 1.8~4.5가 되도록 상기 보급제를 보급하는, 알루미늄계 금속 화성처리욕에 대한 보급방법.
4. The method according to any one of claims 1 to 3,
The replenishment agent is replenished so that the pH of the chemical conversion treatment bath becomes within a predetermined range, thereby replenishing the replenishment agent so that the F / Al ratio is 1.8 to 4.5.
제1항 내지 제4항 중 어느 한 항에 있어서,
상기 화성처리욕의 전기 전도도가 소정 범위내가 되도록 상기 보급제를 보급함으로써, 상기 F/Al이 1.8~4.5가 되도록 상기 보급제를 보급하는 알루미늄계 금속 화성처리욕에 대한 보급방법.
5. The method according to any one of claims 1 to 4,
Wherein the supply agent is supplied so that the electrical conductivity of the chemical conversion treatment bath becomes within a predetermined range, thereby replenishing the supply agent so that the F / Al ratio is 1.8 to 4.5.
제1항 내지 제5항 중 어느 한 항에 있어서,
상기 알루미늄계 금속 화성처리욕은, 알루미늄 음료캔을 처리 대상으로 하는, 알루미늄계 금속 화성처리욕에 대한 보급방법.
6. The method according to any one of claims 1 to 5,
Wherein the aluminum-based metallization treatment bath is an aluminum beverage can treatment target.
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