KR20180084456A - 펄스 플라스마 모니터링이 가능한 펄스 플라스마 발생 장치 - Google Patents
펄스 플라스마 모니터링이 가능한 펄스 플라스마 발생 장치 Download PDFInfo
- Publication number
- KR20180084456A KR20180084456A KR1020170008080A KR20170008080A KR20180084456A KR 20180084456 A KR20180084456 A KR 20180084456A KR 1020170008080 A KR1020170008080 A KR 1020170008080A KR 20170008080 A KR20170008080 A KR 20170008080A KR 20180084456 A KR20180084456 A KR 20180084456A
- Authority
- KR
- South Korea
- Prior art keywords
- pulse plasma
- monitoring
- generating apparatus
- reaction space
- pulse
- Prior art date
Links
- 238000012544 monitoring process Methods 0.000 title abstract 4
- 230000003287 optical effect Effects 0.000 abstract 2
- 230000005684 electric field Effects 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
- G01J2001/4446—Type of detector
- G01J2001/446—Photodiode
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma Technology (AREA)
Abstract
펄스 플라스마 발생 장치가 개시된다. 펄스 플라스마 발생 장치는 반응공간이 내부에 형성되고, 뷰 포트를 갖는 반응 챔버; 상기 반응공간에 전계를 형성하는 안테나; 상기 안테나에 펄스 전력을 인가하는 전력 발생부; 상기 뷰 포트를 통해 상기 반응공간에서 발생되는 펄스 플라스마로부터 광 신호를 추출하는 포토 다이오드; 상기 전력 발생부에서 발생되는 트리거 신호와 상기 포토 다이오드로부터 추출된 상기 광 신호로부터 상기 반응공간 내 펄스 플라스마 발생을 모니터링하는 모니터링부를 포함한다.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020170008080A KR20180084456A (ko) | 2017-01-17 | 2017-01-17 | 펄스 플라스마 모니터링이 가능한 펄스 플라스마 발생 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020170008080A KR20180084456A (ko) | 2017-01-17 | 2017-01-17 | 펄스 플라스마 모니터링이 가능한 펄스 플라스마 발생 장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20180084456A true KR20180084456A (ko) | 2018-07-25 |
Family
ID=63058885
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020170008080A KR20180084456A (ko) | 2017-01-17 | 2017-01-17 | 펄스 플라스마 모니터링이 가능한 펄스 플라스마 발생 장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20180084456A (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114942100A (zh) * | 2021-12-31 | 2022-08-26 | 西安交通大学 | 一种用于真空开关真空度检测的装置及方法 |
US11996275B2 (en) | 2021-12-17 | 2024-05-28 | Samsung Electronics Co., Ltd. | Device for radical diagnostic in plasma processing chamber, radical diagnostic system having the same, and operating method thereof |
-
2017
- 2017-01-17 KR KR1020170008080A patent/KR20180084456A/ko unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11996275B2 (en) | 2021-12-17 | 2024-05-28 | Samsung Electronics Co., Ltd. | Device for radical diagnostic in plasma processing chamber, radical diagnostic system having the same, and operating method thereof |
CN114942100A (zh) * | 2021-12-31 | 2022-08-26 | 西安交通大学 | 一种用于真空开关真空度检测的装置及方法 |
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