KR20170114194A - Apparatus of Vapor Deposition - Google Patents

Abstract

An apparatus for depositing an evaporation material on a surface of an object to be evaporated, the evaporation apparatus comprising: a vaporization device for physically vaporizing the evaporation material; And a fixing device for fixing the object to be coated in a state of being spaced apart from the deposition material by a predetermined distance. On an imaginary line connecting a certain point on the surface of the object from the deposition material in a straight line, There is no shield for controlling the thickness of the deposition material deposited on the surface and the thickness of the deposition material deposited on the surface of the object in proportion to the distance from the deposition material to an arbitrary point on the surface of the object Is thinned.
According to the present invention, there is no need for a separate shield to simplify and speed up the deposition operation, reduce the manufacturing cost of the apparatus, adjust the distance between the substrate and the deposition material and the mass of the deposition material to easily adjust the deposition thickness There is an effect that can be.

Description

[0001] Apparatus of Vapor Deposition [0002]

The present invention relates to a vapor deposition apparatus, and more particularly, to a vapor deposition apparatus which does not require a separate shielding material, simplifies and expedites the deposition work, reduces the manufacturing cost of the apparatus, adjusts the distance between the substrate and the deposition material, To a vapor deposition apparatus capable of easily controlling the vapor deposition apparatus.

BACKGROUND ART [0002] A panel-type base member made of synthetic resin is widely used as an interior member for interior decoration of a car or an exterior member for outdoor decoration of an automobile.

Since the base member has a monochromatic appearance and a simple monochromatic appearance, it is necessary to improve the aesthetics thereof. Vapor deposition may be used as one of such means.

A gradient deposition method using vacuum equipment is disclosed in Korean Patent Publication No. 10-0991131 (published on Nov. 1, 2010). The present invention relates to a gradient deposition method using a vacuum equipment, 4 and a metal target 1 as a deposition material so that atoms 5 protruding from the metal target 1 are shielded by the blocking member 7 when a voltage is applied to the metal target 1. [ 7, the amount of deposition on the workpiece 4 gradually decreases from the edge of the blocking member 7 to the center side, and is gradually reduced.

The above conventional gradient deposition method includes the blocking member 7 which is a shield which obstructs the atoms 5 protruding from the metal target 1 as a deposition material and it is necessary to install the blocking member 7 The complexity of the deposition operation increases the working time and increases the manufacturing cost of the deposition apparatus.

Since the blocking member 7 is disposed between the workpiece 4 as a substrate and the metal target 1 as a deposition material in the conventional gradient deposition method, There is a problem that difficulty may arise in the operation.

The object of the present invention is to solve the above problems, and it is an object of the present invention to provide a deposition apparatus and a deposition apparatus, which do not require any additional shielding, simplify and speed up the deposition operation, reduce the manufacturing cost of the apparatus, The present invention provides a vapor deposition apparatus having an improved structure capable of adjusting the deposition thickness easily by adjusting the thickness of the vapor deposition apparatus.

According to an aspect of the present invention, there is provided a vapor deposition apparatus for depositing an evaporation material on a surface of an object to be vapor-deposited, the apparatus comprising: a vaporization device for physically vaporizing the evaporation material; And a fixing device for fixing the object to be coated in a state of being spaced apart from the deposition material by a predetermined distance. On an imaginary line connecting a certain point on the surface of the object from the deposition material in a straight line, There is no shield for controlling the thickness of the deposition material deposited on the surface and the thickness of the deposition material deposited on the surface of the object in proportion to the distance from the deposition material to an arbitrary point on the surface of the object Is thinned.

Here, it is preferable that the substrate has a shape extending along a longitudinal direction by a predetermined length, and the deposition material is disposed close to one end of the substrate.

Here, the base member may include a base member having one or more fixing devices disposed on one surface thereof, and the base member may be vertically and vertically disposed on one side of the base member, and the deposition material may be disposed close to the upper end of the base material.

Here, it is preferable that the workpiece is disposed vertically to the base member.

Here, the substrate may be arranged to be inclined at an angle predetermined to the base member so that the upper end may be closer to or further away from the evaporation material as compared with the case where the substrate is erected perpendicular to the base member It is possible.

Here, it is preferable that the vaporizer includes a heating wire which is heated by electricity.

Here, the fixing device may include: a first fixing member; A second fixing member disposed at a predetermined distance from the first fixing member; And a connecting member for connecting the first fixing member and the second fixing member to each other, wherein one end of the substrate is coupled to the first fixing member, and the other end of the substrate is coupled to the second fixing member desirable.

Here, the first fixing member may include at least one first fixing portion on at least one concentric circle centered on a first central axis, and the second fixing member may include at least one At least one second fixed portion on the concentric circle, one end of the object is coupled to one of the first fixed portions, and the other end of the object is coupled to one of the second fixed portions desirable.

Here, the holding device revolves about a second central axis which is rotated about the first central axis and is disposed so as to be close to the deposition material, and the first central axis and the second central axis are spaced apart from each other by a predetermined interval It is preferable that they are parallel to each other.

Here, it is preferable that the fixing device revolves about a second central axis that is rotated about a first central axis spaced from the substrate by a predetermined distance, and is arranged to be close to the deposition material.

The deposition material may be a mixture of two or more materials having different melting points.

According to the present invention, there is provided a vaporization device for physically vaporizing a deposition material; And a fixing device for fixing the object in a state of being spaced apart from the deposition material by a predetermined distance. On an imaginary line connecting a certain point on the surface of the object from the deposition material in a straight line, Wherein a thickness of the evaporation material deposited on the surface of the substrate is proportional to a distance from the evaporation material to an arbitrary point on the surface of the substrate so that there is no shield for adjusting the thickness of the evaporation material deposited on the substrate, The thickness of the deposition material can be easily adjusted by controlling the distance between the object and the deposition material and the mass of the deposition material. It is effective.

1 is a perspective view of a vapor deposition apparatus according to an embodiment of the present invention.
FIG. 2 is a view showing a state in which the workpiece is vertically erected and arranged on the fixing device shown in FIG. 1. FIG.
Fig. 3 is a view showing a state in which the upper end of the substrate is disposed at an oblique position so as to be closer to the deposition material in the fixing device shown in Fig. 1. Fig.
FIG. 4 is a view showing a state in which the upper end of the substrate is disposed at an oblique position so as to be further away from the deposition material in the fixing device shown in FIG. 1;
FIG. 5 is a view for explaining a state in which a deposition material is deposited on an object vertically erected as shown in FIG.
6 is a view for explaining a state in which a deposition material is deposited on a substrate obliquely erected so that the upper end of the substrate can be closer to the deposition material as shown in FIG.
FIG. 7 is a view for explaining a state in which a deposition material is deposited on a workpiece obliquely erected so that the upper end of the workpiece may be further away from the deposition material as shown in FIG.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a perspective view of a vapor deposition apparatus according to an embodiment of the present invention, and FIG. 2 is a view illustrating a state in which a workpiece is vertically disposed on a fixing apparatus shown in FIG. Fig. 3 is a view showing a state in which the upper end of the substrate is disposed at an oblique position so as to be closer to the deposition material in the fixing device shown in Fig. 1. Fig.

1 to 3, a vapor deposition apparatus 100 according to a preferred embodiment of the present invention includes a deposition material M deposited on a surface of a substrate P, which is an object of vapor deposition in a vacuum state, Is a physical vapor deposition (PVD) apparatus for supplying a vapor to the substrate 10, and includes a base member 10, a vaporizer 20, and a holding device 30. The following description will be made on the assumption that the object P is a rod-shaped synthetic resin member extending by a predetermined length along the third central axis C3 in the longitudinal direction C3.

The base member 10 is a disk-shaped member having a hollow 11 and is rotatably disposed about a second central axis C2 which is the center of the hollow 11. [

The vaporizer 20 is a vaporizer for physically vaporizing the evaporation material M and includes a heating wire 21, an electrode 22, and a support member 23.

The heating wire 21 is provided as a plurality of filaments to be heated when electricity flows by having a predetermined resistance value and is disposed on a virtual circumference centered on the second central axis C2.

The heating wire 21 is arranged to be close to the upper end p1 of the work P within a predetermined distance and the deposition material M is attached to the surface of the heating wire 21. [

Therefore, the deposition material M is disposed to approach the upper end p1 of the work P within a predetermined distance.

The deposition material (M) is not particularly limited, and for example, only one kind of metal or metal oxide may be used, or a mixture of two or more metals or metal oxides having different melting points may be used. In this embodiment, the evaporation material M is manufactured by mixing two or more kinds of metals, metal oxides, or the like, which have different melting points.

The electrode 22 is an electrode for supplying direct current to the heating wire 21, and is provided in a plurality of "B" shape and disposed between a pair of adjacent heating wires 21.

Both ends of the electrode 22 are electrically connected to one end of the pair of adjacent heating wires 21, respectively.

The support member 23 is a rod member for supporting the electrode 22 and extends along the second central axis C2.

The upper end of the support member 23 is coupled to the middle portion of the electrode 22 and the lower end of the support member 23 is fixed to the bottom of the base member 10 through the hollow 11 .

The fixing device 30 is a device for fixing the object P in a state of being spaced apart from the evaporation material M by a predetermined distance and a plurality of the fixing devices 30 are arranged on the upper surface of the base member 10. The fixing device 30 includes a first fixing member 31, a second fixing member 32, a connecting member 33, and a jig 34.

The first fixing member 31 is a disc-shaped member having a first center axis C1 as the center of the winch and is disposed on the upper side of the upper end p1 of the object P.

The first fixing member 31 includes at least one first fixing part 311 on at least one concentric circle centered on the first central axis C1.

In this embodiment, the first fixing portion 311 is formed of a plurality of through holes 311a and 311b located on two concentric circles.

The second fixing member 32 is a disc-shaped member having a first central axis C1 as the center of the winch and is disposed below the lower end p2 of the object P.

The second fixing member 32 includes at least one second fixing portion 321 on at least one concentric circle centering on the first central axis C1.

In this embodiment, the second fixing portion 321 is formed of a plurality of through holes 321a and 321b located on two concentric circles.

The second fixing member 32 is disposed on the upper surface of the base member 10 with a predetermined distance downward from the first fixing member 31.

In the present embodiment, the second fixing member 32 is provided in the same shape as the first fixing member 31.

The connecting member 33 is a bar member elongated along the first central axis C1 and has an upper end coupled to a lower surface of the first fixing member 31 and a lower end connected to the second fixing member 32, And the first fixing member 31 and the second fixing member 32 are connected to each other.

The jig 34 is a member for supporting the object P and is a bar member elongated along a third central axis C3 which is the longitudinal direction C3 of the object P.

The upper end of the jig 34 is detachably coupled to the first fixing part 311 of the first fixing member 31 and the lower end of the jig 34 is coupled to the second fixing member 32 The upper end portion p1 of the workpiece P is detachably coupled to the first fixing member 31 and the lower end portion p2 of the workpiece P is detachably coupled to the fixing portion 321, And is detachably coupled to the second fixing member 32.

The upper end portion p1 of the workpiece P is coupled to one of the first fixing portions 311a and 311b and the lower end portion p2 of the workpiece P is coupled to one of the first fixing portions 311a and 311b, And is coupled to one of the second fixing portions 321a and 321b.

2, the upper end p1 of the object P is coupled to the first fixed portion 311a and the lower end p2 of the object P is coupled to the second fixed portion 321a , The workpiece P is vertically arranged vertically with respect to the base member 10 up and down.

3, the upper end p1 of the object P is coupled to the first fixed portion 311a and the lower end p2 of the object P is coupled to the second fixed portion 321b The base material 10 is formed so that the upper end p1 is closer to the evaporation material M than when the base material 10 is vertically erected with respect to the base material 10, As shown in Fig.

4, the upper end p1 of the object P is coupled to the first fixed portion 311b and the lower end p2 of the object P is coupled to the second fixed portion 321a The substrate P is prevented from being detached from the base member 10 so that the upper end p1 is further away from the deposition material M as compared with the case where the substrate P is vertically erected relative to the base member 10. [ By an angle? 2 that is predetermined with respect to the center of gravity.

The angles? 1 and? 2 are obtained by measuring an angle between the longitudinal direction C3 of the object P and the first central axis C1.

In this embodiment, the fixing device 30 is provided to rotate around the first central axis C1.

The first center axis C1 is parallel to the second center axis C2 in a predetermined distance from the second center axis C2 and is located on a virtual circumference centered on the second center axis C2 And a plurality of them are arranged.

Accordingly, the fixing device 30 revolves around the first central axis C1 and revolves around the second central axis C2. Here, the second central axis C2 is rotated about the first central axis C1, Is arranged closer to the evaporation material (M) than the first central axis (C1).

5, on an imaginary line connecting a certain point on the surface of the object P from the deposition material M in a straight line, the deposition material M is deposited on the surface of the object P, There is no shield to control the thickness of the material M. [

Here, the fixing device 30 may be temporarily blocked by the connecting member 33 in the process of rotating about the first central axis C1, And does not correspond to a shield for positively controlling the thickness of the deposition material M deposited on the surface of the deposition material M.

5, the evaporation material M vaporized by the heating line 21 is diffused in all directions, and the evaporation material M flying toward the object P flows in a direction Reaches the surface of the object P and is deposited. At this time, the deposition material M is deposited on the surface of the object P in proportion to the distance from the deposition material M to an arbitrary point on the surface of the object P to be thinned.

That is, since the point A in FIG. 5 is closest to the deposition material M, the thickness of the deposition material M deposited at the point A is the largest, and the point E in FIG. 5 is the farthest from the deposition material M Therefore, the thickness of the evaporation material M deposited at the E point is the thinnest, and the thickness of the evaporation material M gradually decreases from the point A to the points B, C, D, and E gradation deposition is performed.

In this embodiment, deposition is performed with an average deposition rate of 70% to 90% in the first region S1 between points A and B, and deposition is performed in the second region S2 between points B and C, A deposition having an average deposition rate of 70% to 70% is performed, and a deposition having an average deposition rate of 10% to 40% is performed in a third region S3 between points C and D, In the fourth region S4 between 0% and 10%. Here, the deposition rate of 100% is the same as the color of the deposition material (M), and the deposition rate of 0% means that no deposition is performed on the substrate (P). That is, a point having a deposition rate of 0%, the color of the object P is exposed without any damage.

The vapor deposition apparatus 100 of the above-described configuration includes a vaporizer 20 for physically vaporizing the deposition material M; And a fixing device 30 for fixing the object P in a state of being spaced apart from the deposition material M by a predetermined distance, wherein an arbitrary arbitrary position on the surface of the object P from the deposition material M, There is no shield for adjusting the thickness of the evaporation material M deposited on the surface of the object P and a virtual shielding line for shielding the evaporation material M from the evaporation material M P, the thickness of the deposition material M deposited on the surface of the object P is reduced in proportion to the distance to a certain point on the surface of the object P, so that a separate shielding is not needed, The manufacturing cost of the apparatus is reduced and the deposition thickness can be easily controlled by controlling the distance between the substrate P and the deposition material M and the mass of the deposition material M. [

The evaporation apparatus 100 has a shape in which the object P extends a predetermined length along a longitudinal direction C3 and the evaporation material M has a shape that is close to one end of the object P The thickness of the evaporation material M deposited gradually from the point A close to the evaporation material M to the point B, C, D, and E becomes gradually thinner as shown in FIG. 5, ) Deposition is possible.

The vapor deposition apparatus 100 includes a base member 10 having at least one fixing device 30 disposed on one surface thereof and the substrate P is mounted on one surface of the base member 10 vertically up and down And the evaporated material M is arranged close to the upper end p1 of the object P so that the chance material M is gradually lowered by the gravitational force and the longitudinal direction C3 of the object P ) Can be formed by a continuous gradation deposition.

5, the vapor deposition apparatus 100 is arranged such that the substrate P is vertically disposed with respect to the base member 10, so that the substrate P is supported on the holding apparatus 30 And the distance between the deposition material M and the surface of the object P can be easily adjusted.

6 and 7, the vapor deposition apparatus 100 may be configured such that the upper end p1 is closer to or further away from the evaporation material M as shown in Figs. 6 and 7, The gradation deposition can be performed differently from the case where it is erected vertically with respect to the base member 10 because gradation is arranged obliquely with respect to the member 10 by predetermined angles? 1 and? 2. That is, the lengths L1, L2, L3, and L4 of the areas S1, S2, S3, and S4 on the surface of the substrate P and the deposition thickness are different from those in the case where the deposition thickness is set perpendicular to the base member 10.

Since the vapor deposition apparatus 100 includes the heating wire 21 heated by the vaporization apparatus 20, the temperature of the heating wire 21 and the amount of heat generated by the vapor deposition apparatus 100 may be controlled, The vaporization rate of the vaporizer can be easily controlled.

The vapor deposition apparatus (100) is characterized in that the fixing device (30) comprises a first fixing member (31); A second fixing member (32) spaced from the first fixing member (31) by a predetermined distance; And a connecting member 33 connecting the first fixing member 31 and the second fixing member 32 to each other so that one end of the support P is coupled to the first fixing member 31, Since the other end of the object P is coupled to the second fixing member 32, there is an advantage that the fixing device 30 can be realized with a simple structure and a low cost.

The vapor deposition apparatus 100 is characterized in that the first fixing member 31 has at least one first fixing portion 311 on at least one concentric circle centering on a first central axis C1 , The second fixing member 32 includes at least one second fixing portion 321 on at least one concentric circle centering on the first central axis C1, And the other end of the object P is coupled to one of the second fixing parts 321 so that the object P is supported by the base member 10 by the predetermined angles? 1,? 2, as shown in FIG.

The vapor deposition apparatus 100 may further include a second center axis C2 disposed so as to rotate about the first center axis C1 and close to the deposition material M, And the first central axis C1 and the second central axis C2 are spaced apart from each other by a predetermined distance and are parallel to each other so that the entire surface of the plurality of objects P can be uniformly deposited There is an advantage.

In addition, since the vapor deposition apparatus 100 is a mixture of two or more materials having different melting points of the evaporation material M, it is possible to deposit colors mixed with the respective colors of the respective materials .

In this embodiment, the vapor deposition apparatus 100 includes a heating line 21 which is heated by electricity, and the vapor deposition apparatus 100 implements thermal evaporation. However, the vapor deposition apparatus 100 may be formed by sputtering, Other PVD (Physical Vapor Deposition) such as E-beam evaporation, L-MBE, Pulsed Laser Deposition (PLD), etc. may be realized to be.

The heating wire 21 and the electrode 22 are fixed to the upper end of the support member 23 but the heating wire 21 and the electrode 22 May be linearly movably coupled to the support member 23 along the second central axis C2.

The evaporation material M is disposed so as to be close to the upper end p1 of the work P within a predetermined distance but the height of the heating wire 21 can be freely adjusted to a desired position, It may be arranged so as to be close to the lower end p2 of the object P or close to the middle of the object P. When the height of the evaporation material M is changed, the shape of the gradient deposition is changed.

The technical scope of the present invention is not limited to the contents described in the above embodiments, and the equivalent structure modified or changed by those skilled in the art can be applied to the technical It is clear that the present invention does not depart from the scope of thought.

[Description of Reference Numerals]
100: vapor deposition apparatus 10: base member
11: hollow 20: vaporizer
21: heating wire 22: electrode
23: support member 30:
31: first fixing member 32: second fixing member
33: connecting member 34: jig
311: first fixing portion 321: second fixing portion
C1: first central axis C2: second central axis
C3: third central axis M: deposition material
P: Coating

Claims (11)

An apparatus for depositing an evaporation material on a surface of an object to be evaporated,
A vaporization device for physically vaporizing the deposition material;
And a fixing device for fixing the object in a state of being spaced apart from the deposition material by a predetermined distance,
There is no shield for controlling the thickness of the evaporation material deposited on the surface of the object on an imaginary line connecting the arbitrary point on the surface of the object from the evaporation material in a straight line,
Wherein a thickness of the evaporation material deposited on the surface of the substrate is reduced in proportion to a distance from the evaporation material to an arbitrary point on the surface of the substrate. The method according to claim 1,
Wherein the object has a shape extending along a longitudinal direction by a predetermined length,
Wherein the vapor deposition material is arranged close to one end of the substrate. 3. The method of claim 2,
And a base member on which one or more fastening devices are disposed,
Wherein the substrate is disposed vertically up and down on one surface of the base member, and the deposition material is disposed close to an upper end of the substrate. The method of claim 3,
Wherein the substrate is vertically disposed with respect to the base member. The method of claim 3,
Wherein the substrate is disposed obliquely upright at a predetermined angle with respect to the base member so that the top portion can be closer to or further away from the deposition material as compared with the case where the substrate is erected perpendicular to the base member Vapor deposition apparatus The method according to claim 1,
Characterized in that the vaporization apparatus comprises a heating line heated by electricity, The method of claim 1, wherein
The fixing device includes:
A first fixing member;
A second fixing member disposed at a predetermined distance from the first fixing member;
A connecting member connecting the first fixing member and the second fixing member to each other;
/ RTI >
Wherein one end of the substrate is coupled to the first holding member and the other end of the substrate is coupled to the second holding member. 8. The method of claim 7,
Wherein the first fixing member has at least one first fixing portion on at least one concentric circle centered on a first central axis,
Wherein the second fixing member has at least one second fixing portion on at least one concentric circle centered on the first central axis,
Wherein one end of the workpiece is coupled to one of the first fixed portions and the other end of the workpiece is coupled to one of the second fixed portions. 9. The method of claim 8,
Wherein the holding device revolves about a second central axis that is rotated about the first central axis and is disposed in proximity to the deposition material,
Wherein the first central axis and the second central axis are parallel to each other with a predetermined distance therebetween. The method according to claim 1,
The fixing device includes:
Characterized in that it revolves around a second central axis which is rotated about a first central axis spaced from the object by a predetermined distance and arranged so as to be close to the deposition material The method according to claim 1,
Wherein the vapor deposition material is a mixture of two or more materials having different melting points.

Images