KR20170059289A - Film touch sensor, touch panel and image display device comprising the same - Google Patents

Abstract

The present invention relates to a film touch sensor, a touch panel, and an image display apparatus including the same. More particularly, the present invention relates to a film touch sensor, a touch panel, and an image display device including the same. The film touch sensor includes a separation layer; an electrode pattern layer disposed on one side of the separation layer; and an optical film bonded to the other side of the separation layer via an adhesive layer. The adhesive layer has a thickness of 0.1 to 5 micrometer. The surface energy ratio of the separation layer, the adhesive layer and the optical film is 1:0.5 to 1.5:0.5 to 1.5. The generation of bubbles at each interface can be remarkably reduced, and a defective rate due to the generation of bubbles can be reduced.

Description

TECHNICAL FIELD [0001] The present invention relates to a film touch sensor, a touch panel, and an image display device including the touch panel.

The present invention relates to a film touch sensor, a touch panel, and an image display apparatus including the same.

There have been attempts to introduce a touch input method into a wider variety of electronic devices while the touch input method is being watched as a next generation input method. Accordingly, research and development on a touch sensor capable of being applied to various environments and capable of accurate touch recognition are actively performed have.

For example, in the case of an electronic device having a touch-type display, an ultra-thin flexible display which achieves light weight, low power and improved portability has been attracting attention as a next generation display, and development of a touch sensor applicable to such a display has been required.

Flexible display means a display made on a flexible substrate that can bend, bend or twist without loss of properties, and technology development is underway in the form of flexible LCDs, flexible OLEDs, and electronic paper. In order to apply the touch input method to such a flexible display, a touch sensor having excellent flexing and restoring force and excellent flexibility and stretchability is required.

As a method for realizing such flexible display manufacturing, studies on film touch sensors have been actively conducted, and in order to prevent defects of the touch panel provided with the film touch sensor, it is desired to reduce the occurrence of bubbles at each interface of the film touch sensor Is required.

Korean Patent Laid-Open Publication No. 2015-0016901 discloses a light-emitting device comprising a base film, a first hard coat layer formed on one side of the base film, a first transparent conductive layer formed in a predetermined pattern on one side of the first hard coat layer, And a first extraction pattern formed in a predetermined pattern on the first transparent conductive pattern and having a light shielding property and a conductivity, wherein the first transparent conductive pattern and the extraction pattern are formed by patterning the first transparent conductive layer and the first Shielding conductive layer is obtained by patterning a light-shielding conductive layer. However, an alternative to the above-described problems has not been proposed.

Korean Patent Publication No. 2015-0016901

An object of the present invention is to provide a film touch sensor capable of remarkably reducing the occurrence of bubbles at each interface of a film touch sensor by including a separation layer, an adhesive layer and an optical film having surface energy values within a specific numerical value range.

It is another object of the present invention to provide a touch screen panel including the above-mentioned film touch sensor and an image display apparatus including the touch screen panel.

1. separation layer;

An electrode pattern layer disposed on one side of the isolation layer; And

And an optical film adhered to the other side of the separation layer through an adhesive layer,

The thickness of the adhesive layer is 0.1 to 5 탆,

Wherein the adhesive layer, the separation layer, and the optical film have a surface energy ratio of 1: 0.5 to 1.5: 0.5 to 1.5.

2. The separator of claim 1, wherein the separating layer is selected from the group consisting of a polyimide-based polymer, a poly vinyl alcohol-based polymer, a polyamic acid-based polymer, a polyamide-based polymer, Based polymer, a polystyrene-based polymer, a polynorbornene-based polymer, a phenylmaleimide copolymer-based polymer, a polyazobenzene-based polymer, a polyphenylenephthalamide-based polymer, A polymer such as a polyester, a polymethyl methacrylate polymer, a polyarylate polymer, a cinnamate polymer, a coumarin polymer, a phthalimidine polymer, phthalimidine-based polymer, chalcone-based polymer, and aromatic acetylene-based polymer. Name touch sensor.

3. The film touch sensor of claim 1, wherein the separation layer is formed on and separated from the carrier substrate.

4. The film touch sensor according to 3 above, wherein the carrier substrate is a glass substrate.

5. The film touch sensor according to 1 above, wherein the electrode pattern layer is formed of at least one material selected from the group consisting of metal oxide materials, metals, metal nanowires, carbon-based materials, and conductive high-molecular materials.

6. The film touch sensor of claim 1, further comprising a first protective layer disposed between the separation layer and the electrode pattern layer.

7. The film touch sensor according to 1 above, wherein the surface energy of the separation layer is 30 to 80 mN / m, the surface energy of the adhesive layer is 20 to 70 mN / m, and the surface energy of the optical film is 40 to 90 mN / m.

8. The film touch sensor according to 1 above, wherein the surface energy of the separation layer is 40 to 70 mN / m, the surface energy of the adhesive layer is 20 to 60 mN / m, and the surface energy of the optical film is 50 to 80 mN / m.

9. The film touch sensor of claim 6, further comprising a second protective layer on the first protective layer on which the electrode pattern layer is disposed.

10. The film touch sensor of claim 9, further comprising an adhesive layer or an adhesive layer on the second protective layer.

11. The film touch sensor of claim 9, further comprising an optical film on the second protective layer.

12. The film touch sensor according to 11 above, wherein the optical film is a polarizing plate or a transparent film.

13. A touch screen panel comprising a film touch sensor of any one of claims 1 to 12.

14. An image display device comprising the touch screen panel of claim 13.

The film touch sensor of the present invention can suppress the occurrence of bubbles at each interface, thereby reducing the defective rate due to bubble generation.

1 is a schematic cross-sectional view of a film touch sensor according to an embodiment of the present invention.
FIGS. 2 to 8 are schematic views of a manufacturing process of a film touch sensor according to an embodiment of the present invention.
9 is an optical microscope photograph of a sample corresponding to the evaluation criterion? In the bubble generation experiment.

The present invention relates to a semiconductor device, An electrode pattern layer disposed on one side of the isolation layer; And an optical film adhered to the other side of the separation layer through an adhesive layer, wherein the adhesive layer has a thickness of 0.1 to 5 탆, a surface energy ratio of the separation layer, the adhesive layer and the optical film is 1: 0.5 to 1.5: 0.5 To 1.5, which can remarkably reduce the generation of bubbles at each interface and reduce the defective rate due to the generation of bubbles, and an image display apparatus including the same.

A film touch sensor according to an embodiment of the present invention includes a separation layer, an electrode pattern layer, an adhesive layer, and an optical film.

FIGS. 2 to 8 show a process for manufacturing a film touch sensor, and particularly, FIG. 1 is a cross-sectional view of a film touch sensor according to an embodiment of the present invention, and the present invention will be described in detail with reference to the drawings.

The carrier substrate 10 serves as a support for forming the separation layer 20 and the separation layer 20 is then peeled off from the carrier substrate 10 so that the carrier substrate 10 is not included in the configuration of the film touch sensor Do not.

The carrier substrate 10 may be used without any particular limitation if it is a material that provides adequate strength to be fixed without being bent or twisted during the process, and has little influence on heat or chemical treatment. For example, glass, quartz, silicon wafer, cloth, or the like may be used, and preferably a glass substrate can be used.

The separation layer 20 protects the electrode pattern layer 40 after separation, while allowing the manufactured film touch sensor to be easily separated from the carrier substrate 10.

The surface energy of the separation layer 20 may be, for example, 30 to 80 mN / m, preferably 40 to 70 mN / m. When the surface energy of the separating layer 20 is less than 30 mN / m, the wettability is low, and the application of the adhesive is not smooth at the time of forming the adhesive layer 70, so that the thickness of the adhesive layer 70 can be thick, The wettability with respect to the adhesive is very high, and it may be difficult to form the adhesive layer 70 having a sufficient thickness to exhibit sufficient adhesion.

There is no particular limitation on the surface energy of the separation layer 20 to be in the above range. Specifically, the composition and the content of the composition of the separation layer 20 may be adjusted, or plasma, corona, saponification (saponification) Or the like, and the like.

The separating layer 20 may be a polymer organic film. The separating layer 20 is not particularly limited as long as it can satisfy the surface energy. Examples of the separating layer 20 include a polyimide-based polymer, a polyvinyl alcohol-based polymer, A polyimide polymer, a polyamide polymer, a polyethylene polymer, a polystyrene polymer, a polynorbornene polymer, a phenylmaleimide copolymer, Based polymer, a polyazobenzene-based polymer, a polyphenylenephthalamide-based polymer, a polyester-based polymer, a polymethyl methacrylate-based polymer, a polyarylate-based polymer, A cinnamate-based polymer, a coumarin-based polymer, a phthalimidine-based polymer, a chalcone-based polymeric material, , Or an aromatic acetylene-based polymer, but the present invention is not limited thereto. These may be used alone or in combination of two or more.

The separation layer 20 is easily peeled off from the carrier substrate 10 and is separated from the separation layer 20, the first protection layer 30, the electrode pattern layer 40 and the second protection layer 50 A material having a peeling force against the carrier substrate 10 of 1 N / 25 mm or less, more preferably a material having a peeling force against the carrier substrate 10 of 0.1 N / 25 mm or less, .

The thickness of the separation layer 20 is not particularly limited as long as it does not deviate from the object of the present invention, and specifically may be 0.01 to 1 탆.

The electrode pattern layer 40 according to the present invention is disposed on either side of the separation layer 20. May be disposed on the isolation layer 20, or may be disposed on the upper side or the lower side of the isolation layer 20, and other structures may be disposed therebetween.

In an embodiment of the present invention, the electrode pattern layer 40 may be formed by applying a photosensitive resist on the conductive material layer disposed on one side of the isolation layer 20, developing and etching the same.

The conductive material forming the electrode pattern layer 40 is generally used in the art and is not particularly limited as long as it does not deviate from the object of the present invention. For example, indium tin oxide (ITO), indium zinc Indium tin oxide (ITO-Ag-ITO), indium tin oxide (IZTO), aluminum zinc oxide (AZO), gallium zinc oxide (GZO), florine tin oxide (FTO) (IZO-Ag-IZO), indium zinc tin oxide-silver-indium zinc-tin oxide (IZTO-Ag-IZTO) and aluminum zinc oxide- silver-aluminum zinc oxide -AZO); < / RTI > Metals selected from the group consisting of gold (Au), silver (Ag), copper (Cu), molybdenum (Mo) and APC; Nanowires of metals selected from the group consisting of gold, silver, copper and lead; Carbon-based materials selected from the group consisting of carbon nanotubes (CNT) and graphene; And a conductive polymer material selected from the group consisting of poly (3,4-ethylenedioxythiophene) (PEDOT) and polyaniline (PANI). Preferably, the material may be a metal oxide, a metal, have. These may be used alone or in combination of two or more.

The unit patterns of the electrode pattern layer 40 may be, for example, polygonal patterns of triangular, tetragonal, pentagonal, hexagonal, or hexagonal or more.

In addition, the electrode pattern layer 40 may include a regular pattern. A rule pattern means that the pattern form has regularity. For example, the unit patterns may include, independently of each other, a mesh shape such as a rectangle or a square, or a pattern such as a hexagon.

Further, the electrode pattern layer 40 may include an irregular pattern. The irregular pattern means that the shape of the pattern does not have regularity.

When the electrode pattern layer 40 is formed of a material such as a metal nanowire, a carbon-based material, or a polymer material, the electrode pattern layer 40 may have a network structure.

In the case of having a network structure, since signals are sequentially transmitted to adjacent patterns in contact with each other, a pattern having high sensitivity can be realized.

The thickness of the electrode pattern layer 40 is not particularly limited as long as it is within the range known in the art, and may be, for example, 0.01 to 0.2 탆.

If necessary, the film touch sensor of the present invention may further include a first protective layer 30 between the separation layer 20 and the electrode pattern layer 40.

The first protective layer 30 protects the electrode pattern layer 40 by covering the electrode pattern layer 40 in the same manner as the separation layer 20 and protects the electrode pattern layer 40 during the manufacturing process of the film touch sensor of the present invention. Thereby preventing the electrode pattern layer 40 from being exposed to the etchant.

As the first protective layer 30, a polymer known in the art can be used without limitation, for example, an organic insulating film material can be used.

The first passivation layer 30 may cover at least a part of the side surface of the isolation layer 20 to minimize the exposure of the side surface of the isolation layer 20 to the etchant during the process of patterning the electrode patterns and the like. The first protective layer 30 preferably covers all the side surfaces of the separation layer 20 in terms of completely blocking the exposure of the side surface of the separation layer 20. [

The thickness of the first protective layer 30 is not particularly limited, and is preferably 1 to 10 占 퐉 in terms of chemical resistance and flexibility.

If necessary, the film touch sensor according to an embodiment of the present invention may further include a second protective layer 50 on the first protective layer 30 on which the electrode pattern layer 40 is disposed.

The second protective layer 50 may be formed of an insulating material and may be formed to cover the conductive pattern to electrically isolate each pattern of the conductive pattern layer 40. However, in order to secure an electrical connection space for electrically connecting the conductive pattern to the circuit board or the like, to prevent defective junction at the time of bonding the base film, to secure flexibility, and to prevent breakage of the conductive pattern, As shown in FIG.

The second protective layer 50 may itself serve as a substrate and serve as a passivation layer. In addition, corrosion of the electrode pattern layer 40 is prevented, and the surface is planarized, so that generation of minute bubbles can be suppressed when the optical film 90 is adhered. It can also serve as an adhesive layer.

The second protective layer may be a single layer or a plurality of layers of two or more layers.

When the second protective layer 50 serves as a substrate, a silicone-based polymer such as polydimethylsiloxane (PDMS) or polyorganosiloxane (POS); Polyimide-based polymers; Polyurethane-based polymers, and the like, but the present invention is not limited thereto. These may be used alone or in combination of two or more.

As the second protective layer 50 according to the present invention, an insulating material known in the art may be used without limitation, and for example, a photosensitive resin composition or a thermosetting resin composition containing a metal oxide such as silicon oxide or an acrylic resin May be formed in a necessary pattern. Or silicon oxide (SiOx). In this case, it may be formed by vapor deposition, sputtering or the like.

When the second protective layer 50 serves as an adhesive layer, a thermosetting or photocurable adhesive or adhesive known in the art can be used without limitation. For example, thermosetting or photo-curable pressure-sensitive adhesives or adhesives such as polyester-based, polyether-based, urethane-based, epoxy-based, silicone-based or acrylic-

The thickness of the second protective layer 50 is not particularly limited, and is preferably 1 to 10 μm from the viewpoint of ensuring corrosion resistance, flatness and flexibility.

The film touch sensor of the present invention includes an adhesive layer 70 so that a base film 80 to be described later can be attached to the separation layer 20 and the separation layer 20 in which the electrode pattern layer 40 is not disposed, As shown in FIG.

The surface energy of the adhesive layer 70 may be, for example, 20 to 70 mN / m, preferably 20 to 60 mN / m. If the surface energy of the adhesive layer 70 is less than 20 mN / m, the adhesive layer 70 may not be smoothly applied at the time of forming the adhesive layer 70, and if the surface energy of the adhesive layer 70 is more than 70 mN / m, The wettability is very high, and it may be difficult to form the adhesive layer 70 having a sufficient thickness to exhibit sufficient adhesive strength.

The surface energy of the adhesive layer 70 is within the above-mentioned range. Specifically, the surface energy of the adhesive layer 70 can be adjusted by adjusting the composition and content of the composition of the adhesive layer 70. [

The adhesive layer 70 is generally used in the art, and the composition and the content of the composition for forming the adhesive layer are not particularly limited within the scope of the present invention, and from the viewpoints of weatherability and polymerizability, A compound, an acrylic oligomer, a photo radical polymerization initiator, and the like.

Examples of the photo-radical polymerizable compound include ethyl acrylate, methyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, butyl acrylate, isobutyl acrylate, allyl methacrylate, 2- (Meth) acrylate, hydroxypropyl (meth) acrylate, isopropyl (meth) acrylate, isopropyl (meth) acrylate, isopropyl (Meth) acrylate, stearyl (meth) acrylate, tetrapuryl (meth) acrylate, phenoxy (meth) acrylate, isobutyl Monofunctional monomers such as ethyl (meth) acrylate, octadecyl methacrylate, isobornyl (meth) acrylate, tetrahydrofuryl acrylate, and acryloylmorpholine; Butanediol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, bisphenol A- (Meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, propylene glycol di Acrylate, dicyclopentanyl di (meth) acrylate, caprolactone modified dicyclopentenyl (meth) acrylate, ethylene oxide modified phosphoric acid (meth) acrylate, tripropylene glycol di (meth) acrylate, neopentyl glycol di (Meth) acrylates such as di (meth) acrylate, bis (2-hydroxyethyl) isocyanurate di (meth) acrylate, di (acryloxyethyl) isocyanurate, allyl cyclohexyldi A bifunctional monomer such as trimethylolpropane diacrylate, neopentyl glycol-modified trimethylolpropane diacrylate, and adamantanediacrylate, such as dimethylolcyclohexane diacrylate, dimethylolcyclohexane diacrylate, dimethylolcyclohexane diacrylate, ; (Meth) acrylate such as trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol tri (meth) acrylate, propionic acid modified dipentaerythritol tri Trifunctional monomers such as tri (meth) acrylate, tris (2-hydroxyethyl) isocyanurate tri (meth) acrylate, tris (acryloxyethyl) isocyanurate, glycerol tri ; Tetrafunctional monomers such as diglycerin tetra (meth) acrylate, pentaerythritol tetra (meth) acrylate, and ditrimethylol propane tetra (meth) acrylate; Pentafunctional monomers such as propionic acid-modified dipentaerythritol penta (meth) acrylate; And hexafunctional monomers such as dipentaerythritol hexa (meth) acrylate and caprolactone-modified dipentaerythritol hexa (meth) acrylate. These may be used alone or in admixture of two or more.

The acrylic oligomer may be an oligomer polymerized by incorporating at least one photo-radical polymerizable compound.

The photo radical polymerization initiator is not particularly limited, and examples thereof include radical photopolymerization initiators such as acetophenone, benzophenone, thioxanthone, benzoin and benzoin alkyl ether. These may be used alone or in combination of two or more.

Specific examples thereof include acetophenone, hydroxydimethylacetophenone, dimethylaminoacetophenone, dimethoxy-2-phenylacetophenone, 3-methylacetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2- Methoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 4-hydroxycyclophenyl ketone, Propan-1-one, 4- (2-hydroxyethoxy) phenyl-2-methyl-1- - (hydroxy-2-propyl) ketone, benzophenone, p-phenylbenzophenone, 4,4-diaminobenzophenone, 4,4'-diethylaminobenzophenone, dichlorobenzophenone, anthraquinone, 2- Anthraquinone, 2-ethyl anthraquinone, 2-t-butyl anthraquinone, 2-amino anthraquinone, 2-methyl thioxanthone, 2-ethyl thioxanthone, 2-chlorothioxanthone, Oxanone, 2,4-diethylthioxanthone, benzoin, benzoin methyl ether, Benzoin ethyl ether, benzoin isopropyl ether, benzoin-n-butyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, diphenyl ketone benzyl dimethyl ketal, acetophenone dimethyl ketal, p- 4,6-trimethylbenzoyldiphenylphosphine oxide, fluorene, triphenylamine, carbazole, and the like, but are not limited thereto.

The available products available on the market include darocur 1173, darocur 4265, darocur BP, darocur TPO, darocur MBF, iracacure 184, irgacure 500, irgacure 2959, irgacure 754, irgacure 651, irgacure 369, irgacure 907, irgacure 1300, irgacure 754, 819, irgacure 2022, irgacure 819DW, irgacure 2100, irgacure 784, irgacure 250, and the like. These may be used alone or in combination of two or more.

The content of the photopolymerization initiator is not particularly limited and may be, for example, 0.5 to 10 parts by weight based on 100 parts by weight of the photopolymerizable compound. When the content is within the above range, it has a proper curing rate and has excellent durability.

The thickness of the adhesive layer 70 is 0.1 to 5 占 퐉. It is possible to suppress the occurrence of bubbles at the interface between the separation layer and the adhesive layer of the film touch sensor and at the interface between the adhesive layer and the optical film within the above range. If the thickness of the adhesive layer 70 is relatively large within a range of 0.1 to 5 占 퐉 (for example, 3.5 占 퐉 or more, especially 4 占 퐉 or more), defects such as bubbles caused by the thickness of the adhesive layer 70 are hardly observed The manufacturing cost can be increased, and it is required to be as thin as possible within the above-mentioned range. Therefore, the thickness of the adhesive layer 70 is preferably 0.1 to 4 占 퐉, more preferably 0.5 to 3.5 占 퐉, from the viewpoint of ensuring the adhesion, suppressing the generation of bubbles, and maintaining flexibility.

The film touch sensor of the present invention includes a substrate film 80 bonded to the other surface of the separation layer 20 via an adhesive layer 70.

The surface energy of the base film 80 may be, for example, 40 to 90 mN / m, preferably 50 to 80 mN / m. When the surface energy of the base film 80 is less than 40 mN / m, the adhesive layer 70 may not be smoothly applied at the time of forming the adhesive layer 70, and if the surface energy of the base film 80 is more than 90 mN / m, The wettability is very high, and it may be difficult to form the adhesive layer 70 having a sufficient thickness to exhibit sufficient adhesive strength.

The surface energy of the base film 80 may be adjusted to the above range. For example, the surface of the base film 80 is treated with a surface treatment method such as plasma, corona or saponification Can be implemented. More specifically, the surface energy can be changed by varying the corona output, the treatment speed, and the like during the corona treatment, and the surface energy can be changed by varying the concentration, temperature, treatment time, etc. of the saponifying solution at the time of saponification .

The polymer constituting the substrate film 80 is well known in the art and is not particularly limited as long as it is within the scope of the present invention and specifically includes polyethylene terephthalate (PET), triacetyl cellulose (TAC) Examples thereof include cyclic olefin polymer (COP), polycarbonate (PC), polymethyl methacrylate (PMMA), polyimide (PI) and the like. If it does not have a surface energy value according to the invention, it can be subjected to surface treatment. Examples of the surface treatment include a saponification treatment, a corona treatment, and a plasma treatment.

The thickness of the base film 80 is not particularly limited as long as it does not deviate from the object of the present invention. Concretely, the thickness of the base film 80 is in the range of 1 to 100 탆, and it is easy to handle in the process, It is preferable from the viewpoint of being able to do.

In the film touch sensor of the present invention, the surface energy of the separation layer, the adhesive layer, and the optical film has a ratio of 1: 0.5 to 1.5: 0.5 to 1.5. When the surface energy ratio is within the above range, the adhesive composition can be smoothly applied at the time of forming the adhesive layer 70, and an excellent adhesion and an appropriate thickness can be realized without generating bubbles.

The film touch sensor according to an embodiment of the present invention may further include an optical film 90 attached on the second protective layer 50.

As the optical film 90, a transparent film made of a material widely used in the art can be used without limitation, for example, a cellulose ester (e.g., cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate Propionate, and nitrocellulose), polyimides, polycarbonates, polyesters such as polyethylene terephthalate, polyethylene naphthalate, poly-1,4-cyclohexanedimethylene terephthalate, polyethylene 1,2-diphenoxyethane 4,4'-dicarboxylate and polybutylene terephthalate, polystyrenes such as syndiotactic polystyrenes, polyolefins such as polypropylene, polyethylene and polymethylpentene, polysulfone, polyethersulfone , Polyarylate, polyether-imide, polymethylmethacrylate, polyetherketone, It may be a polyvinyl alcohol and polyvinyl film made of a single or a mixture selected from the group consisting of chloride.

Further, the transparent film may be an isotropic film or a retardation film.

Nx and ny are the main indices of refraction in the film plane, nz is the refractive index in the film thickness direction, d is the film thickness) is 40 nm or less, and 15 nm And the retardation in the thickness direction (Rth, Rth = [(nx + ny) / 2-nz] xd) is from -90 nm to +75 nm, preferably -80 nm to +60 nm, desirable.

The retardation film is a film produced by the uniaxial stretching, biaxial stretching, polymer coating and liquid crystal coating method of a polymer film, and is generally used for improving the viewing angle of the display, improving the color feeling, improving the light leakage, do.

Further, a polarizing plate may be used for the optical film (90).

The polarizing plate may be one having a polarizer protective film attached on one side or both sides of a polyvinyl alcohol polarizer.

Further, a protective film may be used for the optical film (90).

The protective film may be a film including an adhesive layer on at least one side of a film made of a polymer resin, or a self-adhesive film such as polypropylene, and may be used for protecting the surface of the touch sensor and improving the process precision. If the protective film includes an adhesive layer or has a self-adhesive property, the adhesive layer 60 may be omitted.

A flame treatment, a plasma treatment, an ultraviolet ray irradiation, a primer coating treatment, and a coating treatment are performed on the surface of the base film in order to improve the adhesion between the optical film 90 and the second protective layer 50, A surface treatment such as saponification treatment can be carried out.

The light transmittance of the optical film 90 is preferably 85% or more, and more preferably 90% or more. The haze value of the optical film 90 measured in accordance with JIS K7136 is preferably 10% or less, and more preferably 7% or less.

The thickness of the optical film 90 is not limited, but is preferably 30 to 200 占 퐉, more preferably 30 to 100 占 퐉.

The present invention also provides a touch screen panel including the film touch sensor, and an image display device including the touch screen panel.

The touch screen panel of the present invention is applicable not only to a conventional liquid crystal display but also to various image display devices such as an electroluminescence display device, a plasma display device, and a field emission display device. It can be particularly usefully applied to an image display device having a flexible characteristic.

The present invention also provides a method of manufacturing a film touch sensor.

FIGS. 2 to 8 are schematic views illustrating a manufacturing process of a film touch sensor according to an embodiment of the present invention. Hereinafter, a method of manufacturing the film touch sensor of the present invention will be described with reference to FIGS.

According to an embodiment of the present invention, a separation layer 20 is formed on a carrier substrate 10 as shown in FIG.

As the carrier substrate 10, the above-described substrate can be used.

The separation layer 20 can be formed of the above-described polymer material.

Preferably, the separating layer 20 may have a peeling force of 1 N / 25 mm or less, preferably 0.1 N / 25 mm or less, from the viewpoint of minimizing physical damage to the carrier substrate 10.

The method of forming the separation layer 20 is not particularly limited and may be a slit coating method, a knife coating method, a spin coating method, a casting method, a micro gravure coating method, a gravure coating method, a bar coating method, A dip coating method, a spray coating method, a screen printing method, a gravure printing method, a flexo printing method, an offset printing method, an ink jet coating method, a dispenser printing method, a nozzle coating method, Can be done.

After the separation layer 20 is formed by the above-described method, an additional curing process may be further carried out.

The curing method of the separating layer 20 is not particularly limited, and it is possible to use both of the above methods by photocuring or thermosetting. The order of the photo-curing and the thermal curing is not particularly limited.

As the curing condition, for example, in the case of thermosetting, it can be carried out at 50 to 300 ° C for 1 minute to 60 minutes, preferably at 100 to 200 ° C for 5 to 30 minutes. In the case of photo-curing, UV irradiation at 0.01 to 10 J / cm ² can be performed for 1 second to 500 seconds, preferably UV irradiation at 0.05 to 1 J / cm ² for 1 second to 120 seconds, but the present invention is not limited thereto .

Thereafter, as shown in FIG. 3, the first passivation layer 30 may be formed on the isolation layer 20, if necessary.

The first protective layer 30 may be formed of the above-described material, and the method of forming the first protective layer 30 is not particularly limited, and the same method as the method of forming the separation layer 20 may be used.

The first protective layer 30 may be formed to cover at least a part of the side surface of the isolation layer 20 so as to minimize the exposure of the side surface of the isolation layer 20 to the etchant during the patterning process, have. The first protective layer 30 may be formed so as to cover all the side surfaces of the isolation layer 20 in terms of completely blocking the exposure of the side surface of the isolation layer 20. [

4, when the first protective layer 30 is provided on the upper surface of the separation layer 20 of the touch film sensor, the electrode pattern layer (not shown) may be formed on the first protective layer 30, 40 may be formed.

The electrode pattern layer 40 may be formed of the above-described metal oxide materials, metals, nanowires, carbon-based materials, and polymeric materials.

The method of forming the electrode pattern layer 40 is not particularly limited and may be specifically a physical vapor deposition method, a sputtering method, a chemical vapor deposition method, a plasma deposition method, a plasma polymerization method, a thermal vapor deposition method, a thermal oxidation method, A printing method, a gravure printing method, a flexo printing method, an offset printing method, an ink jet coating method, a dispenser printing method, and the like.

In the case of the unit pattern formation in the electrode pattern layer 40, photoetching can be used.

In the photoetching method, a photoresist is coated on a layer to be patterned, the applied photoresist is selectively cured using a mask, the uncured photoresist is developed and removed, and then etched to form a pattern, And a pattern is formed through a series of processes known in the art for removing the cured photoresist.

In the case of a photoresist, it can be classified into a positive type photoresist and a negative type photoresist. In the case of a positive type, it is a photoresist which becomes soluble in a developing solution upon UV exposure. In the case of a negative type, it is insoluble Lt; / RTI >

Therefore, when a positive type is used, a portion exposed to UV can be developed, and a pattern can be formed through a subsequent process. In the case of a negative type, a portion not exposed to UV is developed, .

The conditions for curing the photoresist are not particularly limited. For example, UV of 0.01 to 10 J / cm ² can be irradiated for 1 second to 500 seconds, preferably UV of 0.05 to 1 J / cm ² for 1 second to It can be irradiated for 120 seconds.

According to an embodiment of the present invention, the method may further include forming a second passivation layer 50 on the first passivation layer 30 on which the electrode pattern layer 40 is formed.

The second protective layer 50 may itself serve as a substrate, or as a passivation layer. In addition, corrosion of the electrode pattern layer 40 is prevented, and the surface is planarized, so that generation of minute bubbles can be suppressed when the optical film 90 is adhered. It can also serve as an adhesive layer.

The second protective layer 50 may be formed of the above-described polymer or the above-mentioned pressure-sensitive adhesive or adhesive.

In the case where the second protective layer 50 is a polymer layer, the present invention may include the steps of attaching a pressure-sensitive adhesive layer 60 on the second protective layer 50 as shown in FIG. 7, (90). ≪ / RTI >

The optical film 90 may be a film made of the above-mentioned material, or a polarizing plate, a retardation film, or a protective film.

The polarizing plate may be one having a polarizer protective film attached on one side or both sides of a polyvinyl alcohol polarizer.

The optical film 90 can be attached under pressure, and the pressure range to be applied is not particularly limited, and can be, for example, 1 to ²⁰⁰ kg / cm ² , and preferably 10 to 100 kg / cm ² .

In order to improve the adhesion between the optical film 90 and the second protective layer 50 at the time of attaching the optical film 90, the surface to which the optical film 90 is adhered is subjected to a corona treatment, a flame treatment, a plasma treatment, Surface treatment such as irradiation, primer coating treatment and saponification treatment can be carried out.

Thereafter, the separation layer 20 is peeled from the carrier substrate 10 as shown in Fig.

The separating layer 20 remains on the film touch sensor side without being removed even after the peeling, and can serve as a covering for protecting the electrode pattern layer 40.

According to an embodiment of the present invention, after the separation layer 20 is peeled from the carrier substrate 10, an adhesive layer 70 is formed on the separation layer 20, The adhesive layer 70 may be formed on one surface of the base film 80 and then the adhesive layer 70 may be adhered to the separating layer 20 to form the adhesive layer 70, A film touch sensor can be manufactured.

The adhesive layer 70 may be formed of the composition for forming an adhesive layer as described above, and the base film 80 may be formed of the materials described above. It can be bonded under pressure at the time of bonding the base film 80 and the separation layer 20, and the pressure range to be applied is not particularly limited as long as it does not deviate from the object of the present invention.

It is to be understood that both the foregoing general description and the following detailed description of the present invention are exemplary and explanatory and are intended to be illustrative of the invention and are not intended to limit the scope of the claims. It will be apparent to those skilled in the art that such variations and modifications are within the scope of the appended claims.

Example  And Comparative Example

The composition described in the following Table 1 was coated on a soda-lime glass having a thickness of 700 mu m so as to have a dry thickness corresponding to the thickness and cured to form a separation layer.

Thereafter, 15 parts by weight of ZAK-115 of Soken Chemical Co., Ltd., 4 parts by weight of a urea curing agent as a curing agent, 0.5 parts by weight of DIC F-554 and 0.5 parts by weight of Shin-Etsu KBM-403 as a polymer resin were mixed with propylene glycol monomethyl ether Acetate and a mixed solvent of 20 parts by weight of propylene glycol monomethyl ether was coated on the separating layer and cured at 180 캜 for 30 minutes to form a first protective layer having a thickness of 2 탆.

Then, an ITO layer having a thickness of 0.05 탆 was formed on the first passivation layer by a vacuum evaporation method, a photosensitive photoresist was applied on the ITO layer, and exposed, developed and etched to form an electrode pattern layer.

Thereafter, a positive photoresist (AZ LExp.S03-032, AGM Korea) was coated on the first protective layer on which the electrode pattern layer was formed, followed by curing and patterning to form a second protective layer having a thickness of 2 m, 2 A polyethylene terephthalate base material (base film) having a thickness of 38 탆 and an acrylic adhesive layer formed on the protective layer was attached.

Thereafter, the glass substrate was peeled off from the separating layer and the upper laminate in a temperature environment of 25 占 폚, the adhesive layer shown in Table 1 below was formed on the lower part of the separating layer, and the optical film of the following Table 1 was bonded to the lower part of the adhesive layer, A film touch sensor was fabricated.

In the case of the cycloolefin polymer (COP) film, the optical film was treated at a corona output of 500 mW and a treatment rate of 1.5 m / min to obtain a surface energy of 42 mN / m, a corona output of 600 mW and a treatment rate of 2.0 m / Was 59 mN / m.

The surface of the triacetyl cellulose (TAC) film was treated at a KOH concentration of 4.5 N, a solution temperature of 45 캜 and a treatment time of 65 seconds to treat the surface of the film with a surface energy of 74 mN / m, a KOH concentration of 4.5 N, The energy was 85 mN / m, the KOH concentration was 4.5 N, the liquid temperature was 45 캜, and the treatment time was 105 seconds to obtain a surface energy of 88 mN / m.

division Separation layer
(A) Adhesive layer
(B) Optical film
(C) ingredient thickness
(탆) Surface energy
(mN / m) ingredient thickness
(탆) Surface energy
(mN / m) Kinds thickness
(탆) Surface energy
(mN / m) Example 1 A-1 0.3 53 B-1 2 57 COP 50 59 Example 2 A-2 0.1 45 B-1 One 57 COP 50 59 Example 3 A-1 0.9 53 B-1 4 57 TAC 20 74 Example 4 A-3 0.3 74 B-1 2 57 TAC 80 85 Example 5 A-4 0.3 33 B-2 2 28 COP 13 42 Example 6 A-2 0.1 45 B-1 2 57 TAC 80 85 Comparative Example 1 A-4 0.3 33 B-1 7 57 COP 13 42 Comparative Example 2 A-1 0.3 53 B-1 0.2 57 COP 50 59 Comparative Example 3 A-3 0.3 74 B-2 2 28 COP 50 59 Comparative Example 4 A-2 0.1 45 B-1 One 57 TAC 50 88 Comparative Example 5 A-5 0.3 25 B-1 2 57 COP 50 59 Comparative Example 6 A-1 0.3 53 B-3 2 85 COP 13 42 A-1: 5% of polyarylate (Unitica, M-2000H), 95% of solvent cyclohexanone,
A-2: 5% of polyarylate (Unitica, M-2040), 95% of solvent cyclohexanone,
A-3: 1% of polyamic acid (Chemfield, T-100), 99% of solvent dimethylacetamide
A-4: Polymethyl methacrylate (Microchem, 495 PMMA A4)
A-5: 3% of polystyrene (Aldrich I, Mw 35,000), solvent toluene 97%
B-1: UV-NS063 (synthesized in Japan)
B-2: MA21 (Mei Sho)
B-3: SKA-BL80 (Shin Kwang Chemical Industry)

Experimental Example . Check for bubbles

The film touch sensors of Examples and Comparative Examples were observed with an optical microscope at an enlargement magnification of 100 times to confirm whether or not microbubbles were generated and evaluated according to the following criteria. FIG. 9 shows an optical microscope photograph of a sample corresponding to the evaluation criterion ?.

○: No fine bubbles

?: Slight microbubbles were slightly generated

X: Large amount of fine bubbles

division Example Comparative Example One 2 3 4 5 6 One 2 3 4 5 6 bubble
Occur
Whether ○ ○ ○ △ △ △ X X X X X X

Referring to Table 2, it can be seen that the film touch sensor of the present invention is particularly advantageous for reducing the generation of bubbles at the interface between the separation layer and the adhesive layer and at the interface between the adhesive layer and the optical film.

10: carrier substrate
20: Separation layer
30: First protective layer
40: electrode pattern layer
50: second protective layer
60:
70: Adhesive layer
80: Optical film
90: base film

Claims (14)

A separation layer;
An electrode pattern layer disposed on one side of the isolation layer; And
And an optical film adhered to the other side of the separation layer through an adhesive layer,
The thickness of the adhesive layer is 0.1 to 5 탆,
Wherein the adhesive layer, the separation layer, and the optical film have a surface energy ratio of 1: 0.5 to 1.5: 0.5 to 1.5.
[3] The method of claim 1, wherein the separation layer is formed of a material selected from the group consisting of a polyimide-based polymer, a polyvinyl alcohol-based polymer, a polyamic acid-based polymer, a polyamide-based polymer, A polymer such as a polystyrene type polymer, a polynorbornene type polymer, a phenylmaleimide copolymer type polymer, a polyazobenzene type polymer, a polyphenylenephthalamide type polymer, A polymer such as a polyester type polymer, a polymethyl methacrylate type polymer, a polyarylate type polymer, a cinnamate type polymer, a coumarin type polymer, a phthalimidine type polymer, Based polymer, a chalcone-based polymer, and an aromatic acetylene-based polymer. , Film touch sensor.
The film touch sensor of claim 1, wherein the separation layer is formed on and separated from the carrier substrate.
The film touch sensor according to claim 3, wherein the carrier substrate is a glass substrate.
The film touch sensor of claim 1, wherein the electrode pattern layer is formed of at least one material selected from the group consisting of metal oxide materials, metals, metal nanowires, carbon-based materials, and conductive high-molecular materials.
The film touch sensor of claim 1, further comprising a first passivation layer between the isolation layer and the electrode pattern layer.
The film touch sensor according to claim 1, wherein the surface energy of the separation layer is 30 to 80 mN / m, the surface energy of the adhesive layer is 20 to 70 mN / m, and the surface energy of the optical film is 40 to 90 mN / m.
The film touch sensor according to claim 1, wherein the surface energy of the separation layer is 40 to 70 mN / m, the surface energy of the adhesive layer is 20 to 60 mN / m, and the surface energy of the optical film is 50 to 80 mN / m.
7. The film touch sensor of claim 6, further comprising a second protective layer on a first protective layer on which the electrode pattern layer is disposed.
The film touch sensor of claim 9, further comprising an adhesive layer or an adhesive layer on the second protective layer.
The film touch sensor of claim 9, further comprising an optical film on the second protective layer.
12. The film touch sensor according to claim 11, wherein the optical film is a polarizing plate or a transparent film.
A touch screen panel comprising the film touch sensor of any one of claims 1 to 12.
An image display device comprising the touch screen panel of claim 13.

Images