KR20170040735A - A fluorene-based compound, and a method for preparing the fluorene-based compound - Google Patents

A fluorene-based compound, and a method for preparing the fluorene-based compound Download PDF

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KR20170040735A
KR20170040735A KR1020160093247A KR20160093247A KR20170040735A KR 20170040735 A KR20170040735 A KR 20170040735A KR 1020160093247 A KR1020160093247 A KR 1020160093247A KR 20160093247 A KR20160093247 A KR 20160093247A KR 20170040735 A KR20170040735 A KR 20170040735A
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fluorene
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heteroaryl
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구오팡 왕
요헤이 오노
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제이엔씨 주식회사
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Abstract

Provided in the present invention is a novel fluorene-based compound which has improved purity and reaction efficiency, and can be used to produce high-purity or inexpensive materials required for organic EL devices. According to the present invention, a compound having a fluorene structure represented by chemical formula (I) is obtained by reacting an OH precursor having a structure represented by chemical formula (II) in the molecule thereof in the presence of a catalyst support and an acid, and/or in the presence of a fixed bed catalyst. A^1 and A^2 are each independently an alkyl group, an aryl group, or a heteroaryl group, which may be optionally substituted, and A^1 and A^2 may bond to form a ring.

Description

플루오렌계 화합물 및 플루오렌계 화합물의 제조방법{A FLUORENE-BASED COMPOUND, AND A METHOD FOR PREPARING THE FLUORENE-BASED COMPOUND}FIELD OF THE INVENTION [0001] The present invention relates to a fluorene-based compound, a fluorene-based compound, and a fluorene-based compound.

본 발명은, 신규한 플루오렌계 화합물 및 플루오렌계 화합물의 제조방법에 관한 것이다.The present invention relates to a novel fluorene-based compound and a process for producing the fluorene-based compound.

최근, 유기전계 발광소자의 발광재료 등에 이용하는 화합물로서, 또한 보다 복잡한 화학구조를 갖는 재료를 제조하기 위한 중간체로서, 플루오렌 골격을 갖는 화합물이나 불소 등의 활성기를 갖는 플루오렌계 화합물이 검토되고 있다.
Recently, a compound having a fluorene skeleton or a fluorene-based compound having an active group such as fluorine has been studied as an intermediate for producing a material having a more complicated chemical structure as a compound used in a light emitting material or the like of an organic electroluminescent device .

예를 들어, 유기 일렉트로닉스 재료로서, 강한 전자흡인기인 불소원자로 플루오렌환의 1, 3, 4, 5, 6, 8위(位)를 치환한 화합물이, 높은 전자수용능을 갖는 것이 알려져 있다(일본특허공개 2009-249355호 공보). 이 문헌에서는, 이 화합물을 제조하기 위한 원료로서 플루오렌을 이용하고 있으며, 플루오렌 골격을 제조하는 방법에 대해서는 설명되어 있지 않다.
For example, it is known that compounds substituted with 1, 3, 4, 5, 6, and 8-positions of a fluorene ring as a strong electron withdrawing group as an organic electronic material have a high electron accepting ability Patent Publication No. 2009-249355). In this document, fluorene is used as a raw material for producing this compound, and a method for producing a fluorene skeleton is not described.

플루오렌 골격을 제조하려면, 예를 들어 비페닐의 알코올체를 기질(OH전구체라고도 함)로 하여, 하이드록시메틸렌으로 환을 말게 하는 방법이 알려져 있다(일본특허공개 2012-211089호 공보). 이 문헌에서는, 모노할로겐 치환 플루오렌계 화합물을 보다 간편한 방법으로 제조하는 것을 목적으로 하고 있으며, 여기에 기재되어 있는 바와 같이, OH전구체에 대하여 산만을 반응시켜 목적 화합물을 얻는 것에 성공하고 있다.To prepare a fluorene skeleton, for example, a method in which an alcoholic form of biphenyl is used as a substrate (also referred to as an OH precursor) to make a ring with hydroxymethylene is known (Japanese Patent Application Laid-Open Publication No. 2012-211089). This publication aims at producing a monohalogen-substituted fluorene compound by a simpler method, and succeeds in obtaining a target compound by reacting an OH precursor with a distillate as described herein.

일본특허공개 2009-249355호 공보Japanese Patent Application Laid-Open No. 2009-249355 일본특허공개 2012-211089호 공보Japanese Patent Application Laid-Open No. 21-2101089

상기 서술한 바와 같이, 플루오렌 골격을 갖는 화합물이나 불소 등의 활성기를 갖는 플루오렌계 화합물, 또한 이들의 제조방법도 일단은 알려져 있으나, 이 제조방법은 반응효율이 나빠, 올레핀계 부생성물이 다량으로 생성되는 것이 알려져 있으며, 예를 들어 유기 EL소자에 요구되는 고순도나 저비용의 재료를 제조하기 위하여 사용할 수 있는 것은 아니다. 따라서, 제조방법의 선택지를 늘리기 위해서도, 더 나아가 그 이상으로 순도 및 반응효율을 보다 높이기 위해서도 신규한 제조방법이 요구되고 있다.As described above, a compound having a fluorene skeleton, a fluorene-based compound having an active group such as fluorine, and a production method thereof are also known for a time. However, this production method has a problem in that the reaction efficiency is poor and the olefinic by- And it can not be used for producing a high-purity or low-cost material required for an organic EL device, for example. Therefore, a new production method is also required to increase the selection method of the production method, and further to further increase the purity and the reaction efficiency.

본 발명자들은, 상기 과제를 해결하기 위하여 예의 검토한 결과, OH전구체에 대하여 산뿐만 아니라 다공질 무기물질 등의 담체와 함께 반응시킴으로써, 매우 높은 효율로 플루오렌계 화합물을 제조하는 것에 성공하였다. 또한 이 방법에 의해, 종래 알려지지 않았던 신규한 활성기 함유 플루오렌계 화합물을 제조할 수 있는 것을 발견하여, 본 발명을 완성시켰다.
Means for Solving the Problems As a result of intensive studies to solve the above problems, the present inventors have succeeded in producing a fluorene compound at a very high efficiency by reacting an OH precursor together with a carrier such as a porous inorganic material as well as an acid. It has also been found by this method that a novel active-group-containing fluorene-based compound, which has not been previously known, can be produced, and the present invention has been completed.

[1][One]

하기 식(II)로 표시되는 구조를 분자 내에 갖는 OH전구체를, 담체 및 산의 존재하 및/또는 고정산 촉매의 존재하에서 반응시켜, 하기 식(I)로 표시되는 플루오렌 구조를 분자 내에 갖는 화합물을 제조하는 방법.Reacting an OH precursor having a structure represented by the following formula (II) in the molecule in the presence of a carrier and an acid and / or in the presence of a fixed-rate catalyst to obtain a fluorene structure represented by the following formula (I) ≪ / RTI >

Figure pat00001
Figure pat00001

A1 및 A2는, 각각 독립적으로, 알킬, 아릴 또는 헤테로아릴이고, 이들 기는 치환되어 있을 수도 있고, A1 및 A2는 결합하여 환을 형성하고 있을 수도 있다.
A 1 and A 2 are each independently alkyl, aryl or heteroaryl, and these groups may be substituted, and A 1 and A 2 may combine to form a ring.

[2][2]

하기 일반식(2-1) 또는 식(2-2)로 표시되는 OH전구체를, 담체 및 산의 존재하 및/또는 고정산 촉매의 존재하에서 반응시켜, 하기 일반식(1)로 표시되는 플루오렌계 화합물을 제조하는, 상기 [1]에 기재된 제조방법.The OH precursor represented by the following general formula (2-1) or (2-2) is reacted in the presence of a carrier and an acid and / or in the presence of a high- The production method according to the above [1], wherein a cyanine compound is produced.

Figure pat00002
Figure pat00002

식(1), 식(2-1) 및 식(2-2) 중,Of the formulas (1), (2-1) and (2-2)

A1 및 A2는, 각각 독립적으로, 알킬, 아릴 또는 헤테로아릴이고, 이들 기는 치환되어 있을 수도 있고, A1 및 A2는 결합하여 환을 형성하고 있을 수도 있고,A 1 and A 2 are each independently alkyl, aryl or heteroaryl which may be substituted, A 1 and A 2 may be combined to form a ring,

R1~R4 및 R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴 또는 디아릴 치환 아미노이고, 이들 기는 치환되어 있을 수도 있고, R1 및 R2, R2 및 R3, R3 및 R4, R5 및 R6, R6 및 R7 그리고 R7 및 R8은, 각각 독립적으로, 결합하여 환을 형성하고 있을 수도 있고,R 1 to R 4 and R 5 to R 8 are each independently hydrogen, alkyl, aryl, heteroaryl or diaryl substituted amino, and these groups may be substituted and R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7, and R 7 and R 8 may be independently bonded to form a ring,

식(1)로 표시되는 플루오렌계 화합물에 있어서의 수소는, 불소, 염소, 브롬, 요오드 또는 알콕시로 치환되어 있을 수도 있고, 이 경우, 식(2-1) 또는 식(2-2)로 표시되는 OH전구체에 있어서의 대응하는 수소가 동일하게 치환되어 있다.
The hydrogen in the fluorene compound represented by the formula (1) may be substituted with fluorine, chlorine, bromine, iodine or alkoxy. In this case, in the formula (2-1) or The corresponding hydrogen in the OH precursor to be displayed is similarly substituted.

[3][3]

상기 담체가, 무기산화물 또는 금속황산화물이고,Wherein the carrier is an inorganic oxide or a metal sulfate,

상기 산이, 황산, 인산, 폴리인산 또는 설폰산이고,Wherein said acid is sulfuric acid, phosphoric acid, polyphosphoric acid or sulfonic acid,

상기 고정산 촉매가, 설폰화처리된 수지 또는 표면이 설폰화처리된 다공질물질인, 상기 [1] 또는 [2]에 기재된 제조방법.
The production method according to the above [1] or [2], wherein the fixed catalyst is a sulfonated resin or a surface-treated sulfonated porous material.

[4][4]

상기 담체가 다공질물질인, 상기 [1]~[3] 중 어느 하나에 기재된 제조방법.
The production method according to any one of [1] to [3], wherein the carrier is a porous material.

[5][5]

식(1), 식(2-1) 및 식(2-2) 중,Of the formulas (1), (2-1) and (2-2)

A1 및 A2는, 각각 독립적으로, 알킬, 아릴 또는 헤테로아릴이고, A1 및 A2는 결합하여 지방족환 또는 방향족환을 형성하고 있을 수도 있고,A 1 and A 2 are each independently alkyl, aryl or heteroaryl, A 1 and A 2 may be bonded to form an aliphatic or aromatic ring,

R1~R4 및 R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴 또는 디아릴 치환 아미노이고, R1 및 R2, R2 및 R3, R3 및 R4, R5 및 R6, R6 및 R7 그리고 R7 및 R8은, 각각 독립적으로, 결합하여 방향족환을 형성하고 있을 수도 있고,R 1 to R 4 and R 5 to R 8 are each independently hydrogen, alkyl, aryl, heteroaryl or diaryl substituted amino, R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 and R 7 and R 8 may be independently bonded to form an aromatic ring,

식(1)로 표시되는 플루오렌계 화합물 중의 플루오렌 골격에 있어서의 수소는, 불소, 염소, 브롬, 요오드 또는 알콕시로 치환되어 있을 수도 있고, 이 경우, 식(2-1) 또는 식(2-2)로 표시되는 OH전구체에 있어서의 대응하는 수소가 동일하게 치환되어 있는,The hydrogen in the fluorene skeleton of the fluorene compound represented by the formula (1) may be substituted with fluorine, chlorine, bromine, iodine or alkoxy. In this case, in the formula (2-1) or -2) in which the corresponding hydrogen in the OH precursor is equally substituted,

상기 [1]~[4] 중 어느 하나에 기재된 제조방법.
The production method according to any one of [1] to [4] above.

[6][6]

식(1), 식(2-1) 및 식(2-2) 중,Of the formulas (1), (2-1) and (2-2)

A1 및 A2는, 각각 독립적으로, 알킬, 아릴 또는 헤테로아릴이고,A 1 and A 2 are each independently alkyl, aryl or heteroaryl,

R1~R4는, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노 또는 불소이고, R1~R4 중 적어도 1개는 불소이고,R 1 to R 4 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino or fluorine, at least one of R 1 to R 4 is fluorine,

R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노, 염소, 브롬, 요오드 또는 알콕시이고, R5~R8 중 적어도 1개는 염소, 브롬, 요오드 또는 알콕시인,R 5 to R 8 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino, chlorine, bromine, iodine or alkoxy, and at least one of R 5 to R 8 is chlorine, bromine, Alkoxy,

상기 [1]~[5] 중 어느 하나에 기재된 제조방법.
The production method according to any one of [1] to [5] above.

[7][7]

하기 일반식(1)로 표시되는 플루오렌계 화합물.A fluorene-based compound represented by the following general formula (1).

Figure pat00003
Figure pat00003

식(1) 중,In the formula (1)

A1 및 A2는, 각각 독립적으로, 알킬, 아릴 또는 헤테로아릴이고,A 1 and A 2 are each independently alkyl, aryl or heteroaryl,

R1~R4는, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노 또는 불소이고, R1~R4 중 적어도 1개는 불소이고,R 1 to R 4 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino or fluorine, at least one of R 1 to R 4 is fluorine,

R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노, 염소, 브롬, 요오드 또는 알콕시이고, R5~R8 중 적어도 1개는 염소, 브롬, 요오드 또는 알콕시이다.
R 5 to R 8 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino, chlorine, bromine, iodine or alkoxy, and at least one of R 5 to R 8 is chlorine, bromine, Lt; / RTI >

[8][8]

식(1) 중,In the formula (1)

A1 및 A2는, 각각 독립적으로, 알킬이고,A 1 and A 2 are each independently alkyl,

R1~R4는, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노 또는 불소이고, R1~R4 중 적어도 1개는 불소이고,R 1 to R 4 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino or fluorine, at least one of R 1 to R 4 is fluorine,

R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노, 염소, 브롬, 요오드 또는 알콕시이고, R5~R8 중 적어도 1개는 염소, 브롬, 요오드 또는 알콕시인,R 5 to R 8 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino, chlorine, bromine, iodine or alkoxy, and at least one of R 5 to R 8 is chlorine, bromine, Alkoxy,

상기 [7]에 기재된 플루오렌계 화합물.The fluorene-based compound according to the above-mentioned [7].

본 발명의 바람직한 태양에 따르면, 종래의 산만을 이용한 일반적인 제조방법과 비교할 때, 산과 함께 담체, 특히 다공질의 담체를 함께 이용함으로써, OH전구체로부터 플루오렌계 화합물로의 전환율을 비약적으로 높일 수 있다. 나아가 이 바람직한 태양에 따라, 종래 알려져 있지 않았던 신규한 활성기 함유 플루오렌계 화합물을 제조할 수 있게 되어, 예를 들어 유기 EL소자에 이용하는 것이 가능한 재료의 베리에이션을 늘릴 수 있다.According to a preferred embodiment of the present invention, the conversion ratio from the OH precursor to the fluorene compound can be dramatically increased by using a carrier, particularly a porous carrier together with an acid, in comparison with a conventional production method using distractions. Further, according to this preferred embodiment, it is possible to produce a novel active-group-containing fluorene-based compound which has not been known in the prior art, and thus it is possible to increase variations of materials which can be used, for example, in organic EL devices.

1. One. 플루오렌계Fluorene-based 화합물의 제조방법 Method for producing a compound

본 발명에 따른 플루오렌계 화합물의 제조방법은, 하기 식(II)로 표시되는 구조를 분자 내에 갖는 OH전구체를, 담체 및 산의 존재하 및/또는 고정산 촉매의 존재하에서 반응시켜, 하기 식(I)로 표시되는 플루오렌 구조를 분자 내에 갖는 화합물을 제조하는 방법이다.A method for producing a fluorene compound according to the present invention comprises reacting an OH precursor having in its molecule a structure represented by the following formula (II) in the presence of a carrier and an acid and / or in the presence of a high- (I) in a molecule.

Figure pat00004

Figure pat00004

한편, 「구조를 분자 내에 갖는다」라는 것은, 해당 구조에 치환기나 환 등이 결합하거나 환이 축합하거나 하여 해당 분자가 형성되는 것을 의미하고, 해당 구조는 해당 분자의 일부의 구조에 상당한다. 또한, 해당 구조 자체가 해당 분자일 수도 있고, 이 경우에는 해당 구조와 해당 분자가 동일한 화학구조인 것을 의미한다. 예를 들어 식(I)로 표시되는 플루오렌 구조를 분자 내에 갖는 화합물이란, 식(I)로 표시되는 플루오렌 구조에 치환기나 환 등이 결합하거나 환이 축합하거나 하여 형성된 화합물이다. 식(II)로 표시되는 구조를 분자 내에 갖는 OH전구체에 대해서도 마찬가지이다.
On the other hand, "having a structure in a molecule" means that a substituent, a ring, or the like is bonded to the structure or a ring is condensed to form the molecule, and the structure corresponds to a structure of a part of the molecule. In addition, the structure itself may be the corresponding molecule, which means that the structure and the molecule have the same chemical structure. For example, a compound having a fluorene structure represented by the formula (I) in a molecule is a compound formed by binding a substituent, a ring, or the like to a fluorene structure represented by the formula (I) or condensing a ring. The same applies to the OH precursor having the structure represented by the formula (II) in the molecule.

또한, 본 발명에 따른 보다 구체적인 플루오렌계 화합물의 제조방법은, 하기 일반식(2-1) 또는 식(2-2)로 표시되는 OH전구체를, 담체 및 산의 존재하 또는 고정산 촉매의 존재하에서 반응시켜, 하기 일반식(1)로 표시되는 플루오렌계 화합물을 제조하는 방법이다.A more specific method for producing a fluorene compound according to the present invention is a method for producing an OH precursor represented by the following general formula (2-1) or (2-2) in the presence of a carrier and an acid, To produce a fluorene-based compound represented by the following general formula (1).

Figure pat00005

Figure pat00005

식(1)은 목적 화합물인 플루오렌계 화합물을 나타내고, 식(I)은 목적 화합물인 플루오렌계 화합물 중의 플루오렌 구조부분을 나타내고, 식(2-1) 또는 식(2-2)나 식(II)는, 이 플루오렌계 화합물을 제조하기 위한 원료를 나타낸다. 이 제조방법은, 원료가 되는 식(2-1) 또는 식(2-2)로 표시되는 화합물이나 식(II)로 표시되는 구조를 분자 내에 갖는 화합물에 있어서의 OH기(수산기)에 대하여, 산을 작용시킴으로써, 인접하는 탄소(상기 「*」로 나타냄)와 환화시키는 탈수환화반응(脫水環化反應)이다. 한편, 이 원료를 편의상 OH전구체라고도 한다.
The formula (1) represents a fluorene compound as a target compound, the formula (I) represents a fluorene structure moiety in a fluorene compound as a target compound, and is represented by formula (2-1) (II) represents a raw material for producing the fluorene compound. This production method is characterized in that the OH group (hydroxyl group) in the compound having the structure represented by the formula (2-1) or the formula (2-2) as the raw material or the structure represented by the formula (II) (Dehydration cyclization reaction) in which an acid is reacted with an adjacent carbon (represented by the above-mentioned " * "). On the other hand, this raw material is also referred to as an OH precursor for convenience.

<각 식 중 A&Lt; A 1One , A, A 22 , , RR 1One ~~ RR 44  And RR 55 ~~ RR 88 에 대하여>About>

식(1)이나 식(I)과, 식(2-1) 및 식(2-2)나 식(II)는, 목적 화합물(또는 그 부분구조)과 원료(또는 그 부분구조)의 관계에 있으므로, 각 식에서 이용되고 있는 A1, A2, R1~R4 및 R5~R8은, 각각 동일한 기를 의미한다. A1 및 A2, R1 및 R2, R2 및 R3, R3 및 R4, R5 및 R6, R6 및 R7 그리고 R7 및 R8은 결합하여 환을 형성하고 있을 수도 있는데, 식(2-1) 및 식(2-2)나 식(II)에 있어서 환이 형성되어 있는 경우에는, 식(1)이나 식(I)에 있어서도 대응하는 위치에 환이 형성되어 있다. 식(2-1) 및 식(2-2)나 식(II)에 있어서 환이 형성되어 있지 않은 경우에는, 식(1)이나 식(I)에 있어서도 대응하는 위치에는 환은 형성되어 있지 않으나, 식(1)로 표시되는 화합물이나 식(I)로 표시되는 플루오렌 구조를 분자 내에 갖는 화합물을 제조한 후에, 이들 환을 형성하는 반응을 행할 수도 있다.
The formula (1) or formula (I), the formula (2-1), the formula (2-2) or the formula (II) Therefore, A 1 , A 2 , R 1 to R 4 and R 5 to R 8 used in each formula means the same groups, respectively. A 1 and A 2 , R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 and R 7 and R 8 may be combined to form a ring When a ring is formed in the formula (2-1), the formula (2-2), or the formula (II), a ring is formed at the corresponding position in the formula (1) or the formula (I). When no ring is formed in the formula (2-1), the formula (2-2) or the formula (II), no ring is formed at the corresponding position in the formula (1) or the formula (I) (1) or a compound having a fluorene structure represented by the formula (I) in the molecule may be produced, followed by reaction for forming these rings.

본 발명에 따른 플루오렌계 화합물의 제조방법은, 상기 서술한 바와 같이, OH전구체 중의 OH기에 대하여 산을 작용시켜 인접하는 탄소와 환화시키는 간단한 반응을 이용하는 것이므로, 식(I), 식(1), 식(II), 식(2-1) 및 식(2-2) 중에서 이용하고 있는 A1, A2, R1~R4 및 R5~R8은 이 반응을 저해하지 않는 기, 일반적인 기이면 특별히 한정되지 않는다. 이들 기로서 바람직한 기를 예로 든다면 이하와 같다.
As described above, the process for producing a fluorene-based compound according to the present invention uses a simple reaction in which an OH group in an OH precursor is reacted with an adjacent carbon to cyclize the OH group. Therefore, the formula (I) A 1 , A 2 , R 1 to R 4 and R 5 to R 8 used in the formulas (II), (2-1) and (2-2) Is not particularly limited. Examples of such groups are as follows.

A1 및 A2는, 각각 독립적으로, 알킬, 아릴 또는 헤테로아릴이고, 이들 기는 치환되어 있을 수도 있고, A1 및 A2는 결합하여 환을 형성하고 있을 수도 있다. A1 및 A2가 알킬 등인 경우, 입체장애나 반응활성 등의 요인으로, 반응용제 등과의 반응이 일어나기 어렵고, OH전구체 자체의 분자내 탈수환화반응 쪽이 진행되기 쉽다고 추측되므로, 플루오렌계 목적 화합물이 얻어지기 쉬워진다고 생각된다. 한편으로, A1 및 A2가 수소이면, OH전구체 자체의 분자내 탈수환화반응보다 톨루엔과의 분자간 탈수반응 쪽이 훨씬 반응속도가 빠르다고 추측되어, 플루오렌계 목적 화합물은 얻어지기 어렵다고 생각된다.A 1 and A 2 are each independently alkyl, aryl or heteroaryl, and these groups may be substituted, and A 1 and A 2 may combine to form a ring. When A 1 and A 2 are alkyl or the like, it is presumed that the reaction with the reaction solvent or the like is difficult to occur due to factors such as steric hindrance or reaction activity, and the intramolecular dehydroxylation reaction of the OH precursor itself is likely to proceed. It is considered that the compound is likely to be obtained. On the other hand, if A 1 and A 2 are hydrogen, it is presumed that the reaction rate is faster for the intermolecular dehydration reaction with toluene than the intramolecular dehydration reaction of the OH precursor itself, and it is considered that the target compound of fluorene is hardly obtained.

또한, R1~R4 및 R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴헤테로아릴 또는 디아릴 치환 아미노이고, 이들 기는 치환되어 있을 수도 있고, R1 및 R2, R2 및 R3, R3 및 R4, R5 및 R6, R6 및 R7 그리고 R7 및 R8은, 각각 독립적으로, 결합하여 환을 형성하고 있을 수도 있다. 이와 같이, R1~R4 및 R5~R8로서 여러가지 치환기를 가지고 있어도 OH전구체 자체의 분자내 탈수환화반응이 저해되지 않는 이유로는, 환화반응의 부위에 대한 각 치환기의 입체장애(특히 반응부위에 가까운 R1이나 R8 등의 입체장애)가 적은 것 등이 생각된다.R 1 to R 4 and R 5 to R 8 are each independently hydrogen, alkyl, arylheteroaryl or diaryl substituted amino, and these groups may be substituted and R 1 and R 2 , R 2 , R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7, and R 7 and R 8 may be independently bonded to form a ring. The reason why the intramolecular dehydroxylation reaction of the OH precursor itself is not inhibited even when it has various substituents as R 1 to R 4 and R 5 to R 8 is that the steric hindrance of each substituent to the site of the cyclization reaction Or a steric hindrance such as R 1 or R 8 near the site).

또한, 식(1)로 표시되는 플루오렌계 화합물에 있어서의 수소는, 불소, 염소, 브롬, 요오드 또는 알콕시로 치환되어 있을 수도 있고, 이 경우, 식(2-1) 또는 식(2-2)로 표시되는 OH전구체에 있어서의 대응하는 수소가 동일하게 치환되어 있다.
The hydrogen in the fluorene compound represented by the formula (1) may be substituted with fluorine, chlorine, bromine, iodine or alkoxy, and in this case, the formula (2-1) ) Is substituted for the corresponding hydrogen in the OH precursor.

A1, A2, R1~R4 및 R5~R8에 있어서의 알킬로는, 직쇄 및 분지쇄 중 어느 것이어도 되는데, 예를 들어, 탄소수 1~24의 직쇄 알킬 또는 탄소수 3~24의 분지쇄 알킬을 들 수 있다. 바람직한 알킬은, 탄소수 1~18의 알킬(탄소수 3~18의 분지쇄 알킬)이다. 보다 바람직한 알킬은, 탄소수 1~12의 알킬(탄소수 3~12의 분지쇄 알킬)이다. 더욱 바람직한 알킬은, 탄소수 1~6의 알킬(탄소수 3~6의 분지쇄 알킬)이다. 특히 바람직한 알킬은, 탄소수 1~4의 알킬(탄소수 3~4의 분지쇄 알킬)이다.
Examples of the alkyl for A 1 , A 2 , R 1 to R 4 and R 5 to R 8 include straight chain or branched chain, and examples thereof include straight chain alkyl having 1 to 24 carbon atoms or straight chain alkyl having 3 to 24 Lt; / RTI &gt; Preferred alkyl is alkyl of 1 to 18 carbon atoms (branched chain alkyl of 3 to 18 carbon atoms). More preferred alkyl is alkyl having 1 to 12 carbon atoms (branched alkyl having 3 to 12 carbon atoms). More preferred alkyl is alkyl having 1 to 6 carbon atoms (branched alkyl having 3 to 6 carbon atoms). Particularly preferred alkyl is alkyl having 1 to 4 carbon atoms (branched alkyl having 3 to 4 carbon atoms).

구체적인 알킬로는, 메틸, 에틸, n-프로필, 이소프로필, n-부틸, 이소부틸, s-부틸, t-부틸, n-펜틸, 이소펜틸, 네오펜틸, t-펜틸, n-헥실, 1-메틸펜틸, 4-메틸-2-펜틸, 3,3-디메틸부틸, 2-에틸부틸, n-헵틸, 1-메틸헥실, n-옥틸, t-옥틸, 1-메틸헵틸, 2-에틸헥실, 2-프로필펜틸, n-노닐, 2,2-디메틸헵틸, 2,6-디메틸-4-헵틸, 3,5,5-트리메틸헥실, n-데실, n-운데실, 1-메틸데실, n-도데실, n-트리데실, 1-헥실헵틸, n-테트라데실, n-펜타데실, n-헥사데실, n-헵타데실, n-옥타데실, n-에이코실 등을 들 수 있다.
Specific examples of alkyl include alkyl groups having 1 to 6 carbon atoms such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, Methylhexyl, n-octyl, t-octyl, 1-methylheptyl, 2-ethylhexyl , 2-propylpentyl, n-nonyl, 2,2-dimethylheptyl, 2,6-dimethyl-4-heptyl, 3,5,5-trimethylhexyl, hexadecyl, n-hexadecyl, n-heptadecyl, n-octadecyl, n-eicosyl, and the like.

A1, A2, R1~R4 및 R5~R8에 있어서의 아릴로는, 예를 들어, 탄소수 6~30의 아릴을 들 수 있다. 바람직한 아릴은 탄소수 6~16의 아릴이고, 보다 바람직하게는 탄소수 6~14의 아릴이고, 더욱 바람직하게는 탄소수 6~12의 아릴이고, 특히 바람직하게는 탄소수 6~10의 아릴이다.
Examples of the aryl for A 1 , A 2 , R 1 to R 4 and R 5 to R 8 include aryl having 6 to 30 carbon atoms. Preferable aryl is aryl having 6 to 16 carbon atoms, more preferably aryl having 6 to 14 carbon atoms, still more preferably aryl having 6 to 12 carbon atoms, and particularly preferably aryl having 6 to 10 carbon atoms.

구체적인 아릴로는, 단환계 아릴인 페닐, 이환계 아릴인 (2-,3-,4-)비페닐일, 축합이환계 아릴인 (1-,2-)나프틸, 삼환계 아릴인 터페닐일(m-터페닐-2’-일, m-터페닐-4’-일, m-터페닐-5’-일, o-터페닐-3’-일, o-터페닐-4’-일, p-터페닐-2’-일, m-터페닐-2-일, m-터페닐-3-일, m-터페닐-4-일, o-터페닐-2-일, o-터페닐-3-일, o-터페닐-4-일, p-터페닐-2-일, p-터페닐-3-일, p-터페닐-4-일), 축합삼환계 아릴인, 아세나프틸렌-(1-,3-,4-,5-)일, 플루오렌-(1-,2-,3-,4-,9-)일, 페날렌-(1-,2-)일, (1-,2-,3-,4-,9-)페난트릴, 사환계 아릴인 쿼터페닐일(5’-페닐-m-터페닐-2-일, 5’-페닐-m-터페닐-3-일, 5’-페닐-m-터페닐-4-일, m-쿼터페닐), 축합사환계 아릴인 트리페닐렌-(1-,2-)일, 피렌-(1-,2-,4-)일, 나프타센-(1-,2-,5-)일, 축합오환계 아릴인 페릴렌-(1-,2-,3-)일, 펜타센-(1-,2-,5-,6-)일 등을 들 수 있다.
Specific examples of aryl include phenyl which is monocyclic aryl, (2-, 3-, 4-) biphenyl which is a bicyclic aryl, (1-, 2-) naphthyl which is a condensed tricyclic aryl, terphenyl -Terphenyl-4'-yl, o-terphenyl-4'-yl, m-terphenyl-5'- M-terphenyl-4-yl, o-terphenyl-2-yl, o-terphenyl- P-terphenyl-3-yl, p-terphenyl-4-yl), condensed tricyclic aryl, acenaphthylene- (1-, 2-, 3-, 4-, 5-) yl, fluorene- (1-, 2-, (5'-phenyl-m-terphenyl-2-yl, 5'-phenyl-m-terphenyl-3 (1-, 2-, 3-, 4-thiophen-4-yl, m- (1-, 2-, 3-), pentacene- (1-, 2-, 5-) 5-, 6-yl, and the like.

A1, A2, R1~R4 및 R5~R8에 있어서의 헤테로아릴로는, 예를 들어, 탄소수 2~30의 헤테로아릴을 들 수 있다. 바람직한 헤테로아릴은, 탄소수 2~25의 헤테로아릴이고, 보다 바람직하게는 탄소수 2~20의 헤테로아릴이고, 더욱 바람직하게는 탄소수 2~15의 헤테로아릴이고, 특히 바람직하게는 탄소수 2~10의 헤테로아릴이다. 또한, 헤테로아릴로는, 예를 들어 환구성원자로서 탄소 이외에 산소, 황 및 질소로부터 선택되는 헤테로원자를 1 내지 5개 함유하는 것을 들 수 있다.
The heteroaryl in A 1 , A 2 , R 1 to R 4 and R 5 to R 8 includes, for example, heteroaryl having 2 to 30 carbon atoms. Preferred heteroaryl is heteroaryl having 2 to 25 carbon atoms, more preferably heteroaryl having 2 to 20 carbon atoms, still more preferably heteroaryl having 2 to 15 carbon atoms, particularly preferably heteroaryl having 2 to 10 carbon atoms / RTI &gt; The heteroaryl includes, for example, those having 1 to 5 hetero atoms selected from oxygen, sulfur and nitrogen in addition to carbon as a ring-constituting atom.

구체적인 헤테로아릴로는, 예를 들어, 푸릴, 티에닐, 피롤일, 옥사졸일, 이소옥사졸일, 티아졸일, 이소티아졸일, 이미다졸일, 피라졸일, 옥사디아졸릴, 푸라잔일, 티아디아졸일, 트리아졸일, 테트라졸일, 피리딜, 피리미딘일, 피리다진일, 피라진일, 트리아진일, 벤조푸라닐, 이소벤조푸라닐, 벤조[b]티에닐, 인돌일, 이소인돌일, 1H-인다졸일, 벤조이미다졸일, 벤조옥사졸일, 벤조티아졸일, 1H-벤조트리아졸일, 퀴놀릴, 이소퀴놀릴, 신노릴(Cinnolyl), 퀴나졸릴, 퀴녹살린일, 프타라지닐(phthalazinyl), 나프티리디닐(naphthyridinyl), 퓨리닐(purinyl), 프테리디닐(pteridinyl), 카르바졸릴, 아크리딘일, 페녹사지닐(phenoxazinyl), 페노티아지닐, 페나진일, 페녹사티이닐(phenoxathiinyl), 티안트레닐, 인돌리지닐 등을 들 수 있다.
Specific heteroaryls include, for example, furyl, thienyl, pyrroyl, oxazolyl, isoxazolyl, thiazolyl, isothiazolyl, imidazolyl, pyrazolyl, oxadiazolyl, furanzyl, thiadiazolyl, Thiazolyl, tetrazolyl, pyridyl, pyrimidinyl, pyridazinyl, pyrazinyl, triazinyl, benzofuranyl, isobenzofuranyl, benzo [b] thienyl, indolyl, isoindolyl, , Benzoimidazolyl, benzoxazolyl, benzothiazolyl, 1H-benzotriazolyl, quinolyl, isoquinolyl, Cinnolyl, quinazolyl, quinoxalinyl, phthalazinyl, naphthyridinyl naphthyridinyl, purinyl, pteridinyl, carbazolyl, acridinyl, phenoxazinyl, phenothiazinyl, phenazinyl, phenoxathiinyl, thianthrenyl , Indolizinyl and the like.

R1~R4 및 R5~R8에 있어서의 디아릴 치환 아미노로는, 상기 서술한 아릴이 2개 치환된 아미노기를 들 수 있다.
Examples of the diaryl-substituted amino in R 1 to R 4 and R 5 to R 8 include an amino group in which the aforementioned aryl is substituted.

A1, A2, R1~R4 및 R5~R8로서 선택되는 알킬, 아릴 또는 헤테로아릴이나, R1~R4 및 R5~R8로서 선택되는 디아릴 치환 아미노는 치환되어 있을 수도 있고, 이 치환기로는, 상기 서술한 알킬이나 아릴과 동일한 것을 들 수 있다.
The alkyl, aryl or heteroaryl selected as A 1 , A 2 , R 1 to R 4 and R 5 to R 8 , or diaryl substituted amino selected from R 1 to R 4 and R 5 to R 8 , And examples of the substituent include the same alkyl and aryl described above.

A1 및 A2, R1 및 R2, R2 및 R3, R3 및 R4, R5 및 R6, R6 및 R7 그리고 R7 및 R8은, 각각 독립적으로, 결합하여 환을 형성하고 있을 수도 있고, 형성된 환으로는 지방족환이나 방향족환을 들 수 있다. 지방족환으로는 예를 들어 시클로알칸환이고, 구체적으로는 시클로부탄환, 시클로펜탄환, 시클로헥산환 등을 들 수 있고, 이들 환은 상기 알킬이나 아릴로 치환되어 있을 수도 있다. 또한, 방향족환으로는 상기 아릴이나 헤테로아릴로서 예로 든 것과 동일한 구조를 갖는 환이고, 구체적으로는 벤젠환, 나프탈렌환, 피리딘환 등을 들 수 있고, 이들 환은 상기 알킬이나 아릴로 치환되어 있을 수도 있다. 이들 중에서도, 형성된 환으로는 벤젠환이 보다 바람직하다.
A 1 and A 2 , R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 and R 7 and R 8 are each independently a bond to form a ring , And the formed ring may be an aliphatic ring or an aromatic ring. The aliphatic ring is, for example, a cycloalkane ring, specifically, a cyclobutane ring, a cyclopentane ring, a cyclohexane ring, etc., and these rings may be substituted with the above-mentioned alkyl or aryl. Examples of the aromatic ring include rings having the same structures as those exemplified as the above aryl or heteroaryl, specifically, benzene ring, naphthalene ring, pyridine ring, etc. These rings may be substituted with the above-mentioned alkyl or aryl have. Among them, a benzene ring is more preferable as the ring formed.

이들 기가 환을 형성한 경우에 대해서는, 특히, 식(1)에 있어서, R2 및 R3, R3 및 R4, R5 및 R6 그리고 R6 및 R7 중 적어도 한 쌍이 환을 형성하는 것이 바람직하고, R2 및 R3 그리고 R3 및 R4 중 어느 하나가 환을 형성하는 것이 보다 바람직하고, R3 및 R4가 환을 형성하는 것이 가장 바람직하다.
In the case where these group rings are formed, in particular, in formula (1), at least one of R 2 and R 3 , R 3 and R 4 , R 5 and R 6 and R 6 and R 7 forms a ring it is most preferably preferably, R 2 and R 3 and R 3 and R 4 either is more preferable to form a ring from, and R 3 and R 4 form a ring.

이렇게 하여 구성된 식(1)로 표시되는 플루오렌계 화합물에 있어서의 수소는, 불소, 염소, 브롬, 요오드 또는 알콕시로 치환되어 있을 수도 있다. 한편, 동일하게 그 원료인 식(2-1) 또는 식(2-2)로 표시되는 OH전구체도 치환되는 것은 상기 서술한 바와 같다.
The hydrogen in the fluorene compound represented by the formula (1) thus formed may be substituted with fluorine, chlorine, bromine, iodine or alkoxy. On the other hand, the OH precursor represented by the formula (2-1) or (2-2) as the raw material is also substituted as described above.

치환기인 알콕시로는, 예를 들어, 탄소수 1~15의 알콕시를 들 수 있다. 바람직한 알콕시는, 탄소수 1~10의 알콕시이다. 더욱 바람직한 알콕시는, 탄소수 1~4의 알콕시이다.
The alkoxy group as a substituent includes, for example, alkoxy of 1 to 15 carbon atoms. Preferred alkoxy is alkoxy of 1 to 10 carbon atoms. More preferred alkoxy is alkoxy of 1 to 4 carbon atoms.

구체적인 알콕시로는, 메톡시, 에톡시, 프로폭시, 이소프로폭시, n-부톡시, 이소부톡시, s-부톡시, t-부톡시, 펜틸옥시, 시클로펜틸옥시, 헥실옥시, 시클로헥실옥시, 헵틸옥시, 시클로헵틸옥시, 옥틸옥시, 시클로옥틸옥시, 페녹시 등을 들 수 있다.
Specific examples of alkoxy include alkoxy such as methoxy, ethoxy, propoxy, isopropoxy, n-butoxy, isobutoxy, s-butoxy, t-butoxy, pentyloxy, cyclopentyloxy, hexyloxy, Heptyloxy, cycloheptyloxy, octyloxy, cyclooctyloxy, phenoxy, and the like.

이들 치환기를 갖는 경우에는, 불소, 염소, 브롬, 요오드 또는 알콕시의 치환형태(수 및 위치)에 제한은 없으나, 식(1)로 표시되는 플루오렌계 화합물 중의 플루오렌 골격에 있어서의 수소가 치환되는 것이 바람직하다.
In the case of having these substituents, there is no limitation on the substitution form (number and position) of fluorine, chlorine, bromine, iodine or alkoxy, but hydrogen in the fluorene skeleton of the fluorene compound represented by formula (1) .

나아가, 식(1) 중, R1~R4 중 적어도 1개는 불소이고, R5~R8 중 적어도 1개는 염소, 브롬, 요오드 또는 알콕시인 것이 바람직하다.Further, in the formula (1), at least one of R 1 to R 4 is fluorine, and at least one of R 5 to R 8 is preferably chlorine, bromine, iodine or alkoxy.

이 경우, 식(1) 중,In this case, in the formula (1)

R1~R4는, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노 또는 불소이고, R1~R4 중 적어도 1개는 불소이고,R 1 to R 4 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino or fluorine, at least one of R 1 to R 4 is fluorine,

R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노, 염소, 브롬, 요오드 또는 알콕시이고, R5~R8 중 적어도 1개는 염소, 브롬, 요오드 또는 알콕시이다.
R 5 to R 8 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino, chlorine, bromine, iodine or alkoxy, and at least one of R 5 to R 8 is chlorine, bromine, Lt; / RTI &gt;

<< 일반식(1)로In general formula (1) 표시되는  Displayed 플루오렌계Fluorene-based 화합물에 대하여> For compounds>

본 발명에 따른 플루오렌계 화합물은, 하기 일반식(1)로 표시되는 플루오렌계 화합물이다.The fluorene compound according to the present invention is a fluorene compound represented by the following general formula (1).

Figure pat00006
Figure pat00006

식(1) 중,In the formula (1)

A1 및 A2는, 각각 독립적으로, 알킬, 아릴 또는 헤테로아릴이고,A 1 and A 2 are each independently alkyl, aryl or heteroaryl,

R1~R4는, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노 또는 불소이고, R1~R4 중 적어도 1개는 불소이고,R 1 to R 4 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino or fluorine, at least one of R 1 to R 4 is fluorine,

R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노, 염소, 브롬, 요오드 또는 알콕시이고, R5~R8 중 적어도 1개는 염소, 브롬, 요오드 또는 알콕시이다.R 5 to R 8 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino, chlorine, bromine, iodine or alkoxy, and at least one of R 5 to R 8 is chlorine, bromine, Lt; / RTI &gt;

한편, A1, A2, R1~R4 및 R5~R8의 각 기의 상세한 것에 대해서는 상기 서술한 바와 같다.
The details of each of A 1 , A 2 , R 1 to R 4 and R 5 to R 8 are as described above.

보다 구체적인 플루오렌계 화합물로는, 이하에 열거하는 것을 들 수 있다. 한편, 구조식 중의 「Me」은 메틸기, 「Et」는 에틸기, 「tBu」은 t-부틸기, 「OMe」은 메톡시기, 「OEt」는 에톡시기, 「Ph」은 페닐기이다.
More specific fluorene compounds include those listed below. In the structural formula, "Me" is a methyl group, "Et" is an ethyl group, "tBu" is a t-butyl group, "OMe" is a methoxy group, "OEt" is an ethoxy group, and "Ph"

Figure pat00007

Figure pat00007

Figure pat00008

Figure pat00008

Figure pat00009

Figure pat00009

Figure pat00010

Figure pat00010

Figure pat00011

Figure pat00011

Figure pat00012

Figure pat00012

Figure pat00013

Figure pat00013

Figure pat00014

Figure pat00014

Figure pat00015

Figure pat00015

Figure pat00016

Figure pat00016

Figure pat00017

Figure pat00017

Figure pat00018

Figure pat00018

Figure pat00019

Figure pat00019

Figure pat00020

Figure pat00020

Figure pat00021

Figure pat00021

<반응에서 이용하는 &Lt; 담체에On the carrier 대하여> About>

담체는, 본 발명에 따른 제조방법에 있어서, 동시에 사용하는 산이 OH전구체에 효과적으로 작용하는 역할을 갖는다고 생각된다. 예를 들어, 반응장에 존재하는 담체의 표면에 산이 흡착되어 촉매활성점을 형성하고, 이것이 OH전구체에 작용하여 반응효율을 비약적으로 높인다고 추측하고 있으나, 본 발명은 이 원리에 제한되는 것은 아니다.
It is considered that the carrier, in the production method according to the present invention, has a role in which the acid used at the same time acts effectively on the OH precursor. For example, it is presumed that the acid is adsorbed on the surface of the carrier present in the reaction field to form catalytic active sites, which act on the OH precursor to dramatically increase the reaction efficiency, but the present invention is not limited to this principle.

따라서, 담체로는 상기 작용을 나타낼 수 있는 물질이면 특별히 제한되지 않는다. 일 예로는, 무기산화물이나 금속황산화물 등을 들 수 있고, 이들은 다공질구조를 갖는(다공질물질인) 것이 바람직하다. 담체는, 단일의 종류를 단독으로 이용할 수도 있고, 2종 이상을 혼합하여 이용할 수도 있다.
Therefore, the carrier is not particularly limited as long as it is a substance capable of exhibiting the above-mentioned action. As an example, inorganic oxides and metal sulfates may be cited, and they are preferably porous materials (porous materials). As the carrier, a single kind may be used alone, or two or more kinds may be used in combination.

무기산화물로는, 실리카(SiO2), 알루미나(Al2O3), 티타니아(TiO2), 마그네시아(MgO), 지르코니아(ZrO2), 산화주석(SnO2 또는 SnO), 산화하프늄(HfO2), 산화철(Fe2O3 또는 Fe3O4) 등을 들 수 있고, 특히 알루미나나 실리카가 호적하게 이용된다.
Inorganic oxide include, silica (SiO 2), alumina (Al 2 O 3), titania (TiO 2), magnesia (MgO), zirconia (ZrO 2), tin oxide (SnO 2 or SnO), hafnium oxide (HfO 2 ), Iron oxide (Fe 2 O 3 or Fe 3 O 4 ), and alumina and silica are particularly preferably used.

금속황산화물로는, 황산알루미늄(Al2(SO4)3), 황산아연(ZnSO4), 황산주석(SnSO4), 황산철II(FeSO4), 황산철III(Fe2(SO4)3) 등을 들 수 있고, 특히 황산알루미늄이나 황산아연이 호적하게 이용된다.
Of a metal sulphate is aluminum sulphate (Al 2 (SO 4) 3 ), zinc sulfate (ZnSO 4), sulfuric acid, tin (SnSO 4), iron sulfate II (FeSO 4), ferrous sulfate III (Fe 2 (SO 4) 3 ), and aluminum sulfate and zinc sulfate are particularly used.

다공질물질인 경우, 비표면적은 30~1500g/m2가 바람직하고, 50~1000g/m2가 보다 바람직하고, 100~800g/m2가 보다 바람직하고, 200~700g/m2가 특히 바람직하고, 300~600g/m2가 가장 바람직하다. 비표면적이 30~1500g/m2이면 반응효율과 정제효율의 밸런스가 가장 우수하다.
If the porous material, the specific surface area is 30 ~ 1500g / m 2 it is preferable, and, 50 ~ 1000g / m 2 is more preferred, and, 100 ~ 800g / m 2 are more preferred, and, 200 ~ 700g / m 2 is particularly preferable. , And most preferably from 300 to 600 g / m 2 . When the specific surface area is 30 to 1500 g / m 2, the balance between the reaction efficiency and the purification efficiency is the most excellent.

반응에 사용하는 담체의 양은, 상기 비표면적에 따라 변하는 경우가 있는데, 일반적으로는 OH전구체 1몰에 대하여 0.1~5몰이 바람직하고, 0.2~3몰이 보다 바람직하고, 0.3~2몰이 보다 바람직하다.
The amount of the carrier used in the reaction may vary depending on the specific surface area. In general, the amount is preferably 0.1 to 5 moles, more preferably 0.2 to 3 moles, and still more preferably 0.3 to 2 moles per mole of the OH precursor.

담체의 형태로는, 특별히 한정되지 않으나, 분말상, 구형입상, 부정형과립상, 클러스터 등을 들 수 있다.
Examples of the carrier include, but are not limited to, powders, spherical granules, amorphous granules, clusters and the like.

<반응에서 이용하는 산에 대하여>&Lt; About the acid used in the reaction >

산은, OH전구체로부터 플루오렌계 화합물을 제조하는 종래의 일반적인 반응에서 이용해 온 산을 사용할 수 있다. 예를 들어, 염산, 질산, 황산, 인산, 폴리인산, 염소산, 브롬산, 요오드산, 과요오드산, 과망간산, 티오시안산, 테트라플루오로붕산, 헥사플루오로인산, 설폰산, 트리플루오로메탄설폰산, 파라톨루엔설폰산 등을 들 수 있다. 이들 산 중에서도, 바람직하게는 황산, 인산, 폴리인산 또는 설폰산이고, 농황산이 특히 바람직하다.
The acid can be an acid used in a conventional reaction for producing a fluorene compound from an OH precursor. For example, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, polyphosphoric acid, chloric acid, bromic acid, iodic acid, periodic acid, permanganic acid, thiocyanic acid, tetrafluoroboric acid, hexafluorophosphoric acid, Sulfonic acid, para-toluenesulfonic acid, and the like. Of these acids, sulfuric acid, phosphoric acid, polyphosphoric acid or sulfonic acid is preferable, and concentrated sulfuric acid is particularly preferable.

반응에 사용하는 산의 양은, 일반적으로는 OH전구체 1몰에 대하여 0.05~2몰이 바람직하고, 0.1~1몰이 보다 바람직하고, 0.2~0.5몰이 보다 바람직하다.
The amount of the acid to be used in the reaction is generally 0.05 to 2 moles, preferably 0.1 to 1 mole, and more preferably 0.2 to 0.5 moles, relative to 1 mole of the OH precursor.

<반응에서 이용하는 &Lt; 고정산Settlement 촉매에 대하여> About catalyst>

고정산 촉매는, 본 발명에 따른 제조방법에 있어서, 해당 촉매에 이미 결합(화학적결합, 물리흡착 등)하고 있는 산성 관능기가 OH전구체에 효과적으로 작용하는 역할을 갖는다고 생각된다. 예를 들어, 반응장에 존재하는 고정산 촉매의 표면에 산성 관능기가 존재해 있어, 이것이 OH전구체에 작용하여 반응효율을 비약적으로 높인다고 추측하고 있으나, 본 발명은 이 원리에 제한되는 것은 아니다.
It is considered that the high-fixation catalyst has a role that the acidic functional group already bonded (chemical bonding, physical adsorption, etc.) to the catalyst effectively acts on the OH precursor in the production method according to the present invention. For example, it is presumed that acidic functional groups are present on the surface of the high-purity catalyst existing in the reaction field, and that this acts on the OH precursor to dramatically increase the reaction efficiency, but the present invention is not limited to this principle.

산성 관능기로는, 설폰산기, 카르복실기, 인산기 등을 들 수 있다. 이들 산성 관능기 중에서도 설폰산기가 바람직하다. 또한 이 산성 관능기가 결합하는 물질로는 수지, 상기 서술한 담체, 다공질의 담체 등을 들 수 있다. 고정산 촉매로는, 예를 들어, 설폰화처리된 수지나 표면이 설폰화처리된 다공질물질 등을 들 수 있다.
Examples of the acidic functional group include a sulfonic acid group, a carboxyl group, and a phosphoric acid group. Among these acidic functional groups, a sulfonic acid group is preferable. Examples of the substance to which the acid functional group binds include a resin, the above-mentioned carrier, and a porous carrier. Examples of the high-fixation catalyst include a sulfonated resin and a porous material having a sulfonated surface.

고정산 촉매의 표면성상(表面性狀)으로는, 비표면적은 20~1200g/m2가 바람직하고, 30~1000g/m2가 보다 바람직하고, 40~800g/m2가 더욱 바람직하고, 80~600g/m2가 특히 바람직하고, 100~500g/m2가 가장 바람직하다. 비표면적이 20~1200g/m2이면 반응효율과 정제효율의 밸런스가 가장 우수하다. 또한, 고정산 촉매에 있어서의 산성 관능기 양은 0.05mmol/g 이상이 바람직하고, 0.1mmol/g 이상이 보다 바람직하고, 0.3mmol/g 이상이 더욱 바람직하고, 0.5mmol/g 이상이 특히 바람직하다. 산성 관능기 양이 0.05mmol/g 이상이면 반응효율이 우수하다.
A high surface property (表面性狀) of settled catalyst, the specific surface area is 20 ~ 1200g / m 2 is preferable, and, 30 ~ 1000g / m 2 is more preferable, and, 40 ~ 800g / m 2 is more preferred, and 80 to 600g / m 2, particularly preferably, 100 ~ 500g / m 2 is most preferable. When the specific surface area is 20 to 1200 g / m 2, the balance between the reaction efficiency and the purification efficiency is the most excellent. The amount of the acidic functional group in the fixed-bed catalyst is preferably 0.05 mmol / g or more, more preferably 0.1 mmol / g or more, still more preferably 0.3 mmol / g or more, and particularly preferably 0.5 mmol / g or more. When the amount of the acidic functional group is 0.05 mmol / g or more, the reaction efficiency is excellent.

구체적인 고정산 촉매로는, Sigma-Aldrich Japan 합동회사제의 폴리스티렌계 설폰산 이온교환수지, 예를 들어, AMBERLYST 15(H), AMBERLYST 16(H), AMBERLYST 36(H), AMBERLITE IR120(H), AMBERJET 1200(H), DOWEX 15W×2, DOWEX 15W×4, DOWEX 15W×8 등, Tayca Corporation제의 실리카겔계 설폰산고정산 촉매, 예를 들어, Taycacure-6, Taycacure-10, Taycacure-15 등, Wako Pure Chemical Industries, Ltd.제의 고농도 황산 함유 황산실리카겔, 예를 들어, 22%황산실리카겔, 44%황산실리카겔, 55%황산실리카겔 등을 들 수 있다.
AMBERLYST 15 (H), AMBERLYST 16 (H), AMBERLYST 36 (H), AMBERLITE IR120 (H), and AMBERLITE IR120 (H) are commercially available from Sigma-Aldrich Japan, Such as Taycacure-6, Taycacure-10, and Taycacure-15, manufactured by Tayca Corporation, such as AMBERJET 1200 (H), DOWEX 15W x 2, DOWEX 15W x 4, DOWEX 15W x 8, Sulfuric acid-containing silica gel containing high sulfuric acid such as 22% sulfuric acid silica gel, 44% sulfuric acid silica gel, and 55% sulfuric acid silica gel manufactured by Wako Pure Chemical Industries, Ltd.

반응에 사용하는 고정산 촉매의 양에 대해서는, 일반적으로는 OH전구체 1몰에 대하여 0.02~1몰의 산성 관능기 양이 되도록 하는 것이 바람직하고, 0.03~0.8몰의 산성 관능기 양이 되도록 하는 것이 보다 바람직하고, 0.05~0.7몰의 산성 관능기 양이 되도록 하는 것이 보다 바람직하다.
The amount of the high-purification catalyst to be used in the reaction is generally preferably from 0.02 to 1 mole of the acidic functional group per mole of the OH precursor, more preferably from 0.03 to 0.8 mole of the acidic functional group , And more preferably 0.05 to 0.7 mol of an acidic functional group.

한편, 알루미나, 실리카, 제올라이트 등의 무기산화물은, 그 표면에 산성을 갖는 활성점이 조금 존재한다는 점에서 고체산 촉매라고도 불리는 경우가 있는데, 이 고체산 촉매 자체는 본원의 비교예에서 검증되는 바와 같이 원하는 반응효율을 가지지 않는다. 따라서, 일반적으로 알려져 있는 고체산 촉매는, 본 발명에서는 고정산 촉매가 아닌 단지 담체로 분류된다.
On the other hand, inorganic oxides such as alumina, silica and zeolite are also sometimes referred to as solid acid catalysts because they have a small number of active sites having acidic properties on their surfaces. It does not have the desired reaction efficiency. Thus, the solid acid catalysts generally known are not simply fixed catalysts in the present invention, but are classified as carriers only.

<반응의 온도, 시간에 대하여>&Lt; Temperature and time of reaction >

반응온도는, OH전구체로부터 플루오렌계 화합물을 제조하는 종래의 일반적인 반응에서 이용해 온 온도라도 되는데, 50~200℃가 바람직하고, 70~150℃가 보다 바람직하고, 80~130℃가 더욱 바람직하다. 반응시간은, OH전구체로부터 플루오렌계 화합물을 제조하는 종래의 일반적인 반응에서 이용해 온 시간이어도 되는데, 0.1~10시간이 바람직하고, 0.5~5시간이 보다 바람직하고, 0.8~3시간이 더욱 바람직하다.
The reaction temperature may be a temperature which has been used in a conventional reaction for producing a fluorene compound from an OH precursor, preferably 50 to 200 ° C, more preferably 70 to 150 ° C, and even more preferably 80 to 130 ° C . The reaction time may be a time used in a conventional reaction for producing a fluorene compound from an OH precursor, preferably 0.1 to 10 hours, more preferably 0.5 to 5 hours, and even more preferably 0.8 to 3 hours .

<반응용매에 대하여>&Lt; Regarding Reaction Solvent >

반응에 사용하는 용매는, OH전구체로부터 플루오렌계 화합물을 제조하는 종래의 일반적인 반응에서 이용해 온 용매라도 되는데, 예를 들어, 디클로로메탄, 오르토디클로로벤젠, 사염화탄소, 톨루엔, 자일렌, o-자일렌, p-자일렌, m-자일렌, 1,2,3-트리메틸벤젠, 1,2,4-트리메틸벤젠, 1,3,5-트리메틸벤젠, 아세트산, 클로로포름 등을 들 수 있다. 특히, 톨루엔, 자일렌, o-자일렌, p-자일렌, m-자일렌, 1,2,3-트리메틸벤젠, 1,2,4-트리메틸벤젠, 1,3,5-트리메틸벤젠이 바람직하다.
The solvent used in the reaction may be a solvent which has been used in a conventional reaction for producing a fluorene compound from an OH precursor. Examples of the solvent include dichloromethane, orthodichlorobenzene, carbon tetrachloride, toluene, xylene, , p-xylene, m-xylene, 1,2,3-trimethylbenzene, 1,2,4-trimethylbenzene, 1,3,5-trimethylbenzene, acetic acid and chloroform. Particularly preferable are toluene, xylene, o-xylene, p-xylene, m-xylene, 1,2,3-trimethylbenzene, 1,2,4-trimethylbenzene and 1,3,5-trimethylbenzene Do.

실시예Example

이하, 실시예를 통해 본 발명을 더욱 구체적으로 설명하나, 본 발명은 이것들로 한정되는 것은 아니다.
Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited thereto.

[실시예 1][Example 1]

담체로서 Wako Pure Chemical Industries, Ltd.제의 활성알루미나(Al2O3) 및 산으로서 농황산을 이용하여, OH전구체로부터 플루오렌계 목적 화합물의 합성을 시도하였다. 한편, 활성알루미나(Al2O3)는 평균입경 45μm, 비표면적 137m2/g이다.
Synthesis of a fluorene-based target compound from an OH precursor was attempted using activated alumina (Al 2 O 3 ) manufactured by Wako Pure Chemical Industries, Ltd. as a carrier and concentrated sulfuric acid as an acid. On the other hand, activated alumina (Al 2 O 3 ) has an average particle diameter of 45 μm and a specific surface area of 137 m 2 / g.

먼저, 질소분위기하, (3,5-디플루오로페닐)보론산(31.65g), 메틸 2-브로모-5-클로로벤조에이트(50g), 테트라키스(트리페닐포스핀)팔라듐(0)(6.95g, 「Pd(PPh3)4」), 탄산칼륨(55.4g) 및 톨루엔(450ml)을 플라스크에 넣어 5분간 교반하였다. 그 후, 물(50ml)을 첨가하고, 4시간 환류하였다. 가열종료 후에 반응액을 냉각하고, 물(100ml)을 첨가하였다. 그 후, 반응혼합액을 톨루엔으로 추출하고, 유기층을 무수황산나트륨으로 건조한 후, 건조제를 제거하고, 용매를 감압유거하여 얻어진 조제품(粗製品)을 적량의 톨루엔에 용해하고, 실리카겔로 칼럼 정제(용매: 헵탄/톨루엔=1/2(용량비))하여, 용매를 감압유거함으로써, 메틸 4-클로로-3’,5’-디플루오로-[1,1’-비페닐]-2-카르복실레이트를 얻었다(57g, 수율 100%).First, 31.65 g of (3,5-difluorophenyl) boronic acid, 50 g of methyl 2-bromo-5-chlorobenzoate, tetrakis (triphenylphosphine) palladium (0) (6.95 g, "Pd (PPh 3 ) 4" ), potassium carbonate (55.4 g) and toluene (450 ml) were placed in a flask and stirred for 5 minutes. Then, water (50 ml) was added and refluxed for 4 hours. After the completion of the heating, the reaction solution was cooled, and water (100 ml) was added. Thereafter, the reaction mixture was extracted with toluene, and the organic layer was dried over anhydrous sodium sulfate. The drying agent was removed, and the solvent was distilled off under reduced pressure. The crude product was dissolved in an appropriate amount of toluene. Column purification (solvent: Chloro-3 ', 5'-difluoro- [1,1'-biphenyl] -2-carboxylate was obtained by reducing the solvent under reduced pressure to give methyl 4-chloro-3', 5'-difluoro- [heptane / toluene = (57 g, yield 100%).

Figure pat00022

Figure pat00022

다음에, 질소분위기하, 메틸 4-클로로-3’,5’-디플루오로-[1,1’-비페닐]-2-카르복실레이트(22g) 및 테트라하이드로퓨란(50ml)을 플라스크에 넣어 5분간 교반하고, 0.96M의 브롬화메틸마그네슘의 테트라하이드로퓨란용액(250ml)을 천천히 적하한 후, 반응액을 실온에서 2시간 교반하였다. 그 후, 포화염화암모늄 수용액(150ml)을 천천히 적하하였다. 반응혼합액을 아세트산에틸로 추출하고, 유기층을 무수황산나트륨으로 건조한 후, 건조제를 제거하고, 용매를 감압유거하여 얻어진 조제품을 적량의 톨루엔에 용해하고, 실리카겔로 칼럼 정제(용매: 톨루엔)하여, 용매를 감압유거함으로써, OH전구체인 2-(4-클로로-3’,5’-디플루오로-[1,1’-비페닐]-2-일)프로판-2-올을 얻었다(21.5g, 수율 97.7%).Then, methyl 4-chloro-3 ', 5'-difluoro- [1,1'-biphenyl] -2-carboxylate (22 g) and tetrahydrofuran (50 ml) were added to a flask The mixture was stirred for 5 minutes, and a tetrahydrofuran solution (250 ml) of 0.96 M methylmagnesium bromide was slowly added dropwise, and then the reaction solution was stirred at room temperature for 2 hours. Thereafter, a saturated aqueous ammonium chloride solution (150 ml) was slowly added dropwise. The reaction mixture was extracted with ethyl acetate, and the organic layer was dried over anhydrous sodium sulfate. The drying agent was removed, and the solvent was distilled off under reduced pressure. The resulting product was dissolved in an appropriate amount of toluene and subjected to column purification using silica gel (solvent: toluene) (OH) precursor, 2- (4-chloro-3 ', 5'-difluoro- [1,1'-biphenyl] -2-yl) propan- 97.7%).

Figure pat00023

Figure pat00023

마지막으로, 2-(4-클로로-3’,5’-디플루오로-[1,1’-비페닐]-2-일)프로판-2-올(1.13g), 활성알루미나(Al2O3)(0.4g) 및 톨루엔(16ml)을 플라스크에 넣고, 교반하면서 농황산(0.08g)을 첨가하였다. 그 후, 110℃에서 1시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 100%였다. 반응종료 후, 반응액을 실리카겔로 쇼트칼럼 정제(용매: 톨루엔)하여, 용매를 감압유거함으로써, 플루오렌계 목적 화합물인 7-클로로-1,3-디플루오로-9,9-디메틸-9H-플루오렌을 얻었다(1.04g, 수율 98%). 한편, 이 반응에 있어서의 OH전구체:활성알루미나:농황산의 몰비율은 약 1:1:0.2이다.Finally, 2- (4-chloro-3 ', 5'-difluoro- [1,1'-biphenyl] -2-yl) propan-2-ol (1.13g), activated alumina (Al 2 O 3 ) (0.4 g) and toluene (16 ml) were placed in a flask, and concentrated sulfuric acid (0.08 g) was added with stirring. Thereafter, the mixture was refluxed at 110 DEG C for 1 hour. The reaction solution was analyzed by gas chromatography. As a result, the conversion rate from the OH precursor to the fluorene target compound was 100%. After completion of the reaction, the reaction solution was subjected to short column purification (solvent: toluene) with silica gel and the solvent was distilled off under reduced pressure to obtain 7-chloro-1,3-difluoro-9,9- -Fluorene was obtained (1.04 g, yield 98%). On the other hand, the molar ratio of the OH precursor: activated alumina: concentrated sulfuric acid in this reaction is about 1: 1: 0.2.

Figure pat00024

Figure pat00024

MS스펙트럼 및 NMR측정을 통해 플루오렌계 목적 화합물의 구조를 확인하였다.The structure of the fluorene-based target compound was confirmed by MS spectrum and NMR measurement.

1H-NMR(CDCl3):δ=7.55(d,1H), 7.38(s,1H), 7.32(d,1H), 7.15(d,1H), 6.70(t,1H), 1.56(s,6H).
1 H-NMR (CDCl 3) : δ = 7.55 (d, 1H), 7.38 (s, 1H), 7.32 (d, 1H), 7.15 (d, 1H), 6.70 (t, 1H), 1.56 (s, 6H).

[비교예 1][Comparative Example 1]

담체를 이용하지 않고, 산으로서 농황산을 이용하여, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다.
Synthesis of the fluorene-based target compound from the OH precursor was attempted using concentrated sulfuric acid as an acid without using a carrier.

상기 OH전구체(1.13g) 및 아세트산(16ml)을 플라스크에 넣고, 교반하면서 농황산(0.08g)을 첨가하였다. 그 후, 117℃에서 1시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 17.7%였고, 올레핀계 부생성물로의 전화율은 82.3%였다. 반응종료 후, 물(20ml)을 첨가하였다. 반응혼합액을 톨루엔으로 추출하고, 유기층을 무수황산나트륨으로 건조한 후, 건조제를 제거하고, 용매를 감압유거하여 얻어진 조제품을 적량의 톨루엔에 용해하고, 실리카겔로 칼럼 정제(용매: 헵탄)하여, 용매를 감압유거함으로써, 올레핀계 부생성물인 4-클로로-3’,5’-디플루오로-2-(프로펜-2-일)-1,1’-비페닐을 얻었다(0.75g, 수율 71%). 한편, 이 반응에 있어서의 OH전구체:농황산의 몰비율은 약 1:0.2이다.The OH precursor (1.13 g) and acetic acid (16 ml) were placed in a flask, and concentrated sulfuric acid (0.08 g) was added with stirring. Thereafter, the mixture was refluxed at 117 DEG C for 1 hour. The reaction solution was analyzed by gas chromatography. As a result, the conversion rate from the OH precursor to the fluorene-based target compound was 17.7%, and the conversion rate to the olefin based product was 82.3%. After completion of the reaction, water (20 ml) was added. The reaction mixture was extracted with toluene, and the organic layer was dried over anhydrous sodium sulfate. The drying agent was removed, and the solvent was distilled off under reduced pressure. The resulting product was dissolved in an appropriate amount of toluene, and the residue was purified by silica gel column chromatography (solvent: heptane) By distillation, an olefinic side product, 4-chloro-3 ', 5'-difluoro-2- (propen-2-yl) -1,1'-biphenyl was obtained (0.75 g, yield 71% . On the other hand, the molar ratio of the OH precursor: concentrated sulfuric acid in this reaction is about 1: 0.2.

Figure pat00025

Figure pat00025

MS스펙트럼 및 NMR측정을 통해 올레핀계 부생성물의 구조를 확인하였다.MS spectrum and NMR measurements confirmed the structure of the olefinic byproducts.

1H-NMR(CDCl3):δ=7.29(s,1H), 7.28(d,1H), 7.16(d,1H), 6.90(d,2H), 6.75(t,1H), 5.13(s,1H), 4.99(s,1H), 1.68(s,3H).
1 H-NMR (CDCl 3) : δ = 7.29 (s, 1H), 7.28 (d, 1H), 7.16 (d, 1H), 6.90 (d, 2H), 6.75 (t, 1H), 5.13 (s, 1H), 4.99 (s, 1H), 1.68 (s, 3H).

[비교예 2][Comparative Example 2]

담체를 이용하지 않고, 산으로서 농황산을 이용하여, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다.
Synthesis of the fluorene-based target compound from the OH precursor was attempted using concentrated sulfuric acid as an acid without using a carrier.

상기 OH전구체(1.13g) 및 톨루엔(16ml)을 플라스크에 넣고, 교반하면서 농황산(0.08g)을 첨가하였다. 그 후, 110℃에서 1시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 37.7%였고, 올레핀계 부생성물로의 전화율은 62.3%였다. 한편, 이 반응에 있어서의 OH전구체:농황산의 몰비율은 약 1:0.2이다.
The OH precursor (1.13 g) and toluene (16 ml) were placed in a flask, and concentrated sulfuric acid (0.08 g) was added with stirring. Thereafter, the mixture was refluxed at 110 DEG C for 1 hour. The reaction solution was analyzed by gas chromatography. As a result, the conversion from the OH precursor to the fluorene-based target compound was 37.7%, and the conversion to olefinic by-products was 62.3%. On the other hand, the molar ratio of the OH precursor: concentrated sulfuric acid in this reaction is about 1: 0.2.

[비교예 3][Comparative Example 3]

담체로서 실시예 1과 동일한 활성알루미나(Al2O3)를 이용하여, 산을 이용하지 않고, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다.
As the carrier, the same activated alumina (Al 2 O 3 ) as in Example 1 was used to synthesize the fluorene-based target compound from the OH precursor without using an acid.

상기 OH전구체(1.13g), 활성알루미나(0.4g) 및 톨루엔(16ml)을 플라스크에 넣은 후, 110℃에서 1시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, 잔류한 OH전구체가 95%였고, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 0%였고, 올레핀계 부생성물로의 전화율은 5%였다. 한편, 이 반응에 있어서의 OH전구체:활성알루미나의 몰비율은 약 1:1이다.
The OH precursor (1.13 g), activated alumina (0.4 g) and toluene (16 ml) were placed in a flask and refluxed at 110 ° C for 1 hour. The reaction solution was analyzed by gas chromatography to find that the remaining OH precursor was 95%, the conversion rate from the OH precursor to the fluorene target compound was 0%, and the conversion rate to the olefinic side product was 5%. On the other hand, the molar ratio of the OH precursor: activated alumina in this reaction is about 1: 1.

[비교예 4][Comparative Example 4]

담체를 이용하지 않고, 산으로서 트리플루오로보란디에틸에테르 착체(Et2O·BF3)를 이용하여, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다.
Synthesis of the fluorene-based target compound from the OH precursor was attempted using a trifluoroborane ethyl ether complex (Et 2 O. BF 3 ) as an acid without using a carrier.

상기 OH전구체(2.83g) 및 클로로포름(30ml)을 플라스크에 넣고, 5℃ 이하로 냉각하였다. 0~5℃온도의 범위에서 트리플루오로보란디에틸에테르 착체(2.13g)를 적하한 후, 실온에서 1시간 교반하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 30.5%였고, 올레핀계 부생성물로의 전화율은 69.5%였다. 한편, 이 반응에 있어서의 OH전구체:트리플루오로보란디에틸에테르 착체의 몰비율은 약 1:1.5이다.
The OH precursor (2.83 g) and chloroform (30 ml) were placed in a flask and cooled to 5 캜 or lower. Trifluoroboron diethyl ether complex (2.13 g) was added dropwise at a temperature range of 0 to 5 占 폚, and the mixture was stirred at room temperature for 1 hour. The reaction solution was analyzed by gas chromatography. As a result, the conversion rate from the OH precursor to the fluorene-based target compound was 30.5% and the conversion rate to the olefinic side product was 69.5%. On the other hand, the molar ratio of the OH precursor: trifluoroborane diethyl ether complex in this reaction is about 1: 1.5.

[실시예 2][Example 2]

담체로서 실시예 1과 동일한 활성알루미나(Al2O3) 및 산으로서 농황산을 이용하여, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다.
Synthesis of the fluorene-based target compound from the OH precursor was attempted using the same activated alumina (Al 2 O 3 ) as in Example 1 as a carrier and concentrated sulfuric acid as an acid.

상기 OH전구체(1.13g), 활성알루미나(0.14g) 및 톨루엔(16ml)을 플라스크에 넣고, 교반하면서 농황산(0.08g)을 첨가하였다. 그 후, 110℃에서 2시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 100%였다. 반응종료 후, 반응액을 실리카겔로 쇼트칼럼 정제(용매: 톨루엔)하여, 용매를 감압유거함으로써, 상기 플루오렌계 목적 화합물을 얻었다. 한편, 이 반응에 있어서의 OH전구체:활성알루미나:농황산의 몰비율은 약 1:0.35:0.2이다.
The OH precursor (1.13 g), activated alumina (0.14 g) and toluene (16 ml) were placed in a flask and concentrated sulfuric acid (0.08 g) was added with stirring. Thereafter, the mixture was refluxed at 110 DEG C for 2 hours. The reaction solution was analyzed by gas chromatography. As a result, the conversion rate from the OH precursor to the fluorene target compound was 100%. After completion of the reaction, the reaction solution was subjected to short column purification (solvent: toluene) with silica gel, and the solvent was distilled off under reduced pressure to obtain the desired fluorene-based compound. On the other hand, the molar ratio of the OH precursor: activated alumina: concentrated sulfuric acid in this reaction is about 1: 0.35: 0.2.

[비교예 5][Comparative Example 5]

담체를 이용하지 않고, 산으로서 농황산을 이용하여, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다.
Synthesis of the fluorene-based target compound from the OH precursor was attempted using concentrated sulfuric acid as an acid without using a carrier.

상기 OH전구체(1.13g) 및 톨루엔(16ml)을 플라스크에 넣고, 교반하면서 농황산(0.08g)을 첨가하였다. 그 후, 110℃에서 2시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 36.5%였고, 올레핀계 부생성물로의 전화율은 63.5%였다. 한편, 이 반응에 있어서의 OH전구체:농황산의 몰비율은 약 1:0.2이다.
The OH precursor (1.13 g) and toluene (16 ml) were placed in a flask, and concentrated sulfuric acid (0.08 g) was added with stirring. Thereafter, the mixture was refluxed at 110 DEG C for 2 hours. The reaction solution was analyzed by gas chromatography. As a result, the conversion from the OH precursor to the fluorene-based target compound was 36.5%, and the conversion to olefinic by-products was 63.5%. On the other hand, the molar ratio of the OH precursor: concentrated sulfuric acid in this reaction is about 1: 0.2.

[실시예 3][Example 3]

담체로서 Shin-Etsu Kasei Kogyo Co., Ltd.제의 구상 실리카겔(SiO2, 제품명: PSQ100) 및 산으로서 농황산을 이용하여, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다. 한편, 실리카겔(SiO2)은 평균입경 110μm, 비표면적 490m2/g이다.
Synthesis of the fluorene-based target compound from the OH precursor was attempted using spherical silica gel (SiO 2 , product name: PSQ100) manufactured by Shin-Etsu Kasei Kogyo Co., Ltd. as carrier and concentrated sulfuric acid as acid. On the other hand, silica gel (SiO 2 ) has an average particle size of 110 μm and a specific surface area of 490 m 2 / g.

상기 OH전구체(1.13g), 실리카겔(0.4g) 및 톨루엔(16ml)을 플라스크에 넣고, 교반하면서 농황산(0.08g)을 첨가하였다. 그 후, 110℃에서 2시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 100%였다. 한편, 이 반응에 있어서의 OH전구체:실리카겔:농황산의 몰비율은 약 1:1.7:0.2이다.
The OH precursor (1.13 g), silica gel (0.4 g) and toluene (16 ml) were placed in a flask, and concentrated sulfuric acid (0.08 g) was added with stirring. Thereafter, the mixture was refluxed at 110 DEG C for 2 hours. The reaction solution was analyzed by gas chromatography. As a result, the conversion rate from the OH precursor to the fluorene target compound was 100%. On the other hand, the molar ratio of the OH precursor: silica gel: concentrated sulfuric acid in this reaction is about 1: 1.7: 0.2.

[비교예 6][Comparative Example 6]

담체로서 실시예 3과 동일한 실리카겔(SiO2)을 이용하여, 산을 이용하지 않고, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다.
Synthesis of the fluorene-based target compound from the OH precursor was attempted using the same silica gel (SiO 2 ) as that in Example 3 as a carrier and without using an acid.

상기 OH전구체(1.13g), 실리카겔(0.4g) 및 톨루엔(16ml)을 플라스크에 넣은 후, 110℃에서 2시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, 잔류한 OH전구체가 93.2%였고, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 0%였고, 올레핀계 부생성물로의 전화율은 6.8%였다. 한편, 이 반응에 있어서의 OH전구체:실리카겔의 몰비율은 약 1:1.7이다.
The OH precursor (1.13 g), silica gel (0.4 g) and toluene (16 ml) were placed in a flask and refluxed at 110 ° C for 2 hours. The reaction solution was analyzed by gas chromatography to find that the remaining OH precursor was 93.2%, the conversion rate from the OH precursor to the fluorene target compound was 0%, and the conversion rate to the olefin side product was 6.8%. On the other hand, the molar ratio of the OH precursor: silica gel in this reaction is about 1: 1.7.

[실시예 4][Example 4]

담체로서 미분말의 황산알루미늄(Al2(SO4)3) 및 산으로서 농황산을 이용하여, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다.
Synthesis of the fluorene-based target compound from the OH precursor was attempted using a fine powder of aluminum sulfate (Al 2 (SO 4 ) 3 ) as a carrier and concentrated sulfuric acid as an acid.

상기 OH전구체(1.13g), 황산알루미늄(0.4g) 및 톨루엔(16ml)을 플라스크에 넣고, 교반하면서 농황산(0.08g)을 첨가하였다. 그 후, 110℃에서 2시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 100%였다. 한편, 이 반응에 있어서의 OH전구체:황산알루미늄:농황산의 몰비율은 약 1:0.3:0.2이다.
The OH precursor (1.13 g), aluminum sulfate (0.4 g) and toluene (16 ml) were placed in a flask and concentrated sulfuric acid (0.08 g) was added with stirring. Thereafter, the mixture was refluxed at 110 DEG C for 2 hours. The reaction solution was analyzed by gas chromatography. As a result, the conversion rate from the OH precursor to the fluorene target compound was 100%. On the other hand, the molar ratio of the OH precursor: aluminum sulfate: concentrated sulfuric acid in this reaction was about 1: 0.3: 0.2.

[비교예 7][Comparative Example 7]

담체로서 실시예 4와 동일한 황산알루미늄(Al2(SO4)3)을 이용하여, 산을 이용하지 않고, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다.
Synthesis of the fluorene-based target compound from the OH precursor was attempted using the same aluminum sulfate (Al 2 (SO 4 ) 3 ) as in Example 4 as a carrier and without using an acid.

상기 OH전구체(1.13g), 황산알루미늄(0.4g) 및 톨루엔(16ml)을 플라스크에 넣은 후, 110℃에서 2시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, 잔류한 OH전구체가 3.2%였고, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 15.5%였고, 올레핀계 부생성물로의 전화율은 81.3%였다. 한편, 이 반응에 있어서의 OH전구체:황산알루미늄의 몰비율은 약 1:0.3이다.
The OH precursor (1.13 g), aluminum sulfate (0.4 g) and toluene (16 ml) were placed in a flask and refluxed at 110 ° C for 2 hours. The reaction solution was analyzed by gas chromatography to find that the residual OH precursor was 3.2%, the conversion rate from the OH precursor to the fluorene target compound was 15.5%, and the conversion rate to the olefinic side product was 81.3%. On the other hand, the molar ratio of the OH precursor: aluminum sulfate in this reaction is about 1: 0.3.

[실시예 5][Example 5]

고정산 촉매로서 스티렌-디비닐벤젠 강산성화 매크로 망상 수지(Styrene-DVB strongly acidic macroreticular resin)(제품명: AMBERLYST 15(H))를 이용하여, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다. 한편, AMBERLYST 15(H)는, 설폰산을 관능기로서 갖는 폴리스티렌계의 강양이온교환수지이고, 설폰산의 함유량이 4.4mmol/g이고, 비표면적이 50m2/g이다.
The synthesis of the fluorene-based target compound from the OH precursor was attempted using Styrene-DVB strongly acidic macroreticular resin (trade name: AMBERLYST 15 (H)) as a high-fixation catalyst. Respectively. On the other hand, AMBERLYST 15 (H) is a polystyrene type strong cation exchange resin having sulfonic acid as a functional group, and has a sulfonic acid content of 4.4 mmol / g and a specific surface area of 50 m 2 / g.

상기 OH전구체(1.13g), AMBERLYST 15(H)(0.4g) 및 톨루엔(16ml)을 플라스크에 넣고, 110℃에서 2시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 100%였다. 한편, 이 반응에 있어서의 OH전구체:고정산 촉매의 산성 관능기의 몰비율은 약 1:0.44이다.
The OH precursor (1.13 g), AMBERLYST 15 (H) (0.4 g) and toluene (16 ml) were placed in a flask and refluxed at 110 ° C for 2 hours. The reaction solution was analyzed by gas chromatography. As a result, the conversion rate from the OH precursor to the fluorene target compound was 100%. On the other hand, the molar ratio of the acid functional group of the OH precursor to the high-settling catalyst in this reaction is about 1: 0.44.

[실시예 6][Example 6]

고정산 촉매로서 Wako Pure Chemical Industries, Ltd.제의 고농도 황산 함유 실리카겔(제품명: 55%황산실리카겔)를 이용하여, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다. 한편, 고농도 황산 함유 실리카겔의 비표면적은 300~800m2/g이다.
Synthesis of the fluorene-based target compound from the OH precursor was attempted using a high-concentration sulfuric acid-containing silica gel (product name: 55% sulfuric acid silica gel) manufactured by Wako Pure Chemical Industries, Ltd. as a high-settling catalyst. On the other hand, the specific surface area of the high-concentration sulfuric acid-containing silica gel is 300 to 800 m 2 / g.

상기 OH전구체(1.13g) 및 톨루엔(16ml)을 플라스크에 넣고, 실온에서 1분간 교반한 후, 55%황산실리카겔(0.4g)을 첨가하였다. 그 후, 110℃에서 2시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 100%였다. 한편, 이 반응에 있어서의 OH전구체:고정산 촉매의 산성 관능기의 몰비율은 약 1:0.56이다.
The OH precursor (1.13 g) and toluene (16 ml) were placed in a flask, stirred at room temperature for 1 minute, and then 55% sulfuric acid silica gel (0.4 g) was added. Thereafter, the mixture was refluxed at 110 DEG C for 2 hours. The reaction solution was analyzed by gas chromatography. As a result, the conversion rate from the OH precursor to the fluorene target compound was 100%. On the other hand, the molar ratio of the acid functional group of the OH precursor to the high-settling catalyst in this reaction is about 1: 0.56.

[실시예 7][Example 7]

고정산 촉매로서 Tayca Corporation제의 Taycacure(제품명: Taycacure SAC-10)를 이용하여, 상기 OH전구체로부터 상기 플루오렌계 목적 화합물의 합성을 시도하였다. 한편, Taycacure SAC-10의 설폰산의 함유량은 0.84mmol/g이고, 비표면적은 245m2/g이다.
Synthesis of the fluorene-based target compound from the OH precursor was attempted using Taycacure (product name: Taycacure SAC-10) manufactured by Tayca Corporation as a high-fixation catalyst. On the other hand, the content of the sulfonic acid in the Taycacure SAC-10 is 0.84 mmol / g and the specific surface area is 245 m 2 / g.

상기 OH전구체(1.13g), Taycacure SAC-10(0.4g) 및 톨루엔(16ml)을 플라스크에 넣고, 110℃에서 2시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 100%였다. 한편, 이 반응에 있어서의 OH전구체:고정산 촉매의 산성 관능기의 몰비율은 약 1:0.084이다.
The OH precursor (1.13 g), Taycacure SAC-10 (0.4 g) and toluene (16 ml) were placed in a flask and refluxed at 110 ° C for 2 hours. The reaction solution was analyzed by gas chromatography. As a result, the conversion rate from the OH precursor to the fluorene target compound was 100%. On the other hand, the molar ratio of the acidic functional group of the OH precursor to the high-settling catalyst in this reaction is about 1: 0.084.

[실시예 8][Example 8]

고정산 촉매로서 Tayca Corporation제의 Taycacure(제품명: Taycacure SAC-15)를 이용하여, 상기와는 상이한 OH전구체로부터 플루오렌계 목적 화합물의 합성을 시도하였다. 한편, Taycacure SAC-15의 설폰산의 함유량은 0.55mmol/g이고, 비표면적은 205m2/g이다.
Synthesis of fluorene-based target compounds was attempted from a different OH precursor using Taycacure (product name: Taycacure SAC-15) manufactured by Tayca Corporation as a high-settling catalyst. On the other hand, the content of the sulfonic acid in the Taycacure SAC-15 is 0.55 mmol / g and the specific surface area is 205 m 2 / g.

먼저, 질소분위기하, 메틸 2-하이드로옥시-4-메톡시벤조에이트(50g) 및 피리딘(350ml)을 플라스크에 넣고, 0℃까지 냉각한 후, 트리플루오로메탄설폰산무수물(154.9g, 「Tf2O」)을 천천히 적하하였다. 그 후, 반응액을 0℃에서 1시간, 실온에서 2시간 교반하였다. 반응 후, 물을 500ml 첨가하였다. 반응혼합액을 톨루엔으로 추출하고, 유기층을 무수황산나트륨으로 건조한 후, 건조제를 제거하고, 용매를 감압유거하였다. 얻어진 조제품을 적량의 톨루엔에 용해하고, 실리카겔로 칼럼 정제(용매: 톨루엔)하여, 용매를 감압유거함으로써, 메틸 4-메톡시-2-(((트리플루오로메틸)설포닐)옥시)벤조에이트를 얻었다(86.3g, 수율 100%).First, methyl 2-hydroxy-4-methoxybenzoate (50 g) and pyridine (350 ml) were placed in a flask, cooled to 0 ° C, and then trifluoromethanesulfonic anhydride (154.9 g, Tf 2 O &quot;) was slowly added dropwise. Thereafter, the reaction solution was stirred at 0 占 폚 for 1 hour and at room temperature for 2 hours. After the reaction, 500 ml of water was added. The reaction mixture was extracted with toluene, and the organic layer was dried over anhydrous sodium sulfate, and then the drying agent was removed, and the solvent was distilled off under reduced pressure. The obtained preparation was dissolved in an appropriate amount of toluene and subjected to column purification (solvent: toluene) using silica gel. The solvent was distilled off under reduced pressure to obtain methyl 4-methoxy-2 - (((trifluoromethyl) sulfonyl) oxy) benzoate (86.3 g, 100% yield).

Figure pat00026

Figure pat00026

다음에, 질소분위기하, 메틸 4-메톡시-2-(((트리플루오로메틸)설포닐)옥시)벤조에이트(23g), (4-(디페닐아미노)페닐)보론산(25.4g), 테트라키스(트리페닐포스핀)팔라듐(0)(2.54g, 「Pd(PPh3)4」), 인산삼칼륨(31.1g), 톨루엔(184ml) 및 에탄올(28ml)을 플라스크에 넣어 5분간 교반하였다. 그 후, 물(28ml)을 첨가하고, 3시간 환류하였다. 가열종료 후에 반응액을 냉각하고, 물(150ml)을 첨가하였다. 그 후, 반응혼합액을 톨루엔으로 추출하고, 유기층을 무수황산나트륨으로 건조한 후, 건조제를 제거하고, 용매를 감압유거하였다. 얻어진 조제품을 적량의 톨루엔에 용해하고, 실리카겔로 칼럼 정제(용매: 헵탄/톨루엔=1/2(용량비))하여, 용매를 감압유거함으로써, 메틸 4’-(디페닐아미노)-5-메톡시-[1,1-비페닐]-2-카르복실레이트를 얻었다(29.7g, 수율 99%).Subsequently, 23 g of methyl 4-methoxy-2 - (((trifluoromethyl) sulfonyl) oxybenzoate and 25.4 g of (4- (diphenylamino) phenyl) , Triphenylphosphine palladium (0) (2.54 g, "Pd (PPh 3 ) 4" ), tripotassium phosphate (31.1 g), toluene (184 ml) and ethanol (28 ml) Lt; / RTI &gt; Water (28 ml) was then added and refluxed for 3 hours. After the completion of heating, the reaction solution was cooled, and water (150 ml) was added. Thereafter, the reaction mixture was extracted with toluene, and the organic layer was dried over anhydrous sodium sulfate, the drying agent was removed, and the solvent was distilled off under reduced pressure. The resulting preparation was dissolved in an appropriate amount of toluene and subjected to column purification using silica gel (solvent: heptane / toluene = 1/2 (volume ratio)) and the solvent was distilled off under reduced pressure to obtain methyl 4 '- (diphenylamino) - [1,1-biphenyl] -2-carboxylate (29.7 g, yield 99%).

Figure pat00027

Figure pat00027

다음에, 질소분위기하, 메틸 4’-(디페닐아미노)-5-메톡시-[1,1-비페닐]-2-카르복실레이트(35g) 및 테트라하이드로퓨란(45ml)을 플라스크에 넣어 5분간 교반하고, 0.91M의 브롬화메틸마그네슘의 테트라하이드로퓨란용액(375ml)을 천천히 적하하였다. 그 후, 반응액을 4시간 환류하였다. 반응종료 후, 포화염화암모늄 수용액(400ml)을 천천히 적하하였다. 반응혼합액을 아세트산에틸로 추출하고, 유기층을 무수황산나트륨으로 건조한 후, 건조제를 제거하고, 용매를 감압유거하였다. 얻어진 조제품을 적량의 톨루엔에 용해하고, 실리카겔로 칼럼 정제(용매: 톨루엔)하여, 용매를 감압유거함으로써, 상기와는 상이한 OH전구체인 2-(4’-(디페닐아미노)-5-메톡시-[1,1’-비페닐]-2-일)프로판-2-올을 얻었다(25.7g, 수율 73.4%).Then, 35 g of methyl 4 '- (diphenylamino) -5-methoxy- [1,1-biphenyl] -2-carboxylate and 45 ml of tetrahydrofuran were placed in a flask under a nitrogen atmosphere The mixture was stirred for 5 minutes, and a tetrahydrofuran solution (375 ml) of 0.91 M methylmagnesium bromide was slowly added dropwise. Thereafter, the reaction solution was refluxed for 4 hours. After completion of the reaction, a saturated aqueous ammonium chloride solution (400 ml) was slowly added dropwise. The reaction mixture was extracted with ethyl acetate, and the organic layer was dried over anhydrous sodium sulfate, and the drying agent was removed, and the solvent was distilled off under reduced pressure. The resulting preparation was dissolved in an appropriate amount of toluene and subjected to column purification (solvent: toluene) using silica gel and the solvent was distilled off under reduced pressure to obtain 2- (4'- (diphenylamino) -5-methoxy - [1,1'-biphenyl] -2-yl) propan-2-ol was obtained (25.7 g, yield 73.4%).

Figure pat00028

Figure pat00028

마지막으로, 이렇게 하여 얻어진 OH전구체(13.5g), Taycacure SAC-15(6.7g) 및 톨루엔(162ml)을 플라스크에 넣고, 110℃에서 2시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 100%였다. 반응종료 후, 반응액을 실리카겔로 쇼트칼럼 정제(용매: 톨루엔)하여, 용매를 감압유거함으로써, 플루오렌계 목적 화합물인 6-메톡시-9,9-디메틸-N,N-디페닐-9H-플루오렌-2-아민을 얻었다(12.7g, 수율 98%). 한편, 이 반응에 있어서의 OH전구체:고정산 촉매의 산성 관능기의 몰비율은 약 1:0.11이다.Finally, the obtained OH precursor (13.5 g), Taycacure SAC-15 (6.7 g) and toluene (162 ml) were placed in a flask and refluxed at 110 ° C for 2 hours. The reaction solution was analyzed by gas chromatography. As a result, the conversion rate from the OH precursor to the fluorene target compound was 100%. After completion of the reaction, the reaction solution was subjected to short column purification (solvent: toluene) with silica gel and the solvent was distilled off under reduced pressure to obtain 6-methoxy-9,9-dimethyl-N, N-diphenyl-9H -Fluorene-2-amine (12.7 g, yield 98%). On the other hand, the molar ratio of the acid functional group of the OH precursor to the high-settling catalyst in this reaction is about 1: 0.11.

Figure pat00029

Figure pat00029

MS스펙트럼 및 NMR측정을 통해 플루오렌계 목적 화합물의 구조를 확인하였다.The structure of the fluorene-based target compound was confirmed by MS spectrum and NMR measurement.

1H-NMR(CDCl3):δ=7.52(d,1H), 7.27~7.23(m,5H), 7.17~7.12(m,6H), 7.03~6.99(m,3H), 6.81(d,1H), 3.86(s,3H), 1.38(s,6H).
1 H-NMR (CDCl 3) : δ = 7.52 (d, 1H), 7.27 ~ 7.23 (m, 5H), 7.17 ~ 7.12 (m, 6H), 7.03 ~ 6.99 (m, 3H), 6.81 (d, 1H ), 3.86 (s, 3H), 1.38 (s, 6H).

[비교예 8][Comparative Example 8]

담체를 이용하지 않고, 산으로서 p-톨루엔설폰산을 이용하여, 실시예 5에서 이용한 OH전구체로부터 실시예 5에서 얻어진 플루오렌계 목적 화합물의 합성을 시도하였다.
Synthesis of the fluorene-based target compound obtained in Example 5 was attempted from the OH precursor used in Example 5 using p-toluenesulfonic acid as an acid without using a carrier.

실시예 5에서 이용한 OH전구체(1.13g), p-톨루엔설폰산(0.4g) 및 톨루엔(16ml)을 플라스크에 넣고, 110℃에서 2시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물로의 전화율은 16.7%였고, 올레핀계 부생성물로의 전화율은 83.3%였다. 한편, 이 반응에 있어서의 OH전구체:p-톨루엔설폰산의 몰비율은 약 1:0.58이다. 또한, p-톨루엔설폰산은 고정산 촉매와 비교하기 위해 선택한 산으로, 고정산 촉매는 아니다.
The OH precursor (1.13 g), p-toluenesulfonic acid (0.4 g) and toluene (16 ml) used in Example 5 were placed in a flask and refluxed at 110 ° C for 2 hours. The reaction solution was analyzed by gas chromatography. As a result, the conversion rate from the OH precursor to the fluorene-based target compound was 16.7% and the conversion rate to the olefin based product was 83.3%. On the other hand, the molar ratio of the OH precursor: p-toluenesulfonic acid in this reaction is about 1: 0.58. Also, p-toluenesulfonic acid is the acid chosen for comparison with the high-settling catalyst, not the high-settling catalyst.

[비교예 9][Comparative Example 9]

고정산 촉매로서 Tayca Corporation제의 Taycacure(제품명: Taycacure SAC-10)를 이용하여, 비교대상으로서의 OH전구체로부터 플루오렌계 목적 화합물의 합성을 시도하였다. 한편, 여기서 이용한 비교대상으로서의 OH전구체는, 알코올부위에 치환기가 없는(즉, 식(II)에 있어서의 A1 및 A2가 수소인) 화합물이다.
Synthesis of a fluorene-based target compound from an OH precursor as a comparative object was attempted using Taycacure (product name: Taycacure SAC-10) manufactured by Tayca Corporation as a high-purification catalyst. On the other hand, the OH precursor as a comparison object used herein is a compound having no substituent at the alcohol moiety (i.e., A 1 and A 2 in the formula (II) are hydrogen).

비교대상으로서의 OH전구체인 2-비페닐메탄올(0.37g), Taycacure SAC-10(0.2g) 및 톨루엔(8ml)을 플라스크에 넣고, 110℃에서 2시간 환류하였다. 반응액을 가스크로마토그래피로 분석한 결과, OH전구체로부터 플루오렌계 목적 화합물(즉, 9H-플루오렌)은 얻어지지 않았으며, OH전구체와 용제인 톨루엔과의 분자간에 탈수한 축합물이 얻어졌다. 그 전화율은, 2-(4-메틸벤질)-1,1’-비페닐이 93.3%, 2-(2-메틸벤질)-1,1’-비페닐이 6.7%였다. 한편, 이 반응에 있어서의 OH전구체:고정산 촉매의 산성 관능기의 몰비율은 약 1:0.084이다.2-biphenylmethanol (0.37 g), Taycacure SAC-10 (0.2 g) and toluene (8 ml) as OH precursors to be compared were put in a flask and refluxed at 110 ° C for 2 hours. The reaction solution was analyzed by gas chromatography. As a result, the fluorene-based target compound (i.e., 9H-fluorene) was not obtained from the OH precursor, and a condensate dehydrated between the OH precursor and the solvent toluene was obtained . The conversion rate was 93.3% for 2- (4-methylbenzyl) -1,1'-biphenyl and 6.7% for 2- (2-methylbenzyl) -1,1'-biphenyl. On the other hand, the molar ratio of the acidic functional group of the OH precursor to the high-settling catalyst in this reaction is about 1: 0.084.

Figure pat00030

Figure pat00030

이상의 결과를 표 1 및 표 2에 정리하였다.The results are summarized in Tables 1 and 2.

[표 1][Table 1]

Figure pat00031

Figure pat00031

[표 2][Table 2]

Figure pat00032
Figure pat00032

※ p-톨루엔설폰산은 고정산 촉매와 비교하기 위해 선택한 산으로,* P-Toluenesulfonic acid is the acid selected for comparison with the high-

고정산 촉매는 아니다.
It is not a high-purification catalyst.

이상과 같이, 본 발명의 제조방법에 따르면, 모두 매우 높은 전화율로 플루오렌계 목적 화합물이 얻어지고 있다. 이에 반해, 종래방법인 산만을 사용한 반응에서는(비교예 1, 2, 4, 5, 8), 플루오렌계 목적 화합물로의 전화율은 매우 낮고, 또한 일반적으로 고체산 촉매라고도 불리는 담체만을 사용한 반응에서는(비교예 3, 6, 7), 플루오렌계 목적 화합물로의 전화율은 매우 낮을 뿐 아니라, 원료인 OH전구체가 반응하지 않고 남아 있는 것을 알 수 있다. 나아가, 알코올부위에 치환기가 없는(즉, 식(II)에 있어서의 A1 및 A2가 수소인) OH전구체를 이용한 경우에는(비교예 9), 플루오렌계 목적 화합물은 얻어지지 않았으며, 용제인 톨루엔과의 분자간 탈수축합물만 얻어졌다. 이는, 알코올부위에 치환기가 없는 경우, OH전구체 자체의 분자내 탈수환화반응보다 톨루엔과의 분자간 탈수반응 쪽이 훨씬 반응속도가 빠른 결과로 추측된다. 이에 반해, 알코올부위에 치환기가 있는(A1 및 A2가 알킬 등인) 경우, 입체장애나 반응활성 등의 요인으로, 용제인 톨루엔과의 반응이 일어나기 어렵고, OH전구체 자체의 분자내 탈수환화반응 쪽이 진행되기 쉬우므로, 플루오렌계 목적 화합물이 얻어지기 쉬워진다고 추측된다.
As described above, according to the production method of the present invention, all of the fluorene-based target compounds are obtained at a very high conversion rate. On the contrary, in the reaction using the conventional method (Comparative Examples 1, 2, 4, 5, 8), the conversion to the fluorene-based target compound was extremely low, and in the reaction using only the carrier, (Comparative Examples 3, 6, and 7), the conversion rate to the fluorene-based target compound was extremely low, and the OH precursor as a raw material remained unreacted. Further, in the case of using an OH precursor having no substituent in the alcohol moiety (i.e., in which A 1 and A 2 in the formula (II) are hydrogen) (Comparative Example 9), the fluorene- Only an intermolecular dehydration condensation product with toluene as a solvent was obtained. This suggests that, in the absence of a substituent at the alcohol moiety, the intermolecular dehydration reaction with toluene is much faster than the intramolecular dehydration reaction of the OH precursor itself. On the other hand, when a substituent is present in the alcohol moiety (A 1 and A 2 are alkyl or the like), the reaction with toluene as a solvent is difficult to occur due to factors such as steric hindrance or reaction activity, It is presumed that the fluorene-based target compound tends to be obtained easily.

산업상 이용가능성Industrial availability

본 발명에 따르면, OH전구체로부터 플루오렌계 화합물로의 전환율을 비약적으로 높일 수 있어, 종래 알려져 있지 않았던 신규한 활성기 함유 플루오렌계 화합물을 제조할 수 있게 된다. 그 결과, 예를 들어 유기 EL소자에 이용하는 것이 가능한 재료의 베리에이션을 늘릴 수 있다.According to the present invention, it is possible to dramatically increase the conversion ratio from the OH precursor to the fluorene compound, and it is possible to produce a novel fluorene compound containing an active group which has not been known heretofore. As a result, for example, variation of materials that can be used for organic EL devices can be increased.

Claims (8)

하기 식(II)로 표시되는 구조를 분자 내에 갖는 OH전구체를, 담체 및 산의 존재하 및/또는 고정산 촉매의 존재하에서 반응시켜, 하기 식(I)로 표시되는 플루오렌 구조를 분자 내에 갖는 화합물을 제조하는 방법.
Figure pat00033

A1 및 A2는, 각각 독립적으로, 알킬, 아릴 또는 헤테로아릴이고, 이들 기는 치환되어 있을 수도 있고, A1 및 A2는 결합하여 환을 형성하고 있을 수도 있다.
Reacting an OH precursor having a structure represented by the following formula (II) in the molecule in the presence of a carrier and an acid and / or in the presence of a fixed-rate catalyst to obtain a fluorene structure represented by the following formula (I) &Lt; / RTI &gt;
Figure pat00033

A 1 and A 2 are each independently alkyl, aryl or heteroaryl, and these groups may be substituted, and A 1 and A 2 may combine to form a ring.
제1항에 있어서,
하기 일반식(2-1) 또는 식(2-2)로 표시되는 OH전구체를, 담체 및 산의 존재하 및/또는 고정산 촉매의 존재하에서 반응시켜, 하기 일반식(1)로 표시되는 플루오렌계 화합물을 제조하는, 제조방법.
Figure pat00034

식(1), 식(2-1) 및 식(2-2) 중,
A1 및 A2는, 각각 독립적으로, 알킬, 아릴 또는 헤테로아릴이고, 이들 기는 치환되어 있을 수도 있고, A1 및 A2는 결합하여 환을 형성하고 있을 수도 있고,
R1~R4 및 R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴 또는 디아릴 치환 아미노이고, 이들 기는 치환되어 있을 수도 있고, R1 및 R2, R2 및 R3, R3 및 R4, R5 및 R6, R6 및 R7 그리고 R7 및 R8은, 각각 독립적으로, 결합하여 환을 형성하고 있을 수도 있고,
식(1)로 표시되는 플루오렌계 화합물에 있어서의 수소는, 불소, 염소, 브롬, 요오드 또는 알콕시로 치환되어 있을 수도 있고, 이 경우, 식(2-1) 또는 식(2-2)로 표시되는 OH전구체에 있어서의 대응하는 수소가 동일하게 치환되어 있다.
The method according to claim 1,
The OH precursor represented by the following general formula (2-1) or (2-2) is reacted in the presence of a carrier and an acid and / or in the presence of a high- To produce a cyanine compound.
Figure pat00034

Of the formulas (1), (2-1) and (2-2)
A 1 and A 2 are each independently alkyl, aryl or heteroaryl which may be substituted, A 1 and A 2 may be combined to form a ring,
R 1 to R 4 and R 5 to R 8 are each independently hydrogen, alkyl, aryl, heteroaryl or diaryl substituted amino, and these groups may be substituted and R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7, and R 7 and R 8 may be independently bonded to form a ring,
The hydrogen in the fluorene compound represented by the formula (1) may be substituted with fluorine, chlorine, bromine, iodine or alkoxy. In this case, in the formula (2-1) or The corresponding hydrogen in the OH precursor to be displayed is similarly substituted.
제1항 또는 제2항에 있어서,
상기 담체가, 무기산화물 또는 금속황산화물이고,
상기 산이, 황산, 인산, 폴리인산 또는 설폰산이고,
상기 고정산 촉매가, 설폰화처리된 수지 또는 표면이 설폰화처리된 다공질물질인, 제조방법.
3. The method according to claim 1 or 2,
Wherein the carrier is an inorganic oxide or a metal sulfate,
Wherein said acid is sulfuric acid, phosphoric acid, polyphosphoric acid or sulfonic acid,
Wherein the fixed catalyst is a sulfonated resin or a surface-sulfonated porous material.
제1항 또는 제2항에 있어서,
상기 담체가 다공질물질인, 제조방법.
3. The method according to claim 1 or 2,
Wherein the carrier is a porous material.
제2항에 있어서,
식(1), 식(2-1) 및 식(2-2) 중,
A1 및 A2는, 각각 독립적으로, 알킬, 아릴 또는 헤테로아릴이고, A1 및 A2는 결합하여 지방족환 또는 방향족환을 형성하고 있을 수도 있고,
R1~R4 및 R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴 또는 디아릴 치환 아미노이고, R1 및 R2, R2 및 R3, R3 및 R4, R5 및 R6, R6 및 R7 그리고 R7 및 R8은, 각각 독립적으로, 결합하여 방향족환을 형성하고 있을 수도 있고,
식(1)로 표시되는 플루오렌계 화합물 중의 플루오렌 골격에 있어서의 수소는, 불소, 염소, 브롬, 요오드 또는 알콕시로 치환되어 있을 수도 있고, 이 경우, 식(2-1) 또는 식(2-2)로 표시되는 OH전구체에 있어서의 대응하는 수소가 동일하게 치환되어 있는,
제조방법.
3. The method of claim 2,
Of the formulas (1), (2-1) and (2-2)
A 1 and A 2 are each independently alkyl, aryl or heteroaryl, A 1 and A 2 may be bonded to form an aliphatic or aromatic ring,
R 1 to R 4 and R 5 to R 8 are each independently hydrogen, alkyl, aryl, heteroaryl or diaryl substituted amino, R 1 and R 2 , R 2 and R 3 , R 3 and R 4 , R 5 and R 6 , R 6 and R 7 and R 7 and R 8 may be independently bonded to form an aromatic ring,
The hydrogen in the fluorene skeleton of the fluorene compound represented by the formula (1) may be substituted with fluorine, chlorine, bromine, iodine or alkoxy. In this case, in the formula (2-1) or -2) in which the corresponding hydrogen in the OH precursor is equally substituted,
Gt;
제2항에 있어서,
식(1), 식(2-1) 및 식(2-2) 중,
A1 및 A2는 각각 독립적으로, 알킬, 아릴 또는 헤테로아릴이고,
R1~R4는, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노 또는 불소이고, R1~R4 중 적어도 1개는 불소이고,
R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노, 염소, 브롬, 요오드 또는 알콕시이고, R5~R8 중 적어도 1개는 염소, 브롬, 요오드 또는 알콕시인,
제조방법.
3. The method of claim 2,
Of the formulas (1), (2-1) and (2-2)
A 1 and A 2 are each independently alkyl, aryl or heteroaryl,
R 1 to R 4 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino or fluorine, at least one of R 1 to R 4 is fluorine,
R 5 to R 8 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino, chlorine, bromine, iodine or alkoxy, and at least one of R 5 to R 8 is chlorine, bromine, Alkoxy,
Gt;
하기 일반식(1)로 표시되는 플루오렌계 화합물.
Figure pat00035

식(1) 중,
A1 및 A2는, 각각 독립적으로, 알킬, 아릴 또는 헤테로아릴이고,
R1~R4는, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노 또는 불소이고, R1~R4 중 적어도 1개는 불소이고,
R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노, 염소, 브롬, 요오드 또는 알콕시이고, R5~R8 중 적어도 1개는 염소, 브롬, 요오드 또는 알콕시이다.
A fluorene-based compound represented by the following general formula (1).
Figure pat00035

In the formula (1)
A 1 and A 2 are each independently alkyl, aryl or heteroaryl,
R 1 to R 4 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino or fluorine, at least one of R 1 to R 4 is fluorine,
R 5 to R 8 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino, chlorine, bromine, iodine or alkoxy, and at least one of R 5 to R 8 is chlorine, bromine, Lt; / RTI &gt;
제7항에 있어서,
식(1) 중,
A1 및 A2는, 각각 독립적으로, 알킬이고,
R1~R4는, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노 또는 불소이고, R1~R4 중 적어도 1개는 불소이고,
R5~R8은, 각각 독립적으로, 수소, 알킬, 아릴, 헤테로아릴, 디아릴 치환 아미노, 염소, 브롬, 요오드 또는 알콕시이고, R5~R8 중 적어도 1개는 염소, 브롬, 요오드 또는 알콕시인,
플루오렌계 화합물.
8. The method of claim 7,
In the formula (1)
A 1 and A 2 are each independently alkyl,
R 1 to R 4 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino or fluorine, at least one of R 1 to R 4 is fluorine,
R 5 to R 8 are each independently hydrogen, alkyl, aryl, heteroaryl, diaryl substituted amino, chlorine, bromine, iodine or alkoxy, and at least one of R 5 to R 8 is chlorine, bromine, Alkoxy,
Fluorene compound.
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