KR20170035217A - Insulating unit and electrode assembly including the same - Google Patents

Insulating unit and electrode assembly including the same Download PDF

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Publication number
KR20170035217A
KR20170035217A KR1020150134037A KR20150134037A KR20170035217A KR 20170035217 A KR20170035217 A KR 20170035217A KR 1020150134037 A KR1020150134037 A KR 1020150134037A KR 20150134037 A KR20150134037 A KR 20150134037A KR 20170035217 A KR20170035217 A KR 20170035217A
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South Korea
Prior art keywords
base plate
electrode
insulating
metal body
insulator
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KR1020150134037A
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Korean (ko)
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KR102024799B1 (en
Inventor
이창근
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인베니아 주식회사
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Priority to KR1020150134037A priority Critical patent/KR102024799B1/en
Publication of KR20170035217A publication Critical patent/KR20170035217A/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

The present invention provides an insulating unit having an improved insulation property and a reinforced body and an electrode assembly including the same. The insulating unit supports a metallic member inserted into a base plate through an insulator from an electrode so that a laminated electrode, the insulator and the base plate are mutually coupled. The insulating unit includes: a body disposed inside the base plate to be adjacent to the insulator; and an insulating part disposed between the metallic member and the body so as to insulate the metallic member from the body while supporting the metallic member. Thus, strength of the insulating unit is reinforced to prevent deformation and breakage caused by external stress, and the service life of the electrode is improved, thereby improving the process efficiency.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to an insulating unit,

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an insulating unit and an electrode assembly including the same, and more particularly, to an insulating unit and an electrode assembly including the same.

Generally, plasma is widely used for various processes for manufacturing semiconductors and display devices, for example, vapor deposition, etching, peeling and cleaning processes. Currently, the plasma generation methods most widely used in semiconductor and display manufacturing fields include an inductively coupled plasma (ICP) generating method, a capacitively coupled plasma (CCP) generating method, and an improved capacitive coupled plasma (ECCP) Coupled Plasma) generation method.

As shown in FIG. 1, the substrate processing apparatus using the plasma performs plasma processing on the substrate S based on the upper electrode 11 and the lower electrode 12 provided in the chamber 10. Here, the lower electrode 12 may be formed by stacking an electrode portion 12a, an insulating portion 12b, and a ground portion 12c.

The lower electrode 12 includes fastening bolts 13 extending from the electrode portion 12a through the insulating portion 12b to extend inward of the ground portion 12c to join the components of the lower electrode 12, An insulating unit 14 of a peak material fastened to the fastening bolt 13 inside the ground portion 12c so as to prevent a short circuit between the electrode portion 12a and the ground portion 12c by the fastening bolts 13, . However, the insulating unit 14 may be deformed or damaged due to external stress such as the torque of the fastening bolt 13 and the vacuum pressure inside the chamber 10.

Korean Patent Laid-Open Publication No. 2009-0088751 (Plasma Treatment Apparatus and Plasma Treatment Method, Aug. 20, 2009)

It is an object of the present invention to provide an insulation unit with improved insulation and a body, and an electrode assembly including the insulation unit.

The insulating unit according to the present invention is an insulating unit for supporting a metal body inserted into the base plate from the electrode through the insulating body so that the laminated electrode, the insulator and the base plate are mutually coupled, And an insulator disposed between the metal body and the body so as to insulate the metal body from the body and to support the metal body.

The body may include a metal body supported by the base plate, and the insulation portion may be disposed between the metal body and the metal body.

The body may further include an insulation body coupled to the metal body between the metal body and the base plate.

The insulating unit is supported inside the insulating body between the insulating part and the insulating body so as to be insulated from the metal body and is fastened to the metal body to prevent stress from the metal body from being transmitted to the body. .

The insulating portion may be fastened to the metallic body such that a coupling force between the metallic body and the body is reinforced.

The metal body may be made of aluminum and the surface may be anodized.

The insulating unit may further include a support portion extending from the main body to the base plate and fastened to the base plate so that the main body is supported by the base plate.

The electrode assembly according to the present invention includes an electrode and a base plate spaced from the electrode, an insulator disposed between the electrode and the base plate, and an insulator between the electrode, the base plate, and the insulator, And a main body disposed inside the base plate so as to be adjacent to the insulator, and a main body disposed between the metallic body and the main body so as to insulate the metallic body from the main body, .

The body may include a metal body supported by the base plate, and the insulation portion may be disposed between the metal body and the metal body.

The body may further include an insulation body coupled to the metal body between the metal body and the base plate.

The electrode assembly is supported inside the insulating body between the insulating part and the insulating body so as to be insulated from the metal body and is fastened to the metal body to prevent stress from the metal body from being transmitted to the body. .

The insulating portion may be fastened to the metallic body such that a coupling force between the metallic body and the body is reinforced.

The metal body may be made of aluminum and the surface may be anodized.

The electrode assembly may further include a support portion extending from the main body to the base plate and fastened to the base plate so that the main body is supported by the base plate.

According to another aspect of the present invention, there is provided a substrate processing apparatus including a chamber, an electrode disposed inside the chamber, a base plate spaced apart from the electrode, an insulator disposed between the electrode and the base plate, A metal body inserted into the base plate through the insulator from the electrode so as to be coupled to each other, and a body disposed inside the base plate so as to be adjacent to the insulator, and a body including the metal body and the body, And an insulating portion which is disposed between the metal body and supports the metal body.

The insulation unit and the electrode assembly including the insulation unit according to the present invention have an effect of enhancing the process efficiency by improving the lifetime of the bar electrode, which prevents the deformation and breakage due to external stress by reinforcing the strength of the insulation unit.

The technical effects of the present invention are not limited to the effects mentioned above, and other technical effects not mentioned can be clearly understood by those skilled in the art from the following description.

1 is a cross-sectional view showing a conventional substrate processing apparatus,
2 is a cross-sectional view of the substrate processing apparatus according to the present embodiment,
3 is an enlarged view showing "A" of the substrate processing apparatus labeled in Fig. 2,
4 is a view showing an insulating unit of the substrate processing apparatus according to the present embodiment,
5 is a view showing an insulating unit of a substrate processing apparatus according to another embodiment.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, it should be understood that the present invention is not limited to the disclosed embodiments, but may be implemented in various forms, and the present embodiments are not intended to be exhaustive or to limit the scope of the invention to those skilled in the art. It is provided to let you know completely. The shape and the like of the elements in the drawings may be exaggerated for clarity, and the same reference numerals denote the same elements in the drawings.

2 is a cross-sectional view showing a substrate processing apparatus according to this embodiment.

2, the substrate processing apparatus 100 according to the present embodiment includes a chamber 110 that forms an outer shape of the substrate processing apparatus 100, and a plasma generating unit 130 that forms a plasma within the chamber 110, And a plasma generating unit 130 for performing plasma processing on the plasma.

First, the chamber 110 forms the body of the substrate processing apparatus 110. Inside the chamber 110, a process region 110a is formed in which a process for the substrate S is performed. At this time, the chamber 110 may be provided so as to maintain a hermetic state with the outside so as to improve the processing efficiency with respect to the substrate S. The chamber 110 may be connected to a vacuum pump (not shown) A vacuum atmosphere can be formed.

Meanwhile, the plasma generating unit 130 generates a plasma on the process region 110a to allow a process for the substrate S to be performed. Here, the plasma generating unit 130 may generate plasma by a capacitively coupled plasma (CCP) generating method or an enhanced capacitively coupled plasma (ECCP) generating method. However, in the plasma generating method, Not limited. However, in this embodiment, an explanation will be given of an embodiment in which the plasma generating unit 130 generates the capacitively coupled plasma to help the understanding of the invention.

Thus, the plasma generating unit 130 of the present embodiment may include an upper electrode 131 and a bias electrode assembly 133 (hereinafter, referred to as an electrode assembly).

First, the upper electrode 131 is disposed on the upper side of the chamber 110, and RF power contributing to plasma generation is applied. The upper electrode 131 may be provided in the form of a showerhead for introducing a process gas contributing to plasma generation to the process region 110a, but the shape of the upper electrode 131 is not limited. The process gas supplied into the chamber 110 may be an etch gas or a deposition gas on which the etching process or the deposition process for the substrate S is performed.

And the electrode assembly 133 may be disposed below the upper electrode 131 in the chamber 110. [ The electrode assembly 133 may be formed by stacking an electrode 133a, an insulator 133b, and a base plate 133c.

The electrode 133a may include an electrostatic chuck 133aa (ESC: Electro Static Chuck) that supports the substrate S and a cooling plate 133ac that is disposed below the electrostatic chuck 133aa to cool the electrostatic chuck 133aa have. Here, the electrostatic chuck 133aa and the cooling plate 133ac are each made of a metal material and serve as a bias electrode by a bias RF power source applied from the outside.

The insulator 133b is disposed between the electrode 133a and the base plate 133c in the form of a plate so that the electrode 133a and the base plate 133c are insulated. In addition, the base plate 133c is supported on the bottom surface of the chamber 110 below the insulator 133b in the form of a plate to serve as a ground.

These electrode assemblies 133 may be coupled to each other by metal bodies 133d provided in the form of bolts. Here, the metal body 133d may extend from the cooling plate 133ac through the insulator 133b into the base plate 133c. At this time, a short circuit may be generated when the cooling plate 133ac and the base plate 133c are energized by the metal body 133d, so that a metal body 133d and a base 133c are formed between the metal body 133d and the base plate 133c. An insulating unit 200 for insulating the plate 133c is disposed.

Hereinafter, the insulating unit 200 according to the present embodiment will be described in detail with reference to the accompanying drawings.

FIG. 3 is an enlarged view showing "A" of the substrate processing apparatus labeled in FIG. 2, and FIG. 4 is a view showing an insulating unit of the substrate processing apparatus according to the present embodiment.

3 and 4, the insulating unit 200 according to the present embodiment includes a main body 210, an insulating portion 230, a fastening portion 250, and a supporting portion 270.

First, the main body 210 is inserted into and supported by the base plate 133c such that its upper surface is adjacent to the lower portion of the insulator 133b. Here, the body 210 may include a metal body 211 and an insulating body 213.

First, the metal body 211 forms an upper portion of the body 210 so as to be adjacent to the lower surface of the insulator 133b. The metal body 211 is made of an aluminum material so as to reinforce the strength of the body 210, and the surface of the metal body 211 can be anodized. Here, a hollow is formed in a substantially central region of the metal body 211, and an insulation portion 230 of a peak material for insulating the metal body 133d from the metal body 211 is disposed in the hollow. The insulation part 230 may be formed with a hollow through which the metal body 133d can penetrate.

The insulation body 213 forms a lower portion of the body 210 so that the body 210 can be supported by the base plate 133c. The insulating body 213 may be made of a peak material to insulate the metal body 133d passing through the insulating portion 230 from the electrode 133a and the base plate 133c. An insertion groove 213a may be formed on the upper side of the insulation body 213 to receive the coupling part 250 therein.

Meanwhile, the coupling part 250 is supported in the insertion groove 213a between the metal body 211 and the insulation body 213. The fastening part 250 is provided in the shape of a nut provided separately from the main body 210 so as to prevent the stress caused by the fastening with the metallic body 133d from being applied to the main body 210. The fastening part 250 can be fastened to the metallic body 133d .

The insertion groove 213a in which the fastening part 250 is supported may be the same as the shape of the side wall of the fastening part 250 or may include at least one frame for supporting the outer wall of the fastening part 250, It is possible to prevent the first protrusion 250 from flowing inside the insertion groove 213a. The bar body 133d and the body 210, which are disposed so as to surround the lower surface of the insulating portion 230 and the outer surface of the fastening portion 250, respectively, of the side wall and the lower surface of the insulating body 213, have.

The support part 270 is provided in the form of a bolt so as to pass through the main body 210. Here, the support part 270 connects the metal body 211 and the insulation body 213, and the lower part extends toward the inside of the base plate 133c. At this time, the lower part of the support part 270 is fastened to the fastening hole 133ca formed in the base plate 133c so that the body 210 can be prevented from flowing to the base plate 133c. The upper surface of the support portion 270 is disposed below the upper surface of the main body 210 when the base plate 133c is coupled with the upper surface of the main body 210 so that the insulator 133b and the supporter 270 can be prevented from coming into contact with each other.

Meanwhile, as shown in FIG. 5, the insulating unit 300 according to another embodiment may be provided with a single body.

5 is a view showing an insulating unit of a substrate processing apparatus according to another embodiment.

5, the insulating unit 300 according to another embodiment includes a main body 310, an insulating portion 330, and a supporting portion 350. As shown in FIG.

First, the main body 310 is inserted into and supported by the base plate 133c such that its upper surface is adjacent to the lower portion of the insulator 133b. Herein, the body 310 may be provided with a metal body 311.

The metal body 311 is made of an aluminum material so that the strength of the body 310 is reinforced, and the surface of the metal body 311 can be anodized. Here, a hollow is formed in a substantially central region of the metal body 311, and a lower portion of the metal body 133d passing through the insulator 133b from the electrode 133a may be extended to the hollow.

Here, the insulating portion 330 is disposed inside the hollow of the metal body 311. The insulating portion 330 is made of a peak material so that the metal body 133d and the metal body 311 are insulated. When the metal body 133d is inserted into the central region of the insulating portion 330, a hollow having a size smaller than the hollow inner diameter of the metal body 311 is formed, and the outer diameter of the metal body 133d and the outer diameter of the metal body 311 Do not allow the inner diameter to contact each other.

The inner diameter of the insulating portion 330 is formed so as to be fastened to the metal body 133d provided in the form of a bolt. At this time, when the metal body 133d and the insulating portion 330 are fastened, the lower portion of the metal body 133d may be provided not to contact the base plate 133c.

The main body 310 is made of a metal material so that strength of the main body 310 is reinforced while the electrical connection between the electrode 133a and the base plate 133c is prevented by the metal body 133d, There is an advantage that the fastening force of the main body 310 is strengthened.

On the other hand, the support part 350 is provided in a bolt shape and is arranged to penetrate the main body 310. Here, the lower portion of the support portion 350 extends toward the inside of the base plate 133c and is fastened to the fastening hole 133ca formed in the base plate 133c. At this time, even though the supporting portion 350 is insulated from the metal body 311 by the insulating portion 330 from the metal body 311 to the base plate 133c, The metal element 133d and the base plate 133c can be prevented from being energized.

The upper surface of the support portion 350 is disposed below the upper surface of the body 310 when the base plate 133c is coupled with the upper surface of the body 310 so that the insulator 133b and the support portion 350 can be prevented from coming into contact with each other.

Thus, the insulation unit and the electrode assembly including the insulation unit are reinforced with the strength of the insulation unit, so that deformation and breakage due to external stress are prevented, and the service life of the electrode is improved, thereby improving the process efficiency.

An embodiment of the present invention described above and shown in the drawings should not be construed as limiting the technical idea of the present invention. The scope of protection of the present invention is limited only by the matters described in the claims, and those skilled in the art will be able to modify the technical idea of the present invention in various forms. Accordingly, such improvements and modifications will fall within the scope of the present invention as long as they are obvious to those skilled in the art.

100: substrate processing apparatus 110: chamber
130: plasma generating part 131: upper electrode
133: Bias electrode assembly 133a: Electrode
133aa: electrostatic chuck 133ac: cooling plate
133b: Insulator 133c: Base plate
133d: metal body 200: insulating unit

Claims (15)

An insulating unit for supporting a metal body inserted into the base plate through the insulator from the electrode so that the laminated electrode, the insulator, and the base plate are mutually coupled,
A body disposed within the base plate adjacent to the insulator; And
And an insulating portion disposed between the metal body and the body so as to support the metal body so that the metal body and the body are insulated.
The method according to claim 1,
The body
And a metal body supported on the base plate,
Wherein the insulating portion is disposed between the metal body and the metal body.
3. The method of claim 2,
The body
Further comprising an insulating body coupled to the metal body between the metal body and the base plate.
The method of claim 3,
And a fastening part supported inside the insulating body between the insulating part and the insulating body so as to be insulated from the metallic body and fastened to the metallic body to prevent stress from the metallic body from being transmitted to the body Features an insulating unit.
3. The method of claim 2,
The insulating portion
And the metal body is fastened to the metal body such that a coupling force between the metal body and the body is reinforced.
3. The method of claim 2,
The metal body
Characterized in that the insulating unit is made of aluminum and the surface is anodized.
The method according to claim 1,
Further comprising: a support portion extending from the main body to the base plate to be coupled to the base plate so that the main body is supported by the base plate.
electrode;
A base plate spaced apart from the electrode;
An insulator disposed between the electrode and the base plate;
A metal body inserted into the base plate through the insulator from the electrode so that the electrode, the base plate, and the insulator are mutually coupled;
A body disposed within the base plate adjacent to the insulator; And
And an insulating portion disposed between the metallic body and the body to support the metallic body so that the metallic body and the body are insulated.
9. The method of claim 8,
The body
And a metal body supported on the base plate,
Wherein the insulating portion is disposed between the metal body and the metal body.
10. The method of claim 9,
The body
And an insulation body coupled to the metal body between the metal body and the base plate.
11. The method of claim 10,
And a fastening part supported inside the insulating body between the insulating part and the insulating body so as to be insulated from the metallic body and fastened to the metallic body to prevent stress from the metallic body from being transmitted to the body The electrode assembly comprising:
10. The method of claim 9,
The insulating portion
And the metallic body is fastened to the metallic body such that a bonding force between the metallic body and the body is strengthened.
10. The method of claim 9,
The metal body
Wherein the electrode assembly is made of an aluminum material and the surface of the electrode assembly is anodized.
9. The method of claim 8,
Further comprising: a support portion extending from the main body to the base plate to be coupled to the base plate so that the main body is supported by the base plate.
chamber;
An electrode disposed within the chamber;
A base plate spaced apart from the electrode;
An insulator disposed between the electrode and the base plate;
A metal body inserted into the base plate through the insulator from the electrode so that the electrode, the base plate, and the insulator are mutually coupled;
A body disposed within the base plate adjacent to the insulator; And
And an insulating portion disposed between the metal body and the body to support the metal body so that the metal body and the body are insulated from each other.

KR1020150134037A 2015-09-22 2015-09-22 Insulating unit and electrode assembly including the same KR102024799B1 (en)

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KR20170035217A true KR20170035217A (en) 2017-03-30
KR102024799B1 KR102024799B1 (en) 2019-09-24

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060002281A (en) * 2004-07-01 2006-01-09 주식회사 에이디피엔지니어링 Plasma processing apparatus
KR20060032714A (en) * 2004-10-13 2006-04-18 주식회사 에이디피엔지니어링 Plasma processing apparatus
KR20060087148A (en) * 2005-01-28 2006-08-02 주식회사 에이디피엔지니어링 Plasma processing apparatus
KR20070093583A (en) * 2006-03-14 2007-09-19 주식회사 에이디피엔지니어링 Esc, support table, chamber and the manufacture methods thereof
KR20090088751A (en) 2008-02-15 2009-08-20 주식회사 에이디피엔지니어링 Apparatus and method for plasma treatment

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20060002281A (en) * 2004-07-01 2006-01-09 주식회사 에이디피엔지니어링 Plasma processing apparatus
KR20060032714A (en) * 2004-10-13 2006-04-18 주식회사 에이디피엔지니어링 Plasma processing apparatus
KR20060087148A (en) * 2005-01-28 2006-08-02 주식회사 에이디피엔지니어링 Plasma processing apparatus
KR20070093583A (en) * 2006-03-14 2007-09-19 주식회사 에이디피엔지니어링 Esc, support table, chamber and the manufacture methods thereof
KR20090088751A (en) 2008-02-15 2009-08-20 주식회사 에이디피엔지니어링 Apparatus and method for plasma treatment

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