KR20170014538A - Reactor having active catalytic particles - Google Patents

Abstract

A reactor having active catalytic particles according to the present invention comprises an outer case with an inner space and a supporting body provided in the outer case. Many nanobumps are formed on the surface of the supporting body and the active catalytic particles are combined with the surfaces of the nanobumps. Much more active catalytic particles can be put into the supporting body with a restricted size without using a separate carrier or nanotube as the active catalytic particles are put on the surface of many nanobumps formed on the surface of the supporting body so that the process becomes simple and the manufacturing cost is reduced as well.

Description

Reactor having active catalytic particles < RTI ID = 0.0 >

The present invention relates to a reactor in which an active catalyst material is supported on a support inside a housing, and more particularly, to a reactor in which a plurality of nano-protrusions are formed on a surface of a support and the active catalyst material is supported on the surface of the nano- .

In general, as reactors for converting a reactant into a product by reacting with the catalyst, there are a catalytic reactor, a reformer, and a three-way catalyst.

The conventional catalytic reactor, the reformer and the three-way catalyst will be described in detail with reference to the accompanying drawings.

FIG. 1 is a sectional view of a conventional catalytic reactor, FIG. 2 is a sectional view of a conventional reformer, and FIG. 3 is a sectional view of a conventional three-way catalyst.

As shown in FIG. 1, a conventional catalytic reactor is composed of an outer case 20 having an inner space and a plurality of supports 10a made of a spherical shape and filled in the outer case 20. The active catalyst material 12 is supported on the surface of the support 10a. When the surface of the support 10a is smoothly formed, there is a limitation on the amount of the active catalyst material 12 that can be supported, A wash coat 11 is coated on the surface of the support member 10a and then the active catalyst material 12 is supported on the support 11. [

Since the carrier 11 has a very large surface area as compared with the support 10 as a material having micropores on the surface thereof, the carrier 11 coated on the surface of the carrier 11 coated on the support 10, The active catalyst material 12 is fixed over the entire unevenness of the carrier 11 as shown in the enlarged view of FIG. 1, so that a larger amount of active The catalyst material 12 can be carried.

2, the conventional catalytic reactor comprises an outer case 20 having an inner space and a multi-layered support 10b provided in the outer case 20. As shown in FIG. The support 11b is coated on the surface of the support 10b so that the surface area of the support 10b is increased and the support 11b is coated on the surface of the support 11b, 11) is supported on the surface of the catalyst material (12).

3, the conventional three-way catalyst is composed of an outer case 20 having an inner space and a support 10c arranged to cross the inner space of the outer case 20, The support 11c is coated on the surface of the support 10c and then the active catalyst material 12 is supported on the surface of the support 11 as in the case of the catalytic reactor or the reformer.

In this case, as shown in FIGS. 1 to 3, in order to coat the carrier 11 on the surfaces of the supports 10a, 10b and 10c, not only the cost of purchasing a carrier but also the manufacturing process becomes complicated, .

In addition, an active catalyst material may be supported on the surface of the nanotube so that a larger amount of the active catalyst material can be supported on the support 10a, 10b, 10c of a limited size even if the carrier is not coated, However, in such a case, a separate bonding step for bonding the nanotubes to the support is indispensably required. In addition, there is a limitation in adhering the nanotubes to a support in a desired form, As shown in Fig.

KR 10-1198284 B1

SUMMARY OF THE INVENTION The present invention has been proposed in order to solve the above-mentioned problems. It is an object of the present invention to provide a method of manufacturing a semiconductor device, which comprises forming a plurality of nano-protrusions on a surface of a support and then supporting an active catalyst material on the surface of the support, It is an object of the present invention to provide a reactor carrying an active catalyst material capable of supporting a larger amount of active catalyst material on a limited size support.

In order to accomplish the above object, the present invention provides an apparatus for supporting an active catalyst material, comprising: an outer case having an inner space; and a support provided in the outer case, wherein a plurality of nano- And the active catalyst material is bonded to the surface of the nano protrusion.

The supporting member is formed in a spherical shape, and a plurality of supporting members are provided to fill the inner space of the outer case, and the nano protrusions are formed over the entire outer surface of the supporting member.

The support body is formed in a plate shape extending along the flow direction of the reactant flowing in the inner case space of the outer case, and the support body is provided with a plurality of nano protrusions arranged at a predetermined interval in parallel with each other.

The supporting body is formed in a thin plate shape extending along the flow direction of the reactant flowing through the inner space of the outer case, and a plurality of the air ducts are arranged to evenly divide the flow path section of the inner space of the outer case, Respectively.

The active catalyst material is deposited on the surface of the nanorods by chemical vapor deposition.

The nano protrusions are formed by mechanical machining by micro sandblasting, electrical discharge machining, and laser machining.

The nano protrusions are formed through a process of drawing a support into a chamber in which an internal pressure is maintained within a set range, and then plasma etching the surface of the support.

The nano protrusions are formed through a process of forming a mask pattern on the surface of the support, performing plasma etching, and then removing the mask pattern.

The nano protrusions are formed through a process of forming a silica bead layer on the surface of the support and then performing plasma etching until the silica bead layer is removed.

Since the active catalyst material is supported on the surfaces of the plurality of nano-dots formed on the surface of the support, even if a separate carrier or nanotube is not used, a larger amount of the catalyst The active catalyst material of the present invention can be supported, thereby simplifying the manufacturing process and reducing the manufacturing cost.

1 is a cross-sectional view of a conventional catalytic reactor.
2 is a sectional view of a conventional reformer.
3 is a cross-sectional view of a conventional three-way catalyst.
4 is a cross-sectional view of a catalytic reactor according to the present invention.
5 is a cross-sectional view of a reformer according to the present invention.
6 is a cross-sectional view of a three-way catalyst according to the present invention.
7 is a cross-sectional view sequentially showing the process of loading the active catalyst material on the surface of the support.
8 is a cross-sectional view showing a configuration in which nano protrusions are formed on the surface of the support according to Example 2. Fig.
FIG. 9 is a sectional view sequentially showing the process of forming nano protrusions on the surface of the support according to Example 3. FIG.
10 is a cross-sectional view sequentially showing the process of forming nano protrusions on the surface of the support according to Example 4. Fig.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

The reactor supporting the active catalyst material according to the present invention is an apparatus for converting a reactant into a product by reacting with a catalyst. Even if a wash coat is coated on the support on which the active catalyst material is supported or the nanotube is not attached, The surface area of the catalyst layer is markedly increased so that a large amount of active catalyst material is supported. That is, the reactor supporting the active catalyst material according to the present invention comprises an outer case provided with an inner space and a support provided in the outer case, wherein a plurality of nano protrusions are formed on the surface of the support, The active catalyst material is bonded to the surface of the catalyst.

At this time, the reactor supporting the active catalyst material according to the present invention may include the catalyst reactor shown in FIG. 4, the reformer shown in FIG. 5, the three-way catalyst shown in FIG. 6, Any type of reactor can be implemented. Hereinafter, the case where the reactor supporting the active catalyst material according to the present invention is implemented as a catalytic reactor, a reformer, and a three-way catalyst will be described.

FIG. 4 is a cross-sectional view of a catalytic reactor according to the present invention, FIG. 5 is a cross-sectional view of a reformer according to the present invention, and FIG. 6 is a cross-sectional view of a three-

When the reactor according to the present invention is applied to a catalytic reactor, the support 100a is formed in a spherical shape as shown in FIG. 4, and a plurality of support members 100a are provided to fill the inner space of the outer case 200 . A plurality of nano protrusions 110 are formed on the outer surface of the support 100a and a large amount of the active catalyst material 120 is bonded to the surfaces of the nano protrusions 110. [

As described above, when a plurality of nano-protrusions 110 are formed on the surface of the support 100a, the surface area of the support 100a is enlarged so that a larger amount of active catalyst There is an advantage that the material 120 can be carried. At this time, the active catalyst material 120 may be deposited on the surface of the nano bumps 110 by chemical vapor deposition. Such a chemical vapor deposition may be performed by a technique commercialized in the related art A detailed description thereof will be omitted.

As shown in FIG. 5, when the reactor according to the present invention is applied as a reformer, the support 100b may include a plate extending along the flow direction of the reactant flowing in the inner space of the outer case 200 And are provided in plural numbers so as to be arranged in parallel and spaced apart from each other at a constant interval. A plurality of nano protrusions 110 are formed on both sides of the support 100b and a large amount of the active catalyst material 120 is bonded to the surfaces of the nano protrusions 110. [

6, when the reactor according to the present invention is applied as a three-way catalyst, the support 100c is formed in a thin plate shape extending along the flow direction of the reactant flowing in the inner space of the outer case 200, A plurality of the flow path sections of the inner space of the outer case 200 are equally divided. A plurality of nano protrusions 110 are formed on both sides of the support 100c and a large amount of the active catalyst material 120 is bonded to the surfaces of the nano protrusions 110. [

In the case where the reactor according to the present invention is implemented with a reformer or a three-way catalyst, if a plurality of nano-protrusions 110 are formed on the surface of the supports 100b and 100c, the surface area of the supports 100b and 100c It is possible to obtain the same effect that a larger amount of the active catalyst material 120 can be supported on the support members 100b and 100c having a predetermined size.

The shapes and arrangement patterns of the supports 100a, 100b, and 100c are not limited to the shapes and arrangement patterns shown in FIGS. 4 to 6, and may be changed into various shapes and arrangement patterns. 4 to 6, only the case where the reactor supporting the active catalyst material according to the present invention is implemented as a catalytic reactor, a reformer, or a three-way catalyst is exemplified. However, The supported reactor may be implemented with various types of reactors, exchangers, or the like so long as the supported catalyst has a structure in which the active catalyst material is supported on the support.

Hereinafter, the process of forming nano protrusions on a support will be described in detail with reference to the accompanying drawings. Hereinafter, the reference numerals of the supports 100a, 100b, and 100c shown in FIGS. 4 to 6 are collectively referred to as '100'.

≪ Example 1 >

7 is a cross-sectional view sequentially showing the process of loading the active catalyst material on the surface of the support.

The surface of the original support body 100 is formed in a smooth plane as shown in FIG. 7 (a), and a micro sandblasting or discharge machining process, a laser machining process, or the like is performed so that a larger amount of the active catalyst material 120 can be carried. A plurality of nano protrusions 110 are formed on the surface of the support 100 (see Fig. 7 (b)). At this time, the nano protrusions 110 may be formed by chemical etching, and the process of forming the nano protrusions 110 through chemical etching will be described in detail with reference to FIGS. 8 to 10. FIG.

As described above, when a plurality of nano protrusions 110 are formed on the surface of the support 100, the surface area of the support 100 is enlarged as much as possible. As shown in FIG. 7C, The active catalyst material 120 of the present invention can be supported. At this time, the active catalyst material 120 may be deposited on the surface of the nano bumps 110 by chemical vapor deposition. Such a chemical vapor deposition may be performed by a technique commercialized in the related art A detailed description thereof will be omitted.

On the other hand, when the support is coated on the surface of the support 100, the rate of increase of the surface area of the support is constant according to the physical properties of the support. Therefore, the support 100 can support the active catalyst material 120 The amount is also limited to a certain range. Likewise, when the nanotubes are used, the surface area increase rate at which the active catalyst material 120 is supported is limited to a certain extent, so that the amount of the active catalyst material 120 can be limited within a certain range.

However, the number and height of the nano-protrusions 110 formed on the surface of the support 100 can be changed per unit area according to the method of forming the nano-protrusions 110. The number of the nano-protrusions 110 and the number of the nano- The amount of the active catalyst material 120 to be loaded can be adjusted by adjusting the height.

≪ Example 2 >

8 is a cross-sectional view showing a configuration in which nano protrusions are formed on the surface of the support according to Example 2. Fig.

In the contact-type gas sensor according to the present invention, the nano protrusions 110 on the surface of the support 100 may be formed through chemical etching. That is, the nano protrusions 110 are formed on the surface of the support 100 through a process of drawing the support 100 into a chamber in which the internal pressure is maintained within a set range, As shown in FIG.

When the surface of the support 100 is treated by plasma etching using a mixed gas of CF ₄ and O ₂ while maintaining the pressure in the chamber at 2 Pa, A plurality of very low nano protrusions 110 are formed. At this time, when the pressure in the chamber is increased to 5 Pa, the height and diameter of the nano protrusions 110 are somewhat increased. The manufacturer adjusts the pressure in the chamber to form the nano protrusions 110 having appropriate height and diameter, The amount of the active catalyst material 120 supported on the surface of the substrate 110 can be increased or decreased.

In the case of using CF ₄ gas only in the plasma etching while maintaining the pressure in the chamber at 2 Pa, the nano protrusion 110 having a significantly larger size than the nano protrusion 110 shown in FIG. 8 (a) is obtained (See Fig. 8 (b)). As described above, plasma etching using only CF ₄ gas can form larger nano protrusions 110, so that a larger amount of active catalyst material 120 can be supported on the surface of the nano protrusions 110. Of course, even in the case of using only CF ₄ gas during plasma etching, the height and diameter of the nano protrusion 110 can be changed by a certain level according to the pressure in the chamber.

As described above, the technical idea that a plurality of nano protrusions 110 are formed on the surface of the support 100 when the surface of the support 100 is subjected to plasma etching is a technology that is well known in the art Since it is a technical idea, a detailed description thereof will be omitted.

≪ Example 3 >

FIG. 9 is a sectional view sequentially showing the process of forming nano protrusions on the surface of the support according to Example 3. FIG.

It is preferable to increase the size of the nano protrusion 110 in order to support a larger amount of the active catalyst material 120 on the surface of the supporter 100. The nano protrusion 110 formed by the second embodiment has a size The effect of increasing the surface area on which the active catalyst material 120 is supported may be limited.

Accordingly, the process of forming the mask pattern 130 on the surface of the support 100 so that the nano protrusion 110 included in the contact-type gas sensor according to the present invention can be formed larger, A process of performing plasma etching on the surface of the support 100 formed with the mask pattern 130, and a process of removing the mask pattern 130.

In order to form the nano protrusion 110 using the mask pattern 130, a mask layer 130 'is first formed on the upper surface of the support 100 as shown in FIG. 9A. The mask layer 130 'is formed by placing the support 100 on a negative electrode in a vacuum chamber, maintaining the pressure in the chamber at 2 Pa to 5 Pa, The target can be sputtered using a DC magnetron sputtering method while the power is maintained at 150 W to 300 W. [ The mask layer 130 'is then annealed at a temperature of about 550 ° C. for about 15 minutes using a rapid thermal annealing (RTP) (See Fig. 9 (b)).

When the wafer surface between the metal dots 132 is etched through the plasma etching, only the portions not covered by the metal dots 132 are etched in the upper surface of the support 100 as shown in FIG. 9 (c) A plurality of first projections 110a are formed. At the same time, a plurality of second protrusions 110b having a diameter of 100 nm or less is formed between the etched first protrusions 110a due to the characteristic of the plasma etching using only CF _{4 as a} gas.

After the nano protrusion 110 composed of the first protrusion 110a and the second protrusion 110b is formed, after all the metal dots 132 attached to the upper surface of the first protrusion 110a are removed, The active catalyst material 120 is deposited on the surface of the nano protrusion 110 formed in Example 2. Since the nano protrusion 110 formed by Example 3 is larger in height and diameter than the nano protrusion 110 formed in Example 2, It becomes possible to deposit a positive active catalyst material 120.

<Example 4>

10 is a cross-sectional view sequentially showing the process of forming nano protrusions on the surface of the support according to Example 4. Fig.

A large number of work processes are added to form the mask pattern 130 composed of a plurality of metal dots 132 on the surface of the support 100. The problem of requiring a lot of time and cost for forming the nano protrusions 110 Lt; / RTI &gt;

Therefore, in the contact-type gas sensor according to the present invention, a plurality of nano-protrusions 110 may be formed on the surface of the support 100 through plasma etching without using a separate mask pattern 130. [ That is, the nano protrusion 110 included in the contact-type gas sensor according to the present invention includes a process of forming a silica bead layer 140 on the surface of the support 100 and a process of removing the silica bead layer 140 when the silica bead layer 140 is removed May be formed on the surface of the support 100 by performing plasma etching on the surface of the support 100.

In order to form the nano protrusion 110 by using the silica bead layer 140 as described above, first, a silica dispersion solution is coated on the surface of the support 100 as shown in FIG. 10 (a) 100, the silica bead layer 140 is formed. The silica dispersion solution includes a plurality of silica beads. The silica dispersion solution may be prepared by mixing silica beads with water, alcohol, organic solvent, etc., and may be coated on the surface of the support 100 by various methods . Can be coated on the support 100 using, for example, spin coating, dip coating and spray coating.

On the other hand, since the silica beads are present as particles, even if the silica dispersion solution is dried to form the silica bead layer 140, an empty space is formed between the silica beads, and a part of the upper surface of the support 100, Lt; / RTI &gt;

Therefore, when the plasma etching is performed in the state shown in FIG. 10A, the portion exposed between the silica beads on the upper surface of the support 100 is preferentially etched as shown in FIG. 10B, When the plasma etching is further continued, not only the support 100 but also the silica bead layer 140 are etched so that a plurality of grooves are formed on the upper surface of the support 100 as shown in FIG. 10 (c).

As shown in FIG. 10 (d), a plurality of nano protrusions 110 are formed on the surface of the support 100, and the support body 100 100 to a larger amount of the active catalyst material 120.

Since the technique of forming the nano protrusion 110 by plasma etching after forming the silica bead layer 140 is a technique known in the wafer processing field, the silica bead layer 140 is formed and plasma etching is performed A detailed description of the etching pattern that is generated when etching is performed will be omitted.

As described above, the nano protrusions 110 formed on the support 100 can be formed by various manufacturing methods. Therefore, even if the support 100 is made of any material such as metal, glass, synthetic resin, or ceramic, It is advantageous that a large amount of the active catalyst material 120 can be carried without a separate carrier or nanotube.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the scope of the present invention is not limited to the disclosed exemplary embodiments. It will also be appreciated that many modifications and variations will be apparent to those skilled in the art without departing from the scope of the invention.

100: Support body 110: Nano-
110a: first projection 110b: second projection
120: active catalyst material 130: mask pattern
130 ': mask layer 132: metal dot
140: silica bead layer

Claims (9)

An outer case having an inner space and a support provided in the outer case,
Wherein a plurality of nano protrusions are formed on a surface of the support, and an active catalyst material is bonded to a surface of the nano protrusion. The method according to claim 1,
The support may be formed in a plurality of openings so as to fill the inner space of the outer case,
Wherein the nano protrusions are formed over the entire outer surface of the support. The method according to claim 1,
The support is formed in a plate shape extending along the flow direction of the reactant flowing through the inner space of the outer case, and is provided with a plurality of spaced apart,
Wherein the nanoparticles are formed on the bottom surface of the support. The method according to claim 1,
The supporting body is formed in a thin plate shape extending along the flow direction of the reactant flowing in the outer case inner space, and a plurality of the supporting bodies are arranged so as to evenly divide the flow path end face of the outer case inner space,
Wherein the nano protrusions are formed on both sides of the support. The method according to any one of claims 1 to 4,
Wherein the active catalyst material is deposited on the surface of the nano protrusion by chemical vapor deposition. The method according to any one of claims 1 to 4,
Wherein the nano protrusions are formed by mechanical working by micro sandblasting, electric discharge machining, and laser machining. The method according to any one of claims 1 to 4,
Wherein the nano protrusions are formed through a process of drawing a support into a chamber in which an internal pressure is maintained within a set range and then plasma etching the surface of the support. The method according to any one of claims 1 to 4,
Wherein the nano protrusions are formed through a process of forming a mask pattern on the surface of the support, performing plasma etching, and then removing the mask pattern. The method according to any one of claims 1 to 4,
Wherein the nano protrusions are formed through a process of forming a silica bead layer on the surface of the support and performing plasma etching until the silica bead layer is removed.

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