KR20170011805A - Particle analysis system for manufacturing semiconductor and method using the same - Google Patents
Particle analysis system for manufacturing semiconductor and method using the same Download PDFInfo
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- KR20170011805A KR20170011805A KR1020150105099A KR20150105099A KR20170011805A KR 20170011805 A KR20170011805 A KR 20170011805A KR 1020150105099 A KR1020150105099 A KR 1020150105099A KR 20150105099 A KR20150105099 A KR 20150105099A KR 20170011805 A KR20170011805 A KR 20170011805A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
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Abstract
Description
The present invention relates to a particle analysis system. More particularly, the present invention relates to a particle analysis system for analytes for semiconductor manufacturing and a method of using the same.
With the high integration of semiconductors, a nanoscale semiconductor manufacturing process is performed, and contaminating particles that are influenced greatly affect the efficiency of the semiconductor manufacturing process.
The measurement of the contaminant particles is divided into a chemical component analysis for the contaminant particles and an analysis of the size and distribution of the contaminant particles. For example, the chemical component analysis may be performed using an XRF (X-ray Fluorescence) apparatus or an EDX (Energy Dispersive X-ray) apparatus for a solid wafer, a GFAAS (Graphite Furnace Atomic Absorption Spectrometry) (Inductively Coupled Plasma-Atomic Emission Spectrometer), or ICP-MS (Inductively Coupled Plasma-Mass Spectrometer).
In addition, the size and distribution of the contaminant particles are analyzed using an electron microscope or a light scattering method. However, when the number of the contaminating particles is small or the size of the contaminating particles is small, the accuracy of measurement is low.
Specifically, when the contaminated particles are contained in a solution, the chemical component analysis is accurate, but the accuracy and reproducibility of analysis of the size and distribution of the polluted particles are poor.
Accordingly, there is a growing need for a system and method for increasing the accuracy of the chemical component analysis and size and distribution analysis of the contaminant particles, and simultaneously and simultaneously performing the analyzes online or in-line.
An object of the present invention is to provide a particle analysis system capable of performing chemical composition analysis, particle size distribution analysis, and accuracy simultaneously.
Another object of the present invention is to provide a particle analysis method capable of simultaneously performing chemical component analysis, particle size and distribution analysis, and simultaneously performing the same.
According to an aspect of the present invention, there is provided a particle analyzing system comprising: a take-out unit for taking out a sample in real time from an analyte reservoir; An interface unit including a calibration sample introduction unit for quantitatively measuring a chemical composition of the analyte contained in the sample sample and analyzing the size and distribution of the particles included in the analyte by receiving a predetermined amount of sample sample through the interface unit; And a chemical analysis unit and a particle analysis unit.
In exemplary embodiments, the chemical component and particle analysis unit may include a data processing unit for measuring a signal intensity value over time for the analyte, a particle processing unit for analyzing the particle intensity of the analyte based on the signal strength value over time, And a chemical component analyzing unit for performing qualitative and quantitative analysis on the analyte based on the signal intensity value and the predetermined calibration curve data over time have.
In exemplary embodiments, the particle size and distribution analyzer may measure the size and distribution of particles using a cyclic distribution method.
In exemplary embodiments, the particle size and distribution analyzer may measure the size and distribution of particles using a low concentration measurement method.
In the exemplary embodiments, the extraction unit comprises a trapping vessel for receiving a trapping solution and an analyte, and a purge gas into the trapping vessel, wherein the trapping solution, in which the analyte is mixed by the purge gas, To the analyzing unit via the analyzing unit.
In the exemplary embodiments, the take-out unit may include a spray that receives the trapping solution and the analytical sample and mixes the same in an aerosol state, a space for primarily collecting the analytes contained in the analytical sample in the aerosol- A trapping tube for providing an aerosol trapping solution and the analytical sample from the spray chamber, and trapping the unreacted analytes in the spray chamber by bringing the analytical sample into contact with the spraying chamber; A trapping vessel for receiving a trapping solution in which the material is trapped and a sample delivery system for providing a purge gas into the trapping vessel so that the trapping solution trapped by the purge gas is provided to the analysis unit via the sample delivery line Section.
In exemplary embodiments, the analytical sample may include process gases, exhaust gases, and contaminated air from a semiconductor or display.
In exemplary embodiments, the analytical sample may be a liquid.
In exemplary embodiments, the bubbler may further comprise a bubbler forming a trapping solution provided in the trapping vessel through the trapping tube.
In exemplary embodiments, the extraction unit may further comprise a cooling unit for cooling the trapping vessel and the trapping tube such that the analyte that is not captured in the trapping solution can be more easily captured.
In the exemplary embodiments, the take-out unit includes a cleaning liquid supply unit for supplying a cleaning liquid into the trapping container to clean contaminants remaining in the trapping container, and a discharge unit for discharging the cleaning liquid that has washed the trapping container to the outside And may further include a taxing authority.
In exemplary embodiments, the control unit controls the operation of the blowout unit, the interface unit, and the chemical component and particle analysis unit, and measures the level of the trapping solution provided inside the trapping container, And a level sensor for transmitting a signal.
In exemplary embodiments, the take-out unit comprises a first collection line for providing the spray with a trapping solution in which the analyte contained in the trapping container is captured, an analyte in the trapping coil after passing through the primary collection line A second collection line for providing a second trapped solution to the trapping vessel, and a circulation pump for concentrating and collecting the analyte by circulating the trapping solution, which is secondarily captured by the analyte, to the first collection line and the second collection line, As shown in FIG.
In the exemplary embodiments, the interface unit may include a sample accommodating portion for receiving a sample sample from the take-out unit and providing a space for primarily accommodating the sample sample, a sample container provided in the sample accommodating portion to be supplied with a predetermined amount A pressure providing unit for supplying a pressure to be introduced into the analyzing unit to a sample sample accommodated in the sample introducing unit or a pressure at which the sample sample is received in the sample introducing unit, A cleaning liquid supply part for supplying a cleaning liquid into the sample storage part for cleaning the sample storage part when the sample sample is injected into the analysis unit, and a cleaning liquid cleaning part for cleaning the sample storage part or a sample sample remaining in the cleaning liquid, And may include a cleaning section including a discharge section for discharging.
In the exemplary embodiments, the interface unit is connected to a lower discharge line connected to a lower portion of the sample storage part, and the concentration of the sample is measured by introducing the sample stored in the sample storage part through the lower discharge line And the like.
According to another aspect of the present invention, there is provided a particle analyzing method in accordance with exemplary embodiments of the present invention, which extracts a sample sample in real time from an analyte storage using a takeout unit. Receiving the sample sample from the extraction unit, and quantifying the sample sample using the interface unit. The analytical unit is used to select the chemical composition measurement mode or the particle size and distribution measurement mode. When the chemical component measurement mode is selected, component analysis is performed on the analyte contained in the sample. When the particle size and distribution measurement mode is selected, particle size and distribution analysis for the analyte contained in the sample sample is performed.
In exemplary embodiments, performing the size and distribution analysis of the particles may measure a signal intensity value over time for the analyte.
In exemplary embodiments, performing the size and distribution analysis of the particles may measure the size and distribution of the particles by a cyclic distribution method based on the signal intensity value over time and predetermined environment variables.
In the exemplary embodiments, performing particle size and distribution analysis of the particles may include determining particle size and distribution using a low-concentration measurement method based on the signal intensity value over time and a predetermined calibration curve and environment variables. ≪ / RTI >
In exemplary embodiments, performing a component analysis on the analyte may measure a signal intensity value over time for the analyte. And qualitative and quantitative analysis of the analyte can be performed based on the signal intensity value over time.
In exemplary embodiments, performing quantitative analysis on the analyte may perform quantitative analysis on the analyte based on predetermined calibration curve data.
In an exemplary embodiment, the extraction of the analytes in real time may include injecting analytes contained in the analytical sample in an aerosol state using a spray of a predetermined amount of the trapping solution and the analytical sample, It can be primary collected in solution. The trapping solution in the form of an aerosol trapped by the analyte may be mixed with the undrawn analytical sample in the trapping tube to collect the analyte in the trapping solution. The analyte can collect the trapped solution of the secondary trapped in the trapping container. The analyte can finally provide the captured trapping solution to the analysis unit via the sample supply line.
In an exemplary embodiment, when the analytical sample is in a gaseous state, after the trapping of the second trapped solution in the trapping vessel, a new amount of the analytical sample and the analytical substance, The trapping solution may be mixed and sprayed in an aerosol state using spray to collect the analytes contained in the analytical sample in the aerosol trapping solution in a tertiary manner. The trapping solution in the aerosol state in which the analyte is captured in the third stage and the analytical sample are mixed and contacted in the trapping tube to collect the analytes in the trapping solution. The step of trapping the trapping solution, which is the fourtharily captured by the analyte, in the trapping container may be performed at least once.
In exemplary embodiments, a cleaning liquid may be provided into the trapping vessel to clean the trapping vessel to clean the contamination remaining in the trapping vessel. The cleaning liquid accommodated in the trapping vessel may be further discharged to the outside via the sample supply line.
In exemplary embodiments, the analytical sample may include process gases, exhaust gases, and contaminated air from a semiconductor or display.
According to another aspect of the present invention, there is provided a particle analysis method for extracting a sample in real time. Then, the extracted sample sample is received, and the analytes of the sample sample are quantitatively and qualitatively analyzed. Then, the concentration of the analyte by the qualitative analysis is confirmed, and the analysis of the analyte is confirmed. If particle analysis is deemed to be necessary, dilute the analyte with a solvent to prepare a diluted analytical sample. Analyze the particle size and distribution for the analyte using the diluted analytical sample.
According to the particle analysis system and method according to the exemplary embodiments, since the particle size and distribution can be measured using the signal intensity value with time in the mass spectrometry method, the accuracy of the particle size and distribution measurement can be improved .
Particularly, the particle analysis system and method have the advantage of improving the accuracy and reproducibility of particle size and distribution measurement for analyte in a solution state, and can simultaneously perform chemical analysis measurement and particle size and distribution measurement, Particle analysis measurements on the analyte can be performed.
In addition, since the particle analysis system and method can perform simultaneous measurement, there is no need to separately provide a chemical analysis apparatus or a separate particle size and distribution measurement apparatus, and the efficiency of the semiconductor manufacturing process can be increased, And convenience can be greatly increased.
However, the effects of the present invention are not limited to the above-mentioned effects, and may be variously expanded without departing from the spirit and scope of the present invention.
1 is a block diagram illustrating a particle analysis system in accordance with exemplary embodiments.
Fig. 2 is a process flow chart for explaining the take-out unit of Fig. 1. Fig.
Figs. 3 and 4 are process flow diagrams illustrating the interface unit of Fig.
FIG. 5 is a block diagram for explaining the analysis unit of FIG. 1; FIG.
6 is a flowchart for explaining a method of sampling a sample using the extraction unit.
7 is a flowchart for explaining a particle analysis method according to an embodiment using the analysis unit.
FIGS. 8 to 10 are graphs for explaining a method of analyzing a chemical component of an analyte using a periodic distribution method. FIG.
FIGS. 11 to 14 are graphs for explaining a method for analyzing the size and distribution of particles for analytes using the low-concentration measurement method.
15 is a flowchart for explaining a particle analysis method according to another embodiment of the present invention.
For the embodiments of the invention disclosed herein, specific structural and functional descriptions are set forth for the purpose of describing an embodiment of the invention only, and it is to be understood that the embodiments of the invention may be practiced in various forms, The present invention should not be construed as limited to the embodiments described in Figs.
The present invention is capable of various modifications and various forms, and specific embodiments are illustrated in the drawings and described in detail in the text. It is to be understood, however, that the invention is not intended to be limited to the particular forms disclosed, but on the contrary, is intended to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention.
The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms may be used for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as a second component, and similarly, the second component may also be referred to as a first component.
It is to be understood that when an element is referred to as being "connected" or "connected" to another element, it may be directly connected or connected to the other element, . On the other hand, when an element is referred to as being "directly connected" or "directly connected" to another element, it should be understood that there are no other elements in between. Other expressions that describe the relationship between components, such as "between" and "between" or "neighboring to" and "directly adjacent to" should be interpreted as well.
The terminology used in this application is used only to describe a specific embodiment and is not intended to limit the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In the present application, the terms "comprise", "having", and the like are intended to specify the presence of stated features, integers, steps, operations, elements, components, or combinations thereof, , Steps, operations, components, parts, or combinations thereof, as a matter of principle.
Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries should be construed as meaning consistent with meaning in the context of the relevant art and are not to be construed as ideal or overly formal in meaning unless expressly defined in the present application .
Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The same reference numerals are used for the same constituent elements in the drawings and redundant explanations for the same constituent elements are omitted.
1 is a block diagram illustrating a particle analysis system in accordance with exemplary embodiments. Fig. 2 is a process flow chart for explaining the take-out unit of Fig. 1. Fig. Figs. 3 and 4 are process flow diagrams illustrating the interface unit of Fig. FIG. 5 is a block diagram for explaining the analysis unit of FIG. 1; FIG.
1 to 5, a particle analysis system according to exemplary embodiments includes a take-out
The analyte reservoir (S) stores the analyte used in the semiconductor manufacturing process. The analyte may be in solution. For example, the analyte may be distilled water, a washing solution, an etching solution, or other necessary solution for the manufacturing process. Alternatively, the analyte may be in a gaseous state.
The
The analytical
As an example, the analytical sample may be a semiconductor process gas, a semiconductor exhaust gas, or a polluted air, and the analyte contained in the analytical sample may include a metal, a metal ion, an organic compound, and the like. As another example, the analytical sample may be a liquid applied to a semiconductor process, a bio-field, and various industrial fields.
The
The
The
The trapping
The trapping
The trapping
In addition, the trapping vessel has a structure connected to a
In one embodiment, the trapped
Since the analyte (metal and metal compounds) in the analytical sample is trapped in the trapping solution while passing through the spray, the spray chamber, and the trapping
The
In one embodiment, the take-out
At this time, the circulation pump is provided on the first collecting line, the gate valve V5 provided on the
The take-out
As another example, the
As another example, the take-out
As another example, the take-out
Specifically, the rinsing liquid supplied through the rinsing liquid supply unit passes through a trap line, a first collection line, a spray, a spray chamber, a trapping coil and a second collection line, a trapping vessel, and a
The take-out
That is, when the analytical sample is in a gaseous state, the trapping solution is circulated in the take-out
In another embodiment, when the analytical sample to be analyzed is a liquid, the components of the
In addition, the
Furthermore, the
3, the
The sample-sample
Specifically, a plurality of lines (
As an example, the sample sampling analysis system is mainly intended to monitor contaminants such as metal in a chemical liquid or gas, but it is also very important to understand changes in the concentration of a chemical liquid in a portion where problems occur during the process. Thus, the apparatus may further include a concentration analyzing unit (not shown) for measuring the concentration of the sample sample accommodated in the sample
The sample
The pressure providing portion includes a
The cleaning section is provided with a cleaning liquid supply section (335) for supplying a cleaning liquid into the sample storage section through a cleaning liquid supply line (332) for cleaning the sample storage section, and a cleaning liquid supply section And a
More specifically, the cleaning
Although not shown in the drawings, the cleaning of the sample storage tank can provide a cleaning effect by providing the cleaning liquid continuously overflowing into the sample storage portion. At this time, the overflow cleaning liquid may escape to the separate discharge portion, and the cleaning liquid in the sample receiving portion may have a structure capable of discharging the discharge pump by operating the discharge pump.
4, the
For example, in the case of the ICP-MS, the analyzing
The calibration
The sample
The standard
Examples of the first metering pump or the second metering pump include a syringe pump, a diaphragm pump, a gear pump, and a piston pump. As an example, the second sample loop may be included in the loading portion of the injection valve type.
The
The standard solution used in the calibration of the
First, the standard solution is loaded into the second sample loop using the pressure provided by the
Subsequently, the position of the second sample loop is adjusted through the switching of the loading section, and the standard solution loaded in the second sample loop is transferred to the T-shaped
In the calibration
The analysis unit (30) for analyzing chemical components and particles can simultaneously perform chemical composition measurement and analysis of the size and distribution of particles contained in the analyte with respect to the analyte provided.
5, the
The
The particle size and
In exemplary embodiments, the particle size and
In addition, the
According to the particle analysis system according to the exemplary embodiments, since the particle size and distribution can be measured using the signal intensity value with time in the mass spectrometry method, the accuracy of the particle size and distribution measurement can be improved.
Particularly, the particle analysis system has an advantage of improving the accuracy and reproducibility of particle size and distribution measurement for solution and gaseous analytes.
In addition, since chemical analysis measurement and particle size and distribution measurement can be performed at the same time, it is possible to perform particle analysis measurement on an analyte in online or in-line.
In addition, since the particle analysis system can perform simultaneous measurement, there is no need to separately provide a chemical analysis apparatus or a separate particle size and distribution measurement apparatus, and it is possible to increase the efficiency of the semiconductor manufacturing process, Can be greatly increased.
6 is a flowchart for explaining a method of sampling a sample using the extraction unit. 7 is a flowchart for explaining a method of analyzing particles using an analysis unit.
Referring to Figures 2, 4, 5, and 6, a predetermined amount of trapping solution is provided to the trapping vessel (S110).
In operation S110, the trapping solution contained in the trapping solution storage part is operated through the first trapping solution 110 (FIG. 1) through the first trapping
Next, the analytical sample and the trapping solution are mixed and sprayed in an aerosol state using spray, and the analytes contained in the analytical sample are firstly collected in the aerosol trapping solution (S120).
In order to collect the analyte in the step S120, the trapping solution and the analytical sample are simultaneously sprayed. Here, the trapping solution is sprayed via the first collection line by operating the circulation pump with the trapping solution contained in the trapping
Next, the trapping solution in the aerosol state in which the analyte is primarily captured and the analytical sample are mixed and contacted in the trapping tube to collect the analytes in the trapping solution (S130).
The trapping solution in the aerosol state is formed into a trapping solution in a liquid state while the analytical sample and the trapping solution pass through the nonlinear flow path of the trapping
Next, the analyte collects the trapped solution and the analytical sample, which are collected in the second step, into the trapping vessel and collects the collected trapping solution and the analytical sample (S140).
In step S140, the trapping solution and the analytical sample may be collected by providing the trapping solution and the analytical sample, which are secondarily captured by the analyte in the trapping tube, into the trapping vessel via the second collecting line.
In the sample sampling method according to one embodiment, when the analytical sample is in a gaseous state, a predetermined amount of analytical sample is separately provided through the analytical sample providing unit, and the analytical sample is collected using the trapping solution collected from the first step to the
Specifically, when the analytical sample is in a gaseous state, a new analytical sample and a trapping solution of step S140 are mixed and sprayed in an aerosol state through the analytical sample providing unit after the step 3) Collecting the analytes contained in the trapping solution in the aerosol state by trapping the analytes in the aerosol trapping solution in a trapping tube; The fourth collecting step and the step of collecting the trapping solution collected in the fourth step in the trapping vessel by the analyte may be repeated at least once.
Further, in the sample sampling method according to one embodiment, it is possible to further perform the step of discharging the gaseous analytical sample provided as the trapping vessel through the trapping tube when the analytical sample is in a gaseous state.
Thereafter, the analyte collects the captured trapping solution through the sample supply line using the purge gas, and provides the interface unit to the interface unit (S150).
At this time, the purge gas enables the trapping solution to be supplied together with the sample supply line and the interface unit to the
(S160) cleaning the trapping vessel by supplying a cleaning liquid into the trapping vessel to clean contaminants remaining in the trapping vessel after step S150, and supplying the cleaning liquid received in the trapping vessel to the sample supply line And then discharging it to the outside.
As another example, the cleaning of the trapping vessel and the discharge of the cleaning liquid can be performed prior to the step S110 of providing the trapping vessel with a predetermined amount of the trapping solution to secure the cleanliness of the take-out
Such a sample sampling method can more effectively collect the analyte from the analytical sample in the gas or liquid state in a more effective manner. In addition, after the sampling of the analyte, the washing liquid is supplied into the trapping container, By draining out through the lines, it is possible to perform secondary sampling without contamination of the analyte of the sampling field more effectively.
2, 4, 5 and 7, the
4, an analytical sample is contained in the sample
Thereafter, the
Next, the chemical component measurement mode or the particle size and distribution measurement mode is selected (S210).
When the particle size and distribution measurement mode is selected, the size and distribution of particles included in the sprayed analyte are analyzed (S220).
5, the chemical component and
For example, the chemical component and
The
The particle size and
In exemplary embodiments, the particle size and
FIGS. 8 to 10 are graphs for explaining a method of analyzing a chemical component of an analyte using a periodic distribution method. FIG.
8, gold (Ag) particles having a diameter within a range of 18 nm to 20 nm are dispersed in distilled water so that 5.9 x 10 11 to 7.2 x 10 11 gold particles per milliliter are contained in distilled water, To the particle size and
Referring to FIG. 9, the result of FIG. 8 may be converted into a graph of a frequency for a count. For example, when the cps value is 26, the local maximum of the frequency is shown, which is due to the gold (Ag) particles having a diameter within the range of 18 nm to 20 nm.
Referring to FIG. 10, the relationship between the diameter of the particles and the frequency thereof can be graphically displayed based on the results of FIG. 9, taking into account the background intensity value and predetermined environment variables. For example, the environmental variable may be a predetermined variable such as density and temperature. It can be seen that particles having diameters in the range of 18 nm to 32 nm in diameter are detected.
FIGS. 11 to 14 are graphs for explaining a method for analyzing the size and distribution of particles for analytes using the low-concentration measurement method.
Referring to Figs. 11 to 14, the solution containing the gold particles is further diluted and dispersed in a solution of a single particle distribution level in the solution to be injected, and a signal distribution (cps) with respect to time is obtained for a single particle .
Subsequently, compared to the calibration curve data for the standard gold solution, the weight of gold nano-atoms for a single particle can be obtained under the conditions of the measured time, and the size of the particles can be obtained by further considering environmental variables.
As shown in FIGS. 11 and 12, more diluted gold nanoparticles (about 100 nm) can be provided to the chemical and
As shown in FIG. 13, the weight of the gold nanoparticles can be determined from the results of FIG. 11, in comparison with the calibration curve data of the standard gold solution.
Through the above process, the size of gold nanoparticles corresponding to each peak can be calculated, and a size distribution can be obtained for all signals obtained.
As shown in FIG. 14, 53 gold nanoparticles having a diameter of 20 nm were provided to the chemical component and
Referring again to FIG. 7, when the chemical component measurement mode is selected, the component analysis for the sprayed analyte is performed (S230).
For example, the cps value for the analyte may be measured, and qualitative and quantitative analysis of the analyte may be performed based on the cps value. In addition, the quantitative analysis of the analyte may be performed on the basis of the predetermined calibration curve data.
According to the particle analysis method according to the exemplary embodiments, since the particle size and the distribution can be measured using the cps value over time in the mass spectrometry method, the accuracy of the particle size and distribution measurement can be improved.
Particularly, the particle analysis method has advantages of increasing the accuracy and reproducibility of particle size and distribution measurement for solution and gaseous analyte, and can perform chemical analysis measurement and particle size and distribution measurement at the same time, a particle analysis measurement on the analyte can be performed.
15 is a flowchart for explaining a particle analysis method according to another embodiment using the analysis unit.
The particle analyzing method according to FIG. 15 is a method for simultaneously measuring the concentration of the ultrafine contaminant and the particles of several tens of nanometers or less by changing the selection of the measuring mode in the analyzing unit without a large change of the concentration measuring apparatus of the analyzing unit.
First, a sample sample of the analyte is taken out in real time and provided to the analysis unit of the particle analysis system (S300)
Then, the sampled analyte provided to the analysis unit is qualitatively and quantitatively analyzed (S310)
In step S310, the qualitative and quantitative analysis is a step of measuring how much substance exists in the analyte and measuring the concentration of the analyte present in the target sample. The detailed description of the quantitative analysis and the qualitative analysis has been described in detail above and is omitted here.
Then, the concentration of the analyte is checked to determine whether to perform the particle analysis of the analyte or the other analyte (S310).
If the concentration of the analyte is higher than the specific concentration by confirming the concentration in step S320, it means that the particles contained in the analyte are present more than necessary, so that the particle analysis process of the analyte needs to be performed. On the other hand, having a specific concentration or less means that the possibility of the presence of a specific particle contained in the analyte is low, so that there is no need to carry out the particle analysis process of the analyte again.
Subsequently, when it is determined that particle analysis is required, the diluted analytical sample is prepared by diluting with the solvent of the analyte (S330)
The preparation of the diluted analytical sample in step S330 may be performed by determining the dilution ratio of the solvent according to the concentration of the analytical material and then mixing the analyte and the solvent.
The number of specific ions present in the analyte is then measured using the diluted analytical sample (S340)
Thereafter, a particle analysis method using the measured number of ions is performed to calculate the particle size and the distribution of particles present in the analyte (S350)
The calculation of the size of particles and the distribution of particles in S350 can be performed according to the method disclosed in Figs. 11 to 14, and a detailed description thereof will be omitted.
It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention as defined in the following claims. It can be understood that it is possible.
S: analyte storage 10: extraction unit
20: Interface unit 30: Chemical component and particle analysis unit
Claims (23)
An interface unit including a calibration sample introduction unit for receiving and quantifying the extracted sample sample;
And a chemical component and particle analyzing unit for receiving a predetermined amount of a sample sample and measuring chemical components of the analyte contained in the sample sample and analyzing the size and distribution of the particles contained in the analyte.
Wherein the chemical component and particle analysis unit comprises:
A data processing unit for measuring a signal intensity value with respect to the analyte over time;
A particle size and distribution analyzer for measuring the particle size and distribution based on the signal intensity value according to the time and a predetermined environment variable; And
And a chemical component analyzing unit for performing qualitative and quantitative analysis on the analyte based on the signal intensity value according to the time and predetermined calibration line data.
Wherein the particle size and distribution analyzer measures the size and distribution of particles using a cyclic distribution method.
Wherein the particle size and distribution analyzer measures the size and distribution of the particles using a low concentration measurement method.
A trapping vessel for containing the trapping solution and the analyte; And
And a sample delivery unit for supplying a purge gas into the trapping container to allow the trapping solution mixed with the purifying gas to be supplied to the interface unit via the sample delivery line.
A spray to which the trapping solution and the analytical sample are mixed and sprayed in an aerosol state;
A spray chamber for providing a space for primarily collecting the analyte contained in the analysis sample in the aerosol trapping solution;
A trapping tube for receiving an aerosolized trapping solution from the spray chamber and the analytical sample, and for trapping the unreacted analytical material in the spray chamber by bringing the analytical sample into contact with the trapping tube;
A trapping vessel receiving the trapping solution in which the analyte is collected through the trapping tube; And
And a sample delivery unit for providing a purge gas into the trapping vessel so that the trapping solution captured by the purge gas is provided to the interface unit via the sample delivery line.
Further comprising a cooling section for cooling the trapping vessel and the trapping tube such that the analyte that is not captured in the trapping solution can be more easily captured.
Further comprising a cleaning unit including a cleaning liquid supply unit for supplying a cleaning liquid into the trapping container to clean contaminants remaining in the trapping container, and a discharge unit for discharging the cleaning liquid to which the cleaning liquid has been discharged, to the outside Particle analysis system.
Further comprising a level sensor for measuring the level of the trapping solution provided to the inside of the trapping vessel and sending a warning signal to the control unit.
A first collection line providing the spray with a trapping solution in which the analyte contained in the trapping container is captured;
A second collection line through which the analyte in the trapping coil passes through the primary collection line and provides the trapped solution secondary trapped to the trapping vessel; And
Further comprising a circulation pump for concentrating and collecting the analyte by circulating the trapped solution, which is secondarily captured by the analyte, to the first capture line and the second capture line.
A sample receiving unit for receiving a sample sample from the extraction unit and providing a space for receiving the sample sample;
A sample introducing portion having a space capable of receiving a predetermined amount of the sample sample to provide a predetermined amount of the sample sample provided in the sample accommodating portion to the analyzing unit;
A pressure providing unit that applies a pressure to the sample introducing unit to receive the sample sample or a sample sample accommodated in the sample introducing unit into the analyzing unit; And
A cleaning liquid supply part for supplying a cleaning liquid into the sample storage part for cleaning the sample storage part when the sample sample is injected into the analysis unit, and a cleaning liquid cleaning part for cleaning the sample storage part or a sample sample remaining in the cleaning liquid, And a cleaning part including a discharge part for discharging the particles.
Further comprising a concentration analyzer connected to a lower discharge line connected to a lower portion of the sample accommodating portion and configured to measure the concentration of the sample accommodated in the sample accommodating portion through the lower discharge line.
Quantifying the sample sample by receiving the sampled sample sample;
Performing a component analysis on the analyte contained in the sample sample when the chemical component measurement mode is selected; And
And performing particle size and distribution analysis on the analyte contained in the sample sample when the particle size and distribution measurement mode is selected.
And measuring a signal intensity value with respect to the analyte over time.
Measuring a particle size and a distribution by a cyclic distribution method based on the signal intensity value according to the time and a predetermined environment variable.
And measuring the size and distribution of the particles by a low concentration measurement method based on the signal intensity value according to the time and a predetermined calibration curve and environment variables.
Measuring a signal intensity value with time for the analyte; And
And performing qualitative and quantitative analysis on the analyte based on the signal intensity value over time.
Wherein performing the quantitative analysis on the analyte comprises performing quantitative analysis on the analyte on the basis of predetermined calibration curve data.
Performing quantitative and qualitative analysis of the analyte of the sample sample by receiving the sample sample taken out;
Confirming the concentration of the analyte by the qualitative analysis to confirm the analysis of the analyte;
Diluting the analyte with a solvent to prepare a diluted analytical sample when it is determined that particle analysis is necessary;
And analyzing the particle size and distribution for the analyte using the diluted analytical sample.
Measuring the number of specific ions present in the analyte and performing a particle analysis method using the measured number of ions to calculate the particle size and the distribution of particles present in the analyte Particle analysis method.
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102587910B1 (en) * | 2022-12-19 | 2023-10-11 | 엔비스아나(주) | System for Analyzing Contamination, Method for Analyzing Contamination, and Apparatus for Introducing Fluid |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102587910B1 (en) * | 2022-12-19 | 2023-10-11 | 엔비스아나(주) | System for Analyzing Contamination, Method for Analyzing Contamination, and Apparatus for Introducing Fluid |
KR102638251B1 (en) * | 2022-12-19 | 2024-02-20 | 엔비스아나 주식회사 | Fluid Drain Apparatus |
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