KR20160143917A - Mask for extreme ultraviolet lithography process and method of fabricating the same - Google Patents
Mask for extreme ultraviolet lithography process and method of fabricating the same Download PDFInfo
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- KR20160143917A KR20160143917A KR1020150079159A KR20150079159A KR20160143917A KR 20160143917 A KR20160143917 A KR 20160143917A KR 1020150079159 A KR1020150079159 A KR 1020150079159A KR 20150079159 A KR20150079159 A KR 20150079159A KR 20160143917 A KR20160143917 A KR 20160143917A
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- pattern
- phase modulation
- film
- absorption
- modulation pattern
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- 238000000034 method Methods 0.000 title claims abstract description 78
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 238000001900 extreme ultraviolet lithography Methods 0.000 title 1
- 238000010521 absorption reaction Methods 0.000 claims abstract description 131
- 239000000463 material Substances 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 238000002310 reflectometry Methods 0.000 claims description 6
- 230000008033 biological extinction Effects 0.000 claims description 5
- 238000000059 patterning Methods 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 21
- 229910052750 molybdenum Inorganic materials 0.000 description 21
- 239000011733 molybdenum Substances 0.000 description 21
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 19
- 238000005530 etching Methods 0.000 description 10
- 230000007423 decrease Effects 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000007687 exposure technique Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
Abstract
A mask for an extreme ultraviolet exposure process is provided. A substrate, a reflective film including a first material film and a second material film alternately and repeatedly stacked on the substrate, a capping film on the reflective film, and a capping film on the capping film, A phase modulation pattern and an absorption pattern, wherein the sidewalls of the phase modulation pattern and the absorption pattern can be oblique to the upper surface of the capping film.
Description
The present invention relates to a mask for extreme ultraviolet exposure process, and more particularly to a mask for extreme ultraviolet exposure process including a phase modulation pattern having an oblique side wall and an absorption pattern, and a manufacturing method thereof.
The continuous growth of the semiconductor industry is based on the feature that the reduction of the minimum line width of the device improves the function of the device while reducing the cost per function. The device linewidth has declined at a rate of 70% every three years in most semiconductor industry history, and recently the cycle has accelerated to two years. At the same time, the cost per function is decreasing at an average rate of 25-30% per year. This tendency is called Moore's law. The device refinement technology, which is the semiconductor growth power that has been going on for 45 years, is the development of lithography process technology capable of transferring smaller-sized images.
As described above, the lithography process is a process directly connected to the miniaturization and integration of semiconductor devices. In 2008, IC chips with 38-nm line widths were mass-produced. After 2010, devices with 30-nm line widths are mass-produced.
There is an exposure technique using extreme ultraviolet (EUV), which is an electromagnetic wave in the middle of silver x-ray and ultraviolet ray, to produce a semiconductor element having such a fine line width. It is expected that a semiconductor device having a line width of 20 nm can be manufactured using such an extreme ultraviolet light source.
On the other hand, since extreme ultraviolet rays have a property of scattering in most materials and air, a reflective mask for extreme ultraviolet rays of 13.5 nm wavelength band is used without using a transmissive mask.
SUMMARY OF THE INVENTION The present invention is directed to a mask for a highly reliable extreme ultraviolet exposure process and a method of manufacturing the same.
It is another object of the present invention to provide a mask for extreme ultraviolet ray exposure process in which a sidewall angle of a phase modulation pattern and an absorption pattern is adjusted, and a manufacturing method thereof.
It is another object of the present invention to provide a mask for an extreme ultraviolet ray exposure process in which a normalized image log slope (NILS) value is controlled, and a method of manufacturing the same.
It is another object of the present invention to provide a mask for an extreme ultraviolet exposure process with improved process margin and a method of manufacturing the same.
It is another object of the present invention to provide a mask for an extreme ultraviolet exposure process with an improved process yield and a method of manufacturing the same.
The technical problem to be solved by the present invention is not limited to the above.
In order to solve the above technical problems, the present invention provides a mask for an extreme ultraviolet ray exposure process.
According to one embodiment, the mask for extreme ultraviolet ray exposure process comprises a substrate, a reflective film including a first material film and a second material film which are alternately and repeatedly stacked on the substrate, a capping film on the reflective film, A phase modulation pattern and an absorption pattern sequentially stacked on the ping film, wherein the sidewalls of the phase modulation pattern and the absorption pattern can be oblique to the upper surface of the capping film.
According to one embodiment, the angle between the sidewalls of the phase modulation pattern and the absorption pattern and the normal of the upper surface of the capping film may be at most 10 degrees.
According to one embodiment, a normalized image log slope (NILS) value may be maximum when the angle between the phase modulation pattern and the normal of the upper surface of the capping film to the sidewalls of the absorption pattern is 10 °.
According to one embodiment, when the angle between the normal to the top surface of the capping film and the sidewalls of the phase modulation pattern and the absorption pattern is greater than 10, the phase modulation pattern and the side walls of the absorption pattern As the angle between the normals of the top surface of the capping film increases, the value of the normalized image log slope (NILS) can be reduced.
According to one embodiment, within the range of the angle between the normal to the top surface of the capping film and the sidewalls of the absorption pattern and the phase modulation pattern is less than or equal to 10 degrees, the sidewalls of the phase modulation pattern and the absorption pattern The normalized image log slope (NILS) value can be increased as the angle between the normal of the capping film and the normal of the upper surface of the capping film increases.
According to one embodiment, a normalized image log slope (NILS) value and a critical dimension bias (CD bias) value are set according to the angle between the phase modulation pattern and the normal of the upper surface of the capping film to the sidewalls of the absorption pattern Can be adjusted.
According to one embodiment, the side walls of the phase modulation pattern and the side walls of the absorption pattern may coplanar.
According to one embodiment, the width of the phase modulation pattern and the absorption pattern may be increased as the top surface of the capping film is adjacent to the top surface.
According to one embodiment, the width of the phase modulation pattern and the absorption pattern may be reduced as the top surface of the capping film is adjacent to the capping film.
According to one embodiment, the refractive indexes of the phase modulation pattern and the absorption pattern are equal to each other, and extinction coefficients may be different from each other.
According to one embodiment, the sum of the thickness of the phase modulation pattern and the absorption pattern may be 40 nm.
According to one embodiment, the reflectivity can be adjusted by adjusting the thickness of the phase modulation pattern and the thickness of the absorption pattern while maintaining a thickness of 40 nm.
In order to solve the above technical problems, the present invention provides a method of manufacturing a mask for an extreme ultraviolet exposure process.
According to one embodiment, the method of manufacturing a mask for extreme ultraviolet ray exposure process includes: forming a reflective film by alternately and repeatedly laminating a first material film and a second material film on a substrate; forming a capping film on the reflective film; Forming a phase modulating film on the capping film, forming an absorbing film on the phase modulating film, and patterning the absorbing film and the phase modulating film in order to form an oblique film on the top surface of the capping film. ) ≪ / RTI > sidewalls to form an absorption pattern and a phase modulation pattern.
According to one embodiment, a normalized image log slope (NILS) value and a critical dimension bias (CD bias) value are set according to the angle between the phase modulation pattern and the normal of the upper surface of the capping film to the sidewalls of the absorption pattern Can be adjusted.
A mask for an EUV exposure process according to an embodiment of the present invention includes a capping film on a reflective film and a phase modulation pattern and an absorption pattern which are sequentially stacked on the capping film. The sidewalls of the phase modulation pattern and the absorption pattern may be oblique to the upper surface of the capping film. A high reliability ultraviolet ray exposure process mask having a NILS value and a CD bias value adjusted according to the phase modulation pattern and the slope of the side wall of the absorption pattern to improve process margin and process yield, Can be provided.
1 is a view for explaining a mask for an EUV exposure process according to an embodiment of the present invention.
FIGS. 2 and 3 are views for explaining a phase modulation pattern and a sidewall angle of an absorption pattern of a mask for an EUV exposure process according to an embodiment of the present invention.
4 is a graph for explaining a phase difference according to a thickness of an absorption pattern of a mask for an EUV exposure process according to an embodiment of the present invention.
5 is a graph illustrating reflectance and image contrast of a phase modulation pattern of a mask for an EUV exposure process according to an exemplary embodiment of the present invention.
6 is an SEM photograph of a phase modulation pattern and an absorption pattern having a trapezoidal shape in a mask for an EUV exposure process according to an embodiment of the present invention.
7 is a graph illustrating a phase modulation pattern having a trapezoidal shape in a mask for an EUV exposure process according to an exemplary embodiment of the present invention and a NILS value according to an angle of a side wall of an absorption pattern.
8 is a graph illustrating a phase modulation pattern having a trapezoidal shape and a CD bias value according to an angle of a sidewall of an absorption pattern in a mask for an EUV exposure process according to an embodiment of the present invention.
9 is an SEM photograph of a phase modulation pattern and an absorption pattern having an inverted trapezoidal shape in a mask for an EUV exposure process according to an embodiment of the present invention.
10 is a graph illustrating a phase modulation pattern having an inverted trapezoidal shape and a NILS value according to an angle of a sidewall of an absorption pattern in an EUV exposure mask according to an embodiment of the present invention.
11 is a graph illustrating a phase modulation pattern having an inverted trapezoidal shape and a CD bias value according to a sidewall angle of an absorption pattern in a mask for an EUV exposure process according to an embodiment of the present invention.
Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the technical spirit of the present invention is not limited to the embodiments described herein but may be embodied in other forms. Rather, the embodiments disclosed herein are provided so that the disclosure can be thorough and complete, and will fully convey the scope of the invention to those skilled in the art.
In this specification, when an element is referred to as being on another element, it may be directly formed on another element, or a third element may be interposed therebetween. Further, in the drawings, the thicknesses of the films and regions are exaggerated for an effective explanation of the technical content.
Also, while the terms first, second, third, etc. in the various embodiments of the present disclosure are used to describe various components, these components should not be limited by these terms. These terms have only been used to distinguish one component from another. Thus, what is referred to as a first component in any one embodiment may be referred to as a second component in another embodiment. Each embodiment described and exemplified herein also includes its complementary embodiment. Also, in this specification, 'and / or' are used to include at least one of the front and rear components.
The singular forms "a", "an", and "the" include plural referents unless the context clearly dictates otherwise. It is also to be understood that the terms such as " comprises "or" having "are intended to specify the presence of stated features, integers, Should not be understood to exclude the presence or addition of one or more other elements, elements, or combinations thereof. Also, in this specification, the term "connection " is used to include both indirectly connecting and directly connecting a plurality of components.
In the following description of the present invention, a detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.
1 is a view for explaining a mask for an EUV exposure process according to an embodiment of the present invention.
1, a mask for an EUV exposure process according to an embodiment of the present invention includes a
The
Each of the plurality of
The refractive index of the
According to one embodiment, the thicknesses of the
Alternatively, unlike the above, according to another embodiment, the thicknesses of the
The
The
The refractive indexes of the
In addition, the
The
FIGS. 2 and 3 are views for explaining a phase modulation pattern and a sidewall angle of an absorption pattern of a mask for an EUV exposure process according to an embodiment of the present invention.
Referring to FIGS. 2 and 3, a vertical line (130 V) perpendicular to the upper surface of the
The
According to the angle (a, b) between the
The step of forming the
The
According to one embodiment, the source power can be adjusted in the etching process of the absorption film and the phase modulation film such that the
Alternatively, according to another embodiment, the operating pressure can be adjusted in the etching process of the absorption layer and the phase modulation layer such that the
Alternatively, according to another embodiment, the gas flow rate can be adjusted such that the
Unlike the above, the
According to one embodiment, the etching process time can be adjusted so that the
The mask for extreme ultraviolet ray exposure process according to the embodiment of the present invention is characterized in that the
Hereinafter, a characteristic evaluation result of the mask for the EUV exposure process according to the embodiment of the present invention described above will be described.
4 is a graph for explaining a phase difference according to a thickness of an absorption pattern of a mask for an EUV exposure process according to an embodiment of the present invention.
4, in a mask for an ultraviolet ray exposure process having a molybdenum (Mo) phase modulation pattern and a tantalum nitride (TaN) absorption pattern, the thickness of the tantalum nitride absorption pattern is varied in the thickness, The difference was measured.
As can be seen from Fig. 4, even if the thicknesses of the molybdenum phase modulation pattern and the tantalum nitride absorption pattern are deformed while the sum of the thicknesses of the molybdenum phase modulation pattern and the tantalum nitride absorption pattern is maintained at 40 nm, And the phase difference between the reflection region and the reflection region is maintained at 180 °.
5 is a graph illustrating reflectance and image contrast of a phase modulation pattern of a mask for an EUV exposure process according to an exemplary embodiment of the present invention.
5, in a mask for an ultraviolet ray exposure process having a molybdenum (Mo) phase modulation pattern and a tantalum nitride (TaN) absorption pattern, the sum of the thicknesses of the molybdenum phase modulation pattern and the tantalum nitride absorption pattern is maintained at 40 nm , The reflectance and image contrast according to the thickness of the molybdenum phase modulation pattern were measured.
As can be seen from FIG. 5, the reflectivity increases and the image contrast is controlled as the thickness of the molybdenum phase modulation pattern is increased while the sum of the total thickness is maintained at 40 nm. In other words, according to the embodiment of the present invention, when the phase modulation pattern and the absorption pattern are formed of a material having substantially the same refractive index but different extinction coefficient, the phase modulation pattern and the absorption pattern are maintained at a thickness of 40 nm It can be seen that the reflectivity and / or the image contrast can be adjusted while adjusting the thickness of the phase modulation pattern and the thickness of the absorption pattern, while maintaining the phase difference between the absorption region and the reflection region at 180 °.
FIG. 6 is an SEM photograph of a phase modulation pattern and an absorption pattern having a trapezoidal shape in a mask for an EUV exposure process according to an embodiment of the present invention. FIG. 7 is a cross- FIG. 8 is a graph illustrating a phase modulation pattern having a trapezoidal shape in an ultraviolet ray exposure process according to an exemplary embodiment of the present invention and an absorption pattern This is a graph measuring the CD bias value according to the sidewall angle.
6 to 8, a Ru capping layer is formed on a reflective layer in which an Mo layer and a Si layer are alternately and repeatedly laminated, and a Ru doping layer is formed on the Mo doped layer and the tantalum Masks for extreme ultraviolet exposure processes with different nitride sidewall angles of the molybdenum phase modulation pattern and tantalum nitride absorption pattern were formed. Then, NILS and CD bias values were measured according to the sidewall angle of the molybdenum phase modulation pattern and the tantalum nitride absorption pattern. 7A and 7B are graphs showing the NILS values measured on the left and right sides of the horizontal pattern, respectively, and FIGS. 8A and 8B are graphs of the vertical patterns And the CD bias value of the horizontal pattern. The phase modulation pattern and the sidewall angle of the absorption pattern refer to the angle formed by the phase modulation pattern and the normal of the upper surface of the capping film to the side wall of the absorption pattern, as described with reference to Figs.
7, in the range where the sidewall angle of the molybdenum phase modulation pattern and the tantalum nitride absorption pattern is 10 degrees or less, the NILS value increases as the sidewall angle increases, and when the sidewall angle exceeds 10 degrees, As the angle increases, the NILS value decreases. That is, it can be confirmed that the NILS value becomes maximum when the side wall angle of the molybdenum phase modulation pattern and the tantalum nitride absorption pattern is 10 °.
Also, as can be seen from FIG. 8, it can be seen that as the sidewall angle of the molybdenum phase modulation pattern and the tantalum nitride absorption pattern increases, the CD bias value of the vertical pattern and the horizontal pattern decreases.
FIG. 9 is an SEM photograph of a phase modulation pattern and an absorption pattern having an inverted trapezoidal shape in the mask for an EUV exposure process according to an embodiment of the present invention. FIG. 10 is a cross- FIG. 11 is a graph showing a phase modulation pattern having an inverted trapezoidal shape and a NILS value according to a sidewall angle of an absorption pattern. FIG. 11 is a graph illustrating a phase modulation pattern having an inverted trapezoidal shape in an EUV exposure mask according to an embodiment of the present invention, And the CD bias value according to the side wall angle of the absorption pattern.
9 to 11, a Ru capping layer is formed on a reflective layer in which an Mo layer and a Si layer are alternately and repeatedly laminated, and a molybdenum phase modulation pattern having an inverted trapezoidal shape and Masks for extreme ultraviolet exposure processes were formed which formed tantalum nitride absorption patterns with different sidewall angles of molybdenum phase modulation pattern and tantalum nitride absorption pattern. Then, NILS and CD bias values were measured according to the sidewall angle of the molybdenum phase modulation pattern and the tantalum nitride absorption pattern. 10 (a) and 10 (b) are graphs showing the NILS values measured on the left and right sides of the horizontal pattern, respectively. FIGS. And the CD bias value of the horizontal pattern.
10, in the range where the sidewall angle of the molybdenum phase modulation pattern and the tantalum nitride absorption pattern is 10 degrees or less, the NILS value increases as the sidewall angle increases, and when the sidewall angle exceeds 10 degrees, As the angle increases, the NILS value decreases. That is, it can be confirmed that the NILS value becomes maximum when the side wall angle of the molybdenum phase modulation pattern and the tantalum nitride absorption pattern is 10 °.
Also, as can be seen from FIG. 11, it can be seen that as the sidewall angle of the molybdenum phase modulation pattern and the tantalum nitride absorption pattern increases, the CD bias value of the vertical pattern and the horizontal pattern decreases.
Consequently, as described with reference to Figs. 6 to 11, according to an embodiment of the present invention, it is possible to control the angle between the normal to the top surface of the capping film and the side wall of the phase modulation pattern and the absorption pattern to be 10 [ , It can be confirmed that the NILS value of the mask for the EUV exposure process is improved and the CD bias value is reduced.
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the scope of the present invention is not limited to the disclosed exemplary embodiments. It will also be appreciated that many modifications and variations will be apparent to those skilled in the art without departing from the scope of the invention.
100: substrate
120R:
121: First material film
122: Second material layer
130: capping film
140: phase modulation pattern
150: absorption pattern
Claims (14)
A reflective film comprising a first material film and a second material film alternately and repeatedly stacked on the substrate;
A capping film on the reflective film; And
A phase modulation pattern and an absorption pattern sequentially stacked on the capping layer,
Wherein the sidewalls of the phase modulation pattern and the absorption pattern include an oblique with respect to an upper surface of the capping film.
Wherein the angle between the normal to the top surface of the capping film and the sidewalls of the phase modulation pattern and the absorption pattern is at most 10 degrees.
Wherein the mask has a maximum normalized image log slope (NILS) value when the angle between the phase modulation pattern and the normal to the top surface of the capping film is 10 DEG, .
Wherein when the angle between the phase modulation pattern and the normal of the sidewalls of the absorption pattern to the upper surface of the capping film is greater than 10 degrees,
Wherein a value of a normalized image log slope (NILS) is reduced as the angle between the phase modulation pattern and the normal of the sidewalls of the absorption pattern to the upper surface of the capping film is increased.
Within a range in which the angle between the phase modulation pattern and the normal of the upper surface of the capping film to the sidewalls of the absorption pattern is 10 DEG or less,
Wherein the NILS (normalized image log slope) value is increased as the angle between the phase modulation pattern and the normal of the sidewalls of the absorption pattern to the upper surface of the capping film is increased.
Wherein the normalized image log slope (NILS) value and the critical dimension bias (CD bias) value are adjusted according to the angle between the phase modulation pattern and the normal of the top surface of the capping film to the sidewalls of the absorption pattern Mask for extreme ultraviolet exposure process.
Wherein the sidewall of the phase modulation pattern and the sidewall of the absorption pattern form a coplanar.
Wherein the phase modulation pattern and the width of the absorption pattern are increased toward the upper surface of the capping film.
Wherein the phase modulation pattern and the width of the absorption pattern are reduced toward the upper surface of the capping film.
Wherein the phase modulation pattern and the absorption pattern have the same refractive index, and the extinction coefficients are different from each other.
Wherein the sum of the thickness of the phase modulation pattern and the absorption pattern is 40 nm.
Wherein the thickness of the phase modulation pattern and the thickness of the absorption pattern are adjusted while maintaining a thickness of 40 nm, whereby the reflectivity is adjusted.
Forming a capping film on the reflective film;
Forming a phase modulation film on the capping film;
Forming an absorption layer on the phase modulation film; And
And patterning the absorption layer and the phase modulation layer in order to form an absorption pattern and a phase modulation pattern having oblique sidewalls with respect to the top surface of the capping layer.
Adjusting a normalized image log slope (NILS) value and a critical dimension bias (CD bias) value according to an angle between the phase modulation pattern and the normal of the top surface of the capping film to the sidewalls of the absorption pattern A method for manufacturing a mask for an extreme ultraviolet exposure process.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020150079159A KR101726045B1 (en) | 2015-06-04 | 2015-06-04 | Mask for extreme ultraviolet lithography process and method of fabricating the same |
| US14/825,572 US10061190B2 (en) | 2015-06-04 | 2015-08-13 | Mask for extreme ultraviolet lithography process and method of fabricating the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020150079159A KR101726045B1 (en) | 2015-06-04 | 2015-06-04 | Mask for extreme ultraviolet lithography process and method of fabricating the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160143917A true KR20160143917A (en) | 2016-12-15 |
| KR101726045B1 KR101726045B1 (en) | 2017-04-13 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020150079159A KR101726045B1 (en) | 2015-06-04 | 2015-06-04 | Mask for extreme ultraviolet lithography process and method of fabricating the same |
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| Country | Link |
|---|---|
| US (1) | US10061190B2 (en) |
| KR (1) | KR101726045B1 (en) |
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| WO2020236886A1 (en) * | 2019-05-22 | 2020-11-26 | Applied Materials, Inc. | Extreme ultraviolet mask absorber materials |
| US10877368B2 (en) | 2016-07-27 | 2020-12-29 | Applied Materials, Inc. | Extreme ultraviolet mask blank with alloy absorber and method of manufacture |
| US11022876B2 (en) | 2016-07-27 | 2021-06-01 | Applied Materials, Inc. | Extreme ultraviolet mask blank with multilayer absorber and method of manufacture |
| US11194244B2 (en) | 2018-12-21 | 2021-12-07 | Applied Materials, Inc. | Extreme ultraviolet mask absorber and processes for manufacture |
| US11209727B2 (en) | 2018-10-26 | 2021-12-28 | Applied Materials, Inc. | Ta—Cu alloy material for extreme ultraviolet mask absorber |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009147200A (en) * | 2007-12-17 | 2009-07-02 | Toppan Printing Co Ltd | Reflective photomask and reflective photomask manufacturing method |
| KR20110009375A (en) * | 2009-07-22 | 2011-01-28 | 한양대학교 산학협력단 | Phase shift mask for extreme ultra-violet lithography |
| KR20130087011A (en) * | 2010-06-15 | 2013-08-05 | 칼 짜이스 에스엠테 게엠베하 | Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6986974B2 (en) | 2003-10-16 | 2006-01-17 | Freescale Semiconductor, Inc. | Attenuated phase shift mask for extreme ultraviolet lithography and method therefore |
| US7282306B2 (en) * | 2004-03-26 | 2007-10-16 | Intel Corporation | Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret |
| KR101096248B1 (en) * | 2009-05-26 | 2011-12-22 | 주식회사 하이닉스반도체 | Method for fabricating phase shift mask in Extrea Ultra-Violet lithography |
| US9304390B2 (en) * | 2013-03-13 | 2016-04-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Extreme ultraviolet lithography process and mask |
-
2015
- 2015-06-04 KR KR1020150079159A patent/KR101726045B1/en active IP Right Grant
- 2015-08-13 US US14/825,572 patent/US10061190B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009147200A (en) * | 2007-12-17 | 2009-07-02 | Toppan Printing Co Ltd | Reflective photomask and reflective photomask manufacturing method |
| KR20110009375A (en) * | 2009-07-22 | 2011-01-28 | 한양대학교 산학협력단 | Phase shift mask for extreme ultra-violet lithography |
| KR20130087011A (en) * | 2010-06-15 | 2013-08-05 | 칼 짜이스 에스엠테 게엠베하 | Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask |
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Also Published As
| Publication number | Publication date |
|---|---|
| US20160357099A1 (en) | 2016-12-08 |
| KR101726045B1 (en) | 2017-04-13 |
| US10061190B2 (en) | 2018-08-28 |
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