KR20160120882A - Method for manufacturing of injection product and injection product made by using the same - Google Patents

Method for manufacturing of injection product and injection product made by using the same Download PDF

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Publication number
KR20160120882A
KR20160120882A KR1020150049996A KR20150049996A KR20160120882A KR 20160120882 A KR20160120882 A KR 20160120882A KR 1020150049996 A KR1020150049996 A KR 1020150049996A KR 20150049996 A KR20150049996 A KR 20150049996A KR 20160120882 A KR20160120882 A KR 20160120882A
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KR
South Korea
Prior art keywords
fine pattern
injection
product
injection product
base
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KR1020150049996A
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Korean (ko)
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박형진
최대원
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박형진
최대원
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Priority to KR1020150049996A priority Critical patent/KR20160120882A/en
Publication of KR20160120882A publication Critical patent/KR20160120882A/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/17Component parts, details or accessories; Auxiliary operations
    • B29C45/26Moulds
    • B29C45/263Moulds with mould wall parts provided with fine grooves or impressions, e.g. for record discs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/44Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using single radiation source per colour, e.g. lighting beams or shutter arrangements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/025Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00Surface treatment of glass, not in the form of fibres or filaments, by etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/04Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Injection Moulding Of Plastics Or The Like (AREA)

Abstract

It is possible to manufacture an injection product formed with an activation fine pattern on the surface only by an injection operation without secondary processing and also to maintain the merit of an injection product capable of mass production of a product in a short period of time, An injection product manufacturing method in which the activation fine pattern does not disappear even when the injection mold is formed, and an injection product manufactured using the method. The method of manufacturing the injection product and the injection product manufactured using the injection product can meet the consumer's desire one step higher by amplifying the visual effect and luxury of the appearance of the product and can bring about the design innovation of the product, It is possible to significantly reduce the production cost of the injection product formed with the activation fine pattern while maintaining the advantage of the injection product which can increase the brand value as well as mass production of the product in a short period of time .

Description

TECHNICAL FIELD [0001] The present invention relates to a method of manufacturing an injection product and an injection product manufactured using the injection product.

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing an injection product and an injection product manufactured using the same, and more particularly to a method of manufacturing an injection product manufactured by injecting a plastic liquid into an injection mold at a high pressure and an injection product will be.

In general, injection products such as cosmetic cases are mass-produced through injection molding using injection molds.

In recent years, injection products such as a cosmetic case have been upgraded in response to a higher consumer demand, and at the same time, they have been manufactured in such a manner that the appearance is excellent. In the case of injection products such as a cosmetic case, And the like.

As described above, an injection product in which a fine pattern is formed on an injection product itself generally forms an injection mold and then forms a fine pattern on the surface of the injection mold through secondary processing, thereby requiring a long manufacturing time and a high manufacturing cost there was.

As a method of forming a fine pattern on the surface of the injection mold by secondary processing, there are usually a discharge, an NC processing method and a laser processing method. In the discharge and NC processing method, And the laser processing method can not process the fine pattern to a size of less than 30 mu m at least.

That is, there is a problem in that it is not possible to produce an injection product in which fine patterns of 10 탆 or less such as a hologram are formed on the injection product itself by using the discharge, NC processing method and laser processing method.

Recently, there has been proposed a method in which a hologram is displaced to an injection molded article using a fine concave and convex hologram as disclosed in Korean Patent Registration No. 10-0949940 (registered on March 22, 2010) and a product manufactured by this method Has been developed and used.

The 'method of displacing the hologram in the injection product using the fine concave-convex hologram' disclosed in Korean Patent No. 10-0949940 (registered on March 22, 2010) is a method of forming a hologram on a metal plate through a holographic technique , The fine concavo-convex hologram formed on the metal plate is displaced to a sheet, and the sheet is inserted into an injection mold in a unit of a sheet to produce an injection product.

Therefore, the sheet having the fine concavo-convex holograms formed thereon must be provided one by one, so that the production cost of the injection product is excessively consumed, and every time the injection products are manufactured one by one, the sheet having the fine concavo- There is a problem that the advantage of an injection product capable of mass-producing a product in a short period of time is discolored.

On the other hand, in the case of an injection product in which the micro concavo-convex hologram is formed, a UV protective liquid is applied to the surface of the injection product to form a surface protective layer in order to prevent scratches from occurring in the micro concavo-convex hologram.

If the UV liquid is coated on the surface of the injection product at a thickness of more than 10 탆, the reliability of the scratch prevention can be secured. However, when the UV liquid is applied to the surface of the injection product having the minute concave- There is a problem that the micro concavo-convex hologram formed on the surface of the injection product disappears. When the UV liquid is applied to a thickness of 5 탆 or less, the UV liquid coating layer is detached, There is a problem in that it disappears.

Patent Document 1: Korean Patent Publication No. 10-0949940 (Feb.

It is an object of the present invention to provide an injection molded article having an activated fine pattern formed on its surface only by an injection operation without any additional secondary molding and to provide an injection molded article which can maintain the merit of an injection molded article capable of mass- And to provide an injection product manufactured using the method.

Another object of the present invention is to provide an injection product manufacturing method in which an activation fine pattern does not disappear even when a surface protection layer for preventing scratches is formed and an injection product manufactured using the same.

Other objects and advantages of the present invention will become apparent to those skilled in the art from the following detailed description.

According to an aspect of the present invention, there is provided a method of manufacturing an injection mold, comprising the steps of: preparing an injection mold core in which an activation fine pattern is formed; inserting the injection mold core into an injection mold; And injecting the plastic liquid into the assembled injection mold at a high pressure to form an injection product having an activation fine pattern formed on the product surface itself only by an injection operation.

In addition, the present invention may further comprise the step of forming a surface protection layer on an injection product having an activation fine pattern formed on the product surface itself.

For example, in the step of forming the surface protection layer, a step of plasma-treating an injection product having an activated fine pattern formed on the surface of the injection product itself to reduce the density of the injection product to widen the gap of the injection product structure, And depositing a metal on the extruded article such that the metal can penetrate and be applied between the tissue voids of the extruded article with reduced porosity of the tissue.

Here, the metal is preferably deposited on the surface of the injection product to a thickness of 5 탆 or less.

For example, the step of fabricating the injection mold core may include the steps of forming an activation fine pattern designed on a first base, applying a photosensitive material on a first base on which the activation fine pattern is formed, Depositing a film on the material, irradiating ultraviolet rays to transfer the activated fine pattern formed on the first base to a film, and nickel plating the transferred fine pattern on the transferred film.

Here, before the step of performing nickel plating on the transferred film, the activation fine pattern may further include a step of forming the film into a desired three-dimensional shape through foaming.

For example, the step of forming the film into a desired three-dimensional shape may include plating the film, placing the plated film on a second base formed in a desired three-dimensional shape, As shown in FIG.

Here, the second base may be made of copper.

The first base may be made of glass.

Meanwhile, the activation fine pattern may be formed through etching on the first base.

For example, the activation fine pattern may be formed to a thickness of 5 mu m or less through etching on the first base.

In another example, the activation fine pattern may be formed in the first base in the form of a hologram.

As another example, the activation fine pattern may be formed in the first base in the form of a three-dimensional hologram in which colors are displayed according to the angle of light to be irradiated.

According to another aspect of the present invention, there is provided an injection product manufactured by the method for manufacturing an injection product as described above.

As described above, an injection product manufacturing method and an injection product manufactured using the injection product according to the present invention can produce an injection product in which a hologram or a three-dimensional hologram is formed, which can produce a gorgeous and luxurious appearance on a flat surface as well as a three- And even if a surface protective layer is formed to prevent scratches on the surface, the activation mask fine pattern in the form of hologram or three-dimensional hologram is not lost by the surface protective layer.

Accordingly, it is possible to meet the consumer's desire one step higher by amplifying the visual effect and luxury of the appearance of the injection molded product, to bring about the design innovation of the injection product, to prevent the molding / It has the effect of raising the value.

In addition, the injection mold core used in the method of manufacturing an injection product according to the present invention is not nickel-plated on a film formed with an activated fine pattern, so that the injection mold core is not used one time but is continuously The cosmetic case with the activation fine pattern can be produced.

Accordingly, it is possible to greatly reduce the production cost of the cosmetic case having the activated micropattern while maintaining the advantages of the injection product capable of mass-producing the product in a short period of time.

The effects of the present invention will be clearly understood and understood by those skilled in the art, either through the specific details described below, or during the course of practicing the present invention.

1 is a flowchart for explaining an injection product manufacturing method according to a first embodiment of the present invention;
2 is a flowchart for explaining step S140.
3 is a view for explaining the step S110 according to the first embodiment of the present invention
4 is a flowchart for explaining step S110 according to the first embodiment of the present invention
5 is a view for explaining step S110 according to the second embodiment of the present invention
6 is a flowchart for explaining step S110 according to the second embodiment of the present invention
7 is a flowchart for explaining step S115b

The present invention is capable of various modifications and various forms, and specific embodiments are illustrated in the drawings and described in detail in the text. It should be understood, however, that the invention is not intended to be limited to the particular forms disclosed, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention.

The terms first, second, etc. may be used to describe various elements, but the elements should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as a second component, and similarly, the second component may also be referred to as a first component.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In the present application, the terms "comprising" or "having ", and the like, are intended to specify the presence of stated features, integers, steps, operations, elements, parts, or combinations thereof, But do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, parts, or combinations thereof.

Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs.

Terms such as those defined in commonly used dictionaries are to be interpreted as having a meaning consistent with the meaning in the context of the relevant art and are to be interpreted as ideal or overly formal in meaning unless explicitly defined in the present application Do not.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Reference will now be made in detail to preferred embodiments of the present invention, examples of which are illustrated in the accompanying drawings.

≪ Embodiment 1 >

1 is a flowchart for explaining an injection product manufacturing method according to a first embodiment of the present invention.

Referring to FIG. 1, in order to manufacture an injection product according to the method of manufacturing an injection product according to the present embodiment, an injection mold core 200 (see FIG. 3) in which an activation fine pattern is formed is fabricated (S110).

After manufacturing the injection mold core 200 having the activation fine pattern, the injection mold core 200 having the activation fine pattern formed thereon is inserted into an injection mold (not shown) and assembled (S120).

When the injection mold core 200 is assembled, a plastic liquid is injected into the injection mold having the injection mold core 200 on which the activation fine pattern is formed at a high pressure, Thereby forming an injection product having a pattern formed therein (S130).

After the injection product having the activation fine pattern formed on the surface thereof is formed, an activation fine pattern is formed on the injection product surface itself to prevent scratches on the surface of the injection product having the activation fine pattern formed thereon A surface protection layer is formed on the injection product (S140).

The step of forming the surface protection layer (S140) will be described in more detail with reference to FIG.

2 is a flowchart for explaining step S140.

Referring to FIG. 2, in order to form a surface protection layer on the surface of an injection product having the activated product fine pattern formed thereon, first, an injection product having an activation fine pattern formed on the injection product surface itself is plasma- The gap of the injection product structure is widened (S141).

When the plasma processing is performed on the injection product, the density of the injection product is reduced to ½ and the void of the injection product structure is widened.

Thereafter, the metal is deposited on the expanded product of the expanded space of the tissue to allow the metal to permeate through the tissue pores of the product to be injected (S142).

As described above, when the metal is vapor-deposited on the injection product in a state in which the pores of the structure are expanded by the plasma treatment as described above, the metal penetrates through the tissue pores of the expanded injection product and is applied to be part of the injection product to form the surface protection layer, The surface protective layer can be formed to a thickness of 5 mu m or less. In the case of forming the surface protective layer through metal vapor deposition after widening the pores of the injection product structure as described above, the surface protective layer may be formed to have a thickness in the unit of A.

Therefore, in the case of the injection product manufactured through the injection product manufacturing method according to the present embodiment, although the activation fine pattern is formed on the surface itself as a hologram or a three-dimensional hologram in which various colors are produced according to the angle at which the light is irradiated There is an advantage that the activation fine pattern disappears due to the surface protective layer.

When the activation fine pattern is formed in a hologram shape, the hologram-shaped fine pattern does not disappear until the surface protection layer is formed to be 5 μm or less. When the activation fine pattern is formed as a three-dimensional hologram, The activation fine pattern in the form of the three-dimensional hologram does not disappear unless the surface protection layer is formed to have a thickness of A units.

However, when an injection product in which a hologram or a three-dimensional hologram is formed on a surface through a conventional method of producing an injection product is usually manufactured, a surface protective layer is formed by coating a UV liquid on the surface of the injection product.

However, when the surface protective layer is formed by coating the surface of the injection product on which the hologram or the three-dimensional hologram is formed, the hologram or the three-dimensional hologram disappears, so that the surface protective layer can not be formed. There is a problem that a lot of scratches are generated on the surface of the injection product.

That is, in order to prevent the occurrence of scratches on the surface of the injection product, in order to form the surface protective layer by coating the UV liquid, a surface protective layer having a thickness of 10 탆 or more should be formed on the surface of the injection product, Thereby ensuring reliability. However, when the hologram-shaped fine pattern is formed on the surface of the injection product, when the thickness of the surface protective layer exceeds 5 탆, the hologram-shaped fine pattern disappears by the surface protective layer. On the other hand, when a three-dimensional hologram-like fine pattern is formed on the surface of the injection product, the fine hologram-like fine pattern disappears unless a surface protective layer is formed in units of angstroms.

Therefore, when an injection product in which a hologram or a three-dimensional hologram-like fine pattern is formed on the surface itself through a conventional general injection product manufacturing method, the surface protection layer can not be formed and the injection product is very weak in scratching. There is a problem in that a large number of scratches are generated on the surface and the hologram or the fine hologram-shaped fine pattern disappears frequently.

However, in the case of an injection product manufactured through the method of manufacturing an injection product according to the present embodiment, a metal is vapor-deposited on an injection product in a state in which a void of the structure is widened by plasma treatment to form a surface protection layer having a thickness of 5 탆 or less , And a surface protective layer having a thickness in the unit of A can be formed. Therefore, the surface protective layer prevents scratches on the surface of the injection product, and the activated fine pattern is formed on the injection surface itself by a hologram or an angle There is an advantage that the activation fine pattern disappears due to the surface protection layer even if it is formed in the form of a three-dimensional hologram that will produce various colors.

The step S110 will be described in more detail with reference to FIG. 3 and FIG.

FIG. 3 is a view for explaining step S110 according to the first embodiment of the present invention. FIG. 4 is a flowchart for explaining step S110 according to the first embodiment of the present invention.

Referring to FIGS. 3 and 4, in order to manufacture the injection mold core 200, first, a fine pattern for activation is designed (S111a).

For example, company logos and brand images can be designed in fine patterns for activation.

After designing the fine pattern for activation, the activated fine pattern designed in the first base 110 is formed (S112a).

For example, the first base 110 on which the activation fine pattern is formed may be made of glass.

Meanwhile, the activation fine pattern may be formed by etching the first base 110 by etching the first base 110 formed of glass. That is, the activation fine pattern may be formed by etching the first base 110 through an etching process used when the semiconductor wafer is processed.

Here, the activation fine pattern may be formed to a thickness of 5 탆 or less through the etching of the first base 110.

For example, the activation fine pattern may be formed by etching the first base 110 to a thickness of more than 2 mu m and less than 5 mu m through etching.

Alternatively, the activation fine pattern may be formed by etching the first base 110 so that the first base 110 is larger than the angstrom unit and less than 2 탆 through etching. Generally, when a pattern is formed on various surfaces in such a manner as to be larger than A and smaller than 2 mu m, the pattern is formed in the form of a hologram on the surface. Therefore, if the first base 110 is etched to a thickness of 2 탆 or more in excess of Å to form an activation fine pattern on the first base 110, The fine pattern is in the form of a hologram.

As another example, the activation fine pattern may be formed by etching the first base 110 in units of A through etching. Generally, when a pattern is formed in units of angles on various surfaces, the pattern is formed in the form of a three-dimensional hologram in which even the hue is directed according to the angle of light irradiated on the surface. Therefore, when the first base 110 is etched in units of A to form an activation fine pattern on the first base 110, the activation fine pattern formed on the first base 110 may be a pattern of light It becomes a three-dimensional hologram shape in which various colors are produced according to the angle.

After forming the activated product fine pattern on the first base 110 as described above, the photosensitive material 120 is coated on the first base 110 formed with the activated fine pattern (S113a).

For example, as the photosensitive material 120, a UV liquid can be used.

After the photosensitive material 120 is applied to the first base 110, the film 130 is placed on the photosensitive material 120, and ultraviolet rays are irradiated thereon to form an activation fine The pattern is transferred to the film 130 (S114a).

After the activation fine pattern is transferred to the film 130, the activation fine pattern is nickel plated 140 on the transferred film 130 (S115a).

The film 130 having the nickel plating 140 is transferred to the injection mold core 200 after the activation fine pattern is transferred as described above.

In the above-described step S110, a method of manufacturing the injection mold core 200 formed in a planar shape has been described. A method of manufacturing the injection mold core 200 having a three-dimensional shape will be described with reference to the second embodiment.

≪ Embodiment 2 >

FIG. 5 is a diagram for explaining step S110 according to the second embodiment of the present invention. FIG. 6 is a flowchart for explaining step S110 according to the second embodiment of the present invention. FIG.

The method of manufacturing an injection product according to the present embodiment and the injection product manufactured using the method according to the present embodiment are identical to those of the injection product manufacturing method according to the first embodiment of the present invention except for the step S110 of manufacturing an injection mold core, The detailed description of the other components except for the step of fabricating the injection mold core (S110) will be omitted.

5 to 7, in order to manufacture the injection mold core 200, a fine pattern for activation is first designed (S111b).

For example, company logos and brand images can be designed in fine patterns for activation.

After designing the fine pattern for activation, the activated fine pattern designed in the first base 110 is formed (S112b).

For example, the first base 110 on which the activation fine pattern is formed may be made of glass.

Meanwhile, the activation fine pattern may be formed by etching the first base 110 by etching the first base 110 formed of glass. That is, the activation fine pattern may be formed by etching the first base 110 through an etching process used when the semiconductor wafer is processed.

Here, the activation fine pattern may be formed to a thickness of 5 탆 or less through the etching of the first base 110.

For example, the activation fine pattern may be formed by etching the first base 110 to a thickness of more than 2 mu m and less than 5 mu m through etching.

Alternatively, the activation fine pattern may be formed by etching the first base 110 so that the first base 110 is larger than the angstrom unit and less than 2 탆 through etching. Generally, when a pattern is formed on various surfaces in such a manner as to be larger than A and smaller than 2 mu m, the pattern is formed in the form of a hologram on the surface. Therefore, if the first base 110 is etched to a thickness of 2 탆 or more in excess of Å to form an activation fine pattern on the first base 110, The fine pattern is in the form of a hologram.

As another example, the activation fine pattern may be formed by etching the first base 110 in units of A through etching. Generally, when a pattern is formed in units of angles on various surfaces, the pattern is formed in the form of a three-dimensional hologram in which even the hue is directed according to the angle of light irradiated on the surface. Therefore, when the first base 110 is etched in units of A to form an activation fine pattern on the first base 110, the activation fine pattern formed on the first base 110 may be a pattern of light It becomes a three-dimensional hologram shape in which various colors are produced according to the angle.

After forming the activated product fine pattern on the first base 110 as described above, the photosensitive material 120 is coated on the first base 110 formed with the activated product fine pattern (S113b).

For example, as the photosensitive material 120, a UV liquid can be used.

After the photosensitive material 120 is applied to the first base 110, the film 130 is placed on the photosensitive material 120, and ultraviolet rays are irradiated thereon to form an activation fine The pattern is transferred to the film 130 (S114b).

After the fine pattern is transferred to the film 130, the fine pattern is formed into a desired three-dimensional shape by forming the transferred film 130 (S115b).

(S115b) of molding the transferred film 130 into a desired three-dimensional shape through foaming will be described in more detail.

As shown in FIG. 5, in order to form the transferred film 130 having a fine pattern into a desired three-dimensional shape through foaming, first, the surface of the film 130 is plated 150 (S1150b).

The reason for plating the surface of the film 1510 is to allow electricity to flow through the film 130 and the second base 160 during the nickel plating 140 in step S116b.

After plating 150 on the surface of the film 130, the plated film 130 is placed on the second base 160 formed in a desired three-dimensional shape, And is molded into a three-dimensional shape (S1151b).

After the film 130 is formed into a desired three-dimensional shape through foaming, the activated fine pattern is nickel plated 140 on the transferred film 130 (S116b).

The film 130 having the nickel plating 140 is transferred to the injection mold core 200 after the activation fine pattern is transferred as described above.

In the above-described step S110, a method of manufacturing the injection mold core 200 formed in a three-dimensional shape has been described.

1 to 7, the method of manufacturing an injection product according to the present invention and the operation effect of an injection product manufactured using the same will be described.

Referring to FIGS. 1 to 7, an injection product manufacturing method and an injection product manufactured using the injection product according to an embodiment of the present invention include a process of plasma-processing an injection product having a hologram or a three-dimensional hologram- A metal is deposited in a state where the pores of the tissue are widened to form a surface protective layer.

Therefore, even if a surface protection layer for preventing scratches is formed on the surface of an injection product having a hologram or a three-dimensional hologram-shaped product activation fine pattern, the hologram or three-dimensional hologram-shaped activation fine pattern is not removed by the surface protection layer But it also has an advantage that scratches on the surface of the injection product can be prevented.

Also, an injection product manufacturing method and an injection product manufactured using the injection product according to an embodiment of the present invention can produce an injection product having a fine pattern of 5 탆 or less on its surface, which can not be manufactured in a general injection mold process.

More specifically, in the general injection molding process, in order to manufacture an injection product having a fine pattern, an injection product is manufactured through an injection mold, and then the injection product is subjected to secondary processing to form a fine pattern on the surface of the injection product do.

However, when the injection product manufacturing method according to an embodiment of the present invention is used, the first base 110 is etched through the etching process used in processing the semiconductor wafer during manufacturing of the injection mold core 200, ), And even the activation fine pattern in the unit of A can be formed. After the activation fine pattern formed on the first base 110 is exposed and transferred to a film, the activation fine pattern is formed by nickel plating 140 on the transferred film 130.

Therefore, if an injection product is manufactured by using the method of manufacturing an injection product according to an embodiment of the present invention, it is possible to form a product fine on the surface by only an injection operation without separately performing a secondary operation for forming an activation fine pattern on the surface of the injection product. An injection molded product having a pattern can be produced.

Especially, injection molding can be performed on the surface of the injection product to produce holograms for activation and stereoscopic holograms for activation, which can produce various colors according to the angle of light irradiation. There is an advantage.

As described above, when an injection product is manufactured through the injection product manufacturing method according to the present invention, a three-dimensional hologram in which a hologram or a variety of colors are produced according to an angle at which light is irradiated is formed by only an injection operation without additional secondary processing It is possible to produce an injection molded article having an excellent appearance.

In recent years, since the appearance of an injection product is in a trend of being beautiful and high-quality, when an injection product is manufactured through an injection product manufacturing method according to the present invention, the injection product is further upgraded, And the brand value can be synergized.

In particular, recently, domestic cosmetics are attracting a great deal of popularity, and it is a frequent occurrence that consumers buy confusion by selling imitation products by modifying / modifying cosmetics cases and inducing them to purchase.

Therefore, if an injection product such as a cosmetic case is manufactured through the manufacturing method of the injection product according to the present invention, the hologram or stereoscopic hologram-type authenticated fine pattern for preventing stray / Can be manufactured.

Accordingly, there is an advantage that consumers can easily purchase the imitation product and the genuine product produced by modifying / modifying the cosmetic case.

In the meantime, the injection product manufacturing method according to the present invention can produce an injection product in which not only a flat injection product having a hologram or a three-dimensional hologram-shaped product activation fine pattern is formed, but also an activation fine pattern with various three- It is possible to provide an environment capable of producing an injection product in which an activation fine pattern is formed on all desired shape surfaces without restriction.

As described above, the method of manufacturing an injection product according to the present invention and the injection product manufactured using the method can prevent scratches from being generated on the surface, and prevent holograms or stereoscopic hologram- A protective layer can be formed.

In addition, it is possible to produce an injection product in which a hologram or a three-dimensional hologram is formed, which can produce a gorgeous and elegant appearance on the surface of the injection product, which is three-dimensionally formed, as well as the plane itself.

Accordingly, it is possible to meet the consumer's desire one step higher by amplifying the visual effect and luxury of the appearance of the injection molded product, to bring about the design innovation of the injection product, to prevent the molding / It has the effect of raising the value.

The injection mold core 200 may be formed by injecting a nickel plating 140 onto the formed film 130 to form the injection mold core 200. In this case, The injection mold core 200 can be used to produce an injection molded product in which an activated fine pattern is continuously formed.

That is, when an injection product is manufactured using the method of manufacturing an injection product according to the present invention, the injection mold core 200 having the activation fine pattern formed on the injection mold is not inserted every time one injection product is produced, If the injection mold core 200 is inserted into the mold only once, it is possible to continuously produce the injection product having the activation fine pattern formed thereon.

Therefore, if an injection product is manufactured using the method of manufacturing an injection product according to the present invention, it is possible to greatly reduce the production cost of an injection product in which an activated fine pattern is formed, while maintaining the advantages of an injection product capable of mass- There is an advantage.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.

(110): first base (120): photosensitive material
(130): Film (140): Nickel plating
(150): Plating (160): Second base
(200): injection mold core

Claims (14)

Manufacturing an injection mold core in which an activation fine pattern is formed;
Inserting the injection mold core into an injection mold and assembling the injection mold core; And
Injecting a plastic liquid into the injection mold having the injection mold core formed with the activation fine pattern at a high pressure to form an injection product having an activation fine pattern formed on the product surface itself only by an injection operation .
The method according to claim 1,
Further comprising the step of forming a surface protective layer on an injection product in which an activation fine pattern is formed on the product surface itself.
3. The method of claim 2,
The step of forming the surface protection layer may include:
Subjecting an injection product having an activated fine pattern formed on the product surface itself to a plasma treatment to reduce the density of the injection product structure to widen the gap of the injection product structure; And
And depositing a metal on the extruded article such that the metal can penetrate into the tissue voids of the extruded article with reduced porosity of the tissue by reducing the density.
The method of claim 3,
Wherein the metal is deposited on the surface of the injection product to a thickness of 5 탆 or less.
The method according to claim 1,
Wherein the step of fabricating the injection mold core comprises:
Forming an activation fine pattern designed in a first base;
Applying a photosensitive material to a first base on which the activation fine pattern is formed;
Depositing a film on the photosensitive material, and irradiating ultraviolet light to transfer the activation fine pattern formed on the first base to a film; And
And nickel plating the transferred film on the activated fine pattern.
6. The method of claim 5,
Before the step of nickel plating the transferred film with the activation fine pattern,
And molding the film into a desired three-dimensional shape through foaming.
The method according to claim 6,
The step of shaping the film into a desired three-
Plating the film; And
Placing the plated film on a second base made in a desired three-dimensional shape, and then molding the molded film into a desired three-dimensional shape through foaming.
8. The method of claim 7,
Wherein the second base is made of copper.
6. The method of claim 5,
Wherein the first base is made of glass.
6. The method of claim 5,
Wherein the activation fine pattern is formed through etching on the first base.
11. The method of claim 10,
Wherein the activation fine pattern is formed on the first base through an etching process to a size of 5 占 퐉 or less.
11. The method of claim 10,
Wherein the activation fine pattern is formed on the first base in the form of a hologram.
11. The method of claim 10,
Wherein the activation fine pattern is formed on the first base in the form of a three-dimensional hologram in which colors are displayed according to an angle of light to be irradiated.
An injection molded article produced by the method according to any one of claims 1 to 13.
KR1020150049996A 2015-04-09 2015-04-09 Method for manufacturing of injection product and injection product made by using the same KR20160120882A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170034356A (en) * 2017-03-06 2017-03-28 주식회사 우리옵토 Pattern body manufacturing method having minute pattern through 3-dimensional structure of body

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100949940B1 (en) 2009-10-08 2010-03-30 장한인프라 주식회사 Method for transposing hologram into molded material using micro unevenness hologram, hologram goods manufactured using its method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100949940B1 (en) 2009-10-08 2010-03-30 장한인프라 주식회사 Method for transposing hologram into molded material using micro unevenness hologram, hologram goods manufactured using its method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20170034356A (en) * 2017-03-06 2017-03-28 주식회사 우리옵토 Pattern body manufacturing method having minute pattern through 3-dimensional structure of body

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