KR20160094918A - Ion beam source - Google Patents

Abstract

An ion beam source comprises: an anode; and a cathode arranging a first cathode and a second cathode in an upper side of the anode to be spaced at a first gap for forming a discharge space wherein the first cathode and the second cathode are spaced at a second gap from each other for extracting ion beam formed in the discharge space. Each of the first cathode and the second cathode includes first slops positioned at corners where the bottom surface facing the anode for enlarging the discharge space meets a side surface of the first cathode and a side surface of the second cathode facing each other. Therefore, the present invention enlarges the discharge source thereof to increase the amount of the extracted ion beam.

Description

Ion beam source < RTI ID = 0.0 >

The present invention relates to an ion beam source used in a vacuum surface treatment, and more particularly, to an ion beam source which can increase the amount of ions drawn out by an ion beam while ensuring a discharge space between electrodes so as not to transition from a discharge space of a plasma to an abnormal discharge To an ion beam source.

Generally, an ion beam source generates ions by applying a voltage to an anode and a cathode arranged at a certain distance apart, injecting gas into the spaced apart space, and accelerates the ions to an electric field to draw them out as a beam. The ion beam technique is widely divided into a method of generating ions by utilizing filament or RF frequency, a method of accelerating ions through a separate accelerating electrode, and a drawing method of generating and accelerating ions at the same time.

In the case of a draw-out system in which the generation and acceleration of the ions can be performed at the same time, an ion source in the form of a closed-drift type using electrons that perform closed-loop movement is mainly used. The ion beam source in the form of the closed-loop motion can easily expand the ion generating region linearly, and is simple in structure and used in various surface treatment industries. An example of a patent in which a linear ion beam source in the form of the closed-loop motion as described above is disclosed is U.S. Patent No. 7425709.

In order to utilize the linear ion beam source in the high-speed surface treatment process, the amount of ions or active species generated from the linear ion beam source must be large. Generally, the generation of ions and active species can be increased by increasing the discharge power and current.

The discharge current increases as the interval between the anode and the cathode increases in the linear ion beam source. However, if the gap between the anode and the cathode is widened by a certain distance or more, undesired insulation breakdown occurs because the space other than the plasma discharge space for ion beam extraction is widened. Therefore, the flow instability of the plasma is caused and an abnormal discharge occurs, so that the stability of use of the ion beam source is deteriorated.

Further, the discharge current and the power can be improved through expansion of the discharge space under the same voltage condition. When the discharge space is expanded, a space in which electrons moving due to a magnetic field are collided with the neutral particles increases, and the discharge current increases relatively. However, if the discharge space is excessively expanded or the space between the anode and the cathode in the non-discharge protection is expanded, an abnormal discharge or an unstable discharge may occur.

As the ion beam is drawn out, the interval between the cathodes is increased by etching or sputtering the cathode. Therefore, the discharge current is reduced, and the ion beam current also decreases. Therefore, the stability of the ion beam source can be ensured only if the interval between the cathodes is equal to or less than a predetermined interval.

Therefore, it is required to develop a linear ion beam source capable of increasing the amount of the ion beam current and increasing the service life of the negative electrode.

US Patent No. 7425709 (Registered on September 16, 2008)

The present invention provides an ion beam source capable of increasing the ion beam current and increasing the service life of the cathode.

The ion beam source according to the present invention is characterized in that a first cathode and a second cathode are disposed above the anode so as to be spaced apart from each other by a first interval to form an anode and a discharge space, Wherein the first and second cathodes are spaced apart from each other by a second interval to draw out the formed ion beam, wherein each of the first and second cathodes has a bottom surface facing the anode to expand the discharge space, Two cathodes may have a first inclined portion at an edge where opposite side faces meet.

According to an embodiment of the present invention, each of the first negative electrode and the second negative electrode may be formed so that the first negative electrode and the second negative electrode are disposed on the upper side of the first inclined portion so as to be continuous with the first inclined portion, As shown in Fig.

According to an embodiment of the present invention, the first cathode and the second cathode are formed so that the first cathode and the second cathode are continuous with the vertical portion on the side where the first cathode and the second cathode face each other for diffusion of the extracted ion beam And a second inclined portion disposed above the vertical portion.

According to an embodiment of the present invention, the height of the first inclined portion may be 0 to 5 mm, and the height of the vertical portion may be 0.5 to 3 mm.

According to one embodiment of the present invention, the first gap may be 1 to 5 mm, and the second gap may be 1 to 5 mm.

According to an embodiment of the present invention, the bottom surface of the first negative electrode and the bottom surface of the second negative electrode may be spaced apart by a third spacing, and the third spacing may be between 1 and 11 mm.

The first negative electrode and the second negative electrode in the ion beam source according to the present invention each have a first negative electrode and a second negative electrode opposed to the positive electrode and a second negative electrode opposed to the first negative electrode and the second negative electrode, 1 inclined portion. The gap between the anode and the cathode in the region between the first cathode and the second cathode is widened due to the first inclined portion, so that the discharge space can be expanded. Therefore, the discharge current of the ion beam source can be increased without abnormal discharge or unstable discharge. In addition, it is possible to increase the plasma generation through the expansion of the discharge space, and further to increase the amount of the ion beam extracted from the ion beam source. Therefore, the speed of the surface treatment process using the ion beam source can be improved.

In the ion beam source, the first cathode and the second cathode have vertical portions. Therefore, even if the negative electrode is etched or sputtered by the extracted ion beam, the interval between the first negative electrode and the second negative electrode can be reduced. Therefore, the lifetime of the ion beam source can be extended by lengthening the replacement period of the negative electrode.

1 is a perspective view illustrating an ion beam source according to an embodiment of the present invention.
2 is a cross-sectional view illustrating the ion beam source shown in FIG.
3 is an enlarged view of an anode and a cathode of the ion beam source shown in FIG. 2. FIG.
4 is a graph showing discharge currents according to voltages of Examples 1 to 4 in the ion beam source of the present invention.
5 is a graph showing ion currents according to voltages of Examples 1 to 4 in the ion beam source of the present invention.
6 is a graph showing discharge currents according to voltages of Examples 5 to 7 in the ion beam source of the present invention.
7 is a graph showing ion currents according to voltages of Examples 5 to 7 in the ion beam source of the present invention.

Hereinafter, an ion beam source according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. The present invention is capable of various modifications and various forms, and specific embodiments are illustrated in the drawings and described in detail in the text. It should be understood, however, that the invention is not intended to be limited to the particular forms disclosed, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention. Like reference numerals are used for like elements in describing each drawing. In the accompanying drawings, the dimensions of the structures are enlarged to illustrate the present invention in order to clarify the present invention.

The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as a second component, and similarly, the second component may also be referred to as a first component.

The terminology used in this application is used only to describe a specific embodiment and is not intended to limit the invention. The singular expressions include plural expressions unless the context clearly dictates otherwise. In this application, the terms "comprises", "having", and the like are used to specify that a feature, a number, a step, an operation, an element, a part or a combination thereof is described in the specification, But do not preclude the presence or addition of one or more other features, integers, steps, operations, components, parts, or combinations thereof.

Unless defined otherwise, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries are to be interpreted as having a meaning consistent with the contextual meaning of the related art and are to be interpreted as either ideal or overly formal in the sense of the present application Do not.

FIG. 1 is a perspective view for explaining an ion beam source according to an embodiment of the present invention, and FIG. 2 is a cross-sectional view for explaining the ion beam source shown in FIG.

1 and 2, an ion beam source 100 for performing a deposition process or an etching process using a gas discharge includes a body 110, a cathode 120, an anode 130, and a gas distributor (not shown) 140).

The body 110 has a substantially rectangular parallelepiped shape and has an inner space 111 formed at a predetermined depth on the upper surface. For example, the inner space 111 may have a ring shape extending along the extending direction of the body 110. Therefore, the upper surface of the body 110 can be divided into an edge portion and a central portion by the inner space 111. [ The body 110 is made of a metal material.

The body 110 has a gas supply hole (not shown). The gas supply hole is provided through the body 110 from the lower surface of the body 110 and supplies the gas to the internal space 111 of the body 110. The gas supply holes may be arranged such that a plurality of gas supply holes are spaced apart from each other by a predetermined distance along the extending direction of the body 110. Therefore, the gas can be uniformly supplied to the inner space 111 through the gas supply hole.

The cathode 120 is provided to expose the internal space 111 on the upper surface of the body 110 and includes a first cathode 121 and a second cathode 122.

The first cathode 121 is provided along a top edge portion of the body 110. For example, the first cathode 121 has a ring shape.

The second cathode 122 is provided at the center of the upper surface of the body 110. For example, the second cathode 122 has a bar shape.

The first cathode 121 and the second cathode 122 are spaced apart from each other by a predetermined distance and form an opening 123. The inner space of the body 110 is exposed through the opening 123 between the first cathode 121 and the second cathode 122. The gas ionized through the opening 123 can be drawn out in the form of an ion beam. At this time, the opening 123 has a ring shape extending in one direction.

A first fastening groove 121a and a second fastening groove 122a are formed on the bottom surfaces of the first cathode 121 and the second cathode 122 for coupling with the body 110. The first fastening groove 121a and the second fastening groove 122a may each have a shape in which one groove is extended. Specifically, the first fastening groove 121a has a ring shape, and the second fastening groove 122a has a bar shape.

As another example, the first fastening groove 121a and the second fastening groove 122a may each have a plurality of grooves arranged at regular intervals. Specifically, the first fastening groove 121a has a plurality of grooves arranged in a ring shape, and the second fastening groove 122a has a plurality of grooves arranged in a bar shape. In this case, the upper surface of the body 110 also has a shape corresponding to the shape of the first engagement groove 121a and the second engagement groove 122a.

The first fastening groove 121a and the second fastening groove 122a receive the upper surface of the body 110. The tolerance of the first fastening groove 121a and the second fastening groove 122a is preferably about 0.3 mm or less. The first negative electrode 121 and the second negative electrode 122 can be precisely positioned on the upper surface of the body 110 by using the first engagement groove 121a and the second engagement groove 122a. The first fastening groove 121a and the second fastening groove 122a may receive the upper surface of the body 110 so that the length of the first cathode 121 and the second cathode 122 is longer than about 2000 mm, Can be accurately positioned on the body 110.

When a magnetic body (not shown) is embedded in the body 110, the first and second negative electrodes 121 and 122 made of metal are precisely positioned on the upper surface of the body 110 due to the magnetic force of the magnetic body it's difficult. However, if the first and second coupling grooves 121a and 122a are used, the first and second cathodes 121 and 122 may be connected to the upper surface of the body 110, As shown in FIG.

The distance between the first cathode 121 and the second cathode 122 can be kept constant since the first cathode 121 and the second cathode 122 can be accurately positioned on the upper surface of the body 110. [ Also, the interval between the cathode 120 and the anode can be kept constant.

On the other hand, the cathode 120 is not connected to a power source from the outside, and maintains a floating state which is not grounded. Since the body 110 is coupled to the cathode 120, the body 110 also acts as the cathode 120. Accordingly, the body 120 connected to the cathode 120 also maintains a floating state.

The anode 130 is provided in the inner space 111 of the body 110. The anode 130 is disposed so as to be spaced apart from the body 110 and the cathode 120. At this time, the distance between the anode 130 and the body 110 and the distance between the anode 130 and the cathode 120 may be the same. The anode 130 has a ring shape extending in the same direction as the extending direction of the body 110.

The anode 130 is connected to an external power source. Accordingly, the anode 130 generates an electric field in the space between the cathode 120 and the anode 130 in conjunction with the driving power applied from the outside. The gas is excited by the electric field into the ion beam in the plasma state.

Since the cathode 120 is in a floating state, the cathode 120 and the anode 130 maintain the site potential state even if driving power is applied to the anode 130. [ Therefore, even when a conductive material is attached to the surface of the ion beam source 100, for example, the body 110, the cathode 120, and the anode 130, and charges are accumulated in the conductive material by the ion beam, The potential difference between the conductive material 100 and the conductive material is not large, and arcing can be reduced.

The gas distributor 140 is provided at a lower portion of the body 110 and is connected to the gas supply holes. A gas distributor 140 distributes the gas uniformly and provides it to the gas supply holes. Therefore, the uniformity of the gas can be improved.

3 is an enlarged view of an anode and a cathode of the ion beam source shown in FIG. 2. FIG.

Referring to FIG. 3, the cathode 120 is spaced apart from the anode 130 by a first distance. At this time, the first spacing (a) may be about 1 to 5 mm.

When the first interval a is less than about 1 mm, the size of the plasma discharge space for drawing out the ion beam formed between the cathode 120 and the anode 130 becomes relatively small. Therefore, the discharge current can not be sufficiently increased.

If the first gap (a) exceeds about 5 mm, not only the discharge space but also the space other than the discharge space is widened to cause undesired dielectric breakdown. Therefore, the flow instability of the plasma is caused and an abnormal discharge occurs, so that the stability of use of the ion beam source is deteriorated.

The first cathode 121 and the second cathode 122 are spaced apart from each other by a second distance b to form an opening 123 in the cathode 120. The ion beam formed in the discharge space is drawn out through the opening 123.

When the second interval b is less than about 1 mm, the size of the opening 123 is too small to easily discharge the ion beam formed in the discharge space.

When the second gap b is greater than about 5 mm, the gap between the first cathode 121 and the second cathode 122 is excessively widened to cause a decrease in the discharge current, Lt; / RTI >

Therefore, it is preferable that the second interval (b) is about 1 to 5 mm.

The first cathode 121 and the second cathode 122 have side surfaces 124 facing each other with the opening 123 interposed therebetween. The first negative electrode 121 and the second negative electrode 122 have a first inclined portion 124a, a vertical portion 124b and a second inclined portion 124c on the side surface 124, respectively. The first cathode 121 and the second cathode 122 have a bottom surface 125 facing the anode 130, respectively.

The first inclined portion 124a is formed at an edge portion where the side face 124 and the bottom face 125 of the first negative electrode 121 and the second negative electrode 122 meet. The gap between the cathode 120 and the anode 130 at the opening 123 is wider than the first gap due to the first inclined portion 124a so that the discharge space can be expanded. At this time, the gap between the cathode 120 and the anode 130 is kept constant at the first interval except for the opening 123.

When the discharge space is expanded, a space in which electrons moving due to a magnetic field are collided with the neutral particles increases, and the discharge current increases relatively. Therefore, it is possible to increase the discharge amount of the ion beam by increasing the plasma generation in the discharge space. Therefore, the process speed using the ion beam can be improved.

The bottom surface 125 of the first cathode 121 and the bottom surface 125 of the second cathode 122 are separated by the third gap c when the first inclined portion 124a is formed.

When the third spacing c is equal to the second spacing b or less than about 1 mm than the second spacing, it is difficult to sufficiently enlarge the discharge space. In addition, in order to sufficiently enlarge the discharge space, the distance between the cathode 120 and the anode 130 should be wider than the first gap, in addition to the opening 123 as well as the opening 123. In this case, abnormal discharge or unstable discharge may occur.

If the third spacing c is larger than the second spacing b by more than about 6 mm, the discharge space may be excessively widened to cause dielectric breakdown, or the thickness of the vertical portion 124b may be relatively small Can be. Accordingly, the cathode 120 is easily damaged by etching or sputtering by the extracted ion beam, so that the second gap between the first cathode 121 and the second cathode 122 can be easily widened. Therefore, the discharge current is reduced, and the ion beam current also decreases. Also, since the cathode 120 is easily damaged, the replacing period of the cathode 120 is shortened and the replacement cost can be increased.

Accordingly, the third spacing c may be equal to or greater than the second spacing b by about 6 mm or more than the second spacing b. Since the second spacing b is about 1 to 5 mm, the third spacing c may be about 1 to 11 mm. More preferably, the third spacing c may be greater than the second spacing b by about 4 mm. That is, the third interval (c) is more preferably about 5 to 9 mm.

If the height d of the first inclined portion 124a exceeds about 5 mm, the discharge space may become excessively widened and insulation breakdown may occur or the thickness of the cathode 120 may become excessively thick.

Therefore, the height d of the first inclined portion 124a is preferably 0 to 5 mm. At this time, when the height d of the first inclined portion 124a is 0, the first inclined portion 124a does not exist.

The vertical portion 124b is disposed on the side 124 of the first cathode 121 and the second cathode 122 so as to be continuous with the first inclined portion 124a above the first inclined portion 124a. The interval between the first cathode 121 and the vertical portion 124b of the second cathode 122 becomes the second gap b.

When the height e of the vertical portion 124b is lower than 0.5 mm, the vertical portions 124b of the first cathode 121 and the second cathode 122 are easily damaged by etching or sputtering by the extracted ion beam The second gap b between the first cathode 121 and the second cathode 122 can be easily widened.

When the height e of the vertical portion 124b is higher than 3 mm, the generated discharge current is drawn out in the form of a beam, and is collided with the vertical portion 124b of the cathode 120 to be lost. In addition, since the material of the cathode 120 is sputtered by the beam colliding with the cathode 120, the lifetime of the cathode 120 can be shortened, and the sputtered material can act as an impurity.

Therefore, the height e of the vertical portion 124b may be about 0.5 to 3 mm.

The second inclined portion 124c is formed at a corner portion where the upper surface opposite to the bottom surface 125 and the side surface 124 meet at the first cathode 121 and the second cathode 122. That is, the inclined portion 124c is disposed so as to be continuous with the vertical portion 124b above the vertical portion 124b in the side surface 124 of the first cathode 121 and the second cathode 122. [ The ion beam extracted through the opening 123 by the second inclined portion 124c can be easily diffused.

Example

Example a (mm) b (mm) c (mm) d (mm) e (mm) One 2 2 0 0 One 2 2 2 6 One One 3 2 2 6 2 One 4 2 2 6 3 One 5 2 1.5 5.5 2 One 6 2 2 6 2 One 7 2 2.5 6.5 2 One

In Table 1, a is the first interval between the cathode 120 and the anode 130 in the ion beam source 100, b is the second interval between the first cathode 121 and the second cathode 122, c D is the height of the first inclined portion 124a and e is the height of the vertical portion 124b of the first cathode 121 and the second inclined portion 124b of the second cathode 122, ).

Referring to Table 1, in Examples 1 to 4, a is constant at 2 mm, b is 2 mm, e is 1 mm, d is gradually increased from 0 mm to 1 mm, in Examples 5 to 7, a is 2 mm, 2mm, e is constant at 1mm, b gradually increases from 1.5mm to 0.5mm, and c increases gradually from 5.5mm to 0.5mm.

FIG. 4 is a graph showing discharge currents according to voltages of Examples 1 to 4 in the ion beam source of the present invention. FIG. 5 is a graph showing ion currents according to voltages of Examples 1 to 4 in the ion beam source of the present invention to be. At this time, argon gas was injected as a discharge gas at 12 sccm, and the ion current was measured at a distance of 150 mm from the ion beam source.

Referring to FIGS. 4 and 5, it can be seen that as the d increases when the same voltage is applied to the ion beam source, the static current and the ion current increase in general. That is, it can be seen that as the height of d increases and the discharge space increases, the discharge current and the ion current also increase.

FIG. 6 is a graph showing discharge currents according to voltages of Examples 5 to 7 in the ion beam source of the present invention. FIG. 7 is a graph showing ion currents according to voltages of Examples 5 to 7 in the ion beam source of the present invention to be. At this time, argon gas was injected as a discharge gas at 12 sccm, and the ion current was measured at a distance of 150 mm from the ion beam source.

Referring to FIGS. 6 and 7, it can be seen that the discharge current and the ion current decrease as b and c increase when the same voltage is applied to the ion beam source. That is, it can be seen that when the distance between the first and second cathodes increases, the discharge current and the ion current decrease.

As described above, the ion beam source according to the present invention extends only the plasma discharge space for withdrawing the ion beam by using the first inclined portion of the negative electrode while maintaining a constant gap between the positive electrode and the negative electrode. Therefore, discharge current and power can be improved without abnormal discharge due to dielectric breakdown.

In addition, the ion beam source according to the present invention has a vertical portion on the cathode, so that the interval between the first and second cathodes can be reduced even if the cathode is etched or sputtered by the extracted ion beam. Therefore, the lifetime of the ion beam source can be extended by lengthening the replacement period of the negative electrode.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the present invention as defined by the following claims. It can be understood that it is possible.

100: ion beam source 110: body
120: cathode 130: anode
140: Gas distributor

Claims (6)

anode; And
A first cathode and a second cathode are disposed above the anode so as to be spaced apart from each other by a first distance to form a discharge space and the first and second cathodes are connected to each other to discharge the ion beam formed in the discharge space, And a cathode which is spaced apart by an interval,
The first cathode and the second cathode each have,
A first inclined portion at a corner where the first cathode and the second cathode face each other facing each other to extend the discharge space; And
In order to prevent the first and second cathodes from being damaged due to etching or sputtering by the extracted ion beam, the first and second cathodes are connected to the first and second cathodes, respectively, And a vertical portion disposed above the first inclined portion so as to be continuous with the first inclined portion on a side where the second negative electrode faces each other. [3] The apparatus of claim 1, further comprising a body having an inner space formed at a predetermined depth on an upper surface thereof,
Wherein the anode is disposed in the inner space, and the cathode is disposed on an upper surface of the body so as to expose the inner space,
A lower surface of the cathode has a fastening groove corresponding to an upper surface of the body for accurately positioning the cathode on the body,
Wherein the coupling groove has a shape in which one groove is extended or a plurality of grooves are arranged at regular intervals. [2] The apparatus of claim 1, wherein the first cathode and the second cathode each include a first cathode and a second cathode arranged on an upper side of the vertical portion so as to be continuous with the vertical portion on a side where the first cathode and the second cathode face each other, And a second inclined portion disposed on the second inclined portion. The ion beam source according to claim 3, wherein a height of the first inclined portion is 0 to 5 mm and a height of the vertical portion is 0.5 to 3 mm. 5. The ion beam source according to claim 4, wherein the first interval is 1 to 5 mm, and the second interval is 1 to 5 mm. The ion beam source according to claim 5, wherein the bottom surface of the first negative electrode and the bottom surface of the second negative electrode are spaced apart by a third gap, and the third gap is 1 to 11 mm.

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