KR20160091469A - Dc port for high voltage electro static chuck - Google Patents

Dc port for high voltage electro static chuck Download PDF

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Publication number
KR20160091469A
KR20160091469A KR1020150011083A KR20150011083A KR20160091469A KR 20160091469 A KR20160091469 A KR 20160091469A KR 1020150011083 A KR1020150011083 A KR 1020150011083A KR 20150011083 A KR20150011083 A KR 20150011083A KR 20160091469 A KR20160091469 A KR 20160091469A
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KR
South Korea
Prior art keywords
electrode rod
port
insulating tube
electrostatic chuck
base material
Prior art date
Application number
KR1020150011083A
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Korean (ko)
Inventor
전세주
김기훈
박정진
서준영
Original Assignee
와이엠씨 주식회사
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Priority to KR1020150011083A priority Critical patent/KR20160091469A/en
Publication of KR20160091469A publication Critical patent/KR20160091469A/en

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    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00—Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect

Abstract

The present invention relates to a structure of a DC port for an electrostatic chuck. A conductive electrode rod 102 having a lower end connected to an upper surface side of the insulator base 107 and a flange 111 having a radial shape at a lower end thereof and the electrode rod 102 Wherein the electrode rod 102 is inserted into the hollow of the inside of the insulator base 107 and the flange 111 is connected to the upper surface of the insulator base 107, And an upper end portion (108) exposed upward from an upper surface of the insulating tube (103), wherein the upper end portion (108) includes a flat upper end surface (109) And an inclined surface 110 reaching the interface between the upper surface of the insulating tube 103 and the upper surface of the insulating tube 103. The slope of the inclined surface 110 is preferably 70 ° or less.

Description

DC PORT FOR HIGH VOLTAGE ELECTRO STATIC CHUCK

The present invention relates to a DC port for an electrostatic chuck, and more particularly, to an improved DC port for an electrostatic chuck in which arcing is not generated by maintaining a completely insulated state between an electrode rod constituting a DC port and a base material of the electrostatic chuck .

Generally, a chuck is used to fix a wafer in a semiconductor device manufacturing process. Particularly, in order to minimize the generation of particles in a plasma processing process, electrostatic chucks, which can be attached and detached without contacting with wafers by using electrostatic force rather than conventional mechanical clamps or vacuum chucks, are mainly used.

The electrostatic chuck is formed by forming a dielectric layer on a plate-shaped aluminum base material, sandwiching an electrode layer therebetween, and applying a DC voltage to the electrode layer to adsorb and fix the semiconductor substrate with an electrostatic force formed on the upper surface of the dielectric layer. The dielectric layer is formed by mainly spraying a dielectric such as alumina to prevent the electrostatic chuck from being etched by a plasma process gas in a plasma processing process.

As a conventional technique related to such an electrostatic chuck, the structure of the electrostatic chuck is disclosed in " Electrostatic Chuck and Method of Manufacturing the Same "and Published Patent Application No. 10-2012-0000745 "Ceramic electrostatic chuck" is disclosed in Jan. 4, 2012, and a manufacturing method of an electrostatic chuck using a spray coating is disclosed in Patent No. 10-0982649 (registered on September 10, 2010, September 9, 2010). &Quot; A spray coating method, an electrostatic chuck manufacturing method using the same, and an electrostatic chuck ").

Hereinafter, particularly, in the structure of such a general electrostatic chuck, a DC port to which a DC voltage is applied will be described in detail with reference to FIGS. 1 to 5. FIG.

1 shows a DC port 1 for a general electrostatic chuck. The DC port 1 includes a columnar titanium electrode rod 2 and a ceramic insulating tube 3 into which the electrode rod 2 is inserted. The insulating tube 3 into which the electrode rod 2 is inserted is inserted into the insertion hole 5 of the base material 4 substantially constituting the electrostatic chuck. The electrode rod 2 has a flange-shaped lower end portion coupled to the bottom surface side of the insulator base 7 and an upper end portion 8 thereof has a circular upper end surface 9 and an inclined surface 10 of the main surface thereof ~ 5). The ceramic insulating tube 3 has a radial flange 11 at its lower end and is bonded to the upper surface side of the insulator base 7. [

On the other hand, the DC port 1 is configured such that the upper end portion 8 of the electrode rod 2 is exposed at a predetermined height from the upper surface of the insulating tube 3. The height at which the upper end portion 8 of the electrode rod 2 is exposed from the upper surface is higher than the height of the base material 4 because the upper surface of the insulating tube 3 lies on the same plane coinciding with the upper surface of the base material 4. [ As shown in FIG.

After the DC port 1 is inserted into the base material 4 as described above, the alumina lower insulating film 12, the tungsten electrode layer 13, and the alumina upper insulating film 14 are sequentially formed on the base material 4 ). At this time, the circular top surface 9, which is the uppermost portion of the upper end of the electrode rod 2 exposed from the upper surface of the insulating tube 3, that is, the upper surface of the base material 4, The height of the upper end portion 8 of the electrode rod 2 exposed from the upper surface of the insulating tube 3 should be at least the same as the thickness of the lower insulating film 12 so that the surface contact is made.

Fig. 5 shows an example of forming the alumina lower insulating film 12 as described above. Referring to FIG. 5, a spray coating of the lower insulating film 12 is performed on the upper surface of the base material 4 including the upper surface of the insulating tube 3 through the plasma gun 15. The plasma gun 15 blows a ceramic (for example, alumina) powder together with a plasma gas so that the thermal spray 16 melts the ceramic powder at a high temperature and fuses it to the upper surface of the base material 4 as an object. In this spray coating, the spray flame 16 of the plasma gun 15 is in the form of a cone, but its central axis is perpendicular to the upper surface of the base material 4, So that a uniform thickness of the coating is formed on the upper surface.

However, the present inventors have found that in the thermal spray coating process of the insulating film, the upper end of the electrode rod 2 exposed from the upper surface of the insulating tube 3 of the DC port 1 lying on the same plane as the upper surface of the base material 4 8), the insulating film is not uniformly coated.

2 to 4, the upper end of the electrode rod 2 exposed from the upper surface of the insulating tube 3 lying on the same plane as the upper surface of the base material 4 8 includes a top surface 9 as the uppermost portion and a sloped surface 10 formed by chamfering an edge portion adjacent thereto and a circumferential surface portion 2a as a part of the circumferential surface of the columnar electrode rod 2. 5, when the ceramic (alumina) powder is deposited on the upper surface of the base material 4 and the insulating tube 3 by using the plasma gun 15 with the spraying flame 16, the insulating tube 3 The circular upper end face 9 of the electrode rod 2 which is perpendicular to the axis of the thermal spraying flame 16 and the inclined face 10 (FIG. 10) of the electrode rod 2 adjacent thereto are formed at the upper end portion 8 of the electrode rod 2, Since the exposed circumferential surface portion 2a of the electrode rod 2 adjacent to the inclined surface 10 extends parallel to the axis of the sprayed flame 16, A portion of the lower insulating film 12 coated on the circumferential surface portion 2a and the upper surface of the insulating tube 3 adjacent thereto or on the upper surface of the base material 4 is unevenly coated and further the lower insulating film 12). The voids in the lower insulating film 12 cause arcing between the electrode rod 2 and the aluminum base material 4 when the high voltage is applied to the electrostatic chuck so that the lower insulating film 12 is peeled off and the tungsten electrode layer 13 And the upper insulating film 14, thereby deteriorating the function of the electrostatic chuck.

The cause of such a problem is the presence of the circumferential surface portion 2a in the exposed upper end portion 8 of the electrode rod 2. For example, in the case of the conventional DC port 1 structure shown in FIGS. 2 to 5, the outer diameter of the insulating tube 3 is typically about 10 mm, and the diameter of the electrode rod 2 is about 3 mm. 3) is about 3.5 mm. The diameter of the electrode rod 2 is about 3 mm, the thickness of the lower insulating film 12 is about 0.6 mm, and the height of the electrode rod upper end portion 8 of the electrode rod 2 is about 0.6 mm. The diameter of the top surface 9 which is in contact with the tungsten electrode layer 13 is about 2.2 mm and the height of the circumferential surface portion 2a located below the inclined surface 10 formed by typical 45 ° chamfering About 0.2 mm. The ratio of the height of the circumferential surface portion 2a to the height of the exposed top end portion 8 of the electrode rod 2 is approximately 33% and the ratio of the height of the bottom insulating layer 12 coated on the circumferential surface portion 2a ) Is very important.

As described above, in the conventional structure, since the circumferential surface portion 2a extends parallel to the axis of the spray flame 16 ejected from the plasma gun 15, the circumferential surface portion 2a and the insulating tube 3 A gap is formed in the lower insulating film 12 coated on the upper surface of the base material 4 or the upper surface of the base material 4. The formation of such a gap is not limited to the case where the electrode rod 2 and the aluminum base material 4 to cause the peeling of the lower insulating film 12, the tungsten electrode layer 13 and the upper insulating film 14, and the function of the electrostatic chuck is deteriorated.

11 is a microscope photograph of a conventional DC port structure for an electrostatic chuck as described above, wherein the coating state of the lower insulating film 12 between the upper end portion 8 of the electrode rod 2 and the upper surface of the sintered ceramic insulating tube 3 is uniform It can be seen that the circumferential interface is formed in a non-uniform manner.

It is therefore necessary to prevent the uneven coating of the lower insulating film 12 by the presence of the circumferential surface portion 2a in the upper end portion 8 of the electrode rod 2 projecting from the upper surface of the insulating tube 3 do.

SUMMARY OF THE INVENTION The present invention has been made in order to solve the above problems of the prior art and provides a DC port for electrostatic chuck And an object of the present invention is to provide an improved structure.

According to an aspect of the present invention, there is provided an insulator comprising: an insulator base; a conductive electrode rod having a lower end coupled to an upper surface side of the insulator base; and a radial flange at a lower end, Wherein the flange includes an insulating tube coupled to an upper surface side of the insulator base, wherein the electrode rod includes an upper end exposed upward from an upper surface of the insulating tube, the upper end having a flat upper surface, And an inclined surface extending from the upper surface to an interface between the electrode rod and the upper surface of the insulating tube.

At this time, the slope of the inclined surface may be 70 ° or less.

The insulator base includes a step portion surrounding the outer circumferential surface of the upper surface, and the height of the step portion is equal to the height of the flange, whereby the flange is inserted into the upper surface region in the step, .

1 is an exploded perspective view showing a DC port used in an electrostatic chuck.
2 is a partial cross-sectional view of an electrostatic chuck coupled with a prior art DC port.
FIG. 3 is a partially enlarged cross-sectional view showing the upper end structure of the conventional DC port shown in FIG. 2. FIG.
FIG. 4 is a partially enlarged cross-sectional view showing a state before the lower insulating film, the electrode layer, and the upper insulating film are formed on the upper surface of the base material, showing that the conventional art DC port is coupled to the aluminum base material constituting the electrostatic chuck.
5 is a partial enlarged cross-sectional view illustrating a spray coating for forming a lower insulating film on a top surface of a base material to which a DC port of the related art is coupled.
6 is an exploded perspective view showing the DC port of the present invention used in the electrostatic chuck.
7 is a partial cross-sectional view of an electrostatic chuck combined with a DC port of the present invention.
FIG. 8 is a partially enlarged cross-sectional view showing the upper end structure of the DC port according to the present invention shown in FIG.
9 is a partial enlarged cross-sectional view showing a state before the lower insulating film, the electrode layer, and the upper insulating film are formed on the upper surface of the base material, showing that the DC port according to the present invention is coupled to the aluminum base material constituting the electrostatic chuck.
10 is a partially enlarged cross-sectional view illustrating a spray coating process for forming a lower insulating film on a top surface of a base material to which a DC port according to the present invention is attached.
11 is a microscope photograph of a conventional DC port structure for an electrostatic chuck.
Figs. 12A to 12C are micrographs of a DC port structure manufactured according to the specifications of Table 1, wherein Fig. 12A is a comparative example 1, Fig. 12B is a first embodiment of the present invention, Fig. 12C is a second embodiment of the present invention Respectively.

Hereinafter, the present invention will be described in detail with reference to FIGS. 6 to 10. FIG.

As best shown in Figures 6-8, the present invention provides a DC port 101 that is coupled to a parent material 104, such as aluminum, which includes an electrode rod 102, And an insulating tube 103 made of a ceramic material such as alumina (Al 2 O 3 ) and the like so that the insulating member 102 can be inserted and electrically isolated from the base material 104. The electrode rod 102 may be a known conductive material in the field including titanium (Ti), tungsten (W), molybdenum (Mo), and the like, and the present invention is not limited thereto.

The lower insulating layer 112, the electrode layer 113, and the upper insulating layer 114 are sequentially formed on the upper surface of the base material 104 including the upper surface 108 of the insulating tube 103 to constitute the electrostatic chuck. . The upper and lower insulating layers 112 and 114 may be formed of alumina (Al 2 O 3 ), yttria (Y 2 O 3 ), zirconia (ZrO 2 ), or the like, and the electrode layer 113 may be formed of tungsten (W), molybdenum (Mo), titanium (Ti), or the like.

The upper and lower insulating films 112 and 114 are spray coated by the thermal spraying of the plasma gun 115 (see FIG. 9). The thickness of the lower insulating film 112 is about 1.0 mm or less , Preferably about 0.6 mm. The height of the upper end portion 108 of the electrode rod 102 exposed from the upper surface of the insulating tube 103 so as to electrically contact the tungsten electrode layer 113 when the thickness of the lower insulating film 112 is 0.6 mm is 0.6 mm .

6, the upper end portion 108 of the electrode rod 102 in the present invention includes a circular upper end surface 109 which is in electrical contact with the tungsten electrode layer 113, 109 are formed so as to be connected to the upper surface of the insulating tube 103 by the inclined surfaces 110 which are not vertical but have a predetermined angle. This inclined surface 110 is not parallel to the axis of the spraying flame 116 when the lower insulating layer 112 is formed by thermal spray coating so that uniform coating of the lower insulating layer 112 at the upper end portion 108 of the electrode rod 102 .

In the present invention, the inclination angle of the inclined surface 110 may be about 70 degrees or less.

The height of the upper end 108 of the electrode rod 102 exposed upward from the upper surface of the base material 104 is maintained as it is and the inclination of the inclined surface 110 is adjusted to 70 ° or less, In addition, the diameter of the electrode rod 102 can be increased (e.g., about 5 mm) so that the lower portion of the upper end 108 of the electrode rod 102 reaches the upper surface of the insulating tube 103 The diameter of the upper end surface 109 above the electrode rod 102 can also be increased (e.g., about 3 mm). For example, if the diameter of the electrode rod 102 is increased to about 5 mm and the outer diameter of the insulating tube 103 is kept about 10 mm, the wall thickness of the insulating tube 103 is only 2.5 mm The wall thickness of the insulating tube 103 is about 3.5 mm because the path of the leakage current from the electrode rod 102 to the base material 104 becomes shorter and the insulation resistance value becomes lower It is preferable to keep it at 3.5 mm or more.

Hereinafter, the present invention will be described in more detail with reference to examples and comparative examples. However, it is to be understood that the present invention is not limited to the following examples, but the present invention is not limited thereto.

Example

In order to compare the electrical characteristics of the conventional DC port and the DC port 101 according to the present invention, as compared with the conventional DC port structure (Comparative Example 1), as shown in the following Table 1, (Example 1) in which the diameter of the electrode rod 102 was increased to 5.0 mm and the wall thickness of the insulating tube 103 was kept equal to 3.5 mm, 103) having an increased wall thickness of 5.0 mm (Example 2) were prepared. As a control example, a DC port (Comparative Example 1) in which the diameter of the conventional electrode rod 102 was increased to 5.0 mm and the wall thickness of the insulation tube 103 was decreased to 2.5 mm compared to the conventional DC port structure (Comparative Example 1) ) Were prepared.

Particularly, in the comparative example 1, the exposed circumferential surface portion 2a of the electrode rod 2 adjacent to the inclined surface 10 is formed so as to be perpendicular to the upper surface of the insulating tube 3 as described above in the prior art, In Examples 1 and 2 and Comparative Example 1, the height of the upper end portion 108 of the electrode rod 102 exposed upward from the upper surface of the base material 104 was maintained and the lower side portion of the peripheral inclined surface 110 The diameter of the electrode rod 102 was increased so as to reach the upper surface and the inclined surface 110 was formed so as to be connected to the upper surface of the insulating tube 103 while being kept at 70 ° or less.

Then, when 500 V was applied to the DC port according to Comparative Example 1, Comparative Example 1, and Examples 1 and 2 through the respective electrode rods, the respective insulation resistance values were measured. Table 1 below summarizes the structures of Examples 1 to 3 and Comparative Examples and their insulation resistance values.

Comparative Example 1
(Prior art) Control Example 1 Example 1 Example 2 Diameter of electrode rod (mm) 3.0 5.0 5.0 5.0 Electrode layer contact surface diameter (mm) 2.2 3.0 3.0 3.0 Diameter of insulation tube (mm) 10.0 10.0 12.0 15.0 Wall thickness of insulation tube (mm) 3.5 2.5 3.5 5.0 Insulation resistance (GΩ) when 500V applied 47.1 34.5 613 769

Referring to Table 1, the inclined surface 110 around the upper end portion 108 of the electrode rod 102 is kept at 70 ° or less and connected to the upper surface of the insulating tube 103, In Examples 1 and 2 according to the present invention, in which the wall thickness of the insulating tube 103 was increased to 3.5 mm or 5.0 mm, respectively, was about 16 times greater than that in Comparative Example 1, It can be seen that it has increased greatly. This means that the leakage current is greatly reduced as compared with the conventional structure, thereby preventing the arcing phenomenon and providing the improved DC port for the electrostatic chuck.

In contrast, in Comparative Example 1, the inclined surface 110 was formed to be connected to the upper surface of the insulating tube 103 while maintaining the inclined surface 110 at 70 ° or less, as in Examples 1 and 2. However, the diameter of the electrode rod 102 was 5.0 mm The diameter of the insulating tube 103 was maintained at 10 mm and the wall thickness thereof was reduced to 2.5 mm smaller than 3.5 mm of Comparative Example 1 so that the path of the leakage current from the electrode rod 102 to the base material 104 It is confirmed that the insulation resistance value is lowered.

12A to 12C are microscope photographs of the DC port structure manufactured as described above. FIG. 12A is a microscope photograph of Control 1, FIG. 12B is a microscope photograph of Example 1, and FIG. 12C is a microscope photograph of Example 2. FIG. These photographs show that the traces of the interface between Comparative Example 1 (see FIG. 11) and the upper surface of the electrode rod and the upper surface of the ceramic insulating tube are relatively unobtrusive, indicating that the lower insulating film is uniformly coated.

As described above, according to the present invention, in the DC port for electrostatic chuck, the upper end surface 109 around the upper end portion 108 of the electrode rod 102 is inclined with respect to the upper surface of the insulating tube 103 110). Since the inclined surface 110 is not parallel to the axis of the spraying flame 116 when the lower insulating layer 112 is formed by spray coating, the lower insulating layer 112 is uniformly coated on the upper end portion 108 of the electrode rod 102 The formation of voids in the lower insulating film 112 is prevented. Therefore, peeling of the lower insulating film, the tungsten electrode layer, and the upper insulating film from around the electrode rod during operation of the electrostatic chuck can be prevented.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, and variations and modifications may be made without departing from the spirit and scope of the invention. , Additions and the like are to be regarded as belonging to the claims. For example, in FIG. 6, a step is formed on the outer peripheral surface of the insulator base 107, and the height of the step is equal to the height of the radial flange 111 to which the lower end of the electrode rod 102 is coupled, A flange 111 is shown inserted into the step and fitted to the upper surface side of the insulator base 107. However, it is obvious to those skilled in the art that the flange 111 can be coupled to the upper surface side of the insulator base 107 without such a step.

101; A lower electrode, a lower electrode, a tungsten electrode layer, an upper insulating layer, a plasma gun, a plasma torch, 116: A warrior fire.

Claims (3)

A conductive electrode rod 102 having a lower end coupled to an upper surface side of the insulator base 107 and a flange 111 having a radial shape at a lower end thereof and the electrode rod 102 having a hollow And an insulation tube (103) which is inserted into the insulator base (107) and the flange (111) is coupled to the upper surface side of the insulator base (107)
The electrode rod 102 includes an upper end portion 108 exposed upward from an upper surface of the insulating tube 103. The upper end portion 108 includes a flat upper end surface 109 and a lower end And an inclined surface (110) extended to an interface between the electrode rod (102) and the upper surface of the insulating tube (103). The method according to claim 1,
Wherein a slope of the inclined surface (110) is 70 DEG or less. 3. The method according to claim 1 or 2,
The insulator base 107 includes a step portion surrounding the outer circumferential surface of the upper surface and the height of the step portion is equal to the height of the flange 111 so that the flange 111 is inserted into the upper surface region of the step And is coupled to the upper surface side of the insulator base (107).
KR1020150011083A 2015-01-23 2015-01-23 Dc port for high voltage electro static chuck KR20160091469A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190083746A (en) * 2018-01-05 2019-07-15 와이엠씨 주식회사 Dc port for high voltage electrostatic chuck and electrostatic chuck having the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190083746A (en) * 2018-01-05 2019-07-15 와이엠씨 주식회사 Dc port for high voltage electrostatic chuck and electrostatic chuck having the same

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