KR20160081437A

KR20160081437A - Vertical type chemical vapor deposition device

Info

Publication number: KR20160081437A
Application number: KR1020140195278A
Authority: KR
Inventors: 김기원
Original assignee: 주식회사 티씨케이
Priority date: 2014-12-31
Filing date: 2014-12-31
Publication date: 2016-07-08

Abstract

The present invention relates to a vertical chemical vapor deposition apparatus, which comprises a bell-shaped processing furnace and a plurality of exhaust ports inserted in an inner central portion of the bell-type processing furnace, the plurality of exhaust ports being formed in vertical and horizontal directions, A plurality of support portions projecting along the circumferential direction of the exhaust pipe to support the object to be processed; an isolation wall protruding along the longitudinal direction of the exhaust pipe to shield both sides of the object to be processed; And a plurality of nozzles provided inside the processing furnace for ejecting the process gas to the object to be treated isolated by the isolation wall and the support. The present invention can improve the uniformity of the thin film deposited on each of the objects to be treated in the bell-mouth treatment furnace by allowing the process gas supplied to each of the object to be processed to be exhausted through the object to be processed arranged in the vertical and horizontal directions There is an effect.

Description

[0001] The present invention relates to a vertical type chemical vapor deposition device,

The present invention relates to a vertical chemical vapor deposition apparatus, and more particularly, to a vertical chemical vapor deposition apparatus capable of forming a more uniform thin film.

In general, the vertical chemical vapor deposition apparatus has a structure having a vertical type of deposition furnace (reactor), in which a plurality of substrates or deposition base structures are stacked upward, and a thin film having a desired physical property is supplied to the substrate or base Is a device for depositing on a structure. At this time, the temperature is controlled by an external heater in the reaction furnace.

The deposition furnace of the vertical chemical vapor deposition apparatus includes a nozzle for supplying the reaction gas and a gas discharge pipe for discharging the gas after the reaction to remove the gas.

For example, Japanese Patent Application Laid-Open No. 10-1382375 (vertical CVD apparatus, registered April 1, 2014) includes a process gas passage into which a process gas is injected and a plurality of process gas ejection openings formed along the process gas passage, It can be seen that the gas can be injected to a plurality of objects to be treated, and that the manifold is provided with an exhaust port for discharging the process gas or the like remaining therein.

However, since the process gas is exhausted only from one side, it is difficult to uniformly deposit the thin film. This problem also arises in the case where a plurality of objects to be processed are charged without charging one object to be processed on the same horizontal plane, and if the object is to be exhausted from one side, a uniform thin film is deposited on a plurality of objects positioned on the same plane There was a difficult problem.

SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and it is an object of the present invention to provide a vertical chemical vapor deposition apparatus capable of improving deposition uniformity of a vertical chemical vapor deposition apparatus having a processing furnace for processing a plurality of objects to be processed on the same plane, And a deposition apparatus.

According to an aspect of the present invention, there is provided a bell-shaped processing furnace including a bell-shaped processing furnace and a plurality of exhaust ports inserted in an inner central portion of the bell-type processing furnace, wherein a plurality of exhaust ports are formed in the vertical direction and the horizontal direction, A plurality of supporting portions projecting along the circumferential direction of the exhaust pipe to support the object to be processed; an isolation wall protruding along the longitudinal direction of the exhaust pipe to shield both sides of the object to be processed; And a plurality of nozzles provided inside the processing furnace for ejecting the process gas to the object to be treated isolated by the isolation wall and the support.

The vertical chemical vapor deposition apparatus of the present invention is a vertical chemical vapor deposition apparatus including a vertical processing furnace capable of vertically and horizontally mounting a plurality of objects to be processed and a plurality of exhaust ports in a vertical direction and a horizontal direction, An exhaust pipe for exhausting the exhaust gas to the lower side of the vertical processing furnace, an isolation wall for isolating an object to be treated disposed horizontally from the exhaust pipe, and a process gas The process gas supplied to each of the to-be-treated objects can be exhausted through the object to be processed arranged in the vertical and horizontal directions to deposit the respective objects to be processed in the vertical processing furnace, The uniformity of the thin film can be improved.

1 is a cross-sectional view of a vertical chemical vapor deposition apparatus according to a preferred embodiment of the present invention.
2 is a cross-sectional view taken along the line AA of Fig.
Fig. 3 is a perspective view of the exhaust pipe and the isolation wall in Fig. 1;

Hereinafter, a vertical chemical vapor deposition apparatus of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a cross-sectional view of a vertical chemical vapor deposition apparatus according to a preferred embodiment of the present invention, FIG. 2 is a sectional view taken along line A-A of FIG. 1, and FIG. 3 is a perspective view of an exhaust pipe and an isolation wall in FIG.

1 to 3, a vertical chemical vapor deposition apparatus according to a preferred embodiment of the present invention includes a bell-shaped processing furnace 10 and a bell-shaped processing furnace And a plurality of exhaust ports 21 inserted into the exhaust pipe 20 and installed in the exhaust pipe 20 so as to extend in the longitudinal direction of the exhaust pipe 20, And an exhaust port (21) arranged in the horizontal direction between the respective isolation walls (30) and horizontally disposed between the exhaust ports (21) arranged in the vertical direction, (10), which is inserted into the vertical processing furnace (10) at an outer surface of the vertical processing furnace (10) and is separated from the support portion (40) and the isolation wall (30) And a plurality of nozzles 50 for supplying a process gas to the water S.

Hereinafter, the construction and operation of the vertical chemical vapor deposition apparatus according to the preferred embodiment of the present invention will be described in detail.

First, the bell-shaped processing furnace 10 is partially openable and closable, and although not shown in the drawing, a heating means is provided outside.

In the vertical processing furnace 10, a plurality of objects S to be processed are supported by the supporting portions 40 in the vertical direction. Also, a large number of objects S are supported by the support portion 40 in the vertical direction as well as in the horizontal direction.

Although FIGS. 1 and 2 illustrate four objects S to be disposed in the horizontal direction, three or two objects to be processed S in the horizontal direction may be charged and arranged as required. The number of the isolation walls 30 and the number of the exhaust ports 21 should be different depending on the horizontal arrangement number of the objects S to be processed.

An exhaust pipe (20) is inserted into the inner center of the vertical treatment furnace (10) from the lower side. The exhaust pipe 20 is a closed top located in the vertical treatment furnace 10, and a plurality of exhaust ports 21 are arranged in the vertical direction and the horizontal direction on the side surface. The number of the exhaust ports 21 is substantially equal to the number of the objects S to be processed.

It is assumed that the number of the exhaust ports 21 is exactly the same as the number of the spaces defined and isolated by the support portion 40 and the isolation walls 30 on both side surfaces of the support portion 40.

A plurality of support portions 40 are provided horizontally along the circumference of the exhaust pipe 20 and a plurality of support portions 40 are vertically disposed to support the object S in the vertical processing furnace 10.

In the present invention, the support portion 40 may have a structure other than the plate-like structure as shown in the drawing, and may be configured to support only the entire bottom surface or a part of the bottom surface of the object S.

The support part 40 divides exhaust ports 21 provided in a vertical direction to the exhaust pipe 20 in the horizontal direction and the isolation walls 30 are formed by vertically arranging the exhaust ports 21 provided in the exhaust pipe 20 vertically So that the bottom side and the peripheral side of each of the objects S are isolated.

The object to be treated S is exposed in the direction toward the inner wall of the vertical processing furnace 10 by the isolation wall 30 and the process gas is injected into the inner wall of the vertical processing furnace 10 in the direction of exposure A nozzle 50 is provided.

Although not shown in the drawings, when the process gas is injected through the nozzle 50 while the internal temperature of the bell-type treatment furnace 10 is heated to the process temperature by the heating means, Is deposited on the exposed surface of the object (S).

The residue of the process gas is discharged through the exhaust port (21) of the exhaust pipe (20). Therefore, a thin film is deposited on all the objects S by the process gas injected from one nozzle 50, and the residue of the used process gas is discharged through the exhaust port 21 to which the same pressure acts, The uniformity of the thin film deposition of the object S to be processed can be ensured.

An exhaust pipe (20) protruding from the bottom side of the vertical processing furnace (10) is connected to an exhaust pump and an exhaust fan so as to be capable of forced exhaust.

In the above example, the exhaust pipe 20 is inserted from the bottom surface side of the bell-type treatment furnace 10 into the bellows type processing furnace 10, but the upper surface of the bellows type treating furnace 10, To the inside of the bell-mouth treatment furnace 10.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit and scope of the invention will be.

10: bell-shaped processing furnace 20: exhaust pipe
21: exhaust port 30: isolation wall
40: support part 50: nozzle

Claims

Bell shaped processing furnace;
An exhaust pipe inserted in an inner central portion of the bell-type treatment furnace and formed with a plurality of exhaust ports in a vertical direction and a horizontal direction, so that gas can be exhausted to the outside through each exhaust port;
A plurality of supporters protruding along the circumferential direction of the exhaust pipe to support the object to be processed;
An isolation wall protruding along the longitudinal direction of the exhaust pipe to shield both sides of the object to be treated; And
And a plurality of nozzles disposed inside the bell-type processing furnace for jetting the process gas into the isolation wall and the object to be processed isolated by the support portion.

The method according to claim 1,
The support portion
And supports the whole or a part of the bottom surface of the object to be processed.

The method according to claim 1,
The isolation wall
Wherein the exhaust pipe is divided into a plurality of exhaust ports arranged horizontally in the exhaust pipe, and the number of exhaust ports is the same as the number of the exhaust ports.