KR20150132804A - Composition for forming solar cell electrode and electrode prepared using the same - Google Patents
Composition for forming solar cell electrode and electrode prepared using the same Download PDFInfo
- Publication number
- KR20150132804A KR20150132804A KR1020150054044A KR20150054044A KR20150132804A KR 20150132804 A KR20150132804 A KR 20150132804A KR 1020150054044 A KR1020150054044 A KR 1020150054044A KR 20150054044 A KR20150054044 A KR 20150054044A KR 20150132804 A KR20150132804 A KR 20150132804A
- Authority
- KR
- South Korea
- Prior art keywords
- oxide
- silver
- solar cell
- composition
- glass frit
- Prior art date
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- 239000000203 mixture Substances 0.000 title claims abstract description 75
- 239000011521 glass Substances 0.000 claims abstract description 79
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 57
- 229910052709 silver Inorganic materials 0.000 claims abstract description 56
- 239000004332 silver Substances 0.000 claims abstract description 51
- 239000011734 sodium Substances 0.000 claims abstract description 41
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 27
- 229910052714 tellurium Inorganic materials 0.000 claims abstract description 24
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 23
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 20
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims abstract description 17
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000011591 potassium Substances 0.000 claims abstract description 15
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000000843 powder Substances 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims description 43
- 239000002184 metal Substances 0.000 claims description 42
- 150000001875 compounds Chemical class 0.000 claims description 25
- 229940100890 silver compound Drugs 0.000 claims description 23
- 150000003379 silver compounds Chemical class 0.000 claims description 23
- 239000002243 precursor Substances 0.000 claims description 15
- 239000011651 chromium Substances 0.000 claims description 13
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 12
- 230000000737 periodic effect Effects 0.000 claims description 12
- -1 silver halide Chemical class 0.000 claims description 10
- 239000011572 manganese Substances 0.000 claims description 9
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 claims description 9
- 239000002245 particle Substances 0.000 claims description 8
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 7
- 239000000395 magnesium oxide Substances 0.000 claims description 7
- 229910052733 gallium Inorganic materials 0.000 claims description 6
- 229910052732 germanium Inorganic materials 0.000 claims description 6
- 150000002500 ions Chemical class 0.000 claims description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims description 6
- 150000004706 metal oxides Chemical class 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 claims description 6
- 229910052684 Cerium Inorganic materials 0.000 claims description 5
- 239000000654 additive Substances 0.000 claims description 5
- 229910017052 cobalt Inorganic materials 0.000 claims description 5
- 239000010941 cobalt Substances 0.000 claims description 5
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 5
- 238000000354 decomposition reaction Methods 0.000 claims description 5
- 239000011777 magnesium Substances 0.000 claims description 5
- ZXSQEZNORDWBGZ-UHFFFAOYSA-N 1,3-dihydropyrrolo[2,3-b]pyridin-2-one Chemical compound C1=CN=C2NC(=O)CC2=C1 ZXSQEZNORDWBGZ-UHFFFAOYSA-N 0.000 claims description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052779 Neodymium Inorganic materials 0.000 claims description 4
- 230000000996 additive effect Effects 0.000 claims description 4
- 229910052787 antimony Inorganic materials 0.000 claims description 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 4
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052792 caesium Inorganic materials 0.000 claims description 4
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims description 4
- 229910052745 lead Inorganic materials 0.000 claims description 4
- 229910052749 magnesium Inorganic materials 0.000 claims description 4
- 229910052748 manganese Inorganic materials 0.000 claims description 4
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims description 4
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 claims description 4
- 229910001958 silver carbonate Inorganic materials 0.000 claims description 4
- LKZMBDSASOBTPN-UHFFFAOYSA-L silver carbonate Substances [Ag].[O-]C([O-])=O LKZMBDSASOBTPN-UHFFFAOYSA-L 0.000 claims description 4
- LFAGQMCIGQNPJG-UHFFFAOYSA-N silver cyanide Chemical compound [Ag+].N#[C-] LFAGQMCIGQNPJG-UHFFFAOYSA-N 0.000 claims description 4
- 229910001961 silver nitrate Inorganic materials 0.000 claims description 4
- 229910052712 strontium Inorganic materials 0.000 claims description 4
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 4
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052785 arsenic Inorganic materials 0.000 claims description 3
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 239000002270 dispersing agent Substances 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 3
- 239000000049 pigment Substances 0.000 claims description 3
- 239000004014 plasticizer Substances 0.000 claims description 3
- 229910052707 ruthenium Inorganic materials 0.000 claims description 3
- CQLFBEKRDQMJLZ-UHFFFAOYSA-M silver acetate Chemical compound [Ag+].CC([O-])=O CQLFBEKRDQMJLZ-UHFFFAOYSA-M 0.000 claims description 3
- 229940071536 silver acetate Drugs 0.000 claims description 3
- 229940098221 silver cyanide Drugs 0.000 claims description 3
- 229910001923 silver oxide Inorganic materials 0.000 claims description 3
- YPNVIBVEFVRZPJ-UHFFFAOYSA-L silver sulfate Chemical compound [Ag+].[Ag+].[O-]S([O-])(=O)=O YPNVIBVEFVRZPJ-UHFFFAOYSA-L 0.000 claims description 3
- 239000003381 stabilizer Substances 0.000 claims description 3
- 239000013008 thixotropic agent Substances 0.000 claims description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 2
- 239000005751 Copper oxide Substances 0.000 claims description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000012963 UV stabilizer Substances 0.000 claims description 2
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 2
- 229910001942 caesium oxide Inorganic materials 0.000 claims description 2
- KOPBYBDAPCDYFK-UHFFFAOYSA-N caesium oxide Chemical compound [O-2].[Cs+].[Cs+] KOPBYBDAPCDYFK-UHFFFAOYSA-N 0.000 claims description 2
- 229910000431 copper oxide Inorganic materials 0.000 claims description 2
- 239000013530 defoamer Substances 0.000 claims description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 2
- 229910000476 molybdenum oxide Inorganic materials 0.000 claims description 2
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 2
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 claims description 2
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 2
- 229910052698 phosphorus Inorganic materials 0.000 claims description 2
- 239000011574 phosphorus Substances 0.000 claims description 2
- 229910000367 silver sulfate Inorganic materials 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 claims 3
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 claims 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 2
- 229910052721 tungsten Inorganic materials 0.000 claims 2
- 239000010937 tungsten Substances 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 claims 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 8
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 15
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 12
- 230000000694 effects Effects 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 8
- 239000013078 crystal Substances 0.000 description 7
- 238000010304 firing Methods 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 239000012086 standard solution Substances 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000011787 zinc oxide Substances 0.000 description 6
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 5
- 229910010981 Li2CO3—Na2CO3 Inorganic materials 0.000 description 5
- 229910017493 Nd 2 O 3 Inorganic materials 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 150000002823 nitrates Chemical class 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 101710134784 Agnoprotein Proteins 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 239000001856 Ethyl cellulose Substances 0.000 description 3
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 229920001249 ethyl cellulose Polymers 0.000 description 3
- 235000019325 ethyl cellulose Nutrition 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 2
- VXQBJTKSVGFQOL-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethyl acetate Chemical compound CCCCOCCOCCOC(C)=O VXQBJTKSVGFQOL-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 2
- 229910021612 Silver iodide Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 239000003929 acidic solution Substances 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000011088 calibration curve Methods 0.000 description 2
- PBAYDYUZOSNJGU-UHFFFAOYSA-N chelidonic acid Natural products OC(=O)C1=CC(=O)C=C(C(O)=O)O1 PBAYDYUZOSNJGU-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 238000010812 external standard method Methods 0.000 description 2
- 229910003437 indium oxide Inorganic materials 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- KZVBBTZJMSWGTK-UHFFFAOYSA-N 1-[2-(2-butoxyethoxy)ethoxy]butane Chemical compound CCCCOCCOCCOCCCC KZVBBTZJMSWGTK-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 1
- ZRXHLJNBNWVNIM-UHFFFAOYSA-N 3-methyl-1-benzofuran Chemical compound C1=CC=C2C(C)=COC2=C1 ZRXHLJNBNWVNIM-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229920000896 Ethulose Polymers 0.000 description 1
- 239000001859 Ethyl hydroxyethyl cellulose Substances 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 1
- IKWTVSLWAPBBKU-UHFFFAOYSA-N a1010_sial Chemical compound O=[As]O[As]=O IKWTVSLWAPBBKU-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- 239000012491 analyte Substances 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 229910000413 arsenic oxide Inorganic materials 0.000 description 1
- 229960002594 arsenic trioxide Drugs 0.000 description 1
- 229910000416 bismuth oxide Inorganic materials 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 235000019326 ethyl hydroxyethyl cellulose Nutrition 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229940051250 hexylene glycol Drugs 0.000 description 1
- 238000007603 infrared drying Methods 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- XGZVUEUWXADBQD-UHFFFAOYSA-L lithium carbonate Chemical compound [Li+].[Li+].[O-]C([O-])=O XGZVUEUWXADBQD-UHFFFAOYSA-L 0.000 description 1
- 229910052808 lithium carbonate Inorganic materials 0.000 description 1
- 150000002642 lithium compounds Chemical class 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- 229910001947 lithium oxide Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229940032007 methylethyl ketone Drugs 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 150000003112 potassium compounds Chemical class 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 238000007781 pre-processing Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- VFWRGKJLLYDFBY-UHFFFAOYSA-N silver;hydrate Chemical compound O.[Ag].[Ag] VFWRGKJLLYDFBY-UHFFFAOYSA-N 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 150000003388 sodium compounds Chemical class 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- LAJZODKXOMJMPK-UHFFFAOYSA-N tellurium dioxide Chemical compound O=[Te]=O LAJZODKXOMJMPK-UHFFFAOYSA-N 0.000 description 1
- QGMWCJPYHVWVRR-UHFFFAOYSA-N tellurium monoxide Chemical compound [Te]=O QGMWCJPYHVWVRR-UHFFFAOYSA-N 0.000 description 1
- IIXQANVWKBCLEB-UHFFFAOYSA-N tellurium trioxide Chemical compound O=[Te](=O)=O IIXQANVWKBCLEB-UHFFFAOYSA-N 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 238000002525 ultrasonication Methods 0.000 description 1
- 239000000326 ultraviolet stabilizing agent Substances 0.000 description 1
- 229910001935 vanadium oxide Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/14—Conductive material dispersed in non-conductive inorganic material
- H01B1/16—Conductive material dispersed in non-conductive inorganic material the conductive material comprising metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Abstract
Description
본 발명은 태양전지 전극 형성용 조성물 및 이로부터 제조된 전극에 관한 것이다.
The present invention relates to a composition for forming a solar cell electrode and an electrode made therefrom.
태양전지는 PN접합(PN junction)의 광전 효과를 이용하여 태양광의 포톤(photon)을 전기 에너지로 변환시킨다. 태양전지는 예를 들면, PN접합이 형성된 반도체 웨이퍼 또는 기판의 표면에 전면 전극과 후면 전극이 형성된 구조일 수 있다. 이러한 구조의 태양전지는 반도체 웨이퍼에 입사되는 태양광에 의해 PN접합에 광전 효과가 유도되고, 이로부터 발생된 전자들이 전극을 통해 외부로 흐른다. Solar cells convert photons of sunlight into electrical energy using the photoelectric effect of PN junctions. The solar cell may be, for example, a structure in which a front electrode and a rear electrode are formed on the surface of a semiconductor wafer or substrate on which a PN junction is formed. In the solar cell having such a structure, the photoelectric effect is induced in the PN junction by the sunlight incident on the semiconductor wafer, and the electrons generated from the PN junction flow to the outside through the electrode.
태양전지의 전극은 태양전지 전극 형성용 조성물을 웨이퍼 또는 기판에 도포하고, 이를 패터닝 및 소성함으로써, 형성될 수 있다.An electrode of a solar cell can be formed by applying a composition for forming a solar cell electrode to a wafer or a substrate, and patterning and firing the same.
최근에는 태양전지의 효율을 증가시키기 위해 전극에 포함된 에미터(emitter)의 두께가 얇아질 것이 요구되고 있다. 그러나, 에미터의 두께가 얇아지는 경우, 태양전지의 성능을 저하시킬 수 있는 션팅(shunting) 현상을 유발시킬 수 있다. 또한, 태양전지의 면적은 광전 변환효율을 향상시키기 위해 넓어지는 추세에 있다. 그러나, 이러한 경우 태양전지의 접촉저항이 높아져 태양전지의 효율을 감소시킬 수 있다.In recent years, in order to increase the efficiency of the solar cell, it is required that the thickness of the emitter included in the electrode is thinned. However, if the thickness of the emitter is reduced, it may cause a shunting phenomenon that may degrade the performance of the solar cell. In addition, the area of the solar cell is becoming wider to improve the photoelectric conversion efficiency. However, in this case, the contact resistance of the solar cell is increased and the efficiency of the solar cell can be reduced.
따라서, 웨이퍼와의 접촉성을 향상시켜 에미터의 박막화가 가능하고, 접촉저항(Rc)과 직렬저항(Rs)을 최소화시켜 변환효율을 높일 수 있는 태양전지 전극 형성용 조성물의 개발이 시급히 요구되고 있다.
Therefore, it is urgently required to develop a composition for forming a solar cell electrode capable of improving the contact property with a wafer, making the emitter thin, and minimizing the contact resistance (Rc) and the series resistance (Rs) have.
본 발명의 목적은 전극과 웨이퍼 표면의 접촉성이 우수한 태양전지 전극 형성용 조성물을 제공하기 위함이다.It is an object of the present invention to provide a composition for forming a solar cell electrode that is excellent in contact properties between an electrode and a wafer surface.
본 발명의 다른 목적은 접촉저항과 직렬저항을 최소화할 수 있는 태양전지 전극 형성용 조성물을 제공하는 것이다.Another object of the present invention is to provide a composition for forming a solar cell electrode capable of minimizing contact resistance and series resistance.
본 발명의 또 다른 목적은 Fill Factor 및 변환효율이 우수한 태양전지 전극을 제공하는 것이다.It is another object of the present invention to provide a solar cell electrode having excellent fill factor and conversion efficiency.
본 발명의 또 다른 목적은 상기 조성물로 제조된 전극을 제공하는 것이다.It is another object of the present invention to provide an electrode made of the composition.
본 발명의 상기 및 기타의 목적들은 하기 설명되는 본 발명에 의하여 모두 달성될 수 있다.
The above and other objects of the present invention can be achieved by the present invention described below.
본 발명의 일 구현예는 은(Ag) 분말, 유리프릿, 및 유기비히클을 포함하고, 상기 유리프릿은 은(Ag) 원소, 텔루륨(Te) 원소, 및 주기율표 1A족 원소를 포함하고, 상기 주기율표 1A족 원소는 리튬(Li), 나트륨(Na) 및 칼륨(K)으로 이루어진 군에서 선택된 하나 이상의 원소; 를 포함하며, 상기 유리프릿에 포함된 은 원소(Ag): 텔루륨 원소(Te)의 몰비는 1 : 0.1 내지 1 : 50이고, 상기 은 원소(Ag)에 대한 리튬(Li), 나트륨(Na) 또는 칼륨(K)의 몰비는 1 : 0.01 내지 1 : 10인 태양전지 전극 형성용 조성물에 관한 것이다.An embodiment of the present invention includes a silver frit containing a silver (Ag) element, a tellurium (Te) element and a periodic table 1A group element, wherein the silver The Group 1A element of the periodic table includes at least one element selected from the group consisting of lithium (Li), sodium (Na), and potassium (K); Wherein the molar ratio of the silver (Ag) to tellurium (Te) element contained in the glass frit is 1: 0.1 to 1:50, and the lithium (Li), sodium (Na ) Or potassium (K) is in a molar ratio of 1: 0.01 to 1:10.
상기 유리프릿은 납(Pb) 원소, 비스무스(Bi) 원소, 인(P) 원소, 게르마늄(Ge) 원소, 갈륨(Ga) 원소, 세륨(Ce) 원소, 철(Fe) 원소, 규소(Si) 원소, 아연(Zn) 원소, 텅스텐(W) 원소, 마그네슘(Mg) 원소, 세슘(Cs) 원소, 스트론튬(Sr) 원소, 몰리브덴(Mo) 원소, 티타늄(Ti) 원소, 주석(Sn) 원소, 인듐(In) 원소, 바나듐(V) 원소, 루테늄(Ru) 원소, 바륨(Ba) 원소, 니켈(Ni) 원소, 구리(Cu) 원소, 비소(As) 원소, 코발트(Co) 원소, 지르코늄(Zr) 원소, 망간(Mn) 원소, 네오디뮴(Nd) 원소, 크롬(Cr) 원소, 안티몬(Sb) 원소 및 알루미늄(Al) 원소로 이루어진 군에서 선택된 1종 이상의 제2금속 원소를 더 포함할 수 있다.The glass frit may be a glass frit containing at least one element selected from the group consisting of Pb, Bi, P, Ge, Ga, Ce, (Ti) element, a tin (Sn) element, a tin (W) element, a magnesium element, a cesium element, a strontium element, a molybdenum element, A metal element such as indium (In), vanadium (V), ruthenium, barium, nickel, copper, arsenic, cobalt, The second metal element may further include at least one second metal element selected from the group consisting of a Zr element, a Mn element, a Neod element, a Cr element, an Sb element, and an Al element. have.
상기 유리프릿은 유리프릿 전체 몰수 대비 은(Ag) 원소를 0.1몰% 내지 65몰%포함할 수 있다. The glass frit may contain 0.1 mol% to 65 mol% of silver (Ag) element relative to the total molar amount of the glass frit.
상기 유리프릿이 포함하는 은(Ag) 원소는 이온 분해온도가 1100℃ 이하인 은 화합물로부터 형성된 것일 수 있다. The silver (Ag) element contained in the glass frit may be formed from a silver compound having an ion decomposition temperature of 1100 ° C or lower.
상기 은 화합물은 시안화은, 질산은, 할로겐화은, 탄산은, 초산은, 황산은 및 산화은으로 이루어진 군에서 선택된 1종 이상을 포함할 수 있다.The silver compound may include at least one member selected from the group consisting of silver cyanide, silver nitrate, silver halide, silver carbonate, silver acetate, silver sulfate and silver oxide.
상기 유리프릿은 은 화합물; 텔루륨 산화물; 및 리튬(Li), 나트륨(Na) 및 칼륨(K)으로 이루어진 군에서 선택된 하나 이상의 주기율표 1A족 원소를 포함하는 화합물;을 포함하는 금속 전구체로부터 형성된 것일 수 있다.The glass frit may be a silver compound; Tellurium oxide; And a compound containing at least one element of the periodic table 1A group selected from the group consisting of lithium (Li), sodium (Na), and potassium (K).
상기 금속 전구체는 납(Pb) 산화물, 비스무스(Bi) 산화물, 인(P) 산화물, 게르마늄(Ge) 산화물, 갈륨(Ga) 산화물, 세륨(Ce) 산화물, 철(Fe) 산화물, 규소(Si) 산화물, 아연(Zn) 산화물, 텅스텐(W) 산화물, 마그네슘(Mg) 산화물, 세슘(Cs) 산화물, 스트론튬(Sr) 산화물, 몰리브덴(Mo) 산화물, 티타늄(Ti) 산화물, 주석(Sn) 산화물, 인듐(In) 산화물, 바나듐(V) 산화물, 루테늄(Ru) 산화물, 바륨(Ba) 산화물, 니켈(Ni) 산화물, 구리(Cu) 산화물, 비소(As) 산화물, 코발트(Co) 산화물, 지르코늄(Zr) 산화물, 망간(Mn) 산화물, 네오디뮴(Nd) 산화물, 크롬(Cr) 산화물, 안티몬(Sb) 산화물 및 알루미늄(Al) 산화물로 이루어진 군에서 선택된 1종 이상의 제2금속 산화물을 더 포함할 수 있다. Wherein the metal precursor is selected from the group consisting of Pb, Bi, P, Ge, Ga, Ce, (Ti) oxide, tin (Sn) oxide, tin (W) oxide, magnesium (Mg) oxide, cesium (Cs) oxide, strontium (Sr) oxide, molybdenum A metal oxide such as indium oxide, vanadium oxide, ruthenium oxide, barium oxide, nickel oxide, copper oxide, arsenic oxide, cobalt oxide, zirconium oxide, (Zr) oxide, manganese (Mn) oxide, neodymium (Nd) oxide, chromium (Cr) oxide, antimony (Sb) oxide and aluminum have.
상기 금속 전구체는 은 화합물 1중량% 내지 45 중량%, 텔루륨 산화물 20 중량% 내지 75 중량% 및 주기율표 1A족 원소를 포함하는 화합물 1중량% 내지 35 중량%을 포함할 수 있다. The metal precursor may comprise from 1 wt% to 45 wt% of silver compounds, from 20 wt% to 75 wt% of tellurium oxide, and from 1 wt% to 35 wt% of a compound comprising Group 1A elements.
상기 금속 전구체는 제2 금속 산화물을 1 중량% 내지 40 중량%로 포함할 수 있다. The metal precursor may include 1 wt% to 40 wt% of the second metal oxide.
본 발명의 다른 구현예는 상기 은 분말 60 중량% 내지 95 중량%; 상기 유리프릿 0.1 중량% 내지 20 중량%; 및 상기 유기비히클 1 중량% 내지 30 중량%를 포함하는 태양전지 전극 형성용 조성물에 관한 것이다. Another embodiment of the present invention is a powder composition comprising 60% to 95% by weight of said silver powder; 0.1% to 20% by weight of said glass frit; And 1% by weight to 30% by weight of the organic vehicle.
상기 유리프릿은 평균입경(D50)이 0.1㎛ 내지 10㎛일 수 있다.The glass frit may have an average particle diameter (D50) of 0.1 占 퐉 to 10 占 퐉.
상기 태양전지 전극 형성용 조성물은 분산제, 요변제, 가소제, 점도 안정화제, 소포제, 안료, 자외선 안정제, 산화방지제 및 커플링제 중 1종 이상의 첨가제를 더 포함할 수 있다.The composition for forming a solar cell electrode may further include at least one of a dispersing agent, a thixotropic agent, a plasticizer, a viscosity stabilizer, a defoamer, a pigment, a UV stabilizer, an antioxidant and a coupling agent.
본 발명의 또 다른 구현예는 태양전지 전극 형성용 조성물로 제조된 태양전지 전극에 관한 것이다.
Another embodiment of the present invention relates to a solar cell electrode made of a composition for forming a solar cell electrode.
본 발명의 태양전지 전극 형성용 조성물은 이온 분해온도가 1100℃ 이하인 은 화합물을 유리프릿에 도입하여 전극과 웨이퍼와 접촉성을 개선하였다.The composition for forming a solar cell electrode of the present invention improves the contact property between the electrode and the wafer by introducing a silver compound having an ion decomposition temperature of 1100 DEG C or lower into a glass frit.
또한, 상기 조성물로 제조된 태양전지 전극은 접촉저항(Rc)과 직렬저항(Rs)이 최소화되어 Fill Factor 및 변환효율이 우수하다.
In addition, the contact resistance (Rc) and the series resistance (Rs) of the solar cell electrode made of the composition are minimized, and the fill factor and conversion efficiency are excellent.
도 1은 본 발명의 일 실시예에 따른 태양전지의 구조를 간략히 도시한 개략도이다.1 is a schematic view briefly showing a structure of a solar cell according to an embodiment of the present invention.
태양전지 전극 형성용 조성물Composition for forming solar cell electrode
본 발명의 일 구현예는 태양전지 전극 형성용 조성물(이하, 단지 「조성물」로 표기하는 경우가 있다)에 관한 것이다. 일 구현예의 태양전지 전극 형성용 조성물은, 은(Ag) 분말, 유리프릿, 및 유기비히클을 포함한다. 상기 유리프릿은 은(Ag) 원소; 텔루륨(Te) 원소; 및 주기율표 1A족 원소를 포함한다. 이 때, 상기 주기율표 1A족 원소는 리튬(Li), 나트륨(Na) 및 칼륨(K)으로 이루어진 군에서 선택된 하나 이상의 원소; 를 포함한다. 상기 유리프릿에 포함된 은 원소(Ag): 텔루륨 원소(Te)의 몰비는 1 : 0.1 내지 1 : 50 이고, 은 원소(Ag):리튬 원소(Li), 나트륨 원소(Na) 또는 칼륨 원소(K)의 몰비는 1 : 0.01 내지 1 : 10이다.One embodiment of the present invention relates to a composition for forming a solar cell electrode (hereinafter sometimes referred to simply as " composition "). The composition for forming a solar cell electrode in one embodiment includes silver (Ag) powder, glass frit, and organic vehicle. The glass frit may include a silver (Ag) element; Tellurium (Te) element; And Periodic Table 1A Group Elements. At this time, the Group 1A element of the periodic table includes at least one element selected from the group consisting of lithium (Li), sodium (Na), and potassium (K); . Wherein the molar ratio of silver (Ag): tellurium element (Te) contained in the glass frit is 1: 0.1 to 1:50 and silver element (Ag): lithium element (Li), sodium element (Na) (K) is from 1: 0.01 to 1:10.
본 명세서에서 몰비는 각 금속 원소의 원자에 대한 몰비를 의미한다. 이하, 본 발명을 상세히 설명하면 다음과 같다.
In the present specification, the molar ratio means a molar ratio of each metal element to an atom. Hereinafter, the present invention will be described in detail.
(A) 은 분말 (A) is powder
본 발명의 태양전지 전극 형성용 조성물은 도전성 분말로서 은(Ag) 분말을 사용한다. 상기 은 분말은 나노 사이즈 또는 마이크로 사이즈의 입경을 갖는 분말일 수 있다. 예를 들어, 은 분말은 수십 내지 수백 나노미터 크기의 은 분말 또는 수 내지 수십 마이크로미터의 은 분말일 수 있다. 또한, 서로 다른 사이즈를 갖는 2종 이상의 은 분말을 혼합하여 사용할 수도 있다.The composition for forming a solar cell electrode of the present invention uses silver (Ag) powder as the conductive powder. The silver powder may be a powder having a nano-sized or micro-sized particle diameter. For example, the silver powder may be a silver powder in the size of tens to hundreds of nanometers or a silver powder in the range of several to several tens of micrometers. Two or more kinds of silver powders having different sizes may be mixed and used.
은 분말의 입자 형상은 예를 들면, 구형, 판상형, 무정형 등일 수 있다.The particle shape of the silver powder may be, for example, spherical, plate-like, amorphous, and the like.
은 분말은 평균입경(D50)은 예를 들면, 0.1㎛ 내지 10㎛ 또는 0.5㎛ 내지 5㎛이 될 수 있다. 상기 범위 내에서, 접촉저항과 선 저항이 낮아지는 효과를 가질 수 있다.The silver powder may have an average particle diameter (D50) of, for example, 0.1 탆 to 10 탆 or 0.5 탆 to 5 탆. Within this range, the contact resistance and line resistance can be lowered.
상기 평균입경은 이소프로필알코올(IPA)에 도전성 분말을 초음파로 25℃에서 3분 동안 분산시킨 후, CILAS社에서 제작한 입도분석기 1064LD 모델을 사용하여 측정된 것이다.The average particle size was measured using a particle size analyzer 1064LD model manufactured by CILAS after dispersing the conductive powder in isopropyl alcohol (IPA) by ultrasonication at 25 캜 for 3 minutes.
은 분말은 태양전지 전극 형성용 조성물 전체 중량 대비 60 중량% 내지 95 중량%로 포함될 수 있다. 상기 범위에서, 변환 효율의 향상 효과 및 페이스트화에 유리한 효과를 구현할 수 있다. 더욱 구체적으로, 은 분말은 태양전지 전극 형성용 조성물 전체 중량 대비 70 중량% 내지 90 중량%로 포함될 수 있다.
Silver powder may be contained in an amount of 60% by weight to 95% by weight based on the total weight of the composition for forming a solar cell electrode. Within the above range, it is possible to realize an effect of improving conversion efficiency and an effect of making paste. More specifically, the silver powder may be contained in an amount of 70% by weight to 90% by weight based on the total weight of the composition for forming a solar cell electrode.
(B) 유리프릿(B) glass frit
유리프릿(glass frit)은 태양전지 전극 형성용 조성물의 소성 공정 중 반사 방지막을 에칭(etching)함으로써, 에미터 영역에 은 결정 입자를 생성시켜 저항을 낮출 수 있다. 또한, 유리프릿(glass frit)은 전도성 분말과 웨이퍼 사이의 접착력을 향상시키고 소결 시에 연화하여 소성 온도를 더욱 낮추는 효과를 유도한다.The glass frit can lower the resistance by forming silver crystal grains in the emitter region by etching the antireflection film during the baking process of the composition for forming the solar cell electrode. In addition, glass frit improves the adhesion between the conductive powder and the wafer and softens at the time of sintering to induce an effect of further lowering the firing temperature.
태양전지의 면적을 증가시키면 태양전지의 접촉저항이 높아질 수 있다. 따라서, 태양전지의 면적 증가로 인한 PN접합(pn junction)에 대한 피해를 최소화하여야 하고, 동시에 직렬저항을 최소화시켜야 한다. 또한, 유릿프릿에는 넓은 범위의 소성 온도에서도 열안정성을 충분히 확보될 것이 요구된다. Increasing the area of the solar cell can increase the contact resistance of the solar cell. Therefore, the damage to the pn junction due to the increase of the area of the solar cell must be minimized, and the series resistance must be minimized. In addition, it is required that the vitreous frit be sufficiently secured in thermal stability even at a wide range of firing temperatures.
본 발명의 유리프릿은 은(Ag) 화합물; 텔루륨(Te) 산화물; 및 주기율표 1A족 원소를 포함하는 화합물을 포함하는 금속 전구체로부터로 형성된 것일 수 있다. The glass frit of the present invention is a silver (Ag) compound; Tellurium (Te) oxide; And a metal precursor comprising a compound comprising a Group 3A element of the Periodic Table of Elements.
이 때, 주기율표 1A족 원소를 포함하는 화합물은 리튬(Li) 화합물, 나트륨(Na) 화합물, 칼륨(K) 화합물 또는 이들의 혼합물일 수 있다.At this time, the compound containing the Group IA element in the periodic table may be a lithium (Li) compound, a sodium (Na) compound, a potassium (K) compound or a mixture thereof.
예를 들면, 일 실시예의 유리프릿은 은(Ag) 화합물; 텔루륨(Te) 산화물; 및 리튬(Li) 화합물, 나트륨(Na) 화합물, 칼륨(K) 화합물 또는 이들의 혼합물; 을 혼합한 금속 전구체를, 용융 및 분쇄하여 제조될 수 있다. 이를 통해, 일 실시예의 유리프릿은 은(Ag) 원소; 텔루륨(Te) 원소; 및 리튬(Li) 원소, 나트륨(Na) 원소 및 칼륨(K) 원소로 이루어진 군에서 선택된 하나 이상의 주기율표 1A족 원소;를 포함하게 된다. For example, the glass frit of one embodiment comprises a silver (Ag) compound; Tellurium (Te) oxide; And lithium (Li) compounds, sodium (Na) compounds, potassium (K) compounds, or mixtures thereof; And then melting and pulverizing the metal precursor. Thus, the glass frit of one embodiment includes a silver (Ag) element; Tellurium (Te) element; And at least one element of the periodic table 1A group selected from the group consisting of lithium (Li) element, sodium (Na) element and potassium (K) element.
상기 은(Ag) 화합물은 은(Ag) 이온으로 분해되는 온도가 1100℃ 이하일 수 있다. 상기 범위의 분해온도를 갖는 은 화합물을 사용하는 경우, 전극과 웨이퍼의 접촉성이 개선될 수 있다.The silver (Ag) compound may be decomposed into silver (Ag) ions at a temperature of 1100 ° C or less. When a silver compound having a decomposition temperature in the above range is used, contact between the electrode and the wafer can be improved.
구체적으로, 은 화합물은 이온결합 화합물로서 예를 들면, 시안화은(AgCN), 질산은(AgNO3), 할로겐화은(Ag-X), 탄산은(Ag2CO3), 초산은(AgC2H3O2), 황산은(Ag2SO4) 및 산화은(Ag2O) 등을 단독으로 또는 혼합하여 사용할 수 있다. 상기 할로겐화은(Ag-X)에서, X는 요오드, 플루오르, 염소 또는 브롬일 수 있다.Specifically, the silver compound is an ion-binding compound such as silver cyanide (AgCN), silver nitrate (AgNO 3 ), silver halide (Ag-X), silver carbonate (Ag 2 CO 3 ), silver acetate (AgC 2 H 3 O 2 ) , Silver sulfate (Ag 2 SO 4 ) and silver oxide (Ag 2 O) may be used singly or in combination. In the silver halide (Ag-X), X may be iodine, fluorine, chlorine or bromine.
상술한 은 화합물로부터 유래되어 유리프릿 내 존재하는 은 원소는, 은 결정-유리(glass)-웨이퍼(wafer) 순으로 형성된 전극의 계면에서 유리(glass)의 전도성을 조절할 수 있다. 또한, 상기 은 화합물로부터 유래된 은 원소는 유리프릿 상에 형성된 고립된 포어(pore) 또는 보이드(void)를 채우는 효과가 우수하다. 이러한 경우, 유리프릿은 웨이퍼와 전극의 접촉저항 및 직렬저항을 감소시킬 수 있다.The silver element present in the glass frit derived from the silver compound described above can control the conductivity of the glass at the interface of the electrode formed in the order of silver-glass-wafer. Further, the silver element derived from the silver compound is excellent in the effect of filling the isolated pore or void formed on the glass frit. In this case, the glass frit can reduce the contact resistance and series resistance between the wafer and the electrode.
본 발명의 유리프릿으로 제조된 태양전지 전극은 소성 후 유리프릿상에서도 은 결정이 더 석출될 수 있다. 이 때, 더 석출되는 상기 은 결정은 소성 후 도전성 분말에 의하여 형성되는 은 결정(Ag crystalline) 이외의 은 결정을 의미한다. 또한, 상술한 은 화합물로부터 유래된 유리프릿 내 존재하는 은 원소는 은 결정-유리(glass)-웨이퍼(wafer) 순으로 형성된 전극의 계면 사이에서 유리(glass)에 전도성을 부여해주고, 유리프릿 상에 형성된 고립된 포어(pore) 또는 보이드(void)를 채워줄 수 있다. 상기에서 전도성이 부여되는 유리(glass)는 은 결정과 웨이퍼 간의 인슐레이터(insulator)로 작용한다. 이러한 경우, 유리프릿 내에 존재하는 은 원소는 웨이퍼-은 전극의 접촉저항 및 직렬저항을 감소시킬 수 있다.The solar cell electrode made of the glass frit of the present invention can further precipitate silver crystals on the glass frit after firing. At this time, the silver crystals precipitated further mean silver crystals other than Ag crystalline formed by the conductive powder after firing. Further, the silver element present in the glass frit derived from the above-mentioned silver compound imparts conductivity to the glass between the interfaces of the electrodes formed in the order of silver-glass-wafer, Or an isolated pore or void formed in the substrate. In this case, the glass to which conductivity is imparted acts as an insulator between the silver crystal and the wafer. In this case, the silver element present in the glass frit can reduce the contact resistance and series resistance of the wafer-silver electrode.
상기 텔루륨 산화물은 예를 들면, 텔루륨 모노옥사이드, 텔루륨 디옥사이드, 텔루륨 트리옥사이드 등 일 수 있다.The tellurium oxide may be, for example, tellurium monoxide, tellurium dioxide, tellurium trioxide, and the like.
상기 리튬 화합물은 예를 들면, 리튬 탄산염일 수 있으나, 리튬의 시안화염, 질산염, 할로겐염, 초산염, 황산염, 리튬 산화물 등을 사용할 수도 있다.The lithium compound may be, for example, lithium carbonate, but lithium cyanide, nitrate, halogen salt, acetate, sulfate, lithium oxide, or the like may be used.
상기 나트륨 화합물은 예를 들면, 나트륨 탄산염일 수 있으나, 나트륨의 시안화염, 질산염, 할로겐염, 초산염, 황산염, 나트륨 산화물 등을 사용할 수도 있다.The sodium compound may be, for example, sodium carbonate, but a cyanide salt, a nitrate salt, a halogen salt, a nitrate salt, a sulfate salt, a sodium oxide or the like of sodium may be used.
상기 칼륨 화합물은 예를 들면, 칼륨 탄산염 일 수 있으나, 칼륨의 시안화염, 질산염, 할로겐염, 초산염, 황산염, 칼륨 산화물 등을 사용할 수도 있다.The potassium compound may be, for example, potassium carbonate, but a cyanide salt, a nitrate salt, a halogen salt, a nitrate salt, a sulfate salt, a potassium oxide, or the like of potassium may be used.
일 구체예에서, 상기 금속 전구체는 은 화합물 1 중량% 내지 45 중량%, 텔루륨 산화물 20 중량% 내지 75 중량% 및 주기율표 1A족 원소를 포함하는 화합물 1 중량% 내지 35 중량%를 포함할 수 있다.In one embodiment, the metal precursor may comprise from 1 wt% to 45 wt% of silver compounds, from 20 wt% to 75 wt% of tellurium oxide, and from 1 wt% to 35 wt% of a compound comprising Group 3A elements .
일 실시예의 유리프릿 내에 존재하는 은 원소: 텔루륨 원소(Ag : Te)의 몰비는, 1 : 0.1 내지 1 : 50, 예를 들면 1 : 0.5 내지 1 : 40 일 수 있다. Ag : Te의 몰비가 1 : 50을 초과하여 Te가 과량으로 포함되는 경우(Te의 몰비가 Ag의 50배 초과인 경우)에는 유리(glass) 내에 Ag의 함량이 상대적으로 적어 효과가 미미하다. 또한 Ag : Te의 몰비가 1 : 0.1을 초과하여 Ag가 과량으로 포함되는 경우(Te의 몰비가 Ag의 0.1배 미만인 경우)에는 유리 본연의 특성을 저하시킬 수 있다.The molar ratio of the silver element: tellurium element (Ag: Te) present in the glass frit of one embodiment may be from 1: 0.1 to 1:50, for example from 1: 0.5 to 1:40. When the molar ratio of Ag: Te exceeds 1: 50 and Te is contained in an excess amount (when the molar ratio of Te exceeds 50 times of Ag), the effect of Ag is small and the effect of Ag is small. When the molar ratio of Ag: Te is more than 1: 0.1 and Ag is contained in an excess amount (when the molar ratio of Te is less than 0.1 times of Ag), the inherent properties of glass may be deteriorated.
또한, 상기 유리프릿 내에 존재하는 은 원소: 리튬(Li) 원소, 나트륨(Na) 원소 또는 칼륨(K) 원소의 몰비(Ag:Li, Ag:Na 또는 Ag:K)는 1 : 0.01 내지 1 : 10 예를 들면 1 : 0.01 내지 1 : 5일 수 있다. Ag에 대한 Li, Na 또는 K의 몰비가 1 : 10을 초과하는 경우(Li, Na 또는 K의 몰비가 Ag의 10배 초과인 경우)에는 유리(glass) 내에 은(Ag)의 함량이 상대적으로 적어 효과가 미미하다. 뿐만 아니라, 리튬(Li), 나트륨(Na) 또는 칼륨(K)이 웨이퍼 안으로 침투하여 개방전압(Voc)을 저하시킬 수 있다. 또한, Ag 대 Li, Na 또는 K의 몰비가 1 : 0.01을 초과하여 은(Ag)이 과량으로 포함되는 경우(Li, Na 또는 K의 몰비가 Ag의 0.01배 미만인 경우)에는 유리의 절연 특성을 저하시킬 수 있다.The molar ratio (Ag: Li, Ag: Na or Ag: K) of the silver element, the lithium element, the sodium element or the potassium element present in the glass frit is 1: 0.01 to 1: 10, for example from 1: 0.01 to 1: 5. When the molar ratio of Li, Na or K to Ag is more than 1:10 (the molar ratio of Li, Na or K is more than 10 times of Ag), the content of silver (Ag) The effect is negligible. In addition, lithium (Li), sodium (Na), or potassium (K) may penetrate into the wafer and lower the open-circuit voltage (Voc). Further, when the molar ratio of Ag to Li, Na or K is more than 1: 0.01 and the amount of silver (Ag) is excessive (the molar ratio of Li, Na or K is less than 0.01 times of Ag) .
상기 유리 프릿은 납(Pb) 원소, 비스무스(Bi) 원소, 인(P) 원소, 게르마늄(Ge) 원소, 갈륨(Ga) 원소, 세륨(Ce) 원소, 철(Fe) 원소, 규소(Si) 원소, 아연(Zn) 원소, 텅스텐(W) 원소, 마그네슘(Mg) 원소, 세슘(Cs) 원소, 스트론튬(Sr) 원소, 몰리브덴(Mo) 원소, 티타늄(Ti) 원소, 주석(Sn) 원소, 인듐(In) 원소, 바나듐(V) 원소, 루테늄(Ru) 원소, 바륨(Ba) 원소, 니켈(Ni) 원소, 구리(Cu) 원소, 비소(As) 원소, 코발트(Co) 원소, 지르코늄(Zr) 원소, 망간(Mn) 원소, 네오디늄(Nd) 원소, 크롬(Cr) 원소, 안티몬(Sb) 원소 및 알루미늄(Al)의 원소로 이루어진 군에서 선택된 1종 이상의 제 2 금속 원소를 더 포함하고 있을 수 있다. 본 명세서에서, 상기 범위 중 어느 하나의 금속 원소는 전술한 은 원소, 텔루륨 원소, 주기율표 1A족 원소 등과 구분하기 위해, 제 2 금속 원소라 한다.The glass frit may be a glass frit containing at least one element selected from the group consisting of Pb, Bi, P, Ge, Ga, Ce, (Ti) element, a tin (Sn) element, a tin (W) element, a magnesium element, a cesium element, a strontium element, a molybdenum element, A metal element such as indium (In), vanadium (V), ruthenium, barium, nickel, copper, arsenic, cobalt, Further includes at least one second metal element selected from the group consisting of elements of Zr, Mn, neodymium, chromium, antimony, and aluminum . In this specification, any one of the above-mentioned metal elements is referred to as a second metal element in order to distinguish it from the above-mentioned silver element, tellurium element, periodic table 1A group element and the like.
이 때, 상기 유리 프릿은 전술한 은(Ag) 화합물; 텔루륨(Te) 산화물; 및 주기율표 1A족 원소; 에 추가적으로, 납(Pb) 산화물, 비스무스(Bi) 산화물, 인(P) 산화물, 게르마늄(Ge) 산화물, 갈륨(Ga) 산화물, 세륨(Ce) 산화물, 철(Fe) 산화물, 규소(Si) 산화물, 아연(Zn) 산화물, 텅스텐(W) 산화물, 마그네슘(Mg) 산화물, 세슘(Cs) 산화물, 스트론튬(Sr) 산화물, 몰리브덴(Mo) 산화물, 티타늄(Ti) 산화물, 주석(Sn) 산화물, 인듐(In) 산화물, 바나듐(V) 산화물, 루테늄(Ru) 산화물, 바륨(Ba) 산화물, 니켈(Ni) 산화물, 구리(Cu) 산화물, 비소(As) 산화물, 코발트(Co) 산화물, 지르코늄(Zr) 산화물, 망간(Mn) 산화물, 네오디늄(Nd) 산화물, 크롬(Cr) 산화물, 안티몬(Sb) 산화물 및 알루미늄(Al)의 산화물로 이루어진 군에서 선택된 1종 이상 의 제 2 금속 산화물을 더 포함하여 제조될 수 있다.At this time, the glass frit may contain the silver (Ag) compound described above; Tellurium (Te) oxide; And Periodic Table 1A Group Elements; (P) oxide, bismuth (Bi) oxide, phosphorus (P) oxide, germanium (Ge) oxide, gallium (Ga) oxide, cerium (Ce) oxide, iron (Fe) oxide, Zinc oxide, tungsten oxide, magnesium oxide, cesium oxide, strontium oxide, molybdenum oxide, titanium oxide, tin oxide, indium oxide, (Zr), zirconium (Zr), zirconium (Zr), zirconium (Zr), tin oxide Further comprises at least one second metal oxide selected from the group consisting of oxides, manganese (Mn) oxides, neodymium (Nd) oxides, chromium (Cr) oxides, antimony (Sb) oxides and aluminum .
금속 전구체는 제 2 금속 산화물을 예를 들면, 1 중량% 내지 40 중량%의 함량으로 더 포함할 수 있다.The metal precursor may further comprise, for example, from 1 wt% to 40 wt% of the second metal oxide.
일 구체예 상기 금속 전구체는 은 화합물 1 중량% 내지 30 중량%, 텔루륨 산화물 20 중량% 내지 70 중량%, 주기율표 1A족 원소를 포함하는 화합물 1 내지 20 중량% 및 산화비스무스 5 중량% 내지 40 중량%를 포함할 수 있다.In one embodiment, the metal precursor comprises 1 to 30% by weight of a silver compound, 20 to 70% by weight of tellurium oxide, 1 to 20% by weight of a compound containing a Group 1A element and 5 to 40% by weight of bismuth oxide %. ≪ / RTI >
다른 구체예 상기 금속 전구체는 은 화합물 1 내지 30 중량%, 텔루륨 산화물 20 내지 70 중량%, 주기율표 1A족 원소를 포함하는 화합물 1 내지 20 중량% 및 산화납 10 중량% 내지 40 중량%를 포함할 수 있다.Other Embodiments The metal precursor may comprise from 1 to 30% by weight of silver compounds, from 20 to 70% by weight of tellurium oxide, from 1 to 20% by weight of compounds containing Group 1A elements and from 10 to 40% .
또 다른 구체예 상기 금속 전구체는 은 화합물 1 내지 30 중량%, 텔루륨 산화물 20 내지 70 중량%, 주기율표 1A족 원소를 포함하는 화합물 1 내지 20 중량% 및 산화네오디뮴 1 중량% 내지 10 중량%를 포함할 수 있다.In another embodiment, the metal precursor comprises 1 to 30% by weight of silver compound, 20 to 70% by weight of tellurium oxide, 1 to 20% by weight of compound containing Group 1A element and 1 to 10% by weight of neodymium oxide can do.
상기 유리프릿은 유리프릿 전체 몰수 대비 은(Ag) 성분을 0.1 몰% 내지 65 몰%, 예를 들면 1 몰% 내지 50몰% 함유할 수 있다. 상기 범위 내에서, 전극의 전도성을 향상시키면서도, 유리프릿의 인슐레이터(insulator) 로서의 특성을 우수하게 유지할 수 있다. 구체예에서 유리프릿 전체 몰수 대비 은(Ag) 성분은 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50 몰%로 함유할 수 있다.The glass frit may contain from 0.1 mol% to 65 mol%, for example, from 1 mol% to 50 mol%, of the silver (Ag) component relative to the total molar amount of the glass frit. Within this range, it is possible to maintain excellent properties as an insulator of the glass frit, while improving the conductivity of the electrode. In the specific example, the silver (Ag) component of the total molar amount of the glass frit is 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50 mol%.
본 명세서에서, 유리프릿이 포함하는 각 금속성분의 함량은 유도결합플라즈마-원자방출분광법(ICP-OES; Inductively Coupled Plasma - Optical Emission Spectrometer)에 의하여 측정된다. 상기 유도결합플라즈마-원자방출분광법(ICP-OES)은 매우 적은 양의 시료를 사용하므로 시료 준비 시간을 단축할 수 있다. 또한, ICP-OES는 시료 전처리를 통해 오차를 줄일 수 있으며 분석 감도가 우수한 이점이 있다.In the present specification, the content of each metal component contained in the glass frit is measured by an inductively coupled plasma-atomic emission spectroscopy (ICP-OES: Inductively Coupled Plasma-Optical Emission Spectrometer). The inductively coupled plasma-atomic emission spectrometry (ICP-OES) uses a very small amount of sample, which can shorten sample preparation time. In addition, ICP-OES can reduce errors through sample preprocessing and has an advantage of excellent analytical sensitivity.
구체적으로, 상기 유도결합플라즈마-원자방출분광법(ICP-OES)은 시료를 전처리 하는 단계, 표준 용액을 준비하는 단계, 및 측정 대상 금속성분의 원소 농도를 측정 및 환산하여 유리프릿 내 존재하는 각 금속성분의 원소 함량을 산출하는 단계를 포함할 수 있다. 이러한 경우, 유리프릿 내 함유된 각 금속성분의 함량을 정밀하게 측정할 수 있다.Specifically, the ICP-OES (Inductively Coupled Plasma-Atomic Emission Spectroscopy) method comprises steps of: pre-treating a sample, preparing a standard solution, measuring and converting an element concentration of a metal component to be measured, And calculating the element content of the component. In this case, the content of each metal component contained in the glass frit can be precisely measured.
상기 시료를 전처리하는 단계는 시료인 유리프릿의 분석대상 금속성분을 용해할 수 있는 산성용액을 이용하여 시료를 적당량 용해하고 가열하여 시료를 탄화시킬 수 있다. 상기 산성용액은 예로서 황산(H2SO4) 용액 등을 사용할 수 있다.In the step of pretreating the sample, the sample may be carbonized by dissolving an appropriate amount of the sample using an acidic solution capable of dissolving the metal component to be analyzed of the glass frit as a sample and heating the mixture. As the acidic solution, for example, a sulfuric acid (H 2 SO 4 ) solution or the like may be used.
상기 탄화된 시료는 증류수, 과산화수소(H2O2) 등의 용매로 분석대상 금속성분의 분석농도 범위까지 적당히 희석할 수 있다. 상기 분석농도 범위는 적용되는 ICP-OES 기기의 원소 검출능력을 고려하여 10,000 배까지 희석된 상태로 사용할 수 있다.The carbonized sample can be appropriately diluted to a range of analytical concentration of the metal component to be analyzed with a solvent such as distilled water and hydrogen peroxide (H 2 O 2 ). The above analytical concentration range can be used diluted to 10,000 times in consideration of the element detection capability of the applied ICP-OES instrument.
상기 전처리된 시료는 ICP-OES 기기로 측정시 표준 용액, 예를 들면, 원소 측정용 분석대상 금속성분의 표준용액으로 교정(calibration)할 수 있다.The preprocessed sample can be calibrated with a standard solution, for example, a standard solution of a metal component to be analyzed for elemental measurement when measured with an ICP-OES instrument.
예로서, 상기 표준용액을 ICP-OES 측정기기에 도입하여 외부 표준법(external standard method)으로 검정곡선(calibration curve)을 작성한다. 이후, 상기 ICP-OES 측정기기로 전처리된 시료의 분석대상 금속성분의 원소 농도(ppm)를 측정한 후 환산하여 유리프릿 내 각 금속성분의 함량 및 몰비를 계산할 수 있다.As an example, the standard solution is introduced into an ICP-OES measuring instrument and a calibration curve is created by an external standard method. Then, the content (ppm) of the analyte metal component of the sample pretreated with the ICP-OES measuring instrument is measured and then converted to calculate the content and the molar ratio of each metal component in the glass frit.
본 발명의 유리프릿으로 제조된 태양전지 전극은 소성 후 도전성 분말에 의하여 형성되는 은 결정(Ag crystalline) 뿐만 아니라, 유리프릿 상에서도 은 결정이 석출될 수 있다. In the solar cell electrode made of the glass frit of the present invention, silver crystals can be precipitated not only on the Ag crystalline formed by the conductive powder after firing but also on the glass frit.
상기 유리프릿은 평균입경(D50)이 0.1㎛ 내지 10㎛인 것이 사용될 수 있다. 상기 유리프릿의 형상은 구형이어도 부정형상이어도 무방하다. 상기 범위 내에서, 전극의 전도성을 향상 효과 및 접촉저항 감소의 효과가 우수하다.The glass frit may have an average particle diameter (D50) of 0.1 占 퐉 to 10 占 퐉. The shape of the glass frit may be spherical or irregular. Within the above range, the effect of improving the conductivity of the electrode and the effect of reducing the contact resistance are excellent.
상기 유리프릿의 함량은 예를 들면, 태양전지 전극 형성용 조성물 전체 중량 대비 0.1 중량% 내지 20 중량% 또는 0.5 중량% 내지 10 중량%일 수 있다. 상기 범위 내에서, 넓은 범위의 면저항 조건에서도 PN접합 안정성을 확보할 수 있다. 또한, 상기 범위 내에서, 태양전지의 직렬저항 값을 최소화시킬 수 있으며, 태양전지의 효율을 개선할 수 있다. The content of the glass frit may be, for example, 0.1% by weight to 20% by weight or 0.5% by weight to 10% by weight based on the total weight of the composition for forming a solar cell electrode. Within the above range, the PN junction stability can be secured even under a wide range of sheet resistance conditions. Also, within the above range, the series resistance value of the solar cell can be minimized, and the efficiency of the solar cell can be improved.
상기 유리프릿은 통상의 방법을 사용하여 상기 제조될 수 있다. 예를 들면, 상기 은(Ag) 화합물; 텔루륨(Te) 산화물; 및 리튬(Li) 화합물, 나트륨(Na) 화합물, 칼륨(K) 화합물 또는 이들의 혼합물; 을 소정의 조성으로 혼합하여 금속 전구체를 제조한다. 혼합은 볼 밀(ball mill) 또는 플라네터리 밀(planetary mill)을 사용하여 혼합할 수 있다. 제조된 금속 전구체를 800℃ 내지 1300℃의 조건에서 용융시키고, 25℃에서 ?칭(quenching)한다. 얻은 결과물을 디스크 밀(disk mill), 플라네터리 밀 등에 의해 분쇄하여 유리프릿을 얻을 수 있다.
The glass frit can be prepared as described above using conventional methods. For example, the silver (Ag) compound; Tellurium (Te) oxide; And lithium (Li) compounds, sodium (Na) compounds, potassium (K) compounds, or mixtures thereof; Are mixed in a predetermined composition to prepare a metal precursor. The blend can be mixed using a ball mill or a planetary mill. The prepared metal precursor is melted at a temperature of 800 to 1300 占 폚 and quenched at 25 占 폚. The resulting product is pulverized by a disk mill, a planetary mill or the like to obtain a glass frit.
(C) 유기비히클(C) Organic vehicle
유기비히클은 태양전지 전극 형성용 조성물의 무기성분과 기계적으로 혼합되어, 조성물에 인쇄에 적합한 점도 및 유변학적 특성을 부여한다.The organic vehicle is mechanically mixed with the inorganic component of the composition for forming a solar cell electrode to give the composition suitable viscosity and rheological properties for printing.
상기 유기비히클은 통상적으로 태양전지 전극 형성용 조성물에 사용되는 유기비히클이 사용될 수 있다. 또한, 유기 비히클은 통상 바인더 수지와 용매 등을 포함할 수 있다.The organic vehicle may be an organic vehicle ordinarily used in a composition for forming a solar cell electrode. In addition, the organic vehicle may generally contain a binder resin, a solvent, and the like.
상기 바인더 수지로는 아크릴레이트계 또는 셀룰로오스계 수지 등을 사용할 수 있으며 에틸 셀룰로오스가 일반적으로 사용되는 수지이다. 그러나, 에틸 하이드록시에틸 셀룰로오스, 니트로 셀룰로오스, 에틸 셀룰로오스와 페놀 수지의 혼합물, 알키드 수지, 페놀계 수지, 아크릴산 에스테르계 수지, 크실렌계 수지, 폴리부텐계 수지, 폴리에스테르계 수지, 요소계 수지, 멜라민계 수지, 초산비닐계 수지, 목재 로진(rosin) 또는 알콜의 폴리메타크릴레이트 등을 사용할 수도 있다.As the binder resin, an acrylate-based or cellulose-based resin can be used, and ethylcellulose is generally used. However, it is preferable to use a mixture of ethylhydroxyethylcellulose, nitrocellulose, a mixture of ethylcellulose and phenol resin, an alkyd resin, a phenol resin, an acrylic ester resin, a xylene resin, a polybutene resin, a polyester resin, Based resin, a rosin of wood, or a polymethacrylate of alcohol may be used.
상기 용매로는 예를 들어, 헥산, 톨루엔, 에틸셀로솔브, 시클로헥사논, 부틸셀로솔브, 부틸 카비톨(디에틸렌 글리콜 모노부틸 에테르), 디부틸 카비톨(디에틸렌 글리콜 디부틸 에테르), 부틸 카비톨 아세테이트(디에틸렌 글리콜 모노부틸 에테르 아세테이트), 프로필렌 글리콜 모노메틸 에테르, 헥실렌 글리콜, 터핀올(Terpineol), 메틸에틸케톤, 벤질알콜, 감마부티로락톤 또는 에틸락테이트 등을 단독으로 사용하거나 또는 2종 이상 혼합하여 사용할 수 있다. Examples of the solvent include hexane, toluene, ethyl cellosolve, cyclohexanone, butyl cellosolve, butyl carbitol (diethylene glycol monobutyl ether), dibutyl carbitol (diethylene glycol dibutyl ether) , Butyl carbitol acetate (diethylene glycol monobutyl ether acetate), propylene glycol monomethyl ether, hexylene glycol, terpineol, methyl ethyl ketone, benzyl alcohol, gamma butyrolactone or ethyl lactate alone Or two or more of them may be used in combination.
상기 유기비히클은 태양전지 전극 형성용 조성물 전체 중량 대비 1 중량% 내지 30 중량%로 포함될 수 있다. 상기 범위에서 충분한 접착강도와 우수한 인쇄성을 확보할 수 있다.
The organic vehicle may be contained in an amount of 1 to 30% by weight based on the total weight of the composition for forming a solar cell electrode. Within this range, sufficient adhesive strength and excellent printability can be ensured.
(D) 첨가제(D) Additive
본 발명의 태양전지 전극 형성용 조성물은 필요에 따라 통상의 첨가제를 더 포함할 수 있다. 상기 첨가제는 분산제, 요변제, 가소제, 점도 안정화제, 소포제, 안료, 자외선 안정제, 산화방지제, 커플링제 등을 단독 또는 2종 이상 혼합하여 사용할 수 있다. 이러한 경우, 태양전지 전극 형성용 조성물에 추가의 유동 특성, 공정 특성 및 안정성을 향상시킬 수 있다. 첨가제는 태양전지 전극 형성용 조성물 전체 중량 대비 0.1 중량% 내지 5 중량%로 포함될 수 있지만 필요에 따라 함량을 변경할 수 있다.
The composition for forming a solar cell electrode of the present invention may further contain usual additives as required. The additive may be used alone or as a mixture of two or more of a dispersing agent, a thixotropic agent, a plasticizer, a viscosity stabilizer, a defoaming agent, a pigment, an ultraviolet stabilizer, an antioxidant and a coupling agent. In this case, it is possible to further improve the flow characteristics, process characteristics and stability of the composition for forming a solar cell electrode. The additive may be contained in an amount of 0.1% by weight to 5% by weight based on the total weight of the composition for forming a solar cell electrode, but the content may be changed if necessary.
태양전지 전극 및 이를 포함하는 태양전지Solar cell electrode and solar cell comprising same
본 발명의 다른 관점은 상기 태양전지 전극 형성용 조성물로부터 형성된 전극 및 이를 포함하는 태양전지에 관한 것이다. Another aspect of the present invention relates to an electrode formed from the composition for forming a solar cell electrode and a solar cell including the same.
도 1은 본 발명의 일 실시예에 따른 태양전지의 구조를 나타낸 것이다.1 shows a structure of a solar cell according to an embodiment of the present invention.
도 1을 참조하면, 웨이퍼(100) 또는 기판(100)은 p층(또는 n층)(101) 및 에미터로서의 n층(또는 p층)(102)을 포함한다. 상기 웨이퍼(100) 또는 기판(100) 상에, 전극 형성용 조성물을 인쇄하고 소성하여 후면 전극(210) 및 전면 전극(230)을 형성할 수 있다. Referring to Fig. 1, a
예를 들면, 전극 형성용 조성물을 웨이퍼의 후면에 인쇄 도포한 후, 대략 200℃ 내지 400℃ 온도로 대략 10초 내지 60초 정도 건조하여 후면 전극을 위한 사전 준비 단계를 수행할 수 있다. 또한, 웨이퍼의 전면에 전극 형성용 조성물을 인쇄한 후 건조하여 전면 전극을 위한 사전 준비단계를 수행할 수 있다. 이후에, 전극 형성용 조성물이 도포된 웨이퍼 또는 기판을 400℃ 내지 950℃, 또는 750℃ 내지 950℃에서 30초 내지 180초 소성하는 과정을 수행하여, 전면 전극 및 후면 전극을 형성할 수 있다.
For example, the electrode forming composition may be applied to the backside of the wafer by printing, followed by drying at a temperature of about 200 캜 to 400 캜 for about 10 seconds to about 60 seconds to perform a preliminary preparation step for the rear electrode. In addition, a preparation step for the front electrode can be performed by printing a composition for electrode formation on the entire surface of the wafer and then drying it. Thereafter, the front electrode and the rear electrode can be formed by baking the wafer or the substrate coated with the electrode forming composition at 400 ° C to 950 ° C or 750 ° C to 950 ° C for 30 seconds to 180 seconds.
이하, 실시예를 통하여 본 발명을 보다 구체적으로 설명하고자 하나, 이러한 실시예들은 단지 설명의 목적을 위한 것으로, 본 발명을 제한하는 것으로 해석되어서는 안 된다.
Hereinafter, the present invention will be described in more detail by way of examples, but these examples are for illustrative purposes only and should not be construed as limiting the present invention.
실시예 1 내지 50 및 비교예 1 내지 4Examples 1 to 50 and Comparative Examples 1 to 4
실시예 1Example 1
유기 바인더로서 에틸셀룰로오스 (Dow chemical company, STD4) 3.0 중량%를 용매인 부틸 카비톨 (Butyl Carbitol) 6.5 중량%에 60℃에서 충분히 용해한 후 평균입경이 2.0㎛인 구형의 은 분말(Dowa Hightech CO. LTD, AG-4-8) 86.90 중량%, 은 화합물로 탄산은(Ag2CO3, Acros社)을 사용하고 하기 표 1의 조성으로 제조된 유리프릿 3.1 중량%, 첨가제로서 분산제 BYK102(BYK-chemie) 0.2 중량% 및 요변제 Thixatrol ST (Elementis co.) 0.3 중량% 투입하여 골고루 믹싱 후 3롤 혼련기로 혼합 분산시켜 태양전지 전극 형성용 조성물을 준비하였다.
3.0 wt% of ethyl cellulose (STD4) as an organic binder was sufficiently dissolved in 6.5 wt% of butyl carbitol as a solvent at 60 캜, and spherical silver powder (Dowa High Tech CO. Ltd., AG-4-8), 3.1% by weight of glass frit prepared by using the silver carbonate (Ag 2 CO 3 , manufactured by Acros) as a silver compound and having the composition shown in the following Table 1, BYK 102 (BYK- chemie) and 0.3 wt% thixotropy ST (Elementis co.) were added, mixed and dispersed by a 3 roll kneader to prepare a composition for forming a solar cell electrode.
실시예 2 내지 9Examples 2 to 9
하기 표 1의 조성으로 제조된 유리프릿을 사용한 것을 제외하고는 실시예 1과 같은 방법으로 태양전지 전극 형성용 조성물을 준비하였다.
A composition for forming a solar cell electrode was prepared in the same manner as in Example 1, except that the glass frit prepared in the composition shown in the following Table 1 was used.
실시예 10 내지 15Examples 10 to 15
은 화합물로 요오드화은(AgI, Sigma-Aldrich)을 사용하고 하기 표 2의 조성으로 제조된 유리프릿을 사용한 것을 제외하고는 실시예 1과 같은 방법으로 태양전지 전극 형성용 조성물을 준비하였다.
A composition for forming a solar cell electrode was prepared in the same manner as in Example 1, except that silver iodide (AgI, Sigma-Aldrich) was used as a silver compound and glass frit prepared in the following Table 2 was used.
실시예 16 내지 24Examples 16 to 24
은 화합물로 질산은(AgNO3, Daejung社)을 사용하고 하기 표 3의 조성으로 제조된 유리프릿을 사용한 것을 제외하고는 실시예 1과 같은 방법으로 태양전지 전극 형성용 조성물을 준비하였다.
A composition for forming a solar cell electrode was prepared in the same manner as in Example 1, except that silver nitrate (AgNO 3 , Daejung Co.) was used as a silver compound and glass frit prepared in the following Table 3 was used.
실시예 25 내지 33Examples 25 to 33
은 화합물로 산화은(Ag2O, Acros社)을 사용하고 하기 표 4의 조성으로 제조된 유리프릿을 사용한 것을 제외하고는 실시예 1과 같은 방법으로 태양전지 전극 형성용 조성물을 준비하였다.
A composition for forming a solar cell electrode was prepared in the same manner as in Example 1, except that silver oxide (Ag 2 O, Acros) was used as the silver compound and glass frit prepared in the composition shown in the following Table 4 was used.
비교예 1 내지 2Comparative Examples 1 to 2
하기 표 5의 조성으로 제조된 유리프릿을 사용한 것을 제외하고는 실시예 1과 같은 방법으로 태양전지 전극 형성용 조성물을 준비하였다.
A composition for forming a solar cell electrode was prepared in the same manner as in Example 1, except that the glass frit prepared in the composition shown in the following Table 5 was used.
유도결합플라즈마-원자방출분광법(ICP-OES)을 이용한 유리프릿 내 Ag : Te, Ag : Li, Ag : Na 및 Ag : K의 몰비 측정Measurement of molar ratio of Ag: Te, Ag: Li, Ag: Na and Ag: K in glass frit using inductively coupled plasma-atomic emission spectrometry (ICP-OES)
시료의 전처리 : 분석대상 시료인 유리프릿 0.5g을 비커에 담고 0.0001g 단위까지 정확하게 칭량한다. 시료가 담겨진 비커에 황산(H2SO4) 5ml를 투입 후 열판(hot plate)를 이용하여 220℃에서 3시간 동안 가열하여 시료를 완전히 탄화시켰다. 탄화된 시료가 담겨진 비커가 투명하게 될 때까지 과산화수소(H2O2)를 투입하여 전처리를 완료하였다.Pretreatment of samples: 0.5 g of glass frit as a sample to be analyzed is weighed accurately into 0.0001 g unit. 5 ml of sulfuric acid (H 2 SO 4 ) was added to the beaker containing the sample and heated at 220 ° C. for 3 hours using a hot plate to fully carbonize the sample. Hydrogen peroxide (H 2 O 2 ) was added to complete the pretreatment until the beaker containing the carbonized sample became transparent.
표준용액의 준비 : 분석대상 금속성분의 표준용액을 각각 준비하였다.Preparation of Standard Solution: A standard solution of the metal component to be analyzed was prepared.
금속성분의 몰비 측정 : 전처리가 완료된 시료가 담겨진 비커에 질산(HNO3)을 투입하여 5분간 가열 후 공냉하였다. 준비된 표준용액을 ICP-OES 측정기기(PerkinElmer社)에 도입하여 외부 표준법(external standard method)으로 검정곡선(calibration curve)을 작성한 후 상기 ICP-OES 측정기기로 시료 내에 포함되는 금속성분 중 은(Ag), 텔루륨(Te), 리튬(Li), 나트륨(Na) 및 칼륨(K)의 원소 농도(ppm)를 각각 측정한 후 환산하여 유리프릿 내 Ag : Te 및 Ag : Li, Ag : Na, Ag : K의 몰비를 계산하였다. 결과값은 하기 표 6에 각각 나타내었다.Measurement of molar ratio of metal components: HNO 3 was added to the beaker containing the pretreated sample, and the mixture was heated for 5 minutes and then air-cooled. The prepared standard solution was introduced into an ICP-OES measuring instrument (PerkinElmer) and a calibration curve was prepared by an external standard method. Then, the ICP-OES measuring instrument was used to measure the concentration of silver (Ag (Ag): Te, Ag: Li, Ag: Na, and Na in the glass frit were measured after measuring the concentrations (ppm) of the elements of the tellurium (Ta), lithium (Li), sodium The mole ratio of Ag: K was calculated. The results are shown in Table 6 below.
각 금속성분의 함량(%) = 각 금속성분의 원소 농도(ppm)×Dilution Factor(DF)/10000The content of each metal component (%) = the element concentration of each metal component (ppm) x Dilution Factor (DF) / 10000
각 금속성분의 mole = 각 금속성분의 함량 / 각 금속성분의 분자량Mole of each metal component = content of each metal component / molecular weight of each metal component
각 금속성분의 mole % = 각 금속성분의 mole / 전체 금속성분의 mole 총합
Mole% of each metal component = mole of each metal component / mole sum of all metal components
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Yes
Fill Factor 및 Efficiency 측정방법How to measure Fill Factor and Efficiency
상기 실시예 및 비교예에 따른 태양전지 전극 형성용 조성물을 결정계 모노 웨이퍼(Wafer) 전면에 일정한 패턴으로 스크린 프린팅 하여 인쇄하고, 적외선 건조로를 사용하여 건조시켰다. 이후 Wafer의 후면에 알루미늄 페이스트를 후면 인쇄한 후 동일한 방법으로 건조하였다. 상기 과정으로 형성된 Cell을 벨트형 소성로를 사용하여 700℃ 내지 950℃ 사이로 30초에서 210초간 소성하였으며, 이렇게 제조 완료된 셀(Cell)은 태양전지효율 측정장비 (Pasan社, CT-801)를 사용하여 태양전지의 태양전지의 직렬저항(Rs), Fill Factor (FF, %) 및 변환효율(%)을 측정하여 하기 표 7과 8에 각각 나타내었다.
The composition for forming a solar cell electrode according to the above-described Examples and Comparative Examples was screen-printed on a crystal mono wafer in a predetermined pattern, and dried using an infrared drying furnace. Thereafter, aluminum paste was printed on the rear side of the wafer and then dried in the same manner. The cells thus formed were fired at 700 ° C. to 950 ° C. for 30 seconds to 210 seconds using a belt-type sintering furnace. The thus-prepared cells were measured using a solar cell efficiency measuring apparatus (Pasan, CT-801) The series resistance (Rs), fill factor (FF,%) and conversion efficiency (%) of the solar cells of the solar cell were measured and shown in Tables 7 and 8, respectively.
(Rs, mΩ)Series resistance
(Rs, m?)
(%)Conversion efficiency
(%)
(Rs, mΩ)Series resistance
(Rs, m?)
(%)Conversion efficiency
(%)
실시예 1 내지 33은 이온 분해온도가 1100℃ 이하인 은 화합물로부터 유래된 은 원소를 함유하고, Ag 대 Te의 몰비가 1 : 0.1 내지 1 : 50이며, Ag 에 대한 Li, Na 또는 K의 몰비가 1 : 0.01 내지 1 : 10 이다.Examples 1 to 33 each contain silver elements derived from a silver compound having an ion decomposition temperature of 1100 DEG C or lower, wherein the molar ratio of Ag to Te is 1: 0.1 to 1: 50, and the molar ratio of Li, Na or K to Ag is 1: 0.01 to 1:10.
상기 표 7과 표 8의 결과에서 확인할 수 있듯이, 실시예 1 내지 33의 유리프릿을 사용한 태양전지 전극 형성용 조성물로 제조된 전극은 비교예 1 및 2에 비하여 직렬저항 값이 낮고, 변환효율과 Fill Factor 값이 우수한 것을 확인할 수 있었다.
As can be seen from the results of Tables 7 and 8, the electrode made of the composition for forming a solar cell electrode using the glass frit of Examples 1 to 33 had a lower series resistance value than Comparative Examples 1 and 2, It was confirmed that the fill factor value was excellent.
본 발명의 단순한 변형 내지 변경은 이 분야의 통상의 지식을 가진 자에 의하여 용이하게 실시될 수 있으며, 이러한 변형이나 변경은 모두 본 발명의 영역에 포함되는 것으로 볼 수 있다.
It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (13)
상기 유리프릿은 은(Ag) 원소, 텔루륨(Te) 원소, 및 주기율표 1A족 원소를 포함하고,
상기 주기율표 1A족 원소는 리튬(Li), 나트륨(Na) 및 칼륨(K)으로 이루어진 군에서 선택된 하나 이상의 원소; 를 포함하며,
상기 유리프릿에 포함된 은 원소(Ag): 텔루륨 원소(Te)의 몰비는 1 : 0.1 내지 1 : 50이고,
상기 은 원소(Ag)에 대한 리튬(Li), 나트륨(Na) 또는 칼륨(K)의 몰비는 1 : 0.01 내지 1 : 10인 태양전지 전극 형성용 조성물.
Silver (Ag) powder, glass frit, and organic vehicle,
Wherein the glass frit comprises a silver (Ag) element, a tellurium (Te) element, and a periodic table 1A group element,
The Group 1A element of the periodic table includes at least one element selected from the group consisting of lithium (Li), sodium (Na), and potassium (K); / RTI >
The molar ratio of the silver element (Ag): tellurium element (Te) contained in the glass frit is 1: 0.1 to 1:50,
Wherein the molar ratio of lithium (Li), sodium (Na) or potassium (K) to the silver (Ag) is 1: 0.01 to 1:10.
The glass frit according to claim 1, wherein the glass frit includes at least one element selected from the group consisting of lead (Pb), bismuth, phosphorus (P), germanium, gallium, cerium, (Si) element, a zinc (Zn) element, a tungsten (W) element, a magnesium element, a cesium element, a strontium element, a molybdenum element, a titanium element, (Cu) element, an arsenic (As) element, a cobalt (Co) element, a cobalt (Co) element, a cobalt At least one second metal selected from the group consisting of a Co element, a Zr element, a Mn element, a Neod element, a Cr element, an Sb element and an Al element. Wherein the composition further comprises an element.
The composition for forming a solar cell electrode according to claim 1, wherein the glass frit contains 0.1 to 65 mol% of silver (Ag) element relative to the total molar amount of the glass frit.
The composition for forming a solar cell electrode according to claim 1, wherein the silver (Ag) element contained in the glass frit is formed from a silver compound having an ion decomposition temperature of 1100 캜 or lower.
The composition for forming a solar cell electrode according to claim 4, wherein the silver compound comprises at least one member selected from the group consisting of silver cyanide, silver nitrate, silver halide, silver carbonate, silver acetate, silver sulfate and silver oxide.
The method of claim 1, wherein the glass frit comprises a silver compound; Tellurium oxide; And a compound containing at least one element selected from the group consisting of lithium (Li), sodium (Na), and potassium (K).
7. The method of claim 6, wherein the metal precursor is selected from the group consisting of Pb, Bi, P, Ge, Ga, (Si) oxide, zinc (Zn) oxide, tungsten (W) oxide, magnesium oxide, cesium oxide, strontium oxide, molybdenum oxide, titanium oxide, A metal oxide such as tin (Sn) oxide, indium (In) oxide, vanadium (V) oxide, ruthenium (Ru) oxide, barium oxide, nickel oxide, copper oxide, At least one second metal selected from the group consisting of an oxide of Co, an oxide of zirconium (Zr), an oxide of manganese (Mn), an oxide of neodymium (Nd), an oxide of chromium (Cr), an oxide of antimony (Sb) Wherein the composition further comprises an oxide.
7. The method of claim 6, wherein the metal precursor comprises from 1 wt% to 45 wt% silver compound, from 20 wt% to 75 wt% tellurium oxide, and from 1 wt% to 35 wt% compound comprising Group 3A element A composition for forming a battery electrode.
The composition for forming a solar cell electrode according to claim 7, wherein the metal precursor comprises 1 wt% to 40 wt% of a second metal oxide.
상기 은 분말 60 중량% 내지 95 중량%;
상기 유리프릿 0.1 중량% 내지 20 중량%; 및
상기 유기비히클 1 중량% 내지 30 중량%를 포함하는 태양전지 전극 형성용 조성물.
The solar cell electrode composition according to claim 1,
60% to 95% by weight of the silver powder;
0.1% to 20% by weight of said glass frit; And
And 1 wt% to 30 wt% of the organic vehicle.
The composition for forming a solar cell electrode according to claim 1, wherein the glass frit has an average particle diameter (D50) of 0.1 to 10 mu m.
The solar cell electrode composition according to claim 1, wherein the composition for forming a solar cell electrode further comprises at least one additive of a dispersing agent, a thixotropic agent, a plasticizer, a viscosity stabilizer, a defoamer, a pigment, a UV stabilizer, / RTI >
A solar cell electrode made of the composition for forming a solar cell electrode according to any one of claims 1 to 12.
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