KR20150055463A - Multi treating type malodorous gas treatment apparatus for preventing white smoke and method for treating malodorous gas - Google Patents

Abstract

According to an embodiment of the present invention, a malodorous gas treatment apparatus comprises: a treatment container having an inlet and an outlet; and a first nozzle and a second nozzle sequentially installed on a moving passage of gas proceeding toward the outlet by being entered through the inlet, wherein the first nozzle jets an acidic fluid reacted with an N-based compound, and the second nozzle jets at least one from an alkaline fluid and an oxidizing fluid reacted with a S-based compound.

Description

TECHNICAL FIELD [0001] The present invention relates to a malodorous gas treatment apparatus and a malodorous gas treatment method,

The present invention relates to a malodor treatment apparatus and a malodor treatment method, and more particularly, to a malodor treatment apparatus and a malodor treatment method which remove a malodorous component contained in a gas through a chemical reaction.

The odor-inducing gas is a gas containing hydrogen sulfide (H ₂ S), mercaptans (R-SH), amines (R ₃ -N) and other irritants. In recent years, due to increasing industrial pollution and urbanization, pollution problems have become the most common complaints along with noise. Especially, refineries, chemical plants, sewage treatment plants, manure and animal wastewater treatment plants, landfill sites The odor generated around the place of the water is a serious problem.

Ammonia (NH ₃ ) is the most common odor-causing substance, and hydrogen sulfide (H ₂ S), which is an odorous odor of eggs, mercaptans (R-SH) They include amines (R ₃ -N).

A typical facility for removing odor-causing gases is a scrubber. In the case of the conventional scrubber, there is a problem that operating costs are increased because expensive chemicals are required to be replenished periodically due to rapid consumption of chemicals used to remove odorous components.

Conventional scrubbers use various chemicals in order to increase the treatment efficiency. These chemicals have a problem of causing air pollution by generating white smoke in the process.

In addition, the conventional scrubber has a problem that waste water containing chemical agents and odorous components necessarily generated in the process is discharged without a separate treatment process, thereby causing another kind of environmental pollution such as water pollution.

A problem to be solved by the present invention is to provide a malodor processing apparatus and a malodor processing apparatus with improved treatment efficiency of a malodor component contained in a gas.

The malodor processing apparatus of the present invention comprises a processing vessel having an inlet and an outlet; A first nozzle and a second nozzle which are sequentially disposed on a moving path of a gas flowing through the inlet and advancing toward the outlet, wherein the first nozzle injects an acidic solution reacting with the N-based compound, The second nozzle injects at least one of a basic solution and an oxidant solution that react with the S-based compound.

The method for treating odors of the present invention includes a first treating step of adding an acidic solution to be reacted with an N-based compound to a gas to be treated; And a secondary treatment step of adding at least one of a basic solution and an oxidant solution that reacts with the S-based compound to the primary treated gas.

The malodor processing apparatus and the malodor processing method of the present invention can prevent the generation of unnecessary acids and bases which are obstacles to the processing by sequentially adding the acidic solution and the basic solution to the gas to be treated, thereby improving the treatment efficiency and minimizing the amount of the chemical compound And reduce operating costs.

In addition, there is an effect that the generation of white smoke can be prevented in the process.

In addition, there is an effect that deodorization efficiency can be improved by treating the odor component contained in the gas in a multi-stage (multi-treatment system).

1 is a view showing a configuration of a malodor processing apparatus according to an embodiment of the present invention.
2 is a flowchart illustrating a malodor processing method according to an embodiment of the present invention.

BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention and the manner of achieving them will become apparent with reference to the embodiments described in detail below with reference to the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. To fully disclose the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims. Like reference numerals refer to like elements throughout the specification.

Hereinafter, embodiments will be described in detail with reference to the drawings.

1 is a view showing a configuration of a malodor processing apparatus according to an embodiment of the present invention.

Referring to FIG. 1, a malodor processing apparatus according to an embodiment of the present invention includes a processing vessel 1 having an inlet 160 and an outlet 620. The malodor processing apparatus may include a first nozzle 120 and a second nozzle 220 which are sequentially disposed on a moving path of the gas flowing through the inlet 160 and advancing toward the outlet 620. The first nozzle 120 injects an acidic solution reacting with the N-based compound, and the second nozzle 220 injects at least one of a basic solution and an oxidant solution which react with the S-based compound.

The gas introduced through the inlet 160 is a gas containing odor components generated from various facilities such as livestock complex, sewage, wastewater and manure treatment plant, industrial complex, waste treatment facility, and the like, for example, NH ₃ , It can include _{SH, NO 2, CN, OH} , CHO, COOH, CO or the like. Particularly, molecules having S and N are strongly odorous.

N-based compounds such as When classified by pollutant generation source, an amine (R ₃ -N), trimethylamine _{((CH 3) 3 N)} , dimethylamine _{((CH 3) 2 NH)} , ammonia flow (NH ₃₎ It may be generated in the fish, dalttong treatment and organic chemistry processes, hydrogen sulfide (H ₂ S), mercaptans (R-SH) and sulfide-dimethyl _{((CH 3) 2 S)} , disulfide-dimethyl (CH ₃ SSCH ₃₎ S-based compounds including S-based organic compounds can be generated in petroleum refining and organic chemical product processes.

The processing vessel 1 includes a first processing chamber 100 in which an inlet 160 is formed, a second processing chamber 200 and a third processing chamber 300 connected to the outlet 620. The processing vessel 1 may be provided with a first mixing blocking part 410 between the first processing chamber 100 and the second processing chamber 200 and may be provided between the second processing chamber 200 and the third processing chamber 300, The second mixing blocking portion 510 may be provided between the first mixing blocking portion 510 and the second mixing blocking portion 510.

A first gas-liquid separation portion 170 may be provided between the first mixing blocking portion 410 and the first nozzle 120 and a second gas-liquid separation portion 360 may be provided at the front end of the discharge port 620 .

The first treatment chamber 100 injects the acidic solution to remove the basic N-based compound from the gas introduced through the inlet 160. Ammonia (NH ₃ ), trimethylamine (2 (CH ₃ ) ₃ N) and the like can be removed by neutralization reaction with an acidic sulfuric acid (H ₂ SO ₄ ) .

The first treatment chamber 100 is provided with a first nozzle 120 for spraying the acid solution and a first filter unit 130 formed on the lower side of the first nozzle 120. The acidic solution injected from the first nozzle 120 is absorbed by the first filter unit 130 and stays there, thereby increasing the frequency of contact between the acidic solution and the gas, thereby improving the treatment efficiency.

The acid solution may be stored in the first storage unit 110 and the acid solution may be supplied from the first storage unit 110 to the first nozzle 120 through the first supply pipe 150. A pump 140 for feeding the acidic solution along the first supply pipe 150 may be provided. A first valve 151 for interrupting the first supply pipe 150 may be further provided.

A first storage unit 110 may receive a sulfuric acid solution _{(H 2 SO 4 (aq)} ). H ₂ SO ₄ and water are supplied from the outside to the first storage unit 110 and then H ₂ SO ₄ is dissolved in the water in the first storage unit 110 so that the sulfuric acid solution H ₂ SO ₄ (aq) Can be produced.

The first nozzle 120 injects the acidic solution supplied from the first supply pipe 150 downward. A first filter unit 130 may be disposed below the first nozzle 120 and a first gas-liquid separation unit 170 may be disposed above the first nozzle 120.

A plurality of first nozzles 120 may be provided. Although five nozzles are shown in the present embodiment, the present invention is not limited thereto. Each nozzle can spray approximately 50 to 60 mL of acid solution per minute, and the water spray range can reach 120 degrees.

The first nozzle 120 may be formed of Teflon (Polytetrafluoroethylene). Teflon has excellent acid resistance, chemical resistance and heat resistance, which is advantageous for maintenance.

The first filter unit 130 may have a porous structure. Such a porous structure has a high water content while passing through the gas, so that a smooth reaction between the gas and the acidic solution is induced. The first filter unit 130 may be formed of a network material, or a plurality of fiber materials may be laminated.

The reaction between the basic N-based material in the gas moving upward and the acidic solution injected from the first nozzle 120 is actively performed. The reaction at this time is mainly a neutralization reaction between the basic gas and the acidic solution.

The efficiency of the oxidation and neutralization reaction by the gas-liquid reaction is closely related to the contact time and contact frequency between the reaction liquid and the gas. In order to improve the contact frequency, it is preferable to put a large amount of filler into a predetermined reactor so that the gas contacts the reactive agent while passing through the filler layer.

 The first filter unit 130 may include a plurality of spheres. The plurality of spheres may be fixed within a given frame or alternatively may flow in the frame by an inflow gas.

The spheres constituting the first filter unit 130 can be easily moved by the pressure of the gas and a glass ball having a very small size can be used so that the specific surface area can be kept as wide as possible. The larger the specific surface area of the sphere (the area occupied by the sphere per volume), the more the collection efficiency is improved and the gas-liquid reaction can be smoothly performed. In addition, the larger the specific surface area, the lower the installation height of the spheres, the smaller the size of the processing vessel, and the larger the porosity, the lower the pressure loss.

On the other hand, the particulate contaminants contained in the gas passing through the first filter unit 130 can be removed by being adsorbed by the droplets, the liquid film, or the bubbly acidic solution injected from the first nozzle 120.

According to an embodiment, the first filter unit 130 may include a multi-filter. That is, the first filter unit 130 may include a plurality of filter layers.

The first filter unit 130 is wetted with the reaction liquid sprayed from the upper part of the first filter unit 130, and the gas is passed through the first filter unit 130, A bubbling is generated, and a more smooth gas-liquid reaction can be induced by the phenomenon of bubbling.

The first gas-liquid separator 170 is disposed between the first process chamber 100 and the second process chamber 200. The first gas-liquid separator 170 is located above the first process chamber 100 and reacts with the acidic solution, . The gas passing through the first processing chamber 100 reacts with the basic solution while passing through the second processing chamber 200. If the acidic solution contained in the gas is not removed, the reaction efficiency in the second processing chamber 200 is lowered . The first gas-liquid separator 170 passes through the first processing chamber 100 and absorbs the acidic solution contained in the processed gas in the form of fine particles such as droplets. Therefore, the acidity of the gas supplied to the second processing chamber 200 Lower.

The first gas-liquid separator 170 may be formed to a thickness of about 200 mm according to an embodiment of the present invention and may be made of polypropylene (PP).

The second treatment chamber 200 removes an acidic S-containing compound, organic acid, or organic sulfur compound contained in the gas by adding a basic solution and an oxidizing agent solution to the gas. Here, the S-based compound stinking, hydrogen sulfide (H ₂ S), sulfide, dimethyl _{((CH 3) 2 S)} , disulfide-dimethyl _{((CH 3) 2 S 2} ) , such as sodium hydroxide (NaOH) solution exhibiting basicity Or by neutralization and oxidation-reduction reaction with sodium hypochlorite (NaClO) used as an oxidizing agent. As sodium hypochlorite is reduced, organic sulfur compounds can be oxidized.

 The second processing chamber 200 formed on the upper portion of the first processing chamber 100 may have a second nozzle 220 and a second filter 230 disposed below the second nozzle 220.

The second nozzle 220 may be installed repeatedly along the flow path of the gas. Hereinafter, the second nozzle 220 includes a second -2 nozzle 222 for reprocessing the gas treated by the reaction liquid injected from the second -1 nozzle 221 and the second -2 nozzle 221 However, the scope of the present invention is not necessarily limited thereto.

In the second-1 nozzle 221, an acidic gas can be removed, and in the second -2 nozzle 222, neutral organic sulfur compounds can be removed. A second-1 supply pipe 251 and a second -2 supply pipe 252 for supplying the reaction liquid from the second storage unit 210 to the respective nozzles 221 and 222 and supply pipes 251 and 252 respectively And at least one valve (253, 254) for interrupting the supply pipes may be further provided.

The second storage unit 210 may contain a mixture of sodium hypochlorite (NaClO) solution, which is an oxidizing agent solution, and sodium hydroxide (NaOH), which is a basic solution. Meanwhile, the second storage unit 210 is provided independently of the first storage unit 110 so that the sulfuric acid solution (H ₂ SO ₄ ) and the sodium hypochlorite (NaClO) solution do not mix with each other.

 The second-1 nozzle 221 is disposed below the second treatment chamber 200 and injects the basic solution and the oxidant solution supplied through the second-1 supply pipe 251. The reaction between the S-based compound contained in the gas and the basic solution is performed.

And the second-1 filter unit 231 may be disposed on the lower side of the (2-1) nozzle 221. In the second-1 filter unit 231, the reaction between the sulfur dioxide (H ₂ S) in the gas moving upward and the basic solution injected downward from the second-1 nozzle 221 is performed. That is, the second-1 filter unit 231 increases the reaction efficiency between the acidic gas and the basic solution by the neutralization reaction.

The second -2nd nozzle 222 is disposed in the upper part of the second treatment chamber 200 and injects the basic solution and the oxidant solution supplied through the second -2 supply pipe 252 downward to neutralize the dimethyl sulfide (CH ₃ ) ₂ S), and dimethyl disulfide (CH ₃ SSCH ₃ ).

And the second -2 filter unit 232 may be disposed below the second -2 nozzle 222. [ The _{second -2} filter portion 232 assists the sulfur dioxide (H ₂ S) in the upwardly moving gas to react with the oxidant solution injected downward from the _{second -2} nozzle 222. That is, the second-1 filter unit 231 increases the reaction efficiency of the gas and the oxidant solution by the oxidation-reduction reaction.

The first mixing blocking part 410 may be formed on the first gas-liquid separating part 170 to separate the first processing chamber 100 and the second processing chamber 200 from each other. The first mixing blocking part 410 serves to separate the processing chambers of the respective stages from each other so as not to be influenced by each other. That is, it is possible to prevent the different reaction liquids from mixing with each other to lower the efficiency of the reaction treatment. The first mixing shutoff unit 410 includes a partition 411 that separates the first process chamber 100 and the second process chamber 200 from each other and a plurality of stacks 412 formed on the partition 411 to allow the gas to pass therethrough. And a stack cover 413 disposed at a predetermined distance from the stack 412 so that the gas can flow through the stack 412. The reaction liquid sprayed from the second nozzle 220 does not flow into the stack 412 but fits on the stack cover 413 and is scattered and collected on the partition wall 411. The mixing of the reaction liquid can be completely blocked between the first treatment chamber 100 and the second treatment chamber 200 by the first mixing blocking portion 410 and the pressure of the reaction mixture by the first mixing blocking portion 410 The loss is on the order of 6 to 10 mm H ₂ O.

The second mixing blocking part 510 may include a partition wall 511, a stack 512 and a stack cover 513 in the same manner as the first mixing blocking part 410.

The first and second mixing blocking portions 410 and 510 may be connected to the first and second discharge pipes 420 and 520, respectively. In this case, the reaction liquid sprayed into the treatment chamber and the precipitate generated by the reaction of the reaction liquid are discharged through the first and second discharge pipes 420 and 520, and the first and second discharge ports 420 and 520 1 and second discharge valves 421 and 521. [ .

The filter units 130, 230, and 330 may be formed of the same material as the gas-liquid separators 170 and 360, but may have a larger contact area and an improved porosity than the mixing blocking units 410 and 510.

The second gas-liquid separation unit 360 removes the moisture contained in the gas that has passed through the third treatment chamber 300. The second gas-liquid separator 360 finally removes fine particles or moisture before the processed gas is discharged through the discharge port 620.

The second gas-liquid separator 360 is similar in structure and function to the first gas-liquid separator 170, but may have different materials and thicknesses depending on the installation position. The thickness of the second gas-liquid separation portion 360 may be 50 mm and may be formed of polypropylene and polyvinylidene difluoride (PVDF).

The third treatment chamber 300 is disposed on the upper portion of the second treatment chamber 200 and is connected to the discharge port 620. A third nozzle 320 for spraying water may be provided in the third treatment chamber 300. The third filter unit 330 may be disposed under the third nozzle 320.

Water may be stored in the third storage unit 310 and water may be supplied from the third storage unit 310 to the third nozzle 320 through the third supply pipe 350. The third nozzle 320 injects the water supplied from the third supply pipe 350 downward. A third pump 340 for feeding water from the third storage part 310 along the third supply pipe 350 may be provided. The third supply pipe may further include a valve 351 for interrupting the third supply pipe.

A third chamber 300 in the ClO that may lead to a strong ^{oxidation-ionic,} soluble in water. The thus dissolved in water ClO ^- ions is again supplied to the second storage unit 210, thereby it is possible to re-use. The second exhaust pipe 520 may be connected to the second storage unit 210 or the third storage unit 310 for reuse of ClO ^- ions.

A third filter unit 330 is disposed below the third nozzle 320 and a second gas-liquid separation unit 360 is disposed above the third nozzle 320 to remove the aqueous solution from the gas from which the malodorous component has been removed It is possible to prevent the occurrence of white smoke.

On the other hand, the ClO < ^- > -dissolved water can be transferred to the third storage part 310 again through the third supply pipe 350 and reused. ClO ^- ions can be re-injected into the second storage part 210, so that odorous components can be efficiently removed from the gas without continuously supplying the chemical.

In addition, a second gas-liquid separator 360 may be disposed in the third treatment chamber 300 between the second gas-liquid separator 360 and the discharge port 620 to prevent the generation of white smoke by removing the aqueous solution from the gas from which the odor component is removed.

Next, the malodor processing method according to the embodiment of the present invention will be described in detail.

The method of treating odors according to an embodiment of the present invention includes a first treatment step (S1) of adding an acidic solution to be reacted with an N-based compound to a gas to be treated, a basic solution (S) And a secondary treatment step (S2) of applying at least one of the solutions. Here, in the secondary treatment step (S2), an NaClO solution can be applied. Further, the odor treatment method is the third processing step (S3), NaClO solution and the water are reacted to generate ClO to react with water to a secondary treatment ^gas-water recovering the ion (S4), and H ₂ SO ₄ To prepare the acidic solution, and dissolving at least one of the NaOH and NaClO solution in water to prepare the basic solution and the oxidizing agent solution.

The recovered ClO <"> ^- ions can be used to prepare the required NaClO 4 solution in the second treatment step (S2).

The gas to be treated moves into the processing vessel 1 through the inlet 160. The gas sequentially passes through the first treatment chamber 100, the second treatment chamber 200, and the third treatment chamber 300. In this process, the acidic substance, the basic substance, the organic compound, and the like, which generate odors contained in the gas are removed, and the purified gas is discharged to the outside of the processing vessel 1 through the discharge port 620.

According to the malodor processing apparatus according to the present invention, the gas enters the first processing chamber 100 through the inlet 160. In the first treatment chamber 100, the volatile N-based compound having basicity can be removed. When the sulfuric acid solution (H ₂ SO ₄ ) is injected through the first nozzle 120, ammonia (NH ₃ ) and trimethylamine (TMA, ( CH ₃ ) ₃ N) is removed by the following reaction formula (1).

<Reaction Scheme 1>

2 NH ₃ + H ₂ SO ₄ → (NH ₄ ) ₂ SO ₄

_{2 (CH 3) 3 N +} H 2 SO 4 → ((CH 3) 3 NH) 2 SO 4

The basic N-type compound can neutralize with an acidic solution to produce a neutral salt. Trimethylamine (TMA, (CH ₃ ) ₃ N), an organic nitrogen compound, is neutralized with a sulfuric acid (H ₂ SO ₄ ) solution in the same manner as ammonia to form a salt.

<Reaction Scheme 2>

NH ₃ + H ₂ O → NH ₄ OH

After the removal of the basic gas in the first treatment chamber 100, it is preferable that the acidic solution capable of inhibiting the next chemical reaction is removed by the first gas-liquid separation unit 170. The gas from which the acid solution has been removed passes through the stack 412 and moves to the second processing chamber 200.

In the second treatment chamber 200 according to an embodiment of the present invention, at least one of a basic solution and an oxidizer solution is used to remove an acidic gas and a neutral organic sulfur compound. Here, the sodium hydroxide (NaOH) solution and the sodium hypochlorite (NaClO) solution, which are basic solutions, are transferred to the second nozzle 220 by the second-and first-second supply pipes 251 and 252 and are sprayed downward. Referring to Reaction Scheme 3, the sodium hydroxide (NaOH) solution in the second filter portion 230 removes hydrogen sulfide (H ₂ S) gas which is acidic. Hydrogen sulfide gas can also be removed by oxidation-reduction reaction with sodium hypochlorite. Neutral organic sulfur compounds such as dimethyl sulfide ((CH ₃ ) ₂ S), dimethyl disulfide ((CH ₃ ) SS (CH ₃ )) and methyl mercaptan ((CH ₃ ) SH) Can be removed by a reduction reaction. The sulfur atoms in organic sulfur compound structures such as dimethyl sulfide ((CH ₃ ) ₂ S), dimethyl disulfide ((CH ₃ ) SS (CH ₃ )) and methyl mercaptan ((CH ₃ ) SH) have unshared electron pairs , Can be oxidized on its own, drawing electrons by drawing oxygen atoms of sodium hypochlorite (NaClO). After the reaction, hypochlorite ion (ClO &lt; &quot;&gt;), which causes a strong oxidation reaction, is decomposed to produce a neutral salt, so that the pH can be prevented from decreasing due to hypochlorous acid (HClO). Since the pH is not reduced, the treatment efficiency according to the reaction promotion is improved.

<Reaction Scheme 3>

H ₂ S + ₂ NaOH → Na ₂ S + 2H ₂ O

Na ₂ S + ₂ NaClO - &gt; Na ₂ SO ₂ + 2 NaCl

_{Na 2 SO 2 + 2NaClO → Na} 2 SO 4 + 2NaCl

H ₂ S + ₂ NaOH + ₄ NaClO - &gt; Na ₂ SO ₄ + ₄ NaCl + 2H ₂ O

(CH ₃ ) ₂ S + NaClO → (CH ₃ ) ₂ SO + NaCl

_{(CH 3) SS (CH 3} ) + 2NaClO → (CH 3) 2 S 2 O 2 + 2NaCl

_{2 (CH 3) SH + 3NaClO} → (CH 3) 2 S 2 O 2 + 3NaCl + H 2 O

In the first and second treatment chambers 100 and 200, the gas purified through the removal process of the basic, acidic gas, and neutral organic compound gas passes through the third treatment chamber 300. A third chamber 300 in the ClO that may lead to a strong ^{oxidation-ionic,} soluble in water. The thus dissolved in water ClO ^- ions is again supplied to the second storage unit 210, thereby it is possible to re-use. ClO ^- ions are strongly oxidizing substances, which are emitted together with the gas and may adversely affect the external environment. Also, by reusing the ClO ^- ions, the amount of the introduced solution can be reduced.

The ClO ^- ion-depleted gas passes through the second gas-liquid separator 360, the basic solution is removed, and can be discharged to the outside through the outlet 620.

As described above, it is also possible to prevent the occurrence of white smoke by sequentially treating the N-series and S-series gases. Referring to Equation 1 and Scheme 4, ammonia, which is a kind of N-based compound, reacts with water to produce ammonia water (NH ₄ OH). Ammonia water can react with sodium hypochlorite (NaClO) solution to generate white smoke. However, since ammonia is actively removed by sulfuric acid in the first treatment step (S1), the production of ammonia water is suppressed as much as that, and thus, the occurrence of white smoke is suppressed in the secondary treatment step (S2).

<Reaction Scheme 4>

NH ₄ OH + NaClO - &gt; NaOH + NH ₂ Cl + H ₂ O

NH ₄ OH + NaClO → NaOH + NH ₄ Cl + O ion

As in the embodiment of the present invention, when the N-based material is removed before the S-based material, the occurrence of white smoke such as NH ₂ Cl and NH ₄ Cl can be prevented.

On the other hand, as described above, the following problems arise when the basic treatment is first performed by adding basic solutions NaOH and NaClO to the gas to be treated, and secondary treatment is performed by adding H ₂ SO ₄ as an acidic solution.

Cheotjae, for the N-based compound contained in gas to be treated, for example, sikineunde ammonia (NH3) is first reacted with NaClO (aq) produced a white smoke of NH ₄ Cl, NH ₄ Cl was soon as the leading cause environmental pollution At the same time, it is known to be difficult to remove.

Second, the pH of the reaction system has a close relationship with the treatment efficiency. The pH in the first treatment process should be controlled by ammonia (NH3) or NaClO (aq) added for the treatment, but ammonia NH ₃ ) reacts with water has a problem that NH ₄ OH acts as an imaginary alkali which raises the pH of the reaction system and causes difficulty in pH control.

Third, Cl ^- generated in the first treatment process is also present in the second treatment process and affects the treatment efficiency. That is, the pH of the reaction system in the secondary treatment process should be controlled by the H ₂ SO _{4 added} for the treatment, but the HCl produced by the reaction of Cl ^- There is a problem that it acts as an imaginary acid which lowers the pH of the reaction system in the treatment process, thereby causing difficulties in pH control.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, but, on the contrary, It should be understood that various modifications may be made by those skilled in the art without departing from the spirit and scope of the invention.

Claims (11)

A processing vessel having an inlet and an outlet; And
And a first nozzle and a second nozzle which are sequentially disposed on a moving path of the gas introduced through the inlet and advancing toward the outlet,
The first nozzle injects an acidic solution reacting with the N-based compound,
And the second nozzle injects at least one of a basic solution and an oxidant solution that react with the S-based compound. The method according to claim 1,
And a third nozzle for spraying water onto the gas treated by the solution sprayed from the second nozzle. The method according to claim 1,
Further comprising a filter unit having a porous structure, which is exposed to an injection port of at least one of the first nozzle and the second nozzle. The method according to claim 1,
Wherein the acidic solution comprises a H ₂ SO ₄ solution. The method according to claim 1,
Wherein the basic solution comprises a NaOH solution. The method according to claim 1,
Wherein the oxidant solution comprises a NaClO solution. A primary treatment step of adding an acidic solution which reacts with the N-based compound to the gas to be treated; And
And a secondary treatment step of adding at least one of a basic solution and an oxidant solution which react with the S-based compound to the primary treated gas. 8. The method of claim 7,
And a tertiary treatment step of causing the secondary treated gas to react with water. 8. The method of claim 7,
Wherein said secondary treatment step comprises adding NaClO solution. 10. The method of claim 9,
And recovering the ClO &lt; &quot;&gt; ^- ions generated by the reaction of the NaClO solution and water. 8. The method of claim 7,
Further comprising the step of dissolving H ₂ SO ₄ in water to prepare said acidic solution and dissolving at least one of NaOH and NaClO solution in water to prepare said basic solution and oxidant solution.

Images