KR20150026993A - method of treating tap water and manufacturing advanced oxidizing treated water using chlorine and UV-ray - Google Patents
method of treating tap water and manufacturing advanced oxidizing treated water using chlorine and UV-ray Download PDFInfo
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- KR20150026993A KR20150026993A KR20140115447A KR20140115447A KR20150026993A KR 20150026993 A KR20150026993 A KR 20150026993A KR 20140115447 A KR20140115447 A KR 20140115447A KR 20140115447 A KR20140115447 A KR 20140115447A KR 20150026993 A KR20150026993 A KR 20150026993A
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- tap water
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- 239000000460 chlorine Substances 0.000 title claims abstract description 88
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 title claims abstract description 86
- 229910052801 chlorine Inorganic materials 0.000 title claims abstract description 81
- 239000008399 tap water Substances 0.000 title claims abstract description 78
- 235000020679 tap water Nutrition 0.000 title claims abstract description 78
- 238000000034 method Methods 0.000 title claims abstract description 64
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 62
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 230000001590 oxidative effect Effects 0.000 title description 3
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 claims description 25
- HEFNNWSXXWATRW-UHFFFAOYSA-N Ibuprofen Chemical compound CC(C)CC1=CC=C(C(C)C(O)=O)C=C1 HEFNNWSXXWATRW-UHFFFAOYSA-N 0.000 claims description 18
- 229960001680 ibuprofen Drugs 0.000 claims description 18
- TUJKJAMUKRIRHC-UHFFFAOYSA-N hydroxyl Chemical compound [OH] TUJKJAMUKRIRHC-UHFFFAOYSA-N 0.000 claims description 15
- 239000003344 environmental pollutant Substances 0.000 claims description 11
- 231100000719 pollutant Toxicity 0.000 claims description 11
- 229960005404 sulfamethoxazole Drugs 0.000 claims description 11
- JLKIGFTWXXRPMT-UHFFFAOYSA-N sulphamethoxazole Chemical compound O1C(C)=CC(NS(=O)(=O)C=2C=CC(N)=CC=2)=N1 JLKIGFTWXXRPMT-UHFFFAOYSA-N 0.000 claims description 11
- 239000000356 contaminant Substances 0.000 claims description 10
- 244000005700 microbiome Species 0.000 claims description 8
- 230000001954 sterilising effect Effects 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 6
- 239000011368 organic material Substances 0.000 claims description 5
- 230000008033 biological extinction Effects 0.000 claims description 4
- 238000009303 advanced oxidation process reaction Methods 0.000 abstract description 2
- -1 first Substances 0.000 description 16
- 230000003647 oxidation Effects 0.000 description 13
- 238000007254 oxidation reaction Methods 0.000 description 13
- 239000007800 oxidant agent Substances 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 9
- MYSWGUAQZAJSOK-UHFFFAOYSA-N ciprofloxacin Chemical compound C12=CC(N3CCNCC3)=C(F)C=C2C(=O)C(C(=O)O)=CN1C1CC1 MYSWGUAQZAJSOK-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000004659 sterilization and disinfection Methods 0.000 description 6
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Inorganic materials Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 5
- 238000000746 purification Methods 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 4
- 229960003405 ciprofloxacin Drugs 0.000 description 4
- 238000001782 photodegradation Methods 0.000 description 4
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000033558 biomineral tissue development Effects 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000007539 photo-oxidation reaction Methods 0.000 description 2
- 238000006303 photolysis reaction Methods 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 241000195493 Cryptophyta Species 0.000 description 1
- 241000223935 Cryptosporidium Species 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000006056 electrooxidation reaction Methods 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229940088597 hormone Drugs 0.000 description 1
- 239000005556 hormone Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000004060 metabolic process Effects 0.000 description 1
- 230000000813 microbial effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 239000006228 supernatant Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/58—Treatment of water, waste water, or sewage by removing specified dissolved compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3222—Units using UV-light emitting diodes [LED]
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/18—Removal of treatment agents after treatment
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- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Water Treatments (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
Abstract
Description
Disclosure of the Invention The present disclosure relates to a treatment method using chlorine and ultraviolet rays, and more particularly, to a method for treating tap water using chlorine and ultraviolet rays and a method for producing highly oxidized water.
Advance Oxidation Process (AOP) is a water treatment technology that oxidizes and decomposes contaminants in water by generating hydroxide radicals (OH?), Which have stronger oxidizing power than oxidants used in ordinary oxidation processes, as intermediates. . Such a high-level oxidation process has been proposed in order to overcome the disadvantage that most of oxidizing agents in general are not easy to decompose organic substances due to slow reaction with organic substances. The above-mentioned organic substances are converted into carbon dioxide (CO2) or water H20) in the final form of the mineralization (Mineralization) is intended. As a method for forming a hydroxyl radical in a conventional high oxidation process, for example, a method of irradiating ultraviolet rays to hydrogen peroxide, ozone, titanium oxide, a photocatalytic decomposition method, an ultrasonic decomposition method, an electron beam irradiation method, an electrochemical oxidation method and the like have been applied.
When an oxidizing agent such as hydrogen peroxide, ozone, titanium oxide or the like and ultraviolet rays are used in the above-described conventional high-level oxidation process, the oxidizing agent that does not react with the ultraviolet ray may cause problems such as already- There is a problem in that it takes a long time to remove microorganisms, and the like.
The present disclosure provides a method for producing highly oxidized water by performing an elevated oxidation process using chlorine and ultraviolet light.
The present disclosure provides a method of treating residual chlorine in tap water using a high oxidation process of chlorine and ultraviolet radiation.
A method of treating tap water according to one aspect is disclosed. In the method for treating tap water, first, tap water containing residual chlorine is provided. The tap water is supplied with ultraviolet rays, and the ultraviolet ray is reacted with the residual chlorine to generate a hydroxyl radical (OH).
A method for producing highly oxidized water according to another aspect is disclosed. In the method for producing the highly oxidized water, raw water containing 0.1 mg / L to 4.0 mg / L of chlorine is prepared. The raw water is irradiated with ultraviolet rays. Hydroxyl radicals are produced from the chlorine.
According to the embodiments of the present disclosure, ultraviolet rays are irradiated to tap water and photodegradation of residual chlorine in tap water makes it possible to remove already or odor attributable to the residual chlorine. By irradiating the ultraviolet rays, the microorganisms in the tap water can be sterilized, or the new contaminant components in the tap water can be removed by photodecomposition and radical oxidation.
According to the embodiments of the present disclosure, hydroxyl radicals can be produced by irradiating ultraviolet rays to raw water containing 0.1 mg / L to 4.0 mg / L of chlorine. Thus, by using a small amount of chlorine, there is an advantage that the amount of the oxidizing agent used can be reduced as compared with the conventional method. In the conventional case, when chlorine is used as a sole oxidizing agent to purify the for-treatment water, it is difficult to control the amount of chlorine to be supplied to the for-treatment water, and relatively excessive chlorine is injected into and remained in the for- . In this purification process, there is a disadvantage that already or bad odor is generated strongly, and residual chlorine forms a by-product in the for-treatment water, so that the by-product must be further treated. Accordingly, embodiments of the present disclosure are of significance to employ chlorine, which is avoided in conventional high oxidation processes.
According to the embodiments of the present disclosure, by applying tap water as raw water containing the trace amount of chlorine, advanced oxidation treatment water can be easily and quickly produced at home.
1 is a flowchart schematically showing a method of treating tap water according to an embodiment of the present disclosure;
2 is a graph showing the percentage of hypochlorous acid and hypochlorous acid ions according to pH in an aqueous chlorine solution according to one embodiment of the present disclosure.
FIG. 3 is a graph showing the molar absorption coefficient of hypochlorous acid and hypochlorous acid ions according to the ultraviolet wavelength, in one embodiment of the present disclosure. FIG.
4 is a graph showing the light absorptivity of an organic material according to wavelength in an embodiment of the present disclosure.
5 is a flowchart schematically showing a method of producing highly oxidized water according to another embodiment of the present disclosure.
In the present specification, the highly oxidized water refers to a solution produced through a high-level oxidation process and produced and reacted with a hydroxyl radical (OH.) Having a strong oxidizing power.
Embodiments of the present disclosure can produce highly oxidized water by reacting residual chlorine in tap water with ultraviolet rays to generate hydroxide radicals (OH.) From the residual chlorine, using tap water as raw water. The tap water may contain about 0.1 mg / L to 4.0 mg / L of chlorine. Further, a chlorine radical (Cl 占) may be produced from the residual chlorine. The highly oxidized water is a supernatant which is remained in the reaction through the reaction and is free of chlorine which is already generated or produces odor. 1 is a flowchart schematically showing a method of treating tap water according to an embodiment of the present disclosure; Referring to FIG. 1, in
At 120 block, ultraviolet rays are supplied to the tap water, and the ultraviolet ray is reacted with the residual chlorine to generate a hydroxyl radical (OH). The ultraviolet ray may, for example, have a wavelength of about 200 nm to 300 nm.
According to a specific embodiment, first, a water tank provided with an ultraviolet lamp or an ultraviolet light emitting diode as an ultraviolet light source is prepared. Subsequently, tap water is supplied into the water tank. At this time, at least a part of the ultraviolet lamp or the ultraviolet light emitting diode may be immersed in the tap water. Then, the ultraviolet lamp or the ultraviolet light emitting diode is emitted to provide the ultraviolet rays into the tap water.
The process of reacting the residual chlorine with the ultraviolet ray to generate a hydroxyl radical (OH) can be explained as follows. Chlorine added in a water purification plant for sterilization or disinfection is present in tap water in the form of hypochlorous acid (HOCl) and hydrochloric acid (HCl) as shown in equation (1). The hypochlorous acid may be decomposed into hydrogen ions (H + ) and hypochlorite ions (OCl - ) and may be present in tap water, as shown in equation (2).
Cl 2 + H 2 O -> HOCl + HCl - (1)
HOCl - & gt ; H & lt ; + & gt ; + OCl -
In the formula (2), the pKa at 20 ° C is 7.6, indicating that hydrogen ions in the hypochlorous acid are sufficiently dissociated to exist as hydrogen ions (H + ) and hypochlorite ions (OCl - ).
The hypochlorous acid present in the tap water can be photolyzed by the ultraviolet rays provided by the ultraviolet light source to generate a hydroxyl radical (OH) and a chlorine radical (Cl), as shown in the following formula (3). Hypochlorite ions present in the tap water as shown in equation (4), the photodegradation by ultraviolet light in which the ultraviolet light source provides an oxygen radical (O · -) and generates a radical and a chlorine (Cl ·). The oxygen radical reacts with water to form hydroxide radicals and hydroxide ions, as in equation (5). The ultraviolet ray may, for example, have a wavelength of about 200 nm to 300 nm.
HOCl + ultraviolet- > OH + Cl < - > - (3)
OCl - + UV -> O - + Cl -
O - + H 2 O -> OH + OH - - - - (5)
The hydroxyl radicals or chlorine radicals generated through the above-mentioned reaction formulas (3) to (5) serve as a strong oxidizing agent, so that they can function to decompose organic substances and the like.
2 is a graph showing the percentage of hypochlorous acid and hypochlorous acid ions according to pH in an aqueous chlorine solution according to one embodiment of the present disclosure. FIG. 3 is a graph showing the molar absorption coefficient of hypochlorous acid and hypochlorous acid ions according to the ultraviolet wavelength, in one embodiment of the present disclosure. FIG.
Referring to FIG. 2, it can be seen that the lower the pH of the chlorine aqueous solution, the higher the fraction of hypochlorous acid, and the higher the pH of the tap water, the higher the percentage of hypochlorite ions. Referring to FIG. 3, it can be seen that the molar absorption coefficient of hypochlorous acid is increased near a wavelength of 237 nm, which is lower than the typical sterilization wavelength of 275 nm, and the molar absorption coefficient of hypochlorite ion is maximized at a wavelength of 291 nm As shown in Fig. At this time, it can be confirmed that the molar absorption coefficient of hypochlorous acid ion is larger than the molar absorption coefficient of hypochlorous acid.
Based on the above description, it can be seen that the residual chlorine is present in the form of hypochlorous acid ion rather than the hypochlorous acid in the tap water, and in this case, the water absorption rate according to ultraviolet irradiation can be relatively good. Using this, according to one embodiment, the tap water is led in a direction of a high pH, or is maintained at about 20 ° C, and ultraviolet rays having a wavelength of about 291 nm are irradiated to generate a hydroxyl radical or a chlorine radical The concentration can be increased. According to another embodiment, by applying an ultraviolet light emitting diode as an ultraviolet light source, ultraviolet light of a single wavelength can be provided. Thus, the concentration of hydroxyl radicals or chlorine radicals produced by simultaneously using a first ultraviolet light-emitting diode providing ultraviolet light having a wavelength of about 237 nm and a second ultraviolet light-emitting diode providing ultraviolet light having a wavelength of about 291 nm .
Hereinafter, the function or utility generated by residual chlorine and ultraviolet ray-treated tap water will be described.
Removal of organic substances by ultraviolet photo-oxidation
Organic materials that are not removed by conventional sterilization or purification methods may remain in the tap water. Specifically, the organic material may include a new pollutant. In the present specification, new pollutants include medicinal substances, hormones, perfluorinated compounds, algae metabolism toxic substances, and the like which have recently been detected in domestic and overseas water systems and tap water. Typical examples of the new pollutants include ibuprofen (IBF), sulfamethoxazole (SMX), ciproflaoxacin (CFX), and the like. However, the present invention is not limited thereto. And may contain various components that may remain in tap water. According to the method for treating tap water according to one embodiment of the present disclosure, the new pollutants in the tap water described above can be removed.
FIG. 4 is a graph showing the light absorptivity of new contaminants according to wavelengths of ultraviolet rays in one embodiment of the present disclosure. FIG. 5 is a graph showing the removal rate of new pollutants in accordance with the light energy of ultraviolet rays in one embodiment of the present disclosure. In FIG. 5, Co represents the concentration of the initial new contaminant contained in the tap water, and C represents the concentration of the new contaminant remaining in the tap water after the reaction between the ultraviolet ray and the new contaminant.
4, new pollutants such as ibuprofen (IBF), sulfamethoxazole (SMX), and ciprofloxacin (CFX) exhibit different ultraviolet absorption rates according to wavelengths in tap water having a pH of 7 Able to know. As an example, the absorption rate of ciprofloxacin (CFX) is the highest at 275 nm, which is a typical sterilization wavelength, followed by sulfamethoxazole (SMX) and ibuprofen (IBF). In addition, at 254 nm wavelength, the light absorptance of sulfamethoxazole (SMX) and ciprofloxacin (CFX) was high and the light absorption rate of ibuprofen (IBF) was relatively low.
5, new pollutants can be photodecomposed by absorbing ultraviolet rays. As described above, photodegradation at 254 nm and 275 nm wavelengths in the order of ciprofloxacin (CFX), sulfamethoxazole (SMX) and ibuprofen Removal efficiency. In addition, except for ibuprofen (IBF), the degradation rate of new pollutants tended to increase as the light energy of irradiated ultraviolet light increased.
According to one embodiment, by applying an ultraviolet light emitting diode as an ultraviolet light source, ultraviolet light of a single wavelength can be provided. Therefore, the ultraviolet ray of the optimum wavelength can be selected in consideration of the light absorption rate of the new pollutant to be removed. Or in another embodiment, a plurality of ultraviolet light emitting diodes having different ultraviolet wavelengths can be provided in consideration of the wavelengths optimized for different new contaminant components.
FIG. 6 is a graph showing the removal rate of ibuprofen according to the concentration of chlorine in an embodiment of the present invention. FIG. As described above, chlorine in tap water reacts with ultraviolet rays, so that a radical substance is generated from the photodecomposition of chlorine, and a reaction to oxidize the target new pollutant may proceed.
Referring to FIG. 6, when chlorine is supplied to the tap water from the outside, the removal rate of ibuprofen increases with increasing chlorine concentration. As shown in FIG. 5, the oxidation removal efficiency of ibuprofen (IBF), which is a target material having a low removal efficiency due to the direct photodegradation by radical reaction, is remarkably increased. As can be seen, in the case of chlorine concentration of 2 mg / L or more, it is confirmed that the oxidation removal efficiency of ibuprofen (IBF) is increased about 9 times or more.
Removal of residual chlorine by ultraviolet photo-oxidation
Through the above-mentioned equations (1) to (5), chlorine remaining in the tap water can be removed. As described above, there is a high possibility that residual chlorine is present in the form of hypochlorous acid ions in tap water, and can be efficiently removed through irradiation with ultraviolet rays having a wavelength of 200 to 300 nm.
By effectively removing the residual chlorine, the tap water can be removed or the offensive odor can be removed.
Microbial sterilization by ultraviolet rays
Microorganisms in tap water can be directly sterilized by using ultraviolet light having a wavelength of 200 nm to 300 nm according to the embodiment of the present disclosure. The microorganism may include, for example, Cryptosporidium and Giadia which are chlorine-resistant microorganisms that can remain in tap water. As an example, the ultraviolet light source may include a light emitting diode generating a wavelength of 275 nm or 254 nm.
7 is a flowchart schematically showing a method of producing highly oxidized water according to another embodiment of the present disclosure. Referring to FIG. 4, raw water containing 0.1 mg / L to 4.0 mg / L of chlorine is prepared in 710 block. As an example, the raw water may be tap water, and the chlorine may be residual chlorine present in the tap water. At this time, in some cases, tap water may be prepared, and chlorine may be additionally provided outside the tap water.
In 720 blocks, the raw water is irradiated with ultraviolet rays. The ultraviolet ray may have a wavelength of 200 nm to 300 nm as an example. In some embodiments, the step of irradiating the ultraviolet rays to the raw water may include a step of sterilizing the microorganisms in the raw water using the ultraviolet rays. In some other embodiments, the step of irradiating the ultraviolet rays to the raw water may include the step of removing the new contaminants in the raw water using the ultraviolet rays. At 730 block, hydroxide radicals are generated from the chlorine. In one embodiment, a chlorine radical may be further generated from the chlorine. The step of generating the hydroxyl radical or the chlorine radical from the chlorine may follow the reaction formulas (1) to (5) described above with reference to FIG. Presented in a form of the UV is the HOCl or OCl the - - that is, the residual chlorine is HOCl or OCl it is possible to produce the hydroxyl radical and the radicals from the chlorine. The wavelength of the ultraviolet ray may be determined in consideration of the extinction coefficient of HOCl or OCl < - >.
The highly oxidized water produced by the above-described manufacturing process comprises hydroxyl radicals or chlorine radicals which function as oxidizing agents for the material to be treated. At this time, the method of producing the highly oxidized water has an advantage that the amount of the oxidizing agent used can be reduced by using a small amount of chlorine such as residual chlorine in the tap water. As an example, in the conventional case, when chlorine is used as a sole oxidizing agent to purify the for-treatment water, it is difficult to control the amount of chlorine to be supplied to the for-treatment water, and relatively excessive chlorine is injected into the for-treatment water . In such a purification process, there is a disadvantage in that the excess or bad odor originates from the excessive chlorine, and the residual chlorine forms a by-product in the for-treatment water, thereby further requiring the by-product to be further treated. Conventionally, the application of chlorine to the advanced oxidation process has been avoided.
According to the embodiments of the present disclosure, by applying tap water as the raw water containing the trace amount of chlorine, it is possible to easily and quickly produce highly oxidized water at home.
Although the embodiments of the present disclosure are illustrated and described herein with reference to the drawings, it is to be understood that the present disclosure is intended to be illustrative and not restrictive of the present disclosure in a detailed disclosure. Various other modifications will be possible as long as the technical ideas presented in this disclosure are reflected.
-
Claims (21)
(b) providing ultraviolet light to the tap water, wherein the ultraviolet light is reacted with the residual chlorine to produce a hydroxyl radical (OH)
A method of treating tap water.
In step (a)
The concentration of the residual chlorine is 0.1 mg / L to 4.0 mg / L
A method of treating tap water.
(b)
Wherein the ultraviolet light has a wavelength of 200 to 300 nm
A method of treating tap water.
(b)
(b1) preparing a water tank equipped with an ultraviolet lamp or an ultraviolet light emitting diode;
(b2) supplying tap water into the water tank; And
(b3) illuminating the ultraviolet lamp or the ultraviolet light emitting diode to provide the ultraviolet rays into the tap water
A method of treating tap water.
(b)
Further comprising the step of photodecomposing an organic substance in the tap water using the ultraviolet light
A method of treating tap water.
(b)
Further comprising the step of determining an ultraviolet wavelength to be irradiated in consideration of the extinction coefficient depending on the type of the organic material
A method of treating tap water.
Wherein the organic material comprises a new pollutant that remains in the tap water
A method of treating tap water.
Wherein said new contaminant comprises at least one selected from the group consisting of ibuprofen, sulfamethoxazole, and ciproflaoxacin
A method of treating tap water.
(b) further comprises sterilizing the microorganisms in the tap water using the ultraviolet light
A method of treating tap water.
(c)
And removing the residual chlorine from the tap water
A method of treating tap water.
(c) further comprises the step of producing a chlorine radical (Cl)
A method of treating tap water.
The residual chlorine is present in the form of HOCl or OCl < - >
Wherein the ultraviolet light is generated from the HOCl or the OCl < - > to form the hydroxyl radical and the chlorine radical
A method of treating tap water.
The wavelength of ultraviolet rays is determined in consideration of the extinction coefficient of HOCl or OCl < - >
A method of treating tap water.
(b) irradiating the raw water with ultraviolet rays; And
(c) generating and reacting a hydroxyl radical from said chlorine
A method for producing highly oxidized water.
The raw water is tap water
A method for producing highly oxidized water.
The ultraviolet light has a wavelength of 200 to 300 nm
A method for producing highly oxidized water.
In the step (c)
Wherein the ultraviolet light further comprises generating a chlorine radical from the chlorine
A method for producing highly oxidized water.
The chlorine is present in the form of HOCl or OCl < - > in the for-treatment water,
The ultraviolet light is the HOCl or OCl wherein - generating the hydroxyl radicals and the chlorine radical from
A method for producing highly oxidized water.
The wavelength of the ultraviolet ray to be irradiated is determined in consideration of the extinction coefficient of HOCl or OCl < - >
A method for producing highly oxidized water.
(b) comprises sterilizing the microorganisms in the raw water using the ultraviolet light
A method for producing highly oxidized water.
(b) comprises the step of removing the new contaminant component in the raw water by using the ultraviolet ray
A method for producing highly oxidized water.
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| KR20130103646 | 2013-08-30 | ||
| KR1020130103646 | 2013-08-30 |
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| KR20150026993A true KR20150026993A (en) | 2015-03-11 |
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| CN107473366A (en) * | 2017-08-31 | 2017-12-15 | 同济大学 | A kind of method for efficiently removing acrylamide in water removal |
| CN109293098A (en) * | 2018-11-13 | 2019-02-01 | 同济大学 | A method of it is generated using UV-LED light source control Disinfection Byproducts in Drinking Water |
| US10954151B1 (en) | 2016-04-15 | 2021-03-23 | Hugh Stephen McDonald | Drinking water treatment system |
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2014
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10954151B1 (en) | 2016-04-15 | 2021-03-23 | Hugh Stephen McDonald | Drinking water treatment system |
| CN107473366A (en) * | 2017-08-31 | 2017-12-15 | 同济大学 | A kind of method for efficiently removing acrylamide in water removal |
| CN109293098A (en) * | 2018-11-13 | 2019-02-01 | 同济大学 | A method of it is generated using UV-LED light source control Disinfection Byproducts in Drinking Water |
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