KR20140141798A - Low temperature plasma sterilizer system - Google Patents

Abstract

The present invention relates to a low temperature plasma sterilizing system and, more specifically, to a low temperature plasma sterilizing system, wherein an active oxygen species is generated using a low temperature plasma so that the sterilizing function and efficiency thereof are excellent and perfect sterilization can be performed in an environmentally-friendly way, and sterilization and odor removal can be simultaneously performed. According to an embodiment of the present invention, the low temperature plasma sterilizing system comprises: a plasma generator generating a plasma jet and including a first electrode and a second electrode having a moving hole and disposed to be separated from the first electrode to form a plasma chamber with the first electrode; a sterilizing system supporting frame supporting the plasma generator, equipped with a plasma jet moving unit formed in one side thereof, and supplying the plasma jet generated from the plasma generator indoors; a power source supplying unit for applying a particular voltage to the plasma generator; a gas supplying unit connected with the plasma generator through a gas supplying line to supply a gas; and a water supplying unit connected with the plasma generator through a water supplying line to supply water.

Description

{Low temperature plasma sterilizer system}

The present invention relates to a low temperature plasma sterilization system. More particularly, the present invention relates to a low-temperature plasma sterilizing system capable of generating active oxygen species using low-temperature plasma, excellent in sterilization performance and efficiency, being environmentally friendly, capable of complete sterilization, and capable of sterilization and odor removal at the same time.

 In 2011, it spread in Germany, rapidly spread to Europe, the United States and Canada, over 4,400 infected people, and the death toll was 52 E. coli. The strain E. coli was first detected in Korea in August 2004, and organic vegetables were identified as pathogens.

In addition, there are additional phenomena that indicate that the surrounding environment is not safe as a microorganism such as bacteria. As a result, children or elderly people with weak immunity due to high exposure to fine dust, airborne bacteria, bacteria and mites may develop headache, fatigue, dyspnea, asthma, , Sick house syndrome that causes rhinitis, and many people suffer from New Car Syndrome. Cell phones that touch everyday are also found to be bacterial masses. Textiles such as school uniforms, foot mats, and pillows also showed 96 times more bacteria than cell phones and toilet seats.

 Such microorganisms are present in every space and proud of their vigorous metabolism, spread by millions of times depending on kind, temperature and humidity, and can threaten human health rapidly in the form of bacteria, fungi and viruses. Corruption.

Accordingly, there is a need for overall odor, pollution, sterilization, disinfection and purification of surrounding environment such as sick house syndrome, new car syndrome, clothes, shoes and other textile products as well as household appliances such as refrigerators.

However, methods for purifying bacteria are differently required for each product and situation, such as a sterilizer for mobile phones and a sterilizer for clothes, so that it is difficult to sterilize and purify the surrounding environment as long as it does not have various sterilizing devices.

In order to solve these problems, there is a demand for a disinfection system that is excellent in sterilization performance and efficiency, is environmentally friendly, has a perfect sterilization effect, and can simultaneously have a sterilization and odor removal effect.

One embodiment of the present invention is to provide a plasma display panel capable of generating active oxygen species such as UV, Ozone, H ₂ O ₂ , and OH radicals using a low-temperature plasma to provide an excellent sterilizing performance and efficiency, Temperature plasma sterilization system capable of simultaneously having a low-temperature plasma sterilization system.

In addition, one embodiment of the present invention is to provide a low-temperature plasma sterilizing system that is simple in structure, compact, and versatile and excellent in portability.

According to an aspect of the invention there is provided a plasma generator comprising a plasma generator and a plasma generator including a first electrode, a moving electrode and a second electrode spaced apart from the first electrode to form a plasma chamber with the first electrode, ; A sterilizing system supporting frame for supporting the plasma generator and having a plasma jet moving part on one side thereof to supply a plasma jet generated in the plasma generating device to a room; A power supply unit for applying a predetermined voltage to the plasma generator; A low temperature plasma sterilizing system including a gas supply unit connected to the plasma generator by a gas supply line to supply gas and a water supply unit connected to the plasma generator by a water supply line may be provided.

In the plasma generator, a gas moving line through which the gas moves is horizontally formed on the second electrode, a water moving line through which the water moves on the second electrode is horizontally formed, Can be supplied horizontally to the electrode.

The plasma generator may include an upper insulator inserted into the upper portion of the first electrode to maintain insulation between the first electrode and the second electrode, and a lower insulator inserted into the lower portion of the first electrode, And a lower insulator for maintaining insulation.

The plasma generator may further include a gasket interposed between the second electrode and the upper insulator to maintain airtightness between the second electrode and the upper insulator.

Also, the low-temperature plasma sterilizing system may further include a second electrode, an upper insulator, and a lower insulator. The second electrode, the upper insulator, and the lower insulator are coupled to each other. And a generator lower support portion.

The second electrode is provided with a separation barrier wall separating the plasma chamber and the gas and water supply chambers from each other. A plurality of the movement holes are formed in the separation barrier rib, and each of the movement holes has a center And the gas and the water supplied through the moving hole form a vortex and can be supplied to the plasma chamber.

In the plasma generator, a gas moving line through which the gas moves is formed vertically and the water moving line through which the water moves is formed vertically, so that the gas and the water Can be supplied perpendicularly to the two electrodes.

The plasma generator may further include: an upper insulator inserted into the upper portion of the first electrode to maintain the first electrode insulated from the second electrode; and a lower insulator inserted into the lower portion of the first electrode, The low temperature plasma sterilizing system may further include a plasma generator lower support portion coupled to a lower portion of the plasma generator to support a lower portion of the plasma generator.

The plasma generator lower support may further include a gas connection port connected to one side of the plasma generator lower support for supplying the gas to the support gas moving line and a gas connection port connected to the plasma generator lower support for supplying the water to the support water movement line. And a water connection port connected to one side of the water connection port.

In addition, a gas supply control valve for regulating the supply amount of the gas supplied to the second electrode may be formed at one side of the gas supply line.

In addition, a water supply control valve for regulating the supply amount of water supplied to the second electrode may be formed at one side of the water supply line.

In addition, the gas supply regulating valve may be a solenoid valve.

Further, the water supply control valve may be a solenoid valve.

The upper insulator and the lower insulator may be formed of ceramic or Teflon.

The low temperature plasma sterilizing system may further include a plasma generator support frame coupled to one side of the plasma generator and the other side of the sterilizing system support frame coupled to one side of the sterilizing system support frame to support the plasma generator.

One embodiment of the present invention is to provide a plasma display panel capable of generating active oxygen species such as UV, Ozone, H ₂ O ₂ , and OH radicals using a low-temperature plasma to provide an excellent sterilizing performance and efficiency, At the same time.

Further, one embodiment of the present invention is simple in structure, small in size, and excellent in portability for versatility.

In addition, one embodiment of the present invention can efficiently generate high-concentration active oxygen species by supplying water to the plasma.

1 is a schematic configuration diagram of a low-temperature plasma sterilizing system according to a first embodiment of the present invention.
2 is a schematic configuration diagram of a plasma generator.
3 is a cross-sectional view taken along the line A-A 'in Fig.
4 is a schematic configuration diagram of a plasma generator of a low temperature plasma sterilizing system according to a second embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, configurations and operations of embodiments of the present invention will be described in detail with reference to the accompanying drawings.

It should be understood, however, that the invention is not intended to be limited to the particular forms disclosed, but includes all modifications, equivalents, and alternatives falling within the spirit and scope of the invention.

It is noted that the terms "comprises" or "having" in this application are intended to specify the presence of stated features, steps, operations, components, parts, or combinations thereof in one or more other features or acts, , Components, parts, or combinations thereof, as a matter of convenience, without departing from the spirit and scope of the invention. That is, throughout the specification, when an element is referred to as "comprising ", it means that it can include other elements, not excluding other elements unless specifically stated otherwise.

Also, unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Terms such as those defined in commonly used dictionaries are to be interpreted as having a meaning consistent with the contextual meaning of the related art and are to be interpreted as either ideal or overly formal in the sense of the present application Do not.

Hereinafter, a repeated description, a known function that may obscure the gist of the present invention, and a detailed description of the configuration will be omitted. Embodiments of the present invention are provided to more fully describe the present invention to those skilled in the art. Accordingly, the shapes and sizes of the elements in the drawings and the like can be exaggerated for clarity.

In the case of low-temperature plasma, the effect on sterilization of active oxygen is now proven as a source reaction material that can generate ultraviolet rays and reactive oxygen species which have not been high in temperature and proved to be effective for sterilization. Research is being conducted globally.

As evidenced by previous studies, in connection with the disinfection of organic materials during plasma discharge, reactive oxygen species such as UV Ozone, H ₂ O ₂ and OH radicals are released by the discharge and these active oxygen species permeate the cell membrane, It is possible to improve the treatment efficiency and to shorten the time required for the treatment.

In the case of the low-temperature plasma sterilizing system according to the first embodiment of the present invention, a small amount of water can be supplied to the generated plasma during the plasma discharge. At this time, H + and OH radicals can be generated by chemical dissociation by the reaction of water molecule and plasma, by the process of the following formula (1).

In the process of generating OH radicals from H ₂ O molecules in reaction with water during plasma discharge, H ₂ O can be ionized by the plasma and separated into molecules in the active state. In addition, OH radicals are generated by separation and ionization, and H + is generated during this process to decrease pH, that is, hydrogen ion concentration. If the hydrogen ion concentration is less than 5 or more than 10, the bacteria can be killed, so that the hydrogen ion concentration can be lowered due to the H + generated by the plasma, and the bacteria can be disinfected.

In addition, it can be effectively applied to the treatment of harmful gas through various chemical reactions as described above. Since the treatment of harmful gas by low-temperature plasma is not limited to the application conditions of the method, it can be easily applied in various cases where toxic or harmful substances in the air are required to be treated, which can also be effective in the treatment of harmful gas in the landfill .

1 is a schematic configuration diagram of a low-temperature plasma sterilizing system according to a first embodiment of the present invention. 2 is a schematic configuration diagram of a plasma generator. 3 is a cross-sectional view taken along the line A-A 'in Fig.

1 to 3, the low temperature plasma sterilizing system according to the first embodiment of the present invention includes a plasma generator 100, a plasma generator lower support 200, a sterilizing system support frame 400, a gas supply unit 500, A power supply unit 600, and a water supply unit (not shown).

2 to 3, the plasma generator 100 may include a first electrode 120, a second electrode 130, an upper insulator 140, and a lower insulator 150.

The second electrode 130 may be spaced apart from the first electrode 120 by a predetermined distance to form the plasma chamber 131 together with the first electrode 120.

Either the first electrode 120 or the second electrode 130 may be a high voltage electrode. Also, any one of the first electrode 120 and the second electrode 130 may be a ground electrode. In the low temperature plasma sterilizing system according to the first embodiment of the present invention, the second electrode 130 may be a ground electrode and the first electrode 120 may be a high voltage electrode. However, the present invention is not limited thereto, and the second electrode 130 may be a high voltage electrode, and the first electrode 120 may be a ground electrode.

The power supply unit 700 may apply a predetermined power to the first electrode 120. The low temperature plasma sterilization system 10 according to the first embodiment of the present invention is configured such that the power supply unit 700 is formed on the upper part of the gas supply unit 500, Any structure can be used.

The second electrode 130 may have a partition wall 134 formed therein. The separation barrier 134 may isolate the gas and water supply chamber 133 from the plasma chamber 134. The gas may be supplied to the gas and water supply chamber 133 through the gas transfer line 136 and supplied to the plasma chamber 134 through the transfer hole 135 formed in the partition wall 136. The water may be supplied to the gas and water supply chamber 133 through the water transfer line 137 and supplied to the plasma chamber 134 through the transfer hole 135 formed in the partition wall 136. [

3, the separation barrier ribs 136 may be formed in a cylindrical shape having a hollow portion inside the second electrode 130. In the partition barrier ribs 136, a plurality of The moving holes 135 may be formed to be inclined to each other in a spiral shape. That is, each of the central axes of the plurality of the moving holes 135 may be formed to be inclined with respect to the central axis passing through the different moving holes 135.

The gas and water supplied to the gas and water supply chamber 133 can be supplied to the movement hole 138. [ The gas and water that have passed through the moving hole 135 can form a vortex like a vortex in the plasma chamber 131 after passing through the moving hole 138. By this vortex formation, the plasma in the plasma chamber 131 can be uniformly generated in the entire region of the plasma chamber 131, not in a specific region.

In addition, the generated vortex can lengthen the reaction time with the plasma, and the temperature of the plasma can also be lowered.

The second electrode 130 has a gas transfer line 136 formed on one side of the side and a gas supply line 510 of the gas supply unit 500 is connected to supply gas from the gas supply unit 500. The gas supplied from the gas supply unit 500 may be air. In addition, gases such as oxygen and nitrogen can be supplied together with air or alone. A water transfer line 137 is formed on the other side of the second electrode 130 and a water supply line 610 is connected to the water transfer line 137 to supply water from the water supply unit (not shown).

A water supply control valve 610a is connected to one side of the water supply line 610 to control the amount of water supplied to the second electrode 130. [ The water supply regulating valve 610a may be a solenoid valve.

In addition, a gas supply control valve 510a is connected to one side of the gas supply line 510 to control the amount of gas supplied to the second electrode 130. The gas supply regulating valve 510a may be a solenoid valve.

The first electrode 120 may be inserted into an upper insulator 140 having a hollow portion at the center thereof. The first electrode 120 inserted into the upper insulator 140 may be inserted into the through hole 138 formed in the second electrode 130. A lower insulator 150 having a hollow portion at the center may be coupled to the lower portion of the first electrode 120.

The upper insulator 140 and the lower insulator 150 can maintain insulation between the first electrode 130 and the second electrode 130. The upper insulator 140 and the lower insulator 150 may be formed of ceramics, Teflon, or the like.

The gasket 160 may be inserted between the second electrode 130 and the upper insulator 140 to maintain airtightness so that the gas does not flow out into the gap between the second electrode 130 and the upper insulator 140.

The plasma generator lower support 200 surrounds the second electrode 130, the upper insulator 140 and the lower insulator 150 and includes a second electrode 130, an upper insulator 140 and a lower insulator 150 Can be combined.

The low temperature plasma sterilizing system 10 according to the first embodiment of the present invention is configured such that the plasma generator lower support 200 surrounds and connects the second electrode 130, the upper insulator 140 and the lower insulator 150, The second electrode 130, the upper insulator 140, and the lower insulator 150 can be bolted to each other by bolts or the like without the generator supporting portion 200. [

A gas supply line 510 and a water supply line 610 may be inserted into both side portions of the plasma generator support frame 300. The plasma generator support frame 300 may have a hollow portion at the center thereof so that the upper portion of the second electrode 130 may be inserted.

One side of the plasma generator support frame 300 may be welded to the sterilizing system support frame 400, or may be coupled by bolts or the like. In addition, a thread may be formed on one side of the inside of the plasma generator support frame 300 and may be coupled to a thread corresponding to one side of the sterilizing system support frame 400.

The sterilizing system support frame 400 of the low temperature plasma sterilization system 10 according to the first embodiment of the present invention is a hollow hollow frame with a hollow quadrangle but the sterilizing system support frame 400 comprises the plasma generator 100, 700, and the gas supply unit 500 and the like can be accommodated.

The low temperature plasma sterilization system 10 according to the first embodiment of the present invention is configured such that the plasma generator 100 is formed on the sterilizing system support frame 400, The sterilizing system support frame 400 may be formed at any position of the sterilizing system support frame 400 regardless of the position where the sterilizing system 400 can be discharged to the room where the low temperature plasma sterilizing system according to one embodiment is installed.

A plasma outlet 110 through which a plasma jet can move can be inserted into the other side of the plasma generator support frame 300. The plasma outlet 110 may be inserted into one side of the second electrode 130 and connected to the plasma chamber 131.

The plasma jet generated in the plasma chamber 131 of the plasma generator 100 passes through the plasma outlet 110 and is discharged to the room through the plasma jet moving part 410 formed on one side of the sterilizing system support frame 400 .

In addition, the low temperature plasma sterilization system 10 according to the first embodiment of the present invention may include a control unit 800 that adjusts an applied voltage and an amount of gas and water to be supplied.

When gas and water are supplied to the plasma chamber 131 after the plasma is generated in the plasma chamber 131, a high-speed plasma jet including the plasma can be generated. The plasma jet thus generated forms a vortex and can move along the plasma outlet 110 and can be supplied to the room through the plasma jet moving part 410.

Next, a low-temperature plasma sterilizing system according to a second embodiment of the present invention will be described.

4 is a schematic configuration diagram of a plasma generator of a low temperature plasma sterilizing system according to a second embodiment of the present invention.

The description of the low-temperature plasma sterilization system according to the second embodiment of the present invention will be focused on the difference from the low temperature plasma sterilization system according to the first embodiment of the present invention.

The low-temperature plasma sterilizing system according to the second embodiment of the present invention differs from the low-temperature plasma sterilizing system according to the first embodiment of the present invention in the structure of the plasma generator 100.

In the plasma generator 100 of the low temperature plasma sterilizing system according to the first embodiment of the present invention, a gas supply line and a water supply line are formed on the side of the plasma generator 100 to supply gas and water, In the plasma generator 100 of the low temperature plasma sterilizing system according to the second embodiment of the present invention, a gas supply line and a water supply line are connected to a lower portion of the plasma generator 100 so that gas and water can be supplied from the lower portion to the upper portion.

The gas moving line 136 may be formed through the second electrode 130 from the bottom to the top. The water transfer line 137 may also pass through from the bottom to the top of the second electrode 130.

The plasma generator lower support 200 may be welded or bolted to the lower portion of the second electrode 130. The plasma generator lower support 200 may have support gas movement lines 210 and support water movement lines 220 formed on both sides thereof. The support gas transfer line 210 may be formed corresponding to the gas transfer line 136, respectively. The support water movement line 220 may be formed corresponding to the water movement line 137, respectively.

A gas connection port 230, which is connected to the support gas moving line 210, may be formed on a lower side of the lower portion of the plasma generator lower support 200. In addition, a water connection port 240 connected to the support part water transfer line 220 may be formed on the other side of the lower portion of the plasma generator lower support part 200.

A gas supply line 510 is connected to one side of the gas connection port 230 to supply gas. The supplied gas may be supplied to the gas and water supply chamber 132 through the support gas transfer line 210 and the gas transfer line 136.

A water supply line 610 may be connected to one side of the water connection port 240 to supply water. The supplied water may be supplied to the gas and water supply chamber 132 through the support water transfer line 220 and the water transfer line 137.

A lower insulator 150 may be coupled to the lower portion of the first electrode 120. An upper insulator 140 may be coupled to the upper portion of the first electrode 120. The first electrode 120 coupled with the upper insulator 140 and the lower insulator 150 may be inserted into the through hole 138 formed in the second electrode 130.

An upper insulator support portion 139 may be formed on one side of the second electrode 120 and an upper insulator 140 may be supported on one side of the upper insulator support portion 139.

Meanwhile, one embodiment of the present invention is to produce active oxygen species such as UV, Ozone, H ₂ O ₂ and OH radical by using low-temperature plasma, so that it has excellent sterilizing performance and efficiency, is environment-friendly and has a perfect sterilizing effect, Removal effect at the same time.

Further, one embodiment of the present invention is simple in structure, small in size, and excellent in portability for versatility. In addition, one embodiment of the present invention can efficiently generate high-concentration active oxygen species by supplying water to the plasma.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, It will be understood. The embodiments described above are therefore to be considered in all respects as illustrative and not restrictive.

10: Low temperature plasma sterilization system 100: Plasma generator
110: plasma outlet 120: first electrode
130: second electrode 131: plasma chamber
132: gas and water supply chamber 134:
135: moving hole 136: gas moving line
137: Water transfer line 138: Through hole
139: upper insulator support 140: upper insulator
150: lower insulator 160: gasket
200: plasma generator lower support part 210: supporting part gas moving line
220: support part water transfer line 230: gas connection port
240: Water connection port 300: Plasma generator support frame
400: sterilizing system supporting frame 410: plasma jet moving part
500: gas supply unit 510: gas supply line
510a: gas supply control valve 610: water supply line
610a: water supply control valve 700: power supply part
800:

Claims (15)

A plasma generator for generating a plasma jet and including a first electrode, a transfer hole, and a second electrode spaced apart from the first electrode to form a plasma chamber with the first electrode;
A sterilizing system supporting frame for supporting the plasma generator and having a plasma jet moving part on one side thereof to supply a plasma jet generated in the plasma generating device to a room;
A power supply unit for applying a predetermined voltage to the plasma generator;
A gas supply unit connected to the plasma generator through a gas supply line to supply gas;
And a water supply portion connected to the plasma generator by a water supply line to supply water.
The method according to claim 1,
The plasma generator includes:
A gas moving line through which the gas moves to the second electrode is formed horizontally,
A water movement line through which water moves on the second electrode is horizontally formed,
Wherein the gas and the water are supplied horizontally to the second electrode.
The method according to claim 1,
The plasma generator includes:
An upper insulator inserted into the upper portion of the first electrode to maintain insulation between the first electrode and the second electrode,
Further comprising a lower insulator inserted into a lower portion of the first electrode to maintain insulation of the first electrode with the second electrode.
The method of claim 3,
The plasma generator includes:
Further comprising a gasket interposed between the second electrode and the upper insulator to maintain airtightness between the second electrode and the upper insulator.
The method of claim 3,
The low temperature plasma sterilization system comprises:
And a plasma generator lower support portion which is inserted into the upper portion of the second electrode, the upper insulator and the lower insulator, and which supports the lower portion of the plasma generator by coupling the second electrode, the upper insulator and the lower insulator Characterized by a low temperature plasma sterilization system.
The method according to claim 1,
Wherein the second electrode is provided with a partition wall separating the plasma chamber and the gas and water supply chambers,
Wherein a plurality of the moving holes are formed in the partition wall and the center axes of the moving holes are inclined with respect to the center axis of the moving holes corresponding to each other,
Wherein a gas and water supplied through the moving hole form a vortex and are supplied to the plasma chamber.
The method according to claim 1,
The plasma generator includes:
A gas moving line through which the gas moves to the second electrode is vertically formed,
A water transfer line through which water is transferred to the second electrode is vertically formed,
Wherein the gas and the water are supplied vertically to the second electrode.
8. The method of claim 7,
The plasma generator includes:
An upper insulator inserted into the upper portion of the first electrode to maintain insulation between the first electrode and the second electrode,
And a lower insulator inserted into a lower portion of the first electrode to maintain insulation of the first electrode with the second electrode,
The plasma sterilization system comprises:
Further comprising a plasma generator lower support coupled to a lower portion of the plasma generator to support a lower portion of the plasma generator.
9. The method of claim 8,
Wherein the plasma generator lower support comprises:
A gas connection port connected to one side of the lower portion of the plasma generator for supplying the gas to the support gas moving line,
And a water connection port connected to one side of the lower portion of the plasma generator for supplying the water to the support water movement line.
The method according to claim 1,
Wherein a gas supply control valve for regulating an amount of gas supplied to the second electrode is formed on one side of the gas supply line.
The method according to claim 1,
Wherein a water supply regulating valve for regulating a supply amount of water supplied to the second electrode is formed at one side of the water supply line.
11. The method of claim 10,
Wherein the gas supply regulating valve is a solenoid valve.
12. The method of claim 11,
Wherein the water supply control valve is a solenoid valve.
The method according to claim 3 or 8,
Wherein the upper insulator and the lower insulator comprise:
Ceramic, or Teflon. ≪ RTI ID = 0.0 > A < / RTI >
The method according to claim 1,
The low temperature plasma sterilization system comprises:
Further comprising a plasma generator support frame coupled to one side of the plasma generator and the other side coupled to one side of the sterilizing system support frame to support the plasma generator.

Images