KR20140101241A - A Plating Rack - Google Patents
A Plating Rack Download PDFInfo
- Publication number
- KR20140101241A KR20140101241A KR1020130014676A KR20130014676A KR20140101241A KR 20140101241 A KR20140101241 A KR 20140101241A KR 1020130014676 A KR1020130014676 A KR 1020130014676A KR 20130014676 A KR20130014676 A KR 20130014676A KR 20140101241 A KR20140101241 A KR 20140101241A
- Authority
- KR
- South Korea
- Prior art keywords
- rotation
- arm
- substrate
- rack
- operation shaft
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
- C25D17/08—Supporting racks, i.e. not for suspending
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/188—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Disclosed is a plating rack apparatus used for plating a substrate.
Such a plating rack apparatus is provided with a rack main body in which a substrate is placed and a pressing member which is rotatably mounted on the rack main body side about an axis so as to press the circumferential portion of the substrate with the pressing means during a turning operation, And a rotation engaging portion formed to be capable of restricting rotation of the rotation operation shaft in a state in which the substrate can be fixed or released while engaging with the rotation operation shaft in accordance with the rotation angle of the rotation operation shaft,
Wherein the rotation engaging portion includes an arm which is provided at one side of the rotation operation shaft and moves in the rotation operation direction, and an engagement groove corresponding to the arm, and is disposed on the rack body side, And a stopper formed to allow the end portion to be engaged or released in a state where the end portion is fitted to the catching groove side or overrun.
Description
The present invention relates to a plating rack apparatus.
BACKGROUND ART [0002] In a manufacturing process of a thin film circuit board such as a PCB (Printed Circuit Board), there is a process of plating a substrate for circuit board production (hereinafter referred to as "substrate").
In the plating process, a plating rack is used as a means for holding the substrate in a plating state.
Such a plating rack is a "plating rack assembly of Patent No. 10-1187397 " filed by the applicant in 2010 and registered as a patent.
In particular, the pressing means includes a pair of conveying bars provided on the side of the rack main body in the forward and backward directions along the longitudinal direction of the bar When operation is performed, power is generated and transmitted by contact force, and operation for fixing or releasing the substrate is performed.
However, the pushing means of the plating rack assembly of the above-mentioned Japanese Patent No. 10-1187397 is difficult to expect satisfactory operability because the pushing means of the plating rack assembly must be operated by a slide method in which the relatively long transport bar is directly pushed or pulled for fixing or releasing the substrate.
In addition, since the power transmitting portion (the first contact hole and the second contact hole) must be provided so that the power generation and transfer for fixing the substrate can be performed by the friction (contact) action in conjunction with the slide operation of the transport bar, The transmission structure is complicated.
Furthermore, the power transmission part may excessively generate dust due to friction during operation, so that contamination of the rack and the plating tank may be easily caused, and the quality of the plating may be deteriorated.
SUMMARY OF THE INVENTION The present invention has been proposed in order to solve the above problems,
SUMMARY OF THE INVENTION An object of the present invention is to provide a plating rack apparatus which can easily fix a substrate by a pressing or depressing method by a turning operation.
In order to achieve the above object,
A rack main body in which a substrate is disposed;
A pivoting operation shaft provided on the rack body side so as to be rotatable about an axis thereof and configured to be pressed to a side of the rack body by pressing the peripheral portion of the substrate with the pushing tool in a rotating operation;
A rotation engaging portion formed to be capable of restricting rotation of the rotation operation shaft in a state in which the substrate can be locked or unlocked while engaging contact is made according to the rotation angle of the rotation operation shaft;
/ RTI >
The rotation-
An arm provided on one side of the rotation operation shaft and moving in a rotation operation direction;
And an engaging groove corresponding to the arm and disposed on the rack main body side so that the end portion of the arm can be engaged or released in a state where the end portion of the arm is fitted or ridden on the side of the engaging groove in accordance with the rotation operation angle of the rotation operation shaft Formed;
The plating rack apparatus according to
According to the present invention as described above, the substrate can be fixed by the pressing operation by the turning operation of the turning operation shaft, and particularly, by the simple engagement contact force, So that it is possible to secure a further improved operational convenience and stability when the loading or unloading operation of the substrate is carried out.
1 is a view schematically showing the entire structure of a plating rack apparatus according to an embodiment of the present invention.
2 to 8 are views for explaining the detailed structure and operation of the plating rack apparatus according to an embodiment of the present invention.
Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.
The embodiments of the present invention will be described by those skilled in the art to which the present invention is applicable.
Therefore, the embodiments of the present invention can be modified into various other forms, so that the claims of the present invention are not limited by the embodiments described below.
FIG. 1 is a schematic view showing the overall structure of a plating rack apparatus according to an embodiment of the present invention, and FIGS. 2 to 8 are views for explaining the detailed structure and operation, wherein
Referring to FIGS. 1 to 3, the
1, the
A support A1 for supporting the periphery of one surface (back surface) of the substrate G is formed on the side of the support portion A of the
The support A1 may be formed at one or more points spaced apart to correspond to the circumferential portion of the substrate G. [
The plating rack apparatus according to one embodiment of the present invention includes a pivoting operation shaft (4).
The
1 and 2, the
The
The pushing tool B is formed at a position corresponding to the support A1 of the
The pushing-out portion B is formed such that a pressing or depressing operation can be performed in a state in which the gap between the support A1 and the support A1 is narrowed or opened by the rotation operation of the
3, when the pushing tool B is moved in a direction toward the support A1 of the
Then, the board G can be fixed to the supporting portion A side of the
When the
Therefore, the substrate G can be fixed to the
Meanwhile, the plating rack apparatus according to an embodiment of the present invention includes a
The
Referring to FIG. 1, the
The arm C is disposed on one side of the
The arm C may be, for example, a metal plate or a synthetic resin plate. The arm C may be disposed at a position substantially perpendicular to the axis of the
The hook D is provided on the side of the
The latching opening D is provided with a latching groove D1 and one side rotatably fixed to the support portion A side of the
3, the latching opening D is fixed by a hinge pin D2 so as to have a rotation axis parallel to the axis of the
In addition, an elastic member D3 may be connected to one side of the latching opening D.
As shown in FIG. 3, one end of the elastic member D3 is connected to the latch D and the other end of the elastic member D3 is connected to the support portion of the rack body 2 A) side.
3, when the arm C is not in contact with the arm C, the latch D can be elastically positioned at a position where the arm C can be engaged with the arm C at all times.
4, when the arm C is moved in the direction of folding toward the inside of the
The arm C and the latch D are formed in such a manner that the pushing tool B of the
6, when the arm C is further pushed in the pressing direction in the latching state of the arm C and the latch D as shown in FIG. 6, when the arm C passes over the latching groove D1 of the latch D, The arm C and the latch D can be positioned in a state before the pressing operation.
Therefore, the
Referring to FIGS. 7 and 8, the plating rack apparatus according to an embodiment of the present invention may further include a
Particularly, the
The
The sensor E may be set to be sensed while being in contact with one side of the latch D when the latch D is engaged with the arm C as shown in FIG.
The sensor E can use a limit switch. In addition, for example, the rotation state of the latch D can be easily sensed by a normal sensing method using an optical sensor or a proximity sensor.
Although not shown in the figure, the sensor E may be set to operate an alarm or a light lamp in accordance with a sensing state, for example, in an ordinary manner with an alarm or a light control lamp.
The
4 and 5, the plating rack apparatus according to the embodiment of the present invention is configured such that the rotation of the rotation operation shaft (4) is restricted by the rotation latching portion (6) The substrate G can be quickly and easily loaded or unloaded on the side of the
Particularly, such a pivoting operation mode is not shown in the drawing, for example, as compared with a method of generating and transmitting power for fixing or releasing the substrate G while directly sliding the shaft or rod in the longitudinal direction, Not only the operation can be performed but also the phenomenon of occurrence of friction (abrasion) during operation can be greatly reduced, thereby improving the problem (dust generation).
2: rack main body 4: rotation operation shaft 6:
8: sensing part G: substrate
Claims (8)
A pivoting operation shaft provided on the rack body side so as to be rotatable about an axis thereof and configured to be pressed to a side of the rack body by pressing the peripheral portion of the substrate with the pushing tool in a rotating operation;
A rotation engaging portion formed to be capable of restricting rotation of the rotation operation shaft in a state in which the substrate can be locked or unlocked while engaging contact is made according to the rotation angle of the rotation operation shaft;
/ RTI >
The rotation-
An arm provided on one side of the rotation operation shaft and moving in a rotation operation direction;
And an engaging groove corresponding to the arm and disposed on the rack main body side so that the end portion of the arm can be engaged or released in a state where the end portion of the arm is fitted or ridden on the side of the engaging groove in accordance with the rotation operation angle of the rotation operation shaft Formed;
.
The rack main body includes:
And a support portion formed so as to correspond to a circumferential portion of the substrate, wherein a support is formed at one or more points so as to support the circumferential portion of the one surface of the substrate in contact with the support portion.
The above-
And is disposed so as to be spaced apart in an axis parallel to the rack body side so as to be capable of pressing the pressing portion with the pressing portion or releasing the pressed state when the rotating portion is rotated about the axis.
The arm of the rotation locking portion
And is provided so as to be movable along a rotating direction of the pivoting operation shaft in a state fixed so as to be perpendicular to the axis of the pivoting operation shaft.
The engagement portion of the rotation-
Wherein one end of the arm is fixed to the rack body side by a hinge pin so that the end of the arm is engaged with the engaging groove side while being rotated about the hinge pin by the end contact force of the arm during the rotation operation of the rotation operation shaft, The plating rack device being set so as to be able to release the jamming state in a state in which the jamming groove is overrun.
Preferably,
Wherein one side is connected to an elastic member and is set to be elastically rotated at a certain point around the hinge pin by an elastic force of the elastic member.
The plating rack apparatus includes:
And a sensing unit corresponding to the rotation latching unit,
The sensing unit includes:
Wherein the sensor is set so as to detect a rotation state of the latching part of the rotation latching part on the side of the rack body.
The sensor includes:
Plating rack devices used in limit switches, optical sensors, and proximity sensors.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020130014676A KR20140101241A (en) | 2013-02-08 | 2013-02-08 | A Plating Rack |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020130014676A KR20140101241A (en) | 2013-02-08 | 2013-02-08 | A Plating Rack |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20140101241A true KR20140101241A (en) | 2014-08-19 |
Family
ID=51746742
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020130014676A KR20140101241A (en) | 2013-02-08 | 2013-02-08 | A Plating Rack |
Country Status (1)
Country | Link |
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KR (1) | KR20140101241A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109898121A (en) * | 2019-04-15 | 2019-06-18 | 广东长盈精密技术有限公司 | Hanging Basket is electroplated |
-
2013
- 2013-02-08 KR KR1020130014676A patent/KR20140101241A/en not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109898121A (en) * | 2019-04-15 | 2019-06-18 | 广东长盈精密技术有限公司 | Hanging Basket is electroplated |
CN109898121B (en) * | 2019-04-15 | 2020-08-18 | 广东长盈精密技术有限公司 | Electroplating hanging basket |
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |