KR20140003284A - Coating substrate, touch panel with the same and method of touch panel with the same - Google Patents

Coating substrate, touch panel with the same and method of touch panel with the same Download PDF

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Publication number
KR20140003284A
KR20140003284A KR1020120071429A KR20120071429A KR20140003284A KR 20140003284 A KR20140003284 A KR 20140003284A KR 1020120071429 A KR1020120071429 A KR 1020120071429A KR 20120071429 A KR20120071429 A KR 20120071429A KR 20140003284 A KR20140003284 A KR 20140003284A
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KR
South Korea
Prior art keywords
substrate
coating
coating layer
touch panel
solution
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KR1020120071429A
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Korean (ko)
Inventor
박형준
이진석
임종욱
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엘지이노텍 주식회사
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Priority to KR1020120071429A priority Critical patent/KR20140003284A/en
Publication of KR20140003284A publication Critical patent/KR20140003284A/en

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

Coating substrate according to an embodiment, the substrate; An antireflection layer disposed on the substrate; And a coating layer disposed on the substrate, wherein the coating layer includes an epoxy reactor.
According to an embodiment, there is provided a method of coating a substrate, comprising: preparing a substrate including a first surface, a second surface opposite to the first surface, and a third surface positioned between the first and second surfaces; Forming an anti-reflection layer on the substrate; And forming a coating layer by coating a coating solution on the second side and the third side, wherein the coating layer includes an epoxy reactor.
According to an embodiment, a touch panel may include: a substrate including a first surface, a second surface opposite to the first surface, and a third surface disposed between the first and second surfaces; An antireflection layer disposed on the substrate; A coating layer formed on the substrate; A transparent electrode disposed on the substrate and sensing an input position; And a wire for electrically connecting the transparent electrode, wherein the coating layer is disposed on the second side and the third side, and the coating layer includes an epoxy reactor.

Description

COATING SUBSTRATE, TOUCH PANEL WITH THE SAME AND METHOD OF TOUCH PANEL WITH THE SAME}

Embodiments relate to a coated substrate, a method of manufacturing the same, and a touch panel including the same.

The chemically tempered glass, which is currently used as a substrate for display panels, has an advantage in strength. However, due to micro cracks on the surface or on the side, variations in the products to which the chemically tempered glass is applied occur, resulting in lower reliability of the product. In addition, as the thickness of the substrate decreases due to the recent thinning of the display panel, there is a need for chemically strengthened glass having a high strength while maintaining a thin thickness.

In order to cover such micro cracks, the chemically strengthened glass is coated with a coating liquid. However, in general, coating liquids using silica sol have satisfactory physical properties at high temperatures of 300 ° C. or higher and at least 1 hour of curing. There is. That is, chemically strengthened glass has a disadvantage that it is impossible to apply a coating solution that requires high temperature curing.

Embodiments provide an improved coating substrate, a method of manufacturing the same, and a touch panel including the same.

According to an embodiment, a coated substrate may include: a substrate including a first surface, a second surface opposite to the first surface, and a third surface disposed between the first and second surfaces; And a coating layer disposed on the substrate, the coating layer comprising an epoxy reactor, the second side of the substrate defining an effective area and an invalid area surrounding the effective area, wherein the coating layer is an invalid area of the substrate. And the third surface.

According to an embodiment, a touch panel may include: a substrate including a first surface, a second surface opposite to the first surface, and a third surface disposed between the first and second surfaces; A coating layer disposed on the substrate, the coating layer comprising an epoxy reactor; An outer dummy layer having an effective area and an invalid area surrounding the effective area, the second surface of the substrate being disposed in the invalid area of the substrate; A transparent electrode disposed on the substrate and sensing an input position; A wiring electrically connecting the transparent electrode, wherein the coating layer is disposed on an invalid region and the third surface of the substrate.

In one embodiment, a method of manufacturing a touch panel includes preparing a substrate including a first surface, a second surface opposite to the first surface, and a third surface disposed between the first and second surfaces. ; And an effective area and an invalid area surrounding the effective area are defined on a second surface of the substrate, and forming an outer dummy layer on the invalid area of the substrate; Coating a coating solution on the non-effective region and the third surface to form a coating layer; And forming a transparent electrode on the substrate, wherein the coating layer comprises an epoxy reactor.

The coating substrate according to the embodiment includes a chemically strengthened glass and a coating layer, the coating layer may be located in the fine gap of the chemically strengthened glass. That is, the coating layer may fill the microgap. Specifically, the epoxy reactor included in the coating liquid composition may fill the microgap. In particular, the coating layer may be formed on the side of the chemically strengthened glass in which the fine gaps are distributed. Through this, it is possible to improve the strength of the chemically strengthened glass by reducing the fine cracks of the chemically strengthened glass. In particular, according to the trend of thinning, even when chemically strengthened glass is thinned, strength can be maintained through the coating layer. Moreover, the compressive stress layer of chemically strengthened glass can be maintained as it is, and reliability can be improved.

In addition, the coated substrate according to the embodiment can maintain transparency and improve transmittance, which is advantageous when applied to a substrate of a display panel.

Subsequently, the coating method of the substrate according to the embodiment may proceed at a low temperature to form a coating layer without the chemical strengthening of the chemically strengthened glass. Therefore, the strength can be further improved while maintaining the physical properties of the chemically strengthened glass. In addition, the coating liquid composition does not discolor in the process of forming the coating layer can maintain the transparency of the chemically strengthened glass as it is. Therefore, when chemically strengthened glass is used as a substrate such as a display, it is possible to increase the strength of the substrate to reduce variations in the product and to maintain transparency.

The coated substrate of the touch panel according to the embodiment includes the coated substrate according to the above-described embodiment. The coating layer may be formed only on the ineffective area and the side surface of the lower surface. On the other hand, the input tool is touched on the upper surface of the substrate. That is, by touching the input tool on the surface where the coating layer is not formed, it is possible to prevent the touch sensitivity due to the coating layer from being lowered. In addition, since no coating layer is formed in the effective region, foreign matter management can be facilitated.

In addition, a portion of the coating layer may fill the minute gap to improve the strength of the coating substrate, it is possible to reduce the product variation of the touch panel to which the coating substrate is applied. In addition, the reliability of the touch panel can be improved.

1 is a cross-sectional view of a coated substrate according to an embodiment.
2 is a perspective view of a coated substrate according to an embodiment.
3 to 6 are process flow charts for explaining the method for producing a coating liquid composition.
7 is a cross-sectional view of a touch panel according to an embodiment.

In the description of embodiments, each layer, region, pattern or structure may be “on” or “under” the substrate, each layer, region, pad or pattern. Substrate formed in ”includes all formed directly or through another layer. The criteria for top / bottom or bottom / bottom of each layer are described with reference to the drawings.

The thickness or the size of each layer (film), region, pattern or structure in the drawings may be modified for clarity and convenience of explanation, and thus does not entirely reflect the actual size.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

First, referring to Figures 1 and 2, the coating substrate according to the embodiment will be described in detail. 1 is a cross-sectional view of a coated substrate according to an embodiment. 2 is a perspective view of a coated substrate according to an embodiment.

Referring to FIG. 1, the coated substrate 100 according to the embodiment includes a substrate 10 and a coating layer 20.

The substrate 10 includes chemically strengthened glass. The chemically tempered glass comprises chemically reinforced glass. For example, the chemically strengthened glass may be soda lime glass (Na 2 O · CaO · SiO 2) or aluminosilicate glass (Na 2 O · Al 2 O 3 · SiO 2). The soda lime glass may be glass produced by a float method. The aluminosilicate glass may be produced by a fusion draw process.

The substrate 10 includes fine gaps 10a. In this case, the depth D of the microcavity 10a may be 1 μm to 10 μm, and the width W may be greater than 0 nm to 15 μm. Alternatively, the depth D of the microcavity 10a may be 1 μm to 10 μm, and the width W may be 0.0000001 μm to 15 μm.

The coating layer 20 may include an epoxy reactor. In addition, the coating layer 20 may further include a glycol. The coating liquid composition for forming the coating layer 20 will be described later in detail.

The substrate 10 may have a first surface 11, a second surface 12 (hereinafter referred to as a 'bottom surface') opposite to the first surface 11 (hereinafter referred to as an 'top surface'), and the first surface 11. And a third surface 13 (hereinafter referred to as a 'side') positioned between the second surface 12, and the coating layer 20 is disposed on the second surface 12 and the third surface 13. do. That is, referring to FIG. 1, the coating layer 20 may be disposed on the bottom surface 12 of the substrate and the side surface 13 of the substrate.

Meanwhile, referring to FIG. 2, the bottom surface 12 of the substrate 10 defines an effective area AA and an ineffective area UA surrounding the effective area AA. In this case, the coating layer 20 may be disposed in the ineffective area UA. The coating layer 20 may be disposed in the ineffective area UA.

The coating layer 20 may be located in the microcavity 10a. That is, the coating layer 20 may fill the fine gap 10a. Specifically, the epoxy reactor included in the coating liquid composition may fill the microgap 10a. That is, the coating layer 20 may fill a microcavity 10a having a depth D of 1 μm to 10 μm and a width W of more than 0 nm to 15 μm. In particular, the coating layer 20 may be formed on the side surface 13 of the chemically strengthened glass in which the fine gaps 10a are distributed. Through this, the fine gap 10a of the chemically strengthened glass can be reduced to improve the strength of the chemically strengthened glass. In particular, according to the trend of thinning, even when chemically strengthened glass is thinned, the strength may be maintained through the coating layer 20. Moreover, the compressive stress layer of chemically strengthened glass can be maintained as it is, and reliability can be improved.

In addition, the coated substrate 100 according to the embodiment may maintain transparency and improve transmittance, which is advantageous when applied to a substrate of a display panel.

The thickness T of the coating layer 20 may be 100 nm to 15 μm. When the thickness T of the coating layer 20 is less than 100 nm, the fine gap may not be well filled. In addition, when the thickness T of the coating layer 20 exceeds 15 μm, the thickness of the coating substrate 100 including the coating layer 20 may be thickened.

Hereinafter, the coating method of the substrate according to the embodiment will be described in detail. For the sake of clarity and conciseness, the same or similar parts as those described above will not be described in detail.

The method of coating a substrate according to the embodiment includes preparing a substrate and forming a coating layer.

In the preparing of the substrate, a substrate including a top surface, a bottom surface opposite to the top surface, and a side surface positioned between the top surface and the bottom surface may be prepared. In addition, the substrate may be chemically strengthened glass.

Subsequently, in the forming of the coating layer, the coating liquid composition may be coated on the chemically strengthened glass. In particular, in the step of forming the coating layer, the coating liquid composition may be coated on the side and bottom of the chemically strengthened glass. Specifically, the lower surface of the substrate may include an effective region and an ineffective region surrounding the effective region, and after forming a mask on the effective region and the upper surface of the substrate, the substrate may be coated by immersing the substrate in a coating liquid.

The coating solution composition includes a silane and a solvent.

The silane includes a silicon source, a reactive silane and a coupling agent.

The silicon source may be included in more than 0% to 50% by weight relative to the total weight of the coating liquid composition. The silicon source may be included in 0.00001% by weight to 50% by weight relative to the total weight of the coating liquid composition. The silicon source is a silica precursor, it is possible to form a coating solution composition of the silica base through the silicon source. When the silicon source is included in more than 50% by weight relative to the total weight of the coating liquid composition, it is difficult to form a coating liquid composition of excellent physical properties.

The silicon source may comprise tetraethyl orthosilicate (TEOS) or tetramethyl orthosilicate (TMOS). Preferably, the silicon source may comprise TEOS.

The reactive silane may be included in an amount of more than 0 wt% to 50 wt% based on the total weight of the coating solution composition. The reactive silane may be included in an amount of 0.00001 wt% to 50 wt% based on the total weight of the coating liquid composition. The reactive silane may react with the silicon source to form an epoxy reactor. Through the epoxy reactor, it is possible to fill the micro cracks or micro-crack of the coating material to enhance the strength of the coating material. When the reactive silane is included in excess of 50% by weight based on the total weight of the coating solution composition, the coating solution may be gelled, and coating may not be performed well.

The reactive silane is 3-glycidoxypropyltrimethoxysilane (3-GPTMS), 3-glycidoxypropyltriethoxysilane (3-GPTES), vinyltrimethoxysilane (VTMS), vinyltriethoxysilane (VTES), epoxytrimethoxysilane (ETMS), acryltrimethoxysilane (ATMS) or 3-methacryloxypropyltrimethoxysilane. Preferably, the reactive silane may comprise 3-GPTMS.

The reactive silane may react with the silicon source. For example, when the reactive silane is 3-GPTMS, the hydrolyzed silanol group (Si-OH) of the 3-GPTMS and the -OH group on the surface of the silica particles form hydrogen bonds, thereby adsorbing on the surface of the silica particles well. do.

The 3-GPTMS has a methoxy functional group which is a hydrolyzable group and an epoxy group which is an organic functional group. The methoxy functional group is hydrolyzed by water to form a silanol group (Si-OH), and serves to connect silica and 3-GPTMS by forming a hydrogen bond with an -OH group on the surface of silica particles. The epoxy group reacts with an aliphatic amine-based coupling agent to chemically bond with an organic functional group on the surface of the coating material, thereby connecting the coating material with 3-GPTMS.

Such 3-GPTMS also affects chemical bonding with the coating material, and when an appropriate amount of 3-GPTMS is added, the physical properties of the coating liquid composition may be improved. Specifically, by adding 3-GPTMS, it is possible to prevent cracking of the surface of the coating material due to capillary forces generated by evaporation of the solvent in the drying and curing process after coating the coating material. Therefore, the hardness of the coating layer can be strengthened and have excellent adhesion.

The coupling agent may be included in an amount of more than 0 wt% to 50 wt% based on the total weight of the coating liquid composition. The coupling agent may be included in an amount of 0.00001 wt% to 50 wt% based on the total weight of the coating solution composition. When the coupling agent is included in an amount of more than 50% by weight based on the total weight of the coating liquid composition, it may be difficult to form a coating liquid composition of excellent physical properties.

The coupling agent may comprise gamma-aminopropyltriethoxysilane (APTMS). The coupling agent may induce a coupling reaction of the silicon source and the reactive silane. In addition, the coupling agent may improve the dispersibility of the coating solution to improve the coating properties.

Subsequently, the solvent may include an alcohol, a discoloration preventing solution, and distilled water.

The alcohol may be included in an amount of 10% to 90% by weight based on the total weight of the coating liquid composition. The alcohol may include various alcohols such as ethanol, methanol, isopropanol, normal propanol, normal butanol or secbutanol.

The discoloration preventing solution may be included in an amount of 0.1% to 10% by weight based on the total weight of the coating liquid composition. The discoloration preventing solution may prevent discoloration of the silane. The discoloration preventing solution may react with the epoxy reactor to prevent discoloration. That is, when the coating liquid composition is coated at a high temperature of 100 ° C. or higher, discoloration of the entire coating liquid may occur due to discoloration of the silane or the reactive silane, and thus, a color of the coating material may be lost. Discoloration can be prevented through. When the discoloration preventing solution is included in less than 0.1% by weight relative to the total weight of the coating liquid composition, it may be difficult to play a role of discoloration prevention. When the discoloration preventing solution is included in more than 10% by weight relative to the total weight of the coating liquid composition, the adhesion of the coating liquid to the coating material may be reduced.

The discoloration preventing solution includes glycol. For example, the discoloration preventing solution may include ethylene glycol butyl ether (ethylene glycol butyle ether).

The distilled water (D.I water) may be included in more than 0% by weight to 10% by weight relative to the total weight of the coating liquid composition. The distilled water may be included 0.00001% to 50% by weight relative to the total weight of the coating liquid composition.

The sum of the weight percentages of the silicon source, the reactive silane, the coupling agent, the alcohol, the discoloration preventing liquid and the distilled water is 100% by weight.

Coating liquid composition according to the embodiment can fill the micro cracks or micro cracks of the coating material to reduce the micro cracks to improve the strength of the coating material. In addition, the coating liquid composition can be cured at a low temperature. Therefore, when the material to be coated is chemically tempered glass, it is possible to form a coating liquid while maintaining the tempered glass. That is, the reliability of the to-be-coated material can be improved by forming a coating liquid, maintaining the compressive stress layer of tempered glass. In addition, the coating solution composition is not discolored in the process of forming the coating solution can maintain the intrinsic color of the coating material. In particular, when the coating material on which the coating liquid is formed is applied to the substrate of the display panel, transparency can be maintained.

Hereinafter, a method of preparing the coating solution composition will be described with reference to FIGS. 3 to 6.

3 to 6 are process flow charts for explaining the method for producing a coating liquid composition according to the embodiment.

Referring to FIG. 3, the method of preparing a coating solution composition according to an embodiment includes preparing a first solution (ST100), preparing a second solution (ST200), and preparing a mixed solution (ST300). .

Referring to FIG. 4, preparing the first solution (ST100) may include mixing the first solution (ST110), adjusting the pH of the first solution (ST120), and stirring the first solution ( ST130).

In the mixing of the first solution (ST110), a silicon source, alcohol, and water may be mixed. In the mixing of the first solution (ST110), the silicon source, alcohol, and water may be mixed in a molar ratio of 1:10 to 200: 1 to 4, respectively. In this case, the molar ratio of the silicon source is determined based on the number of molecules. When the silicon source, alcohol and water do not satisfy the molar ratio, it may be difficult to prepare a coating liquid composition of excellent physical properties.

On the other hand, in the step (ST110) of mixing the first solution may be further mixed discoloration preventing liquid. The discoloration preventing solution may be included in an amount of 0.1% to 10% by weight based on the total weight of the first solution. The discoloration preventing solution may include glycol.

In the step of adjusting the pH of the first solution (ST120), the pH of the first solution may be adjusted through acid hydrolysis. In the step of adjusting the pH of the first solution (ST120), the pH may be adjusted through nitric acid, hydrochloric acid, acetic acid or phosphoric acid. In particular, the first solution may be adjusted to about pH 4 through the hydrochloric acid. When the first solution is about pH 4, the coating solution may have a stable state in which the coating solution may be coated for a long time without gelling.

In the step (ST130) of stirring the first solution, the first solution may be stirred for 10 minutes to 24 hours at room temperature. The dispersibility of the first solution may be maintained by stirring the first solution (ST130).

Subsequently, referring to FIG. 5, the preparing of the second solution (ST200) may include mixing the second solution (ST210), adjusting the pH of the second solution (ST220), and stirring the second solution. Step ST230 is included.

In the mixing of the second solution (ST210), the reactive silane, alcohol, and water may be mixed. In the mixing of the second solution (ST210), the reactive silane, alcohol, and water may be mixed in a molar ratio of 1:10 to 200: 1 to 4, respectively. In this case, the molar ratio of the reactive silane is determined based on the number of molecules. When the reactive silane, alcohol and water do not satisfy the molar ratio, it may be difficult to prepare a coating liquid composition having excellent physical properties.

On the other hand, in the step of mixing the second solution (ST210) it may be further mixed discoloration preventing liquid. The discoloration preventing solution may be included in an amount of 0.1 wt% to 10 wt% with respect to the total weight of the second solution. The discoloration preventing solution may include glycol.

In the adjusting of the pH of the second solution (ST220), the pH of the second solution may be adjusted through acid hydrolysis. In the step of adjusting the pH of the second solution (ST220), the pH may be adjusted through nitric acid, hydrochloric acid, acetic acid, or phosphoric acid. In particular, the second solution may be adjusted to about pH 4 via the hydrochloric acid. When the second solution is about pH 4, the coating solution may have a stable state in which the coating solution may be coated for a long time without gelling.

In the step (ST230) of stirring the second solution, the second solution may be stirred for 10 minutes to 24 hours at room temperature. The dispersibility of the second solution may be maintained by stirring the second solution (ST230).

Subsequently, referring to FIG. 6, preparing the mixed solution (ST300) includes preparing a premixed solution (ST310) and mixing a coupling agent (ST320).

In preparing the preliminary mixed solution (ST310), the first solution and the second solution may be mixed in a molar ratio of 1: 2 or 2: 1. When the first solution and the second solution does not satisfy the molar ratio, it may be difficult to prepare a coating liquid composition of excellent physical properties.

In the step of mixing the coupling agent (ST320), the coupling agent may be mixed such that the silicon source: the reactive silane: the coupling agent satisfies a molar ratio of greater than 1: 1: 0 to 4.

Subsequently, although not shown in the drawing, after preparing the mixed solution (ST300), the mixed solution may be stirred at room temperature for 10 minutes to 24 hours.

After the coating liquid composition prepared by the above method is formed on the lower surface and the side surface of the substrate, it may be dried and cured at a temperature of 100 ° C or more and 300 ° C or less.

That is, the process can be carried out at a low temperature to form a coating layer without the chemical strengthening of the chemically strengthened glass. Therefore, the strength can be further improved while maintaining the physical properties of the chemically strengthened glass. In addition, the coating liquid composition does not discolor in the process of forming the coating layer can maintain the transparency of the chemically strengthened glass as it is. Therefore, when chemically strengthened glass is used as a substrate such as a display, it is possible to increase the strength of the substrate to reduce variations in the product and to maintain transparency.

Hereinafter, a touch panel according to an embodiment will be described with reference to FIG. 7.

Referring to FIG. 7, the touch panel according to the embodiment includes a coating substrate 100, an outer dummy layer 200, and a transparent electrode 300. The wire 400 may be connected to the transparent electrode 300, and the printed circuit board 500 may be connected to the wire 400. The shatterproof film 600 may be formed while covering the transparent electrode 300, the wiring 400, and the printed circuit board 500.

The coating substrate 100 includes a coating substrate 100 according to the embodiment described above. The coating layer 20 may be formed only on the bottom surface 12 and the side surface 13 of the substrate 10. Specifically, the coating layer 20 may be formed only on the ineffective region UA and the side surface 13 of the lower surface 12. Meanwhile, an input tool is touched on the upper surface 11 of the substrate 10. That is, by touching the input tool on the surface where the coating layer is not formed, it is possible to prevent the touch sensitivity due to the coating layer from being lowered. In addition, since the coating layer 20 is not formed in the effective area AA, foreign matter management can be facilitated.

In addition, as described above, a portion of the coating layer 20 may fill the microcavities 10a to improve the strength of the coating substrate 100 and reduce product variation of the touch panel to which the coating substrate is applied. In addition, the reliability of the touch panel can be improved.

The outer dummy layer 200 is formed in the ineffective area UA of the substrate 10. The outer dummy layer 200 may be formed by coating a material having a predetermined color so that the wiring 400 and the printed circuit board 500, etc., formed in the ineffective area UA may not be seen from the outside. The outer dummy layer 200 may have a color suitable for a desired appearance, for example, a black pigment including black pigment and the like. A desired logo or the like can be formed on the outer dummy layer 200 by various methods. The outer dummy layer 200 may be formed by vapor deposition, printing, wet coating, or the like.

The transparent electrode 300 is formed on the lower surface 12 of the substrate 10. The transparent electrode 300 may be formed in various shapes to detect whether an input device such as a finger is in contact. In this case, in the portion where the outer dummy layer 200 is formed, the transparent electrode 300 may be formed on the outer dummy layer 200.

When such an input device such as a finger touches the touch panel, a difference in capacitance occurs at a portion where the input device is contacted, and a portion where the difference occurs can be detected as the contact position. In the exemplary embodiment, the transparent electrode 300 has a structure applied to the capacitive touch panel, but is not limited thereto. Therefore, the transparent electrode 300 may be formed in a structure applied to the resistive touch panel.

The transparent electrode 300 may include a transparent conductive material to allow electricity to flow without disturbing the transmission of light. To this end, the transparent electrode 300 may be formed of indium tin oxide, indium zinc oxide, copper oxide, tin oxide, zinc oxide, or titanium oxide. Metal oxides such as titanium oxide), carbon nanotubes (CNT), and various materials such as conductive polymer materials may be included.

The transparent electrode 300 may be formed by various thin film deposition techniques such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). For example, it may be formed by reactive sputtering, which is an example of physical vapor deposition. In this case, when the transparent electrode 300 is formed of indium tin oxide, the content of tin may be 10% or less. As a result, the transmittance may be improved, and then the indium tin compound may be crystallized by an annealing process to improve electrical conductivity. However, the embodiment is not limited thereto, and the transparent electrode 300 may be formed in various ways.

A wiring 400 connected to the transparent electrode 300 and a printed circuit board 500 connected to the wiring 400 are formed as the non-effective area UA of the substrate 10. Since the wire 400 is located in the ineffective area UA, the wire 400 may be made of a metal having excellent electrical conductivity. Various types of printed circuit boards may be applied to the printed circuit board 500. For example, a flexible printed circuit board (FPCB) may be applied.

The scattering prevention film 600 may be formed while covering the transparent electrode 300, the wiring 400, and the printed circuit board 500. The anti-scattering film 600 is to prevent the debris from scattering when the touch panel is broken by an impact, and may be formed of various materials and structures. In the embodiment illustrated that the anti-scattering film 600 is located on the lower surface 12 side of the coating substrate 100. However, embodiments are not limited thereto, and the anti-scattering film 600 may be formed at various positions.

The features, structures, effects and the like described in the foregoing embodiments are included in at least one embodiment of the present invention and are not necessarily limited to one embodiment. Further, the features, structures, effects, and the like illustrated in the embodiments may be combined or modified in other embodiments by those skilled in the art to which the embodiments belong. Therefore, it should be understood that the present invention is not limited to these combinations and modifications.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is clearly understood that the same is by way of illustration and example only and is not to be construed as limiting the scope of the present invention. It can be seen that various modifications and applications are possible. For example, each component specifically shown in the embodiments may be modified. It is to be understood that the present invention may be embodied in many other specific forms without departing from the spirit or essential characteristics thereof.

Claims (21)

A substrate including a first surface, a second surface opposite to the first surface, and a third surface located between the first and second surfaces; And
A coating layer disposed on the substrate, the coating layer comprising an epoxy reactor,
A second surface of the substrate is defined with an effective area and an invalid area surrounding the effective area,
The coating layer is a coating substrate disposed on the non-effective region and the third surface of the substrate. The method of claim 1,
The substrate includes a microgap,
A portion of the coating layer is a coating substrate located in the fine gap. 3. The method of claim 2,
The epoxy reactor is a coating substrate located in the fine gap. 3. The method of claim 2,
The depth of the microcavity is 1 ㎛ to 10 ㎛, the width is greater than 0 nm to 15 ㎛ coated substrate. The method of claim 1,
The coating layer has a thickness of 100 nm to 15 ㎛ coated substrate. The method of claim 1,
The coating layer further comprises a coating substrate glycol. The method of claim 1,
The substrate is a coated substrate comprising chemically strengthened glass. A substrate including a first surface, a second surface opposite to the first surface, and a third surface located between the first and second surfaces;
A coating layer disposed on the substrate, the coating layer comprising an epoxy reactor;
A second surface of the substrate is defined with an effective area and an invalid area surrounding the effective area,
An outer dummy layer disposed in the ineffective region of the substrate;
A transparent electrode disposed on the substrate and sensing an input position;
A wire for electrically connecting the transparent electrode;
The coating layer is disposed on the non-effective region and the third surface of the substrate. 9. The method of claim 8,
The touch panel touches the input tool on the first surface. 9. The method of claim 8,
The substrate includes a microgap,
A part of the coating layer is located in the microgap. 9. The method of claim 8,
The coating layer further comprises a glycol. The method of claim 10,
The microcavity has a depth of 1 μm to 10 μm, and a width of more than 0 nm to 15 μm. Preparing a substrate comprising a first side, a second side opposite to the first side, and a third side positioned between the first side and the second side; And
A second surface of the substrate is defined with an effective area and an invalid area surrounding the effective area,
Forming an outer dummy layer in an invalid region of the substrate;
Coating a coating solution on the non-effective region and the third surface to form a coating layer; And
Forming a transparent electrode on the substrate;
The coating layer is a method of manufacturing a touch panel comprising an epoxy reactor. The method of claim 13,
In the step of forming the coating layer,
And forming a mask on effective areas of the first and second surfaces of the substrate, and then immersing the substrate in a coating liquid. 15. The method of claim 14,
In the step of forming the coating layer is a method of manufacturing a touch panel which is coated at a temperature of 100 ° C or more and 300 ° C or less. 15. The method of claim 14,
The coating solution is a method of manufacturing a touch panel comprising a silicon source, a reactive silane and a coupling agent. 17. The method of claim 16,
The silicon source is a method of manufacturing a touch panel comprising any one selected from the group consisting of tetraethyl orthosilicate (TEOS) and tetramethyl orthosilicate (TMOS). 17. The method of claim 16,
The reactive silane is 3-glycidoxypropyltrimethoxysilane (3-GPTMS), 3-glycidoxypropyltriethoxysilane (3-GPTES), vinyltrimethoxysilane (VTMS), vinyltriethoxysilane (VTES), epoxy trimethoxysilane (ETMS), acryltrimethoxysilane (ATMS) and 3-methacryloxypropyl trimethoxysilane manufacturing method of a touch panel comprising any one selected from the group consisting of. 17. The method of claim 16,
The coupling agent manufacturing method of a touch panel comprising gamma-aminopropyltriethoxysilane (APTMS). The method of claim 13,
The coating liquid further comprises a color change prevention liquid,
The discoloration preventing solution is a manufacturing method of the touch panel comprises 0.1% by weight to 10% by weight relative to the total weight of the coating liquid. 21. The method of claim 20,
The discoloration preventing solution is a method of manufacturing a touch panel containing glycol.
KR1020120071429A 2012-06-29 2012-06-29 Coating substrate, touch panel with the same and method of touch panel with the same KR20140003284A (en)

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