KR20130066138A - Sensor having nano channel structure and method for preparing the same - Google Patents

Abstract

PURPOSE: A sensor with a nanochannel structure and a manufacturing method thereof are provided to manufacture a channel for the sensor by applying an ion bombardment phenomenon caused by physical ion etching, thereby manufacturing the ultra-fine nanochannel structure having various line widths and shapes at low costs through a simple process simultaneously with a line width of a maximum 10nm level. CONSTITUTION: A manufacturing method of a sensor with a nanochannel structure is as follows. A target material layer and a polymer layer are successively formed on a substrate(10). A lithographic process is performed on the polymer layer so that a patterned polymer structure is formed. The target material layer is ion-etched so that a target material-polymer composite structure(25) in which the ion-etched target material is attached on the outer circumference of the polymer structure. A polymer of the target material-polymer composite structure is removed so that the nanochannel structure is manufactured on the substrate.

Description

Sensor having nano channel structure and method for preparing the same

The present invention relates to a sensor having a nanochannel structure and a method of manufacturing the same, and more particularly, to an ion bombardment phenomenon through a physical ion etching process on an outer circumferential surface of a patterned polymer structure. After forming the target material-polymer composite structure to which the material is attached, a nanochannel structure is prepared by removing the polymer of the target material-polymer composite structure, and the nanochannel structure is improved by applying the prepared nanochannel structure. A sensor having a channel structure and a method of manufacturing the same.

Micromechanical technology, designed to develop microphysical and chemical sensors and mechanical drive devices, has been developed for RLC passive components, high frequency devices, flat panel displays, and key components for optical communication networks. The scope of application is expanding day by day.

In particular, microfluidics have recently been used for the analysis of trace amounts of DNA sequencing, protein function, biometabolites and reactants in the life sciences, genetic engineering, medical diagnostics, and drug development. As a result, fluid MEMS technology for miniaturization and high performance has been actively studied. Dual lab-on-a-chip (lab-on-a-chip) is being developed as a fluid platform for the integration and systemization of biochips, such as DNA chips, protein chips, immunoassay (immuno assay) devices. These devices perform the functions of separating, extracting, filtering, mixing, and transporting reactants, liquids, and microparticles using the principle of electrophoresis or dielectrophoresis mainly through microelectrodes. It consists of a fluid network based on a structure.

On the other hand, in order to implement a micro-PCR amplifying apparatus, a micro-reactor, etc., a high-efficiency micro-heater is additionally required for rapid heating of reagents, gases or liquids. The microchannel structure interconnects microfluidic components such as micro pumps, micro valves, and sensors in micro total analysis systems, drug delivery devices, and high performance liquid chromatography (HPLC). In addition, it is used as a separation column, and is applied as a heat sink and a heat exchanger part for cooling electronic parts such as a CPU, an infrared device, and a high power semiconductor laser.

Such microchannels have various applications such as bulk micromachining or polymer micromachining, which mainly focuses on the processing and bonding of the substrate itself, which is MEMS technology, and thin films that are laminated and etched on top of the substrate. It is manufactured by surface micromachining which is mainly a technique.

For example, silicon, glass, and quartz substrates are locally processed by etching solutions, dry etching, and laser cutting to form channel patterns, and other substrates are attached on top of them by anode, melting, diffusion bonding, soldering, and the like. Seal the microchannels.

In another form, a thick polymer film is coated on a substrate and irradiated with UV light to form a channel pattern, and then another substrate is adhered thereon, or a polymer film is applied and an etching hole is patterned to remove the lower sacrificial layer polymer. Form a channel. There is a method of filling a portion where a channel is to be formed by using an oxide film or a photoresist film as a sacrificial layer on a silicon substrate, depositing or electroplating a thin film for the channel outer wall thereon, and then removing the sacrificial layer with an etchant to complete the microchannel. In addition, there is a method of patterning a thin masking thin film on the substrate in the form of a slot, thereby anisotropically etching the substrate with an etching solution to form a channel region, and depositing a thin film to seal the inlet.

The above-mentioned conventional technique forms microchannels by bonding another substrate on a substrate on which the channel pattern is etched or on a thick polymer film to form micropores at the bonding interface, and it is difficult to control the channel size. There is a disadvantage that it is difficult to apply to the production of ultra-fine microchannels of several tens of micrometers or less. In addition, since two substrates are used, the manufacturing process is complicated, and it is difficult to freely select a channel forming material, and it is difficult to form additional structures such as sensors, actuators, passive devices, and electronic devices on the microchannel by a semiconductor integrated process. have. In addition, in the case of using a sacrificial layer deposited or coated on a silicon substrate, it is difficult to deposit several micrometers or more of the sacrificial layer thin film by a semiconductor process, so the channel depth is extremely thin and the subsequent exposure process is affected by the channel pattern step. Will receive. In the conventional method of forming a channel inside a substrate, there is a problem in that the channel shape is determined by the difference in etching rate according to the determination of the substrate and a channel having a relatively large size of several tens of micrometers in width is formed.

All of these methods focus only on the formation of a single or several microchannels themselves, and have not been applied to fabrication of ultra-fine microchannel arrays by semiconductor processes and integration of additional device structures using the same.

Accordingly, the present inventors have made diligent efforts to solve the problems of the prior art. As a result, the target material is attached to the target material using an ion bombardment phenomenon through a physical ion etching process on the outer circumferential surface of the patterned polymer structure. When the polymer composite structure is formed, and then the polymer of the target material-polymer composite structure is removed to prepare the ultrafine nanochannel structure, the ultrafine nanochannel structure having various line widths and shapes, and having a line width of up to 10 nm level At the same time, it was confirmed that the sensitivity of the sensor can be improved by using the ultra-fine nanochannel structure, thereby completing the present invention.

An object of the present invention is to provide an ultra-fine nanochannel structure having a variety of line widths and shapes, having a line width of up to 10nm level and a method of manufacturing the same.

In addition, another object of the present invention is to provide a sensor with improved sensitivity having an ultra-fine nanochannel structure manufactured by the manufacturing method.

In order to achieve the above object, the present invention comprises the steps of (a) sequentially forming a target material layer and a polymer layer on the substrate; (b) performing a lithography process on the polymer layer to form a patterned polymer structure; (c) ion etching the target material layer to form a target material-polymer composite structure having an ion-etched target material attached to an outer circumferential surface of the polymer structure; And (d) removing the polymer of the target material-polymer composite structure to produce a nanochannel structure on a substrate, and provides a method of manufacturing a nanochannel structure and a nanochannel structure manufactured by the method. .

The present invention also includes the steps of: (a) forming a polymer layer on a substrate, and then forming a patterned polymer structure through a lithography process; (b) forming a target material layer on the substrate on which the patterned polymer structure is formed; (c) ion etching the target material layer to form a target material-polymer composite structure having the target material ion-etched on the outer circumferential surface of the polymer structure; And (d) removing the polymer of the target material-polymer composite structure to produce a nanochannel structure on a substrate, and provides a method of manufacturing a nanochannel structure and a nanochannel structure manufactured by the method. .

The present invention also comprises the steps of (a) sequentially forming a target material layer and a polymer layer on the substrate; (b) performing a lithography process on the polymer layer to form a patterned polymer structure; (c) ion etching the target material layer to form a target material-polymer composite structure having an ion-etched target material attached to an outer circumferential surface of the polymer structure; (d) removing the polymer of the target material-polymer composite structure to form a nanochannel structure on the substrate; (e) depositing an electrode on the substrate on which the nanochannel structure is formed; And (f) fixing a receptor coupled to the analyte inside the nanochannel structure to manufacture a sensor provided with the nanochannel structure, the method of manufacturing a sensor provided with the method of manufacturing a nanochannel structure and the manufacturing method. It provides a sensor manufactured by.

The present invention also includes the steps of: (a) forming a polymer layer on a substrate, and then forming a patterned polymer structure through a lithography process; (b) forming a target material layer on the substrate on which the patterned polymer structure is formed; (c) ion etching the target material layer to form a target material-polymer composite structure having the target material ion-etched on the outer circumferential surface of the polymer structure; (d) removing the polymer of the target material-polymer composite structure to form a nanochannel structure on the substrate; (e) depositing an electrode on the substrate on which the nanochannel structure is formed; And (f) fixing a receptor coupled to the analyte inside the nanochannel structure to produce a sensor provided with the nanochannel structure, by the method of manufacturing a sensor with a nanochannel structure and by the manufacturing method. It provides a manufactured sensor.

According to the present invention, by fabricating a channel for the sensor by applying the ion bombardment phenomenon through physical ion etching, an ultra-fine nanochannel structure having various line widths and shapes at the same time and a maximum line width of 10 nm at a simple process and low cost is produced. Because it can be manufactured, it can be usefully used for a sensor requiring excellent sensitivity.

1 is a manufacturing process diagram of a nanochannel structure according to an embodiment of the present invention.
2 is a schematic diagram of an ion etching process according to the present invention.
3 is a manufacturing process diagram of a nanochannel structure according to another embodiment of the present invention.
4 is a manufacturing process diagram of a sensor provided with a nanochannel structure according to the present invention.
5 is a SEM photograph of a nanochannel structure prepared by the method according to the present invention, (a) is a 30,000 magnification photograph, (b) is a 50,000 magnification photograph, (c) is a 150,000 magnification photograph, and (d) 400,000 magnification pictures.
6 is a schematic diagram of an apparatus for measuring the performance of a sensor with a nanochannel structure according to the present invention.

DETAILED DESCRIPTION Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. In describing the present invention, detailed descriptions of related well-known functions or configurations are omitted in order not to obscure the subject matter of the present invention.

Throughout this specification, it is to be understood that when a layer or member is "on" another layer or member, it is not only the case where a layer or member is in contact with another layer or member, Or < / RTI > another member is present. Also, when an element is referred to as "comprising ", it means that it can include other elements as well, without departing from the other elements unless specifically stated otherwise.

As used herein, the terms "about", "substantially", and the like, are used at, or in close proximity to, numerical values when manufacturing and material tolerances inherent in the meanings indicated are intended to aid the understanding of the invention. It is used to help prevent unscrupulous infringers from unscrupulous disclosures where accurate or absolute figures are mentioned to help.

The present invention in one aspect, (a) sequentially forming a target material layer and a polymer layer on the substrate; (b) performing a lithography process on the polymer layer to form a patterned polymer structure; (c) ion etching the target material layer to form a target material-polymer composite structure having an ion-etched target material attached to an outer circumferential surface of the polymer structure; And (d) removing the polymer of the target material-polymer composite structure to produce a nanochannel structure on the substrate.

The core idea of the present invention utilizes an ion bombardment phenomenon in which particles of a physically impacted target material are separated and bounced out in all directions, and particles of the target material bounced from the target material layer can be attached to the outer circumferential surface. After the patterned polymer structure is formed, the polymer is removed from the target material-polymer composite structure formed by attaching particles of the target material separated by the ion bombardment phenomenon. To prepare a nanochannel structure having.

More specifically, the method of manufacturing a nanochannel structure according to the present invention, as shown in Figure 1, by sequentially applying a target material and a polymer on the substrate 10 and the target material layer 15 on the substrate 10 A layer of polymer 20 is formed (FIG. 1A). In this case, the substrate 110 may be used as long as the material does not cause physical deformation due to the temperature and pressure of the lithography process, preferably selected from the group consisting of silicon, silicon oxide, quartz, glass, and mixtures thereof. do.

The target material refers to a material forming the nanochannel structure, which is a final product, and is a polycrystalline material that can be separated in various directions to apply an ion bombardment phenomenon through physical ion etching, which will be described later. Preferably gold, platinum, silver, copper, aluminum, zinc oxide, chromium, silicon dioxide, indium tin oxide and mixtures thereof.

The polymer may be used as the polymer that can be used in the lithography process, and is preferably selected from the group consisting of polystyrene, chitosan, polyvinylalcohol, polymethylmethacrylate (PMMA), and mixtures thereof.

In the present invention, among the methods of sequentially forming the target material 15 layer and the polymer 20 layer on the substrate 10, the method of forming the target material layer 15 is generally chemical vapor deposition (CVD). Selected from the group consisting of atomic layer deposition, sputtering, laser ablation, arc-discharge, plasma deposition, thermochemical vapor deposition and electron beam vapor deposition. The method is carried out by a method, and the method of forming the polymer layer is formed by spin coating or spray coating.

In addition, in the present invention, the target material layer 15 may be formed in multiple layers according to the purpose, use, etc. of the nanochannel structure as a final result.

As described above, the polymer layer formed on the target material 15 layer forms a patterned polymer 20 structure by using a lithography process (FIG. 1B) such as a mold for nanoimprint 30 (FIG. 1C). . In this case, since the shape of the polymer structure determines the shape of the nanochannel, nanochannel structures having various shapes and sizes can be easily manufactured by controlling the shape of the polymer structure by various lithography processes.

The lithography process may be a conventional lithography process, preferably carried out by at least one method selected from the group consisting of nanoimprint, soft lithography, block copolymer lithography, optical lithography and capillary lithography.

In particular, the patterned polymer structure using the lithography process can be further adjusted in various shapes and sizes depending on the reactive ion etching (RIE) conditions and the polymer layer around the patterned polymer structure. For example, reactive ion etching under high vacuum of 0.1 to 0.001 mTorr is only anisotropic, i.e., only at the bottom, but reactive ion etching under low vacuum of 0.01 to 0.1 Torr isotropic, i. Further ion etching of the structure under low vacuum reduces the overall height and diameter of the patterned polymer structure. Thus, all of the polymer layer around the patterned polymer structure is removed, leaving only the patterned polymer structure (FIG. 1D).

In addition, the size control of the patterned polymer structure can be controlled by the thickness of the polymer layer coated on the substrate. If the thickness of the polymer layer is thin, the polymer layer disappears during the short reactive ion etching time and only the patterned polymer structure remains, and the cup-shaped polymer structure pattern is formed in a short time. By performing ion etching, the polymer structure is etched as a whole, thereby reducing the overall size of the polymer structure pattern, thereby producing a pattern having a small diameter of the polymer structure.

In the present invention, the target material-polymer composite structure 25 is a target material on the outer circumferential surface of the polymer 20 structure formed as described above by applying ion bombardment through physical ion etching of the target material. (15) It forms by adhering particle | grains (FIG. 1E).

As shown in FIG. 2, the ion bombardment phenomenon accelerates ions, such as argon ions, by a voltage difference to apply a physical impact to the target material layer 15, thereby causing particles of the target material 15 to be impacted. It refers to a phenomenon in which a high energy impact is torn off in the crystal direction.

In the present invention, a physical ion etching method for generating an ion bombardment phenomenon is performed by ion milling. The ion milling applies a high energy to the hard ions to reduce the wide angle distribution in the polycrystalline direction when the ion bombardment phenomenon is carried out, so that the angle of the deviated and bounced is small, the target material on the outer peripheral surface of the patterned polymer structure (15) Since the adhesion of the particles is difficult, preferably plasma is formed by using a gas such as argon gas under a process pressure of 0.1 mTorr to 10 mTorr, and then the plasma is accelerated to 200 eV to 1,000 eV to perform a physical ion etching process. .

If, in the physical ion etching process, the ion etching is performed by accelerating to plasma exceeding 1,000 eV, the angle at which the target material is separated and bounced off into the target material layer is bounced vertically as the direction in which the ions are incident. In the case where the amount of adhesion is small and the ion etching is performed by accelerating the plasma to less than 200 eV, the etching rate of the target material layer is slow, resulting in a decrease in working efficiency.

In the present invention, the heavy gas is selected from the group consisting of argon, helium, nitrogen, hydrogen, oxygen, and a mixed gas thereof, preferably argon.

The target material-polymer composite structure 25 formed as described above removes only the polymer 20 by dry or wet etching to produce a nanochannel structure (FIG. 1F). The dry or wet etching is performed by a conventional etching method capable of removing the polymer.

In addition, the method for manufacturing a nanochannel structure according to the present invention is to produce the desired patterned nanochannel structure 35 by manufacturing the nanochannel structure, and then ion-etched the unnecessary target material portion of the prepared nanochannel structure. (FIG. 1G).

The method of manufacturing a nanochannel structure according to the present invention is manufactured by using the ion bombardment phenomenon through physical ion etching, thereby producing a nanochannel structure having a large aspect ratio and uniformity in a simple process and low cost. By controlling the pattern of the polymer structure, it is easy to manufacture various structures and at the same time can form a uniform ultra-fine nanochannel structure having a thickness of 10 nm.

In another aspect, the present invention provides a method of forming a polymer layer on a substrate, the method comprising: (a) forming a polymer layer on a substrate and then forming a patterned polymer structure through a lithography process; (b) forming a target material layer on the substrate on which the patterned polymer structure is formed; (c) ion etching the target material layer to form a target material-polymer composite structure having the target material ion-etched on the outer circumferential surface of the polymer structure; And (d) removing the polymer of the target material-polymer composite structure to produce a nanochannel structure on the substrate.

As shown in FIG. 3, in the method for manufacturing a nanochannel structure according to the present invention, a polymer 20 layer is coated on a substrate 10 (FIG. 3A), and then the patterned polymer is subjected to a lithography process (FIG. 3B). (20) A structure is formed (FIG. 3C). The target material layer 15 is formed on the substrate on which the patterned polymer 20 structure is formed (FIG. 3D), and the target material particles are physically ion-etched to form the target material particles in the bombardment phenomenon. It is attached to the outer circumferential surface to form the target material-polymer structure 25 (FIG. 3E). The nanochannel structure is manufactured by removing only the polymer 20 of the target material-polymer structure 25 thus formed (FIG. 3F).

In the case of manufacturing by the manufacturing method as described above, there is an advantage that it is not necessary to add a step of removing the target material 15 other than the nanochannel structure after the nanochannel structure is manufactured.

In yet another aspect, the present invention relates to a nanochannel structure, which is prepared by the above method, wherein the nanochannel of the nanochannel structure has a line width of 10 to 20 nm and a height of 10 nm to 200 nm.

The nanochannel structure according to the present invention can ionically etch a target material layer having a small thickness in the range of 20 nm to 50 nm, thereby making it possible to uniformly manufacture a nanochannel having a height of 10 nm to 200 nm and a width of 10 to 20 nm, thereby increasing the surface area. In addition, the height can be easily adjusted through additional etching, so that the surface area can also be increased, which can be useful for miniaturizing and integrating the sensor.

In still another aspect of the present invention, there is provided a method of manufacturing a semiconductor device, the method comprising: (a) sequentially forming a target material layer and a polymer layer on a substrate; (b) performing a lithography process on the polymer layer to form a patterned polymer structure; (c) ion etching the target material layer to form a target material-polymer composite structure having an ion-etched target material attached to an outer circumferential surface of the polymer structure; (d) removing the polymer of the target material-polymer composite structure to form a nanochannel structure on the substrate; (e) depositing an electrode on the substrate on which the nanochannel structure is formed; And (f) fixing a receptor coupled to the analyte inside the nanochannel structure to manufacture a sensor provided with the nanochannel structure.

In still another aspect, the present invention provides a method for forming a polymer layer on a substrate, the method comprising: forming a patterned polymer structure through a lithography process; (b) forming a target material layer on the substrate on which the patterned polymer structure is formed; (c) ion etching the target material layer to form a target material-polymer composite structure having the target material ion-etched on the outer circumferential surface of the polymer structure; (d) removing the polymer of the target material-polymer composite structure to form a nanochannel structure on the substrate; (e) depositing an electrode on the substrate on which the nanochannel structure is formed; And (f) fixing a receptor coupled to the analyte inside the nanochannel structure to manufacture a sensor provided with the nanochannel structure.

In the method of manufacturing a sensor with a nanochannel structure according to the present invention, as shown in FIG. 4, the electrode 45 is deposited around the nanochannel structure 35 (FIG. 4A) manufactured by the above-described method, and the nano The sensor 40 is manufactured by fixing the receptor 40 coupled to the analyte inside the channel structure 35 (FIG. 4B).

The analyte 50 to be detected in the above can be any material that can be bound to the receptor, without limitation, derivatives including ozone, carbon monoxide, sulfur oxide gas, nitric oxide gas, heavy metal, benzene ring or these Gases, derivatives containing alkyl chains or their gases, enzymes, proteins, nucleic acids, oligosaccharides, amino acids, carbohydrates, dissolved ammonia, dissolved oxygen, or water-soluble gases containing dissolved hydrogen peroxide, dissolved oxytetracycline, dissolved tetracycline , Soluble ibuprofen, and a substance comprising diclofenac, estradiol, bisphenol A, nonylphenol, chloramphenicol, carbofuran, di (2-ethylhexyl) phthalate (DEHP), or endosulfan It is preferably one or more selected from, but is not limited thereto.

The receptor 40 that binds to the analyte is selected from the group consisting of enzyme substrates, ligands, amino acids, peptides, proteins, nucleic acids, lipids and carbohydrates, attached to the nanochannel structure by a functional group, or attached to the nanomaterials. And immobilized inside the nanochannel structure. In this case, the functional group is preferably any one or more selected from the group consisting of an amine group, a carboxyl group, and a thiol group, but is not limited thereto.

On the other hand, the nanomaterial is combined with the receptor 40 to increase the reaction area and serves to improve the sensitivity to the material to be measured, such as metal nanoparticles such as gold, platinum, palladium, cobalt, silicon, silicon oxide, Non-metal nanoparticles such as polystyrene, quantum dots (quantum dot), etc., but composed of graphene, but can be attached to the receptor, can be used in the form of a film, if it can be used without limitation.

The receptor 40 as described above may be immobilized with a different receptor on each nanochannel structure, wherein the immobilization method is a drop casting method, a dip coating method, and a vapor deposition method. You can.

 Meanwhile, in the present invention, the electrode 45 is connected to an external signal applying circuit and a detection circuit to serve as an adhesive point for observing a change in electrical characteristics from the outside, and physically generated inside the nanochannel structure. Chemical reactions result in a change in electrical properties that can be detected externally through the point of attachment to the outside, the electrode. The electrode is deposited around the channel, and the deposition method is performed by a method selected from the group consisting of a chemical vapor deposition method, a printing method, a vapor deposition method, and a sputtering method. It is usable and can be coated with a polymer to minimize leakage currents.

In still another aspect, the present invention relates to a sensor manufactured by the above method, wherein the nanochannel of the nanochannel structure has a width of 10 to 20 nm and a height of 10 nm to 200 nm.

The sensor equipped with the nanochannel structure according to the present invention has a nanochannel having a height of 10 nm to 200 nm and a width of 10 nm to 20 nm, and is mostly due to a line width smaller than the mean free path of free electrons. As the electrons move through the channel surface, not only the small amount of analyte can detect the target material to be detected very sensitively, but also the nanochannel structure can be assembled into a matrix-aligned array on the substrate surface, thus providing various processing. It can be applied as an array of sensors that can simultaneously detect various materials through. Such biosensors can be usefully used for cancer diagnosis, blood glucose measurement, harmful virus detection, environmentally harmful substances detection, and the like.

Having described specific portions of the invention in detail, those skilled in the art will appreciate that these specific embodiments are merely preferred embodiments and that the scope of the invention is not limited thereby will be. It is therefore intended that the scope of the invention be defined by the claims appended hereto and their equivalents.

Example  1: Fabrication of Sensor with Nanochannel Structure

1-1: Preparation of Nanochannel Structure

Gold was deposited on a glass substrate to a thickness of 20 nm using an electron-beam evaporation method, followed by spin coating a polystyrene (5 wt%) / toluene mixture, followed by evaporation of toluene to form a polystyrene layer having a thickness of 200 nm. The formed polystyrene layer was formed using a mold for nanoimprint in which a rectangular parallelepiped shape was engraved to form a polystyrene structure having a thickness of 400 nm and having a thickness of 1 mm (length) × 400 nm (height) × 400 nm (width). The mold for nanoimprint was removed and cooled to form a patterned polystyrene structure. The polystyrene layer other than the polystyrene structure thus formed was removed by reactive ion etching in which oxygen and tetrafluoromethane were injected at 40:60, and then the left-sided 'c'-shaped 1 mm (length) was formed on the glass substrate. ) Three-dimensional gold nanostructures having a thickness of 200 nm (height) × 400 nm (width) and a thickness of 15 nm were prepared, and then ion milling was applied to form a linear shape of 1 mm (length) × 200 nm (height) × 15 nm (width). Nano channel structures were prepared (FIG. 5).

1-2: Fabrication of Sensor with Nanochannel Structure

After fabricating the substrate on which the nanochannel structure is manufactured in the form of an array, one chip was used, and then a mask mask was used to raise an electrode on the nanochannel structure. The mask is designed in such a way that only the ends of the pattern are open, and the mask is placed on the fabricated nanochannel structure and gold is deposited using an MHS 1800 Evaporation System to form electrodes at both ends of the nanochannel structure. It was. The nanochannel structure was prepared by attaching 4-methoxy-toluenethiol, 2-mercaptobenzoxazole and 11-mercapto-1-undecanthiol to the nanochannel structure on which the electrode was formed using drop-casting. It was.

Experimental Example  1: Measurement of resistance change of a sensor equipped with a nanochannel structure

In order to evaluate the performance of the manufactured sensor, the sensor of Example 1 was mounted in a socket capable of measuring resistance (FIG. 6). The resistance measuring socket is located in a chamber that can flow a specific substance into the vaporized state, and flows a gas mixed with water, oxygen, and carbon dioxide to check the analyte detection performance in actual exhalation, and measures the resistance change of the sensor. It was.

As a result, it can be seen that the resistance value of the sensor is sensitively changed according to the introduction of the mixed gas. When the nanochannel structure according to the present invention is used, it can be seen that a high-performance chemical sensor can be realized.

Having described specific portions of the invention in detail, those skilled in the art will appreciate that these specific embodiments are merely preferred embodiments and that the scope of the invention is not limited thereby will be. It is therefore intended that the scope of the invention be defined by the claims appended hereto and their equivalents.

10: substrate 15: target material
20: polymer 25: target substance-polymer composite structure
30: mold for nanoimprint 35: nanochannel structure
40: receptor 45: electrode
50: analyte

Claims (21)

A method of making a nanochannel structure, comprising the following steps:
(a) sequentially forming a target material layer and a polymer layer on the substrate;
(b) performing a lithography process on the polymer layer to form a patterned polymer structure;
(c) ion etching the target material layer to form a target material-polymer composite structure having an ion-etched target material attached to an outer circumferential surface of the polymer structure; And
(d) manufacturing a nanochannel structure on a substrate by removing the polymer of the target material-polymer composite structure.
A method of making a nanochannel structure, comprising the following steps:
(a) forming a polymer layer on the substrate, and then forming a patterned polymer structure through a lithography process;
(b) forming a target material layer on the substrate on which the patterned polymer structure is formed;
(c) ion etching the target material layer to form a target material-polymer composite structure having the target material ion-etched on the outer circumferential surface of the polymer structure; And
(d) manufacturing a nanochannel structure on a substrate by removing the polymer of the target material-polymer composite structure.
The method of manufacturing a nanochannel structure according to claim 1 or 2, wherein the target material is a polycrystalline material.
The nanochannel structure of claim 3, wherein the target material is selected from the group consisting of gold, platinum, silver, copper, aluminum, zinc oxide, chromium, silicon dioxide, indium tin oxide, and mixtures thereof. Way.
The method of claim 1 or 2, wherein the substrate is selected from the group consisting of silicon, silicon oxide, quartz, glass, and mixtures thereof.
The method of claim 1 or 2, wherein the polymer is selected from the group consisting of polystyrene, chitosan, polymethylmethacrylate, polyvinyl alcohol, and mixtures thereof.
The lithographic process of claim 1, wherein the lithographic process of step (b) is performed by at least one method selected from the group consisting of nanoimprint, soft lithography, photolithography, block copolymer lithography and capillary lithography. Method of manufacturing a nanochannel structure.
The lithographic process of step (a) is characterized in that it is carried out by at least one method selected from the group consisting of nanoimprint, soft lithography, photolithography, block copolymer lithography and capillary lithography. Method of manufacturing a nanochannel structure.
The method of claim 1, wherein the ion etching of step (c) is performed by ion milling.
The method of claim 9, wherein the ion milling is performed by forming a plasma using a gas under a process pressure of 0.1 mTorr to 10 mTorr, and then accelerating the plasma to 200 eV to 1,000 eV. .
The method of claim 10, wherein the gas is selected from the group consisting of argon, helium, nitrogen, oxygen, and mixtures thereof.
The method of claim 1 or 2, wherein the removing of the polymer of step (d) is performed by dry etching or wet etching.
The nanochannel structure of claim 1 or 2, wherein the nanochannel of the nanochannel structure has a width of 10 to 20nm and a height of 10nm to 200nm.
A method for manufacturing a sensor equipped with a nanochannel structure, comprising the following steps:
(a) sequentially forming a target material layer and a polymer layer on the substrate;
(b) performing a lithography process on the polymer layer to form a patterned polymer structure;
(c) ion etching the target material layer to form a target material-polymer composite structure having an ion-etched target material attached to an outer circumferential surface of the polymer structure;
(d) removing the polymer of the target material-polymer composite structure to form a nanochannel structure on the substrate;
(e) depositing an electrode on the substrate on which the nanochannel structure is formed; And
(f) manufacturing a sensor having a nanochannel structure by fixing a receptor coupled with an analyte inside the nanochannel structure.
A method for manufacturing a sensor equipped with a nanochannel structure, comprising the following steps:
(a) forming a polymer layer on the substrate, and then forming a patterned polymer structure through a lithography process;
(b) forming a target material layer on the substrate on which the patterned polymer structure is formed;
(c) ion etching the target material layer to form a target material-polymer composite structure having the target material ion-etched on the outer circumferential surface of the polymer structure;
(d) removing the polymer of the target material-polymer composite structure to form a nanochannel structure on the substrate;
(e) depositing an electrode on the substrate on which the nanochannel structure is formed; And
(f) manufacturing a sensor having a nanochannel structure by fixing a receptor coupled with an analyte inside the nanochannel structure.
16. The method of claim 14 or 15, wherein the receptor is selected from the group consisting of enzyme substrates, ligands, amino acids, peptides, proteins, nucleic acids, lipids and carbohydrates.
The method of claim 14 or 15, wherein the receptor is attached to the surface of the substrate by a functional group, or attached to the nanomaterial to be immobilized inside the nanochannel structure.
18. The method of claim 17, wherein the functional group is selected from the group consisting of thiols, carboxyl groups, amine groups and mixed functional groups thereof.
18. The method of claim 17, wherein the nanomaterial is selected from the group consisting of graphene, metal nanoparticles, nonmetal nanoparticles, and mixtures thereof.
The method of claim 14 or 15, wherein the deposition of the electrode is performed by a method selected from the group consisting of a chemical vapor deposition method, a printing method, a vapor deposition method, and a sputtering method.
The sensor according to claim 14 or 15, wherein the nanochannel of the nanochannel structure has a width of 10 to 20 nm and a height of 10 nm to 200 nm.

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