KR20130021103A - Exposure system and exposure method using the system - Google Patents

Exposure system and exposure method using the system Download PDF

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Publication number
KR20130021103A
KR20130021103A KR1020110083428A KR20110083428A KR20130021103A KR 20130021103 A KR20130021103 A KR 20130021103A KR 1020110083428 A KR1020110083428 A KR 1020110083428A KR 20110083428 A KR20110083428 A KR 20110083428A KR 20130021103 A KR20130021103 A KR 20130021103A
Authority
KR
South Korea
Prior art keywords
film
curvature
pattern forming
mask
exposure system
Prior art date
Application number
KR1020110083428A
Other languages
Korean (ko)
Inventor
최봉진
김용환
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020110083428A priority Critical patent/KR20130021103A/en
Priority to JP2013524807A priority patent/JP5695197B2/en
Priority to CN201180046322.4A priority patent/CN103119519B/en
Priority to PCT/KR2011/007166 priority patent/WO2012044077A2/en
Publication of KR20130021103A publication Critical patent/KR20130021103A/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/213—Exposing with the same light pattern different positions of the same surface at the same time
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Abstract

The present invention relates to an exposure system and an exposure method using the same, and more particularly, a light emitting part, a film conveying part that adheres to a surface thereof and is bent in an ellipse or a part thereof, and is bent in the same curvature as the above curvature. And a pattern forming portion configured to transmit the light emitted from the light emitting portion to the curved film at the above curvature to form a polarization pattern, thereby forming a polarization pattern while continuously unwinding the film wound on the roll. The present invention relates to an exposure system capable of minimizing meandering and enabling uniform exposure to a wider area and contributing to increased production quality and efficiency, and to an exposure method using the same.

Description

Exposure system and exposure method using the same {EXPOSURE SYSTEM AND EXPOSURE METHOD USING THE SYSTEM}

The present invention relates to an exposure system for continuously forming a polarization pattern and an exposure method using the same.

The exposure system continuously unwinds the film rolled on the roll, and irradiates light on the unwinded portion after coating and drying to form a polarization pattern. As the exposure system releases and moves the film, meandering and shaking of the film occur, which causes irregularities in the polarization pattern formed on the film.

Films with irregular polarization patterns have poor polarization performance, causing problems that also significantly degrade the performance of 3D displays attached thereto. Therefore, the search for a method for regularly forming the exposure pattern on the film is required.

Previous exposure systems have been unsuitable for continuous processes, such as, for example, Japanese Patent Laid-Open Publication No. 2003-40674, or there is a limit that the exposure area of the mask is narrow and the efficiency is lowered.

In addition, when the exposure area is a curved surface, the exposure amount which passes through the mask and reaches the exposure area is considered to be a non-uniform factor causing irregular polarization patterns, and the exposure area must be flat.

Published Patent Publication No. 2003-40674 (2003. 5. 23)

An object of the present invention is to provide an exposure system and an exposure method using the same that can minimize the shaking and meandering of the film when forming a continuous polarization pattern.

An object of the present invention is to provide an exposure system capable of uniform exposure over a wider area and an exposure method using the same.

1. light emitting unit; A film transfer part in which the film adheres to the surface thereof and moves while being bent at the curvature of the ellipse or a part thereof; And a pattern forming unit configured to be bent at the same curvature as the curvature above, and to transmit light emitted from the light emitting unit to the film curved at the above curvature to form a polarization pattern.

2. The exposure system according to the above 1, wherein the film transfer unit is an elliptical roller.

3. The exposure system according to the above 1, wherein the film transfer unit is a plurality of circular rollers spaced apart by a trajectory having a curvature of an ellipse or a part thereof.

4. The exposure system according to the above 1, wherein the film transfer unit is a plurality of circular rollers disposed adjacent to the trajectory having a curvature of an ellipse or a portion thereof.

5. The exposure system according to the above 3 or 4, the film transfer unit further includes a support roller at the bottom of the plurality of circular rollers.

6. The exposure system according to the above 1, wherein the pattern forming unit comprises a mask.

7. The system of claim 1, wherein the pattern forming unit comprises a mask and a polarizer.

8. In the above 6 or 7, wherein the pattern forming unit further comprises an internal pressure control chamber to allow the mask or mask and the polarizer is configured to be curved to the curvature of the ellipse or a portion thereof.

9. In the above 6 or 7, wherein the mask is in the form of a quadrilateral with four sides, one side and the opposite side is fixedly connected to the pattern forming portion, except for these two sides a pair of two opposite sides are patterns Exposure system not fixed to the forming part.

10. The exposure system according to the above 9, wherein the curvature of the mask can be adjusted by a fixing device that can adjust the distance between two sides of the mask fixed to the pattern forming portion.

11. The exposure system according to the above 1, wherein the distance between the pattern forming unit and the film conveying unit is constant.

12. The exposure system according to the above 1, wherein the surface of the film transfer unit is antireflective or scattering-free.

13. The exposure system according to the above 1, wherein the surface of the film transfer part is formed with an adhesive layer or an anti-slip layer.

14. In the above 1, the first reflector for reflecting the light output from the light emitting unit; A condenser that collects and transmits the light reflected by the first reflector; And a second reflecting portion for reflecting light transmitted from the light collector to the pattern forming portion.

15. bringing the film into close contact with the film conveying portion and bending the film to a curvature of an ellipse or a portion thereof; And irradiating light to the film bent at the curvature to form a polarization pattern on the film by irradiating light through a pattern forming unit configured to be bent at the same curvature as the above curvature.

16. In the above 15, the film conveying portion is an elliptical roller, a plurality of circular rollers spaced apart by a trajectory having an ellipse or a portion thereof, or a plurality of circular rollers disposed adjacent to a trajectory having a curvature of an ellipse or a portion thereof. Exposure method.

17. The method according to the above 16, wherein the film transfer unit further comprises a support roller at the bottom of the plurality of circular rollers.

18. The exposure method according to the above 15, wherein the pattern forming unit comprises a mask, or a mask and a polarizer.

19. The exposure method according to the above 15, wherein the pattern forming unit maintains the curvature by the internal pressure control chamber.

20. The exposure method according to the above 15, wherein the light irradiated through the pattern forming unit is uniformly incident on the bent film with the curvature above.

The exposure system and method of the present invention can minimize the shaking and meandering of the film during continuous polarization pattern formation by allowing the film to be conveyed to be brought in close contact with the film conveying portion.

According to the exposure system and method of the present invention, the curvature of the pattern forming portion and the film conveying portion are matched to make the distance between them uniform, so that light is uniformly incident on the contact surface of the film, and more uniform exposure and pattern formation are possible. .

The exposure system and method of the present invention transfer the film to which the film conveying part is in close contact with the curvature of an ellipse or a part thereof, and in other cases (for example, when the film is brought in close contact with the curvature of a circle or part thereof, as usual) Extensive areas of exposure and pattern formation per unit time are possible compared to the case of transferring the film to rolls arranged in a straight line.

In addition, the exposure system and method of the present invention can minimize the loss of light generated by the reflection and scattering of light incident on the surface when the surface of the film transfer part is antireflected and scattered, and the light of the intended intensity and amount is closely adhered. It can be applied on the film to form a uniform and accurate polarization pattern.

In addition, the film conveying part of the present invention can be easily implemented by placing a plurality of circular rollers spaced apart or adjacent to the trajectory having a curvature of an ellipse or a part thereof to add a support roll in a double or multiple shape to the bottom of the plurality of circular rollers. In this case, more stable system operation is possible.

1 shows an example of an exposure system of the present invention.
2 shows examples of the film conveying part of the present invention.
3 shows an example of the pattern forming portion of the present invention.

The present invention consists of a light emitting part, a film conveying part that is in close contact with the surface and bent at the curvature of an ellipse or a part thereof, and is bent at the same curvature as the above curvature, and the light emitted from the light emitting part is curved at the above curvature. By including a pattern forming portion that transfers to the film to form a polarization pattern, even when forming the polarization pattern while continuously unwinding the film wound on the roll, it is possible to minimize the shaking and meandering of the film. The present invention relates to an exposure system and an exposure method using the same, which can contribute to an increase in production quality and efficiency.

Hereinafter, the present invention will be described in detail.

The exposure system of the present invention can be configured, for example, as in FIG. The exposure system of FIG. 1 is a system for forming a polarization pattern by irradiating light to the polarizing film F for 3D displays.

In the exposure system according to the present exemplary embodiment, the lamp 110, the reflector-1 (120), the light collector 130, the reflector-2 (140), the pattern forming unit 150, and the film conveying unit 160 are performed. It is provided.

The lamp 110 generates light and outputs the light to the reflector-1 120. The reflector-1 120 reflects the light output from the lamp 110 toward the light collector 130.

The light collector 130 collects the light reflected from the reflector-1 120 and transmits the light reflected to the reflector-2140. The reflector-2 140 reflects the light received from the light collector 130 to the pattern forming unit 150.

The pattern forming unit 150 receives light irradiated from the lamp 110 by an optical system including the reflector-1 120, the light collector 130, and the reflector-2140.

The film transfer part 160 is a means for moving the film F in close contact with the arrow direction shown in FIG. 1 through a rotational motion. The film F moves in close contact with the curved surface of the film transfer unit 160 to prevent shaking and meandering generated during the transfer process. The curved surface of the film conveying unit 160 corresponds to the close contact surface where the film F is in close contact, and the film F is in close contact with the surface of the film conveying unit 160 and is bent at the curvature of the ellipse or a part thereof.

An adhesive layer or an anti-slip layer may be formed on the surface of the film conveying part if necessary to convey the film in close contact. If sufficient tension is applied to the film to be transported, a separate layer for adhesion may not be formed.

The film transfer part 160 is shown as an elliptical roller in FIG. 1, but may be implemented in various ways as shown in FIG. 2. As shown in FIG. 2 (a), an endless track type formed by connecting two circular rollers with a belt is possible, and as shown in FIG. 2 (b), a plurality of circular rollers are arranged to be spaced apart by a trajectory having an ellipse or a portion thereof. As shown in Fig. 2 (c), a plurality of circular rollers may be arranged closely and closely adjacent to a locus having a curvature of an ellipse or a part thereof. Also, as shown in Figs. 2 (d) and 2 (e), it is also possible to provide double or multiple support rolls in the lower parts of Figs. 2 (b) and 2 (c).

The pattern forming unit 150 may include a film in which light emitted from the lamp 110 received through the reflector-1 120, the condenser 130, and the reflector-2140 is in close contact with the curved surface of the film transfer unit 160 ( F) to pass. As a result, a polarization pattern is formed on a part of the film F in close contact with the curved surface of the film transfer part 160.

Light transmitted from the pattern forming unit 150 to the film F in close contact with the film transfer unit 160 may be directed toward the center of the elliptical roller of the film transfer unit 160. In this case, the light may be uniformly incident on the portion of the film F that is in close contact with the curved surface of the film transfer part 160.

In addition, the curved surface of the film transfer unit 160 may be anti-reflective and scattering-free treatment. As a result, the incident light is not reflected or scattered on the curved surface of the film transfer part 160, and thus a polarization pattern is uniformly formed on the portion of the film F that is in close contact with the curved surface of the film transfer part 160.

The detailed structure of the pattern forming unit 150 is, for example, as shown in FIG. 3.

As shown in FIG. 3, the pattern forming unit 150 includes a chamber 151, a polarizing plate 153, a polarizing plate fixing part 155, a mask fixing part 157, and a mask 159.

The polarizer 153 may be composed of COP (cycloolefin polymer) / polarizer PVA (polyvinyl alcohol) / COP. At this time, the PVA to be used may be a iodine stained, or may be used for other polarization means. The polarizer fixing part 155 fixes both ends of the polarizer 153 to the pattern forming part 150.

The mask 159 may be implemented with a film or quartz glass material capable of forming a polarization pattern. The mask fixing part 157 fixes both ends of the mask 159 to the pattern forming part 150.

In detail, the mask 159 has a quadrangular shape having four sides, and a side facing the one side is fixedly connected to the mask fixing part 157, and another pair of two facing each other except these two sides is provided. The sides are not fixed to the mask fixing part 157.

The chamber 151 is a means for adjusting the internal air pressure so that the distance between the curved surface of the polarizing plate 153 and the mask 159 and the curved surface of the film transfer unit 160 is constant. The internal air pressure of the chamber 151 is lowered to reduce the radius of curvature of the polarizing plate 153 and the mask 159 so that the distance between the curved surface of the polarizing plate 153 and the mask 159 and the curved surface of the film transfer unit 160 is constant. The adjusted result is shown in FIG. 3B. In addition, in FIG. 1, the distance between the curved surface of the mask provided in the pattern forming unit 150 and the curved surface of the film transfer unit 160 may be determined to be constant (AA ′ = BB ′ = CC ′).

The distance between the curved surface of the polarizing plate 153 and the mask 159 and the curved surface of the film transfer unit 160 is preferably maintained to be constant. This is to allow light to be uniformly incident on the portion of the film F that is in close contact with the curved surface of the film transfer part 160.

Up to now, the preferred embodiment has been described in detail with reference to an exposure system for uniformly irradiating light with the film F in close contact with the cylindrical film transfer part 160 to form a polarization pattern.

In the present embodiment, it is assumed that light is transmitted from the lamp 110 to the pattern forming unit 150 through an optical system composed of the reflector-1 120, the condenser 130, and the reflector-2140, but It is merely exemplary.

Through an optical system of a type different from that of the type shown in FIG. 1, it is possible to implement light to be transmitted from the lamp 110 to the pattern forming part 150. In addition, it is of course possible to implement such that the light is transmitted directly from the lamp 110 to the pattern forming unit 150 without the optical system.

In addition, although it is assumed that the curved surface of the polarizing plate 153 and the mask 159 is adjusted using the chamber 151 whose internal air pressure is adjustable, this is also merely an example for description of the invention, and thus, other than the chamber 151. It is also possible to implement to adjust the curved surface of the polarizing plate 153 and the mask 159 using other means. For example, it is possible to control the means for applying external pressure to both ends of the polarizing plate 153 and the mask 159 to adjust the curved surfaces of the polarizing plate 153 and the mask 159.

Meanwhile, in the above embodiment, it is assumed that the curved surfaces of the polarizer 153 and the mask 159 are variable, but this is also merely an example for convenience of description. Accordingly, the curved surfaces of the polarizing plate 153 and the mask 159 may be maintained in a fixed state. In this case, the means for adjusting the curved surfaces of the polarizing plate 153 and the mask 159, such as the chamber 151, may be used. This is not necessary.

In addition, in the above embodiment, the film F is assumed to be the elliptical roller film transfer unit 160, but the elliptical roller is only an example of the means for moving to the curvature of the ellipse or a portion thereof in close contact with the film (F). It is possible to replace this with various means including the examples of FIG. 2.

In addition, in the above embodiment, the polarizing plate 153 and the mask 159 are stacked in the order of the polarizing plate 153 and the mask 159 with respect to the surface of the film transfer part 160, but they are spaced apart within an appropriate range or the stacking order thereof. You can perform the same function even if you change.

In addition, in the above embodiment, the polarizer 153 and the mask 159 are sequentially stacked, but the polarizer may also be lost when the light emitted from the light source is polarized light. In addition, only the polarizer of the polarizing plate 153 may be used.

In addition, in the above embodiment, the curved surface of the portion including the mask 159 is adjusted using the chamber 151, but this is merely an example of a means for adjusting the curved surface, and thus maintains the curved surface while adjusting the curved surface of the mask. As long as the means capable of applying an external force that can be made, any one may replace the chamber 151.

For example, the radius of curvature of the mask can be implemented to be adjusted by a fixing device that can adjust the distance between two sides of the mask fixed to the pattern forming portion.

The exposure system assumed in the above embodiment is a system for forming a polarization pattern on the polarizing film for 3D display. However, the technical idea of the present invention is also applicable to the case of forming a pattern on a film other than the polarizing film for 3D display.

In addition, although the preferred embodiment of the present invention has been shown and described above, the present invention is not limited to the specific embodiments described above, but the technical field to which the invention belongs without departing from the spirit of the invention claimed in the claims. Of course, various modifications can be made by those skilled in the art, and these modifications should not be individually understood from the technical spirit or the prospect of the present invention.

110: lamp 120: reflector-1
130: condenser 140: reflector-2
150: pattern forming unit 151: chamber
153: polarizer 155: polarizer fixing portion
157: mask fixing portion 159: mask
160: film transfer unit

Claims (20)

A light emitting portion;
A film transfer part in which the film adheres to the surface thereof and moves while being bent at the curvature of the ellipse or a part thereof; And
And a pattern forming part configured to be bent at the same curvature as the curvature and to transmit the light emitted from the light emitting part to the curved film at the curvature to form a polarization pattern.
The exposure system of claim 1, wherein the film transfer unit is an elliptical roller.
The exposure system according to claim 1, wherein the film transfer part is a plurality of circular rollers spaced apart by a trajectory having a curvature of an ellipse or a portion thereof.
The exposure system according to claim 1, wherein the film transfer unit is a plurality of circular rollers disposed adjacent to a trajectory having a curvature of an ellipse or a portion thereof. The exposure system according to claim 3 or 4, wherein the film transfer unit further includes a support roller below the plurality of circular rollers.
The exposure system of claim 1, wherein the pattern forming unit comprises a mask.
The exposure system of claim 1, wherein the pattern forming unit includes a mask and a polarizer.
The exposure system according to claim 6 or 7, wherein the pattern forming unit further includes an internal pressure adjusting chamber for allowing the mask or the mask and the polarizer to be curved in an ellipse or a portion thereof.
The method of claim 6 or 7, wherein the mask is in the form of a quadrilateral having four sides, one side facing the opposite side is fixedly connected to the pattern forming portion, the two sides of the pair facing each other except these two sides are An exposure system that is not fixed to the pattern forming portion.
The exposure system of claim 9, wherein the curvature of the mask can be adjusted by a fixing device capable of adjusting a distance between two sides of the mask fixed to the pattern forming portion.
The exposure system according to claim 1, wherein a distance between the pattern forming portion and the film transfer portion is constant.
The exposure system of claim 1, wherein the surface of the film transfer part is antireflected or scattered.
The exposure system of claim 1, wherein an adhesion layer or an anti-slip layer is formed on a surface of the film transfer part.
The display apparatus of claim 1, further comprising: a first reflector reflecting light output from the light emitter; A condenser that collects and transmits the light reflected by the first reflector; And a second reflecting portion for reflecting light transmitted from the light collector to the pattern forming portion.
Bending the film in close contact with the film conveying portion and bending the curvature of an ellipse or a portion thereof; And
And irradiating light to the film bent at the curvature to form a polarization pattern on the film by irradiating light through a pattern forming unit configured to be bent at the same curvature as the curvature.
The exposure apparatus of claim 15, wherein the film transfer part is an elliptical roller, an ellipse, or a plurality of circular rollers spaced apart in a trajectory having a curvature thereof, or a plurality of circular rollers disposed adjacent to a trajectory having a curvature of an ellipse or a portion thereof. Way.
The exposure method of claim 16, wherein the film transfer unit further includes a support roller below the plurality of circular rollers.
The exposure method of claim 15, wherein the pattern forming unit includes a mask or a mask and a polarizer.
The exposure method of claim 15, wherein the pattern forming unit maintains the curvature by an internal pressure adjusting chamber.
The exposure method of claim 15, wherein the light irradiated through the pattern forming part is uniformly incident on the film curved at the curvature.
KR1020110083428A 2010-09-29 2011-08-22 Exposure system and exposure method using the system KR20130021103A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020110083428A KR20130021103A (en) 2011-08-22 2011-08-22 Exposure system and exposure method using the system
JP2013524807A JP5695197B2 (en) 2010-09-29 2011-09-28 Exposure system
CN201180046322.4A CN103119519B (en) 2010-09-29 2011-09-28 Exposure system
PCT/KR2011/007166 WO2012044077A2 (en) 2010-09-29 2011-09-28 Light-exposure system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110083428A KR20130021103A (en) 2011-08-22 2011-08-22 Exposure system and exposure method using the system

Publications (1)

Publication Number Publication Date
KR20130021103A true KR20130021103A (en) 2013-03-05

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KR1020110083428A KR20130021103A (en) 2010-09-29 2011-08-22 Exposure system and exposure method using the system

Country Status (1)

Country Link
KR (1) KR20130021103A (en)

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