KR20120136736A - 톰슨산란 플라즈마 진단을 위한 레이저 빔 조사 시스템 - Google Patents
톰슨산란 플라즈마 진단을 위한 레이저 빔 조사 시스템 Download PDFInfo
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- KR20120136736A KR20120136736A KR1020110055859A KR20110055859A KR20120136736A KR 20120136736 A KR20120136736 A KR 20120136736A KR 1020110055859 A KR1020110055859 A KR 1020110055859A KR 20110055859 A KR20110055859 A KR 20110055859A KR 20120136736 A KR20120136736 A KR 20120136736A
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- laser
- reflection mirror
- plasma
- pumping
- irradiation system
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- 238000003745 diagnosis Methods 0.000 title claims abstract description 16
- 238000005086 pumping Methods 0.000 claims abstract description 26
- 238000000034 method Methods 0.000 claims description 8
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/1022—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0401—Arrangements for thermal management of optical elements being part of laser resonator, e.g. windows, mirrors, lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/1062—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using a controlled passive interferometer, e.g. a Fabry-Perot etalon
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Plasma Technology (AREA)
- Particle Accelerators (AREA)
- Lasers (AREA)
Abstract
Description
도 2는 KSTAR에 배치된 레이저 조사 시스템을 나타내는 도면이다.
도 3은 본 발명의 일 실시예에 따른 레이저 조사 시스템을 나타내는 도면이다.
도 4는 본 발명의 다른 실시예에 따른 레이저 조사 시스템을 나타내는 도면이다.
200: 톰슨산란 진단 장치 300, 400: 레이저 조사 시스템
310, 410: 레이저 캐비티 320, 420: 전반사 미러
330: 이득 매질 340: 부분 반사 미러
350: 덤프 431: 제1 이득 매질
432: 제2 이득 매질 433: 제3 이득 매질
441: 제1 부분 반사 미러 442: 제2 부분 반사 미러
443: 제3 부분 반사 미러 451: 제1 덤프
452: 제2 덤프 453: 제3 덤프
Claims (4)
- 톰슨산란 플라즈마 진단을 위한 레이저 조사 시스템에 있어서,
레이저 캐비티;
상기 레이저 캐비티 내의 일측에 위치하는 전반사 미러;
상기 레이저 캐비티 내의 타측에 위치하는 부분 반사 미러; 및
상기 전반사 미러와 상기 부분 반사 미러 사이에 위치하여 펌핑에 의해 광을 유도 방출하는 이득 매질(상기 이득 매질은 상기 전반사 미러와 상기 부분 반사 미러 사이에 복수 개가 위치됨)을 포함하고,
상기 전반사 미러와 상기 부분 반사 미러는,
상기 이득 매질로부터 유도 방출된 광을 증폭시켜 레이저를 생성하고, 상기 이득 매질과 상기 부분 반사 미러 사이에 위치한, KSTAR 내부에 형성된 플라즈마에 상기 레이저를 조사하는 톰슨산란 플라즈마 진단을 위한 레이저 조사 시스템. - 제1항에 있어서,
상기 레이저 캐비티의 외부에 위치하고, 상기 플라즈마를 통과하여 상기 부분 반사 미러로부터 출력된 상기 레이저를 처리하는 덤프(dump)를 더 포함하는 톰슨산란 플라즈마 진단을 위한 레이저 조사 시스템. - 제1항에 있어서,
상기 이득 매질의 후단에 위치하여 상기 증폭된 광의 이득을 제어하는 이득 제어부를 더 포함하는 톰슨산란 플라즈마 진단을 위한 레이저 조사 시스템. - 제1항에 있어서,
상기 펌핑은, 광 펌핑, 전기방전 펌핑, 전자-홀 생성 펌핑, 화학 반응 펌핑 및 가스 금속 팽창 펌핑 중 어느 하나의 펌핑 방식으로 이루어지는 톰슨산란 플라즈마 진단을 위한 레이저 조사 시스템.
Priority Applications (1)
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KR1020110055859A KR101249473B1 (ko) | 2011-06-10 | 2011-06-10 | 톰슨산란 플라즈마 진단을 위한 레이저 빔 조사 시스템 |
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KR1020110055859A KR101249473B1 (ko) | 2011-06-10 | 2011-06-10 | 톰슨산란 플라즈마 진단을 위한 레이저 빔 조사 시스템 |
Publications (2)
Publication Number | Publication Date |
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KR20120136736A true KR20120136736A (ko) | 2012-12-20 |
KR101249473B1 KR101249473B1 (ko) | 2013-04-01 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106211532A (zh) * | 2016-08-31 | 2016-12-07 | 中国科学院等离子体物理研究所 | 一种用于对边界汤姆逊散射诊断系统信号光路定位的装置 |
CN113507775A (zh) * | 2021-06-07 | 2021-10-15 | 中国工程物理研究院激光聚变研究中心 | 适用大型激光装置的多用途光学汤姆逊散射光谱测量系统 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11581692B2 (en) * | 2019-06-18 | 2023-02-14 | KLA Corp. | Controlling pressure in a cavity of a light source |
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US3885874A (en) * | 1974-01-11 | 1975-05-27 | Us Energy | Laser plasma diagnostic using ring resonators |
EP0310000B1 (en) * | 1987-09-28 | 1994-06-01 | Matsushita Electric Industrial Co., Ltd. | Laser apparatus |
GB0211202D0 (en) * | 2002-05-16 | 2002-06-26 | Univ Heriot Watt | Novel waveguide resonator |
JP4933860B2 (ja) * | 2006-08-21 | 2012-05-16 | 国立大学法人名古屋大学 | プラズマ電子状態測定装置および方法 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106211532A (zh) * | 2016-08-31 | 2016-12-07 | 中国科学院等离子体物理研究所 | 一种用于对边界汤姆逊散射诊断系统信号光路定位的装置 |
CN113507775A (zh) * | 2021-06-07 | 2021-10-15 | 中国工程物理研究院激光聚变研究中心 | 适用大型激光装置的多用途光学汤姆逊散射光谱测量系统 |
CN113507775B (zh) * | 2021-06-07 | 2023-11-21 | 中国工程物理研究院激光聚变研究中心 | 适用大型激光装置的多用途光学汤姆逊散射光谱测量系统 |
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