KR20120129489A - Apparatus to dry substrate - Google Patents

Abstract

PURPOSE: An apparatus for drying a substrate is provided to prevent the leaning phenomenon that patterns are broken down by rapidly evaporating materials remaining in patterns of the substrate. CONSTITUTION: A drying chamber(110) has a drying space for a substrate. A substrate loading part(111) is rotatably installed in the drying chamber. A gas supply part(130) is mounted on the drying chamber. The gas supply part evaporates deionized water and isopropyl alcohol. An absorption part(150) sucks evaporated deionized water and isopropyl alcohol. [Reference numerals] (121) DIW supply; (123) IPA supply

Description

Apparatus to dry substrate

A substrate drying apparatus is disclosed. More specifically, a substrate drying apparatus capable of preventing a phenomenon in which a pattern of a substrate falls down and ensuring safety can be disclosed.

In general, in order to manufacture a semiconductor device, various processes such as lithography, deposition, and etching are repeatedly performed. During these processes, particles, metal impurities, organics, etc. remain on the substrate, for example, a wafer made of silicon.

Conventionally known drying methods include spin drying, drying using Marangoni effect by isopropyl alcohol (IPA, Iso-propyl Alcohol).

Among them, the drying method using isopropyl alcohol is obtained by pulling the substrate vertically in de-ionized water (DIW) and blowing isopropyl alcohol and nitrogen gas (N2) near the gas-liquid interface on the substrate surface. It refers to a method of drying the substrate by generating a marangoni effect. This drying method is executed by the substrate drying apparatus.

Here, a substrate drying apparatus is an apparatus for making the wafer which wash | cleaned the chemical with ultrapure water in a semiconductor wafer process free from foreign substances, such as a defect or a liquid.

1 is a view schematically showing the configuration of a substrate drying apparatus according to a conventional embodiment.

As shown in the drawing, the substrate drying apparatus 1 according to an exemplary embodiment includes a drying chamber 10 that forms a drying space, a loading unit 11 in which a substrate W is loaded and rotatable, and a rotation thereof. It may be provided with a supply unit 20 for sequentially supplying pure water, isopropyl alcohol and nitrogen gas (N2) to the substrate (W). By such a configuration, defects or foreign matter on the substrate W can be removed.

However, due to the miniaturization of the semiconductor process, the size of the pattern P formed on the surface of the substrate W is very small. The surface tension of the ultrapure water remaining between the patterns P during the drying operation of the substrate W is very small. Leaning phenomenon occurs, in which some of the patterns (P) fall without being able to withstand the influence of.

In order to solve this problem, by filling the ultrapure water between the pattern (P) and the pattern (P) to prevent the occurrence of the lining phenomenon due to the surface tension of the ultrapure water and to provide isopropyl alcohol with a relatively small surface tension To remove the ultrapure water and subsequently remove the isopropyl alcohol from the patterns P of the substrate W.

However, in this drying method, since a drying effect is very weak at a low temperature of isopropyl alcohol, a heating device (not shown) for heating isopropyl alcohol is used, which is dangerous due to the low flash point of isopropyl alcohol. There is a disadvantage that a situation can occur.

Therefore, it is necessary to develop a substrate drying apparatus capable of preventing a lining phenomenon in which patterns formed on a substrate fall, while preventing a dangerous situation due to ignition of isopropyl alcohol.

An object according to an embodiment of the present invention is to apply a heat to a substrate to quickly vaporize a material remaining between the patterns of the substrate, for example, ultrapure water or isopropyl alcohol, thereby preventing the pattern from falling. It is to provide a substrate drying apparatus that can be prevented.

In addition, another object according to an embodiment of the present invention is to provide a substrate drying apparatus capable of preventing ignition of isopropyl alcohol because hot gas applied to the substrate does not directly contact with isopropyl alcohol.

Further, another object according to an embodiment of the present invention is to provide a substrate drying apparatus capable of reliably removing a substance such as vaporized isopropyl alcohol due to the moving structure of the suction unit.

According to an embodiment of the present invention, a substrate drying apparatus includes a drying chamber which forms a drying space of a substrate to be dried and is rotatably mounted to a substrate loading unit on which the substrate is loaded; A gas supply unit mounted to the drying chamber so as to be positioned below the substrate loading unit, and vaporizing ultrapure water or isopropyl alcohol present in the substrate by providing a high temperature gas toward the substrate loading unit; And a suction part mounted to the drying chamber to be movable above the substrate loading part, and configured to suck the ultrapure water or the isopropyl alcohol vaporized from the substrate loading part. It is possible to quickly vaporize the remaining material between the patterns of the substrate, such as ultrapure water or isopropyl alcohol, to prevent the pattern from falling and also to prevent the high temperature gas applied to the substrate. Since it is not directly in contact with isopropyl alcohol, it is possible to prevent ignition of isopropyl alcohol.

The suction part may move in a radial direction from the center of the substrate loaded in the substrate loading part to suck the isopropyl alcohol, and may be provided in a nozzle type.

The expansion speed of the vaporization range of the isopropyl alcohol by the hot gas and the moving speed of the suction unit may correspond to each other.

The hot gas supplied from the gas supply part may be an inert gas, and the hot gas may be heated by a hot water principle.

On the other hand, the substrate drying apparatus according to an embodiment of the present invention, the drying chamber to form a drying space of the substrate, the substrate loading portion on which the substrate is loaded rotatably; A heat supply unit mounted in the drying chamber to be positioned above the substrate loading unit and vaporizing ultrapure water or isopropyl alcohol present in the substrate by applying heat to the substrate on the substrate loading unit; And a suction part mounted in the drying chamber so as to be movable above the substrate loading part, and suctioning the ultrapure water or the isopropyl alcohol vaporized from the substrate, and applying patterns to the substrate by applying heat to the substrate. It is possible to quickly vaporize a substance remaining in between, for example, ultrapure water or isopropyl alcohol, to prevent the pattern from collapsing and to prevent ignition of isopropyl alcohol.

The heat supply part and the suction part may be combined to move together in an upper portion of the substrate loading part.

The heat supply part may be provided as a heater type for supplying heat to the substrate, and the suction part may be provided as a nozzle type.

The heat supply part and the suction part move together in a radial direction from the center of the substrate loaded in the substrate loading part, supplying heat from the heat supply part and the ultrapure water or the isopropyl alcohol vaporized through the suction part. The inhalation process can proceed substantially simultaneously.

The heat supply unit may first vaporize the ultrapure water or the isopropyl alcohol in the upper region between the patterns formed on the substrate by supplying heat from the upper portion of the substrate.

According to an embodiment of the present invention, by heating the substrate, the remaining material between the patterns of the substrate, for example, ultrapure water or isopropyl alcohol, can be rapidly vaporized to prevent the patterns from falling. Can be.

In addition, according to the embodiment of the present invention, since the hot gas applied to the substrate does not directly contact with isopropyl alcohol, it is possible to prevent ignition of isopropyl alcohol.

In addition, according to the embodiment of the present invention, it is possible to reliably remove a substance such as evaporated isopropyl alcohol due to the moving structure of the suction unit.

1 is a view schematically showing the configuration of a substrate drying apparatus according to a conventional embodiment.
2 is a view showing a schematic configuration of a substrate drying apparatus according to an embodiment of the present invention.
FIG. 3 is a conceptual view showing an exaggerated part of the configuration of FIG. 2.
4 is a view showing a schematic configuration of a substrate drying apparatus according to another embodiment of the present invention.
FIG. 5 is a conceptual view illustrating an exaggerated part of the configuration of FIG. 4.

Hereinafter, configurations and applications according to embodiments of the present invention will be described in detail with reference to the accompanying drawings. The following description is one of several aspects of the patentable invention and the following description forms part of the detailed description of the invention.

In the following description, well-known functions or constructions are not described in detail for the sake of clarity and conciseness.

The substrate to be described below may be any one of another flat panel display such as a wafer, a liquid crystal display (LCD), a plasma display panel (PDP), and the like.

2 is a view showing a schematic configuration of a substrate drying apparatus according to an embodiment of the present invention, Figure 3 is a concept diagram showing an exaggerated part of the configuration of FIG.

As shown in these drawings, the substrate drying apparatus 100 according to an embodiment of the present invention is equipped with a substrate loading part 111 on which the substrate W, which is a drying object, is mounted, and is dried on the substrate W. As shown in FIG. A drying chamber 110 in which work is performed, a DIW / IPA supply unit 120 provided in the drying chamber 110 to supply ultrapure water (DIW) and isopropyl alcohol (IPA) to the substrate W, and a substrate loading unit ( The gas supply unit 130 for vaporizing the ultrapure water or isopropyl alcohol present in the substrate W by providing a high temperature gas in the gas direction at the lower portion of the 111, and the drying chamber so as to be positioned above the substrate loading unit 111. And a suction unit 150 mounted in the 110 to suck ultra-pure water or isopropyl alcohol vaporized from the substrate W.

By this configuration, not only the ultrapure water or isopropyl alcohol existing between the patterns P of the substrate W can be removed, but also the patterns P are formed by the surface tension of the ultrapure water or isopropyl alcohol during the drying operation. Tilting can prevent the phenomenon of leaning, and also prevent ignition from occurring due to the low flash point of isopropyl alcohol.

Referring to each configuration, first, the drying chamber 110 of the present embodiment may be provided in a hollow cylindrical shape. However, the shape of the drying chamber 110 is not limited thereto and may be provided in a different shape according to the type of the substrate W.

Referring to FIG. 2, the substrate loading part 111 on which the substrate W is seated is rotatably mounted in the lower region of the drying chamber 110. The substrate loading part 111 is rotatable in a state where the substrate W is seated on an upper surface thereof, and thus, when ultrapure water and isopropyl alcohol in a liquid state are supplied from the DIW / IPA supply part 120 to be described later, Drying operations on the front can be carried out.

Meanwhile, the DIW / IPA supply unit 120 sequentially supplies the ultrapure water and isopropyl alcohol in a liquid state on the substrate W, and thus may remove defects or foreign substances remaining on the substrate W. have.

As shown in FIG. 2, the DIW / IPA supply unit 120 according to the present embodiment has a length corresponding to the radius of the substrate W and is long in the drying chamber 110 along the radial direction of the substrate W. FIG. Is placed. Therefore, ultrapure water or isopropyl alcohol provided from the DIW / IPA supply unit 120 may be supplied to the front surface of the rotating substrate W.

The DIW / IPA supply unit 120 is connected to the ultrapure water supply tank 121 for supplying ultrapure water and the IPA supply tank 123 for supplying isopropyl alcohol by respective moving lines 122 and 124. Therefore, it may be sequentially supplied to the substrate W of ultrapure water and isopropyl alcohol through the DIW / IPA supply unit 120.

However, the ultrapure water has a relatively large surface tension so that when the ultrapure water remains in the upper region between the patterns P of the substrate W, the pattern falls to one side (a partial enlarged view of FIG. 1). May occur). Therefore, by providing an isopropyl alcohol having a relatively small surface tension compared to ultrapure water, the ultrapure water is replaced with isopropyl alcohol. By the way, the isopropyl alcohol has not been rapidly dried at a low temperature state, but in the related art, a device for heating the isopropyl alcohol was separately provided.

Therefore, in the present embodiment, in order to prevent the phenomenon of lining of the pattern P or the occurrence of ignition of isopropyl alcohol, a gas for rapidly vaporizing isopropyl alcohol by providing a high temperature gas from the lower portion of the substrate loading portion 111. A supply unit 130 and a suction unit 150 for sucking vaporized isopropyl alcohol are provided.

Referring to each configuration, first, the gas supply unit 130 of the present embodiment, as shown in Figure 2, is provided from the gas supply tank 131 for supplying a high temperature gas, and the gas supply tank 131 A blower (not shown) for supplying hot gas to the lower central area of the substrate loading part 111 may be provided.

Here, the hot gas supplied from the gas supply tank 131 is a relatively inexpensive nitrogen gas (N2) among inert gases which do not react with isopropyl alcohol. However, the present invention is not limited thereto, and other inert gas such as halogen gas may be applied.

As such, the hot gas supplied from the gas supply unit 130 is not directly provided to the upper surface of the substrate W as in the prior art, but is supplied to the lower portion of the substrate loading unit 111 to be loaded thereon. The substrate W is heated in the outward direction from the center region. In this case, since the hot gas provided from the gas supply unit 130 may be heated to about 100 ° C. by the hot water principle, the substrate loading unit 111 and the substrate W may be quickly heated.

Therefore, as shown schematically in FIG. 3, vaporization of isopropyl alcohol may be performed first from the center of the substrate W, and gradually vaporization of isopropyl alcohol may be performed up to the outer region of the substrate W. FIG.

As such, the hot gas vaporizes the isopropyl alcohol to remove the isopropyl alcohol from the substrate W. At this time, the hot gas does not directly contact the isopropyl alcohol having a low flash point, so that the isopropyl alcohol is not ignited. In addition, it is possible to provide a gas at a high temperature so that isopropyl alcohol can be quickly removed from the substrate (W).

On the other hand, as described above, by the operation of the gas supply unit 130, the isopropyl alcohol is gradually evaporated from the central region to the outer region of the substrate (W), wherein the vaporized isopropyl alcohol must be discharged to the outside do.

To this end, the suction unit 150 of the present embodiment is movably mounted in the upper region of the substrate loading unit 111 and serves to suck vaporized isopropyl alcohol. The suction unit 150 may be provided in a nozzle type to efficiently suck. However, the type of the suction unit 150 is not limited thereto, and if the vaporized isopropyl alcohol can be reliably inhaled, it may be provided in another kind.

As shown in FIG. 2, the suction unit 150 may suck the isopropyl alcohol vaporized while moving radially from the center of the substrate W. As shown in FIG. At this time, the moving speed of the suction unit 150 corresponds to the vaporization speed of the isopropyl.

In other words, the substrate W is heated from the central region to the outer region by the hot gas supply of the gas supply unit 130, so that isopropyl alcohol remaining between the patterns P of the substrate W is also removed from the substrate ( The vaporization range is vaporized from the central region of W) and the vaporization range spreads in the radial direction, wherein the suction unit 150 reliably moves the vaporized isopropyl alcohol by moving in the radial direction of the substrate W according to the expansion speed of the vaporization range. Inhalation is possible.

Thus, according to one embodiment of the present invention, by providing a high-temperature gas, for example inert gas nitrogen gas (N2) from the lower portion of the substrate (W) to the central region of the substrate (W) It is possible to vaporize the isopropyl alcohol between the pattern (P) to prevent the phenomenon of the pattern (P), and also to lower the flash point when the hot gas is heated to heat the substrate (W) Since isopropyl alcohol does not come into direct contact with the hot gas, there is an advantage of preventing ignition of isopropyl alcohol.

Meanwhile, hereinafter, a substrate drying apparatus according to another embodiment of the present invention will be described, but the description thereof will be omitted for parts substantially the same as the substrate drying apparatus of the above-described embodiment.

4 is a view showing a schematic configuration of a substrate drying apparatus according to another embodiment of the present invention, Figure 5 is a concept diagram showing an exaggerated part of the configuration of FIG.

As shown in these figures, the substrate drying apparatus 200 according to another embodiment of the present invention, the drying chamber 210, the DIW / IPA supply unit 220 and the substrate loading unit 211 is rotatably mounted And ultrapure water or isopropyl alcohol present in the substrate W by being heated in the drying chamber 210 so as to be positioned above the substrate loading part 211 and applying heat to the substrate W on the substrate loading part 211. Similar to the heat supply unit 230 for vaporizing, the suction unit 250 provided in the drying chamber 210 to be positioned above the substrate loading unit 211 to suck ultrapure water or isopropyl alcohol vaporized by the heat supply unit 230. It includes.

Here, the heat supply unit 230 and the suction unit 250 may be combined and move together. As described above, the suction unit 250 moves in the radial direction of the substrate W in the upper central area of the substrate W and sucks vaporized material, and together with the suction unit 250, the heat supply unit 230 is also included. Moving together, heat can be supplied in the direction of the substrate (W).

In detail, when the ultrapure water or isopropyl alcohol remains in the liquid state in the upper region between the patterns P of the substrate W, a lining phenomenon may occur due to the surface tension thereof. Ultrapure water or isopropyl alcohol present in the upper region between the patterns P is first vaporized by the operation of the heat supply unit 230 and the suction unit 250 and then sucked to prevent the occurrence of a lining phenomenon. .

Since the heat supply unit 230 is provided on the upper portion of the substrate loading unit 211, first, the heat supply unit 230 may supply heat to the ultrapure water or isopropyl alcohol present in the upper region between the patterns P, and thus, the ultrapure water of the upper region. Or isopropyl alcohol can be vaporized.

However, the ultra-pure water or isopropyl alcohol, which has not yet been vaporized, exists in the lower region between the patterns P, which does not cause a lining phenomenon because of relatively small surface tension, and also, as described above, the heat supply 230 The vaporization of the substrate (W) can proceed reliably by eventually evaporating by the heat provided from).

The suction unit 250 of the present embodiment may be provided as a nozzle type as described above, the heat supply unit 230 of the present embodiment may be provided as a heater, for example IR heater type. Thus, it is possible not only to provide sufficient heat to vaporize ultrapure water or isopropyl alcohol, but also to efficiently inhale the vaporized material. However, the type and structure of the suction unit 250 and the heat supply unit 230 is not limited thereto.

As described above, according to another embodiment of the present invention, the interaction between the heat supply unit 230 and the suction unit 250 may be performed at the upper portion of the substrate loading unit 211 to prevent the phenomenon of the patterning of the substrate W. In addition, there is an advantage that can be performed reliably the drying process of the substrate (W).

In another embodiment described above, the suction unit and the heat supply unit are coupled to move together, but the present invention is not limited thereto, and the suction unit and the heat supply unit may be separately mounted on the substrate loading unit to perform their respective operations. Do.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit and scope of the invention. Therefore, such modifications or variations will have to be belong to the claims of the present invention.

100 substrate drying apparatus 110 drying chamber
111: substrate loading part 120: DIW / IPA supply part
130 gas supply unit 150 suction unit

Claims (10)

In the substrate drying apparatus for sequentially supplying ultra-pure water (DIW, de-ionized water) and isopropyl alcohol (IPA, Iso-propyl Alcohol) to the substrate to be dried,
A drying chamber which forms a drying space of the substrate and is rotatably mounted with a substrate loading part on which the substrate is loaded;
A gas supply unit mounted to the drying chamber so as to be positioned below the substrate loading unit, and vaporizing the ultrapure water or the isopropyl alcohol present in the substrate by providing a hot gas toward the substrate loading unit; And
A suction part mounted to the drying chamber to be movable above the substrate loading part, and sucking the ultrapure water or the isopropyl alcohol vaporized from the substrate loading part;
Substrate drying apparatus comprising a.
The method of claim 1,
And the suction part moves radially from the center of the substrate loaded in the substrate loading part to suck the isopropyl alcohol and is provided in a nozzle type.
The method of claim 2,
An expansion speed of the vaporization range of the isopropyl alcohol by the hot gas and the moving speed of the suction unit correspond to each other.
The method of claim 1,
And the hot gas supplied from the gas supply part is an inert gas.
5. The method of claim 4,
And the hot gas is heated by a hot water principle.
In the substrate drying apparatus for sequentially supplying ultra-pure water (DIW, de-ionized water) and isopropyl alcohol (IPA, Iso-propyl Alcohol) to the substrate to be dried,
A drying chamber which forms a drying space of the substrate and is rotatably mounted with a substrate loading part on which the substrate is loaded;
A heat supply unit mounted in the drying chamber to be positioned above the substrate loading unit, and configured to vaporize the ultrapure water or the isopropyl alcohol present in the substrate by applying heat to the substrate on the substrate loading unit; And
A suction part mounted in the drying chamber so as to be movable above the substrate loading part, and sucking the ultrapure water or the isopropyl alcohol vaporized from the substrate;
Substrate drying apparatus having a.
The method according to claim 6,
And the heat supply unit and the suction unit are coupled together and move together in an upper portion of the substrate loading unit.
The method of claim 7, wherein
The heat supply unit is provided as a heater type for supplying heat to the substrate,
The suction unit is provided with a nozzle type substrate drying apparatus.
The method of claim 7, wherein
The heat supply part and the suction part move together in a radial direction from the center of the substrate loaded in the substrate loading part, supplying heat from the heat supply part and the ultrapure water or the isopropyl alcohol vaporized through the suction part. A substrate drying apparatus in which the inhalation process proceeds substantially simultaneously.
The method according to claim 6,
And the heat supply unit first vaporizes the ultrapure water or the isopropyl alcohol in the upper region between the patterns formed in the substrate by supplying heat from the top of the substrate.

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