KR20120078494A - A gas barrier film having getter layer and a process for preparing the same - Google Patents

A gas barrier film having getter layer and a process for preparing the same Download PDF

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Publication number
KR20120078494A
KR20120078494A KR1020100140812A KR20100140812A KR20120078494A KR 20120078494 A KR20120078494 A KR 20120078494A KR 1020100140812 A KR1020100140812 A KR 1020100140812A KR 20100140812 A KR20100140812 A KR 20100140812A KR 20120078494 A KR20120078494 A KR 20120078494A
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KR
South Korea
Prior art keywords
layer
gas barrier
getter layer
film
getter
Prior art date
Application number
KR1020100140812A
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Korean (ko)
Inventor
정이운
정재호
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주식회사 효성
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Priority to KR1020100140812A priority Critical patent/KR20120078494A/en
Publication of KR20120078494A publication Critical patent/KR20120078494A/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/308—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29—Laminated material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/24—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer not being coherent before laminating, e.g. made up from granular material sprinkled onto a substrate
    • B32B2037/246—Vapour deposition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00—Coating on the layer surface
    • B32B2255/10—Coating on the layer surface on synthetic resin layer or on natural or synthetic rubber layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2255/00—Coating on the layer surface
    • B32B2255/20—Inorganic coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/724—Permeability to gases, adsorption
    • B32B2307/7242—Non-permeable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2405/00—Adhesive articles, e.g. adhesive tapes

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Laminated Bodies (AREA)

Abstract

PURPOSE: A gas barrier film including a getter layer and a manufacturing method thereof are provided to control gas interceptability by proper combination of processing condition. CONSTITUTION: A gas barrier film(100) including a getter layer comprises a base film(101) having a first side and a second side, a getter layer(102) formed on the first side of the base film, an epoxy adhesive layer(103) formed on the getter layer, and a barrier layer(104) which is vaporized on the second side of the base film. The thickness of the getter layer is 100-300 micro meters. A manufacturing method of the gas barrier film including the getter layer comprises the following steps: forming a getter layer formed on top of the first of the base film; forming an epoxy adhesive layer formed on top of the getter layer; and forming a barrier layer on top of the second side of the base film using a vacuum deposition process.

Description

A gas barrier film having getter layer and a process for preparing the same}

The present invention relates to a gas barrier film having a multilayer structure including a getter layer and a method of manufacturing the same.

Conventionally, glass has been mainly used as a gas barrier panel for protecting an electronic device from oxygen and water vapor, but there is a high risk of breakage due to low flexibility, limited weight, and low impact resistance. In recent years, the use of a base film excellent in flexibility and impact resistance, although the gas barrier performance is reduced, instead of glass, the present invention relates to a film and a method of manufacturing the improved gas barrier performance.

Various methods are known for producing a film having a gas barrier performance by depositing a coating film on the film.

For example, Korean Patent Application Publication No. 10-2010-0045647 discloses a protective film having moisture resistance, that is, moisture barrier property, by forming a silicon-based oxide coating layer on both surfaces of a plastic substrate by using a vacuum deposition method. The moisture permeability of the film is 10 -2 g / m 2 day, there was a problem that the moisture barrier property is poor to be used in the electronic device.

In addition, Korean Patent Application Publication No. 10-2010-0051810 discloses encapsulating an environmentally sensitive device, in particular a display device that is susceptible to degradation by the penetration of environmental gases or liquids used for processing water vapor and oxygen, or electronic products in the atmosphere. Multilayer barrier stacks and methods of making the same are disclosed. The barrier stack consists of a polymer separation layer and an inorganic layer, and the inorganic layers are deposited using a vacuum deposition process. However, in order to produce a film having excellent gas barrier performance, the barrier stack, that is, the organic layer and the inorganic layer must be repeatedly formed, which has a problem of undergoing a long and complicated process.

An object of the present invention is to provide a gas barrier film having the water vapor transmission rate (10 −6 g / m 2 day or less) required by OLEDs for solar cells, displays, and illuminations. An object of the present invention is to provide a method for producing a gas barrier film which can control the gas barrier performance by an appropriate combination of process conditions while having an improved gas barrier property and a simple manufacturing process.

Gas barrier film containing a getter layer as a means for solving one problem of the present invention,

A base film having a first surface and a second surface;

A getter layer formed on the first surface of the base film;

An epoxy adhesive layer formed on the getter layer; And

And a barrier layer deposited on the second surface of the base film.

Method for producing a gas barrier film comprising the getter layer of the present invention,

Forming a getter layer on a first surface of the base film having a first surface and a second surface;

Forming an epoxy adhesive layer on the getter layer; And

Forming a barrier layer on the second surface of the base film by a vacuum deposition process;

It is configured to include.

The gas barrier film of the present invention exhibits a high level of gas barrier properties and can be widely used in food and industrial packaging materials, as well as solar cells, display devices and lighting OLEDs. In addition, since the epoxy adhesive layer of the gas barrier film of the present invention absorbs UV, the UV filter film for protecting the OLED device becomes unnecessary. The method for producing a gas barrier film of the present invention consists of a simple process, and by appropriately combining the process conditions, the gas barrier performance can be variously adjusted, thereby increasing process efficiency and reducing manufacturing costs.

1 is a diagram illustrating a gas barrier film of the present invention.

Hereinafter, the gas barrier film including the getter layer of the present invention will be described in detail.

Specifically, the gas barrier film 100 including the getter layer according to the present invention,

A base film 101 having a first surface and a second surface;

A getter layer 102 formed on the first surface of the base film;

An epoxy adhesive layer 103 formed on the getter layer; And

And a barrier layer 104 deposited on the second surface of the base film.

The base film 101 is a substrate on which a getter layer, an epoxy adhesive layer, and a barrier layer are laminated, and includes PA (polyamide), PET (polyester), PEN (polyethylene naphthalate), PI (polyimide), and PES ( It is an optical film consisting of one or more polymers selected from the group consisting of polyethersulfone), PAR (polyarylate), PC (polycarbonate) and the like.

The getter layer 102 is formed on the first surface of the base film to not only absorb or adsorb and remove water vapor introduced through the barrier layer in the air, but also to generate water vapor inside the device to be protected by the film of the present invention. In addition, the layer to perform the function of removing, it comprises a poly methyl methacrylate (Poly methyl methacrylate, PMMA). The getter layer 102 preferably has a thickness of 100 to 300 µm, and if the thickness is less than 100 µm, the water vapor adsorption capacity decreases. If the thickness of the getter layer 102 exceeds 300 µm, the thickness of the entire gas barrier film of the present invention increases. .

The epoxy adhesive layer 103 is a layer formed on the edge of the getter to adhere the gas barrier film of the present invention to the device. The epoxy adhesive layer 103 includes an epoxy resin having strong adhesive strength and excellent heat resistance, durability, and electrical insulation. In addition, the epoxy adhesive layer 103 is preferably 1 ~ 10㎛, the thickness is less than 1㎛ adhesion performance is lowered, if the thickness exceeds 10㎛ there is a disadvantage in reducing the light transmittance.

For gas barrier films for display devices such as OLEDs, it is suitable to use a room temperature curable epoxy resin, but if a room temperature curable epoxy resin is not used, the OLED element may be damaged during UV irradiation, and thus a separate UV filter film is required. Because there is. As the room temperature curing agent for epoxy resins, polyamide resins, aliphatic amines and derivatives thereof, aromatic amines and derivatives thereof or cycloaliphatic amines and derivatives thereof can be used.

The barrier layer 104 is a layer formed on the base film to impart gas barrier performance to the base film. As the main component, metal oxides, metal nitrides, metals, and mixtures thereof are used, and the thickness thereof is preferably 50 to 300 nm. Do. If the thickness of the barrier layer 104 is less than 50 nm, the gas barrier performance is lowered. If the thickness is more than 300 nm, the light transmittance is lowered, and the deposition process time of the barrier layer is increased to decrease the process efficiency.

Next, the method of manufacturing the gas barrier film containing the getter layer of this invention is demonstrated concretely.

Method for producing a gas barrier film comprising the getter layer of the present invention,

Forming a getter layer on a first surface of the base film having a first surface and a second surface;

Forming an epoxy adhesive layer on the getter layer; And

Forming a barrier layer on the second surface of the base film by a vacuum deposition process;

It is configured to include.

The forming of the getter layer is not only to absorb and block water vapor introduced through the barrier layer in the air, but also to absorb and remove water vapor generated inside the device to be protected by the film of the present invention. The coating is performed on the first surface of the base film and then cured.

The step of forming the epoxy adhesive layer is performed in order to adhere the gas barrier film of the present invention to the device, it is carried out in such a manner as to maintain the low temperature storage after applying the epoxy adhesive on the getter layer. When the epoxy adhesive is applied only to the edge portion of the getter layer, there is an advantage that the adhesive layer and the device can be separated to prevent device damage by the adhesive agent.

The forming of the barrier layer is performed to impart a gas barrier performance to the base film, and sputtering, chemical vapor deposition (CVD), and plasma enhanced chemical vapor deposition (PECVD) on a second surface of the base film. It is carried out by a vacuum deposition process such as). The preferred process here is plasma enhanced chemical vapor deposition (PECVD) method, since the raw material is deposited using a plasma, there is an advantage that the process can be performed at room temperature.

Next, the method of manufacturing the gas barrier film including the getter layer according to the present invention will be described in detail with reference to preferred Examples 1 to 3 and Comparative Example 1.

The following examples are intended to illustrate the invention, but the invention is not limited thereto.

1) Formation of Getter Layer

A solvent-free liquid getter is spin coated on a PET film to form a getter layer having a thickness of 100 μm.

2) formation of barrier layer

A 200 nm barrier layer is deposited on the water repellent layer by plasma enhanced chemical vapor deposition (PECVD) using SiO x (1.5 <x <1.9).

3) Apply epoxy adhesive

An epoxy solution containing an aliphatic amine as a room temperature curing agent on the getter layer is applied to a thickness of 5㎛.

A gas barrier film was manufactured in the same manner as in Example 1 except that the thickness of the getter layer was formed to 200 μm.

A gas barrier film was manufactured in the same manner as in Example 1 except that the thickness of the getter layer was formed to be 300 μm.

Comparative example  One

A gas barrier film was manufactured in the same manner as in Example 1, except that no getter layer was formed on the base film.

Water vapor permeability of the gas barrier film prepared by Examples 1 to 3 and Comparative Example 1, respectively Performance evaluation was carried out in the following manner, and the measured results are summarized in Table 1 below.

(1) water vapor transmission rate

Based on ASTM F 1249, measured at 38, 100% RH using a Permatran-W 3/33 Model of MOCON.

division Getter
Thickness (㎛) Water vapor permeability
(g / m 2 day) Example 1 100 8 × 10 -6 Example 2 200 5 × 10 -6 Example 3 300 2 × 10 -6 Comparative Example 1 0 3 × 10 -2

As can be seen in Table 1, the films prepared by Examples 1 to 3 according to the present invention, compared to the films prepared by Comparative Examples 1 and 2, the water vapor transmission rate is significantly lower, as well as for solar cells, displays It can be seen that the gas barrier performance is excellent even when used for lighting OLED.

In addition, since the epoxy adhesive layer of the gas barrier film of the present invention absorbs UV, the UV filter film for protecting the OLED device becomes unnecessary.

100: gas barrier film
101: base film
102: getter layer
103: epoxy adhesive layer
104: barrier layer

Claims (7)

A base film having a first surface and a second surface;
A getter layer formed on the first surface of the base film;
An epoxy adhesive layer formed on the getter layer; And
And a barrier layer deposited on the second surface of the base film. The gas barrier film of Claim 1 containing the getter layer whose thickness of the said getter layer is 100-300 micrometers. The gas barrier film of claim 1, wherein the epoxy adhesive layer is formed on an edge on the getter layer. The gas barrier film of claim 1, wherein the epoxy adhesive layer comprises a room temperature curable epoxy resin. The gas barrier film of claim 1, wherein the barrier layer comprises one of a metal oxide, a metal nitride, and a metal. The gas barrier film using nanoparticles of claim 1, wherein the barrier layer comprises silicon oxide (SiO x , x has a value of 1.5 to 1.9). Forming a getter layer on a first surface of the base film having a first surface and a second surface;
Forming an epoxy adhesive layer on the getter layer; And
Forming a barrier layer on the second surface of the base film by a vacuum deposition process;
The method of manufacturing a gas barrier film comprising a getter layer, including.
KR1020100140812A 2010-12-31 2010-12-31 A gas barrier film having getter layer and a process for preparing the same KR20120078494A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020100140812A KR20120078494A (en) 2010-12-31 2010-12-31 A gas barrier film having getter layer and a process for preparing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020100140812A KR20120078494A (en) 2010-12-31 2010-12-31 A gas barrier film having getter layer and a process for preparing the same

Publications (1)

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KR20120078494A true KR20120078494A (en) 2012-07-10

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