KR20120076969A - Method of producting anti-reflective layer for display device - Google Patents

Abstract

PURPOSE: A method for manufacturing an anti-reflecting layer is provided to prevent brilliant by making low reflectivity of external light and to improve visibility. CONSTITUTION: A solvent containing nano-powder is spread on a first material. A curing process evaporating the solvent through a drying process by UV investigation is executed at is 80-120°C for 1-2 minutes. The first material in which the nano-power is spread contacts with a second material(230) which is coated by a binder. The second material is heat-hardened or UV-hardened. A mold is separated from the second material. An anti-reflective layer(240a) having a moth-eye pattern is formed on the second material. The binder is composed of a thermosetting resin or a UV-cured resin.

Description

Method for manufacturing anti-reflection layer for display device {METHOD OF PRODUCTING ANTI-REFLECTIVE LAYER FOR DISPLAY DEVICE}

The present invention relates to a method of manufacturing an antireflection layer for a display device having a low reflectance.

Display devices that display images include cathode ray tubes (CRTs), liquid crystal displays (LCDs), plasma displays (PDPs), and field emission displays (CRTs) in flat-panel computer monitors or televisions. Emission Display (FED) and Organic Light Emitting Diodes (OLED) devices.

Such a display device is used in an environment in which external light is incident indoors or outdoors, and a problem such as deterioration of visibility is caused in the display device due to an image condensation phenomenon caused by external light.

In order to solve the problem of the display device, various kinds of anti-reflection layers have been developed to reduce the reflectance.

A widely used method for reducing the reflectance of a display device in manufacturing an antireflection layer is to induce diffuse reflection to scatter light incident on the surface of the display device or to use offset interference by diffraction of light.

Among them, the most commonly used method is to use offset interference by diffraction of light. In order to use the offset interference effect by diffraction of light, a single layer or multi-layer antireflection layer is required.

Single layer or multilayer antireflective layer is made of inorganic compounds such as calcium fluoride (CaF₂), zinc sulfide (ZnS), silica (silica: SiO₂), and vacuum deposition sputtering (physical vapor deposition) (chemical vapor deposition: CVD), wet coating, or the like.

Figure 1a is a view showing a conventional single-layer anti-reflection layer, Figure 1b is a view showing a conventional multilayer anti-reflection layer.

As shown in FIG. 1A, the single layer anti-reflective layer forms a hard coat layer 12 using a hard coating solution on one surface of the substrate 10 and has a low refractive index of 1.3 to 1.5 on one surface of the hard coat layer 12. The eggplant is prepared by forming the low refractive index layer 14 with a coating liquid.

The hard coat layer 12 is laminated using a heat or ultraviolet curing agent transparent coating.

The low refractive index layer 14 includes silica (SiO 2), magnesium fluoride (MgF 2), fluorocarbon resin, and the like.

Meanwhile, as shown in FIG. 1B, the multilayer antireflective layer forms a hard coat layer 22 using a hard coating solution on one surface of the substrate 20 and has a first refractive index on one surface of the hard coat layer 22. The first refractive index layer 24, the second refractive index layer 26 having the second refractive index, and the third refractive index layer 28 having the third refractive index are sequentially formed.

Here, it is preferable that the first refractive index has a value within the range of 1.64 to 1.67, the second refractive index has a value within the range of 1.75 to 1.77, and the third refractive index has a value within the range of 1.4 to 1.42.

In general, the high refractive index has a value of 1.6 or more, and the low refractive index has a value in the range of 1.3 to 1.5, so the first refractive index layer 24 and the second refractive index layer 26 correspond to the high refractive index layer, and the third refractive index. Layer 28 corresponds to a low refractive index layer.

The multilayer anti-reflection layer may be laminated in various combinations of a plurality of refractive index layers defined as specific values as needed without any limitation on the refractive index layer.

The hard coat layer 22 is laminated using a heat or ultraviolet curing agent transparent coating.

The first and second refractive layers 24 and 26 use inorganic metal oxides and sulfide particles having high refractive indices.

As the third refractive layer 28, silica (SiO 2), magnesium fluoride (MgF 2), fluorocarbon resin, or the like is used.

Recently, as the structure of the optical system is complicated, the desired transmittance and the reflectance cannot be obtained with the single layer anti-reflection layer, and thus, the multilayer anti-reflection layer is frequently used.

The most important factors in the production of such multilayer antireflection layers are the refractive index of each layer and the thickness of each layer.

An optimal refractive index value for satisfying the cancellation interference condition is 1.22, and it is not easy to adjust the average regulation rate of the multilayer antireflection layer to 1.22.

In particular, there are few materials having a refractive index of 1.22 or less, and they are expensive and are not easy to use. In addition, since the strength of the material is lowered as the refractive index is lower, there is a problem that it is not easy to apply.

Accordingly, an object of the present invention is to provide a method of manufacturing an antireflection layer having an optimal low refractive index in a display device.

In order to achieve the above object, the method for manufacturing an antireflection layer for a display device according to the present invention comprises the steps of applying a solution containing a nano powder to a first substrate; Performing a curing process on the first substrate including the nanopowder; Contacting the first substrate coated with the nano powder with a second substrate coated with a binder; Photocuring or thermosetting the second substrate; Generating an uneven shape in the form of acid on the second substrate.

The curing process is characterized in that for 1 to 2 minutes at 80 ~ 120 ℃.

The binder is characterized in that the photocurable resin or thermosetting resin.

In addition, the binder has a refractive index of 1.4 to 1.6, the thickness is characterized in that formed in the range of 1 to 2㎛.

The uneven shape of the mountain form is characterized in that the interval between the acid and the mountain or the valley and the valley has a range of 50 to 200nm.

The first substrate is characterized in that it corresponds to a flat substrate or a roll substrate.

The anti-reflection layer may include a cathode ray tube (CRT), a plasma display panel (PDP), a liquid crystal display (LCD), and an organic electroluminescent display (OELD). It is characterized in that it is applicable to either.

According to the method of manufacturing an antireflection layer according to the present invention, an antireflection layer having a low refractive index can be manufactured using a material having a high refractive index. As a result, the width of the selectable material becomes wider, and the antireflection layer can be manufactured using an inexpensive material.

In addition, the display device using the anti-reflection layer can improve the visibility while preventing glare by lowering the reflectance of the external light.

Figure 1a is a view showing a conventional monolayer antireflection layer.
Figure 1b is a view showing a conventional multilayer anti-reflection layer.
2A to 2D are views illustrating a process of manufacturing an anti-reflection layer according to a first embodiment of the present invention.
3 is a flowchart illustrating a method of manufacturing an anti-reflection layer according to a first embodiment of the present invention.
4A and 4B illustrate an antireflection layer manufacturing process according to a second embodiment of the present invention.
5 is a graph showing the amount of change in black luminance value for each illuminance in the display device to which the anti-reflection layer is not applied and the display device to which the anti-reflection layer is applied according to the present invention.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

2A to 2D are views illustrating a process of manufacturing an antireflection layer according to a first embodiment of the present invention, and FIG. 3 is a flowchart illustrating a method of manufacturing an antireflection layer according to a first embodiment of the present invention.

As shown in FIG. 2A, the solution 216 containing the nanopowder 214 is coated on the first substrate 212 (S10). In this case, the solution 216 containing the nanopowder 214 may be formed by using a spin coating method, a slit coating method, a drop casting method, a dip casting method, or the like. The first substrate 212 may be applied to be regularly arranged on the front surface.

Here, the nano powder 214 is a nano-size powder powder, so that the interval (pattern between the acid and the acid or the valley and valley) of the moth eye pattern corresponding to the acid shape to be formed is formed to 200nm or less. It may have a diameter in the range of 50-200 nm, more preferably in the range of 100-150 nm. The nano powder 214 may be used as silicon oxide (SiOx), titanium oxide (TiOx), zinc oxide (ZnOx), antimony tin oxide (ATO), indium tin oxide (ITO), TnOx, or the like.

The first substrate 212 may use a transparent substrate such as glass, quartz, or a wafer.

Accordingly, as shown in FIG. 2B, the first substrate 212 to which the nanopowder 214 is applied is subjected to a curing process of evaporating the solvent through drying through UV irradiation. Curing process may proceed for 1 to 2 minutes at 80 ~ 120 ℃ (S12). At this time, the curing process may be performed by heat treatment instead of UV irradiation.

After the curing process as described above, the first substrate 212 coated with the nanopowder 214 is used as a mold, and the mold has a lens shape opposite to the uneven shape of the acid form to be formed. 214).

Thereafter, as shown in FIG. 2C, after the first substrate 212 coated with the nanopowder 214 is contacted with the second substrate 230 coated with the binder 240 (S14), UV is applied to the second substrate. Is irradiated with photocuring or thermal curing (S16).

The binder 240 corresponds to a thermosetting resin or a photocurable resin, and the thermosetting resin or the photocurable resin has a refractive index in the range of 1.4 to 1.6 and more preferably has a refractive index in the range of 1.45 to 1.55. Such, the thickness of the thermosetting resin or photocurable resin is preferably formed in the range of about 1 ~ 2㎛.

As described above, the second substrate 230 to which the binder 240 is encoded may be one of a transparent substrate and a film, and includes a glass, a plastic film, a polyether sulfone (PES), a sheet, and the like. Here, the plastic film may be a polyethylene terephthalate (PET) film, a cellulose triacetate (CTA) film, or the like.

The polymer suitable for the material of the plastic film may be cellulose ester, polyimide, polycarbonate, polyester, polystyrene, polyolefine, polysulfone. (polysulfone), polyether sulfone, polyarylate, polyether lmide, polymethyl methacrylate, and polyether ketone, polyvinyl alcohol ( polyvinyl alcohol, polyvinyl chloride, and the like.

Cellulose esters include cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate propionate, and nitro cellulose The polyester includes polyethylene terephthalate, polyethylene naphthalate, polybutylene terephthalate, and polystyrene includes syndiotactic polystyrene.

On the other hand, as shown in FIG. 2D, the first substrate to which the nanopowder 214 is applied, that is, the mold is separated from the second substrate 230 coated with the binder 240 to the second substrate 230. The process of manufacturing the anti-reflection layer 240a in which the uneven shape of the mountain form, that is, the moth eye pattern is formed, may be completed (S18).

As such, the pattern pitch (the spacing between the peaks and peaks or valleys and valleys) d1 of the moth-eye pattern formed on the reflective ring layer 240a is formed to have a range of 50 to 200 nm, more preferably. It will be formed to have a range of 100 ~ 150nm. In addition, the thickness d2 of the reflective ring layer 240a may be formed in a range of about 1 to 2 μm.

As described above, the reflective ring layer 240a having the moth-eye pattern has an average refractive index in the range of 1.2 to 1.3, and the reflectance of the anti-reflection layer 240a is in the range of 0.5 to 2%.

The reflection ring layer 240a has an effect of preventing reflection to visible light and has excellent transmission characteristics.

As described above, since the moth-eye pattern is formed by using the first substrate 212 coated with the nanopowder 214 as a mold, the nanopowder 214 corresponding to a commercially available material is used between the patterns. It is possible to repeatedly form a moth-eye pattern having a constant interval (pitch) and to form a uniform moth-eye pattern on a large-area substrate.

Accordingly, the productivity can be improved by simplifying the process, and a uniform MOSFET pattern can be formed on a large-area substrate at low cost.

In particular, even when using a photocurable resin or a thermosetting resin having a high refractive index in the range of 1.4 to 1.6 without the need to deposit low refractive materials such as silica (SiO₂), fluorocarbonresin on the substrate, It is characterized by forming a reflective ring layer having a low refractive index. In other words, the width of the material can be selected.

4A and 4B are process charts illustrating a method of manufacturing an antireflection layer according to a second embodiment of the present invention.

As shown in FIG. 4A, the nanopowder 314 applied to the roller 300 is rotated by rotating the roller 300 coated with the nanopowder 314 on the binder 340 coated on one surface of the substrate 330. As a result, the moth-eye pattern in the form of acid is printed on the binder 340.

The nano powder 314 may have a diameter in the range of 50 to 200 nm, and more preferably in the range of 100 to 150 nm so that the inter-pattern spacing of the mos-eye pattern is formed to 200 nm or less with nano-sized powder powder. . The nano powder 314 may be used as silicon oxide (SiOx), titanium oxide (TiOx), zinc oxide (ZnOx), antimony tin oxide (ATO), indium tin oxide (ITO), TnOx, or the like.

The substrate may use a transparent substrate such as glass, quartz, or a wafer.

The binder 340 corresponds to a curable resin or photocurable resin, and the curable resin or photocurable resin has a refractive index in a range of 1.4 to 1.6 and more preferably has a refractive index in a range of 1.45 to 1.55. Such, the thickness of the curable resin or photocurable resin is preferably formed in the range of about 1 ~ 2㎛.

As described above, the substrate 330 to which the binder 340 is encoded may be one of a transparent substrate and a film, and may include glass, a plastic film, a polyether sulfone (PES), a sheet, and the like. Here, the plastic film may be a polyethylene terephthalate (PET) film, a cellulose triacetate (CTA) film, or the like.

On the other hand, the roller 300 coated with the nanopowder 314, like the first embodiment of the present invention by applying a solution containing the nano powder 314 to the roller 300, by performing a curing process Solvent was evaporated. Curing process may be performed for 1 to 2 minutes of light (UV) irradiation or heat treatment of 80 ~ 120 ℃.

Thereafter, UV light is irradiated onto the substrate 330 on which the Moth Eye pattern is printed, or heat curing is performed to reflect the MoS Eye pattern formed on the substrate 330 as shown in FIG. 4B. The process of manufacturing the ring layer 340a may be completed.

As such, the pattern pitch (the spacing between the mountains and the mountains or the valleys and valleys) of the moth-eye pattern formed on the reflective ring layer 340a is formed to have a range of 50 to 200 nm, more preferably 100 to 150 nm. Will be formed. In addition, the thickness of the reflective ring layer 340a is to be formed in the range of about 1 ~ 2㎛.

As described above, the reflective ring layer 340a having the moth-eye pattern has an average refractive index in the range of 1.2 to 1.3, and the reflectance of the antireflection layer 340a is in the range of 0.5 to 2%.

The reflection ring layer 340a has an effect of preventing reflection of visible light and has excellent transmission characteristics.

As described above, by applying the nano-powder to the roller to form a moth eye pattern it is possible to repeatedly form a moth eye pattern with a constant pattern pitch, it is possible to more easily form a uniform moth eye pattern on a large-area substrate. .

As such, the process can be simplified to improve productivity, and a uniform MOSFET pattern can be formed on a large-area substrate at low cost.

Low refractive index in the range of 1.2 to 1.3 even when using a photocurable resin or a thermosetting resin having a high refractive index in the range of 1.4 to 1.6 without the need to deposit a low refractive material such as silica (SiO₂), fluorocarbonresin on the substrate It is characterized in that it forms a reflective ring layer having a.

FIG. 5 is a graph showing changes in black luminance values for respective illumination levels in the display device to which the anti-reflection layer is not applied and the display device to which the anti-reflection layer is applied according to the present invention.

In this case, the black luminance value is a value indicating the lowest luminance by minimizing backlight light passing through the liquid crystal display panel of the display device.

When the illuminance is 5000 lux, the black luminance value of the display apparatus B without applying the reflection ring layer is about 310 (cd / m²), but the anti-reflection layer (240a of FIG. 2D and 340a of FIG. 4B) according to the present invention is used. The black luminance value of the applied display apparatus A is about 170 (cd / m²), and it can be seen that the black luminance value is reduced by 55% compared to the display apparatus B without the antireflective layer.

Accordingly, it can be seen that the display device to which the antireflection layer is applied according to the present invention has low reflectance of external light.

The antireflective layer according to the present invention is applicable to all display devices requiring low reflectance. For example, it is applied to a cathode ray tube (CRT), a plasma display panel (PDP), a liquid crystal display (LCD), and an organic electroluminescent display (OELD). It is possible.

The present invention is not limited to the above embodiments, and various modifications can be made without departing from the spirit of the present invention.

212: first substrate 214, 314: nano powder
230: second substrate 240, 340: binder
240a, 340a: antireflection layer 300: roller

Claims (7)

Applying a solution containing a nanopowder to a first substrate;
Performing a curing process on the first substrate including the nanopowder;
Contacting the first substrate coated with the nano powder with a second substrate coated with a binder;
Photocuring or thermosetting the second substrate;
Generating an uneven shape of an acid form on the second substrate;
Method for manufacturing an anti-reflection layer for a display device comprising.
The method of claim 1,
The curing process
Method for manufacturing an anti-reflection layer for a display device, characterized in that for 1 to 2 minutes at 80 ~ 120 ℃.
The method of claim 1,
The binder is
A method of manufacturing an antireflection layer for a display device, characterized in that it is a photocurable resin or a thermosetting resin.
The method of claim 3, wherein
The binder is
It has a refractive index of 1.4 to 1.6, the thickness is formed in the range of 1 to 2㎛ antireflection layer manufacturing method for a display device.
The method of claim 1,
The uneven shape of the acid form
A method of manufacturing an antireflection layer for a display device, characterized in that the interval between the acid and the hill or the valley and the valley has a range of 50 to 200nm.
The method of claim 1,
The first substrate is
Method for manufacturing an anti-reflection layer for a display device, characterized in that the flat substrate or roll substrate.
The method of claim 1,
The antireflection layer
Applicable to Cathode Ray Tube (CRT), Plasma Display Panel (PDP), Liquid Crystal Display (LCD) and Organic Eltro Luminescence Display (OELD) Method for manufacturing an anti-reflection layer for display device characterized in that.

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